Adjustable dosage control valve
The adjustable dosage control valve with integrated diaphragm and needle valve portions addresses pressure spikes and inaccurate dosage in thin-film deposition by ensuring stable fluid flow and accurate chemical control, enhancing process quality and efficiency.
Patent Information
- Application Number
- PCT/FI2024/050717
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-02-09
- Filing Date
- 2024-12-19
- Publication Date
- 2025-08-14
AI Technical Summary
Existing fluid flow control systems in thin-film deposition processes, such as ALD, suffer from pressure spikes and inaccurate chemical dosage due to high saturation vapor pressure and undesired fluid bursts, leading to higher chemical consumption and longer purge times.
An adjustable dosage control valve integrating a diaphragm and needle valve portion within a single valve body, allowing real-time adjustment of fluid flow and pressure to minimize pressure spikes and ensure accurate dosage control.
The integrated valve system minimizes pressure spikes and ensures stable, accurate fluid flow and dosage, improving process quality and efficiency in thin-film deposition processes by eliminating dead spaces and enabling immediate adjustment upon valve opening.
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Figure FI2024050717_14082025_PF_FP_ABST
Abstract
Description
[0001] ADJUSTABLE DOSAGE CONTROL VALVE
[0002] TECHNICAL FIELD
[0003] The present disclosure generally relates to controlling of fluid flow. The disclosure relates particularly, though not exclusively, to an adjustable dosage / flow control valve.
[0004] BACKGROUND
[0005] This section illustrates useful background information without admission of any technique described herein representative of the state of the art.
[0006] Fluids, i.e., gases and liquids, are used in many manufacturing industries. Generally, different kinds of flow control valves can be used to adjust and control fluid flow.
[0007] Especially, in thin-film deposition processes, such as atomic layer deposition (ALD), accurate fluid flow and chemical dosage control is important. For instance, when the reactant gas has high saturation vapor pressure, the amount of chemical injected during one gas pulse easily becomes too high for an optimal ALD process. Such unintentional use of excessive chemical dosage leads to higher chemical consumption and longer required purge times in an ALD process. Additionally, pressure build-up in fluid channels may result in undesired and uncontrolled bursts of fluid upon opening of flow control valves, thus, negatively affecting reaction conditions and process quality. Therefore, an improved flow and dosage control is desired.
[0008] SUMMARY
[0009] The present disclosure aims to improve flow and dosage control of fluid, i.e., gas or liquid, flow(s) or at least to provide an alternative to existing technology. Embodiments of the present disclosure enable adjustable flow control and minimizing pressure spiking in the beginning of a fluid pulsing state, i.e., upon opening of a valve.
[0010] The appended claims define the scope of protection. Any examples and technical descriptions of apparatuses, products and / or methods in the description and / or drawings not covered by the claims are presented not as embodiments of the invention but as background art or examples useful for understanding the invention. According to a first example aspect there is provided an adjustable dosage control valve for controlling fluid flow, comprising a valve body, a first inlet forming (or for forming) a first flow path for a first fluid flow in the valve body (and for providing the first fluid flow into the valve body), an outlet for discharging output flow from the valve body, a diaphragm valve portion comprising a diaphragm in the first flow path of the first fluid flow integrated to (or in) the valve body configured to regulate the flow of the first fluid flow (from the first flow path) through the valve body and its discharge (from the valve body) as output flow through the outlet, and a needle valve portion (integrated to the valve body) comprising a movable needle valve head positioned in the first flow path of the first fluid flow in (or inside) the valve body, configured to adjustably control, together with the diaphragm valve portion, the output flow discharged through the outlet.
[0011] Preferably, in certain embodiments, the diaphragm of the diaphragm valve portion is integrated to a valve body and the valve body forms the valve seat. That is, in certain embodiments, the diaphragm is pressed against the valve body to close the diaphragm valve. In certain embodiments, the needle valve portion that is integrated to the valve body comprises a needle valve housing at least partially formed by the valve body. In certain embodiments, the needle valve head moves in the needle valve housing.
[0012] Advantageously, improved flow control and fluid dosage may be enabled. Effects of pressure spikes or bursts due to, for instance, pressure build-up in fluid channels or high saturation vapor pressure of the fluid, on the pulses of the diaphragm valve can be minimized and controlled by the adjustable needle valve portion. Therefore, the pressure and flow rate of the fluid flow emerging from the outlet is accurately controlled.
[0013] In certain embodiments, the movable needle valve head is located downstream of the diaphragm. That is, the first fluid flow passing the needle valve head has already passed the diaphragm before it reaches the needle valve head and propagates away from the diaphragm.
[0014] In certain embodiments, the movable needle valve head is located upstream of the diaphragm. That is, the first fluid flow having passed the needle valve head propagates towards the diaphragm and has not (yet) passed the diaphragm. Advantageously, the dosage control valves with different relative positioning of the needle valve portion and the diaphragm portion may be manufactured. This allows, for example, valves with different configurations or geometries that are compatible with and can be fitted to different kinds of equipment and conditions to improve control of fluid flow and dosage.
[0015] In certain embodiments, the needle valve head is conical. In certain embodiments, the needle valve head is cylindrical. In certain embodiments, the needle valve head is spherical. Advantageously, various needle valve head geometries can be implemented according to the properties of the used fluid(s) and the desired processing parameters.
[0016] In certain embodiments, adjustable dosage control valve comprises an adjustment assembly to adjust the position of the needle valve head. In certain embodiments, the position of the needle valve head is manually adjustable by a user. Advantageously, the needle valve portion can be accurately adjusted, independently of the diaphragm valve portion.
[0017] In certain embodiments, the adjustment assembly comprises a servomotor-driven actuator. In certain embodiments, the adjustment assembly comprises a pneumatic actuator. In certain embodiments, the adjustment assembly comprises a linear motor. In certain embodiments, the adjustment assembly comprises a piezoelectric actuator. In certain embodiments, the adjustment assembly (and thus the needle valve head) is automatically controlled (by a control unit). Advantageously, flow and dosage control may be automated and adjusted in real-time.
[0018] In certain embodiments, the adjustment assembly is configured to adjust the position of the needle valve head actively in real time during opening of the diaphragm. In certain embodiments, the active adjustment of the needle valve head is based on real-time flow measurement data, real-time pressure data, or pre-defined parameters. In certain embodiments, pressure sensors positioned upstream and / or downstream of the adjustable flow control valve are configured to provide real-time data to the control unit for controlling the adjustment assembly. Advantageously, optimal basis for adjustment can be chosen according to the used fluid(s) and selected process. Further, the needle valve portion may automatically react and adapt to changes in fluid flow (passing through the diaphragm valve portion) during sample processing. Thus, stability of the output flow and reaction conditions may be improved.
[0019] In certain embodiments, the adjustable dosage control valve further comprises a second inlet forming (or for forming) a second flow path for a second fluid flow in the valve body (and for providing the second fluid flow into the valve body). Therefore, in certain embodiments, the adjustable dosage control valve is a three-way valve. Advantageously, improved flow and dosage control may be implemented in a three-way valve. In certain embodiments, the adjustable dosage control valve is configured to combine the first fluid flow and the second fluid flow inside the valve body before reaching the outlet as a combined output flow. Advantageously, the first fluid flow can be evenly mixed, at a desired rate and pressure, to the second fluid flow, to be provided as a combined output flow with controlled flow rate and stable pressure. Hence, processing conditions are improved. The improved dosage and flow control enable more accurate and improved mixing of the two fluid flows, while keeping the (combined) output flow stable.
[0020] In certain embodiments, first inlet is reaction precursor inlet. In certain embodiments, the second inlet is carrier gas inlet (of a substrate processing apparatus or a thin-film deposition apparatus). In certain embodiments, the carrier gas is inert gas. In certain embodiments, the output flow is further provided as a reactant flow for a surface deposition or thin-film deposition process.
