Insulation film and window structure

Abstract

According to embodiments of the present invention, an insulation film and a window structure comprising same are provided. The insulation film comprises: insulation patterns separated to be spaced apart from each other; and separation lines for partitioning the insulation patterns. The separation lines include first row-wise separation lines and second row-wise separation lines that are mirror-symmetrical to each other, and first column-wise separation lines and second column-wise separation lines that are mirror-symmetrical to each other.

Description

Insulating films and window structures

[0001] The present invention relates to an insulating film and a window structure. More particularly, it relates to an insulating film and a window structure comprising a plurality of insulating patterns.

[0002]

[0003] Recently, to improve heating and cooling efficiency and energy efficiency, low-emissivity (L-E) glass with high insulation properties has been used in building exterior walls, windows, vehicle windows, and other areas. Low-E glass offers enhanced insulation properties due to a metal coating formed on the glass surface. However, this metal coating can impede or block the movement of radio waves, increasing radio wave loss in the object to which the low-E glass is attached.

[0004] For example, as the information society develops, wireless communication technologies such as Wi-Fi and Bluetooth are being applied or built into display devices, electronic devices, buildings, the Internet of Things (IoT), and autonomous vehicles. Furthermore, with the recent advancement of mobile communication technology, antennas for high-frequency and ultra-high-frequency communication are being widely applied. For example, along with Wi-Fi, which operates in bands such as 2.4 GHz and 5 GHz, and Bluetooth, which operates in the 2.45 GHz band, 5G (5th-generation) communication systems, which operate in high-frequency bands (e.g., 28 GHz or higher), are being commercialized.

[0005] However, electromagnetic waves in the high-frequency or ultra-high-frequency bands have high transmission speeds and short wavelengths, and can cause loss, attenuation, or dissipation of electromagnetic waves when passing through building windows or car windows. Consequently, the signal efficiency and coverage of the antenna can be reduced.

[0006] Installing or forming an electromagnetic wave transparent region in low-E glass to compensate for signal loss may reduce thermal insulation. Furthermore, the electromagnetic wave transparent region may cause optical unevenness, which may degrade the transparency and visual characteristics of the window.

[0007] For example, Korean Patent Publication No. 10-2013-0048132 discloses an insulating film, but does not consider electromagnetic wave transmittance.

[0008]

[0009] One object of the present invention is to provide an insulating film having improved radio wave transmittance and insulating properties.

[0010] An object of the present invention is to provide a window structure having improved radio wave transmittance and thermal insulation.

[0011]

[0012] 1. An insulating film comprising insulating patterns separated from each other; and separating lines dividing the insulating patterns, wherein the separating lines include a first row-direction separating line and a second row-direction separating line that are mirror-symmetrical to each other; and a first column-direction separating line and a second column-direction separating line that are mirror-symmetrical to each other.

[0013] 2. In the above 1, a row-direction line pair is defined by the adjacent first row-direction separation line and the second row-direction separation line, and a plurality of the row-direction line pairs are repeated along the column direction.

[0014] An insulating film, wherein pairs of column-direction lines are defined by adjacent first column-direction separation lines and second column-direction separation lines, and a plurality of pairs of column-direction lines are repeated along the row direction.

[0015] 3. In the above 1, the first row direction separation line and the second row direction separation line each have a wave line shape with the same period, an insulating film.

[0016] 4. In the above 1, the first heat direction separation line and the second heat direction separation line each have a wave line shape with the same period, an insulating film.

[0017] 5. In the above 1, the insulating film includes a first insulating pattern and a second insulating pattern having different shapes.

[0018] 6. In the above 5, the insulating film in which the first insulating pattern and the second insulating pattern are alternately and repeatedly arranged along the column direction and alternately and repeatedly arranged along the row direction.

[0019] 7. An insulating film in the above 5, wherein the first insulating pattern is periodically repeated and the second insulating pattern is periodically repeated.

[0020] 8. In the above 5, a unit cell is defined by one insulation pattern in a complete form among the insulation patterns, and segments of the insulation pattern arranged around the one insulation pattern,

[0021] An insulating film in which the above unit cells are repeated along the row and column directions.

