CIS scanner-based fabric ripple and pattern alignment cutting method and cutting device

Abstract

The present application relates to a CIS scanner-based fabric ripple and pattern alignment cutting method and cutting device, and relates to the field of fabric locating-cutting. The cutting method comprises the following steps: S10, unfolding and fixing a fabric; S20, by means of a CIS scanner, acquiring an image of the fabric; S30, extracting feature points of ripples and / or patterns in the image of the fabric and, according to the feature points, identifying the fabric and locating the ripples and / or the patterns; S40, according to set fabric cut piece information and the locations of the feature points, generating cutting paths for cutting of fabric cut pieces on the fabric; and S50, on the basis of the cutting paths, performing ripple and pattern alignment cutting of the fabric cut pieces on the fabric. The present application can improve the ripple and pattern alignment precision of fabric cut pieces, and cutting efficiency. The cutting device of the present application can implement the method of the present application, so as to implement efficient ripple and pattern alignment cutting of fabric cut pieces.

Description

Fabric wave and pattern cutting method and cutting device based on CIS scanner Technical Field

[0001] The present application relates to the field of fabric positioning cutting, and more particularly to a method for fabric wave and pattern cutting based on a CIS scanner. Furthermore, the present application also relates to a device for fabric wave and pattern cutting based on a CIS scanner. Background Art

[0002] As living standards improve, people's expectations for clothing are becoming increasingly sophisticated. Beyond traditional needs for warmth and comfort, they are increasingly seeking decorative and personalized features. Ripples and patterns on clothing are crucial elements in reflecting these decorative and personalized qualities. Clothing is typically cut from fabrics with periodic, repetitive ripples and / or patterns to create panels, which are then stitched together through various processes.

[0003] To create the overall effect of ripples and patterns on clothing, in addition to selecting fabric with specific ripples and / or patterns for cutting, it is also required that the ripples and / or patterns on each fabric piece are in a predetermined position so that the ripples and / or patterns at the joints of different fabric pieces on the clothing match each other, forming a smooth transition of ripples and / or patterns, and combining to form the overall pattern of the clothing. This requires that when cutting the fabric pieces, the ripples and patterns on the fabric are cut in a symmetrical manner.

[0004] Because fabric is soft and easily stretched and folded, it is difficult to form a fixed, standard flat state on a cutting table. Therefore, it is difficult to achieve the alignment of fabric pieces on the fabric by manually positioning the cutting template. Existing methods for cutting fabric pieces by aligning the pattern on the fabric typically use a projection system to project a set cutting template onto the fabric. The operator moves the projection position and adjusts the positioning of the fabric on the cutting table so that the ripples and / or patterns on the fabric coincide with the ripples and / or patterns projected by the cutting template. A tool with automatic positioning control then cuts the fabric piece according to the contour of the cutting template. This aligning process is complex, time-consuming, and has poor positioning accuracy.

[0005] Summary of the Invention

[0006] In order to improve the efficiency of fabric wave-alignment and pattern-alignment cutting and ensure the accuracy of wave-alignment and pattern-alignment, the present application provides a fabric wave-alignment and pattern-alignment cutting method and cutting device based on a CIS scanner.

[0007] The fabric wave and pattern cutting method based on CIS scanner provided in this application adopts the following technical solutions:

[0008] A method for cutting fabric for aligning waves and patterns based on a CIS scanner comprises the following steps: S10: unfolding and fixing the fabric; S20: acquiring an image of the fabric using a CIS scanner; S30: extracting characteristic points of waves and / or patterns in the fabric image, and identifying the fabric and locating the waves and / or patterns based on the characteristic points; S40: generating a cutting path for cutting the fabric piece on the fabric based on set fabric piece information and the positions of the characteristic points; and S50: performing aligning and cutting of the fabric piece on the fabric according to the cutting path.

[0009] By adopting the above-mentioned technical solution, a CIS scanner is used to capture fabric images. The resulting images are highly stable, have minimal distortion, and are less susceptible to external light sources, enabling better visualization of the fabric's ripples and / or patterns. By locating the fabric using characteristic points of the ripples and / or patterns, the tilt and stretch of the fabric at different locations can be detected, eliminating the need to adjust the fabric's position and tension, enabling automatic adjustment of the fabric's tilt and stretch. By comparing fabric piece information with the actual positions of characteristic points on the fabric, the offset of the corresponding fabric position can be determined. Based on this offset, the contour boundaries of the fabric piece can be adjusted to produce a cutting path corresponding to the fabric's actual fixed position.

[0010] In a specific possible implementation manner, in step S10, the fabric is fixed by applying negative pressure suction at a plurality of scattered positions below the fabric.

[0011] By adopting the above technical solution, the fabric can be conveniently fixed on the cutting workbench by utilizing negative pressure suction at multiple scattered positions under the fabric, and the fabric can be conveniently released from fixation, thereby improving the fabric cutting efficiency.

[0012] In a specific embodiment, in step S50, the density of applying negative pressure suction in the fabric cutting area is increased to improve the fixing strength of the fabric in the cutting area.

[0013] By adopting the above technical solution and utilizing the method of increasing the density of negative pressure suction applied in the fabric cutting area, the fixing force of the cutting area can be enhanced, so that the fabric in the cutting area is firmly fixed on the cutting workbench, preventing the cutting force of the cutting tool from causing the local position of the fabric to shift.

[0014] In a specific possible implementation, in step S20, the images acquired by different photoelectric conversion heads in the CIS scanner are preprocessed so that the images acquired by different photoelectric conversion heads have the same brightness and the same hue.