[0021] In certain embodiments, the dosage control valve is implemented in a surface deposition apparatus. In certain embodiments, the dosage control valve is implemented in an ALD apparatus. In certain embodiments, the dosage control valve is implemented in an apparatus suitable for carrying out ALD sub-type processes, such as MLD (Molecular Layer Deposition) plasma-assisted ALD, for example PEALD (Plasma Enhanced Atomic Layer Deposition), and photon-enhanced Atomic Layer Deposition (known also as flash enhanced ALD). In certain embodiments, the dosage control valve is implemented in chemical vapor deposition apparatus (CVD). In certain embodiments, the dosage control valve is implemented in an apparatus suitable for other deposition technologies, such as Physical Vapor Deposition (PVD) and for Plasma-Enhanced Chemical Vapor Deposition (PECVD) processes. In certain embodiments, the dosage control valve is implemented in an atomic layer etching (ALE) reactor. Further, the dosage control valve is not limited to thin-film deposition processes but can be adapted to other technologies as well that require accurate control of fluids and chemical dosage.
[0022] In certain embodiments, the adjustable dosage control valve is configured to regulate both the flow of the first fluid flow and the flow of the second fluid flow through the valve body. In certain embodiments, the diaphragm valve portion is configured to regulate both the flow of the first fluid flow and the flow of the second fluid flow through the valve body. In certain embodiments, the needle valve portion regulates only the first fluid flow, while both the first fluid flow and second fluid flow flow through the diaphragm valve portion. In certain embodiments, the first fluid flow and the second fluid flow flow through the adjustable dosage control valve simultaneously. Advantageously, only one diaphragm suffices also for embodiments comprising a three-way valve with two inlets. Hence, the dosage control valve structure may be kept simple.
[0023] In certain embodiments, the adjustable dosage control valve is configured to allow the second fluid flow to flow as a constant flow through the valve body and to actively adjust only the first fluid flow by the diaphragm valve and the needle valve portion. Therefore, controlled feeding of the first fluid, or pulses of the first fluid, to the constant second fluid flow may be enabled while minimizing unintended pressure changes in the combined output flow.
[0024] According to a second example aspect, there is provided a substrate processing apparatus, comprising a reaction chamber, and at least one adjustable dosage control valve of any preceding embodiment to provide the reaction chamber with a fluid flow.
[0025] According to a third example aspect, there is provided a use of an adjustable dosage control valve of any embodiment of the first example aspect, in the substrate processing apparatus of the second example aspect, in a thin-film deposition process.
[0026] According to a fourth example aspect, there is provided a method for controlling dosage of fluid flow through an adjustable dosage control valve, comprising regulating, by a diaphragm valve portion comprising a diaphragm (positioned) in a first flow path in a valve body, the flow of a first fluid flow through the valve body and its discharge as output flow through an outlet of the valve, and adjustably controlling, together with the diaphragm valve portion, by a needle valve portion comprising a movable needle valve head positioned in the first flow path of the first fluid flow in the valve body, the output flow discharged through the outlet.
[0027] In certain embodiments, adjustably controlling, together with the diaphragm portion, by the needle valve portion the output flow (F3) discharged through the outlet (130), further comprises at least partially closing or opening the needle valve portion. In other words, in certain embodiments, adjustably controlling, together with the diaphragm portion, by the needle valve portion the output flow (F3) comprises at least partially blocking the flow of the first fluid flow through the needle valve portion.
[0028] In certain embodiments, the method comprises providing a second fluid flow into a second flow path in the valve body. In certain embodiments, the method comprises regulating both the first fluid flow and the second fluid flow with the diaphragm portion in the valve body. In certain embodiments, the method comprises regulating both the first fluid flow and the second fluid flow with the diaphragm portion and the first fluid flow also with the needle valve portion. In certain embodiment, the method comprises allowing the second fluid flow to freely flow through the valve body. In certain embodiments, the method comprises combining the first fluid flow and the second fluid flow within the valve body into a combined output flow.
[0029] In certain embodiments, the method comprises, providing the output flow, discharged from the outlet, as reactant flow for a thin-film deposition process.
[0030] According to a fifth example aspect, there is provided a control apparatus for controlling an adjustable dosage control valve (100), comprising a processor, and a memory comprising computer-readable program code, wherein the memory and the computer program code are configured to, when executed by the processor, cause the adjustable dosage control valve to regulate, by a diaphragm valve portion integrated to a valve body of the valve, flow of a first fluid flow through the valve body and its discharge as output flow through an outlet of the valve, and adjustably control, together with the diaphragm valve portion, by a needle valve portion comprising a movable needle valve head (150) positioned in a flow path of the first fluid flow in the valve body, the output flow discharged through the outlet.
[0031] In certain embodiments, the control apparatus is configured to cause the adjustable dosage control valve to regulate (by the diaphragm valve portion) both the flow of the first fluid flow and the flow of the second fluid flow through the valve body.
[0032] Different non-binding example aspects and embodiments have been illustrated in the foregoing. The embodiments in the foregoing are used merely to explain selected aspects or steps that may be utilized in different implementations. Some embodiments may be presented only with reference to certain example aspects. It should be appreciated that corresponding embodiments may apply to other example aspects as well.
[0033] BRIEF DESCRIPTION OF THE FIGURES
[0034] Some example embodiments will be described with reference to the accompanying figures, in which:
[0035] Figs. 1 and 2 schematically show certain embodiments of an adjustable dosage control valve; Fig. 3a schematically shows an adjustable dosage control valve according to certain embodiments;
[0036] Fig. 3b shows a schematical cross-section of an adjustable dosage control valve according to Fig. 3a;
[0037] Fig. 3c shows another schematical cross-section of an adjustable dosage control valve according to Fig. 3a;
[0038] Fig. 4a schematically shows an adjustable dosage control valve according to certain embodiments;
[0039] Fig. 4b shows a schematical cross-section of an adjustable dosage control valve according to Fig. 4a;
[0040] Fig. 4c shows another schematical cross-section of an adjustable dosage control valve according to Fig. 4a;
[0041] Fig. 5 schematically shows a cross-section of an adjustable dosage control valve according to certain embodiments;
[0042] Fig. 6a and 6b schematically show substrate processing apparatuses comprising an adjustable dosage control valve according to certain embodiments;
[0043] Fig. 7 schematically shows a control unit according to certain embodiments; and
[0044] Fig. 8 shows a flow chart of a method according to certain embodiments.
[0045] DETAILED DESCRIPTION
[0046] In the following description, like reference signs denote like elements or steps.
[0047] The embodiments described in more detail below, describe an adjustable dosage control valve for controlling fluid flow. The fluid may be liquid or gas. The adjustable dosage control valve comprises a valve body, (at least) a first inlet for forming a first flow path for a first fluid flow (into and) in the valve body, an outlet for discharging output flow from the valve body, a diaphragm valve portion (integrated to the valve body) comprising a diaphragm in the first flow path in (or inside) the valve body configured to regulate the flow of the first fluid flow through the valve body and its discharge as output flow through the outlet, and a needle valve portion (integrated to the valve body) comprising a movable needle valve head positioned in the first flow path of the first fluid flow in the valve body, configured to adjustably control, together with the diaphragm valve portion, (the pressure and flow rate of) the output flow (or output flow pulses) discharged through the outlet.
[0048] In conventional systems, flow controlling devices are typically implemented separately upstream of a pulsing (diaphragm) valve, to restrict flux of high vapor pressure chemicals to minimize pressure spikes upon opening of the pulsing valve. However, such systems tend to result in undesired pressure build-up in the dead space (inside a fluid channel) between the flow controlling device and the pulsing valve while the pulsing valve is closed. That is, fluid having passed the flow controlling device accumulates in the region between the flow controlling device and the pulsing valve. Once the pulsing valve is opened, the accumulated pressure is released as pressure spike. Hence, the flow controlling device is unable to adjust the output flow immediately after opening of the pulsing valve, because some fluid has already passed the flow controlling device. Furthermore, high vapor pressure of the fluid may further contribute to the pressure spike and complicate controlling of the fluid flow.
