glass

Abstract

The present invention suppresses decreases in light transmittance, even after exposure to an acid, while also suppressing deformation. This glass (10) has a Young's modulus of 90 GPa or greater and has a surface arithmetic mean roughness Ra (nm) as stipulated by JIS B 0601:2001 of equal to or less than a recycling parameter value expressed by equation (1).

Description

Glass

[0001] The present invention relates to glass.

[0002] For example, as disclosed in Patent Document 1, glass having a high Young's modulus is known to suppress deflection.

[0003] Japanese Patent Application Laid-Open No. 2021-20840

[0004] However, glass with a high Young's modulus tends to have low acid resistance, and after being exposed to acid in acid washing or the like, the surface may become rough, resulting in a decrease in light transmittance.

[0005] An object of the present invention is to provide glass that can suppress distortion and also suppress a decrease in light transmittance even after exposure to acid.

[0006] The glass according to the present disclosure has a Young's modulus of 90 GPa or more, and the arithmetic mean roughness Ra (nm) of the surface as specified in JIS B 0601:2001 is less than or equal to the recycling parameter value A shown in formula (1).

[0007] A = (13 × [SiO ２ ]−3×[Al ２ O ３ ]-[B ２ O ３ ]-7×[MgO]-4×[CaO]-0.5×[SrO]-[BaO]-[R ２ O]) / 1000...(1)

[0008] Here, [SiO ２ ] is SiO in mole % notation based on oxide ２ is the content of [Al ２ O ３ ] is the percentage of Al in mole percent based on oxide. ２ O ３ is the content of [B ２ O ３ ] is the B in mole percent notation based on oxides ２ O ３[MgO] is the MgO content in mol% on an oxide basis, [CaO] is the CaO content in mol% on an oxide basis, [SrO] is the SrO content in mol% on an oxide basis, [BaO] is the BaO content in mol% on an oxide basis, and [R ２ O] is the total content of oxides of monovalent elements contained in the glass, expressed in mole percent on an oxide basis.

[0009] According to the present invention, it is possible to suppress the deterioration of light transmittance even after exposure to acid while suppressing the bending.

[0010] Fig. 1 is a schematic diagram of a glass according to this embodiment, and Fig. 2 is a schematic diagram for explaining deflection evaluation.

[0011] Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Note that the present invention is not limited to these embodiments, and when there are multiple embodiments, the present invention also includes configurations that are made by combining the respective embodiments. Furthermore, numerical values ​​include the range of rounding.

[0012] (Glass) FIG. 1 is a schematic diagram of glass according to this embodiment. As shown in FIG. 1, glass 10 according to this embodiment is used as a glass substrate for manufacturing semiconductor packages, and more specifically, is a supporting glass substrate for manufacturing FOWLPs and the like. However, the use of glass 10 is not limited to the manufacture of FOWLPs and the like and is arbitrary. It may be a glass substrate used to support components, or may be used for purposes other than supporting components. Note that FOWLPs and the like include fan-out wafer level packages (FOWLPs) and fan-out panel level packages (FOPLPs).

[0013] (Young's modulus of glass) The Young's modulus of the glass 10 is 90 GPa or more, preferably 95 GPa or more, and more preferably 100 GPa or more. The Young's modulus of the glass 10 is preferably 90 GPa or more and 150 GPa or less, more preferably 95 GPa or more and 130 GPa or less, and even more preferably 100 GPa or more and 120 GPa or less. Having the Young's modulus within this range can suppress deflection and facilitate cutting, grinding, and polishing. The Young's modulus of the glass 10 was measured using the ultrasonic pulse method specified in JIS R 1602:1995 "Test method for elastic modulus of fine ceramics." The bulk density of the sample was measured using the Archimedes method, and the longitudinal wave velocity and shear wave velocity were measured using an ultrasonic thickness gauge 38DL PLUS manufactured by Olympus Corporation, to determine the Young's modulus value.

[0014] (Recycling Parameter Value) The recycling parameter value A of the glass 10 is defined as a value shown in the following formula (1): The recycling parameter value A is a parameter calculated based on the composition of the glass 10.

