Micro LED display panel and manufacturing method thereof
The micro LED display panel addresses the challenge of limited pixel density by using a micro LED array with vertically stacked light emitting mesas and an innovative electrical connection structure, achieving reduced material consumption and improved light isolation and efficiency.
Patent Information
- Application Number
- PCT/CN2024/104127
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-07-26
- Filing Date
- 2024-07-08
- Publication Date
- 2025-01-30
AI Technical Summary
The existing micro LED display panels face a challenge in increasing the number of multi-color micro LEDs due to the significant space occupied by each electrode for the light emitting mesas, which limits the pixel density of the display panel.
The micro LED display panel incorporates a micro LED array with vertically stacked light emitting mesas and conductive layers on both sides, along with an electrical connection structure that includes top and bottom electrical connection structures. The electrical connection structure is arranged around the light emitting mesas and features a groove with an opening facing the mesas, where the conductive layer extends into the groove and is connected to the electrical connection structure, filled with a dielectric medium.
This configuration reduces material consumption in the electrical connection structure, facilitates integrated formation, and improves production efficiency, while also enhancing light isolation and luminous efficiency by preventing light interference between adjacent micro LEDs.
Smart Images

Figure CN2024104127_30012025_PF_FP_ABST
Abstract
Description
MICRO LED DISPLAY PANEL AND MANUFACTURING METHOD THEREOF
[0001] CROSS-REFERENCE TO RELATED APPLICATIONS
[0002] The disclosure claims the benefits of priority to Chinese Application No. 202310928218.2, filed on July 26, 2023, which is incorporated herein by reference in its entirety.TECHNICAL FIELD
[0003] The present disclosure relates to the micro light emitting diode (LED) domain, and more particularly, relates to a micro LED display panel and a manufacturing method thereof.BACKGROUND
[0004] Inorganic micro pixel light emitting diodes, also referred to as micro light emitting diodes, micro LEDs, or μ-LEDs, become more important since they are used in various applications including self-emissive micro-displays, visible light communications, and optogenetics. The micro LEDs have higher output performance than conventional LEDs because of better strain relaxation, improved light extraction efficiency, and uniform current spreading. Compared with conventional LEDs, the micro LEDs also exhibit several advantages, such as improved thermal effects, faster response rate, larger working temperature range, higher resolution, wider color gamut, higher contrast, lower power consumption, and operability at higher current density.
[0005] A multi-color micro LED display panel may include a micro LED array including a plurality of multi-color micro LEDs. A multi-color micro LED can include multiple light emitting mesas, and each light emitting mesa can be electrically connected to a respective electrode, so that each light emitting mesa can be controlled. For a multi-color micro LED display panel, each electrode for each light emitting mesa of the multi-color micro LED occupies a significant amount of space within the micro LED display panel, which may limit increasing the number of multi-color micro LEDs that can be arranged on multi-color micro LED display panels, and thereby impede improvement of the pixel density of the display panel.
[0006] SUMMARYOF THE DISCLOSURE
[0007] Embodiments of the present disclosure provide a micro LED display panel. The micro LED display panel includes: a micro LED array including: a plurality of micro LEDs, each of the plurality of micro LEDs including at least two light emitting mesas vertically stacked from bottom to top; and conductive layers formed on a top side and a bottom side of each light emitting mesa, wherein the conductive layers comprise a top conductive layer formed on a top of each of the light emitting mesas and a bottom conductive layer formed on a bottom of each of the light emitting mesas; a backplane provided at a bottom of the micro LED array and configured to control the plurality of micro LEDs; and an electrical connection structure including at least one top electrical connection structure and at least one bottom electrical connection structure; the at least one top electrical connection structure is electrically connected to the top conductive layer, and each of the at least one bottom electrical connection structure is electrically connected correspondingly to the bottom conductive layer; and the electrical connection structure is arranged around the at least two light emitting mesas; wherein the electrical connection structure further comprises a groove with at least one opening facing a light emitting mesa on a side of the electrical connection structure near the light emitting mesa; at least one end of the conductive layer corresponding to the light emitting mesa comprises an etch masking segment; the etch masking segment extends into the groove and is electrically connected to the electrical connection structure; and dielectric medium fills gaps between adjacent light emitting mesas and inside the groove.
[0008] Embodiments of the present disclosure also provide a method of manufacturing a micro LED display panel. The method includes: forming a plurality of first bottom conductive layers at predefined positions on a substrate; forming a first light emitting mesa on each of the first bottom conductive layers; forming a first top conductive layer on the first light emitting mesa; filling a surrounding area of the first light emitting mesa with dielectric medium to form a first dielectric layer, wherein the first dielectric layer covers a region above the first top conductive layer; etching along a first etch path in a first predefined region between adjacent first light emitting mesas to form a first etch hole; wherein at least one end of the first top conductive layer is located at the first etch path and an etch masking segment is formed, and the dielectric medium located below the etch masking segment is preserved during etching; and filling the first etch hole with a conductive material to form a top electrical connection structure connected to the first top conductive layer.BRIEF DESCRIPTION OF THE DRAWINGS
[0009] Embodiments and various aspects of the present disclosure are illustrated in the following detailed description and the accompanying figures. Various features shown in the figures are not drawn to scale.
[0010] FIG. 1 illustrates a top view of an exemplary micro LED display panel, according to some embodiments of the present disclosure.
[0011] FIG. 2 illustrates a top view of an exemplary single micro LED in the micro LED array shown in FIG. 1, according to some embodiments of the present disclosure.
[0012] FIG. 3 illustrates a structural diagram showing a sectional view of the micro LED along an A-A direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0013] FIG. 4 illustrates a structural diagram showing a sectional view of the micro LED along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0014] FIG. 5 illustrates a structural diagram showing a sectional view of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0015] FIG. 6A illustrates a top view of another exemplary micro LED, according to some embodiments of the present disclosure.
[0016] FIG. 6B illustrates a structural diagram showing a sectional view of the micro LED along an A1-A1 direction shown in FIG. 6A, according to some embodiments of the present disclosure.
[0017] FIG. 7A is an enlarged view of an exemplary embodiment of the micro LED at a portion F shown in FIG. 3, according to some embodiments of the present disclosure.
[0018] FIG. 7B is an enlarged view of another exemplary embodiment of the micro LED at a portion F shown in FIG. 3, according to some embodiments of the present disclosure.
[0019] FIG. 8 illustrates a top view of another exemplary micro LED, according to some embodiments of the present disclosure.
[0020] FIG. 9 is a structural diagram showing a sectional view of a variant embodiment of the micro LED along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0021] FIG. 10 is a structural diagram showing a sectional view of a variant embodiment of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0022] FIG. 11 is a structural diagram showing a sectional view of another variant embodiment of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0023] FIG. 12 illustrates a section view of two adjacent exemplary micro LEDs along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0024] FIG. 13A illustrates a top view of an exemplary single micro LED, according to some embodiments of the present disclosure.
[0025] FIG. 13B illustrates a top view of an array arrangement of a plurality of micro LEDs shown in FIG. 13A, according to some embodiments of the present disclosure.
[0026] FIG. 13C illustrates a structural diagram showing a sectional view of the micro LED along an E-E direction shown in FIG. 13A, according to some embodiments of the present disclosure.
[0027] FIG. 13D illustrates a structural diagram showing a sectional view of the micro LED along an F-F direction shown in FIG. 13A, according to some embodiments of the present disclosure.
[0028] FIG. 13E illustrates a structural diagram showing a sectional view of the micro LED along a G-G direction shown in FIG. 13A, according to some embodiments of the present disclosure.