[0049] In contrast to the conventional systems, the flow controlling device (as a needle valve) in the present disclosure is integrated directly to the same valve body with the pulsing valve (diaphragm valve). This enables minimizing, or even completely eliminating, the dead space between the flow controlling device (needle valve) and the pulsing (diaphragm) valve. Therefore, the adjustment effect of the needle valve is enabled to take effect immediately after opening of the pulsing (diaphragm) valve. Consequently, pressure spikes may be minimized, and steady output flow and fluid dosage provided right from the beginning of a fluid pulse step to the end of the fluid pulse step.
[0050] The adjustable dosage control valve of the present disclosure is particularly suitable for thin- film deposition and processing systems and for thin-film deposition processes. However, its field of use and suitability is not limited to thin-film deposition and processing, but it may be implemented in other systems and processes as well, where accurate control of fluid flow and chemical dosage is essential, for example, for reaching optimal process quality and cost-efficiency.
[0051] Substrate processing systems and processes, wherein the adjustable dosage control valve of the present disclosure can be implemented comprise, for instance, atomic layer deposition (ALD), and atomic layer etching (ALE). Further, the adjustable dosage control valve is suitable for sub-types of ALD, such as MLD (Molecular Layer Deposition) plasma- assisted ALD, for example PEALD (Plasma Enhanced Atomic Layer Deposition), and photon-enhanced Atomic Layer Deposition (known also as flash enhanced ALD). Further, the valve may be applied to chemical vapor deposition (CVD) systems and processes.
[0052] Fig. 1 schematically shows an adjustable dosage control valve 100 according to certain embodiments. The adjustable dosage control valve 100 is shown from the direction of its needle valve portion (the needle valve portion being directed towards the viewer and not shown in Fig. 1 ). However, the needle valve housing 140, to house a movable needle valve head 150, is shown in the valve body 110. In certain embodiments, the needle valve housing is connected to a first inlet 120 and, thus, part of a first flow path.
[0053] Particularly, a three-way adjustable dosage control valve 100 according to certain embodiments is shown in Fig. 1. The three-way valve comprises a first inlet 120, second inlet 125 and an outlet 130. The solid arrows in Fig. 1 , and in Figs. 2-5, depict fluid flow directions. In certain embodiments, first fluid flow F1 is provided to the adjustable dosage control valve 100 via a first inlet 120. In certain embodiments, the first inlet 120 is configured to form the first flow path into the valve body 110. In certain embodiments, the first flow path comprises the needle valve housing 140. In certain embodiments, the first inlet 120 is connected to the outlet 130.
[0054] In certain embodiments, second fluid flow F2 is provided to the adjustable dosage control valve 100 via a second inlet 125. in certain embodiments, the first inlet 120 is configured to form the second flow path into the valve body 110. In certain embodiments, the second inlet 125 is connected to the outlet 130. In certain embodiments, the first inlet 120 and second inlet 125 are configured to merge within the valve body into a combined outlet 130.
[0055] In certain embodiments, output flow F3 is discharged through the outlet 130. In certain embodiments, the first fluid flow F1 provided via the first flow path into the valve bodyl 10 is discharged as the output low F3. In certain embodiments, the first fluid flow F1 and the second fluid flow F2 are mixed inside the adjustable dosage control valve 100 and discharged through outlet 130 as a combined output flow F3. The adjustable dosage control valve 100 is configured to regulate the flow rate and pressure of the output flow F3 by adjusting the flow rate and pressure of the first fluid flow F1 and / or the second fluid flow F2.
[0056] In certain embodiments, only the first fluid flow F1 is provided via the first inlet 120 (first flow path) to, and its output controlled by, the adjustable dosage control valve 100. That is, the second inlet 125 is temporarily closed, removed, or not existing from the beginning in those embodiments. In such cases the output flow F3 consists only of the first fluid. In certain embodiments, only the second fluid flow F2 is provided via the second inlet 125 (second flow path) to, and its output controlled by, the adjustable dosage control valve 100. That is, the first inlet 120 is temporarily closed, removed, or not existing from the beginning in those embodiments. In such, cases the output flow F3 consists only of the second fluid.
[0057] In certain embodiments, the first fluid flow F1 and the second fluid flow F2 are provided simultaneously into the adjustable dosage control valve 100. In certain embodiments, the adjustable dosage control valve is configurable to allow only the first fluid flow F1 to pass through, while preventing the second fluid flow F2. In certain embodiments, the adjustable dosage control valve 100 is configurable to allow only the second fluid flow F2 to pass through, while preventing the second fluid flow F1. In certain embodiments, the first fluid flow F1 and / or the second fluid flow F2 are further adjustable by other valve(s) separate from the adjustable dosage control valve 100.
[0058] In certain embodiments, the first inlet 120 and the second inlet 125 are connected to fluid reservoir(s) (not shown). The fluid reservoir(s) provide the first fluid and / or the second fluid. In certain embodiments, the first fluid is different from the second fluid. In certain embodiments, the first fluid is the same as the second fluid. In certain embodiments, the first fluid is a reaction precursor for a thin-film deposition or etching process. In certain embodiments, the second fluid is a carrier gas, such as, nitrogen, oxygen or argon, preferably an inert carrier gas, such as argon or nitrogen, for a thin-film deposition or etching process.
[0059] In certain embodiments, the adjustable dosage control valve 100 is purged by flushing it with an inert fluid flow provided simultaneously through both the first inlet 120 and the second inlet 125. In each case, an output flow F3, regulated by the adjustable dosage control valve 100, exits the valve body 110 through the outlet 130. In certain embodiments, the output flow 130 comprises the first fluid and / or the second fluid.
[0060] The output flow F3 can be completely stopped by closing the adjustable dosage control valve 100. In such situations, the inflow of the first fluid flow F1 and the second fluid flow F2 are shut down by the adjustable dosage control valve 100 as well. In certain embodiments, the adjustments, closing and opening of the adjustable dosage control valve 100 is carried out manually by a user. In certain embodiments, the valve 100 is automatically adjusted. In certain embodiments, the adjustable dosage control valve 100 is controlled by a control unit 700, such as shown in and discussed with respect to Fig. 7. In certain embodiments, other valves (not shown), separate from the adjustable dosage control valve 100, can also be used to adjust the first fluid flow F1 and / or the second fluid flow F2.
[0061] Fig. 2 schematically shows an adjustable dosage control valve 100 according to certain embodiments. Particularly, it shows a cross-cut view of a three-way valve according to certain embodiments. The three-way valve comprises two inlets 120, 125 and one outlet 130. It is to be noted that the first inlet 120 is directed out of the page towards the viewer and, thus, not shown in Fig. 2. That is, the figure is shown from the direction of the first inlet 120. If shown, however, the first inlet 120 would enter the valve body 110 below the needle valve head 150 in the needle valve housing 140. For a more detailed illustration of possible exemplary three-dimensional positionings of the two inlets 120, 125 and the outlet 130 in a three-way adjustable dosage control valve 100 the reader is referred to Figs. 3a-4c.
[0062] The adjustable dosage control valve 100 comprises a valve body 110. The first inlet 120 (not shown in Fig. 2) and a second inlet 125 are connected to the valve body 110. The first inlet 120 and the second inlet 125 provide first fluid flow F1 and second fluid flow F2, respectively, into the valve body 110 of the adjustable dosage control valve 100. An outlet 130 is also connected to the valve body 110 to discharge an output flow, or output pulse(s), F3 downstream from the valve body 110. The pressure and flow rate of the output flow (or pulses) F3 are controlled by the adjustable dosage control valve 100 by adjusting the flow rate and pressure of the incoming first fluid flow F1 and / or the second fluid flow F2. In certain embodiments, the flows are controlled by adjusting the diaphragm 170 and the position of the needle valve head 150. The output flow F3 comprises the first fluid flow F1 and / or the second fluid flow F2 (that have passed through the adjustable dosage control valve 100).
