Display panel and preparation method therefor, and display panel motherboard and display device

Abstract

The present application relates to a display panel and a preparation method therefor, and a display panel motherboard and a display device. The display panel is provided with an active area and a non-active area, and comprises: a substrate; a pixel definition layer arranged on one side of the substrate; an isolation structure layer arranged on the side of the pixel definition layer away from the substrate, the isolation structure layer comprising a first isolation layer and a second isolation layer located on the side of the first isolation layer that faces away from the substrate, and the isolation structure layer enclosing a plurality of first-type openings located in the active area and functional openings located in the non-active area; and a plurality of light-emitting devices, wherein at least part of the structure of each light-emitting device is arranged in a corresponding first-type opening. The extension length of the side of at least part of the second isolation layer participating in enclosing the functional openings towards the functional opening relative to the first isolation layer is smaller than the extension length of the side of the second isolation layer participating in enclosing the first-type openings towards the first-type openings relative to the first isolation layer.

Description

Display panel and manufacturing method thereof, display panel motherboard and display device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims the priority of Chinese Patent Application No. 202410124714.7 filed on January 29, 2024, entitled “Display panel, display device and method for preparing display panel”, the priority of Chinese Patent Application No. 202410124722.1 filed on January 29, 2024, entitled “Display panel, display device and method for preparing display panel”, the priority of Chinese Patent Application No. 202410337767.7 filed on March 22, 2024, entitled “Display panel, method for preparing display panel and electronic device”, and the priority of Chinese Patent Application No. 202410451548.1 filed on April 15, 2024, entitled “Array substrate and preparation method thereof, display panel and preparation method thereof and display device”, and the entire contents of the foregoing applications are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of display technology, and in particular to a display panel and a manufacturing method thereof, a display panel motherboard and a display device. Background Art

[0004] Organic Light Emitting Diode (OLED) and flat-panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, and desktop computers due to their advantages such as high image quality, power saving, thin body, and wide range of applications, becoming the mainstream display device.

[0005] However, the process performance of current OLED display products needs to be improved.

[0006] Summary of the Invention

[0007] Embodiments of the present application provide a display panel and a method for manufacturing the same, a display panel motherboard, and a display device, aiming to improve the process reliability of the display panel.

[0008] An embodiment of the first aspect of the present application provides a display panel, which has a display area and a non-display area, and the display panel includes: a substrate; a pixel definition layer, which is arranged on one side of the substrate, the pixel definition layer including a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, which is arranged on a side of the pixel definition layer away from the substrate, the isolation structure layer including a first isolation layer and a second isolation layer located on the side of the first isolation layer away from the substrate, the isolation structure layer encloses a plurality of first-type openings located in the display area and functional openings located in the non-display area, and the first-type openings are connected to the corresponding pixel openings; a plurality of light-emitting devices, wherein at least part of the structure of the light-emitting device is arranged in the corresponding first-type opening; the extension length of at least part of the second isolation layer that participates in the enclosing formation of the functional opening relative to the first isolation layer toward the functional opening is shorter than the extension length of the second isolation layer that participates in the enclosing formation of at least part of the first-type opening relative to the first isolation layer toward the first-type opening.

[0009] An embodiment of the first aspect of the present application also provides a display panel, which has a display area and a non-display area, and the display panel includes: a substrate; a pixel definition layer, which is arranged on one side of the substrate, the pixel definition layer including a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, which is arranged on a side of the pixel definition layer away from the substrate, the isolation structure layer including a first isolation layer and a second isolation layer located on the side of the first isolation layer away from the substrate, the isolation structure layer encloses a plurality of first-type openings located in the display area and functional openings located in the non-display area, the first-type openings are connected to the corresponding pixel openings, and the second isolation layer that participates in enclosing the first-type openings extends from the first isolation layer toward the first-type openings; a plurality of light-emitting devices, at least part of the structure of the light-emitting device is arranged in the corresponding first-type openings; the second isolation layer forms a hollow structure on the side of the first isolation layer away from the substrate, the hollow structure is connected to the functional openings and is arranged around at least part of the functional openings.

[0010] An embodiment of the first aspect of the present application also provides a display panel, which has a display area and a non-display area, and the display panel includes: a substrate; a pixel definition layer, which is arranged on one side of the substrate, the pixel definition layer including a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, which is arranged on one side of the substrate, the isolation structure layer including an isolation structure at least partially located in the display area and an edge structure connected to the isolation structure and located in the non-display area, the isolation structure encloses an isolation opening connected to the pixel opening, the edge structure includes a main structure connected to the isolation structure and a plurality of protruding structures extending toward a second area relative to the main structure, the edge structure encloses a functional opening, and the edge area of ​​the functional opening has a first groove extending toward one side of the edge structure, the first groove penetrates the edge structure in the thickness direction of the display panel and is located between adjacent protruding structures; a plurality of light-emitting devices, at least part of the structure of the light-emitting device is arranged in the isolation opening.

[0011] An embodiment of the first aspect of the present application also provides a display panel, which has adjacent first specific areas and second areas, and the display panel includes: a substrate; an isolation structure, which is arranged on one side of the substrate and located in the first specific area, and the isolation structure encloses an isolation opening; a plurality of first auxiliary structures, which are located in the second area and arranged on the side of the substrate facing the isolation structure, the first auxiliary structures are spaced apart from the isolation structures, and adjacent first auxiliary structures are spaced apart; a light-emitting layer, including a light-emitting unit arranged in the isolation opening.

[0012] An embodiment of the first aspect of the present application also provides a display panel, which has adjacent display areas and non-display areas, and the display panel includes: a substrate; an isolation structure, which is arranged on one side of the substrate, and the isolation structure encloses an isolation opening; a plurality of protrusion structures, and the plurality of protrusion structures are arranged at intervals and connected to the edge portion of the isolation structure away from the display area; a light-emitting layer, which is located in the display area and includes a light-emitting unit arranged in the isolation opening.

[0013] An embodiment of the first aspect of the present application also provides a display panel, which includes a second sub-region and a display area surrounding the second sub-region; the display panel includes: a substrate; an isolation structure layer, the isolation structure layer is located on the substrate and encloses an isolation opening; in the direction away from the substrate, the isolation structure layer includes a first isolation layer and a second isolation layer stacked together; in the isolation structure layer surrounding the second sub-region, the extension length of the second isolation layer on the side facing the second sub-region relative to the first isolation layer is less than the extension length of the second isolation layer on the side away from the second sub-region relative to the first isolation layer.

[0014] The embodiment of the second aspect of the present application provides a display panel motherboard having a display area and a non-display area, wherein the non-display area includes a first area adjacent to the display area and a second area located on a side of the first area away from the display area, the second area includes a first sub-area and a second sub-area located on a side of the first sub-area away from the first area, and the display panel includes: a substrate; a pixel definition layer, arranged on one side of the substrate, the pixel definition layer including a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, arranged on a side of the pixel definition layer away from the substrate, the isolation structure layer including an isolation structure, an edge structure and an auxiliary structure spaced apart from the edge structure, the isolation structure surrounding The plurality of light-emitting devices are configured such that at least a portion of the light-emitting device is disposed in a first region and a second region. The plurality of light-emitting devices are configured such that at least a portion of the light-emitting device is disposed in a first region and a second region. The plurality of light-emitting devices are configured such that at least a portion of the light-emitting device is disposed in a first region and a second region. The plurality of light-emitting devices are configured such that at least a portion of the light-emitting device is disposed in a first region and a second region. The plurality of light-emitting devices are configured such that at least a portion of the light-emitting device is disposed in a first region and a second region.

[0015] An embodiment of a third aspect of the present application provides a method for manufacturing a display panel, wherein the display panel has a display area and a non-display area, and the manufacturing method includes:

[0016] preparing a pixel definition material layer on a substrate;

[0017] An isolation structure layer is prepared on the pixel definition material layer, the isolation structure layer comprising a first isolation layer and a second isolation layer located on a side of the first isolation layer facing away from the substrate, the isolation structure layer enclosing at least a portion of the first type of opening located in the display area and a functional opening located in the non-display area, wherein a length of at least a portion of the second isolation layer involved in enclosing the functional opening extending toward the functional opening relative to the first isolation layer is shorter than a length of the second isolation layer involved in enclosing at least a portion of the first type of opening extending toward the first type of opening relative to the first isolation layer;

[0018] Coating a first protective material layer on the isolation structure layer, wherein the first protective material layer forms a first hollow area at the first type of opening located in the display area;

[0019] A portion of the pixel definition material layer exposed from the first hollow area and the first type of opening located in the display area is patterned to form at least a portion of the pixel opening, and the pixel opening is connected to the first type of opening.

[0020] An embodiment of the third aspect of the present application further provides a method for manufacturing a display panel, wherein the display panel has a display area and a non-display area, and the manufacturing method includes:

[0021] preparing a pixel definition material layer on a substrate;

[0022] Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer;

[0023] Preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer;

[0024] performing patterning on the first isolation material layer and the second isolation material layer in the display area to form at least a portion of the first type of openings located in the display area;

[0025] Coating a first protective material layer on the second isolation material layer, wherein the first protective material layer forms a first hollow area at the first type of opening located in the display area;

[0026] performing patterning on a portion of the pixel definition material layer exposed from the first hollow area and the first type of opening located in the display area to form at least a portion of the pixel opening, wherein the pixel opening is connected to the first type of opening;

[0027] The first isolation material layer and the second isolation material layer in the non-display area are patterned to form an isolation structure layer. The isolation structure layer encloses a first type of opening and a functional opening at least partially located in the non-display area.

[0028] An embodiment of the fourth aspect of the present application provides a display device, comprising: a display panel of any of the above-mentioned embodiments or a display panel prepared by the preparation method of any of the above-mentioned embodiments; and a photosensitive component, arranged corresponding to the functional opening of the display panel.

[0029] In a display panel provided in an embodiment of the present application, the display panel has a display area and a non-display area, and the display panel includes a substrate, a pixel definition layer, an isolation structure layer, and a plurality of light-emitting devices. The pixel definition layer includes a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion. The isolation structure layer is disposed on a side of the pixel definition layer away from the substrate. The isolation structure layer encloses a plurality of first-type openings located in the display area and functional openings located in the non-display area. The functional openings can help improve the light transmittance of the non-display area, so that when the display panel is applied to a display device, a photosensitive component for sensing light in the display device can be correspondingly disposed below the functional opening, and the photosensitive component can better sense light through the functional opening.

[0030] The first-type openings are connected to corresponding pixel openings, and both the isolation structure layer and the pixel definition layer can be used to divide sub-pixels of the display panel. The light-emitting device is at least partially disposed within the corresponding first-type opening, so that the light-emitting device within the first-type opening can be used to achieve luminous display in the display area of ​​the display panel.

[0031] The isolation structure layer includes a first isolation layer and a second isolation layer located on the side of the first isolation layer facing away from the substrate. The extension length of at least part of the second isolation layer that participates in enclosing and forming a functional opening relative to the first isolation layer toward the functional opening is less than the extension length of the second isolation layer that participates in enclosing and forming at least part of the first type of opening relative to the first isolation layer toward the first type of opening.

[0032] By providing a second isolation layer that participates in enclosing at least a portion of the first type of opening and has a longer extension length toward the first type of opening relative to the first isolation layer, when preparing the light-emitting device of the display panel, at least a portion of the material of the light-emitting device can be directly vapor-deposited on the entire surface. The second isolation layer that participates in enclosing the first type of opening can block at least a portion of the material used to prepare the light-emitting device, so as to separate the material of the light-emitting device between adjacent sub-pixels, so as to facilitate the formation of a plurality of light-emitting devices that are spaced apart and located within the first type of opening, thereby eliminating the need to provide a mask with high precision when preparing the light-emitting device of the display panel. For example, there is no need to provide a high-precision metal mask (Fine Metal Mask, FMM) when vapor-depositing the material of the light-emitting device, thereby effectively reducing the production and preparation cost of the display panel.

[0033] By setting at least a portion of the second isolation layer involved in enclosing and forming the functional opening to have a shorter extension length toward the functional opening than the first isolation layer, during the preparation of the display panel, when a new material is formed on the isolation structure layer, for example, when an organic material is formed on the isolation structure layer, the second isolation layer located around the functional opening in the non-display area is less likely to block the organic material, and the new material can be better placed near the first isolation layer around the functional opening. Furthermore, when a new material is formed on the isolation structure layer, the second isolation layer with a shorter extension length is less likely to block the exhaust of gas, making it less likely for gas to remain under the second isolation layer around the functional opening, thereby significantly improving the structural stability of the display panel and further improving the process reliability of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The features, advantages and technical effects of exemplary embodiments of the present application will be described below with reference to the accompanying drawings, which are not drawn to scale.

[0035] FIG1 is a schematic structural diagram of a display panel provided in an embodiment of the present application;

[0036] FIG2 is a partial schematic diagram of a display panel provided in an embodiment of the present application;

[0037] FIG3 is a partial cross-sectional view of a display panel provided in an embodiment of the present application;

[0038] FIG4 is a partial cross-sectional view of a display panel in a display area provided by an embodiment of the present application;

[0039] FIG5 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0040] FIG6 is a partial cross-sectional view of a display panel provided in yet another embodiment of the present application;

[0041] FIG7 is a partial schematic diagram of a display panel provided in another embodiment of the present application;

[0042] FIG8 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure layer on a substrate provided in an embodiment of the present application;

[0043] FIG9 is a partial cross-sectional view of a display panel provided in yet another embodiment of the present application;

[0044] FIG10 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0045] FIG11 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0046] FIG12 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0047] FIG13 is a partial schematic diagram of a display panel provided in yet another embodiment of the present application;

[0048] FIG14 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0049] FIG15 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0050] FIG16 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0051] FIG17 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0052] FIG18 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure layer on a substrate provided by another embodiment of the present application;

[0053] FIG19 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0054] FIG20 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0055] FIG21 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0056] FIG22 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0057] FIG23 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0058] FIG24 is a schematic structural diagram of a display panel provided by another embodiment of the present application;

[0059] FIG25 is a partial cross-sectional view of a display panel provided in another embodiment of the present application;

[0060] FIG26 is a partial schematic diagram of a display panel provided in yet another embodiment of the present application;

[0061] FIG27 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure and a first auxiliary structure on a substrate provided by an embodiment of the present application;

[0062] FIG28 is a partial cross-sectional view of a display panel provided in yet another embodiment of the present application;

[0063] FIG29 is a partial schematic diagram of a display panel provided in yet another embodiment of the present application;

[0064] FIG30 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure, a protruding structure, and a first auxiliary structure on a substrate provided in an embodiment of the present application;

[0065] FIG31 is a schematic structural diagram of a display panel provided in yet another embodiment of the present application;

[0066] FIG32 is a partial cross-sectional view of a display panel provided in yet another embodiment of the present application;

[0067] FIG33 is a partial schematic diagram of a display panel provided in yet another embodiment of the present application;

[0068] FIG34 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure and a protrusion structure on a substrate provided by an embodiment of the present application;

[0069] FIG35 is a partial schematic diagram of a display panel provided in yet another embodiment of the present application;

[0070] FIG36 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure and a protrusion structure on a substrate provided by another embodiment of the present application;

[0071] FIG37 illustrates a schematic diagram of regional distribution of a display panel provided by this embodiment;

[0072] FIG38 illustrates one of the schematic diagrams of a partial film layer structure of a display panel provided in this embodiment;

[0073] FIG39 illustrates a schematic diagram of the isolation structure layer provided in this embodiment before and after lateral side engraving;

[0074] FIG40 illustrates a second schematic diagram of a partial film layer structure of a display panel provided in this embodiment;

[0075] FIG41 illustrates a third schematic diagram of a partial film layer structure of a display panel provided in this embodiment;

[0076] FIG42 illustrates a fourth schematic diagram of a partial film layer structure of a display panel provided in this embodiment;

[0077] FIG43 illustrates a fifth schematic diagram of a partial film layer structure of a display panel provided in this embodiment;

[0078] FIG44 illustrates a sixth schematic diagram of a partial film layer structure of a display panel provided in this embodiment;

[0079] FIG45 is a partial enlarged view of a second sub-region provided in an embodiment of the present application;

[0080] FIG46 is a partial cross-sectional view of a display panel motherboard provided in an embodiment of the present application;

[0081] FIG47 is a top view of a display panel motherboard provided in an embodiment of the present application;

[0082] FIG48 is a partial enlarged view of the second sub-region of the display panel in FIG47;

[0083] FIG49 is a cross-sectional view of the display panel motherboard along section line AA in FIG47;

[0084] FIG50 is a cross-sectional view of a display panel motherboard manufacturing process provided by an embodiment of the present application;

[0085] FIG51 is an enlarged view of another second sub-region provided in an embodiment of the present application;

[0086] FIG52 is an enlarged view of another second sub-region provided in an embodiment of the present application;

[0087] FIG53 is a partial enlarged view of another second sub-region provided in an embodiment of the present application;

[0088] FIG54 is an enlarged view of another second sub-region provided in an embodiment of the present application;

[0089] FIG55 is a cross-sectional view of another display panel motherboard provided in an embodiment of the present application;

[0090] FIG56 is a cross-sectional view of another display panel motherboard provided in an embodiment of the present application;

[0091] FIG57 is a cross-sectional view of another display panel motherboard provided in an embodiment of the present application;

[0092] FIG58 is a schematic flow chart of a method for manufacturing a display panel according to an embodiment of the present application;

[0093] 59 to 65 are schematic diagrams of a manufacturing process of a method for manufacturing a display panel provided in an embodiment of the present application;

[0094] FIG66 is a schematic diagram of a manufacturing process of a display panel manufacturing method provided in another embodiment of the present application;

[0095] 67 to 69 are schematic diagrams showing a manufacturing process of a method for manufacturing a display panel according to yet another embodiment of the present application;

[0096] 70 and 71 are schematic diagrams showing a manufacturing process of a method for manufacturing a display panel provided in yet another embodiment of the present application;

[0097] FIG72 is a schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present application;

[0098] 73 to 77 are schematic diagrams showing a manufacturing process of a method for manufacturing a display panel according to another embodiment of the present application;

[0099] 78 to 82 are schematic diagrams showing a manufacturing process of a method for manufacturing a display panel according to another embodiment of the present application;

[0100] FIG83 is a schematic flow chart of a method for manufacturing a display panel according to yet another embodiment of the present application;

[0101] FIG84 is a schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present application;

[0102] 85 to 89 are schematic diagrams showing a manufacturing process of a method for manufacturing a display panel according to another embodiment of the present application;

[0103] FIG90 is a schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present application;

[0104] FIG91 is a schematic diagram illustrating a process of a method for manufacturing a display panel provided in this embodiment;

[0105] FIG92 illustrates a process flow chart corresponding to FIG91 ;

[0106] FIG93 is a schematic diagram illustrating a flow chart for implementing step S13 in FIG91 ;

[0107] FIG94 is a process diagram corresponding to FIG93;

[0108] FIG95 is a schematic diagram illustrating a flow chart for implementing step S14 in FIG91 ;

[0109] FIG96 is a process diagram corresponding to FIG95 ;

[0110] FIG97 illustrates a partial process flow diagram of a method for manufacturing a display panel provided in this embodiment;

[0111] FIG98 illustrates another part of the process flow chart of the method for manufacturing the display panel provided in this embodiment.

[0112] Description of reference numerals:

[0113] 10-display panel; 10a-first protective material layer; 10aa-first hollow region; 10b-second protective material layer; 10ba-first thickness region; 10bb-second thickness region; 10bc-second hollow region; 10c-third protective material layer; 10e-isolation material layer; 11-pixel definition material layer; 12-first isolation material layer; 13-second isolation material layer; 14-isolation primary structure; 14a-isolation primary opening; 15-edge primary structure; 15a-functional primary opening; 16-auxiliary primary structure; 17-first type primary opening; 18-metal layer;

[0114] 100 - substrate; 110 - underlay; 120 - first insulating layer; 130 - second insulating layer; 140 - third insulating layer; 150 - transistor; 151 - gate; 152 - source and drain; 160 - storage capacitor; 161 - first plate; 162 - second plate; 170 - driving circuit layer;

[0115] 200-pixel definition layer; 210-pixel definition portion; 220-pixel opening;

[0116] 300-isolation structure layer; 300a-first type opening; 300aa-first opening; 300ab-second opening; 300ac-third opening; 300b-functional opening; 300ba-first groove; 301-first isolation layer; 301a-first surface; 301b-second surface; 302-second isolation layer; 302a-third surface; 302b-hollow structure; 303-third isolation layer; 310-isolation structure; 310a-isolation opening; 311-first isolation portion; 312-second isolation portion; 320-edge structure; 320a - first edge portion; 320b - second edge portion; 321 - main structure; 321a - first main portion; 321b - second main portion; 322 - raised structure; 322a - first raised portion; 322b - second raised portion; 330 - auxiliary structure; 331 - first auxiliary structure; 331a - first auxiliary portion; 331b - second auxiliary portion; 332 - second auxiliary structure; 332a - third auxiliary portion; 332b - fourth auxiliary portion; 332c - drainage groove; 332d - drainage auxiliary groove; 332e - positioning mark opening; 332f - concave-convex structure;

[0117] 400 - light-emitting device; 401 - first type light-emitting device; 402 - second type light-emitting device; 403 - third type light-emitting device; 410 - first electrode layer; 411 - first electrode; 420 - light-emitting layer; 421 - light-emitting unit; 430 - second electrode layer; 431 - second electrode;

[0118] 500-first packaging layer; 510-packaging unit;

[0119] 600- second encapsulation layer;

[0120] 700-third encapsulation layer;

[0121] 20-display panel motherboard;

[0122] 30-half-tone mask; 31-first mask opening; 32-second mask opening;

[0123] TA-first specific area;

[0124] AA-display area;

[0125] NA-non-display area; NA1-first area; NA2-second area; NA21-first sub-area; NA22-second sub-area;

[0126] A1-first isolation area; A2-second isolation area;

[0127] B1-first edge;

[0128] B2-second edge;

[0129] B3-third edge; B31-first sub-edge; B32-second sub-edge;

[0130] B4-fourth edge;

[0131] B5-fifth edge;

[0132] S1-first spacing; S2-second spacing;

[0133] H-functional hole;

[0134] L-cutting line;

[0135] X-first direction;

[0136] Y-second direction;

[0137] Z-thickness direction. DETAILED DESCRIPTION

[0138] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In the detailed description below, many specific details are set forth in order to provide a comprehensive understanding of the present application. However, it will be apparent to those skilled in the art that the present application can be implemented without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present application by illustrating examples of the present application. In the accompanying drawings and the following description, at least some of the well-known structures and technologies are not shown in order to avoid unnecessary ambiguity in the present application; and, for clarity, the sizes of some structures may be exaggerated. In addition, the features, structures, or characteristics described below may be combined in any suitable manner in one or more embodiments.

[0139] Embodiments of the present application provide a display panel and a method for manufacturing the same, a display panel motherboard, and a display device. The following describes various embodiments of the display panel and a method for manufacturing the same, a display panel motherboard, and a display device in conjunction with the accompanying drawings.

[0140] FIG1 is a schematic diagram of the structure of a display panel 10 provided in an embodiment of the present application, FIG2 is a partial schematic diagram of a display panel 10 provided in an embodiment of the present application, and FIG3 is a partial cross-sectional view of a display panel 10 provided in an embodiment of the present application. The X direction in the figure is a first direction, the Y direction in the figure is a second direction, and the Z direction in the figure may be the thickness direction of the display panel 10. The first direction X and the second direction Y intersect with the thickness direction Z of the display panel 10 in pairs. For example, the first direction X and the second direction Y may be perpendicular to the thickness direction Z of the display panel 10 in pairs. Optionally, the first direction X may be the length direction of the display panel 10, and the second direction Y may be the width direction of the display panel 10.

[0141] As shown in Figures 1 to 3, an embodiment of the first aspect of the present application provides a display panel 10, the display panel 10 having a display area AA and a non-display area NA, the display panel 10 comprising: a substrate 100; a pixel definition layer 200, disposed on one side of the substrate 100, the pixel definition layer 200 comprising a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210; an isolation structure layer 300, disposed on a side of the pixel definition layer 200 away from the substrate 100, the isolation structure layer 300 comprising a first isolation layer 301 and a second isolation layer 302 located on a side of the first isolation layer 301 away from the substrate 100, the isolation structure layer 300 0 encloses a plurality of first-type openings 300a located in the display area AA and a functional opening 300b located in the non-display area NA, wherein the first-type openings 300a are connected to the corresponding pixel openings 220; a plurality of light-emitting devices 400, wherein at least a portion of the light-emitting device 400 is structurally disposed within the corresponding first-type openings 300a; a length of at least a portion of the second isolation layer 302 that participates in enclosing and forming the functional openings 300b relative to the first isolation layer 301 extending toward the functional openings 300b is shorter than a length of the second isolation layer 302 that participates in enclosing and forming at least a portion of the first-type openings 300a that extends relative to the first isolation layer 301 toward the first-type openings 300a.

[0142] In a display panel 10 provided in an embodiment of the present application, the display panel 10 has a display area AA and a non-display area NA. The display panel 10 includes a substrate 100 , a pixel definition layer 200 , an isolation structure layer 300 , and a plurality of light-emitting devices 400 .

[0143] The pixel definition layer 200 includes a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210. The isolation structure layer 300 is arranged on the side of the pixel definition layer 200 away from the substrate 100. The isolation structure layer 300 encloses a plurality of first-type openings 300a located in the display area AA and functional openings 300b located in the non-display area NA. The functional openings 300b can help improve the transmittance of the non-display area NA, so that when the display panel 10 is applied to a display device, the photosensitive component for sensing light in the display device can be correspondingly arranged under the functional opening (the functional hole here can be a light-transmitting opening), and the photosensitive component can better sense light through the functional opening.

[0144] Optionally, the photosensitive component may include at least one of: a distance sensor, a camera, an under-screen fingerprint recognition module, an infrared light emitting diode (IR-LED), a proximity sensor, and other components capable of sensing light.

[0145] The first-type openings 300a are in communication with the corresponding pixel openings 220. Both the isolation structure layer 300 and the pixel definition layer 200 can be used to divide the sub-pixels of the display panel 10. At least a portion of the light-emitting device 400 is disposed within the corresponding first-type opening 300a, so that the light-emitting device 400 within the first-type opening 300a can be used to achieve light-emitting display in the display area AA of the display panel 10.

[0146] Optionally, the first-type openings 300a communicate with corresponding pixel openings 220, which may mean that adjacent first-type openings 300a communicate with pixel openings 220. For example, first-type openings 300a whose orthographic projections on the substrate 100 at least partially overlap with pixel openings 220 communicate with each other. Specifically, a single first-type opening 300a may communicate with a single pixel opening 220.

[0147] The isolation structure layer 300 includes a first isolation layer 301 and a second isolation layer 302 located on the side of the first isolation layer 301 facing away from the substrate 100. The extension length of at least part of the second isolation layer 302 that participates in enclosing and forming the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is less than the extension length of the second isolation layer 302 that participates in enclosing and forming at least part of the first type opening 300a relative to the first isolation layer 301 toward the first type opening 300a.

[0148] By setting a second isolation layer 302 that participates in enclosing and forming at least a portion of the first type opening 300a and has a longer protruding length toward the first type opening 300a relative to the first isolation layer 301, when preparing the light-emitting device 400 of the display panel 10, at least a portion of the material of the light-emitting device 400 can be directly vapor-deposited on the entire surface. The second isolation layer 302 that participates in enclosing and forming the first type opening 300a can block at least a portion of the material used to prepare the light-emitting device 400, so as to separate the material of the light-emitting device 400 between adjacent sub-pixels, so as to form a plurality of light-emitting devices 400 that are spaced apart and located within the first type opening 300a, so that when preparing the light-emitting device 400 of the display panel 10, there is no need to set a mask with high precision. For example, there is no need to set a high-precision metal mask (Fine Metal Mask, FMM) when vapor-depositing the material of the light-emitting device 400, thereby effectively reducing the production and preparation cost of the display panel 10.

[0149] By setting at least a portion of the second isolation layer 302 that participates in enclosing and forming the functional opening 300b to have a shorter extension length toward the functional opening 300b relative to the first isolation layer 301, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, for example, when an organic material is formed on the isolation structure layer 300, the second isolation layer 302 located around the functional opening 300b in the non-display area NA is less likely to block the organic material, and the new material can be better placed near the first isolation layer 301 around the functional opening 300b. In addition, when a new material is formed on the isolation structure layer 300, the second isolation layer 302 with a shorter extension length is less likely to cause excessive blocking effects on the discharge of gas, making it less likely that gas will remain under the second isolation layer 302 around the functional opening 300b, thereby effectively improving the structural stability of the display panel 10 and further improving the process reliability of the display panel 10.