[0015] A = (13 × [SiO ２ ]−3×[Al ２ O ３ ]-[B ２ O ３ ]-7×[MgO]-4×[CaO]-0.5×[SrO]-[BaO]-[R ２ O]) / 1000...(1)

[0016] Here, [SiO ２ ] is the SiO contained in glass 10 in mole percent on an oxide basis. ２ is the content of [Al ２ O ３ ] is the Al content of glass 10 in mole percent on an oxide basis. ２ O ３ is the content of [B ２ O ３ ] is the B content of glass 10 in mole percent on an oxide basis. ２ O ３[MgO] is the content of MgO contained in the glass 10 in mol% notation based on oxides, [CaO] is the content of CaO contained in the glass 10 in mol% notation based on oxides, [SrO] is the content of SrO contained in the glass 10 in mol% notation based on oxides, and [BaO] is the content of BaO contained in the glass 10 in mol% notation based on oxides. ２ O] is the total content of oxides of monovalent elements contained in the glass 10 in mol % notation on an oxide basis. That is, for example, when the glass 10 contains, on an oxide basis, Li ２ O, Na ２ O.K. ２ When O is contained, [R ２ O] is Li contained in the glass 10. ２ The O content (mol %) and the Na content in the glass 10 ２ The O content (mol %) and the Na content in the glass 10 ２ The total value of the content (mol%) of Li and O ([Li ２ O] + [Na ２ O] + [K ２ O]). Furthermore, the glass 10 does not need to contain all of the oxides listed in formula (1). In formula (1), the content of oxides not contained in the glass 10 is treated as zero.

[0017] (Surface Roughness of Glass) The arithmetic mean roughness Ra (nm) of the surface 12 of the glass 10 is equal to or less than the recycling parameter value A described above. Note that the surface 12 refers to the main surface of the glass 10. If one main surface of the glass 10 is surface 12A and the main surface opposite surface 12A is surface 12B, then surface 12 refers to both surfaces 12A and 12B, but is not limited thereto and may refer to at least one of surfaces 12A and 12B. That is, it is preferable that the arithmetic mean roughness Ra of both surfaces 12A and 12B of the glass 10 is equal to or less than the recycling parameter value A, but the arithmetic mean roughness Ra of at least one of surfaces 12A and 12B may be equal to or less than the recycling parameter value A. As a result of extensive research, the inventors have found that by setting the arithmetic mean roughness Ra of the surface 12 to a value equal to or less than the recycling parameter value A, a decrease in light transmittance (i.e., a deterioration in the haze value) can be suppressed even when the surface 12 of the glass 10 is roughened by exposure to acid. Specifically, when the arithmetic mean roughness Ra of the surface 12 is greater than the recycling parameter value A, the surface 12, which is already highly uneven, is roughened by the acid, further increasing the degree of roughness, making it difficult for light to transmit through the surface. On the other hand, by setting the arithmetic mean roughness Ra of the surface 12 to a value equal to or less than the recycling parameter value A, even when the surface 12 is roughened by the acid, the degree of roughness does not increase so much, thereby suppressing the difficulty in light transmission. Note that the term "light" herein may refer to light of any wavelength, such as infrared light, ultraviolet light, or visible light. Note that the arithmetic mean roughness Ra is measured in accordance with the provisions of JIS B 0601:2001 "Geometric Product Specifications (GPS)."

[0018] The ratio (Ra / A) of the arithmetic mean roughness Ra (nm) of the surface 12 to the recycling parameter value A is preferably 0.75 or less, more preferably 0.01 to 0.72, even more preferably 0.1 to 0.65, and even more preferably 0.55 or less. When the ratio of the arithmetic mean roughness Ra to the recycling parameter value A is within this range, it is possible to suitably prevent light from being transmitted through the surface 12.

[0019] The arithmetic mean roughness Ra of the surface 12 described above refers to the arithmetic mean roughness of the surface 12 in a state before the glass 10 is exposed to acid. The state before the glass 10 is exposed to acid refers to a state after it has been confirmed that the arithmetic mean roughness Ra of the surface 12 is within the above-mentioned range, but before the glass 10 is exposed to acid. Therefore, for example, the arithmetic mean roughness of the surface 12 may be returned to the above-mentioned range of arithmetic mean roughness Ra by polishing the surface 12 after exposing the glass 10 to acid. This state can also be referred to as the state before the glass 10 was exposed to acid.

[0020] (Glass Composition) Next, a description will be given of a preferred composition of the glass 10. However, the glass 10 may have any composition as long as the Young's modulus and the arithmetic mean roughness Ra of the surface 12 satisfy the above ranges.

[0021] For glass 10, the value E expressed by the following formula (2) is preferably 0.8 or greater, more preferably 0.85 or greater, even more preferably 0.90 or greater, and even more preferably 0.95 or greater. When the value E is within this range, the Young's modulus can be increased and deflection can be appropriately suppressed.

