Temperature-resistant polymer and preparation method therefor, and use of cyclic imide diol compound

Abstract

Disclosed are a temperature-resistant polymer and a preparation method therefor, and a use of a cyclic imide diol compound, belonging to the field of macromolecular materials. The polymer comprises a segment (I) containing a cyclic imide, a segment (II) containing a cyclic compound, and an optional third segment (III); the segment (I) containing a cyclic imide can improve the heat resistance of the polymer, and the structure thereof is such that R1 is a residue of an easily cyclized dibasic acid and R2 is a residue of a diol containing an amino group. The temperature-resistant polymer of the present invention has improved heat resistance and good mechanical properties.

Description

A heat-resistant polymer and its preparation method, and application of cyclic imide diol compound Technical Field

[0001] The present invention relates to the field of polymer materials, and in particular to a temperature-resistant polymer and a preparation method thereof, and applications of a cyclic imide diol compound. Background Art

[0002] Polyester materials, such as polyethylene terephthalate (PET), are widely used in various areas of daily life due to their structural regularity and symmetry, which provide excellent mechanical properties, processing capabilities, and wear and corrosion resistance. However, polyester materials containing alkyl alcohol segments generally have poor heat resistance and cannot be used in high temperature environments.

[0003] Currently, the main method for improving the heat resistance of polyester materials is to use cyclic diols such as 1,4-cyclohexanediol to replace alkyl alcohols. However, due to the high cost and difficulty in obtaining 1,4-cyclohexanediol as a raw material, this method is costly. Moreover, modifying polyester materials with only aliphatic cyclic diols can lead to reduced mechanical properties at room temperature. Therefore, providing a polyester material with improved heat resistance and stable mechanical properties is an urgent problem to be solved. Summary of the Invention

[0004] In order to overcome the above-mentioned defects, the present invention provides a temperature-resistant polymer and a preparation method thereof, and an application of a cyclic imide diol compound to solve the problems involved in the background technology.

[0005] In a first aspect, the present invention provides a temperature-resistant polymer.

[0006] Characterized in that the polymer comprises: a segment (I) containing a cyclic imide, a segment (II) containing a cyclic compound and an optional third segment (III), wherein the segment (I) containing a cyclic imide comprises the following repeating units:

[0007] Wherein, m is any integer from 1 to 300;

[0008] R1 is a residue of an easily cyclized dibasic acid, preferably at least one of an alkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl and is interrupted by one or more O atoms, an alkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkylene group or a heterocycloalkyl group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an arylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a heteroarylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged ring group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro;

[0009] Preferably, the alkylene group in the definition of R1 is C1-C10 alkylene group, preferably C1-C6 alkylene group, more preferably C1-C5 alkylene group, and most preferably methylene, ethylene, 1-methylethylene, 1,1-dimethylethylene, 1,2-dimethylethylene, 1,1,2,2-tetramethylethylene, 1-phenylethylene, 1-benzylethylene, 1,1-diphenylethylene, 1,1-dibenzylethylene, 1,2- Diphenylethylene, 1,2-diphenylmethylethylene, propylene, 1-methylpropylene, 2-methylpropylene, 1,1-dimethylpropylene, 1,2-dimethylpropylene, 2,2-dimethylpropylene, 1,3-dimethylpropylene, 1-phenylpropylene, 2-phenylpropylene, 1,2-diphenylpropylene, 2,2-diphenylpropylene or 1,3-diphenylpropylene; the alkenylene in the definition of R1 is C2-C10 Alkenyl, preferably C2-C6 alkenylene, more preferably C2-C3 alkenylene, most preferably vinylene, 1-methylvinylene, 1,2-dimethylvinylene or propenylene; the alkylene group defined in R1, which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, is interrupted by one or more O atoms and is interrupted by 1-3 oxygen atoms, such as 2-oxa-1,3-ethylene; the cycloalkylene group defined in R1 is C3-C8 cycloalkylene, preferably C4-C6 cycloalkylene, most preferably cyclobutylene or cyclohexylene; the cycloalkenylene group defined in R1 may be C4-C8 cycloalkenylene, preferably C4-C6 cycloalkenylene, most preferably 3-cyclohexene-1,6-diyl; the arylene group defined in R1 is C6-C10 arylene, preferably phenylene, such as 1,6-phenylene; the cyclized group defined in R1 is norbornenylene;

[0010] R2 is a residue of a diol containing an amino group, preferably a trivalent alkyl group which is unsubstituted or substituted with a substituent selected from a halogen, an alkyl group or a nitro group, or at least one of a trivalent alkyl-aryl-alkyl group which is unsubstituted or substituted with a substituent selected from a halogen, an alkyl group or a nitro group;

[0011] Preferably, the trivalent alkyl-aryl-alkyl group in the definition of R2 is a trivalent C1-C10 alkyl-C6-C10 aryl-C1-C10 alkyl group, preferably a trivalent C1-C5 alkyl-C6-C8 aryl-C1-C5 alkyl group, more preferably a trivalent C1-C3 alkyl-C6-C8 aryl-C1-C3 alkyl group,

[0012] Preferably, R2 is selected from at least one of the following structures:

[0013] In the above formula, * represents the bonding site with the O atom, and ** represents the bonding site with the N atom;

[0014] Further preferably:

[0015] R1 is selected from an alkylene group having 1 to 7 carbon atoms, preferably a straight or branched alkylene group having 1, 2, 3 or 4 main chain carbon atoms, an arylene group having 6 to 12 carbon atoms, a heteroalkylene group having 5 to 11 carbon atoms, a cycloalkylene group having 3 to 12 carbon atoms, a heterocycloalkylene group having 2 to 11 carbon atoms or a combination thereof, optionally containing the following substituents: halogen, nitro, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl or C6-C12 aryl substituted with halogenated or C1-C4 alkyl, or C6-C12 aryl-C1-C4 alkyl;

[0016] R2 is selected from a linear alkylene group having 2 to 12 carbon atoms, a branched alkylene group having 3 to 12 carbon atoms, an arylene group having 6 to 12 carbon atoms, a cycloalkylene group having 3 to 12 carbon atoms, or a trivalent C1-C5 alkyl-C6-C8 aryl-C1-C5 alkyl group, optionally containing the following substituents: halogen, nitro, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl, or a halogenated or C1-C4 alkyl-substituted C6-C12 aryl-C6-C12 aryl-C1-C4 alkyl group;

[0017] The segment (II) containing a cyclic compound comprises the following repeating units:

[0018] Wherein, n is any integer from 1 to 500;

[0019] Cy is a residue of a cyclic diacid, selected from at least one of a C5-C12 arylene group, an alicyclic group, or a heterocyclic group containing at least one N, O, or S atom, which is unsubstituted or substituted by a substituent selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl; preferably, Cy is at least one of a C6-C12 arylene group, which is unsubstituted or substituted by a substituent selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl; a C5-C10 cycloalkylene group, which is unsubstituted or substituted by a substituent selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl; or a C5-C10 heteroaryl group, which is unsubstituted or substituted by a substituent selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl, which contains at least one oxygen atom;

[0020] The third segment (III) comprises the following repeating units:

[0021] Wherein, p and q are any integers from 1 to 150;

[0022] R3 is the residue of any dibasic acid, preferably the residue of a dibasic acid used for polymer synthesis, for example, the residue of the easily cyclized dibasic acid described in R1; or R3 is the residue of a dibasic acid that is not easily cyclized, for example, terephthalic acid, sebacic acid; preferably, R3 is a chemical bond, an alkylene group that is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkylene group that is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, and ... at least one of an unsubstituted alkylene group, an alkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an arylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a heteroarylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged ring group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro;

[0023] Preferably, R3 is selected from a chemical bond, a straight or branched alkylene or alkenylene group having 2 to 12 carbon atoms optionally interrupted by O atoms, an arylene group having 6 to 12 carbon atoms, a heteroarylene group having 5 to 11 carbon atoms, a cycloalkylene group, a cycloalkenyl group or a bridged cycloalkyl group having 3 to 12 carbon atoms, a heterocycloalkylene group having 2 to 11 carbon atoms, or a combination of the above groups, optionally containing the following substituents: halogen, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl or C6-C12 aryl substituted with halogenated or C1-C4 alkyl, or C6-C12 aryl-C1-C4 alkyl.

[0024] R4 is selected from C1-C12 alkylene groups, alicyclic groups, or heterocyclic groups containing at least one N, O, or S atom, which are unsubstituted or substituted by substituents selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl groups; preferably, R4 is selected from at least one of C2-C8 alkylene groups, alicyclic groups, or heterocyclic groups containing oxygen atoms, which are unsubstituted or substituted by substituents selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl groups.

[0025] In one embodiment of the present invention, the heat-resistant polymer further comprises the following repeating unit (IV):

[0026] wherein s is any integer from 1 to 50, and R1 and R2 have the meanings described above.

[0027] Furthermore, in the heat-resistant polymer, m:n is (1-99):(99-1); if the heat-resistant polymer contains a third segment (III), (p+q):(m+n) is (1-80):(99-20).

[0028] In a preferred embodiment of the present invention, R1 is selected from at least one of C1-C7 alkylene, phenylene, and cycloalkylene; preferably at least one of ethylene, propylene, butylene, pentylene, phenylene, cyclobutylene, cyclopentylene, and cyclohexylene. Ethylene and propylene are most preferred.

[0029] R2 is selected from at least one of a C2-C12 straight-chain alkyl group, a C3-C12 branched alkyl group, a C6-C12 aryl group, and a C3-C12 cycloalkyl group, preferably at least one of a propyl group, a butyl group, a pentyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.

[0030] Cy is selected from phenylene, cyclohexylene, and furylene.

[0031] R3 is at least one selected from phenylene and cyclohexylene.

[0032] R4 is at least one selected from ethylene, 1,2-dimethylenecyclohexane, 1,3-dimethylenecyclohexane, 1,4-dimethylenecyclohexane, 1,3-diyl-2,2,4,4-tetramethylcyclobutane, (3S,3AR,6R,6AR)-hexahydro-[3,2-B]furan-3,6-diyl).

[0033] In one embodiment of the present invention, the temperature resistant polymer has a 14 C / 12 C ratio; or the polymer is synthesized using monomers derived from petroleum.

[0034] Furthermore, the heat-resistant polymer of the present invention has the following performance parameters: The heat-resistant polymer has the following performance parameters: According to GB / T 19466.2-2004, the Tg of the heat-resistant polyester material is greater than 30°C, preferably greater than 50°C, 70°C, 80°C, 90°C, 100°C, or 110°C.

[0035] In one embodiment of the present invention, the heat-resistant polymer of the present invention may comprise, according to the combination of the aforementioned segments:

[0036] (1) Polyester segment containing cyclic imide (I-2):

[0037] wherein m2 is any integer from 1 to 300. R1, R2, and R3 are as defined above.

