Display substrate and display device

Abstract

A display substrate and a display device. The display substrate comprises: a base substrate (01) and a plurality of circles of isolation columns (100) and an inorganic layer (200) which are located on the base substrate (01). The plurality of circles of isolation columns (100) are located in a non-hole region (A22) on the base substrate (01) and surround a hole region (A21). Each circle of isolation column (100) at least comprises a first isolation layer (110) and a second isolation layer (120) that are stacked, the second isolation layer (120) is located on the side of the first isolation layer (110) distant from the base substrate (01), the edge of the second isolation layer (120) protrudes relative to the edge of the first isolation layer (110), and the first isolation layer (110) and the second isolation layer (120) are both made of conductive materials; and the inorganic layer (200) wraps the side surfaces of the first isolation layer (110) and the second isolation layer (120) of at least one circle of isolation column (100). This configuration can not only prevent electrical connection between the isolation layer in the isolation column configured to isolate a light-emitting functional layer and any film layer in the light-emitting functional layer, but also eliminate the need for an etching step that would otherwise be required to remove the residual inorganic layer in the isolation column.

Description

Display substrate and display device

[0001] This application claims priority to Chinese Patent Application No. 202411039658.3, filed on July 31, 2024, the disclosure of which is incorporated herein in its entirety as part of the present application. TECHNICAL FIELD

[0002] Embodiments of the present disclosure relate to a display substrate and a display device. BACKGROUND

[0003] Organic light emitting diode (OLED) display products have a wide range of applications due to their rich colors, fast response time, foldability, and other advantages. Organic light emitting diode display devices include tandem devices, which improve the lifetime and brightness of light emitting devices and reduce power consumption by providing stacked light emitting layers in the tandem devices to meet user demands for display device service life, power consumption, and good display quality. SUMMARY

[0004] Embodiments of the present disclosure provide a display substrate and a display device.

[0005] Embodiments of the present disclosure provide a display substrate, comprising: a substrate and a plurality of rings of isolation pillars and an inorganic layer on the substrate. The substrate includes a first region and a second region, the first region surrounds at least part of the second region, the first region includes a display region, and the second region includes an aperture region and a non-aperture region surrounding the aperture region; the plurality of rings of isolation pillars are located on the non-aperture region of the substrate and surround the aperture region. The isolation pillars at least include a first isolation layer and a second isolation layer stacked, the second isolation layer is located on the side of the first isolation layer away from the substrate, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; the inorganic layer wraps the side surfaces of the first isolation layer and the second isolation layer of at least one ring of isolation pillars.

[0006] For example, according to embodiments of the present disclosure, the display region includes a plurality of sub-pixels, each sub-pixel includes a first electrode, a light emitting functional layer, and a second electrode stacked, the first electrode is located between the light emitting functional layer and the substrate, and the light emitting functional layer includes a plurality of film layers; the display substrate includes a defined structure located between adjacent sub-pixels and configured to block at least one layer of the light emitting functional layer; the defined structure includes an inorganic defined layer in which the inorganic layer is located between adjacent sub-pixels.

[0007] For example, according to an embodiment of the present disclosure, the display substrate further includes an organic layer between the first electrode and the substrate.

[0008] For example, according to an embodiment of the present disclosure, the display substrate further includes a pixel defining pattern on a side of the first electrode away from the substrate, wherein the pixel defining pattern includes a plurality of first openings configured to expose the first electrode of the plurality of sub-pixels, and a pixel defining portion surrounding the plurality of first openings; and the inorganic defining layer is in contact with at least a side surface of the pixel defining portion away from the substrate.

[0009] For example, according to an embodiment of the present disclosure, the display substrate further includes a pixel defining pattern on a side of the first electrode away from the substrate, wherein the pixel defining pattern includes a plurality of first openings, a plurality of second openings configured to expose at least part of the defining structure, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings.

[0010] For example, according to an embodiment of the present disclosure, the defining structure further includes at least one first protrusion in the organic layer in contact with a surface of the inorganic defining layer, a side surface of the first protrusion and a first surface of a portion of the organic layer other than the first protrusion away from the substrate form an angle of 80-110 degrees, and the first surface is substantially parallel to the substrate.

[0011] For example, according to an embodiment of the present disclosure, the defining structure further includes at least one second protrusion in the pixel defining portion in contact with a surface of the inorganic defining layer, a side surface of the second protrusion and a second surface of a portion of the pixel defining portion other than the second protrusion away from the substrate form an angle of 80-110 degrees, and the second surface is substantially parallel to the substrate.

[0012] For example, according to an embodiment of the present disclosure, the inorganic layer covers an edge of the first electrode in at least part of the sub-pixel.

[0013] For example, according to an embodiment of the present disclosure, the first electrode and the inorganic layer do not overlap in a direction perpendicular to the substrate.

[0014] For example, according to an embodiment of the present disclosure, the inorganic layer includes an inorganic covering layer covering a side edge of the first opening.

[0015] For example, according to an embodiment of the present disclosure, the display substrate further includes a spacer located on a side of the inorganic layer away from the substrate, wherein a projection of the spacer on the substrate is completely located within a projection of the inorganic layer on the substrate.

[0016] For example, according to an embodiment of the present disclosure, the display substrate further includes a spacer located on a side of the first electrode away from the substrate, wherein the inorganic layer is located at least on a surface of the spacer away from the substrate.

[0017] For example, according to an embodiment of the present disclosure, each of the sub-pixels further includes a pixel circuit including a light-emitting control transistor, the first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and the inorganic layer does not overlap the via in a direction perpendicular to the substrate.

[0018] For example, according to an embodiment of the present disclosure, the first electrode includes a main body portion and a connecting portion connected to each other, the main body portion overlaps a light-emitting region of the sub-pixel, the connecting portion is electrically connected to the light-emitting control transistor through the via, and the inorganic layer covers edges of the main body portion and the connecting portion.

[0019] For example, according to an embodiment of the present disclosure, the pixel defining portion includes a first covering portion covering a surface of the inorganic defining layer away from the substrate, and an edge of the inorganic defining layer protrudes relative to an edge of the first covering portion.

[0020] For example, according to an embodiment of the present disclosure, a size by which the edge of the inorganic defining layer protrudes relative to the edge of the first covering portion is a first protruding size, a size by which the edge of the inorganic defining layer protrudes relative to an edge of the first protrusion is a second protruding size, and the first protruding size is not less than the second protruding size.

[0021] For example, according to an embodiment of the present disclosure, a portion of the inorganic layer covering an edge of the first electrode is a second covering portion, and a projection of the second covering portion on the substrate is completely located within a projection of the pixel defining portion on the substrate.

[0022] For example, according to an embodiment of the present disclosure, all edges of the first protrusion are recessed relative to all edges of the inorganic defining layer.

[0023] For example, according to an embodiment of the present disclosure, a thickness of the pixel defining portion is 0.2-0.7 microns.

[0024] For example, according to an embodiment of the present disclosure, a height of the first protrusion is greater than a thickness of the first electrode.

[0025] Another embodiment of the present disclosure provides a display substrate, comprising: a substrate substrate and a plurality of sub-pixels, a pixel defining pattern, an inorganic layer and an organic layer located on the substrate substrate. Each sub-pixel comprises a first electrode, a light-emitting functional layer and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer comprises a plurality of film layers; the pixel defining pattern is located on the side of the first electrode away from the substrate substrate, and comprises a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the organic layer is located between the inorganic layer and the substrate substrate. The display substrate comprises a limiting structure, the second openings are configured to expose at least part of the limiting structure, the limiting structure comprises an inorganic limiting layer between adjacent sub-pixels and at least one protrusion in the organic layer in contact with the surface of the inorganic limiting layer, and the limiting structure is configured to separate at least one layer of the light-emitting functional layer; and the inorganic layer covers the edges of the first electrodes in at least part of the sub-pixels.

[0026] For example, according to an embodiment of the present disclosure, each sub-pixel further comprises a pixel circuit comprising a light-emitting control transistor, the first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and in a direction perpendicular to the substrate substrate, the inorganic layer does not overlap with the via.

[0027] Another embodiment of the present disclosure provides a display substrate, comprising: a substrate substrate and a plurality of sub-pixels, a pixel defining pattern, an inorganic layer and an organic layer located on the substrate substrate. Each sub-pixel comprises a first electrode, a light-emitting functional layer and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer comprises a plurality of film layers; the pixel defining pattern is located on the side of the first electrode away from the substrate substrate, and comprises a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the organic layer is located between the inorganic layer and the substrate substrate. The display substrate comprises a limiting structure, the second openings are configured to expose at least part of the limiting structure, the limiting structure comprises an inorganic limiting layer between adjacent sub-pixels and at least one protrusion in the organic layer in contact with the surface of the inorganic limiting layer, and the limiting structure is configured to separate at least one layer of the light-emitting functional layer; and in a direction perpendicular to the substrate substrate, the inorganic layer does not overlap with the first electrode.

[0028] Another embodiment of the present disclosure provides a display substrate, comprising: a substrate substrate and a plurality of sub-pixels, a pixel defining pattern and an inorganic layer located on the substrate substrate. Each sub-pixel comprises a first electrode, a light-emitting functional layer and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer comprises a plurality of film layers; the pixel defining pattern is located on the side of the first electrode away from the substrate substrate, and comprises a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, the plurality of first openings are configured to expose the first electrodes of the plurality of sub-pixels; the inorganic layer is located on the side of the pixel defining portion away from the substrate substrate. The display substrate comprises a limiting structure located between adjacent sub-pixels and configured to separate at least one layer of the light-emitting functional layer; the limiting structure comprises an inorganic limiting layer of the inorganic layer located between adjacent sub-pixels, and the inorganic limiting layer at least contacts the side surface of the pixel defining portion away from the substrate substrate.

[0029] For example, according to an embodiment of the present disclosure, the limiting structure further comprises at least one protrusion in the pixel defining portion in contact with the surface of the inorganic limiting layer, the included angle between the side surface of the protrusion and the surface of the pixel defining portion other than the protrusion away from the substrate substrate is 80-110 degrees, and the surface is parallel to the substrate substrate.

[0030] For example, according to an embodiment of the present disclosure, in a direction perpendicular to the substrate substrate, the first electrode does not overlap with the inorganic layer.

[0031] For example, according to an embodiment of the present disclosure, the inorganic layer comprises an inorganic covering layer covering the side of the first opening.

[0032] For example, according to an embodiment of the present disclosure, the display substrate further comprises: a spacer located on the side of the first electrode away from the substrate substrate. The inorganic layer is at least located on the surface of the spacer away from the substrate substrate.

[0033] Another embodiment of the present disclosure provides a display device comprising the display substrate provided by any of the above embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0034] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings described below only relate to some embodiments of the present disclosure, but not limit the present disclosure.

[0035] FIG. 1 is a schematic view of a partial cross-sectional structure of a display substrate.

[0036] FIG. 2 is a schematic plan view of a display substrate provided by an embodiment of the present disclosure.

[0037] FIG. 3 is a schematic diagram of a partial cross-sectional structure along the line BB' in FIG. 2.

[0038] FIG. 4 is a schematic diagram of a partial cross-sectional structure in a first region.

