Apparatus and method for skin care according to skin type

Abstract

The present invention provides an apparatus and method for skin care according to skin type. The present invention can receive the impedance of skin measured on the basis of an electrode unit when the electrode unit is brought into contact with the skin, extract a waveform and high-frequency energy according to the skin type associated with the impedance of the skin, control an energy supply unit so that the skin is irradiated with the waveform and high-frequency energy according to the skin type through the electrode unit, and control a cooling unit to lower the temperature of the skin to a preset target temperature when the temperature of the skin is not the target temperature.

Description

Skin care devices and methods for different skin types

[0001] The present disclosure relates to a skin care device and method for each skin type.

[0002] Generally, skin care devices for wrinkle removal, skin elasticity restoration, and sebum removal include those that transmit ultrasound to skin tissue (HIFU type), those that transmit high-frequency waves to skin tissue (RF type), and those that irradiate laser light to skin tissue (Optical type).

[0003] A device that delivers high frequency waves to skin tissue repeatedly penetrates the deep skin with a vertically reciprocating RF needle electrode, and uses the heat generated by the high frequency to remove damaged collagen and elastic fibers from the deep skin of the target point and promote new formation.

[0004] Furthermore, these skin care devices improve skin pigmentation, acne scars, and wrinkles.

[0005] That is, by applying various energies to the target area of ​​the skin to intentionally cause wounds, the skin area is regenerated by stimulating the collagen in the dermis layer to induce collagen regeneration.

[0006] However, conventional skin care devices can cause unexpected damage to the skin upon penetration, and even with anesthesia, pain can occur later.

[0007] Therefore, research has been continuously conducted on devices that can deliver electric energy deep into the skin in a non-invasive manner, finely control the temperature of the deep skin by controlling the high-frequency irradiation energy per pulse within the high-frequency irradiation cycle, and control the number and timing of cooling of the high-frequency irradiated area of ​​the skin to reduce skin irritation such as pain.

[0008] Additionally, research is ongoing on devices that can alleviate pain, improve the effectiveness of high-frequency irradiation, improve skin, and prevent skin damage by lowering skin temperature.

[0009] The embodiments disclosed herein aim to provide a method for delivering electrical energy deep into the skin in a non-invasive manner.

[0010] In addition, the embodiment disclosed in the present disclosure aims to provide a method for finely controlling deep skin temperature by controlling pulse-by-pulse high-frequency irradiation energy within a high-frequency irradiation cycle.

[0011] In addition, the embodiment disclosed in the present disclosure aims to provide a method for controlling the number and timing of cooling of a high-frequency irradiated area of ​​the skin to reduce skin irritation such as pain.

[0012] In addition, the embodiments disclosed in the present disclosure aim to provide a method for improving skin by alleviating pain and improving the efficiency of high-frequency irradiation.

[0013] In addition, the embodiment disclosed in the present disclosure aims to provide something that can lower skin temperature and thereby prevent skin damage in advance.

[0014] In addition, the problems to be solved by the present disclosure are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below.

[0015] According to an aspect of the present disclosure for achieving the above-described technical problem, a skin care device for each skin type comprises: an electrode unit that comes into contact with skin; a sensing unit that acquires the temperature of the skin; a cooling unit that cools the skin; an energy supply unit that supplies high-frequency energy to the electrode unit; and a processor that controls the cooling unit and the energy supply unit; wherein, when the electrode unit comes into contact with the skin, the processor receives an impedance of the skin measured based on the electrode unit, extracts a skin type-specific waveform and high-frequency energy linked to the impedance of the skin, and controls the energy supply unit to irradiate the skin type-specific waveform and high-frequency energy through the electrode unit, and when the temperature of the skin is not a preset target temperature, controls the cooling unit to lower the temperature of the skin to the target temperature.

[0016] In addition, the type of the waveform may be characterized by at least one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform.

[0017] Additionally, the processor may be characterized in that the type and peak value of the waveform are set differently depending on the type of the skin.

[0018] Additionally, the processor may be characterized in that the number of times the waveform is applied and the application cycle are set differently for each type of skin.

[0019] Additionally, the processor may be characterized in that the type and peak value of the waveform are set differently depending on the type of skin and the purpose of investigation.

[0020] Additionally, the processor may be characterized in that the number of times the waveform is applied and the application cycle are set differently depending on the type of skin and the purpose of investigation.

[0021] Additionally, the processor may be characterized in that it further displays at least one of the impedance of the skin and the temperature of the skin on the display unit.

[0022] In addition, the processor may be characterized in that it further notifies an abnormal situation through a notification unit when the impedance of the skin is not a preset target impedance or when the temperature of the skin is not the target temperature.

[0023] In addition, the processor may be characterized in that, when the impedance of the skin is not a preset target impedance and the temperature of the skin is not the target temperature, the processor further controls the cooling unit according to at least one of a preset cooling spray time, a spray amount per cooling spray time, and a cooling spray intensity per cooling spray time.

[0024] In addition, the processor may further control the cooling unit according to at least one of each cooling spray time point, each cooling spray amount per time, and each cooling spray intensity per time, which are preset for each layer of the skin, when the impedance of the skin is not a preset target impedance and the temperature of the skin is not the target temperature.

[0025] In addition, the processor may be characterized in that the type and peak value of the waveform are set differently depending on the number and size of the electrode portion.

[0026] In addition, the processor may be characterized in that the number of times the waveform is applied and the application cycle are set differently depending on the number and size of the electrode portions.

[0027] In addition, the processor may be characterized in that it further displays waveform setting information including at least one of the type of the waveform, peak value, number of application times, and application period, and feedback information on the result of the investigation of the high-frequency energy on the display unit.

[0028] In addition, the energy supply unit may supply the skin type-specific waveform and high-frequency energy to the electrode unit during a preset high-frequency irradiation cycle, and the processor may further control the energy supply unit to divide the high-frequency irradiation cycle into a plurality of pulse shot sections, and adjust the skin type-specific waveform and high-frequency energy for each pulse shot section, and further control the cooling unit to lower the temperature of the skin to the target temperature during at least a portion of the pulse shot sections.

[0029] In addition, the processor may further control the energy supply unit to uniformly irradiate the skin type-specific waveform and high-frequency energy throughout the pulse shot section, or further control the energy supply unit to irradiate the skin type-specific waveform and high-frequency energy differently depending on a designated section among the pulse shot sections.

[0030] According to the aforementioned problem solving means of the present disclosure, it is provided that electrical energy can be delivered deep into the skin in a non-invasive manner.

[0031] In addition, according to the above-described problem solving means of the present disclosure, it is provided that the deep skin temperature can be finely controlled by controlling the high-frequency irradiation energy per pulse within the high-frequency irradiation cycle.