[0022] E=(122-0.53×[SiO ２ ]+0.35×[Al ２ O ３ ]−1.15×[B ２ O ３ ]+0.20×[MgO]-0.15×[CaO]-0.01×[SrO]-1.25×[BaO]) / 100...(2)

[0023] (SiO ２ ) The glass 10 is SiO ２ Contains (SiO ２ It is preferable that the content of SiO is higher than 0 mol %. ２ is a component that reduces the coefficient of linear thermal expansion and controls the magnitude of Young's modulus. Glass 10 contains, in mole percent on an oxide basis, SiO ２ The content of SiO is preferably 35% or more and 60% or less, more preferably 40% or more and 55% or less, even more preferably 45% or more and 53% or less, and even more preferably 48% or more and 51% or less.２ When the content of SiO falls within this range, the Young's modulus can be increased and deflection can be suppressed. ２ By setting the content of SiO in this range, the Young's modulus can be increased, but the acid resistance is reduced. ２ By making the content of the polymer film lower than the recycling parameter value A calculated based on the content of the polymer film, it is possible to suppress the deterioration of the transmittance due to the acid while suppressing the deflection by achieving a high Young's modulus.

[0024] (Al ２ O ３ ) Al ２ O ３ Al has the effect of increasing the Young's modulus, suppressing deflection, and suppressing phase separation of glass. ２ O ３ By making the content of Al 6% or more, these effects can be easily achieved. ２ O ３ By making the content of Al 30% or less, it is possible to prevent the liquidus temperature from becoming high. ２ O ３ The content of Al is preferably 6% or more and 30% or less, more preferably 8% or more and 25% or less, even more preferably 9% or more and 20% or less, even more preferably 11% or more and 15% or less, and even more preferably 12% or more and 14% or less. ２ O ３ When the content falls within this range, it is possible to suppress the deflection due to a high Young's modulus, and also to suppress the decrease in transmittance due to acid.

[0025] (B ２ O ３ ) B ２ O ３ has the effect of suppressing devitrification due to crystallization of the glass, facilitating manufacturing, and controlling the Young's modulus. On the other hand, if the content is too high, the acid resistance deteriorates. Therefore, the glass 10 contains B ２ O ３ Does not contain (B ２ O ３ The content of B may be 0 mol %, ２ O３ The glass 10 may contain, in mole percent on an oxide basis, B ２ O ３ The content of is preferably 0% or more and 8% or less, more preferably 1% or more and 6% or less, and even more preferably 3% or more and 5% or less. ２ O ３ When the content falls within this range, it is possible to suppress the deflection due to a high Young's modulus, and also to suppress the decrease in transmittance due to acid.

[0026] (MgO) MgO increases Young's modulus without increasing density, and thus can suppress deflection by increasing the specific modulus. It also has the effect of reducing the linear thermal expansion coefficient. Therefore, it is preferable that glass 10 contains MgO. The MgO content of glass 10, expressed in mole percent on an oxide basis, is preferably 8% to 44%, more preferably 9% to 44%, even more preferably 9.5% to 40%, even more preferably 10% to 36%, even more preferably 12% to 32%, even more preferably 15% to 28%, even more preferably 17% to 24%, and even more preferably 19% to 21%. By having the MgO content within this range, it is possible to suppress deflection due to a high Young's modulus while suppressing a decrease in transmittance caused by acid.

[0027] (CaO) CaO has the characteristic of having the second highest specific elastic modulus after MgO among oxides of Group 2 elements. Therefore, glass 10 may contain or not contain CaO. The CaO content of glass 10, expressed in mole percent based on oxide, is preferably 0% to 25% or less, more preferably 3% to 23% or less, even more preferably 5% to 21% or less, even more preferably 7% to 19% or less, even more preferably 9% to 17% or less, even more preferably 11% to 16% or less, and even more preferably 14% to 15% or less. By having the CaO content within this range, it is possible to suppress distortion due to a high Young's modulus while suppressing a decrease in transmittance due to acid.

[0028] (SrO) SrO, an oxide of a Group 2 element, has the effect of increasing the linear thermal expansion coefficient. Glass 10 may contain or not contain SrO. The SrO content of glass 10, expressed in mole percent based on oxide, is preferably 0.1% to 11%, more preferably 1% to 9%, and even more preferably 3% to 5%. When the SrO content is within this range, it is possible to suppress distortion due to a high Young's modulus while suppressing a decrease in transmittance caused by acid.