[0038] (2) Polyester segment containing cyclic compound (II-2):

[0039] wherein n2 is any integer from 1 to 500. Cy and R4 are as defined above.

[0040] (3) The third polyester segment (III-3):

[0041] wherein p2 is any integer from 1 to 150. R3 and R4 are as defined above. Preferably, R3 in Formula I-2 is the same as Cy in Formula II-2; preferably, R3 in III-3 is different from Cy in Formula II-2, or R4 in III-3 is different from R4 in Formula II-2.

[0042] In a second aspect, the present invention provides a method for preparing a heat-resistant polymer, the method comprising the steps of:

[0043] The heat-resistant polymer is obtained by esterifying or transesterifying the cyclic imide diol (V), the cyclic diacid (VI) and its esterified product or oligomer, and the optional third monomer or its oligomer (VII);

[0044] The cyclic imide diol has the following structural formula (V):

[0045] In the formula, R1 and R2 have the meanings as described above;

[0046] The cyclic diacid has the following structural formula (VI): HOOC-Cy-COOH (VI);

[0047] wherein Cy has the meaning as defined above, the ester is an ester of the cyclic diacid and a monoalkyl alcohol whose C1-C8 groups are unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, and the oligomer is a prepolymer having a degree of polymerization of 1-100 obtained by polycondensation of the cyclic diacid and a polyol whose C1-C8 groups are unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl;

[0048] The optional third monomer is selected from one or more of the following monomers (1) to (3):

[0049] (1) R1 and R2 in the formula have the meanings as described above, and the precursor or precursor composition thereof is a primary amino diol and a dibasic acid and / or an acid anhydride corresponding to the dibasic acid;

[0050] (2) HOOC-R3-COOH (Formula VII-2) and its esters or oligomers, wherein R3 has the meaning as defined above; the esters are esters of Formula VII-2 and a monoalkyl alcohol having C1-C6 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl; the oligomers are prepolymers having a degree of polymerization of 1 to 100 obtained by polycondensation of Formula VII-2 and a polyol having C1-C8 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl;

[0051] (3) HO-R4-OH (Formula VII-3), wherein R4 has the meaning as described above.

[0052] Furthermore, in the above method, the cyclic imide diol is prepared from a primary amino diol and a dibasic acid and / or its corresponding acid anhydride;

[0053] The structural formula of the primary amino diol is shown in formula (VIII):

[0054] wherein R2 has the meaning as described above; preferably, the primary amino diol is one or more of 2-amino-1,3-propanediol, 3-amino-1,2-propanediol, 2-amino-2-methyl-1,3-propanediol, 2-amino-2-ethyl-1,3-propanediol, 2-amino-1-phenyl-1,3-propanediol, 4-amino-1,2-butanediol, 3,4-dihydroxyaniline, and 4-(2-aminoethyl)benzene-1,2-ethanediol;

[0055] The structural formula of the dibasic acid is shown in Formula (IX):

[0056] H00C-R1-COOH, wherein R1 has the meaning as described above, preferably succinic acid, glutaric acid, phthalic acid, 1,2-cyclohexanedicarboxylic acid.

[0057] In a third aspect, the present invention provides a cyclic imide diol compound (V), an amide-containing diol compound (VII-1), a precursor composition of a compound of formula (V) or formula (VII-1), or a prepolymer formed from a compound of formula (V) or formula (VII-1) and a dicarboxylic acid for polymer synthesis, such as a hydroxyl-terminated or carboxyl-terminated prepolymer, in the preparation of a heat-resistant polyester material, wherein the cyclic imide diol monomer has a structural formula as shown in formula (V):

[0058] Amide-containing diol compound (VII-1)

[0059] The precursor composition is a primary amino diol and an easily cyclic dibasic acid and / or an acid anhydride corresponding to the dibasic acid, or a diol monomer containing an amide bond, wherein the primary amino diol is HOR2(NH2)OH.

[0060] Wherein, R1 and R2 are defined as above.

[0061] In a specific embodiment of the present invention, the content of the cyclic imide diol compound in the heat-resistant polyester material is 0.01-99.9%, preferably 0.01-25%, 5-80%, 10-70%, 20-50% or 75-99.9%.

[0062] Furthermore, the heat-resistant polyester material also includes a chain segment unit obtained by polymerization of a polyol, and / or a polyacid and its anhydride or ester or oligomer, wherein the polyacid has the following structural formula: HOOC-Cy-COOH (VI) or HOOC-R3-COOH (Formula VII-2); the polyol has the following structural formula: H0-R4-OH (Formula VII-3).

[0063] Among them, Cy, R 3、 R4 is as defined above.

[0064] The ester is an ester of a monoalkyl alcohol of formula (VI) or (VII-2) and C1-C8 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl; the oligomer is a prepolymer having a degree of polymerization of 1-100 obtained by condensation of a polyol of formula (VI) or (VII-2) and C1-C8 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl.

[0065] Preferably, the heat-resistant polyester material of the present invention has the following performance parameters: according to GB / T19466.2-2004, the Tg of the heat-resistant polyester material is greater than 30°C, preferably greater than 50°C, 70°C, 80°C, 90°C, 100°C, or 110°C.

[0066] The invention introduces a cyclic imide structure into the polyester material, thereby promoting the crystallization of the polyester, improving the heat resistance of the polyester material, and maintaining the stability of various mechanical properties of the polymer at room temperature. DETAILED DESCRIPTION

[0067] In the following description, numerous specific details are provided to provide a more thorough understanding of the present invention. However, it will be apparent to those skilled in the art that the present invention may be practiced without one or more of these details. In other instances, certain technical features well known in the art are not described to avoid confusion with the present invention.

[0068] The following describes the implementation of the present invention in detail with reference to the definitions of terms:

[0069] I. Diol monomers containing an imide ring structure: cyclic imide diol (V), and their synthesis

[0070] The present invention first provides a diol monomer containing an imide ring structure, wherein the monomer has the following structure:

[0071] In a specific embodiment of the present invention, the cyclic imide diol is prepared from a primary amino diol and a dibasic acid and / or its corresponding anhydride, and the definitions of R1 and R2 are as described above.

[0072] Preferably, the reaction temperature is determined according to the physicochemical properties of the raw materials and the common technical knowledge in the field. For example, considering the melting points of different dibasic acids, the reaction temperature can be 70-230°C, 80-200°C, 90-160°C, 100-140°C, 110-120°C, etc.

[0073] Preferably, the reaction time is determined according to common technical knowledge in the art to maximize the yield of formula (V), such as 1-24 h, 2-15 h, 3-12 h, 4-8 h, 5-6 h, etc.

[0074] The cyclic imide diol (V) obtained is preferably selected from the following structures:

[0075] II. Heat-Resistant Polymers Containing Diol Monomer Segments Containing Imide Ring Structures and Their Synthesis

[0076] In one embodiment, the polymer comprises: a segment (I) containing a cyclic imide, a segment (II) containing a cyclic compound, and optionally a third segment (III) and optionally other segments (IV).

[0077] In one embodiment of the present invention, the cyclic imide-containing segment (I) comprises a segment obtained by polymerization of the aforementioned cyclic imide diol (V):

[0078] Preferably, m is any integer from 1 to 150, preferably any integer from 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0079] Preferably, the molar percentage of the cyclic imide segment (I) in the temperature-resistant polymer is 0.1-99%, preferably 1%, 5%, 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80%, 90%.

[0080] In one embodiment of the present invention, the segment (II) containing a cyclic compound is a segment obtained by polymerization of a cyclic diacid HOOC-Cy-COOH (VI) monomer or its ester, or its oligomer:

[0081] Preferably, n is any integer from 1 to 150, preferably any integer from 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0082] Preferably, the molar percentage of the segment (II) containing the cyclic compound in the temperature-resistant polymer is 10-99.9%, preferably 20%, 30%, 40%, 50%, 60%, 70%, 80%, 90%.

[0083] Preferably, the cyclic diacid (VI) is selected from the following structures:

[0084] Preferably, the ester of cyclic diacid (VI) is selected from the reaction product of cyclic diacid (VI) and at least one of ethanol, 1-propanol, 2-propanol, 1-butanol and 2-butanol.

[0085] Preferably, the oligomer of cyclic diacid (VI) is selected from the reaction product of cyclic diacid (VI) and at least one of ethylene glycol, propylene glycol, butanediol, cyclopentanediol, and cyclohexanediol.

[0086] In one embodiment of the present invention, the third segment (III) is a segment obtained by polymerization of any dibasic acid HOOC-R3-COOH (Formula VII-2) and its esters or oligomers:

[0087] and / or a segment obtained by polymerization of any diol HO-R4-OH (Formula VII-3):

[0088] Preferably, p and q are any integers of 1-150, preferably any integer of 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0089] Preferably, the molar percentage of the third segment (III) in the temperature-resistant polymer is 1-80%, preferably 10%, 20%, 30%, 40%, 50%, 60%, or 70%.

[0090] Preferably, HOOC-R3-COOH (Formula VII-2) is selected from oxalic acid, phthalic acid, isophthalic acid, terephthalic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, and 1,4-cyclohexanedicarboxylic acid.

[0091] In one embodiment of the present invention, the other segment (IV) is a product of the reaction of a primary amino diol with a dibasic acid and / or an acid anhydride corresponding to the dibasic acid (without forming an imide ring):

[0092] The polymerized segments:

[0093] Preferably, s is any integer from 1 to 150, preferably any integer from 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0094] Preferably, the molar percentage of the other segment (IV) in the temperature-resistant polymer is 0-40%, preferably 1%, 10%, 20%, or 30%.

[0095] Preferably, the aforementioned primary amino diol is one or more of 2-amino-1,3-propanediol, 3-amino-1,2-propanediol, 2-amino-2-methyl-1,3-propanediol, 2-amino-2-ethyl-1,3-propanediol, 2-amino-1-phenyl-1,3-propanediol, 4-amino-1,2-butanediol, 3,4-dihydroxyaniline, and 4-(2-aminoethyl)benzene-1,2-ethanediol.

[0096] Preferably, the aforementioned dibasic acid is selected from the group consisting of succinic acid, glutaric acid, adipic acid, pimelic acid, glutaric acid, cyclohexanedicarboxylic acid, and phthalic acid.

[0097] Preferably, m:n in the temperature-resistant polymer is (1-99):(99-1), preferably (1-75):(75-1), (1-50):(50-1), (1-25):(25-1), (1-10):(10-1), (1-2):(2-1).

[0098] If the heat-resistant polymer contains a third segment (III), (p+q):(m+n) is (1-80):(99-20), preferably (5-60):(95-40), (10-40):(90-60), (20-30):(80-70).