[0032] In addition, according to the aforementioned problem solving means of the present disclosure, it is provided that the number and timing of cooling of a high-frequency irradiated area of ​​the skin can be controlled to reduce skin irritation such as pain.

[0033] In addition, the above-described problem solving means of the present disclosure provides that pain is alleviated and the efficiency of high-frequency irradiation is improved, thereby improving the skin.

[0034] In addition, the above-described problem solving means of the present disclosure provides a method for lowering skin temperature, thereby preventing skin damage in advance.

[0035] The effects of the present disclosure are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description below.

[0036] Figure 1 is a drawing showing a skin care device for each skin type according to the present disclosure.

[0037] Figure 2 is a drawing showing a state in which the skin type-specific skin care device of Figure 1 is in contact with the skin.

[0038] Figure 3 is a drawing showing a skin care method for each skin type according to the present disclosure.

[0039] FIG. 4 is a diagram showing an example of a process for controlling a waveform and high-frequency energy for each skin type in each pulse shot section through the processor of FIG. 1.

[0040] Fig. 5 is a drawing showing an example of a process for lowering the surface temperature of the skin through the processor of Fig. 1.

[0041] Throughout this disclosure, the same reference numerals denote the same components. This disclosure does not describe all elements of the embodiments, and any content that is common in the technical field to which this disclosure pertains or that overlaps between embodiments is omitted. The terms "part, module, element, block" used in the specification may be implemented in software or hardware, and depending on the embodiments, multiple "parts, modules, elements, blocks" may be implemented as a single component, or a single "part, module, element, block" may include multiple components.

[0042] Throughout the specification, when a part is said to be "connected" to another part, this includes not only direct connection but also indirect connection, and indirect connection includes connection via a wireless communication network.

[0043] Additionally, when a part is said to "include" a component, this does not mean that it excludes other components, but rather that it may include other components, unless otherwise specifically stated.

[0044] Throughout the specification, when we say that an element is "on" another element, this includes not only cases where the element is in contact with the other element, but also cases where another element exists between the two elements.

[0045] The terms first, second, etc. are used to distinguish one component from another, and the components are not limited by the aforementioned terms.

[0046] Singular expressions include plural expressions unless the context clearly indicates otherwise.

[0047] The identification codes for each step are used for convenience of explanation and do not describe the order of each step. Each step may be performed in a different order than specified unless the context clearly indicates a specific order.

[0048] The operating principle and embodiments of the present disclosure are described below with reference to the attached drawings.

[0049] The control unit of the skin care device according to the present disclosure, as described herein, includes various devices capable of performing computational processing and providing results to the user. For example, the control unit of the skin care device according to the present disclosure may include a computer, a server device, and a portable terminal, or may be any one of them.

[0050] Here, the computer may include, for example, a notebook, desktop, laptop, tablet PC, slate PC, etc. equipped with a web browser.

[0051] A server device is a server that processes information by communicating with external devices, and may include an application server, a computing server, a database server, a file server, a mail server, a proxy server, and a web server.

[0052] A portable terminal is, for example, a wireless communication device that ensures portability and mobility, and may include all kinds of handheld-based wireless communication devices such as PCS (Personal Communication System), GSM (Global System for Mobile communications), PDC (Personal Digital Cellular), PHS (Personal Handyphone System), PDA (Personal Digital Assistant), IMT (International Mobile Telecommunication)-2000, CDMA (Code Division Multiple Access)-2000, W-CDMA (W-Code Division Multiple Access), WiBro (Wireless Broadband Internet) terminals, smart phones, etc., and wearable devices such as watches, rings, bracelets, anklets, necklaces, glasses, contact lenses, or head-mounted devices (HMD).

[0053] The skin type-specific skin care device according to the present disclosure receives the impedance of the skin measured based on the electrode portion when the electrode portion is in contact with the skin, extracts a skin type-specific waveform and high-frequency energy linked to the skin impedance, controls the energy supply portion to irradiate the skin type-specific waveform and high-frequency energy through the electrode portion, and controls the cooling portion to lower the skin temperature to the target temperature when the skin temperature is not a preset target temperature.

[0054] These skin type-specific skin care devices non-invasively deliver electrical energy deep into the skin and can finely control deep skin temperature by adjusting the radiofrequency energy per pulse within the radiofrequency cycle. Furthermore, these skin type-specific skin care devices can control the number and timing of cooling treatments applied to the radiofrequency-treated area of ​​the skin to reduce skin irritation, such as pain. Furthermore, these skin type-specific skin care devices can alleviate pain, improve the effectiveness of radiofrequency treatment, improve skin texture, and lower skin temperature, thereby preventing skin damage.

[0055] Below, we will take a closer look at skin care devices for each skin type.

[0056] Fig. 1 is a drawing illustrating a skin care device for each skin type according to the present disclosure. Fig. 2 is a drawing illustrating a state in which the skin care device for each skin type of Fig. 1 is in contact with skin.

[0057] Referring to FIGS. 1 and 2, a skin care device (100) for each skin type can output high frequency waves toward the inside of the skin in a non-invasive manner. At this time, the high frequency waves can have a specific frequency band based on RF (Radio Frequency).

[0058] For example, the high frequency may be 6.78mHZ, 13.56mHZ, 27.12mHZ, etc., but is not limited thereto and may have other frequency bands.

[0059] At this time, the skin type-specific skin care device (100) can transmit energy to the deep layers of the skin when irradiated with high-frequency energy of 6.78 mHZ. This skin type-specific skin care device (100) can transmit energy to a wide area.

[0060] Additionally, the skin type-specific skin care device (100) can transmit energy to the middle layer of the skin when irradiated with high-frequency energy of 13.56 mHZ. This skin type-specific skin care device (100) can be effective when performing high-frequency irradiation targeting the layer between the skin layer and the surface.

[0061] Additionally, the skin type-specific skin care device (100) can deliver concentrated energy to the surface layer of the skin when irradiated with high-frequency energy of 27.12 mHZ. Such a skin type-specific skin care device (100) can deliver concentrated energy to a narrow and specific area due to the characteristics of high frequency, making it effective when performing precise high-frequency irradiation of a specific area.

[0062] In this way, the skin type-specific skin care device (100) can be effective when performing precise high-frequency irradiation of a specific area, as the frequency increases, the high-frequency energy is concentrated in a narrow area. On the other hand, the skin type-specific skin care device (100) can deliver high-frequency energy to a deeper layer of the skin or a wider area, as the frequency decreases, and can be effective when performing high-frequency irradiation of a wide area. Therefore, the skin type-specific skin care device (100) of the present disclosure can select various frequencies depending on the purpose of the high-frequency irradiation, the target area, etc.

[0063] A skin care device (100) for each skin type can supply power to an electrode unit (110) including a plurality of surface electrodes positioned at a location in contact with the skin surface to irradiate high-frequency pulse shots to the skin (S).