[0022] 9. In the above 8, the unit cell comprises a pair of first column-direction separation line segments and second column-direction separation line segments, and a pair of first row-direction separation line segments and second row-direction separation line segments, an insulating film.

[0023] 10. In the above 9, the first column-direction separation line segment and the second column-direction separation line segment are mirror-symmetrical to each other,

[0024] An insulating film wherein the first row-direction separation line segment and the second row-direction separation line segment are mirror-symmetrical to each other.

[0025] 11. In the above 8, the segments of the insulation pattern include a first insulation pattern segment and a second insulation pattern segment having different shapes,

[0026] An insulating film in which the first insulating pattern segments and the second insulating pattern segments are alternately arranged clockwise or counterclockwise around the one insulating pattern within the unit cell.

[0027] 12. In the above 8, the segments of the insulating pattern are arranged mirror-symmetrically with respect to an imaginary line passing through the center of one insulating pattern within the unit cell, the insulating film

[0028] 13. In the above 1, an insulating film including a metal layer with the insulating patterns.

[0029] 14. A window structure comprising a window substrate; and an insulating film according to the above-described embodiments disposed on the window substrate.

[0030] 15. In the above 14, the window structure includes a first window substrate and a second window substrate facing each other, and the insulating film is attached to one of the first window substrate and the second window substrate.

[0031] 16. A window structure according to the above 15, further comprising an air layer formed between the first window substrate and the second window substrate.

[0032]

[0033] An insulating film according to embodiments of the present invention may include an insulating layer formed by regularly arranging a plurality of unit cells. The insulating layer may include separation lines having a wave-like shape. The non-uniformity of the shape due to the separation lines and the regularity of the arrangement of the unit cells may be included in the insulating layer. Accordingly, moire and light scattering phenomena occurring in the insulating film can be suppressed, and light transmittance can be enhanced.

[0034] The above insulating layer may include island-shaped insulating patterns defined by the above separation lines. Accordingly, the electromagnetic wave transmission characteristics of the insulating film may be improved.

[0035] The above separation lines can be arranged so that adjacent separation lines are mirror-symmetrical to each other. Accordingly, the thermal resistance and insulation properties of the insulating film can be improved, while optical irregularities or optical defects such as the starburst phenomenon can be reduced.

[0036]

[0037] FIG. 1 and FIG. 2 are schematic cross-sectional and plan views, respectively, showing an insulating film according to exemplary embodiments.

[0038] FIG. 3 is a schematic, partially enlarged plan view illustrating a unit cell according to exemplary embodiments.

[0039] Figure 4 is a schematic cross-sectional view showing an insulating film according to exemplary embodiments.

[0040] FIGS. 5 and 6 are schematic cross-sectional views each showing a window structure according to exemplary embodiments.

[0041] Figure 7 is a schematic plan view showing an insulating film according to Comparative Example 2.

[0042] Figure 8 is an image of a light source observed through a window structure of an embodiment.

[0043] Figure 9 is an image of a light source observed through the window structure of Comparative Example 1.

[0044] Figure 10 is an image of a light source observed through the window structure of Comparative Example 2.

[0045]

[0046] Embodiments of the present invention provide an insulating film including a conductive pattern.

[0047] Hereinafter, embodiments of the present invention will be described in more detail with reference to the drawings. However, the following drawings attached to this specification illustrate preferred embodiments of the present invention and, together with the contents of the invention described above, serve to further understand the technical concept of the present invention. Therefore, the present invention should not be interpreted as being limited to the matters described in such drawings.

[0048] The terms “upper”, “lower”, “top surface”, “bottom surface”, etc. used in the present invention indicate the relative positions of each component and do not imply an absolute superior-subordinate relationship.

[0049] In the present application, the first direction and the second direction may refer to two directions that are parallel to the upper surface of the insulating film and are perpendicular to each other. For example, the first direction may refer to the row direction, the X direction, or the width direction. The second direction may refer to the column direction, the Y direction, or the length direction.

[0050] FIG. 1 and FIG. 2 are schematic cross-sectional and plan views, respectively, showing an insulating film according to exemplary embodiments.

[0051] Referring to FIGS. 1 and 2, an insulating film according to exemplary embodiments may include a formed insulating layer (110) including insulating patterns. In some embodiments, the insulating film may include a substrate layer (100) on which the insulating layer (110) is formed.

