Spray plate and treatment device

Abstract

Provided in the present application are a spray plate and a treatment device. The spray plate comprises: a plate body having a spray surface; two first spray groups spaced apart in a first direction on the spray surface, each first spray group comprising a plurality of first spray ports; at least one second spray group provided between the two first spray groups, each second spray group comprising a plurality of second spray ports, and the at least one second spray group being at least spaced apart from each adjacent first spray group by a preset distance; and two first flow channel groups and at least one second flow channel group which are located in the plate body, the two first flow channel groups being communicated with the plurality of first spray ports of the two first spray groups, and the at least one second flow channel group being communicated with the plurality of second spray ports of the at least one second spray group. The spray plate provided by the present application can satisfy the requirements of coating only cut surfaces without depositing passivation films on other planes, and can reduce the phenomenon of dusting in chambers while improving production capacity.

Description

Spray plate and processing device TECHNICAL FIELD

[0001] The present application relates to the field of thin film deposition, and in particular to a spray plate and processing device for a processing chamber. BACKGROUND

[0002] It is very common to encapsulate cut small photovoltaic cells into photovoltaic modules. The cut small photovoltaic cells are usually formed by cutting a whole substrate (e.g. silicon wafer, semi-finished cell, finished cell) by laser non-destructive cutting. However, the cutting surface of the cut whole substrate is a non-passivated surface, which has many defects and surface charge recombination is very serious, which will affect the lifetime of minority carriers and thus affect the efficiency of the photovoltaic cell, and further affect the power generation of the photovoltaic module. Therefore, it is necessary to use edge passivation technology to passivate the cutting surface of the substrate.

[0003] Figure 1 shows a schematic diagram of a processing chamber known to the applicant, and Figure 2 shows a schematic diagram of a spray plate known to the applicant. As shown in Figures 1 and 2, the spray plate 200' used in the processing chamber 100' for coating the substrate is usually attached to the inner cavity 101' of the processing chamber 100', and the entire surface of the spray plate 200' is uniformly distributed with spray holes 203'. Gases 1 and 2 enter the internal flow channel of the spray plate 200' through the first gas inlet 202' and the second gas inlet 204' of the spray plate 200' and flow to the spray holes 203', and then are sprayed into the inner cavity 101'.

[0004] A front empty area FEA is formed between the spray plate 200' and the substrate rack 110' carrying the substrate in the processing chamber 100'. In the front empty area FEA, the gas flow is blocked to form a vortex, which in turn forms a dust phenomenon in the cavity during the reaction process. In addition, the gas sprayed by the spray holes 203' on the entire surface of the spray plate 200' when passing through the substrate rack 110' carrying the substrate in the processing chamber 100' will coat the periphery of the substrate, causing wrap-around coating. Therefore, the spray plate 200' used in the processing chamber 100' cannot meet the requirement of depositing passivation only on the cutting surface of the substrate and not depositing passivation on the remaining surface. SUMMARY

[0005] The following presents a simplified summary of one or more aspects in order to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated aspects, and is intended to neither identify key or critical elements of all aspects nor delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.

[0006] In order to overcome the above-mentioned defects described in the background art, the present application provides a shower plate and a processing device, which can only coat the cutting surface of a substrate and not deposit a passivation film on other surfaces of the substrate.

[0007] Specifically, the shower plate according to the first aspect of the present application comprises: a plate body having a shower surface; two first shower groups spaced apart along a first direction on the shower surface, the first shower group comprising a plurality of first shower nozzles; at least one second shower group located between the two first shower groups, the second shower group comprising a plurality of second shower nozzles, and the second shower group being spaced apart from the adjacent first shower group by at least a preset distance; and two first flow channel groups and at least one second flow channel group located in the plate body, the two first flow channel groups being in communication with the first shower nozzles of the two first shower groups, and the at least one second flow channel group being in communication with the second shower nozzles of the at least one second shower group.

[0008] In an embodiment of the present application, when the shower plate is arranged in a processing chamber, the preset distance is the size of a substrate rack in the processing chamber in the first direction.

[0009] In an embodiment of the present application, the plate body does not have a shower nozzle within the preset distance.

[0010] In an embodiment of the present application, the distribution width of the first shower nozzles of the first shower group in the first direction is less than the width of a side flow channel in the first direction in the processing chamber, the side flow channel being located between the substrate rack and the side wall of the processing chamber.

[0011] In an embodiment of the present application, the distribution height of the first shower nozzles of the first shower group and / or the second shower nozzles of the second shower group in a second direction is less than the height of the substrate rack, the first direction intersecting the second direction.

[0012] In an embodiment of the present application, the second flow channel group is independent of the first flow channel group.

[0013] In an embodiment of the present application, the shower plate further comprises: at least one first inlet in communication with the two first flow channel groups, each of the first inlets being used to introduce a reaction fluid; and at least one second inlet in communication with the second flow channel group, the second inlet being used to introduce a blocking fluid.

[0014] In an embodiment of the present application, the shower plate comprises two first inlets, and the two first flow channel groups are independent of each other.

[0015] In an embodiment of the present application, the spray plate comprises one of the second flow channel groups, and the second main pipe of the second flow channel group is located at the middle position of the plate body along the first direction.

[0016] In an embodiment of the present application, the spray plate further comprises: at least one first inlet in communication with the first flow channel group, for introducing a blocking fluid; and at least one second inlet in communication with at least one of the second flow channel groups, each of the second inlets being used for introducing a reaction fluid.

[0017] In an embodiment of the present application, the spray plate comprises a plurality of the second spray groups and a corresponding plurality of the second flow channel groups, wherein adjacent ones of the second spray groups are separated by at least the preset distance.

[0018] In an embodiment of the present application, the spray plate comprises a plurality of the second inlets in communication with a plurality of the second flow channel groups, and the plurality of the second flow channel groups are independent of each other.

[0019] In an embodiment of the present application, the first flow channel group comprises a first main pipe and a plurality of first branch pipes, the first main pipe extends along a second direction, the first branch pipes intersect the first main pipe and extend along the first direction, the first spray port comprises a first reaction fluid spray port and a second reaction fluid spray port, the first reaction fluid spray port is arranged on the first branch pipe of one of the first flow channel groups, and the second reaction fluid spray port is arranged on the first branch pipe of another of the first flow channel groups; or the first flow channel group comprises two first main pipes and two groups of first branch pipes, each group of the first branch pipes comprises a plurality of first branch pipes that respectively intersect one of the first main pipes and extend along the first direction, and the first spray port comprises a first reaction fluid spray port and a second reaction fluid spray port arranged on the two groups of the first branch pipes, respectively; wherein the first direction intersects the second direction.

[0020] In an embodiment of the present application, the second flow channel group comprises a second main pipe and a plurality of second branch pipes, the second main pipe extends along the second direction, the second branch pipes intersect the second main pipe and extend along the first direction, and the second spray port is arranged on the second branch pipe.

[0021] In an embodiment of the present application, the first flow channel group comprises a second main pipe and a plurality of second branch pipes, the second main pipe extends along a second direction, the second branch pipes intersect the second main pipe and extend along the first direction, the first spray port is arranged on the second branch pipe, and the first direction intersects the second direction.

[0022] In an embodiment of the present application, the second flow channel group comprises a first main pipe and a plurality of first branch pipes, the first main pipe extends along the second direction, the first branch pipes intersect with the first main pipe and extend along the first direction, and the second spray port is arranged on the first branch pipe; or the spray plate comprises two second inlets and two second flow channel groups, the two second inlets are used for respectively introducing first reaction fluid and second reaction fluid into the corresponding two second flow channel groups, and the plurality of second spray ports comprise first reaction fluid spray ports and second reaction fluid spray ports, which are respectively communicated with the two second flow channel groups.

[0023] In an embodiment of the present application, when the spray plate comprises two second inlets and two second flow channel groups, the first main pipe of the second flow channel group is located between at least one second spray group and the first spray group.

[0024] According to the first aspect of the present application, the processing device comprises a processing cavity, and a spray plate as described above, which is arranged on the processing cavity and has the spray surface facing the inside of the processing cavity.

[0025] In an embodiment of the present application, the processing cavity has two rows of substrate cassettes arranged along the fluid transmission direction, an intermediate flow channel is formed between the two rows of substrate cassettes, and side flow channels are respectively formed between the two rows of substrate cassettes and the side walls of the processing cavity, wherein each first spray group of the spray plate corresponds to one side flow channel, and the second spray group of the spray plate corresponds to the intermediate flow channel.

[0026] In an embodiment of the present application, the processing device further comprises a coating carrier, and the carrier comprises:

[0027] A carrier body comprising a body bottom plate and body side plates located on both sides of the body bottom plate, and the two rows of substrate cassettes arranged in the carrier body along the width direction, and the substrate cassettes are used for stacking and placing substrates, wherein each row of substrate cassettes extending along the length direction is provided with an opening to expose the substrate cutting surface.