[0064] A skin care device (100) for each skin type can transmit high-frequency energy not only to the epidermal layer (S1) of the skin (S) but also to the dermal layer (S2), and can use the heat generated by the high-frequency energy to remove damaged collagen, elastic fibers, etc. from the deep layer of the skin (S) and promote new formation. Meanwhile, the skin care device (100) for each skin type can also transmit high-frequency energy to the muscle layer (S3) of the skin (S).

[0065] A skin care device (100) for each skin type may include an electrode unit (110), a sensing unit (120), a cooling unit (130), an energy supply unit (140), and a control unit (150).

[0066] The electrode unit (110) may be in contact with the skin (S) and may include a plurality of electrodes (111) in the form of surface electrodes. Here, the plurality of electrodes (111) may include first to fifth electrodes (111a to 111e), but is not limited thereto and may be four electrodes or six or more electrodes. At this time, the shapes of the plurality of electrodes (111) may be circular, polygonal, oval, etc. In addition, the arrangement of the plurality of electrodes (111) may be formed symmetrically, but is not limited thereto and may be formed asymmetrically. Meanwhile, the first to fifth electrodes (111a to 111e) may be monopolar type surface electrodes or bipolar type surface electrodes.

[0067] The sensing unit (120) can acquire the temperature of the high-frequency irradiated area of ​​the skin (S) and transmit the acquired temperature of the high-frequency irradiated area to the processor (151). For example, the sensing unit (120) can be a temperature sensor, but is not limited thereto, and any device capable of acquiring the temperature of the skin (S) is possible.

[0068] The cooling unit (130) can cool the skin (S). At this time, the cooling unit (130) can lower the temperature of the skin (S) using refrigerant gas based on the cooling spray timing, the spray amount per cooling spray time, and the cooling spray intensity per cooling spray time.

[0069] The energy supply unit (140) can supply high-frequency energy to the electrode unit (110). At this time, the energy supply unit (140) can supply high-frequency energy to a plurality of electrodes (111) simultaneously. In addition, the energy supply unit (140) can supply high-frequency energy to a specific electrode among the plurality of electrodes (111). In addition, when the temperature of a skin area in contact with a specific electrode is higher than a preset target temperature, the energy supply unit (140) can suppress an increase in skin temperature by supplying high-frequency energy to other electrodes while avoiding the corresponding skin area. In addition, the energy supply unit (140) can supply high-frequency energy to the plurality of electrodes (111) sequentially or alternately according to the designated order of the electrodes. At this time, the energy supply unit (140) can include a switching circuit for applying high-frequency current corresponding to the high-frequency energy.

[0070] Here, the energy supply unit (140) can apply a high-frequency current corresponding to high-frequency energy to the first to fifth electrodes (111a to 111e).

[0071] In addition, the energy supply unit (140) can selectively apply a first high-frequency current corresponding to the first high-frequency energy and a second high-frequency current corresponding to the second high-frequency energy to the first to fifth electrodes (111a to 111e). At this time, the intensity of the first high-frequency current may be stronger or weaker than the intensity of the second high-frequency current.

[0072] For example, the energy supply unit (140) can apply a first high-frequency current to the first, third, and fifth electrodes (111a, 111c, 111e), and can apply a second high-frequency current to the second and fourth electrodes (111b, 111d). In addition, the energy supply unit (140) can apply a second high-frequency current to the first, third, and fifth electrodes (111a, 111c, 111e), and can apply a first high-frequency current to the second and fourth electrodes (111b, 111d).

[0073] For another example, the energy supply unit (140) can apply a first high-frequency current to the first and fifth electrodes (111a, 111e), and a second high-frequency current to the second, third, and fourth electrodes (111b, 111c, 111d). In addition, the energy supply unit (140) can apply a second high-frequency current to the first and fifth electrodes (111a, 111e), and a first high-frequency current to the second, third, and fourth electrodes (111b, 111c, 111d).

[0074] For another example, the energy supply unit (140) can apply a first high-frequency current to the first, second, fourth, and fifth electrodes (111a, 111b, 111d, and 111e), and can apply a second high-frequency current to the third electrode (111c). In addition, the energy supply unit (140) can apply a second high-frequency current to the first, second, fourth, and fifth electrodes (111a, 111b, 111d, and 111e), and can apply a first high-frequency current to the third electrode (111c).

[0075] For another example, the energy supply unit (140) can apply a first high-frequency current to the first and second electrodes (111a, 111b), and a second high-frequency current to the third, fourth, and fifth electrodes (111c, 111d, 111e). In addition, the energy supply unit (140) can apply a second high-frequency current to the first and second electrodes (111a, 111b), and a first high-frequency current to the third, fourth, and fifth electrodes (111c, 111d, 111e).

[0076] For another example, the energy supply unit (140) can apply a first high-frequency current to the first, second, and third electrodes (111a, 111b, 111c), and can apply a second high-frequency current to the fourth and fifth electrodes (111d, 111e). In addition, the energy supply unit (140) can apply a second high-frequency current to the first, second, and third electrodes (111a, 111b, 111c), and can apply a first high-frequency current to the fourth and fifth electrodes (111d, 111e).

[0077] The control unit (150) may include a memory (151) and a processor (152).

[0078] The memory (151) can store data regarding an algorithm for controlling the operation of components within the device or a program reproducing the algorithm. The processor (152) can perform the aforementioned operation using the data stored in the memory (151). Here, the memory (151) and the processor (152) can each be implemented as separate chips. Additionally, the memory (151) and the processor (152) can each be implemented as a single chip.

[0079] The memory (151) can store data supporting various functions of the device, programs for the operation of components within the device, input / output data, and a plurality of application programs (or applications) run on the device, data for the operation of the device, and commands. At least some of these application programs can be downloaded from an external server via wireless communication.

[0080] The memory (151) may include at least one type of storage medium among a flash memory type, a hard disk type, an SSD (Solid State Disk type), an SDD (Silicon Disk Drive type), a multimedia card micro type, a card type memory (e.g., SD or XD memory, etc.), a random access memory (RAM), a static random access memory (SRAM), a read-only memory (ROM), an electrically erasable programmable read-only memory (EEPROM), a programmable read-only memory (PROM), a magnetic memory, a magnetic disk, and an optical disk.

[0081] The memory (151) can store data related to skin care for each skin type, and the processor (152) can perform control operations related to skin care for each skin type.

[0082] Figure 3 is a drawing showing a skin care method for each skin type according to the present disclosure.

[0083] Referring to FIG. 3, a skin care method for each skin type may include a receiving step (S310), an extraction step (S320), a first control step (S330), a judgment step (S340), and a second control step (S350).