[0150] In some embodiments of the present application, the substrate 100 may include a substrate 110 and a transistor 150 disposed on a side of the substrate 110 facing the first electrode layer 410, wherein the transistor 150 includes a gate 151 and a source and drain 152. Optionally, the substrate 100 may further include a storage capacitor 160. Exemplarily, the storage capacitor 160 may include a first plate 161 and a second plate 162 located on a side of the first plate 161 facing away from the substrate 110.

[0151] As an example, the substrate 100 may further include a first insulating layer 120, a second insulating layer 130, and a third insulating layer 140, which are located on a side of the substrate 110 facing the transistor 150 and are sequentially stacked on the substrate 110. The gate 151 and the first electrode 161 may be provided on the same layer. For example, the gate 151 and the first electrode 161 may be located on a side of the first insulating layer 120 facing the substrate 110. The second electrode 162 may be located between the first insulating layer 120 and the second insulating layer 130, and the source and drain electrodes 152 may be located between the second insulating layer 130 and the third insulating layer 140.

[0152] Optionally, in a direction away from the substrate 100, the light-emitting device 400 may include a first electrode layer 410, a light-emitting layer 420 and a second electrode layer 430 stacked in sequence, the light-emitting layer 420 may include a light-emitting unit 421 at least partially located within the pixel opening 220 and the isolation opening 310a, the first electrode layer 410 may include a first electrode 411 located on the side of the light-emitting layer 420 facing the substrate 100, and the second electrode layer 430 may include a second electrode 431 located on the side of the light-emitting layer 420 facing away from the substrate 100.

[0153] Optionally, the light-emitting unit 421 may include a hole injection layer (HIL), a hole transport layer (HTL), a light-emitting structure, an electron injection layer (EIL), and an electron transport layer (ETL).

[0154] In these optional embodiments, the first electrode layer 410 and the second electrode layer 430 can serve as pixel electrode layers of the display panel 10, one of the first electrode 411 and the second electrode 431 can serve as an anode, and the other can serve as a cathode to drive the light-emitting unit 421 to emit light. In the embodiment of the present application, the first electrode 411 is used as the anode of the display panel 10, and the second electrode 431 is used as the cathode of the display panel 10.

[0155] In some embodiments of the present application, during the preparation of the display panel 10, when an organic material is formed on the isolation structure layer 300, the second isolation layer 302 with a shorter extension length provided in the present application is not likely to cause excessive obstruction to the discharge of gas when the organic material is coated on the periphery of the functional opening 300b.

[0156] For example, referring to the embodiment of the method for preparing the display panel 10 described later, the second isolation layer 302 with a shorter extension length set in the present application is not likely to cause excessive blocking effect on the discharge of gas when the photoresist is coated on the periphery of the functional opening 300b during the preparation process of the pixel definition layer 200.

[0157] Specifically, during the preparation process of the display panel 10, the material of the entire pixel definition layer 200 can be prepared on the formed first electrode 411, and then the isolation structure layer 300 can be prepared on the material of the pixel definition layer 200. The material of the entire pixel definition layer 200 covering the first electrode 411 can provide better protection for the first electrode 411, so that when the material of the isolation structure layer 300 is etched, the etching material is not easily damaged by the first electrode 411 due to the shielding of the material of the pixel definition layer 200. After the preparation of the isolation structure layer 300 is completed, the material of the pixel definition layer 200 can be patterned using a photolithography process to form the pixel definition layer 200. Therefore, when photoresist is coated on the material of the pixel definition layer 200 and the isolation structure layer 300 using the photolithography process, the second isolation layer 302 with a shorter extension length is not likely to cause excessive blocking effect on the discharge of gas around the functional opening 300b, so that gas is not likely to remain under the second isolation layer 302 around the functional opening 300b, thereby better improving the structural stability of the display panel 10.

[0158] In some embodiments of the present application, the orthographic projection area of ​​the first type opening 300a on the substrate 100 may be smaller than the orthographic projection area of ​​the functional opening 300b on the substrate 100. Compared to the smaller first type opening 300a, if the isolation structure layer 300 is not specially configured around the functional opening 300b, gas is more likely to be trapped around the larger functional opening 300b when the organic material is formed on the isolation structure layer 300.

[0159] Therefore, by setting the extension length of at least a portion of the second isolation layer 302 that participates in enclosing and forming the functional opening 300b to be smaller than that of the first isolation layer 301 toward the functional opening 300b, during the preparation process of the display panel 10, when new material is formed on the isolation structure layer 300, the second isolation layer 302 on the side of the functional opening 300b with a larger size is not likely to cause excessive blocking effect on the discharge of gas on the side of the first isolation layer 301, so that gas is not likely to remain on the side of the functional opening 300b with a larger size, thereby better improving the process reliability of the display panel 10.

[0160] Optionally, the extension length of the second isolation layer 302 that participates in enclosing and forming the first type of opening 300a relative to the first isolation layer 301 toward the first type of opening 300a may be greater than 0, that is, the second isolation layer 302 may be arranged to extend from the first isolation layer 301 toward the first type of opening 300a, so that during the preparation process of the display panel 10, the second isolation layer 302 can be better used to block and isolate the materials between adjacent light-emitting devices 400.

[0161] Optionally, the extension length of at least part of the second isolation layer 302 participating in the enclosure to form the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is less than the extension length of the second isolation layer 302 participating in the enclosure to form at least part of the first type of opening 300a relative to the first isolation layer 301 toward the first type of opening 300a. This may refer to the extension length of at least part of the second isolation layer 302 participating in the enclosure to form the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b being less than the maximum extension length of the second isolation layer 302 participating in the enclosure to form the first type of opening 300a relative to the first isolation layer 301 toward the first type of opening 300a, so as to better determine the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b. For example, in the isolation structure layer 300, the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b can be set according to the maximum extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the first type of opening 300a. That is, in the preparation experiment of the display panel 10, multiple experiments can be carried out based on the maximum extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the first type of opening 300a, and the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is gradually reduced in each experiment, until gas is not easily retained on the peripheral side of the functional opening 300b in a certain experiment, so that the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b can be better determined.

[0162] FIG4 is a partial cross-sectional view of a display panel 10 in a display area AA provided in an embodiment of the present application.

[0163] As shown in FIG4 , in some optional embodiments, among a plurality of light-emitting devices 400, at least some of the light-emitting devices 400 may have different colors. For example, some of the light-emitting devices 400 may be first-type light-emitting devices 401 for emitting red light, some of the light-emitting devices 400 may be second-type light-emitting devices 402 for emitting green light, and some of the light-emitting devices 400 may be third-type light-emitting devices 403 for emitting blue light.

[0164] Optionally, the first type opening 300a may include a first opening 300aa for accommodating the first type light emitting device 401 , a second opening 300ab for accommodating the second type light emitting device 402 , and a portion of a third opening 300ac for accommodating the third type light emitting device 403 .

[0165] Optionally, the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the first opening 300aa, the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the second opening 300ab, and the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the third opening 300ac may be different.

[0166] In some optional embodiments, the first type of opening 300a includes a first type of sub-opening and a second type of sub-opening having an opening area smaller than the first type of sub-opening, and the extension length of at least a portion of the second isolation layer 302 that participates in the enclosing and forming the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is smaller than the extension length of the second isolation layer 302 that participates in the enclosing and forming the first type of sub-opening relative to the first isolation layer 301 toward the first type of opening 300a.

[0167] Alternatively, the first-type sub-opening may be any one of the first opening 300aa, the second opening 300ab, and the third opening 300ac, and the second-type sub-opening may be any one of the first opening 300aa, the second opening 300ab, and the third opening 300ac except the first-type sub-opening. For example, when the opening area of ​​the third opening 300ac is larger than the opening areas of the first opening 300aa and the second opening 300ab, the first-type sub-opening may be the third opening 300ac, and the second-type sub-opening may be the first opening 300aa or the second opening 300ab.

[0168] Optionally, the extension length of at least part of the second isolation layer 302 participating in the enclosing and forming the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is smaller than the extension length of the second isolation layer 302 participating in the enclosing and forming the largest first-type opening 300a relative to the first isolation layer 301 toward the first-type opening 300a.

[0169] Optionally, the largest first-type opening 300a may refer to the first-type opening 300a with the largest opening area, or may refer to the first-type opening 300a with the largest orthographic projection area on the substrate 100. For example, the largest first-type opening 300a may be the third opening 300ac, that is, the third opening 300ac may have the largest opening area among the first opening 300aa, the second opening 300ab, and the third opening 300ac.

[0170] In these optional embodiments, since gas is more easily retained around the first-type opening 300a with a larger opening area on the substrate 100, by setting the extension length of at least a portion of the second isolation layer 302 that participates in the enclosing and forming the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b to be smaller than the extension length of the second isolation layer 302 that participates in the enclosing and forming the first-type sub-opening relative to the first isolation layer 301 toward the first-type opening 300a, it is possible to better determine the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b.

[0171] For example, in the isolation structure layer 300, the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b can be set according to the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the largest first-type opening 300a. That is, in the preparation experiment of the display panel 10, the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the largest first-type opening 300a can be reasonably set to make it difficult for gas to remain on the surrounding side of the largest first-type opening 300a. Then, multiple experiments can be carried out based on the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the largest first-type opening 300a, and the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is gradually reduced in each experiment until gas is not easily generated on the surrounding side of the functional opening 300b in a certain experiment, so that the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b can be better determined.

[0172] In some optional embodiments, the extension length of at least part of the second isolation layer 302 participating in the enclosure to form the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b may be less than the minimum extension length of the second isolation layer 302 participating in the enclosure to form the first type of opening 300a relative to the first isolation layer 301 toward the first type of opening 300a, so as to better reduce the extension length of at least part of the second isolation layer 302 participating in the enclosure to form the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b, thereby further reducing the impact of the second isolation layer 302 on the discharge of gas, and further making it less likely for gas to remain under the second isolation layer 302 on the side of the functional opening 300b, which can better improve the structural stability of the display panel 10, and thus better improve the process reliability of the display panel 10.

[0173] Optionally, the extension length of at least a portion of the second isolation layer 302 involved in enclosing and forming the functional opening 300 b relative to the first isolation layer 301 toward the functional opening 300 b may be less than 0.8 micrometers.

[0174] FIG5 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application. FIG6 is a partial cross-sectional view of a display panel 10 provided in accordance with yet another embodiment of the present application.

[0175] As shown in Figures 5 and 6, in some optional embodiments, the minimum distance between the orthographic projection of the edge of the second isolation layer 302 corresponding to the first type of opening 300a on the substrate 100 and the orthographic projection of the edge of the first isolation layer 301 on the side facing away from the substrate 100 corresponding to the first type of opening 300a on the substrate 100 is a first distance S1. The first distance S1 may be greater than zero so as to achieve a structural morphology in which the second isolation layer 302, which participates in enclosing and forming the first type of opening 300a, extends from the first isolation layer 301 toward the first type of opening 300a.

[0176] Optionally, the second isolation layer 302 corresponds to the edge of the first type opening 300a, which may refer to the edge of the first type opening 300a formed by the second isolation layer 302. Optionally, the surface of the first isolation layer 301 facing away from the substrate 100 corresponds to the edge of the first type opening 300a, which may refer to the edge of the first type opening 300a formed by the surface of the first isolation layer 301 facing away from the substrate 100.

[0177] Optionally, the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b may be greater than or equal to zero. The minimum spacing between the orthographic projection of the edge of the second isolation layer 302 corresponding to the functional opening 300b on the substrate 100 and the orthographic projection of the edge of the surface of the first isolation layer 301 facing away from the substrate 100 corresponding to the functional opening 300b on the substrate 100 is a second spacing S2. The second spacing S2 may be smaller than the first spacing S1, so that the extension length of the second isolation layer 302 participating in enclosing and forming the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is smaller than the extension length of the second isolation layer 302 participating in enclosing and forming the first type of opening 300a relative to the first isolation layer 301 toward the first type of opening 300a, thereby effectively reducing the shielding effect of the second isolation layer 302 on the peripheral side of the functional opening 300b on gas exhaust.

[0178] Optionally, the second isolation layer 302 corresponds to the edge of the functional opening 300b, which may mean that the second isolation layer 302 participates in enclosing and forming the edge of the functional opening 300b. Optionally, the surface of the first isolation layer 301 facing away from the substrate 100 corresponds to the edge of the functional opening 300b, which may mean that the surface of the first isolation layer 301 facing away from the substrate 100 participates in enclosing and forming the edge of the functional opening 300b.

[0179] In some optional embodiments, as shown in Figure 5, when the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is greater than zero, the second spacing S2 is greater than zero, and the positive projection of the edge of the second isolation layer 302 corresponding to the functional opening 300b on the substrate 100 is located on the side of the first isolation layer 301 facing away from the substrate 100, corresponding to the positive projection of the edge of the first type of opening 300a on the substrate 100 facing the functional opening 300b, and the second isolation layer 302 can be arranged to extend from the first isolation layer 301 toward the functional opening 300b.

[0180] Optionally, the angle between the surface of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the first type of opening 300a may be smaller than the angle between the surface of at least part of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the functional opening 300b, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side wall of the first isolation layer 301, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0181] Optionally, the surface of the first isolation layer 301 facing the first-type opening 300a may be the first surface 301a, the surface of the first isolation layer 301 facing the functional opening 300b may be the second surface 301b, and the surface of the second isolation layer 302 facing the substrate 100 may be the third surface 302a. The end of the first surface 301a facing away from the substrate 100 may be in contact with an end of a portion of the third surface 302a proximal to the first isolation layer 301, and the end of the second surface 301b facing away from the substrate 100 may be in contact with an end of a portion of the third surface 302a proximal to the first isolation layer 301.

[0182] In some embodiments, the first surface 301a, the second surface 301b, and the third surface 302a may all be planes. The angle between the surface of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the first-type opening 300a may be referred to as the angle between the third surface 302a and the first surface 301a. The angle between the surface of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the functional opening 300b may be referred to as the angle between the third surface 302a and the second surface 301b.

[0183] In other embodiments, at least a portion of the first surface 301a may be a curved surface, and / or at least a portion of the second surface 301b may be a curved surface, and / or at least a portion of the third surface 302a may be a curved surface. A first cut surface is defined as a tangent to the edge of the first surface 301a facing the third surface 302a, a second cut surface is defined as a tangent to the edge of the second surface 301b facing the third surface 302a, and a third cut surface is defined as a tangent to the edge of the third surface 302a facing the first surface 301a and / or the second surface 301b. The angle between the surface of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the first-type opening 300a may be referred to as the angle between the third cut surface and the first cut surface. The angle between the surface of the second isolation layer 302 facing the substrate 100 and the surface of the first isolation layer 301 facing the functional opening 300b may be referred to as the angle between the third cut surface and the second cut surface.

[0184] In some optional embodiments, as shown in Figure 6, when the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is equal to zero, the second spacing S2 is equal to zero, and the second isolation layer 302 may not extend from the first isolation layer 301 toward the functional opening 300b, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side walls of the first isolation layer 301 and the second isolation layer 302, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0185] Optionally, the second interval S2 may be 70% of the first interval S1, or the second interval S2 may be 50% of the first interval S1, or the second interval S2 may be 30% of the first interval S1.

[0186] As shown in Figure 6, optionally, when the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is equal to zero, it may mean that the orthographic projection of the edge of the second isolation layer 302 corresponding to the side of the functional opening 300b on the substrate 100 and the orthographic projection of the edge of the surface of the first isolation layer 301 facing away from the substrate 100 corresponding to the side of the functional opening 300b on the substrate 100 at least partially overlap.

[0187] In some optional embodiments, the isolation structure layer 300 includes an isolation structure 310 at least partially located in the display area AA and an edge structure 320 located in the non-display area NA, the first type of opening 300a includes an isolation opening 310a formed by the isolation structure 310, and the edge structure 320 encloses a functional opening 300b, and the isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312 located on the side of the first isolation portion 311 facing away from the substrate 100.

[0188] Optionally, the light emitting device 400 may be at least partially located within the isolation opening 310a, and the isolation opening 310a may communicate with the pixel opening 220. Optionally, the first isolation portion 311 may be used to participate in forming the first isolation layer 301, and the second isolation portion 312 may be used to participate in forming the second isolation layer 302.

[0189] Optionally, the isolation structure 310 can be used to isolate the materials of the light-emitting layer 420 and the second electrode layer 430 during the preparation of the light-emitting layer 420 and the second electrode layer 430 to achieve sub-pixel division. Optionally, the extension length of the second isolation portion 312 relative to the first isolation portion 311 on the side facing the first type of opening 300a can be greater than zero, that is, the second isolation portion 312 can be arranged to extend beyond the first isolation portion 311 toward the first type of opening 300a. This allows, when preparing the light-emitting device 400 of the display panel 10, at least a portion of the material of the light-emitting device 400 can be directly evaporated on the entire surface. The second isolation portion 312 can shield at least a portion of the material used to prepare the light-emitting device 400, thereby isolating the material of the light-emitting device 400 between adjacent sub-pixels, thereby facilitating the formation of multiple light-emitting devices 400 spaced apart and located within the isolation opening 310a. This eliminates the need for a highly precise mask when preparing the light-emitting device 400 of the display panel 10.

[0190] Optionally, the isolation structure 310 may be in a mesh shape, wherein the hollow areas in the mesh-shaped isolation structure 310 may form isolation openings 310 a .

[0191] Optionally, the material of the isolation structure 310 may include a conductive material. For example, the material of the first isolation portion 311 may include a conductive material, so that the second electrode 431 can be connected to the isolation structure 310, so that the second electrodes 431 in adjacent isolation openings 310a can be interconnected through the isolation structure 310 to form a surface electrode, so as to facilitate the control of the second electrode 431 in the display panel 10.

[0192] In some embodiments, as shown in Figures 5 and 6, the edge structure 320 includes a first edge portion 320a and a second edge portion 320b located on the side of the first edge portion 320a facing away from the substrate 100, and at least a portion of the second edge portion 320b extending relative to the first edge portion 320a toward the functional opening 300b is less than the length of the second isolation portion 312 extending relative to the first isolation portion 311 toward the isolation opening 310a.

[0193] Optionally, the first edge portion 320 a may be used to participate in forming the first isolation layer 301 , and the second edge portion 320 b may be used to participate in forming the second isolation layer 302 .

[0194] Optionally, the first edge portion 320a can be provided in the same layer and material as the first isolation portion 311, and the second edge portion 320b can be provided in the same layer and material as the second isolation portion 312, so that the edge structure 320 can be formed using the same or similar manufacturing process and equipment as the isolation structure 310. Optionally, the edge structure 320 can be connected to the isolation structure 310, for example, the edge structure 320 can be integrally formed with the isolation structure 310.

[0195] Optionally, the length of the second edge portion 320b extending relative to the first edge portion 320a toward the functional opening 300b may be greater than or equal to zero. For example, as shown in FIG5 , when the length of the second edge portion 320b extending relative to the first edge portion 320a toward the functional opening 300b is greater than zero, the second edge portion 320b may be arranged to extend beyond the first edge portion 320a toward the functional opening 300b. For example, as shown in FIG6 , when the length of the second edge portion 320b extending relative to the first edge portion 320a toward the functional opening 300b is equal to zero, the orthographic projection of the second edge portion 320b on the substrate 100 may be located within the orthographic projection of the surface of the first edge portion 320a facing away from the substrate 100 on the substrate 100.

[0196] Optionally, when the extension length of the second edge portion 320b relative to the first edge portion 320a toward the functional opening 300b is equal to zero, the orthographic projection of the edge of the second edge portion 320b corresponding to the side of the functional opening 300b on the substrate 100 and the orthographic projection of the edge of the surface of the first edge portion 320a facing away from the substrate 100 corresponding to the side of the functional opening 300b on the substrate 100 at least partially overlap, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side walls of the first edge portion 320a and the second edge portion 320b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0197] In these optional embodiments, by setting the extension length of at least part of the second edge portion 320b relative to the first edge portion 320a toward the functional opening 300b to be shorter than the extension length of the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a, during the preparation process of the display panel 10, when new material is formed on the isolation structure layer 300, the second edge portion 320b with a shorter extension length is less likely to cause excessive blocking effect on the discharge of gas around the functional opening 300b, so that gas is less likely to remain under the second edge portion 320b around the functional opening 300b, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0198] FIG7 is a partial schematic diagram of a display panel 10 provided in another embodiment of the present application.

[0199] As shown in FIG. 7 , in some optional embodiments, the functional opening 300 b includes a first groove 300 ba disposed in the edge region. The first groove 300 ba is disposed through the edge structure 320 in the thickness direction Z of the display panel 10 .

[0200] Alternatively, the edge region may refer to an edge region of the functional opening 300b on a side close to the edge structure 320. Alternatively, the first groove 300ba may be formed by inward depression of a portion of the surface of the edge structure 320 on a side facing the functional opening 300b.

[0201] In these optional embodiments, by setting the first groove 300ba, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, the first groove 300ba extending toward the edge structure 320 can improve the exhaust path when the new material is formed, so that when the new material is coated along a certain direction on the isolation structure layer 300, under the extrusion force of the coating material, the gas between the new material and the edge structure 320 and the gas between the new material and the substrate 100 can be guided by the edge structure 320 on the side of the first groove 300ba and discharged outward from the edge of the edge structure 320 on the side of the first groove 300ba in a direction away from the display area AA, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0202] FIG8 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure layer 300 on a substrate 100 provided in an embodiment of the present application.

[0203] As shown in Figure 8, in some optional embodiments, when the edge structure 320 includes a first edge portion 320a and a second edge portion 320b, the extension length of at least part of the second edge portion 320b relative to the first edge portion 320a toward the first groove 300ba is smaller than the extension length of the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a.

[0204] Optionally, as shown in FIG8 , the extension length of the second edge portion 320 b relative to the first edge portion 320 a toward the first groove 300 ba may be greater than or equal to zero.

[0205] In these optional embodiments, by setting the extension length of at least part of the second edge portion 320b relative to the first edge portion 320a toward the first groove 300ba to be shorter than the extension length of the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a, when new material is formed on the isolation structure layer 300, the gas can not only be discharged outward from the edge of the edge structure 320 on the side of the first groove 300ba along the direction away from the display area AA under the guidance of the edge structure 320 on the side of the first groove 300ba, but the gas can also be discharged outward along the thickness direction Z of the display panel 10 without being easily blocked by the second edge portion 320b with a shorter extension length, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0206] In some optional embodiments, the non-display area NA includes a first area NA1 adjacent to the display area AA and a second area NA2 located on the side of the first area NA1 away from the display area AA, the edge structure 320 is located in the first area NA1, the edge structure 320 includes a main structure 321 connected to the isolation structure 310 and a plurality of protruding structures 322 extending toward the second area NA2 relative to the main structure 321, and the first groove 300ba is located between adjacent protruding structures 322.

[0207] Optionally, the main structure 321 may include a first main portion 321a and a second main portion 321b located on the side of the first main portion 321a facing away from the substrate 100. The first main portion 321a can be used to participate in forming the first edge portion 320a, and the second main portion 321b can be used to participate in forming the second edge portion 320b.

[0208] Optionally, the first main body portion 321a can be provided in the same layer and material as the first isolating portion 311, and the second main body portion 321b can be provided in the same layer and material as the second isolating portion 312, so that the main structure 321 can be produced using the same or similar production process and equipment as the isolating structure 310. Optionally, the first main body portion 321a of the main structure 321 can be integrally formed with the first isolating portion 311, and the second main body portion 321b of the main structure 321 can be integrally formed with the second isolating portion 312.

[0209] Optionally, the protruding structure 322 may include a first protruding portion 322a and a second protruding portion 322b located on the side of the first protruding portion 322a facing away from the substrate 100. The first protruding portion 322a may be used to participate in forming the first edge portion 320a, and the second protruding portion 322b may be used to participate in forming the second edge portion 320b.

[0210] Alternatively, the first raised portion 322a may be formed from the same layer and material as the first isolating portion 311, and the second raised portion 322b may be formed from the same layer and material as the second isolating portion 312, so that the raised structure 322 can be manufactured using the same or similar manufacturing process and equipment as the isolating structure 310. Alternatively, the first raised portion 322a of the raised structure 322 may be integrally formed with the first main portion 321a of the main structure 321, and the second raised portion 322b of the raised structure 322 may be integrally formed with the second main portion 321b of the main structure 321.

[0211] In these optional embodiments, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, the protruding structure 322 protruding relative to the main structure 321 can improve the exhaust path when the material is formed, so that when the material is coated along a certain direction on the isolation structure layer 300, under the extrusion force of the coating material, the gas between the new material and the edge structure 320 and the gas between the new material and the substrate 100 can be guided by the protruding structure 322 and discharged outward from the edge of the protruding structure 322 in the direction pointing to the second area NA2, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0212] In some optional embodiments, the dimension of the first groove 300ba in a direction perpendicular to the line from the display area to the centroid of the functional opening 300b gradually increases (not shown in the figure). This facilitates the discharge of gas from the edge of the edge structure 320 surrounding the first groove 300ba away from the display area AA when new material is formed on the isolation structure layer 300. For example, the orthographic projection of the first groove 300ba on the substrate 100 may be trapezoidal.

[0213] Optionally, in the direction from the display area AA to the centroid of the functional opening 300b, the dimension of the first groove 300ba in the direction perpendicular to the straight line from the display area to the centroid of the functional opening gradually increases, which may mean that in the direction away from the display area AA, the distance between the protruding structures 322 on both sides of the first groove 300ba gradually increases.

[0214] In some optional embodiments, the dimension of the protrusion structure perpendicular to the line from the centroid of the functional opening to the centroid of the protrusion (herein, the average dimension) is equal to 0.5 to 10 times the dimension of the isolation opening (herein, the maximum outline dimension of the larger pixel opening among several different pixel openings); and / or the dimension of the first groove along the direction from the centroid of the functional opening to the centroid of the groove (herein, the average dimension) is equal to 60 nanometers to 100 microns; and / or the dimension of the first groove perpendicular to the line from the centroid of the functional opening to the centroid of the groove is equal to 0.5 to 10 times the dimension of the isolation opening. The centroid here refers to the centroid of the corresponding pattern of the corresponding structure on the surface parallel to the substrate.

[0215] Optionally, the dimension of the protrusion structure in a direction perpendicular to the straight line from the centroid of the functional opening to the centroid of the protrusion is equal to 0.8 times, 1.5 times, 3 times, 5 times, or 8 times the outline dimension of the isolation opening.

[0216] Optionally, a dimension of the first groove in a direction perpendicular to a straight line from the centroid of the functional opening to the centroid of the groove is equal to 0.8 times, 1.5 times, 3 times, 5 times, or 8 times the outline dimension of the isolation opening.

[0217] Optionally, a dimension of the first groove in a direction from the centroid of the functional opening to the centroid of the groove is equal to 100 nanometers, 300 nanometers, 600 nanometers, 1 micrometer, 5 micrometers, 10 micrometers, 20 micrometers, 30 micrometers, 40 micrometers, 60 micrometers, or 100 micrometers.

[0218] In these optional embodiments, by reasonably setting the sizes of the protruding structure 322 and the first groove 300ba according to the isolation opening 310a, when new material is formed on the isolation structure layer 300 during the preparation of the display panel 10, gas is not easily retained on the sides of the protruding structure 322 and the first groove 300ba, and the gas can be better discharged outward along the edge of the protruding structure 322 on the sides of the first groove 300ba.

[0219] FIG9 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application, and FIG10 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application.

[0220] As shown in Figures 9 and 10, in some optional embodiments, the extension length of at least part of the second protrusion 322b relative to the first protrusion 322a toward the functional opening 300b is smaller than the extension length of the second isolation portion 312 relative to the first isolation portion 311 of the isolation structure 310 toward the isolation opening 310a.

[0221] Optionally, as shown in FIG. 9 and FIG. 10 , the extension length of the second protrusion 322 b relative to the first protrusion 322 a toward the functional opening 300 b may be greater than or equal to zero.

[0222] Optionally, the orthographic projection of the second protrusion 322b on the substrate 100 is located within the orthographic projection of the first protrusion 322a on the substrate 100, so as to better shorten the protruding length of the second protrusion 322b relative to the first protrusion 322a.

[0223] Further optionally, as shown in Figure 10, the orthographic projection of the second protrusion 322b on the substrate 100 is located within the orthographic projection of the surface of the first protrusion 322a on the side facing away from the substrate 100 on the substrate 100, so that the protruding length of the second protrusion 322b relative to the first protrusion 322a toward the side of the functional opening 300b can be equal to zero.