[0029] FIG. 13F illustrates a structural diagram showing a sectional view of the micro LED along an H-H direction shown in FIG. 13A, according to some embodiments of the present disclosure.
[0030] FIG. 14 is a flowchart of an exemplary method manufacturing of a micro LED display panel, according to some embodiments of the present disclosure.
[0031] FIG. 15 is a flowchart showing sub-steps of an exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure.
[0032] FIG. 16 is a flowchart showing sub-steps of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure.
[0033] FIG. 17 is a flowchart showing sub-steps of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure.
[0034] FIG. 18 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along an A-A direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0035] FIG. 19 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0036] FIG. 20 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0037] FIG. 21 is a flowchart of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure.DETAILED DESCRIPTION
[0038] Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. The following description refers to the accompanying drawings in which the same numbers in different drawings represent the same or similar elements unless otherwise represented. The implementations set forth in the following description of exemplary embodiments do not represent all implementations consistent with the invention. Instead, they are merely examples of apparatuses and methods consistent with aspects related to the invention as recited in the appended claims. Particular aspects of the present disclosure are described in greater detail below. The terms and definitions provided herein control, if in conflict with terms and / or definitions incorporated by reference.
[0039] Embodiments of the present disclosure provide a micro LED display panel.
[0040] FIG. 1 illustrates a top view of an exemplary micro LED display panel 100, according to some embodiments of the present disclosure. Micro LED display panel 100 includes a micro LED array 110 and a driven backplane 120. Micro LED array 110 is arranged on one side of backplane 120 to form an image display area, while backplane 120 is arranged on the back of micro LED array 110. An area of backplane 120 where micro LED array 110 is not arranged is referred to as a non-functional area. Micro LED array 110 includes a plurality of micro LEDs 200 (which can also be referred to as pixels) . Backplane 120 is configured to control a plurality of micro LEDs 200. In some embodiments, backplane 120 is a thin film transistor (TFT) board or an integrated circuit (IC) board.
[0041] FIG. 2 illustrates a top view of an exemplary micro LED 200 in micro LED array 110, according to some embodiments of the present disclosure. FIG. 3 illustrates a structural diagram showing a sectional view of the micro LED along an A-A direction shown in FIG. 2, according to some embodiments of the present disclosure. FIG. 4 illustrates a structural diagram showing a sectional view of the micro LED along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure. FIG. 5 illustrates a structural diagram showing a sectional view of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure. It is noted that a section view of the micro LED along a D-D direction shown in FIG. 2 is the same as the section view of the micro LED along a C-C direction shown in FIG. 2. As shown in FIGs. 3-5, micro LED 200 includes at least two light emitting mesas 210 stacked vertically from top to bottom and a conductive layer 220 located on both sides of each light emitting mesa 210. Conductive layer 220 includes a top conductive layer 221 arranged above each light emitting mesa 210 and a bottom conductive layer 222 arranged below each light emitting mesa 210. Top conductive layer 221 is electrically connected correspondingly to the top surface of light emitting mesa 210, and the bottom conductive layer 222 is electrically connected correspondingly to the bottom surface of light emitting mesa 210. Conductive layer 220 is used to energize light emitting mesa 210 to power on the corresponding light emitting mesa 210.
[0042] Further, the at least two light emitting mesas 210 include a first light emitting mesa 211, a second light emitting mesa 212, and a third light emitting mesa 213. First light emitting mesa 211, second light emitting mesa 212, and third light emitting mesa 213 are vertically stacked from bottom to top. In some embodiments, the at least two light emitting mesas 210 may include two or four light emitting mesas, or more light emitting mesas. In some embodiments, first light emitting mesa 211 emits red light; second light emitting mesa 212 emits green light; and third light emitting mesa 213 emits blue light. In some embodiments, light emitting mesas 210 at different layers of a micro LED 200 emit light in the same color; exemplarily, first light emitting mesa 211, second light emitting mesa 212, and third light emitting mesa 213 emit blue light; or first light emitting mesa 211, second light emitting mesa 212, and third light emitting mesa 213 emit green light or red light. In some embodiments, first light emitting mesa 211 is a red light emitting mesa, second light emitting mesa 212 is a blue light emitting mesa, and third light emitting mesa 213 is a green light emitting mesa. In some embodiments, for a micro LED having two or four or more light emitting mesas, the bottom-most one of the light emitting mesas is a red light emitting mesa, and the top-most one of the light emitting mesas is a green light emitting mesa.
[0043] In some embodiments, light emitted from the second and third light emitting mesas 212 and 213 may be reflected within micro LED 200 multiple times before leaving micro LED 200, and the resulting light extraction efficiency (LEE) may be low.
[0044] Two adjacent light emitting mesas of the at least two light emitting mesas 210 provided vertically stacked are spaced apart from each other. In some embodiments, the spacings between two adjacent light emitting mesas (for example, a spacing between first light emitting mesa 211 and second light emitting mesa 212, and a spacing between second light emitting mesa 212 and third light emitting mesa 213) are equal in the vertical direction. In some embodiments, the spacing between two adjacent light emitting mesas in the vertical direction can be set differently as required. In some embodiments, the top and bottom surfaces of light emitting mesa 210 are circular, and a diameter of the top surface of light emitting mesa 210 is smaller than a diameter of the bottom surface of light emitting mesa 210. For instance, a diameter of the top surface of first light emitting mesa 211 is smaller than a diameter of the bottom surface of first light emitting mesa 211; a diameter of the top surface of second light emitting mesa 212 is smaller than a diameter of the bottom surface of second light emitting mesa 212; and a diameter of the top surface of third light emitting mesa 213 is smaller than a diameter of the bottom surface of third light emitting mesa 213. In some embodiments, the top surface and bottom surface of light emitting mesa 210 may not be circular, for example, they instead may be square, oval, etc. In some embodiments, the top surface area of light emitting mesa 210 is smaller than the bottom surface area of light emitting mesa 210.
[0045] In some embodiments, the at least two light emitting mesas 210 are coaxial. The projections of all light emitting mesas 210 in the vertical direction are superimposed. In some embodiments, the dimensions of light emitting mesas 210 may vary, and the projections of light emitting mesas 210 in the vertical direction may be partially superimposed.
[0046] As shown in FIGs. 2-5, micro LED 200 further includes an electrical connection structure 230. Electrical connection structure 230 is electrically connected to conductive layer 220 of micro LED 200 to power on light emitting mesa 210. Electrical connection structure 230 includes at least one top electrical connection structure 231 and at least one bottom electrical connection structure 232. The at least one top electrical connection structure 231 is electrically connected to top conductive layer 221 of each light emitting mesa 210, while each bottom electrical connection structure 232 is electrically connected correspondingly to bottom conductive layer 222 of light emitting mesa 210. The bottom of top electrical connection structure 231 is integrated with backplane 120, but it is not electrically connected directly to backplane 120. Top electrical connection structure 231 can electrically connect top conductive layer 221 to the negative electrode of an external power supply. The bottom of each bottom electrical connection structure 232 is integrated with backplane 120 and electrically connected to backplane 120. Each bottom electrical connection structure 232 can electrically connect bottom conductive layer 222 to the positive electrode of the external power supply. Electrical connection structure 230 is arranged around light emitting mesa 210 to electrically connect light emitting mesa 210 to backplane 120 and reflect the light emitted by light emitting mesa 210, thus preventing light interference with adjacent micro LEDs 200, thereby improving the luminous efficiency.
