Display substrate and display device

Abstract

A display substrate and a display device. The display substrate comprises: a transistor provided on a base, and an insulating dielectric layer (31) and an optical auxiliary structure (82) provided on the side of the transistor away from the base, wherein the insulating dielectric layer (31) is provided with a first channel (901), and the first channel (901) is filled with at least part of the optical auxiliary structure (82).

Description

Display substrate, display device Technical Field

[0001] This article relates to but is not limited to the field of display technology, and specifically to a display substrate and a display device. Background Art

[0002] In recent years, with the diversified expansion of VR (virtual reality) and AR (augmented reality) application fields, the demand for VR and AR products has grown rapidly. The display panel of VR and AR products is one of their core hardware. More pixel viewpoints are needed to restore the real scene. The PPI (Pixels Per Inch) demand is getting higher and higher, and the resolution is generally required to be higher than 1500PPI. The higher the PPI demand of the display panel, the smaller the area occupied by a single pixel. As the pixel size decreases, the aperture ratio drops sharply, and the display brightness decreases accordingly, which seriously restricts the improvement of the display performance and application of AR / VR products. Increasing the aperture ratio and optimizing the light efficiency are crucial for AR / VR displays.

[0003] Liquid crystal displays (LCDs) have rapidly developed due to their small size, low power consumption, and zero radiation. An LCD panel consists of a cell-aligned thin-film transistor (TFT) array substrate and a color filter (CF) substrate. Liquid crystal (LC) molecules are positioned between the array and CF substrates. By controlling the second and first electrodes, an electric field is generated to drive the liquid crystal deflection, achieving grayscale display.

[0004] Summary of the Invention

[0005] The following is a summary of the subject matter described in detail herein. This summary is not intended to limit the scope of the claims.

[0006] The present disclosure provides a display substrate, comprising:

[0007] a transistor disposed on a substrate;

[0008] An insulating dielectric layer and an optical auxiliary structure are provided on a side of the transistor away from the substrate;

[0009] The insulating medium layer has a first channel, and the optical auxiliary structure is at least partially filled into the first channel.

[0010] In an exemplary embodiment, the optical auxiliary structure fills part or all of the first channel.

[0011] In an exemplary embodiment, an organic medium layer is further included, at least a portion of which is located in the first channel, the organic medium layer is arranged on a side of the optical auxiliary structure close to the substrate and is in direct contact with the optical auxiliary structure, and the refractive index of the organic medium layer is greater than the refractive index of the optical auxiliary structure.

[0012] In an exemplary embodiment, the optical auxiliary structure includes a first surface close to the substrate, the shape of the first surface includes an arc that is convex along the direction close to the substrate, the organic medium layer includes a second surface away from the substrate, the shape of the second surface includes an arc that is concave along the direction close to the substrate, the first surface is in direct contact with the second surface, and the first surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

[0013] In an exemplary embodiment, a ratio of a minimum height of the organic medium layer in the first channel in a direction perpendicular to the substrate to a height of a first surface of the optical auxiliary structure is greater than or equal to 0.8 and less than or equal to 1.2.

[0014] In an exemplary embodiment, an organic medium layer is further included, at least a portion of which is located in the first channel, and the organic medium layer is arranged on a side of the optical auxiliary structure away from the substrate and in direct contact with the optical auxiliary structure; the refractive index of the organic medium layer is greater than the refractive index of the optical auxiliary structure.

[0015] In an exemplary embodiment, the transistor includes an active layer, at least one insulating layer is disposed between the active layer and the insulating dielectric layer, and the at least one insulating layer has a second hole, and the second hole exposes at least a portion of the active layer.

[0016] In an exemplary embodiment, the second channel is in communication with the first channel, and an orthographic projection of the second channel on the substrate is located within an orthographic projection of the first channel on the substrate.

[0017] In an exemplary embodiment, a boss is formed at a connection between a side wall of the second channel and a side wall of the first channel.

[0018] In an exemplary embodiment, at least a portion of the second channel's side away from the substrate does not overlap with an orthographic projection of a side of the first channel's side close to the substrate on the substrate.

[0019] In an exemplary embodiment, an organic medium layer is further included, and at least a portion of the organic medium layer fills the second channel.

[0020] In an exemplary embodiment, at least a portion of the insulating dielectric layer fills the second channel.

[0021] In an exemplary embodiment, a first electrode and a connecting electrode are further included, wherein the first electrode is arranged on a side of the first channel away from the substrate, the first electrode is connected to the connecting electrode, and at least a portion of the connecting electrode covers the inner walls of the first channel and the second channel and is connected to the active layer.

[0022] In an exemplary embodiment, at least a portion of the first electrode is in contact with a surface of the optical auxiliary structure that is away from the substrate, and a refractive index of the first electrode is greater than a refractive index of the optical auxiliary structure.

[0023] In an exemplary embodiment, the optical auxiliary structure includes a first surface close to the side of the substrate, the shape of the first surface includes an arc convex along the direction close to the substrate, and the first surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

[0024] In an exemplary embodiment, the optical auxiliary structure includes a first surface close to the side of the substrate, the shape of the first surface includes an arc that is concave along a direction close to the substrate, and the first surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

[0025] In an exemplary embodiment, the optical auxiliary structure includes a third surface away from the substrate, the shape of the third surface includes an arc convex along the direction away from the substrate, and the third surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

[0026] In an exemplary embodiment, the radian of the third surface of the optical auxiliary structure may be greater than or equal to 0.15π and less than or equal to 0.5π.

[0027] In an exemplary embodiment, the optical auxiliary structure includes a first part and a second part connected as an integral whole, the first part fills at least a portion of the first channel, the first part includes a first surface close to the side of the substrate, the shape of the first surface includes an arc convex along the direction close to the substrate, and the first surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate; the second part is located on the side of the first channel away from the substrate, and the orthographic projection of the second part on the substrate includes the orthographic projection of the first channel on the substrate.

[0028] On the other hand, the present disclosure further provides a display device comprising the aforementioned display substrate.

[0029] In an exemplary embodiment, a light emitting substrate is further included, and the light emitting substrate is disposed on a side of the base away from the optical auxiliary structure; or the light emitting substrate is disposed on a side of the optical auxiliary structure away from the base.

[0030] In an exemplary embodiment, a color filter substrate is further included, which is arranged in a box with the display substrate. The color filter substrate includes a filter layer and a lens structure arranged on a side of the filter layer away from the display substrate. The filter layer includes a filter pattern, and the lens structure includes a lens pattern. The filter pattern overlaps with the orthographic projection of the lens pattern on the substrate.

[0031] Still other aspects will become apparent upon reading and understanding the accompanying drawings and detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The accompanying drawings are used to provide an understanding of the technical solution of the present disclosure and constitute a part of the specification. Together with the embodiments of the present disclosure, they are used to explain the technical solution of the present disclosure and do not constitute a limitation to the technical solution of the present disclosure.

[0033] FIG1 is a schematic diagram of a cross-sectional structure of a display device;

[0034] FIG2 is a schematic diagram of a planar structure of a display device;

[0035] FIG3 is a schematic diagram of a planar structure of a display substrate;

[0036] FIG4a is a schematic diagram of a planar structure of a display area in a display substrate according to an exemplary embodiment of the present disclosure;

[0037] FIG4 b is a schematic diagram of a planar structure of a non-display area in a display substrate according to an exemplary embodiment of the present disclosure;

[0038] FIG4c is a schematic cross-sectional view of a display substrate according to an exemplary embodiment of the present disclosure;

[0039] FIG4 d is a schematic cross-sectional view of a first channel of a display substrate according to an exemplary embodiment of the present disclosure;

[0040] FIG4e is a schematic cross-sectional view of a first channel of a display substrate according to an exemplary embodiment of the present disclosure;

[0041] 5a to 5c are schematic diagrams showing the working principle of an optical auxiliary structure of a display substrate according to an exemplary embodiment of the present disclosure;

[0042] FIG6 a is a schematic structural diagram of a display substrate after forming a second active layer in a preparation process of an exemplary embodiment of the present disclosure;

[0043] FIG6 b is a schematic structural diagram of a display substrate after forming a second gate in a preparation process of an exemplary embodiment of the present disclosure;

[0044] FIG6 c is a schematic structural diagram of a display substrate after forming a first active layer in a preparation process of an exemplary embodiment of the present disclosure;

[0045] FIG6 d is a schematic structural diagram of a display substrate after forming a first gate in a preparation process of an exemplary embodiment of the present disclosure;

[0046] FIG6e is a schematic structural diagram of a display substrate after forming a first via hole, a second via hole, a third via hole, and a first conductive layer in a preparation process of an exemplary embodiment of the present disclosure;

[0047] FIG6 f is a schematic structural diagram of a display substrate after forming connection vias during the preparation process of an exemplary embodiment of the present disclosure;

[0048] FIG6g is a schematic structural diagram of a display substrate after forming connecting electrodes in a preparation process of an exemplary embodiment of the present disclosure;

[0049] FIG6h is a schematic structural diagram of a display substrate preparation process after forming an organic dielectric layer and an optical auxiliary structure according to an exemplary embodiment of the present disclosure;

[0050] FIG6i is a schematic structural diagram of a display substrate after forming a first electrode in a preparation process of an exemplary embodiment of the present disclosure;

[0051] FIG7 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure;

[0052] FIG8 a is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure;

[0053] FIG8 b is a schematic cross-sectional view of a first channel of another display substrate according to an exemplary embodiment of the present disclosure;

[0054] FIG9 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure;

[0055] FIG10 a is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure;

[0056] FIG10 b is a schematic cross-sectional view of the first and second channels of another display substrate according to an exemplary embodiment of the present disclosure;

[0057] FIG11 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure;

[0058] FIG12a is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure;

[0059] FIG12 b is a schematic cross-sectional view of another exemplary embodiment of the present disclosure showing a connecting via hole on a substrate;

[0060] FIG13 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure;

[0061] FIG14 is a schematic cross-sectional view of a second substrate of another display device according to an exemplary embodiment of the present disclosure;

[0062] FIG15 is a schematic cross-sectional view of another display device according to an exemplary embodiment of the present disclosure;

[0063] FIG16 is a schematic cross-sectional view of another display device according to an exemplary embodiment of the present disclosure;

[0064] FIG17 is a schematic cross-sectional view of another display device according to an exemplary embodiment of the present disclosure. DETAILED DESCRIPTION

[0065] In order to make the purpose, technical solutions and advantages of the present disclosure clearer, the embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. Note that the embodiments can be implemented in a variety of different forms. A person of ordinary skill in the art can easily understand the fact that the methods and contents can be transformed into various forms without departing from the purpose and scope of the present disclosure. Therefore, the present disclosure should not be interpreted as being limited to the contents described in the following embodiments. In the absence of conflict, the embodiments in the present disclosure and the features in the embodiments can be arbitrarily combined with each other.

