Photosensitive glass and preparation method therefor, reinforced photosensitive glass, and use

Abstract

Embodiments of the present application provide photosensitive glass and a preparation method therefor, reinforced photosensitive glass, and a use. By controlling the raw material composition of the photosensitive glass, not only can the photosensitive glass containing Ag2O be ensured to have stable glass components during melting, but also the problem of wear of and damage to a precious metal container caused by silver atoms Ag0 generated by the decomposition of Ag2O can be solved, and it can also be ensured that the exposed area of the photosensitive glass obtained after radiation treatment and heat treatment has extremely low optical transmittance in visible light and near-infrared wavelength ranges, thereby achieving optical signal shielding.

Description

Photosensitive glass and method for producing the same, strengthened photosensitive glass and use thereof

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application No. 202411102134.4, filed on August 12, 2024, entitled “Photosensitive glass and method for producing the same, strengthened photosensitive glass and use thereof”, the content of which is incorporated herein by reference in its entirety. TECHNICAL FIELD

[0003] The present application relates to the technical field of glass, in particular, to a photosensitive glass and a method for producing the same, a strengthened photosensitive glass and a use thereof. BACKGROUND

[0004] Photosensitive glass can respond to external light stimulation, and the structure and phase of the glass will change under certain light conditions, showing different mechanical and optical properties. Ag-containing photosensitive glass is the most common type of photosensitive glass, and Ag is usually combined with Ce ions and Sb ions. During the melting process, Sb 3+ Ce 4+ can transfer an electron to Ce 3+ , and Ce 3+ can transfer an electron to Ag + , and Ag 0 can be reduced to Ag 0 , which acts as a growth center for colloidal Ag crystals. Subsequent heat treatment can cause the precipitation and growth of Ag colloids, and due to the close lattice constant, Ag colloidal crystals can induce the precipitation of lithium metasilicate crystals. Based on the above reaction chain principle, Corning and Schott developed Fotoform / Fotoceram and Foturan products, respectively, which can realize micro-mechanical processing of glass through subsequent etching of the glass, and are used in MEMS, TGV, and microfluidic glass chips.

[0005] Ag-containing photosensitive glass has many problems during the melting process, such as the use of corundum and quartz containers, which can greatly affect the final glass composition during high-temperature melting, and the melting container is also prone to breakage. The use of precious metal containers (especially platinum, rhodium, and other metal containers) can cause corrosion of the container by Ag in the glass composition, and long-term melting can cause serious damage and destruction to the container (melting containers include crucibles, kilns, channels, etc.). Therefore, it is an urgent technical problem to ensure the stability of the melting process, maintain the stability of the glass composition, and reduce and avoid damage to the container during the melting process.

[0006] The system photosensitive glass, its application mainly concentrates in the glass micro mechanical processing aspect, and the application in the optical aspect has not been reported. Actually, in the UV exposure area, the optical transmittance of the photosensitive glass will be reduced significantly with the precipitation of colloidal Ag crystal and the precipitation of lithium silicate crystal, which makes the Ag photosensitive glass-ceramics can be applied to shield the optical signal, and through the process of UV exposure combined with mask specific area, the specific area can shield the optical signal of certain wavelength range.

[0007] It should be noted that this part of the present application only provides the background of the present application, and does not necessarily constitute the prior art or the known technology.

[0008] Content of application

[0009] The purpose of the present application is to provide a photosensitive glass which can not only ensure the stability of glass components during melting of Ag2O-containing photosensitive glass, but also solve the problem of damage to precious metal containers due to the decomposition of Ag2O to produce silver atoms Ag 0 Moreover, it can also ensure that the optical transmittance of the exposed area of the photosensitive glass in the visible and near-infrared wavelength range is extremely low after radiation treatment and heat treatment, and can achieve shielding of the optical signal.

[0010] In order to achieve the above-mentioned purpose, the present application provides the following technical solutions:

[0011] In a first aspect, a photosensitive glass is provided, which comprises the following components in terms of the mass percentage of each component in the photosensitive glass: 50wt%-60wt% of silica sand, 15wt%-22wt% of lithium carbonate, 6wt%-10wt% of aluminum hydroxide, 3wt%-6wt% of potassium nitrate, 3wt%-6wt% of sodium nitrate, 3wt%-5wt% of zirconium oxide, 0.3wt%-0.6wt% of silver nitrate, 0.05wt%-0.10wt% of cerium oxide, and pentavalent antimony salt; wherein the mass percentage of pentavalent antimony salt in the composition of the photosensitive glass is 0.3wt%-0.8wt% in terms of sodium antimonate.

[0012] Optionally, the composition of the photosensitive glass comprises the following components in terms of the mass percentage of each component in the photosensitive glass:

[0013] The content of silica sand is 53wt%-59wt%, preferably the content of silica sand is 54.00wt%-58.96wt%, and / or,

[0014] The content of lithium carbonate is 17wt%-20wt%, preferably the content of lithium carbonate is 17.43wt%-19.94wt%, and / or,

[0015] the content of aluminum hydroxide is 8wt% to 10wt%, preferably the content of aluminum hydroxide is 8.22wt% to 9.97wt%, and / or,

[0016] the content of potassium nitrate is 4wt% to 6wt%, preferably the content of potassium nitrate is 4.07wt% to 5.97wt%, and / or,

[0017] the content of sodium nitrate is 3.5wt% to 5.5wt%, preferably the content of sodium nitrate is 3.77wt% to 5.45wt%, and / or,

[0018] the content of zirconium oxide is 3.33wt% to 5wt%, preferably the content of zirconium oxide is 3.33wt% to 4.96wt%, and / or,

[0019] the content of silver nitrate is 0.3wt% to 0.5wt%, preferably the content of silver nitrate is 0.32wt% to 0.49wt%, and / or,

[0020] the content of cerium oxide is 0.05wt% to 0.09wt%, preferably the content of cerium oxide is 0.06wt% to 0.09wt%, and / or,

[0021] the content of pentavalent antimony salt is 0.3wt% to 0.7wt%, preferably the content of pentavalent antimony salt is 0.3wt% to 0.5wt%.