[0047] With reference to FIG. 2, bottom electrical connection structure 232 includes a first bottom electrical connection structure 232a and a second bottom electrical connection structure 232b. First bottom electrical connection structure 232a is located along the direction of the A-A line shown in FIG. 2 and the sectional view in FIG. 3, and second bottom electrical connection structure 232b is located in the direction of the B-B line shown in FIG. 2 and the sectional view in FIG. 4. Top electrical connection structure 231 is located along the direction of the C-C line and D-D line shown in FIG. 2 and the sectional view in FIG. 5. Referring to FIGs. 3-5, bottom conductive layer 222 includes a first bottom conductive layer 222a, a second bottom conductive layer 222b, and a third bottom conductive layer 222c. First bottom conductive layer 222a is at the bottom of first light emitting mesa 211; second bottom conductive layer 222b is at the bottom of second light emitting mesa 212; and third bottom conductive layer 222c is at the bottom of third light emitting mesa 213. Top conductive layer 221 includes a first top conductive layer 221a, a second top conductive layer 221b, and a third top conductive layer 221c. First top conductive layer 221a is at the top of first light emitting mesa 211; second top conductive layer 221b is at the top of second light emitting mesa 212; and third top conductive layer 221c is at the top of third light emitting mesa 213. As shown in FIG. 3, one end of second bottom conductive layer 222b extends to first bottom electrical connection structure 232a and is electrically connected to first bottom electrical connection structure 232a. As shown in FIG. 4, one end of third bottom conductive layer 222c extends to second bottom electrical connection structure 232b, and is electrically connected to second bottom electrical connection structure 232b. As shown in FIG. 5, the ends of first top conductive layer 221a, second top conductive layer 221b and third top conductive layer 221c extend to top electrical connection structure 231 and are electrically connected to top electrical connection structure 231.
[0048] Top electrical connection structure 231 can be electrically connected to all top conductive layers 221 (for example, first top conductive layer 221a, second top conductive layer 221b, and third top conductive layer 221c) . Bottom electrical connection structure 232 is electrically connected correspondingly to bottom conductive layer 222 (for example, first bottom conductive layer 222a, second bottom conductive layer 222b, or third bottom conductive layer 222c) .
[0049] As shown in FIG. 2, there are four top electrical connection structures 231, two of which are arranged along the direction of the C-C line and the other two are arranged along the direction of the D-D line. All four top electrical connection structures 231 are electrically connected to all light emitting mesas 210 (for example, first light emitting mesa 211, second light emitting mesa 212, and third light emitting mesa 213) . The four top electrical connection structures 231, first bottom electrical connection structure 232a and second bottom electrical connection structure 232b are spaced apart from each other around light emitting mesa 210, and a gap between adjacent electrical connection structures 230 is filled with a dielectric medium 300.
[0050] As shown in FIGs. 3 to 5, a groove 400 with at least one opening is provided facing light emitting mesa 210 and on the side of electrical connection structure 230 near light emitting mesa 210. At least one end of at least one conductive layer 220 corresponding to at least one light emitting mesa 210 extends into groove 400 to form an etch masking segment 223 and is electrically connected to electrical connection structure 230. The space between adjacent light emitting mesas 210 and below etch masking segment 223 in groove 400 is filled with dielectric medium 300. In groove 400, the end of etch masking segment 223 is abutted onto the back wall of groove 400, i.e., the side wall of electrical connection structure 230 facing and below etch masking segment 223.
[0051] FIG. 6A illustrates a top view of an exemplary micro LED 200’ having two light emitting mesas 210, according to some embodiments of the present disclosure. FIG. 6B illustrates a structural diagram showing a sectional view of the micro LED along an A1-A1 direction shown in FIG. 6A, according to some embodiments of the present disclosure. As shown in FIG. 6A and FIG. 6B, light emitting mesa 210 includes first light emitting mesa 211 and second light emitting mesa 212. Description of other features shown in FIG. 6A and FIG. 6B may be found by referring to corresponding features described above with reference to FIGs. 2-5, which will not be repeated here.
[0052] FIG. 7A is an enlarged view of an exemplary embodiment of the micro LED at a portion F shown in FIG. 3, according to some embodiments of the present disclosure. With reference to FIG. 7A, in some embodiments, the side wall of bottom electrical connection structure 232b facing etch masking segment 223 is tilted, and the end of etch masking segment 223 is abutted onto the tilted side wall of bottom electrical connection structure 232b. An upper length L2 of etch masking segment 223 is smaller than a lower length L1 of etch masking segment 223. Lower length L1 of etch masking segment 223 is smaller than a width W1 of electrical connection structure 230. FIG. 7B is an enlarged view of another exemplary embodiment of the micro LED 200 at portion F shown in FIG. 3, according to some embodiments of the present disclosure. With reference to FIG. 7B, in some embodiments, the side wall of bottom electrical connection structure 232b facing etch masking segment 223 is vertical, and the end of etch masking segment 223 is abutted onto the vertical side wall of bottom electrical connection structure 232b. In some embodiments, an angle between the side wall of bottom electrical connection structure 232b facing etch masking segment 223 and the vertical plane is between 0° and 5°. Length L1 of etch masking segment 223 is smaller than width W1 of electrical connection structure 230.
[0053] In micro LED display panel 100 provided in the embodiments of the present disclosure, etch masking segment 223 extends into electrical connection structure 230, and electrical connection structure 230 is integrated formation; groove 400 in electrical connection structure 230 can reduce the material use for electrical connection structure 230, helping to reduce the weight of micro LED 200.
[0054] In some embodiments, dielectric medium 300 is transparent. In some embodiments, a material of dielectric medium 300 may be one or a combination of SiO2, SiON, Al2O3, or SiN.
[0055] FIG. 8 illustrates a top view of the structural schematic diagram of an exemplary micro LED 200” with one top electrical connection structure, according to some embodiments of the present disclosure. According to FIG. 8, there is one top electrical connection structure 231. Extension segments of second bottom conductive layer 222b, third bottom conductive layer 222c, and top conductive layer 221 (including first top conductive layer 221a, second top conductive layer 221b, and third top conductive layer 221c) are located in different vertical sections, The corresponding first bottom electrical connection structure 232a, second bottom electrical connection structure 232b, and third top electrical connection structure 231 are spaced from each other and around light emitting mesa 210. Compared with the embodiment shown in FIG. 2 in which four top electrical connection structures 231 are spaced at four different positions, the exemplary embodiment in FIG. 8 can reduce the gap between adjacent electrical connection structures 230, thereby enhancing light isolation. As shown in FIG. 8, top electrical connection structure 231 extends a greater length in the circumferential direction than first bottom electrical connection structure 232a and second bottom electrical connection structure 232b, respectively. In some embodiments, top electrical connection structure 231, first bottom electrical connection structure 232a, and second bottom electrical connection structure 232b have equal extension lengths in the circumferential direction.
[0056] As shown in FIGs. 3-5, electrical connection structure 230 further includes a top cascade structure 233. Top cascade structure 233 is arranged above the top-most light emitting mesa 210 (i.e., third light emitting mesa 213) and surrounds the top-most light emitting mesa 210 (i.e., third light emitting mesa 213) . Top cascade structure 233 is electrically connected to all top electrical connection structures 231. The space between top cascade structure 233 and the top surface of bottom electrical connection structure 232 is also filled with dielectric medium 300. Top cascade structure 233 is not electrically connected to any of bottom electrical connection structures 232.
[0057] In some embodiments, top electrical connection structures 231 of adjacent micro LEDs 200 are electrically connected to each other, and bottom electrical connection structures 232 of adjacent micro LEDs 200 are electrically insulated from each other.
[0058] Preferably, the top of electrical connection structure 230 is higher than or flush with the top of the top-most light emitting mesa 210 (i.e., third light emitting mesa 213) .