[0066] The scales in the figures in this disclosure are intended to serve as a reference for actual processes, but are not intended to be limiting. For example, the channel width-to-length ratio, the thickness and spacing of the various film layers, and the width and spacing of the various signal lines can be adjusted based on actual needs. The number of pixels in the display substrate and the number of sub-pixels within each pixel are not limited to the numbers shown in the figures. The figures described in this disclosure are merely schematic diagrams of the structures, and one embodiment of this disclosure is not limited to the shapes or values ​​shown in the figures.

[0067] In this specification, ordinal numbers such as “first”, “second” and “third” are provided to avoid confusion among constituent elements, and are not intended to limit the number.

[0068] In this specification, for convenience, words and phrases indicating orientation or positional relationships, such as "middle," "upper," "lower," "front," "back," "vertical," "horizontal," "top," "bottom," "inside," and "outside," are used to illustrate the positional relationships of constituent elements with reference to the accompanying drawings. This is merely for the purpose of facilitating the description of this specification and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limiting the present disclosure. The positional relationships of constituent elements may be appropriately changed depending on the direction in which each constituent element is described. Therefore, the present disclosure is not limited to the words and phrases described in the specification and may be appropriately replaced according to the circumstances.

[0069] In this specification, unless otherwise specified or limited, the terms "mounted," "connected," and "connected" should be understood broadly. For example, they can refer to fixed, removable, or integral connections; mechanical or electrical connections; direct connections, indirect connections through intermediaries, or internal communication between two components. Those skilled in the art will understand the specific meanings of these terms in this disclosure.

[0070] In this specification, a transistor refers to a device that includes at least three terminals: a gate, a drain electrode, and a source electrode. A transistor has a channel region between a drain electrode (drain electrode terminal, drain region, or drain electrode) and a source electrode (source electrode terminal, source region, or source electrode), and current can flow through the drain electrode, the channel region, and the source electrode. Note that in this specification, the channel region refers to the region through which current primarily flows.

[0071] In this specification, the first electrode can be a drain electrode and the second electrode can be a source electrode, or vice versa. The functions of "source electrode" and "drain electrode" may be interchanged when using transistors with opposite polarity or when the direction of current changes during circuit operation. Therefore, in this specification, "source electrode" and "drain electrode" can be interchanged, and "source terminal" and "drain terminal" can be interchanged.

[0072] In this specification, "electrically connected" includes components connected together via an element having some electrical function. There are no particular limitations on the "element having some electrical function" as long as it enables the transfer of electrical signals between the connected components. Examples of "element having some electrical function" include not only electrodes and wiring, but also switching elements such as transistors, resistors, inductors, capacitors, and other components with various functions.

[0073] In this specification, "parallel" refers to a state where the angle formed by two straight lines is greater than -10° and less than 10°, and thus also includes a state where the angle is greater than -5° and less than 5°. Furthermore, "perpendicular" refers to a state where the angle formed by two straight lines is greater than 80° and less than 100°, and thus also includes a state where the angle is greater than 85° and less than 95°.

[0074] In this specification, the terms "film" and "layer" may be interchanged. For example, "conductive layer" may be replaced with "conductive film." Similarly, "insulating film" may be replaced with "insulating layer."

[0075] The triangles, rectangles, trapezoids, pentagons or hexagons in this specification are not in the strict sense, but may be approximate triangles, rectangles, trapezoids, pentagons or hexagons, etc. There may be some small deformations caused by tolerances, and there may be chamfers, arc edges and deformations.

[0076] The term "about" in the present disclosure refers to a numerical value that is not strictly defined and allows for process and measurement errors.

[0077] Research by the inventors of this disclosure has revealed that existing liquid crystal display devices include pixel electrodes, common electrodes, routing areas, and via areas. The pixel electrodes are located in the opening area, the routing area includes data lines and gate lines, and the via area is filled with inorganic and organic materials. Both the routing area and the via area are obscured by the black matrix in the color filter substrate. For high-PPI products, increasing the aperture ratio can be achieved by reducing the routing size. However, this size reduction is limited by the process capabilities of the equipment, preventing further increases in the aperture ratio.

[0078] Figure 1 is a schematic cross-sectional view of a display device. As shown in Figure 1, the display device may include a first substrate 100 and a second substrate 200 disposed opposite each other, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may include a first structural layer 102 disposed on the side of the first base 10 facing the second substrate 200, and the second substrate 200 may include a second structural layer 202 disposed on the side of the second base 201 facing the first substrate 100.

[0079] In an exemplary embodiment, the first substrate 100 may serve as an array substrate, and the first structure layer 102 may include gate lines, data lines, thin film transistors, first electrodes, and second electrodes. The second substrate 200 may serve as a color filter substrate, and the second structure layer 202 may include a filter layer and a black matrix. The liquid crystal layer 300 may include a plurality of liquid crystal molecules having dielectric anisotropy. In response to an electric field applied between the array substrate and the color filter substrate, the liquid crystal molecules may rotate in a predetermined direction between the array substrate and the color filter substrate, thereby allowing or blocking light transmission.

[0080] Figure 2 is a schematic diagram of a planar structure of a display device. As shown in Figure 2, the display device may include a plurality of pixel units P arranged in a matrix manner, at least one of the plurality of pixel units P includes a first sub-pixel P1 emitting a first color light, a second sub-pixel P2 emitting a second color light, and a third sub-pixel P3 emitting a third color light, and the three sub-pixels may each include a thin film transistor, a first electrode, and a second electrode. In an exemplary embodiment, the first sub-pixel P1 may be a red sub-pixel emitting red (R) light, the second sub-pixel P2 may be a green sub-pixel emitting green (G) light, and the third sub-pixel P3 may be a blue sub-pixel emitting blue (B) light. The shape of the sub-pixels in the pixel unit may be rectangular, diamond, pentagonal, or hexagonal, etc. The sub-pixels in the pixel unit may be arranged horizontally, vertically, or in a herringbone manner, which is not limited in this disclosure. In an exemplary embodiment, the pixel unit may include four sub-pixels, which is not limited in this disclosure.

[0081] Figure 3 is a schematic diagram of a planar structure of a display substrate. As shown in Figure 3, in an exemplary embodiment, the display substrate includes a display area and a frame area. The display area may include multiple gate lines (S1 to Sm) and multiple data lines (D1 to Dn). The multiple gate lines may extend horizontally and are arranged in sequence along the vertical direction. The multiple data lines may extend vertically and are arranged in sequence along the horizontal direction. The multiple intersecting gate lines and data lines define a plurality of regularly arranged sub-pixels Pxij, where i and j may be natural numbers. In an exemplary embodiment, at least one sub-pixel Pxij may include a thin film transistor, a first electrode, and a second electrode. The thin film transistor is respectively connected to the gate line, the data line, and the first electrode.

[0082] In an exemplary embodiment, the display substrate may further include a plurality of second electrode lines (E1 to Eo), which may extend horizontally and be sequentially arranged vertically, and are correspondingly connected to the second electrodes in the plurality of sub-pixels Pxij.

[0083] In an exemplary embodiment, a plurality of gate lines are led out to the frame area and connected to a scan driver, a plurality of data lines are led out to the frame area and connected to a data driver, and at least a portion of the scan driver and the data driver may be formed on an array substrate.

[0084] In an exemplary embodiment, an external control device (such as a timing controller) may provide grayscale values ​​and control signals suitable for the specifications of the data driver to the data driver. The data driver may use the received grayscale values ​​and control signals to generate data voltages to be provided to the data signal lines D1, D2, D3, ..., and Dn. For example, the data driver may use a clock signal to sample the grayscale values ​​and apply data voltages corresponding to the grayscale values ​​to the data signal lines D1 to Dn on a pixel row basis, where n may be a natural number. The external control device may provide a clock signal, a scan start signal, etc. suitable for the specifications of the scan driver to the scan driver. The scan driver may use the clock signal, the scan start signal, etc. to generate scan signals to be provided to the scan signal lines S1, S2, S3, ..., and Sm. For example, the scan driver may sequentially provide scan signals having on-level pulses to the scan signal lines S1 to Sm, where m may be a natural number. For example, the scan driver may be configured as a shift register and may generate scan signals by sequentially transmitting the scan start signal provided in the form of an on-level pulse to the next stage circuit under the control of the clock signal.

[0085] The present disclosure provides a display substrate, comprising:

[0086] a transistor disposed on a substrate;

[0087] An insulating dielectric layer and an optical auxiliary structure are provided on a side of the transistor away from the substrate;

[0088] The insulating medium layer has a first channel, and the optical auxiliary structure is at least partially filled into the first channel.

[0089] In an exemplary embodiment, the optical auxiliary structure fills part or all of the first channel.

[0090] In an exemplary embodiment, an organic medium layer is further included, at least a portion of which is located in the first channel, the organic medium layer is arranged on a side of the optical auxiliary structure close to the substrate and is in direct contact with the optical auxiliary structure, and the refractive index of the organic medium layer is greater than the refractive index of the optical auxiliary structure.

[0091] In an exemplary embodiment, the optical auxiliary structure includes a first surface close to the substrate, the shape of the first surface includes an arc that is convex along the direction close to the substrate, the organic medium layer includes a second surface away from the substrate, the shape of the second surface includes an arc that is concave along the direction close to the substrate, the first surface is in direct contact with the second surface, and the first surface is configured to focus the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

[0092] In an exemplary embodiment, a ratio of a minimum height of the organic medium layer in the first channel in a direction perpendicular to the substrate to a height of a first surface of the optical auxiliary structure is greater than or equal to 0.8 and less than or equal to 1.2.

[0093] In an exemplary embodiment, an organic medium layer is further included, at least a portion of which is located in the first channel, and the organic medium layer is arranged on a side of the optical auxiliary structure away from the substrate and in direct contact with the optical auxiliary structure; the refractive index of the organic medium layer is greater than the refractive index of the optical auxiliary structure.

[0094] The display substrate of the present disclosure is described below by way of some exemplary embodiments.

[0095] Figure 4a is a schematic planar structural diagram of a display region in a display substrate according to an exemplary embodiment of the present disclosure. The display region of the exemplary display substrate according to the present disclosure includes a first active layer 21 disposed on a first substrate, a first gate electrode 71 disposed on a side of the first active layer 21 away from the first substrate, a first electrode 51 disposed on a side of the first gate electrode 71 away from the first substrate 10, a first electrode 55 disposed on a side of the first electrode 51 away from the first substrate 10, and a second electrode disposed on a side of the first electrode 55 away from the first substrate 10.