[0015] By adopting the above technical solution and utilizing a method for preprocessing images acquired by different photoelectric conversion heads, it is possible to reduce the impact of hardware differences between different photoelectric conversion heads in a CIS scanner on the brightness and hue of the scanned image, improve the consistency of the overall fabric image imaging conditions, and improve the accuracy and consistency of the extracted feature points of the ripples and / or patterns on the fabric.

[0016] In a specific possible implementation scheme, the method of step S30 includes the following steps: S301: extracting feature points of ripples and / or patterns in the fabric image; S302: retrieving fabrics having the feature points from a fabric library stored in a storage unit, and if a fabric having the feature points is retrieved, obtaining feature parameters of the feature points stored in the fabric library, and then performing the operation of step S304; S303: identifying the fabric according to the feature points, calibrating the feature parameters of the feature points, and adding the identification, feature points and feature parameter information of the fabric to the fabric library in the storage unit; S304: determining the actual position of the ripples and / or patterns on the fabric.

[0017] By adopting the above technical solution, the fabric library stored in the storage unit can be used to conveniently obtain fabric feature parameters, reducing the amount of information processing required during fabric cutting, improving the timeliness of system response and cutting efficiency. By using the extracted feature point information to identify the fabric, a correspondence between the feature points and the fabric can be established, allowing for rapid fabric positioning based on the feature points. By adding information such as fabric feature points and feature parameters to the fabric library in the storage unit, an information archive of all used fabrics can be established in the storage unit, facilitating clothing design and the setting of fabric piece information, while also reducing the amount of information processing required during fabric cutting.

[0018] In a specific possible implementation scheme, in step S40, the fabric piece information includes the contour line of the fabric piece and the characteristic point positions of the corrugations and / or patterns on the fabric piece; the method for producing the cutting path of the fabric is to adjust the contour line of the fabric piece according to the actual positions of the corrugations and / or patterns on the fabric and the characteristic parameters of the characteristic points to obtain the cutting path of the fabric.

[0019] By adopting the above technical solution, by aligning and comparing the characteristic point positions of the corrugations and / or patterns on the fabric piece with the characteristic point positions of the corrugations and / or patterns on the fabric, the torsion and stretching amplitudes at different positions on the fabric can be obtained, and the contour lines of adjacent positions can be adjusted according to the torsion and stretching amplitudes. In this way, the cutting path of the fabric piece can be accurately obtained without adjusting the fixed position of the fabric. By cutting the fabric through the cutting path, a fabric piece that meets the set requirements for corrugation and pattern can be obtained.

[0020] The fabric wave and pattern cutting device based on the CIS scanner provided in this application adopts the following technical solutions:

[0021] A fabric aligning and pattern cutting device based on a CIS scanner comprises a feeding unit, a CIS scanner, an information processing unit and a cutting unit, wherein the feeding unit is capable of conveying the fabric and unfolding and fixing it on a cutting workbench, and the cutting unit comprises a longitudinal movable frame, a transverse cutting seat and a rotary cutting knife, the longitudinal movable frame is mounted on the cutting workbench and is capable of longitudinally moving along the cutting workbench under the drive of a longitudinal drive device, the transverse cutting seat is mounted on the longitudinal movable frame and is capable of transversely moving along the longitudinal movable frame under the drive of a transverse drive device, the rotary cutting knife is mounted on the transverse cutting seat, and the CIS scanner is mounted on the longitudinal movable frame, the information processing unit is electrically connected to the feeding unit, the CIS scanner and the cutting unit, so as to be able to control the cutting unit to perform aligning and pattern cutting of fabric pieces on the fabric according to the corrugation and / or pattern images on the fabric acquired by the CIS scanner.

[0022] By adopting the above technical solution, using a CIS scanner installed on a longitudinal movable frame, it is possible to conveniently obtain an image of the fabric fixed on the cutting workbench without relying on external power supply lighting, thereby reducing the imaging distortion of the fabric image and improving the clarity and stability of the image. By utilizing the longitudinal movement of the longitudinal movable frame and the lateral movement of the lateral cutting seat, a multi-directional composite motion of the rotary cutting knife can be formed on the plane of the cutting workbench, and through the rotation of the rotary cutting knife, a free cut is formed on the fabric in which the feed direction of the cutting knife is consistent with the direction of the cutting trajectory. By utilizing the information processing unit, it is possible to find a portion of the fabric image that is consistent with the set corrugation and / or pattern features on the fabric piece, and control the rotary cutting knife to cut a fabric piece on the fabric with the corrugation and / or pattern features that meet the set requirements, thereby achieving the wave and pattern cutting of the fabric piece.

[0023] In a specific embodiment, the CIS scanner includes a plurality of photoelectric conversion heads, and the plurality of photoelectric conversion heads are arranged along the length direction of the CIS scanner.

[0024] By adopting the above technical solution and utilizing multiple photoelectric conversion heads arranged along the length direction of the CIS scanner, it is possible to significantly expand the scanning range of the CIS scanner while maintaining the original scanning resolution of the photoelectric conversion heads, thereby achieving full coverage of the wide width of the fabric and improving the pixel resolution of the fabric image.

[0025] In a specific possible implementation scheme, the fabric wave and pattern cutting device based on the CIS scanner of the present application also includes an external storage unit, which is electrically connected to the information processing unit. The information processing unit can extract the characteristic points of the ripples and / or patterns on the fabric from the image information of the fabric obtained by the CIS scanner, and calibrate the characteristic parameters of the characteristic points, and save them in the external storage unit to form a fabric library; the storage unit includes local storage and cloud storage, so that the cloud storage can be used to save the fabric library, and the local storage can be used to save the information in the fabric library that has been used recently.