[0039] FIG. 5 is a schematic diagram of a partial region of a display region in the display substrate shown in FIG. 2.

[0040] FIG. 6 is an enlarged view of the partial region shown in FIG. 5.

[0041] FIG. 7 is a schematic diagram of a positional relationship between a first electrode and an inorganic layer according to another example provided by embodiments of the present disclosure.

[0042] FIG. 8 is a schematic diagram of a partial cross-sectional structure along the line DD' in FIG. 7.

[0043] FIG. 9 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0044] FIG. 10 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0045] FIG. 11 is a schematic diagram of a partial planar structure of the display substrate shown in FIG. 10.

[0046] FIG. 12 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0047] FIG. 13 is a schematic diagram of a partial planar structure of the display substrate shown in FIG. 12.

[0048] FIG. 14 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0049] FIG. 15 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0050] FIG. 16 is a schematic diagram of a partial planar structure corresponding to the display substrate shown in FIG. 15.

[0051] FIG. 17 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0052] FIG. 18 is a schematic diagram of a partial planar structure corresponding to the display substrate shown in FIG. 17.

[0053] FIG. 19 is a schematic diagram of a partial cross-sectional structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0054] FIG. 20 is a schematic block diagram of a display device according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0055] The technical solutions of the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of, rather than all of, the embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by a person of ordinary skill in the art without any inventive effort fall within the protection scope of the present disclosure.

[0056] Unless otherwise defined, technical terms or scientific terms used in the present disclosure shall have the ordinary meaning as understood by a person of ordinary skill in the art to which the present disclosure belongs. The terms “first”, “second” and similar terms used in the present disclosure do not denote any order, quantity or importance, but are used to distinguish different components. The terms “comprise”, “contain” and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, and do not exclude other elements or objects.

[0057] The terms “parallel”, “perpendicular” and “same” and the like used in at least one embodiment of the present disclosure include the strict sense of “parallel”, “perpendicular”, “same” and the like, and “approximately parallel”, “approximately perpendicular”, “approximately same” and the like with a certain error, which, considering the measurement and the error related to the measurement of a specific value (for example, the limitation of a measurement system), represents an acceptable deviation range for a specific value determined by a person of ordinary skill in the art. For example, “approximately” can mean within one or more standard deviations, or within 10% or 5% of the value. When the quantity of a component is not specifically indicated in the following embodiments of the present disclosure, it means that the component can be one or more, or can be understood as at least one. “At least one” means one or more, and “a plurality of” means at least two. The “same layer arrangement” referred to in the disclosure means that two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and their materials can be the same or different. The “integrally arranged structure” in the present disclosure means that two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and are connected to each other, and their materials can be the same or different.

[0058] The light-emitting functional layer of the sub-pixel can include a plurality of light-emitting layers arranged in a stack, such as a tandem device. The tandem device has the characteristics of low power consumption and long service life. However, at least two layers of the plurality of light-emitting layers in the tandem device are provided with a charge generation layer (CGL). The charge generation layer has a relatively large conductivity. For example, when the charge generation layer is a full-area film layer, the charge generation layers of different color sub-pixels are continuous film layers, and there is a phenomenon of lateral migration of charges, which causes the display substrate to deviate in low gray scale monochromatic chroma. For example, the phenomenon of crosstalk between adjacent sub-pixels of different colors, such as a red sub-pixel and a blue sub-pixel, or a red sub-pixel and a green sub-pixel, or a blue sub-pixel and a green sub-pixel, can easily occur, which causes the display substrate to deviate in color. For example, the charge generation layer can easily cause crosstalk between sub-pixels of different colors at low brightness, which causes the display substrate to deviate in color at low gray scale.

[0059] The barrier structure provided between adjacent sub-pixels of different colors is beneficial to reduce crosstalk between the sub-pixels. For example, the barrier structure can be a barrier structure formed of inorganic materials. In the peripheral area outside the display area, an isolation column formed by the same patterning process as the barrier structure can be provided to solve some reliability problems that often occur in the peripheral non-display area of the display substrate under reliability conditions.

[0060] FIG. 1 is a schematic view of a partial cross-sectional structure of a display substrate. In the research, the inventors of the present application found that the display substrate with the barrier structure can have some disadvantages as described below.

[0061] For example, as shown in FIG. 1, the inorganic structure 030 in the barrier structure is formed between the planar layer 031 and the anode 022 of the sub-pixel. The anode 022 needs to be electrically connected to the pixel circuit 036 through the inorganic structure 030 and the via hole 035 in the planar layer 031. The via hole 035 is a sleeve hole formed by the inorganic structure via hole and the planar layer via hole. The uniformity of the via hole 035 is poor, and the via hole boundary of the anode 022 in the barrier structure is thin and easy to break. In addition, the inorganic structure 030 in the barrier structure is etched by a dry etching process. The etching gas causes the surface of the metal material, such as titanium, in the pixel circuit 036 to be oxidized, thereby causing the contact impedance of the anode 022 to the surface of the metal in the pixel circuit 036 to be poor in uniformity and large in impedance. This can cause serious display mura at low gray scale and affect the image quality.

[0062] For example, as shown in FIG. 1, the inorganic structure 030 in the partition structure is prone to leave residues 037 on the sidewall of the metal isolation column 034 in the non-display area during the preparation process, which causes the metal isolation column 034 to fail to effectively partition the organic material in the non-display area, such as the material in the light-emitting functional layer. To this end, an additional mask process, such as a hole mask process, is required to remove the residues 037, and then the metal isolation column 034 is side-etched. The above-mentioned additional mask process increases the process complexity, resulting in an increase in mask process cost and a decrease in process capacity.

[0063] For example, as shown in FIG. 1, the inorganic structure 030 in the partition structure is formed before the anode 022 of the sub-pixel, and a recess is formed in the planar layer 031 during the process of patterning the inorganic structure 030. The recess is prone to have water residues. During the subsequent high-temperature process, the residual water is likely to adhere to the metal material with a large area in the film layer where the anode 022 is located, which can easily cause the metal material to bulge and other problems, thereby causing peeling problems.

[0064] For example, as shown in FIG. 1, one side edge of the inorganic structure 030 in the partition structure between two adjacent sub-pixels is covered by the pixel limiting part 011 of the pixel limiting pattern, and the other side edge is exposed by the opening 012 of the pixel limiting pattern. The part of the inorganic structure 030 exposed by the opening is used to partition the light-emitting functional layer 023. The charge generation layer in the light-emitting functional layer 023 is electrically connected to the cathode 021 formed subsequently on the partition surface of the partition structure exposed by the opening 012, which is prone to cause short circuit problems.

[0065] For example, as shown in FIG. 1, the partition structure is formed before the anode 022. The process of forming the partition structure etches the surface of the planar layer 031, which reduces the flatness and further affects the flatness of the anode 022.

[0066] For example, as shown in FIG. 1, the display substrate further includes a substrate 038 and an intermediate film layer 033 between the metal isolation column 034 and the substrate 038. The film layer 032 between the planar layer 031 and the substrate 038 includes the metal film layer where the metal isolation column 034 is located, in addition to the intermediate film layer 033.

[0067] The display substrate and the display device are provided. The display substrate includes a substrate, a plurality of isolation columns and an inorganic layer on the substrate. The substrate includes a first region and a second region, the first region surrounds at least part of the second region, the first region includes a display region, and the second region includes a hole region and a non-hole region surrounding the hole region; the plurality of isolation columns are located on the non-hole region of the substrate and surround the hole region. The isolation column includes at least a first isolation layer and a second isolation layer arranged in a stack, the second isolation layer is located on a side of the first isolation layer away from the substrate, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; and the inorganic layer wraps the side of the first isolation layer and the second isolation layer of at least one isolation column.

[0068] The display substrate provided by the present disclosure can prevent the electrical connection between the isolation layer in the isolation column configured to separate the light-emitting functional layer and the film layer in the light-emitting functional layer, and can save the etching step in the case of residual inorganic layer in the isolation column, by wrapping the side of the isolation layer of at least one isolation column in the non-hole region with the inorganic layer.

[0069] Another display substrate provided by the present disclosure includes a substrate, a plurality of sub-pixels, a pixel definition pattern, an inorganic layer and an organic layer on the substrate. Each sub-pixel includes a first electrode, a light-emitting functional layer and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel definition pattern is located on a side of the first electrode away from the substrate, and the pixel definition pattern includes a plurality of first openings, a plurality of second openings and a pixel definition part surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrode of the plurality of sub-pixels; and the organic layer is located between the inorganic layer and the substrate. The display substrate includes a definition structure, the second opening is configured to expose the definition structure, the definition structure includes an inorganic definition layer in the inorganic layer between adjacent sub-pixels and at least one protrusion in the organic layer in contact with the surface of the inorganic definition layer, the definition structure is configured to separate at least one layer of the light-emitting functional layer; and the inorganic layer covers the edge of the first electrode in at least part of the sub-pixels.

[0070] In the display substrate provided by the present disclosure, by setting the part of the inorganic layer arranged in the same layer as the inorganic definition layer in the definition structure to cover the edge of the first electrode of the sub-pixel, it is beneficial to prevent damage to the edge of the first electrode in the process of etching to form the inorganic definition layer.

[0071] Another display substrate provided by the present disclosure includes a substrate substrate, a plurality of sub-pixels located on the substrate substrate, a pixel definition pattern, an inorganic layer, and an organic layer. Each sub-pixel includes a first electrode, a light-emitting functional layer, and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel definition pattern is located on a side of the first electrode away from the substrate substrate, and the pixel definition pattern includes a plurality of first openings, a plurality of second openings, and a pixel definition portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings are configured to expose the first electrode of the plurality of sub-pixels; the organic layer is located between the inorganic layer and the substrate substrate. The display substrate includes a definition structure, the second opening is configured to expose the definition structure, the definition structure includes an inorganic definition layer between adjacent sub-pixels of the inorganic layer and at least one protrusion of the organic layer in contact with a surface of the inorganic definition layer, and the definition structure is configured to block at least one layer of the light-emitting functional layer; in a direction perpendicular to the substrate substrate, the inorganic layer does not overlap the first electrode.

[0072] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel definition pattern is formed, so that the first electrode can be arranged without overlapping the inorganic layer, to avoid the influence of the inorganic layer on the opening of the sub-pixel and the first electrode, and to facilitate improving the display effect of the display substrate.

[0073] Another display substrate provided by the embodiment of the present disclosure includes a substrate substrate, a plurality of sub-pixels located on the substrate substrate, a pixel definition pattern, and an inorganic layer. Each sub-pixel includes a first electrode, a light-emitting functional layer, and a second electrode arranged in a stack, the first electrode is located between the light-emitting functional layer and the substrate substrate, and the light-emitting functional layer includes a plurality of film layers; the pixel definition pattern is located on a side of the first electrode away from the substrate substrate, and the pixel definition pattern includes a plurality of first openings and a pixel definition portion surrounding the plurality of first openings, the plurality of first openings are configured to expose the first electrode of the plurality of sub-pixels; the inorganic layer is located on a side of the pixel definition portion away from the substrate substrate. The display substrate includes a definition structure located between adjacent sub-pixels and configured to block at least one layer of the light-emitting functional layer; the definition structure includes an inorganic definition layer between adjacent sub-pixels of the inorganic layer, and the inorganic definition layer at least contacts a surface of the pixel definition portion away from the substrate substrate.