[0096] In an exemplary embodiment, the display region of the exemplary display substrate of the present disclosure further includes a first via 91 and a connecting via 90. Both the first via 91 and the connecting via 90 extend perpendicular to the first substrate. The first via 91 exposes the first contact end of the first active layer 21, and the first electrode 51 is connected to the first contact end of the first active layer 21 through the first via 91. The connecting via 90 exposes the second contact end of the first active layer 21, and the first electrode 55 is connected to the second contact end of the first active layer 21 through the connecting via 90.

[0097] Figure 4b is a schematic planar structural diagram of a non-display region in a display substrate according to an exemplary embodiment of the present disclosure. The non-display region of the exemplary display substrate according to the present disclosure includes a second active layer 22 disposed on a first substrate, a second gate electrode 72 disposed on a side of the second active layer 22 away from the first substrate 10, and a second electrode 52 and a third electrode 53 disposed on a side of the second gate electrode 72 away from the first substrate 10.

[0098] In an exemplary embodiment, the non-display region of the exemplary display substrate of the present disclosure further includes a second via 92 and a third via 93. Both the second via 92 and the third via 93 extend perpendicularly to the first substrate. The second via 92 exposes the first contact end of the second active layer 22, and the second electrode 52 is connected to the first contact end of the second active layer 22 through the second via 92. The third via 93 exposes the second contact end of the second active layer 22, and the third electrode 53 is connected to the second contact end of the second active layer 22 through the third via 93.

[0099] Figure 4c is a schematic cross-sectional view of a display substrate according to an exemplary embodiment of the present disclosure. The cross-sectional view of the display area 400 in Figure 4c is a cross-sectional view taken along the line AA' in Figure 4a; the cross-sectional view of the non-display area 500 in Figure 4c is a cross-sectional view taken along the line BB' in Figure 4b. In an exemplary embodiment, as shown in Figure 4c, the exemplary display substrate according to the present disclosure may be an array substrate. On a plane perpendicular to the display substrate, the exemplary display substrate of the present disclosure includes a first substrate 10, a first insulating layer 11 disposed on the first substrate 10, a second active layer 22 disposed on a side of the first insulating layer 11 away from the first substrate 10, a second insulating layer 12 disposed on a side of the second active layer 22 away from the first substrate 10, a second gate 72 disposed on a side of the second insulating layer 12 away from the first substrate 10, a third insulating layer 13 disposed on a side of the second gate 72 away from the first substrate 10, a first active layer 21 disposed on a side of the third insulating layer 13 away from the first substrate 10, a fourth insulating layer 14 disposed on a side of the first active layer 21 away from the first substrate 10, a first gate 71 disposed on a side of the fourth insulating layer 14 away from the first substrate 10, and a The fifth insulating layer 15 is located on the side of the first gate 71 away from the first substrate 10, the first conductive layer is located on the side of the fifth insulating layer 15 away from the first substrate 10, the sixth insulating layer 16 is located on the side of the first conductive layer away from the first substrate 10, the insulating dielectric layer 31 is located on the side of the sixth insulating layer 16 away from the first substrate 10, the connecting electrode 54 is located on the side of the insulating dielectric layer 31 away from the first substrate 10, the first electrode 55 is located on the side of the connecting electrode 54 away from the first substrate 10, the seventh insulating layer 17 is located on the side of the first electrode 55 away from the first substrate 10, the second electrode 56 and the light shielding layer 57 are located on the side of the seventh insulating layer 17 away from the first substrate 10, and the spacer layer 80 is located on the side of the light shielding layer 57 away from the first substrate 10.

[0100] In an exemplary embodiment, the connection electrode 54 is connected to the first active layer 21 at a side close to the first substrate, and is connected to the second electrode 56 at a side away from the first substrate.

[0101] In an exemplary embodiment, the first substrate 10 may include glass, metal, or a polymer resin. When the first substrate 10 is flexible or bendable, the first substrate 10 may include a polymer resin such as polyethersulfone, polyacrylate, polyetherimide, polyethylene naphthalate, polyethylene terephthalate, polyphenylene sulfide, polyarylate, polyimide, polycarbonate, or cellulose acetate propionate. Various modifications are possible. For example, the first substrate 10 may have a multilayer structure including two layers each including such a polymer resin and a barrier layer between the two layers including an inorganic material (e.g., silicon oxide, silicon nitride, or silicon oxynitride).

[0102] In an exemplary embodiment, the first conductive layer includes a first electrode 51, a second electrode 52, and a third electrode 53. The first electrode 51, the second electrode 52, and the third electrode 53 can be made of the same material and through the same manufacturing process.

[0103] In an exemplary embodiment, an exemplary display substrate of the present disclosure includes a display area 400 and a non-display area 500 surrounding the display area 400. The display area 400 includes a first transistor disposed on a first substrate 10, a first electrode 55 disposed on a side of the first transistor away from the first substrate 10, and a second electrode 56 disposed on a side of the first electrode 55 away from the first substrate 10. The non-display area 500 includes a second transistor disposed on the first substrate 10. The first transistor may include a pixel transistor, and the second transistor may include a gate driver transistor.

[0104] In an exemplary embodiment, the first transistor includes a first active layer 21 disposed on a first substrate 10 , a first gate 71 disposed on a side of the first active layer 21 away from the first substrate 10 , and a first electrode 51 and a connecting electrode 54 disposed on a side of the first gate 71 away from the first substrate 10 .

[0105] In an exemplary embodiment, the second transistor includes a second active layer 22 disposed on the first substrate 10 , a second gate 72 disposed on a side of the second active layer 22 away from the first substrate 10 , and a second electrode 52 and a third electrode 53 disposed on a side of the second gate 72 away from the first substrate 10 .

[0106] In an exemplary embodiment, the exemplary display substrate of the present disclosure further includes a first via 91 and a connecting via 90. Both the first via 91 and the connecting via 90 extend in a direction perpendicular to the first substrate. The first via 91 exposes the first contact end of the first active layer 21. The first electrode 51 is connected to the first contact end of the first active layer 21 through the first via 91.

[0107] In an exemplary embodiment, the connecting via 90 exposes the second contact end of the first active layer 21, the first electrode 55 is arranged on the side of the connecting via 90 away from the first substrate, the first end of the connecting electrode 54 is connected to the second contact end of the first active layer 21 through the connecting via 90, and the second end of the connecting electrode 54 is connected to the first electrode 55 through the connecting via 90.

[0108] In an exemplary embodiment, the connection electrode 54 may employ a transparent conductive material, for example, indium tin oxide (ITO).

[0109] In an exemplary embodiment, the orthographic projections of the first active layer 21 and the first gate 71 on the first substrate 10 overlap. For example, the orthographic projection of the first active layer 21 on the first substrate 10 includes the orthographic projection of the first gate 71 on the first substrate 10 .

[0110] In an exemplary embodiment, the first gate 71 may have a dual-layer structure, including a first gate layer and a second gate layer sequentially disposed along the thickness direction of the first substrate, with the first gate layer located on a side of the second gate layer closer to the first substrate. The first gate layer may include indium tin oxide (ITO), and the second gate layer may include metal.

[0111] In an exemplary embodiment, the exemplary display substrate of the present disclosure further includes a second via 92 and a third via 93. Both the second via 92 and the third via 93 extend perpendicular to the first substrate. The second via 92 exposes the first contact end of the second active layer 22, and the second electrode 52 is connected to the first contact end of the second active layer 22 through the second via 92. The third via 93 exposes the second contact end of the second active layer 22, and the third electrode 53 is connected to the second contact end of the second active layer 22 through the third via 93.

[0112] In an exemplary embodiment, the orthographic projections of the second active layer 22 and the second gate 72 on the first substrate 10 overlap. For example, the orthographic projection of the second active layer 22 on the first substrate 10 includes the orthographic projection of the second gate 72 on the first substrate 10 .

[0113] In an exemplary embodiment, the first active layer 21 may be made of low-temperature polysilicon (LTPS) or an oxide semiconductor. The second active layer 22 may be made of low-temperature polysilicon (LTPS) or an oxide semiconductor. For example, the first active layer 21 may be made of oxide semiconductor (Oxide), and the second active layer 22 may be made of low-temperature polysilicon (LTPS). The first active layer 21 made of oxide semiconductor (Oxide) has advantages such as low leakage current, and the second active layer 22 made of low-temperature polysilicon has advantages such as high mobility and fast charging. Integrating the first active layer 21 made of oxide semiconductor (Oxide) and the second active layer 22 made of low-temperature polysilicon on a display substrate can take advantage of the advantages of both, achieve low-frequency driving, reduce power consumption, and improve display quality.

[0114] In an exemplary embodiment, the second electrode 56 overlaps with the orthographic projection of the first electrode 55 on the first substrate 10 .

[0115] In an exemplary embodiment, the first electrode 55 may employ a transparent conductive material, for example, indium tin oxide (ITO).

[0116] In an exemplary embodiment, the second electrode 56 may employ a transparent conductive material, for example, indium tin oxide (ITO).

[0117] In an exemplary embodiment, the light-shielding layer 57 overlaps with the orthographic projection of the first gate 71 on the first substrate. For example, the orthographic projection of the light-shielding layer 57 on the first substrate covers the orthographic projection of the first gate 71 on the first substrate, so as to reduce the orthographic projection area of ​​the display device wiring area on the first substrate and improve the aperture ratio of the display device.

[0118] In an exemplary embodiment, the spacer layer 80 overlaps with the orthographic projection of the light shielding layer 57 on the first substrate. For example, the orthographic projection of the spacer layer 80 on the first substrate is located within the orthographic projection of the light shielding layer 57 on the first substrate. The side of the spacer layer 80 close to the first substrate is directly connected to the light shielding layer 57, and the side of the spacer layer 80 away from the first substrate can be connected to the support pillar.

[0119] In an exemplary embodiment, the first insulating layer 11, the second insulating layer 12, the third insulating layer 13, the fourth insulating layer 14, the fifth insulating layer 15, the sixth insulating layer 16, and the seventh insulating layer 17 each include an inorganic material, such as silicon nitride or silicon oxide. The insulating dielectric layer 31 may include an organic material, such as a resin.

[0120] In an exemplary embodiment, the connecting via 90 extends from the surface of the insulating dielectric layer 31 away from the first substrate, and sequentially penetrates the insulating dielectric layer 31, the sixth insulating layer 16, the fifth insulating layer 15 and a portion of the fourth insulating layer 14 to the surface of the first active layer 21 away from the first substrate, exposing a portion of the surface of the first active layer 21, that is, the connecting via 90 penetrates to the surface of the first active layer 21.

[0121] In an exemplary embodiment, the connection electrode 54 covers at least the sidewalls and the bottom wall of the connection via 90 , and the connection electrode 54 is in direct contact with the surface of the first active layer 21 through the connection via 90 .