[0026] By adopting the above technical solution, an external storage unit can be used to store a fabric library of used fabric feature information, thereby enabling rapid acquisition of fabric feature information from the fabric library, thereby improving the response speed of the CIS scanner-based fabric alignment and pattern cutting device of the present application. By combining the local storage of the external storage unit with cloud storage, the rapid response capability of local storage can be utilized to further improve the acquisition speed of feature information of commonly used fabrics and the alignment and pattern speed of fabric cut pieces on the fabric. By utilizing the large capacity and sharing nature of cloud storage, more fabric feature information can be stored, reducing the cost of setting up local storage, and enabling the sharing of fabric feature information between different fabric alignment and pattern cutting devices, thereby reducing the computational burden of the information processing unit.

[0027] In a specific possible implementation scheme, the feeding unit includes a feeding roller, a feeding belt and a fabric clamping device, the feeding roller is arranged at both ends of the cutting workbench in the longitudinal direction, the feeding belt is wrapped around the feeding roller, and can move on the cutting workbench as the feeding roller rotates, and the fabric clamping device is arranged on the longitudinal movable frame, and can clamp the feeding belt and the fabric located on the feeding belt.

[0028] By adopting the above technical solution, the feed belt is arranged on the feed roller, which facilitates the movement of the feed belt on the cutting workbench, thereby facilitating the movement of the fabric with the feed belt and the unrolling of the fabric on the cutting workbench. By using the fabric clamping device to clamp the feed belt and the fabric on the feed belt, the movement of the feed belt can be driven by the movement of the longitudinal movable frame, which facilitates the accurate transmission and automatic unrolling of the fabric.

[0029] In summary, this application includes at least one of the following beneficial technical effects:

[0030] 1. Using a CIS scanner to capture fabric images can achieve images with reasonable exposure without relying on external light sources, reducing the impact of external vibrations on imaging quality. It also allows different parts of the fabric to have the same imaging angle, reducing imaging distortion caused by the imaging angle. Furthermore, by setting up multiple photoelectric conversion heads on the CIS scanner, the scanning range of the CIS scanner can be expanded, improving the pixel resolution of the fabric image and ensuring clear imaging of the ripples and / or patterns on the fabric.

[0031] 2. By extracting characteristic points of ripples and patterns from fabric images, the system can identify and locate ripples and patterns on the fabric. This facilitates the identification and comparison of periodically repeated ripples and patterns on the fabric, simplifies the image recognition and comparison algorithms, and reduces the computing power requirements of image processing components while ensuring the accuracy of ripples and patterns.

[0032] 3. By comparing the actual positions of the characteristic points on the fabric fixed to the cutting table with the characteristic point parameters set on the fabric piece, the local tilt and stretch of different parts of the fabric fixed to the cutting table can be determined. The cutting path is then adaptively adjusted to correspond to the contour of the fabric piece, reducing the impact of local fabric tilt and stretch on cutting accuracy, ensuring the correct wave and pattern cutting on the fabric, and obtaining fabric pieces that meet design requirements.

[0033] 4. By forming a higher density of negative pressure attraction points in the cutting area, the fixing strength of the fabric in the cutting area on the cutting workbench can be improved, preventing the cutting operation of the cutting tool from causing local movement of the fabric. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] FIG1 is a flowchart of an embodiment of a method for cutting fabric in accordance with a wave and pattern based on a CIS scanner of the present application.

[0035] FIG2 is a flowchart of processing waves and patterns on fabric in one embodiment of the method for cutting waves and patterns of fabric based on a CIS scanner of the present application.

[0036] FIG3 is a flowchart of an embodiment of a method for cutting fabric in accordance with a wave and pattern based on a CIS scanner according to the present application.

[0037] FIG4 is a schematic diagram of an embodiment of a fabric wave-matching and pattern-matching cutting device based on a CIS scanner of the present application.

[0038] FIG5 is a schematic diagram of another perspective of an embodiment of the fabric wave and pattern cutting device based on the CIS scanner of the present application.

[0039] FIG6 is a schematic diagram of a rotary cutting blade in an embodiment of a fabric wave and pattern cutting device based on a CIS scanner of the present application.

[0040] FIG7 is a schematic diagram of a CIS scanner in one embodiment of a fabric wave and pattern cutting device based on a CIS scanner of the present application.

[0041] Explanation of the accompanying drawings: 1. Feeding unit; 11. Feeding roller; 12. Feeding belt; 13. Fabric clamping device; 2. CIS scanner; 21. Photoelectric conversion head; 3. Information processing unit; 4. Cutting unit; 41. Longitudinal moving frame; 42. Transverse cutting seat; 43. Rotating cutting knife; 431. Rotating part; 432. Cutter driving motor; 433. Cutter transmission mechanism; 434. Rotating blade; 5. Cutting workbench. DETAILED DESCRIPTION

[0042] In this application, unless otherwise indicated, the directions or positional relationships indicated by directional terms such as "longitudinal" and "transverse" are based on the orientation or positional relationships of the CIS scanner-based fabric wave-matching and pattern cutting device during normal use. The direction indicated by the directional term "longitudinal" is the direction of fabric transport on the cutting table; the direction indicated by the directional term "transverse" is the direction perpendicular to the fabric transport direction on a horizontal plane. The description of the orientation or positional relationships of the components of the CIS scanner-based fabric wave-matching and pattern cutting device in this application is consistent with its actual installation orientation during use.