[0099] In one embodiment of the present invention, the heat-resistant polymer of the present invention may comprise, according to the combination of the aforementioned segments:

[0100] (1) Polyester segment containing cyclic imide (I-2):

[0101] wherein m2 is any integer from 1 to 300. R1, R2, and R3 are as defined above.

[0102] Preferably, m2 is any integer of 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0103] Preferably, the molar percentage of the polyester segment (I-2) containing cyclic imide in the temperature-resistant polymer is 0.1-99%, preferably 1%, 5%, 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80%, 90%.

[0104] In one embodiment of the present invention, the heat-resistant polymer of the present invention may comprise, according to the combination of the aforementioned segments:

[0105] (2) Polyester segment containing cyclic compound (II-2):

[0106] wherein n2 is any integer from 1 to 500. Cy and R4 are as defined above.

[0107] Preferably, n2 is any integer of 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0108] Preferably, the molar percentage of the polyester segment (II-2) containing a cyclic compound in the temperature-resistant polymer is 10-99.9%, preferably 20%, 30%, 40%, 50%, 60%, 70%, 80%, 90%.

[0109] In one embodiment of the present invention, the heat-resistant polymer of the present invention may comprise, according to the combination of the aforementioned segments:

[0110] (3) The third polyester segment (III-3):

[0111] wherein p2 is any integer from 1 to 150. R3 and R4 are as defined above, and R3 and Cy are different.

[0112] Preferably, p2 is any integer of 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, or 140.

[0113] Preferably, the molar percentage of the third polyester segment (III-3) in the temperature-resistant polymer is 1-80%, preferably 10%, 20%, 30%, 40%, 50%, 60%, or 70%.

[0114] In a specific embodiment of the present invention, the temperature for preparing the heat-resistant polymer is determined according to the physical and chemical properties of the raw materials and the general technical knowledge of esterification reactions in the art. For example, the reaction temperature can be 100-300°C, 120-260°C, 150-230°C, 180-200°C, etc.

[0115] Preferably, the reaction time for preparing the heat-resistant polymer is determined according to the polymer conversion rate required and based on common technical knowledge in the art, such as 1-24 h, 2-15 h, 3-12 h, 4-8 h, 5-6 h, etc.

[0116] The heat-resistant polymer of the present invention has good heat resistance, specifically, it can be reflected in having an increased glass transition temperature (Tg). The increased Tg means that the Tg of the heat-resistant polymer of the present invention after copolymerization with the addition of the cyclic imide diol monomer is increased relative to the polymer without the cyclic imide diol repeating unit, and specifically can be increased by 1-100%, 5-75%, 10-50%, 15-30%, or 20-25%. Based on this, depending on the type of material, the heat-resistant polymer of the present invention can have a Tg greater than 30°C, 50°C, 70°C, 80°C, 90°C, 100°C, or 110°C, and the upper limit of Tg can be any value, preferably less than 300°C, 250°C, 200°C, 150°C, 120°C, etc.

[0117] III. Technical Terms

[0118] The structural unit, also known as the monomer unit, is the smallest indivisible structural unit included in the polymer. It has the same structure as the monomer except for the functional group that undergoes polymerization. In a binary copolymer, two different structural units are contained and can be divided into random copolymers, alternating copolymers or block copolymers, etc. The polymer of the present invention is preferably a random copolymer.

[0119] Amino-containing diols

[0120] The amino-containing diol in the present invention has the following structure: OH-R2(NH2)-OH. The amino-containing diol can be selected from an alkanediolamine that is unsubstituted or substituted with a substituent selected from a halogen, alkyl, or nitro group, or an alkyl-aryl-alkanediolamine that is unsubstituted or substituted with a substituent selected from a halogen, alkyl, or nitro group. Preferably, the amino-containing diol can be selected from at least one of 3-amino-1,2-propylene glycol, 2-amino-1,3-propylene glycol, 2-amino-1,3-butanediol, 2-amino-1,4-butanediol, 2-amino-1,5-pentanediol, 3-amino-1,5-pentanediol, 5-amino-1,3-benzenedimethanol, and 2-amino-1,3-phenylenedimethanol.

[0121] Dicarboxylic acid HOOC-R1-COOH that is easily cyclized

[0122] The HOOC-R1-COOH is a dicarboxylic acid that readily cyclizes, i.e., a dicarboxylic acid that readily forms a cyclic anhydride in the absence of a catalyst or under catalytic conditions. Dicarboxylic acids that readily cyclize are known to those skilled in the art, for example, see CN110790906B. HOOC-R1-COOH may be selected from an alkanedicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkanedicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl and is interrupted by one or more O atoms, an alkenedicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen or alkyl, a cycloalkanedicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkenedicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an aromatic dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged cyclic dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro. Preferably, HOOC-R1-COOH can be selected from at least one of succinic acid, 2-methylsuccinic acid, 2-phenylsuccinic acid, 2-benzylsuccinic acid, 2,2-dimethylsuccinic acid, 2,3-dimethylsuccinic acid, 2,3-diphenylsuccinic acid, 1,2-cyclobutanedicarboxylic acid, 2,2,3,3-tetramethylsuccinic acid, methylmaleic acid, dimethylmaleic acid, phthalic acid, hexahydrophthalic acid, norbornenic acid, tetrahydrophthalic acid, glutaric acid, 2-methylglutaric acid, 3-methylglutaric acid, 3-phenylglutaric acid, 2,2-dimethylglutaric acid, 3,3-dimethylglutaric acid, diglycolic acid, 2,3-furandicarboxylic acid, 3,4-furandicarboxylic acid, 2,3-pyridinedicarboxylic acid, and 3,4-pyridinedicarboxylic acid. The cyclic anhydride of HOOC-R1-COOH can be preferably selected from succinic anhydride, 2-methylsuccinic anhydride, 2-phenylbutyric anhydride, 2-benzylsuccinic anhydride, 2,2-dimethylsuccinic anhydride, 2,3-dimethylsuccinic anhydride, 2,3-diphenylsuccinic anhydride, 1,2-cyclosuccinic anhydride, 2,2,3,3-tetramethylsuccinic anhydride, methylmaleic anhydride, dimethylmaleic anhydride, phthalic anhydride At least one of dihydrophthalic anhydride, hexahydrophthalic anhydride, nadic anhydride, tetrahydrophthalic anhydride, glutaric anhydride, 2-methylglutaric anhydride, 3-methylglutaric anhydride, 3-phenylglutaric anhydride, 2,2-dimethylglutaric anhydride, 3,3-dimethylglutaric anhydride and diglycolic anhydride, 2,3-furandicarboxylic anhydride, 3,4-furandicarboxylic anhydride, 2,3-pyridinedicarboxylic anhydride and 3,4-pyridinedicarboxylic anhydride.

[0123] Dicarboxylic acids for polymer synthesis

[0124] The dicarboxylic acid used for polymer synthesis in the present invention can be used for the synthesis of polymer main structural units, and can also be used to promote the synthesis of biodegradable structural units. When used to promote the synthesis of biodegradable structural units, that is, HOOC-R3-COOH defined in the present invention, it can be any dicarboxylic acid different from HOOC-R2-COOH, for example, it can be the easily cyclized dicarboxylic acid described above for HOOC-R2-COOH; or it can be a dicarboxylic acid that is not easily cyclized, such as terephthalic acid, 2,5-furandicarboxylic acid, oxalic acid, malonic acid, 1,6-hexanediol, 1,10-decanedioic acid, and 1,18-octadecanediol. Preferably, HOOC-R3-COOH can be selected from an alkane dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkane dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl and is interrupted by one or more O atoms, an alkene dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen or alkyl, a cycloalkane dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkene dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an aromatic dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged cyclic dicarboxylic acid which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro. Preferably, HOOC-R3-COOH can be selected from oxalic acid, succinic acid, 2-methylsuccinic acid, 2-phenylsuccinic acid, 2-benzylsuccinic acid, 2,2-dimethylsuccinic acid, 2,3-dimethylsuccinic acid, 2,3-diphenylsuccinic acid, 1,2-cyclobutanediol, 2,2,3,3-tetramethylsuccinic acid, oxalic acid, malonic acid, 1,6-hexanediol, 1,10-decanedioic acid, 1,18-octadecanedioic acid, maleic acid, methylmaleic acid , dimethylmaleic acid, phthalic acid, hexahydrophthalic acid, norbornene dicarboxylic acid, tetrahydrophthalic acid, glutaric acid, 2-methylglutaric acid, 3-methylglutaric acid, 3-phenylglutaric acid, 2,2-dimethylglutaric acid, 3,3-dimethylglutaric acid, diglycolic acid, 2,3-furandicarboxylic acid, 3,4-furandicarboxylic acid, 2,3-pyridinedicarboxylic acid, 3,4-pyridinedicarboxylic acid, terephthalic acid, 2,5-furandicarboxylic acid, at least one of.

[0125] Diols for polymer synthesis

[0126] The diol used for polymer synthesis can be selected from alkylene glycols that are unsubstituted or substituted with substituents selected from halogen, alkyl or nitro groups, OH-alkylene-cycloalkylene-alkylene-OH that are unsubstituted or substituted with substituents selected from halogen, alkyl or nitro groups, polyether glycols, or alkylene glycols interrupted by one or more nitrogen atoms; preferably, at least one selected from alkylene glycols containing 2 to 18 carbon atoms, polyethylene glycol, polypropylene glycol, polytetrahydrofuran diol, N-methyldiethanolamine, and N-ethyldiethanolamine. Preferably, at least one selected from ethylene glycol, 1,3-propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 1,8-octanediol, 1,9-nonanediol, 1,10-decanediol, 1,18-octadecanediol, polyethylene glycol, and 1,4-cyclohexanedimethanol.

[0127] Organic Definition

[0128] When a numerical range is listed, it is intended to include every value and sub-range within the stated range. For example, "C 1-6 "Alkyl" includes C1, C2, C3, C4, C5, C6, C 1-6 、C 1-5 、C 1-4 、C 1-3 、C 1-2 、C 2-6 、C 2-5 、C 2-4 、C 2-3 、C 3-6 、C 3-5 、C 3-4 、C 4-6 、C 4-5 and C 5-6 alkyl.