[0063] A diaphragm valve portion is integrated to the valve body 110 of the adjustable dosage control valve 100. In certain embodiments, the diaphragm valve portion comprises a diaphragm 170, valve seat 175, an actuator 190, and an actuating member 195. The diaphragm 170 is attached from its peripheral edge(s) to the valve body 110 in an air-tight manner. The center part of the diaphragm can be actuated in the direction perpendicular to the plane of attachment of the diaphragm 170. The diaphragm 170 is actuated, i.e., opened or closed, by the actuator 190 via the actuating member 195. The actuating member 195 is attached to the central part of the diaphragm 170 at its first end and to the actuator 190 at its second end. Accordingly, the central part of the diaphragm 170 is raised as the actuator 190 lifts the actuating member 195, as shown in the open position of Fig. 2. By lowering the actuating member 195, the diaphragm 170 is closed against the valve seat 175. In certain embodiments, (a part of) the valve body 110 is configured to form the valve seat 175. In certain embodiments, the valve body 110 comprises the valve seat 175.
[0064] In certain embodiments, the actuator 190 is a pneumatic actuator. In certain embodiments, the actuator 190 is manually controlled by a user. In certain embodiments, the actuator 190 comprises a servomotor-driven actuator. In certain embodiments, the actuator 190 comprises a linear motor. In certain embodiments, the actuator 190 comprises a piezoelectric actuator. In certain embodiments, the actuator 190 comprises a hydraulic actuator. In certain embodiments, the actuator 190 is an electric actuator. In certain embodiments, the actuator 190 is connected to and automatically controlled by the control unit 700.
[0065] The diaphragm 170 is located in the first flow path of the first fluid flow F1 (integrated the valve body 110), such that it can be operated as a diaphragm valve to control the flow of first fluid flow F1 through the adjustable dosage control valve 100. In certain embodiments, the diaphragm 170 regulates the flow of (only) the first fluid flow F1 through the valve body 110 of the adjustable dosage control valve 100. In certain embodiments, the diaphragm 170 regulates the flows of both the first fluid flow F1 and the second fluid flow F2 through the valve body 110. The fluid(s) flowing through the adjustable dosage control valve 100 is / are discharged as an output flow F3 through the outlet 130.
[0066] At an open position, or at least in a partially open position, having the central part raised by the actuator 190 (by moving the actuating member 195), the diaphragm 170 allows fluid flow (F1 and / or F2) to pass through the adjustable dosage control valve 100 to the outlet 130 to form an output flow F3.
[0067] The magnitude of the opening and / or the duration or frequency of opening and closing of the diaphragm 170 is regulated by the actuator 190 (by moving the actuating member 195). In certain embodiments, the actuator 190 is controlled by the control unit 700. In certain embodiments, the actuator 190 is configured to allow constant flow of fluid(s) F1 , F2 through the diaphragm 170. That is, the diaphragm 170 is retained in a constant open or partially open position for a certain period of time. In certain embodiments, the actuator 190 is configured to actively adjust the opening of the diaphragm 170, for example, gradually or stepwise, to regulate fluid flow during processing. In certain embodiments, the actuator 190 is configured operate in a pulsing manner, i.e., to repeatedly (rapidly) open and close the diaphragm 170 at pre-determined intervals to provide a pulsed output flow F3. In certain embodiments, individual fluid pulses are provided. In a closed position, the diaphragm 170 is pressed (flat) against the valve seat 175 in (or inside) the valve body 110 to block flow of fluid(s) beyond the diaphragm 170. In certain embodiments, the valve seat 175 is integrated to the valve body 110. At the closed position, the diaphragm 170 prevents first fluid flow F1 from passing through the adjustable dosage control valve 100. That is, the first fluid flow F1 from the inlet 120 to the outlet 130 is blocked. In certain embodiments, the diaphragm 170, in a closed position, also blocks the second fluid flow F2. That is, also the second fluid flow F2 from the inlet 125 to the outlet 130 is blocked. Hence, no output flow F3 emerges from the outlet 130.
[0068] A transient flow volume 180, through which the fluid(s) flow from the first and / or second flow path to the outlet 130, is formed when the diaphragm 170 is at an open, or partially open, position. The flow volume 180 is determined by the plane of the valve seat 175 and the concave inner surface of the open diaphragm 170. Once the diaphragm 170 is closed against the valve seat 175, the flow volume 180 is zero. The first fluid flow F1 and / or the second fluid flow F2 flow from the first inlet 120 and the second inlet 125, respectively, through the flow volume 180, to the outlet 130. In certain embodiments, the first fluid flow F1 and the second fluid flow F2 are simultaneously provided, and the flows mix together inside the flow volume 180 upon opening of the diaphragm 170 before reaching the outlet 130 and exiting the adjustable dosage control valve 100 as a combined output flow F3. Hence, in certain embodiments, the flow volume 180 is implemented as a mixing volume where the first fluid flow F1 and the second fluid flow F2 coincide and the two flows F1 , F2 are evenly and controllably mixed.
[0069] In certain embodiments, the diaphragm valve seat 175 is made of an elastomer. In certain embodiments, the valve seat 175 is made of ethylene propylene diene monomer rubber (EPDM). In certain embodiments, the valve seat 175 is made of EPDM combined with fluorine compounds, such as polytetrafluoroethylene (PTFE). In certain embodiments, the valve seat 175 is made of natural rubber. In certain embodiments, the valve seat 175 is made of butyl. In certain embodiments, the valve seat 175 is made of fluorocarbon-based fluoroelastomer materials. In certain embodiments, the valve seat 175 is made of metal or metal alloy.
[0070] In certain embodiments, the diaphragm 170 of the diaphragm valve portion is made of metal. In certain embodiments, the diaphragm 170 is made of or metal alloy. In certain embodiments, the diaphragm 170 is made of cobolt or nickel based super alloy, for instance, 20Cr-15Ni-40Co-7Mo-16Fe. Preferably, in certain embodiments, the diaphragm 170 material is corrosive resistive, high strength, ductile, long fatigue life metal alloy.
[0071] However, the usability of the present disclosure is not limited by the diaphragm or diaphragm seat material, but it is applicable and adaptable to various fields, processes and conditions. In general, the diaphragm material is chosen by a skilled person to provide best compatibility, reliability and optimal performance with respect to the used chemicals, application, and equipment. The skilled person is expected to be aware of the limitations of different diaphragm materials and the requirements of the processes they are using and, hence, be able to choose the optimal diaphragm material for the adjustable dosage control valve 100 accordingly.
[0072] A needle valve portion is integrated to the valve body 110 of the adjustable dosage control valve 100. In certain embodiments, the needle valve portion comprises a movable needle valve head 150, plunger rod 155, needle valve housing 140, and an adjustment assembly 160. Also, bellows 165 are provided. In certain embodiments, the needle valve housing 140 is at least partially formed by the valve body 110.
[0073] The needle valve head 150 is located in a needle valve housing 140 inside the valve body 110. The needle valve housing 140 further comprises a needle valve outlet wall 145, whose (inner surface) shape matches the (outer surface shape) of the needle valve head 150. In certain embodiments, the needle valve portion is at least partially closed to adjust the first fluid flow F1 (that is, the gap between the needle valve outlet wall 145 and needle valve head is partially closed). In certain embodiments, the needle valve position is fully closed. In certain embodiments, the opening and closing of the needle valve portion is adjusted in rea-time during processing.
[0074] The needle valve head 150 is movable inside the needle valve housing 140 such that the gap between (the outer surface of) the needle valve head 150 and (the inner surface of) the needle valve outlet wall 145 can be adjusted. When the gap is closed, or at least partially closed, that is, the gap between (the outer surface of) the needle valve head 150 and needle valve outlet wall 145 is closed, or at least partially closed, such that no, or limited amount of, fluid flow is allowed through the needle valve portion. By moving the needle valve head 150, such that the said gap opens and widens, fluid flow through the needle valve portion is enabled. Advantageously, by adjusting the said gap width between the needle valve head 150 and (the inner surface of) the needle valve outlet wall 145, the first fluid flow F1 passing through the needle valve portion may be precisely regulated. The needle valve head 150 is attached to a first end of the plunger rod 155 inside needle valve housing 140 in the valve body 110. In certain embodiments, the needle valve head 150 is conical. However, other shapes of the needle valve head 150 are possible too, as long as the needle valve outlet wall 145 is configured to match the shape. For instance, Fig. 5 presents a cylindrical needle valve head 150 according to certain embodiments. In certain other embodiments, the needle valve head is spherical. The second end of the plunger rod 155 extends outside the valve body 110. The plunger rod 155 is attached from its second end to the adjustment assembly 160 located outside the valve body 110. By manipulating the adjustment assembly 160, (the position of) the plunger rod 155 can be extended or retracted such that the needle valve head 150 is moved inside the needle valve housing 140 and in relation to the needle valve outlet wall 145. Hence, the opening and closing of the needle valve portion is adjusted by manipulating the adjustment assembly 160 to move the needle valve head 150.