[0028] In an embodiment of the present application, the substrate cassettes are provided with the opening on the side facing the body side plate, and a gap is left between the substrate cassettes and the adjacent body side plates to form a reaction fluid channel, and the reaction fluid channel is the side flow channel.

[0029] In an embodiment of the present application, the substrate cassettes are provided with back plates on the other side opposite to the opening, and a gap is left between the two rows of substrate cassettes to form a barrier fluid channel for passing inert fluid, and the barrier fluid channel is the intermediate flow channel.

[0030] In an embodiment of the present application, the front end of the carrier body along the length direction is provided with a front flow uniform plate, and the front flow uniform plate is provided with a plurality of parallel flow uniform plates corresponding to the position of the fluid channel.

[0031] In an embodiment of the present application, the rear end of the carrier body along the length direction is provided with a rear flow uniform plate, and the rear flow uniform plate is provided with a plurality of parallel flow uniform plates corresponding to the position of the reaction fluid channel.

[0032] In an embodiment of the present application, the substrate warehouse is provided with a bottom plate, and the bottom plate is provided with a supporting plate, and the supporting plate comprises a base and a supporting surface protruding from the base, and the substrate is stacked on the supporting surface.

[0033] In an embodiment of the present application, the substrate warehouse is provided with a pressing plate for pressing on the stacked substrates.

[0034] In an embodiment of the present application, the carrier body is provided with a plurality of connecting rods and a plurality of partition plates along the length direction, the connecting rods are fixed on the body side plates at both ends, the partition plates are used to separate two adjacent groups of substrate warehouses, and the connecting rods are used to fix the partition plates.

[0035] In an embodiment of the present application, in the width direction, the number of partition plates is the same as the number of substrate warehouses, and a gap is left between adjacent partition plates to form a fluid channel, and the fluid channel is a reaction fluid channel or a blocking fluid channel.

[0036] In an embodiment of the present application, a gap is left between the body side plate and the adjacent partition plate to form the fluid channel.

[0037] In an embodiment of the present application, a body upper cover is further included, and the body upper cover covers the carrier body.

[0038] Through the spray plate and the processing device provided by the present application, different spray groups are provided, and the spray groups are separated by a preset distance, so that only the cutting surface of the substrate can be passivated without passivating the remaining surface. And according to the actual situation, different fluids are separated by different flow channel groups, effectively reducing the substrate around the plating during the reaction process. Through the arrangement design of the air flow channel, the thickness of the spray plate can also be effectively reduced, the deep hole machining of the spray plate is reduced, the manufacturing process of the spray plate is simplified, and the manufacturing cost is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0039] The above features and advantages of the present application can be better understood after reading the detailed description of embodiments of the present application in conjunction with the following drawings. In the drawings, the components are not necessarily drawn to scale, and the components having similar related properties or features can have the same or similar reference numerals.

[0040] Figure 1 shows a simplified diagram of a processing chamber known to the applicant;

[0041] Figure 2 shows a simplified diagram of a shower plate known to the applicant;

[0042] Figure 3 shows a schematic diagram of a shower plate for a processing chamber according to some embodiments of the present application;

[0043] Figure 4 shows a schematic diagram of a processing chamber according to some embodiments of the present application;

[0044] Figures 5A-5C show schematic diagrams of flow channels within a shower plate according to some embodiments of the present application;

[0045] Figure 6 shows a schematic diagram of flow channels within a shower plate according to some embodiments of the present application;

[0046] Figure 7 shows a schematic diagram of flow channels within a shower plate according to some embodiments of the present application;

[0047] Figure 8 shows a schematic diagram of a shower plate for a processing chamber according to some embodiments of the present application;

[0048] Figure 9 shows a schematic diagram of a processing chamber according to some embodiments of the present application;

[0049] Figures 10A-10C show schematic diagrams of flow channels within a shower plate according to some embodiments of the present application; and

[0050] Figure 11 shows a schematic diagram of flow channels within a shower plate according to some embodiments of the present application.

[0051] Figure 12 shows a schematic diagram of flow channels within a shower plate according to some embodiments of the present application.

[0052] Figure 13A shows a schematic diagram of a model of a plating carrier according to some embodiments of the present application;

[0053] Figure 13B shows an exploded view of a plating carrier according to some embodiments of the present application;

[0054] Figure 13C shows a schematic diagram of a substrate pod according to some embodiments of the present application;

[0055] Figure 13D shows a schematic diagram of a substrate stack of a substrate pod according to some embodiments of the present application;

[0056] Figure 13E shows a schematic diagram of a substrate stack of a substrate pod according to some embodiments of the present application;

[0057] FIG. 14 shows a detailed view of a carrier body, in accordance with some embodiments of the application;

[0058] FIG. 15 shows a schematic view of the internal structure of a carrier body and the flow direction of air, in accordance with some embodiments of the application;

[0059] FIG. 16A shows a schematic view of a front flow uniformizer, in accordance with some embodiments of the application;

[0060] FIG. 16B shows a schematic view of a rear flow uniformizer, in accordance with some embodiments of the application;

[0061] FIG. 17 shows a schematic view of the internal structure of a carrier body and the flow direction of air, in accordance with some embodiments of the application; and

[0062] FIG. 18 shows a schematic view of a rear flow uniformizer, in accordance with some embodiments of the application.

[0063] Reference signs: 100': processing cavity; 101': inner cavity 110': substrate rack; 200': shower plate; 202': first gas inlet 204': second gas inlet; 203': showering orifice; FEA: front empty area 200: shower plate; 201: plate body; SS: showering surface; 210: first showering group; 211: first showering orifice; 220: second showering group; 221: second showering orifice; 21a: first reaction fluid showering orifice; 21b: second reaction fluid showering orifice; 231: first inlet; 232: second inlet; 23a: first reaction fluid inlet; 23b: second reaction fluid inlet; 250: first flow channel group; 260: second flow channel group; 241: reaction fluid channel; 241a: first reaction fluid channel; 241b: second reaction fluid channel; 242: first main pipe; 243: first branch pipe; 246: blocking fluid channel; 247: second main pipe; 248: second branch pipe; 100: processing cavity; 110: substrate rack; 111: substrate cutting surface side; 120: processing cavity sidewall; 131: side channel; 132: middle channel;140: intake flange; A: first direction; B: second direction; C: fluid flow direction; D: thickness direction; E, F: flow channel layer; BS: back surface; 1100: carrier; 1110: carrier body; 1111: body side plate; 1112: body upper cover; 1113: body bottom plate; 1114: front flow uniform plate; 1115: rear flow uniform plate; 1120: partition plate; 121: connecting rod; 1130: positioning block; 1141: flow uniform plate; 1142: partition plate; 1200: substrate; 1201: substrate cutting surface side; 1210: substrate warehouse; 1211: bottom plate; 1212: side plate; 1213: back plate; 1214: support plate; 1215: pressing plate; 1310: reaction gas passage; 1320: barrier gas passage; 1410: reaction gas; 1420: barrier gas; and A', B', C': direction. DETAILED DESCRIPTION

[0064] The present application is described in detail below with reference to the attached drawings and specific examples. Note that the following aspects described below with reference to the attached drawings and specific examples are merely illustrative in all respects and should not be construed as limiting the scope of protection of the present application in any way.

[0065] In the description of the application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection", "linking" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integral connection; it can be direct connection, or indirect connection through intermediate medium, or internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the application can be understood according to the specific circumstances.

[0066] In addition, "up", "down", "left", "right", "top", "bottom", "horizontal", "vertical" used in the following description should be understood as the orientation shown in the section and the related drawings. The relative terms are only for the convenience of description, and do not mean that the device described thereby should be manufactured or operated in a specific orientation, and therefore should not be understood as a limitation on the application.

[0067] It can be understood that although the terms "first", "second", "third" and the like can be used herein to describe various components, regions, layers and / or parts, these components, regions, layers and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers and / or parts. Therefore, the first component, region, layer and / or part discussed below can be referred to as the second component, region, layer and / or part without departing from some embodiments of the application.

[0068] As described above, a front dead zone will be formed between the shower plate and the substrate carrier carrying the substrate in the processing chamber. In the front dead zone, the fluid will be blocked to form a vortex, which will form dust in the chamber during the reaction process. In addition, the fluid sprayed by the whole surface of the shower plate will be plated around the substrate when passing through the substrate carrier carrying the substrate in the processing chamber, which will cause the around plating. Therefore, the known shower plate for processing chamber cannot meet the requirement of depositing passivation film only on the cutting surface of the substrate and not on the remaining surface. In the embodiments of the application, the fluid is typically a gas.

[0069] In order to overcome the defects described in the background art, the embodiments of the application provide a shower plate which can realize the requirement of plating only on the cutting surface and not depositing passivation film on other planes.

[0070] The substrate is put into the processing cavity for process reaction, and the edge passivation of the substrate cutting surface is realized by forming a passivation film such as silicon oxide, aluminum oxide, silicon nitride, silicon oxynitride, etc. on the cutting surface of the substrate. If aluminum oxide is used as the passivation film, TMA (trimethylaluminum) and H2O or TMA (trimethylaluminum) and ozone can be respectively introduced into the processing cavity as the reaction fluid, and nitrogen gas is introduced as the blocking fluid, which does not react with the reaction fluid and the substrate. If silicon oxide is used as the passivation film, oxygen or ozone can be introduced into the processing cavity as the reaction fluid, and nitrogen gas is introduced as the blocking fluid, which does not react with the reaction fluid and the substrate.