[0059] FIG. 9 is a structural diagram showing a sectional view of a variant embodiment of the micro LED along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure. With reference to FIG. 9, in some embodiments, the top of electrical connection structure 230 is lower than the top of the top-most light emitting mesa 210; and the volume above the top of electrical connection structure 230 is filled with dielectric medium 300 or opaque material 232d (or a reflective material) .
[0060] As shown in FIG. 5, grooves 400 corresponding to top conductive layer 221 on different light emitting mesas 210 are located in the same vertical section, while top conductive layers 221 on different light emitting mesas 210 are electrically connected correspondingly to the same top electrical connection structure 231. Specifically, first top conductive layer 221a, second top conductive layer 221b, and third top conductive layer 221c are electrically connected correspondingly to top electrical connection structure 231.
[0061] As shown in FIG. 5, top conductive layer 221 includes a first electrically connected segment 2211, a second electrically connected segment 2212, and a tilt connection segment 2213. A first end of tilt connection segment 2213 is connected to first electrically connected segment 2211, and a second end of tilt connection segment 2213 is connected to second electrically connected segment 2212. First electrically connected segment 2211 extends into groove 400 to form etch masking segment 223, second electrically connected segment 2212 is electrically connected to light emitting mesa 210, and there is a predefined height difference between first electrically connected segment 2211 and second electrically connected segment 2212. With reference to FIG. 5, in some embodiments, the top of first electrically connected segment 2211 is lower than the top of second electrically connected segment 2212, while the height difference between first electrically connected segment 2211 and second electrically connected segment 2212 is smaller than the thickness of the corresponding light emitting mesa 210. As a result, a length of groove 400 corresponding to top conductive layer 221 is reduced.
[0062] FIG. 10 is a structural diagram showing a sectional view of a variant embodiment of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure. With reference to FIG. 10, in some embodiments, with third light emitting mesa 213 as an example: the top of first electrically connected segment 2211 is higher than the top of second electrically connected segment 2212, while the height difference between first electrically connected segment 2211 and second electrically connected segment 2212 is greater than the thickness of the corresponding light emitting mesa 210 (i.e., third light emitting mesa 213) . As a result, the length of groove 400 corresponding to top conductive layer 221 is increased.
[0063] FIG. 11 is a structural diagram showing a sectional view of another variant embodiment of the micro LED along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure. With reference to FIG. 11, in some embodiments, conductive layer 220 extends into groove 400 in an overall horizontal state. In this example, first electrically connected segment 2211 directly connects with second electrically connected segment 2212 and there is no need for tilt connection segment 2213.
[0064] As shown in FIGs. 3-5, micro LED 200 further includes a bottom connecting mesa 240. Bottom connecting mesa 240 is disposed between the bottom-most light emitting mesa 210 (i.e., first light emitting mesa 211) and backplane 120, and is electrically connected to backplane 120 and the bottom-most light emitting mesa 210 (i.e., first light emitting mesa 211) . Micro LED 200 further includes a top connecting mesa 214. Top connecting mesa 214 is located between first light emitting mesa 211 and first top conductive layer 221a, and is electrically connected to first light emitting mesa 211 and first top conductive layer 221a. Bottom connecting mesa 240 and top connecting mesa 214 are made of one or more of the following metals: Al, Au, Rh, Ag, Cr, Ti, Pt, Sn, Cu, AuSn, TiW, or the like. In some embodiments, the top and bottom surfaces of light emitting mesa 210 are circular, and the surface diameter of light emitting mesa 210 is smaller than a bottom surface diameter of light emitting mesa 210. The top surface of bottom connecting mesa 240 is also circular, and a top surface diameter of bottom connecting mesa 240 is equal to a bottom surface diameter of the bottom-most light emitting mesa 210 (i.e., first light emitting mesa 211) ; and the top surface diameter of bottom connecting mesa 240 is smaller than a bottom surface diameter of bottom connecting mesa 240. First bottom conductive layer 222a is disposed between bottom connecting mesa 240 and first light emitting mesa 211, enabling an ohmic contact layer to be formed between bottom connecting mesa 240 and first light emitting mesa 211. First bottom conductive layer 222a and bottom connecting mesa 240 can constitute an omni-directional reflector (ODR) structure with high reflective efficiency. In some embodiments, first bottom conductive layer 222a is one or a combination of the following films: transparent conductive oxide (TCO) film, Indium Tin Oxide (ITO) film, Antimony doped Zinc Oxide (AZO) film, Antimony-doped Tin Oxide (ATO) film, or Fluorine doped Tin Oxide (FTO) film.
[0065] In some embodiments, no bottom connecting mesa 240 is arranged between first light emitting mesa 211 and backplane 120, and the space between first bottom conductive layer 222a and backplane 120 is filled with dielectric medium 300. Bottom electrical connection structure 232 further includes a third bottom electrical connection structure (not shown) , and the end of first bottom conductive layer 222a extends outward and is electrically connected to the third bottom electrical connection structure.
[0066] Conductive layer 220 is transparent and made of one or a combination of the following: ITO, FTO, or AZO.
[0067] As shown in FIGs. 3-5, micro LED 200 further includes a top dielectric layer 250. Top dielectric layer 250 continuously covers the top surface of micro LED. Top dielectric layer 250 is transparent and made of one or a combination of the following: SiO2, SiN, SiON or Al2O3.
[0068] As shown in FIGs. 3-5, micro LED 200 further includes a micro-lens 260. Micro-lens 260 is located above top dielectric layer 250, and one micro-lens 260 covers a pixel region of the micro LED. A bottom diameter of micro-lens 260 is greater than a maximum diameter of light emitting mesa 210. Thickness H1 (shown in FIG. 3) of micro-lens 260 is less than or equal to 10 μm. In some embodiments, micro-lens 260 is made of silicon dioxide, photoresist, etc.
[0069] As shown in FIGs. 3-5, backplane 120 includes a pad group 121 corresponding to micro LED 200. Pad group 121 includes a first pad 1211, a second pad 1212, and a third pad 1213. First pad 1211 corresponds to bottom connecting mesa 240 and is electrically connected to bottom connecting mesa 240, second pad 1212 corresponds to first bottom electrical connection structure 232a and is electrically connected to first bottom electrical connection structure 232a; and third pad 1213 corresponds to second bottom electrical connection structure 232b and is electrically connected to second bottom electrical connection structure 232b.
[0070] As shown in FIG. 3, a thickness H2 of a light emitting mesa 210 ranges from 0.3 μm to 3.5 μm, and a bottom diameter of light emitting mesa 210 ranges from 0.5 μm to 50 μm. A thickness H3 of micro LED 200 (excluding micro-lens 260) ranges from 1 μm to 10 μm, and a diameter of micro LED 200 (excluding micro-lens 260) ranges from 2 μm to 200 μm. The length of micro LED display panel 100 ranges from 500 μm to 50, 000 μm; a resolution of the array consisting of micro LEDs in the display panel can be 320×240, 640×480, 1, 920×1, 080, or 2,560×1, 440. In some embodiments, the resolution of the array consisting of micro LEDs in the display panel can be of other values.
[0071] FIG. 12 illustrates a section view of two adjacent exemplary micro LEDs along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure. As shown in FIG. 12, top conductive layers 221 (i.e., first top conductive layers 221) corresponding to the bottom-most two light emitting mesas 210 (i.e., first light emitting mesas 211) of adjacent micro LEDs 200 are connected to each other.