[0029] (BaO) BaO has a greater effect of increasing the linear thermal expansion coefficient than SrO. The glass 10 may contain or not contain BaO. The BaO content of the glass 10, expressed in mole percent on an oxide basis, is preferably 0.1% to 15%, more preferably 1% to 10%, and even more preferably 3% to 7%. When the BaO content is within this range, it is possible to suppress a decrease in transmittance due to acid while suppressing deflection due to a high Young's modulus.

[0030] (Na ２ O) Glass 10 is Na ２ It may not contain O or Na ２ Glass 10 may contain, in mole percent on an oxide basis, Na ２ The O content is preferably 0.1% or more and 7% or less, more preferably 1% or more and 5% or less, and even more preferably 2% or more and 3% or less. ２ When the O content falls within this range, it is possible to suppress the deterioration of transmittance due to acid while suppressing the deflection due to a high Young's modulus.

[0031] (R ２ O) R ２ O has the effect of increasing the linear thermal expansion coefficient. ２ It may not contain O, or R ２ The glass 10 may contain, in mole percent on an oxide basis, R ２ The O content is preferably 0.1% or more and 7% or less, more preferably 1% or more and 5% or less, and even more preferably 2% or more and 3% or less. ２When the O content is in this range, it is possible to suppress the deterioration of transmittance due to acid while suppressing the deflection by achieving a high Young's modulus. ２ The O content refers to the total content of oxides of monovalent elements contained in the glass 10 .

[0032] (Fe ２ O ３ ) Glass 10 is Fe ２ O ３ It is preferable that the glass 10 does not contain Fe as an external percentage, expressed as mass % on an oxide basis. ２ O ３ The content of Fe is preferably 0.1% or less, more preferably 0.005% or more and 0.07% or less, and further preferably 0.01% or more and 0.05% or less. ２ O ３ Such a low content of Fe can suppress the decrease in light transmittance. ２ O ３ By setting the content of Fe in the above range, it becomes possible to make the transmittance of the glass 10 having a thickness of 0.7 mm for light with a wavelength of 900 nm 90% or more, and it is possible to suppress a decrease in the transmittance of infrared light. ２ O ３ is present as an impurity in the raw materials of glass. ２ O ３ If the content of is too small, high-quality raw materials with a small amount of impurities are required for production, which increases the cost of raw materials required for glass production, so it is preferable that the lower limit is in the above range. ２ O ３ The content of Fe is based on the oxide. ２ O ３ Fe contained in glass 10 relative to the total mass of all components of glass 10 excluding ２ O ３ It refers to the mass ratio of

[0033] It is preferable that the glass 10 does not contain a sintered body. In other words, the glass 10 is preferably glass that is not a sintered body. The sintered body here refers to a component in which a plurality of particles are heated at a temperature lower than the melting point to bond the particles together. A sintered body contains pores, resulting in a relatively high porosity. However, the glass 10 is not a sintered body, and therefore has a low porosity, typically 0%. However, the inclusion of unavoidable trace pores is permitted. The porosity here refers to the so-called true porosity, which is the value obtained by dividing the sum of the volumes of pores (voids) that are connected to the outside and pores (voids) that are not connected to the outside by the total volume (apparent volume). The porosity can be measured, for example, according to JIS R 1634.

[0034] The glass used for the glass 10 is preferably amorphous glass, i.e., an amorphous solid. This glass may be crystallized glass containing crystals on the surface or inside, but amorphous glass is preferred from the viewpoint of density. Among ceramics, those produced by sintering methods are preferably not used because they have low transmittance and high density.

[0035] (Shape of Glass) Next, the shape of the glass 10 will be described. As shown in FIG. 1 , the glass 10 is a plate-shaped glass substrate including a surface 12A and a surface 12B. The surface 12B may be parallel to the surface 12A, for example. The glass 10 may have a circular disk shape when viewed in a plan view, i.e., from a direction perpendicular to the surface 12A. However, the shape of the glass 10 is not limited to a disk shape and may be any shape, such as a polygonal plate such as a rectangle. Note that the above shapes also include those having a notch or an orientation flat on the outer periphery.