[0071] The end of the processing cavity is generally also provided with a gas inlet structure such as a gas inlet flange for gas inlet. The shower plate is fixedly connected with the processing cavity through the gas inlet flange. After the fluid enters the gas inlet flange, it enters the shower plate and is output to the processing cavity through the shower plate.

[0072] The shower plate provided in the present application comprises a plate body with a spraying surface. Two first spraying groups are arranged at intervals along a first direction on the spraying surface, and each first spraying group comprises a plurality of first spraying ports. At least one second spraying group is arranged between the two first spraying groups, and each second spraying group comprises a plurality of second spraying ports. Here, the at least one second spraying group is at least separated from each adjacent first spraying group by a preset distance. Two first flow channel groups and at least one second flow channel group are arranged in the plate body. The two first flow channel groups are in communication with the plurality of first spraying ports of the two first spraying groups, and the at least one second flow channel group is in communication with the plurality of second spraying ports of the at least one second spraying group. Preferably, when the shower plate is arranged on the processing cavity, the preset distance is the size of the substrate tank in the processing cavity in the first direction.

[0073] In the context of the present application, the first direction can be parallel to one edge of the plate body. When the shower plate is arranged on the processing cavity, the first direction is the horizontal direction.

[0074] Figure 3 shows a schematic view of a shower plate according to some embodiments of the present application. As shown in Figure 3, the shower plate 200 includes a plate body 201 having a shower surface SS. Two first shower groups 210 (shown in dashed boxes) are spaced apart along a first direction A on the shower surface SS, each of the first shower groups 210 including a plurality of first shower ports 211. The first shower ports 211 are typically arranged in an array, the number of which in the first direction A and a second direction B (intersecting the first direction) is not limited herein. Further, embodiments of the present application are exemplified with the first direction A and the second direction B being substantially perpendicular to each other. In other implementations, the first direction A and the second direction B can also be two different directions intersecting at other angles, to reasonably distribute fluid into the corresponding shower groups (shower ports) within the shower plate 200, which is not limited in embodiments of the present application. At least one second shower group 220 (one shown in dashed boxes) is disposed between the two first shower groups 210. Each of the second shower groups 220 includes a plurality of second shower ports 221. Again, the second shower ports 221 are typically arranged in an array, the number of which in the first direction A and the second direction B is not limited herein. Here, the second shower group 220 is spaced apart from each of the adjacent first shower groups 210 by at least a predetermined distance L. It can be appreciated that when there are two second shower groups 220, each of the two second shower groups 220 is spaced apart from each of the adjacent first shower groups 210 by at least the predetermined distance L. When there are three second shower groups 220, each of the outer two second shower groups 220 is spaced apart from each of the adjacent first shower groups 210 by at least the predetermined distance L, and so on. In another perspective, the one or more second shower groups 220 are taken as a whole, which is spaced apart from each of the adjacent first shower groups 210 by at least the predetermined distance L.

[0075] As exemplified in Figure 3, the at least one second shower group 220 is located in the center of the shower surface SS, and the two first shower groups 210 are located on the two sides along the first direction A. The shower surface SS is not arranged with any other shower groups except the first shower groups 210 and the second shower groups 220. In particular, no shower groups or shower ports are arranged within the two predetermined distances L. Therefore, fluid will not be sprayed out of the two predetermined distances L.

[0076] Figure 4 shows a schematic view of a processing chamber according to some embodiments of the present application. As shown in Figure 4, the shower plate 200 is disposed at an end of the processing chamber 100 for injecting fluid into the chamber. Inside the processing chamber 100, at least two rows of substrate pods 110 can be arranged along a fluid flow direction C. The substrate pods 110 and the sidewall 120 of the processing chamber form edge channels 131 that can be used to pass fluid, and the substrate pods 110 form intermediate channels 132 that can be used to pass fluid.

[0077] As shown in FIGS. 3 and 4, the distance between the second spray group 220 in the middle and the first spray groups 210 on both sides can be the size of one substrate shelf 110 in the first direction A. In this way, the second spray group 220 can correspond to (e.g., align with) the middle passage 132 of the processing chamber 100, and the fluid sprayed from the second spray openings 221 can enter the processing chamber 100 through the middle passage 132.

[0078] Returning to FIG. 3, two first flow groups 250 and at least one second flow group 260 are arranged in the plate body 201. The two first flow groups 250 are in communication with the plurality of first spray openings 211 of the two first spray groups 210. The second flow group 260 is in communication with the plurality of second spray openings 221 of the second spray group 220. These flow groups 250 and 260 are shown in lines in FIG. 3. It can be understood that these flow groups 250 and 260 are actually located inside the plate body 201 and are not visible at the spray surface SS. In the example of FIG. 3, the first flow group 250 on the left side is in communication with the two first inlets 231 on the top and bottom sides, and the first flow group 250 on the right side is in communication with the other two first inlets 231 on the top and bottom sides, for introducing the reaction fluid. The four first inlets 231 help the fluid to enter more evenly. In other examples, the number of first inlets 231 can be varied, such as two or fewer.

[0079] The fluid enters the processing chamber 100 through the gas inlet flange 140, enters the inlets of the shower plate 200 through the small holes (not shown) on the gas inlet flange 140, and then flows through the first flow groups 250 and the second flow groups 260 inside the shower plate 200 to the first spray groups 210 and the second spray group 220 on the spray surface SS, and is sprayed into the inner cavity of the processing chamber 100.

[0080] In the embodiment shown in FIG. 4, the side of the substrate shelf 110 facing the processing chamber side wall 120 can be set as the substrate cutting surface side 111. Accordingly, the middle passage 132 of the processing chamber 100 is introduced with the blocking fluid, and the side passage 131 is introduced with the reaction fluid, so that the reaction fluid in the side passage 131 is in contact with the cutting surface of the substrate. Correspondingly, the first flow group 250 in communication with the first spray group 210 can be used to introduce the reaction fluid, and the second flow group 260 in communication with the second spray group 220 can be used to introduce the blocking fluid.

[0081] The flow channel arrangement inside the shower plate 200 can be adjusted according to actual needs. The following preferred embodiments are shown to expand the description of the flow channel arrangement, but those skilled in the art should understand that the preferred embodiments shown are only specific schemes for implementation, and are intended to clearly show the main idea of the present application, and are not intended to limit the protection scope of the present application.

[0082] In practice, in the case of two reaction fluids, they are introduced through different first inlets 231. The first inlets 231 are correspondingly divided into a first reaction fluid inlet 23a and a second reaction fluid inlet 23b. The first spray ports 211 can include a first reaction fluid spray port 21a and a second reaction fluid spray port 21b. The left first flow channel group 250 is in communication with the plurality of first reaction fluid spray ports 21a in the two first spray groups 210. The right first flow channel group 250 is in communication with the plurality of second reaction fluid spray ports 21b in the two first spray groups 210. The second flow channel group 260 is in communication with the second inlet 232 for introducing the blocking fluid. The two first flow channel groups 250 can be independent of each other, so that the two reaction fluids are staggered to avoid direct contact between the two reaction fluids. Moreover, any first flow channel group 250 is also independent of the second flow channel group 260.

[0083] In the embodiment shown in FIG. 3, each first flow channel group 250 includes a reaction fluid passage 241, which includes a first main pipe 242 and a plurality of first branch pipes 243. In the case of two reaction fluids, one of the first flow channel groups 250 includes a first reaction fluid passage 241a, and the other first flow channel group 250 includes a second reaction fluid passage 241b. The first main pipe 242 extends along the second direction B, and the plurality of first branch pipes 243 intersect the first main pipe 242 and extend along the first direction A. The first reaction fluid spray ports 21a are arranged on the plurality of first branch pipes 243 of one of the first flow channel groups 250, and the second reaction fluid spray ports 21b are arranged on the plurality of first branch pipes 243 of the other first flow channel group 250, with one row arranged on each first branch pipe 243. The first main pipes 242 of the first reaction fluid passage 241a and the second reaction fluid passage 241b can be arranged at the middle position of the first direction A, and are in communication with the first reaction fluid inlet 23a and the second reaction fluid inlet 23b, respectively.

[0084] The second flow channel group 260 includes a blocking fluid passage 246, which can be arranged on one side of the first direction A (left side in FIG. 3) and is in communication with the second inlet 232. The blocking fluid passage 246 includes a second main pipe 247 and a plurality of second branch pipes 248. The second main pipe 247 extends along the second direction B, and the plurality of second branch pipes 248 intersect the second main pipe 247 and extend along the first direction A. The plurality of second spray ports 221 are arranged on the plurality of second branch pipes 248, with one row arranged on each second branch pipe 248.