[0072] FIG. 13A illustrates a top view of an exemplary single micro LED 200” ’ , according to some embodiments of the present disclosure. FIG. 13B illustrates a top view of an array arrangement of a plurality of micro LEDs 200” ’s hown in FIG. 13A, according to some embodiments of the present disclosure. FIG. 13C illustrates a structural diagram showing a sectional view of the micro LED along an E-E direction shown in FIG. 13A, according to some embodiments of the present disclosure. FIG. 13D illustrates a structural diagram showing a sectional view of the micro LED along an F-F direction shown in FIG. 13A, according to some embodiments of the present disclosure. FIG. 13E illustrates a structural diagram showing a sectional view of the micro LED along a G-G direction shown in FIG. 13A, according to some embodiments of the present disclosure. FIG. 13F illustrates a structural diagram showing a sectional view of the micro LED along an H-H direction shown in FIG. 13A, according to some embodiments of the present disclosure. As shown in FIG. 13A, a conductive layer 220 is electrically connected correspondingly to an electrical connection structure 230. Exemplarily, first top conductive layer 221a is electrically connected correspondingly to first top electrical connection structure 231a; second top conductive layer 221b is electrically connected correspondingly to second top electrical connection structure 231b; and third top conductive layer 221c is electrically connected correspondingly to third top electrical connection structure 231c. Second bottom conductive layer 222b is electrically connected correspondingly to first bottom electrical connection structure 232a; third bottom conductive layer 222c is electrically connected correspondingly to second bottom electrical connection structure 232b. First top electrical connection structure 231a, second top electrical connection structure 231b, third top electrical connection structure 231c, first bottom electrical connection structure 232a, and second bottom electrical connection structure 232b are spaced apart from each other. In some embodiments, the relative positions among first top electrical connection structure 231a, second top electrical connection structure 231b, third top electrical connection structure 231c, first bottom electrical connection structure 232a, and second bottom electrical connection structure 232b can be adjusted as required. It is noted that the positions indicated in FIG. 13A are for illustrative purposes only.
[0073] As shown in FIG. 13B, in an array consisting of a plurality of micro LEDs 200” ’ , second top electrical connection structure 231b of a first micro LED 200” ’a nd third top electrical connection structure 231c of second micro LED 200” ’a re adjacently spaced apart from each other.
[0074] As shown in FIGs. 13C-13F, top conductive layer 221 on light emitting mesa 210 is electrically connected correspondingly to top electrical connection structure 231; and grooves 400 corresponding to top conductive layers 221 on different light emitting mesas 210 are located in different vertical sections. Bottom conductive layer 222 below light emitting mesa 210 is electrically connected correspondingly to bottom electrical connection structure 232; and grooves 400 corresponding to bottom conductive layers 222 below different light emitting mesas 210 are located in different vertical sections. Through arranging grooves 400 corresponding to top conductive layers 221 on different light emitting mesas 210 in different vertical sections, and arranging grooves 400 corresponding to bottom conductive layers 222 below different light emitting mesas 210 in different vertical sections, it is allowable to etch and fill electrical connection structure 230 after all light emitting mesas 210 are formed during a manufacturing process.
[0075] Technical effect of the micro LED display panel provided by the embodiments of the present disclosure may include:
[0076] 1) On the side of the electrical connection structure near the light emitting mesa, there is at least one groove with an opening facing the light emitting mesa, and the end of at least one conductive layer extends into the groove and is electrically connected to a corresponding electrical connection structure. The groove is filled with a dielectric medium, which helps reduce the material consumption of the electrical connection structure and facilitate the integrated formation of the electrical connection structure.
[0077] 2) The end of the conductive layer extends into the etch path to form an etch masking segment, which enables simultaneous etching of the dielectric medium on both sides of the etch masking segment, thereby forming an etch hole. Filling the etch hole with a conductive material allows for the integrated formation of the electrical connection structure on both sides of the etch masking segment, thus improving production efficiency.
[0078] 3) A first electrical connection segment of the top conductive layer extends into the groove to form an etch masking segment, and a second electrical connection segment is electrically connected to the light emitting mesa. There is a predefined height difference between the first and second electrical connection segments. The first electrical connection segment is higher or lower than the second electrical connection segment, so that the groove length can be adjusted as required.
[0079] Additionally, some embodiments of the present disclosure provide a method of manufacturing micro LED display panel.
[0080] FIG. 14 is a flowchart of an exemplary method 1400 of manufacturing a micro LED display panel, according to some embodiments of the present disclosure. FIG. 18 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along an A-A direction shown in FIG. 2, according to some embodiments of the present disclosure. FIG. 19 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along a B-B direction shown in FIG. 2, according to some embodiments of the present disclosure. FIG. 20 is a structural schematic diagram of an exemplary manufacturing process showing a sectional view of the micro LED pixel along a C-C direction shown in FIG. 2, according to some embodiments of the present disclosure.
[0081] With reference to FIG. 14 and in conjunction with steps S1 and S2 in FIG. 18, steps S1 and S2 in FIG. 19, and steps S1 and S2 in FIG. 20, method 1400 includes steps S101-S106.
[0082] In step S101, a plurality of first bottom conductive layers 222a are formed on substrate 120 at predefined positions. In some embodiments, the substrate 120 is a backplane.
[0083] In step S102, first light emitting mesa 211 is formed on each first bottom conductive layer 222a.
[0084] In step S103, first top conductive layer 221a is formed on each first light emitting mesa 211. At this point, the micro LED structure can be seen as shown in step S1 in FIG. 18, step S1 in FIG. 19, and S1 in FIG. 20.
[0085] In step S104, the surrounding area of first light emitting mesa 211 is filled with dielectric medium to form first dielectric layer 301 and make sure first dielectric layer 301 covers the region above first top conductive layer 221a.
[0086] In step S105, etching is performed along a first etch path (not shown) in a predefined region between adjacent first light emitting mesas 211 to form a first etch hole (not shown) . At least one end of first top conductive layer 221a is located at first etch path and an etch masking segment 223 is formed, allowing the dielectric medium located below etch masking segment 223 to be preserved during etching.
[0087] In step S106, the first etch hole is filled with a conductive material to form a top electrical connection structure 231 connected to first top conductive layer 221a, as shown in step S2 in FIG. 20.
[0088] In some embodiments, with reference to FIGs. 18, 19 and 20, before several first bottom conductive layers 222a are formed at a number of predefined positions on substrate 120 as described in above-described step S101, the method further includes: bottom connecting mesa 240 is formed on substrate 120, and first bottom conductive layer 222a is formed on the top surface of bottom connecting mesa 240.
[0089] In some embodiments, with reference to step S1 in FIG. 18, step S1 in FIG. 19 and step S1 in FIG. 20, before first top conductive layer 221a is formed on each first light emitting mesa 211 as described in step S103, the method further includes: a second dielectric layer 302 is formed on the side face of first light emitting mesa 211, and a top diameter of first light emitting mesa 211 is smaller than a bottom diameter of first light emitting mesa 211; and second dielectric layer 302 can prevent first top conductive layer 221a from contacting the side face of first light emitting mesa 211.
[0090] FIG. 15 is a flowchart showing sub-steps of an exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure. With reference to FIG. 15 and in conjunction with steps S3-S5 in FIG. 18, steps S3-S5 in FIG. 19, and steps S3-S5 in FIG. 20, in some embodiments, after step S106, the method further includes steps S201-S208.
[0091] In step S201, etching is performed along a second etch path (not shown) in a predefined region between adjacent first light emitting mesas 211 to form a second etch hole (not shown) .
[0092] In step S202, the second etch hole is filled with a conductive material to form first bottom electrical connection structure 232a.
[0093] In step S203, a third dielectric layer 303 is formed on first top conductive layer 221a so that third dielectric layer 303 covers the top surface of top electrical connection structure 231 and first bottom electrical connection structure 232a.