[0052] The substrate layer (100) may include, for example, a resin material. For example, the substrate layer (100) may include a polyester resin such as polyethylene terephthalate, polyethylene isophthalate, polyethylene naphthalate, or polybutylene terephthalate; a cellulose resin such as diacetyl cellulose or triacetyl cellulose; a polycarbonate resin; an acrylic resin such as polymethyl (meth)acrylate or polyethyl (meth)acrylate; a styrene resin such as polystyrene or an acrylonitrile-styrene copolymer; a polyolefin resin such as polyethylene, polypropylene, a polyolefin having a cyclo- or norbornene structure, or an ethylene-propylene copolymer; a vinyl chloride resin; an amide resin such as nylon or an aromatic polyamide; an imide resin; a polyethersulfone resin; a sulfone resin; a polyetheretherketone resin; a sulfated polyphenylene resin; a vinyl alcohol resin; It may include vinylidene chloride resin; vinyl butyral resin; allylate resin; polyoxymethylene resin; epoxy resin; urethane or acrylic urethane resin; silicone resin, etc. These may be used alone or in combination of two or more.

[0053] In some embodiments, the substrate layer (100) may include an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, glass, or the like.

[0054] In some embodiments, the insulating layer (110) may be disposed on the upper surface of the substrate layer (100). According to exemplary embodiments, the insulating layer (110) may include repeatedly arranged insulating patterns (105, 107). The insulating patterns (105, 107) may be partitioned and defined by separation lines (102, 104, 106, 108).

[0055] The insulating patterns (105, 107) may be island patterns that are independently separated or spaced apart from each other by separation lines (102, 104, 106, 108). The insulating patterns (105, 107) may be relief patterns that protrude from the substrate layer (100) or the window surface. The insulating patterns (105, 107) may include a solid metal layer. For example, the insulating patterns (105, 107) may not have a structure having openings such as a mesh structure.

[0056] For example, the separation lines (102, 104, 106, 108) may be etched lines forming the insulating patterns (105, 107). In some embodiments, after forming an insulating coating layer for forming the insulating patterns (105, 107), the separation lines (102, 104, 106, 108) may be formed by etching the insulating coating layer using an etching mask. For example, the separation lines (102, 104, 106, 108) may be empty spaces such as line-shaped trenches or voids.

[0057] The insulating patterns (105, 107) or the insulating coating layer may include a metal or alloy layer. For example, the insulating patterns (105, 107) or the insulating coating layer may include silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), titanium (Ti), tungsten (W), niobium (Nb), tantalum (Ta), vanadium (V), iron (Fe), manganese (Mn), cobalt (Co), nickel (Ni), zinc (Zn), tin (Sn), molybdenum (Mo), calcium (Ca), or an alloy containing at least one of these. These may be used alone or in combination of two or more thereof.

[0058] In one embodiment, the insulating patterns (105, 107) or the insulating coating layer may include silver (Ag) or a silver alloy (e.g., a silver-palladium-copper (APC) alloy), or copper (Cu) or a copper alloy (e.g., a copper-calcium (CuCa) alloy).

[0059] In some embodiments, the insulating patterns (105, 107) or the insulating coating layer may include a transparent conductive oxide such as indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO), zinc oxide (ZnOx), indium oxide (InOx), tin oxide (SnOx), cadmium tin oxide (CTO), gallium-doped zinc oxide (GZO), zinc tin oxide (ZTO), or indium gallium oxide (IGO).

[0060] In some embodiments, the insulating patterns (105, 107) or the insulating coating layer may include a laminated structure of a transparent conductive oxide layer and a metal layer, and may have, for example, a two-layer structure of a transparent conductive oxide layer-metal layer, or a three-layer structure of a transparent conductive oxide layer-metal layer-transparent conductive oxide layer.

[0061] The metal layer may include the metal or alloy described above. The transparent conductive oxide layer may include the transparent conductive oxide described above. The metal layer may improve thermal insulation properties, and the transparent conductive oxide layer may improve corrosion resistance and transparency.