[0074] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel definition pattern is formed, so that the inorganic definition layer can be formed on the pixel definition portion, to prevent the inorganic definition layer from affecting the first electrode and the organic layer between the first electrode and the substrate substrate, and to facilitate improving the display effect of the display substrate.

[0075] The display substrate and the display device provided by the embodiment of the present disclosure are described below with reference to the accompanying drawings.

[0076] FIG. 2 is a schematic plan view of a display substrate according to embodiments of the present disclosure. FIG. 3 is a schematic view of a partial cross-sectional structure along the line BB' in FIG. 2.

[0077] As shown in FIGS. 2 and 3, the display substrate includes a substrate 01 and a plurality of isolation columns 100 and an inorganic layer 200 on the substrate 01. The substrate 01 includes a first area A1 and a second area A2, the first area A1 surrounds at least part of the second area A2, the first area A1 includes a display area, and the second area A2 includes a hole area A21 and a non-hole area A22 surrounding the hole area A21. For example, the second area A2 includes a non-display area. For example, the display area is an area for displaying an image, and the non-display area is an area that does not display an image. For example, the hole area A21 can be a light-transmissive area for disposing a light-sensing sensor such as an infrared sensor, an ultrasonic sensor, a LIDAR (Light Detection and Ranging) sensor, a radar sensor, a camera, a distance sensor, but is not limited thereto; and the non-hole area A22 can be a non-light-transmissive area for disposing a blocking portion or the like. For example, the second area A2 can also be an AA hole area. FIG. 2 schematically shows that the second area A2 includes one hole area A21, but is not limited thereto and can include two or more hole areas A21.

[0078] FIG. 4 is a schematic view of a partial cross-sectional structure in the first area.

[0079] As shown in FIGS. 2 to 4, the plurality of isolation columns 100 are on the non-hole area A22 of the substrate 01 and surround the hole area A21. FIGS. 2 and 3 schematically show that the number of the isolation columns 100 is six, but is not limited thereto and the number of the isolation columns 100 can be set according to product requirements, such as nine, eight, or seven, or less than six.

[0080] In some examples, as shown in FIG. 4, the display area includes a plurality of sub-pixels 300, each of which includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 stacked, the first electrode 310 is between the light-emitting functional layer 330 and the substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers. For example, the non-hole area A22 does not dispose a sub-pixel 300 for display, and the isolation column 100 can be a structure for isolating at least one film layer of the light-emitting functional layer 330 in the non-hole area A22 to prevent water and oxygen from invading the light-emitting functional layer 330 in the display area through the film layer of the non-hole area A22. For example, the isolation column 100 can be a structure for isolating a film layer in which the second electrode 320 is located in the non-hole area A22 to avoid affecting the electrical performance of the second electrode 320 in the display area.

[0081] As shown in FIG. 3, the isolation column 100 at least includes a first isolation layer 110 and a second isolation layer 120 arranged in a stack, the second isolation layer 120 is located on a side of the first isolation layer 110 away from the substrate 01, an edge of the second isolation layer 120 protrudes relative to an edge of the first isolation layer 110, and the materials of the first isolation layer 110 and the second isolation layer 120 are both conductive materials. For example, the edge of the second isolation layer 120 protrudes relative to the edge of the first isolation layer 110 to isolate the part of the light-emitting functional layer 330 located in the non-hole region A22.

[0082] As shown in FIG. 3, the inorganic layer 200 wraps the side surfaces of the first isolation layer 110 and the second isolation layer 120 of at least one ring of the isolation column 100.

[0083] The display substrate provided by the present disclosure can achieve the isolation of the film layers such as the light-emitting functional layer, prevent the electrically connected film layers such as the light-emitting functional layer from being isolated from the isolation column, and prevent the problems caused by incomplete power-off and water and oxygen invasion, such as display black spots in the reliability process.

[0084] In addition, the metal isolation column 034 in FIG. 1 is further etched, such as side etching, after the removal of the residue 037 to form a protruding part for isolating the film layers such as the light-emitting functional layer; compared with the case shown in FIG. 1, the inorganic layer is easily left on the side wall of the isolation column, and a step of mask etching process (such as Hole mask process) needs to be added, the display substrate provided by the present disclosure can save the Hole mask process and is beneficial to reduce the production cost of the display substrate after the edge of the isolation column forms a protruding part.

[0085] For example, as shown in FIG. 3, the inorganic layer 200 wraps the side surfaces of the first isolation layer 110 and the second isolation layer 120 of each ring of the isolation column 100. For example, the isolation column 100 further includes a third isolation layer 130 located between the first isolation layer 110 and the substrate 01, and the material of the third isolation layer 130 includes a conductive material. For example, the materials of the first isolation layer 110 and the third isolation layer 130 are the same, and the material of the first isolation layer 110 is different from the material of the second isolation layer 120. For example, the edges of the first isolation layer 110 and the third isolation layer 130 both protrude relative to the edge of the second isolation layer 120. For example, the isolation column 100 includes three metal layers, such as a titanium / aluminum / titanium structure.

[0086] For example, as shown in FIG. 3, the area between the adjacent isolation columns 100 can not be provided with the inorganic layer 200, or can be covered by the inorganic layer 200, such as the inorganic layer 200 covering the isolation column 100 and the interval between the adjacent isolation columns 100.

[0087] For example, as shown in FIG. 3, the display substrate further comprises a buffer layer and a shielding layer 02, a gate insulating layer 03, and an interlayer insulating layer 04 between the substrate 01 and the isolation column 100. For example, a first metal pad layer 051 is arranged between the gate insulating layer 03 and the isolation column 100, and / or a second metal pad layer 052 is arranged between the buffer layer and the shielding layer 02 and the isolation column 100. The first metal pad layer 051 and / or the second metal pad layer 02 serve to pad the isolation column 100, so as to further improve the effect of the isolation column 100 on the film layer. For example, the first metal pad layer 051 and the second metal pad layer 052 both overlap the isolation column 100 in a direction perpendicular to the substrate 01. For example, the first metal pad layer 051 and the second metal pad layer 052 are both annular. For example, at least one of the first metal pad layer 051 and the second metal pad layer 052 can be a film layer in which the gate lines in the display area are located. FIG. 3 schematically shows that the first metal pad layer and the second metal pad layer can be arranged between the isolation column 100 and the substrate 01 at the same time, but are not limited thereto. One of the first metal pad layer and the second metal pad layer can be arranged between the isolation column 100 and the substrate 01.

[0088] For example, as shown in FIG. 4, the light-emitting functional layer 330 comprises a charge generation layer. For example, the light-emitting functional layer 330 can be a light-emitting functional layer 330 comprised by an organic light-emitting element. For example, each sub-pixel 300 in the display area comprises a light-emitting element.

[0089] For example, as shown in FIG. 4, the light-emitting functional layer 330 can comprise a first light-emitting layer (EML), a charge generation layer (CGL), and a second light-emitting layer (EML) arranged in a stack, and the charge generation layer is located between the first light-emitting layer and the second light-emitting layer. The charge generation layer has strong conductivity, which can make the light-emitting functional layer 330 have the advantages of long service life, low power consumption, and high brightness. For example, compared with a light-emitting functional layer 330 without a charge generation layer, the sub-pixel 300 can increase the light-emitting brightness by nearly one time by arranging the charge generation layer in the light-emitting functional layer 330.

[0090] For example, the same sub-pixel 300 can be a tandem structure, such as a Tandem OLED.

[0091] For example, the charge generation layer can comprise an N-type charge generation layer and a P-type charge generation layer.

[0092] For example, in each sub-pixel 300, the light-emitting functional layer 330 can further comprise a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0093] For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, and the charge generation layer are common film layers of the plurality of sub-pixels 300, which can be referred to as common layers. For example, the common layers and the second electrode 320 can be film layers formed using an open mask.

[0094] For example, the second light-emitting layer can be located between the first light-emitting layer and the second electrode 320, and the hole injection layer can be located between the first electrode 310 and the first light-emitting layer. For example, an electron transport layer can be further provided between the charge generation layer and the first light-emitting layer. For example, a hole transport layer can be provided between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer can be provided between the second light-emitting layer and the second electrode 320.

[0095] For example, in the same sub-pixel 300, the first light-emitting layer and the second light-emitting layer can be light-emitting layers emitting the same color light. For example, in the same sub-pixel 300, the first light-emitting layer and the second light-emitting layer can be light-emitting layers emitting different colors of light. By providing light-emitting layers emitting different colors of light in the same sub-pixel 300, the light emitted by the multiple light-emitting layers included in the sub-pixel 300 can be mixed to white light. By providing a color filter layer, the color of the light emitted by each sub-pixel 300 can be adjusted.

[0096] For example, the material of the electron transport layer can include an aromatic heterocyclic compound, such as a benzimidazole derivative, an imidazopyridine derivative, a benzimidazophenanthroline derivative, and other imidazole derivatives; a pyrimidine derivative, a triazine derivative, and other azine derivatives; a quinoline derivative, an isoquinoline derivative, a phenanthroline derivative, and other compounds containing a nitrogen-containing six-membered ring structure (including compounds having a phosphine oxide group as a substituent on the heterocycle); and the like.

[0097] For example, the material of the charge generation layer can be a material containing a phosphorus oxygen group or a material containing a triazine.

[0098] For example, the ratio of the electron mobility of the charge generation layer to the electron mobility of the electron transport layer is 10 -2 ~ 10 2 .

[0099] For example, the first electrode 310 can be an anode, and the second electrode 320 can be a cathode. For example, the cathode can be formed of a material with high conductivity and a low work function, for example, the cathode can be made of a metal material. For example, the anode can be formed of a transparent conductive material with a high work function.

[0100] For example, as shown in FIG. 4, the orthographic projection of the second electrode 320 on the substrate 01 in at least part of the sub-pixels 300 is a full-area structure. For example, the second electrode 320 can be a common electrode shared by the plurality of sub-pixels 300.

[0101] In some examples, as shown in FIG. 4, the display substrate includes a limiting structure 400 located between adjacent sub-pixels 300 and configured to isolate at least one layer of the light-emitting functional layer 330. For example, FIGS. 4-6 schematically show that one continuous limiting structure 400 is provided between adjacent sub-pixels 300, but the present disclosure is not limited thereto, and a plurality of spaced limiting structures can be provided between adjacent sub-pixels.

[0102] For example, as shown in FIG. 6, the angle between the extension direction of the limiting structure 400 and the extension direction of the edge of the light-emitting region of the sub-pixel 300 adjacent thereto is less than 5 degrees.