[0075] In certain embodiments, the adjustment assembly 160 (and thus the position of the needle valve head 150) is manually operated by a user. In certain embodiments, the adjustment assembly 160 is automatically adjusted by a control unit 700. In certain embodiments, the adjustment assembly 160 is set at a predetermined value (or position) for the duration of processing (when fluid flow through the valve 100 is required). In certain embodiments, the adjustment assembly 160 is actively adjusted in real-time, or in substantially real-time, during processing. In certain embodiments, the adjustment assembly 160 comprises an adjustment screw to adjust the position of the needle valve head 150. In certain embodiments, the adjustment assembly 160 comprises servo motor-driven actuator. In certain embodiments, the adjustment assembly 160 comprises a pneumatic actuator. In certain embodiments, the adjustment assembly 160 comprises a linear motor. In certain embodiments, the adjustment assembly 160 comprises a piezoelectric actuator.
[0076] The (vacuum) bellows surround the plunger rod 155 outside the valve body 110. The bellows enable movement of the plunger rod 155 with respect to the valve body 110, and thus also the movement of the needle valve head 150 inside the valve body 110 controlled by the adjustment assembly 160, while preventing leaking of fluid(s) through the needle valve housing 140.
[0077] In certain embodiments, the needle valve portion is integrated to the valve body 100 such that the needle valve head 150 is directed perpendicularly towards the diaphragm 170 along the flow path of the first fluid flow F1 . Hence, the needle valve housing 140 is also aligned perpendicular to the diaphragm 170. That is, the needle valve portion is located practically opposite to the diaphragm valve portion, such that the needle valve head is located in the first flow path of the first fluid flow F1 . The needle valve portion comprising the needle valve outlet wall 145 is configured to adjust the first fluid flow F1 flowing pass the needle valve head 150. For clarity, it is reminded that according to embodiments depicted by Fig. 2, the first fluid flow F1 enters the valve body in the needle valve housing 140 below the needle valve head 150 (inlet 120 not shown in the Fig. 2). Therefrom, the first fluid flow proceeds “upwards” to the diaphragm 170. The diaphragm 170 regulates the further fluid flow towards the outlet 130.
[0078] Advantageously, the needle valve portion enables accurate and adjustable control of the first fluid flow F1 at the diaphragm 170. Since the empty space between the needle valve head 150 and diaphragm 170 is substantially eliminated, or at least minimized, the fluid accumulation and pressure build up in said space is minimized, even if the needle valve portion was kept open and the diaphragm 170 fully closed. Therefore, the first fluid flow F1 reaching and passing the diaphragm 170 remains at all times under (substantially) immediate control of the needle valve portion. Accordingly, only the desired first fluid flow F1 is allowed to arrive at the diaphragm 170, thus, adverse pressure spiking upon opening of the diaphragm valve portion are minimized and substantially prevented. Further, the needle valve portion can be further adjusted during processing to finetune the fluid flow during processing.
[0079] In certain embodiments, the position of the needle valve head 150 is actively adjusted in real-time during opening of the diaphragm valve (by the control unit 700). In certain embodiments, the active adjustment of the needle valve head 150 is based on real-time flow measurement data, real-time pressure data, or pre-defined parameters.
[0080] In certain embodiments, first fluid flow F1 and second fluid flow F2 are provided to the adjustable dosage control valve 100 simultaneously via the first inlet 120 and the second inlet 125, respectively. The first fluid flow F1 is controlled by adjusting the needle valve head 150 and the diaphragm 170. The second fluid flow F2 is controlled (only) by adjusting the diaphragm 170. Upon opening of the diaphragm 170 (and the needle valve portion), the two fluid flows coincide at the transient flow volume 180. In certain embodiments, the first fluid is a reaction precursor for a thin-film deposition or etching process. In certain embodiments, the second fluid is an inert carrier gas, such as nitrogen or argon, for a thin-film deposition or etching process. Both the needle valve portion and the diaphragm valve portion can be fully closed. In certain embodiments, the diaphragm valve portion is first opened (by opening the diaphragm 170 by a desired amount) to allow the second fluid flow F2 to pass through the valve body 110, before opening of the needle valve portion. Therefore, a steady output flow consisting of only the second fluid flow F2 can be established since the first fluid flow F1 remains blocked by the needle valve head 150. Upon controlled opening of the needle valve portion (by moving the needle valve head 150), accurate dosage of the first fluid is then allowed to flow to the flow volume 180 and to mix with the second fluid flow F2. Thus, in certain embodiments, the first fluid flow F1 and the second fluid flow F2 are combined inside the flow volume 180 in the valve body 110 before reaching the outlet 130 as a combined outlet flow F3. In certain embodiments, pulsed combined (F1 +F2) output flow F3 is provided by pulsing the diaphragm 170.
[0081] Notice, that in certain embodiments the pressure and flow rate of the first fluid flow F1 reaching the diaphragm 170 and, thereafter, flow volume 180, is accurately controlled at all times by adjusting the needle valve head 150. Further, in certain embodiments, the combined output flow (F1 +F2) is controlled by the opening of the diaphragm 170. Hence, unintended pressure spikes may be avoided when the two flows are mixed, and a steady combined output flow (F1 +F2) is established.
[0082] In certain embodiments, the ratio of the first fluid and the second fluid in the output flow F3 is adjusted by controlling the opening of the diaphragm 170 and the position of the needle valve head 150. In certain embodiments, the output flow F3 and mixing of the first fluid flow F1 and the second fluid flow F2 are further adjusted during processing (by moving the needle valve head 150 and / or the diaphragm 170). In certain embodiments, other valve(s) (not shown), separate from the adjustable dosage control valve 100, are additionally used to regulate the first fluid flow F1 and / or the second fluid flow F2 before they reach the adjustable dosage control valve 100 to provide additional control.
[0083] Fig. 3a schematically shows an adjustable dosage control valve according to certain embodiments. Fig. 3b shows a schematical cross-section of an adjustable dosage control valve according to Fig. 3a in a Y-Z plane. Further Fig. 3c shows a schematical cross-section of an adjustable dosage control valve according to Fig. 3a in an X-Z plane. The Figs. 3a-3c show the needle valve head in (partially) open configuration, and the diaphragm 170 in closed configuration. The curved dashed line in Figs. 3b and 3c depict the diaphragm in an open configuration, housing the flow volume 180 beneath the inner concave surface of the open diaphragm 170. Arrows in the figures depict fluid flow directions. Also, notice that the actuator 195 and the actuating member 195 of the diaphragm valve portion, as well as the bellows 165 and the adjustment assembly 160 of the needle valve portion are omitted from the Figs. 3a-5.
[0084] In certain embodiments, the adjustable dosage control valve 100 has two inlets 120, 125 and one outlet 130 as shown in Figs. 3a-3c. The first inlet 120 provides the first fluid flow F1 and the second inlet 12 provides the second fluid flow F2 to the valve body 110. The first inlet 120 is connected and configured to provide the first fluid flow F1 to the needle valve housing 140 below the needle valve head 150 (Fig. 3c). Thus, the needle valve head 150 is located in the flow path of the first fluid flow F1. The first fluid flow F1 proceeds to the diaphragm 170 along the needle valve housing 140 and between the needle valve head 150 and the needle valve outlet wall 145. Thus, in certain embodiments, needle valve head 150 is located upstream of the diaphragm 170 (in view of the first fluid flow (F1 ). Therefore, by adjusting the position of the needle valve head 150, the first fluid flow F1 to the diaphragm 170 can be adjusted. The first fluid flow F1 , after having passed the needle valve head 150, is further controlled by the opening of the diaphragm 170. The second fluid flow F2 is also controlled by the opening of the diaphragm 170, but not by (the position of) the needle valve head 150. Therefore, the diaphragm 170 is located in the flow path of both the first fluid flow F1 and the second fluid flow F2.