[0122] In an exemplary embodiment, the connecting via 90 includes a first channel 901 located in the insulating dielectric layer 31 and a second channel 902 located in the sixth insulating layer 16, the fifth insulating layer 15, and a portion of the fourth insulating layer 14. Specifically, the first channel 901 penetrates the insulating dielectric layer 31 in a direction perpendicular to the first substrate, and the second channel 902 penetrates the sixth insulating layer 16, the fifth insulating layer 15, and a portion of the fourth insulating layer 14 in a direction perpendicular to the first substrate. The orthographic projection of the second channel 902 on the first substrate is located within the orthographic projection of the first channel 901 on the first substrate, and the second channel 902 is connected to the first channel 901.

[0123] In an exemplary embodiment, in a cross section perpendicular to the display substrate, the shape of the first channel 901 is larger at the top and smaller at the bottom. That is, the orthographic projection area of ​​the surface of the first channel 901 away from the first substrate on the first substrate includes the orthographic projection area of ​​the surface of the first channel 901 close to the first substrate on the first substrate, and the sidewalls of the first channel 901 converge in a direction closer to the first substrate. For example, in a cross section perpendicular to the display substrate, the shape of the first channel 901 may include an inverted trapezoid.

[0124] In an exemplary embodiment, the first channel 901 overlaps with an orthographic projection of the first active layer 21 on the first substrate.

[0125] In an exemplary embodiment, in a cross section perpendicular to the display substrate, the shape of the second channel 902 is larger at the top and smaller at the bottom. That is, the orthographic projection area of ​​the surface of the second channel 902 on the side away from the first substrate on the first substrate includes the orthographic projection area of ​​the surface of the second channel 902 on the side close to the first substrate on the first substrate, and the sidewalls of the second channel 902 converge in a direction closer to the first substrate. For example, in a cross section perpendicular to the display substrate, the shape of the second channel 902 may include an inverted trapezoid.

[0126] In an exemplary embodiment, the orthographic projection of the second channel 902 on the first substrate is located within the orthographic projection of the first channel 901 on the first substrate. The orthographic projection of the surface of the second channel 902 on the first substrate that is away from the first substrate is located within the orthographic projection of the surface of the first channel 901 on the first substrate that is close to the first substrate. The junction of the sidewalls of the second channel 902 and the sidewalls of the first channel 901 forms a boss.

[0127] In an exemplary embodiment, the second channel 902 overlaps with an orthographic projection of the first active layer 21 on the first substrate, and exposes at least a portion of the first active layer 21 .

[0128] In an exemplary embodiment, the exemplary display substrate of the present disclosure further includes an optical auxiliary structure 82, which fills at least a portion of the connection via 90. The optical auxiliary structure 82 is configured to focus light incident on the optical auxiliary structure 82 in a direction perpendicular to the first substrate.

[0129] In an exemplary embodiment, the optical auxiliary structure 82 fills a portion of the first channel 901 , and the orthographic projection of the optical auxiliary structure 82 on the first substrate is located within the orthographic projection of the connecting via 90 on the first substrate.

[0130] In an exemplary embodiment, the exemplary display substrate of the present disclosure further includes an organic medium layer 81 , which fills at least a portion of the connection via 90 . The organic medium layer 81 is located on the side of the optical auxiliary structure 82 close to the first substrate, and the organic medium layer 81 is in direct contact with the optical auxiliary structure 82 .

[0131] In an exemplary embodiment, the organic medium layer 81 fills the second channel 902 and a portion of the first channel 901 , and an orthographic projection of the organic medium layer 81 on the first substrate is located within an orthographic projection of the connecting via 90 on the first substrate.

[0132] In an exemplary embodiment, the refractive index n1 of the organic medium layer 81 is greater than the refractive index n2 of the optical auxiliary structure 82. For example, n1 is greater than or equal to 1.73 and less than or equal to 2, and n2 is greater than or equal to 1.19 and less than or equal to 1.53.

[0133] In an exemplary embodiment, the optical auxiliary structure 82 may include an organic material, for example, silicone resin or acrylic resin. The organic medium layer 81 may include an organic material, for example, acrylic resin or polyimide resin.

[0134] The exemplary display substrate of the present disclosure gathers the light incident on the organic medium layer 81 and the optical auxiliary structure 82 in a direction perpendicular to the first substrate through the optical auxiliary structure 82, thereby improving the light extraction efficiency of the display device and playing a focusing role. For example, part of the light emitted toward the non-light-emitting area of ​​the display device is emitted toward the light-emitting area of ​​the display device, wherein the non-light-emitting area of ​​the display device may include the area where the spacer layer 80 and the light-shielding layer 57 are located in the array substrate, and the area where the black matrix is ​​located in the color film substrate.

[0135] Figure 4d is a schematic cross-sectional view of a first channel of a display substrate according to an exemplary embodiment of the present disclosure. In exemplary embodiments, as shown in Figures 4c and 4d, the optical auxiliary structure 82 includes a first surface 821 proximal to the first substrate, with the first surface 821 shaped as a convex arc along the direction approaching the first substrate. The organic dielectric layer 81 includes a second surface 811 distal to the first substrate, with the second surface 811 shaped as a concave arc along the direction approaching the first substrate. The convex arc of the first surface 821 directly contacts the concave arc of the second surface 811, forming a refractive interface 83 on the first surface 821. At least a portion of the refractive interface 83 is located within the first channel 901 and overlaps with the orthographic projection of the first channel 901 on the first substrate. For example, the orthographic projection of the refractive interface 83 on the first substrate lies within the orthographic projection of the first channel 901 on the first substrate. The refractive interface 83 is configured to focus light incident on the optical auxiliary structure 82 in a direction perpendicular to the first substrate.

[0136] The exemplary display substrate of the present disclosure gathers the light incident on the optical auxiliary structure 82 from the organic medium layer 81 in a direction perpendicular to the first substrate through the refractive interface 83 of the optical auxiliary structure 82, thereby improving the light extraction efficiency of the display device and playing a focusing role. For example, part of the light emitted toward the non-light-emitting area of ​​the display device is emitted toward the light-emitting area of ​​the display device.

[0137] In an exemplary embodiment, in a cross section perpendicular to the display substrate, the outer contour of the optical auxiliary structure 82 is arched, and the arched surface of the optical auxiliary structure 82 faces the side close to the first substrate, which is the first surface 821 of the optical auxiliary structure 82 .

[0138] In an exemplary embodiment, the optical auxiliary structure 82 includes a third surface 823 on a side away from the first substrate. The third surface 823 may be a flat surface and directly contacts the first electrode 55. The organic dielectric layer 81 includes a fourth surface 814 on a side close to the first substrate. The fourth surface 814 may be a flat surface and directly contacts the connection electrode 54.

[0139] Figure 4e is a schematic cross-sectional view of a first channel of a display substrate according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 4e, the ratio of the minimum height H1 of the organic dielectric layer 81 in the first channel 901 in a direction perpendicular to the first substrate to the arch height H2 of the first surface 821 of the optical auxiliary structure 82 can be greater than or equal to 0.8 and less than or equal to 1.2. For example, the ratio of the maximum height H1 to the arch height H2 can be greater than or equal to 0.9 and less than or equal to 1. The arch height H2 of the optical auxiliary structure 82 can be the maximum height of the optical auxiliary structure 82 in the first channel 901 in a direction perpendicular to the first substrate.

[0140] Figures 5a to 5c are schematic diagrams showing the working principle of an optical auxiliary structure of a display substrate in an exemplary embodiment of the present disclosure. The working principle of the optical auxiliary structure in the exemplary display substrate of the present disclosure to focus light in a direction perpendicular to the first substrate is as follows:

[0141] As shown in Figure 5a, the interface 83' in Figure 5a can be a convex or concave structure relative to the first substrate. This figure uses a convex structure as an example. The refractive index of the optically dense material 81' is greater than the refractive index of the optically sparse material 82'. For example, the refractive index of the optically dense material 81' can be 1.7, and the refractive index of the optically sparse material 82' can be 1.19. When the first light ray Li1 is emitted from the optically dense material 81' to the optically sparse material 82', the first light ray Li1 is refracted at the interface 83' between the optically dense material 81' and the optically sparse material 82' to form the second light ray Li2. Among them, the incident angle of the first light ray Li1 at the interface 83' is θ, and the refraction angle of the second light ray Li2 at the interface 83' is γ. The incident angle θ and the refraction angle γ satisfy the formula: n1*sinθ=n2*sinγ. From the above formula, it can be seen that the refractive index n1 of the optically dense material 81' is greater than the refractive index n2 of the optically sparse material 82', the refraction angle γ is greater than the incident angle θ, and the second light Li2 formed by the first light Li1 refracted at the interface 83' converges in a direction perpendicular to the first substrate.

[0142] As shown in Figure 5b, the second substrate 200 is positioned opposite the display substrate. The second substrate 200 includes a filter pattern 220 and a black matrix 210. The black matrix 210 is located on opposite sides of the filter pattern 220 parallel to the first substrate. The black matrix 210 is a non-light-transmitting area, while the filter pattern 220 is a light-emitting area. In a cross-section perpendicular to the display substrate, the outer contour of the optically dense material 81' is arched, and the interface 83' is arc-shaped. The first light ray Li1 is refracted at the interface 83', forming the second light ray Li2. The incident angle of the first light ray Li1 at the interface 83' is θ, the refraction angle of the second light ray Li2 at the interface 83' is γ, the arc radius of the interface 83' is R, the arch height of the interface 83' is H, half the length of the surface of the optically dense material 81' close to the first substrate in a direction parallel to the first substrate is D, the deflection distance of the second light ray Li2 is d, and the distance from the surface of the optically dense material 81' away from the second substrate 200 to the second substrate 200 in a direction perpendicular to the first substrate is h. The above parameters of the substrate in the exemplary embodiment of the present disclosure satisfy the following formula:

[0143] Formula 1: R 2 =D 2 +(RH) 2 ;

[0144] Formula 2: Tanθ = (RH) / D;

[0145] Formula 3: n1*sinθ=n2*sinγ;

[0146] Formula 4: Tan(90-θ+γ)=h / d.

[0147] According to formula 1, the arc radius R of the interface 83' can be calculated; according to formula 2, the incident angle θ of the first light ray Li1 at the interface 83' can be calculated; according to formula 3, the refraction angle γ of the second light ray Li2 at the interface 83' can be calculated; according to formula 4, the deflection distance d of the second light ray Li2 can be calculated.

[0148] As can be seen from the above formula, the first light beam Li1 is deflected at the interface 83', causing the second light beam Li2 emitted toward the black matrix 210 to be emitted toward the filter pattern 220, thereby improving the light extraction efficiency of the display device and achieving a light-concentrating effect. Furthermore, increasing the deflection distance d of the second light beam Li2 can cause more of the second light beam Li2 emitted toward the black matrix 210 to be emitted toward the filter pattern 220, thereby improving the light extraction efficiency of the display device.

