Energy regulation and deflection assembly, and ion implanter

Abstract

An energy regulation and deflection assembly and an ion implanter. The energy regulation and deflection assembly comprises an energy regulation module and a deflection module. The energy regulation module comprises an energy regulation electrode (202) and a suppression electrode (201), the energy regulation electrode (202) being arranged downstream the suppression electrode (201), and the suppression electrode (201) being used for suppressing a front-end electron beam and preventing transverse beam divergence in a front-end ion beam. The energy regulation electrode (202) comprises an acceleration mode, a deceleration mode and a drift mode, the energy regulation electrode (202) switching the working modes by regulating the electric potential; in the acceleration mode, an ion beam is accelerated to a predetermined energy; in the deceleration mode, the ion beam is decelerated to a predetermined energy; in the drift mode, the electron beam is suppressed and transverse divergence in the ion beam is prevented. The deflection module is arranged downstream the energy regulation module and is used for deflecting an ion beam processed by the energy regulation module by a predetermined angle. The ion implanter comprises the energy regulation and deflection assembly. The energy regulation module has the three working modes, which can be flexibly selected by actual needs; the deflection module eliminates energy pollution.

Description

Speed ​​regulating deflection assembly and ion implanter Technical Field

[0001] The present invention belongs to the field of semiconductor technology, and more specifically, relates to a speed-regulating deflection assembly and an ion implanter. Background Art

[0002] Ion implanters are common equipment in semiconductor component manufacturing. Their primary function is to manipulate dopant ions through various electrical and magnetic devices, ultimately implanting them into substrate materials to achieve material modification. With the advancement of science and technology, the importance of ion implantation in the semiconductor field has become increasingly prominent. The requirements for implanted ion energy, dopant type, doping depth, and implantation angle have become more precise, and the design requirements for ion implantation components have become even greater challenges.

[0003] Implantation depth is directly related to ion beam energy. Lowering the ion energy allows for shallower implantation depths, while increasing the ion beam current allows for a higher dose. However, current ion implanters can only perform a single acceleration or deceleration, a relatively simple process. Furthermore, this process can introduce energy contamination and result in beam loss. Technical issues

[0004] An embodiment of the present invention provides a speed regulation and deflection assembly and an ion implanter. The speed regulation module has three working modes, and can flexibly select acceleration, deceleration or drift of the ion beam according to actual needs. The deflection module is used to deflect the ion beam by a certain angle to eliminate energy pollution caused by acceleration and deceleration. In the deceleration mode, the drift length of the low-energy beam is shorter, which is conducive to saving structural space and reducing low-energy beam loss. It solves the problem that the current ion implanter can only perform a single acceleration or deceleration, and the ion beam will induce energy pollution and cause beam loss during the acceleration and deceleration process. Technical Solutions

[0005] To this end, the embodiments of the present invention provide the following technical solutions:

[0006] An embodiment of the present invention provides a speed regulation deflection assembly, comprising a speed regulation module and a deflection module.

[0007] The speed regulation module includes a speed regulation electrode and a suppression electrode. The speed regulation electrode is arranged downstream of the suppression electrode. The suppression electrode is used to suppress the front beam electrons and prevent the front ion beam from generating lateral beam divergence. The speed regulation electrode includes an acceleration mode, a deceleration mode and a drift mode. The speed regulation electrode switches the working mode by adjusting the potential. In the acceleration mode, the speed regulation electrode is used to accelerate the ion beam to a predetermined energy; in the deceleration mode, the speed regulation electrode is used to decelerate the ion beam to a predetermined energy; in the drift mode, the speed regulation electrode is used to suppress the beam electrons and prevent the ion beam from generating lateral divergence.

[0008] The deflection module is arranged downstream of the speed regulation module, and is used to deflect the ion beam processed by the speed regulation module by a predetermined angle.

[0009] Furthermore, the ground potential of the suppression electrode is the front-end electrode, and the potential relative to the front-end electrode is negative; in acceleration mode, the ground potential of the speed regulation electrode is the earth, and the potential relative to the front-end electrode is negative; in deceleration mode, the ground potential of the speed regulation electrode is the earth, and the potential relative to the front-end electrode is positive; in drift mode, the speed regulation electrode and the suppression electrode are connected to the same potential.