[0036] (Glass Thickness) The thickness D of the glass 10, i.e., the length between the surface 12A and the surface 12B, is preferably 0.1 mm or more and 5.0 mm or less, more preferably 0.1 mm or more and 2.0 mm or less, and even more preferably 0.1 mm or more and 0.5 mm or less. By setting the thickness D to 0.1 mm or more, the glass 10 can be prevented from becoming too thin, thereby suppressing breakage due to bending or impact. By setting the thickness D to 2.0 mm or less, the glass can be prevented from becoming heavy, and by setting the thickness D to 0.5 mm or less, the glass can be further prevented from becoming heavy.

[0037] (Light Transmittance) The transmittance of the glass 10 having a thickness D of 0.7 mm for light (infrared radiation) with a wavelength of 900 nm is preferably 80% to 99%, more preferably 85% to 98%, and even more preferably 90% to 95%. Having a transmittance for light with a wavelength of 900 nm within this range allows for appropriate transmission of infrared radiation. Furthermore, the internal transmittance of the glass 10 having a thickness D of 0.7 mm for light with a wavelength of 350 nm (ultraviolet radiation) is preferably 30% to 90%, more preferably 35% to 86%, even more preferably 40% to 83%, even more preferably 45% to 80%, even more preferably 50% to 77%, even more preferably 55% to 74%, and even more preferably 60% to 71%. Having a transmittance for light with a wavelength of 350 nm within this range allows for appropriate transmission of ultraviolet radiation. The transmittance here refers to the light transmittance of the glass 10 before the glass 10 is exposed to acid. The transmittance can be measured by measuring a spectral transmittance curve using a spectrophotometer or the like.

[0038] (Haze Value) The haze value of the glass 10 before exposure to acid is preferably 0.001 to 0.1, more preferably 0.01 to 0.05, and even more preferably 0.02 to 0.03. Furthermore, the haze value of the glass 10 after exposure to acid is preferably 0.001 to 0.3, more preferably 0.01 to 0.2, even more preferably 0.02 to 0.15, even more preferably 0.03 to 0.1, and even more preferably 0.05 to 0.08. Thus, the glass 10 according to this embodiment exhibits a small decrease in haze value before and after exposure to acid, thereby suppressing a decrease in light transmittance when exposed to acid. The haze value can be measured using a haze meter HZ-2 manufactured by Suga Test Instruments Co., Ltd., or the like. The state before exposure to acid refers to the state after the arithmetic mean roughness Ra of the surface 12 of the glass 10 has been measured to be within the above range, but before exposure to acid. The state after exposure to acid refers to the state after the arithmetic mean roughness Ra of the surface 12 of the glass 10 has been measured to be within the above range, and after exposure to acid. The conditions for exposure to acid may be arbitrary, but in this example, sulfuric acid (H ) at a pH of 2 and a temperature of 40°C is used. ２ SO ４ ) for 2 hours.

[0039] (Linear thermal expansion coefficient) The linear thermal expansion coefficient is a property that is effective in suppressing deflection, but the extent of this effect depends greatly on the linear thermal expansion coefficient of the semiconductor device being supported. Since the linear thermal expansion coefficients of semiconductor devices vary widely, it is desirable to use glass with a linear thermal expansion coefficient suitable for the semiconductor device being manufactured as the support substrate. For example, in a process for high-density mounting of semiconductors, the linear expansion coefficient of the semiconductor device is expected to be 5.0 ppm / K. In this case, the linear thermal expansion coefficient of glass 10 is preferably 6 ppm / °C or less, more preferably 3 ppm / °C or more and 5.9 ppm / °C or less, more preferably 3.5 ppm / °C or more and 5.8 ppm / °C or less, more preferably 4 ppm / °C or more and 5.7 ppm / °C or less, more preferably 4.2 ppm / °C or more and 5.6 ppm / °C or less, more preferably 4.4 ppm / °C or more and 5.5 ppm / °C or less, more preferably 4.6 ppm / °C or more and 5.4 ppm / °C or less, and even more preferably 4.8 ppm / °C or more and 5.3 ppm / °C or less. The linear thermal expansion coefficient is the average thermal expansion coefficient in the range of 50°C to 200°C, and is a value measured in accordance with DIN-51045-1 as a standard for thermal expansion measurement. For example, a thermal expansion meter (DIL 402 Expedis Supreme) manufactured by NETZSCH is used as the measuring device to measure the thermal expansion coefficient in the range of 30°C to 300°C, and the average thermal expansion coefficient in the range of 50°C to 200°C may be used as the linear thermal expansion coefficient.

