Display panel and manufacturing method therefor, and display device

Abstract

Provided in the present disclosure are a display panel and a manufacturing method therefor, and a display device. The display panel comprises a substrate and a plurality of sub-pixels located on one side of the substrate. Each sub-pixel comprises: an anode, which comprises: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer facing away from the substrate, and a second transparent conductive layer located on the side of the reflective layer facing away from the substrate, wherein a groove is provided on the side of the reflective layer facing away from the substrate, and the second transparent conductive layer is electrically connected to the reflective layer around the groove; an optical adjustment layer, which fills the groove; an light-emitting functional layer, which is located on the side of the anode facing away from the substrate; and a cathode, which is located on the side of the light-emitting functional layer facing away from the substrate and serves as a transflective electrode, with a microcavity structure being formed between the bottom of the groove and the cathode.

Description

A display panel, its manufacturing method and display device

[0001] Cross-reference to related applications

[0002] This application claims priority to Chinese Patent Application No. 202410693586.8, filed on May 30, 2024, entitled "A display panel, a method of manufacturing the same and a display device", the entire contents of which are incorporated herein by reference. Technical Field

[0003] This disclosure relates to the field of display technology, and in particular to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0004] Quantum dots (QDs) are excellent nanomaterials for emitting light, possessing advantages such as high quantum yield, narrow emission peaks, tunable emission spectra, and high photochemical stability. Therefore, quantum dot light-emitting diodes (QLEDs), a new generation of light-emitting devices using QDs as the emitting layer, have attracted widespread attention from academia and industry due to their self-emissive nature, low power consumption, and wide color gamut.

[0005] Currently, there are various approaches to developing active quantum dot light-emitting diodes (AMQLEDs) to meet the requirements of patterned film deposition. Among them, photolithography, as one of the patterning methods, offers relatively easy tuning of precision and can achieve the high pixel resolution (PPI) required for small and medium-sized display panels. However, high PPI small and medium-sized display panels have a large pixel density and many light-emitting units. Therefore, these self-emissive devices may accumulate a lot of heat during operation, which can severely damage the efficiency and lifespan of the internal light-emitting units. Summary of the Invention

[0006] This disclosure provides a display panel, its manufacturing method, and a display device, which improve the luminous efficiency and lifespan of the display panel while reducing power consumption and heat generation without affecting its electrical performance. The specific solutions are as follows:

[0007] This disclosure provides a display panel including a substrate and a plurality of sub-pixels located on one side of the substrate, each sub-pixel including:

[0008] The anode includes: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer facing away from the substrate, and a second transparent conductive layer located on the side of the reflective layer facing away from the substrate; wherein, a groove is provided on the side of the reflective layer facing away from the substrate, and the second transparent conductive layer is electrically connected to the reflective layer around the groove.

[0009] An optical adjustment layer is provided to fill the groove.

[0010] A light-emitting functional layer is located on the side of the anode facing away from the substrate;

[0011] The cathode is located on the side of the light-emitting functional layer opposite to the substrate. The cathode is a transparent and reflective electrode, and a microcavity structure is formed between the bottom of the groove and the cathode.

[0012] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the thickness of the optical adjustment layer is the same as the thickness of the groove.

[0013] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the refractive index of the optical adjustment layer is greater than 1.7.

[0014] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the optical adjustment layer has a transmittance of more than 80% in the visible light range.

[0015] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the material of the optical adjustment layer is an organic material or an inorganic material.

[0016] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the organic material includes NPB, HAT-CN, or a polymer doped with sulfur, phosphorus, or halogen, and the inorganic material includes ZnO, ZnMgO, or Al2O3.

[0017] In one possible implementation, the display panel provided in the embodiments of this disclosure further includes a third transparent conductive layer located between the reflective layer and the second transparent conductive layer. The third transparent conductive layer is electrically connected to the reflective layer around the groove. The material of the third transparent conductive layer includes a Mg:Ag alloy.

[0018] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the thickness of the third transparent conductive layer is 5 to 15 nm.

[0019] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the plurality of sub-pixels includes a first sub-pixel, a second sub-pixel, and a third sub-pixel, wherein the emission wavelength of the first sub-pixel is greater than the emission wavelength of the second sub-pixel, and the emission wavelength of the second sub-pixel is greater than the emission wavelength of the third sub-pixel; wherein,

[0020] The lengths of the microcavity structures corresponding to the first sub-pixel, the second sub-pixel, and the third sub-pixel are all different, and the length of each microcavity structure is equal to an integer multiple of its corresponding half-wavelength of emission.

[0021] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the materials of the optical adjustment layer corresponding to the first sub-pixel, the optical adjustment layer corresponding to the second sub-pixel, and the optical adjustment layer corresponding to the third sub-pixel are the same.

[0022] The thickness of the groove corresponding to the first sub-pixel is greater than the thickness of the groove corresponding to the second sub-pixel, and the thickness of the groove corresponding to the second sub-pixel is greater than the thickness of the groove corresponding to the third sub-pixel.

[0023] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the thickness of the groove corresponding to the first sub-pixel, the thickness of the groove corresponding to the second sub-pixel, and the thickness of the groove corresponding to the third sub-pixel are the same;

[0024] The refractive index of the optical adjustment layer corresponding to the first sub-pixel is greater than the refractive index of the optical adjustment layer corresponding to the second sub-pixel, and the refractive index of the optical adjustment layer corresponding to the second sub-pixel is greater than the refractive index of the optical adjustment layer corresponding to the third sub-pixel.

[0025] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the first sub-pixel emits light in red, the second sub-pixel emits light in green, and the third sub-pixel emits light in blue.

[0026] In one possible implementation, in the display panel provided in the embodiments of this disclosure, the light-emitting functional layer includes: a light-emitting layer located between the anode and the cathode, a hole injection layer located between the anode and the light-emitting layer, a hole transport layer located between the hole injection layer and the light-emitting layer, and an electron transport layer located between the light-emitting layer and the cathode.

[0027] Accordingly, this disclosure also provides a display device, including the display panel provided in the embodiments of this disclosure.