[0149] For display devices with different pixel densities (PPI), different deflection distances d need to be designed. For example, when the pixel density (PPI) of the display device is very high, such as 1500PPI, or 2000PPI or higher PPI, the length D can be 3um, the arch height H can be 1um, and the radius R can be 5um according to Formula 1. According to Formula 2, the incident angle θ=53.1° can be obtained, and according to Formula 3, the refraction angle γ can be 33.8°. Taking the distance h greater than or equal to 1 micron and less than or equal to 2 microns as an example, according to Formula 4, it can be concluded that the deflection distance d is greater than or equal to 0.35 microns and less than or equal to 0.70 microns. According to the light efficiency improvement formula: Light efficiency improvement efficiency = (3 / (3-d)-1)*100%, it can be concluded that compared with products with the same pixel density, the light efficiency of the present disclosure can be significantly improved, and the efficiency improvement can be greater than or equal to 13.2% and less than or equal to 30.4%. In the display device, by increasing the distance h, the deflection distance d can be increased, thereby improving the light extraction efficiency of the display device.

[0150] In an exemplary embodiment, as shown in Figure 5c, the first surface 821 of the optical auxiliary structure 82 has an arched outer profile in a cross-section perpendicular to the display substrate. When a first light ray Li1 enters the optical auxiliary structure 82 from the organic dielectric layer 81, it is refracted at the refractive interface 83 to form a second light ray Li2. The incident angle θ of the first light ray Li1 at the refractive interface 83 is the same as the refractive angle γ of the second light ray Li2 at the refractive interface 83. The incident angle θ and the refractive angle γ satisfy the formula: n1*sinθ=n2*sinγ. As can be seen from the above formula, the refractive index n1 of the organic dielectric layer 81 is greater than the refractive index n2 of the optical auxiliary structure 82, and the refractive angle γ is greater than the incident angle θ. Therefore, the second light ray Li2 formed by the refraction of the first light ray Li1 at the refractive interface 83 converges perpendicular to the first substrate, thereby improving the light extraction efficiency of the display device.

[0151] The following is an illustrative explanation through the preparation process of the display substrate. The "patterning process" mentioned in the present disclosure includes processes such as coating photoresist, mask exposure, development, etching, and stripping photoresist for metal materials, inorganic materials or transparent conductive materials, and includes processes such as coating organic materials, mask exposure and development for organic materials. Deposition can be carried out by any one or more of sputtering, evaporation, and chemical vapor deposition, coating can be carried out by any one or more of spraying, spin coating and inkjet printing, and etching can be carried out by any one or more of dry etching and wet etching, which are not limited in the present disclosure. "Thin film" refers to a layer of thin film made by deposition, coating or other processes of a certain material on a first substrate. If the "thin film" does not require a patterning process during the entire production process, the "thin film" can also be called a "layer". If the "thin film" requires a patterning process during the entire production process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process contains at least one "pattern". As used in this disclosure, "A and B are disposed in the same layer" means that A and B are formed simultaneously through the same patterning process, and the "thickness" of the film layer refers to the dimension of the film layer in a direction perpendicular to the display substrate. In exemplary embodiments of this disclosure, "the orthographic projection of B is within the range of the orthographic projection of A" or "the orthographic projection of A contains the orthographic projection of B" means that the boundary of the orthographic projection of B falls within the boundary of the orthographic projection of A, or that the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B.

[0152] In an exemplary embodiment, the preparation process of the display substrate of this embodiment may include the following operations.

[0153] (1) Forming a second active layer. In an exemplary embodiment, forming the second active layer pattern may include sequentially depositing a first insulating layer 11 and a second semiconductor thin film on a first substrate 10, and patterning the second semiconductor thin film through a patterning process to form a second active layer 22 disposed on the first insulating layer 11, as shown in FIG6a.

[0154] In an exemplary embodiment, the first insulating layer 11 may include a first inorganic dielectric layer and a second inorganic dielectric layer stacked together. The first inorganic dielectric layer may be silicon nitride, and the thickness of the first inorganic dielectric layer may be greater than or equal to 200 angstroms and less than or equal to 2000 angstroms. The second inorganic dielectric layer may be silicon oxide, and the thickness of the second inorganic dielectric layer may be greater than or equal to 1000 angstroms and less than or equal to 6000 angstroms. In some embodiments, the first insulating layer may have a single-layer structure, and the first insulating layer may be silicon nitride or silicon oxide.

[0155] In an exemplary embodiment, the second active layer 22 may be made of low temperature polysilicon (LTPS), and may have a thickness of greater than or equal to 200 angstroms and less than or equal to 1000 angstroms.

[0156] (2) Forming a second gate. In an exemplary embodiment, forming the second gate may include: on the first substrate having the aforementioned pattern formed thereon, sequentially depositing a second insulating layer 12 and a second conductive film on the first insulating layer 11, and patterning the second conductive film through a patterning process to form a second gate 72 disposed on the second insulating layer 12, as shown in FIG6b.

[0157] (3) Forming a First Active Layer. In an exemplary embodiment, forming the first active layer may include: on the first substrate having the aforementioned pattern formed thereon, sequentially depositing a third insulating layer 13 and a first semiconductor thin film on the second insulating layer 12, and patterning the first semiconductor thin film through a patterning process to form a first active layer 21 disposed on the third insulating layer 13, as shown in FIG6c.

[0158] (4) Forming a First Gate. In an exemplary embodiment, forming the first gate may include: on the first substrate having the aforementioned pattern formed thereon, sequentially depositing a fourth insulating layer 14 and a first conductive film on the third insulating layer 13, patterning the first conductive film through a patterning process to form a first gate 71 disposed on the fourth insulating layer 14, as shown in FIG6d.

[0159] (5) Form a first via hole, a second via hole, a third via hole and a first conductive layer. In an exemplary embodiment, forming the first via hole, the second via hole, the third via hole and the first conductive layer may include: on the first substrate formed with the aforementioned pattern, first depositing a fifth insulating layer 15 covering the first gate electrode 71 on the fourth insulating layer 14; subsequently, forming a first via hole 91 exposing the first contact end of the first active layer 21, a second via hole 92 exposing the first contact end of the second active layer 22, and a third via hole 93 exposing the second contact end of the second active layer 22 in the fifth insulating layer 15; finally, depositing a third conductive film on the fifth insulating layer 15, and patterning the third conductive film through a patterning process to form a first conductive layer disposed on the fifth insulating layer 15, the first conductive layer including a first electrode 51, a second electrode 52 and a third electrode 53, the first electrode 51 being connected to the first contact end of the first active layer 21 through the first via hole 91, the second electrode 52 being connected to the first contact end of the second active layer 22 through the second via hole 92, and the third electrode 53 being connected to the second contact end of the second active layer 22 through the third via hole 93, as shown in FIG. 6e.

[0160] (6) Forming a connecting via. In an exemplary embodiment, forming a connecting via may include: on the first substrate formed with the aforementioned pattern, first depositing a sixth insulating layer 16 covering the first electrode 51, the second electrode 52, and the third electrode 53 on the fifth insulating layer 15; then depositing an insulating dielectric layer 31 on the sixth insulating layer 16; and finally, forming a connecting via 90 in the insulating dielectric layer 31 and the fifth insulating layer 15, as shown in FIG6f. The second electrode 52, the third electrode 53, the second gate 72, and the second active layer 22 form a second transistor; and the first electrode 51, the first gate 71, and the first active layer 21 form a first transistor.

[0161] In an exemplary embodiment, the connecting via 90 extends from the surface of the insulating dielectric layer 31 away from the first substrate, through the insulating dielectric layer 31, the sixth insulating layer 16, the fifth insulating layer 15 and a portion of the fourth insulating layer 14 in sequence, to the surface of the first active layer 21 away from the first substrate, exposing the surface of the first active layer 21, and the bottom wall of the connecting via 90 is the surface of the first active layer 21.

[0162] (7) Forming a connecting electrode. In an exemplary embodiment, forming the connecting electrode may include: depositing a fourth conductive film on the insulating dielectric layer 31 on the first substrate having the aforementioned pattern formed thereon, and patterning the fourth conductive film through a patterning process to form a connecting electrode 54 disposed on the insulating dielectric layer 31, as shown in FIG. 6g .

[0163] In an exemplary embodiment, the connection electrode 54 covers a portion of the surface of the insulating dielectric layer 31 away from the first substrate, and covers the sidewalls and bottom wall of the connection via 90 . The connection electrode 54 directly contacts the surface of the first active layer 21 through the connection via 90 .

[0164] (8) Forming an organic dielectric layer and an optical auxiliary structure. In an exemplary embodiment, forming the organic dielectric layer and the optical auxiliary structure may include: on the first substrate formed with the aforementioned pattern, sequentially forming an organic dielectric layer 81 and an optical auxiliary structure 82 in the connecting via 90, wherein the organic dielectric layer 81 is located on a side of the optical auxiliary structure 82 close to the first substrate, and the organic dielectric layer 81 is in direct contact with the optical auxiliary structure 82, as shown in FIG. 6h.

[0165] In an exemplary embodiment, the organic dielectric layer 81 and the optical auxiliary structure 82 cover the connecting electrode 54 located on the side wall and bottom wall of the connecting via 90, and at least a portion of the connecting electrode 54 located on the surface of the insulating dielectric layer 31 away from the first substrate is exposed and is not covered by the organic dielectric layer 81 and the optical auxiliary structure 82.

[0166] In an exemplary embodiment, the connecting via 90 includes a first channel 901 located in the insulating dielectric layer 31 and a second channel 902 located in the sixth insulating layer 16, the fifth insulating layer 15, and a portion of the fourth insulating layer 14. The organic dielectric layer 81 is located in a portion of the first channel 901, and the optical auxiliary structure 82 is located in a portion of the first channel 901 and all of the second channel 902.

[0167] In an exemplary embodiment, the optical auxiliary structure 82 includes a first surface 821 close to the first substrate, and the shape of the first surface 821 includes a convex arc along the direction close to the first substrate; the organic medium layer 81 includes a second surface 811 away from the first substrate, and the shape of the second surface 811 includes a concave arc along the direction close to the first substrate. The convex arc of the first surface 821 is in direct contact with the concave arc of the second surface 811, and the first surface 821 forms a refractive interface 83.

[0168] (9) Forming a First Electrode. In an exemplary embodiment, forming the first electrode may include: depositing a fifth conductive film on the insulating dielectric layer 31 on the first substrate having the aforementioned pattern formed thereon, and patterning the fifth conductive film through a patterning process to form a first electrode 55 disposed on the insulating dielectric layer 31, as shown in FIG. 6i .