[0022] Optionally, the pentavalent antimony salt comprises at least one of NaSbO3, KSbO3, NH4SbO3 and hydrates thereof.

[0023] Optionally, the photosensitive glass has a thickness of 0.4-2.0mm.

[0024] Optionally, the photosensitive glass comprises an exposed region and a non-exposed region, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the exposed region of the photosensitive glass has a transmittance T1 of 0.00% to 5.00% at a wavelength of 850nm, preferably the transmittance T1 is 0.00% to 3%, and / or, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the exposed region of the photosensitive glass has a transmittance T2 of 0.00% to 5.00% at a wavelength of 550nm, preferably the transmittance T2 is 0.00% to 2%, and / or, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the non-exposed region of the photosensitive glass has a transmittance T3 of 90% or above at a wavelength of 850nm, and / or, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the non-exposed region of the photosensitive glass has a transmittance T4 of 90% or above at a wavelength of 550nm.

[0025] In a second aspect, a method for preparing the photosensitive glass is provided, comprising:

[0026] The raw materials are configured, mixed and melted in a noble metal container, then formed, and then annealed to obtain the base glass;

[0027] The base glass comprises a first region and a second region, the first region is masked, and the second region is not masked to obtain the masked base glass;

[0028] The masked base glass is subjected to radiation treatment and heat treatment to obtain the photosensitive glass having a non-exposed region and an exposed region, wherein the non-exposed region corresponds to the first region, and the exposed region corresponds to the second region.

[0029] Optionally, the noble metal container is made of at least one of gold, platinum and rhodium.

[0030] Optionally, the melting temperature is 1400-1650°C, and the melting time is 6-48h.

[0031] Optionally, the annealing temperature is 400-500°C, and the annealing time is 8-24h.

[0032] Optionally, the masking treatment comprises masking using a masking ink and / or a mask plate.

[0033] Optionally, the radiation treatment comprises ultraviolet irradiation treatment.

[0034] Optionally, the ultraviolet irradiation treatment has a wavelength of 300-320nm, an intensity of 20-360mw / cm 2 , and a time of 5-60min. 2

[0035] Optionally, the heat treatment comprises nucleation treatment and crystallization treatment.

[0036] Optionally, the nucleation treatment has a temperature increasing rate of 1-10°C / min; and / or,

[0037] the nucleation treatment has a temperature of 430-540°C; and / or,

[0038] the nucleation treatment has a time of 30-360min; and / or,

[0039] the crystallization treatment has a temperature increasing rate of 1-10°C / min; and / or,

[0040] the crystallization treatment has a temperature of 540-800°C; and / or, ​

[0041] The crystallization treatment time is 30 minutes to 480 minutes.

[0042] Optionally, the thickness of the substrate glass is 0.4-2.0mm.

[0043] In a third aspect, there is provided a strengthened photosensitive glass, characterized by a thickness t, comprising a strengthening layer and a tensile stress layer, the strengthening layer extending from the surface of the strengthened photosensitive glass in an inward direction, the thickness of the strengthening layer being 0-0.22t.

[0044] The tensile stress layer and / or the center of the strengthened photosensitive glass comprises the following components in terms of mass percentage of oxides:

[0045] SiO2: 65%-74.00%, Al2O3: 5.00%-10.00%, Li2O: 7.90%-12.00%, Na2O: 1.00%-3.00%, K2O: 1.50%-3.80%, ZrO2: 3.5%-6.50%, Ag2O: 0.20%-0.50%, CeO2: 0.07%-0.13%, and Sb2O3: 0.2%-0.50%;

[0046] The strengthening layer comprises the following components in terms of mass percentage of oxides:

[0047] SiO2: 65%-74.00%, Al2O3: 5.00%-10.00%, Na2O: 4.00%-16.00%, K2O: 2.0%-5.0%, ZrO2: 3.5%-6.50%, Ag2O: 0.20%-0.50%, CeO2: 0.07%-0.13%, and Sb2O3: 0.2%-0.50%; the content of Li2O in the strengthening layer is lower than the content of Li2O in the tensile stress layer and / or the center of the strengthened photosensitive glass;

[0048] Wherein, Na2O is obtained by sodium nitrate, K2O is obtained by potassium nitrate, Ag2O is obtained by silver nitrate, and Sb2O3 is obtained by pentavalent antimony salt;

[0049] The strengthened photosensitive glass comprises a non-exposed region and an exposed region.

[0050] Optionally, t is 0.4-2.0mm.

[0051] Optionally, the single bar static pressure strength of the strengthened photosensitive glass is above 200N, preferably 200N-500N, more preferably 200N-490N.

[0052] In a fourth aspect, there is provided a cover glass made of the photosensitive glass according to any one of the embodiments of the first aspect, the photosensitive glass prepared by the method according to any one of the embodiments of the second aspect, or the strengthened photosensitive glass according to any one of the embodiments of the third aspect.

[0053] In a fifth aspect, there is provided an electronic device comprising the photosensitive glass according to any one of the embodiments of the first aspect, the photosensitive glass prepared by the method according to any one of the embodiments of the second aspect, or the strengthened photosensitive glass according to any one of the embodiments of the third aspect.

[0054] Optionally, the electronic device comprises a housing having a top portion and a bottom portion, and the bottom portion of the housing comprises the photosensitive glass according to any one of the embodiments of the first aspect, the photosensitive glass prepared by the method according to any one of the embodiments of the second aspect, or the strengthened photosensitive glass according to the third aspect.

[0055] Optionally, the electronic device further comprises a camera assembly, and the housing of the electronic device comprises a camera protective cover plate covering the camera assembly, and the camera protective cover plate comprises the photosensitive glass according to any one of the embodiments of the first aspect, the photosensitive glass prepared by the method according to any one of the embodiments of the second aspect, or the strengthened photosensitive glass according to the third aspect.