[0010] Furthermore, the deflection module includes multiple pairs of vertical deflection electrodes and a pair of horizontal focusing electrodes, the multiple pairs of vertical deflection electrodes are arranged front to back in the horizontal direction, and the horizontal focusing electrode is arranged between two rows of electrodes arranged above and below the multiple pairs of vertical deflection electrodes; in the deceleration mode, at least one pair of vertical deflection electrodes among the multiple pairs of vertical deflection electrodes is used to deflect the decelerated ion beam; in the acceleration mode and the drift mode, all the vertical deflection electrodes are used to deflect the ion beam.

[0011] Furthermore, in the deceleration mode, there is a voltage difference between the two electrodes of the vertical deflection electrode used to deflect the ion beam, and equal voltages are applied to the upper and lower electrodes of the remaining vertical deflection electrodes; in the acceleration mode and drift mode, there is a voltage difference between the upper and lower electrodes of all vertical deflection electrodes.

[0012] Furthermore, there are three pairs of vertical deflection electrodes. In the deceleration mode, the middle pair of vertical deflection electrodes among the three pairs of vertical deflection electrodes is used to deflect the decelerated ion beam.

[0013] Furthermore, the horizontal spacings between the three pairs of vertical deflection electrodes are the same, and in the acceleration mode and the drift mode, the voltage differences between the upper and lower electrodes of the front and rear pairs of vertical deflection electrodes are the same.

[0014] Furthermore, the suppression electrode is shaped like a plate with a hole in the middle, a rod that is not connected up and down, or a rod that is not connected up and down; the speed regulation electrode is shaped like a plate with a hole in the middle, a rod that is not connected up and down, or a rod that is not connected up and down.

[0015] Furthermore, each of the vertical deflection electrodes is in the shape of a round rod or a square.

[0016] Furthermore, each of the horizontal focusing electrodes is in the shape of a rod or a plate that is not connected in the middle.

[0017] An embodiment of the present invention further provides an ion implanter, comprising an ion source, a mass analyzer, a focusing device, a parallelizing magnet, and the speed regulating deflection assembly described in the above embodiment.

[0018] The ion source is used to generate an ion beam;

[0019] The mass analyzer is arranged downstream of the ion source and is used to perform mass analysis on the ion beam and screen out the ion species required for injection;

[0020] The focusing device is arranged downstream of the mass analyzer and is used for focusing or defocusing to make the screened ion beam converge or diverge;

[0021] The parallelizing magnet is arranged downstream of the focusing device and is used to parallelize the ion beam after converging or diverging;

[0022] The speed regulating and deflecting assembly is arranged downstream of the parallelizing magnet and is used to accelerate, decelerate, drift and deflect the parallelized ion beam. Beneficial effects

[0023] The beneficial effects of the present invention are as follows: the speed regulation module has three working modes, which can flexibly select acceleration, deceleration or drift of the ion beam according to actual needs; the deflection module is used to deflect the ion beam at a certain angle, eliminating the energy pollution caused by acceleration and deceleration, and the drift length of the low-energy beam is shorter in the deceleration mode, which is conducive to saving structural space and reducing low-energy beam loss. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of each embodiment. Obviously, the drawings described below are only some embodiments of the embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings in the specific description below of the embodiments of the present invention without paying any creative work.

[0025] FIG1 is a schematic diagram of a speed regulating deflection assembly according to an embodiment of the present invention.

[0026] FIG2 is a schematic structural diagram of a speed regulation module according to an embodiment of the present invention.

[0027] FIG3 is a schematic structural diagram of a deflection module according to an embodiment of the present invention.

[0028] FIG4 is a potential connection diagram of an embodiment of the present invention.

[0029] FIG5 is a diagram showing the relationship between electrode positions and deflection angles according to an embodiment of the present invention.

[0030] FIG6 is a schematic diagram of beam deflection in drift mode according to an embodiment of the present invention.