[0169] In an exemplary embodiment, at least a portion of the first electrode 55 is in direct contact with the connection electrode 54 located on a surface of the insulating dielectric layer 31 away from the first substrate.

[0170] (10) Forming a second electrode, a light shielding layer, and a spacer layer. The formation of the second electrode, the light shielding layer, and the spacer layer 80 may include: depositing a seventh insulating layer 17 covering the first electrode 55 on the insulating dielectric layer 31 on the first substrate having the aforementioned pattern formed thereon, forming the second electrode 56 and the light shielding layer 57 on the seventh insulating layer 17; and subsequently forming the spacer layer 80 on the light shielding layer 57, as shown in FIG4c.

[0171] The preparation process of the display substrate in this embodiment is to first form the first active layer 21 and the second active layer 22, and then form the organic dielectric layer 81 and the optical auxiliary structure 82 in the connecting via 90, so as to avoid the high temperature generated during the formation of the first active layer 21 and the second active layer 22 (for example, the temperature for forming the oxide active layer is 350°C, and the temperature for forming the low-temperature polysilicon active layer is 450°C) from affecting the optical auxiliary structure 82.

[0172] This embodiment shows that the preparation process of the substrate forms an organic dielectric layer 81 and an optical auxiliary structure 82 in the connecting via 90. The morphology of the organic dielectric layer 81 and the optical auxiliary structure 82 can be formed along the outer contour of the connecting via 90 without etching, which simplifies the preparation process and improves the matching degree between the device and the process.

[0173] Figure 7 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 7 , the display device according to the present disclosure includes a first substrate 100 and a second substrate 200 arranged in a cell-like arrangement, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may be the display substrate shown in Figure 4c . The second substrate 200 includes a second base 201, a first adhesive layer 230 disposed on the side of the second base 201 closer to the first substrate 100, a filter pattern 220 and a black matrix 210 disposed on the side of the first adhesive layer 210 closer to the first substrate 100, and a second adhesive layer 240 disposed on the side of the filter pattern 220 and the black matrix 210 closer to the first substrate 100.

[0174] In an exemplary embodiment, the first surface 821 of the optical auxiliary structure 82 in the first substrate 100 is located on a side away from the second substrate 200 , and the first surface 821 of the optical auxiliary structure 82 is convex toward the side away from the second substrate 200 .

[0175] In an exemplary embodiment, at least a portion of the black matrix 210 overlaps with the orthographic projection of the connection via 90 of the first substrate 100 on the first base 10. The optical auxiliary structure 82 within the connection via 90 can direct light emitted toward the black matrix 210 toward the filter pattern 220, thereby improving the light extraction efficiency of the display device. At least a portion of the black matrix 210 overlaps with the orthographic projection of the second transistor on the first base 10. For example, the orthographic projection of the second transistor on the first base 10 is located within the orthographic projection of the black matrix 210 on the first base 10.

[0176] In an exemplary embodiment, at least a portion of the filter pattern 220 overlaps with an orthographic projection of the connection via hole 90 of the first substrate 100 on the first base 10 .

[0177] In an exemplary embodiment, the display device of the disclosed embodiment further includes a support column 250 , which is connected to the spacer layer 80 of the first substrate 100 on the side close to the first substrate 100 , and is connected to the second adhesive layer 240 of the second substrate 100 on the side away from the first substrate 100 .

[0178] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is disposed on a side of the first substrate away from the optical auxiliary structure 82. At least a portion of the first light Li1 emitted by the light-emitting substrate 600 passes through the first substrate and is emitted toward the optical auxiliary structure 82. The optical auxiliary structure 82 converts the first light Li1 into a second light Li2 that converges in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the second substrate.

[0179] In some embodiments, the light-emitting substrate can be arranged on the side of the optical auxiliary structure away from the first substrate. For example, the light-emitting substrate can be arranged on the side of the second substrate away from the first substrate. At least part of the first light Li1 emitted by the light-emitting substrate passes through the second substrate and is emitted toward the optical auxiliary structure. The optical auxiliary structure converts the first light Li1 into a second light Li2 that converges in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the first substrate.

[0180] Figure 8a is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure; Figure 8b is a schematic cross-sectional view of a first channel of another display substrate according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figures 8a and 8b, the structure of the display substrate of this exemplary embodiment is substantially identical to that of the display substrate of the embodiment shown in Figure 4c, except that the optical auxiliary structure 82 comprises a first portion 801 and a second portion 802, which are integrally connected and comprise the same material. The first portion 801 fills the first channel 901 of the connecting via 90 and directly contacts the organic dielectric layer 81. The side of the first portion 801 proximal to the first substrate is arc-shaped. The second portion 802 is located on the side of the connecting via 90 facing away from the first substrate. The orthographic projection of the second portion 802 on the first substrate includes the orthographic projection of the connecting via 90 on the first substrate. At least a portion of the second portion 802 is located on the surface of the insulating dielectric layer 31 facing away from the first substrate. The second portion 802 covers the connecting electrode 54 located on the surface of the insulating dielectric layer 31 facing away from the first substrate.

[0181] In an exemplary embodiment, as shown in FIG8b , the first portion 801 includes a first surface 821 proximal to the first substrate. The first surface 821 is shaped like an arc that bulges in a direction proximal to the first substrate. The first surface 821 of the first portion 801 is in direct contact with the organic dielectric layer 81, forming a refractive interface 83. When a first light ray Li1 enters the optical auxiliary structure 82 from the organic dielectric layer 81, the first light ray Li1 is refracted at the refractive interface 83 to form a second light ray Li2. The second light ray Li2 converges in a direction perpendicular to the first substrate, thereby improving the light extraction efficiency of the display device.

[0182] In the exemplary embodiment, a fourth via hole 94 is provided in the second portion 802. The fourth via hole 94 extends through the second portion 802 and exposes the connection electrode 54 located on the surface of the insulating dielectric layer 31 on a side remote from the first substrate. The first electrode 55 is provided on the surface of the second portion 802 on a side remote from the first substrate. The first electrode 55 covers the sidewalls and bottom wall of the fourth via hole 94 and is connected to the connection electrode 54 through the fourth via hole 94.

[0183] In an exemplary embodiment, a light shielding layer 57 is disposed on a surface of the first electrode 55 away from the first substrate, and at least a portion of the light shielding layer 57 covers the first electrode 55 located on the sidewalls and bottom wall of the fourth via hole 94. A spacer layer 80 is disposed on a surface of the light shielding layer 57 away from the first substrate, and at least a portion of the spacer layer 80 fills the fourth via hole 94. A seventh insulating layer 17 is disposed on a surface of the light shielding layer 57 away from the first substrate, exposing the spacer layer 80. A second electrode 56 is disposed on a surface of the seventh insulating layer 17 away from the first substrate.

[0184] The exemplary display substrate of the present disclosure divides the optical auxiliary structure 82 into a first part 801 and a second part 802 , thereby reducing the difficulty of manufacturing the optical auxiliary structure 82 , facilitating adjustment of the thickness of the insulating layer, and improving light efficiency.

[0185] The exemplary display substrate of the present disclosure gathers the light incident on the optical auxiliary structure 82 in a direction perpendicular to the first substrate through the optical auxiliary structure 82 , thereby improving the light extraction efficiency of the display device and playing a light-collecting role.

[0186] This embodiment shows that the preparation process of the substrate is to first form the first active layer 21 and the second active layer 22, and then form the optical auxiliary structure 82 in the connecting via 90, so as to avoid the high temperature generated when the first active layer 21 and the second active layer 22 are formed (for example, the temperature of forming the oxide active layer and the low-temperature polysilicon active layer is 300-450°C) from affecting the optical auxiliary structure 82.

[0187] This embodiment shows that the optical auxiliary structure 82 is formed in the connection via 90 during the preparation process of the substrate. The morphology of the optical auxiliary structure 82 can be formed along the outer contour of the connection via 90 without etching, which simplifies the preparation process and improves the matching degree between the device and the process.

[0188] Figure 9 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 9, the display device according to the present disclosure includes a first substrate 100 and a second substrate 200 arranged in a cell-like manner, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may be the display substrate shown in Figure 8a. The second substrate 200 includes a second base 201, a first adhesive layer 230 disposed on a side of the second base 201 close to the first substrate 100, a filter pattern 220 and a black matrix 210 disposed on a side of the first adhesive layer 210 close to the first substrate 100, and a second adhesive layer 240 disposed on a side of the filter pattern 220 and the black matrix 210 close to the first substrate 100.

[0189] In an exemplary embodiment, the first surface 821 of the optical auxiliary structure 82 in the first substrate 100 is located on a side away from the second substrate 200 , and the first surface 821 of the optical auxiliary structure 82 is convex toward the side away from the second substrate 200 .

[0190] In an exemplary embodiment, at least a portion of the black matrix 210 overlaps with the orthographic projection of the connection via 90 of the first substrate 100 on the first base 10. The optical auxiliary structure 82 within the connection via 90 can direct light emitted toward the black matrix 210 toward the filter pattern 220, thereby improving the light extraction efficiency of the display device. At least a portion of the black matrix 210 overlaps with the orthographic projection of the second transistor on the first base 10. For example, the orthographic projection of the second transistor on the first base 10 is located within the orthographic projection of the black matrix 210 on the first base 10.

[0191] In an exemplary embodiment, at least a portion of the filter pattern 220 overlaps with an orthographic projection of the connection via hole 90 of the first substrate 100 on the first base 10 .

[0192] In an exemplary embodiment, the display device of the disclosed embodiment further includes a support column 250 , which is connected to the spacer layer 80 of the first substrate 100 on the side close to the first substrate 100 , and is connected to the second adhesive layer 240 of the second substrate 100 on the side away from the first substrate 100 .

[0193] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is disposed on a side of the first substrate away from the optical auxiliary structure 82. At least a portion of the first light Li1 emitted by the light-emitting substrate 600 passes through the first substrate and is emitted toward the optical auxiliary structure 82. The optical auxiliary structure 82 converts the first light Li1 into a second light Li2 that converges in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the second substrate.

[0194] Figure 10a is a schematic diagram of the cross-sectional structure of another display substrate according to an exemplary embodiment of the present disclosure; Figure 10b is a schematic diagram of the cross-sectional structure of the first and second channels of another display substrate according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figures 10a and 10b, the structure of the display substrate of this exemplary embodiment is substantially the same as the structure of the display substrate of the embodiment shown in Figure 4c, except that the connecting vias include a first channel 901 located in the insulating dielectric layer 31 and a second channel 902 located in the sixth insulating layer 16, the fifth insulating layer 15, and a portion of the fourth insulating layer 14. At least a portion of the second channel 902, away from the first substrate, does not overlap with the orthographic projection of the first channel 901, closer to the first substrate, onto the first substrate.