[0056] In a sixth aspect, there is provided a use of the photosensitive glass according to any one of the embodiments of the first aspect, the photosensitive glass prepared by the method according to any one of the embodiments of the second aspect, or the strengthened photosensitive glass according to any one of the embodiments of the third aspect, for a component in a mobile phone, a smart watch, a wearable device, a camera module, or a vehicle.

[0057] Compared with the prior art, one or more of the above technical solutions provided in the present application have the following advantages:

[0058] By controlling the raw material composition of the photosensitive glass, the stability of the glass composition during melting of the Ag2O-containing photosensitive glass can be ensured, and the problem of damage to the precious metal container due to the decomposition of Ag2O to generate silver atoms Ag 0 the precious metal container, and also ensures that the exposure area of the photosensitive glass obtained after radiation treatment and heat treatment has extremely low optical transmittance in the visible light and near-infrared wavelength range, thereby achieving shielding of the optical signal. BRIEF DESCRIPTION OF DRAWINGS

[0059] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly introduced as follows. It should be understood that the following drawings only show some of the embodiments of the present application, and therefore should not be regarded as limiting the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0060] Fig. 1 is a structural schematic diagram of a substrate glass after masking using a masking ink according to an embodiment of the present application.

[0061] Fig. 2 is a structural schematic diagram of a photosensitive glass according to an embodiment of the present application.

[0062] Fig. 3 is a structural schematic diagram of an electronic device which is a mobile phone according to an embodiment of the present application.

[0063] Fig. 4 is a structural schematic diagram of an electronic device which is a smart watch according to an embodiment of the present application.

[0064] Fig. 5 is a photograph of the inner side of a crucible after melting according to Examples 9-10 and Comparative Examples 1-2; wherein a. is a photograph of the bottom of the crucible of Comparative Example 1, b. is a photograph of the bottom of the crucible of Comparative Example 2, c. is a photograph of the bottom of the crucible of Example 9, and d. is a photograph of the bottom of the crucible of Example 10.

[0065] Fig. 6 is a shielding real object diagram of the exposed area in the visible light range according to Examples 9-10 and Comparative Examples 1-3, wherein the bright light spots in Comparative Examples 1-3 are red light.

[0066] Reference signs: 11 - light transmission area; 12 - light shielding area; 21 - exposed area; 22 - non-exposed area; 31 - camera protective cover plate; 32 - camera assembly; 33 - back cover; 41 - shell at the bottom of the smart watch. DETAILED DESCRIPTION

[0067] The embodiments of the present application will be described in detail below with reference to the embodiments, but those skilled in the art will understand that the following embodiments are only configured to illustrate the present application, and should not be regarded as limiting the scope of the present application. The specific conditions are not specified in the embodiments, and are carried out according to the conventional conditions or the conditions recommended by the manufacturer. The reagents or instruments used are not specified by the manufacturer, and are all conventional products that can be purchased on the market.

[0068] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the ranges, the endpoint values ​​of the ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "optional" mean that they may or may not be included (or may or may not be present). The term "and / or" as used herein is inclusive; for example, "A and / or B" means only A, or only B, or both A and B.

[0069] Terminology and testing methods:

[0070] In this application, the main surface refers to the surface with the largest surface area, such as the upper or lower surface of a horizontally placed substrate glass.

[0071] In this application, when light of a certain wavelength is irradiated onto the main surface of the photosensitive glass, the light will be reflected, absorbed, and transmitted. The ratio of the intensity of the transmitted portion to the intensity of the incident light is the transmittance.

[0072] In this application, the thickness of the glass was obtained by micrometer measurement.

[0073] In this application, the dimensions of the glass slides were measured using a two-dimensional measuring machine (instrument model: MiyuMY~YXCL~4030).

[0074] Main surface Ag / Ag2O concentration test

[0075] In this application, the surface Ag / Ag₂O concentration of the photosensitive glass was measured using X-ray fluorescence spectrometry (XRF), and the testing equipment used was Thermo Scientific ARL. TM PERFORM'X. The target material is Rh (rhodium), the photodiode voltage is 40KW, the current is 60mA, the collimator is 0.15, the crystal is LiF200, the detector is FPC, the test range is a 29mm circle, and the analysis software is UniQuant scale-free analysis. Scale-free XRF testing was used, which did not measure the concentration of elements with atomic numbers 6 and below, or their oxides, in the glass. Specifically, elements such as SiO2, Al2O3, Na2O, and K2O can be accurately measured, while elements such as Li2O and B2O3 cannot. Therefore, in this application, when measuring the Ag / Ag2O concentration on the surface using XRF, the total mass of the surface elements or their oxides does not include the mass of elements with atomic numbers 6 and below, or their oxides, in the glass.

[0076] In the present application, the transmittance of the exposed area and the non-exposed area of the glass to be tested is tested by using a UV-visible spectrophotometer. The UV-visible spectrophotometer used in the present application is UV-2000 UV-visible spectrophotometer of Shimadzu.

[0077] The specific method for testing the exposed area of the glass to be tested is as follows: first, using a jig with the same shape and size as the glass to be tested, and the same area corresponding to the exposed area of the glass to be tested is a hollow area, and the area corresponding to the non-exposed area of the glass to be tested is a non-transparent area, and the linking position of the hollow area and the non-transparent area is a non-transparent jig as a blank sample for testing and correction, then cutting the exposed area of the glass to be tested into a sample with the same shape as the hollow area of the jig, and placing it into the hollow area of the jig for testing to obtain the transmittance. The transmittance of the exposed area of 5 pieces of glass to be tested in the same batch to light of different wavelengths is tested by using a UV-visible spectrophotometer, and then the average value is taken as the transmittance result of the exposed area of the glass to be tested under the light of the wavelength.

[0078] In addition, the transmittance of the non-exposed area of 5 pieces of glass to be tested in the same batch to light of different wavelengths is tested by using a UV-visible spectrophotometer. The average value of the transmittance of the non-exposed area of the 5 pieces of glass to be tested under light of different wavelengths is taken as the transmittance result of the non-exposed area of the glass to be tested under the light of the wavelength.