[0084] The receiving step (S210) can receive the impedance of the skin (S) measured based on the electrode unit (110) through the processor (151) when the electrode unit (110) is in contact with the skin (S). For example, the processor (151) can receive the impedance of the skin (S) measured based on at least one of the first to fifth electrodes (111a to 111e).

[0085] At this time, the impedance of the skin (S) represents the electrical characteristics of the skin (S) and can be affected by temperature, moisture content, and skin structure. When the temperature of the skin (S) changes, the moisture content and conductivity of the skin (S) change, which can appear as a change in the impedance of the skin (S). That is, when the temperature of the skin (S) increases, the conductivity tends to increase and the impedance of the skin (S) tends to decrease. This correlation can indirectly detect the temperature change of the skin (S) through impedance measurement. In addition, the increase in the temperature of the skin (S) affects the moisture content and structure of the skin (S), and can change the impedance of the deep skin layers (S1, S2, S3). At this time, the deep skin layers (S1, S2, S3) can react more sensitively to temperature changes than the surface, and the change in impedance can be detected through impedance measurement. Therefore, by measuring the temperature and impedance of the skin (S), the condition of the deep skin layers (S1, S2, S3) can be more precisely identified.

[0086] The extraction step (S220) can extract a skin type-specific waveform and high-frequency energy linked to the impedance of the skin (S) through the processor (151). Here, the processor (151) can identify the skin type based on the measured impedance of the skin (S) when the electrode unit (110) is in contact with the skin (S). At this time, the processor (151) can identify the skin condition by analyzing various characteristics of the skin (S), such as moisture content, elasticity, and thickness.

[0087] Here, skin types can be normal skin, dry skin, oily skin, sensitive skin, combination skin, aging skin, hyperpigmented skin, telangiectatic skin, acne skin, etc.

[0088] At this time, the type of waveform may be at least one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform.

[0089] A sine wave is a waveform that follows the shape of a sine function over time. By adjusting the frequency and amplitude, various waveform shapes can be created. These sine waves deliver gentle high-frequency energy to the skin and are particularly suitable for sensitive skin types.

[0090] A square wave is a waveform that follows the shape of a step function over time, and various waveform shapes can be created by adjusting the frequency and pulse width. These square waves are useful for high-frequency examination of deep tissues and can be applied when intense high-frequency energy delivery is required.

[0091] A triangle wave is a waveform that follows the shape of a trigonometric function over time. Various waveform shapes can be created by adjusting the frequency and peak-to-peak amplitude. This type of triangle wave is suitable for high-frequency irradiation of the middle layer of the skin and can be used for uniform heating of tissue.

[0092] Sawtooth waves are waveforms that follow a sawtooth pattern over time. Various waveform shapes can be created by adjusting the frequency and peak-to-peak amplitude. These sawtooth waves are suitable for high-frequency irradiation of superficial tissues and can rapidly deliver high-frequency energy to the outer layers of the skin.

[0093] A pulse width modulation waveform is a waveform in which the pulse width of a square wave changes over time. This pulse width modulation waveform can precisely control the intensity of high-frequency irradiation, so it can be used to suit various skin conditions and high-frequency irradiation purposes.

[0094] An impulse waveform is a waveform that exists only for a short period of time, and such an impulse waveform is used to deliver concentrated high-frequency energy to a specific area, and may be suitable for localized high-frequency irradiation.

[0095] For example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to normal skin linked to the impedance of the skin (S) and high-frequency energy corresponding to the waveform.

[0096] For another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the impedance of the skin (S) and a high frequency energy corresponding to the waveform.

[0097] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the oily skin linked to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0098] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the sensitivity of the skin (S) linked to the impedance of the skin, and high frequency energy corresponding to the waveform.

[0099] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the complex skin linked to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0100] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to aging skin linked to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0101] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the hyperpigmented skin linked to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0102] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the capillary dilation skin linked to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0103] As another example, the processor (151) can output any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to the impedance of the skin (S) and high frequency energy corresponding to the waveform.

[0104] The first control step (S330) may control the energy supply unit (140) through the processor (151) to irradiate with a waveform and high-frequency energy according to the skin type through the electrode unit (110). At this time, the processor (151) may set the type of waveform and the peak value differently according to the skin type. In addition, the processor (151) may set the type of waveform and the peak value differently according to the skin type and the irradiation purpose. In addition, the processor (151) may further set the number of times the waveform is applied and the application cycle differently according to the skin type. In addition, the processor (151) may further set the number of times the waveform is applied and the application cycle differently according to the skin type and the irradiation purpose. At this time, the irradiation purpose may be a high-frequency irradiation condition for acne suppression, elasticity improvement, and pore shrinkage.

[0105] For example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to normal skin and elasticity improvement, the peak value of the waveform, and high frequency energy corresponding to the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to normal skin and elasticity improvement, the number of times the waveform is applied, the application cycle of the waveform, and high frequency energy corresponding to the waveform.

[0106] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to dry skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application cycle of the waveform, and high frequency energy corresponding to the waveform, according to dry skin, acne suppression, and elasticity improvement.

[0107] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to oily skin, acne suppression, and elasticity improvement, the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, the number of times the waveform is applied, the application cycle of the waveform, and high frequency energy corresponding to the waveform, ...

[0108] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to sensitivity to skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, according to sensitivity to skin, acne suppression, and elasticity improvement.

[0109] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to combination skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application cycle of the waveform, and high frequency energy corresponding to the waveform, according to combination skin, acne suppression, and elasticity improvement.

[0110] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to aging skin and elasticity improvement, the peak value of the waveform, and high frequency energy corresponding to the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to aging skin and elasticity improvement, the number of times of application of the waveform, the application cycle of the waveform, and high frequency energy corresponding to the waveform.

[0111] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to the hyperpigmented skin, acne suppression, and elasticity improvement, the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, the number of times the waveform is applied, the application cycle of the waveform, and high frequency energy corresponding to the waveform, ...

[0112] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform according to the effects of capillary dilation, pore contraction, acne suppression, and elasticity improvement, the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangular wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, the number of times of application of the waveform, the application cycle of the waveform, and high frequency energy corresponding to the waveform, the waveform.

[0113] For another example, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to acne skin, acne suppression, and pore shrinkage, the peak value of the waveform, and the high frequency energy corresponding to the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate, through the electrode unit (110), any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to acne skin, acne suppression, and pore shrinkage, the number of times of application of the waveform, the application cycle of the waveform, and the high frequency energy corresponding to the waveform.

[0114] Meanwhile, the processor (151) may set the type and peak value of the waveform differently depending on the number and size of the electrode portions (111). In addition, the processor (151) may set the number of times the waveform is applied and the application cycle differently depending on the number and size of the electrode portions (111).