[0028] Accordingly, this disclosure also provides a method for manufacturing a display panel, used to manufacture the display panel provided in this disclosure embodiment, the method comprising:

[0029] An anode and an optical adjustment layer are formed on a substrate. The anode includes: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer opposite to the substrate, and a second transparent conductive layer located on the side of the reflective layer opposite to the substrate. A groove is provided on the side of the reflective layer facing the second transparent conductive layer, and the optical adjustment layer fills the groove.

[0030] A light-emitting functional layer is formed on the anode;

[0031] A cathode is formed on the light-emitting functional layer. The cathode is a transparent and reflective electrode. A microcavity structure is formed between the bottom of the groove and the cathode.

[0032] In one possible implementation, the fabrication method provided in the embodiments of this disclosure, wherein forming the anode and optical adjustment layer on the substrate specifically includes:

[0033] A first transparent conductive film is deposited on the substrate;

[0034] A reflective film is deposited on the first transparent conductive film, and a patterning process is used to pattern the reflective film and the first transparent conductive film to form a patterned first transparent conductive layer and reflective layer.

[0035] Pattern each of the reflective layers, and form a groove on the side of the reflective layer facing away from the substrate;

[0036] A thin film of optical adjustment material is deposited on the reflective layer;

[0037] Pattern the optical adjustment material film, and remove the optical adjustment material film around the groove to form an optical adjustment layer that fills the groove;

[0038] A second transparent conductive film is deposited on the reflective layer, and the second transparent conductive film is patterned to form a patterned second transparent conductive layer. Attached Figure Description

[0039] Figure 1 is a schematic diagram of the structure of a display panel provided in an embodiment of this disclosure;

[0040] Figure 2 is a schematic diagram of the structure of another display panel provided in an embodiment of this disclosure;

[0041] Figure 3 is a schematic diagram of the structure of another display panel provided in an embodiment of this disclosure;

[0042] Figure 4 is a schematic diagram of the structure of another display panel provided in an embodiment of this disclosure;

[0043] Figure 5 shows the emitted light intensity at different angles obtained by changing the thickness of the groove;

[0044] Figure 6 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of this disclosure;

[0045] Figure 7 is a schematic flowchart of another manufacturing method of a display panel provided in an embodiment of this disclosure;

[0046] Figure 8A is a schematic diagram of the structure of a display panel provided in the present disclosure during the manufacturing process;

[0047] Figure 8B is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0048] Figure 8C is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0049] Figure 8D is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0050] Figure 8E is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0051] Figure 8F is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0052] Figure 8G is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0053] Figure 8H is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0054] Figure 8I is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0055] Figure 8J is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0056] Figure 8K is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0057] Figure 8L is another structural schematic diagram of the display panel provided in the embodiment of this disclosure during the manufacturing process;

[0058] Figure 9 is a schematic diagram of the structure of a display device provided in an embodiment of this disclosure. Detailed Implementation

[0059] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. Furthermore, the embodiments and features in the embodiments of this disclosure can be combined with each other without conflict. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0060] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms "comprising" or "including," and similar terms as used in this disclosure, mean that an element or object preceding the term encompasses the elements or objects listed following the term and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. Terms such as "inner," "outer," "upper," and "lower" are used only to indicate relative positional relationships; these relative positional relationships may change accordingly when the absolute position of the described objects changes.

[0061] As used in this disclosure, “about,” “approximately,” or “approximately” includes the stated value and the average value within an acceptable range of deviation from the given value, wherein the acceptable range of deviation is determined by a person skilled in the art taking into account the measurement under discussion and the error associated with the measurement of the given quantity (i.e., the limitations of the measurement system).

[0062] As used in this disclosure, "parallel," "perpendicular," and "equal" include the described situation and situations that are similar to the described situation, within an acceptable deviation range, which is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein an acceptable deviation range for approximate parallelism may be, for example, within 5°; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein an acceptable deviation range for approximate perpendicularity may also be, for example, within 5°. "Equal" includes absolute equality and approximate equality, wherein an acceptable deviation range for approximate equality may be, for example, a difference between the two equals being less than or equal to 10% of either one.

[0063] It should be understood that when a layer or element is referred to as being on another layer or substrate, it can mean that the layer or element is directly on the other layer or substrate, or that there is an intermediate layer between the layer or element and the other layer or substrate.

[0064] This disclosure describes exemplary embodiments with reference to cross-sectional views and / or plan views as idealized exemplary drawings. In the drawings, for clarity, the thickness of layers and the area of ​​regions are enlarged. Therefore, variations in shape relative to the drawings are contemplated due to, for example, manufacturing techniques and / or tolerances. Thus, exemplary embodiments should not be construed as limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing processes. For example, etched areas shown as rectangular would typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of areas of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0065] In this disclosure, circles, triangles, rectangles, trapezoids, pentagons, or hexagons are not strictly defined, but can be approximate circles, triangles, rectangles, trapezoids, pentagons, or hexagons. Small deformations due to tolerances may exist, and chamfers, curved edges, and other deformations may exist.

[0066] In related technologies, to address the issue of excessive heat accumulation during operation in high-PPI small-to-medium-sized display panels due to their high pixel density, self-emissive displays such as AMOLED employ a top-emitting device structure. This allows the light emitted from the light-emitting layer to exit from the cathode side, avoiding light obstruction by backplane traces and thin-film transistors, effectively improving brightness and reducing power consumption. Furthermore, the anode of the top-emitting device is typically a reflective ITO / Ag / ITO stacked electrode, while the cathode is generally a semi-transparent Mg:Ag alloy electrode. An optical microcavity structure is formed between the semi-transparent cathode and the reflective Ag layer. Since small-to-medium-sized display panels do not have particularly high viewing angle requirements, the front light emission of the display panel can be enhanced by adjusting the microcavity structure of the top-emitting device, reducing operating voltage and decreasing power consumption and heat generation. The microcavity structure of the top-emitting device is a Fabry-Perot cavity (FP cavity), and the front light emission intensity can be controlled by adjusting the cavity length or the type of material within the cavity.