[0079] In the present application, the test of single rod static pressure strength can be as follows: placing the glass sample to be tested on the bottom ring of a tensile testing machine (LT-850A), starting the test software, setting the moving speed of the extrusion rod (rod diameter 8mm, pressure head arc radius 10mm) to 50mm / min, clicking start test, and the extrusion rod will apply force to the center of the glass sample to be tested at the set moving speed until the glass sample cracks and breaks. The test software will automatically read the force (N) when the glass sample breaks as the test result. Take 10 pieces of glass samples in the same state for testing, and take the average value of the test results as the single rod static pressure strength of the glass sample to be tested.

[0080] In the present application, the wavelength range of visible light and near infrared is 400nm-1000nm.

[0081] In the present application, the glass component contains Ag2O, which will undergo the following reversible reaction during melting:

[0082] And the silver atom Ag produced by decomposition 0 Therefore, in order to prevent Ag2O from decomposing Ag 0 The precious metal container for mixing and melting raw materials is eroded and damaged, and the present application uses other raw material components that can provide an oxygen atmosphere except Ag2O for melting to inhibit the conversion of Ag2O to Ag0 The preferred raw material components that can provide an oxygen atmosphere include nitrates and / or pentavalent antimony salts. Specifically, nitrates are used as raw material components, including NaNO3, KNO3, AgNO3, etc. Nitrates decompose to produce O2 during the melting process, and the specific reaction is as follows, thereby providing an oxidizing atmosphere that can inhibit the decomposition of Ag2O.

[0083] In addition, pentavalent antimony salts, including NaSbO3, KSbO3, NH4SbO3, and their hydrates, can also decompose during the melting process to generate an oxygen atmosphere, thereby inhibiting the conversion of Ag2O to Ag. 0 Taking NaSbO3 as an example, the specific reaction is as follows: 2NaSbO3→Na2O+Sb2O3+O2↑

[0084] In addition, Sb 5+ Sb is produced during the decomposition of antimony salts in the melting process. 3+ It can act as a reducing agent to convert Ce in glass. 4+ Restored to Ce 3+ Maintain Ce 3+ The effective content; and then in the later exposure area of ​​the photosensitive glass under radiation conditions such as ultraviolet irradiation, Ce 3+ Ag + Restored to Ag 0 Ag 0 As a growth center, Ag can then undergo heat treatment. 0 Clustered crystal nuclei induce the precipitation of lithium metasilicate crystals.

[0085] This application controls the composition of the photosensitive glass to ensure that the Ag₂O-containing photosensitive glass remains stable during the melting process, without any Ag₂O. 0 This leads to the generation and resolution of Ag produced by the decomposition of Ag2O. 0 It eliminates the problem of corrosion and damage to molten precious metal containers, and also ensures that after radiation and heat treatment, the exposed area of ​​the photosensitive glass forms an opaque area, achieving shielding of optical signals in the visible and near-infrared wavelength range.

[0086] In some embodiments of the present application, there is provided a photosensitive glass comprising, in terms of mass percentage of each component in the photosensitive glass, 50wt%-60wt% of silica sand, 15wt%-22wt% of lithium carbonate, 6wt%-10wt% of aluminum hydroxide, 3wt%-6wt% of potassium nitrate, 3wt%-6wt% of sodium nitrate, 3wt%-5wt% of zirconium oxide, 0.3wt%-0.6wt% of silver nitrate, 0.05wt%-0.10wt% of cerium oxide, and pentavalent antimony salt; wherein the mass percentage of pentavalent antimony salt in the composition of the photosensitive glass is 0.3wt%-0.8wt% in terms of sodium antimonate.

[0087] The type of crystal precipitated from the photosensitive glass during the crystallization process is mainly lithium metasilicate (Li2SiO3), and the precipitation of Li2SiO3 is conducive to reducing the optical transmittance of the exposed area of the photosensitive glass and shielding the optical signal in the visible and near-infrared wavelength range. In the present application, SiO2 is a glass-forming oxide, which is derived from silica sand and serves as the network skeleton of the glass. In some embodiments of the present application, the content of silica sand is 53wt%-60wt%, preferably 53wt%-59wt%, and more preferably 54.00wt%-58.96wt% in terms of mass percentage of each component in the photosensitive glass.

[0088] In some embodiments of the present application, the content of silica sand can be 53wt%, 53.5wt%, 54wt%, 54.5wt%, 55wt%, 55.5wt%, 56wt%, 56.5wt%, 57wt%, 57.5wt%, 58wt%, 58.5wt%, 58.96wt%, 59wt% or 60wt%, or a value within a value range constituted by any two of the above specific values as endpoints. It should be understood that in the embodiments, any of the above ranges can be combined with any other range.