[0115] For example, the processor (151) can control the energy supply unit (140) through the electrode unit (110) to irradiate with one of the waveforms among a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to the two electrodes and the first size, the peak value of the waveform, and the high-frequency energy corresponding to the waveform. In addition, the processor (151) can control the energy supply unit (140) through the electrode unit (110) to irradiate with one of the waveforms among a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform set according to the two electrodes and the first size, the number of times the waveform is applied, the application period of the waveform, and the high-frequency energy corresponding to the waveform.

[0116] For another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, which are preset according to the three electrodes and the second size smaller than the first size, the peak value of the waveform, and the high-frequency energy corresponding to the waveform, through the electrode unit (110). In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, which are preset according to the three electrodes and the second size smaller than the first size, the number of times the waveform is applied, the application period of the waveform, and the high-frequency energy corresponding to the waveform, through the electrode unit (110).

[0117] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, through the electrode unit (110) according to four electrodes and a third size smaller than the second size. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application period of the waveform, and high frequency energy corresponding to the waveform, through the electrode unit (110) according to four electrodes and a third size smaller than the second size.

[0118] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to a fourth size smaller than the third size and five electrodes through the electrode unit (110), a peak value of the waveform, and a high-frequency energy corresponding to the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to a fifth size smaller than the fourth size and five electrodes through the electrode unit (110), a number of times of applying the waveform, an application period of the waveform, and a high-frequency energy corresponding to the waveform.

[0119] The judgment step (S340) can determine, through the processor (151), whether the temperature of the skin (S) is not a preset target temperature. The second control step (S350) can control, through the processor (151), the cooling unit (130) to lower the temperature of the skin (S) to the target temperature if the temperature of the skin (S) is not a preset target temperature. For example, the cooling unit (130) can perform a cooling operation if the temperature of the skin (S) is higher than the target temperature of 38.5 degrees. At this time, the processor (151) can determine the intensity and duration of the cooling according to the temperature of the skin (S) and the high-frequency irradiation area.

[0120] For example, if the impedance of the skin (S) is not a preset target impedance and the temperature of the skin (S) is not a target temperature, the processor (151) may further control the cooling unit (130) according to at least one of the preset cooling spray time, the spray amount per cooling spray time, and the cooling spray intensity per cooling spray time.

[0121] As another example, if the impedance of the skin (S) is not a preset target impedance and the temperature of the skin (S) is not a target temperature, the processor (151) may further control the cooling unit (130) according to at least one of the preset cooling spray time points, the spray amount per each cooling spray time, and the cooling spray intensity per each cooling spray time for each layer (S1, S2, S3) of the skin (S). For example, the processor (151) may control the cooling unit (130) according to the preset cooling spray time points, the spray amount per each cooling spray time, and the cooling spray intensity per each cooling spray time corresponding to the epidermal layer (S1). As another example, the processor (151) may control the cooling unit (130) according to the preset cooling spray time points, the spray amount per each cooling spray time, and the cooling spray intensity per each cooling spray time corresponding to the dermal layer (S2). As another example, the processor (151) can control the cooling unit (130) according to each preset cooling spray time point, each cooling spray time-based spray amount, and each cooling spray time-based cooling spray intensity, corresponding to the muscle layer (S3).

[0122] Meanwhile, the skin type-specific skin care method of the present disclosure may further include a first display step (S311), a second display step (S331), a third display step (S341), and an identification step (S342).

[0123] The first display step (S311) can display the impedance of the skin (S) on the display unit through the processor (151). The second display step (S331) can display waveform setting information including at least one of the waveform type, peak value, number of application times, and application cycle, and feedback information on the irradiation result of high-frequency energy on the display unit through the processor (151). For example, the feedback information on the irradiation result of high-frequency energy can be the intensity of the irradiated high-frequency energy, the linearity of the irradiated high-frequency energy, the continuity of the irradiated high-frequency energy, etc.

[0124] The third display step (S341) may display the temperature of the skin (S) on the display unit through the processor (151). The identification step (S342) may further display or notify of an abnormal situation in the temperature of the skin (S) through the display unit or the notification unit if the temperature of the skin (S) is not the target temperature through the processor (151). In addition, the identification step (S342) may further display or notify of an abnormal situation in the impedance of the skin (S) through the display unit or the notification unit if the impedance of the skin (S) is not the preset target impedance through the processor (151).

[0125] Meanwhile, if the temperature of the skin surface rises, the patient may feel pain.

[0126] Accordingly, the skin type-specific skin care device (100) of the present disclosure can deliver sufficient energy to the deep skin while minimizing temperature rise on the skin surface by controlling the intensity of the high-frequency energy provided for each pulse shot. For example, the skin type-specific skin care device (100) of the present disclosure can irradiate multiple pulse shots within a single cycle using a dielectric electrode-based electrode unit (110).

[0127] FIG. 4 is a diagram showing an example of a process for controlling a waveform and high-frequency energy for each skin type in each pulse shot section through the processor of FIG. 1.

[0128] Referring to FIG. 4, the energy supply unit (140) may further supply a waveform and high-frequency energy according to skin type to the electrode unit (110) during a preset high-frequency irradiation cycle. For example, the skin type may be normal skin, dry skin, oily skin, sensitive skin, combination skin, aging skin, hyperpigmented skin, telangiectasia skin, acne skin, etc. In addition, the type of waveform may be at least one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform. Here, the energy supply unit (140) may supply high-frequency energy to the electrode unit (110) during a preset high-frequency irradiation cycle (t1 to t2). At this time, the high-frequency irradiation cycle (t1 to t2) may be a time for performing high-frequency irradiation and may be a period corresponding to a single high-frequency irradiation.

[0129] The processor (151) may further divide the high-frequency irradiation cycle (t1 to t2) into a plurality of pulse shot sections (ta to tc). In this case, the present disclosure illustrates the plurality of pulse shot sections as three sections, but is not limited thereto and may include two sections or four or more sections.

[0130] The processor (151) may further control the energy supply unit (140) to adjust the waveform and high-frequency energy according to skin type for each pulse shot section (ta to tc).

[0131] For example, the processor (15) can control the energy supply unit (140) to uniformly irradiate a skin type-specific waveform and high-frequency energy throughout the pulse shot section (ta to tc).

[0132] For example, the processor (15) can control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to normal skin and improved elasticity, throughout the pulse shot section (ta to tc). In addition, the processor (151) can control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application period of the waveform, and high frequency energy corresponding to the waveform, according to normal skin and improved elasticity, throughout the pulse shot section (ta to tc).