[0085] In the embodiments of the present application, the distribution size of the first spray ports 211 in the first spray group 210 is limited to better correspond to the passage of the processing chamber 100. In one example, the distribution width W of the plurality of first spray ports 211 in each first spray group 210 in the first direction A is less than the width of the side flow channel 131 in the first direction A within the processing chamber 100. In one example, the distribution height H of the plurality of first spray ports 211 in each first spray group 210 for spraying the reaction fluid in the second direction B is less than the height of the substrate rack 110, and if there are multiple substrate racks 110 stacked in the second direction B, the height of the substrate rack 110 corresponds to the overall height of the multiple substrate racks 110 after stacking.

[0086] FIGS. 5A-5C show schematic diagrams of flow channels inside the spray plate according to some embodiments of the present application. In reference to FIGS. 3 and 5A-5C, the inside of the spray plate 200 includes two first flow channel groups 250 and one second flow channel group 260, and further includes a first reaction fluid passage 241a, a second reaction fluid passage 241b, and a blocking fluid passage 246. The first reaction fluid passage 241a and the second reaction fluid passage 241b each can include a first main pipe 242 extending in the second direction B and a plurality of first branch pipes 243 intersecting the first main pipe 242 and extending in the first direction A. The blocking fluid passage 246 includes a second main pipe 247 extending in the second direction B and a plurality of second branch pipes 248 intersecting the second main pipe 247 and extending in the first direction A.

[0087] As shown in FIG. 5A, the inner part of the plate body 201 of the spray plate 200 has two layers of flow channels along the thickness direction D thereof. As shown in FIGS. 5B and 5C, the flow channel layer E is the layer close to the spray surface SS (i.e. the side facing the inner cavity) of the spray plate 200, and the flow channel layer F is the layer close to the back surface BS of the spray plate 200. FIG. 5B shows the spray plate inner part view of the spray plate 200 from the side of the spray surface SS. As shown in FIG. 5B, the flow channel layer E can be provided with the blocking fluid passage 246 and the second reaction fluid passage 241b, and the second branch pipe 248 of the blocking fluid passage 246 and the first branch pipe 243 of the second reaction fluid passage 241b are staggered arranged, and the branch pipe of the blocking fluid passage 246 does not intersect with the first branch pipe 243 of the second reaction fluid passage 241b. Similarly, FIG. 5C shows the spray plate inner part view of the spray plate 200 from the side of the back surface BS. As shown in FIG. 5C, the flow channel layer F can be provided with the first reaction fluid passage 241a, and the first reaction fluid passage 241a and the second reaction fluid passage 241b are not in the same flow channel layer, but the main pipes 242 of each are symmetrically distributed in the first direction A, and the first reaction fluid passage 241a and the first branch pipe 243 of the second reaction fluid passage 241b are staggered arranged to cover the first reaction fluid spray port 21a and the second reaction fluid spray port 21b respectively.

[0088] The flow channels shown in FIGS. 5A-5C are formed by opening and punching inwardly from the side edges of the spray plate 200, which is more convenient for processing the flow channels.

[0089] In combination with FIGS. 3, 4, 5A-5C, the first reaction fluid and the second reaction fluid can enter the first main pipe 242 of the first reaction fluid passage 241a and the second reaction fluid passage 241b in the inner part of the spray plate 200 respectively through the first reaction fluid inlet 23a and the second reaction fluid inlet 23b on the upper and lower sides of the spray plate 200, and then flow to the area of the two first spray groups 210 on both sides of the spray surface SS through the first branch pipe 243 of each, and then sprayed into the inner cavity. The first spray port 211 of the first spray group 210 includes the first reaction fluid spray port 21a and the second reaction fluid spray port 21b. The blocking fluid can enter the second main pipe 247 of the blocking fluid passage 246 through the blocking fluid inlet 232 on one side of the spray plate 200, and then flow to the area of the second spray group 220 in the middle of the spray surface SS through the second branch pipe 248, and then sprayed out.

[0090] Thus, the first and second reaction fluids can be sprayed from the first and second reaction fluid spray ports 21a and 21b of the first spray ports 211 on both sides of the spray surface SS, pass through the side passages 131 between the processing chamber sidewalls 120 and the substrate cutting surface sides 111 of the substrate shelves 110, and thus achieve passivation deposition on the cutting surfaces of the substrates. The barrier fluid can be sprayed from the second spray ports 221 in the middle of the spray plate 200, pass through the middle passages 132 between the substrate shelves 110, diffuse to the side passages 131 on both sides, and thus form and maintain a non-process atmosphere in the middle passages 132, thereby preventing the reaction fluids from diffusing to the middle passages 132 and causing around-plating or secondary contamination of the non-cutting surfaces of the substrates.

[0091] In a more preferred embodiment, the flow channels can be arranged in the same layer plane of the spray plate 200 in the thickness direction D by means of plate block splicing, thereby reducing the thickness of the spray plate 200.

[0092] FIGS. 6 and 7 show schematic diagrams of flow channels inside the spray plate according to some embodiments of the present application. In the following description, reference will be made to the first and second spray groups 210 and 220 shown in FIG. 3. In the embodiment shown in FIG. 6, the inside of the spray plate 200 includes two first flow channel groups 250 and one second flow channel group 260, and more specifically, two reaction fluid passages 241 and one barrier fluid passage 246. Each first reaction fluid passage 241a can include a first main pipe 242 extending in the second direction B and a plurality of first branch pipes 243 intersecting the first main pipe 242 and extending in the first direction A. The rows of first spray ports 211 in the first spray group 210 can be arranged on the first branch pipes 243 of the reaction fluid passages 241. The barrier fluid passage 246 includes a second main pipe 247 extending in the second direction B and a plurality of second branch pipes 248 intersecting the second main pipe 247 and extending in the first direction A. The rows of second spray ports 221 in the second spray group 220 can be arranged on the second branch pipes 248 of the barrier fluid passage 246.

[0093] The second main pipe 247 of the barrier fluid passage 246 can be located at the middle of the first direction A, and the second branch pipes 248 thereof extend a distance from the middle of the first direction A to both ends to cover the second spray group 220 in the middle of the spray plate 200. The first main pipes 242 of the two reaction fluid passages 241 can be arranged on both sides of the first direction A, and the plurality of first branch pipes 243 of the two reaction fluid passages 241 can extend a distance to the middle of the first direction A to cover the two first spray groups 210 on both sides of the spray surface SS.

[0094] Those skilled in the art can understand that the above examples are only specific solutions for ease of implementation, and are not intended to limit the protection scope of the present application. For example, in another example, based on the above concept, those skilled in the art can also arrange the first main pipe 242 of the two first reaction fluid channels 241 at the edge position of the second branch pipe 248 of the blocking fluid channel 246, as long as it is ensured that the second branch pipe 248 does not intersect with the first main pipe 242. In this way, the first branch pipe 243 can extend to both sides of the first direction A to cover the two first spray groups 210 on both sides of the spray surface SS.

[0095] FIG. 7 shows a case where the first flow channel group 250 includes first reaction fluid channels 241a and second reaction fluid channels 241b which are independent of each other. The first reaction fluid channels 241a and the second reaction fluid channels 241b respectively include first main pipes 242 extending along the second direction B and a plurality of first branch pipes 243 intersecting with the first main pipes 242 and extending along the first direction A. First reaction fluid spray ports 21a and second reaction fluid spray ports 21b are respectively arranged on the first branch pipes 243 of the first reaction fluid channels 241a and the second reaction fluid channels 241b. The first main pipes 242 of a group of first reaction fluid channels 241a and second reaction fluid channels 241b are located on one side (left side in the figure) of the spray panel 200 along the first direction A, and the first main pipes 242 of another group of first reaction fluid channels 241a and second reaction fluid channels 241b are located on the other side (right side in the figure) of the spray panel 200 along the first direction A.

[0096] Taking the left side of the spray panel 200 as an example, the first main pipe 242 of the first reaction fluid channel 241a can be close to the outside of the spray panel 200 along the first direction A. The first main pipe 242 of the second reaction fluid channel 241b can be close to the inside of the spray panel 200 along the first direction A and located outside the second branch pipe 248 of the blocking fluid channel 246, and does not intersect with the second branch pipe 248. The first branch pipe 243 of the first reaction fluid channel 241a extends to the position direction of the first main pipe 242 of the second reaction fluid channel 241b, but does not intersect with the first main pipe 242 of the second reaction fluid channel 241b. Similarly, the first branch pipe 243 of the first main pipe 242 extends to the position direction of the first main pipe 242 of the first reaction fluid channel 241a, but does not intersect with the first main pipe 242 of the first reaction fluid channel 241a. The first branch pipes 243 of the first reaction fluid channels 241a and the second reaction fluid channels 241b can be staggered and arranged to cover the first reaction fluid spray ports 21a and the second reaction fluid spray ports 21b of the first spray ports 211 on the spray surface SS.

[0097] Those skilled in the art can understand that the above embodiments are some specific solutions provided by the present application for the public to implement, which are intended to clearly show the main idea of the present application, and are not used to limit the protection scope of the present application. For example, the positions of the flow channels in the spray plate 200 and the corresponding gas inlets can be adjusted according to actual needs.