[0129] In the present invention, alkyl refers to a chain or branched saturated hydrocarbon group with a corresponding number of carbon atoms, such as "C 1-6 "Alkyl" refers to a straight or branched chain saturated hydrocarbon group having 1 to 6 carbon atoms. In some embodiments, C 1-4 Alkyl and C 1-2 Alkyl groups are preferred. 1-6 Examples of alkyl groups include: methyl (C1), ethyl (C2), n-propyl (C3), isopropyl (C3), n-butyl (C4), tert-butyl (C4), sec-butyl (C4), isobutyl (C4), n-pentyl (C5), 3-pentyl (C5), pentyl (C5), neopentyl (C5), 3-methyl-2-butyl (C5), tert-pentyl (C5), and n-hexyl (C6). The term “C 1-6"Alkyl" also includes heteroalkyl groups in which one or more (e.g., 1, 2, 3, or 4) carbon atoms are replaced by heteroatoms (e.g., oxygen, sulfur, nitrogen, boron, silicon, phosphorus). The alkyl group may be optionally substituted with one or more substituents, for example, 1 to 5 substituents, 1 to 3 substituents, or 1 substituent. Conventional alkyl abbreviations include: Me (-CH3), Et (-CH2CH3), iPr (-CH(CH3)2), nPr (-CH2CH2CH3), n-Bu (-CH2CH2CH2CH3), or i-Bu (-CH2CH(CH3)2). In other embodiments, "C 6-24 "Alkyl" is preferred, such as C6, C7, C8, C9, C 10 , C 11 , C 12 , C 13 , C 14 , C 15 , C 16 , C 17 , C 18 , C 19 , C 20 , C 21 , C 22 , C 23 , C 24 , and preferably a straight-chain alkyl group.

[0130] In the present invention, "alkenyl" refers to a straight-chain or branched hydrocarbon group having corresponding carbon atoms and at least one carbon-carbon double bond, such as "C 2-6 "Alkenyl" refers to a straight or branched chain hydrocarbon group having 2 to 6 carbon atoms and at least one carbon-carbon double bond. In some embodiments, C 2-4 Alkenyl is preferred. 2-6 Examples of alkenyl groups include ethenyl (C2), 1-propenyl (C3), 2-propenyl (C3), 1-butenyl (C4), 2-butenyl (C4), butadienyl (C4), pentenyl (C5), pentadienyl (C5), hexenyl (C6), and the like. The term "C 2-6 "Alkenyl" also includes heteroalkenyl groups in which one or more (e.g., 1, 2, 3, or 4) carbon atoms are replaced by heteroatoms (e.g., oxygen, sulfur, nitrogen, boron, silicon, phosphorus). The alkenyl group may be optionally substituted with one or more substituents, for example, 1 to 5 substituents, 1 to 3 substituents, or 1 substituent. In other embodiments, "C 6-24 Alkenyl" is preferred, such as C6, C7, C8, C9, C 10 , C 11 , C 12 , C 13 , C 14 , C 15 , C 16 , C17 , C 18 , C 19 , C 20 , C 21 , C 22 , C 23 , C 24 , and preferably a straight chain alkenyl group, preferably containing multiple olefinic bonds.

[0131] “C 2-6 "Alkynyl" refers to a straight or branched chain hydrocarbon group having 2 to 6 carbon atoms, at least one carbon-carbon triple bond, and optionally one or more carbon-carbon double bonds. In some embodiments, C 2-4 Alkynyl is preferred. 2-6 Examples of alkynyl groups include, but are not limited to, ethynyl (C2), 1-propynyl (C3), 2-propynyl (C3), 1-butynyl (C4), 2-butynyl (C4), pentynyl (C5), hexynyl (C6), and the like. The term "C 2-6 "Alkynyl" also includes heteroalkynyl groups, in which one or more (e.g., 1, 2, 3, or 4) carbon atoms are replaced by heteroatoms (e.g., oxygen, sulfur, nitrogen, boron, silicon, phosphorus). Alkynyl groups can be optionally substituted with one or more substituents, for example, 1 to 5 substituents, 1 to 3 substituents, or 1 substituent. In other embodiments, "C 6-24 Alkenyl" is preferred, such as C6, C7, C8, C9, C 10 , C 11 , C 12 , C 13 , C 14 , C 15 , C 16 , C 17 , C 18， C 19 , C 20 , C 21 , C 22 , C 23 , C 24 , and preferably a straight-chain alkynyl group.

[0132] “C 1-10 "Alkylene" refers to the removal of C 1-10 In some embodiments, C 1-4 Alkylene, C 2-4 Alkylene and C 1-3Alkylene is preferred. Unsubstituted alkylene includes, but is not limited to, methylene (-CH2-), ethylene (-CH2CH2-), propylene (-CH2CH2CH2-), butylene (-CH2CH2CH2CH2-), pentylene (-CH2CH2CH2CH2CH2-), hexylene (-CH2CH2CH2CH2CH2CH2-), and the like. Exemplary substituted alkylenes, for example, alkylenes substituted with one or more alkyl (methyl) groups, include, but are not limited to, substituted methylene (-CH(CH3)-, -C(CH3)2-), substituted ethylene (-CH(CH3)CH2-, -CH2CH(CH3)-, -C(CH3)2CH2-, -CH2C(CH3) 2- ), substituted propylene (-CH(CH3)CH2CH2-, -CH2CH(CH3)CH2-, -CH2CH2CH(CH3)-, -C(CH3)2CH2CH2-, -CH2C(CH3)2CH2-, -CH2CH2C(CH3)2-), and the like.

[0133] “C 2-10 "Alkenylene" refers to the removal of C 2-10 In some embodiments, C 2-4 Alkenylene is particularly preferred. Exemplary unsubstituted alkenylene groups include, but are not limited to, vinylene (-CH=CH-) and propenylene (e.g., -CH=CHCH2-, -CH2-CH=CH-). Exemplary substituted alkenylene groups, for example, alkenylene groups substituted with one or more alkyl (methyl) groups, include, but are not limited to, substituted ethylene (-C(CH3)=CH-, -CH=C(CH3)-), substituted propenylene (-C(CH3)=CHCH2-, -CH=C(CH3)CH2-, -CH=CHCH(CH3)-, -CH=CHC(CH3)2-, -CH(CH3)-CH=CH-, -C(CH3)2-CH=CH-, -CH2-C(CH3)=CH-, -CH2-CH=C(CH3)-), and the like.

[0134] “C 2-10 "Alkynylidene" refers to the removal of C 2-10 In some embodiments, C 2-4 Alkyne is particularly preferred. Exemplary alkynyl includes, but is not limited to, ethynyl (-C≡C-), substituted or unsubstituted propynyl (-C≡CCH2-), and the like.

[0135] “C0-6 "Alkylene" refers to the chemical bond and the above-mentioned "C 1-6 Alkylene", "C 0-4 "Alkylene" refers to the chemical bond and the above-mentioned "C 1-4 "Alkylene".

[0136] "Halo" or "halogen" refers to fluorine (F), chlorine (Cl), bromine (Br) and iodine (I).

[0137] Therefore, “C 1-6 "Haloalkyl" refers to the above-mentioned "C 1-6 Alkyl", which is substituted by one or more halogen groups. In some embodiments, C 1-4 Halogenated alkyl is particularly preferred, more preferably C 1-2 Haloalkyl. Exemplary haloalkyl groups include, but are not limited to, -CF3, -CH2F, -CHF2, -CHFCH2F, -CH2CHF2, -CF2CF3, -CCl3, -CH2Cl, -CHCl2, 2,2,2-trifluoro-1,1-dimethyl-ethyl, and the like. The haloalkyl group can be substituted at any available point of attachment, for example, with 1 to 5 substituents, 1 to 3 substituents, or 1 substituent.

[0138] “C 3-10 "Cycloalkyl" refers to a non-aromatic cyclic hydrocarbon group having 3 to 10 ring carbon atoms and zero heteroatoms, optionally containing 1, 2 or 3 double or triple bonds. In some embodiments, C 5-10 Cycloalkyl, C 3-7 Cycloalkyl and C 3-6 Cycloalkyl is particularly preferred, more preferably C 5-7 Cycloalkyl and C 5-6Cycloalkyl. Cycloalkyl also includes ring systems in which the above-mentioned cycloalkyl ring is fused to one or more aryl or heteroaryl groups, wherein the point of attachment is on the cycloalkyl ring, and in such cases, the number of carbons continues to represent the number of carbons in the cycloalkyl system. Cycloalkyl also includes cycloalkyl rings in which the substituents on any non-adjacent carbon atoms are linked to form a bridged ring, together forming a polycycloalkane sharing two or more carbon atoms. Cycloalkyl also includes cycloalkyl rings in which the substituents on the same carbon atom are linked to form a ring, together forming a polycycloalkane sharing one carbon atom. Exemplary cycloalkyl groups include, but are not limited to, cyclopropyl (C3), cyclopropenyl (C3), cyclobutyl (C4), cyclobutenyl (C4), cyclopentyl (C5), cyclopentenyl (C5), cyclohexyl (C6), cyclohexenyl (C6), cyclohexadienyl (C6), cycloheptyl (C7), cycloheptenyl (C7), cycloheptadienyl (C7), cycloheptatrienyl (C7), and the like. A cycloalkyl group can be optionally substituted with one or more substituents, for example, with 1 to 5 substituents, 1 to 3 substituents, or 1 substituent.

[0139] “C 3-10 "Cycloalkylene" refers to the removal of C 3-10 In some embodiments, C 3-6 Cycloalkylene and C 3-4 Cycloalkylene is particularly preferred, and cyclopropylene is especially preferred.