[0133] For another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc) according to dry skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times the waveform is applied, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0134] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc) according to oily skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0135] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc) according to sensitivity, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0136] For another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc) according to combination skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0137] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to aging skin and elasticity improvement, a peak value of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to aging skin and elasticity improvement, a number of times of application of the waveform, an application period of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0138] For another example, the processor (151) may control the energy supply unit (140) to irradiate with any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to hyperpigmented skin, acne suppression, and elasticity improvement, throughout the pulse shot section (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate with any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0139] For another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, in accordance with capillary dilation skin, pore contraction, acne suppression, and elasticity improvement, throughout the pulse shot section (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, in accordance with capillary dilation skin, pore contraction, acne suppression, and elasticity improvement, throughout the pulse shot section (ta to tc).

[0140] As another example, the processor (151) may control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high frequency energy corresponding to the waveform, according to acne skin, acne suppression, and pore shrinkage, throughout the pulse shot section (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate with one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application, an application cycle of the waveform, and high frequency energy corresponding to the waveform, throughout the pulse shot section (ta to tc).

[0141] As another example, the processor (15) can control the energy supply unit (140) to irradiate different waveforms and high-frequency energy according to skin type according to a designated section among the pulse shot sections (ta to tc).

[0142] For example, the processor (15) may control the energy supply unit (140) to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) depending on normal skin and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application period of the waveform, and high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) depending on normal skin and elasticity improvement.

[0143] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to dry skin, acne suppression, and elasticity improvement, the peak value of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to dry skin, acne suppression, and elasticity improvement, the number of times of application of the waveform, the application period of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc).

[0144] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to oily skin, acne suppression, and elasticity improvement, the peak value of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to oily skin, acne suppression, and elasticity improvement, the number of times of application of the waveform, the application period of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc).

[0145] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to sensitivity to skin, acne suppression, and elasticity improvement, depending on a designated section among the pulse shot sections (ta to tc), the peak value of the waveform, and the high-frequency energy corresponding to the waveform. In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to sensitivity to skin, acne suppression, and elasticity improvement, the number of times of application of the waveform, the application period of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc).

[0146] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to combination skin, acne suppression, and elasticity improvement, the peak value of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to combination skin, acne suppression, and elasticity improvement, the number of times of application of the waveform, the application period of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc).

[0147] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and a high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) according to aging skin and improvement in elasticity. In addition, the processor (151) may control the energy supply unit (140) to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application period of the waveform, and a high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) according to aging skin and improvement in elasticity.

[0148] For another example, the processor (151) may control the energy supply unit (140) to irradiate differently any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and a high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) according to hyperpigmented skin, acne suppression, and elasticity improvement. In addition, the processor (151) may control the energy supply unit (140) to irradiate differently any one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application cycle of the waveform, and a high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc) according to hyperpigmented skin, acne suppression, and elasticity improvement.

[0149] For another example, the processor (151) may control the energy supply unit (140) to irradiate, differently, one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to capillary dilation skin, pore contraction, acne suppression, and elasticity improvement, the peak value of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc). In addition, the processor (151) may control the energy supply unit (140) to irradiate, differently, one of a preset sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform according to capillary dilation skin, pore contraction, acne suppression, and elasticity improvement, the number of times of application of the waveform, the application cycle of the waveform, and the high-frequency energy corresponding to the waveform, depending on a designated section among the pulse shot sections (ta to tc).

[0150] For another example, the energy supply unit (140) may be controlled to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a peak value of the waveform, and a high-frequency energy corresponding to the waveform, depending on the designated section among the pulse shot sections (ta to tc) for acne skin and acne suppression and pore shrinkage. In addition, the processor (151) may be controlled to irradiate differently one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform, a number of times of application of the waveform, an application period of the waveform, and a high-frequency energy corresponding to the waveform, depending on the designated section among the pulse shot sections (ta to tc) for acne skin and acne suppression and pore shrinkage.

[0151] Fig. 5 is a drawing showing an example of a process for lowering the surface temperature of the skin through the processor of Fig. 1.

[0152] Referring to FIG. 5, the processor (151) may further control the cooling unit (130) to lower the temperature (I1, I2, I3) of the skin (S) to the target temperature (TH) when the temperature (I1, I2, I3) of the skin (S) is higher than the target temperature (TH) during at least a portion of the pulse shot interval (ta to tc). For example, the cooling unit (130) may perform a cooling operation when the temperature (I1, I2, I3) of the skin (S) is higher than the target temperature (TH) of 38.5 degrees.

[0153] At this time, the number of cooling cycles of the cooling unit (130) may be one or more. In addition, the cooling time of the cooling unit (130) may be before or after the output of high-frequency energy, and may be the time at which high-frequency energy is output.

[0154] For example, the processor (151) can control the cooling unit (130) to lower the temperature (I1) of the skin (S) to the target temperature (TH) between ta and tb. For another example, the processor (151) can control the cooling unit (130) to lower the temperature (I2) of the skin (S) to the target temperature (TH) between tb and tc. For yet another example, the processor (151) can control the cooling unit (130) to lower the temperature (I3) of the skin (S) to the target temperature (TH) between tc and t2.

[0155] Meanwhile, in the present disclosure, the input unit (160) is for receiving high-frequency irradiation information and cooling spray information according to the type, number, and size of the electrode unit (110) from the user. When the high-frequency irradiation information and cooling spray information according to the type, number, and size of the electrode unit (110) are input, the control unit (150) can control the operation of the present device so as to correspond to the high-frequency irradiation information and cooling spray information according to the type, number, and size of the electrode unit (110).

[0156] The input unit (160) may include hardware-type physical keys (e.g., buttons located on at least one of the front, rear, and side of the device, dome switches, jog wheels, jog switches, etc.) and software-type touch keys. As an example, the touch keys may be formed of virtual keys, soft keys, or visual keys displayed on a touchscreen-type display unit through software processing, or may be formed of touch keys placed on a part other than the touchscreen. Meanwhile, the virtual keys or visual keys may have various forms and be displayed on the touchscreen, and may be formed of, for example, graphics, text, icons, videos, or a combination thereof.

[0157] Meanwhile, the present disclosure can be utilized in various fields such as skin examination devices and human body examination devices in addition to skin care devices.

[0158] The present disclosure divides the high-frequency irradiation cycle into multiple sections, and supplies power to the electrode unit (110) by relatively weakening the high-frequency energy intensity for each section. Accordingly, the present disclosure can reduce skin damage and alleviate skin pain without causing a rapid increase in skin temperature.

[0159] In other words, the present disclosure can reduce skin damage by dividing the high-frequency irradiation cycle into multiple sections and supplying energy, compared to supplying intense energy to the skin all at once. Furthermore, the present disclosure can prevent rapid increases in skin temperature by controlling the energy intensity for each section, thereby alleviating skin pain.

[0160] Here, the high-frequency irradiation cycle can be set from 1 nanosecond to 1 minute, but is not limited thereto. In addition, the energy output per pulse shot can be from 0.1 to 500 watts, but is not limited thereto.