[0103] For example, as shown in FIG. 5, the plurality of sub-pixels 300 includes a red sub-pixel 301, a green sub-pixel 302, and a blue sub-pixel 303, and the limiting structure 400 can be in a plurality, including a limiting structure 400 surrounding a red sub-pixel and a limiting structure 400 surrounding a green sub-pixel. The limiting structure 400 surrounding a red sub-pixel refers to the limiting structure 400 being located between a red sub-pixel and a green sub-pixel, but closer to the red sub-pixel. For example, the number of limiting structures 400 surrounding a red sub-pixel is four, and the number of limiting structures 400 surrounding a green sub-pixel is two. For example, one limiting structure 400 includes an inorganic limiting layer 410 and a protrusion (the first protrusion 510 or the second protrusion 631 described later).

[0104] For example, the limiting structure 400 can isolate the charge generation layer to prevent crosstalk between adjacent different color sub-pixels 300. For example, all film layers of the light-emitting functional layer 330 located between the charge generation layer and the substrate 01 can be isolated at the edge of the limiting structure 400. For example, all film layers of the light-emitting functional layer 330 can be isolated at the edge of the limiting structure 400. For example, the second electrode 320 can be continuous or isolated at the edge of the limiting structure 400.

[0105] In some examples, as shown in FIG. 4, the display substrate further includes: a pixel definition pattern 600 located on the side of the first electrode 310 away from the substrate 01, the pixel definition pattern 600 includes a plurality of first openings 610, a plurality of second openings 620, and a pixel definition portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, the plurality of second openings 620 are configured to expose the limiting structure 400. For example, in each example, the second opening 620 is configured to expose at least part of the limiting structure 400, for example, the second opening can only expose part of the limiting structure 400, or can expose the entire limiting structure 400. For example, one sub-pixel 300 corresponds to at least one first opening 610, at least part of the light-emitting functional layer 330 of the sub-pixel 300 is located in the first opening 610 corresponding to the sub-pixel 300, and the first opening 610 is configured to expose the first electrode 310. For example, one sub-pixel 300 corresponds to one first opening 610, and the light-emitting functional layer 330 located in the first opening 610 realizes light emission by contacting the first electrode 310 and the second electrode 320. For example, the first opening 610 is used to define the light-emitting area of the sub-pixel 300. For example, the light-emitting functional layer 330 can include a part located in the first opening 610, the pixel definition portion 630, and the second opening 620, and is disconnected at the edge of the limiting structure 400. For example, the light-emitting layer in the light-emitting functional layer 330 can only be located in the first opening 610, or can be located in the first opening 610 and on the pixel definition portion 630, but not in the second opening 620.

[0106] For example, as shown in FIG. 4, the material of the pixel definition portion 630 includes an organic material. For example, the material of the pixel definition portion 630 can include polyimide, acrylic, polyethylene terephthalate, etc. For example, the maximum thickness of the pixel definition portion 630 in the direction perpendicular to the substrate 01 can be 0.8 microns or more.

[0107] In some examples, as shown in FIG. 4, the limiting structure 400 includes an inorganic limiting layer 410, and the inorganic limiting layer 410 is a structure of the inorganic layer 200 located between adjacent sub-pixels 300. For example, the inorganic layer 200 includes a film layer in the limiting structure 400, and a structure covering the isolation column 100.

[0108] In some examples, as shown in FIG. 4, the display substrate further includes: an organic layer 500 located between the first electrode 310 and the substrate 01, and the inorganic limiting layer 410 is in surface contact with the organic layer 500 away from the substrate 01. FIG. 4 omits the film layer between the organic layer 500 and the substrate 01, and the film layer between the organic layer 500 and the substrate 01 can refer to the film layer shown in FIG. 3. For example, the organic layer 500 can be a planar layer.

[0109] In some examples, as shown in FIG. 4, the defining structure 400 further includes at least one first protrusion 510 in the organic layer 500 in contact with the surface of the inorganic defining layer 410, and the included angle between the side surface of the first protrusion 510 and the first surface S1 of the organic layer 500 on the side away from the substrate 01 of the part other than the first protrusion 510 is 80-110 degrees, and the first surface S1 is substantially parallel to the substrate 01. For example, the included angle of the side surface of the first protrusion 510 can be 90-100 degrees, or 85-105 degrees, etc., and the specific angle of the included angle is not listed one by one in the embodiments of the present disclosure, which can be any angle in 80-110 degrees. For example, the first surface S1 substantially parallel to the substrate 01 can mean that the included angle between the first surface and the main surface of the substrate is not more than 5 degrees.

[0110] For example, as shown in FIG. 4, the structure in the organic layer 500 and the structure in the inorganic layer 200 are respectively the inorganic defining layer 410 and the first protrusion 510 in the defining structure 400, and the setting of the side angle of the first protrusion 510 can play the effect of blocking at least one layer in the light-emitting functional layer 330 of the adjacent sub-pixel 300.

[0111] For example, as shown in FIG. 4, the edge of the inorganic defining layer 410 protrudes relative to the edge of the first protrusion 510 to achieve the effect of blocking at least one layer in the light-emitting functional layer 330.

[0112] For example, as shown in FIG. 3, the non-hole area A22 is further provided with at least one blocking part 053, which can be located between two isolation columns 100. The blocking part 053 can be used to prevent the organic layer 500 in the packaging layer (not shown) from overflowing the substrate 01 during the manufacturing process. For example, the blocking part 053 can include part of the organic layer 500; and / or, the blocking part 053 includes the same material as the pixel defining part 630.

[0113] For example, as shown in FIG. 3, the non-hole area A22 further includes an isolation structure surrounding the isolation column 100, which includes structures in the organic layer 500 and structures in the inorganic layer 200, and the isolation structure is used to assist the isolation column 100 to further block the film layer such as the light-emitting functional layer 330. For example, the part of the inorganic layer 200 in the isolation structure is covered by the structure layer 631 which is co-deposited with the pixel defining part 630.

[0114] FIG. 5 is a schematic plan view of a partial area of a display area in the display substrate shown in FIG. 2. FIG. 6 is an enlarged view of the partial area shown in FIG. 5. FIG. 4 is a partial cross-sectional view along the line CC' shown in the figure.

[0115] In some examples, as shown in FIGS. 4-6, the inorganic layer 200 covers edges of the first electrode 310 in at least part of the sub-pixel 300. By setting the inorganic layer 200 to cover the edges of the first electrode 310, damage to the edges of the first electrode 310 during subsequent film layer etching processes can be prevented, and the electrical performance of the first electrode 310 can be affected.

[0116] For example, as shown in FIGS. 4-6, the portion of the inorganic layer 200 covering the edges of the first electrode 310 is a second covering portion 210, and the second covering portion 210 wraps at least part of the edges of the first electrode 310. For example, the second covering portion 210 can have a ring structure. For example, the second covering portion 210 has a spacing with the edges of the first opening 610.

[0117] In some examples, as shown in FIGS. 4-6, the first electrode 310 includes a main body portion 311 and a connecting portion 312 connected to each other, the main body portion 311 overlaps with the light-emitting area of the sub-pixel 300, and the connecting portion 312 is electrically connected to the pixel circuit through the via hole 501 in the organic layer 500. For example, the second covering portion 210 covers a circle of edges of the main body portion 311. For example, the main body portion 311 and the connecting portion 312 are integrally arranged.

[0118] For example, as shown in FIG. 6, in one example, the second covering portion 210 can not cover the edges of the connecting portion 312 of the first electrode 310.

[0119] In the display substrate provided by the present disclosure, by setting the inorganic layer to be formed after the first electrode, and setting part of the structure of the inorganic layer, such as the second covering portion, to cover a circle of edges of the main body portion of the first electrode, damage to the edges of the main body portion of the first electrode during subsequent processes of patterning (such as dry etching) the inorganic layer to form the inorganic limiting layer 410 can be prevented, and the light-emitting effect of the sub-pixel can be affected.

[0120] In some examples, as shown in FIGS. 4-6, the orthographic projection of the second covering portion 210 on the substrate 01 is completely located within the orthographic projection of the pixel limiting portion 630 on the substrate 01. The second covering portion 210 of the inorganic layer 200 covering the edges of the first electrode 310 is completely covered by the pixel limiting portion 630 and is not exposed by the first opening 610 or the second opening 620, and therefore, the second covering portion 210 does not play a role in blocking the light-emitting functional layer 330.

[0121] FIG. 7 is a schematic diagram of the positional relationship between a first electrode and an inorganic layer according to another example provided by an embodiment of the present disclosure.

[0122] In some examples, as shown in FIG. 7, the inorganic layer 200 covers the edges of the main body part 311 and the connecting part 312 of the first electrode 310. For example, the shape of the main body part 311 of the first electrode 310 is similar to the shape of the light emitting region, such as both being quadrilaterals. For example, the connecting part 312 is a structure extending from a corner of the main body part 311.

[0123] For example, as shown in FIG. 7, the second covering part 210 covers the edges of the connecting part 312 of the first electrode 310 in addition to covering the edges of the main body part 311 of the first electrode 310, which is beneficial to prevent the edges of the connecting part 312 from being damaged in the process of dry etching the inorganic layer 200, and improve the electrical connection effect of the connecting part 312 and the pixel circuit. FIG. 7 schematically shows the positional relationship between one first electrode 310 and the inorganic layer 200, and shows that the edges of the main body part 311 and the connecting part 312 of the first electrode 310 in other sub-pixels 300 in the display substrate are all covered by the inorganic layer 200.

[0124] FIG. 8 is a schematic diagram of a partial cross-sectional structure along DD' shown in FIG. 7. FIG. 8 does not show the film layers on the side of the pixel defining part 630 away from the substrate 01, and the plurality of film layers 06 in FIG. 8 can refer to the film layers between the substrate 01 and the organic layer 500 as described above.

[0125] In some examples, as shown in FIG. 7 and FIG. 8, each sub-pixel 300 further includes a pixel circuit, the pixel circuit includes a light emitting control transistor 056, the first electrode 310 is electrically connected to the light emitting control transistor 056 through a via hole 501 in the organic layer 500, and in a direction perpendicular to the substrate 01, the inorganic layer 200 does not overlap the via hole 501.

[0126] Compared with the case shown in FIG. 1 in which the inorganic structure is arranged at the anode via hole so that the anode via hole includes an inorganic layer opening and an organic layer opening to form a sleeve hole, in the display substrate provided by the present disclosure, the inorganic layer is formed after the first electrode, the first electrode is only electrically connected to the pixel circuit through the via hole in the organic layer, and does not need to be electrically connected to the pixel circuit through the via hole in the inorganic layer; at the same time, the inorganic layer is formed after the first electrode, which avoids problems such as oxidation of the surface of the metal material in the pixel circuit in the process of etching the inorganic layer, thereby avoiding the problem of low gray scale display mura of the display substrate.

[0127] For example, as shown in FIG. 8, the first electrode 310 is electrically connected to the light emitting control transistor 056 through the connecting structure 055. For example, the connecting part 312 of the first electrode 310 is electrically connected to the light emitting control transistor 056 through a via hole 501 in the organic layer 500.

[0128] For example, the pixel circuit can include a plurality of transistors and at least one capacitor. For example, the pixel circuit can be in a structure of 7T1C, 8T1C, 2T1C, 3T1C, etc., and the embodiments of the present disclosure do not limit this, and the actual needs of the display substrate can be set. FIG. 8 schematically shows the light-emitting control transistor 056 in the pixel circuit, and the pixel circuit can also include other transistors, such as a driving transistor, a data writing transistor, an initialization transistor, a compensation transistor, etc., and the embodiments of the present disclosure do not limit the specific structure of the pixel circuit, which can be set according to the needs.