[0043] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "disposed" and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections or indirect connections through an intermediate medium; they can refer to internal communication between two components or the interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0044] The specific embodiments of the present application are described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present application and are not intended to limit the present application.

[0045] An embodiment of the fabric wave and pattern cutting method based on a CIS scanner of the present application, as shown in FIG1 and FIG3 , includes the following steps:

[0046] S10: Unfold and secure the fabric.

[0047] Fabrics are usually sold in rolls. When used, one end of the fabric is pulled out, pulled and transported to a cutting table so that the fabric is spread out and laid flat on the cutting table, and the fabric is fixed on the cutting table to facilitate image acquisition and cutting of the fabric. The fabric mentioned in this application can be a textile such as cloth, a hollow fabric such as lace, or a non-woven fabric such as a non-woven fabric. Fabric is a flexible fabric that is prone to local tensile deformation and tilt distortion during the pulling process, making it difficult to form a standard overall straight state. After the fabric is spread out on the cutting table, it can be fixed on the cutting table by methods such as negative pressure suction, local acupuncture or edge clamping to prevent the fabric from shifting during subsequent operations such as image acquisition, cutting and trimming.

[0048] S20: Acquire an image of the fabric through a CIS scanner.

[0049] A CIS scanner uses a contact image sensor. When the CIS scanner is working, the photoelectric conversion head moves across the surface of the fabric. The light source inside the photoelectric conversion head emits light that illuminates the surface of the fabric. The electrical sensor senses the light reflected from the fabric and converts it into an electrical signal containing the fabric image information, thereby obtaining an image of the fabric.

[0050] Compared with traditional CCD imaging methods, CIS scanner imaging does not require an external light source to illuminate the fabric, and does not have an optical imaging system usually composed of lenses. Therefore, the image exposure is highly uniform, the imaging stability is high, the imaging distortion is small, and the impact of external vibration on the imaging quality can be reduced.

[0051] S30: Extracting feature points of ripples and / or patterns in the fabric image.

[0052] Fabrics used to make clothing often have ripples and / or patterns. Ripple typically refers to the texture created by weaving or embossing processes, often with convex and concave lines that match the fabric's color. Patterns typically refer to stripes and patterns printed on fabric, which differ in color from the fabric's natural color but typically do not create surface convexity or concavity. A CIS scanner scans fabric, producing an image that captures both the ripples and patterns on the fabric surface. Compared to traditional CCD imaging, the image quality of ripples is superior.

[0053] Image processing software is used to process fabric images and extract characteristic points of ripples and / or patterns. These points represent points within the ripples or patterns that contain characteristic information, such as ripples of a specific shape, intersections at specific angles, ripples with specific orientations, intersections of patterns of specific colors, widths, and intersections at specific angles, and patterns of specific colors and shapes, as well as combinations thereof. Using these characteristic points on a fabric allows identification not only of different ripples and patterns, but also of different fabrics in general.

[0054] The fabric is identified and the waves and / or patterns are located based on the characteristic points.

[0055] Different fabrics often have different ripples, printed patterns, or have varying spacing and angles between the ripples and patterns. The characteristic points on a fabric's surface often represent the fabric's type, allowing fabric identification through these points. This means establishing a correspondence between these points and the fabric's type.

[0056] For a particular fabric, characteristic points have fixed positions on the fabric. Locating these points typically also determines the fabric's position. This allows for the detection of positional changes in characteristic points at different locations on the fabric, and the determination of local stretch and distortion based on local deviations.

[0057] S40: generating a cutting path for cutting the fabric piece on the fabric according to the set fabric piece information and the position of the feature point.

[0058] To create the overall ripple and pattern effects on clothing, the design of the fabric pieces requires not only the outline of the fabric pieces but also the angle and position of the ripples and patterns. To achieve the matching ripple and pattern cutting of the fabric pieces, the outline information of the fabric pieces, as well as the characteristic points of the ripples and / or patterns, are typically input into the control system to represent the desired shape and ripple pattern requirements.

[0059] The characteristic point information of the corrugations and / or patterns of the fabric pieces can be obtained by calling a database storing characteristic points of the corrugations and / or patterns of different fabrics when designing the fabric pieces, and setting the positions of the characteristic points on the fabric pieces; it can also be obtained by designing the corrugations and patterns on the fabric pieces, and extracting the contours of the fabric pieces and the characteristic points on the fabric pieces through image processing software.

[0060] The feature point information of the ripples and / or patterns of the fabric piece is compared with the actual feature point positions on the fabric. Areas on the fabric with high consistency with the feature point information of the fabric piece are identified. Local areas of the fabric piece with discrepancies in the feature point positions on the fabric are then stretched and twisted to align the positions of all feature points on the fabric piece with those on the fabric. Simultaneously, the local contour lines of the fabric piece are processed in the same manner using the same stretching and twisting amplitude ratios. The processed contour lines of the fabric piece are then used as the cutting path for cutting the fabric piece on the fabric.

[0061] S50: performing wave-matching and pattern-matching cutting of the fabric pieces on the fabric according to the cutting path.

[0062] The cutting tool is used to cut the fabric along the cutting path to obtain a fabric piece whose corrugation and / or pattern are consistent with the design requirements, thereby achieving the wave and pattern cutting of the fabric piece on the fabric.

[0063] In some embodiments of the fabric wave and pattern cutting method based on the CIS scanner of the present application, the fabric is fixed by setting multiple negative pressure attraction points under the fabric, connecting the negative pressure air source to the multiple negative pressure attraction points, and applying negative pressure to attract the fabric at the negative pressure attraction points.