[0062] The above separation lines may include column-wise separation lines (102, 104) and row-wise separation lines (106, 108). The column-wise separation lines (102, 104) may extend in the second direction. The row-wise separation lines (106, 108) may extend in the first direction. The column-wise separation lines (102, 104) and the row-wise separation lines (106, 108) may intersect each other.

[0063] The column-wise separation lines (102, 104) and the row-wise separation lines (106, 108) may each have a wave-line shape. According to exemplary embodiments, the column-wise separation lines (102, 104) and the row-wise separation lines (106, 108) may each have a wave-line shape with a constant period.

[0064] The thermal separation lines (102, 104) may include a first thermal separation line (102) and a second thermal separation line (104). According to exemplary embodiments, the periods of the first thermal separation line (102) and the second thermal separation line (104) may be substantially the same.

[0065] The first column-wise separation line (102) and the second column-wise separation line (104) may be alternately and repeatedly arranged along the first direction. According to exemplary embodiments, the first column-wise separation line (102) and the second column-wise separation line (104) adjacent to each other along the first direction may be mirror-symmetrical to each other. For example, the first column-wise separation line (102) and the second column-wise separation line (104) may be mirror-symmetrical with respect to an imaginary symmetry axis extending in the second direction.

[0066] In some embodiments, a pair of column-wise lines may be defined by mirror-symmetrically adjacent first column-wise separating lines (102) and second column-wise separating lines (104). A plurality of the column-wise line pairs may be regularly and repeatedly arranged along the first direction. For example, the column-wise line pairs may be repeated along the first direction at regular intervals.

[0067] The row-wise separation lines (106, 108) may include a first row-wise separation line (106) and a second row-wise separation line (108). According to exemplary embodiments, the periods of the first row-wise separation line (106) and the second row-wise separation line (108) may be substantially the same.

[0068] The first row-wise separation line (106) and the second row-wise separation line (108) may be alternately and repeatedly arranged along the second direction. According to exemplary embodiments, the first row-wise separation line (106) and the second row-wise separation line (108) adjacent to each other along the second direction may be mirror-symmetrical to each other. For example, the first row-wise separation line (106) and the second row-wise separation line (108) may be mirror-symmetrical with respect to an imaginary symmetry axis extending in the first direction.

[0069] In some embodiments, a row-direction line pair may be defined by mirror-symmetrically adjacent first row-direction separation lines (106) and second row-direction separation lines (108). A plurality of the row-direction line pairs may be regularly and repeatedly arranged along the second direction. For example, the row-direction line pairs may be repeated along the second direction at regular intervals.

[0070] The above row-direction line pairs and the above column-direction line pairs can be defined as insulating patterns (105, 107) that intersect each other and are separated from each other by separation lines (102, 104, 106, 108).

[0071] The insulating patterns (105, 107) may include first insulating patterns (105) and second insulating patterns (107). The first insulating pattern (105) and the second insulating pattern (107) may have different shapes by the above-described separation lines (102, 104, 106, 108). The first insulating pattern (105) and the second insulating pattern (107) may be regularly and repeatedly arranged with a constant cycle.

[0072] According to exemplary embodiments, the first insulating pattern (105) and the second insulating pattern (107) may be alternately and repeatedly arranged along the second direction to form an insulating pattern row. The first insulating pattern (105) and the second insulating pattern (107) may be alternately and repeatedly arranged along the first direction to form an insulating pattern row.

[0073] According to the embodiments of the present invention described above, separation lines (102, 104, 106, 108) are formed between the insulating patterns (105, 107), thereby increasing the transmittance of electromagnetic waves while improving or maintaining the insulating properties.

[0074] For example, as electromagnetic waves pass through insulating patterns (105, 107), absorption or reflection of electromagnetic waves due to metallic components may increase. Furthermore, in high-frequency or ultra-high-frequency bands such as 4G / 5G, the wavelength of electromagnetic waves is short, and diffraction characteristics are reduced, making it difficult to diffract, which may further increase electromagnetic wave loss.

[0075] However, according to exemplary embodiments, the separation lines (102, 104, 106, 108) can reduce the extinction and reflection of electromagnetic waves and increase the transmittance. Accordingly, transmission loss and attenuation can be prevented even in high frequency bands, and signal strength can be increased.