[0129] For example, FIGS. 7 and 8 schematically show that the part of the connecting portion 312 connected with the main body portion 311 is completely covered by the inorganic layer 200, but are not limited thereto, and the part of the connecting portion 312 connected with the main body portion 311 can be covered only at the edge.

[0130] In some examples, as shown in FIGS. 4 and 6, the edges of the first protrusions 510 are all recessed relative to the edges of the inorganic defining layer 410, so that the edges of the inorganic defining layer 410 towards the sub-pixels 300 on both sides are all used to separate the light-emitting functional layer 330.

[0131] Compared with the case of single-side separation of the inorganic structure 030 shown in FIG. 1, that is, the inorganic structure 030 only separates the light-emitting functional layer of the sub-pixel on one side and does not separate the light-emitting functional layer of the sub-pixel on the other side, the display substrate provided by the present disclosure sets the defining structure to separate the light-emitting functional layers of the sub-pixels on both sides, which is beneficial to avoid the short circuit problem caused by the electrical connection between the charge generation layer and the second electrode in the single-side separated light-emitting functional layer.

[0132] For example, as shown in FIGS. 4 and 6, the size of the second opening 620 is greater than the size of the inorganic defining layer 410, so that the edges of the inorganic defining layer 410 are exposed by the second opening 620.

[0133] For example, as shown in FIG. 4, the size of the edge of the inorganic defining layer 410 protruding relative to the edge of the first protrusion 510 can be not greater than 0.2 microns. For example, the height of the first protrusion 510 can be 1500 angstroms or more.

[0134] For example, as shown in FIG. 4, in the process of etching the inorganic layer 200 to form the inorganic confinement layer 410 and the second cover portion 210, the etching liquid will etch the organic layer 500 to form side etching, so that the edge of the first protrusion 510 stacked with the inorganic confinement layer 410 is recessed inward by a certain size relative to the edge of the inorganic confinement layer 410, and the edge of the protrusion stacked with the second cover portion 210 is recessed inward by a certain size relative to the edge of the second cover portion 210. In the subsequent process of forming the pixel confinement portion 630, the portion of the edge of the protrusion stacked with the second cover portion 210 that is recessed inward relative to the edge of the second cover portion 210 can be filled with the material of the pixel confinement portion 630.

[0135] In some examples, as shown in FIG. 4, the height of the first protrusion 510 is greater than the thickness of the first electrode 310. For example, the height of the first protrusion 510 can be 2000-3000 angstroms.

[0136] In some examples, as shown in FIG. 5, the display substrate further includes a spacer 700 located on the side of the inorganic layer 200 away from the substrate 01, and the orthogonal projection of the spacer 700 on the substrate 01 is completely located within the orthogonal projection of the inorganic layer 200 on the substrate 01.

[0137] By arranging part of the inorganic layer between the spacer and the substrate, the spacer is raised to improve the support of the spacer on the fine metal mask (FMM) for forming the light-emitting layer, preventing the mask from scratching the light-emitting material in the light-emitting area and affecting the display effect.

[0138] For example, as shown in FIG. 3, the non-hole region A22 is also provided with at least one circle of filling structure 054, which is helpful to prevent the spacer 100 from being electrically connected with the film layer such as the light-emitting functional layer 330. For example, the filling structure 054 can be the same material as the spacer 700, such as being formed in the same step of patterning process.

[0139] Another embodiment of the present disclosure provides a display substrate, including the display substrate shown in FIGS. 2-8, the display substrate including a substrate 01, a plurality of sub-pixels 300 on the substrate 01, a pixel defining pattern 600, an inorganic layer 200, and an organic layer 500. Each of the sub-pixels 300 includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 stacked, the first electrode 310 is between the light-emitting functional layer 330 and the substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is on a side of the first electrode 310 away from the substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610, a plurality of second openings 620, and a pixel defining portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, the plurality of first openings 610 are configured to expose the first electrode 310 of the plurality of sub-pixels 300; and the organic layer 500 is between the inorganic layer 200 and the substrate 01. The display substrate includes a limiting structure 400, the second opening 620 is configured to expose the limiting structure 400, the limiting structure 400 includes an inorganic limiting layer 410 between adjacent sub-pixels 300 in the inorganic layer 200 and at least one protrusion (such as a first protrusion 510) in the organic layer 500 in contact with a surface of the inorganic limiting layer 410, the limiting structure 400 is configured to isolate at least one layer of the light-emitting functional layer 330; and the inorganic layer 200 covers edges of the first electrode 310 in at least part of the sub-pixels 300.

[0140] In the display substrate provided by the present disclosure, the inorganic layer is formed after the first electrode, and by configuring the part of the inorganic layer that is in the same layer as the inorganic limiting layer in the limiting structure to cover the edges of the first electrode of the sub-pixel, it is beneficial to prevent damage to the edges of the first electrode during the process of etching to form the inorganic limiting layer.

[0141] In the display substrate provided by the embodiment of the present disclosure, the side surface of the isolation column in the non-hole area can or can not be covered by the inorganic layer.

[0142] In some examples, as shown in FIGS. 2 to 8, each sub-pixel 300 further includes a pixel circuit including a light-emitting control transistor, the first electrode 310 is electrically connected with the light-emitting control transistor through a via hole in the organic layer 500, and along a direction perpendicular to the substrate substrate 01, the inorganic layer 200 does not overlap with the via hole 501. In the case of setting the inorganic structure at the anode via hole as shown in FIG. 1 to form a via hole including an inorganic layer opening and an organic layer opening, in the display substrate provided by the present disclosure, the inorganic layer is formed after the formation of the first electrode, and the first electrode is only electrically connected with the pixel circuit through the via hole in the organic layer, without the need to be electrically connected with the pixel circuit through the via hole in the inorganic layer; at the same time, the inorganic layer is formed after the first electrode, avoiding the problem that the surface of the metal material in the pixel circuit is oxidized in the process of etching the inorganic layer, thereby avoiding the problem of low gray scale display mura of the display substrate.

[0143] The substrate substrate, the sub-pixel, the pixel defining pattern, the inorganic layer and the organic layer in the display substrate provided by the present disclosure can have the same features as the above-mentioned embodiments, and will not be described here.

[0144] FIG. 9 is a schematic diagram of a partial cross-sectional structure of a display substrate provided by another example according to an embodiment of the present disclosure. The display substrate shown in FIG. 9 is different from the display substrate shown in FIG. 3 in whether a first cover portion 632 is arranged on the defining structure 400.

[0145] In some examples, as shown in FIG. 9, the pixel defining portion 630 includes a first cover portion 632 covering a side surface of the inorganic defining layer 410 away from the substrate substrate 01, and an edge of the inorganic defining layer 410 protrudes relative to an edge of the first cover portion 632. By arranging the first cover portion 632 on the side of the inorganic defining layer 410 away from the substrate substrate 01, and arranging the edge of the inorganic defining layer 410 to protrude relative to the edge of the first cover portion 632, the inorganic defining layer 410 can be prevented from being peeled off from the first protrusion 510 without affecting the blocking effect of the inorganic defining layer 410 on the light-emitting functional layer 330.

[0146] In some examples, as shown in FIG. 9, the edge of the inorganic defining layer 410 protrudes relative to the edge of the first cover portion 632 by a first protruding size d1, the edge of the inorganic defining layer 410 protrudes relative to the edge of the first protrusion 510 by a second protruding size d2, and the first protruding size d1 is not less than the second protruding size d2. By limiting the sizes of the edges of the inorganic defining layer 410 protruding relative to the edges of the first cover portion 632 and the first protrusion 510, the blocking effect of the edge of the inorganic defining layer 410 on the light-emitting functional layer 330 can be achieved.

[0147] The other structures outside the first covering portion in the display substrate shown in FIG. 9 can have the same features as the corresponding structures in the display substrate shown in FIG. 3, and will not be described here again.

[0148] FIG. 10 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. FIG. 11 is a schematic diagram of a partial planar structure of the display substrate shown in FIG. 10.

[0149] The display substrate shown in FIG. 10 is different from the display substrate shown in FIG. 3 in whether the first electrode 310 of the sub-pixel 300 overlaps the inorganic layer 200.

[0150] In some examples, as shown in FIGS. 10 and 11, in a direction perpendicular to the substrate base plate 01, the first electrode 310 does not overlap the inorganic layer 200. The display substrate provided in the present example, in which the inorganic layer 200 is formed after the pixel defining pattern 600, not only can prevent the inorganic layer 200 from affecting the metal film layer between the organic layer 500 directly below the first electrode 310 and the substrate base plate 01, and the peeling problem of the film layer in which the first electrode 310 is located, during the patterning process of the inorganic layer 200, but also can save the second covering portion 210 wrapping the edge of the first electrode 310, which is conducive to avoiding the second covering portion 210 affecting the shape of the first opening 610 in the pixel defining pattern 600 and the shape of the pixel defining portion 630 surrounding the first opening 610, and further causing the light-emitting functional layer 330 to be easily scratched by the mask plate.

[0151] In some examples, as shown in FIG. 10, the thickness H0 of the pixel defining portion 630 is 0.2-0.7 microns. Here, the thickness of the pixel defining portion 630 refers to the thickness at the position where the surface of the pixel defining portion 630 away from the substrate base plate 01 is a relatively flat surface.

[0152] Since the inorganic layer is formed after the pixel defining pattern, the process of patterning the inorganic layer to form the inorganic defining layer will cause a certain etching to the pixel defining portion, resulting in the thickness of the pixel defining portion being thinned, such as the thickness of the pixel defining portion in the present example being less than the thickness of the pixel defining portion in the display substrates shown in FIGS. 3 and 9.

[0153] For example, as shown in FIG. 10, the thickness of the organic layer 500 directly below the pixel defining portion 630 is greater than the thickness of the organic layer 500 between the pixel defining portion 630 and the inorganic defining layer 410.

[0154] For example, as shown in FIG. 10, the limiting structure 400 can separate the light-emitting functional layer in the sub-pixel 300 on both sides, such as double-sided separation. For example, the first electrode does not need to pass through the inorganic layer via hole, but only through the via hole in the organic layer to be electrically connected with the pixel circuit.

[0155] The features of the isolation columns 100, the limiting structures 400, the sub-pixels 300, and the like in the display substrate shown in FIG. 10 can be the same as those in the display substrate shown in FIG. 3, and will not be described here again. For example, the inorganic layer 200 covering the isolation columns 100 in the display substrate shown in FIG. 10 is formed after the pixel defining pattern 600.

[0156] FIG. 12 is a schematic diagram of a partial cross-sectional structure of a display substrate provided in another example according to an embodiment of the present disclosure. FIG. 13 is a schematic diagram of a partial planar structure of the display substrate shown in FIG. 12. The display substrate shown in FIG. 12 is different from the display substrate shown in FIG. 10 in the positional relationship between the spacers 700 and the inorganic layer 200.