[0064] Multiple negative pressure suction points are dispersed beneath the fabric, attracting and securing the fabric from multiple locations beneath it, improving the overall stability of the fabric. This method of negative pressure suction fixation can prevent the effects of fixed objects on fabric imaging and cutting.

[0065] In a preferred embodiment of the CIS scanner-based fabric wave and pattern cutting method of the present application, multiple negative pressure attraction points below the fabric are respectively connected to a negative pressure air source, and a solenoid valve is provided at each negative pressure attraction point to independently control the connection and disconnection between each negative pressure attraction point and the negative pressure air source. When cutting the fabric, the negative pressure state of each negative pressure attraction point is dynamically adjusted to increase the density of negative pressure attraction points connected to the negative pressure air source in the cutting area, thereby improving the adhesion of the fabric in the cutting area to the cutting workbench and the fixing strength of the fabric in the cutting area, thereby preventing the cutting force of the cutting tool from causing local movement of the fabric.

[0066] In some embodiments of the CIS scanner-based fabric wave and pattern cutting method of the present application, when using a CIS scanner to scan a fabric image, the CIS scanner used includes multiple photoelectric conversion heads, each of which captures an image of a partial area of ​​the fabric. The partial images captured by the multiple photoelectric conversion heads are combined to form an image of the entire fabric. Before combining the images captured by the various photoelectric conversion heads, the images captured by the different photoelectric conversion heads are preprocessed so that the images captured by the different photoelectric conversion heads have the same brightness and hue, and then the images are combined. This ensures that the brightness and hue of different parts of the fabric image are the same, and the ripples and patterns on the fabric have the same image features, ensuring that the characteristic points of the ripples and / or patterns at different locations on the fabric can be correctly extracted.

[0067] In some embodiments of the fabric wave and pattern cutting method based on a CIS scanner of the present application, as shown in FIG2 and FIG3 , in step S30, the method of extracting characteristic points of the wave and / or pattern, and identifying the fabric and locating the wave and / or pattern according to the characteristic points includes the following steps:

[0068] S301: Extracting feature points of ripples and / or patterns in a fabric image.

[0069] S302: Retrieve a fabric having the feature point from a fabric library.

[0070] The cutting device is equipped with a storage unit that stores a fabric library containing information about various fabrics identified by characteristic points. This fabric information may include the fabric name, characteristic points of the fabric's ripples and / or patterns, and characteristic parameters. Characteristic parameters refer to the distribution characteristics of characteristic points on the fabric, such as the distance of a characteristic point from the fabric edge, the spacing between adjacent characteristic points, and the length of repeats of identically located characteristic points on the fabric.

[0071] Search the fabric library for fabrics with the same feature points as the extracted feature points, and perform different operations based on different search results:

[0072] If the fabric library stores fabrics with the same characteristic points, the characteristic parameters of the fabric are directly extracted from the fabric library, and the operation of step S304 is directly performed; if the fabric library does not store fabrics with the same characteristic points, the operation of step S303 is performed.

[0073] S303: Marking the fabric according to the feature points.

[0074] The process of fabric identification is usually done manually, and specifically includes: numbering and naming the fabrics with the characteristic points according to set rules. The numbering and naming can be performed separately or combined to form a numbered name. It is usually necessary to maintain the uniqueness of the numbering and naming to ensure a one-to-one correspondence between the characteristic points and the fabric numbers and names.

[0075] Calibrate the characteristic parameters of feature points.

[0076] Determine the characteristic parameters of the fabric containing the feature point, which are composed of the distribution characteristics of the feature points. These typically include the distance of the calibrated feature point from the fabric edge, the distance between feature points, and the length between repeated feature points on the fabric. The characteristic parameters are typically the data between the feature points when the fabric is laid flat and tension-free. They are typically used as standard data, and fabric cutting information is also designed based on the standard fabric parameters. When calibrating the feature point parameters, image processing software analyzes and processes the fabric image obtained by the CIS scanner, correcting for deviations in the distance between feature points caused by fabric stretching and deflection on the cutting table, thereby forming the characteristic parameters of the fabric feature points.

[0077] The identification, characteristic points and characteristic parameter information of the fabric are added to a fabric library in a storage unit.

[0078] The fabric number, name, feature point information, feature parameters and other information are stored in the storage unit of the cutting device and added to the fabric library of the storage unit, thereby enriching the types of fabrics stored in the fabric library. When the fabric is used again in the future, the required information can be directly extracted from the fabric library, reducing the amount of computation of the image processing software and improving the efficiency of fabric wave and pattern cutting.

[0079] S304: Determine the actual position of the ripples and / or patterns on the fabric.

[0080] The actual locations of characteristic points of ripples and / or patterns on the fabric are determined in the fabric image captured by the CIS scanner. These locations represent the actual locations of the ripples and / or patterns on the fabric. The difference between the actual locations of the characteristic points and the reference locations (i.e., the characteristic parameters) can be used to determine the stretch and deflection of the fabric on the cutting table. This information can be used to adjust the cutting path, minimizing the impact of deformation during fabric expansion on the cutting result and ensuring that the fabric pieces cut from the fabric meet the design requirements.

[0081] As a specific embodiment of the CIS scanner-based fabric wave and pattern cutting method of the present application, when designing clothing, not only the contour lines of the various fabric pieces required for the clothing are designed, but also the position and arrangement of the ripples and / or patterns on the fabric pieces are designed. Specifically, the designed fabric piece information includes the contour lines of the fabric pieces and the positions of the characteristic points of the ripples and / or patterns on the fabric pieces relative to the contour lines.