[0098] Compared with the prior art, the number of spray holes arranged on the spray surface SS of the spray plate 200 is reduced, and the spray holes can be distributed only on the spray surface SS corresponding to the passages for passing the reaction fluid and the blocking fluid in the processing cavity 100.

[0099] In another embodiment, the first flow channel group 250 can be used to introduce the blocking fluid, and the second flow channel group 260 can be used to introduce the reaction fluid. FIG. 8 shows a schematic diagram of a spray plate for a processing cavity according to some embodiments of the present application, and FIG. 9 shows a schematic diagram of a processing cavity according to some embodiments of the present application. As shown in FIG. 8, the same as the embodiment shown in FIG. 3 is that the spray surface SS of the spray plate 200 includes two first spray groups 210 (indicated by a dashed box in the figure) and a second spray group 220 (indicated by a dashed box in the figure) located between the two first spray groups 210. The other details of the spray groups can be referred to the embodiment shown in FIG. 3, which will not be expanded here. In the embodiment shown in FIG. 9, two rows of substrate cassettes 110 are arranged inside the processing cavity 100 along the fluid flow direction C, and the opposite side of the two rows of substrate cassettes 110 is the substrate cutting surface side 111, and the side facing the processing cavity side wall 120 is the back surface of the substrate cassette 110. The substrate cassette 110 and the processing cavity side wall 120 form an edge passage 131 which can be used to pass the blocking fluid, and the intermediate passage 132 between the two rows of substrate cassettes 110 can be used to pass the reaction fluid.

[0100] On the spray surface SS of the spray plate 200, the distance L between the first spray group 210 and the second spray group 220 in the middle can be the size of a substrate cassette 110 in the first direction A, so that the edge passage 131 and the intermediate passage 132 can correspond to the areas of the first spray group 210 and the second spray group 220 on the spray surface SS.

[0101] In practice, according to the number of times the substrate is cut, three or more columns of substrate racks 110 can be arranged in the processing chamber 100, thereby forming multiple intermediate channels 132. For example, in the case of three columns of substrate racks 110, one of the columns of substrate racks 110 can form one intermediate channel 132 with each of the two adjacent columns of substrate racks 110 on both sides, and the substrate cutting surface side 111 of the column of substrate racks 110 facing both adjacent columns of substrate racks 110 is exposed. Accordingly, the spray surface SS of the shower plate 200 can be provided with multiple second spray groups 220 corresponding to the multiple intermediate channels 132. In embodiments not shown in the drawings, when there are two second spray groups 220, each of the two second spray groups 220 is separated from each adjacent first spray group 210 by at least a predetermined distance L. Also, the two second spray groups 220 are separated from each other by at least a predetermined distance L. When there are three second spray groups 220, the outermost two second spray groups 220 are separated from each adjacent first spray group 210 by at least a predetermined distance L, and the adjacent second spray groups 220 among the three second spray groups 220 are also separated from each other by at least a predetermined distance L, and so on.

[0102] The inlet of the shower plate 200 is in communication with the flow channels inside the shower plate 200, which can include two first flow channel groups 250 in communication with the two first spray groups 210, respectively, and a second flow channel group 260 in communication with the second spray group 220. These flow channel groups 250 and 260 are exemplified by lines in FIG. 8. The first flow channel group 250 and the second flow channel group 260 can be adjusted according to actual needs, and will not be described here.

[0103] In practice, in the case of two reaction fluids, they are introduced through different second inlets 232. The second inlets 232 are accordingly divided into a first reaction fluid inlet 23a and a second reaction fluid inlet 23b. The second spray openings 221 can include a first reaction fluid spray opening 21a and a second reaction fluid spray opening 21b. The second flow channel group 260 on the left side of the middle of the shower plate 200 is in communication with the multiple first reaction fluid spray openings 21a in the second spray group 220, and the second flow channel group 260 on the right side of the middle is in communication with the multiple second reaction fluid spray openings 21b in the second spray group 220. The two first flow channel groups 250 are in communication with the first inlet 231 for introducing the blocking fluid. The two second flow channel groups 260 can be independent of each other, thereby staggering the two reaction fluids and avoiding direct contact between the two reaction fluids. Also, any second flow channel group 260 is independent of the first flow channel group 250.

[0104] In this embodiment, as shown in FIG. 8, the second flow channel group 260 includes two reaction fluid channels 241, i.e., a first reaction fluid channel 241a and a second reaction fluid channel 241b. Each reaction fluid channel 241 includes a first main pipe 242 and a plurality of first branch pipes 243. The first main pipe 242 extends along the second direction B, and the plurality of first branch pipes 243 intersect the first main pipe 242 and extend along the first direction A. The first reaction fluid spray ports 21a are arranged on the plurality of first branch pipes 243 of the first reaction fluid channel 241a, and the second reaction fluid spray ports 21b are arranged on the plurality of first branch pipes 243 of the second reaction fluid channel 241b, one row on each first branch pipe 243. The first main pipes 242 of the first reaction fluid channel 241a and the second reaction fluid channel 241b can be arranged at the middle position of the first direction A and communicate with the first reaction fluid inlet 23a and the second reaction fluid inlet 23b, respectively. In an embodiment not shown in the figure, the second flow channel group 260 can include one reaction fluid channel 241 for introducing one reaction fluid.

[0105] Each first flow channel group 250 includes one barrier fluid channel 246, which can be arranged on both sides (left and right in FIG. 8) of the first direction A and communicates with the first inlet 231. The barrier fluid channel 246 includes a second main pipe 247 and a plurality of second branch pipes 248. The second main pipe 247 extends along the second direction B, and the plurality of second branch pipes 248 intersect the second main pipe 247 and extend along the first direction A. A plurality of second spray ports 221 are arranged on the plurality of second branch pipes 248, one row on each second branch pipe 248.

[0106] FIGS. 10A-10C show schematic diagrams of flow channels inside a spray plate according to some embodiments of the present application. In combination with FIG. 8 and FIGS. 10A-10C, the inside of the spray plate 200 includes two first flow channel groups 250 and two second flow channel groups 260, and further includes a first reaction fluid channel 241a, a second reaction fluid channel 241b, and two barrier fluid channels 246 independent of each other. The first reaction fluid channel 241a and the second reaction fluid channel 241b each include a first main pipe 242 extending along the second direction B and a plurality of first branch pipes 243 intersecting the first main pipe 242 and extending along the first direction A. The barrier fluid channel 246 includes a second main pipe 247 extending along the second direction B and a plurality of second branch pipes 248 intersecting the second main pipe 247 and extending along the first direction A.

[0107] As shown in FIG. 10A, the inside of the shower plate 200 has two layers of flow channels along the thickness direction D of the shower plate 200. As shown in FIGS. 10B and 10C, the flow channel layer E is the layer close to the shower surface SS of the shower plate 200, and the flow channel layer F is the layer close to the back surface BS of the shower plate 200. FIG. 10B shows the inside view of the shower plate 200 from the side of the shower surface SS, and it can be seen from FIG. 10B that the blocking fluid channel 246 and the second reaction fluid channel 241b can be arranged in the flow channel layer E. The second branch pipe 248 of the blocking fluid channel 246 extends inwardly (to the right in the figure) to cover one first shower group 210 on the side of the first direction A. Moreover, the second branch pipe 248 of the blocking fluid channel 246 does not contact the first main pipe 242 and the first branch pipe 243 of the second reaction fluid channel 241b. Similarly, FIG. 10C shows the inside view of the shower plate 200 from the side of the shower surface SS, and the structure thereof is symmetrical about the symmetry axis of the shower surface SS, which will not be described here. In this way, the flow channels in the shower plate 200 do not contact other flow channels by changing the position in the thickness direction D.

[0108] In this way, the first reaction fluid and the second reaction fluid enter the first main pipe 242 of the first reaction fluid channel 241a and the second reaction fluid channel 241b in the inside of the shower plate 200 through the first reaction fluid inlet 23a and the second reaction fluid inlet 23b on the top and bottom of the shower plate 200, respectively, and then flow to the first reaction fluid shower port 21a and the second reaction fluid shower port 21b in the middle of the shower surface SS through the first branch pipe 243. The blocking fluid can enter the second main pipe 247 of the blocking fluid channel 246 through the first inlet 231 on the two sides of the shower plate 200, and then flow to the area of the first shower group 210 on the two sides of the shower surface SS through the second branch pipe 248 and then be sprayed out. After that, the sprayed first reaction fluid and second reaction fluid pass through the middle passage 132 between the substrate shelves 110 in the processing chamber 100, so as to realize the passivation deposition on the cutting surface of the substrate. After the blocking fluid is sprayed out from the two sides of the shower plate 200, it passes through the side passage 131 between the side wall 120 of the processing chamber and the substrate shelf 110, diffuses to the middle passage 132, forms and maintains the non-process atmosphere of the side passage 131, so as to prevent the reaction fluid from diffusing to the side passage 131 on the two sides and causing the non-cutting surface of the substrate to be plated or secondarily contaminated.