[0067] In the microcavity effect of QLED devices, enhanced emission from a microcavity is the result of interference enhancement between two beams, which requires the optical path difference to be an integer multiple of the corresponding half-wavelength of the emission. Compared to a first-order microcavity, a second-order microcavity has an optical path difference that is a higher multiple of the wavelength and a thicker cavity. Therefore, adjusting the microcavity of a QLED to a second-order microcavity can further improve the current efficiency of front-side emission. In order to tune for enhanced emission from a second-order microcavity, the device needs to be thickened based on the existing device structure. Related technologies for adjusting the microcavity effect generally include: (1) replacing the ITO located in the FP cavity of ITO / Ag / ITO with thick IZO; (2) increasing the thickness of the electron transport layer inside the device, suppressing electron injection, and adjusting the cavity length, etc. These schemes adjust the microcavity structure of the device, and the increase in front-side emission intensity comes from optical gain, but the electrical performance of the device may be affected, leading to a decrease in the intrinsic external quantum efficiency and a decrease in lifetime. For example, for red and green devices, the thickness of the functional layer needs to be significantly increased to meet the requirements. This leads to a substantial increase in the device's operating voltage, power consumption, and lifespan. Therefore, it is crucial to minimize the impact on electrical performance during the adjustment of the optical structure.

[0068] However, in order to minimize the impact on electrical performance during the adjustment of the optical structure, related technologies have proposed thickening the transparent electrodes such as IZO and ITO on the Ag layer. However, for mass production processes, the uniformity of the transparent electrodes cannot be guaranteed during large-area deposition, resulting in poor uniformity of the electrical and optical properties of the electrodes, which fails to guarantee the quality of the display panel. Therefore, it is necessary to develop new methods or structures to control the microcavity effect of the top-emitting device without affecting the electrical performance of the device, so as to improve the front light emission intensity of the display panel.

[0069] In view of this, in order to enhance the light emission from the front of the display panel by adjusting the microcavity structure of the top-emitting device without affecting the electrical performance of the device, thereby reducing the operating voltage and power consumption and heat generation of the display panel, this disclosure provides a display panel, as shown in FIG1, including a substrate 1 and multiple sub-pixels located on one side of the substrate 1. FIG1 only illustrates one sub-pixel, and the multiple sub-pixels emit different wavelengths, i.e., different colors. Optionally, the multiple sub-pixels include a first sub-pixel, a second sub-pixel, and a third sub-pixel. The emission wavelength of the first sub-pixel is greater than that of the second sub-pixel, and the emission wavelength of the second sub-pixel is greater than that of the third sub-pixel. Optionally, the emission color of the first sub-pixel is red (R), the emission color of the second sub-pixel is green (G), and the emission color of the third sub-pixel is blue (B). RGB are the basic colors in the display field. Various colors are obtained by changing the R, G, and B color channels and superimposing them, realizing full-color display.

[0070] Specifically, as shown in Figure 1, each sub-pixel includes:

[0071] Anode 2 includes: a first transparent conductive layer 21 located on one side of substrate 1, a reflective layer 22 located on the side of the first transparent conductive layer 21 facing away from substrate 1, and a second transparent conductive layer 23 located on the side of the reflective layer 22 facing away from substrate 1; wherein, a groove U is provided on the side of the reflective layer 22 facing away from substrate 1, and the second transparent conductive layer 23 is electrically connected to the reflective layer 22 around the groove U.

[0072] Optical adjustment layer 3 fills the groove U;

[0073] The light-emitting functional layer 4 is located on the side of the anode 2 that is away from the substrate 1;

[0074] The cathode 5 is located on the side of the light-emitting functional layer 4 away from the substrate 1. The cathode 5 is a transparent and reflective electrode, and a microcavity structure is formed between the bottom of the groove U and the cathode 5.

[0075] Specifically, anode 2 is a reflective electrode used to reflect light irradiating anode 2; cathode 5 is a transmissive electrode used to partially transmit and partially reflect light irradiating cathode 5.

[0076] Specifically, a microcavity structure refers to an optical resonant cavity with dimensions on the order of micrometers or submicrometers. It utilizes effects such as reflection, total internal reflection, scattering, or diffraction at interfaces with discontinuous refractive indices to confine light to a very small area. When a certain relationship is satisfied between the cavity length of the microcavity structure and the wavelength of the light emitted by the sub-pixel, the light is selectively amplified. Therefore, microcavity structures can narrow the spectrum of electroluminescent diodes, enhance light intensity, and adjust the emission peak wavelength, thereby improving the color purity and luminous efficiency of display devices.

[0077] Specifically, as shown in Figure 1, in this embodiment of the present disclosure, the cavity length of the microcavity structure is the distance between the bottom of the groove U and the cathode 5.

[0078] The display panel provided in this embodiment features a groove within the reflective layer of the anode, forming a microcavity structure between the bottom of the groove and the cathode. This allows adjustment of the groove thickness to control the microcavity length of each sub-pixel, matching the cavity length of each sub-pixel to the wavelength of its respective color light. This selectively enhances the color light, narrows the spectrum, and increases the light output, thereby reducing the operating voltage of the display panel, decreasing power consumption and heat generation. This solves the problem of excessive heat accumulation during operation in high-PPI small-to-medium-sized display panels due to their high pixel density. Furthermore, since the second transparent conductive layer and the reflective layer are electrically connected through the reflective layer around the groove, current flows from the periphery of the groove, bypassing the optical adjustment layer within the groove. Moreover, this disclosure does not adjust the thickness of the light-emitting functional layer between the anode and cathode. Therefore, the electrical performance of the device remains unaffected, and compared to related technologies, this disclosure reduces the thickness of the display panel, achieving a thinner and lighter display. Meanwhile, the grooves in the reflective layer increase the distance between the light-emitting layer and the reflective layer, reducing light loss caused by surface plasmon resonance (SPR) modes and further improving the front light emission efficiency of the sub-pixel. Therefore, this disclosure allows for optical adjustment of the microcavity structure of the sub-pixel without affecting the device's electrical performance, thereby improving the front light emission efficiency of the sub-pixel, ultimately enhancing the luminous efficiency and lifespan of the display panel, and reducing power consumption and heat generation.