[0040] (Glass Manufacturing Method) Glass 10 may be manufactured by any method, but is manufactured, for example, by the following method. First, raw materials such as silica sand and soda ash, which are the raw materials for the compounds contained in glass 10, are heated to a predetermined temperature (e.g., 1500°C to 1600°C) and melted. Then, the molten raw materials (glass) are refined and then formed into a plate shape in a forming step. The formed glass has the composition range of glass 10 described above based on oxides. Then, glass 10 is manufactured by subjecting the glass formed in the forming step to an annealing step. Furthermore, the surface 12 of the manufactured glass 10 may be polished to bring the arithmetic mean roughness Ra into the above range. Note that the manufacturing method of glass 10 is not limited to the above and may be any method. For example, the annealing step is not essential. Furthermore, various methods can be adopted as the forming step when manufacturing glass 10, and examples thereof include a fusion casting method, a downdraw method (e.g., an overflow downdraw method, a slot-down method, and a redraw method), a float method, a roll-out method, and a press method.

[0041] Next, an example of a manufacturing process when the glass 10 is used in FOWLP manufacturing will be described. In FOWLP manufacturing, a plurality of semiconductor chips are bonded to the glass 10, and the semiconductor chips are covered with a sealing material to form an element substrate. Then, the glass 10 and the element substrate are separated, and the side of the element substrate opposite the semiconductor chips is bonded to, for example, another piece of glass 10. Then, wiring, solder bumps, etc. are formed on the semiconductor chips, and the element substrate and the glass 10 are separated again. Then, the element substrate is cut into individual semiconductor chips to obtain semiconductor devices.

[0042] (Effects) As described above, glass 10 according to the first aspect of the present disclosure has a Young's modulus of 90 GPa or more, and the arithmetic mean roughness Ra (nm) of surface 12 as defined in JIS B 0601:2001 is equal to or less than the recycling parameter value A. Because glass 10 according to the present disclosure has a Young's modulus of 90 GPa or more, it is possible to suppress deflection. Furthermore, because the arithmetic mean roughness Ra of surface 12 is equal to or less than the recycling parameter value A, it is possible to suppress a decrease in light transmittance (deterioration of haze value) even after exposure to acid. Furthermore, glass with a high Young's modulus tends to have reduced acid resistance. For example, after exposure to acid, such as through acid cleaning, the surface becomes rough, which increases the risk of a decrease in light transmittance. In contrast, in the present disclosure, the arithmetic mean roughness Ra of surface 12 is set to equal to or less than the recycling parameter value A, which is a threshold value based on the composition of glass 10. This makes it possible to suppress a decrease in light transmittance after exposure to acid, even when glass has a high Young's modulus.

[0043] Glass 10 according to the second aspect of the present disclosure is preferably glass 10 according to the first aspect, with a Young's modulus of 95 GPa or greater. According to the present disclosure, it is possible to suppress a decrease in light transmittance after exposure to acid while suppressing deflection.

[0044] Glass 10 according to a third aspect of the present disclosure is glass 10 according to the first or second aspect, wherein the glass contains, in mole percent on an oxide basis, SiO ２ According to the present disclosure, the content of SiO is preferably 35% or more and 60% or less. ２ By setting the content within the above range, it is possible to increase the Young's modulus and suppress deflection, while suppressing a decrease in light transmittance after exposure to acid.

[0045] Glass 10 according to a fourth aspect of the present disclosure is glass 10 according to the third aspect, further comprising, in mole percent on an oxide basis, Al ２ O ３ : 6% to 30%, B ２ O ３It is preferable that the composition contains: 0% to 8%, MgO: 10% to 44%, and CaO: 0% to 25%. By ensuring that the content of each component falls within this range, the Young's modulus can be set to 90 GPa or more, thereby suppressing deflection. Note that a numerical range expressed as "to" means a numerical range that includes the numerical values ​​before and after "to" as the lower and upper limits, and the same meaning will be used hereinafter when "to" is used.

[0046] Glass 10 according to a fifth aspect of the present disclosure is glass 10 according to any of the first to fourth aspects, wherein the ratio of the arithmetic mean roughness Ra (nm) to the recycling parameter value A is preferably 0.75 or less. This makes it possible to suppress distortion while also suppressing a decrease in light transmittance after exposure to acid.

[0047] The glass 10 according to a sixth aspect of the present disclosure is the glass 10 according to any one of the first to fifth aspects, and is preferably used as a substrate. The glass 10 according to the present disclosure is suitably used as a substrate.