[0109] Please refer to FIG. 11, which shows the flow channel diagram of the inside of the shower plate according to some embodiments of the present application.

[0110] As shown in FIG. 11, the spray plate 200 can be formed by plate blocks spliced together, so that the first reaction fluid passage 241a, the second reaction fluid passage 241b, and the two barrier fluid passages 246 are arranged in the same layer plane of the spray plate 200 along the thickness direction D, thereby reducing the thickness of the spray plate 200.

[0111] The first main pipe 242 of the first reaction fluid passage 241a and the second reaction fluid passage 241b can be located between the second spray group 220 and the two first spray groups 210, respectively. The first branch pipes 243 of the first reaction fluid passage 241a and the second reaction fluid passage 241b are arranged in cross, and do not intersect with the first main pipe 242 of the other reaction fluid passage. The first reaction fluid spray ports 21a and the second reaction fluid spray ports 21b (refer to FIG. 8) can be arranged on the first branch pipes 243 of the first reaction fluid passage 241a and the second reaction fluid passage 241b, respectively. The second main pipe 247 of the barrier fluid passage 246 can be located on both sides of the first direction A, and each second branch pipe 248 extends inward, and each first spray port 211 (refer to FIG. 8) is located on the second branch pipe 248 of the barrier fluid passage 246.

[0112] In one example, when only one kind of reaction fluid is introduced, the flow channel group layout shown in FIG. 12 can also be used for the embodiment shown in FIG. 8. In the embodiment shown in FIG. 12, the inside of the spray plate 200 includes two first flow channel groups 250 and one second flow channel group 260, and further includes one reaction fluid passage 241 and two barrier fluid passages 246. The reaction fluid passage 241 can include one first main pipe 242 extending along the second direction B and a plurality of first branch pipes 243 intersecting the first main pipe 242 and extending along the first direction A. Each row of second spray ports 221 in the second spray group 220 (refer to FIG. 8) can be arranged on the first branch pipes 243 of the reaction fluid passage 241. Each barrier fluid passage 246 includes one second main pipe 247 extending along the second direction B and a plurality of second branch pipes 248 intersecting the second main pipe 247 and extending along the first direction A. Each row of first spray ports 211 in the first spray group 210 (refer to FIG. 8) can be arranged on the second branch pipes 248 of the barrier fluid passage 246. At this time, the second spray ports 221 in the second spray group 220 only spray one kind of reaction fluid.

[0113] The first main pipe 242 of the reaction fluid channel 241 can be located at the middle of the first direction A, and the first branch pipes 243 of the first main pipe 242 extend from the middle of the first direction A to both ends by a distance to cover the second spray group 220 located at the middle of the spray plate 200. The second main pipes 247 of the two blocking fluid channels 246 can be arranged on both sides of the first direction A, and the second branch pipes 248 of the two blocking fluid channels 246 can extend to the middle of the first direction A by a distance to cover the two first spray groups 210 on both sides of the spray surface SS.

[0114] In summary, the spray plate provided by the present application can achieve the process effect of passivating only the cutting surface of the substrate and not depositing a passivation film on the remaining surface. According to actual conditions, different fluids can be separated by different flow channels to effectively reduce the substrate winding during the reaction. Through the arrangement design of the flow channel, the thickness of the spray plate can also be effectively reduced, the deep hole processing of the spray plate can be reduced, the manufacturing process of the spray plate can be simplified, and the manufacturing cost can be reduced.

[0115] In addition, corresponding to the above-mentioned spray plate, the present application also provides a film deposition carrier in a processing chamber for placing a substrate rack, which is used to cooperate with the above-mentioned spray plate to achieve the requirement of depositing a film only on the cutting surface of the substrate and not depositing a passivation film on other surfaces.

[0116] Please refer to FIG. 13A and FIG. 13B, FIG. 13A shows a model schematic diagram of a film deposition carrier according to some embodiments of the present application, and FIG. 13B shows an exploded view of a film deposition carrier according to some embodiments of the present application.

[0117] As shown in FIG. 13A, the carrier 1100 can include a carrier body 1110, which can include a body bottom plate 1113 extending along the length direction A' of the reaction fluid flow and body side plates 1111 located on both sides of the body bottom plate 1113. In the embodiment of FIG. 13A, it can also include a body upper cover 1112. The body side plates 1111 are located on both sides of the carrier body 1110, and the cavity of the carrier body 1110 can be formed by a body bottom plate 1113 and two body side plates 1111, or by a U-shaped plate material with a body bottom plate and two body side plates.

[0118] As shown in FIG. 13B, the carrier body 1110 of the carrier 1100 can also include at least two rows of substrate racks 1210 arranged along the width direction B'. After the substrate racks 1210 are placed in the carrier body 1110 of the carrier 1100, the body upper cover 1112 is combined on the carrier body 1110 to form the carrier 1100. Here, the carrier 1100 is preferably made of high-temperature resistant material, including but not limited to aluminum alloy material, stainless steel material.

[0119] In the embodiment shown in FIG. 13B, each row of the substrate cassettes 1210 in the length direction A' includes two substrate cassettes 1210, thereby extending along the length direction A' to form two columns of substrate cassettes 1210. In practice, each row can include more than two substrate cassettes 1210, thereby forming more than two columns of substrate cassettes 1210, depending on the substrate cutting. For example, a complete substrate can be cut twice to correspond to 3 columns of substrate cassettes 1210 in the width direction B', or even more times to correspond to more than 3 columns of substrate cassettes 1210.

[0120] FIG. 13C shows a schematic view of a single substrate cassette according to some embodiments of the present application. As shown in FIG. 13C, each substrate cassette 1210 is in the shape of a box or a case, in which the cut substrates 1200 can be stacked. In the example shown in FIG. 13C, the substrate cassette 1210 can be formed by a bottom plate 1211, two side plates 1212 and a back plate 1213. In some embodiments, the substrate cassette 1210 can also be provided with a top plate (not shown). In FIG. 13C, one side of the substrate cassette is provided with an opening, i.e. without the back plate 1213, to expose the end surface of the cut substrate, thereby exposing the cut surface of the substrate to the reaction fluid. Depending on the substrate cutting, both end surfaces of the substrate can be cut surfaces, for example, a complete substrate can be cut twice to form three substrates 1200, in which the middle substrate 1200 has two cut surfaces and the two side substrates 1200 have only one cut surface. In this example, the substrate cassette 1210 for stacking the substrates 1200 with two cut surfaces has only two side plates 1212, without the back plate 1213, thereby forming an opening to expose both cut surfaces of the substrate 1200.

[0121] When inserting or removing the substrates 1200 into the substrate cassette 1210, the substrates 1200 can be sucked into or out of the substrate cassette 1210 from the direction C'. In an example, the bottom plate 1211 can be provided with a carrier plate 1214 for lifting the substrates 1200. The carrier plate 1214 can include a base and a support surface protruding from the base, wherein the support surface of the base is consistent with the size of the substrate 1200, and the substrates 1200 are stacked on the support surface. Since the edge of the support surface protrudes out of the base, it is convenient to operate the carrier plate 1214 by the robot to push out all the substrates 1200 in the substrate cassette 1210 after coating.

[0122] Preferably, the substrate cassette 1210 can also be provided with a pressing plate 1215. After the substrates 1200 are stacked, the pressing plate 1215 is pressed on the stacked substrates 1200, and the stacked substrates 1200 are compressed by the self-weight of the pressing plate 1215, thereby reducing the gap between the substrates 1200 to avoid the reaction fluid entering the gap and unnecessarily coating the uncut surface.

[0123] Please refer to FIG. 13D and FIG. 13E, which show schematic diagrams of the substrate stack of the substrate rack according to some embodiments of the present application.

[0124] As shown in FIG. 13D, the substrates 1200 can be horizontally stacked, and the pressing plate 1215 presses the substrates 1200 from top to bottom, and the substrate rack 1210 seals the non-plating surface of the substrates 1200 by the bottom plate 1211, the side plate 1212, the back plate 1213 and the pressing plate 1215, so as not to be in contact with the reaction fluid. Under the action of the pressing plate 1215, the stacking surface of the substrates 1200 can be substantially not in contact with the reaction fluid. In other examples, the substrates 1200 can also be stacked in the vertical direction, as shown in FIG. 13E.

[0125] Further, FIG. 14 shows a detailed view of the carrier body according to some embodiments of the present application. As shown in FIG. 14, a plurality of groups of partitions 1120 can be arranged along the length direction A' in the carrier body 1110 of the carrier 1100, and each group of partitions 1120 is used to separate two adjacent groups of substrate racks 1210 arranged along the length direction A'. Each group of partitions 1120 can be fixed by the connecting rods 1121 connecting the body side plates 1111 on both sides.