[0140] "3-10 membered heterocyclyl" refers to a saturated or unsaturated radical of a 3- to 10-membered non-aromatic ring system having ring carbon atoms and 1 to 5 ring heteroatoms, wherein each heteroatom is independently selected from nitrogen, oxygen, sulfur, boron, phosphorus, and silicon, and optionally containing 1, 2, or 3 double or triple bonds. In heterocyclyl groups containing one or more nitrogen atoms, the point of attachment may be a carbon or nitrogen atom, as valence permits. In some embodiments, a 5-10 membered heterocyclyl is preferred, which is a 5-10 membered non-aromatic ring system having ring carbon atoms and 1 to 5 ring heteroatoms; in some embodiments, a 3-7 membered heterocyclyl is preferred, which is a 3-7 membered non-aromatic ring system having ring carbon atoms and 1 to 4 ring heteroatoms; a 5-7 membered heterocyclyl is preferred, which is a 5-7 membered non-aromatic ring system having ring carbon atoms and 1 to 3 ring heteroatoms; a 3-6 membered heterocyclyl is preferred, which is a 3-6 membered non-aromatic ring system having ring carbon atoms and 1 to 3 ring heteroatoms; a 4-6 membered heterocyclyl is preferred, which is a 4-6 membered non-aromatic ring system having ring carbon atoms and 1 to 3 ring heteroatoms; and a 5-6 membered heterocyclyl is more preferred, which is a 5-6 membered non-aromatic ring system having ring carbon atoms and 1 to 3 ring heteroatoms. Heterocyclyl also includes a ring system in which the above-mentioned heterocyclyl ring is fused to one or more cycloalkyl groups, wherein the point of attachment is on the heterocyclyl ring, or a ring system in which the above-mentioned heterocyclyl ring is fused to one or more aryl or heteroaryl groups, wherein the point of attachment is on the heterocyclyl ring; and in such a case, the number of ring members continues to represent the number of ring members in the heterocyclyl ring system. Heterocyclyl also includes a heterocyclyl ring in which any substituents on non-adjacent carbon or nitrogen atoms are connected to form a bridged ring, together forming a polycyclic heteroalkane sharing two or more carbon or nitrogen atoms. Heterocyclyl also includes a heterocyclyl ring in which the substituents on the same carbon atom are connected to form a ring, together forming a polycyclic heteroalkane sharing one carbon atom. Exemplary 3-membered heterocyclyls containing one heteroatom include, but are not limited to, aziridine, oxirane, and thiorenyl. Exemplary 4-membered heterocyclyls containing one heteroatom include, but are not limited to, azetidinyl, oxirane, and thiidine. Exemplary 5-membered heterocyclic groups containing one heteroatom include, but are not limited to, tetrahydrofuranyl, dihydrofuranyl, tetrahydrothiophenyl, dihydrothiophenyl, pyrrolidinyl, dihydropyrrolyl, and pyrrolyl-2,5-dione. Exemplary 5-membered heterocyclic groups containing two heteroatoms include, but are not limited to, pyrazolidinyl, dioxolanyl, oxasulfuranyl, disulfuranyl, and oxazolidin-2-one. Exemplary 5-membered heterocyclic groups containing three heteroatoms include, but are not limited to, triazolinyl, oxadiazolinyl, and thiadiazolinyl. Exemplary 6-membered heterocyclic groups containing one heteroatom include, but are not limited to, piperidinyl, tetrahydropyranyl, dihydropyridinyl, and thianyl.Exemplary 6-membered heterocyclyls containing two heteroatoms include, but are not limited to, piperazinyl, morpholinyl, dithianyl, and dioxanyl. Exemplary 6-membered heterocyclyls containing three heteroatoms include, but are not limited to, hexahydrotriazinyl (triazinanyl). Exemplary 7-membered heterocyclyls containing one heteroatom include, but are not limited to, azepanyl, oxepanyl, and thiepanyl. Exemplary 5-membered heterocyclyls fused to a C6 aryl ring (also referred to herein as 5,6-bicyclic heterocyclyls) include, but are not limited to, dihydroindolinyl, isoindolinyl, dihydrobenzofuranyl, dihydrobenzothienyl, benzoxazolinone, and the like. Exemplary 6-membered heterocyclyls fused to a C6 aryl ring (also referred to herein as 6,6-bicyclic heterocyclyls) include, but are not limited to, tetrahydroquinolinyl, tetrahydroisoquinolinyl, and the like. Heterocyclyl also includes the above-mentioned heterocyclyl and a cycloalkyl, heterocyclyl, aryl or heteroaryl group sharing one or two atoms to form a bridged ring or spirocycle. As long as the valence permits, the shared atom can be a carbon or nitrogen atom. Heterocyclyl also includes the above-mentioned heterocyclyl and heterocyclyl groups that may be optionally substituted with one or more substituents, for example, 1 to 5 substituents, 1 to 3 substituents or 1 substituent.

[0141] “C 6-10 "Aryl" refers to a monocyclic or polycyclic (e.g., bicyclic) 4n+2 aromatic ring system (e.g., having 6 or 10 π electrons shared in a cyclic arrangement) having 6-10 ring carbon atoms and zero heteroatoms. In some embodiments, an aryl group has six ring carbon atoms ("C6 aryl"; e.g., phenyl). In some embodiments, an aryl group has ten ring carbon atoms ("C 10 Aryl also includes ring systems in which an aryl ring as described above is fused to one or more cycloalkyl or heterocyclyl groups, and the point of attachment is on the aryl ring, in which case the number of carbon atoms continues to refer to the number of carbon atoms in the aryl ring system. Aryl groups can be optionally substituted with one or more substituents, for example, with 1 to 5 substituents, 1 to 3 substituents, or 1 substituent.

[0142] "5-14 membered heteroaryl" refers to a group of a 5-14 membered monocyclic or bicyclic 4n+2 aromatic ring system (e.g., having 6, 10, or 14 π electrons shared in a cyclic arrangement) having ring carbon atoms and 1-4 ring heteroatoms, wherein each heteroatom is independently selected from nitrogen, oxygen, and sulfur. In heteroaryl groups containing one or more nitrogen atoms, the point of attachment may be a carbon or nitrogen atom as long as valence permits. Heteroaryl bicyclic ring systems may include one or more heteroatoms in one or both rings. Heteroaryl also includes ring systems in which the above-mentioned heteroaryl rings are fused to one or more cycloalkyl or heterocyclyl groups, and the point of attachment is on the heteroaryl ring, in which case the number of carbon atoms continues to represent the number of carbon atoms in the heteroaryl ring system. In some embodiments, 5-10 membered heteroaryl is preferred, which is a 5-10 membered monocyclic or bicyclic 4n+2 aromatic ring system having ring carbon atoms and 1-4 ring heteroatoms. In other embodiments, 5-6 membered heteroaryls are particularly preferred and are 5-6 membered monocyclic or bicyclic 4n+2 aromatic ring systems having ring carbon atoms and 1-4 ring heteroatoms. Exemplary 5-membered heteroaryls containing one heteroatom include, but are not limited to, pyrrolyl, furanyl, and thienyl. Exemplary 5-membered heteroaryls containing two heteroatoms include, but are not limited to, imidazolyl, pyrazolyl, oxazolyl, isoxazolyl, thiazolyl, and isothiazolyl. Exemplary 5-membered heteroaryls containing three heteroatoms include, but are not limited to, triazolyl, oxadiazolyl (e.g., 1,2,4-oxadiazolyl), and thiadiazolyl. Exemplary 5-membered heteroaryls containing four heteroatoms include, but are not limited to, tetrazolyl. Exemplary 6-membered heteroaryls containing one heteroatom include, but are not limited to, pyridinyl or pyridonyl. Exemplary 6-membered heteroaryls containing two heteroatoms include, but are not limited to, pyridazinyl, pyrimidinyl, and pyrazinyl. Exemplary 6-membered heteroaryl groups containing three or four heteroatoms include, but are not limited to, triazinyl and tetrazinyl, respectively. Exemplary 7-membered heteroaryl groups containing one heteroatom include, but are not limited to, azacycloheptatrienyl, oxepinyl, and thieptatrienyl. Exemplary 5,6-bicyclic heteroaryl groups include, but are not limited to, indolyl, isoindolyl, indazolyl, benzotriazolyl, benzothiophenyl, isobenzothiophenyl, benzofuranyl, benzisofuranyl, benzimidazolyl, benzoxazolyl, benzisoxazolyl, benzoxadiazolyl, benzothiazolyl, benzisothiazolyl, benzothiadiazolyl, indanyl, and purinyl. Exemplary 6,6-bicyclic heteroaryl groups include, but are not limited to, naphthyridinyl, pteridinyl, quinolinyl, isoquinolinyl, cinnolinyl, quinoxalinyl, phthalazinyl, and quinazolinyl. A heteroaryl group can be optionally substituted with one or more substituents, for example, with 1 to 5 substituents, 1 to 3 substituents, or 1 substituent.

[0143] "Hydroxyalkyl" refers to an alkyl group substituted with one or more hydroxy groups.

[0144] "Alkoxy" refers to the oxygen ether form of a straight or branched chain alkyl group, i.e., -O-alkyl. Similarly, "methoxy" refers to -O-CH3.

[0145] "Optionally substituted by..." means that it may be substituted by a specified substituent or may be unsubstituted;

[0146] The divalent groups formed by removing another hydrogen from the above-defined alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl groups are collectively referred to as "subunits". The ring-forming groups such as cycloalkyl, heterocyclyl, aryl and heteroaryl groups are collectively referred to as "cyclyls".

[0147] Alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl, heteroaryl, and the like are defined herein as optionally substituted groups.

[0148] Exemplary substituents on carbon atoms include, but are not limited to, halogen, -CN, -NO2, -N3, -SO2H, -SO3H, -OH, -OR aa 、-ON(R bb )2、-N(R bb )2、-N(R bb )3 + X - 、-N(OR cc )R bb 、-SH、-SR aa 、-SSR cc 、-C(=O)R aa 、-CO2H、-CHO、-C(OR cc )2, -CO2R aa 、-OC(=O)R aa 、-OCO2R aa 、-C(=O)N(R bb )2、-OC(=O)N(R bb )2、-NR bb C(=O)R aa 、-NR bb CO2R aa 、-NR bb C(=O)N(R bb )2、-C(=NR bb )R aa 、-C(=NR bb )OR aa 、-OC(=NR bb )R aa 、-OC(=NR bb )OR aa 、-C(=NR bb )N(R bb )2、-OC(=NRbb )N(R bb )2、-NR bb C(=NR bb )N(R bb )2、-C(=O)NR bb SO2R aa 、-NR bb SO2R aa 、-SO2N(R bb )2、-SO2R aa 、-SO2OR aa 、-OSO2R aa 、-S(=O)R aa 、-OS(=O)R aa 、-Si(R aa )3、-OSi(R aa )3、-C(=S)N(R bb )2、-C(=O)SR aa 、-C(=S)SR aa 、-SC(=S)SR aa 、-SC(=O)SR aa 、-OC(=O)SR aa 、-SC(=O)OR aa 、-SC(=O)R aa 、-P(=O)2R aa 、-OP(=O)2R aa 、-P(=O)(R aa )2、-OP(=O)(R aa )2、-OP(=O)(OR cc )2、-P(=O)2N(R bb )2、-OP(=O)2N(R bb )2、-P(=O)(NR bb )2、-OP(=O)(NR bb )2、-NR bb P(=O)(OR cc )2、-NR bb P(=O)(NR bb )2、-P(R cc )2、-P(R cc )3、-OP(R cc )2、-OP(R cc )3、-B(R aa )2、-B(OR cc )2、-BR aa (OR cc), alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl is independently replaced by 0, 1, 2, 3, 4 or 5 R dd group substitution;

[0149] Or the two geminal hydrogen atoms on the carbon atom are replaced by groups =O, =S, =NN(R bb )2, =NNR bb C(=O)R aa 、=NNR bb C(=O)OR aa 、=NNR bb S(=O)2R aa 、=NR bb or = NOR cc replace;

[0150] R aa Each of R is independently selected from alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, or two R aa The groups are combined to form a heterocyclyl or heteroaryl ring, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl group is independently replaced by 0, 1, 2, 3, 4 or 5 R dd group substitution;