[0224] Optionally, when the extension length of the second protrusion 322b relative to the first protrusion 322a toward the functional opening 300b is equal to zero, the orthographic projection of the edge of the second protrusion 322b corresponding to the side of the functional opening 300b on the substrate 100 and the orthographic projection of the edge of the surface of the first protrusion 322a facing away from the substrate 100 corresponding to the side of the functional opening 300b on the substrate 100 at least partially overlap, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side walls of the first protrusion 322a and the second protrusion 322b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0225] In these optional embodiments, by setting the extension length of at least part of the second protrusion 322b relative to the first protrusion 322a toward the functional opening 300b to be shorter than the extension length of the second isolation portion 312 relative to the first isolation portion 311 of the isolation structure 310 toward the isolation opening 310a, when new material is formed on the isolation structure layer 300, the gas is less likely to be blocked by the second protrusion 322b with a shorter extension length and is discharged outward along the thickness direction Z of the display panel 10, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0226] FIG11 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application. FIG12 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application.

[0227] As shown in Figures 11 and 12, in some optional embodiments, the extension length of at least part of the second main body portion 321b relative to the first main body portion 321a toward the first groove 300ba is smaller than the extension length of the second isolation portion 312 relative to the first isolation portion 311 of the isolation structure 310 toward the isolation opening 310a.

[0228] Optionally, a protruding length of the second main body portion 321b relative to the first main body portion 321a toward the first groove 300ba may be greater than or equal to zero.

[0229] Optionally, the orthographic projection of the second main body portion 321b on the substrate 100 is located within the orthographic projection of the first main body portion 321a on the substrate 100, so as to better shorten the protruding length of the second main body portion 321b relative to the first main body portion 321a.

[0230] Further optionally, as shown in Figure 12, the orthographic projection of the second main body portion 321b on the substrate 100 is located within the orthographic projection of the surface of the first main body portion 321a on the substrate 100 that is away from the substrate 100, so that the protruding length of the second main body portion 321b relative to the first main body portion 321a toward the side of the first groove 300ba can be equal to zero.

[0231] Optionally, when the extension length of the second main body portion 321b relative to the first main body portion 321a toward the side of the first groove 300ba is equal to zero, the orthographic projection of the edge of the second main body portion 321b corresponding to the side of the first groove 300ba on the substrate 100 and the orthographic projection of the edge of the surface of the first main body portion 321a facing away from the substrate 100 corresponding to the side of the first groove 300ba on the substrate 100 at least partially overlap, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side walls of the first main body portion 321a and the second main body portion 321b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0232] In these optional embodiments, by setting the extension length of at least part of the second main body portion 321b relative to the first main body portion 321a toward the first groove 300ba to be shorter than the extension length of the second isolation portion 312 relative to the first isolation portion 311 of the isolation structure 310 toward the isolation opening 310a, when new material is formed on the isolation structure layer 300, the gas can be discharged outward along the thickness direction Z of the display panel 10 without being blocked by the second main body portion 321b with a shorter extension length, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0233] FIG13 is a partial schematic diagram of a display panel 10 provided in yet another embodiment of the present application.

[0234] As shown in FIG. 13 , in some optional embodiments, the isolation structure layer 300 further includes an auxiliary structure 330 located in the functional opening 300 b and spaced apart from the edge structure 320 .

[0235] Optionally, the auxiliary structure 330 may be provided in the second area NA2.

[0236] Optionally, the second area NA2 includes a first sub-area NA21 and a second sub-area NA22 located on the side of the first sub-area NA21 away from the first area NA1, and the auxiliary structure 330 includes a plurality of first auxiliary structures 331 located in the first sub-area NA21, and the plurality of first auxiliary structures 331 are arranged at intervals and around the periphery of the second sub-area NA22.

[0237] Optionally, the distance between the first auxiliary structure 331 and the edge structure 320 may be less than or equal to 10 microns. For example, the distance between the first auxiliary structure 331 and the edge structure 320 may be less than or equal to 1 micron, 2 microns, 3 microns, 5 microns or 7 microns.

[0238] In these optional embodiments, an auxiliary structure 330 spaced from the edge structure 320 is provided in the functional opening 300b, so that when the isolation structure layer 300 is etched, the etching material in the functional opening 300b of the second area NA2 can also etch the material of the auxiliary structure 330, so that the auxiliary structure 330 can limit the etching material in the functional opening 300b from being transferred toward the edge structure 320, thereby effectively reducing the amount of etching of the edge structure 320 by the etching material, making the edge structure 320 less likely to be damaged by excessive etching, and effectively improving the structural stability of the display panel 10. Moreover, while reducing the amount of etching material on the material of the edge structure 320, the auxiliary structure 330 can also facilitate the realization of the morphology of the edge structure 320 in the aforementioned embodiment, that is, the setting of the auxiliary structure 330 can reduce the amount of etching material on the material of the edge structure 320, so as to facilitate the formation of a morphological structure in which the extension length of at least part of the second protrusion 322b relative to the first protrusion 322a toward the functional opening 300b is less than the extension length of the second isolation part 312 relative to the first isolation part 311 of the isolation structure 310 toward the isolation opening 310a, and can facilitate the formation of a morphological structure in which the extension length of at least part of the second main body part 321b relative to the first main body part 321a toward the first groove 300ba is less than the extension length of the second isolation part 312 relative to the first isolation part 311 of the isolation structure 310 toward the isolation opening 310a.

[0239] In addition, by setting the spacing between adjacent auxiliary structures 330, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, for example, when the material is coated along a certain direction on the isolation structure layer 300, the gas between the new material and the auxiliary structure 330 or the gas between the new material and the substrate 100 can be discharged outward from the edge of the auxiliary structure 330 under the guidance of the spacing between adjacent auxiliary structures 330, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0240] FIG14 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application. FIG15 is a partial cross-sectional view of a display panel 10 provided in accordance with another embodiment of the present application.

[0241] As shown in Figures 14 and 15, in some optional embodiments, the first auxiliary structure 331 includes a first auxiliary portion 331a and a second auxiliary portion 331b located on the side of the first auxiliary portion 331a facing away from the substrate 100, and at least part of the second auxiliary portion 331b has a length extending relative to the first auxiliary portion 331a toward the functional opening 300b that is smaller than the length extending relative to the first isolation portion 311 toward the isolation opening 310a.

[0242] Optionally, the first auxiliary portion 331 a may be used to participate in forming the first isolation layer 301 , and the second auxiliary portion 331 b may be used to participate in forming the second isolation layer 302 .

[0243] Alternatively, the first auxiliary portion 331a may be formed from the same layer and material as the first isolating portion 311, and the second auxiliary portion 331b may be formed from the same layer and material as the second isolating portion 312, so that the first auxiliary structure 331 can be manufactured using the same or similar manufacturing process and equipment as the isolating structure 310. Alternatively, the first auxiliary portion 331a of the first auxiliary structure 331 may be integrally formed with the first isolating portion 311, and the second auxiliary portion 331b of the main structure 321 may be integrally formed with the second isolating portion 312.

[0244] Optionally, the extension length of the second auxiliary portion 331 b relative to the first auxiliary portion 331 a toward the functional opening 300 b may be greater than or equal to zero.

[0245] Optionally, the orthographic projection of the second auxiliary portion 331 b on the substrate 100 is located within the orthographic projection of the first auxiliary portion 331 a on the substrate 100 , so as to better shorten the protruding length of the second auxiliary portion 331 b relative to the first auxiliary portion 331 a .

[0246] Further optionally, as shown in Figure 15, the orthographic projection of the second auxiliary portion 331b on the substrate 100 is located within the orthographic projection of the surface of the first auxiliary portion 331a on the substrate 100 that is away from the substrate 100, so that the protruding length of the second auxiliary portion 331b relative to the first auxiliary portion 331a toward the functional opening 300b can be equal to zero.

[0247] Optionally, when the extension length of the second auxiliary portion 331b relative to the first auxiliary portion 331a toward the functional opening 300b is equal to zero, the orthographic projection of the edge of the second auxiliary portion 331b corresponding to the side of the functional opening 300b on the substrate 100 and the orthographic projection of the edge of the surface of the first auxiliary portion 331a facing away from the substrate 100 corresponding to the side of the functional opening 300b on the substrate 100 at least partially overlap, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side walls of the first auxiliary portion 331a and the second auxiliary portion 331b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0248] In these optional embodiments, by setting the extension length of at least part of the second auxiliary portion 331b relative to the first auxiliary portion 331a toward the functional opening 300b to be shorter than the extension length of the second isolation portion 312 relative to the first isolation portion 311 of the isolation structure 310 toward the isolation opening 310a, when new material is formed on the isolation structure layer 300, the gas can be less easily blocked by the second auxiliary portion 331b with a shorter extension length and discharged outward along the thickness direction Z of the display panel 10, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0249] In some optional embodiments, the display panel 10 is provided with a functional hole H in the second sub-area NA22 , so that when a photosensitive component is provided corresponding to the functional opening 300 b , the photosensitive component can better sense light through the functional hole H.

[0250] Optionally, the edge structure 320 and the first auxiliary structure 331 may be disposed around at least a portion of the functional hole H.

[0251] FIG16 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0252] 1 to 15 and refer to FIG16 , an embodiment of the first aspect of the present application further provides a display panel 10, the display panel 10 having a display area AA and a non-display area NA, the display panel 10 comprising: a substrate 100; a pixel definition layer 200, disposed on one side of the substrate 100, the pixel definition layer 200 comprising a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210; an isolation structure layer 300, disposed on a side of the pixel definition layer 200 away from the substrate 100, the isolation structure layer 300 comprising a first isolation layer 301 and a second isolation layer 302 located on a side of the first isolation layer 301 away from the substrate 100, the isolation structure layer 300 A plurality of first-type openings 300a are enclosed and located in the display area AA, and a functional opening 300b is enclosed and located in the non-display area NA. The first-type openings 300a are connected to the corresponding pixel openings 220, and the second isolation layer 302 that participates in enclosing and forming the first-type openings 300a extends out from the first isolation layer 301 toward the first-type openings 300a; a plurality of light-emitting devices 400, at least part of the structure of the light-emitting device 400 is arranged in the corresponding first-type openings 300a; the second isolation layer 302 forms a hollow structure 302b on the side of the first isolation layer 301 facing away from the substrate 100, and the hollow structure 302b is connected to the functional openings 300b and is arranged around at least part of the functional openings 300b.

[0253] In a display panel 10 provided in an embodiment of the present application, the display panel 10 has a display area AA and a non-display area NA. The display panel 10 includes a substrate 100, a pixel definition layer 200, an isolation structure layer 300, and a plurality of light-emitting devices 400. The pixel definition layer 200 includes a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210. The isolation structure layer 300 is disposed on a side of the pixel definition layer 200 away from the substrate 100. The isolation structure layer 300 encloses a plurality of first-type openings 300a in the display area AA and functional openings 300b in the non-display area NA. The functional openings 300b can help improve the light transmittance of the non-display area NA. When the display panel 10 is used in a display device, a photosensitive component for sensing light in the display device can be correspondingly disposed below the functional openings, and the photosensitive component can better sense light through the functional openings.

[0254] The first-type openings 300a are in communication with the corresponding pixel openings 220. Both the isolation structure layer 300 and the pixel definition layer 200 can be used to divide the sub-pixels of the display panel 10. At least a portion of the light-emitting device 400 is disposed within the corresponding first-type opening 300a, so that the light-emitting device 400 within the first-type opening 300a can be used to achieve light-emitting display in the display area AA of the display panel 10.

[0255] The isolation structure layer 300 includes a first isolation layer 301 and a second isolation layer 302 located on the side of the first isolation layer 301 away from the substrate 100. The second isolation layer 302, which participates in enclosing and forming the first type of opening 300a, extends out from the first isolation layer 301 toward the first type of opening 300a, so that when preparing the light-emitting device 400 of the display panel 10, at least part of the material of the light-emitting device 400 can be directly evaporated on the entire surface. The second isolation layer 302, which participates in enclosing and forming the first type of opening 300a, can block at least part of the material used to prepare the light-emitting device 400 to separate the material of the light-emitting device 400 between adjacent sub-pixels, so as to form a plurality of light-emitting devices 400 that are spaced apart and located in the first type of opening 300a, so that when preparing the light-emitting device 400 of the display panel 10, there is no need to set a mask with high precision. For example, there is no need to set a high-precision metal mask when evaporating the material of the light-emitting device 400, which can effectively reduce the production and preparation cost of the display panel 10.

[0256] The second isolation layer 302 forms a hollow structure 302b on the side of the first isolation layer 301 facing away from the substrate 100. The hollow structure 302b is connected to the functional opening 300b and is disposed around at least a portion of the functional opening 300b. This allows, during the manufacturing process of the display panel 10, when a new material is formed on the isolation structure layer 300, for example, when an organic material is formed on the isolation structure layer 300, the second isolation layer 302 located around the functional opening 300b in the non-display area NA is unlikely to block the organic material, allowing the new material to be effectively deposited near the first isolation layer 301 around the functional opening 300b. Furthermore, when a new material is formed on the isolation structure layer 300, the second isolation layer 302 is unlikely to significantly block the exhaust of gas. When the organic material is formed on the isolation structure layer 300, gas around the functional opening 300b can be effectively discharged outward along the sidewalls of the first isolation layer 301, thereby effectively improving the structural stability of the display panel 10 and, therefore, the process reliability of the display panel 10.

[0257] Optionally, the structure of a display panel 10 provided in the embodiment of the first aspect of the present application can be configured with reference to any of the aforementioned embodiments. Therefore, the display panel 10 provided in the embodiment of the present application can have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and this application will not further elaborate on this. For example, the substrate 100 can be the substrate 100 in any of the aforementioned embodiments. For example, the light-emitting device 400 can be the light-emitting device 400 in any of the aforementioned embodiments.

[0258] In some optional embodiments, at the hollow structure 302b, the second isolation layer 302 may extend less than zero relative to the first isolation layer 301 on the side toward the functional opening 300b. For example, at the hollow structure 302b surrounding the functional opening 300b, at least a portion of the second isolation layer 302 may be retracted into the first isolation layer 301 in a direction away from the functional opening 300b.

[0259] Optionally, when the second isolation layer 302 around the functional opening 300b forms a hollow structure 302b on the side of the first isolation layer 301 facing away from the substrate 100 , part of the functional opening 300b at the hollow structure 302b may be enclosed only by the first isolation layer 301 .

[0260] Please refer to Figures 1 to 15 and Figure 16. In some optional embodiments, the isolation structure layer 300 includes an isolation structure 310 at least partially located in the display area AA and an edge structure 320 located in the non-display area NA. The first type of opening 300a includes an isolation opening 310a formed by the isolation structure 310, and the edge structure 320 encloses a functional opening 300b. The isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312 located on the side of the first isolation portion 311 away from the substrate 100. The second isolation portion 312 extends from the first isolation portion 311 toward the isolation opening 310a.

[0261] Optionally, the light emitting device 400 may be at least partially located within the isolation opening 310a, and the isolation opening 310a may communicate with the pixel opening 220. Optionally, the first isolation portion 311 may be used to participate in forming the first isolation layer 301, and the second isolation portion 312 may be used to participate in forming the second isolation layer 302.

[0262] Optionally, the isolation structure 310 may be the isolation structure 310 in any of the aforementioned embodiments. For example, the isolation structure 310 may be used to isolate the materials of the light-emitting layer 420 and the second electrode layer 430 during the preparation of the light-emitting layer 420 and the second electrode layer 430 to achieve sub-pixel division. The second isolation portion 312 may extend from the first isolation portion 311 toward the first-type opening 300a. That is, the extension length of the second isolation portion 312 relative to the first isolation portion 311 toward the first-type opening 300a may be greater than zero. This allows for direct full-surface vapor deposition of at least a portion of the material of the light-emitting device 400 during the preparation of the light-emitting device 400 of the display panel 10. The second isolation portion 312 can shield at least a portion of the material used to prepare the light-emitting device 400, thereby isolating the material of the light-emitting device 400 between adjacent sub-pixels, thereby facilitating the formation of multiple light-emitting devices 400 spaced apart and located within the isolation opening 310a. This eliminates the need for a highly precise mask when preparing the light-emitting device 400 of the display panel 10.

[0263] In some optional embodiments, the edge structure 320 includes a first edge portion 320a, and the second isolation layer 302 has a hollow structure 302b on the side of the first edge portion 320a facing away from the substrate 100. The hollow structure 302b is connected to the functional opening 300b and is arranged around at least a portion of the functional opening 300b.

[0264] Optionally, at the hollow structure 302 b , a protruding length of the second isolation layer 302 relative to the first edge portion 320 a toward the functional opening 300 b is less than zero.

[0265] Optionally, as shown in Figure 16, the edge structure 320 may include a first edge portion 320a and a second edge portion 320b, but the second edge portion 320b may be retracted into the first edge portion 320a toward the side away from the functional opening 300b. Therefore, the second isolation layer 302 is provided with a hollow structure 302b on the side of the first edge portion 320a facing away from the substrate 100, which may mean that the second edge portion 320b of the second isolation layer 302 may only partially cover and be arranged above the first edge portion 320a.

[0266] FIG17 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0267] Or optionally, as shown in Figure 17, the edge structure 320 may only include a first edge portion 320a, and the second isolation layer 302 may have a hollow structure 302b on the side of the first edge portion 320a facing away from the substrate 100, which may mean that the second isolation layer 302 may not cover the first edge portion 320a.

[0268] In these optional embodiments, by arranging a second isolation layer 302 with a hollow structure 302b on the side of the first edge portion 320a facing away from the substrate 100, the blocking effect of the second isolation layer 302 on the gas discharge around the functional opening 300b can be effectively reduced, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side wall of the first edge portion 320a, thereby effectively improving the structural stability of the display panel 10 and further improving the process reliability of the display panel 10.

[0269] FIG18 is a partially enlarged schematic diagram of an orthographic projection of an isolation structure layer 300 on a substrate 100 provided in another embodiment of the present application.

[0270] Please refer to Figures 1 to 15 and Figure 18. In some optional embodiments, the functional opening 300b includes a first air guide groove 300ba arranged in the edge area, and the first air guide groove 300ba is arranged to penetrate the edge structure 320 in the thickness direction Z of the display panel 10.

[0271] Optionally, the edge region of the functional opening 300b may refer to the edge region of the functional opening 300b close to the edge structure 320. Optionally, the first groove 300ba may be formed by inward depression of a portion of the surface of the edge structure 320 facing the functional opening 300b.

[0272] In these optional embodiments, by setting the first groove 300ba, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, the first groove 300ba extending toward the edge structure 320 can improve the exhaust path when the new material is formed, so that when the new material is coated along a certain direction on the isolation structure layer 300, under the extrusion force of the coating material, the gas between the new material and the edge structure 320 and the gas between the new material and the substrate 100 can be guided by the edge structure 320 on the side of the first groove 300ba and discharged outward from the edge of the edge structure 320 on the side of the first groove 300ba in a direction away from the display area AA, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0273] As shown in FIG. 18 , in some optional embodiments, the hollow structure 302 b is in communication with the first air guide groove 300 ba and is disposed around at least a portion of the first air guide groove 300 ba .

[0274] Optionally, at the hollow structure 302 b , a protruding length of the second isolation layer 302 relative to the first edge portion 320 a toward the first groove 300 ba is less than zero.

[0275] In these optional embodiments, by connecting the hollow structure 302b with the first groove 300ba of the gas guide groove and arranging it around at least part of the first groove 300ba of the gas guide groove, the blocking effect of the second isolation layer 302 on the gas discharge on the periphery of the first groove 300ba can be better reduced, so that when the organic material is formed on the isolation structure layer 300, the gas on the periphery of the first groove 300ba can also be better discharged outward from the side wall of the first edge portion 320a along the thickness direction Z of the display panel 10, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0276] In some optional embodiments, the non-display area NA includes a first area NA1 adjacent to the display area AA and a second area NA2 located on the side of the first area NA1 away from the display area AA, the edge structure 320 is located in the first area NA1, the edge structure 320 includes a main structure 321 connected to the isolation structure 310 and a plurality of protruding structures 322 extending toward the second area NA2 relative to the main structure 321, and the first groove 300ba is located between adjacent protruding structures 322.

[0277] In this optional embodiment, during the preparation of the display panel 10, when a new material is formed on the isolation structure layer 300, the protruding structure 322 protruding relative to the main structure 321 can improve the exhaust path when the material is formed, so that when the material is coated along a certain direction on the isolation structure layer 300, under the extrusion force of the coating material, the gas between the new material and the edge structure 320 and the gas between the new material and the substrate 100 can be guided by the protruding structure 322 and discharged outward from the edge of the protruding structure 322 in the direction pointing to the second area NA2, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0278] Optionally, the protruding structure 322 includes a first protruding portion 322a, and the main body structure 321 includes a first main body portion 321a.

[0279] Optionally, the first raised portion 322a can be used to form the first edge portion 320a. Alternatively, the first raised portion 322a can be provided in the same layer and material as the first isolation portion 311, so that the raised structure 322 can be manufactured using the same or similar manufacturing process and equipment as the isolation structure 310. Alternatively, the first raised portion 322a of the raised structure 322 can be integrally formed with the first main portion 321a of the main structure 321.

[0280] Optionally, the first main portion 321a can be used to form the first edge portion 320a. Optionally, the first main portion 321a can be provided in the same layer and material as the first isolation portion 311, so that the main structure 321 can be produced using the same or similar production process and equipment as the isolation structure 310. Optionally, the first main portion 321a of the main structure 321 can be integrally formed with the first isolation portion 311.

[0281] FIG19 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0282] As shown in FIG. 19 , in some optional embodiments, the second isolation layer 302 is provided with a hollow structure 302 b on a side of the first protrusion 322 a facing away from the substrate 100 .

[0283] Optionally, at the hollow structure 302 b , a protruding length of the second isolation layer 302 relative to the first protrusion 322 a toward the functional opening 300 b is less than zero.

[0284] Optionally, as shown in Figure 19, the raised structure 322 may include a first raised portion 322a and a second raised portion 322b, but the second raised portion 322b may be retracted into the first raised portion 322a toward the side away from the functional opening 300b. Therefore, the second isolation layer 302 is provided with a hollow structure 302b on the side of the first raised portion 322a facing away from the substrate 100, which may mean that the second raised portion 322b of the second isolation layer 302 may only partially cover and be arranged above the first raised portion 322a.

[0285] FIG20 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0286] Or optionally, as shown in Figure 20, the protruding structure 322 may only include a first protruding portion 322a, and the second isolation layer 302 may be provided with a hollow structure 302b on the side of the first protruding portion 322a facing away from the substrate 100, which may mean that the second isolation layer 302 may not cover the first protruding portion 322a.

[0287] In these optional embodiments, by arranging a second isolation layer 302 with a hollow structure 302b on the side of the first protrusion 322a facing away from the substrate 100, the blocking effect of the second isolation layer 302 on the gas discharge around the functional opening 300b can be effectively reduced, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side wall of the first protrusion 322a, thereby effectively improving the structural stability of the display panel 10 and further improving the process reliability of the display panel 10.

[0288] FIG21 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0289] In some optional embodiments, the second isolation layer 302 has a hollow structure 302 b on a side of the first main portion 321 a facing away from the substrate 100 .

[0290] Optionally, at the hollow structure 302 b , a protruding length of the second isolation layer 302 relative to the first main body portion 321 a toward the functional opening 300 b is less than zero.

[0291] Optionally, as shown in Figure 21, the main structure 321 may include a first main body portion 321a and a second main body portion 321b, but the second main body portion 321b may be retracted into the first main body portion 321a toward the side away from the functional opening 300b. Therefore, the second isolation layer 302 is provided with a hollow structure 302b on the side of the first main body portion 321a away from the substrate 100, which may mean that the second main body portion 321b of the second isolation layer 302 may only partially cover and be arranged above the first main body portion 321a.

[0292] FIG22 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0293] Or optionally, as shown in Figure 20, the main structure 321 may only include a first main body portion 321a, and the second isolation layer 302 may have a hollow structure 302b on the side of the first main body portion 321a facing away from the substrate 100, which may mean that the second isolation layer 302 may not cover the first main body portion 321a.

[0294] In these optional embodiments, by providing a second isolation layer 302 with a hollow structure 302b on the side of the first main body 321a facing away from the substrate 100, the blocking effect of the second isolation layer 302 on the gas discharge around the functional opening 300b can be effectively reduced, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side wall of the first main body 321a, thereby effectively improving the structural stability of the display panel 10 and further improving the process reliability of the display panel 10.

[0295] FIG23 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application.

[0296] 1 to 15 and refer to FIG. 23 , in some optional embodiments, the isolation structure layer 300 further includes an auxiliary structure 330 located in the functional opening 300 b and spaced apart from the edge structure 320 .

[0297] Optionally, the auxiliary structure 330 may be provided in the second area NA2.

[0298] Optionally, the second area NA2 includes a first sub-area NA21 and a second sub-area NA22 located on the side of the first sub-area NA21 away from the first area NA1, and the auxiliary structure 330 includes a plurality of first auxiliary structures 331 located in the first sub-area NA21, and the plurality of first auxiliary structures 331 are arranged at intervals and around the periphery of the second sub-area NA22.

[0299] In these optional embodiments, an auxiliary structure 330 spaced from the edge structure 320 is provided in the functional opening 300b, so that when the isolation structure layer 300 is etched, the etching material in the functional opening 300b of the second area NA2 can also etch the material of the auxiliary structure 330, so that the auxiliary structure 330 can limit the etching material in the functional opening 300b from being transferred toward the edge structure 320, thereby effectively reducing the amount of etching of the edge structure 320 by the etching material, making the edge structure 320 less likely to be damaged by excessive etching, and effectively improving the structural stability of the display panel 10. Moreover, while reducing the amount of etching material on the material of the edge structure 320, the auxiliary structure 330 can also facilitate the realization of the morphology of the edge structure 320 in the aforementioned embodiment, that is, the setting of the auxiliary structure 330 can reduce the amount of etching material on the material of the edge structure 320, so as to facilitate the formation of a morphological structure in which the extension length of at least part of the second protrusion 322b relative to the first protrusion 322a toward the functional opening 300b is less than the extension length of the second isolation part 312 relative to the first isolation part 311 of the isolation structure 310 toward the isolation opening 310a, and can facilitate the formation of a morphological structure in which the extension length of at least part of the second main body part 321b relative to the first main body part 321a toward the first groove 300ba is less than the extension length of the second isolation part 312 relative to the first isolation part 311 of the isolation structure 310 toward the isolation opening 310a.

[0300] In addition, by setting the spacing between adjacent auxiliary structures 330, during the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, for example, when the material is coated along a certain direction on the isolation structure layer 300, the gas between the new material and the auxiliary structure 330 or the gas between the new material and the substrate 100 can be discharged outward from the edge of the auxiliary structure 330 under the guidance of the spacing between adjacent auxiliary structures 330, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0301] In some optional embodiments, the first auxiliary structure 331 includes a first auxiliary portion 331 a , and the second isolation layer 302 is provided with a hollow structure 302 b on a side of the first auxiliary portion 331 a facing away from the substrate 100 .

[0302] Optionally, as shown in Figure 23, the auxiliary structure 330 may only include a first auxiliary part 331a, and the second isolation layer 302 may be provided with a hollow structure 302b on the side of the first auxiliary part 331a facing away from the substrate 100, which may mean that the second isolation layer 302 may not cover the first auxiliary part 331a.

[0303] In these optional embodiments, by arranging a second isolation layer 302 with a hollow structure 302b on the side of the first auxiliary portion 331a facing away from the substrate 100, the blocking effect of the second isolation layer 302 on the gas discharge around the functional opening 300b can be effectively reduced, so that when the organic material is formed on the isolation structure layer 300, the gas around the functional opening 300b can be better discharged outward along the side wall of the first auxiliary portion 331a, thereby effectively improving the structural stability of the display panel 10 and further improving the process reliability of the display panel 10.

[0304] 1 to 23 , an embodiment of the first aspect of the present application further provides a display panel 10, the display panel 10 having a display area AA and a non-display area NA, the display panel 10 comprising: a substrate 100; a pixel definition layer 200, disposed on one side of the substrate 100, the pixel definition layer 200 comprising a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210; an isolation structure layer 300, disposed on one side of the substrate 100, the isolation structure layer 300 comprising an isolation structure 310 at least partially located in the display area AA and an edge structure 320 connected to the isolation structure 310 and located in the non-display area NA, the isolation structure 310 enclosing a plurality of pixel openings 220; An isolation opening 310a is formed to communicate with the pixel opening 220, the edge structure 320 includes a main structure 321 connected to the isolation structure 310 and a plurality of protruding structures 322 extending relative to the main structure 321 and away from the display area AA. The edge structure 320 encloses a functional opening 300b, and the edge area of ​​the functional opening 300b has a first groove 300ba extending toward one side of the edge structure 320. The first groove 300ba penetrates the edge structure 320 in the thickness direction Z of the display panel 10 and is located between adjacent protruding structures 322; a plurality of light-emitting devices 400, at least part of which is arranged in the isolation opening 310a.