[0161] At this time, the present disclosure can supply the total output energy used in a single high-frequency irradiation cycle to the skin multiple times with pulse shots, the same as when a strong power source is supplied to the electrode unit (110) once within the high-frequency irradiation cycle. Therefore, the present disclosure can maintain the high-frequency irradiation effect on the skin excellently while preventing a rapid temperature increase in the skin.

[0162] The present disclosure can achieve a high-frequency irradiation effect by maintaining a constant high-frequency irradiation energy within a high-frequency irradiation cycle, while reducing skin temperature rise, alleviating pain, and enhancing patient comfort by irradiating multiple pulse shots within a high-frequency irradiation cycle. Furthermore, the present disclosure can effectively manage skin surface temperature, and in particular, by controlling the high-frequency energy of each pulse shot, sufficient energy can be delivered to deep skin while minimizing the temperature rise at the skin surface.

[0163] The present disclosure may irradiate pulse shots to only a specific skin area through some electrodes based on temperature changes in a high-frequency irradiated area of ​​the skin, and, if the temperature of the area is higher than a preset target temperature by some electrodes, irradiate pulse shots to other areas using other electrodes. In this case, the present disclosure may control a cooling unit (130) to lower the temperature of the skin area by some electrodes before irradiating the pulse shots by other electrodes.

[0164] The present disclosure monitors the temperature change of the entire or part of the high-frequency irradiated area of ​​the skin in real time using the sensing unit (120), and if it is higher than the preset target temperature, the scheduled cooling irradiation is ignored and the cooling unit (130) is controlled to irradiate the skin with cooling.

[0165] The present disclosure can prevent excessive temperature rise of the skin surface and more effectively alleviate pain by controlling the number and timing of cooling sprays during a high-frequency irradiation process.

[0166] The present disclosure also allows the user to finely adjust the waveform type and peak value. In this case, the waveform type can be adjusted depending on the location of the high-frequency irradiation. For example, the user can set a soft waveform for a delicate skin area. In another example, the user can set a strong waveform for an area requiring deep high-frequency irradiation. In another example, the user can set different waveforms for sensitive areas of the face and less sensitive areas of the torso.

[0167] The present disclosure can also extract high-frequency energy having a skin type-specific waveform linked to skin impedance, and an irradiation depth and intensity linked to skin impedance. Furthermore, the present disclosure can output high-frequency energy having a skin type-specific waveform linked to skin impedance, and an irradiation depth and intensity linked to skin impedance, tailored to the needs of individual patients. Thus, the present disclosure can efficiently and safely irradiate high-frequency energy to individual patients.

[0168] The present disclosure can minimize pain and protect patient safety by monitoring measured impedance and skin temperature. This disclosure can maintain patient comfort and maximize the effectiveness of high-frequency irradiation, and can monitor all risk factors that may occur during high-frequency irradiation, such as excessive heat, skin damage, and increased pain, and take appropriate measures.

[0169] The present disclosure can automatically recommend optimal pulse settings based on the type and size of the electrode used. This disclosure can optimize the use of high-frequency energy and reduce stress on the skin.

[0170] This disclosure detects abnormal impedance changes or skin temperature increases, immediately alerting the user and, if necessary, halting high-frequency energy irradiation. This disclosure prioritizes patient safety and enhances safety throughout all high-frequency energy irradiation procedures.

[0171] The present disclosure can also perform customized radiofrequency treatment based on the patient's skin type, radiofrequency treatment history, and specific radiofrequency treatment goals. This disclosure can maximize the effectiveness of radiofrequency treatment and provide optimized radiofrequency treatment results for each patient.

[0172] This disclosure may also provide feedback on the waveform settings used and the results of the radiofrequency energy examination. This disclosure allows medical professionals to continuously learn and utilize the feedback information for future radiofrequency examinations.

[0173] In this disclosure, the use of various waveforms can minimize stress on the skin and shorten recovery time after high-frequency irradiation. Furthermore, this disclosure dynamically controls the output waveform and output conditions of the high-frequency generator based on impedance values, allowing patients to receive high-frequency irradiation more comfortably.

[0174] In other words, the present disclosure can select an appropriate waveform based on the patient's skin type and condition, thereby enabling efficient high-frequency energy delivery and minimizing pain. Furthermore, the present disclosure can monitor the patient's response and skin changes during high-frequency irradiation and adjust the waveform as needed to optimize the high-frequency irradiation effect and minimize pain. At this time, a soft waveform can be applied to sensitive skin types, while an enhanced waveform can be applied to areas requiring strong high-frequency irradiation. For example, for wrinkle improvement, a waveform that requires high-frequency irradiation of deep tissues can be selected, while for pigmentation treatment, a waveform that affects superficial tissues can be selected.

[0175] The present disclosure can also dynamically control the injection of cooling gas from the cooling unit through real-time monitoring of impedance and skin temperature. This disclosure can reduce pain that may occur during high-frequency irradiation and enhance patient safety. Furthermore, by precisely determining the timing of the injection of cooling gas, the present disclosure can prevent excessive skin heating and maintain patient comfort.

[0176] The present disclosure, based on measurements of impedance and skin temperature, enables precise monitoring of skin condition during high-frequency irradiation. This disclosure enables cooling control that takes into account even the deep layers of the skin during high-frequency irradiation, thereby improving the stability and efficiency of high-frequency irradiation. In other words, the real-time monitoring of impedance and skin temperature in the present disclosure enables immediate detection of changes in skin condition during high-frequency irradiation. Therefore, the present disclosure can quickly detect skin overheating or other potential risks during high-frequency irradiation and implement appropriate cooling control.

[0177] The present disclosure can enhance the customization and precision of high-frequency irradiation by adjusting the parameters of the high-frequency irradiation based on skin temperature and impedance data. This disclosure can provide appropriate cooling to each layer of the skin and improve the stability and efficiency of high-frequency irradiation.

[0178] The present disclosure can further adjust the irradiation time and intensity of high-frequency energy based on real-time measured skin impedance. Furthermore, the present disclosure can estimate skin moisture content based on the measured skin impedance value, and adjust the high-frequency irradiation energy accordingly.

[0179] The present disclosure may automatically activate a cooling function when the skin temperature is higher than a preset target temperature. The present disclosure may also provide a notification to the user when the cooling function is activated.

[0180] The present disclosure can detect in real time any abnormal conditions that may occur during skin care and warn the user.

[0181] The present disclosure can also determine optimal radiofrequency energy irradiation conditions by combining skin temperature measurement and skin impedance measurement functions. At this time, the present disclosure can also select various radiofrequency energy irradiation patterns through a user interface. Furthermore, the present disclosure can also allow a user to preset different radiofrequency energy irradiation patterns according to their skin type. At this time, the present disclosure can store the radiofrequency energy irradiation patterns preset by the user and quickly retrieve them when needed. Furthermore, the present disclosure can optimize the user interface so that the user can easily select a radiofrequency energy irradiation pattern suited to their skin type.