[0079] Optionally, the substrate provided in this disclosure can be a rigid substrate or a flexible substrate. The rigid substrate can be a glass substrate or a PMMA (polymethyl methacrylate) substrate, in which case the display panel is a rigid display panel. The flexible substrate can be a PET (polyethylene terephthalate) substrate or a PI (polyimide) substrate, in which case the display panel is a flexible display panel.

[0080] In some embodiments of the display panel provided in this disclosure, as shown in FIG1, the thickness of the optical adjustment layer 3 is the same as the thickness of the groove U. This ensures that the surface of the second transparent conductive layer 23 is flat, guaranteeing the quality of the display panel.

[0081] In some embodiments, as shown in FIG1, in the display panel provided in the present disclosure, the refractive index of the optical adjustment layer 3 is greater than 1.7, that is, the optical adjustment layer 3 is made of a high refractive index material, so that the light irradiated to the anode 2 can be refracted into the optical adjustment layer 3, and the light of a specific wavelength can be selectively enhanced by utilizing the strong microcavity effect.

[0082] In some embodiments of the display panel provided in this disclosure, as shown in FIG1, the transmittance of the optical adjustment layer 3 in the visible light range is greater than 80%. This can further improve the front light emission efficiency of the display panel.

[0083] In some embodiments of the display panel provided in this disclosure, as shown in FIG1, since the optical adjustment layer 3 is filled in the groove U of the reflective layer 22, the material selection range of the high refractive index optical adjustment layer 3 is relatively wide. For example, the material of the optical adjustment layer 3 can be an organic material, which may include, but is not limited to, NPB, HAT-CN or sulfur, phosphorus or halogen doped polymers; the material of the optical adjustment layer 3 can also be an inorganic material, which may include, but is not limited to, ZnO, ZnMgO or Al2O3.

[0084] In some embodiments, as shown in FIG1, in the display panel provided in the present disclosure, the materials of the first transparent conductive layer 21 and the second transparent conductive layer 23 can be transparent conductive materials such as ITO, the material of the reflective layer 22 can be reflective materials such as Ag, and the cathode 5 can be a semi-transparent reflective film layer of magnesium silver (Mg:Ag) alloy.

[0085] In some embodiments of the display panel provided in this disclosure, as shown in FIG1, since a groove U is provided in the reflective layer 22, the contact area between the reflective layer 22 and the second transparent conductive layer 23 is greatly reduced, which easily leads to poor contact between the second transparent conductive layer 23 (ITO) and the reflective layer 22 (Ag). To prevent poor contact between the second transparent conductive layer 23 (ITO) and the reflective layer 22 (Ag), as shown in FIG2, a third transparent conductive layer 6 is further included, located between the reflective layer 22 and the second transparent conductive layer 23. The third transparent conductive layer 6 is electrically connected to the reflective layer 22 around the groove U, and the material of the third transparent conductive layer 6 includes a Mg:Ag alloy. Since the Mg:Ag alloy is a highly conductive material, the third transparent conductive layer 6 can ensure the continuity of the circuits on both sides and allow the current to flow laterally, making the light emission of the sub-pixels uniform.

[0086] In some embodiments, to ensure the transmittance of the third transparent conductive layer, in the display panel provided in the embodiments of this disclosure, as shown in FIG2, the thickness of the third transparent conductive layer 6 can be 5-15 nm. Optionally, the thickness of the third transparent conductive layer 6 can be 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm, etc.

[0087] In some embodiments, as shown in FIG1 and FIG2, in the display panel provided in the present disclosure, the light-emitting functional layer 4 includes: a light-emitting layer 41 located between the anode 2 and the cathode 5, a hole injection layer 42 located between the anode 2 and the light-emitting layer 41, a hole transport layer 43 located between the hole injection layer 42 and the light-emitting layer 41, and an electron transport layer 44 located between the light-emitting layer 41 and the cathode 5. Specifically, the hole injection layer 42 and the hole transport layer 43 are used to transport holes in the anode 2 to the light-emitting layer 41, and the electron transport layer 44 is used to transport electrons in the cathode 5 to the light-emitting layer 41. Electrons and holes recombine to emit light in the light-emitting layer 41.

[0088] Optionally, the hole transport layer can be made of at least one of poly(9,9-dioctylfluorene-CO-N-(4-butylphenyl)diphenylamine) (TFB), poly(N-vinylcarbazole) (PVK), and poly(bis(4-phenyl)(4-butylphenyl)amine) (Poly-TPD).

[0089] Optionally, the electron transport layer can be made of nanoparticles such as ZnO and ZnMgO, and this disclosure does not limit this.

[0090] Optionally, the material of the light-emitting layer can be a quantum dot material, which may include a quantum dot body and a quantum dot ligand, with the coordinating groups in the quantum dot body and the quantum dot ligand connected by chemical bonds.

[0091] Optionally, the quantum dot body includes any one of the following: group IIB-VIA quantum dots, group IIIA-VA quantum dots, group IVA-VIA quantum dots, core-shell structured quantum dots, and ABX3 type perovskite quantum dots. In ABX3 type perovskite quantum dots, A is CH3NH3. + (methylamine), NH2CH=NH2 (formamidinium) and Cs + One or more of them, where B is Pb 2+ and Sn 2+ One or two of them, X is Cl - ,Br - and I - One or more of the following, ABX3 type perovskite quantum dots include CH3NH3PbBr3, CH3NH3PbCl3, CH3NH3PbI3, CsPbBr3, CsPbCl3 and CsPbI3.

[0092] For example, group IIB-VIA quantum dots are selected from: one or more binary compounds such as CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, and MgS; and ternary compounds such as CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, and CdZn Te, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, MgZnSe, MgZnS, or mixtures thereof; and quaternary compounds such as HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, or mixtures thereof, but not limited thereto.

[0093] IIIA-VA group quantum dots are selected from: binary compounds such as GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, or mixtures thereof; ternary compounds such as GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, or mixtures thereof; and quaternary compounds such as GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, or mixtures thereof, but not limited thereto.