[0094] In step S204, second bottom conductive layer 222b is formed on third dielectric layer 303.
[0095] In step S205, second light emitting mesa 212 is formed on second bottom conductive layer 222b.
[0096] In step S206, second top conductive layer 221b is formed on second light emitting mesa 212.
[0097] In step S207, the surrounding area of second light emitting mesa 212 is filled with dielectric medium to form a fourth dielectric layer 304 and make sure fourth dielectric layer 304 covers the top surface of second top conductive layer 221b.
[0098] In step S208, the dielectric medium is etched along the first etch path between adjacent second light emitting mesas 212 until top electrical connection structure 231 is reached. Then, conductive material is injected to increase the height of top electrical connection structure 231, and the dielectric medium is etched along second etch path until first bottom electrical connection structure 232a is reached. Then, the conductive material is injected to increase the height of first bottom electrical connection structure 232a. An end of second top conductive layer 221b is located at the first etch path, and an end of second bottom conductive layer 222b is located at the second etch path.
[0099] As shown in step S4 in FIG. 18, step S4 in FIG. 19 and step S4 in FIG. 20, in some embodiments, before step S206, the method further includes: a fifth dielectric layer 305 is formed on the side face of second light emitting mesa 212, and a top diameter of second light emitting mesa 212 is smaller than a bottom diameter of second light emitting mesa 212; and fifth dielectric layer 305 can prevent second top conductive layer 221b from contacting the side face of second light emitting mesa 212.
[0100] FIG. 16 is a flowchart showing sub-steps of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure. With reference to FIG. 16 and in conjunction with steps S6-S8 in FIG. 18, steps S6-S8 in FIG. 19 and steps S6-S8 in FIG. 20, in some embodiments, after step S106 and before step S203, the method further includes steps S301-S302, and after step S208, the method further includes steps S303-S309.
[0101] In step S301, etching is performed along a third etch path (not shown) in a predefined region between adjacent first light emitting mesas 211 to form a third etch hole (not shown) .
[0102] In step S302, the third etch hole is filled with a conductive material to form second bottom electrical connection structure 232b.
[0103] In step S303, the dielectric medium is etched along third etch path between adjacent second light emitting mesas 212 until second bottom electrical connection structure 232b is reached; and then the conductive material is injected to increase the height of second bottom electrical connection structure 232b.
[0104] In step S304, a sixth dielectric layer 306 is formed on second top conductive layer 221b so that sixth dielectric layer 306 covers the top surfaces of top electrical connection structure 231, first bottom electrical connection structure 232a, and second bottom electrical connection structure 232b.
[0105] In step S305, third bottom conductive layer 222c is formed on sixth dielectric layer 306.
[0106] In step S306, third light emitting mesa 213 is formed on third bottom conductive layer 222c.
[0107] In step S307, third top conductive layer 221c is formed on third light emitting mesa 213.
[0108] In step S308, the surrounding area of third light emitting mesa 213 is filled with dielectric medium to form a seventh dielectric layer 307 and make sure seventh dielectric layer 307 covers the top surface of third top conductive layer 221c.
[0109] In step S309, the dielectric medium is etched along the first etch path between adjacent third light emitting mesas 213 until top electrical connection structure 231 is reached; then, the conductive material is injected to increase the height of top electrical connection structure 231, and the dielectric medium is etched along the second etch path until first bottom electrical connection structure 232a is reached; next, the conductive material is injected to increase the height of first bottom electrical connection structure 232a; and the dielectric medium is etched along the third etch path until second bottom electrical connection structure 232b is reached; again, the conductive material is injected to increase the height of second bottom electrical connection structure 232b; and an end of third top conductive layer 221c is located at the first etch path, and an end of third bottom conductive layer 222c is located at the third etch path.
[0110] As shown in step S7 in FIG. 18, step S7 in FIG. 19 and step S7 in FIG. 20, in some embodiments, before step S307, the method further includes: an eighth dielectric layer 308 is formed on the side face of third light emitting mesa 213, and the top diameter of third light emitting mesa 213 is smaller than a bottom diameter of third light emitting mesa 312; and eighth dielectric layer 308 can prevent third top conductive layer 221c from contacting the side face of third light emitting mesa 213.
[0111] FIG. 17 is a flowchart showing sub-steps of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure. With reference to FIG. 17 and in conjunction with steps S9 and S10 in FIG. 18, steps S9 and S10 in FIG. 19 and steps S9 and S10 in FIG. 20, in some embodiments, after step S309, the method of manufacturing the micro LED display panel further includes steps S401-S405.
[0112] In step S401, a ninth dielectric layer 309 is formed on top surfaces of top electrical connection structure 231, first bottom electrical connection structure 232a, and second bottom electrical connection structure 232b.
[0113] In step S402, the dielectric medium is etched along the first etch path until top electrical connection structure 231 is reached; and then the conductive material is injected to increase the height of top electrical connection structure 231 until top electrical connection structure 231 is flush with ninth dielectric layer 309.
[0114] In step S403, conductive material is injected around the pixel region above ninth dielectric layer 309 to form top cascade structure 233 so that top cascade structure 233 is electrically connected to top electrical connection structure 231.
[0115] In step S404, top dielectric layer 250 is formed on ninth dielectric layer and covers top cascade structure 233.
[0116] In step S405, micro-lens 260 is formed at the position corresponding to the light emitting mesas (211, 212, and 213) above top dielectric layer 250.
[0117] In some embodiments, first light emitting mesa 211, second light emitting mesa 212, and third light emitting mesa 213 are coaxially disposed.
[0118] Additionally, some embodiments of the present disclosure provide another method of manufacturing a micro LED display panel.
[0119] FIG. 21 is a flowchart of another exemplary method of manufacturing a micro LED display panel, according to some embodiments of the present disclosure. With reference to FIG. 21 and in conjunction with FIGs. 13A-13F, the method of manufacturing the micro LED display panel includes steps S501 and S502.
[0120] In step S501, a light emitting unit group array is formed, according to a preset order, at a predefined position on substrate 120; each light emitting unit group vertically includes at least two light emitting units arranged in a stacked arrangement; each light emitting unit includes light emitting mesa 210 and conductive layer 220 located on a top side and a bottom side of the light emitting mesa 210; and the space between adjacent light emitting units is filled with dielectric medium 300.
[0121] In step S502, the dielectric medium is etched along at least three etch paths in different vertical sections within the predefined region between adjacent the light emitting units to form at least three etch holes; the ends of at least three the conductive layers corresponding to at least two the light emitting units are correspondingly located in at least three of the etch paths, thereby forming three etch masking segments 223 correspondingly; the at least three etch holes are filled with a conductive material to form at least three electrical connection structures 230, which are electrically connected correspondingly to at least three the conductive layers 220.
[0122] In some embodiments, the method of manufacturing a micro LED display panel further includes the following: a dielectric layer is formed at the top of the array of light emitting units so that the dielectric layer covers the top of at least three electrical connection structures 230; then, the dielectric medium is etched along the etch paths corresponding to at least two top conductive layers to expose the tops of at least two electrical connection structures corresponding to at least two top conductive layers, wherein the conductive layer on the top side of the light emitting mesa is the top conductive layer; next, the conductive material is injected upon completion of the etching to increase the length of at least two electrical connection structures corresponding to at least two top conductive layers so as to be flush with the dielectric layer; again, the conductive material the injected around the pixel region over the dielectric layer to form top cascade structure 233, while ensuring top cascade structure 233 is electrically connected to at least two electrical connection structures 230 corresponding to at least two top conductive layers. A top dielectric layer is formed on the dielectric layer to cover the top cascade structure 233; and micro-lens 260 is provided at the position above the top dielectric layer corresponding to the light emitting mesa 210.