[0076] In addition, the diffraction characteristics of electromagnetic waves are increased by the wave-shaped separation lines (102, 104, 106, 108), thereby further enhancing the transmittance of electromagnetic waves.

[0077] As described above, mirror symmetry allows for the repeated arrangement of different shaped separation lines. Accordingly, different shaped insulation patterns (105, 107) can be regularly repeated within the insulation layer (110). Consequently, both irregularity and regularity can be incorporated within the insulation layer (110).

[0078] Therefore, for example, it is possible to prevent optical interference patterns or moire that occur when polygonal patterns overlap in a completely regular manner, and to suppress light scattering phenomena such as starburst.

[0079] In some embodiments, the line width of each of the separation lines (102, 104, 106, 108) may be 2.5 μm or more, or 5 μm or more, and 20 μm or less, or 10 μm or less.

[0080] For example, if the width of the separation lines (102, 104, 106, 108) is excessively small, etching defects due to the fine pitch may occur, and the insulating patterns (105, 107) may be electrically connected, causing electromagnetic interference. If the width of the separation lines (102, 104, 106, 108) is excessively large, the pattern may be visible, and the optical characteristics and insulating properties may deteriorate. Within the above range, it is possible to secure sufficient electromagnetic wave transmittance while suppressing heat flow and transfer through the separation lines (102, 104, 106, 108).

[0081] In some embodiments, the area of ​​the separation lines (102, 104, 106, 108) in the planar direction may be 20% or less, 15% or less, or 10% or less of the total area of ​​the insulation layer (110). For example, the total area of ​​the insulation patterns (105, 107) may be 80% or more, 85% or more, or 90% or more of the total area of ​​the insulation layer (110). In some embodiments, the area of ​​the separation lines (102, 104, 106, 108) may be 3% or more of the total area of ​​the insulation layer (110).

[0082] Within the above range, the electromagnetic wave transmittance through the separation lines (102, 104, 106, 108) can be increased while heat transfer and radiation can be reduced. Accordingly, the radio wave transmittance and thermal insulation properties of the insulating film can be further improved.

[0083] For example, the area of ​​the separation lines (102, 104, 106, 108) may be 5% to 20%, 5% to 15%, or 5% to 10% of the total area of ​​the insulation layer (110).

[0084] Fig. 3 is a schematic partial enlarged plan view illustrating a unit cell according to exemplary embodiments. Fig. 3 is an enlarged plan view of the unit cell (UC) area shown in Fig. 2.

[0085] Referring to FIG. 3, a unit cell (UC) may include segments of separation lines (102, 104, 106, 108). According to exemplary embodiments, the unit cell (UC) may include a pair of first column-wise separation line segments (102-1) and a second column-wise separation line segments (104-1). The unit cell (UC) may include a pair of first row-wise separation line segments (106-1) and a second row-wise separation line segments (108-1).

[0086] The first column-wise separation line segment (102-1) and the second column-wise separation line segment (104-1) included in the unit cell (UC) may be mirror-symmetrical to each other. The first row-wise separation line segment (106-1) and the second row-wise separation line segment (108-1) included in the unit cell (UC) may be mirror-symmetrical to each other.

[0087] According to exemplary embodiments, a unit cell (UC) may include a complete insulating pattern and segments of the insulating pattern. For example, as illustrated in FIG. 3 , a unit cell (UC) may include a single complete insulating pattern (e.g., a second insulating pattern (107)) and segments of the insulating pattern arranged around the insulating pattern.

[0088] For example, four segments (105-1, 105-2, 105-3, 105-4) of the first insulation pattern and four segments (107-1, 107-2, 107-3, 107-4) of the second insulation pattern can be arranged alternately in a clockwise or counterclockwise direction around the insulation pattern.

[0089] In some embodiments, the segments of the insulating pattern may be arranged mirror-symmetrically with respect to an imaginary line extending in the second direction through the center of the centrally arranged insulating pattern.

[0090] The unit cells (UC) may be repeatedly arranged along the first and second directions to form an insulating layer (110). As described above, the unit cells (UC) having irregularity or randomness may be regularly repeated. Accordingly, the entire insulating layer (110) may include both irregularity and regularity.