[0195] In this exemplary embodiment, the display substrate further includes a first connecting electrode 541 and a second connecting electrode 542. The first connecting electrode 541 covers at least the sidewalls and bottom wall of the second channel 902, as well as the surface of the sixth insulating layer 16 facing away from the first substrate. The first connecting electrode 541 is connected to the first active layer 21 via the second channel 902. The first channel 901 exposes the first connecting electrode 541 located on the surface of the sixth insulating layer 16 facing away from the first substrate. The second connecting electrode 542 covers at least the sidewalls and bottom wall of the first channel 901, as well as the surface of the insulating dielectric layer 31 facing away from the first substrate. The second connecting electrode 542 is connected to the first connecting electrode 541 via the first channel 901.

[0196] In an exemplary embodiment, at least a portion of the insulating dielectric layer 31 fills the second channel 902 and directly contacts the sidewalls and bottom wall of the second channel 902 . At least a portion of the insulating dielectric layer 31 covers the first connection electrode 541 in the second channel 902 .

[0197] In an exemplary embodiment, the optical auxiliary structure 82 fills the first channel 901 and covers the second connecting electrode 542 within the first channel 901. The optical auxiliary structure 82 includes a third surface 823 on a side facing away from the first substrate. The third surface 823 is shaped like an arc that bulges away from the first substrate. The third surface 823 of the optical auxiliary structure 82 is in direct contact with the first electrode 55, forming a refractive interface 83. The refractive index of the first electrode 55 is greater than that of the optical auxiliary structure 82. When a first light ray Li1 is incident on the optical auxiliary structure 82 from the first electrode 55, it is refracted at the refractive interface 83 to form a second light ray Li2. The second light ray Li2 converges in a direction perpendicular to the first substrate, thereby improving the light extraction efficiency of the display device.

[0198] In an exemplary embodiment, the curvature of the third surface 823 of the optical auxiliary structure 82 may be greater than or equal to 0.15π and less than or equal to 0.5π. When the curvature of the third surface 823 of the optical auxiliary structure 82 is less than 0.15π, the deviation angle of the refracted light by the third surface 823 of the optical auxiliary structure 82 is small, and the brightness of the display device cannot be effectively improved. When the curvature of the third surface 823 of the optical auxiliary structure 82 is greater than 0.5π, the third surface 823 of the optical auxiliary structure 82 forms a large step, and the first electrode 55 is easily broken at the third surface 823 of the optical auxiliary structure 82.

[0199] The exemplary display substrate of the present disclosure forms the optical auxiliary structure 82 by filling the first channel 901 with lens material, which simplifies the process and reduces the production cost.

[0200] The exemplary display substrate of the present disclosure gathers the light incident on the optical auxiliary structure 82 in a direction perpendicular to the first substrate through the optical auxiliary structure 82 , thereby improving the light extraction efficiency of the display device and playing a light-collecting role.

[0201] This embodiment shows that the preparation process of the substrate is to first form the first active layer 21 and the second active layer 22, and then form the optical auxiliary structure 82 in the connecting via 90, so as to avoid the high temperature generated when the first active layer 21 and the second active layer 22 are formed (for example, the temperature for forming the oxide active layer is 350°C, and the temperature for forming the low-temperature polysilicon active layer is 450°C) from affecting the optical auxiliary structure 82.

[0202] This embodiment shows that the optical auxiliary structure 82 is formed in the connection via 90 during the preparation process of the substrate. The morphology of the optical auxiliary structure 82 can be formed along the outer contour of the connection via 90 without etching, which simplifies the preparation process and improves the matching degree between the device and the process.

[0203] Figure 11 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 11, the display device according to the present disclosure includes a first substrate 100 and a second substrate 200 arranged in a cell-like manner, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may be the display substrate shown in Figure 10a. The second substrate 200 includes a second base 201, a first adhesive layer 230 disposed on a side of the second base 201 closer to the first substrate 100, a filter pattern 220 and a black matrix 210 disposed on a side of the first adhesive layer 210 closer to the first substrate 100, and a second adhesive layer 240 disposed on a side of the filter pattern 220 and the black matrix 210 closer to the first substrate 100.

[0204] In an exemplary embodiment, the third surface 823 of the optical auxiliary structure 82 in the first substrate 100 is located on the side close to the second substrate 200 , and the third surface 823 of the optical auxiliary structure 82 is convex toward the side close to the second substrate 200 .

[0205] In an exemplary embodiment, at least a portion of the black matrix 210 overlaps with the orthographic projection of the first channel 901 of the first substrate 100 on the first substrate 10. The optical auxiliary structure 82 within the first channel 901 can direct light emitted from the black matrix 210 toward the filter pattern 220, thereby improving the light extraction efficiency of the display device. At least a portion of the black matrix 210 overlaps with the orthographic projection of the second transistor on the first substrate 10. For example, the orthographic projection of the second transistor on the first substrate 10 is located within the orthographic projection of the black matrix 210 on the first substrate 10.

[0206] In an exemplary embodiment, at least a portion of the filter pattern 220 overlaps with an orthographic projection of the first hole 901 of the first substrate 100 on the first base 10 .

[0207] In an exemplary embodiment, the display device of the disclosed embodiment further includes a support column 250 , which is connected to the spacer layer 80 of the first substrate 100 on the side close to the first substrate 100 , and is connected to the second adhesive layer 240 of the second substrate 100 on the side away from the first substrate 100 .

[0208] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is arranged on the side of the second substrate 200 away from the first substrate 100. At least part of the first light Li1 emitted by the light-emitting substrate 600 passes through the second substrate 200 and is emitted toward the optical auxiliary structure 82. The optical auxiliary structure 82 converts the first light Li1 emitted by the first electrode 55 into a second light Li2 that is focused in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the first substrate.

[0209] Figure 12a is a schematic cross-sectional view of another display substrate according to an exemplary embodiment of the present disclosure; Figure 12b is a schematic cross-sectional view of a connection via in another display substrate according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figures 12a and 12b , the structure of the display substrate of this exemplary embodiment is substantially the same as that of the display substrate of the embodiment shown in Figure 4c , except that an optical auxiliary structure 82 fills the first and second channels 901, 902 of the connection via 90. The optical auxiliary structure 82 includes a third surface 823 facing away from the first substrate, and the shape of the third surface 823 comprises an arc that convexly extends away from the first substrate. The third surface 823 of the optical auxiliary structure 82 directly contacts the first electrode 55, forming a refractive interface 83. The refractive index of the first electrode 55 is greater than that of the optical auxiliary structure 82. When a first light ray Li1 is incident on the optical auxiliary structure 82 from the first electrode 55, it is refracted at the refractive interface 83 to form a second light ray Li2. The second light ray Li2 converges perpendicularly to the first substrate, thereby improving the light extraction efficiency of the display device.

[0210] The exemplary display substrate of the present disclosure forms the optical auxiliary structure 82 by filling the first channel 901 and the second channel 902 with lens material, which simplifies the process and reduces the production cost.

[0211] The exemplary display substrate of the present disclosure gathers the light incident on the optical auxiliary structure 82 in a direction perpendicular to the first substrate through the optical auxiliary structure 82 , thereby improving the light extraction efficiency of the display device and playing a light-collecting role.

[0212] This embodiment shows that the preparation process of the substrate is to first form the first active layer 21 and the second active layer 22, and then form the optical auxiliary structure 82 in the connecting via 90, so as to avoid the high temperature generated when the first active layer 21 and the second active layer 22 are formed (for example, the temperature for forming the oxide active layer is 350°C, and the temperature for forming the low-temperature polysilicon active layer is 450°C) from affecting the optical auxiliary structure 82.

[0213] This embodiment shows that the optical auxiliary structure 82 is formed in the connection via 90 during the preparation process of the substrate. The morphology of the optical auxiliary structure 82 can be formed along the outer contour of the connection via 90 without etching, which simplifies the preparation process and improves the matching degree between the device and the process.

[0214] Figure 13 is a schematic cross-sectional view of a display device according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 13, the display device according to the present disclosure includes a first substrate 100 and a second substrate 200 arranged in a cell-like manner, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may be the display substrate shown in Figure 12a. The second substrate 200 includes a second base 201, a first adhesive layer 230 disposed on the side of the second base 201 closer to the first substrate 100, a filter pattern 220 and a black matrix 210 disposed on the side of the first adhesive layer 210 closer to the first substrate 100, and a second adhesive layer 240 disposed on the side of the filter pattern 220 and the black matrix 210 closer to the first substrate 100.

[0215] In an exemplary embodiment, the third surface 823 of the optical auxiliary structure 82 in the first substrate 100 is located on the side close to the second substrate 200 , and the third surface 823 of the optical auxiliary structure 82 is convex toward the side close to the second substrate 200 .

[0216] In an exemplary embodiment, at least a portion of the black matrix 210 overlaps with the orthographic projection of the first channel 901 of the first substrate 100 on the first substrate 10. The optical auxiliary structure 82 within the first channel 901 can direct light emitted from the black matrix 210 toward the filter pattern 220, thereby improving the light extraction efficiency of the display device. At least a portion of the black matrix 210 overlaps with the orthographic projection of the second transistor on the first substrate 10. For example, the orthographic projection of the second transistor on the first substrate 10 is located within the orthographic projection of the black matrix 210 on the first substrate 10.

[0217] In an exemplary embodiment, at least a portion of the filter pattern 220 overlaps with an orthographic projection of the first hole 901 of the first substrate 100 on the first base 10 .

[0218] In an exemplary embodiment, the display device of the disclosed embodiment further includes a support column 250 , which is connected to the spacer layer 80 of the first substrate 100 on the side close to the first substrate 100 , and is connected to the second adhesive layer 240 of the second substrate 100 on the side away from the first substrate 100 .

[0219] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is arranged on the side of the second substrate 200 away from the first substrate 100. At least part of the first light Li1 emitted by the light-emitting substrate 600 passes through the second substrate 200 and is emitted toward the optical auxiliary structure 82. The optical auxiliary structure 82 converts the first light Li1 emitted by the first electrode 55 into a second light Li2 that is focused in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the first substrate.

[0220] Figure 14 is a schematic cross-sectional view of the second substrate of another display device according to an exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 14, the second substrate of the display device according to the present embodiment includes a second base 201, a lens structure 700 disposed on the side of the second base 201 near the first substrate 100, a first adhesive layer 230 disposed on the side of the lens structure 700 near the first substrate 100, a filter pattern 220 and a black matrix 210 disposed on the side of the first adhesive layer 210 near the first substrate 100, and a second adhesive layer 240 disposed on the side of the filter pattern 220 and the black matrix 210 near the first substrate 100. The lens structure 700 is configured to focus light incident on the lens structure 700 in a direction perpendicular to the first base, thereby improving the light extraction efficiency of the display device.