[0094] Group IVA-VIA quantum dots are selected from: binary compounds such as SnS, SnSe, SnTe, PbS, PbSe, PbTe, or mixtures thereof; ternary compounds such as SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, or mixtures thereof; and quaternary compounds such as SnPbSSe, SnPbSeTe, SnPbSTe, or mixtures thereof, but are not limited thereto. Group IVA-VIA quantum dots are selected from, for example, elemental (monological) semiconductors such as Si, Ge, or mixtures thereof; and binary semiconductor compounds such as SiC, SiGe, and mixtures thereof, but are not limited thereto.

[0095] A core-shell quantum dot is a quantum dot in which one material forms the core and the other forms the shell. For example, a CdS / ZnS quantum dot means that the core is made of CdS and the shell is made of ZnS.

[0096] In other embodiments, the quantum dot bulk can be other nanoscale materials, such as nanorods, nanosheets, etc. The composition of these other nanoscale materials may include at least one of the following: CdS, CdSe, CdTe, ZnSe, InP, PbS, CuInS2, ZnO, CsPbCl3, CsPbBr3, CsPhI3, CdS / ZnS, CdSe / ZnS, ZnSe, InP / ZnS, PbS / ZnS, InAs, InGaAs, InGaN, GaNk, ZnTe, Si, Ge, and C.

[0097] For example, the quantum dot body can include cadmium-free (Cd) quantum dots. Cadmium-free quantum dots are quantum dots that do not contain cadmium (Cd). Cadmium (Cd) can cause serious environmental / health problems, so cadmium-free quantum dots can be used effectively.

[0098] Optionally, the shape of the quantum dot material includes, but is not limited to, quantum dot materials of any geometric shape such as sphere, spherical, ellipsoidal, polyhedral, rod-shaped, cross-shaped, and ring-shaped.

[0099] In some embodiments, in the display panel provided in this disclosure, as shown in Figures 3 and 4, which respectively illustrate a first sub-pixel (represented by R), a second sub-pixel (represented by B), and a third sub-pixel (represented by B), the lengths of the microcavity structures corresponding to the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B) are all different. The length of each microcavity structure is equal to an integer multiple of its corresponding half-wavelength of emission. In this way, the brightness of different colors of light can be enhanced by the microcavity structures within the corresponding color sub-pixels in the display panel. The microcavity effect in the display panel can enhance the resonance of different monochromatic lights, ensuring the color purity of different lights and effectively improving the luminous efficiency of the display device. For example, the distance between the reflective layer 22 and the cathode 5 satisfies the following formula:

[0100] D = j(λ / 2n);

[0101] Where D is the distance between the reflective layer 22 and the cathode 5, λ is the wavelength of the predetermined color light, n is the effective refractive index of the medium between the reflective layer 22 and the cathode 5, and j is a positive integer. It should be noted that the effective refractive index of the medium between the reflective layer 22 and the cathode 5 refers to the effective refractive index of the media of each film layer (e.g., hole injection layer 42, hole transport layer 43, light-emitting layer 41, and electron transport layer 44) between the reflective layer 22 and the cathode 5. Therefore, the display panel can adjust the distance between the reflective layer 22 and the cathode 5 by adjusting the thickness of the groove U in the reflective layer 22, so that the distance between the reflective layer 22 and the cathode 5 satisfies the above formula. This allows light of the predetermined color to be enhanced while light of other colors is weakened, thereby improving the front light emission efficiency of each sub-pixel, ultimately improving the luminous efficiency and lifespan of the display panel, and reducing power consumption and heat generation.

[0102] In some embodiments, in the display panel provided in the present disclosure, as shown in FIG3, the materials of the optical adjustment layer 3 corresponding to the first sub-pixel (R), the optical adjustment layer 3 corresponding to the second sub-pixel (G), and the optical adjustment layer 3 corresponding to the third sub-pixel (B) can be the same, for example, all of them are ZnO or all of them are sulfur-containing polyimide, etc.

[0103] Specifically, as shown in Figure 3, since the emission wavelength of the first sub-pixel (R) is greater than that of the second sub-pixel (G), and the emission wavelength of the second sub-pixel (G) is greater than that of the third sub-pixel (B), in order for the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B) to all satisfy that the length of their respective microcavity structures is equal to an integer multiple of their respective half-wavelengths of emission, the thickness of the groove U corresponding to the first sub-pixel (R) needs to be set to be greater than the thickness of the groove U corresponding to the second sub-pixel (G), and the thickness of the groove U corresponding to the second sub-pixel (G) needs to be set to be greater than the thickness of the groove U corresponding to the third sub-pixel (B). This can enhance the light emission of the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B).

[0104] In some embodiments, as shown in FIG4, in the display panel provided in the present disclosure, the thickness of the groove U corresponding to the first sub-pixel (R), the thickness of the groove U corresponding to the second sub-pixel (G), and the thickness of the groove U corresponding to the third sub-pixel (B) can be the same.

[0105] Specifically, as shown in Figure 4, if the thickness of the groove U corresponding to each sub-pixel is the same, and if we want to enhance the light of the three colors at the same time, the refractive index of the optical adjustment layer 3 corresponding to each sub-pixel needs to be adjusted to the most suitable value so that the length of each sub-pixel's microcavity structure is equal to an integer multiple of its corresponding half wavelength of light emission. Therefore, the refractive index of the optical adjustment layer 3 corresponding to the first sub-pixel (R) is greater than the refractive index of the optical adjustment layer 3 corresponding to the second sub-pixel (G), and the refractive index of the optical adjustment layer 3 corresponding to the second sub-pixel (G) is greater than the refractive index of the optical adjustment layer 3 corresponding to the third sub-pixel (B). This allows the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B) to all achieve enhanced light emission.

[0106] It should be noted that the display panel provided in this embodiment may also have different groove thicknesses for the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B), and the refractive indices of the optical adjustment layers corresponding to the first sub-pixel (R), the second sub-pixel (G), and the third sub-pixel (B) may also be different. By reasonably setting these parameters, a strong microcavity effect for each sub-pixel can be achieved.