[0151] R bb Each of the following is independently selected from: hydrogen, -OH, -OR aa 、-N(R cc )2, -CN, -C(=O)R aa 、-C(=O)N(R cc )2, -CO2R aa 、-SO2R aa 、-C(=NR cc )OR aa 、-C(=NR cc )N(R cc )2、-SO2N(R cc )2, -SO2R cc 、-SO2OR cc 、-SOR aa 、-C(=S)N(R cc )2, -C(=O)SR cc 、-C(=S)SR cc 、-P(=O)2R aa 、-P(=O)(R aa )2、-P(=O)2N(R cc )2、-P(=O)(NR cc)2, alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, or two R bb The groups are combined to form a heterocyclyl or heteroaryl ring, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl group is independently replaced by 0, 1, 2, 3, 4 or 5 R dd group substitution;

[0152] R cc Each of R is independently selected from hydrogen, alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, or two R cc The groups are combined to form a heterocyclyl or heteroaryl ring, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl group is independently replaced by 0, 1, 2, 3, 4 or 5 R dd group substitution;

[0153] R dd Each of the is independently selected from: halogen, -CN, -NO2, -N3, -SO2H, -SO3H, -OH, -OR ee 、-ON(R ff )2、-N(R ff )2,、-N(R ff )3 + X - 、-N(OR ee )R ff 、-SH、-SR ee 、-SSR ee 、-C(=O)R ee 、-CO2H、-CO2R ee 、-OC(=O)R ee 、-OCO2R ee 、-C(=O)N(R ff )2、-OC(=O)N(R ff )2、-NR ff C(=O)R ee 、-NR ff CO2R ee 、-NR ff C(=O)N(R ff )2、-C(=NR ff )OR ee 、-OC(=NR ff )R ee 、-OC(=NR ff )OR ee 、-C(=NR ff )N(R ff )2、-OC(=NR ff )N(R ff)2、-NR ff C(=NR ff )N(R ff )2、-NR ff SO2R ee 、-SO2N(R ff )2, -SO2R ee 、-SO2OR ee 、-OSO2R ee 、-S(=O)R ee 、-Si(R ee )3、-OSi(R ee )3、-C(=S)N(R ff )2, -C(=O)SR ee 、-C(=S)SR ee 、-SC(=S)SR ee 、-P(=O)2R ee 、-P(=O)(R ee )2、-OP(=O)(R ee )2、-OP(=O)(OR ee )2, alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl, heteroaryl, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl is independently substituted by 0, 1, 2, 3, 4 or 5 R gg Group substitution, or two geminal R dd Substituents may combine to form =O or =S;

[0154] R ee Each of R is independently selected from alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, aryl, heterocyclyl and heteroaryl, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl is independently replaced by 0, 1, 2, 3, 4 or 5 R gg group substitution;

[0155] R ff Each of R is independently selected from hydrogen, alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, or two R ff The groups are combined to form a heterocyclic or heteroaryl ring, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl and heteroaryl group is independently replaced by 0, 1, 2, 3, 4 or 5 R gg group substitution;

[0156] R gg Each of the independently: halogen, -CN, -NO2, -N3, -SO2H, -SO3H, -OH, -OC 1-6 Alkyl, -ON(C 1-6 Alkyl)2, -N(C1-6 Alkyl)2, -N(C 1-6 Alkyl)3 + X - 、-NH(C 1-6 Alkyl)2 + X - 、-NH2(C 1-6 alkyl) + X - 、-NH3 + X - 、-N(OC 1-6 Alkyl)(C 1-6 Alkyl), -N(OH)(C 1-6 Alkyl), -NH(OH), -SH, -SC 1-6 Alkyl, -SS(C 1-6 alkyl), -C(=O)(C 1-6 alkyl), -CO2H, -CO2(C 1-6 alkyl), -OC(=O)(C 1-6 Alkyl), -OCO2(C 1-6 alkyl), -C(=O)NH2, -C(=O)N(C 1-6 alkyl)2, -OC(=O)NH(C 1-6 alkyl), -NHC(=O)(C 1-6 Alkyl), -N(C 1-6 alkyl)C(=O)(C 1-6 Alkyl), -NHCO2(C 1-6 alkyl), -NHC(=O)N(C 1-6 Alkyl)2, -NHC(=O)NH(C 1-6 alkyl), -NHC(=O)NH2, -C(=NH)O(C 1-6 alkyl), -OC(=NH)(C 1-6 alkyl), -OC(=NH)OC 1-6 Alkyl, -C(=NH)N(C 1-6 Alkyl)2, -C(=NH)NH(C 1-6 alkyl), -C(=NH)NH2, -OC(=NH)N(C 1-6 Alkyl)2, -OC(NH)NH(C 1-6 alkyl), -OC(NH)NH2, -NHC(NH)N(C 1-6 Alkyl)2, -NHC(=NH)NH2, -NHSO2(C 1-6 Alkyl), -SO2N(C 1-6 Alkyl)2, -SO2NH(C 1-6 alkyl), -SO2NH2, -SO2C1-6 Alkyl, -SO2OC 1-6 Alkyl, -OSO2C 1-6 Alkyl, -SOC 1-6 Alkyl, -Si(C 1-6 alkyl)3, -OSi(C 1-6 alkyl)3, -C(=S)N(C 1-6 alkyl)2、C(=S)NH(C 1-6 alkyl), C(=S)NH2, -C(=O)S(C 1-6 alkyl), -C(=S)SC 1-6 Alkyl, -SC(=S)SC 1-6 Alkyl, -P(=O)2(C 1-6 alkyl), -P(=O)(C 1-6 alkyl)2, -OP(=O)(C 1-6 alkyl)2, -OP(=O)(OC 1-6 Alkyl)2, C 1-6 Alkyl, C 1-6 Halogenated alkyl, C2-C6 alkenyl, C2-C6 alkynyl, C3-C7 cycloalkyl, C6-C 10 Aryl, C3-C7 heterocyclic, C5-C 10 heteroaryl; or two geminal R gg Substituents may combine to form =O or =S; wherein X - For the counter ion.

[0157] Exemplary substituents on nitrogen atoms include, but are not limited to, hydrogen, -OH, -OR aa 、-N(R cc )2, -CN, -C(=O)R aa 、-C(=O)N(R cc )2, -CO2R aa 、-SO2R aa 、-C(=NR bb )R aa 、-C(=NR cc )OR aa 、-C(=NR cc )N(R cc )2、-SO2N(R cc )2, -SO2R cc 、-SO2OR cc 、-SOR aa 、-C(=S)N(R cc )2, -C(=O)SR cc 、-C(=S)SR cc 、-P(=O)2R aa 、-P(=O)(Raa )2、-P(=O)2N(R cc )2、-P(=O)(NR cc )2, alkyl, haloalkyl, alkenyl, alkynyl, cycloalkyl, heterocyclyl, aryl and heteroaryl, or two R attached to the nitrogen atom cc The groups are combined to form a heterocyclic or heteroaryl ring, wherein each alkyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl and heteroaryl group is independently replaced by 0, 1, 2, 3, 4 or 5 R dd Group substituted, and wherein R aa 、R bb 、R cc and R dd As mentioned above.

[0158] The repeating units of the present invention are atomic groups that are the residues of the reaction products of one or more monomers after polymerization. Brackets within a repeating unit indicate the presence of multiple residues of the reaction products enclosed in the brackets in the polymer, which may or may not be connected. The numbers outside the brackets, such as m, n, p, q, and s, indicate the average number of residues of the reaction products enclosed in the brackets present per polymer chain in the heat-resistant polymer.

[0159] Unless otherwise specified, the percentages (%) used in the present invention are molar percentages.

[0160] The present invention will be further described below with reference to the embodiments. The examples of the embodiments are intended to explain the present invention but should not be construed as limiting the present invention.

[0161] Synthesis Example 1 Synthesis of Cyclic Imide Diol A-1

[0162] Vacuum-dried 3-amino-1,2-propanediol and 1,4-butanediol were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionic acid]pentyl erythritol ester were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred and mixed at room temperature, and nitrogen was used to fully replace the air in the reactor. The temperature was slowly raised to 120°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 3 hours.

[0163] Synthesis Example 2 Synthesis of Cyclic Imide Diol A-2

[0164] Vacuum-dried 2-amino-1,3-propanediol and 1,4-butanedioic acid were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionic acid]pentyl erythritol ester were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred at room temperature and the air in the reactor was fully replaced with nitrogen. The temperature was slowly raised to 120°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 3 hours.

[0165] Synthesis Example 3 Synthesis of Cyclic Imide Diol A-3

[0166] Vacuum-dried 3-amino-1,2-propanediol and 1,5-pentanedioic acid were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionic acid]pentyl erythritol ester were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred and mixed at room temperature, and nitrogen was used to fully replace the air in the reactor. The temperature was slowly raised to 120°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 3 hours.

[0167] Synthesis Example 4 Synthesis of Cyclic Imide Diol A-4

[0168] Vacuum-dried 3-amino-1,2-propanediol and (1R, 2R)-phthalic acid were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionic acid]pentyl erythritol ester were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred and mixed at room temperature, and nitrogen was used to fully replace the air in the reactor. The temperature was slowly raised to 200°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 5 hours.

[0169] Synthesis Example 5 Synthesis of Cyclic Imide Diol A-5

[0170] Vacuum-dried 3-amino-1,2-propanediol and (1R, 2R)-1,2-cyclohexanedicarboxylic acid were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred and mixed at room temperature, and nitrogen was used to fully replace the air in the reactor. The temperature was slowly raised to 200°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 5 hours.

[0171] Synthesis Example 6 Synthesis of Cyclic Imide Diol A-6

[0172] Vacuum-dried 3-amino-1,2-propanediol and succinic anhydride were added to reactor A at a molar ratio of 1:1.05. At the same time, 100 ppm of triphenyl phosphate and 100 ppm of tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionic acid]pentyl erythritol ester were added as a thermal stabilizer and antioxidant, respectively, relative to the total mass of the raw materials. The mixture was stirred and mixed at room temperature, and nitrogen was used to fully replace the air in the reactor. The temperature was slowly raised to 120°C in a nitrogen atmosphere with a nitrogen flow rate of 150 mL / min, and the reaction was kept warm for 3 hours.