[0126] In the width direction B', a group of partitions 1120 can include the same number of partitions 1120 as the number of columns of substrate racks 1210. A gap can be left between adjacent partitions 1120 to form a fluid channel in the length direction A', or a gap can be left between the body side plate 1111 and the adjacent partition 1120 to form a fluid channel in the length direction A'. In one embodiment, the fluid channel can include a reaction fluid channel 1310 and a barrier fluid channel 1320, the reaction fluid 1410 flowing through the reaction fluid channel 1310 is used to coat the exposed substrate cutting surface, and the barrier fluid 1420 flowing through the barrier fluid channel 1320 is used to block the diffusion of the reaction fluid 1410 to reduce the degree of winding.

[0127] In one embodiment, a gap is left between adjacent partitions 1120 and between the body side plate 1111 and the adjacent partition 1120 to form a fluid channel in the length direction A'. In this embodiment, in addition to the reaction fluid channel 1310, a barrier fluid channel 1320 is also provided, and the barrier fluid 1420 can be an inert fluid that does not react with the substrate and the reaction fluid 1410, and the barrier fluid 1420 is used to block the diffusion of the reaction fluid 1410 to reduce the degree of winding, which is described in detail below in connection with FIG. 15 and FIG. 17.

[0128] In practice, the side plate 1212 and the back plate 1213 of the substrate bin 1210 can be inclined to facilitate the placement of the substrate bin 1210 in the carrier body 1110, and the substrate bin 1210 can form a seal with the partition 1120 in the carrier body 1110. The body bottom plate 1113 can further be provided with a positioning block 1130 to more accurately place the substrate bin 1210.

[0129] In addition, the front end and the rear end of the carrier body 1110 of the carrier 1100 can be respectively provided with a front flow uniform plate 1114 and a rear flow uniform plate 1115 to make the airflow in the carrier body 1110 more uniform. The front flow uniform plate 1114 and the rear flow uniform plate 1115 can be provided with a plurality of parallel flow uniform plates 1141 at positions corresponding to the reaction fluid channels 1310. More preferably, the front flow uniform plate 1114 can also be provided with a plurality of parallel flow uniform plates 1141 at positions corresponding to the blocking fluid channels 1320.

[0130] Please refer to FIG. 15, which shows a schematic diagram of the internal structure of the carrier body and the airflow direction according to some embodiments of the present application.

[0131] As shown in FIG. 15, two rows of substrate bins 1210 are arranged in the width direction B' in the carrier body 1110. The substrate bins 1210 arranged in the carrier body 1110 can include a back plate 1213 and an opening for exposing the substrate cutting surface side 1201. The openings of the substrate bins 1210 in the two adjacent rows are arranged opposite to each other, i.e., the opposite side of the two rows of substrate bins 1210 in the width direction B' is the substrate cutting surface side 1201, and a gap is left between the two rows of substrate bins 1210 to form the reaction fluid channel 1310 in the length direction A'.

[0132] As described above, in other embodiments, the substrate can also be cut into more than three pieces in the width direction B', and in this case, three or more rows of substrate bins can also be arranged in the width direction B' in the carrier body. The side of the row of substrate bins adjacent to the body side plate opposite to the body side plate is the substrate uncut surface side, and the substrate bin is provided with a back plate on this side, while the opposite side, i.e., the side between the two substrate bins, is the substrate cutting surface side, and no back plate is provided on this side to form an opening. In this way, the opposite sides of the two adjacent rows of substrate bins are the substrate cutting surface sides, and the gap left between the two rows of substrate bins is used to form the reaction fluid channel.

[0133] Please continue to refer to FIG. 15, preferably, the two rows of substrate cassettes 1210 adjacent to the body side plate 1111 can have a gap between the back plate 1213 facing the body side plate 1111 and the body side plate 1111, for forming a barrier fluid channel 1320. The barrier fluid 1420 can be an inert fluid that does not react with the substrate 1200 and the reaction fluid 1410, and the barrier fluid 1420 is used to block the diffusion of the reaction fluid 1410, reducing the wrap-around condition.

[0134] Please refer to FIG. 16A and FIG. 16B, FIG. 16A shows a schematic diagram of a front flow uniformizing plate according to some embodiments of the present application, and FIG. 16B shows a schematic diagram of a back flow uniformizing plate according to some embodiments of the present application.

[0135] Please refer to FIG. 15 and FIG. 16A, the front flow uniformizing plate 1114 has a plurality of parallel flow uniformizing plates 1141 at the positions corresponding to the fluid channels, which can include the reaction fluid channels 1310 and the barrier fluid channels 1320, and the front flow uniformizing plate 1114 can have three groups of flow uniformizing plates 1141 corresponding to one group of reaction fluid channels 1310 and two groups of barrier fluid channels 1320, and the flow uniformizing plates 1141 are separated by the partition plates 1142. When there are more than one group of reaction fluid channels, the number of groups of flow uniformizing plates 1141 is increased accordingly. As shown in FIG. 16B, the back flow uniformizing plate 1115 can have one group of flow uniformizing plates 1141 corresponding to one group of reaction fluid channels 1310, and similarly, when there are more than one group of reaction fluid channels, the number of groups of flow uniformizing plates 1141 is increased accordingly. The flow uniformizing plates 1141 are separated by the partition plates 1142 on both sides, and the exhaust gas after the reaction in the reaction chamber is discharged by the flow uniformizing plates 1141 of the back flow uniformizing plate 1115.

[0136] In this way, the reaction fluid 1410 enters the carrier body 1110 through the flow uniformizing plates 1141 in the middle of the front flow uniformizing plate 1114, and is deposited on the cut surface of the substrate 1200 in the reaction fluid channel 1310. The barrier fluid 1420 enters through the flow uniformizing plates 1141 on both sides of the front flow uniformizing plate 1141, passes through the barrier fluid channel 1320, and flows in the direction of the reaction fluid channel 1310, forming a non-reaction fluid atmosphere around the reaction fluid channel 1310. The diffusion of the reaction fluid 1410 to the barrier fluid channel 1320 on both sides is blocked, reducing the wrap-around condition of the reaction fluid 1410.

[0137] Please refer to FIG. 17, which shows a schematic diagram of the internal structure of the carrier body and the flow direction of the gas according to some embodiments of the present application.

[0138] As shown in FIG. 17, two rows of substrate cassettes 1210 can be arranged in the carrier body 1110, each of the two rows of substrate cassettes 1210 facing one side of the body side plate 1111 as the substrate cutting surface side 1201. The substrate cassettes 1210 are provided with an opening on the side facing the body side plate 1111. A gap is left between each row of substrate cassettes 1210 and the adjacent body side plate 1111 to form a reaction fluid channel 1310. When the substrate cutting surface side 1201 of the substrate cassettes 1210 is close to the body side plates 1111 on both sides, the temperature of the cutting surface of the substrate 1200 is raised, the preheating time is reduced, and the deposition of the passivation film on the cutting surface of the substrate 1200 is facilitated. Preferably, the other side of the two rows of substrate cassettes 1210 opposite the opening is provided with a back plate 1213, and a gap can be left between the back plates 1213 of the two rows of substrate cassettes 1210 to form a barrier fluid channel 1320 for passing in an inert fluid that does not react with the substrate 1200 and the reaction fluid 1410.

[0139] It should be understood that the barrier fluid channel 1320 herein corresponds to the intermediate channel 132 in the shower plate embodiment described above, and the reaction fluid channel 1310 corresponds to the side channel 131 in the shower plate embodiment described above.

[0140] Referring to FIG. 18, FIG. 18 shows a schematic diagram of a rear flow uniformizing plate according to some embodiments of the present application.

[0141] In the embodiment shown in FIG. 17, the front flow uniformizing plate 1114 can have three groups of flow uniformizing pieces 1141 corresponding to two groups of reaction fluid channels 1310 and one group of barrier fluid channels 1320, as shown in FIG. 16A. The rear flow uniformizing plate 1115 can have two groups of flow uniformizing pieces 1141 corresponding to two groups of reaction fluid channels 1310, and the two groups of flow uniformizing pieces 1141 are separated by a partition plate 1142, and the exhaust gas after the reaction in the reaction chamber is discharged by the flow uniformizing pieces 1141 on both sides, as shown in FIG. 18.

[0142] The reaction fluid 1410 enters the carrier body 1110 through the flow uniformizing pieces 1141 on both sides of the front flow uniformizing plate 1114 and is deposited on the cutting surface of the substrate in the reaction fluid channel 1310. The barrier fluid 1420 enters through the flow uniformizing pieces 1141 in the middle of the front flow uniformizing plate 1114, passes through the barrier fluid channel 1320, and flows in the direction of the reaction fluid channel 1310, forming a non-reaction fluid atmosphere around the reaction fluid channels 1310 on both sides. The diffusion of the reaction fluid 1410 in the direction of the middle barrier fluid channel 1320 is blocked, reducing the degree of reaction fluid 1410.

[0143] As understood by those skilled in the art, in the embodiments shown in FIG. 15 and FIG. 17, the capacity can be increased by increasing the number of substrate cassettes in each column and increasing the height of each substrate cassette, so as to coat the cutting surfaces of more substrates at the same time.