[0107] In some embodiments, the display panel provided in the present disclosure, as shown in Figures 1-4, further includes a pixel definition layer 7, which defines the opening area of ​​each sub-pixel.

[0108] In some embodiments, the display panel provided in the present disclosure may further include: a light extraction layer (CPL) located on the side of the cathode away from the substrate, and an encapsulation layer located on the side of the light extraction layer away from the substrate.

[0109] As shown in Figure 5, taking the structure shown in Figure 1 as an example, Figure 5 simulates adjusting the thickness of the groove U corresponding to the second sub-pixel (G) by changing the thickness of the groove U, obtaining the emitted light intensity at different angles. The horizontal axis represents the emission angle, and the vertical axis represents the luminance. The numbers marked on each curve represent the thickness of the corresponding groove U (for example, if the material of the optical adjustment layer is ZnO, the number represents the ZnO thickness d, in nm). It can be seen that to obtain better emitted light brightness at different angles, different thicknesses of groove U are required. Therefore, this disclosure can achieve different front-side light emission efficiencies at different angles by adjusting the thickness of the groove U.

[0110] In summary, the display panel provided by the embodiments of this disclosure can be optically adjusted without affecting the electrical performance of the device, thereby improving the front light emission efficiency and reducing power consumption and heat generation. Furthermore, the groove provided in the reflective layer can increase the distance between the bottom of the groove in the light-emitting layer and the reflective layer, which helps to reduce surface plasmon mode loss and improve external quantum efficiency.

[0111] Based on the same inventive concept, this disclosure also provides a method for manufacturing a display panel, used to manufacture the display panel as described above in this disclosure, as shown in FIG6. The manufacturing method includes:

[0112] S601. An anode and an optical adjustment layer are formed on a substrate. The anode includes: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer away from the substrate, and a second transparent conductive layer located on the side of the reflective layer away from the substrate. A groove is provided on the side of the reflective layer facing the second transparent conductive layer, and the optical adjustment layer is filled in the groove.

[0113] S602, A light-emitting functional layer is formed on the anode;

[0114] S603. A cathode is formed on the light-emitting functional layer. The cathode is a transparent and reflective electrode. A microcavity structure is formed between the bottom of the groove and the cathode.

[0115] It should be noted that the beneficial effects of the display panel manufactured using the manufacturing method provided in this embodiment can be found in the relevant description of the aforementioned display panel, and will not be repeated here.

[0116] In some embodiments, in the fabrication method provided in this disclosure, an anode and an optical adjustment layer are formed on a substrate, as shown in FIG7, specifically including:

[0117] S701, Deposit a first transparent conductive film on the substrate;

[0118] Specifically, taking the fabrication of the second sub-pixel (G) as an example, as shown in Figure 8A, a first transparent conductive film 21' is deposited on the substrate 1 using magnetron sputtering, atomic layer deposition, vacuum evaporation, etc. The material of the first transparent conductive film 21' is ITO with a thickness of 5-15 nm.

[0119] S702. A reflective film is deposited on the first transparent conductive film, and a patterning process is used to pattern the reflective film and the first transparent conductive film to form a patterned first transparent conductive layer and reflective layer.

[0120] Specifically, as shown in Figure 8B, a reflective film is deposited on the first transparent conductive film 21' using magnetron sputtering, atomic layer deposition, vacuum evaporation, etc. The material of the reflective film is Ag, and the thickness is 200-400nm. A single patterning process is used to pattern the reflective film and the first transparent conductive film 21' to form a patterned first transparent conductive layer 21 and reflective layer 22.

[0121] S703. Pattern each reflective layer and form a groove on the side of the reflective layer facing away from the substrate.

[0122] Specifically, as shown in Figure 8C, the reflective layer 22 is patterned using photolithography, and a groove U is formed on the side of the reflective layer 22 facing away from the substrate 1. The maximum depth of the groove U is 20-300 nm.

[0123] S704, Deposit a thin film of optical adjustment material on the reflective layer;

[0124] Specifically, as shown in Figure 8D, an optical adjustment material thin film 3' is deposited on the reflective layer 22 using a solution method (including but not limited to blade coating, spin coating) or a vapor phase method (including but not limited to magnetron sputtering, atomic layer deposition, vacuum evaporation). The material of the optical adjustment material thin film 3' is ZnO or sulfur-containing polyimide.

[0125] S705. Pattern the optical adjustment material film and remove the optical adjustment material film around the groove to form an optical adjustment layer that fills the groove.

[0126] Specifically, as shown in Figure 8E, the optical adjustment material film 3' is patterned, and the optical adjustment material film 3' around the groove U is removed to form an optical adjustment layer 3 that fills the groove U. The thickness of the optical adjustment layer 3 is approximately the same as the thickness of the groove U.

[0127] S706. Deposit a second transparent conductive film on the reflective layer and pattern the second transparent conductive film to form a patterned second transparent conductive layer;

[0128] Specifically, as shown in Figure 8F, a second transparent conductive film 23' with a thickness of 5-20 nm is deposited on the reflective layer 22 using magnetron sputtering, atomic layer deposition, vacuum evaporation, etc., and the second transparent conductive film is patterned to form a patterned second transparent conductive layer 23.

[0129] After the above steps S601-S606, the anode 2 and the optical adjustment layer 3 are formed on the substrate, and then other film layers of the display panel are formed.

[0130] Specifically, as shown in Figure 8G, an organic pixel definition layer material is deposited using a spin coating method. The organic pixel definition layer material is then opened in the corresponding sub-pixel region using a photolithography process to form a pixel definition layer 7. The thickness of the pixel definition layer 7 is 0.4–1.5 μm.

[0131] Specifically, as shown in Figure 8H, hole injection material is deposited in the opening of the pixel definition layer 7 using a solution spin coating method, and then patterned by photolithography to form a hole injection layer 42 with a thickness of 5-10 nm.

[0132] Specifically, as shown in Figure 8I, hole transport material is deposited on the hole injection layer 42 by methods such as slot coating and screen printing, and then patterned by photolithography to form the hole transport layer 43 with a thickness of 10-30 nm.