[0031] FIG7 is a schematic diagram of beam deflection in a deceleration mode according to an embodiment of the present invention. Modes for Carrying Out the Invention

[0032] The following, in conjunction with the accompanying drawings, provides a clear and complete description of the technical solutions of a speed-regulating deflection assembly and an ion implanter provided by various embodiments of the present invention. Obviously, the described embodiments are only a portion of the embodiments of the present invention, not all of them. All other embodiments derived by those skilled in the art based on the embodiments of the present invention without inventive effort are also within the scope of protection of the present invention.

[0033] In the description of the embodiments of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the embodiments of the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, so they cannot be understood as limitations on the embodiments of the present invention. In addition, the terms "first", "second", "third" and the like are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", and "third" may explicitly or implicitly include one or more features. In the description of the embodiments of the present invention, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined.

[0034] In the embodiments of the present invention, unless otherwise specified or limited, the terms "installed," "connected," "connected," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; internal communication between two components or interaction between two components, unless otherwise specified. Those skilled in the art will understand the specific meanings of the above terms in the embodiments of the present invention based on specific circumstances.

[0035] In the embodiments of the present invention, the word "exemplary" is used to mean "serving as an example, illustration or description". Any embodiment described as "exemplary" in the embodiments of the present invention is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is given to enable any person skilled in the art to implement and use the embodiments of the present invention. In the following description, the embodiments of the present invention are listed in detail for the purpose of explanation. It should be understood that a person of ordinary skill in the art can recognize that the embodiments of the present invention can be implemented even without using these specific details. In other examples, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the embodiments of the present invention with unnecessary details. Therefore, the embodiments of the present invention are not intended to be limited to the embodiments shown, but should be consistent with the widest scope consistent with the principles and features disclosed in the embodiments of the present invention.

[0036] Example 1:

[0037] Please refer to Figure 1, which is a schematic diagram of a speed regulation and deflection assembly. This embodiment specifically discloses a speed regulation and deflection assembly, including a speed regulation module and a deflection module. The speed regulation module is used to adjust the ion beam to a predetermined energy. As shown in Figures 1 and 2, the speed regulation module includes a speed regulation electrode 202 and a suppression electrode 201. The speed regulation electrode 202 is arranged downstream of the suppression electrode 201. The suppression electrode 201 is used to suppress the front beam electrons and prevent the front ion beam from generating lateral beam divergence. After being suppressed by the suppression electrode 201, the ion beam enters the speed regulation electrode 202 for processing. The suppression electrode 201 is shaped like a plate with a hole in the middle, a rod that is not connected to each other at the top and bottom, or a rod that is not connected to each other at the top and bottom. The speed regulation electrode 202 is shaped like a plate with a hole in the middle, a rod that is not connected to each other at the top and bottom, or a rod that is not connected to each other at the top and bottom. The shapes of the suppression electrode 201 and the speed regulation electrode 202 are set according to the layout and size of the ion implanter. As shown in FIG2 , in this embodiment, the suppression electrode 201 and the speed regulating electrode 202 are both in the shape of plates with a hole in the middle, and the ion beam passes through the hole between the suppression electrode 201 and the speed regulating electrode 202. The speed regulating electrode 202 includes an acceleration mode, a deceleration mode, and a drift mode. The speed regulating electrode 202 switches the working mode by adjusting the potential. In the acceleration mode, the speed regulating electrode 202 is used to accelerate the ion beam to a predetermined energy; in the deceleration mode, the speed regulating electrode 202 is used to decelerate the ion beam to a predetermined energy; in the drift mode, the speed regulating electrode 202 is used to suppress beam electrons and prevent the ion beam from generating lateral divergence; during the acceleration and deceleration process, the ion beam will introduce energy contamination. As shown in FIG1 , the deflection module is arranged downstream of the speed regulating module, and is used to deflect the ion beam processed by the speed regulating module to a predetermined angle, thereby eliminating the energy contamination caused by acceleration and deceleration and reducing low-energy beam loss.