[0082] The fabric piece information is input into the cutting device. When the fabric pieces are arranged on the fabric, the position where the feature points are close to the fabric piece information is found on the fabric according to certain rules. Then, the actual positions of the corrugation and / or pattern feature points on the fabric are compared with the characteristic parameters of the fabric. Based on the difference in the comparison, the direction and amplitude of the stretching and twisting of the fabric on the cutting workbench are calculated, and the design contour line of the fabric piece is adjusted accordingly to obtain the cutting path for cutting the fabric piece on the fabric according to the wave and pattern.

[0083] An embodiment of the fabric wave-matching and pattern-matching cutting device based on the CIS scanner of the present application, as shown in Figures 4 and 5, includes a feeding unit 1, a CIS scanner 2, an information processing unit 3 and a cutting unit 4, which can realize the fabric wave-matching and pattern-matching cutting method based on the CIS scanner of the present application.

[0084] The feeding unit 1 can be any device capable of conveying the fabric and unfolding it onto the cutting table 5. Usually, a conveyor belt or roller is used to extract the fabric from the fabric roll and unfold it onto the cutting table.

[0085] The cutting unit 4 includes a longitudinal movable frame 41, a transverse cutting seat 42, and a rotary cutting blade 43. The longitudinal movable frame 41 is installed on both sides of the cutting table 5, extending across the cutting table 5 from the top. In a specific embodiment, longitudinal slide rails are provided on both sides of the cutting table 5, and longitudinal sliders adapted to the longitudinal slide rails are provided at both ends of the longitudinal movable frame 41. The longitudinal movable frame 41 is installed on the cutting table 5 through the cooperation of the longitudinal sliders and the longitudinal slide rails. Longitudinal drive motors are provided at both ends of the longitudinal movable frame 41, and the longitudinal movable frame 41 can move longitudinally along the cutting table 5 under the drive of the longitudinal drive motor. The transverse cutting seat 42 is installed on the longitudinal movable frame 41 and can move back and forth transversely on the longitudinal movable frame 41 under the drive of the transverse drive motor. The rotary cutting knife 43 is installed on the transverse cutting seat 42 and can be raised and lowered on the transverse cutting seat 42 under the drive of a lifting drive mechanism, such as a lifting drive motor, a lifting hydraulic cylinder, a lifting cylinder, etc. When the rotary cutting knife 43 descends, it can cut the fabric on the cutting table 5, and when the rotary cutting knife 43 rises, it can move freely above the cutting table 5.

[0086] The structure of a rotary cutter 43 is shown in Figure 6. It includes a rotating portion 431, a driving portion, and a cutting portion. The rotating portion 431, the driving portion, and the cutting portion are arranged in sequence from top to bottom. The driving portion and the cutting portion can rotate under the drive of the rotating portion 431. The driving portion is internally provided with a cutter drive motor 432, and the cutting portion is internally provided with a cutter transmission mechanism 433. A rotating blade 434 is provided at the end of the cutting portion. The cutter transmission mechanism 433 includes multiple sets of cross-meshing gears, which can redirect the rotation of the cutter drive motor 432 and transmit it to the rotating blade 434, driving the rotating blade 434 to rotate vertically, thereby cutting the fabric below the rotary cutter 43.

[0087] The CIS scanner 2 is mounted on a longitudinal movable frame 41. Typically, a transverse cutting station 42 is mounted on one side of the longitudinal movable frame 41, and the CIS scanner 2 is mounted on the other side. The CIS scanner 2 can use a scanning width that reaches or exceeds the width of the fabric. The photoelectric conversion head 21 of the CIS scanner 2 faces the fabric and is mounted close to the fabric. As the longitudinal movable frame 41 moves longitudinally on the cutting table 5, the photoelectric conversion head 21 can move across the fabric, scanning an image of the fabric, typically encompassing the length of at least two repeating ripple and / or pattern units.

[0088] The information processing unit 3 is arranged on a side frame of the cutting workbench 5, and is connected to the feeding unit 1, the CIS scanner 2 and the cutting unit 4 through signal lines respectively. It can transmit the fabric image obtained by the CIS scanner 2 to the information processing unit 3, and the information processing unit 3 extracts the characteristic points of the ripples and / or patterns on the fabric in the image, and controls the actions of the feeding unit 1 and the cutting unit 4 according to the requirements of the fabric pieces for the contour and characteristic points, and performs wave and pattern cutting of the fabric pieces on the fabric.

[0089] In some embodiments of the CIS scanner-based fabric wave and pattern cutting device of the present application, as shown in FIG7 , a plurality of photoelectric conversion heads 21 are provided on the CIS scanner 2. Each photoelectric conversion head 21 has the same scanning resolution, and the plurality of photoelectric conversion heads 21 are arranged parallel to each other in their lengthwise directions on the same side of the CIS scanner 2. The lengthwise directions of the photoelectric conversion heads 21 are consistent with the lengthwise direction of the CIS scanner 2, and adjacent photoelectric conversion heads 21 are staggered so that the plurality of photoelectric conversion heads 21 cover the lengthwise direction of the CIS scanner 2. Typically, the plurality of photoelectric conversion heads 21 are alternately arranged on two straight lines parallel to the lengthwise direction on the side of the CIS scanner 2, and adjacent photoelectric conversion heads 21 overlap to a certain extent in the lengthwise direction of the CIS scanner 2.