[0182] The present disclosure can also provide real-time analysis of the effects of the investigated high-frequency energy and provide feedback to the user. Furthermore, the present disclosure can also visually display the results of the analysis of the effects of the investigated high-frequency energy to the user.

[0183] The present disclosure can also provide a cooling pattern suitable for the skin based on its moisture content. Furthermore, the present disclosure can automatically set optimal cooling conditions based on the skin's moisture content. Furthermore, the present disclosure can automatically adjust the irradiation time and intensity of high-frequency energy based on the skin's moisture content.

[0184] The present disclosure can also change the irradiation pattern of high-frequency energy selected by the user. Furthermore, the present disclosure can analyze and adjust the skin's response based on the irradiation pattern of high-frequency energy selected by the user.

[0185] The present disclosure can also automatically adjust a skin care program based on the user's skin condition. Furthermore, the present disclosure can recommend a customized high-frequency irradiation protocol tailored to specific skin concerns based on skin temperature and impedance measurement results. Furthermore, the present disclosure can integrate the skin temperature and impedance measurement results to more accurately assess skin condition.

[0186] In the present disclosure, a skin care device for each skin type can be provided as a handpiece, and by directly integrating adjustment buttons on the handpiece, the user can directly adjust high-frequency energy or specific functions during high-frequency irradiation without touching the user interface of the main unit. In this case, the present disclosure can be configured to allow the user to conveniently operate the buttons, size, sensitivity, etc. of the handpiece. These buttons on the handpiece can adjust high-frequency energy and change functions in real time, and the user can directly operate them during high-frequency irradiation without having to return to the main unit.

[0187] At least one component may be added or deleted in accordance with the performance of the components illustrated in FIGS. 1, 2, 4, and 5. Furthermore, it will be readily apparent to those skilled in the art that the relative positions of the components may be altered in accordance with the performance or structure of the system.

[0188] Although FIG. 3 describes that multiple steps are executed sequentially, this is merely an example of the technical idea of ​​the present embodiment, and a person having ordinary skill in the technical field to which the present embodiment belongs can modify and apply various modifications and variations by changing the order described in FIG. 3 and executing it or executing one or more steps among the multiple steps in parallel without departing from the essential characteristics of the present embodiment, and therefore FIG. 3 is not limited to a chronological order.

[0189] The disclosed embodiments have been described with reference to the attached drawings as described above. Those skilled in the art will understand that the present disclosure can be implemented in forms other than the disclosed embodiments without altering the technical spirit or essential features of the present disclosure. The disclosed embodiments are illustrative and should not be construed as limiting.

Claims

1. Electrode part that comes into contact with the skin; A sensing unit that obtains the temperature of the skin; A cooling unit for cooling the above skin; An energy supply unit that supplies high-frequency energy to the electrode unit; and A processor that controls the cooling unit and the energy supply unit; The above processor, When the above electrode part is in contact with the skin, the impedance of the skin measured based on the above electrode part is received, Extracts skin type-specific waveforms and high-frequency energy linked to the impedance of the skin. Control the energy supply unit so that the skin type-specific waveform and high-frequency energy are irradiated through the electrode unit, A skin care device for each skin type, characterized in that when the temperature of the skin is not a preset target temperature, the cooling unit is controlled to lower the temperature of the skin to the target temperature.

2. In paragraph 1, A skin care device for each skin type, characterized in that the type of the waveform is at least one of a sine wave, a square wave, a triangle wave, a sawtooth wave, a pulse width modulation waveform, and an impulse waveform.

3. In paragraph 1, The above processor, A skin care device for each skin type, characterized in that the type and peak value of the waveform are set differently for each skin type.

4. In paragraph 3, The above processor, A skin care device for each skin type, characterized in that the number of times and the application cycle of the waveform are set differently for each skin type.

5. In paragraph 1, The above processor, A skin care device for each skin type, characterized in that the type and peak value of the waveform are set differently according to the skin type and investigation purpose.

6. In paragraph 5, The above processor, A skin care device for each skin type, characterized in that the number of times and the application cycle of the waveform are set differently depending on the skin type and the purpose of investigation.

7. In paragraph 1, The above processor, A skin care device for each skin type, characterized in that at least one of the impedance of the skin and the temperature of the skin is further displayed on a display unit.

8. In paragraph 7, The above processor, If the impedance of the above skin is not the preset target impedance, A skin care device for each skin type, characterized in that if the temperature of the skin is not the target temperature, an abnormal situation is further notified through a notification unit.

9. In paragraph 1, The above processor, The impedance of the above skin is not the preset target impedance, A skin care device for each skin type, characterized in that, when the temperature of the skin is not the target temperature, the cooling unit is further controlled to match at least one of a preset cooling spray time, a spray amount per cooling spray time, and a cooling spray intensity per cooling spray time.

10. In paragraph 9, The above processor, The impedance of the above skin is not the preset target impedance, A skin care device for each skin type, characterized in that, when the temperature of the skin is not the target temperature, the cooling unit is further controlled to match at least one of the cooling spray time point, the spray amount for each cooling spray time, and the cooling spray intensity for each cooling spray time set for each layer of the skin.

11. In paragraph 1, The above processor, A skin care device for each skin type, characterized in that the type and peak value of the waveform are set differently according to the number and size of the electrode parts.

12. In paragraph 11, The above processor, A skin care device for each skin type, characterized in that the number of times and the application cycle of the waveform are set differently according to the number and size of the electrode parts.

13. In paragraph 1, The above processor, A skin care device for each skin type, characterized in that it further displays waveform setting information including at least one of the type of the waveform, peak value, number of applications, and application cycle, and feedback information on the results of the investigation of the high-frequency energy on a display unit.

14. In paragraph 1, The above energy supply unit, The above electrode section supplies the skin type-specific waveform and high-frequency energy for a preset high-frequency irradiation cycle, The above processor, The above high-frequency investigation cycle is divided into multiple pulse shot sections, Further controlling the energy supply unit to adjust the waveform and high-frequency energy for each skin type for each pulse shot section; A skin care device for each skin type, characterized in that the cooling unit is further controlled to lower the temperature of the skin to the target temperature during at least a portion of the pulse shot interval.

15. In paragraph 14, The above processor, Further controlling the energy supply unit to uniformly irradiate the skin type-specific waveform and high-frequency energy throughout the pulse shot section, or A skin care device for each skin type, characterized in that the energy supply unit is further controlled to irradiate different waveforms and high-frequency energy for each skin type according to a designated section among the pulse shot sections.

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