[0089] In some embodiments of the present application, the content of lithium carbonate is 15wt% to 22wt%, preferably 15wt% to 20wt%, more preferably 17wt% to 20wt%, according to the mass percentage of each component in the photosensitive glass. In some embodiments of the present application, the content of lithium carbonate can be 15wt%, 16wt%, 17wt%, 17.43wt%, 17.5wt%, 18wt%, 18.5wt%, 19wt%, 19.5wt%, 19.94wt%, 20wt%, 21wt% or 22wt%, or a value within a range formed by any two of the above specific values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0090] In the present application, Al2O3 acts as a glass network intermediate, entering the glass network structure as [AlO4] tetrahedron. Alumina, which is derived from aluminum hydroxide, can increase the stability of the photosensitive glass. In some embodiments of the present application, the content of aluminum hydroxide is 6wt% to 10wt%, preferably 8wt% to 10wt%, more preferably 8.22wt% to 9.97wt%, according to the mass percentage of each component in the photosensitive glass. In some embodiments of the present application, the content of aluminum hydroxide can be 6wt%, 7wt%, 8wt%, 8.22wt%, 8.5wt%, 8.7wt%, 9wt%, 9.2wt%, 9.5wt%, 9.7wt%, 9.97wt% or 10wt%, or a value within a range formed by any two of the above specific values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0091] In this application, zirconium oxide (ZrO2) can improve the chemical stability of photosensitive glass. However, ZrO2 has a high melting point, and excessive addition will lead to a higher melting temperature of the photosensitive glass. In some embodiments of this application, the zirconium oxide content is 3 wt% to 5 wt%, preferably 3.33 wt% to 5 wt%, and more preferably 3.33 wt% to 4.96 wt%, based on the mass percentage of each component in the photosensitive glass. In some embodiments of this application, the zirconium oxide content can be 3.0 wt%, 3.2 wt%, 3.33 wt%, 3.5 wt%, 3.7 wt%, 4.0 wt%, 4.2 wt%, 4.5 wt%, 4.8 wt%, 4.96 wt%, or 5.0 wt%, or a value within the range defined by any two of the above specific values ​​as endpoints. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0092] In this application, Na₂O and K₂O are the outer components of the glass network, acting as fluxes to lower the melting temperature of the glass. + K + In the case of existence, Na + K + The lithium will be preferentially fed into the aluminum-silicon-oxygen network to compensate for the electricity price, which to some extent maintains the lithium content in the lithium-rich region, making the Si / Li ratio in the lithium-rich region closer to the chemical ratio of Li₂SiO₃. This results in the precipitated crystalline phase of the photosensitive glass containing Na₂O and K₂O being lithium metasilicate; Na₂O originates from sodium nitrate, and K₂O from potassium nitrate. In this application, nitrates such as sodium nitrate, potassium nitrate, and / or silver nitrate, combined with antimonates, provide better clarification, thus affecting the transmittance and other properties of the finished product. Carbonates cannot achieve the transmittance effect of the finished product involved in this application.

[0093] In some embodiments of this application, the sodium nitrate content, based on the mass percentage of each component of the raw material in the photosensitive glass, is 3.0–6.0 wt%, preferably 3.5–5.5 wt%, and more preferably 3.77 wt%–5.45 wt%. In some embodiments of this application, the sodium nitrate content, based on the mass percentage of each component of the raw material in the photosensitive glass, can be 3.0 wt%, 3.5 wt%, 3.77 wt%, 4.0 wt%, 4.2 wt%, 4.5 wt%, 4.8 wt%, 5 wt%, 5.3 wt%, 5.45 wt%, or 5.5 wt%, or a value within a range defined by any two of the above specific values ​​as endpoints. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0094] In some embodiments of the application, the potassium nitrate is present in an amount of 3 wt% to 6 wt%, preferably 4 wt% to 6 wt%, more preferably 4.07 wt% to 5.97 wt%, based on the mass percent of each component of the raw material in the photosensitive glass. In some embodiments of the application, the potassium nitrate can be present in an amount of 3.0 wt%, 4.0 wt%, 4.07 wt%, 4.2 wt%, 4.5 wt%, 4.7 wt%, 5.0 wt%, 5.2 wt%, 5.5 wt%, 5.8 wt%, 5.97 wt%, or 6.0 wt%, or a value within a range bounded by any two of these specifically named values. It should be appreciated that in embodiments, any of the above ranges can be combined with any other range.

[0095] In some embodiments of the application, the silver nitrate is present in an amount of 0.3 wt% to 0.6 wt%, preferably 0.30 wt% to 0.5 wt%, more preferably 0.32 wt% to 0.49 wt%, based on the mass percent of each component of the raw material in the photosensitive glass. In some embodiments of the application, the silver nitrate can be present in an amount of 0.30 wt%, 0.32 wt%, 0.35 wt%, 0.37 wt%, 0.40 wt%, 0.43 wt%, 0.45 wt%, 0.49 wt%, 0.50 wt%, or 0.60 wt%, or a value within a range bounded by any two of these specifically named values. It should be appreciated that in embodiments, any of the above ranges can be combined with any other range.

[0096] Cerium oxide (Ce02) is a photosensitizer that provides electrons to Ag + In some embodiments of the application, the cerium oxide is present in an amount of 0.05 wt% to 0.10 wt%, preferably 0.05 wt% to 0.09 wt%, more preferably 0.06 wt% to 0.09 wt%, based on the mass percent of each component of the raw material in the photosensitive glass. In some embodiments of the application, the cerium oxide can be present in an amount of 0.05 wt%, 0.06 wt%, 0.07 wt%, 0.08 wt%, 0.09 wt%, or 0.10 wt%, or a value within a range bounded by any two of these specifically named values. It should be appreciated that in embodiments, any of the above ranges can be combined with any other range.

[0097] In some embodiments of the application, the Sb 5+The amount of the pentavalent antimony salt is sufficient, and in the present application, the content of the pentavalent antimony salt is 0.3wt% to 0.8wt%, preferably 0.31wt% to 0.5wt%, and more preferably 0.31wt% to 0.49wt%, according to the mass percentage content of each component of the raw material in the photosensitive glass, calculated as sodium antimonate.

[0098] In some embodiments of the present application, the content of the pentavalent antimony salt can be 0.30wt%, 0.31wt%, 0.33wt%, 0.35wt%, 0.38wt%, 0.40wt%, 0.43wt%, 0.45wt%, 0.48wt%, 0.49wt%, or 0.50wt%, or a value within a range bounded by any two of the above specific values, according to the mass percentage content of each component of the raw material in the photosensitive glass, calculated as sodium antimonate.

[0099] It should be noted that the pentavalent antimony salt includes, but is not limited to, sodium antimonate, potassium antimonate, ammonium antimonate, and / or hydrates thereof, and in the present application, different types of pentavalent antimony salts are all converted to sodium antimonate.

[0100] In some embodiments of the present application, the pentavalent antimony salt includes at least one of NaSbO3, KSbO3, NH4SbO3, and hydrates thereof.