[0085] In certain embodiments, upon opening of the diaphragm, a (transient) flow volume 180 is formed and both the first fluid flow F1 and the second fluid flow F2 are allowed to flow through the flow volume 180 towards the outlet 130. However, the flow of the first fluid flow F1 to and through the flow volume 180 can be prevented by closing the needle valve portion. The open position of the diaphragm 170, forming the flow volume 180 between the concave inner surface of the open diaphragm 170 and the valve seat 175, is depicted with a curved dashed line in Figs. 3b-3c. In certain embodiments, the first fluid flow F1 and the second fluid flow F2 coincide in the flow volume 180 and mix together before exiting the adjustable dosage control valve 100 through the outlet 130.
[0086] In certain embodiments, the needle valve outlet wall 145 housing the needle valve head 150 is (substantially) immediately adjacent to the diaphragm 170 as shown in the Figs. 3a- 3c. Hence, the space between the needle valve and the diaphragm valve may be minimized, or even eliminated as far as structurally possible. Advantageously, the needle valve portion may be enabled with immediate and direct control of the first fluid flow F1 reaching the diaphragm 170. In other words, undesired pressure build-up or delayed control of the first fluid flow F1 between the needle valve head 150 and the diaphragm 170 can be minimized or even avoided. Hence, pressure spiking resulting from the first fluid flow F1 upon opening of the diaphragm 170 is mitigated, as the dosage of the flow F1 is accurately adjusted by the needle valve portion. Further, accurate dosage control of the first fluid is enabled. In certain embodiments, the first fluid is a reaction precursor of a thin-film deposition process, such as ALD or MLD.
[0087] As the second fluid flow F2 is not under control of the needle valve portion, it is controlled only by the opening of the diaphragm 170. In certain embodiments, to prevent pressure spiking effects downstream of the adjustable dosage control valve 100 caused by the second fluid flow F2 upon opening of the diaphragm 170, a steady constant flow of the second fluid flow F2 is established. That is, the diaphragm 170 is retained in an open position to allow a constant stable flow of the second fluid through the flow volume 180. In certain embodiments, the diaphragm is opened in a pulsing manner to provide a (continuous) pulsed second fluid flow F2 through the flow volume 180. In certain embodiments, the second fluid flow F2 is an inert carrier gas flow of a thin-film deposition process. In certain embodiments, only the second fluid flow F2 is allowed to pass through the adjustable dosage control valve 100.
[0088] The dosage of the first fluid to the (constant or pulsed) second fluid flow F2 is adjusted by controlling the position of the needle valve head 150 to provide a combined output flow F3 (F2 + dosed F1 ). The first fluid flow F1 and the second fluid flow F2 are combined in the flow volume 180 inside the valve body 110 before reaching the outlet 130. In certain embodiments, the position of the needle valve head 150 is actively adjusted in real-time during opening, or pulsing, of the diaphragm valve portion. In certain embodiments, the active adjustment of the needle valve head 150 is based on real-time flow measurement data, real-time pressure data, or pre-defined parameters.
[0089] Fig. 4a schematically shows an adjustable dosage control valve according to certain embodiments. Fig. 4b shows a schematical cross-section of an adjustable dosage control valve according to Fig. 4a in a B-A plane. Fig. 4c shows a schematical cross-section of an adjustable dosage control valve according to Fig. 4a in a C-A plane. The Figs. 4a-4c show the needle valve head in (partially) open configuration, and the diaphragm 170 in closed configuration. Open position of the diaphragm 170, housing the flow volume 180, is depicted with a curved dashed line in Figs. 4b-4c. Arrows depict fluid flow directions. Figs 4a-4c show an adjustable dosage control valve 100 according to certain embodiments, where the second fluid flow F2 is controlled neither by (the opening of) the diaphragm 170 nor (the position of) the needle valve head 150. Instead, the second fluid flow F2 directly and unadjusted flows through the valve body 110. That is, the second inlet 125 is directly connected to the outlet 130 without any adjustment means (diaphragm, needle valve head) placed in its flow path inside the valve body 110. The second inlet 125 (forming second flow path in the valve body 110) provides the second fluid flow F2 to the valve body 110 of the adjustable dosage control valve 100. In such embodiments, the second fluid flow F2 is controlled by other valves (not shown), separate from the adjustable dosage control valve 100. In certain embodiments, the second fluid flow is carrier gas, such as nitrogen, oxygen, or argon, preferably an inert carrier gas, namely nitrogen or argon provided for a thin-film deposition process, such as ALD.
[0090] In certain embodiments depicted by Figs. 4a-4c, the first fluid flow F1 is controlled by both (the opening of) the diaphragm 170 and (the position of) the needle valve head 150. The first fluid flow F1 is provided to the valve body 110 of the adjustable dosage control valve 100 by the first inlet 120 (forming the first flow path in the valve body 110). From the first inlet 120, the first fluid flow F1 proceeds to the diaphragm 170. The diaphragm 170 is located in the flow path of the first fluid flow F1 . The first fluid flow must pass the diaphragm 170 before reaching needle valve housing 140. That is, in certain embodiments, the needle valve head 150 is located downstream of the diaphragm 170 (in view of the flow of the first fluid flow F1 ). The needle valve head 150, within the needle valve housing 150, is directed towards the diaphragm 170, downstream of the diaphragm 170 inside the valve body 110. The needle valve head 150 can block the fluid flow from the diaphragm 170 by being pressed against the needle outlet wall 145.
[0091] In certain embodiments, opening of the diaphragm 170 enables constant flow of the first fluid, through the flow volume 180, to the needle valve flow channel 145 (located between the diaphragm 170 and the needle valve head 150). In certain embodiments, the diaphragm 170 is used to adjust the first fluid flow F1 with time. In certain embodiments, the diaphragm 170 is used to provide a pulsed first fluid flow F1 to the needle valve flow channel 145.
[0092] The movable needle valve head 150 (of the needle valve portion) controls the access of the first fluid flow F1 to the outlet 130. At the same time, the mixing of the first fluid flow F1 to the constant second fluid flow F2 is controlled. That is, the movable needle valve head 150 also adjusts the composition and flow of the output flow F3 (F1 +F2). By adjusting the position of the needle valve head (via the plunger rod 155 by the adjustment assembly 160), accurate dosage of the first fluid is allowed to mix with the second fluid flow F2 flowing through the adjustable dosage control valve 100. In certain embodiments, the second fluid flow F2 is blocked (by some other valve; not shown) and only the first fluid flow F1 is dosed through the adjustable dosage control valve 100. In certain embodiments, only the second fluid flow F2 is allowed to flow through (the valve body 110 of) the adjustable dosage control valve 100.
[0093] By combining the diaphragm portion and the needle valve portion, accurate dosing of the first fluid flow F1 may be improved. The opening of the diaphragm 170 regulates the access of the first fluid to the needle valve flow channer 145. Thereafter, the movable needle valve head 150 regulates the access of the first fluid flow towards the outlet 130. At the same time, mixing of the first fluid and the second fluid are controlled (when the second fluid flow F2 is passing through the adjustable dosage control valve 100). Advantageously, the needle valve portion may mitigate the undesired pressure spikes that may have resulted from fluid build-up upstream of the diaphragm 170 when at a closed position. For instance, even though an accumulation of a high vapor pressure fluid upstream of the diaphragm 170 would cause a pressure spike, the needle valve portion is able to minimize the pressure spike effects to the output flow F3.