[0133] Specifically, as shown in Figure 8J, quantum dot materials are deposited on the hole transport layer 43 by methods such as solution spin coating, slot coating, and screen printing to form a light-emitting layer 41 with a thickness of 10–30 nm.

[0134] Specifically, as shown in Figure 8K, an electron transport material is deposited on the light-emitting layer 41 by methods such as slit coating, and then dried to form an electron transport layer 44 with a thickness of 30-60 nm; wherein, the hole injection layer 42, the hole transport layer 43, the light-emitting layer 41 and the electron transport layer 44 constitute the light-emitting functional layer 4.

[0135] Specifically, as shown in Figure 8L, cathode metal material is deposited on the light-emitting functional layer 4 by vacuum evaporation to form cathode 5, with a thickness of 6-12 nm.

[0136] Afterwards, a light extraction layer can be formed on the cathode 5, and then a glass cover plate can be used for encapsulation to complete the fabrication of the display panel.

[0137] It should be noted that the manufacturing method of this embodiment is illustrated using the structure shown in FIG1 as an example. The manufacturing method of the structure shown in FIG2 is basically the same as that of FIG1, except that before step S606, a third transparent conductive layer 6 is formed on the reflective layer 22.

[0138] It should be noted that the above methods take the fabrication of the monochrome device structure shown in Figures 1 and 2 as examples. The main structural difference between the fabrication method of the red, green, and blue tri-color device shown in Figure 3 and the fabrication method of the monochrome device described above is that: when forming a groove U on the side of the reflective layer 22 facing away from the substrate 1, the thickness of the groove U corresponding to the first sub-pixel (R) needs to be set to be greater than the thickness of the groove U corresponding to the second sub-pixel (G), and the thickness of the groove U corresponding to the second sub-pixel (G) needs to be set to be greater than the thickness of the groove U corresponding to the third sub-pixel (B); the main structural difference between the fabrication method of the red, green, and blue tri-color device shown in Figure 4 and the fabrication method of the monochrome device described above is that: the thickness of the groove U corresponding to the first sub-pixel (R), the thickness of the groove U corresponding to the second sub-pixel (G), and the thickness of the groove U corresponding to the third sub-pixel (B) need to be set to be greater than the thickness of the groove U corresponding to the third sub-pixel (B). The thickness of the groove U is the same as the thickness of the groove U corresponding to the third sub-pixel (B). The refractive index of the optical adjustment layer 3 corresponding to the first sub-pixel (R) is greater than the refractive index of the optical adjustment layer 3 corresponding to the second sub-pixel (G). The refractive index of the optical adjustment layer 3 corresponding to the second sub-pixel (G) is greater than the refractive index of the optical adjustment layer 3 corresponding to the third sub-pixel (B). For example, ZnO or ZnMgO with a Mg doping amount of less than 5% is deposited in the groove U of the first sub-pixel (R), ZnMgO with a Mg doping amount of 5% to 15% is deposited in the groove U of the second sub-pixel (G), and ZnMgO with a Mg doping amount of 15% to 25% is deposited in the groove U of the third sub-pixel (B). By adjusting the different Mg doping amounts, the refractive index of each sub-pixel is gradually reduced to meet the requirements of strong microcavity effect.

[0139] It should be noted that the manufacturing method for devices containing red, green, and blue colors differs from that for monochrome devices not only in the structural differences mentioned above, but also in the thickness of each film layer. The thickness of each film layer is optimized according to the electrical and optical performance of the device to ensure that the electrical and optical performance of the display panel is optimal.

[0140] It should be noted that the methods for depositing the above-mentioned film layers may include blade coating, screen printing, slot coating, roll-to-roll coating, spraying, etc.

[0141] Based on the same inventive concept, this disclosure also provides a display device, including the display panel described above. Since the principle by which this display device solves the problem is similar to that of the display panel described above, the implementation of the display device provided in this disclosure can refer to the implementation of the display panel described above, and repeated details will not be elaborated further.

[0142] In specific implementation, the display device provided in the embodiments of this disclosure can be an organic light-emitting display device.

[0143] In specific implementation, the display device provided in the embodiments of this disclosure may be a full-screen display device or a flexible display device, etc., and is not limited thereto.

[0144] In specific implementations, the display device provided in this disclosure embodiment can be a full-screen mobile phone as shown in FIG9. Of course, the display device provided in this disclosure embodiment can also be any product or component with display function, such as a tablet computer, television, monitor, laptop computer, digital photo frame, or navigator. Other essential components of this display device are understood by those skilled in the art and will not be described in detail here, nor should they be construed as limitations on the present invention. This display device includes, but is not limited to, components such as: a radio frequency unit, a network module, an audio output & input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply. Furthermore, those skilled in the art will understand that the above structure does not constitute a limitation on the display device provided in this disclosure embodiment. In other words, the display device provided in this disclosure embodiment can include more or fewer of the above components, or combine certain components, or have different component arrangements.

[0145] This disclosure provides a display panel, its manufacturing method, and a display device. By setting a groove in the reflective layer of the anode, a microcavity structure is formed between the bottom of the groove and the cathode. This allows adjustment of the groove thickness to control the microcavity length of each sub-pixel, matching the cavity length of each sub-pixel to the wavelength of its respective color light. This selectively enhances the color light, narrows the spectrum, and increases the light output of that color light. This reduces the operating voltage of the display panel, decreasing power consumption and heat generation. It solves the problem of excessive heat accumulation during operation in high-PPI small-to-medium-sized display panels due to their high pixel density. Furthermore, since the second transparent conductive layer and the reflective layer are electrically connected through the reflective layer around the groove, the current flows from the periphery of the groove, bypassing the optical adjustment layer within the groove. This disclosure does not adjust the thickness of the light-emitting functional layer between the anode and cathode, ensuring that the electrical performance of the device is not affected. Moreover, compared to related technologies, this disclosure reduces the thickness of the display panel, achieving a thinner and lighter display. Meanwhile, the grooves in the reflective layer increase the distance between the light-emitting layer and the reflective layer, reducing light loss caused by surface plasmon resonance (SPR) modes and further improving the front light emission efficiency of the sub-pixel. Therefore, this disclosure allows for optical adjustment of the microcavity structure of the sub-pixel without affecting the device's electrical performance, thereby improving the front light emission efficiency of the sub-pixel, ultimately enhancing the luminous efficiency and lifespan of the display panel, and reducing power consumption and heat generation.