[0038] In this embodiment, in acceleration mode, the ground potential of the suppression electrode 201 is the same as the front electrode, with a negative potential relative to the front electrode, while the ground potential of the speed control electrode 202 is the same as the earth, with a negative potential relative to the front electrode (i.e., the suppression electrode 201), achieving acceleration. In deceleration mode, the ground potential of the suppression electrode 201 is the same as the front electrode, with a negative potential relative to the front electrode, while the ground potential of the speed control electrode 202 is the same as the earth, with a positive potential relative to the front electrode (i.e., the suppression electrode 201), achieving deceleration. In drift mode, the ground potential of the suppression electrode 201 is the same as the front electrode, with a negative potential relative to the front electrode, and the speed control electrode and the suppression electrode 201 are connected to the same potential, jointly exerting a suppressive effect. The operating mode can be switched by adjusting the potential of the speed control electrode, which is simple and easy to operate.

[0039] As shown in Figures 1 and 3, the deflection module includes multiple pairs of vertical deflection electrodes and a pair of horizontal focusing electrodes. The multiple pairs of vertical deflection electrodes are arranged horizontally, one behind the other, with a horizontal spacing between them. The horizontal focusing electrode is positioned between two rows of electrodes arranged above and below the multiple pairs of vertical deflection electrodes. The vertical deflection electrodes are used to deflect the ion beam vertically by a certain angle. Due to the horizontal divergence caused by vertical deflection and the beam space charge effect, the horizontal focusing electrode is used to control the horizontal width of the beam and reduce horizontal beam energy loss. The number of vertical deflection electrodes and the horizontal spacing between them are set based on the actual deflection angle and the required energy intensity. In deceleration mode, at least one pair of the multiple pairs of vertical deflection electrodes is used to deflect the decelerated ion beam. In deceleration mode, the beam is decelerated to a predetermined energy, which is relatively low. Therefore, angular deflection of all vertical deflection electrodes is not required. The number of vertical deflection electrodes used to deflect the ion beam is adjusted based on the decelerated beam energy. In acceleration and drift modes, all vertical deflection electrodes are used to deflect the ion beam. Due to the high beam energy during acceleration and drift, multiple deflections are required, with each pair of electrodes providing a certain degree of deflection to ultimately achieve overall beam deflection and eliminate energy contamination. By adjusting the number of vertical deflection electrodes used for deflection and the horizontal spacing between electrodes, the exit angle and position of the ion beam can be adjusted for each mode, ensuring similar or consistent exit angles and positions for the final ion beam across all modules.

[0040] Each vertical deflection electrode is shaped like a round rod or a square. Each horizontal focusing electrode is shaped like a non-connected rod or plate. The two horizontal focusing electrodes are arranged horizontally, and the distance between the two electrodes can be flexibly adjusted based on the size and production needs of the actual ion implanter. The shapes of the vertical deflection electrodes and horizontal focusing electrodes can be flexibly selected based on the size and layout of the ion implanter. The ion beam passes between the upper and lower electrodes of the vertical deflection electrode and through the gap between each of the horizontal focusing electrodes.

[0041] In this embodiment, in deceleration mode, a voltage difference exists between the two electrodes of the vertical deflection electrode used to deflect the ion beam, while equal voltages are applied to the upper and lower electrodes of the remaining vertical deflection electrodes. This reduces the transmission distance of low-energy ion beams and provides corresponding beam control functions. In acceleration and drift modes, a voltage difference exists between the upper and lower electrodes of all vertical deflection electrodes, with each pair of electrodes providing a certain angle of deflection, ultimately achieving the overall beam deflection goal. Adjusting the potential relationship by adjusting the wiring of the vertical deflection electrodes can achieve adjustment of the deflection angle. By adaptively adjusting the potential of the deflection module according to the different operating states of the speed control electrodes, and thereby adjusting the deflection angle of the ion beam, the ion beam can ultimately achieve similar or consistent ion beam exit angles and positions in all modes, with simple operation.

[0042] In this embodiment, as shown in Figures 1 and 3, there are three pairs of vertical deflection electrodes. In deceleration mode, the middle pair of these three pairs is used to deflect the decelerated ion beam, thereby eliminating post-deceleration energy contamination. In acceleration and drift modes, all three pairs of vertical deflection electrodes are used to deflect the ion beam, with each pair deflecting the beam by a specific angle, ultimately achieving overall beam deflection and eliminating post-acceleration or drift energy contamination.