[0091] For example, separation line segments can be formed using an etching mask corresponding to one unit cell (UC). A patterning process can be repeatedly performed while moving the etching mask along the first direction and the second direction at intervals corresponding to the length and width of the unit cell (UC).

[0092] Therefore, the above-described insulating layer (110) can be easily formed using the etching mask corresponding to the unit cell (UC). In addition, a large-area insulating film can be easily produced through a repeated arrangement of the unit cells (UC).

[0093] For example, forming an insulating film through a single etching process may require a large-area mask and etching process equipment. However, according to the embodiments of the present invention described above, the insulating layer (110) can be formed through repeated patterning using an etching mask with a small area corresponding to the unit cell (UC). Therefore, process efficiency can be improved while simplifying the process equipment.

[0094] The above patterning process may include a photolithography process. For example, after forming a photoresist layer on the insulating coating layer, the etching mask may be moved and an exposure process may be repeated. Thereafter, the photoresist layer may be partially removed through a development process to form a photoresist pattern.

[0095] Insulating patterns (105, 107) can be formed through dry etching or wet etching using the above photoresist pattern.

[0096] After the above patterning process, the photoresist pattern can be removed through an ashing and / or strip process.

[0097] In some embodiments, the insulating patterns (105, 107) or unit cells (UC) may be formed through a laser etching process using the etching mask.

[0098] Fig. 4 is a schematic cross-sectional view showing an insulating film according to exemplary embodiments. For example, Fig. 4 is a cross-sectional view showing a laminated structure of an insulating film.

[0099] Referring to FIG. 4, the insulating film may include a protective layer formed on the upper or lower surface of the insulating pattern (105, 107). According to exemplary embodiments, the protective layer may include an upper protective layer (140) formed on the upper surface of the insulating pattern (105, 107) and a lower protective layer (130) formed on the lower surface of the insulating pattern (105, 107) and positioned between the substrate layer (100) and the insulating pattern (105, 107).

[0100] The protective layers (130, 140) can prevent physical and chemical damage to the insulation pattern (105, 107) from the external environment and can improve transparency by suppressing the occurrence of haze due to heat.

[0101] The protective layers (130, 140) may include inorganic insulating materials such as metal oxides, metal nitrides, or metal oxynitrides. The protective layers (130, 140) may include, for example, silicon oxide, silicon nitride, silicon oxynitride, zinc oxide, zinc nitride, zinc oxynitride, or the like.

[0102] The protective layers (130, 140) may include organic insulating materials such as epoxy resin, acrylic resin, imide series resin, etc.

[0103] In some embodiments, the dielectric constants of the protective layers (130, 140) can be adjusted to a range of about 2 to 12, respectively. Within this range, transmission loss due to refraction and reflection of electromagnetic waves can be suppressed.

[0104] According to exemplary embodiments, the insulating film may further include a point-of-contact adhesive layer (120). The point-of-contact adhesive layer (120) may be formed between the substrate layer (100) and the insulating pattern (105, 107), or between the substrate layer (100) and the lower protective layer (130).

[0105] The adhesive layer (120) may include an adhesive film such as an optically clear adhesive (OCA), an optically clear resin (OCR), etc.

[0106] FIGS. 5 and 6 are schematic cross-sectional views each showing a window structure according to exemplary embodiments.

[0107] Referring to FIG. 5, the window structure may include an insulating layer (110) according to the above-described embodiments attached on the window substrate.

[0108] The window substrate may include a first window substrate (150) and a second window substrate (160) facing each other. For example, the window substrate may include a glass substrate.

[0109] According to one embodiment, a glass substrate of an object to which the window structure is applied may be provided as the window substrate. The glass substrate may include, for example, glass such as a window on an exterior wall of a building, a window included in an appliance, or automobile glass.

[0110] In one embodiment, the thickness of the glass substrate may be 2t to 10t, but is not limited thereto, and may be appropriately adjusted depending on the design purpose and target object.

[0111] The first window substrate (150) and the second window substrate (160) may include a transparent resin substrate. For example, the transparent resin substrate may include cyclic olefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallylate, polyimide (PI), cellulose acetate propionate (CAP), polyethersulfone (PES), cellulose triacetate (TAC), polycarbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA), etc.