[0123] In this variant embodiment, all the electrical connection structures corresponding to each conductive layer 220 are located in different vertical sections, so that etching and filling are performed in a unified manner to form electrical connection structure 230 upon completion of all the light emitting mesas 210 stacked in the vertical direction.
[0124] The present disclosure provides a micro LED display panel. On the side of an electrical connection structure near a light emitting mesa, there is at least one groove with an opening that faces the light emitting mesa, and the end of at least one conductive layer extends into the groove and is electrically connected to corresponding the electrical connection structure; the groove is filled with a dielectric medium, which helps reduce the material consumption of the electrical connection structure and facilitate its integrated forming.
[0125] For the method of manufacturing a micro LED display panel provided in the present disclosure, the end of the conductive layer extends into the etch path to form an etch masking segment, which enables simultaneous etching of the dielectric medium on both sides of the etch masking segment, thereby forming an etch hole; filling the etch hole with conductive material allows for the integrated forming of the electrical connection structure on both sides of the etch masking segment, thus improving production efficiency. Because a first electrically connected segment of the top conductive layer extends into the etch path to form an etch masking segment and there is a predefined height difference between the first electrically connected segment and a second electrically connected segment, the first electrically connected segment is higher or lower than the second electrically connected segment. As a result, the groove length can be adjusted as required by adjusting the relative position and height difference between the first electrically connected segment and the second electrically connected segment.
[0126] It is understood by those skilled in the art that the micro LED display panel is not limited by the structure described above, and may include greater or fewer components than those illustrated, or some components may be combined, or a different component may be utilized.
[0127] It should be noted that relational terms herein such as “first” and “second” are used only to differentiate an entity or operation from another entity or operation, and do not require or imply any actual relationship or sequence between these entities or operations. Moreover, the words “comprising, ” “having, ” “containing, ” and “including, ” and other similar forms are intended to be equivalent in meaning and be open ended in that an item or items following any one of these words is not meant to be an exhaustive listing of such item or items, or meant to be limited to only the listed item or items.
[0128] As used herein, unless specifically stated otherwise, the term “or” encompasses all possible combinations, except where infeasible. For example, if it is stated that a database may include A or B, then, unless specifically stated otherwise or infeasible, the database may include A, or B, or A and B. As a second example, if it is stated that a database may include A, B, or C, then, unless specifically stated otherwise or infeasible, the database may include A, or B, or C, or A and B, or A and C, or B and C, or A and B and C.
[0129] In the foregoing specification, embodiments have been described with reference to numerous specific details that can vary from implementation to implementation. Certain adaptations and modifications of the described embodiments can be made. Other embodiments can be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims. It is also intended that the sequence of steps shown in figures are only for illustrative purposes and are not intended to be limited to any particular sequence of steps. As such, those skilled in the art can appreciate that these steps can be performed in a different order while implementing the same method.
[0130] In the drawings and specification, there have been disclosed exemplary embodiments. However, many variations and modifications can be made to these embodiments. Accordingly, although specific terms are employed, they are used in a generic and descriptive sense only and not for purposes of limitation.
Claims
1.A micro light emitting diode (LED) display panel, comprising:a micro LED array comprising:a plurality of micro LEDs, each of the plurality of micro LEDs comprising at least two light emitting mesas vertically stacked from bottom to top; andconductive layers formed on a top side and a bottom side of each light emitting mesa, wherein the conductive layers comprise a top conductive layer formed on a top of each of the light emitting mesas and a bottom conductive layer formed on a bottom of each of the light emitting mesas;a backplane provided at a bottom of the micro LED array and configured to control the plurality of micro LEDs; andan electrical connection structure comprising at least one top electrical connection structure and at least one bottom electrical connection structure; the at least one top electrical connection structure is electrically connected to the top conductive layer, and each of the at least one bottom electrical connection structure is electrically connected correspondingly to the bottom conductive layer; and the electrical connection structure is arranged around the at least two light emitting mesas;wherein the electrical connection structure further comprises a groove with at least one opening facing a light emitting mesa on a side of the electrical connection structure near the light emitting mesa; at least one end of the conductive layer corresponding to the light emitting mesa comprises an etch masking segment; the etch masking segment extends into the groove and is electrically connected to the electrical connection structure; and dielectric medium fills gaps between adjacent light emitting mesas and inside the groove.2.The micro LED display panel according to claim 1, wherein an end of the etch masking segment abuts with the electrical connection structure below the etch masking segment.3.The micro LED display panel according to claim 2, wherein a side wall of the electrical connection structure below the etch masking segment is tilted, and the end of the etch masking segment abuts onto the tilted side wall of the electrical connection structure; ora side wall of the electrical connection structure below the etch masking segment is vertical, and the end of the etch masking segment abuts onto the vertical side wall of the electrical connection structure.4.The micro LED display panel according to claim 3, wherein an angle between the side wall and a vertical plane is less than or equal to 5° when the side wall of the electrical connection structure below the etch masking segment is tilted.5.The micro LED display panel according to claim 1, wherein a top of the electrical connection structure is greater than or equal to a top of a top-most one of the light emitting mesa.6.The micro LED display panel according to claim 1, wherein a length of the etch masking segment is smaller than a width of the electrical connection structure.7.The micro LED display panel according to claim 1, wherein grooves in the electrical connection structure corresponding to top conductive layers of different light emitting mesas are in a same vertical section.8.The micro LED display panel according to claim 7, wherein grooves in the electrical connection structure corresponding to bottom conductive layers of different light emitting mesas are in different vertical sections.9.The micro LED display panel according to claim 1, wherein the top conductive layer comprises:a first electrically connected segment extending into the groove to form the etch masking segment,a second electrically connected segment electrically connected to the light emitting mesa; anda tilt connection segment connecting between the first electrically connected segment and the second electrically connected segment; ; wherein a predefined height difference is set between the first electrically connected segment and the second electrically connected segment.10.The micro LED display panel according to claim 9, wherein a top of the first electrically connected segment is higher than a top of the second electrically connected segment.11.The micro LED display panel according to claim 9, wherein a top of the first electrically connected segment is lower than a top of the second electrically connected segment.12.The micro LED display panel according to claim 1, wherein the conductive layer extends into the groove in a horizontal state.13.The micro LED display panel according to claim 1, wherein top conductive layers corresponding to adjacent bottom-most light emitting mesas are connected to each other.14.The micro LED display panel according to any one of claims 1-13, wherein a top surface and a bottom surface of the light emitting mesa are circular, and a diameter of the top surface is greater than a diameter of the bottom surface.15.The micro LED display panel according to any one of claims 1-13, wherein the micro LED further comprises:a bottom connecting mesa, between a bottom-most light emitting mesa and the backplane, electrically connected to the backplane and the bottom-most light emitting mesa.16.The micro LED display panel according to claim 15, wherein the bottom connecting mesa is made of metal.17.The micro LED display panel according to claim 16, wherein a metallic material of the bottom connecting mesa is one or a combination of Al, Au, Rh, Ag, Cr, Ti, Pt, Sn, Cu, AuSn or TiW.18.The micro LED display panel according to claim 15, wherein a top surface of the bottom connecting mesa is circular, a bottom surface of the bottom-most light emitting mesa is circular, and a diameter of the top surface of the bottom connecting mesa is equal to a diameter of the bottom surface of the bottom-most light emitting mesa.19.The micro LED display panel according to claim 1, wherein the conductive layer is transparent.20.The micro LED display panel according to claim 19, wherein the conductive layer is made of one or a combination of ITO, FTO, or AZO.21.The micro LED display panel according to claim 1, wherein the electrical connection structure is made of