[0043] Furthermore, the horizontal spacing between the three pairs of vertical deflection electrodes is the same. In acceleration mode and drift mode, the voltage difference between the upper and lower electrodes of the front and rear pairs of vertical deflection electrodes is the same, which can ensure that the ion beam exit angle and position are consistent in each mode.

[0044] As shown in Figure 1, the deflection module includes three pairs of vertical deflection electrodes (a first pair of vertical deflection electrodes 301, 302, a second pair of vertical deflection electrodes 303, 304, and a third pair of vertical deflection electrodes 305, 306) and a pair of horizontal focusing electrodes 307, 308 in the middle. The suppression electrode 201 and the speed control electrode 202 are both plate-shaped with a central opening for the beam to pass through. The central opening allows the beam to pass through. The electrode 101 is at the same potential as the front-end beam line. The ground potential of the suppression electrode 201 is negative, and the counter electrode 101 is at a lower potential than the front-end electrode 101. This can inhibit the front-end beam electrons from entering the speed control and deflection assembly cavity, causing the front-end beam to diverge due to the space charge effect. The potential of the speed regulating electrode 202 can be higher than the potential of the suppression electrode 201, which has a pre-deceleration effect on the ion beam, that is, the deceleration mode of this embodiment; the potential of the speed regulating electrode 202 can be lower than the potential of the suppression electrode 201, which has an acceleration effect on the beam, that is, the acceleration mode of this embodiment; the potential of the speed regulating electrode 202 can also be consistent with the potential of the suppression electrode 201, and they jointly have a suppression effect, which is the drift mode of this embodiment.

[0045] Figure 4 shows the potential connection diagram of this embodiment. The potential of electrode 101 is V1, and the potential of the suppression electrode 201 is V2, which is lower than V1 and acts to suppress electrons. The speed control electrode 202 can be connected to V2, and together with the suppression electrode 201, it acts as a suppressor, i.e., the drift mode of this embodiment; it can also be connected to V3, with a potential higher than V2, to act as a pre-decelerator, i.e., the deceleration mode of this embodiment; it can also be connected to V3, with a potential lower than V2, to act as an accelerater, i.e., the acceleration mode of this embodiment. The upper electrode 301 of the first pair of vertical deflection electrodes has a potential of V8, and the lower electrode 302 has a potential of V4. In drift mode and acceleration mode, V8>V4, and the ion beam is deflected at the first pair of vertical deflection electrodes; in deceleration mode, V8=V4, and the ion beam is not deflected at the first pair of vertical deflection electrodes. The upper electrode 303 of the second pair of vertical deflection electrodes has a potential of V10, and the lower electrode 304 has a potential of V5. In drift mode and acceleration mode, V10>V5, and the ion beam is deflected at the second pair of vertical deflection electrodes. In deceleration mode, V10>V5, and the ion beam is deflected at the second pair of vertical deflection electrodes. The upper electrode 305 of the third pair of deflection electrodes has a potential of V11, and the lower electrode 306 has a potential of V7. In drift and acceleration mode, V11>V7, and the ion beam is deflected at the third pair of vertical deflection electrodes. In deceleration mode, V11=V7, and the ion beam is not deflected at the third pair of vertical deflection electrodes. The horizontal focusing electrode 307 has a potential of V9, and the horizontal focusing electrode 308 has a potential of V6.

[0046] As shown in Figure 5, in the deceleration mode, after the ion beam is decelerated to the required energy by the speed regulating electrode, the upper electrode 301 and the lower electrode 302 of the first pair of vertical deflection electrodes are applied with equal potential, and the potential of the lower electrode 304 of the second pair of vertical deflection electrodes is lower than the potential of the upper electrode 303, thereby achieving deflection. The upper electrode 305 and the lower electrode 306 of the third pair of vertical deflection electrodes are also applied with equal potential, and the beam moves to the end of L1, with a deflection angle of θ. In drift and acceleration modes, the beam energy is relatively high. The deflection is completed by three pairs of vertical deflection electrodes. At the beginning of L1, the deflection angle is recorded as θ1, at the end of L1, the deflection angle is recorded as θ2, and at the end of L2, the deflection angle is recorded as θ3. The exit angle and position of the ion beam in each mode should be consistent. Then L1, L2, θ1, θ2, θ3, θ should satisfy: θ1+θ2+θ3=θ (1) L1*tan(θ1)+L2*tan(θ1+θ2)=L2*tan(θ) (2)