[0305] In an embodiment of the present application, a display panel 10 is provided. The display panel 10 has a display area AA and a non-display area NA. The display panel 10 includes a substrate 100, a pixel definition layer 200, an isolation structure layer 300, and a plurality of light-emitting devices 400. The pixel definition layer 200 includes a pixel defining portion 210 and a plurality of pixel openings 220 enclosed by the pixel defining portion 210. The isolation structure layer 300 is disposed on a side of the pixel definition layer 200 away from the substrate 100. The isolation structure layer 300 includes an isolation structure 310 at least partially located in the display area AA and an edge structure 320 connected to the isolation structure 310 and located in the non-display area NA. The isolation structure 310 encloses an isolation opening 310a that communicates with the pixel opening 220. Both the isolation structure 310 and the pixel definition layer 200 can be used to divide sub-pixels of the display panel 10. The light-emitting devices 400 are at least partially disposed within the isolation opening 310a. The light-emitting devices 400 within the isolation opening 310a can be used to achieve light-emitting display in the display area AA of the display panel 10.

[0306] The edge structure 320 encloses to form a functional opening 300b, which can help improve the transmittance of the non-display area NA, so that when the display panel 10 is applied to a display device, the photosensitive component for sensing light in the display device can be correspondingly arranged under the functional opening, and the photosensitive component can better sense light through the functional opening.

[0307] The edge structure 320 includes a main structure 321 connected to the isolation structure 310 and a plurality of protruding structures 322 extending toward the second area NA2 relative to the main structure 321. The edge area of ​​the functional opening 300b has a first groove 300ba extending toward one side of the edge structure 320. The first groove 300ba is arranged to penetrate the edge structure 320 in the thickness direction Z of the display panel 10 and is located between adjacent protruding structures 322. During the preparation process of the display panel 10, when a new material is formed on the isolation structure layer 300, the first groove 300ba extending toward the edge structure 320 can improve the exhaust path when the new material is formed, so that when the new material is coated along a certain direction on the isolation structure layer 300, under the extrusion force of the coating material, the gas between the new material and the edge structure 320 and the gas between the new material and the substrate 100 can be guided by the protruding structure 322 on the side of the first groove 300ba and discharged outward from the edge of the protruding structure 322 on the side of the first groove 300ba in a direction away from the display area AA, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0308] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 described in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0309] For example, the substrate 100 may be the substrate 100 in any of the aforementioned embodiments. For example, the light-emitting device 400 may be the light-emitting device 400 in any of the aforementioned embodiments. For example, the isolation structure layer 300 may be the isolation structure layer 300 in any of the aforementioned embodiments, and the isolation structure layer 300 may include the isolation structure 310, the edge structure 320, and the auxiliary structure 330 in any of the aforementioned embodiments.

[0310] Figure 24 is a structural schematic diagram of a display panel 10 provided in another embodiment of the present application, Figure 25 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application, Figure 26 is a partial schematic diagram of a display panel 10 provided in another embodiment of the present application, and Figure 27 is a partial enlarged schematic diagram of the positive projection of an isolation structure 310 and a first auxiliary structure 331 on a substrate 100 provided in an embodiment of the present application.

[0311] Please refer to the drawings in the aforementioned embodiments and Figures 24 to 27. The embodiment of the first aspect of the present application also provides a display panel 10 having adjacent first specific areas TA and second areas NA2, and the display panel 10 includes: a substrate 100; an isolation structure 310, arranged on one side of the substrate 100 and located in the first specific area TA, the isolation structure 310 encloses an isolation opening 310a; a plurality of first auxiliary structures 331, located in the second area NA2 and arranged on the side of the substrate 100 facing the isolation structure 310, the first auxiliary structures 331 are spaced apart from the isolation structure 310, and adjacent first auxiliary structures 331 are spaced apart; a light-emitting layer 420, including a light-emitting unit 421 arranged in the isolation opening 310a.

[0312] In a display panel 10 provided in an embodiment of the present application, the display panel 10 has a first specific area TA and a second area NA2 adjacent to each other. The display panel 10 includes a substrate 100, an isolation structure 310, a first auxiliary structure 331, and a light-emitting layer 420. The isolation structure 310 is disposed on one side of the substrate 100 and located in the first specific area TA. The isolation structure 310 encloses an isolation opening 310a, which can be used to divide the sub-pixels of the display panel 10. The light-emitting layer 420 includes a light-emitting unit 421 disposed within the isolation opening 310a, enabling the display panel 10 in the first specific area TA to be used for light-emitting display.

[0313] By setting the first auxiliary structure 331 in the second area NA2, when the isolation structure 310 is etched, the etching material located in the second area NA2 can also etch the material of the first auxiliary structure 331, so that the first auxiliary structure 331 can limit the etching material in the second area NA2 from being transferred toward the isolation structure 310, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material, making the isolation structure 310 less likely to be damaged by excessive etching, and effectively improving the structural stability of the display panel 10. Moreover, by setting intervals between adjacent first auxiliary structures 331, during the preparation process of the display panel 10, when a new material is formed on the first auxiliary structure 331, for example, when the material is coated on the first auxiliary structure 331 along a certain direction, the gas between the material and the first auxiliary structure 331 or the gas between the material and the substrate 100 can be discharged outward from the edge of the first auxiliary structure 331 under the guidance of the intervals between adjacent first auxiliary structures 331, thereby better improving the structural stability of the display panel 10 and further better improving the process reliability of the display panel 10.

[0314] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 described in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0315] Optionally, the first specific area TA may include the display area AA and the first area NA1 in the non-display area NA described in any of the aforementioned embodiments.

[0316] In some embodiments of the present application, at least a portion of the first specific area TA of the display panel 10 can serve as the display area of ​​the display panel 10, that is, at least a portion of the first specific area TA of the display panel 10 can perform luminous display. The second area NA2 of the display panel 10 can serve as the non-display area of ​​the display panel 10. For example, the second area NA2 of the display panel 10 can serve as the functional area of ​​the display panel 10. The transmittance of the second area NA2 can be greater than the transmittance of the first specific area TA. When the display panel 10 is applied to a display device, the photosensitive component for sensing light in the display device can be correspondingly arranged under the second area NA2. The photosensitive component can better sense light through the second area NA2. The photosensitive component can include at least one of: a distance sensor, a camera, an under-screen fingerprint recognition module, an infrared light-emitting diode, a proximity sensor, and other components capable of sensing light. For another example, the second area NA2 can serve as the border area of ​​the display panel 10.

[0317] For ease of description, the following embodiments are described using the second area NA2 as an example of a functional area of ​​the display panel 10. Optionally, the display panel 10 has a functional hole H in the second area NA2 so that when a photosensitive component is disposed in the second area NA2, the photosensitive component can better sense light through the functional hole H.

[0318] Optionally, the isolation structure 310 may be disposed around at least a portion of the second area NA2 , so that the isolation structure 310 is less likely to affect the light transmittance of the second area NA2 .

[0319] Optionally, there are multiple first auxiliary structures 331, and the multiple first auxiliary structures 331 are spaced apart from each other and arranged around at least part of the second area NA2. For example, the multiple first auxiliary structures 331 are arranged around at least part of the functional hole H, so that the first auxiliary structures 331 can be better distributed on the side of the isolation structure 310 facing the second area NA2, so as to better limit the etching material with a higher concentration in the second area NA2 from flowing toward the isolation structure 310, thereby better reducing the amount of etching of the isolation structure 310 by the etching material, so that the isolation structure 310 is not easily damaged by over-etching.

[0320] In some embodiments of the present application, the isolation structure 310 can be used to isolate the material of the light-emitting layer 420 when preparing the light-emitting layer 420 to achieve sub-pixel division, wherein there are many ways to set the shape of the isolation structure 310, and the shape of the isolation structure 310 can be any shape that can block and isolate the material of the light-emitting layer 420 in adjacent isolation openings 310a.

[0321] In some optional embodiments, the isolation structure 310 may include a first isolation portion 311 and a second isolation portion 312 located on a side of the first isolation portion 311 facing away from the substrate 100 , and the second isolation portion 312 protrudes from the first isolation portion 311 toward the isolation opening 310 a .

[0322] By arranging the second isolation portion 312 to protrude from the first isolation portion 311 toward the isolation opening 310a, the second isolation portion 312 can block at least a portion of the material used to prepare the light-emitting layer 420 when vapor-depositing the light-emitting layer 420 of the display panel 10, so as to separate the light-emitting layer 420 between adjacent sub-pixels, and can facilitate the formation of a plurality of spaced-apart light-emitting units 421, thereby eliminating the need to set a mask with high precision when vapor-depositing the light-emitting layer 420 of the display panel 10. For example, there is no need to set a high-precision metal mask when vapor-depositing the light-emitting layer 420, thereby effectively reducing the production cost of the display panel 10.

[0323] Optionally, the second isolation portion 312 may also be provided to protrude from the first isolation portion 311 toward the second area NA2. For example, the second isolation portion 312 on the isolation structure 310 between adjacent protruding structures 322 may also be provided to protrude from the first isolation portion 311 toward the second area NA2.

[0324] In some optional embodiments, the shape of the first auxiliary structure 331 may be similar to the shape of the isolation structure 310. For example, the first auxiliary structure 331 includes a first auxiliary portion 331a and a second auxiliary portion 331b located on a side of the first auxiliary portion 331a facing away from the substrate 100. The second auxiliary portion 331b is provided to protrude from the first auxiliary portion 331a. For example, the orthographic projection of the first auxiliary portion 331a on the substrate 100 is located within the orthographic projection of the second auxiliary portion 331b on the substrate 100. When the etching material is used to etch the material of the isolation structure 310, the etching material may also etch the first auxiliary structure 331. This can reduce the amount of etching of the isolation structure 310 by the etching material while also etching the first auxiliary structure 331 into a shape in which the second auxiliary portion 331b protrudes from the first auxiliary portion 331a.

[0325] Optionally, the first auxiliary portion 331a can be set in the same layer and material as the first isolation portion 311, and / or the second auxiliary portion 331b can be set in the same layer and material as the second isolation portion 312, so that the first auxiliary structure 331 can be prepared in the same preparation process as the isolation structure 310 to improve the preparation efficiency of the display panel 10.

[0326] Figure 28 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application, Figure 29 is a partial schematic diagram of a display panel 10 provided in another embodiment of the present application, and Figure 30 is a partial enlarged schematic diagram of the positive projection of an isolation structure 310, a protruding structure 322 and a first auxiliary structure 331 on the substrate 100 provided in an embodiment of the present application.

[0327] As shown in Figures 28 to 30, in some optional embodiments, the display panel 10 further includes a protruding structure 322, which is connected to the isolation structure 310 and is arranged on the side of the isolation structure 310 facing the second area NA2, and the first auxiliary structure 331 is spaced apart from the protruding structure 322.

[0328] Optionally, the protruding structure 322 may also be provided in the first specific area TA.

[0329] In these optional embodiments, by connecting the protruding structure 322 to the isolation structure 310 and arranging it on the side of the isolation structure 310 facing the second area NA2, that is, by arranging the protruding structure 322 protruding toward the second area NA2 on the edge portion of the isolation structure 310, when the isolation structure 310 is etched, the etching material can also etch the material of the protruding structure 322, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material, making it less likely that the isolation structure 310 will be damaged by excessive etching, and effectively improving the structural stability of the display panel 10.

[0330] Moreover, during the preparation process of the display panel 10, when a new material is formed on the isolation structure 310, for example, when an organic material is formed on the isolation structure 310, the protruding structure 322 protruding relative to the isolation structure 310 can enhance the exhaust path when the material is formed, so that when the material is coated on the isolation structure 310 along a certain direction, under the extrusion force of the coating material, the gas between the material and the edge of the isolation structure 310 toward the second area NA2, between the material and the protruding structure 322, and / or between the material and the substrate 100 can be discharged outward from the edge of the protruding structure 322 under the guidance of the protruding structure 322, thereby better improving the structural stability of the display panel 10.

[0331] In some optional embodiments, the raised structure 322 may include a first raised portion 322a, which is integrally formed with the first isolation portion 311, and / or the raised structure 322 may include a second raised portion 322b, which is integrally formed with the second isolation portion 312, so that at least a portion of the raised structure 322 can be prepared in the same preparation process as the isolation structure 310 to improve the preparation efficiency of the display panel 10.

[0332] Optionally, the shape of the raised structure 322 may be similar to the shape of the isolation structure 310. For example, the raised structure 322 may include a first raised portion 322a and a second raised portion 322b, wherein the second raised portion 322b may be arranged to protrude from the first raised portion 322a toward the second area NA2. When the etching material is used to etch the material of the isolation structure 310, the etching material may also etch the raised structure 322. This can reduce the amount of etching of the isolation structure 310 by the etching material while also etching the second raised portion 322b in the raised structure 322 to protrude from the first raised portion 322a toward the second area NA2.

[0333] As shown in Figures 29 and 30, in these optional embodiments, a protruding structure 322 protruding toward the second area NA2 is provided on the edge portion of the isolation structure 310, so that when the material of the isolation structure 310 is etched to form the first isolation portion 311 and the second isolation portion 312, the etching material located at the edge portion of the isolation structure 310 facing the second area NA2 can also etch the material of the protruding structure 322, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material, making it less likely that the isolation structure 310 is damaged by excessive etching, and effectively improving the structural stability of the display panel 10.

[0334] Optionally, the orthographic projection area of ​​the first auxiliary structure 331 on the substrate 100 may be larger than the orthographic projection area of ​​the protrusion structure 322 on the substrate 100 , so that the first auxiliary portion 331 a of the first auxiliary structure 331 is not easily etched away.

[0335] In some optional embodiments, there are multiple protrusion structures 322, and the multiple protrusion structures 322 are spaced apart from each other and arranged around at least a portion of the second area NA2. For example, the multiple protrusion structures 322 are spaced apart from each other and arranged around at least a portion of the functional hole H.

[0336] Optionally, the protrusion structure 322 may extend from the isolation structure 310 toward the second area NA2 . For example, the protrusion structure 322 may extend from the isolation structure 310 toward the functional hole H.

[0337] In these optional embodiments, by spacing the plurality of raised structures 322 apart and surrounding at least a portion of the second area NA2, when a material is coated on the isolation structure 310 along a certain direction, gas between the material and the isolation structure 310, or gas between the material and the isolation structure 310, can be discharged outward from the edges of the raised structures 322 under the guidance of the spacing between adjacent raised structures 322, thereby effectively improving the structural stability of the display panel 10. Furthermore, the raised structures 322 surrounding at least a portion of the second area NA2 can further reduce the amount of etching material on the isolation structure 310, making the isolation structure 310 less susceptible to damage due to over-etching, thereby effectively improving the structural stability of the display panel 10.

[0338] In some embodiments of the present application, there are various ways to set the shape of the protruding structure 322 . The shape of the protruding structure 322 can be set to facilitate the discharge of gas when forming a material above the protruding structure 322 .

[0339] As shown in Figures 29 and 30, in some optional embodiments, the orthographic projection of the protrusion structure 322 on the substrate 100 may have a first edge B1 and a second edge B2, and the first edge B1 and the second edge B2 may be arranged to intersect, for example, the first edge B1 and the second edge B2 may be arranged perpendicular to each other.

[0340] In this optional embodiment, the first edge B1 and the second edge B2 are arranged to intersect, so that when material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, for example, when material is coated above the isolation structure 310 and the protruding structure 322 along any of the first direction X, the second direction Y, the circumferential direction of the functional hole H, or the radial direction of the functional hole H, if one of the first edge B1 and the second edge B2 cannot better conform to the coating direction of the material, then the other of the first edge B1 and the second edge B2 can better conform to the coating direction of the material. For example, when one of the first edge B1 and the second edge B2 is perpendicular to the coating direction of the material, the angle between the other of the first edge B1 and the second edge B2 and the coating direction of the material may be less than 90 degrees, so that when the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, under the extrusion force of the coating material, the gas between the material and the edge of the isolation structure 310 toward the second area NA2 and / or the gas between the material and the protruding structure 322 can be better discharged outward under the guidance of at least one of the first edge B1 and the second edge B2, thereby better improving the structural stability of the display panel 10.

[0341] Optionally, the first edge B1 and the second edge B2 intersect, which may mean that the first edge B1 and the second edge B2 can be straight edges that intersect, thereby enhancing the gas-guiding effect of the edge portion of the protruding structure 322 and facilitating gas discharge. Optionally, a curved edge (not shown) can be connected between the first edge B1 and the second edge B2 for transition.

[0342] In some optional embodiments, the orthographic projection of the protrusion structure 322 on the substrate 100 may be approximately polygonal. For example, the orthographic projection of the protrusion structure 322 on the substrate 100 may be approximately rectangular or triangular. Compared to other shapes, a protrusion structure 322 having an orthographic projection of a rectangle may have a better extension dimension, thereby facilitating gas discharge. For ease of description, the following embodiments will be described using the example of a protrusion structure 322 having an orthographic projection of a rectangle on the substrate 100.

[0343] Optionally, the first edge B1 may be located on a side of the second edge B2 away from the isolation structure 310 , and the second edge B2 may be located on both sides of the first edge B1 .

[0344] In some optional embodiments, the isolation structure 310 has a third edge B3 on a side of its orthographic projection on the substrate 100 facing the second area NA2 , and the second edge B2 intersects the third edge B3 .

[0345] Optionally, the second edge B2 may be connected between the first edge B1 and the third edge B3, and the second edge B2 is perpendicular to the third edge B3.

[0346] Optionally, the second edge B2 intersects the third edge B3, which may mean that the second edge B2 and the third edge B3 may be straight edges and intersect. Optionally, an arc edge (not shown in the figure) may be connected between the third edge B3 and the second edge B2 for transition.

[0347] In these optional embodiments, by setting the second edge B2 to intersect the third edge B3, when the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, and the third edge B3 cannot conform to the coating direction of the material, the second edge B2 can conform to the coating direction of the material. For example, when the third edge B3 is perpendicular to the coating direction of the material, the angle between the second edge B2 intersecting with the third edge B3 and the coating direction of the material can be less than 90 degrees. When the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, under the squeezing force of the coating material, the gas between the material and the edge of the isolation structure 310 facing the second area NA2 and / or the gas between the material and the protruding structure 322 can be better discharged outward under the guidance of the second edge B2, thereby better improving the structural stability of the display panel 10.

[0348] In some embodiments of the present application, there are various ways to set the shape of the first auxiliary structure 331 . The shape of the first auxiliary structure 331 can be set to facilitate the discharge of gas when forming material above the first auxiliary structure 331 .

[0349] In some optional embodiments, the orthographic projection of the first auxiliary structure 331 on the substrate 100 has a fourth edge B4 and a fifth edge B5, and the fourth edge B4 and the fifth edge B5 may be arranged to intersect, for example, the fourth edge B4 and the fifth edge B5 may be arranged perpendicular to each other.

[0350] In this optional embodiment, by intersecting the fourth edge B4 and the fifth edge B5, when material is applied in a certain direction over the first auxiliary structure 331, for example, when material is applied in any of the first direction X, the second direction Y, the circumferential direction of the functional hole H, or the radial direction of the functional hole H over the first auxiliary structure 331, if one of the fourth edge B4 and the fifth edge B5 does not conform to the material application direction, the other of the fourth edge B4 and the fifth edge B5 can conform to the material application direction. For example, when one of the fourth edge B4 and the fifth edge B5 is perpendicular to the material application direction, the angle between the fourth edge B4 and the fifth edge B5 and the material application direction can be less than 90 degrees. This allows the material to be applied in a certain direction over the first auxiliary structure 331. Under the compressive force of the applied material, gas between the material and the auxiliary structure can be effectively discharged outwardly under the guidance of at least one of the fourth edge B4 and the fifth edge B5, thereby effectively improving the structural stability of the display panel 10.

[0351] Optionally, the fourth edge B4 and the fifth edge B5 intersect, which may mean that the fourth edge B4 and the fifth edge B5 can be straight edges that intersect, thereby enhancing the gas-guiding effect of the edge portion of the first auxiliary structure 331 and facilitating gas discharge. Optionally, a curved edge (not shown) can be connected between the fourth edge B4 and the fifth edge B5 for transition.

[0352] In some optional embodiments, the orthographic projection of the first auxiliary structure 331 on the substrate 100 may approximate a polygon. For example, the orthographic projection of the first auxiliary structure 331 on the substrate 100 may approximate a rectangle or triangle. Compared to other shapes, the first auxiliary structure 331 with an orthographic projection approximates a rectangle and has a better extension dimension, which facilitates gas discharge. For ease of description, the following embodiments are described using the example of the first auxiliary structure 331 with an orthographic projection approximates a rectangle on the substrate 100.

[0353] Optionally, the first auxiliary structure 331 may extend in a direction from the isolation structure 310 to the second area NA2 . For example, the first auxiliary structure 331 may extend in a direction from the isolation structure 310 to the functional hole H to facilitate gas discharge.

[0354] Alternatively, the fifth edge B5 may intersect with the third edge B3. Alternatively, the number of the fourth edge B4 and the fifth edge B5 may be two, the two fourth edges B4 may be spaced apart in a direction from the isolation structure 310 toward the second area NA2, and the fifth edge B5 may be disposed on both sides of the fourth edge B4.

[0355] In some optional embodiments, the first auxiliary structure 331 may be disposed close to the isolation structure 310. Optionally, when the display panel 10 does not include the protruding structure 322, the minimum distance between the first auxiliary structure 331 and the isolation structure 310 may be less than or equal to 20 microns. For example, the minimum distance between the first auxiliary structure 331 and the isolation structure 310 may be less than or equal to 20 microns and greater than or equal to 3 microns, so that the first auxiliary structure 331 can effectively limit the transfer of the etching material in the second area NA2 toward the isolation structure 310, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material.

[0356] Optionally, when the display panel 10 includes a protruding structure 322, the minimum spacing between the first auxiliary structure 331 and the protruding structure 322 may be less than or equal to 20 microns. For example, the minimum spacing between the first auxiliary structure 331 and the protruding structure 322 may be less than or equal to 20 microns and greater than or equal to 3 microns, so that the first auxiliary structure 331 can better limit the transfer of the etching material in the second area NA2 toward the isolation structure 310 and the protruding structure 322, thereby better reducing the amount of etching of the isolation structure 310 and the protruding structure 322 by the etching material.

[0357] As shown in Figures 25 and 28, in some optional embodiments, the display panel 10 also includes a pixel definition layer 200, the pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 formed by the pixel defining portion 210, the pixel defining portion 210 is arranged around at least a portion of the first electrode 411, and the orthographic projection of the pixel opening 220 on the substrate 100 is located within the orthographic projection of the isolation opening 310a on the substrate 100.

[0358] In this optional embodiment, the first electrode 411 and the isolation structure 310 can be insulated by the pixel defining portion 210, so that the second electrode 431 is not easily short-circuited with the first electrode 411 through the isolation structure 310, thereby improving the working stability of the display panel 10.

[0359] In some embodiments of the present application, the relative positions of the pixel defining portion 210 and the isolation structure 310, the pixel defining portion 210 and the protrusion structure 322, and the pixel defining portion 210 and the first auxiliary structure 331 can be arranged in various ways. For example, as shown in FIG28 and FIG25 , the isolation structure 310, the protrusion structure 322, and the first auxiliary structure 331 can be arranged on the side of the pixel defining portion 210 facing away from the substrate 100, that is, the isolation structure 310, the protrusion structure 322, and the first auxiliary structure 331 can be directly arranged on the pixel defining portion 210. Alternatively, for example, the pixel defining portion 210 can be provided with a receiving groove, and at least a portion of the isolation structure 310, the protrusion structure 322, and the first auxiliary structure 331 can be located within the receiving groove. This prevents the isolation structure 310, the protrusion structure 322, and the first auxiliary structure 331 from being excessively tall relative to the substrate 100, thereby effectively reducing the thickness of the display panel 10. For ease of description, the following embodiments are described by taking as an example an example that the isolation structure 310 , the protruding structure 322 and the first auxiliary structure 331 are disposed on a side of the pixel defining portion 210 facing away from the substrate 100 .

[0360] In some embodiments of the present application, during the preparation process of the display panel 10, when organic material is formed on the isolation structure 310, the protruding structure 322 and the first auxiliary structure 331, the protruding structure 322 and the first auxiliary structure 331 provided in the present application can better discharge the gas that is easily generated when the organic material is coated.

[0361] For example, referring to the corresponding figures of the preparation method in the embodiments described later, the raised structures 322 and the first auxiliary structures 331 provided in the present application can effectively discharge the gas at the corresponding positions during the photoresist coating. Specifically, during the preparation process of the display panel 10, a pixel definition material layer 11 can be prepared on the entire surface of the formed first electrode 411. The pixel definition material layer 11 can be used to form the pixel definition layer 200. Then, the isolation structure 310, the raised structure 322 and the first auxiliary structure 331 can be prepared on the pixel definition material layer 11. The pixel definition material layer 11 covering the entire surface above the first electrode 411 can provide good protection for the first electrode 411, so that when the materials of the isolation structure 310, the raised structure 322 and the first auxiliary structure 331 are etched, the etching material is not easily damaged by the first electrode 411 under the shielding of the pixel definition material layer 11. After the isolation structure 310, the protruding structure 322, and the first auxiliary structure 331 on the pixel definition material layer 11 are prepared, the pixel definition material layer 11 can be patterned using a photolithography process to form a pixel definition layer 200. The pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 formed by the pixel defining portion 210. Therefore, in the photolithography process, a first protective material layer 10a (for example, a first protective material layer 10b) is coated on the entire surface of the pixel definition material layer 11, the isolation structure 310, the protruding structure 322, and the first auxiliary structure 331 along a certain direction. When the first protective material layer 10a may include a photoresist), under the squeezing force of the material coated with the first protective material layer 10a, the gas between the material of the first protective material layer 10a and the edge of the isolation structure 310 facing the second area NA2, the gas between the material of the first protective material layer 10a and the protruding structure 322, and the gas between the material of the first protective material layer 10a and the first auxiliary structure 331 can be discharged outward from the edges of the protruding structure 322 and the first auxiliary structure 331 under the guidance of the protruding structure 322 and the first auxiliary structure 331, thereby better improving the structural stability of the display panel 10.

[0362] Please refer to the drawings in the aforementioned embodiments. The embodiments of the first aspect of the present application further provide a display panel 10, which has an adjacent first specific area TA and a second area NA2. The display panel 10 includes: a substrate 100; an isolation structure 310, which is arranged on one side of the substrate 100 and is located in the first specific area TA, and the isolation structure 310 encloses an isolation opening 310a; a protrusion structure 322, which is connected to the isolation structure 310 and is arranged on the side of the isolation structure 310 facing the second area NA2; and a light-emitting layer 420, including a light-emitting unit 421 arranged in the isolation opening 310a.

[0363] In a display panel 10 further provided in an embodiment of the present application, the display panel 10 has a first specific area TA and a second area NA2 adjacent to each other. The display panel 10 includes a substrate 100, an isolation structure 310, a protruding structure 322, and a light-emitting layer 420. The isolation structure 310 is disposed on one side of the substrate 100 and located in the first specific area TA. The isolation structure 310 encloses an isolation opening 310a, which can be used to divide sub-pixels of the display panel 10. The light-emitting layer 420 includes a light-emitting unit 421 disposed within the isolation opening 310a, enabling the display panel 10 within the first specific area TA to be used for light-emitting display. By connecting the protruding structure 322 to the isolation structure 310 and arranging it on the side of the isolation structure 310 facing the second area NA2, that is, by arranging the protruding structure 322 protruding toward the second area NA2 on the edge portion of the isolation structure 310, when the isolation structure 310 is etched, the etching material can also etch the material of the protruding structure 322, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material, making it less likely that the isolation structure 310 will be damaged by excessive etching, and effectively improving the structural stability of the display panel 10.

[0364] Moreover, during the preparation process of the display panel 10, when a new material is formed on the isolation structure 310, for example, when an organic material is formed on the isolation structure 310, the protruding structure 322 protruding relative to the isolation structure 310 can also improve the exhaust path when the material is formed, so that when the material is coated on the isolation structure 310 along a certain direction, under the extrusion force of the coating material, the gas between the material and the edge of the isolation structure 310 facing the second area NA2 side, between the material and the protruding structure 322, and / or between the material and the substrate 100 can be discharged outward from the edge of the protruding structure 322 under the guidance of the protruding structure 322, thereby better improving the structural stability of the display panel 10.