[0173] Synthesis Example 7 Synthesis of Cyclic Diacid Oligomer B-1

[0174] Thoroughly vacuum-dried terephthalic acid and ethylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0175] Synthesis Example 8 Synthesis of Cyclic Diacid Oligomer B-2

[0176] Vacuum-dried isophthalic acid and ethylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0177] Synthesis Example 9 Synthesis of Cyclic Diacid Oligomer B-3

[0178] Vacuum-dried phthalic acid and ethylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0179] Synthesis Example 10 Synthesis of Cyclic Diacid Oligomer B-4

[0180] Vacuum-dried 1,4-cyclohexanedicarboxylic acid and ethylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and precondensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0181] Synthesis Example 11 Synthesis of Cyclic Diacid Oligomer B-5

[0182] Vacuum-dried 2,5-furandicarboxylic acid and ethylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and precondensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0183] Synthesis Example 12 Synthesis of Cyclic Diacid Oligomer B-6

[0184] Thoroughly vacuum-dried terephthalic acid and 1,3-propylene glycol (1) were added to reactor B at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and precondensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0185] Synthesis Example 13 Synthesis of Cyclic Diacid Oligomer B-7

[0186] Thoroughly vacuum-dried terephthalic acid and 1,4-butanediol (1) were added to reactor B at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, ethylene glycol (2) was added (the molar ratio of ethylene glycol (1) to ethylene glycol (2) was 1:0.2). Simultaneously, 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour to obtain a cyclic polyester oligomer.

[0187] Synthesis Example 14 Synthesis of the Third Monomer Oligomer C-1

[0188] Vacuum-dried isophthalic acid and ethylene glycol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added simultaneously. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0189] Synthesis Example 15 Synthesis of the Third Monomer Oligomer C-2

[0190] Vacuum-dried phthalic acid and ethylene glycol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added simultaneously. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0191] Synthesis Example 16 Synthesis of the Third Monomer Oligomer C-3

[0192] Vacuum-dried cis-1,2-cyclohexanedicarboxylic acid and ethylene glycol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, along with 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0193] Synthesis Example 17 Synthesis of the Third Monomer Oligomer C-4

[0194] Vacuum-dried cis-1,3-cyclohexanedicarboxylic acid and ethylene glycol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added simultaneously. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0195] Synthesis Example 18 Synthesis of the Third Monomer Oligomer C-5

[0196] Thoroughly vacuum-dried terephthalic acid and 2,2,4,4-tetramethyl-1,3-cyclobutanediol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added simultaneously. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0197] Synthesis Example 19 Synthesis of the Third Monomer Oligomer C-6

[0198] Thoroughly vacuum-dried terephthalic acid and 1,4-cyclohexanedimethanol were preheated and melted, then added to Reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was stirred and heated to melt under a nitrogen atmosphere. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added simultaneously. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0199] Synthesis Example 20 Synthesis of the Third Monomer Oligomer C-7

[0200] Thoroughly vacuum-dried terephthalic acid and 1:4;3:6-dianhydro-D-sorbitol were preheated and melted, then added to reactor C at a molar ratio of 1:1.2. The materials were mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 200 ppm of zinc acetate was added. The reaction was maintained at 230°C and 300 kPa until the distillate reached 97% of the theoretical distillate yield. After returning to normal pressure, ethylene glycol was added, along with 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate. The temperature was raised to 270°C and precondensed at -0.08 MPa for 1 hour to obtain the third monomer oligomer.

[0201] Example 1 Synthesis of Heat-Resistant Polymer H-1

[0202] 2 mole parts of A-1 (product from kettle A) and 18 mole parts of B-1 (product from kettle B) were placed in reactor D and heated to 180°C in nitrogen. 100 ppm of zinc acetate was added and the mixture was kept at 200°C for reaction until no more distillate was produced. 200 ppm of n-butyl titanate was then added, the temperature was raised to 260°C, and the pressure was slowly evacuated to <100 Pa. Polycondensation reaction was carried out for 6 hours to obtain a heat-resistant polymer.

[0203] Example 2-22

[0204] On the basis of Example 1, the types of raw materials and the feed ratios were changed, and polymers H-2 to H-22 were prepared in the same manner, as shown in Table 1.

[0205] Comparative Example 1 Synthesis of non-heat-resistant polymer N-1

[0206] 1 part by mole of thoroughly vacuum-dried terephthalic acid (AD-1) and 1.2 parts by mole of ethylene glycol (BD-1) (①) were added to a reactor. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. The pressure was restored to normal, and 0.24 parts by mole of ethylene glycol (BD-1) (②) was added. 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were also added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour. The temperature was then continued to rise while the vacuum level was gradually increased. Finally, the polycondensation reaction was carried out at 260°C and a vacuum level of <100 Pa for 6 hours to obtain a non-heat-resistant polymer.

[0207] Comparative Example 2 Synthesis of non-heat-resistant polymer N-2

[0208] 1 part by mole of thoroughly vacuum-dried 2,5-furandicarboxylic acid (AD-2) and 1.2 parts by mole of ethylene glycol (BD-1) (①) were added to a reactor. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, 0.24 parts by mole of ethylene glycol (BD-1) (②) was added, along with 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate. The temperature was raised to 220°C and precondensed at -0.08 MPa for 1 hour. The temperature was then raised to 260°C, and the pressure was slowly evacuated to <100 Pa. The polycondensation reaction continued for 6 hours to obtain a non-heat-resistant polymer.

[0209] Comparative Example 3 Synthesis of non-heat-resistant polymer N-3

[0210] 1 part by mole of thoroughly vacuum-dried terephthalic acid (AD-1) and 1.2 parts by mole of 1,4-butanediol (BD-2) (①) were added to a reactor. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated to melt under a nitrogen atmosphere with stirring. When the temperature reached 170°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. After returning to normal pressure, 0.24 parts by mole of 1,4-butanediol (BD-2) (②) was added, along with 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour. The temperature was then continued to rise, and the vacuum level was gradually increased. Finally, the polycondensation reaction was carried out at 260°C and a vacuum level of <100 Pa for 6 hours to obtain a non-heat-resistant polymer.

[0211] Comparative Example 4 Synthesis of non-heat-resistant polymer N-4

[0212] One part by mole of thoroughly vacuum-dried terephthalic acid (AD-1) and 1.2 parts by mole of pre-melted cis-1,4-cyclohexanedimethanol (BD-3) were added to a reactor. The mixture was mixed at room temperature, and the air in the reactor was fully replaced with nitrogen. The mixture was heated and melted under a nitrogen atmosphere with stirring. When the temperature reached 240°C, 100 ppm of zinc acetate was added. The reaction was maintained at 190°C and 300 kPa until the distillate reached 97% of the theoretical yield. The pressure was then restored to normal, and 500 ppm of n-butyl titanate, 100 ppm of tetraethyl silicate, and 100 ppm of triphenyl phosphate were added. The temperature was raised to 250°C and pre-condensed at -0.08 MPa for 1 hour. The temperature was then continued to rise, and the vacuum level was gradually increased. Finally, the polycondensation reaction was carried out at 270°C and a vacuum level of <100 Pa for 6 hours to obtain a non-heat-resistant polymer.

[0213] Performance Testing

[0214] I. Test Method

[0215] The polymer materials obtained in the examples and comparative examples of the present invention were tested according to the following standards.

[0216] Tensile strength and elastic modulus: GB / T 1040.2-2006.

[0217] Glass transition temperature (Tg), melting temperature (Tm): GB / T 19466.2-2004.

[0218] Melt flow index: ASTM-D1238-2010.

[0219] II. Test Results

[0220] As shown in Table 1, the heat-resistant polymers of the present invention exhibit excellent heat resistance and substantially unchanged mechanical properties compared to polymers without cyclic imide repeating units. Comparisons of H-10 and N-2, H-12 and N-3, and H-21 and N-4 show that the addition of cyclic imide improves heat resistance in various polymer materials while maintaining excellent mechanical properties to meet the needs of various applications.

[0221] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any appropriate manner without contradiction. To avoid unnecessary repetition, the present invention will not further describe various possible combinations.