[0090] The provision of multiple photoelectric conversion heads 21 expands the scanning width of the CIS scanner 2 while maintaining the original scanning resolution of the photoelectric conversion heads 21, thereby forming high-resolution images covering a wide range of fabric. This overcomes the drawback of conventional imaging, where the total number of pixels in the image remains constant, and the imaging resolution must be reduced to achieve a larger imaging range. As a result, the CIS scanner-based fabric wave and pattern cutting device of the present application can capture clearer images of waves and patterns, particularly images of waves with smaller morphological differences and patterns with smaller color differences, thereby improving the accuracy of wave and pattern feature point extraction.

[0091] In a preferred embodiment of the CIS scanner-based fabric wave-matching and pattern-matching cutting device of the present application, an external storage unit is further provided in the CIS scanner-based fabric wave-matching and pattern-matching cutting device of the present application, and the external storage unit 6 is electrically connected to the information processing unit 3. The information processing unit 3 can extract the characteristic points of the ripples and / or patterns on the fabric from the image of the fabric obtained by the CIS scanner 2, and calibrate the characteristic parameters of the characteristic points, and store them in the external storage unit to form a fabric library containing fabric information, characteristic point information and characteristic parameters. When the fabric is used again for fabric cutting, the characteristic parameters can be directly called from the fabric library according to the characteristic point information, thereby reducing the amount of calculation of the information processing unit 3 when extracting the characteristic parameters from the fabric image, and improving the response speed of the CIS scanner-based fabric wave-matching and pattern-matching cutting device of the present application.

[0092] The external storage unit 6 can also be configured as a combination of local and cloud storage. The CIS scanner-based fabric alignment and pattern cutting device of the present application is provided with local storage and cloud storage on the network. The CIS scanner-based fabric alignment and pattern cutting device of the present application is also provided with a network communication unit for connecting to the cloud storage. A fabric library containing fabric information, feature point information, and feature parameters is stored in both the local and cloud storage. The local storage is used to store newly generated fabric-related records by the information processing unit 3 and fabric-related records recently retrieved from the cloud storage; the cloud storage is used to store a complete record of all used fabrics.

[0093] After the information processing unit 3 extracts the characteristic point information of the ripples and / or patterns from the fabric image, it first retrieves the fabric information from the locally stored fabric library. If the fabric information is retrieved in the locally stored fabric library, the characteristic parameters stored in the fabric library are directly called for use, thereby utilizing the fast running speed of the local storage to improve the response speed of the information processing unit 3.

[0094] If the fabric information is not found in the local fabric library, the fabric information is retrieved from the cloud storage. Leveraging the larger storage capacity of the cloud storage, the information of all previously used fabrics can be stored, improving the fabric detection rate. If the fabric information is found in the cloud storage, the characteristic parameters stored in the fabric library are used and the fabric record information is saved in the local fabric library. If the number of fabric records in the local fabric library has reached the storage limit, the oldest record in the local fabric library is deleted and replaced with the most recently used record.

[0095] If the fabric information is not found in the cloud storage, information processing unit 3 extracts the positional information of multiple feature points on the fabric from the fabric image, selects feature points with high positional consistency, extracts characteristic parameters from these points, and after manual calibration and confirmation, stores them synchronously in the fabric library stored locally and in the cloud. Due to the high computational complexity of information processing unit 3 and the need for manual calibration and confirmation, the acquisition of characteristic parameters is slow, resulting in low processing efficiency.

[0096] Due to the high cost and low sharing of local storage, the cost of installing large local storage on each cutting device is high, and the utilization rate of the fabric information stored in the local storage fabric library is low. By storing recently used fabric information in the local storage fabric library, the fabric detection rate in the limited local storage fabric library can be improved, thereby improving the response speed and reducing the installation cost of the storage unit.

[0097] In a preferred embodiment of the CIS scanner-based fabric wave and pattern cutting device of the present application, as shown in Figures 4 and 5, the feeding unit 1 includes a feeding roller 11, a feeding belt 12 and a fabric clamping device 13.

[0098] The feed rollers 11 are arranged at both ends of the cutting table 5 in the longitudinal direction. The roller shafts of the feed rollers 11 are installed on both sides of the cutting table 5 in the transverse direction and can rotate freely on the cutting table 5. The feed belt 12 is usually made of a felt belt of a certain thickness. The feed belt 12 is wrapped around the feed roller 11, wherein the upper feed belt 12 is located on the cutting table 5 and can move on the cutting table 5 as the feed roller 11 rotates. The fabric clamping device 13 can use electric or pneumatic clamps. There are usually two fabric clamping devices 13, which are respectively fixed on the longitudinal movable frame 41, so that the feed belt 12 above the cutting table 5 and the fabric on the feed belt 12 are located in the clamping opening of the fabric clamping device 13. When the fabric needs to be transported, the fabric clamping device 13 clamps the feed belt 12 and the fabric on the feed belt 12. After the fabric is unfolded and transported to the set position on the cutting table 5 by the movement of the longitudinal movable frame 41, the fabric clamping device 13 is released. The movement of the longitudinal movable frame 41 can then drive the CIS scanner 2 to scan the fabric image, and the cutting unit 4 can be used to cut the fabric pieces in the wave and pattern alignment.