[0221] In an exemplary embodiment, the lens structure 700 includes a plurality of lens patterns 710 arranged parallel to the first substrate. The lens patterns 710 include curved surfaces located on a side away from the second substrate and convex in a direction away from the second substrate. The curved surfaces are in direct contact with the first adhesive layer 230. The refractive index of the lens patterns 710 is lower than that of the first adhesive layer 230, so that light incident on the lens patterns 710 is refracted at the curved surfaces of the lens patterns 710, forming refracted light that converges perpendicular to the first substrate.

[0222] In an exemplary embodiment, the lens pattern 710 may overlap with the orthographic projection of the filter pattern 220 on the first substrate. For example, the orthographic projection of the lens pattern 710 on the first substrate covers the orthographic projection of the filter pattern 220 on the first substrate, and the lens pattern 710 may be arranged in a one-to-one correspondence with the filter pattern 220. This allows the refracted light emitted by the lens pattern 710 to effectively transmit through the filter pattern 220.

[0223] Figure 15 is a schematic cross-sectional view of another exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in Figure 15 , the display device includes a first substrate 100 and a second substrate 200 arranged in a cell, and a liquid crystal layer 300 disposed between the first and second substrates 100 and 200. The first substrate 100 may be the display substrate shown in Figure 4c . The refractive index of the optical auxiliary structure 82 in the first substrate 100 is greater than that of the organic dielectric layer 81 . When a first light ray Li1 is emitted from the optical auxiliary structure 82 to the organic dielectric layer 81, it is refracted at the first surface 821 of the optical auxiliary structure 82, forming a second light ray that converges perpendicularly to the first substrate. The second substrate 200 may be the second substrate shown in Figure 14 .

[0224] In an exemplary embodiment, the display device of the disclosed embodiment further includes a support column 250 , which is connected to the spacer layer 80 of the first substrate 100 on the side close to the first substrate 100 , and is connected to the second adhesive layer 240 of the second substrate 100 on the side away from the first substrate 100 .

[0225] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is arranged on the side of the second substrate 200 away from the first substrate 100. At least part of the first light Li1 emitted by the light-emitting substrate 600 passes through the lens structure 700 of the second substrate 200 and is emitted toward the first substrate 100. The light entering the first substrate 100 passes through the optical auxiliary structure 82 to form a second light Li2 that is gathered in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the first substrate.

[0226] FIG16 is a schematic cross-sectional view of another display device according to an exemplary embodiment of the present disclosure. In the exemplary embodiment, as shown in FIG16 , the display device according to the present disclosure has substantially the same structure as the display device according to the exemplary embodiment shown in FIG15 , with the difference being that the optical auxiliary structure 82 within the connecting via 90 in the first substrate 100 is located on the side of the organic dielectric layer 81 proximal to the first base 10 . The optical auxiliary structure 82 is in direct contact with the organic dielectric layer 81 . The refractive index of the organic dielectric layer 81 in the first substrate 100 is greater than that of the optical auxiliary structure 82 . Therefore, when a first light ray Li1 is emitted from the organic dielectric layer 81 to the optical auxiliary structure 82, the first light ray Li1 is refracted at the first surface 821 of the optical auxiliary structure 82, forming a second light ray that converges in a direction perpendicular to the first base.

[0227] In an exemplary embodiment, the organic dielectric layer 81 partially fills the first channel 901, and the optical auxiliary structure 82 fills the second channel 902 and partially the first channel 901. The optical auxiliary structure 82 includes a first surface 821 on a side away from the first substrate, and the shape of the first surface 821 includes a concave arc along a direction approaching the first substrate. The organic dielectric layer 81 includes a second surface 811 on a side close to the first substrate, and the shape of the second surface 811 includes a convex arc along a direction approaching the first substrate. The concave arc of the first surface 821 is in direct contact with the convex arc of the second surface 811.

[0228] FIG17 is a schematic cross-sectional view of another exemplary embodiment of the present disclosure. In an exemplary embodiment, as shown in FIG17 , the display device of the present disclosure includes a first substrate 100 and a second substrate 200 arranged in a cell, and a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The first substrate 100 may be the display substrate shown in FIG10a , and the second substrate 200 may be the second substrate shown in FIG14 .

[0229] In an exemplary embodiment, the display device of the embodiment of the present disclosure further includes a light-emitting substrate 600, which is arranged on the side of the second substrate 200 away from the first substrate 100. At least part of the first light Li1 emitted by the light-emitting substrate 600 passes through the lens structure 700 of the second substrate 200 and is emitted toward the first substrate 100. The light entering the first substrate 100 passes through the optical auxiliary structure 82 to form a second light Li2 that is gathered in a direction perpendicular to the first substrate, and the second light Li2 is emitted toward the first substrate.

[0230] Embodiments of the present invention further provide a display device comprising any of the aforementioned display substrates. The display device includes a mobile phone, a tablet computer, a smart wearable product (e.g., a smartwatch, a wristband, etc.), a personal digital assistant (PDA), an in-vehicle computer, and the like. The embodiments of this application do not impose any particular limitations on the specific form of the display device.

[0231] Although the embodiments disclosed in this disclosure are as described above, the contents described are merely embodiments adopted to facilitate understanding of the disclosure and are not intended to limit the present invention. Any person skilled in the art may make any modifications and changes in the form and details of the implementation without departing from the spirit and scope of the disclosure. However, the scope of patent protection of the present invention shall still be based on the scope defined by the appended claims.

Claims

1. A display substrate, comprising: A transistor disposed on a substrate; An insulating dielectric layer and an optical auxiliary structure disposed on a side of the transistor away from the substrate; The insulating dielectric layer has a first channel, and at least a part of the optical auxiliary structure is filled into the first channel.

2. The display substrate according to claim 1, wherein, The part of the optical auxiliary structure that fills the first channel is partial or full.

3. The display substrate according to claim 2, further comprising an organic dielectric layer, at least a part of the organic dielectric layer is located in the first channel, the organic dielectric layer is disposed on a side of the optical auxiliary structure close to the substrate, and is in direct contact with the optical auxiliary structure, and the refractive index of the organic dielectric layer is greater than the refractive index of the optical auxiliary structure.

4. The display substrate according to claim 3, wherein, The optical auxiliary structure includes a first surface on a side close to the substrate, the shape of the first surface includes an arc-shaped convex along the direction close to the substrate, the organic dielectric layer includes a second surface on a side away from the substrate, the shape of the second surface includes an arc-shaped concave along the direction close to the substrate, the first surface is in direct contact with the second surface, and the first surface is configured to converge the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

5. The display substrate according to claim 4, wherein, The ratio of the minimum height of the organic dielectric layer in the first channel in the direction perpendicular to the substrate to the arch height of the first surface of the optical auxiliary structure is greater than or equal to 0.8 and less than or equal to 1.

2.

6. The display substrate according to claim 2, further comprising an organic dielectric layer, at least a part of the organic dielectric layer is located in the first channel, the organic dielectric layer is disposed on a side of the optical auxiliary structure away from the substrate, and is in direct contact with the optical auxiliary structure; the refractive index of the organic dielectric layer is greater than the refractive index of the optical auxiliary structure.

7. The display substrate according to claim 1, wherein, The transistor includes an active layer, at least one insulating layer is disposed between the active layer and the insulating dielectric layer, the at least one insulating layer has a second channel, and at least a part of the active layer is exposed through the second channel.

8. The display substrate according to claim 7, wherein, The second channel communicates with the first channel, and the orthographic projection of the second channel on the substrate is located in the orthographic projection of the first channel on the substrate.

9. The display substrate according to claim 8, wherein, A boss is formed at the connection between the side wall of the second channel and the side wall of the first channel.

10. The display substrate according to claim 7, wherein, The orthographic projection on the substrate of at least a part of the second channel on a side away from the substrate does not overlap with the orthographic projection on the substrate of the first channel on a side close to the substrate.

11. The display substrate according to claim 7, further comprising an organic dielectric layer, at least a part of the organic dielectric layer fills the second channel.

12. The display substrate according to claim 7, wherein, At least a part of the insulating dielectric layer fills the second channel.

13. The display substrate according to claim 7, further comprising a first electrode and a connection electrode, the first electrode is disposed on a side of the first channel away from the substrate, the first electrode is connected to the connection electrode, and at least a part of the connection electrode covers the inner walls of the first channel and the second channel and is connected to the active layer.

14. The display substrate according to claim 13, wherein, At least a part of the first electrode is in contact with the surface of the optical auxiliary structure on a side away from the substrate, and the refractive index of the first electrode is greater than the refractive index of the optical auxiliary structure.

15. The display substrate according to claim 1, wherein, The optical auxiliary structure includes a first surface on a side close to the substrate. The shape of the first surface includes an arc-shaped convexity along the direction close to the substrate. The first surface is configured to converge the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

16. The display substrate according to claim 1, wherein, The optical auxiliary structure includes a first surface on a side close to the substrate. The shape of the first surface includes an arc-shaped concavity along the direction close to the substrate. The first surface is configured to converge the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

17. The display substrate according to claim 1, wherein, The optical auxiliary structure includes a third surface on a side away from the substrate. The shape of the third surface includes an arc-shaped convexity along the direction away from the substrate. The third surface is configured to converge the light incident on the optical auxiliary structure in a direction perpendicular to the substrate.

18. The display substrate according to claim 17, wherein, The radian of the third surface of the optical auxiliary structure can be greater than or equal to 0.15π and less than or equal to 0.5π.

19. The display substrate according to claim 1, wherein, The optical auxiliary structure includes a first part and a second part connected as a whole. The first part fills at least part of the first channel. The first part includes a first surface on a side close to the substrate. The shape of the first surface includes an arc-shaped convexity along the direction close to the substrate. The first surface is configured to converge the light incident on the optical auxiliary structure in a direction perpendicular to the substrate. The second part is located on a side of the first channel away from the substrate. The orthographic projection of the second part on the substrate includes the orthographic projection of the first channel on the substrate.

20. A display device, comprising the display substrate according to any one of claims 1 to 19.

21. The display device according to claim 20, further comprising a light-emitting substrate, wherein the light-emitting substrate is disposed on a side of the substrate away from the optical auxiliary structure; or, the light-emitting substrate is disposed on a side of the optical auxiliary structure away from the substrate.

22. The display device according to claim 21, further comprising a color filter substrate. The color filter substrate is disposed opposite to the display substrate. The color filter substrate includes a light-filtering layer and a lens structure disposed on a side of the light-filtering layer away from the display substrate. The light-filtering layer includes a light-filtering pattern. The lens structure includes a lens pattern. The orthographic projections of the light-filtering pattern and the lens pattern on the substrate overlap.

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