[0365] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0366] For example, the light-emitting layer 420 may be the light-emitting layer 420 in any of the aforementioned embodiments, and the display panel 10 may further include the first electrode layer 410 and the second electrode layer 430 in any of the aforementioned embodiments. For example, the isolation structure 310 may be the isolation structure 310 in any of the aforementioned embodiments, and the isolation structure 310 may include the first isolation portion 311 and the second isolation portion 312 in any of the aforementioned embodiments, so that the isolation structure 310 can be used to isolate the material of the light-emitting layer 420 during the preparation of the light-emitting layer 420 to achieve sub-pixel division. For example, the protrusion structure 322 may be the protrusion structure 322 in any of the aforementioned embodiments to enhance the protrusion structure 322's ability to guide and discharge gas.

[0367] Optionally, in a display panel 10 further provided in an embodiment of the present application, the display panel 10 may not include the first auxiliary structure 331 in any of the aforementioned embodiments, or the display panel 10 may include the first auxiliary structure 331 in any of the aforementioned embodiments, and this application does not impose any specific restrictions thereon. When the display panel 10 includes the first auxiliary structure 331 in any of the aforementioned embodiments, the first auxiliary structure 331 may be disposed on a side of the protruding structure 322 facing away from the isolation structure 310 and located within the second area NA2.

[0368] Figure 31 is a structural schematic diagram of a display panel 10 provided in another embodiment of the present application, Figure 32 is a partial cross-sectional view of a display panel 10 provided in another embodiment of the present application, Figure 33 is a partial schematic diagram of a display panel 10 provided in another embodiment of the present application, and Figure 34 is a partial enlarged schematic diagram of the positive projection of an isolation structure 310 and a protrusion structure 322 on a substrate 100 provided in an embodiment of the present application.

[0369] As shown in Figures 31 to 34, an embodiment of the first aspect of the present application further provides a display panel 10, which has adjacent display area AA and non-display area NA, and includes: a substrate 100; an isolation structure 310, which is arranged on one side of the substrate 100, and the isolation structure 310 encloses an isolation opening 310a; a protrusion structure 322, wherein the number of the protrusion structures 322 is multiple, and the multiple protrusion structures 322 are arranged at intervals from each other and connected to the edge portion of the isolation structure 310 on the side away from the display area AA; a light-emitting layer 420, which is located in the display area AA and includes a light-emitting unit 421 arranged in the isolation opening 310a.

[0370] In a display panel 10 provided in an embodiment of the present application, the display panel 10 has adjacent display area AA and non-display area NA. The display panel 10 includes a substrate 100, an isolation structure 310, a protruding structure 322, and a light-emitting layer 420. The isolation structure 310 is disposed on one side of the substrate 100 and encloses an isolation opening 310a. The isolation structure 310 can be used to divide the sub-pixels of the display panel 10. The light-emitting layer 420 is located in the display area AA and includes a light-emitting unit 421 disposed within the isolation opening 310a, enabling the display panel 10 in the display area AA to be used for light-emitting display. By connecting a plurality of spaced-apart raised structures 322 to the isolation structure 310 and arranging them on the side of the isolation structure 310 away from the display area AA, during the preparation process of the display panel 10, when a new material is formed on the isolation structure 310, for example, when an organic material is formed on the isolation structure 310, the raised structure 322 protruding relative to the isolation structure 310 can improve the exhaust path when the material is formed, so that when the material is coated on the isolation structure 310 along a certain direction, under the extrusion force of the coating material, the gas between the material and the edge portion of the isolation structure 310 away from the display area AA, between the material and the raised structure 322, and / or between the material and the substrate 100 can be discharged outward from the edge of the raised structure 322 under the guidance of the raised structure 322. For example, the gas can be better discharged outward from the gap between adjacent raised structures 322, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0371] In addition, by providing a protruding protrusion structure 322 on the edge portion of the isolation structure 310, when the isolation structure 310 is etched, the etching material can also etch the material of the protrusion structure 322, so that the protrusion structure 322 can better limit the transfer of the etching material toward the isolation structure 310, thereby better reducing the amount of etching of the isolation structure 310 by the etching material, making the isolation structure 310 less likely to be damaged by excessive etching, and better improving the structural stability of the display panel 10.

[0372] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 described in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0373] Optionally, the non-display area NA may include the first area NA1 and the second area NA1 described in any one of the aforementioned embodiments.

[0374] In some embodiments of the present application, the isolation structure 310 is at least partially located in the display area AA, and at least a portion of the isolation opening 310a defined in the isolation structure 310 is located in the display area AA, such that the light-emitting unit 421 within the isolation opening 310a can participate in the light-emitting display operation of the display area AA in the display panel 10. Part of the isolation structure 310 may be located in the display area AA, while another portion of the isolation structure 310 may be located in the non-display area NA. The protruding structure 322 may be located in the non-display area NA, and the protruding structure 322 may be connected to an edge portion of the isolation structure 310 away from the display area AA. This may mean that the protruding structure 322 may be connected to a side of the portion of the isolation structure 310 located in the non-display area NA that is away from the portion of the isolation structure 310 located in the display area AA.

[0375] Optionally, at least a portion of the isolation structure 310 located in the non-display area NA can be reused as the main structure 321 in any of the aforementioned embodiments. For example, an embodiment of the first aspect of the present application further provides a display panel 10 in which the isolation structure 310 located in the display area AA can be the isolation structure 310 in any of the aforementioned embodiments, while the isolation structure 310 located in the non-display area NA can be reused as the main structure 321 in any of the aforementioned embodiments.

[0376] Optionally, at least a portion of the non-display area NA of the display panel 10 can serve as a functional area of ​​the display panel 10. For example, the transmittance of at least a portion of the non-display area NA can be greater than the transmittance of the display area AA. When the display panel 10 is applied to a display device, a photosensitive component for sensing light in the display device can be correspondingly arranged under the non-display area NA having a greater transmittance. The photosensitive component can better sense light through the non-display area NA having a greater transmittance. The photosensitive component can include at least one of: a distance sensor, a camera, an under-screen fingerprint recognition module, an infrared light-emitting diode, a proximity sensor, and other components capable of sensing light. Optionally, at least a portion of the non-display area NA of the display panel 10 can serve as the border area of ​​the display panel 10.

[0377] For ease of description, the following embodiments are described using the non-display area NA as an example of a functional area of ​​the display panel 10. Optionally, the display panel 10 has a functional hole H in the non-display area NA so that when a photosensitive component is disposed in the non-display area NA, the photosensitive component can better sense light through the functional hole H.

[0378] Optionally, the isolation structure 310 and the protrusion structure 322 may be arranged around at least a portion of the functional hole H. For example, a plurality of protrusion structures 322 may be connected to the isolation structure 310 and spaced apart around the functional hole H, so that the arrangement of the isolation structure 310 and the protrusion structure 322 is not likely to affect the transmittance at the functional hole H, and can facilitate the gas to be discharged outward from the edge of the protrusion structure 322 toward one side of the functional hole H.

[0379] In some embodiments of the present application, the isolation structure 310 can be used to isolate the material of the light-emitting layer 420 when preparing the light-emitting layer 420 to achieve sub-pixel division, wherein there are many ways to set the shape of the isolation structure 310, and the shape of the isolation structure 310 can be any shape that can block and isolate the material of the light-emitting layer 420 in adjacent isolation openings 310a.

[0380] In some optional embodiments, the isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312 located on a side of the first isolation portion 311 facing away from the substrate 100 . The second isolation portion 312 is protruded from the first isolation portion 311 toward the isolation opening 310 a .

[0381] By arranging the second isolation portion 312 to protrude from the first isolation portion 311 toward the isolation opening 310a, the second isolation portion 312 can block at least a portion of the material used to prepare the light-emitting layer 420 when vapor-depositing the light-emitting layer 420 of the display panel 10, so as to separate the light-emitting layer 420 between adjacent sub-pixels, and can facilitate the formation of a plurality of spaced-apart light-emitting units 421, thereby eliminating the need to set a mask with high precision when vapor-depositing the light-emitting layer 420 of the display panel 10. For example, there is no need to set a high-precision metal mask when vapor-depositing the light-emitting layer 420, thereby effectively reducing the production cost of the display panel 10.

[0382] Optionally, the second isolation portion 312 may also be provided to protrude from the first isolation portion 311 toward the functional hole H. For example, the second isolation portion 312 on the isolation structure 310 between adjacent protruding structures 322 may also be provided to protrude from the first isolation portion 311 toward the functional hole H.

[0383] In some optional embodiments, the raised structure 322 may include a first raised portion 322a, which is integrally formed with the first isolation portion 311, and / or the raised structure 322 may include a second raised portion 322b, which is integrally formed with the second isolation portion 312, so that at least a portion of the raised structure 322 can be prepared in the same preparation process as the isolation structure 310 to improve the preparation efficiency of the display panel 10.

[0384] In some optional embodiments, the shape of the protruding structure 322 may be similar to the shape of the isolation structure 310. Optionally, the protruding structure 322 may include a first protruding portion 322a and a second protruding portion 322b, wherein the second protruding portion 322b is provided to protrude from the first protruding portion 322a toward the side facing away from the isolation structure 310. For example, the second protruding portion 322b is provided to protrude from the first protruding portion 322a toward the functional hole H. When the etching material is used to etch the material of the isolation structure 310, the etching material may also etch the protruding structure 322. While reducing the amount of etching of the material of the isolation structure 310 by the etching material, the protruding structure 322 may be etched to form a shape in which the second protruding portion 322b of the protruding structure 322 protrudes from the first protruding portion 322a toward the side facing away from the isolation structure 310.

[0385] As shown in Figures 33 and 34, in these optional embodiments, a protruding raised structure 322 is provided on the edge portion of the isolation structure 310 away from the display area AA, so that when the material of the isolation structure 310 is etched to form the first isolation portion 311 and the second isolation portion 312, the etching material located at the edge portion of the isolation structure 310 away from the display area AA can also etch the material of the raised structure 322, thereby effectively reducing the amount of etching of the isolation structure 310 by the etching material, making it less likely that the isolation structure 310 is damaged by excessive etching, and effectively improving the structural stability of the display panel 10.

[0386] In some embodiments of the present application, there are various ways to set the shape of the protruding structure 322 . The shape of the protruding structure 322 can be set to facilitate the discharge of gas when forming a material above the protruding structure 322 .

[0387] In some optional embodiments, the orthographic projection of the protrusion structure 322 on the substrate 100 has a first edge B1 and a second edge B2, and the first edge B1 and the second edge B2 may intersect. For example, the first edge B1 and the second edge B2 may be perpendicular to each other.

[0388] In this optional embodiment, the first edge B1 and the second edge B2 are arranged to intersect, so that when material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, for example, when material is coated above the isolation structure 310 and the protruding structure 322 along any of the first direction X, the second direction Y, the circumferential direction of the functional hole H, or the radial direction of the functional hole H, if one of the first edge B1 and the second edge B2 cannot better conform to the coating direction of the material, then the other of the first edge B1 and the second edge B2 can better conform to the coating direction of the material. For example, when one of the first edge B1 and the second edge B2 is perpendicular to the coating direction of the material, the angle between the other of the first edge B1 and the second edge B2 and the coating direction of the material may be less than 90 degrees, so that when the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, under the extrusion force of the coating material, the edge portion of the material and the isolation structure 310 away from the display area AA and / or the gas between the material and the protruding structure 322 can be better discharged outward under the guidance of at least one of the first edge B1 and the second edge B2, thereby better improving the structural stability of the display panel 10.

[0389] Optionally, the first edge B1 and the second edge B2 intersect, which may mean that the first edge B1 and the second edge B2 can be straight edges that intersect, thereby enhancing the gas-guiding effect of the edge portion of the protruding structure 322 and facilitating gas discharge. Optionally, a curved edge (not shown) can be connected between the first edge B1 and the second edge B2 for transition.

[0390] In some optional embodiments, the orthographic projection of the protrusion structure 322 on the substrate 100 may be approximately polygonal. For example, the orthographic projection of the protrusion structure 322 on the substrate 100 may be approximately rectangular or triangular. Compared to other shapes, a protrusion structure 322 having an orthographic projection of a rectangle may have a better extension dimension, thereby facilitating gas discharge. For ease of description, the following embodiments will be described using the example of a protrusion structure 322 having an orthographic projection of a rectangle on the substrate 100.

[0391] Optionally, the first edge B1 is located on a side of the second edge B2 away from the isolation structure 310 , and the second edge B2 is located on both sides of the first edge B1 .

[0392] In some optional embodiments, the isolation structure 310 has a third edge B3 on a side of its orthographic projection on the substrate 100 facing the protrusion structure 322 , and the second edge B2 intersects the third edge B3 .

[0393] Optionally, the second edge B2 is connected between the first edge B1 and the third edge B3, and the second edge B2 is perpendicular to the third edge B3.

[0394] Optionally, the second edge B2 intersects the third edge B3, which may mean that the second edge B2 and the third edge B3 may be straight edges and intersect. Optionally, an arc edge (not shown in the figure) may be connected between the third edge B3 and the second edge B2 for transition.

[0395] In these optional embodiments, by setting the second edge B2 to intersect the third edge B3, when the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, and the third edge B3 cannot conform to the coating direction of the material, the second edge B2 can better conform to the coating direction of the material. For example, when the third edge B3 is perpendicular to the coating direction of the material, the angle between the second edge B2 intersecting with the third edge B3 and the coating direction of the material can be less than 90 degrees. When the material is coated in a certain direction above the isolation structure 310 and the protruding structure 322, under the squeezing force of the coating material, the gas between the edge portion of the material and the isolation structure 310 away from the display area AA and / or the gas between the material and the protruding structure 322 can be better discharged outward under the guidance of the second edge B2, thereby better improving the structural stability of the display panel 10.

[0396] In some embodiments of the present application, there are multiple ways to extend the protruding structure 322 connected to the edge portion of the isolation structure 310, that is, there are multiple ways in which the protruding structure 322 protrudes in different directions relative to the isolation structure 310. The extending setting method of the protruding structure 322 can be set according to the coating direction of the material when coating the material above the isolation structure 310 and the protruding structure 322.

[0397] As shown in Figures 33 and 34 , in some optional embodiments, the raised structure 322 may be formed to extend from the isolation structure 310 toward the center of the functional hole H. This allows the edges of the raised structure 322 to effectively guide gas when material is applied circumferentially or radially around the functional hole H above the isolation structure 310 and raised structure 322, facilitating gas discharge from the edges of the isolation structure 310 and raised structure 322. Specifically, when material is applied circumferentially around the functional hole H above the isolation structure 310 and raised structure 322, the pressure of the applied material allows gas to be discharged outward along a first edge B1, which has an angle less than 90 degrees with the circumference of the functional hole H. Furthermore, when material is applied radially around the functional hole H above the isolation structure 310 and raised structure 322, the pressure of the applied material allows gas to be discharged outward along a second edge B2, which has an angle less than 90 degrees with the radial direction of the functional hole H.

[0398] In this optional embodiment, the protrusion structure 322 may be symmetrically arranged about at least one virtual line extending radially along the functional hole H, so that the gas is discharged outward along the circumference of the functional hole H or the radial direction of the functional hole H under the guidance of the edge of the protrusion structure 322.

[0399] FIG35 is a partial schematic diagram of a display panel 10 provided in another embodiment of the present application, and FIG36 is a partial enlarged schematic diagram of the orthographic projection of an isolation structure 310 and a protrusion structure 322 on a substrate 100 provided in another embodiment of the present application.

[0400] As shown in Figures 35 and 36, in other optional embodiments, the isolation structure 310 may have a first isolation region A1 located on at least one side of the functional hole H in the first direction X, and the second edge B2 of the protruding structure 322 connected to the isolation structure 310 located in the first isolation region A1 extends along the first direction X, and / or, the isolation structure 310 has a second isolation region A2 located on at least one side of the functional hole H in the second direction Y, and the second edge B2 of the protruding structure 322 connected to the isolation structure 310 located in the second isolation region A2 extends along the second direction Y.

[0401] In this optional embodiment, the protruding structure 322 connected to the isolation structure 310 located in the first isolation area A1 can be extended and formed along the first direction X. By setting the second edge B2 of the protruding structure 322 connected to the isolation structure 310 located in the first isolation area A1 to extend along the first direction X, when material is coated along the first direction X above the isolation structure 310 and the protruding structure 322, the second edge B2 of the protruding structure 322 extending along the first direction X can better guide the gas, so as to facilitate the discharge of gas at the edge position of the isolation structure 310 and the protruding structure 322. The protruding structure 322 connected to the isolation structure 310 located in the second isolation area A2 can be extended and formed along the second direction Y. By setting the second edge B2 of the protruding structure 322 connected to the isolation structure 310 located in the second isolation area A2 to extend along the second direction Y, when the material is coated along the second direction Y above the isolation structure 310 and the protruding structure 322, the second edge B2 on the protruding structure 322 extending along the second direction Y can better guide the gas, so as to facilitate the discharge of gas from the edge portion of the isolation structure 310 away from the display area AA and the edge position of the protruding structure 322.

[0402] Optionally, the first edge B1 of the protruding structure 322 connected to the isolation structure 310 located in the first isolation area A1 may extend along the second direction Y, so that when material is coated along the second direction Y above the isolation structure 310 and the protruding structure 322, the first edge B1 of the protruding structure 322 extending along the second direction Y can better guide the gas, so as to facilitate the discharge of gas from the edge portion of the isolation structure 310 away from the display area AA and the edge position of the protruding structure 322.

[0403] Optionally, the protruding structure 322 connected to the isolation structure 310 located in the first isolation area A1 can be set to protrude from the isolation structure 310 of the first isolation area A1 in the second direction Y. For example, the protruding structure 322 connected to the isolation structure 310 located in the first isolation area A1 can be set to protrude from the isolation structure 310 of the first isolation area A1 along the second direction Y toward the functional hole H.

[0404] Optionally, the first edge B1 of the protruding structure 322 connected to the isolation structure 310 located in the second isolation area A2 extends along the first direction X, so that when material is coated along the first direction X above the isolation structure 310 and the protruding structure 322, the first edge B1 of the protruding structure 322 extending along the first direction X can better guide the gas, so as to facilitate the discharge of gas from the edge portion of the isolation structure 310 away from the display area AA and the edge position of the protruding structure 322.

[0405] Optionally, the protruding structure 322 connected to the isolation structure 310 located in the second isolation area A2 can be set to protrude from the isolation structure 310 in the second isolation area A2 in the first direction X. For example, the protruding structure 322 connected to the isolation structure 310 located in the second isolation area A2 can be set to protrude from the isolation structure 310 in the second isolation area A2 along the first direction X toward the functional hole H.

[0406] Optionally, the third edge B3 includes a first sub-edge B31 and a second sub-edge B32 connected to each other, the first sub-edge B31 extends along the first direction X, the second sub-edge B32 extends along the second direction Y, the protruding structure 322 located in the first isolation area A1 is connected to the side of the second sub-edge B32 facing the functional hole H, and / or, the protruding structure 322 located in the second isolation area A2 is connected to the side of the first sub-edge B31 facing the functional hole H.

[0407] By providing a first sub-edge B31 extending along the first direction X, when material is coated along the first direction X above the isolation structure 310 and the protrusion structure 322, the first sub-edge B31 extending along the first direction X on the isolation structure 310 can effectively guide gas, thereby facilitating the discharge of gas from the edge portion of the isolation structure 310 away from the display area AA and the upper edge of the protrusion structure 322. By providing a second sub-edge B32 extending along the second direction Y, when material is coated along the second direction Y above the isolation structure 310 and the protrusion structure 322, the second sub-edge B32 extending along the second direction Y on the isolation structure 310 can effectively guide gas, thereby facilitating the discharge of gas from the edge portion of the isolation structure 310 away from the display area AA and the upper edge of the protrusion structure 322. In addition, by setting the protruding structure 322 located in the first isolation area A1 to be connected to the side of the second sub-edge B32 facing the functional hole H, and setting the protruding structure 322 located in the second isolation area A2 to be connected to the side of the first sub-edge B31 facing the functional hole H, the protrusion degree of the protruding structure 322 relative to the isolation structure 310 is improved, so as to enhance the guiding and discharge effect of the protruding structure 322 on gas.

[0408] In these optional embodiments, the specific sizes of the first isolation area A1 and the second isolation area A2 can be set according to the shape of the non-display area NA, wherein the orthographic projection area of ​​the first isolation area A1 on the substrate 100 may be equal to the orthographic projection area of ​​the second isolation area A2 on the substrate 100, or the orthographic projection area of ​​the first isolation area A1 on the substrate 100 may be larger than or smaller than the orthographic projection area of ​​the second isolation area A2 on the substrate 100, and this application does not impose any restrictions on this.

[0409] Optionally, when the extension dimension of the non-display area NA in the first direction X is greater than the extension dimension of the non-display area NA in the second direction Y, the extension dimension of the first isolation region A1 in the second direction Y may be smaller than the extension dimension of the second isolation region A2 in the first direction X. Optionally, when the extension dimension of the non-display area NA in the second direction Y is greater than the extension dimension of the non-display area NA in the first direction X, the extension dimension of the first isolation region A1 in the second direction Y may be greater than the extension dimension of the second isolation region A2 in the first direction X.

[0410] Optionally, there may be two first isolation regions A1, each located on either side of the functional hole H in the first direction X. Within each of the two first isolation regions A1, the protruding structure 322 connected to the isolation structure 310 within one of the first isolation regions A1 may protrude toward the other first isolation region A1. The orthographic projection areas of the two first isolation regions A1 on the substrate 100 may be equal or unequal, and this is not a limitation of this application. Optionally, the extension dimensions of the two opposing first isolation regions A1 in the second direction Y may be equal.

[0411] Optionally, there may be two second isolation regions A2, each located on either side of the functional hole H in the second direction Y. Within each of the two second isolation regions A2, the protruding structure 322 connected to the isolation structure 310 within one of the second isolation regions A2 may protrude toward the other second isolation region A2. The orthographic projection areas of the two second isolation regions A2 on the substrate 100 may be equal or unequal, and this is not a limitation of this application. Optionally, the two opposing second isolation regions A2 may have equal extensions in the first direction X.

[0412] In some optional embodiments, the length of the second edge B2 may be greater than the length of the first edge B1, so that the protrusion structure 322 may have a greater degree of protrusion relative to the isolation structure 310, so that the gas can be better moved away from the isolation structure 310 under the guidance of the second edge B2, so as to reduce the impact of the gas on the isolation structure 310, thereby better improving the structural stability of the isolation structure 310.

[0413] Optionally, the length of the first edge B1 is greater than or equal to 5 microns and less than or equal to 300 microns, and / or the length of the second edge B2 is greater than or equal to 5 microns and less than or equal to 300 microns. By properly setting the lengths of the first edge B1 and the second edge B2, the first edge B1 and the second edge B2 will not be too large, that is, when the gas moves along the first edge B1 and the second edge B2, there will not be an excessively large exhaust path, so that the gas can be discharged outward along the first edge B1 and the second edge B2. The first edge B1 and the second edge B2 will not be too small, so as to better enhance the guiding effect of the protrusion structure 322 on the gas. For example, the length of the first edge B1 can be at least one of 60 microns, 120 microns, 180 microns, 240 microns, and 300 microns, and the length of the second edge B2 can be at least one of 50 microns, 100 microns, 150 microns, 200 microns, and 250 microns.

[0414] Optionally, the minimum spacing between adjacent protrusion structures 322 is greater than or equal to 5 microns and less than or equal to 300 microns. By properly setting the minimum spacing between adjacent protrusion structures 322, the spacing between adjacent protrusion structures 322 is reduced to a minimum. This allows gas on the edge of the isolation structure 310 between adjacent protrusion structures 322 to more easily migrate to the edge of the protrusion structure 322, thereby preventing excessive gas from remaining at the edge of the isolation structure 310 between adjacent protrusion structures 322, thereby facilitating gas discharge through the protrusion structure 322. Furthermore, the spacing between adjacent protrusion structures 322 is reduced to a minimum, preventing gas from being trapped between the isolation structure 310 and the adjacent protrusion structure 322. For example, the minimum spacing between adjacent protrusion structures 322 can be at least one of 50 microns, 100 microns, 150 microns, 200 microns, 250 microns, and 300 microns.

[0415] As shown in Figure 33, in some optional embodiments, the pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 formed by the pixel defining portion 210, and the pixel defining portion 210 is arranged around at least a portion of the first electrode 411, and the orthographic projection of the pixel opening 220 on the substrate 100 is located within the orthographic projection of the isolation opening 310a on the substrate 100.

[0416] In this optional embodiment, the first electrode 411 and the isolation structure 310 can be insulated by the pixel defining portion 210, so that the second electrode 431 is not easily short-circuited with the first electrode 411 through the isolation structure 310, thereby improving the working stability of the display panel 10.

[0417] In some embodiments of the present application, the relative positions of the pixel defining portion 210 and the isolation structure 310, and between the pixel defining portion 210 and the protrusion structure 322, can be arranged in various ways. For example, the isolation structure 310 and the protrusion structure 322 can be arranged on the side of the pixel defining portion 210 facing away from the substrate 100, that is, the isolation structure 310 and the protrusion structure 322 can be directly arranged on the pixel defining portion 210. Alternatively, for example, the pixel defining portion 210 can be provided with a receiving groove, and at least a portion of the isolation structure 310 and the protrusion structure 322 can be located within the receiving groove. This prevents the isolation structure 310 and the protrusion structure 322 from being excessively tall relative to the substrate 100, thereby effectively reducing the thickness of the display panel 10. For ease of description, the following embodiments will be described using the example of the isolation structure 310 and the protrusion structure 322 being arranged on the side of the pixel defining portion 210 facing away from the substrate 100.

[0418] In some embodiments of the present application, during the preparation of the display panel 10 , when an organic material is formed on the isolation structure 310 and the protruding structure 322 , the protruding structure 322 provided in the present application can better discharge the gas that is easily generated when the organic material is coated.

[0419] For example, referring to the corresponding figures of the preparation method in the embodiments described later, the raised structure 322 provided in the present application can effectively discharge the gas at the corresponding position during the photoresist coating. Specifically, during the preparation process of the display panel 10, a pixel definition material layer 11 can be prepared on the entire surface of the first electrode 411 that has been formed. The pixel definition material layer 11 can be used to form the pixel definition layer 200. Then, the isolation structure 310 and the raised structure 322 can be prepared on the pixel definition material layer 11. The pixel definition material layer 11 covering the entire surface above the first electrode 411 can provide good protection for the first electrode 411, so that when the materials of the isolation structure 310 and the raised structure 322 are etched, the etching material is not easily damaged by the first electrode 411 under the shielding of the pixel definition material layer 11. After the isolation structure 310 and the protruding structure 322 on the pixel definition material layer 11 are prepared, the pixel definition material layer 11 can be patterned using a photolithography process to form a pixel definition layer 200. The pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 enclosed by the pixel defining portion 210. Therefore, in the photolithography process, when a first protective material layer 10a (for example, the first protective material layer 10a may include photoresist) is coated on the entire surface along a certain direction above the pixel definition material layer 11, the isolation structure 310, and the protruding structure 322, under the squeezing force of the material of the first protective material layer 10a, the gas between the material of the first protective material layer 10a and the edge portion of the isolation structure 310 away from the display area AA, and the gas between the material of the first protective material layer 10a and the protruding structure 322 can be discharged outward from the edge of the protruding structure 322 under the guidance of the protruding structure 322, thereby effectively improving the structural stability of the display panel 10.

[0420] The embodiment of the first aspect of the present application also provides a display panel 10, which is provided with a functional hole H. The display panel 10 includes: a substrate 100; an isolation structure 310, which is arranged on one side of the substrate 100 and surrounds at least part of the functional hole H, and the isolation structure 310 encloses an isolation opening 310a; a protruding structure 322, which is connected to the side of the isolation structure 310 facing the functional hole H; and a light-emitting layer 420, which includes a light-emitting unit 421 arranged in the isolation opening 310a.

[0421] Please refer to Figures 31 to 35. In a display panel 10 also provided in an embodiment of the present application, a functional hole H is provided in the display panel 10 to improve the light transmittance performance of the display panel 10. When the display panel 10 is applied to a display device, a photosensitive component for sensing light in the display device can be correspondingly arranged at the functional hole H. The photosensitive component can better sense light through the functional hole H. The photosensitive component may include: a distance sensor, a camera, an under-screen fingerprint recognition module, an infrared light-emitting diode proximity sensor, etc.