[0101] In the present application, the photosensitive glass includes an exposed region and a non-exposed region, the exposed region has a low transmittance in the visible and near-infrared wavelength range, and the non-exposed region has a high transmittance in the visible and near-infrared wavelength range. In some embodiments of the present application, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the transmittance T1 of the exposed region of the photosensitive glass at a wavelength of 850nm is 0.00% to 5.00%, and preferably the transmittance T1 is 0.00% to 3%. In some embodiments of the present application, when the thickness of the photosensitive glass is 0.40mm to 1.00mm, the transmittance T1 of the exposed region of the photosensitive glass at a wavelength of 850nm can be 0.00%, 0.22%, 0.50%, 0.88%, 0.96%, 1.00%, 1.27%, 1.55%, 1.59%, 1.64%, 2.00%, 2.30%, 2.51%, 3.00%, 3.50%, 4.00%, 4.50%, 4.80%, or 5.00%; or a value within a range bounded by any two of the above specific values. It should be understood that in the embodiments, any of the above ranges can be combined with any other range.

[0102] In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T2 of the exposed region of the photosensitive glass at a wavelength of 550 nm is 0.00% to 5.00%, preferably the transmittance T2 is 0.00% to 2%. In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T2 of the exposed region of the photosensitive glass at a wavelength of 550 nm can be 0.00%, 0.20%, 0.50%, 0.70%, 0.90%, 1.00%, 1.35%, 1.50%, 1.70%, 2.00%, 2.50%, 3.00%, 3.50%, 4.00%, 4.20%, 4.50%, 4.90%, or 5.00%; or a value within a range bounded by any two of the foregoing specific values as endpoints. It should be understood that in embodiments, any of the foregoing ranges can be combined with any other range.

[0103] In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T3 of the non-exposed region of the photosensitive glass at a wavelength of 850 nm is 90% or more. In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T3 of the non-exposed region of the photosensitive glass at a wavelength of 850 nm can be 90.00%, 90.50%, 91.00%, 91.69%, 91.92%, 92.03%, 92.21%, 93.00%, 93.50%, 94.00%, 94.80%, or 95.00%; or a value within a range bounded by any two of the foregoing specific values as endpoints. It should be understood that in embodiments, any of the foregoing ranges can be combined with any other range.

[0104] In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T4 of the non-exposed region of the photosensitive glass at a wavelength of 550 nm is 90% or more. In some embodiments of the present application, when the photosensitive glass has a thickness of 0.40 mm to 1.00 mm, the transmittance T4 of the non-exposed region of the photosensitive glass at a wavelength of 550 nm can be 90.00%, 90.74%, 91.05%, 91.60%, 92.03%, 92.50%, 93.00%, 93.50%, 94.00%, 94.80%, or 95.00%; or a value within a range bounded by any two of the foregoing specific values as endpoints. It should be understood that in embodiments, any of the foregoing ranges can be combined with any other range.

[0105] In some embodiments of the present application, a method for preparing the photosensitive glass described above is provided, which comprises:

[0106] The raw material components are configured, then mixed and melted in a noble metal container, then formed, and then annealed to obtain the base glass;

[0107] The base glass includes a first region and a second region, the first region is masked, and the second region is not masked to obtain the masked base glass;

[0108] The masked base glass is subjected to radiation treatment and heat treatment to obtain the photosensitive glass having a non-exposed region and an exposed region, wherein the non-exposed region corresponds to the first region, and the exposed region corresponds to the second region.

[0109] In the present application, the container includes but is not limited to a crucible, a crucible, a kiln, a channel, etc., wherein the noble metal container refers to a part at least in contact with the raw materials made of noble metal, wherein the noble metal includes but is not limited to gold, platinum, rhodium, etc. In some embodiments of the present application, the noble metal container is a container prepared by using at least one of gold, platinum, and rhodium.

[0110] In the present application, the base glass can be prepared by using the forming method in the prior art, and the present application does not have any limitation thereon, for example, the forming method of the base glass can include but is not limited to a float method, an overflow method, a drawing method, a calendering method, or a casting method.

[0111] For example, according to the use of the defined raw materials and the corresponding weight fractions for batching, after the raw materials are uniformly mixed, they are segmented and continuously fed into the noble metal container for melting, and the feeding mode can be adjusted according to the different noble metal containers. After the glass melting is completed, the glass bricks are formed, then the glass bricks are transferred to an annealing furnace for annealing treatment, and after the annealing is completed, the glass bricks are naturally cooled to room temperature to obtain the base glass.

[0112] In some embodiments of the present application, the composition of the base glass of the present application is the same as or substantially the same as that of the photosensitive glass; and the specific composition is as described above.

[0113] In some embodiments of the present application, the melting temperature is 1400°C to 1650°C, and the melting time is 6h to 48h. In some embodiments of the present application, the melting temperature can be 1400°C, 1475°C, 1500°C, 1525°C, 1550°C, 1575°C, 1600°C, 1625°C, or 1650°C, or a value within a value range with any two of the above specific values as endpoints. It should be understood that in the embodiments, any of the above ranges can be combined with any other range.

[0114] In some embodiments of this application, the melting time can be any value among 6h, 9h, 12h, 15h, 18h, 21h, 24h, 27h, 30h, 33h, 36h, 39h, 42h, 45h, and 48h, or a value within a range defined by any two of the above specific values ​​as endpoints. It should be understood that, in specific embodiments, any of the above ranges can be combined with any other range, as long as the photosensitive glass with the desired performance of this application is obtained.

[0115] In some embodiments of this application, the annealing temperature is 400℃ to 500℃, and the annealing time is 8 hours to 24 hours. In some embodiments of this application, the annealing temperature is 400℃, 410℃, 420℃, 430℃, 440℃, 450℃, 460℃, 470℃, 480℃, 490℃, or 500℃, or a value within a range defined by any two of the above specific values ​​as endpoints. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0116] In some embodiments of this application, the annealing time can be 5h, 6h, 7h, 8h, 10h, 12h, 14h, 16h, 18h, 20h, 22h, or 24h, or a value within a range defined by any two of the above specific values ​​as endpoints. It should be understood that, in embodiments, any of the above ranges can be combined with any other range.