[0048] The glass 10 according to a seventh aspect of the present disclosure is the glass 10 according to the sixth aspect, and is preferably used in the manufacture of at least one of a fan-out wafer-level package and a fan-out panel-level package. The glass 10 is suitable for these applications.

[0049] Examples Next, examples will be described. Tables 1 to 3 show the properties of the glass of each example. Note that the embodiment may be modified as long as the effects of the invention are achieved.

[0050]

[0051] (Example 1) In Example 1, a glass having the composition shown in Table 1 was prepared. ２ O ３The contents of the components are expressed as percent by mass as in the above-described embodiment, and the contents of the other components are expressed as percent by mol as in the above-described embodiment. In Example 1, a raw plate having a diameter of 320 mm and a thickness of 6 mm was produced using a melt-casting method. Next, multiple plates having a diameter of 300 mm and a thickness of 3 mm were cut out from the center of the raw plate. Both sides of these plates were double-polished using cerium oxide as an abrasive to obtain glass having a thickness of 0.7 mm.

[0052] The Young's modulus of the glass of Example 1 was measured. The Young's modulus was measured by the ultrasonic pulse method specified in JIS R 1602:1995. The bulk density of the sample was measured by the Archimedes method, and the longitudinal wave velocity and shear wave velocity were measured using an ultrasonic thickness gauge 38DL PLUS manufactured by Olympus Corporation to obtain the Young's modulus value. The linear thermal expansion coefficient (ppm / °C) of the glass of Example 1 was measured. Measurement was performed using a thermal dilatometer (DIL 402 Expedis Supreme) manufactured by NETZSCH as the measuring device in the range of 30°C to 300°C, and the average thermal expansion coefficient in the range of 50°C to 200°C was taken as the linear thermal expansion coefficient. For the glass of Example 1, the recycling parameter value A was calculated based on the composition using the above-mentioned formula (1), and the value E was calculated using the above-mentioned formula (2). The arithmetic mean roughness Ra (nm) of the surface of the glass of Example 1 before the acid immersion test and the arithmetic mean roughness Ra (nm) of the surface after the acid immersion test were measured. ２ SO ４) for 2 hours. The arithmetic mean roughness Ra was calculated from a planar profile obtained, for example, by an atomic force microscope. The ratio of the arithmetic mean roughness Ra (nm) of the surface before the acid immersion test to the recycling parameter value A was calculated. The weight loss rate (%) of the glass of Example 1 before and after the acid immersion test was measured. The weight loss rate (%) was calculated as follows: 100 × (glass weight before acid immersion test - glass weight after acid immersion test) / (glass weight before acid immersion test). The transmittance of the glass of Example 1 to light with a wavelength of 350 nm and light with a wavelength of 900 nm before the acid immersion test was also measured. The transmittance was measured by measuring a spectral transmittance curve using an ultraviolet-visible spectrophotometer (UH4150 model, manufactured by Hitachi High-Tech Corporation). Furthermore, the haze value before and after the acid immersion test was measured for the glass of Example 1. The haze value was measured using a haze meter, Model HZ-V3, manufactured by Suga Test Instruments Co., Ltd. The measurement results and calculation results are shown in Table 1.

[0053] In Examples 2 to 42, glasses were produced in the same manner as in Example 1, except that the glass compositions and arithmetic mean roughnesses Ra were as shown in Tables 1 to 3. The measurement results and calculation results for each example are shown in Tables 1 to 3.

[0054] (Evaluation) The deflection and recyclability of each glass sample were evaluated. The deflection evaluation was performed based on the Bi-Metal warpage calculation defined in S. Timoshenko, "Analysis of Bi-Metal Thermostats," J. Opt. Soc. Am. 11 (1925) 233. FIG. 2 is a schematic diagram for explaining the deflection evaluation. Here, the amount of warpage δ is defined as the amount of vertical displacement of the edge of the glass 10, with the center of the second surface 12B as the height reference, when the glass 10 is cooled from a high temperature of 200°C to a low temperature of 20°C during the process of molding and bonding a semiconductor substrate with resin to the first surface 12A side of the glass 10 processed into the shape of FIG. 1, as shown in FIG. 2. Specifically, the amount of warpage δ is calculated using the following equation (3):

[0055]