[0422] The display panel 10 includes a substrate 100, an isolation structure 310, a protruding structure 322, and a light-emitting layer 420. The isolation structure 310 is disposed on one side of the substrate 100 and encloses an isolation opening 310a. The isolation structure 310 can be used to divide the sub-pixels of the display panel 10. The light-emitting layer 420 includes a light-emitting unit 421 disposed within the isolation opening 310a, enabling the display panel 10 to be used for light-emitting display. By connecting the protruding structure 322 to the isolation structure 310 and arranging it on the side of the isolation structure 310 facing the functional hole H, during the preparation process of the display panel 10, when a new material is formed on the isolation structure 310, for example, when an organic material is formed on the isolation structure 310, the protruding structure 322 protruding relative to the isolation structure 310 can improve the exhaust path when the material is formed, so that when the material is coated on the isolation structure 310 along a certain direction, under the extrusion force of the coating material, the gas between the material and the edge portion of the isolation structure 310 away from the display area AA, between the material and the protruding structure 322, and / or between the material and the substrate 100 can be discharged outward from the edge of the protruding structure 322 under the guidance of the protruding structure 322, thereby better improving the structural stability of the display panel 10.

[0423] Furthermore, by providing a protruding raised structure 322 at the edge portion of the isolation structure 310, when the isolation structure 310 is etched, the etching material located near the functional hole H can also etch the material of the raised structure 322, so that the raised structure 322 can better limit the transfer of the etching material toward the isolation structure 310, thereby better reducing the amount of etching of the isolation structure 310 by the etching material, making the isolation structure 310 less likely to be damaged by excessive etching, and better improving the structural stability of the display panel 10.

[0424] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0425] For example, the substrate 100 may be the substrate 100 in any of the aforementioned embodiments. For example, the light-emitting layer 420 may be the light-emitting layer 420 in any of the aforementioned embodiments, and the display panel 10 may further include the first electrode layer 410 and the second electrode layer 430 in any of the aforementioned embodiments. For example, the isolation structure 310 may be the isolation structure 310 in any of the aforementioned embodiments, and the isolation structure 310 may include the first isolation portion 311 and the second isolation portion 312 in any of the aforementioned embodiments, so that the isolation structure 310 can be used to isolate the material of the light-emitting layer 420 during the preparation of the light-emitting layer 420 to achieve sub-pixel division. For example, the protrusion structure 322 may be the protrusion structure 322 in any of the aforementioned embodiments to enhance the protrusion structure 322's ability to guide and discharge gas.

[0426] Please refer to Figure 37 and Figure 38. Figure 37 illustrates a schematic diagram of the distribution of various areas of the display panel provided by this embodiment, and Figure 38 illustrates a schematic diagram of a partial film layer structure of the display panel provided by this embodiment.

[0427] An embodiment of the first aspect of the present application also provides a display panel 10. In this embodiment, the display panel 10 includes a second sub-area NA22 and a display area AA. The display area AA at least partially surrounds the second sub-area NA22. The light transmittance of the second sub-area NA22 is greater than the light transmittance of the display area AA. The shape of the second sub-area NA22 may include circular, rectangular, and teardrop-shaped, etc. In this embodiment, no specific limitation is made on the shape of the second sub-area NA22.

[0428] The display panel 10 includes a substrate 100 and an isolation structure layer 300. The isolation structure layer 300 is located on one side of the substrate 100 and forms an isolation opening 310a on the substrate 100 corresponding to the display area AA. In a direction away from the substrate 100, the isolation structure layer 300 includes a first isolation layer 301 and a second isolation material layer 132 stacked together. The orthographic projection of the first isolation layer 301 on the substrate 100 is located within the orthographic projection of the second isolation material layer 132 on the substrate 100.

[0429] In this embodiment, in order to disconnect the light-emitting material layer and the cathode layer between adjacent isolation openings 310a at the isolation structure position, the second isolation material layer 132 needs to extend toward the isolation opening 310a relative to the first isolation layer 301 to form an undercut structure that can disconnect the evaporated light-emitting material layer and the cathode layer at the isolation structure layer 3003. Similarly, the second isolation material layer 132 also forms an undercut structure on the side facing the second sub-region NA22. Since the area of ​​the second sub-region NA22 is much larger than that of the first isolation layer 301, the undercut structure can be formed. The area of ​​the isolation opening 310a is larger than that of the isolation opening 310a. When the photoresist layer is coated, the air between the photoresist layer and the underlying film layer will spread from the center of the opening area to the periphery of the opening area, and accumulate in the isolation structure layer 300 around the opening area. Specifically, the accumulated air will gather in the recessed area C (at the position of the dotted circle in the figure) formed at the junction of the first isolation layer 301 and the second isolation material layer 132. The inventors have found that the deeper the recessed area C, the easier it is for air to accumulate and the more unfavorable it is for air to be released along the gap between the optical adhesive and the isolation structure layer 300.

[0430] In this embodiment, in the isolation structure layer 300 surrounding the second sub-region NA22, a length d1 of the second isolation material layer 132 extending from the first isolation layer 301 on the side facing the second sub-region NA22 is less than a length d2 of the second isolation material layer 132 extending from the first isolation layer 301 on the side facing away from the second sub-region NA22. The length of the second isolation material layer 132 extending from the first isolation layer 301 refers to the length of the orthographic projection of the second isolation material layer 132 on the substrate 100 extending relative to the orthographic projection of the first isolation layer 301 on the substrate 100. For example, the length d1 of the second isolation material layer 132 extending from the first isolation layer 301 on the side facing the second sub-region NA22 refers to the length of the orthographic projection of the second isolation material layer 132 on the substrate 100 extending relative to the orthographic projection of the first isolation layer 301 on the substrate 100 in the direction facing the second sub-region NA22.

[0431] With such a design, a recessed area C with a shallower recessed depth can be formed on the side of the isolation structure layer 300 close to the second sub-region NA22, under the premise that the bottom cut structure on the side of the isolation structure layer 300 away from the second sub-region NA22 can isolate the evaporated light-emitting material layer and the cathode layer. This is beneficial for the air accumulated in the second sub-region NA22 to be released along the gap between the optical glue and the isolation structure when the photoresist layer is coated, thereby reducing the air accumulation in the recessed area C and preventing a large air pressure from being formed, thereby ensuring the display effect of the display panel 10.

[0432] Optionally, the embodiment of the first aspect of the present application also provides a display panel 10 which may be the display panel 10 described in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel 10 which may have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0433] In this embodiment, please refer to Figure 39. The above-mentioned shape of the isolation structure layer 300 can be achieved by controlling the lateral side etching depth of the first isolation layer 301. As shown in Figure 39, before the lateral side etching, the cross-sectional shape of the isolation structure layer 300 is a trapezoid. By controlling the lateral etching depth of the first isolation layer 301 located on both sides of the trapezoid, the lateral etching depth of the first isolation layer 301 away from the second sub-region NA22 is greater than the lateral etching depth of the first isolation layer 301 toward the second sub-region NA22. In other words, as shown in Figure 39, at the junction of the first isolation layer 301 and the second isolation material layer 132, on the side away from the second sub-region NA22, the recess depth of the first isolation layer 301 relative to the second isolation material layer 132 is d4, and on the side toward the second sub-region NA22, the recess depth of the first isolation layer 301 relative to the second isolation material layer 132 is d3, wherein the recess depth d4 is greater than the recess depth d3.

[0434] Optionally, the recess depth d4 may be the first spacing S1 described in any of the aforementioned embodiments, and the recess depth d3 may be the second spacing S2 described in any of the aforementioned embodiments.

[0435] Furthermore, in this embodiment, near the second sub-region NA22, an angle α1 is formed between the surface of the second isolation material layer 132 facing the substrate 100 and the surface of the first isolation layer 301 facing the second sub-region NA22, and an angle α2 is formed between the surface of the second isolation material layer 132 facing the substrate 100 and the surface of the first isolation layer 301 facing away from the second sub-region NA22, wherein the angle α1 is smaller than the angle α2. The larger the angle, the more conducive it is to the release of air along the gap between the photoresist layer and the surface of the isolation structure layer 300.

[0436] In this embodiment, referring to FIG. 40 , the display panel 10 further includes a pixel definition layer 200, which is located on one side of the substrate 100. The isolation structure layer 300 is located on a side of the pixel definition layer 200 away from the substrate 100. The pixel definition layer 200 includes a pixel opening 220, and the orthographic projection of the pixel opening 220 on the substrate 100 is located within the orthographic projection of the isolation opening 310a on the substrate 100. In other words, the orthographic projection of the isolation opening 310a on the substrate 100 covers the orthographic projection of the pixel opening 220 on the substrate 100.

[0437] Referring to Figure 41 , in this embodiment, the display panel 10 further includes a light-emitting device 400, which is disposed within the isolation opening 310a. The light-emitting device 400 includes a first electrode 411, a light-emitting unit 421, and a second electrode 431, which are sequentially stacked in a direction away from the substrate 100. The first electrodes 411 are spaced apart and distributed on one side of the substrate 100. For example, the first electrodes 411 are located at positions on the substrate 100 corresponding to the isolation opening 310a. The pixel opening 220 exposes the first electrodes 411. The light-emitting unit 421 extends from the pixel opening 220 to the side of the pixel definition layer 200 away from the substrate 100. The second electrode 431 extends from the pixel opening 220 to the side of the pixel definition layer 200 away from the substrate 100 and is connected to the isolation structure layer 300. For example, the second electrode 431 extends from the pixel opening 220 to the side of the pixel definition layer 200 away from the substrate 100 and overlaps the first isolation layer 301. For example, in this embodiment, the first electrode 411 can be the anode of the light-emitting device 400, the second electrode 431 can be the cathode of the light-emitting device 400, and the first isolation layer 301 can be a conductive isolation portion, which can connect the second electrodes of adjacent light-emitting devices 400 together. By connecting the first isolation layer 301 to the power signal voltage (VSS), the light-emitting devices 400 at different positions can have the same VSS voltage to improve the display uniformity of the display panel.

[0438] Referring to Figure 42 , in this embodiment, the isolation structure layer 300 further includes a third isolation layer 303. The third isolation layer 303 is located on the side of the first isolation portion 121 facing the substrate 100. That is, in a direction away from the substrate 100, the third isolation layer 303, the first isolation layer 301, and the second isolation material layer 132 are stacked in this order. The orthographic projection of the third isolation layer 303 on the substrate 100 is located within the orthographic projection of the second isolation material layer 132 on the substrate 100, and the orthographic projection of the first isolation layer 301 on the substrate 100 is located within the orthographic projection of the third isolation layer 303 on the substrate 100. Exemplarily, the third isolation layer 303 may be a conductive isolation portion, and the second electrode 142 is connected to the third isolation portion.

[0439] In a direction perpendicular to the plane of the substrate 100, the height of the first isolation layer 301 is greater than the height of the third isolation layer 303. In this embodiment, the material of the first isolation layer 301 includes aluminum, the material of the second isolation material layer 132 includes titanium, and the material of the third isolation layer 303 includes molybdenum.

[0440] 43 , the display panel 10 includes a first encapsulation layer 500, which includes a plurality of encapsulation units 510. Different encapsulation units 510 are used to encapsulate light-emitting devices 400 within different isolation openings 310a. Adjacent encapsulation units 510 are spaced apart on the isolation structure layer 300. For example, two adjacent encapsulation units 510 are disconnected on a side of the isolation structure layer 300 away from the substrate 100. The encapsulation units 510 can be manufactured using chemical vapor deposition.

[0441] Referring to Figure 44, the display panel 10 further includes a second encapsulation layer 600 and a third encapsulation layer 700. The second encapsulation layer 600 covers the isolation structure layer 300 and the light-emitting device 400, and the side of the second encapsulation layer 600 away from the substrate 100 forms a flat surface. The third encapsulation layer 700 is located on the side of the second encapsulation layer 600 away from the substrate 100. The second encapsulation layer 600 can be manufactured by inkjet printing, and the third encapsulation layer 700 can be manufactured by chemical vapor deposition. The first encapsulation layer 500 and the third encapsulation layer 700 are inorganic encapsulation layers, and the second encapsulation layer 600 is an organic encapsulation layer. The first encapsulation layer 500, the second encapsulation layer 600, and the third encapsulation layer 700 form the thin film encapsulation structure of the display panel 10.

[0442] In this embodiment, at a position close to the second sub-region NA22, the isolation structure layer 300 surrounds the second sub-region NA22. Unlike a conventional OLED display panel, the display panel provided by this embodiment can realize a single light-emitting device package. Therefore, in this embodiment, the isolation structure layer 300 close to the second sub-region NA22 is not deliberately used to block water and oxygen from entering the display area AA from the second sub-region NA22. Therefore, in this embodiment, the isolation structure layer 300 surrounding the second sub-region NA22 can be a continuously distributed isolation structure or a discontinuous isolation structure. The configuration can be adjusted based on different panel design requirements. For example, when different light-emitting devices 400 need to be controlled individually, the isolation structure layer 300 defining different isolation openings 310a is insulated from each other. In this case, the isolation structure layer 300 surrounding the second sub-region NA22 is a discontinuously distributed isolation structure. When the same cathode voltage signal needs to be provided to light-emitting devices 400 in different locations, the isolation structure layer 300 defining different isolation openings 310a can be connected to each other. In this case, the isolation structure layer 300 surrounding the second sub-region NA22 is a continuously distributed isolation structure. In this embodiment, preferably, the isolation structure layer 300 surrounding the second sub-region NA22 can be a continuously distributed isolation structure.

[0443] FIG45 is a partial enlarged view of a second sub-area NA22 provided in an embodiment of the present application, and FIG46 is a partial cross-sectional view of a display panel motherboard 20 provided in an embodiment of the present application.

[0444] Please refer to the drawings in the aforementioned embodiments and FIG. 45 and FIG. 46 , an embodiment of the second aspect of the present application provides a display panel motherboard 20, the display panel motherboard 20 having a display area AA and a non-display area NA, the non-display area NA including a first area NA1 adjacent to the display area AA and a second area NA2 located on a side of the first area NA1 away from the display area AA, the second area NA2 including a first sub-area NA21 and a second sub-area NA22 located on a side of the first sub-area NA21 away from the first area NA1, and the display panel 10 including: a substrate 1 00; pixel definition layer 200, disposed on one side of substrate 100, pixel definition layer 200 includes pixel defining portion 210 and a plurality of pixel openings 220 enclosed by pixel defining portion 210; isolation structure layer 300, disposed on the side of pixel definition layer 200 away from substrate 100, isolation structure layer 300 includes isolation structure 310, edge structure 320 and auxiliary structure 330 spaced apart from edge structure 320, isolation structure 310 encloses isolation opening 310a located in display area AA, isolation opening 310a and pixel opening 220 are formed. The isolation structure 310 is connected, including a first isolation portion 311 and a second isolation portion 312 located on the side of the first isolation portion 311 away from the substrate 100, the edge structure 320 is located in the first area NA1, and the edge structure 320 encloses a functional opening 300b. The edge structure 320 includes a first edge portion 320a and a second edge portion 320b located on the side of the first edge portion 320a away from the substrate 100. The auxiliary structure 330 includes a second auxiliary structure 332 located in the second sub-area NA22, and at least a portion of the second edge portion 320b relative to the first edge portion 320a extends toward the functional opening 300b less than the second isolation portion 312 extends relative to the first isolation portion 311 toward the isolation opening 310a. A plurality of light-emitting devices 400, at least part of the structure of the light-emitting device 400 is arranged in the corresponding isolation opening 310a.

[0445] In the display panel motherboard 20 provided in the embodiment of the present application, the display panel motherboard 20 has a display area AA and a non-display area NA. The display panel motherboard 20 includes a substrate 100, a pixel definition layer 200, an isolation structure layer 300, and a plurality of light-emitting devices 400. The pixel definition layer 200 includes a pixel defining portion 210 and a plurality of pixel openings 220 formed by the pixel defining portion 210. The isolation structure layer 300 is disposed on a side of the pixel definition layer 200 away from the substrate 100. The isolation structure layer 300 includes an isolation structure 310, an edge structure 320, and an auxiliary structure 330 spaced apart from the edge structure 320. The isolation structure 310 encloses an isolation opening 310a located in the display area AA. The isolation opening 310a is connected to the pixel opening 220. Both the isolation structure 310 and the pixel definition layer 200 can be used to divide the sub-pixels of the display panel motherboard 20. At least a portion of the structure of the light emitting device 400 is disposed in the corresponding isolation opening 310 a . The light emitting device 400 in the isolation opening 310 a can be used to realize light emitting display in the display area AA of the display panel motherboard 20 .

[0446] The edge structure 320 is located in the first area NA1, and the edge structure 320 encloses a functional opening 300b. The functional opening 300b can help improve the transmittance of the non-display area NA, so that when the display panel motherboard 20 is applied to a display device, the photosensitive component used for sensing light in the display device can be correspondingly arranged under the functional opening, and the photosensitive component can better sense light through the functional opening.

[0447] The isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312 located on the side of the first isolation portion 311 facing away from the substrate 100. The edge structure 320 includes a first edge portion 320a and a second edge portion 320b located on the side of the first edge portion 320a facing away from the substrate 100. At least a portion of the second edge portion 320b has a length extending relative to the first edge portion 320a toward the functional opening 300b that is smaller than a length extending relative to the second isolation portion 312 toward the isolation opening 310a that is larger than the first isolation portion 311.

[0448] By setting the second isolation portion 312 to have a longer protruding length toward the isolation opening 310a relative to the first isolation portion 311, when preparing the light-emitting device 400 of the display panel motherboard 20, at least part of the material of the light-emitting device 400 can be directly vapor-deposited on the entire surface, and the second isolation portion 312 participating in enclosing and forming the isolation opening 310a can block at least part of the material used to prepare the light-emitting device 400, so as to separate the material of the light-emitting device 400 between adjacent sub-pixels, so as to form a plurality of light-emitting devices 400 that are spaced apart and located within the isolation opening 310a, so that when preparing the light-emitting device 400 of the display panel motherboard 20, there is no need to set a mask plate with high precision. For example, when vapor-depositing the material of the light-emitting device 400, there is no need to set a high-precision metal mask plate, thereby effectively reducing the production and preparation cost of the display panel motherboard 20.

[0449] By providing a shorter extension of at least a portion of the second edge portion 320b, which forms the functional opening 300b, relative to the first edge portion 320a, toward the functional opening 300b, during the manufacturing process of the display panel motherboard 20, when a new material, for example, an organic material, is formed on the isolation structure layer 300, the second edge portion 320b located around the functional opening 300b in the non-display area NA is less likely to block the organic material, allowing the new material to be deposited near the first edge portion 320a around the functional opening 300b. Furthermore, when the new material is formed on the isolation structure layer 300, the shorter extension of the second edge portion 320b is less likely to significantly block the exhaust of gas, preventing gas from accumulating beneath the second edge portion 320b around the functional opening 300b. This effectively improves the structural stability of the display panel motherboard 20 and, in turn, the process reliability of the display panel motherboard 20.

[0450] By setting the second auxiliary structure 332 including the second auxiliary structure 332 located in the second sub-area NA22, when the isolation structure layer 300 is etched, the etching material located in the functional opening 300b can also etch the material of the second auxiliary structure 332, so that the second auxiliary structure 332 can limit the etching material in the functional opening 300b from being transferred toward the edge structure 320, thereby effectively reducing the amount of etching of the edge structure 320 by the etching material, making the edge structure 320 less likely to be damaged by excessive etching, and effectively improving the structural stability of the display panel 10. Moreover, while reducing the amount of etching material on the material of the edge structure 320, the second auxiliary structure 332 can also facilitate the realization of the morphology of the edge structure 320 in the aforementioned embodiment, that is, the provision of the second auxiliary structure 332 can reduce the amount of etching material on the material of the edge structure 320, so as to facilitate the formation of a morphology structure in which the extension length of at least part of the second edge portion 320b relative to the first edge portion 320a toward the functional opening 300b is less than the extension length of the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a.

[0451] Optionally, the display panel motherboard 20 provided in the embodiment of the second aspect of the present application can be used to prepare the display panel 10 described in any of the aforementioned embodiments. For example, the second sub-region NA22 of the display panel motherboard 20 can be subjected to a hole-forming process to remove the second auxiliary structure 332 located within the second sub-region NA22 and the portion of the substrate 100 located below the second auxiliary structure 332 and form a functional hole H, thereby forming the display panel 10 in any of the aforementioned embodiments. Except for the distinguishing structural features between the functional hole H and the second auxiliary structure 332, the structure of the display panel motherboard 20 provided in the embodiment of the second aspect of the present application can be configured with reference to the structure of the display panel 10 in any of the aforementioned embodiments. Therefore, the display panel motherboard 20 provided in the embodiment of the present application can have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and this application will not elaborate on this in detail.

[0452] Optionally, the second auxiliary structure 332 may include a third auxiliary portion 332a and a fourth auxiliary portion 332b located on the side of the third auxiliary portion 332a facing away from the substrate 100, wherein the third auxiliary portion 332a may be set in the same layer and material as the first isolation portion 311 of the isolation structure 310 in any of the aforementioned embodiments, and the fourth auxiliary portion 332b may be set in the same layer and material as the second isolation portion 312 of the isolation structure 310 in any of the aforementioned embodiments, so that the second auxiliary structure 332 can be prepared using the same or similar preparation process as the isolation structure 310 in any of the aforementioned embodiments.

[0453] In some optional embodiments, there are multiple auxiliary structures 330 , drainage grooves 332 c are formed between adjacent second auxiliary structures 332 , and auxiliary drainage grooves 332 d communicating with the drainage grooves 332 c are formed on the second auxiliary structures 332 .

[0454] In this optional embodiment, by providing the drainage groove 332c and the drainage auxiliary groove 332d, when a new material is formed on the isolation structure layer 300 during the preparation of the display panel motherboard 20, the contact area between the second auxiliary structure 332 and the new material is increased, and the adhesion between the second auxiliary structure 332 and the new material is increased, which can reduce the accumulation of gas around the second auxiliary structure 332, thereby effectively reducing the probability of adverse problems.

[0455] In some optional embodiments, the second auxiliary structure 332 includes a through hole that passes through the second auxiliary structure 332 and is formed as a positioning mark opening 332e, or a pattern formed by areas surrounded by multiple second auxiliary structures 332 is formed as a positioning mark opening 332e.

[0456] In this optional embodiment, the positioning mark opening 332e can be used to position the mask used in the process of setting up the structure such as the light-emitting device 400. By setting the positioning mark opening 332e in the second sub-area NA22, the alignment and fixing accuracy of the mask can be improved, thereby improving the manufacturing accuracy of the display panel 10.

[0457] The second aspect of the present application also provides a display panel motherboard. FIG47 is a top view of a display panel motherboard 20 provided in an embodiment of the present application. FIG48 is a partially enlarged view of the second sub-area NA22 of the display panel in FIG47 . FIG49 is a cross-sectional view of the display panel motherboard 20 along section line AA in FIG47 . Referring to FIG47-49 , the display panel motherboard 20 includes: a substrate 110; a pixel definition layer 200 located on one side of the substrate 110; and a defining structure located on a side of the pixel definition layer 200 away from the substrate 110. The defining structure includes an edge structure 320 and a second auxiliary structure 332. The edge structure 320 is located in a first specific area TA, enclosing a plurality of isolation openings 310a in the first specific area TA. The edge structure 320 surrounds at least a portion of the second sub-area NA22. The second auxiliary structure 332 is located in the second sub-area NA22, and at least one second auxiliary structure 332 is provided.

[0458] Optionally, the embodiment of the second aspect of the present application also provides a display panel motherboard 20 which may be the display panel motherboard 20 in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel motherboard 20 which may have the beneficial effects of the display panel motherboard 20 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0459] Optionally, the embodiment of the second aspect of the present application further provides a display panel motherboard 20 that can be used to prepare the display panel 10 described in any of the aforementioned embodiments. For example, the second sub-region NA22 of the display panel motherboard 20 can be subjected to a hole-forming process to remove the second auxiliary structure 332 located within the second sub-region NA22 and the portion of the substrate 110 located below the second auxiliary structure 332 and form a functional hole, thereby forming the display panel 10 in any of the aforementioned embodiments. Except for the distinguishing structural features of the functional hole H and the second auxiliary structure 332, the structure of the display panel motherboard 20 provided in the embodiment of the second aspect of the present application can be configured with reference to the structure of the display panel 10 in any of the aforementioned embodiments. Therefore, the display panel motherboard 20 provided in the embodiment of the present application can have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and this application will not elaborate on this in detail.

[0460] Optionally, the limiting structure may include the isolation structure 310 and the edge structure 320 in any of the aforementioned embodiments.

[0461] The first specific area TA can subsequently form a display area for displaying images, and the second sub-area NA22 can subsequently form an aperture area to facilitate the placement of photosensitive components such as cameras. Of course, in some other embodiments, the first specific area TA may also include a non-display area located between the display area and the aperture area. The first specific area TA surrounds at least a portion of the second sub-area NA22. For example, the first specific area TA surrounds the entire second sub-area NA22 or a portion of the second sub-area NA22. The display panel motherboard 20 may also include a drive circuit layer located between the substrate 110 and the pixel definition layer 200. The drive circuit layer may include multiple pixel drive circuits for driving the light-emitting structures to emit light, with each light-emitting structure corresponding to a pixel drive circuit. The pixel drive circuit may include at least two thin-film transistors and at least one capacitor. For example, each pixel drive circuit may include seven thin-film transistors and one capacitor. The drive circuit layer is electrically connected to the first electrode layer 410. The first electrode layer 410 may be an anode or a cathode of the light-emitting structure.

[0462] Furthermore, an edge structure 320 and a second auxiliary structure 332 are disposed on a surface of the pixel definition layer 200 away from the substrate 110. The edge structure 320 is disposed in the first specific area TA and surrounds at least a portion of the second sub-area NA22. The edge structure 320 may include a first edge portion 320a and a second edge portion 320b. The second edge portion 320b is disposed on a side of the first edge portion 320a away from the substrate 110. The orthographic projection of the second edge portion 320b on the substrate 110 overlaps the orthographic projection of the first edge portion 320a on the substrate 110, and the edge of the orthographic projection of the second edge portion 320b on the substrate 110 does not overlap the edge of the orthographic projection of the first edge portion 320a on the substrate 110. The second auxiliary structure 332 is disposed in the second sub-area NA22.

[0463] The pixel definition layer 200 within each isolation opening 310a may include a pixel opening 220. The isolation openings 310a, as defined by the defining structure, are used to separate multiple light-emitting structures from one another. Each isolation opening 310a contains a pixel opening 220, each of which is used to house a light-emitting structure. The second electrode of each light-emitting structure can be disconnected from the second electrodes of other light-emitting structures by the defining structure, allowing each light-emitting structure to be individually packaged. In other embodiments, each isolation opening 310a contains multiple pixel openings 220, and the light-emitting structures housed in the multiple pixel openings 220 emit the same color. The edge structure 320 surrounding at least a portion of the second sub-area NA22 may encompass the entire second sub-area NA22 or a portion of the second sub-area NA22. For example, when the first specific area TA surrounds the entire second sub-area NA22, the edge structure 320 surrounds the entire second sub-area NA22. When the first specific area TA surrounds a portion of the second sub-area NA22, the edge structure 320 surrounds a portion of the second sub-area NA22.

[0464] Specifically, FIG50 is a cross-sectional view of a display panel motherboard 20 manufacturing process provided in an embodiment of the present application. Referring to FIG49 and FIG50 , during the manufacturing process of the display panel motherboard 20, the pixel definition layer 200 is first manufactured, then the edge structure 320 and the second auxiliary structure 332 are manufactured, and then the pixel definition layer 200 is patterned to form the pixel opening 220. During the patterning process of the pixel definition layer 200, a first protective material layer 10a is applied, and the first protective material layer 10a is patterned through a photolithography process to expose the pixel definition layer 200 to be etched. FIG5 shows the patterned first protective material layer 10a, which exposes the pixel definition layer 200 to be etched in the first specific area TA. By providing the second auxiliary structure 332 in the second sub-area NA22, the manufacturing yield of the display panel motherboard 20 can be improved.

[0465] In addition, the second sub-region NA22 may be provided with one, two, or more second auxiliary structures 332. The second auxiliary structures 332 can improve the adhesion between the first protective material layer 10a and the second sub-region NA22. The second auxiliary structures 332 can also reduce gas accumulation by draining the first protective material layer 10a so that the first protective material layer 10a completely covers the area adjacent to the second sub-region NA22 and the edge structure 320. The second auxiliary structures 332 can also be made of metal materials to increase the metal density of the second sub-region NA22, reduce the amount of undercutting of the edge structure 320, and reduce gas accumulation.