[0117] In some embodiments of this application, the masking process includes masking using masking ink and / or a mask plate.

[0118] For example, a schematic diagram of the structure of the substrate glass after being masked with masking ink is shown in Figure 1. The composite circular hole has a light-transmitting area 11 with an inner diameter and a light-blocking area 12 other than the inner diameter. A schematic diagram of the structure of the corresponding photosensitive glass is shown in Figure 2. The position corresponding to the light-transmitting area 11 forms an exposure area 21, and the position corresponding to the light-blocking area 12 forms a non-exposure area 22.

[0119] In some embodiments of this application, the radiation treatment method includes ultraviolet irradiation treatment.

[0120] In some embodiments of this application, the wavelength of the ultraviolet irradiation treatment is 300 nm to 320 nm, and the intensity of the ultraviolet irradiation treatment is 20 mw / cm². 2 ~360mw / cm 2 The ultraviolet irradiation treatment time is 5 min to 60 min.

[0121] In some embodiments of the application, the wavelength of the UV irradiation treatment is 300 nm, 302 nm, 305 nm, 308 nm, 310 nm, 312 nm, 315 nm, 317 nm, or 320 nm, or a value within a range defined by any two of the foregoing values as endpoints. In some embodiments of the application, the intensity of the UV irradiation treatment is 20 mw / cm 2 , 40 mw / cm 2 , 60 mw / cm 2 , 80 mw / cm 2 , 100 mw / cm 2 , 120 mw / cm 2 , 140 mw / cm 2 , 160 mw / cm 2 , 180 mw / cm 2 , 200 mw / cm 2 , 210 mw / cm 2 , 220 mw / cm 2 , 230 mw / cm 2 , 240 mw / cm 2 , 250 mw / cm 2 , 260 mw / cm 2 , 270 mw / cm 2 , 280 mw / cm 2 , 290 mw / cm 2 , 300 mw / cm 2 , 310 mw / cm 2 , 320 mw / cm 2 , 330 mw / cm 2 , 340 mw / cm 2 , 350 mw / cm 2 , or 360 mw / cm 2 , or a value within a range defined by any two of the foregoing values as endpoints. In some embodiments of the application, the time of the UV irradiation treatment is 5 min, 10 min, 15 min, 20 min, 25 min, 30 min, 35 min, 40 min, 45 min, 50 min, 55 min, or 60 min, or a value within a range defined by any two of the foregoing values as endpoints; so long as a photosensitive glass having the desired properties of the application is obtained. It should be understood that in specific embodiments, any of the foregoing ranges can be combined with any other range, so long as a photosensitive glass having the desired properties of the application is obtained.

[0122] In some embodiments of the present application, the heat treatment includes a nucleation treatment and a crystallization treatment. The nucleation treatment and the crystallization treatment are common processes in the art.

[0123] In some embodiments of the present application, the temperature increasing rate of the nucleation treatment is 1-10°C / min. In some embodiments of the present application, the temperature increasing rate of the nucleation treatment can be 1°C / min, 2°C / min, 3°C / min, 4°C / min, 5°C / min, 6°C / min, 7°C / min, 8°C / min, 9°C / min or 10°C / min, or a value within a range between any two of the foregoing values as endpoints. In some embodiments of the present application, the temperature of the nucleation treatment can be 430-500°C. In some embodiments of the present application, the temperature of the nucleation treatment can be 430°C, 440°C, 450°C, 460°C, 470°C, 480°C, 490°C or 500°C, or a value within a range between any two of the foregoing values as endpoints. In some embodiments of the present application, the time of the nucleation treatment is 30-360 min. In some embodiments of the present application, the time of the nucleation treatment can be 30 min, 45 min, 50 min, 55 min, 60 min, 90 min, 100 min, 120 min, 140 min, 150 min, 160 min, 170 min, 180 min, 190 min, 200 min, 220 min, 240 min, 280 min, 300 min, 320 min, 340 min or 360 min, or a value within a range between any two of the foregoing values as endpoints.

[0124] In some embodiments of the present application, the temperature increasing rate of the crystallization treatment is 1-10°C / min. In some embodiments of the present application, the temperature increasing rate of the crystallization treatment can be 1°C / min, 2°C / min, 3°C / min, 4°C / min, 5°C / min, 6°C / min, 7°C / min, 8°C / min, 9°C / min or 10°C / min, or a value within a range between any two of the foregoing values as endpoints.

[0125] In some embodiments of the present application, the temperature of the one-step crystallization process can be 500°C to 800°C. In some embodiments of the present application, the temperature of the one-step crystallization process can be 500°C, 510°C, 520°C, 530°C, 540°C, 550°C, 560°C, 570°C, 580°C, 600°C, 650°C, 700°C, 750°C, or 800°C, or a value within a range having a value of any two of the aforementioned specific numerical values as endpoints. In some embodiments of the present application, the time of the one-step crystallization process is 30 min to 480 min. In some embodiments of the present application, the time of the one-step crystallization process can be 30 min, 45 min, 50 min, 55 min, 60 min, 90 min, 100 min, 120 min, 140 min, 150 min, 160 min, 170 min, 180 min, 190 min, 200 min, 220 min, 240 min, 280 min, 300 min, 340 min, 380 min, 400 min, 430 min, 450 min, or 480 min, or a value within a range having a value of any two of the aforementioned specific numerical values as endpoints.

[0126] In some embodiments of the present application, the multi-step crystallization process includes a two-step crystallization process. In some embodiments of the present application, the temperature of the first step of the two-step crystallization process is 500°C to 560°C, and the temperature of the second step of the two-step crystallization process is 560°C to 800°C. It can be understood that the temperature of the second step of the two-step crystallization process is higher than the temperature of the first step of the two-step crystallization process.