[0094] In certain embodiment, the needle valve portion is adjusted in real-time. In certain embodiments, the real-time adjustment is based on the monitored characteristics of the flow passing through the diaphragm 170. In certain embodiments, the real-time adjustment is based on the output flow F3. Therefore, the dual flow adjusting means of the adjustable flow control valve 100 enable improved and accurate control and dosage of the first fluid flow F1 to the outlet 130 (and to the second fluid flow F2), as well as the control of the output flow F3.
[0095] Fig. 5 schematically shows a cross-section of an adjustable dosage control valve according to certain embodiments. Fig. 5 illustrates an adjustable dosage control valve 100 with a cylindrical needle valve head 150 according to certain embodiments. However, the shape of the needle valve head 150 in general is not limited to conical but different shapes may be used. In certain embodiments, the needle valve head 150 can also be conical or spherical. The cylindrical needle valve head 150 in Fig. 5 is surrounded by an annular cavity 510. The annular cavity allows the first fluid flow F1 to spread evenly around the circumference of the needle valve head 150. By moving the cylindrical needle valve head 150, the width of the flow gap between the needle valve head upper surface 520 and the inner upper surface of the annular cavity 510 is adjusted. By closing the gap, the first fluid flow FI through the needle valve portion towards the diaphragm 170 is blocked. By adjusting (opening or closing) the gap, by moving the cylindrical needle valve head 150 via the plunger rod 155 by the adjustment assembly 160 (not shown), the first fluid flow F1 through the needle valve portion towards the diaphragm 170 is allowed and adjusted to reach the desired flow. By opening of the diaphragm 170 the first fluid flow F1 having passed the cylindrical needle valve head 150 is further adjusted and its access towards the outlet 130 (not shown) controlled.
[0096] Fig. 6a and 6b schematically show substrate processing apparatuses comprising an adjustable dosage control valve according to certain embodiments. In certain embodiments, the substrate processing apparatus 600 is a thin-film deposition apparatus, such as an ALD reactor or a CVD reactor. In certain embodiments, the apparatus 600 is an apparatus for ALD, CVD or MLD processing. In certain embodiments, the substrate processing apparatus is an etching apparatus, such as an ALE reactor. The skilled person however appreciates that the substrate processing apparatus is not limited to the above exemplary embodiments, but other substrate processing apparatuses are possible as well.
[0097] The substrate processing apparatus 600 comprises a reaction chamber 610, i.e., a processing chamber for processing of substrates 620, such as silicon wafers. In certain embodiments, the apparatus 600 comprises a vertical flow reaction chamber 610. In certain embodiments, the apparatus 600 comprises a horizontal flow reaction chamber 610. In certain embodiments, the apparatus 600 comprises a laminar flow reaction chamber 610.
[0098] A substrate holder 630 is located inside the reaction chamber and configured to support the substrates 620. The substrates 620 are placed onto the substrate holder 630 for processing. In certain embodiments, the apparatus is for processing of a single substrate 620 at a time, as shown in Fig. 6a. In certain embodiments, the apparatus 600 is configured to process a batch of substrates 620, as schematically shown in Fig. 6b. In certain embodiments, the batch of substrates 620 is arranged as a stack within the reaction chamber. In certain embodiments, the substrate surface(s) are arranged parallel to the fluid flow direction through the reaction chamber 610 for processing. In certain embodiments, the substrate surface(s) are arranged perpendicular to the fluid flow direction through the reaction chamber 610 for processing. In certain embodiments, the substrate processing apparatus 600 further comprises an outer chamber 640 that at least partially surrounds the reaction chamber 610. In certain embodiments, the outer chamber 640 (fully) encloses the reaction chamber 610. Thus, the reaction chamber 610 can also be referred to as the inner chamber. Accordingly, in certain embodiments, an intermediate space 645 is formed between the (outer) walls of the reaction chamber 610 and the (inner) walls of the outer chamber 640. In certain embodiments, the interior of the reaction chamber 610 and the intermediate space 645 are separable from each other at least for the duration of substrate processing such that different vacuum conditions can be established and maintained in the reaction chamber 610 and the intermediate space 645. Alternatively, in certain embodiments, the substrate processing apparatus comprises only the reaction chamber 610 and not the outer chamber 640, that is, there intermediate space 645 is lacking.
[0099] The substrate processing apparatus 600 comprises a reaction chamber inlet 650 for providing reaction gas(es), precursor(s) and / or plasma to the reaction chamber. The reaction chamber inlet 650 is shown in Fig. 6 as a solid arrow, the arrowhead depicting the fluid flow direction into the reaction chamber 610. The reaction gas(es), precursor(s) and / or plasma from the reaction chamber inlet 650 are directed to the substrate 620 for surface processing.
[0100] An adjustable dosage control valve 100 is coupled to the reaction chamber inlet 650 to regulate the inflow of rection gas(es), precursor(s), and / or plasma into the reaction chamber 610. That is, the output flow F3 of the adjustable dosage control valve is configured to form the inflow of the reaction chamber 610. The adjustable dosage control valve 100 can be for example any of the adjustable dosage control valves shown in Figs. 1-5. Advantageously, due to the valve 100, the fluid flow to the reaction chamber 610 can be accurately controlled.
[0101] The reaction gas flow inside the reaction chamber 610 after meeting the substrate 620 is schematically depicted with the dashed arrows in Fig. 6. Eventually, the reaction gases exit the reaction chamber as they are removed through an exhaust outlet 660. The exhaust outlet may be connected to a pump (not shown), such as a vacuum pump for facilitating gas removal and controlling the vacuum conditions inside the reaction chamber 610.
[0102] Fig. 7 schematically depicts the control unit 700 according to certain embodiments. In certain embodiments, the control unit is connected to and configured to control the adjustable dosage control valve 100. In certain embodiments, the control unit 700 is a computing device, such as a general-purpose computer, connected to the adjustable dosage control valve 100.
[0103] In certain embodiments, the control unit 700 comprises at least one processor 710. In certain embodiments, the control unit comprises a at least one memory (storage unit) for storing computer-readable program code 730. In certain embodiments, the memory 720 also is configured to store data received from sensor for controlling the adjustable dosage control valve 100, such as pressure data from first inlet 120, second inlet 120, and / or outlet 130. In certain embodiments, the at least one processor 710 is configured to execute the instructions of the computer program code 730 stored in the memory 720. Thus, automatic and / or real-time control of the adjustable dosage control valve 100 may be achieved.
[0104] In certain embodiments, the control unit 700 comprises an input / output module 740. In certain embodiments, the control unit 700 is connected to the adjustable dosage control valve 100 via the input / output module 740, as schematically shown by the dashed line in Fig. 7. The connection may be based on standard wired or wireless communication means, such as cabling or WLAN. In certain embodiments, the control unit 700 is configured to control the adjustable dosage control valve via the input / output module 740. In certain embodiments, the input / output module 740 comprises a receiver unit at the adjustable dosage control valve 100 configured to receive and implement the instructions from the control unit 700 via the input / output module 740. In certain embodiments, the control unit 700 is connected to sensor(s) providing pressure and flow data for controlling the adjustable dosage control valve 100 through the input / output module 740.
[0105] In certain embodiments, the control unit 700 comprises a user interface module 750. The user interface module enables users to interact with the control unit 700. The user interface module may comprise visual, audio, or mechanical means for interacting with the control unit, such as a keyboard, touchscreen, headphones, and / or status lights. In certain embodiments, the user interface module 750 is used to add, modify, or remove the program code or data in the memory 720.
[0106] In certain embodiments, the control unit 700 comprises a processor 710 and a memory 720 comprising computer-readable program code 730, wherein the memory 720 and the computer program code 730 are configured to, when executed by the processor 710, cause the adjustable dosage control valve 100 to regulate, by a diaphragm valve portion integrated to a valve body 110 of the valve 100, flow of a first fluid flow F1 through the valve body 110 and its discharge as output flow F3 through an outlet 130 of the valve 100. In certain embodiments, the control unit 700, comprising the processor 710, memory 720 and program code 730 is further configured to, when the program code 730 is executed, adjustably control, together with the diaphragm valve portion, by a needle valve portion comprising a movable needle valve head 150 positioned in a flow path of the first fluid flow F1 in the valve body 110, the output flow F3 discharged through the outlet 130.