[0112] For example, the outer surface of the first window substrate (150) may be a surface exposed to the external environment. The outer surface of the second window substrate (160) may be a surface exposed to the internal environment of the object to which the window structure is attached.

[0113] As described above, the window structure may have a pair glass form. In one embodiment, the window structure may further include a spacer (not shown) formed between the first window substrate (150) and the second window substrate (160). The spacer may maintain a gap between the first window substrate (150) and the second window substrate (160).

[0114] In one embodiment, an air layer (170) may be formed between the first window substrate (150) and the second window substrate (160). The air layer (170) may include air or an inert gas such as argon (Ar) gas. The air layer (170) may further suppress heat flow through conduction and convection.

[0115] The insulating layer (110) or the insulating film may be attached to either the first window substrate (150) or the second window substrate (160). In some embodiments, the insulating layer (110) or the insulating film may be attached to the inner surface of the first window substrate (150) (e.g., the surface facing the second window substrate (160). For example, the insulating layer (110) may be separated from the substrate layer (100) of the insulating film. The insulating layer (110) separated from the substrate layer (100) may be attached to the window substrate via the adhesive layer (120).

[0116] The above window structure may be provided with low-e glass. For example, the air layer (170) may suppress heat flow through conduction and convection and block heat transfer between the first window substrate (150) and the second window substrate (160). According to exemplary embodiments, thermal radiation transmitted from a heat source may be blocked through the insulating layer (110).

[0117] In some embodiments, the thermal conduction rate of the window structure is 3.90 kcal / m 2 h℃ or less. The window structure may have a lower thermal transmittance than a typical glass substrate, for example, 3.70 kcal / m 2 h℃ or less. For example, 3.40 kcal / m 2 h℃ to 3.70 kcal / m 2 h℃, or 3.50 kcal / m 2 h℃ to 3.60 kcal / m 2 It can have a thermal transmittance in the h℃ range.

[0118] According to exemplary embodiments, through the above-described insulating layer (110) structure, the transmission characteristics of electromagnetic waves transmitted from a base station antenna (AT) can be improved, thereby reducing or suppressing signal loss of electromagnetic waves passing through the window structure.

[0119] Referring to FIG. 6, an insulating material may be filled between the first window substrate (150) and the second window substrate (160). For example, the window structure may further include a filling layer (180) sandwiched or embedded between the first window substrate (150) and the second window substrate (160). The filling layer (180) may include the aforementioned organic insulating material and / or inorganic insulating material.

[0120] As illustrated in FIG. 6, the insulation layer (110) may be attached on the outer surface of the first window substrate (150) (e.g., the opposite surface of the surface facing the second window substrate (160).

[0121] The above window structure can be applied to various structures and objects, such as windows of public transportation such as buses and subways, buildings, windows, vehicles, decorative sculptures, and guidance signs (e.g., directional signs, emergency exit signs, emergency lights), etc. The above window structure can improve insulation and energy efficiency, thereby increasing the signal efficiency of an antenna or radar.

[0122] Hereinafter, preferred embodiments are presented to help understand the present invention, but these embodiments are only illustrative of the present invention and do not limit the scope of the appended claims. It is obvious to those skilled in the art that various changes and modifications to the embodiments are possible within the scope and technical idea of ​​the present invention, and it is also natural that such changes and modifications fall within the scope of the appended claims.

[0123] Experimental Example 1

[0124] Example

[0125] A glass substrate with an insulating film attached was used as a window structure. The thickness of the glass substrate was 4.8 t, and the insulating film was manufactured to have an insulating layer having the shape shown in Fig. 2. Specifically, the insulating film was formed by periodically arranging unit cells having the shape shown in Fig. 3. The width and width of the unit cell were each set to 20 mm, the width of the separation line was set to 2.5 ㎛, and the area occupied by the separation lines was set to 20% of the total area of ​​the unit cell.

[0126] The above insulating layer was formed as a three-layer structure of a lower insulating layer - electrode layer (IZO / APC / IZO) - upper insulating layer. The insulating layer was bonded to a glass substrate via OCA (5 μm thick).

[0127] Comparative Example 1

[0128] A glass substrate (4.8t thick) without an insulating film attached was used as the window structure.