Claims

1. A heat-resistant polymer, characterized in that: The polymer comprises: a segment (I) containing a cyclic imide, a segment (II) containing a cyclic compound and an optional third segment (III), wherein the segment (I) containing a cyclic imide comprises the following repeating units: Wherein, m is any integer from 1 to 300; R1 is a residue of an easily cyclized dibasic acid, preferably at least one of an alkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl and is interrupted by one or more O atoms, an alkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkylene group or a heterocycloalkyl group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an arylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a heteroarylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged ring group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro; Preferably, the alkylene group in the definition of R1 is C1-C10 alkylene group, preferably C1-C6 alkylene group, more preferably C1-C5 alkylene group, and most preferably methylene, ethylene, 1-methylethylene, 1,1-dimethylethylene, 1,2-dimethylethylene, 1,1,2,2-tetramethylethylene, 1-phenylethylene, 1-benzylethylene, 1,1-diphenylethylene, 1,1-dibenzylethylene, 1,2- diphenylethylene, 1,2-dibenzhydrylethylene, propylene, 1-methylpropylene, 2-methylpropylene, 1,1-dimethylpropylene, 1,2-dimethylpropylene, 2,2-dimethylpropylene, 1,3-dimethylpropylene, 1-phenylpropylene, 2-phenylpropylene, 1,2-diphenylpropylene, 2,2-diphenylpropylene or 1,3-diphenylpropylene; the alkenylene in the definition of R1 is C2-C10 Alkenyl, preferably C2-C6 alkenylene, more preferably C2-C3 alkenylene, most preferably vinylene, 1-methylvinylene, 1,2-dimethylvinylene or propenylene; the alkylene group in the definition of R1, which is unsubstituted or substituted by a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, is interrupted by 1-3 oxygen atoms, such as 2-oxa-1,3-ethylene; the cycloalkylene group in the definition of R1 is C3-C8 cycloalkylene, preferably C4-C6 cycloalkylene, most preferably cyclobutylene or cyclohexylene; the cycloalkenylene group in the definition of R1 may be C4-C8 cycloalkenylene, preferably C4-C6 cycloalkenylene, most preferably 3-cyclohexene-1,6-diyl; the arylene group in the definition of R1 is C6-C10 arylene, preferably phenylene, such as 1,6-phenylene; the cyclylene group in the definition of R1 is norbornene; R2 is a residue of a diol containing an amino group, preferably a trivalent alkyl group which is unsubstituted or substituted with a substituent selected from a halogen, an alkyl group or a nitro group, or at least one of a trivalent alkyl-aryl-alkyl group which is unsubstituted or substituted with a substituent selected from a halogen, an alkyl group or a nitro group; Preferably, the trivalent alkyl-aryl-alkyl in the definition of R2 is a trivalent C1-C10 alkyl-C6-C10 aryl-C1-C10 alkyl, preferably a trivalent C1-C5 alkyl-C6-C8 aryl-C1-C5 alkyl, more preferably a trivalent C1-C3 alkyl-C6-C8 aryl-C1-C3 alkyl, Preferably, R2 is selected from at least one of the following structures: In the above formula, * represents the connection site with the O atom, and ** represents the connection site with the N atom; Further preferably: R1 is selected from an alkylene group having 1 to 7 carbon atoms, preferably a straight or branched alkylene group having 1, 2, 3 or 4 carbon atoms in the main chain, an arylene group having 6 to 12 carbon atoms, a heteroarylene group having 5 to 11 carbon atoms, a cycloalkylene group having 3 to 12 carbon atoms, a heterocycloalkylene group having 2 to 11 carbon atoms or a combination thereof, optionally containing the following substituents: halogen, nitro, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl or halogenated, C1-C4 alkyl-substituted C6-C12 aryl or C6-C12 aryl-C1-C4 alkyl; R2 is selected from a straight chain alkylene group having 2 to 12 carbon atoms, a branched chain alkylene group having 3 to 12 carbon atoms, an arylene group having 6 to 12 carbon atoms, a cycloalkylene group having 3 to 12 carbon atoms, or a trivalent C1-C5 alkyl-C6-C8 aryl-C1-C5 alkyl group, optionally containing the following substituents: halogen, nitro, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl, or a halogenated, C1-C4 alkyl-substituted C6-C12 aryl or C6-C12 aryl-C1-C4 alkyl group; The segment (II) containing a cyclic compound comprises the following repeating units: Wherein, n is any integer from 1 to 500; Cy is a residue of a cyclic diacid, selected from at least one of C5-C12 arylene groups, alicyclic groups, or heterocyclic groups containing at least one N, O, or S atom; preferably, Cy is C6-C12 arylene groups, which are unsubstituted or substituted with substituents selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl, C5-10 cycloalkylene groups, which are unsubstituted or substituted with substituents selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl, or C5-C10 heteroaryl groups, which are unsubstituted or substituted with substituents selected from halogen, alkyl, aryl, arylalkyl, or alkylaryl, and contain at least one oxygen atom; The third segment (III) comprises the following repeating units: and / or Wherein, p and q are any integers from 1 to 150; R3 is any dicarboxylic acid residue, preferably a dicarboxylic acid residue used for polymer synthesis, for example, it is the residue of the easily cyclized dicarboxylic acid described in R1; or R3 is the residue of a dicarboxylic acid that is not easily cyclized, and the dicarboxylic acid that is not easily cyclized may be, for example, terephthalic acid or sebacic acid; preferably, R3 is a chemical bond, an alkylene group that is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, an alkylene group that is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl with one or more O atoms. at least one of a substituted alkylene group, an alkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a cycloalkenylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, an arylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, a heteroarylene group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro, or a bridged ring group which is unsubstituted or substituted with a substituent selected from halogen, alkyl or nitro; Preferably, R3 is selected from a chemical bond, a straight or branched alkylene or alkenylene group having 2 to 12 carbon atoms optionally interrupted by O atoms, an arylene group having 6 to 12 carbon atoms, a heteroarylene group having 5 to 11 carbon atoms, a cycloalkylene group, a cycloalkenyl group or a bridged cycloalkyl group having 3 to 12 carbon atoms, a heterocycloalkylene group having 2 to 11 carbon atoms, or a combination of the above groups, optionally containing the following substituents: halogen, C1-C4 alkyl, halogenated C1-C4 alkyl, C6-C12 aryl, C6-C12 aryl-C1-C4 alkyl, or a halogenated, C1-C4 alkyl-substituted C6-C12 aryl or C6-C12 aryl-C1-C4 alkyl; R4 is selected from the diol residue used for polymer synthesis; preferably, selected from C1-C12 alkylene groups, alicyclic groups, or heterocyclic groups containing at least one N, O or S atom, which are unsubstituted or substituted by substituents selected from halogen, alkyl, aryl, arylalkyl or alkylaryl groups; preferably, R4 is selected from at least one of C2-C8 alkylene groups, alicyclic groups, or C5-C8 heterocyclic groups containing oxygen atoms, which are unsubstituted or substituted by substituents selected from halogen, alkyl, aryl, arylalkyl or alkylaryl groups.

2. The temperature-resistant polymer according to claim 1, characterized in that The heat-resistant polymer also includes the following repeating unit (IV): Wherein, s is any integer from 1 to 50, and R1 and R2 have the meanings as described in the preceding claims.

3. The temperature-resistant polymer according to claim 1, characterized in that m:n is (1-99):(99-1); if the temperature-resistant polymer contains a third segment (III), (p+q):(m+n) is (1-80):(99-20).

4. The heat-resistant polymer according to claim 1, characterized in that: The R1 is selected from at least one of C1-C7 alkylene, phenylene or cycloalkylene; preferably at least one of ethylene, propylene, butylene, pentylene, phenylene, cyclobutylene, cyclopentylene or cyclohexylene; most preferably ethylene and propylene; R2 is selected from at least one of a C2-C12 straight chain alkylene group, a C3-C12 branched chain alkylene group, a C6-C12 aryl group or a C3-C12 cycloalkylene group, preferably at least one of a propylene group, a butylene group, a pentylene group, a cyclobutylene group, a cyclopentylene group or a cyclohexylene group; Cy is selected from phenylene, cyclohexylene or furanylene; R3 is selected from at least one of phenylene or cyclohexylene; R4 is selected from at least one of ethylene, 1,2-dimethylenecyclohexane, 1,3-dimethylenecyclohexane, 1,4-dimethylenecyclohexane, 1,3-diyl-2,2,4,4-tetramethylcyclobutane or (3S,3AR,6R,6AR)-hexahydro-[3,2-B]furan-3,6-diyl).

5. The heat-resistant polymer according to claim 1, wherein the heat-resistant polymer has a 14 C / 12 C ratio; or the polymer is synthesized using monomers derived from petroleum.

6. The heat-resistant polymer according to claim 1, wherein the heat-resistant polymer has the following performance parameters: According to GB / T 19466.2-2004, the Tg of the heat-resistant polyester material is greater than 30°C, preferably greater than 50°C, 70°C, 80°C, 90°C, 100°C, or 110°C.

7. A method for preparing a temperature-resistant polymer as claimed in claim 1, characterized in that: The method comprises the following steps: The temperature-resistant polymer is obtained by esterifying or transesterifying the cyclic imide diol (V), the cyclic diacid (VI) and its esterified product or oligomer, and the optional third monomer or its oligomer (VII); The cyclic imide diol has the following structural formula (V): R1 and R2 in the formula have the meanings as described in the preceding claims; The cyclic diacid has the following structural formula (VI): HOOC-Cy-COOH (VI); wherein Cy has the meaning as defined in the preceding claims, the ester is an ester of the cyclic diacid and a monoalkyl alcohol whose C1-C8 is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, and the oligomer is a prepolymer having a degree of polymerization of 1-100 obtained by polycondensation of the cyclic diacid and a polyol whose C1-C8 is unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl; The optional third monomer is selected from one or more of the following monomers (1) to (3): (1) R1 and R2 in the formula have the meanings as described in the preceding claims, and the precursor or precursor composition thereof is a primary amino diol and a dibasic acid and / or an anhydride corresponding to the dibasic acid; (2) HOOC-R3-COOH (Formula VII-2) and its esters or oligomers, wherein R3 has the meaning as defined in the preceding claims; the esters are esters of monoalkyl alcohols of Formula VII-2 and C1-C6 unsubstituted or substituted with substituents selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, and the oligomers are prepolymers having a degree of polymerization of 1 to 100 obtained by polycondensation of the polyols of Formula VII-2 and C1-C8 unsubstituted or substituted with substituents selected from halogen, alkyl, aryl, arylalkyl or alkylaryl; (3) HO-R4-OH (Formula VII-3), wherein R4 has the meaning as described in the preceding claims.

8. The method according to claim 7, characterized in that The cyclic imide diol is prepared from a primary amino diol and a dibasic acid and / or an acid anhydride corresponding thereto; The structural formula of the primary amino diol is shown in formula (VIII): wherein R2 has the meaning as described in the preceding claims; preferably, the primary amino diol is one or more of 2-amino-1,3-propanediol, 3-amino-1,2-propanediol, 2-amino-2-methyl-1,3-propanediol, 2-amino-2-ethyl-1,3-propanediol, 2-amino-1-phenyl-1,3-propanediol, 4-amino-1,2-butanediol, 3,4-dihydroxyaniline or 4-(2-aminoethyl)benzene-1,2-ethanediol; The dibasic acid structural formula is shown in formula (IX): H00C-R1-COOH, wherein R1 has the meaning as described in the preceding claims, preferably succinic acid, glutaric acid, phthalic acid or 1,2-cyclohexanedicarboxylic acid.

9. Use of a cyclic imide diol compound (V), an amide-containing diol compound (VII-1), a precursor composition of a compound of formula (V) or formula (VII-1), or a prepolymer formed by a compound of formula (V) or formula (VII-1) and a dicarboxylic acid for polymer synthesis, such as a hydroxyl-terminated or carboxyl-terminated prepolymer, in the preparation of a heat-resistant polyester material, wherein: The structural formula of the cyclic imide diol monomer is shown in formula (V): Amide-containing diol compound (VII-1) The precursor composition is a primary amino diol and an easily cyclic dibasic acid and / or an acid anhydride corresponding to the dibasic acid, or a diol monomer containing an amide bond, wherein the primary amino diol is HOR2(NH2)OH; wherein R1 and R2 are as defined in claim 1.

10. The use according to claim 9, wherein R1 is selected from at least one of C1-C7 alkylene, phenylene or cycloalkylene; preferably at least one of ethylene, propylene, phenylene or cyclohexylene; R2 is selected from at least one of C2-C12 straight-chain alkylene, C3-C12 branched alkylene, C6-C12 arylene or C3-C12 cycloalkylene, preferably propyleneene.

11. The use according to claim 9, wherein the content of the cyclic imide diol compound in the heat-resistant polyester material is 0.01-99.9%, preferably 0.01-25%, 5-80%, 10-75%, 20-50% or 75-99.9%.

12. The use according to claim 9, wherein the heat-resistant polyester material further comprises a segment unit obtained by polymerization of a polyol, and / or a polyacid and an anhydride or ester or oligomer thereof, wherein the polyacid has the following structural formula: HOOC-Cy-COOH (VI) or HOOC-R3-COOH (Formula VII-2), wherein: Cy, R3 as defined in claim 1; The ester is an ester of a monoalkyl alcohol of formula (VI) or (VII-2) and C1-C8 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl, and the oligomer is a prepolymer having a degree of polymerization of 1-100 obtained by condensation of a polyol of formula (VI) or (VII-2) and C1-C8 unsubstituted or substituted with a substituent selected from halogen, alkyl, aryl, arylalkyl or alkylaryl.

13. The use according to claim 9, wherein the heat-resistant polyester material has the following performance parameters: According to GB / T 19466.2-2004, the Tg of the heat-resistant polyester material is greater than 30°C, preferably greater than 50°C, 70°C, 80°C, 90°C, 100°C, or 110°C.

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