[0466] In the embodiment of the present application, a second auxiliary structure 332 and an edge structure 320 are arranged on the surface of the pixel definition layer 200 away from the substrate 110. The edge structure 320 is arranged in the first specific area TA, and the edge structure 320 surrounds at least a portion of the second sub-area NA22. The second auxiliary structure 332 is arranged in the second sub-area NA22. When the first protective material layer 10a required for etching the pixel definition layer 200 is arranged during the etching process of the pixel definition layer 200, the second auxiliary structure 332 can be adhered to the coated first protective material layer 10a, thereby improving the production yield of the display panel motherboard 20.

[0467] Optionally, with continued reference to FIG. 48 to FIG. 50 , at least a portion of the edge of the orthographic projection of the second auxiliary structure 332 on the substrate 110 is a concave-convex edge.

[0468] Specifically, the convex portion of the concave-convex edge protrudes outwardly from the second auxiliary structure 332, and the concave portion is concave inwardly from the second auxiliary structure 332. At least a portion of the edge of the orthographic projection of the second auxiliary structure 332 on the substrate 110 is a concave-convex edge. This may be a portion of the edge of the orthographic projection of the second auxiliary structure 332 on the substrate 110 that is a concave-convex edge, or the entire edge of the orthographic projection of the second auxiliary structure 332 on the substrate 110 that is a concave-convex edge.

[0469] The pixel definition layer 200 and the surface of the second auxiliary structure 332 between the second auxiliary structure 332 and the edge structure 320 have a certain height difference. This allows the photoresist on the surface of the second auxiliary structure 332 to flow more easily into the surface of the pixel definition layer 200 between the second auxiliary structure 332 and the edge structure 320 when applying photoresist, allowing the photoresist to cover the area near the edge structure 320. At the same time, the contact between the photoresist and the second auxiliary structure 332 increases adhesion, thereby reducing the probability of defects. Furthermore, by configuring the edge of the second auxiliary structure 332 adjacent to the edge structure 320 to have at least a partially concave-convex edge as its orthographic projection on the substrate 110, the first protective material layer 10a and the second auxiliary structure 332 have a larger contact area between the edge structure 320 and the second auxiliary structure 332, resulting in greater adhesion between the first protective material layer 10a and the second auxiliary structure 332, further reducing the probability of defects.

[0470] Optionally, an edge of an orthographic projection of the second auxiliary structure 332 on the substrate 110 is in at least one of a sawtooth shape, a wavy line shape, and a broken line shape.

[0471] Specifically, the zigzag, wavy, and broken-line edges can all provide the edge structure 320 with a larger contact area with the first protective material layer 10 a .

[0472] Figure 51 is an enlarged view of another second sub-area NA22 provided in an embodiment of the present application. Optionally, referring to Figure 51, the second auxiliary structure 332 includes at least one drainage groove 332c, which extends from the edge of the second auxiliary structure 332 to the center of the second auxiliary structure 332, and the drainage groove 332c is connected to the outside world, that is, the end of the drainage groove 332c away from the center of the second auxiliary structure 332 is connected to the outside world.

[0473] Specifically, by providing the drainage groove 332c, the contact area between the second auxiliary structure 332 and the first protective material layer 10a is further increased, the adhesion between the first protective material layer 10a and the second auxiliary structure 332 is further increased, and the probability of defective problems is further reduced.

[0474] Optionally, a plurality of drainage grooves 332 c are provided, and the plurality of drainage grooves 332 c are arranged at intervals along the circumference of the second auxiliary structure 332 .

[0475] Exemplarily, the plurality of drainage grooves 332 c are evenly arranged along the circumference of the second auxiliary structure 332 .

[0476] Optionally, along a direction perpendicular to the substrate 110 , the depth of the drainage groove 332 c is equal to the thickness of the second auxiliary structure 332 .

[0477] That is, along the thickness direction of the second auxiliary structure 332, the drainage groove 332c penetrates the second auxiliary structure 332, thereby increasing the side wall area of ​​the drainage groove 332c, further increasing the contact area between the second auxiliary structure 332 and the first protective material layer 10a, further increasing the adhesion between the first protective material layer 10a and the second auxiliary structure 332, and further reducing the probability of adverse problems occurring.

[0478] Figure 52 is an enlarged view of another second sub-region NA22 provided in an embodiment of the present application. Optionally, referring to Figure 52, the edge of the drainage groove 332c on the positive projection of the substrate 110 is at least partially a concave-convex structure 332f, which further increases the sidewall area of ​​the drainage groove 332c, further increases the contact area between the second auxiliary structure 332 and the first protective material layer 10a, and further increases the adhesion between the first protective material layer 10a and the second auxiliary structure 332, further reducing the probability of adverse problems.

[0479] Optionally, the edge of the orthographic projection of the drain groove 332c on the substrate 110 is in at least one of a sawtooth shape, a wavy line shape, and a broken line shape.

[0480] Specifically, the zigzag, wavy, and broken-line edges can all provide a larger contact area between the edge structure 320 and the first protective material layer 10 a , thereby better improving the adhesion between the first protective material layer 10 a and the second auxiliary structure 332 .

[0481] Figure 53 is a partially enlarged view of another second sub-region NA22 provided in an embodiment of the present application. Optionally, referring to Figures 50 and 53, the second sub-region NA22 includes at least two second auxiliary structures 332, and there is a gap between adjacent second auxiliary structures 332.

[0482] Specifically, at least two second auxiliary structures 332 can be arranged in an array. The edges of each second auxiliary structure 332 contact the first protective material layer 10a, further increasing the contact area between the second auxiliary structures 332 and the first protective material layer 10a and the adhesion between the first protective material layer 10a and the second auxiliary structures 332, thereby further reducing the probability of defects. Furthermore, adjacent second auxiliary structures 332 are spaced apart to prevent the formation of closed patterns between the second auxiliary structures 332. This effectively prevents gas accumulation between the photoresist and the second auxiliary structures 332 during the subsequent photoresist coating process.

[0483] Optionally, the edge of each second auxiliary structure 332 includes a concave-convex edge in the positive projection on the substrate 110, further increasing the contact area between the second auxiliary structure 332 and the first protective material layer 10a, thereby further increasing the adhesion between the first protective material layer 10a and the second auxiliary structure 332, and further reducing the probability of defective problems occurring.

[0484] Figure 54 is an enlarged view of another second sub-area NA22 provided in an embodiment of the present application. Optionally, referring to Figures 53 and 54, the display panel motherboard 20 further includes a positioning mark opening 332e, and the positioning mark opening 332e is located in the second sub-area NA22.

[0485] Among them, the positioning mark opening 332e is used to position the mask used in the process of setting up structures such as the light-emitting layer 420. By setting the positioning mark opening 332e in the second sub-area NA22, the alignment and fixing accuracy of the mask can be further improved, thereby improving the manufacturing accuracy of the display panel.

[0486] Optionally, the second auxiliary structure 332 includes a through hole, which is a positioning mark opening 332e, or, referring to FIG. 53 or FIG. 54 , a plurality of areas surrounded by the second auxiliary structure 332 are positioning mark openings 332e.

[0487] With this arrangement, the first protective material layer 10a can be filled in the positioning mark opening 332e, further increasing the contact area between the second auxiliary structure 332 and the first protective material layer 10a, further increasing the adhesion between the first protective material layer 10a and the second auxiliary structure 332, and further reducing the probability of defective problems occurring.

[0488] Optionally, Figure 55 is a cross-sectional view of another display panel motherboard 20 provided in an embodiment of the present application. Referring to Figure 55, along the direction perpendicular to the substrate 110, the thickness of the second auxiliary structure 332 is the same as the height of the edge structure 320, and the second auxiliary structure 332 and the edge structure 320 are made of the same material.

[0489] With this arrangement, the second auxiliary structure 332 and the edge structure 320 can be manufactured in the same process, thereby reducing process costs.

[0490] 55 , the edge structure 320 includes a first edge portion 320a and a second edge portion 320b, the second edge portion 320b being arranged on a side of the first edge portion 320a away from the substrate 110, the orthographic projection of the second edge portion 320b on the substrate 110 covering the orthographic projection of the first edge portion 320a on the substrate 110, and the edge of the orthographic projection of the second edge portion 320b on the substrate 110 does not overlap with the edge of the orthographic projection of the first edge portion 320a on the substrate 110.

[0491] Specifically, the orthographic projection of the second edge portion 320b on the substrate 110 covers the orthographic projection of the first edge portion 320a on the substrate 110, and the edge of the orthographic projection of the second edge portion 320b on the substrate 110 does not overlap with the edge of the orthographic projection of the first edge portion 320a on the substrate 110, that is, the first edge portion 320a in the edge structure 320 is retracted a certain distance relative to the second edge portion 320b.

[0492] Optionally, the second auxiliary structure 332 includes a third auxiliary portion 332a and a fourth auxiliary portion 332b; the fourth auxiliary portion 332b is arranged on the side of the third auxiliary portion 332a away from the substrate, the orthographic projection of the fourth auxiliary portion 332b on the substrate 110 covers the orthographic projection of the third auxiliary portion 332a on the substrate 110, and the edge of the orthographic projection of the fourth auxiliary portion 332b on the substrate 110 does not overlap with the edge of the orthographic projection of the third auxiliary portion 332a on the substrate 110.

[0493] Specifically, the orthographic projection of the fourth auxiliary portion 332b on the substrate 110 overlaps the orthographic projection of the third auxiliary portion 332a on the substrate 110, and the edge of the orthographic projection of the fourth auxiliary portion 332b on the substrate 110 does not overlap the edge of the orthographic projection of the third auxiliary portion 332a on the substrate 110. In other words, the third auxiliary portion 332a is retracted relative to the fourth auxiliary portion 332b by a certain distance. This arrangement allows the second auxiliary structure 332 to be manufactured using the same process as the edge structure 320, eliminating the need for a new process and reducing process costs.

[0494] Optionally, the third auxiliary portion 332a is provided at the same layer as the first edge portion 320a, and has the same material and thickness; the fourth auxiliary portion 332b is provided at the same layer as the second edge portion 320b, and has the same material and thickness.

[0495] This arrangement allows the second auxiliary structure 332 to be formed in the same process as the edge structure 320, reducing process costs. Furthermore, the third auxiliary portion 332a is made of the same material as the first edge portion 320a. This allows the etchant that etches the first edge portion 320a to simultaneously etch the third auxiliary portion 332a during the formation of the edge structure 320. This prevents the etchant from excessively etching the first edge portion 320a, thereby preventing significant inward retraction of the first edge portion 320a and reducing gas accumulation, thereby reducing defects on the production line.

[0496] Optionally, the third auxiliary portion 332a and the first edge portion 320a are made of aluminum, silver, or copper, and the fourth auxiliary portion 332b and the second edge portion 320b are made of titanium or molybdenum. Specifically, the third auxiliary portion 332a and the first edge portion 320a are made of aluminum, and the fourth auxiliary portion 332b and the second edge portion 320b are made of titanium.

[0497] Optionally, Figure 56 is a cross-sectional view of another display panel motherboard 20 provided in an embodiment of the present application. Referring to Figure 56, the edge structure 320 also includes a third isolation layer 303, which is arranged on the side of the first edge portion 320a facing the substrate 110, and the orthographic projection of the first edge portion 320a on the substrate 110 is located within the orthographic projection of the third isolation layer 303 on the substrate 110; the second auxiliary structure 332 also includes a third isolation layer 303, which is arranged on the side of the third auxiliary portion 332a facing the substrate 110, and the orthographic projection of the third auxiliary portion 332a on the substrate 110 is located within the orthographic projection of the third isolation layer 303 on the substrate 110.

[0498] Specifically, the cross-sections of the edge structure 320 and the second auxiliary structure 332 are both I-shaped. The second auxiliary structure 332 can be manufactured using the same process as the edge structure 320 to reduce process costs.

[0499] Optionally, the third isolation layer 303 is provided on the same layer as the third isolation layer 303 , and has the same material and thickness.

[0500] With this arrangement, the third isolation layer 303 can be formed in the same process as the third isolation layer 303 , and the second auxiliary structure 332 can be formed in the same process as the edge structure 320 , thereby reducing process costs.

[0501] Optionally, the material of the third isolation layer 303 and the third isolation layer 303 includes molybdenum or titanium. Specifically, the material of the third isolation layer 303 and the third isolation layer 303 is molybdenum.

[0502] Optionally, referring to FIG. 53 , a plurality of second auxiliary structures 332 are provided in the second sub-region NA22 , and the plurality of second auxiliary structures 332 are arranged at intervals.

[0503] Optionally, when the second auxiliary structure 332 includes a third auxiliary part 332a, a fourth auxiliary part 332b and a third isolation layer 303, the edge of the positive projection of the second auxiliary structure 332 on the substrate 110 is at least one of a serrated shape, a wavy line shape, and a broken line shape, which further increases the adhesion between the first photoresist layer and the second auxiliary structure 332 and further reduces the probability of occurrence of defects.

[0504] In addition, referring to FIG55 and FIG56 , the defining structure further includes an isolation structure 310. The isolation structure 310 is located on a side of the pixel definition layer 200 away from the substrate 110. The isolation structure 310 is located in the first specific area TA and is located on a side of the edge structure 320 away from the second auxiliary structure 332.

[0505] Specifically, the isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312. The first isolation portion 311 is provided on the same layer as the first edge portion 320a and is made of the same material and thickness. The second isolation portion 312 is provided on the same layer as the second edge portion 320b and is made of the same material and thickness. The orthographic projection of the second isolation portion 312 on the substrate 110 overlaps the orthographic projection of the first isolation portion 311 on the substrate 110, and the edge of the orthographic projection of the second isolation portion 312 on the substrate 110 does not overlap with the edge of the orthographic projection of the first isolation portion 311 on the substrate. The distance between the edge of the orthographic projection of the second edge portion 320b on the substrate 110 facing the second sub-region NA22 and the edge of the orthographic projection of the first edge portion 320a on the substrate 110 facing the second sub-region NA22 is D1. The distance between the edge of the orthographic projection of the second isolation portion 312 on the substrate 110 and the edge of the orthographic projection of the first isolation portion 311 on the substrate 110 is D2, and D1 is greater than or equal to D2.

[0506] Furthermore, the difference between D1 and D2 is less than or equal to 0.3 μm, that is, D1-D2≤0.3 μm. For example, the difference between D1 and D2 is 0.3 μm, 0.25 μm, 0.2 μm, 0.18 μm, 0.15 μm, 0.12 μm, 0.08 μm, 0.05 μm, 0.03 μm, 0.01 μm, or 0 μm.

[0507] 56 , the isolation structure 310 further includes a third isolation layer 303, which is disposed on the side of the first isolation portion 311 facing the substrate 110, and the orthographic projection of the first isolation portion 311 on the substrate 110 is located within the orthographic projection of the third isolation layer 303 on the substrate 110. It is worth noting that the edge structure 320 and the isolation structure 310 may be connected in the first specific area TA to form a mesh structure, and the edge structure 320 and the isolation structure 310 may enclose an isolation opening, where the pixel opening 220 is disposed, or the pixel opening 220 is disposed where the isolation structure 310 encloses an isolation opening. In other embodiments, the edge structure 320 and the isolation structure 310 may also be disconnected, in which case the pixel opening 220 may be disposed where the isolation structure 310 encloses an isolation opening in the first specific area TA.

[0508] Optionally, the third isolation layer 303 is provided in the same layer as the third isolation layer 303 and has the same material and thickness. Therefore, the edge structure 320 and the isolation structure 310 can be formed in the same process, reducing process costs.

[0509] The embodiment of the second aspect of the present application further provides a display panel motherboard. FIG57 is a cross-sectional view of another display panel motherboard 20 provided in the embodiment of the present application. Referring to FIG57 , the display panel motherboard 20 includes:

[0510] substrate 110;

[0511] a pixel definition layer 200 located on one side of the substrate 110;

[0512] A defining structure and a second auxiliary structure 332 located on a side of the pixel definition layer 200 away from the substrate 110;

[0513] The defining structure includes an edge structure 320, which is located in the first specific area TA and surrounds at least a portion of the second sub-area NA22. The edge structure 320 includes a first edge portion 320a and a second edge portion 320b. The second edge portion 320b is disposed on a side of the first edge portion 320a away from the substrate. The orthographic projection of the second edge portion 320b on the substrate 110 covers the orthographic projection of the first edge portion 320a on the substrate 110, and the edge of the orthographic projection of the second edge portion 320b on the substrate 110 does not overlap with the edge of the orthographic projection of the first edge portion 320a on the substrate 110.

[0514] The second auxiliary structure 332 is located in the second sub-region NA22 and is provided with at least one second auxiliary structure 332 . The second auxiliary structure 332 includes a third auxiliary portion 332 a , and the material of the third auxiliary portion 332 a is the same as that of the first edge portion 320 a .

[0515] In the embodiment of the present application, a second auxiliary structure 332 and an edge structure 320 are formed on the surface of the pixel definition layer 200 away from the substrate 110. The edge structure 320 is arranged in the first specific area TA, and the edge structure 320 surrounds at least a portion of the second sub-area NA22. The second auxiliary structure 332 is arranged in the second sub-area NA22. The second auxiliary structure 332 includes a third auxiliary portion 332a. The material of the third auxiliary portion 332a is the same as that of the first edge portion 320a. When the edge structure 320 and the second auxiliary structure 332 are etched, the etching liquid that etches the first edge portion 320a can simultaneously etch the third auxiliary portion 332a, which can avoid the etching liquid from etching the first edge portion 320a too much, avoid the first edge portion 320a from shrinking too much, reduce gas accumulation, and improve the production yield of the display panel motherboard 20.

[0516] Optionally, the embodiment of the second aspect of the present application also provides a display panel motherboard 20 which may be the display panel motherboard 20 in any of the aforementioned embodiments. Therefore, the embodiment of the present application also provides a display panel motherboard 20 which may have the beneficial effects of the display panel motherboard 20 in any of the aforementioned embodiments, and the present application will not elaborate on it.

[0517] Optionally, the embodiment of the second aspect of the present application further provides a display panel motherboard 20 that can be used to prepare the display panel 10 described in any of the aforementioned embodiments. For example, the second sub-region NA22 of the display panel motherboard 20 can be subjected to a hole-forming process to remove the second auxiliary structure 332 located within the second sub-region NA22 and the portion of the substrate 110 located below the second auxiliary structure 332 and form a functional hole, thereby forming the display panel 10 in any of the aforementioned embodiments. Except for the distinguishing structural features of the functional hole H and the second auxiliary structure 332, the structure of the display panel motherboard 20 provided in the embodiment of the second aspect of the present application can be configured with reference to the structure of the display panel 10 in any of the aforementioned embodiments. Therefore, the display panel motherboard 20 provided in the embodiment of the present application can have the beneficial effects of the display panel 10 in any of the aforementioned embodiments, and this application will not elaborate on this in detail.

[0518] Optionally, the limiting structure may include the isolation structure 310 and the edge structure 320 in any of the aforementioned embodiments.

[0519] Optionally, the third auxiliary portion 332a and the first edge portion 320a are made of aluminum, silver, or copper, and the second edge portion 320b is made of titanium or molybdenum. Specifically, the third auxiliary portion 332a and the first edge portion 320a are made of aluminum, and the second edge portion 320b is made of titanium.

[0520] The first specific area TA and the second sub-area NA22 in this embodiment can refer to the description of the above embodiment; in addition, the edge structure 320 can also include a third isolation layer 303, and the second auxiliary structure 332 can include a third isolation layer 303. The specific design can refer to the description of the above embodiment and will not be repeated here; in other embodiments, the second auxiliary structure 332 may also not have the third isolation layer 303, that is, only the third auxiliary part 332a.

[0521] Optionally, with continued reference to FIG. 53 , a plurality of second auxiliary structures 332 are provided in the second sub-area NA22 , and the plurality of second auxiliary structures 332 are arranged at intervals.

[0522] Optionally, at least a portion of an edge of the orthographic projection of the third auxiliary portion 332a on the substrate is a concave-convex edge.

[0523] Specifically, the structure and function of the concave-convex edge of the third auxiliary portion 332a are similar to those of the concave-convex edge shown in Figure 48, and will not be repeated here.

[0524] Optionally, an edge of the orthographic projection of the third auxiliary portion 332a on the substrate is in at least one of a sawtooth shape, a wavy line shape, and a broken line shape.

[0525] In addition, as shown in FIG57 , the defining structure further includes an isolation structure 310 , which is located on a side of the pixel definition layer 200 away from the substrate 110 , the isolation structure 310 is located in the first specific area TA, and the isolation structure 310 is located on a side of the edge structure 320 away from the second auxiliary structure 332 ;

[0526] Specifically, the isolation structure 310 includes a first isolation portion 311 and a second isolation portion 312. The first isolation portion 311 is provided on the same layer as the first edge portion 320a and is made of the same material and thickness. The second isolation portion 312 is provided on the same layer as the second edge portion 320b and is made of the same material and thickness. The orthographic projection of the second isolation portion 312 on the substrate 110 overlaps the orthographic projection of the first isolation portion 311 on the substrate 110, and the edge of the orthographic projection of the second isolation portion 312 on the substrate 110 does not overlap with the edge of the orthographic projection of the first isolation portion 311 on the substrate. The distance between the edge of the orthographic projection of the second edge portion 320b on the substrate 110 facing the second sub-region NA22 and the edge of the orthographic projection of the first edge portion 320a on the substrate 110 facing the second sub-region NA22 is D1. The distance between the edge of the orthographic projection of the second isolation portion 312 on the substrate 110 and the edge of the orthographic projection of the first isolation portion 311 on the substrate 110 is D2, and D1 is greater than or equal to D2.

[0527] Furthermore, the difference between D1 and D2 is less than or equal to 0.3 μm, that is, D1-D2≤0.3 μm. For example, the difference between D1 and D2 is 0.3 μm, 0.25 μm, 0.2 μm, 0.18 μm, 0.15 μm, 0.12 μm, 0.08 μm, 0.05 μm, 0.03 μm, 0.01 μm, or 0 μm.

[0528] In some embodiments, the isolation structure 310 further includes a third isolation layer 303 , for details of which reference may be made to the description of the third isolation layer 303 in the above embodiments, which will not be repeated here.

[0529] FIG58 is a schematic flow chart of a method for preparing a display panel 10 according to an embodiment of the present application, and FIG59 to FIG65 are schematic diagrams of the preparation process of a method for preparing a display panel 10 according to an embodiment of the present application.

[0530] Referring to FIG. 58 and FIG. 59 to FIG. 65 , an embodiment of a third aspect of the present application provides a method for manufacturing a display panel 10. The display panel 10 may be the display panel 10 provided in any of the embodiments of the first aspect described above. The display panel 10 has a display area AA and a non-display area NA. The manufacturing method includes:

[0531] Step S10: As shown in FIG. 59 , a pixel definition material layer 11 is prepared on the substrate 100 .

[0532] Step S20: As shown in Figures 60 to 63, an isolation structure layer 300 is prepared on the pixel definition material layer 11. The isolation structure layer 300 includes a first isolation layer 301 and a second isolation layer 302 located on the side of the first isolation layer 301 facing away from the substrate 100. The isolation structure layer 300 encloses at least a portion of the first type opening 300a located in the display area AA and a functional opening 300b located in the non-display area NA. The extension length of at least a portion of the second isolation layer 302 that participates in enclosing the functional opening 300b relative to the first isolation layer 301 toward the functional opening 300b is less than the extension length of the second isolation layer 302 that participates in enclosing at least a portion of the first type opening 300a relative to the first isolation layer 301 toward the first type opening 300a.

[0533] Optionally, the isolation structure layer 300 may be the isolation structure layer 300 in any of the aforementioned embodiments, and the isolation structure layer 300 may include the isolation structure 310 , the edge structure 320 , and the auxiliary structure 330 in any of the aforementioned embodiments.

[0534] Optionally, the functional opening 300b can help improve the transmittance of the non-display area NA, so that when the display panel 10 is applied to a display device, the photosensitive component for sensing light in the display device can be correspondingly arranged under the functional opening, and the photosensitive component can better sense light through the functional opening.

[0535] Step S30: as shown in FIG. 64 , a first protective material layer 10 a is coated on the isolation structure layer 300 , and the first protective material layer 10 a forms a first hollow region 10 aa at the first type of opening 300 a located in the display area AA.

[0536] Optionally, the first protective material layer 10a may include photoresist.

[0537] Step S40: As shown in FIG64a, the portion of the pixel definition material layer 11 exposed from the first hollow area 10aa and the first type opening 300a located in the display area AA is patterned to form at least a portion of the pixel opening 220, which is connected to the first type opening 300a.

[0538] In the method for preparing the display panel 10 provided in the embodiment of the present application, by setting in step S20 that the extension length of at least a portion of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is shorter than the extension length of the second isolation layer 302 relative to the first isolation layer 301 toward the first-type opening 300a, when the first protective material layer 10a is applied in step S30, the second isolation layer 302 located around the functional opening 300b in the non-display area NA is less likely to block the organic material, allowing the new material to fall preferably near the first isolation layer 301 around the functional opening 300b. Furthermore, when the first protective material layer 10a is applied in step S30, the second isolation layer 302 with a shorter extension length is less likely to significantly block the exhaust of gas, making it less likely that gas will remain below the second isolation layer 302 around the functional opening 300b, thereby significantly improving the structural stability of the display panel 10 and, in turn, the process reliability of the display panel 10.

[0539] In some optional embodiments, step S20 may include:

[0540] Step S21 : as shown in FIG. 60 , a first isolation material layer 12 is formed on the pixel definition material layer 11 and located in the display area AA and the non-display area NA.

[0541] Optionally, the first isolation material layer 12 may be used to participate in forming the first isolation layer 301 .

[0542] Step S22 : As shown in FIG. 61 , a second isolation material layer 13 is formed on the first isolation material layer 12 and located in the display area AA and the non-display area NA.

[0543] Optionally, the second isolation material layer 13 may be used to participate in forming the second isolation layer 302 .

[0544] Step S23: As shown in FIG62 , the first isolation material layer 12 and the second isolation material layer 13 in the display area AA and the non-display area NA are dry-etched to form an isolation primary structure 14 at least partially located in the display area AA, an edge primary structure 15 connected to the isolation primary structure 14 and located in the non-display area NA, and an auxiliary primary structure 16 spaced apart from the edge primary structure 15 and located in the non-display area NA. The isolation primary structure 14 encloses an isolation primary opening 14a, the edge primary structure 15 encloses a functional primary opening 15a, and the auxiliary primary structure 16 is located in the functional primary opening 15a.

[0545] Optionally, the isolation initial structure 14 can be used to form the isolation structure 310 of the isolation structure layer 300, the isolation initial opening 14a can be used to form the isolation opening 310a of the isolation structure 310, the edge initial structure 15 can be used to form the edge structure 320 of the isolation structure layer 300, the functional initial opening 15a can be used to form the functional opening 300b of the edge structure 320, and the auxiliary initial structure 16 can be used to form the auxiliary structure 330.

[0546] Optionally, the auxiliary initial structure 16 may be closer to the edge initial structure 15, so that there is less etching material between the auxiliary initial structure 16 and the edge initial structure 15 in the subsequent preparation process, so that the auxiliary initial structure 16 can better affect the degree of etching of the edge initial structure 15 by the etching material in the subsequent preparation process. For example, the auxiliary initial structure 16 can better reduce the degree of etching of the edge initial structure 15 by the etching material in the subsequent preparation process, thereby better facilitating the formation of a morphology in which at least part of the second edge portion 320b relative to the first edge portion 320a toward the functional opening 300b is shorter than the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a in the subsequent preparation process.

[0547] Step S24 : as shown in FIG. 63 , wet etching is performed on the isolation preliminary structure 14 , the edge preliminary structure 15 and the auxiliary preliminary structure 16 to form an isolation structure layer 300 .