[0056] Here, as shown in FIG. 2, L is the length of the glass 10 in the warp direction (the horizontal direction in FIG. 2), and α １ is the linear thermal expansion coefficient of the element substrate 20, and α ２ is the linear thermal expansion coefficient of the glass 10, and T ２ is the temperature after cooling (here 20°C), and T １ is the temperature before cooling (here, 200°C). １ / a ２ and h is a １ +a ２ and n is E １ / E ２ Here, a １ is the thickness of the element substrate 20, and a ２ is the thickness of the glass 10, and E １ is the Young's modulus of the element substrate 20, and E ２ is the Young's modulus of the glass 10. For the deflection evaluation, the element substrate 20 to be bonded to the glass 10 was assumed to have a thickness of 0.3 mm and a Young's modulus of 31.5 GPa, taking into consideration the implementation of semiconductors. The linear thermal expansion coefficient of the element substrate 20 was assumed to be {linear thermal expansion coefficient of glass (ppm / °C)} -0.5 ppm / °C, assuming application to various manufacturing processes. The amount of warpage δ was calculated for a thickness of 0.7 mm and a length L = 300 mm of the glass 10. The absolute value of each calculated value δ was evaluated as ◯ when it was 0.90 mm or less, ⊚ when it was 0.86 mm or less, and × when it was greater than 0.90 mm. Furthermore, recyclability refers to the ability to maintain sufficient light transmittance even after acid immersion. A haze value of less than 0.1 after the acid immersion test was evaluated as ◯, and a haze value of 0.1 or greater after the acid immersion test was evaluated as ×.

[0057] As shown in Tables 1 and 2, Examples 1 to 28, which are working examples in which the arithmetic mean roughness Ra before the acid immersion test was equal to or less than the recycling parameter value A and the Young's modulus was 90 GPa or greater, received a deflection assessment and a recycling assessment of "O," indicating that the reduction in light transmittance after exposure to acid could be suppressed while suppressing deflection. On the other hand, Comparative Examples 29 to 42 did not satisfy at least one of the requirements of the arithmetic mean roughness Ra before the acid immersion test being equal to or less than the recycling parameter value A and the Young's modulus being 90 GPa or greater, and therefore received an "X" for at least one of the deflection assessment and the recycling assessment. Therefore, it can be seen that the Comparative Examples were unable to simultaneously suppress deflection and the reduction in light transmittance after exposure to acid.

[0058] Although the embodiments of the present invention have been described above, the embodiments are not limited to the contents of these embodiments. Furthermore, the above-described components include those that can be easily imagined by a person skilled in the art, those that are substantially the same, and those that are within the scope of what is called equivalents. Furthermore, the above-described components can be combined as appropriate. Furthermore, various omissions, substitutions, or modifications of the components can be made without departing from the spirit of the above-described embodiments.

[0059] 10. Glass

Claims

1. Glass having a Young's modulus of 90 GPa or more and a surface arithmetic mean roughness Ra (nm) as specified in JIS B 0601:2001 that is equal to or less than the recycling parameter value A shown in formula (1). A = (13 x [SiO ２ ]−3×[Al ２ O ３ ]-[B ２ O ３ ]-7×[MgO]-4×[CaO]-0.5×[SrO]-[BaO]-[R ２ O]) / 1000 ... (1) where, [SiO ２ ] is SiO in mole percent notation based on oxide ２ The content of [Al ２ O ３ ] is Al in mole percent notation based on oxide ２ O ３ The content of [B ２ O ３ ] is B in mole percent based on oxide ２ O ３ [MgO] is the MgO content in mol% on an oxide basis, [CaO] is the CaO content in mol% on an oxide basis, [SrO] is the SrO content in mol% on an oxide basis, [BaO] is the BaO content in mol% on an oxide basis, [R ２ O] is the total content of oxides of monovalent elements contained in the glass, expressed in mole % on an oxide basis.

2. The glass according to claim 1, having a Young's modulus of 95 GPa or more.

3. SiO in mole percent based on oxide ２ The glass according to claim 1 or 2, wherein the content of is 35% or more and 60% or less.

4. In mole percent based on oxide, Al ２ O ３ : 6% to 30%, B ２ O ３ 4. The glass according to claim 3, comprising: MgO: 0% to 8%; MgO: 10% to 44%; CaO: 0% to 25%.

5. The glass according to claim 1 or 2, wherein the ratio of the arithmetic mean roughness Ra (nm) to the recycling parameter value A is 0.75 or less.

6. The glass according to claim 1 or 2, which is used as a substrate.

7. The glass of claim 6 for use in the manufacture of at least one of a fan-out wafer level package and a fan-out panel level package.

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