conductive materials.22.The micro LED display panel according to claim 1, further comprising:a top cascade structure provided above and surrounding a top-most one of the light emitting mesas, and electrically connected to all top electrical connection structures.23.The micro LED display panel according to claim 22, further comprising:a top dielectric layer continuously covering a surface of the micro LED array.24.The micro LED display panel according to claim 23, wherein the top dielectric layer is transparent.25.The micro LED display panel according to claim 24, wherein the top dielectric layer is made of one or a combination of SiO2, SiN, SiON, or Al2O3.26.The micro LED display panel according to claim 23, further comprising:a plurality of micro-lenses arranged above the top dielectric layer, wherein each of the plurality of micro-lenses covers a pixel region of one of the micro LEDs.27.The micro LED display panel according to claim 26, wherein a bottom surface diameter of the micro-lens is greater than a maximum diameter of the light emitting mesa.28.The micro LED display panel according to claim 27, wherein a thickness of the micro-lens is less than or equal to 10 μm.29.The micro LED display panel according to claim 15, wherein the backplane comprises a pad group array comprising a plurality of pad groups, wherein the pad group array corresponds to the micro LED array and one pad group corresponds to one micro LED; the at least two light emitting mesas comprises a first light emitting mesa, a second light emitting mesa and a third light emitting mesa stacked from top to bottom; and the pad group comprises:a first pad connected to the bottom connecting mesa;a second pad connected to a first bottom electrical connection structure, the first bottom electrical connection structure connected to a bottom conductive layer of the first light emitting mesa; anda third pad connected to second bottom electrical connection structure, the second bottom electrical connection structure connected to a bottom conductive layer of the second light emitting mesa.30.The micro LED display panel according to claim 29, wherein the first light emitting mesa emits red light, the second light emitting mesa emits green light, and the third light emitting mesa emits blue light.31.The micro LED display panel according to claim 29, wherein the first light emitting mesa emits red light, the second light emitting mesa emits blue light, and the third light emitting mesa emits green light.32.The micro LED display panel according to claim 1, wherein a thickness of the micro LED ranges from 1 μm to 10 μm, and a diameter of the micro LED ranges from 2 μm to 200 μm.33.The micro LED display panel according to claim 32, wherein a thickness of the light emitting mesa ranges from 0.3 μm to 3.5 μm, and a bottom diameter of the light emitting mesa ranges from 0.5 μm to 50 μm.34.The micro LED display panel according to claim 33, wherein a length of the micro LED display panel ranges from 500 μm to 50,000 μm; and a resolution of the micro LED array is 320×240, 640×480, 1,920×1,080 or 2,560×1,440.35.A method of manufacturing a micro light emitting diode (LED) display panel, comprising:forming a plurality of first bottom conductive layers at predefined positions on a substrate;forming a first light emitting mesa on each of the first bottom conductive layers;forming a first top conductive layer on the first light emitting mesa;filling a surrounding area of the first light emitting mesa with dielectric medium to form a first dielectric layer, wherein the first dielectric layer covers a region above the first top conductive layer;etching along a first etch path in a first predefined region between adjacent first light emitting mesas to form a first etch hole; wherein at least one end of the first top conductive layer is located at the first etch path and an etch masking segment is formed, and the dielectric medium located below the etch masking segment is preserved during etching; andfilling the first etch hole with a conductive material to form a top electrical connection structure connected to the first top conductive layer.36.The method according to claim 35, wherein the substrate is a backplane.37.The method according to claim 35, wherein forming a plurality of first bottom conductive layers at predefined positions on the substrate further comprises:forming a bottom connecting mesa on the substrate; andforming the first bottom conductive layer on a top surface of the bottom connecting mesa.38.The method according to claim 35, wherein before forming the first top conductive layer on the first light emitting mesa, the method further comprises:filling a side face of the first light emitting mesa to form a second dielectric layer.39.The method according to claim 35, wherein after filling the first etch hole with the conductive material to form the top electrical connection structure connected to the first top conductive layer, the method further comprises:forming a second etch hole along a second etch path in a second predefined region between adjacent first light emitting mesas;filling the second etch hole with a conductive material to form a first bottom electrical connection structure;providing a second dielectric layer on the first top conductive layer, wherein the second dielectric layer covers a top surface of the top electrical connection structure and the first bottom electrical connection structure;forming a second bottom conductive layer on the second dielectric layer;forming a second light emitting mesa on the second bottom conductive layer;forming a second top conductive layer on the second light emitting mesa;filling a surrounding area of the second light emitting mesa with dielectric medium to form a third dielectric layer, wherein the third dielectric layer covers a top surface of the second top conductive layer;etching the dielectric medium to the top electrical connection structure along the first etch path between adjacent second light emitting mesas, and injecting the conductive material to increase a height of the top electrical connection structure; andetching the dielectric medium along the second etch path to the first bottom electrical connection structure, and injecting the conductive material to increase a height of the first bottom electrical connection structure; wherein an end of the second top conductive layer is located at the first etch path, and an end of the second bottom conductive layer is located at the second etch path.40.The method according to claim 39, wherein after filling the first etch hole with the conductive material to form a top electrical connection structure connected to the first top conductive layer, and before providing the second dielectric layer on the top of the first top conductive layer, the method further comprises:forming a third etch hole along a third etch path in a third predefined region between the adjacent light emitting mesas;filling the third etch hole with conductive material to form a second bottom electrical connection structure; andetching the dielectric medium along the second etch path to the first bottom electrical connection structure, and injecting the conductive material to increase the height of the first bottom electrical connection structure;after etching the dielectric medium along the second etch path to the first bottom electrical connection structure, and injecting the conductive material to increase the height of the first bottom electrical connection structure, the method further comprises:etching the dielectric medium to the second bottom electrical connection structure along the third etch path between adjacent second light emitting mesas, and injecting the conductive material to increase a height of the second bottom electrical connection structure;providing a fourth dielectric layer on the second top conductive layer wherein the fourth dielectric layer covers a top surfaces of the top electrical connection structure, the first bottom electrical connection structure, and the second bottom electrical connection structure;forming a third bottom conductive layer on the fourth dielectric layer;forming a third light emitting mesa on the third bottom conductive layer;forming a third top conductive layer on the third light emitting mesa;filling a surrounding area of the third light emitting mesa with dielectric medium to form a fifth dielectric layer, wherein the fifth dielectric layer covers a top surface of the third top conductive layer;etching the dielectric medium to the top electrical connection structure along the first etch path between adjacent third light emitting mesas, and injecting the conductive material to increase the height of the top electrical connection structure; andetching the dielectric medium along the second etch path to the first bottom electrical connection structure, and injecting the conductive material to increase the height of the first bottom electrical connection structure, and etching the dielectric medium along the third etch path to the second bottom electrical connection structure and injecting the conductive material to increase the height of the second bottom electrical connection structure; and an end of the third top conductive layer is located at the first etch path, and an end of the third bottom conductive layer is located at the third etch path.41.The method according to claim 40, further comprising:forming a sixth dielectric layer on a top surface of the top electrical connection structure, the first bottom electrical connection structure, and the second bottom electrical connection structure;etching the dielectric medium along the first etch path until the top electrical connection structure is reached; and injecting the conductive material increase the height of the top electrical connection structure until the top electrical connection structure is flush with the sixth dielectric layer;injecting a conductive material around a pixel region above the sixth dielectric layer to form a top cascade structure, wherein the top cascade structure is electrically connected to the top electrical connection structure;forming a top dielectric layer on the ninth dielectric layer to cover the top cascade structure; andforming a micro-lens at a position corresponding to the light emitting mesa above the top dielectric layer.
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