[0146] Obviously, those skilled in the art can make various modifications and variations to this disclosure without departing from its spirit and scope. Therefore, if such modifications and variations fall within the scope of the claims of this disclosure and their equivalents, this disclosure is also intended to include such modifications and variations.

Claims

1. A display panel, wherein, Includes a substrate and a plurality of sub-pixels located on one side of the substrate, each sub-pixel including: The anode includes: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer facing away from the substrate, and a second transparent conductive layer located on the side of the reflective layer facing away from the substrate; wherein, a groove is provided on the side of the reflective layer facing away from the substrate, and the second transparent conductive layer is electrically connected to the reflective layer around the groove. An optical adjustment layer is provided to fill the groove. A light-emitting functional layer is located on the side of the anode facing away from the substrate; The cathode is located on the side of the light-emitting functional layer opposite to the substrate. The cathode is a transparent and reflective electrode, and a microcavity structure is formed between the bottom of the groove and the cathode.

2. The display panel as claimed in claim 1, wherein, The thickness of the optical adjustment layer is the same as the thickness of the groove.

3. The display panel as claimed in claim 1, wherein, The refractive index of the optical adjustment layer is greater than 1.

7.

4. The display panel as claimed in claim 3, wherein, The optical adjustment layer has a transmittance of more than 80% in the visible light range.

5. The display panel as claimed in claim 4, wherein, The optical adjustment layer is made of organic or inorganic materials.

6. The display panel as claimed in claim 5, wherein, The organic materials include NPB, HAT-CN, or sulfur, phosphorus, or halogen-doped polymers, and the inorganic materials include ZnO, ZnMgO, or Al2O3.

7. The display panel according to any one of claims 1-6, wherein, It also includes a third transparent conductive layer located between the reflective layer and the second transparent conductive layer, the third transparent conductive layer being electrically connected to the reflective layer surrounding the groove, and the material of the third transparent conductive layer including Mg:Ag alloy.

8. The display panel as claimed in claim 7, wherein, The thickness of the third transparent conductive layer is 5–15 nm.

9. The display panel according to any one of claims 1-8, wherein, The plurality of sub-pixels includes a first sub-pixel, a second sub-pixel, and a third sub-pixel, wherein the emission wavelength of the first sub-pixel is greater than the emission wavelength of the second sub-pixel, and the emission wavelength of the second sub-pixel is greater than the emission wavelength of the third sub-pixel; wherein, The lengths of the microcavity structures corresponding to the first sub-pixel, the second sub-pixel, and the third sub-pixel are all different, and the length of each microcavity structure is equal to an integer multiple of its corresponding half-wavelength of emission.

10. The display panel as claimed in claim 9, wherein, The materials of the optical adjustment layer corresponding to the first sub-pixel, the optical adjustment layer corresponding to the second sub-pixel, and the optical adjustment layer corresponding to the third sub-pixel are the same; The thickness of the groove corresponding to the first sub-pixel is greater than the thickness of the groove corresponding to the second sub-pixel, and the thickness of the groove corresponding to the second sub-pixel is greater than the thickness of the groove corresponding to the third sub-pixel.

11. The display panel as claimed in claim 9, wherein, The thickness of the groove corresponding to the first sub-pixel, the thickness of the groove corresponding to the second sub-pixel, and the thickness of the groove corresponding to the third sub-pixel are the same; The refractive index of the optical adjustment layer corresponding to the first sub-pixel is greater than the refractive index of the optical adjustment layer corresponding to the second sub-pixel, and the refractive index of the optical adjustment layer corresponding to the second sub-pixel is greater than the refractive index of the optical adjustment layer corresponding to the third sub-pixel.

12. The display panel as claimed in any one of claims 9-11, wherein, The first sub-pixel emits light in red, the second sub-pixel emits light in green, and the third sub-pixel emits light in blue.

13. The display panel according to any one of claims 1-12, wherein, The light-emitting functional layer includes: a light-emitting layer located between the anode and the cathode, a hole injection layer located between the anode and the light-emitting layer, a hole transport layer located between the hole injection layer and the light-emitting layer, and an electron transport layer located between the light-emitting layer and the cathode.

14. A display device, wherein, Includes the display panel as described in any one of claims 1-13.

15. A method for manufacturing a display panel, used to manufacture the display panel as described in any one of claims 1-13, wherein, The manufacturing method includes: An anode and an optical adjustment layer are formed on a substrate. The anode includes: a first transparent conductive layer located on one side of the substrate, a reflective layer located on the side of the first transparent conductive layer opposite to the substrate, and a second transparent conductive layer located on the side of the reflective layer opposite to the substrate. A groove is provided on the side of the reflective layer facing the second transparent conductive layer, and the optical adjustment layer fills the groove. A light-emitting functional layer is formed on the anode; A cathode is formed on the light-emitting functional layer. The cathode is a transparent and reflective electrode. A microcavity structure is formed between the bottom of the groove and the cathode.

16. The manufacturing method as described in claim 15, wherein, The formation of the anode and optical adjustment layer on the substrate specifically includes: A first transparent conductive film is deposited on the substrate; A reflective film is deposited on the first transparent conductive film, and a patterning process is used to pattern the reflective film and the first transparent conductive film to form a patterned first transparent conductive layer and reflective layer. Pattern each of the reflective layers, and form a groove on the side of the reflective layer facing away from the substrate; A thin film of optical adjustment material is deposited on the reflective layer; Pattern the optical adjustment material film, and remove the optical adjustment material film around the groove to form an optical adjustment layer that fills the groove; A second transparent conductive film is deposited on the reflective layer, and the second transparent conductive film is patterned to form a patterned second transparent conductive layer.

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