[0157] In some examples, as shown in FIGS. 12 and 13, the display substrate further includes that the spacers 700 are located on the side of the first electrodes 310 away from the substrate 01, and the inorganic layer 200 covers at least the surface of the side of the spacers 700 away from the substrate 01.

[0158] The display substrate provided in the present example prevents the inorganic layer from affecting the shape and height of the spacers during the patterning process of the inorganic layer, thereby preventing the mask plate supported by the spacers from scratching the light-emitting functional layer.

[0159] For example, as shown in FIG. 12, the inorganic layer 200 wraps the spacers 700. However, the inorganic layer 200 can be located only on the surface of the side of the spacers 700 away from the substrate 01.

[0160] For example, as shown in FIG. 12, the thickness of the pixel defining portion 630 at the position directly below the spacers 700 is greater than the thickness of the pixel defining portion 630 at other positions, which is beneficial to improve the supporting effect of the spacers 700.

[0161] FIG. 12 schematically shows that the spacers 700 and the pixel defining portion 630 are in a split structure, but the spacers 700 can also be in an integrated structure with the pixel defining portion 630.

[0162] For example, as shown in FIG. 12, the limiting structures 400 can separate the light-emitting functional layers in the sub-pixels 300 on both sides, such as double-sided separation. For example, the first electrode does not need to pass through the inorganic layer via hole, but only passes through the via hole in the organic layer to be electrically connected with the pixel circuit.

[0163] The features of the isolation columns 100, the limiting structures 400, the sub-pixels 300, and the like in the display substrate shown in FIG. 12 can be the same as those of the isolation columns 100, the limiting structures 400, the sub-pixels 300, and the like in the display substrate shown in FIG. 3, and will not be described here again. For example, the inorganic layer 200 covering the isolation columns 100 in the display substrate shown in FIG. 12 is formed after the spacers 700.

[0164] FIG. 14 is a schematic diagram of a partial cross-sectional structure of a display substrate provided in another example according to an embodiment of the present disclosure. The display substrate shown in FIG. 14 is different from the display substrate shown in FIG. 12 in whether the inorganic layer 200 covers the side edges of the first openings 610.

[0165] In some examples, as shown in FIG. 14, the inorganic layer 200 includes an inorganic covering layer 220 covering the side edges of the first openings 610.

[0166] In the display substrate provided in the present example, by setting the inorganic layer to include the inorganic covering layer covering the side edges of the pixel limiting portion surrounding the first openings, it is beneficial to prevent the inorganic layer from causing unnecessary etching to the side edges of the pixel limiting portion surrounding the first openings during dry etching to form the inorganic limiting layer, thereby affecting the height of the pixel limiting portion and the topography of the slope, which not only easily affects the topography of the pixel opening, but also can affect the height of the spacers, and further cause the mask plate to scratch the light-emitting functional layer.

[0167] For example, as shown in FIG. 14, the side edges of each first opening 610 are covered by the inorganic layer 200. For example, the orthogonal projection of the inorganic covering layer 220 on the substrate 01 can be a ring-shaped structure. For example, in addition to covering the side edges of the pixel limiting portion 630 surrounding the first openings 610, the inorganic covering layer 220 also covers the flat surface of the pixel limiting portion 630 away from the substrate 01. For example, the orthogonal projection of the portion of the first electrode 310 covered by the pixel limiting portion 630 on the substrate 01 can be completely located within the orthogonal projection of the inorganic covering layer 220 on the substrate 01.

[0168] For example, as shown in FIG. 14, the pixel limiting portion 630 includes a pixel limiting protrusion 601 stacked with the inorganic covering layer 220, and the edge of the inorganic covering layer 220 away from the first opening 610 protrudes relative to the edge of the pixel limiting protrusion 601, which is beneficial to assist the limiting structure 400 in blocking the light-emitting functional layer 330, so as to improve the blocking effect of the light-emitting functional layer 330.

[0169] For example, FIG. 14 schematically shows that the inorganic layer 200 covers the spacers 700, but is not limited thereto. The inorganic layer 200 can also not cover the spacers 700, which can be set according to product requirements.

[0170] For example, as shown in FIG. 14, the limiting structure 400 can separate the light-emitting functional layer in the sub-pixel 300 on both sides, such as double-side separation. For example, the first electrode does not need to pass through the inorganic layer via hole, and is electrically connected with the pixel circuit only through the via hole in the organic layer.

[0171] The features of the isolation column 100, the limiting structure 400, the sub-pixel 300 and the like in the display substrate shown in FIG. 14 can be the same as those of the isolation column 100, the limiting structure 400, the sub-pixel 300 and the like in the display substrate shown in FIG. 3, which will not be repeated here. For example, the inorganic layer 200 covering the isolation column 100 in the display substrate shown in FIG. 14 is formed after the spacer 700.

[0172] Another embodiment of the present disclosure provides a display substrate, including any one of the display substrates shown in FIGS. 10 to 14, the display substrate including a substrate 01, a plurality of sub-pixels 300 located on the substrate 01, a pixel defining pattern 600, an inorganic layer 200 and an organic layer 500. Each sub-pixel 300 includes a first electrode 310, a light-emitting functional layer 330 and a second electrode 320 which are stacked, the first electrode 310 is located between the light-emitting functional layer 330 and the substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is located on the side of the first electrode 310 away from the substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610, a plurality of second openings 620 and a pixel defining portion 630 surrounding the plurality of first openings 610 and the plurality of second openings 620, the plurality of first openings 610 are configured to expose the first electrode 310 of the plurality of sub-pixels 300; the organic layer 500 is located between the inorganic layer 200 and the substrate 01. The display substrate includes a limiting structure 400, the second opening 620 is configured to expose the limiting structure 400, the limiting structure 400 includes an inorganic limiting layer 410 located between adjacent sub-pixels 300 of the inorganic layer 200 and at least one protrusion in the organic layer 500 in contact with the surface of the inorganic limiting layer 410, the limiting structure 400 is configured to separate at least one layer of the light-emitting functional layer 330; in the direction perpendicular to the substrate 01, the inorganic layer 200 does not overlap with the first electrode 310.

[0173] In the display substrate provided by the embodiment of the present disclosure, the inorganic layer is formed after the pixel defining pattern is formed, so that the first electrode can be arranged without overlapping with the inorganic layer, so as to avoid the influence of the inorganic layer on the opening of the sub-pixel and the first electrode, and facilitate to improve the display effect of the display substrate.

[0174] In the display substrate provided by the embodiment of the present disclosure, the side surface of the isolation column located in the non-hole region can be covered by the inorganic layer, or can not be covered by the inorganic layer.

[0175] The substrate substrate 01, the sub-pixel 300, the pixel defining pattern 600, the inorganic layer 200 and the organic layer 500 in the display substrate provided by the present disclosure can have the same features as the above embodiments, and will not be described here again.

[0176] FIG. 15 is a schematic diagram of a partial cross-sectional structure of a display substrate provided by another example according to an embodiment of the present disclosure. FIG. 16 is a schematic diagram of a corresponding partial planar structure of the display substrate shown in FIG. 15. FIG. 15 is a schematic diagram of a partial cross-sectional structure along the line EE' shown in FIG. 16. The display substrate shown in FIGS. 15 and 16 differs from the display substrate shown in FIG. 3 in that the film layer included in the limiting structure 400 is different.

[0177] In some examples, as shown in FIGS. 15 and 16, the pixel defining pattern 600 includes a plurality of first openings 610 configured to expose the first electrodes 310 of the plurality of sub-pixels 300 and a pixel defining portion 630 surrounding the plurality of first openings 610; and the inorganic limiting layer 410 is in contact with at least a side surface of the pixel defining portion 630 away from the substrate substrate 01.

[0178] In the display substrate provided by the present example, the inorganic layer is formed after the pixel defining pattern, so that the inorganic limiting layer can be formed on the pixel defining portion, preventing the inorganic limiting layer from affecting the first electrode and the organic layer between the first electrode and the substrate substrate, and facilitating improvement of the display effect of the display substrate.

[0179] The pixel defining pattern 600 in the display substrate shown in FIG. 15 only includes the first openings 610 and does not include the second openings 620, which facilitates prevention of the second openings 620 from affecting the side edges and the height of the pixel defining portion 630 surrounding the first openings 610, and further affecting the height of the spacers 700, thereby causing the mask plate to scratch the light-emitting functional layer.

[0180] In some examples, as shown in FIG. 1, the limiting structure 400 further includes at least one second protrusion 631 in the pixel defining portion 630 in contact with a surface of the inorganic limiting layer 410, and an included angle between a side surface of the second protrusion 631 and a second surface S2 of the pixel defining portion 630 away from the substrate substrate 01 on a side other than the second protrusion 631 is 80-110 degrees, and the second surface S2 is substantially parallel to the substrate substrate 01. For example, the included angle of the side surface of the second protrusion 631 can be 90-100 degrees, or 85-105 degrees, etc., and the present disclosure will not enumerate all specific angles of the included angle, which can be any angle within 80-110 degrees. For example, the second surface S2 being substantially parallel to the substrate substrate 01 can mean that the included angle between the second surface and the main surface of the substrate substrate is not more than 5 degrees.

[0181] In the example, the part of the pixel defining part in contact with the inorganic defining layer is defined as the structure of the defining structure. The side angle of the second protrusion can block at least one layer of the light-emitting functional layer of the adjacent sub-pixel. In addition, the flatness of the organic layer between the first electrode and the substrate can be improved to improve the flatness of the first electrode.

[0182] For example, as shown in FIG. 15, the inorganic defining layer 410 does not overlap with the first electrode 310 in the direction perpendicular to the substrate 01.

[0183] For example, as shown in FIG. 15, the thickness H0 of the pixel defining part 630 is 0.2-0.7 microns. Here, the thickness of the pixel defining part 630 refers to the thickness at the position where the surface of the pixel defining part 630 away from the substrate 01 is relatively flat.

[0184] Since the inorganic layer is formed after the pixel defining pattern, the process of patterning the inorganic layer to form the inorganic defining layer will etch the pixel defining part to some extent, resulting in a reduction in the thickness of the pixel defining part. For example, the thickness of the pixel defining part in the example is smaller than that of the pixel defining part in the display substrate shown in FIG. 3 and FIG. 9.

[0185] For example, as shown in FIG. 15, the height of the second protrusion 631 can be 1500 angstroms or more. For example, the height of the second protrusion 631 can be 2000-3000 angstroms.

[0186] FIG. 15 schematically shows that the part of the pixel defining part 630 around the second protrusion 631 is a flat surface, but is not limited thereto. The pixel defining part 630 can include a groove around the second protrusion 631, which is beneficial to assist the defining structure 400 in blocking the light-emitting functional layer 330.

[0187] For example, as shown in FIG. 15, the defining structure 400 can block the light-emitting functional layer in the sub-pixel 300 on both sides, such as double-sided blocking. For example, the first electrode does not need to pass through the inorganic layer via hole and is electrically connected to the pixel circuit only through the via hole in the organic layer.

[0188] The structures such as the sub-pixel 300 and the spacer 700 in the display substrate shown in FIG. 15 and FIG. 16 can have the same features as the corresponding structures shown in FIG. 3, which will not be described here.