[0144] The coating carrier provided by the present application achieves the passivation requirement of coating only the cutting surfaces of the substrates and not coating other surfaces by stacking the substrates in the substrate cassettes and forming a closed space by the substrate cassettes. In addition, the reaction fluid channels formed by the substrate cassettes on the cutting surface side of the substrates can improve the deposition efficiency of the passivation film layer, and by blocking the fluid channels, the reaction fluid can also reduce the degree of winding.

[0145] As understood by those skilled in the art, the coating carrier in the present embodiment is used in cooperation with the spray plate in the above embodiments. The spray groups on the spray plate are one-to-one corresponding to the fluid channels in the coating carrier. The open side of the substrate cassettes in the coating carrier corresponds to the reaction fluid channels, so the corresponding spray groups are used to introduce the reaction fluid, and the back plate side of the substrate cassettes corresponds to the blocking fluid channels, so the corresponding spray groups are used to introduce the blocking fluid.

[0146] The foregoing description of the present disclosure has been provided for the purposes of illustrating and describing it and its practical application. Various modifications to the present disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the present disclosure is not intended to be limited to the examples described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A spray panel, comprising: A panel with a spray surface; Two first spray groups are spaced apart on the spray surface along a first direction, and each first spray group includes a plurality of first spray nozzles; At least one second spray group is provided between two first spray groups, the second spray group includes a plurality of second spray nozzles, and the second spray group is at least a predetermined distance away from the adjacent first spray group; The plate contains two first flow channel groups and at least one second flow channel group. The two first flow channel groups are connected to the first spray ports of the two first spray groups, and the at least one second flow channel group is connected to the second spray port of the at least one second spray group.

2. The spray plate as described in claim 1, characterized in that, When the spray plate is installed on the processing cavity, the preset distance is the dimension of the substrate compartment in the processing cavity in the first direction.

3. The spray plate as described in claim 1, characterized in that, The plate does not have spray nozzles within the preset distance.

4. The spray plate as described in claim 2, characterized in that, The width of the first spray nozzle of the first spray group in the first direction is smaller than the width of the side flow channel in the first direction in the processing cavity, and the side flow channel is located between the substrate compartment and the side wall of the processing cavity.

5. The spray plate as described in claim 2, characterized in that, The distribution height of the first spray nozzle of the first spray group and / or the second spray nozzle of the second spray group in the second direction is less than the height of the substrate compartment, and the first direction intersects the second direction.

6. The spray plate as described in claim 1, characterized in that, The second flow channel group is independent of the first flow channel group.

7. The spray plate as described in claim 1, characterized in that, Also includes: At least one first inlet is connected to the two first flow channel groups, each first inlet being used to introduce a reactive fluid; as well as At least one second inlet connected to the second flow channel group is used to introduce the blocking fluid.

8. The spray plate as described in claim 7, characterized in that, It includes two first inlets, and the two first flow channel groups are independent of each other.

9. The spray plate as described in claim 7, characterized in that, It includes a second flow channel group, wherein the second main channel of the second flow channel group is located at the middle position of the plate along the first direction.

10. The spray plate as described in claim 1, characterized in that, Also includes: At least one first inlet connected to the first flow channel group is used to introduce the blocking fluid; At least one second inlet connected to at least one of the second flow channels, each of the second inlets being used to introduce a reactive fluid.

11. The spray plate as described in claim 10, characterized in that, It includes multiple second spray groups and corresponding multiple second flow channel groups, wherein adjacent second spray groups are at least separated by the preset distance.

12. The spray plate as described in claim 11, characterized in that, It includes multiple second inlets connected to multiple second flow channel groups, and the multiple second flow channel groups are independent of each other.

13. The spray plate according to any one of claims 7-9, characterized in that, The first flow channel group includes a first main pipe and multiple first branch pipes. The first main pipe extends along a second direction, and the first branch pipes intersect with the first main pipe and extend along the first direction. The first spray nozzle includes a first reactive fluid spray nozzle and a second reactive fluid spray nozzle. The first reactive fluid spray nozzle is disposed on the first branch pipe of one of the first flow channel groups, and the second reactive fluid spray nozzle is disposed on the first branch pipe of another first flow channel group; or The first flow channel group includes two first main pipes and two groups of first branch pipes. The first main pipes extend along the second direction. Each group of first branch pipes includes multiple first branch pipes that intersect with one of the first main pipes and extend along the first direction. The first spray nozzle includes a first reactive fluid spray nozzle and a second reactive fluid spray nozzle respectively disposed on the two groups of first branch pipes. The first direction intersects with the second direction.

14. The spray plate as described in claim 13, characterized in that, The second flow channel group includes a second main pipe and multiple second branch pipes. The second main pipe extends along the second direction, and the second branch pipes intersect with the second main pipe and extend along the first direction. The second spray nozzle is disposed on the second branch pipe.

15. The spray plate according to any one of claims 10-12, characterized in that, The first flow channel group includes a second main pipe and multiple second branch pipes. The second main pipe extends along a second direction, and the second branch pipes intersect with the second main pipe and extend along the first direction. The first spray nozzle is disposed on the second branch pipe, and the first direction intersects with the second direction.

16. The spray plate as described in claim 15, characterized in that, The second flow channel group includes a first main pipe and multiple first branch pipes. The first main pipe extends along the second direction, and the first branch pipes intersect with the first main pipe and extend along the first direction. The second spray nozzle is disposed on the first branch pipe; or The spray plate includes two second inlets and two second flow channel groups. The two second inlets are used to introduce a first reaction fluid and a second reaction fluid into the corresponding two second flow channel groups, respectively. The second spray port includes a first reaction fluid spray port and a second reaction fluid spray port, which are respectively connected to the two second flow channel groups.

17. The spray plate as described in claim 16, characterized in that, When the spray plate includes two second inlets and two second flow channel groups, the first main pipe of the second flow channel group is located between at least one second spray group and the first spray group.

18. A processing apparatus, comprising: Processing the cavity; The spray plate as described in any one of claims 1-17 is disposed on the processing cavity, with the spray surface of the spray plate facing the inner side of the processing cavity.

19. The processing apparatus as claimed in claim 18, characterized in that, The processing chamber has two rows of substrate compartments placed along the fluid transport direction, with a middle flow channel formed between the two rows of substrate compartments and side flow channels formed between the two rows of substrate compartments and the side wall of the processing chamber, wherein each first spray group of the spray plate corresponds to one side flow channel, and the second spray group of the spray plate corresponds to the middle flow channel.

20. The processing apparatus as claimed in claim 19, characterized in that, The processing apparatus further includes a coating carrier, the carrier comprising: The vehicle body includes a base plate and side plates, the side plates being located on both sides of the base plate; and The two rows of substrate compartments are arranged in the width direction within the carrier body. The substrate compartments are used to stack substrates, and each row of substrate compartments extending in the length direction has an opening to expose the substrate cutting surface.

21. The processing apparatus as claimed in claim 20, characterized in that, The substrate compartments have openings on their respective sides facing the body side plates, and a gap is left between the substrate compartments and the adjacent body side plates to form a reaction fluid channel, which is the side flow channel.

22. The processing apparatus as claimed in claim 21, characterized in that, A backplate is provided on the side of the substrate compartment opposite to the opening, and a gap is left between the two rows of substrate compartments to form a fluid blocking channel for introducing inert fluid. The fluid blocking channel is the intermediate flow channel.

23. The processing apparatus as claimed in claim 20, characterized in that, The front end of the vehicle body along the length direction is provided with a front flow equalizer plate, and the front flow equalizer plate has a plurality of parallel flow equalizer plates at the position corresponding to the fluid channel. The fluid channel is a reaction fluid channel and / or a blocking fluid channel.

24. The processing apparatus as claimed in claim 20, characterized in that, The rear end of the carrier body along the length direction is provided with a rear flow equalizer, and the rear flow equalizer has a number of parallel flow equalizers arranged at the position corresponding to the reaction fluid channel.

25. The processing apparatus as claimed in claim 20, characterized in that, The substrate compartment is provided with a base plate, and a support plate is provided on the base plate. The support plate includes a base and a support surface protruding from the base, and the substrates are stacked on the support surface.

26. The processing apparatus as claimed in claim 25, characterized in that, The substrate compartment is equipped with a pressure plate for pressing down on the stacked substrates.

27. The processing apparatus as claimed in claim 20, characterized in that, The carrier body is provided with multiple connecting rods and multiple partitions along the length direction. The two ends of the connecting rods are fixed to the side plates of the body. The partitions are used to separate two adjacent sets of substrate compartments. The connecting rods are used to fix the partitions.

28. The processing apparatus as claimed in claim 27, characterized in that, In the width direction, the number of partitions is the same as the number of substrate compartments, and gaps are left between adjacent partitions to form fluid channels, which are either reaction fluid channels or blocking fluid channels.

29. The vehicle as claimed in claim 28, characterized in that, A gap is left between the body side plate and the adjacent partition plate to form the fluid channel.

30. The vehicle as claimed in claim 20, characterized in that, It also includes a body cover that fits over the vehicle body.

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