[0047] When θ is small (generally less than 20°), we can approximate L1*θ1+L2*(θ1+θ2)=L2*θ (3)

[0048] Substituting the relationship in (1) into (3), we get: L1*θ1=L2*θ3 (4)

[0049] Specially, we can take L1=L2, that is, θ1=θ3.

[0050] Therefore, the exit angle and position of the ion beam can be adjusted by adjusting the position and potential of the vertical deflection electrode, thereby improving the flexibility of the ion implanter. In this embodiment, the exit angle and position of the ion beam in each mode can be made consistent by adjusting the position and potential of the vertical deflection electrode, and the working mode and deflection angle can also be flexibly adjusted by adjusting the potential. The horizontal spacing between the three pairs of vertical deflection electrodes is the same. In the deceleration mode, only the middle pair of vertical deflection electrodes has a voltage difference. In the acceleration mode and drift mode, there is a voltage difference between the upper and lower electrodes of the three pairs of vertical deflection electrodes. When the voltage difference between the upper and lower electrodes of the front and rear pairs of vertical deflection electrodes is the same, the exit angle and position of the ion beam in the three modes are consistent.

[0051] As shown in Figure 6, in drift mode, the high-energy beam completes trajectory deflection under the action of three deflection electrodes. As shown in Figure 7, the high-energy beam is decelerated by the deceleration module and deflected under the action of the middle vertical deflection electrode, decelerating to the target energy, and eliminating the energy pollution caused by deceleration through beam deflection. The ion beam exit angles and positions of Figures 6 and 7 are consistent. This proves that the speed regulation and deflection assembly of this embodiment can effectively realize beam deflection in various modes, eliminate energy pollution caused by acceleration or deceleration, and reduce low-energy beam loss.

[0052] Example 2:

[0053] Based on the same inventive concept as the first embodiment, this embodiment specifically provides an ion implanter, including an ion source, a mass analyzer, a focusing device, a parallelizing magnet, and the speed-regulating deflection assembly described in the above embodiment.

[0054] An ion source is used to generate an ion beam. The ion source is capable of generating polyvalent ions of boron, phosphorus, arsenic, argon, xenon, or nitrogen.

[0055] The mass analyzer is set downstream of the ion source to perform mass analysis on the ion beam and screen out the ion species required for injection to ensure the purity of the ion species. At the same time, it partially focuses the transmitted ion beam to increase the beam transmission efficiency.

[0056] The focusing device is disposed downstream of the mass analyzer and is used to focus or defocus the screened ion beam, converging or diverging it, controlling the size of the ion beam and shaping it into a desired cross-sectional shape. In this embodiment, the focusing device is a set of quadrupole lenses.

[0057] The parallelizing magnet is arranged downstream of the focusing device and is used to parallelize the converged or diverged ion beam and bend the deflected ion beam back to be parallel to a preset ion beam reference track.

[0058] The speed regulating deflection assembly is arranged downstream of the parallelizing magnet and is used to accelerate, decelerate, drift and deflect the parallelized ion beam to eliminate energy contamination. Finally, the ion beam enters the target chamber.

[0059] The ion implanter of this embodiment can flexibly select the working mode according to actual production needs through the design of the speed regulation deflection component, and can eliminate the energy pollution of the beam. By adjusting the potential and the position distribution of the electrode, the ion beam outlet angle and position can be consistent in the three working modes, thereby improving the flexibility of the ion implanter and the accuracy of ion implantation.

[0060] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent replacements, and simple improvements made to the essential contents of the embodiments of the present invention should be included in the scope of protection of the present invention.