[0189] FIG. 17 is a schematic diagram of a partial cross-sectional structure of a display substrate provided in another example according to an embodiment of the present disclosure. FIG. 18 is a schematic diagram of a corresponding partial planar structure of the display substrate shown in FIG. 17. FIG. 17 is a schematic diagram of a partial cross-sectional structure along the line FF’ shown in FIG. 18. The display substrate shown in FIG. 17 and FIG. 18 is different from the display substrate shown in FIG. 15 and FIG. 16 in that the inorganic layer 200 is located at least on the surface of the spacer 700 away from the substrate 01.

[0190] In some examples, as shown in FIGS. 17 and 18, the spacers 700 are located on the side of the first electrode 310 away from the substrate 01, and the inorganic layer 200 is at least located on the surface of the side of the spacers 700 away from the substrate 01. For example, the inorganic layer 200 at least covers the surface of the side of the spacers 700 away from the substrate 01, but is not limited thereto, and the inorganic layer can be in direct contact with the spacers, or other film layers can exist between the inorganic layer and the spacers.

[0191] The display substrate provided in this example prevents the shape and height of the spacers from being affected during the patterning of the inorganic layer, thereby preventing the mask plate supported by the spacers from scratching the light-emitting functional layer.

[0192] For example, as shown in FIG. 17, the limiting structure 400 can separate the light-emitting functional layer in the sub-pixel 300 on both sides, such as bilateral separation. For example, the first electrode does not need to pass through the inorganic layer via hole, and is only electrically connected to the pixel circuit through the via hole in the organic layer.

[0193] The covering relationship between the spacers 700 and the inorganic layer 200 in this example is the same as that between the spacers 700 and the inorganic layer 200 shown in FIG. 12, and will not be described here again.

[0194] This example is not limited to the inorganic layer being located on the side of the spacers away from the substrate, and the inorganic layer can also be located between the spacers and the pixel limiting portion. For example, the orthographic projection of the spacers on the substrate falls completely within the orthographic projection of the inorganic layer on the substrate, which is beneficial to raising the spacers, so as to improve the supporting effect of the spacers on the fine metal mask (FMM) for forming the light-emitting layer, and prevent the mask plate from scratching the light-emitting material in the light-emitting area and affecting the display effect.

[0195] FIG. 19 is a schematic diagram of a partial cross-sectional structure of a display substrate provided in another example according to an embodiment of the present disclosure. The display substrate shown in FIG. 19 is different from the display substrate shown in FIG. 17 in whether the edge of the first opening 610 is covered by the inorganic layer 200.

[0196] In some examples, as shown in FIG. 19, the inorganic layer 200 includes an inorganic covering layer 220 covering the side of the first opening 610.

[0197] In the display substrate provided by the example, by setting the inorganic layer 200 to include the inorganic covering layer 220 covering the side of the pixel defining portion 630 around the first opening 610, it is beneficial to prevent the inorganic layer 200 from causing unnecessary etching to the side of the pixel defining portion 630 around the first opening 610 during dry etching to form the inorganic defining layer 410, thereby affecting the height and the profile of the slope of the pixel defining portion 630, which not only affects the profile of the pixel opening, but also affects the height of the spacer 700, and further causes the mask plate to scratch the light-emitting functional layer.

[0198] For example, as shown in FIG. 19, the portion of the pixel defining portion 630 between the inorganic covering layer 220 and the inorganic defining layer 410 includes the groove 602, and the edge of the inorganic covering layer 220 protrudes into the groove 602. The inorganic covering layer 220 is beneficial to assist the inorganic defining layer 410 in blocking at least one layer of the light-emitting functional layer 330, and is beneficial to significantly improve the blocking effect of the light-emitting functional layer.

[0199] For example, as shown in FIG. 19, the limiting structure 400 can block the light-emitting functional layer in the sub-pixel 300 on both sides, such as double-side blocking. For example, the first electrode does not need to pass through the inorganic layer via hole, but only passes through the via hole in the organic layer to be electrically connected with the pixel circuit.

[0200] The inorganic covering layer 220 shown in FIG. 19 has the same features as the inorganic covering layer 220 shown in FIG. 14, and will not be described here.

[0201] Another embodiment of the present disclosure provides a display substrate, including any one of the display substrates shown in FIGS. 15 to 19, the display substrate including a substrate 01, and a plurality of sub-pixels 300, a pixel defining pattern 600, and an inorganic layer 200 located on the substrate 01. Each sub-pixel 300 includes a first electrode 310, a light-emitting functional layer 330, and a second electrode 320 stacked, the first electrode 310 is located between the light-emitting functional layer 330 and the substrate 01, and the light-emitting functional layer 330 includes a plurality of film layers; the pixel defining pattern 600 is located on the side of the first electrode 310 away from the substrate 01, and the pixel defining pattern 600 includes a plurality of first openings 610 and a pixel defining portion 630 around the plurality of first openings 610, the plurality of first openings 610 are configured to expose the first electrode 310 of the plurality of sub-pixels 300; the inorganic layer 200 is located on the side of the pixel defining portion 630 away from the substrate 01. The display substrate includes a limiting structure 400 located between adjacent sub-pixels 300 and configured to block at least one layer of the light-emitting functional layer 330; the limiting structure 400 includes an inorganic defining layer 410 of the inorganic layer 200 between the adjacent sub-pixels 300, and the inorganic defining layer 410 at least contacts the surface of the pixel defining portion 630 away from the substrate 01.

[0202] The display substrate provided by the embodiments of the present disclosure forms the inorganic limiting layer on the pixel limiting part, prevents the inorganic limiting layer from affecting the first electrode and the organic layer between the first electrode and the substrate, and further prevents the profile of the edge of the pixel limiting part around the first opening from being affected to cause the mask to scratch the light-emitting functional layer in the light-emitting area and generate bright and dark spots. Therefore, the inorganic limiting layer is formed after the pixel limiting pattern, which is beneficial to improve the display effect of the display substrate, improve the production yield of the product, and greatly reduce the production cost.

[0203] In some examples, as shown in FIGS. 15-19, the limiting structure 400 further includes at least one protrusion (i.e., the second protrusion 631) in the pixel limiting part 630 that is in contact with the surface of the inorganic limiting layer 410, and the included angle between the side surface of the protrusion and the surface of the pixel limiting part 630 excluding the protrusion away from the side of the substrate 01 is 80-110 degrees, and the surface is parallel to the substrate 01. The protrusion in the present example can have the same features as the second protrusion 631 described above, and will not be described here.

[0204] In some examples, as shown in FIGS. 15-18, the first electrode 310 does not overlap with the inorganic layer 200 in the direction perpendicular to the substrate 01. The display substrate provided by the present example forms the inorganic layer 200 after the pixel limiting pattern 600, which not only prevents the inorganic layer 200 from affecting the organic layer 500 directly below the first electrode 310 and even the metal film layer between the organic layer 500 and the substrate 01 during the patterning process of the inorganic layer 200, and the peeling problem of the film layer where the first electrode 310 is located, but also can save the second covering part 210 that wraps the edge of the first electrode 310, which is beneficial to avoid the influence of the second covering part 210 on the shape of the first opening 610 in the pixel limiting pattern 600 and the shape of the pixel limiting part 630 around the first opening 610, and further affect the scratching of the light-emitting functional layer 330 by the mask.

[0205] For example, as shown in FIG. 17, the thickness H0 of the pixel limiting part 630 is 0.2-0.7 microns. Here, the thickness of the pixel limiting part 630 refers to the thickness at the position where the surface of the pixel limiting part 630 away from the substrate 01 is relatively flat. Since the inorganic layer 200 is formed after the pixel limiting pattern 600, the process of patterning the inorganic layer 200 to form the inorganic limiting layer 410 will etch the pixel limiting part 630 to a certain extent, resulting in the thickness of the pixel limiting part 630 being thinned, such as the thickness of the pixel limiting part 630 in the present example being less than the thickness of the pixel limiting part 630 in the display substrate shown in FIGS. 3 and 9.

[0206] In some examples, as shown in FIG. 19, the inorganic layer 200 includes an inorganic covering layer 220 covering the side of the first opening 610. In the display substrate provided by the present example, by setting the inorganic layer 200 to include the inorganic covering layer 220 covering the side of the pixel defining portion 630 around the first opening 610, it is beneficial to prevent the inorganic layer 200 from causing unnecessary etching to the side of the pixel defining portion 630 around the first opening 610 during dry etching to form the inorganic defining layer 410, thereby affecting the height of the pixel defining portion 630 and the morphology of the slope, which not only easily affects the morphology of the pixel opening, but also can affect the height of the spacer 700, thereby causing the mask plate to scratch the light-emitting functional layer 330.

[0207] The inorganic covering layer 220 in the present example can have the same features as the inorganic covering layer 220 in the above-mentioned embodiments, and will not be described here again.

[0208] In some examples, as shown in FIGS. 17 and 18, the display substrate further includes a spacer 700 on the side of the first electrode 310 away from the substrate 01, and the inorganic layer 200 is at least located on the surface of the spacer 700 away from the substrate 01. For example, the inorganic layer 200 at least covers the surface of the spacer 700 away from the substrate 01, but is not limited thereto, and the inorganic layer can be in direct contact with the spacer, or other film layers can exist between the inorganic layer and the spacer. By setting the inorganic layer 200 on the spacer 700, it is prevented that the inorganic layer 200 affects the shape and height of the spacer 700 during the patterning process, thereby causing the mask plate supported by the spacer 700 to scratch the light-emitting functional layer 330.

[0209] The relative positional relationship between the spacer 700 and the inorganic layer 200 in the present example can be the same as that between the spacer 700 and the inorganic layer 200 in the above-mentioned embodiments, and will not be described here again.

[0210] Another embodiment of the present disclosure provides a manufacturing method of a display substrate, which includes forming an inorganic layer 200 on the side of the first electrode 310 away from the substrate 01 after the first electrode 310 is patterned, and patterning the inorganic layer 200 to form a structure covering the side of the spacer 100, an inorganic defining layer 410 in contact with the organic layer 500, and a second covering portion 210 covering the edge of the first electrode 310, and the formed structure is shown in FIGS. 3 to 9.

[0211] Another embodiment of the present disclosure provides a manufacturing method of a display substrate, which comprises forming an inorganic layer 200 in the first opening 610 and the second opening 620 away from the substrate 01 on one side of the pixel defining part 630 after the pixel defining pattern 600 is formed by patterning, and forming the inorganic limiting layer 410 in contact with the organic layer 500 exposed by the second opening 620 and the structure covering the side surface of the isolation column 100 by patterning the inorganic layer 200, as shown in FIG. 3 and FIG. 10. For example, the inorganic layer 200 can also be patterned to form a partial structure covering the spacer 700 as shown in FIG. 12. For example, the inorganic layer 200 can also be patterned to form an inorganic covering layer 220 as shown in FIG. 14.