[0548] In these optional embodiments, by preparing an auxiliary initial structure 16 located within the functional initial opening 15a in step S23, when the isolation initial structure 14, the edge initial structure 15 and the auxiliary initial structure 16 are wet-etched in step S24, the etching material located within the functional opening 300b can also etch the auxiliary initial structure 16, so that the auxiliary initial structure 16 can limit the etching material within the functional opening 300b from being transferred toward the edge initial structure 15, thereby effectively reducing the amount of etching material on the material of the edge initial structure 15, making it less likely that the edge initial structure 15 is damaged by excessive etching, and effectively improving the structural stability of the display panel 10. Moreover, while reducing the amount of etching material on the material of the edge preliminary structure 15, the auxiliary preliminary structure 16 can also facilitate the realization of the morphology of the edge structure 320 in the aforementioned embodiment, that is, the provision of the auxiliary preliminary structure 16 can reduce the amount of etching material on the material of the edge preliminary structure 15, so as to facilitate the formation of a morphology in which the protruding length of at least part of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is less than the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the first type opening 300a. Specifically, it can facilitate the formation of a morphology in which the protruding length of at least part of the second edge portion 320b relative to the first edge portion 320a toward the functional opening 300b is less than the protruding length of the second isolation portion 312 relative to the first isolation portion 311 toward the isolation opening 310a.

[0549] In some optional embodiments, the isolation structure layer 300 includes an isolation structure 310 at least partially located in the display area AA, an edge structure 320 connected to the isolation structure 310 and located in the non-display area NA, and an auxiliary structure 330 spaced apart from the edge structure 320 and located in the non-display area NA. As shown in FIG. 46 , the auxiliary structure 330 includes a second auxiliary structure 332. After step S40, the following steps may be performed:

[0550] Step S50: As shown in FIG. 46 and FIG. 65 , the isolation structure layer 300 and the substrate 100 are subjected to a hole-opening process to remove the second auxiliary structure 332 in the non-display area NA and a portion of the substrate 100 below the second auxiliary structure 332 and form a functional hole H.

[0551] Optionally, the preparation of the light-emitting device 400 in any of the aforementioned embodiments may be performed between step S40 and step S50.

[0552] FIG66 is a schematic diagram of a manufacturing process of a method for manufacturing a display panel 10 provided in another embodiment of the present application.

[0553] In some optional embodiments, step S20 may include:

[0554] Step S21 : as shown in FIG. 60 , a first isolation material layer 12 is formed on the pixel definition material layer 11 and located in the display area AA and the non-display area NA.

[0555] Step S22 : As shown in FIG. 61 , a second isolation material layer 13 is formed on the first isolation material layer 12 and located in the display area AA and the non-display area NA.

[0556] Step S23: As shown in Figure 66, a second protective material layer 10b is prepared on the side of the second isolation material layer 13 away from the substrate 100. The second protective material layer 10b has a second hollow area 10bc, a first thickness area 10ba and a second thickness area 10bb. The thickness of the second protective material layer 10b located in the first thickness area 10ba is greater than the thickness of the second protective material layer 10b located in the second thickness area 10bb.

[0557] Optionally, the second protective material layer 10b may include photoresist.

[0558] Optionally, a half-tone mask may be used to prepare a second protective material layer 10b on the side of the second isolation material layer 13 away from the substrate 100, so as to form a second protective material layer 10b having a second hollow area 10bc, a first thickness area 10ba and a second thickness area 10bb.

[0559] Optionally, the second hollow area 10bc can be correspondingly arranged above the position where the first type of opening 300a needs to be prepared in the first isolation material layer 12 and the second isolation material layer 13, and the second thickness area 10bb can be correspondingly arranged above the position where the second type of opening needs to be prepared in the first isolation material layer 12 and the second isolation material layer 13.

[0560] Step S24: As shown in FIG63 , the film layer below the second hollow area 10bc is patterned to form at least a portion of the first type opening 300a located in the display area AA, the second protective material layer 10b in the second thickness area 10bb is removed and a portion of the first protective material layer in the first thickness area is retained, and then the film layer below the second thickness area 10bb is patterned to form a functional opening 300b located in the non-display area NA.

[0561] In these optional embodiments, in step S23, a second protective material layer 10b having a second hollow area 10bc, a first thickness area 10ba and a second thickness area 10bb is prepared on the side of the second isolation material layer 13 away from the substrate 100, and the thickness of the second protective material layer 10b in the first thickness area 10ba is set to be greater than the thickness of the second protective material layer 10b in the second thickness area 10bb, so that in step S24, the etching material can etch the first isolation material layer 12 and the second isolation material layer 13 below the hollow area to a greater extent, so as to form the first type of opening 300a of the first isolation layer 301 with a larger protruding length on the peripheral side. In the second thickness area 10bb, since the etching material will first etch the second protective material layer 10b in the second thickness area 10bb, the etching material etches the first isolation material layer 12 and the second isolation material layer 13 below the second thickness area 10bb to a lesser extent, so as to form the functional opening 300b with a smaller protruding length on the peripheral side.

[0562] 67 to 69 are schematic diagrams of a manufacturing process of a method for manufacturing a display panel 10 provided in yet another embodiment of the present application.

[0563] In some optional embodiments, step S20 includes:

[0564] Step S21 : as shown in FIG. 60 , a first isolation material layer 12 is formed on the pixel definition material layer 11 and located in the display area AA and the non-display area NA.

[0565] Step S22: As shown in FIG61 , a second isolation material layer 13 is formed on the first isolation material layer 12 and located in the display area AA and the non-display area NA;

[0566] Step S23: As shown in FIG. 67 and FIG. 67 a , the first isolation material layer 12 and the second isolation material layer 13 in the display area AA are dry-etched to form a first type of preliminary opening 17 in the display area AA.

[0567] Optionally, the first type of preliminary openings 17 may be used to form first type openings 300 a located in the display area AA.

[0568] Step S24: as shown in FIG68 , wet etching is performed on the inner wall of the first type preliminary opening 17 to form at least a portion of the first type opening 300 a located in the display area AA;

[0569] Step S25: As shown in FIG. 69 , the first isolation material layer 12 and the second isolation material layer 13 in the non-display area NA are dry-etched to form a functional opening 300 b in the non-display area NA.

[0570] Optionally, as shown in Figures 66 to 69, step S25 may be performed after step S24. Alternatively, step S25 may be performed before step S23. That is, the first isolation material layer 12 and the second isolation material layer 13 in the non-display area NA may first be dry-etched to form the functional opening 300b in the non-display area NA, and then steps S24 and 25 may be performed sequentially to complete the preparation of the first type of opening 300a. This application does not impose any specific limitations on this.

[0571] In these optional embodiments, by separately preparing the first type of opening 300a and the functional opening 300b, the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the first type of opening 300a and the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b can be better controlled separately, thereby facilitating the formation of a morphology in which the protruding length of at least part of the second isolation layer 302 relative to the first isolation layer 301 toward the functional opening 300b is smaller than the protruding length of the second isolation layer 302 relative to the first isolation layer 301 toward the first type of opening 300a.

[0572] In addition, a functional opening 300b is formed in the non-display area NA by dry etching the first isolation material layer 12 and the second isolation material layer 13 in the non-display area NA, so that the extension length of the second edge portion 320b on the peripheral side of the functional opening 300b relative to the first edge portion 320a toward the side of the functional opening 300b can be equal to zero, so that when the first protective material layer 10a is formed on the isolation structure layer 300, the gas on the peripheral side of the functional opening 300b can be better discharged outward along the side walls of the first edge portion 320a and the second edge portion 320b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0573] 70 and 71 are schematic diagrams of a manufacturing process of a method for manufacturing a display panel 10 provided in yet another embodiment of the present application.

[0574] In some optional embodiments, step S20 includes:

[0575] Step S21 : as shown in FIG. 60 , a first isolation material layer 12 is formed on the pixel definition material layer 11 and located in the display area AA and the non-display area NA.

[0576] Step S22 : As shown in FIG. 61 , a second isolation material layer 13 is formed on the first isolation material layer 12 and located in the display area AA and the non-display area NA.

[0577] Step S23: As shown in FIG70 , the first isolation material layer 12 and the second isolation material layer 13 in the display area AA and the non-display area NA are dry-etched to form a first type of initial opening 17 in the display area AA and a functional opening 300b in the non-display area NA.

[0578] Optionally, the first type of preliminary openings 17 may be used to form the first type of openings 300 a .

[0579] Optionally, a functional opening 300b is formed in the non-display area NA by dry etching the first isolation material layer 12 and the second isolation material layer 13 in the non-display area NA, so that the extension length of the second edge portion 320b on the peripheral side of the functional opening 300b relative to the first edge portion 320a toward the side of the functional opening 300b can be equal to zero, so that when the first protective material layer 10a is formed on the isolation structure layer 300, the gas on the peripheral side of the functional opening 300b can be better discharged outward along the side walls of the first edge portion 320a and the second edge portion 320b, thereby better improving the structural stability of the display panel 10, and further better improving the process reliability of the display panel 10.

[0580] Step S24: as shown in FIG. 71 , wet etching is performed on the inner wall of the first type preliminary opening 17 to form at least a portion of the first type opening 300 a located in the display area AA.

[0581] In these optional embodiments, by simultaneously preparing the first type of preliminary opening 17 and the functional opening 300b in step S23, the production efficiency of the display panel 10 can be improved. By wet etching only the inner wall of the first type of preliminary opening 17 in step S24, the etched material does not damage the inner wall of the functional opening 300b, thereby facilitating the formation of a morphology in which at least a portion of the second isolation layer 302 extending from the first isolation layer 301 toward the functional opening 300b is shorter than the portion of the second isolation layer 302 extending from the first isolation layer 301 toward the first type of opening 300a.

[0582] FIG72 is a flow chart of a method for preparing a display panel 10 according to another embodiment of the present application. FIG73 to FIG77 are flow charts of a method for preparing a display panel 10 according to another embodiment of the present application.

[0583] Referring to FIG. 59 to FIG. 77 in conjunc...

Claims

1. A display panel, wherein: The display panel has a display area and a non-display area, and includes: substrate; A pixel definition layer is provided on one side of the substrate, wherein the pixel definition layer includes a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, disposed on a side of the pixel definition layer away from the substrate, the isolation structure layer comprising a first isolation layer and a second isolation layer located on a side of the first isolation layer away from the substrate, the isolation structure layer enclosing a plurality of first-type openings located in the display area and functional openings located in the non-display area, the first-type openings being in communication with the corresponding pixel openings; a plurality of light-emitting devices, wherein at least a portion of the light-emitting devices is disposed within the corresponding first-type openings; The extension length of at least part of the second isolation layer that participates in enclosing and forming the functional opening relative to the first isolation layer toward the functional opening is smaller than the extension length of the second isolation layer that participates in enclosing and forming at least part of the first type of opening relative to the first isolation layer toward the first type of opening.

2. The display panel according to claim 1, wherein The first type of opening includes a first type of sub-opening and a second type of sub-opening with an opening area smaller than the first type of sub-opening. The extension length of at least a portion of the second isolation layer that participates in enclosing and forming the functional opening relative to the first isolation layer toward the functional opening is smaller than the extension length of the second isolation layer that participates in enclosing and forming the first type of sub-opening relative to the first isolation layer toward the first type of opening.

3. The display panel according to claim 1, wherein: The minimum distance between the orthographic projection of the edge of the second isolation layer corresponding to the first type of opening on the substrate and the orthographic projection of the edge of the first isolation layer on the side facing away from the substrate corresponding to the first type of opening on the substrate is a first distance, and the minimum distance between the orthographic projection of the edge of the second isolation layer corresponding to the functional opening on the substrate and the orthographic projection of the edge of the first isolation layer on the side facing away from the substrate corresponding to the functional opening on the substrate is a second distance, and the second distance is smaller than the first distance.

4. The display panel according to claim 1, wherein: The angle between the surface of the second isolation layer facing the substrate and the surface of the first isolation layer facing the first type of opening is smaller than the angle between the surface of at least part of the second isolation layer facing the substrate and the surface of the first isolation layer facing the functional opening.

5. The display panel according to claim 1, wherein: The orthographic projection of the edge of the second isolation layer corresponding to the functional opening on the substrate at least partially overlaps with the orthographic projection of the edge of the first isolation layer on the side facing away from the substrate corresponding to the functional opening on the substrate. The display panel according to claim 1 , wherein: The isolation structure layer includes an isolation structure at least partially located in the display area and an edge structure located in the non-display area. The first type of opening includes an isolation opening formed by the isolation structure, and the edge structure encloses the functional opening. The isolation structure includes a first isolation portion and a second isolation portion located on a side of the first isolation portion facing away from the substrate. The edge structure includes a first edge portion and a second edge portion located on the side of the first edge portion facing away from the substrate, and at least a portion of the second edge portion extending toward the functional opening relative to the first edge portion is shorter than the second isolation portion extending toward the isolation opening relative to the first isolation portion.

7. The display panel according to claim 6, wherein: The orthographic projection of the edge of the second edge portion corresponding to the functional opening on the substrate at least partially overlaps with the orthographic projection of the edge of the first edge portion on the side facing away from the substrate corresponding to the functional opening on the substrate.

8. The display panel according to claim 6, wherein: The functional opening includes a first groove arranged in an edge area, and the first groove is arranged to penetrate the edge structure in a thickness direction of the display panel.

9. The display panel according to claim 8, wherein: A length of at least a portion of the second edge portion extending relative to the first edge portion toward the first groove is smaller than a length of the second isolation portion extending relative to the first isolation portion toward the isolation opening.

10. The display panel according to claim 8, wherein: The non-display area includes a first area adjacent to the display area and a second area located on the side of the first area away from the display area. The edge structure is located in the first area. The edge structure includes a main structure connected to the isolation structure and a plurality of protruding structures extending toward the second area relative to the main structure. The first groove is located between adjacent protruding structures.

11. The display panel according to claim 10, wherein: The protruding structure includes a first protruding portion and a second protruding portion located on a side of the first protruding portion facing away from the substrate, wherein at least a portion of the second protruding portion extends from the first protruding portion toward the functional opening to a length that is shorter than a portion of the second isolating portion extends from the first isolating portion of the isolation structure toward the isolation ... And / or, the main structure includes a first main body portion and a second main body portion located on the side of the first main body portion facing away from the substrate, and at least part of the extension length of the second main body portion relative to the first main body portion toward the first groove is smaller than the extension length of the second isolation portion relative to the first isolation portion of the isolation structure toward the isolation opening.

12. The display panel according to claim 11, wherein: The orthographic projection of the second protrusion on the substrate is located within the orthographic projection of the first protrusion on the substrate; Alternatively, the orthographic projection of the edge of the second protrusion corresponding to the functional opening on the substrate at least partially overlaps with the orthographic projection of the edge of the surface of the first protrusion facing away from the substrate corresponding to the functional opening on the substrate.

13. The display panel according to claim 11, wherein: The orthographic projection of the second main body portion on the substrate is located within the orthographic projection of the first main body portion on the substrate; Alternatively, the orthographic projection of the edge of the second main portion corresponding to the first groove on the substrate at least partially overlaps with the orthographic projection of the edge of the surface of the first main portion facing away from the substrate corresponding to the first groove on the substrate.

14. The display panel according to any one of claims 9 to 13, wherein: In a direction from the display area to the centroid of the functional opening, a size of the first groove gradually increases in a direction perpendicular to the straight line from the display area to the centroid of the functional opening.

15. The display panel according to claim 6, wherein: The isolation structure layer further includes an auxiliary structure located in the functional opening and spaced apart from the edge structure.

16. The display panel according to claim 15, wherein: The non-display area includes a first area adjacent to the display area and a second area located on a side of the first area away from the display area, the edge structure is located in the first area, the second area includes a first sub-area and a second sub-area located on a side of the first sub-area away from the first area, and the auxiliary structure includes a plurality of first auxiliary structures located in the first sub-area, and the plurality of first auxiliary structures are arranged at intervals and around the periphery of the second sub-area.

17. The display panel according to claim 16, wherein: The first auxiliary structure includes a first auxiliary portion and a second auxiliary portion located on a side of the first auxiliary portion facing away from the substrate. A length of at least a portion of the second auxiliary portion extending relative to the first auxiliary portion toward the functional opening is smaller than a length of the second isolation portion extending relative to the first isolation portion toward the isolation opening.

18. The display panel according to claim 17, wherein: The orthographic projection of the second auxiliary portion on the substrate is located within the orthographic projection of the first auxiliary portion on the substrate; Alternatively, an orthographic projection of an edge of the second auxiliary portion on the substrate at least partially overlaps with an orthographic projection of an edge of a surface of the first auxiliary portion on a side facing away from the substrate on the substrate.

19. The display panel according to any one of claims 16 to 18, wherein: The display panel is provided with a functional hole in the second sub-region, and the edge structure and the first auxiliary structure are arranged around at least a portion of the functional hole.

20. A display panel, wherein: The display panel has a display area and a non-display area, and includes: substrate; A pixel definition layer is provided on one side of the substrate, wherein the pixel definition layer includes a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, disposed on a side of the pixel definition layer away from the substrate, the isolation structure layer comprising a first isolation layer and a second isolation layer located on a side of the first isolation layer away from the substrate, the isolation structure layer enclosing a plurality of first-type openings located in the display area and functional openings located in the non-display area, the first-type openings being connected to the corresponding pixel openings, and the second isolation layer participating in enclosing the first-type openings extending out of the first isolation layer toward the first-type openings; a plurality of light-emitting devices, wherein at least a portion of the light-emitting devices is disposed within the corresponding first-type openings; The second isolation layer forms a hollow structure on a side of the first isolation layer facing away from the substrate. The hollow structure is communicated with the functional opening and is disposed around at least a portion of the functional opening.

21. The display panel according to claim 20, wherein: The isolation structure layer includes an isolation structure at least partially located in the display area and an edge structure located in the non-display area. The first type of opening includes an isolation opening formed by the isolation structure, and the edge structure encloses the functional opening. The isolation structure includes a first isolation portion and a second isolation portion located on a side of the first isolation portion facing away from the substrate. The second isolation portion extends from the first isolation portion toward the isolation opening. The edge structure includes a first edge portion, and the second isolation layer is provided with the hollow structure on a side of the first edge portion facing away from the substrate. The hollow structure is connected to the functional opening and is arranged around at least a portion of the functional opening.

22. The display panel according to claim 21, wherein: The functional opening includes a first groove arranged in the edge area, the first groove is arranged to penetrate the edge structure in the thickness direction of the display panel, and the hollow structure is connected to the first groove and is arranged around at least a portion of the first groove.

23. The display panel according to claim 22, wherein: The non-display area includes a first area adjacent to the display area and a second area located on a side of the first area away from the display area. The edge structure is located in the first area. The edge structure includes a main structure connected to the isolation structure and a plurality of protruding structures extending toward the second area relative to the main structure. The first groove is located between adjacent protruding structures. The raised structure includes a first raised portion, and the second isolation layer is provided with a hollow structure on a side of the first raised portion facing away from the substrate; And / or, the main structure includes a first main portion, and the second isolation layer is provided with a hollow structure on a side of the first main portion facing away from the substrate.

24. The display panel according to claim 21, wherein The non-display area includes a first area adjacent to the display area and a second area located on a side of the first area away from the display area, the edge structure is located in the first area, the second area includes a first sub-area and a second sub-area located on a side of the first sub-area away from the first area, the isolation structure layer also includes an auxiliary structure located in the functional opening and spaced apart from the edge structure, the auxiliary structure includes a plurality of first auxiliary structures located in the first sub-area, the plurality of first auxiliary structures are spaced apart and arranged around the circumference of the second sub-area, the first auxiliary structure includes a first auxiliary portion, and the second isolation layer is provided with a hollow structure on the side of the first auxiliary portion away from the substrate.

25. A display panel, wherein: The display panel has a display area and a non-display area, and includes: substrate; The pixel definition layer is provided on one side of the substrate, and the pixel definition layer includes a pixel defining portion and a plurality of pixels enclosed by the pixel defining portion. pixel opening; an isolation structure layer disposed on one side of the substrate, the isolation structure layer comprising an isolation structure at least partially located in the display area and an edge structure connected to the isolation structure and located in the non-display area, the isolation structure enclosing an isolation opening connected to the pixel opening, the edge structure comprising a main structure connected to the isolation structure and a plurality of protruding structures extending away from the display area relative to the main structure, the edge structure enclosing a functional opening, the functional opening comprising a first groove disposed in the edge area, the first groove penetrating the edge structure in the thickness direction of the display panel and located between adjacent protruding structures; A plurality of light emitting devices are provided, wherein at least a portion of the light emitting devices is disposed in the isolation opening.

26. The display panel according to claim 25, wherein: The dimension of the protrusion structure in a direction perpendicular to the straight line from the centroid of the functional opening to the centroid of the protrusion is equal to 0.5 to 10 times the dimension of the isolation opening; and / or, the dimension of the first groove in a direction from the centroid of the functional opening to the centroid of the groove is equal to 60 nanometers to 100 microns; and / or, the dimension of the first groove in a direction perpendicular to the straight line from the centroid of the functional opening to the centroid of the groove is equal to 0.5 to 10 times the dimension of the isolation opening.

27. A display panel, wherein: The display panel has a first specific area and a second area adjacent to each other, and includes: substrate; an isolation structure, disposed on one side of the substrate and located in the first specific area, the isolation structure enclosing an isolation opening; a plurality of first auxiliary structures located in the second region and disposed on a side of the substrate facing the isolation structure, wherein the first auxiliary structures are spaced apart from the isolation structure and adjacent first auxiliary structures are spaced apart; The light-emitting layer includes a light-emitting unit arranged in the isolation opening.

28. A display panel, wherein: The display panel has a display area and a non-display area adjacent to each other, and the display panel includes: substrate; An isolation structure is provided on one side of the substrate, and the isolation structure encloses an isolation opening; a convex structure, wherein the convex structures are multiple and spaced apart from each other and connected to an edge portion of the isolation structure away from the display area; The light-emitting layer is located in the display area and includes a light-emitting unit arranged in the isolation opening.

29. A display panel, wherein: The display panel includes a second sub-region and a display area surrounding the second sub-region; The display panel includes: substrate; an isolation structure layer, the isolation structure layer being located on the substrate and enclosing an isolation opening; In a direction away from the substrate, the isolation structure layer includes a first isolation layer and a second isolation layer stacked; In the isolation structure layer surrounding the second sub-region, the extension length of the second isolation layer toward the second sub-region relative to the first isolation layer is smaller than the extension length of the second isolation layer away from the second sub-region relative to the first isolation layer.

30. A display panel motherboard, wherein: A display panel having a display area and a non-display area, wherein the non-display area includes a first region adjacent to the display area and a second region located on a side of the first region away from the display area, the second region includes a first sub-region and a second sub-region located on a side of the first sub-region away from the first region, and the display panel includes: substrate; A pixel definition layer is provided on one side of the substrate, wherein the pixel definition layer includes a pixel defining portion and a plurality of pixel openings formed by the pixel defining portion; an isolation structure layer, disposed on a side of the pixel definition layer away from the substrate, the isolation structure layer comprising an isolation structure, an edge structure, and an auxiliary structure spaced apart from the edge structure, the isolation structure enclosing an isolation opening located in the display area, the isolation opening being connected to the pixel opening, the isolation structure comprising a first isolation portion and a second isolation portion located on a side of the first isolation portion facing away from the substrate, the edge structure being located in the first region, the edge structure enclosing a functional opening, the edge structure comprising a first edge portion and a second edge portion located on a side of the first edge portion facing away from the substrate, the auxiliary structure comprising a second auxiliary structure located in the second subregion, at least a portion of the second edge portion extending toward the functional opening relative to the first edge portion being shorter than a portion of the second isolation portion extending toward the isolation opening relative to the first isolation portion; A plurality of light emitting devices are provided, wherein at least a portion of the structures of the light emitting devices are disposed in the corresponding isolation openings.

31. The display panel motherboard according to claim 30, wherein: There are multiple auxiliary structures, drainage grooves are formed between adjacent second auxiliary structures, and the second auxiliary structure is provided with a drainage auxiliary groove connected to the drainage groove.

32. The display panel motherboard according to claim 30, wherein: The second auxiliary structure includes a through hole, the through hole passes through the second auxiliary structure, and the through hole is formed as a positioning mark opening, or a pattern formed by areas surrounded by a plurality of second auxiliary structures is formed as a positioning mark opening.

33. A method for preparing a display panel, wherein: The display panel has a display area and a non-display area, and the preparation method includes: preparing a pixel definition material layer on a substrate; An isolation structure layer is formed on the pixel definition material layer, the isolation structure layer comprising a first isolation layer and a second isolation layer located on a side of the first isolation layer facing away from the substrate, the isolation structure layer enclosing at least a portion of the first type of opening located in the display area and a functional opening located in the non-display area, wherein a length of at least a portion of the second isolation layer involved in enclosing the functional opening extending toward the functional opening relative to the first isolation layer is shorter than a length of the second isolation layer involved in enclosing at least a portion of the first type of opening extending toward the first type of opening relative to the first isolation layer; Coating a first protective material layer on the isolation structure layer, wherein the first protective material layer forms a first hollow area at the first type of opening located in the display area; A portion of the pixel definition material layer exposed from the first hollow area and the first type of opening located in the display area is patterned to form at least a portion of a pixel opening, wherein the pixel opening is connected to the first type of opening.

34. The preparation method according to claim 33, wherein The step of preparing an isolation structure layer on the pixel definition material layer includes: Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer; preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer; Performing dry etching on the first isolation material layer and the second isolation material layer in the display area and the non-display area to form an isolation primary structure at least partially located in the display area, an edge primary structure connected to the isolation primary structure and located in the non-display area, and an auxiliary primary structure spaced apart from the edge primary structure and located in the non-display area, wherein the isolation primary structure encloses an isolation primary opening, the edge primary structure encloses a functional primary opening, and the auxiliary primary structure is located within the functional primary opening; The isolation preliminary structure, the edge preliminary structure and the auxiliary preliminary structure are wet-etched to form the isolation structure layer.

35. The preparation method according to claim 34, wherein The isolation structure layer includes an isolation structure at least partially located in the display area, an edge structure connected to the isolation structure and located in the non-display area, and an auxiliary structure spaced apart from the edge structure and located in the non-display area, the auxiliary structure including a second auxiliary structure, after patterning the portion of the pixel definition material layer exposed from the first hollow area and the first type of opening located in the display area to form at least a portion of the pixel opening, the method further includes: The isolation structure layer and the substrate are subjected to a hole-opening process to remove the second auxiliary structure located in the non-display area and a portion of the substrate below the second auxiliary structure and form a functional hole.

36. The preparation method according to claim 33, wherein The step of preparing an isolation structure layer on the pixel definition material layer includes: Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer; preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer; A second protective material layer is formed on a side of the second isolation material layer away from the substrate, wherein the second protective material layer has a second hollow region, a first thickness region, and a second thickness region, wherein the thickness of the second protective material layer in the first thickness region is greater than the thickness of the second protective material layer in the second thickness region; The film layer below the second hollow area is patterned to form at least part of the first type of opening located in the display area; the second protective material layer in the second thickness area is removed and the second protective material layer in part of the first thickness area is retained, and the film layer below the second thickness area is patterned to form the functional opening located in the non-display area.

37. The preparation method according to claim 33, wherein The step of preparing an isolation structure layer on the pixel definition material layer includes: Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer; preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer; performing dry etching on the first isolation material layer and the second isolation material layer in the display area to form a first type of preliminary opening in the display area; performing a wet etching process on inner walls of the first-type initial openings to form at least a portion of the first-type openings located in the display area; The first isolation material layer and the second isolation material layer in the non-display area are dry-etched to form the functional opening in the non-display area.

38. The preparation method according to claim 33, wherein The step of preparing an isolation structure layer on the pixel definition material layer includes: Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer; preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer; performing dry etching on the first isolation material layer and the second isolation material layer in the display area and the non-display area to form a first type of primary opening in the display area and the functional opening in the non-display area; The inner walls of the first-type initial openings are wet-etched to form at least a portion of the first-type openings located in the display area.

39. A method for preparing a display panel, wherein: The display panel has a display area and a non-display area, and the preparation method includes: preparing a pixel definition material layer on a substrate; Preparing a first isolation material layer located in the display area and the non-display area on the pixel definition material layer; preparing a second isolation material layer located in the display area and the non-display area on the first isolation material layer; performing patterning on the first isolation material layer and the second isolation material layer in the display area to form at least a portion of the first type of openings located in the display area; coating a first protective material layer on the second isolation material layer, wherein the first protective material layer forms a first hollow area at the first type of opening located in the display area; performing patterning on a portion of the pixel definition material layer exposed from the first hollow area and the first type of opening located in the display area to form at least a portion of a pixel opening, wherein the pixel opening is connected to the first type of opening; The first isolation material layer and the second isolation material layer in the non-display area are patterned to form an isolation structure layer, which encloses the first type of openings and a functional opening at least partially located in the non-display area.

40. A display device, wherein: include: The display panel according to any one of claims 1 to 29 or the display panel prepared by the preparation method according to any one of claims 33 to 39; The photosensitive component is arranged corresponding to the functional opening of the display panel.

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