Claims

1. A speed regulating deflection assembly, wherein: Including speed control module and deflection module, The speed regulation module includes a speed regulation electrode and a suppression electrode. The speed regulation electrode is arranged downstream of the suppression electrode. The suppression electrode is used to suppress the front beam electrons and prevent the front ion beam from generating lateral beam divergence. The speed regulation electrode includes an acceleration mode, a deceleration mode and a drift mode. The speed regulation electrode switches the working mode by adjusting the potential. In the acceleration mode, the speed regulation electrode is used to accelerate the ion beam to a predetermined energy; in the deceleration mode, the speed regulation electrode is used to decelerate the ion beam to a predetermined energy; in the drift mode, the speed regulation electrode is used to suppress the beam electrons and prevent the ion beam from generating lateral divergence. The deflection module is arranged downstream of the speed regulation module, and is used to deflect the ion beam processed by the speed regulation module to a predetermined angle.

2. The speed regulating deflection assembly according to claim 1, wherein: The ground potential of the suppression electrode is the same as that of the front-end electrode, and is negative relative to the potential of the front-end electrode; in acceleration mode, the ground potential of the speed regulation electrode is the earth, and is negative relative to the potential of the front-end electrode; in deceleration mode, the ground potential of the speed regulation electrode is the earth, and is positive relative to the potential of the front-end electrode; in drift mode, the speed regulation electrode and the suppression electrode are connected to the same potential.

3. The speed regulating deflection assembly according to claim 1, wherein: The deflection module includes multiple pairs of vertical deflection electrodes and a pair of horizontal focusing electrodes. The multiple pairs of vertical deflection electrodes are arranged front and back in the horizontal direction, and the horizontal focusing electrode is arranged between two rows of electrodes arranged up and down of the multiple pairs of vertical deflection electrodes. In the deceleration mode, at least one pair of vertical deflection electrodes among the multiple pairs of vertical deflection electrodes is used to deflect the decelerated ion beam; in the acceleration mode and the drift mode, all the vertical deflection electrodes are used to deflect the ion beam.

4. The speed regulating deflection assembly according to claim 3, wherein: In the deceleration mode, there is a voltage difference between the two electrodes of the vertical deflection electrode used to deflect the ion beam, and equal voltages are applied to the upper and lower electrodes of the remaining vertical deflection electrodes; in the acceleration mode and drift mode, there is a voltage difference between the upper and lower electrodes of all vertical deflection electrodes.

5. The speed regulating deflection assembly according to claim 3, wherein: There are three pairs of vertical deflection electrodes. In the deceleration mode, the middle pair of vertical deflection electrodes among the three pairs of vertical deflection electrodes is used to deflect the decelerated ion beam.

6. The speed regulating deflection assembly according to claim 5, wherein: The horizontal spacings between the three pairs of vertical deflection electrodes are the same, and in the acceleration mode and the drift mode, the voltage differences between the upper and lower electrodes of the front and rear pairs of vertical deflection electrodes are the same.

7. The speed regulating deflection assembly according to claim 1, wherein: The suppressing electrode is in the shape of a plate with a hole in the middle, a rod that is not connected up and down, or a rod that is not connected up and down; the speed regulating electrode is in the shape of a plate with a hole in the middle, a rod that is not connected up and down, or a rod that is not connected up and down.

8. The speed regulating deflection assembly according to claim 3, wherein: Each of the vertical deflection electrodes is in the shape of a round rod or a square.

9. The speed regulating deflection assembly according to claim 3, wherein: Each electrode of the horizontal focusing electrode is in the shape of a rod or a plate that is not connected in the middle.

10. An ion implanter, wherein: It comprises an ion source, a mass analyzer, a focusing device, a parallelizing magnet and a speed regulating deflection assembly according to any one of claims 1 to 9, The ion source is used to generate an ion beam; The mass analyzer is arranged downstream of the ion source and is used to perform mass analysis on the ion beam and screen out the ion species required for injection; The focusing device is arranged downstream of the mass analyzer and is used for focusing or defocusing to make the screened ion beam converge or diverge; The parallelization magnet is arranged downstream of the focusing device and is used to parallelize the converged or diverged ion beam; The speed regulating and deflecting assembly is arranged downstream of the parallelizing magnet, and is used for accelerating, decelerating, drifting and deflecting the parallelized ion beam.

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