[0212] Another embodiment of the present disclosure provides a manufacturing method of a display substrate, which comprises forming an inorganic layer 200 in the first opening 610 and the second opening 620 away from the substrate 01 on one side of the pixel defining part 630 after the pixel defining pattern 600 is formed by patterning, and forming the inorganic limiting layer 410 in contact with the organic layer 500 exposed by the second opening 620 and the structure covering the side surface of the isolation column 100 by patterning the inorganic layer 200, as shown in FIG. 3 and FIG. 10. For example, the inorganic layer 200 can also be patterned to form a partial structure covering the spacer 700 as shown in FIG. 12. For example, the inorganic layer 200 can also be patterned to form an inorganic covering layer 220 as shown in FIG. 14.

[0213] The embodiments of the present disclosure are not limited to the above-mentioned manufacturing method of patterning the inorganic layer 200 to form the structure covering the side surface of the isolation column 100 as shown in FIG. 3. For example, the non-hole area A22 can not be provided with the wrapping structure formed by patterning the inorganic layer 200.

[0214] FIG. 20 is a schematic block diagram of a display device provided by another embodiment of the present disclosure. As shown in FIG. 20, the display device provided by the embodiments of the present disclosure comprises any of the above-mentioned display substrates.

[0215] For example, the display substrate provided by the embodiments of the present disclosure can be an organic light-emitting diode display substrate. For example, the display substrate can be provided with a color filter layer, or can not be provided with a color filter layer.

[0216] For example, the display device further comprises a cover plate located on the light-emitting side of the display substrate.

[0217] For example, the display device can be a display device such as an organic light-emitting diode display device, and any product or component having a display function such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, etc., and the embodiments of the present disclosure are not limited thereto.

[0218] The following points need to be explained:

[0219] (1) In the drawings of the embodiments of the present disclosure, only structures related to the embodiments of the present disclosure are involved, and other structures can be referred to general designs.

[0220] (2) In the case of no conflict, the features in the same embodiment and different embodiments of the present disclosure can be combined with each other.

[0221] The above only describes exemplary embodiments of the present disclosure, and is not intended to limit the protection scope of the present disclosure, and the protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: a substrate, comprising a first region and a second region, the first region surrounding at least part of the second region, the first region comprising a display region, the second region comprising an aperture region and a non-aperture region surrounding the aperture region; a plurality of isolation columns on the non-aperture region of the substrate and surrounding the aperture region; an inorganic layer on the substrate, wherein the isolation columns comprise at least a first isolation layer and a second isolation layer stacked, the second isolation layer being on a side of the first isolation layer away from the substrate, an edge of the second isolation layer protruding relative to an edge of the first isolation layer, the first isolation layer and the second isolation layer both being conductive material; the inorganic layer wrapping at least a side of the first isolation layer and the second isolation layer of the isolation columns. 2.The display substrate of claim 1, wherein, the display region comprising a plurality of sub-pixels, each sub-pixel comprising a first electrode, a light-emitting functional layer and a second electrode stacked, the first electrode being between the light-emitting functional layer and the substrate, the light-emitting functional layer comprising a plurality of film layers; the display substrate comprising a defining structure between adjacent sub-pixels and configured to separate at least one layer of the light-emitting functional layer; the defining structure comprising an inorganic defining layer, the inorganic defining layer being a structure of the inorganic layer between adjacent sub-pixels. 3.The display substrate of claim 2, further comprising: an organic layer between the first electrode and the substrate, wherein the inorganic defining layer is in surface contact with the organic layer away from the substrate. 4.The display substrate of claim 2, further comprising: a pixel defining pattern on a side of the first electrode away from the substrate, wherein the pixel defining pattern comprises a plurality of first openings and a pixel defining portion surrounding the plurality of first openings, the plurality of first openings being configured to expose the first electrode of the plurality of sub-pixels; the inorganic defining layer being in surface contact with at least a side of the pixel defining portion away from the substrate. 5.The display substrate of claim 3, further comprising: a pixel defining pattern on a side of the first electrode away from the substrate, wherein the pixel defining pattern comprises a plurality of first openings, a plurality of second openings and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of second openings being configured to expose at least part of the defining structure. 6.The display substrate of claim 5, wherein, the defining structure further comprising at least one first protrusion of the organic layer in surface contact with the inorganic defining layer, a side of the first protrusion and a first surface of the organic layer other than the first protrusion away from the substrate forming an angle of 80-110 degrees, the first surface being substantially parallel to the substrate. 7.The display substrate of claim 4, wherein, the defining structure further comprising at least one second protrusion of the pixel defining portion in surface contact with the inorganic defining layer, a side of the second protrusion and a second surface of the pixel defining portion other than the second protrusion away from the substrate forming an angle of 80-110 degrees, the second surface being substantially parallel to the substrate. 8.The display substrate according to claim 3, 5 or 6, wherein The inorganic layer covers edges of the first electrode in the at least part of the sub-pixel. 9.The display substrate according to claim 3 or 4, wherein The first electrode does not overlap the inorganic layer in a direction perpendicular to the substrate. 10.The display substrate according to claim 4 or 5, wherein The inorganic layer includes an inorganic covering layer covering sides of the first opening.

11. The display substrate of claim 3, 5, 6, or 8, further comprising: a spacer on a side of the inorganic layer away from the substrate, wherein a footprint of the spacer on the substrate is entirely within a footprint of the inorganic layer on the substrate.

12. The display substrate of claim 3 or 4, further comprising: a spacer on a side of the first electrode away from the substrate, wherein the inorganic layer is at least on a surface of the spacer away from the substrate. 13.The display substrate of claim 8, wherein, Each sub-pixel further includes a pixel circuit including a light emitting control transistor, the first electrode is electrically connected with the light emitting control transistor through a via in the organic layer, and the inorganic layer does not overlap the via in a direction perpendicular to the substrate. 14.The display substrate of claim 13, wherein, The first electrode includes a main body portion and a connection portion connected with each other, the main body portion overlaps a light emitting region of the sub-pixel, the connection portion is electrically connected with the light emitting control transistor through the via, and the inorganic layer covers edges of the main body portion and the connection portion. 15.The display substrate of claim 6, wherein, The pixel defining portion includes a first covering portion covering a surface of the inorganic defining layer away from the substrate, and edges of the inorganic defining layer protrude relative to edges of the first covering portion. 16.The display substrate of claim 15, wherein, Edges of the inorganic defining layer protruding relative to edges of the first covering portion have a first protruding dimension, edges of the inorganic defining layer protruding relative to edges of the first protrusion have a second protruding dimension, and the first protruding dimension is not less than the second protruding dimension. 17.The display substrate of claim 5, wherein, The inorganic layer covers edges of the first electrode in the at least part of the sub-pixel. 18.The display substrate of claim 6, wherein, Edges of the first protrusion are all recessed relative to edges of the inorganic defining layer.

19. The display substrate of claim 4, wherein, The pixel defining portion has a thickness of 0.2-0.7 microns. 20.The display substrate of claim 6, wherein, The first protrusion has a height greater than a thickness of the first electrode.

21. A display substrate, comprising: a substrate; a plurality of sub-pixels on the substrate, each sub-pixel including a first electrode, a light emitting functional layer, and a second electrode stacked, the first electrode being between the light emitting functional layer and the substrate, the light emitting functional layer including a plurality of film layers; a pixel defining pattern on a side of the first electrode away from the substrate, the pixel defining pattern including a plurality of first openings, a plurality of second openings, and a pixel defining portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings being configured to expose the first electrode of the plurality of sub-pixels; an inorganic layer on the substrate; an organic layer between the inorganic layer and the substrate, The display substrate includes a limiting structure, and the second openings are configured to expose at least part of the limiting structure. The limiting structure includes an inorganic limiting layer in which the inorganic layer is located between adjacent sub-pixels, and at least one protrusion in the organic layer that is in contact with a surface of the inorganic limiting layer. The limiting structure is configured to separate at least one layer of the light-emitting functional layer. The inorganic layer covers at least part of an edge of the first electrode in the sub-pixel. 22.The display substrate of claim 21, wherein, Each sub-pixel further includes a pixel circuit including a light-emitting control transistor, the first electrode is electrically connected to the light-emitting control transistor through a via in the organic layer, and in a direction perpendicular to the substrate substrate, the inorganic layer does not overlap the via.

23. A display substrate, comprising: a substrate substrate; a plurality of sub-pixels on the substrate substrate, each sub-pixel including a first electrode, a light-emitting functional layer, and a second electrode arranged in a stack, the first electrode being located between the light-emitting functional layer and the substrate substrate, the light-emitting functional layer including a plurality of film layers; a pixel limiting pattern on a side of the first electrode away from the substrate substrate, the pixel limiting pattern including a plurality of first openings, a plurality of second openings, and a pixel limiting portion surrounding the plurality of first openings and the plurality of second openings, the plurality of first openings being configured to expose the first electrodes of the plurality of sub-pixels; an inorganic layer on the substrate substrate; an organic layer between the inorganic layer and the substrate substrate, wherein the display substrate includes a limiting structure, and the second openings are configured to expose at least part of the limiting structure. The limiting structure includes an inorganic limiting layer in which the inorganic layer is located between adjacent sub-pixels, and at least one protrusion in the organic layer that is in contact with a surface of the inorganic limiting layer. The limiting structure is configured to separate at least one layer of the light-emitting functional layer. In a direction perpendicular to the substrate substrate, the inorganic layer does not overlap the first electrode.

24. A display substrate, comprising: a substrate substrate; a plurality of sub-pixels on the substrate substrate, each sub-pixel including a first electrode, a light-emitting functional layer, and a second electrode arranged in a stack, the first electrode being located between the light-emitting functional layer and the substrate substrate, the light-emitting functional layer including a plurality of film layers; a pixel limiting pattern on a side of the first electrode away from the substrate substrate, the pixel limiting pattern including a plurality of first openings and a pixel limiting portion surrounding the plurality of first openings, the plurality of first openings being configured to expose the first electrodes of the plurality of sub-pixels; an inorganic layer on a side of the pixel limiting portion away from the substrate substrate, wherein the display substrate includes a limiting structure located between adjacent sub-pixels and configured to separate at least one layer of the light-emitting functional layer; The limiting structure includes an inorganic limiting layer in which the inorganic layer is located between adjacent sub-pixels, and the inorganic limiting layer is in contact with at least a surface of the pixel limiting portion away from the substrate substrate. 25.The display substrate of claim 24, wherein, The limiting structure further includes at least one protrusion in the pixel limiting portion in contact with a surface of the inorganic limiting layer, a side surface of the protrusion and a surface of a portion of the pixel limiting portion other than the protrusion away from the substrate substrate side are parallel to each other, and an included angle between the side surface of the protrusion and the surface of the portion of the pixel limiting portion other than the protrusion away from the substrate substrate side is 80 to 110 degrees. 26.The display substrate according to claim 24 or 25, wherein, In a direction perpendicular to the substrate substrate, the first electrode does not overlap the inorganic layer.

27. The display substrate of any of claims 24-26, wherein, The inorganic layer includes an inorganic covering layer covering a side of the first opening.

28. The display substrate according to any one of claims 24-27, further comprising: a spacer on a side of the first electrode away from the substrate substrate, wherein the inorganic layer is at least on a surface of the spacer away from the substrate substrate.

29. A display device comprising the display substrate according to any one of claims 1-28.

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