[0107] Fig. 8 shows a flow chart of a method according to certain embodiments. The method may be implemented by one or more of the embodiments of the adjustable dosage control valve 100 or substrate processing apparatus 600 described in the foregoing. The method may also be controlled by the control unit 700.
[0108] 810: Optionally, providing first fluid flow F1 into a valve body. In certain embodiments, the method comprises providing first fluid flow F1 via a first flow path into a valve body 110 of the adjustable dosage control valve 100. In certain embodiments, the first fluid flow F1 is provided via the first inlet 120. In certain embodiments, the method also providing a second fluid flow in a second fluid path (via the second inlet for forming second flow path) in the valve body 110.
[0109] 820. Regulating fist fluid flow through the valve body by a diaphragm valve portion. In certain embodiments, the method comprises regulating, by a diaphragm valve portion, positioned in the first flow path in the valve body 110, the flow of the first fluid flow F1 through the valve body 110 and its discharge as output flow F3 from the valve body 110. In certain embodiments, the method comprises regulating flow of both the first fluid flow F1 and the second fluid flow F2 through the valve body 110 with the diaphragm portion.
[0110] 830: Adjustably controlling, together with the diaphragm valve portion, the output flow discharged from the valve body by a needle valve portion positioned in the first flow path in the valve body. In certain embodiments, the method comprises regulating both the first fluid flow F1 and the second fluid flow F2 with the diaphragm portion and the first fluid flow F1 also with the needle valve portion. In certain embodiment, the method comprises allowing the second fluid flow F2 to freely flow through the valve body 110. In certain embodiments, the method comprises combining the first fluid flow F1and the second fluid flow F2 within the valve body into a combined output flow F3 (before discharging from the valve body 110).
[0111] In certain embodiments, adjustably controlling, together with the diaphragm portion, by the needle valve portion the output flow (F3) discharged through the outlet (130), further comprises at least partially closing or opening the needle valve portion. Without limiting the scope and interpretation of the patent claims, certain technical effects of one or more of the example embodiments disclosed herein are listed in the following. A technical effect is improved control of fluid flow(s). Another technical effect is mitigating the effects of pressure spikes.
[0112] Various embodiments have been presented. It should be appreciated that in this document, words comprise, include, and contain are each used as open-ended expressions with no intended exclusivity.
[0113] The foregoing description has provided by way of non-limiting examples of particular implementations and embodiments a full and informative description of the best mode presently contemplated by the inventors for carrying out the invention. It is however clear to a person skilled in the art that the invention is not restricted to details of the embodiments presented in the foregoing, but that it can be implemented in other embodiments using equivalent means or in different combinations of embodiments without deviating from the characteristics of the invention.
[0114] Furthermore, some of the features of the afore-disclosed example embodiments may be used to advantage without the corresponding use of other features. As such, the foregoing description shall be considered as merely illustrative of the principles of the present invention, and not in limitation thereof. Hence, the scope of the invention is only restricted by the appended patent claims.
Claims
CLAIMS1 . An adjustable dosage control valve (100) for controlling fluid flow, comprising: a valve body (110), a first inlet (120) for forming a first flow path for a first fluid flow (F1 ) in the valve body (110), an outlet (130) for discharging output flow (F3) from the valve body (110), a diaphragm valve portion comprising a diaphragm (170) in the first flow path of the first fluid flow (F1 ) integrated to the valve body (110) configured to regulate the flow of the first fluid flow (F1 ) through the valve body (110) and its discharge as output flow (F3) through the outlet (130), and a needle valve portion comprising a movable needle valve head (150) positioned in the first flow path of the first fluid flow (F1 ) in the valve body (110), configured to adjustably control, together with the diaphragm valve portion, the output flow (F3) discharged through the outlet (130).
2. The adjustable dosage control valve (100) of claim 1 , wherein the movable needle valve head (150) is located downstream of the diaphragm (170).
3. The adjustable dosage control valve of claim 1 , wherein the movable needle valve head (150) is located upstream of the diaphragm (170).
4. The adjustable dosage control valve (100) of any preceding claim, wherein the needle valve head (150) is conical, cylindrical or spherical.
5. The adjustable dosage control valve (100) of any preceding claim, comprising an adjustment assembly (160) to adjust the position of the needle valve head (150).
6. The adjustable dosage control valve (100) of claim 5, wherein the adjustment assembly (160) comprises a servomotor-driven actuator, pneumatic actuator, linear motor, or piezoelectric actuator.
7. The adjustable dosage control valve (100) of claim 5 or 6, wherein the adjustment assembly (160) is configured to adjust the position of the needle valve head (150) actively in real-time during opening of the diaphragm (170).
8. The adjustable dosage control valve (100) of claim 7, wherein the active adjustment of the needle valve head (150) is based on real-time flow measurement data, real-time pressure data, or pre-defined parameters.
9. The adjustable dosage control valve (100) of any preceding claim, further comprising a second inlet (125) for forming a second flow path for a second fluid flow (F2) in the valve body (110).
10. The adjustable dosage control valve (100) of claim 9, configured to combine the first fluid flow (F1 ) and the second fluid flow (F2) inside the valve body (110) before reaching the outlet (130) as a combined output flow (F3).11 . The adjustable dosage control valve (100) of claim 9 or 10, wherein the first inlet (120) is a reaction precursor inlet.
12. The adjustable dosage control valve (100) of claim 9 or 10, wherein the second inlet (125) is a carrier gas inlet.
13. The adjustable dosage control valve (100) of any one of claims 9-12, wherein the diaphragm valve portion is configured to regulate both the flow of the first fluid flow (F1 ) and the flow of the second fluid flow (F2) through the valve body (110).
14. The adjustable dosage control valve (100) of any one of claims 9-12, wherein the adjustable dosage control valve (100) is configured to allow the second fluid flow (F2) to flow as a constant flow through the valve body (110) and to actively adjust only the first fluid flow (F1 ) by the diaphragm valve portion and the needle valve portion.
15. A substrate processing apparatus (600), comprising: a reaction chamber (610); and at least one adjustable dosage control valve (100) of any preceding claim to provide the reaction chamber (610) with a fluid flow.
16. Use of an adjustable dosage control valve (100) of any one of claims 1-14, in the substrate processing apparatus of claim 15, in a thin-film deposition process.
17. A method for controlling dosage of fluid flow through an adjustable dosage control valve (100), comprising:regulating, by a diaphragm valve portion comprising a diaphragm (170) in a first flow path of a first fluid flow (F1 ) integrated to a valve body (110) of the valve (100), flow of the first fluid flow (F1 ) through the valve body (110) and its discharge as output flow (F3) through an outlet (130) of the valve (100), and adjustably controlling, together with the diaphragm valve portion, by a needle valve portion comprising a movable needle valve head (150) positioned in the first flow path of the first fluid flow (F1 ) in the valve body (110), the output flow (F3) discharged through the outlet (130).
18. The method of claim 17, wherein adjustably controlling, together with the diaphragm portion, by the needle valve portion the output flow (F3) discharged through the outlet (130), further comprises: at least partially closing or opening the needle valve portion.
19. The method of claim 17 or 18, further comprising providing the output flow (F3), discharged from the outlet (130), as reactant flow for a thin-film deposition process.
20. A control apparatus for controlling an adjustable dosage control valve (100), comprising: a processor (710); and a memory (720) comprising computer-readable program code (730), wherein the memory (720) and the computer program code (730) are configured to, when executed by the processor (710), cause the adjustable dosage control valve (100) to: regulate, by a diaphragm valve portion integrated to a valve body (110) of the valve (100), flow of a first fluid flow (F1 ) through the valve body (110) and its discharge as output flow (F3) through an outlet (130) of the valve (100), and adjustably control, together with the diaphragm valve portion, by a needle valve portion comprising a movable needle valve head (150) positioned in a flow path of the first fluid flow (F1 ) in the valve body (110), the output flow (F3) discharged through the outlet (130).
Citation Information
Patent Citations
Injection valve
JP1993304100A
Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method
US20200278234A1