[0129] Comparative Example 2

[0130] Figure 7 is a schematic plan view showing an insulating film according to Comparative Example 2.

[0131] A window structure was manufactured in the same manner as in the example, except that the insulation layer was manufactured in the same form as in Fig. 7.

[0132] In Comparative Example 2, insulating patterns (50) having a square shape were periodically arranged, the width (W) of the insulating pattern (50) was set to 300 μm, the width of the separation line (55) was set to 2.5 μm, and the area of ​​the separation lines (55) was set to 20% of the total area of ​​the insulation layer.

[0133] Starburst Evaluation

[0134] The light scattering phenomenon was evaluated by observing the light source through the window structures of Examples 1 and 2.

[0135] Fig. 8 is an image of a light source observed through a window structure of an embodiment. Fig. 9 is an image of a light source observed through a window structure of Comparative Example 1. Fig. 10 is an image of a light source observed through a window structure of Comparative Example 2.

[0136] Referring to FIGS. 8 to 10, in the window structure of the embodiment, almost no light scattering phenomenon occurred, and a light source was observed that was substantially similar to a glass substrate.

[0137] In the window structure of Comparative Example 2, as patterns of the same shape are periodically arranged, scattering and spreading of light increased during the process of passing through the window structure.

Claims

1. Insulating patterns separated from each other; and comprising separation lines that divide the above insulation patterns, wherein the separation lines A first row-wise separation line and a second row-wise separation line that are mirror-symmetrical to each other; and An insulating film having a first heat direction separation line and a second heat direction separation line, which are mirror-symmetrical to each other.

2. In claim 1, a row-direction line pair is defined by the adjacent first row-direction separation line and the second row-direction separation line, and a plurality of the row-direction line pairs are repeated along the column direction. An insulating film, wherein pairs of column-direction lines are defined by adjacent first column-direction separation lines and second column-direction separation lines, and a plurality of pairs of column-direction lines are repeated along the row direction.

3. In claim 1, the first row-direction separation line and the second row-direction separation line each have a wave line shape with the same period, an insulating film.

4. In claim 1, the first heat-direction separation line and the second heat-direction separation line each have a wave line shape with the same period, an insulating film.

5. An insulating film according to claim 1, wherein the insulating patterns include a first insulating pattern and a second insulating pattern having different shapes.

6. An insulating film according to claim 5, wherein the first insulating pattern and the second insulating pattern are alternately and repeatedly arranged along the column direction and alternately and repeatedly arranged along the row direction.

7. An insulating film according to claim 5, wherein the first insulating pattern is periodically repeated and the second insulating pattern is periodically repeated.

8. In claim 5, a unit cell is defined by one insulation pattern in a complete form among the insulation patterns, and segments of the insulation pattern arranged around the one insulation pattern, An insulating film in which the above unit cells are repeated along the row and column directions.

9. An insulating film according to claim 8, wherein the unit cell comprises a pair of first column-direction separation line segments and second column-direction separation line segments, and a pair of first row-direction separation line segments and second row-direction separation line segments.

10. In claim 9, the first column-wise separation line segment and the second column-wise separation line segment are mirror-symmetrical to each other, An insulating film wherein the first row-direction separation line segment and the second row-direction separation line segment are mirror-symmetrical to each other.

11. In claim 8, the segments of the insulation pattern include a first insulation pattern segment and a second insulation pattern segment having different shapes, An insulating film in which the first insulating pattern segments and the second insulating pattern segments are alternately arranged clockwise or counterclockwise around the one insulating pattern within the unit cell.

12. In claim 8, the segments of the insulating pattern are arranged mirror-symmetrically with respect to an imaginary line passing through the center of one of the insulating patterns within the unit cell.

13. An insulating film according to claim 1, wherein the insulating patterns include a solid metal layer.

14. Windows substrate; and A window structure comprising an insulating film according to claim 1 disposed on the window substrate.

15. In claim 14, the window substrate includes a first window substrate and a second window substrate facing each other, A window structure, wherein the above insulating film is attached to one of the first window substrate and the second window substrate.

16. A window structure according to claim 15, further comprising an air layer formed between the first window substrate and the second window substrate.

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