[0099] The cutting table 5 is equipped with multiple fixed air holes, evenly spaced and arranged in an array. Each fixed air hole is connected to a negative pressure mechanism via an independent solenoid valve. The feed belt 12 is made of a highly breathable material, or is provided with multiple air holes. When the valve is opened, the negative pressure mechanism draws air through the fixed air holes, securing the fabric to the feed belt 12. During fabric cutting, the density of the fixed air holes in the cutting area or the amount of air drawn in can be increased by controlling the opening and closing of the solenoid valves connected to the fixed air holes in different locations, thereby increasing the density of the fixed air holes and the amount of air drawn in. This improves the fabric's securement in the cutting area and prevents fabric movement caused by the cutting tool.

[0100] In the description of this application, reference to terms such as "one embodiment," "specific embodiment," and "preferred embodiment" means that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of this application. In this application, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0101] The above are all preferred embodiments of the present application, and are not intended to limit the scope of protection of the present application. Therefore, any equivalent changes made based on the structure, shape, and principle of the present application should be included in the scope of protection of the present application.

Claims

1. A fabric wave and pattern cutting method based on a CIS scanner, characterized in that: The steps include: S10: unfold and fix the fabric; S20: Acquire an image of the fabric through a CIS scanner; S30: extracting characteristic points of the ripples and / or patterns in the fabric image, and marking the fabric and locating the ripples and / or patterns according to the characteristic points; S40: generating a cutting path for cutting the fabric piece on the fabric according to the set fabric piece information and the position of the feature point; S50: performing wave-matching and pattern-matching cutting of the fabric pieces on the fabric according to the cutting path.

2. The method according to claim 1, characterized in that: In step S10, the fabric is fixed by applying negative pressure suction at a plurality of scattered positions below the fabric.

3. The method according to claim 2, characterized in that: In step S50, the method of increasing the density of applying negative pressure suction in the fabric cutting area improves the fixing strength of the fabric in the cutting area.

4. The method according to claim 1, characterized in that: In step S20, the images acquired by different photoelectric conversion heads in the CIS scanner are preprocessed so that the images acquired by different photoelectric conversion heads have the same brightness and the same hue.

5. The method according to claim 1, characterized in that: The method of step S30 comprises the following steps: S301: extracting characteristic points of ripples and / or patterns in the fabric image; S302: Retrieving a fabric having the feature point from a fabric library stored in a storage unit, and if a fabric having the feature point is retrieved, obtaining feature parameters of the feature point stored in the fabric library, and then performing the operation of step S304; S303: Mark the fabric according to the feature points, calibrate the feature parameters of the feature points, and Adding the identification, characteristic points and characteristic parameter information of the fabric to a fabric library in a storage unit; S304: Determine the actual position of the waves and / or patterns on the fabric.

6. The method according to claim 5, characterized in that: In step S40, the fabric piece information includes the contour line of the fabric piece and the characteristic point positions of the corrugations and / or patterns on the fabric piece; the method for producing the cutting path of the fabric is to adjust the contour line of the fabric piece according to the actual positions of the corrugations and / or patterns on the fabric and the characteristic parameters of the characteristic points to obtain the cutting path of the fabric.

7. A fabric wave and pattern cutting device based on a CIS scanner, characterized in that: The invention comprises a feeding unit (1), a CIS scanner (2), an information processing unit (3) and a cutting unit (4); the feeding unit (1) is capable of conveying fabric and unfolding and fixing the fabric on a cutting workbench (5); the cutting unit (4) comprises a longitudinal movable frame (41), a transverse cutting seat (42) and a rotary cutting knife (43); the longitudinal movable frame (41) is mounted on the cutting workbench (5) and is capable of longitudinally moving along the cutting workbench (5) under the drive of a longitudinal driving device; the transverse cutting seat (42) is mounted on the longitudinal movable frame (41); The machine is capable of moving laterally along the longitudinal movable frame (41) under the drive of a transverse driving device, the rotary cutting knife (43) is mounted on the transverse cutting seat (42), the CIS scanner (2) is mounted on the longitudinal movable frame (41), and the information processing unit (3) is electrically connected to the feeding unit (1), the CIS scanner (2) and the cutting unit (4) so ​​as to control the cutting unit (4) to perform wave and pattern matching cutting of fabric pieces on the fabric according to the wave and / or pattern images on the fabric acquired by the CIS scanner (2).

8. The fabric wave and pattern cutting device based on CIS scanner according to claim 7, characterized in that: The CIS scanner (2) comprises a plurality of photoelectric conversion heads (21), and the plurality of photoelectric conversion heads (21) are arranged along the length direction of the CIS scanner (2).

9. The fabric wave and pattern cutting device based on CIS scanner according to claim 7 or 8, characterized in that: The invention also comprises an external storage unit (6), wherein the external storage unit (6) is electrically connected to the information processing unit (3), and the information processing unit (3) is capable of extracting characteristic points of ripples and / or patterns on the fabric from the image information of the fabric acquired by the CIS scanner (2), calibrating characteristic parameters of the characteristic points, and storing them in the external storage unit to form a fabric library; the external storage unit comprises local storage and cloud storage, so that the cloud storage can be used to store the fabric library, and the local storage can be used to store recently used information in the fabric library.

10. The fabric wave and pattern cutting device based on CIS scanner according to claim 7 or 8, characterized in that: The feeding unit (1) comprises a feeding roller (11), a feeding belt (12) and a fabric clamping device (13); the feeding roller (11) is arranged at both ends of the cutting workbench (5) in the longitudinal direction; the feeding belt (12) is wrapped around the feeding roller (11) and can move on the cutting workbench (5) as the feeding roller (11) rotates; the fabric clamping device (13) is arranged on the longitudinal movable frame (41) and can clamp the feeding belt (12) and the fabric on the feeding belt (12).

Images