[0127] In some embodiments of the present application, the temperature of the first step of the two-step crystallization process can be 500°C, 510°C, 520°C, 530°C, 540°C, 550°C, or 560°C, or a value within a range having a value of any two of the aforementioned specific numerical values as endpoints. In some embodiments of the present application, the temperature of the second step of the two-step crystallization process can be 560°C, 570°C, 580°C, 600°C, 650°C, 700°C, 750°C, or 800°C, or a value within a range having a value of any two of the aforementioned specific numerical values as endpoints.

[0128] In some embodiments of the present application, the first crystallization process in the two-step crystallization process has a time period of 30 min to 240 min, and the second crystallization process has a time period of 30 min to 240 min. In some embodiments of the present application, the first crystallization process in the two-step crystallization process can have a time period of 30 min, 45 min, 50 min, 55 min, 60 min, 90 min, 100 min, 120 min, 140 min, 150 min, 160 min, 170 min, 180 min, 190 min, 200 min, 220 min, or 240 min, or a value within a range having any two of the foregoing as endpoints. In some embodiments of the present application, the second crystallization process in the two-step crystallization process can have a time period of 30 min, 45 min, 50 min, 55 min, 60 min, 90 min, 100 min, 120 min, 140 min, 150 min, 160 min, 170 min, 180 min, 190 min, 200 min, 220 min, or 240 min, or a value within a range having any two of the foregoing as endpoints.

[0129] Before and / or after the heat treatment, one skilled in the art can also perform other conventional steps to obtain a photosensitive glass sample that meets the required specifications or requirements, such as performing a shaping process, a cutting process (e.g., using a multi-wire saw), a CNC machining process (computer numerical control), a thinning process, or a polishing process. The size of the photosensitive glass in the present application is not limited, and can be, for example, 50 mm x 50 mm x 1.0 mm, 300 mm x 120 mm x 0.7 mm, etc.

[0130] In some embodiments of the present application, the thickness of the substrate glass and / or the photosensitive glass of the present application is not particularly limited, and can be, for example, 0.4 to 2.0 mm. In some embodiments of the present application, the thickness of the photosensitive glass of the present application can be 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1.0 mm, 1.2 mm, 1.4 mm, 1.6 mm, 1.8 mm, or 2.0 mm, or a value within a range having any two of the foregoing as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0131] In some embodiments of the present application, a strengthened photosensitive glass having a thickness of t is provided, comprising a strengthened layer and a tensile stress layer, the strengthened layer extending from the surface of the strengthened photosensitive glass in a direction towards the interior, the thickness of the strengthened layer being 0 to 0.22t.

[0132] The central part of the stress layer and / or the strengthened photosensitive glass comprises the following components in terms of mass percentage of oxides:

[0133] SiO2: 65% to 74.00%, Al2O3: 5.00% to 10.00%, Li2O: 7.90% to 12.00%, Na2O: 1.00% to 3.00%, K2O: 1.50% to 3.80%, ZrO2: 3.5% to 6.50%, Ag2O: 0.20% to 0.50%, CeO2: 0.07% to 0.13%, and Sb2O3: 0.2% to 0.50%;

[0134] The strengthened layer comprises the following components in terms of mass percentage of oxides:

[0135] SiO2: 65% to 74.00%, Al2O3: 5.00% to 10.00%, Na2O: 4.00% to 16.00%, K2O: 2.0% to 5.0%, ZrO2: 3.5% to 6.50%, Ag2O: 0.20% to 0.50%, CeO2: 0.07% to 0.13%, and Sb2O3: 0.2% to 0.50%; the content of Li2O in the strengthened layer is lower than the content of Li2O at the central part of the stress layer and / or the strengthened photosensitive glass;

[0136] The Na2O is obtained by sodium nitrate, the K2O is obtained by potassium nitrate, the Ag2O is obtained by silver nitrate, and the Sb2O3 is obtained by a pentavalent antimony salt.

[0137] The strengthened photosensitive glass comprises a non-exposed region and an exposed region.

[0138] In some embodiments of the present application, a strengthened photosensitive glass is provided, having a thickness of t, and the strengthened photosensitive glass is obtained by chemically strengthening the photosensitive glass of any of the above embodiments.

[0139] In some embodiments of the present application, the above strengthened photosensitive glass comprises a strengthened layer and a stress layer, and the strengthened layer comprises the following components in terms of mass percentage of oxides:

[0140] SiO2: 65% to 74.00%, Al2O3: 5.00% to 10.00%, Na2O: 4.00% to 16.00%, K2O: 2.0% to 5.0%, ZrO2: 3.5% to 6.50%, Ag2O: 0.20% to 0.50%, CeO2: 0.07% to 0.13%, and Sb2O3: 0.2% to 0.50%; the content of Li2O in the strengthened layer is lower than the content of Li2O at the central part of the stress layer and / or the strengthened photosensitive glass;

[0141] Na2O is obtained by sodium nitrate, K2O is obtained by potassium nitrate, Ag2O is obtained by silver nitrate, and Sb2O3 is obtained by pentavalent antimony salt;

[0142] The central tensile stress layer and / or the strengthened photosensitive glass comprises the following components in mass percentage of oxides:

[0143] SiO2: 65% to 74.00%, Al2O3: 5.00% to 10.00%, Li2O: 7.90% to 12.00%, Na2O: 1.00% to 3.00%, K2O: 1.50% to 3.80%, ZrO2: 3.5% to 6.50%, Ag2O: 0.20% to 0.50%, CeO2: 0.07% to 0.13%, and Sb2O3: 0.2% to 0.50%.

[0144] In the present application, SiO2 is a glass-forming oxide, which forms an irregular continuous network with a structural unit of silicon-oxygen tetrahedron, and is the skeleton of the glass. In some embodiments of the present application, the content of SiO2 in the strengthened layer or the central tensile stress layer of the strengthened photosensitive glass is 65.00% to 74.00%, preferably 66.00% to 73.20%, in mass percentage of oxides.

[0145] In some embodiments of the present application, the content of SiO2 in the strengthened layer or the central tensile stress layer of the strengthened photosensitive glass is 65.00%, 66.00%, 67.00%, 68.00%, 69.00%, 70.00%, 71.00%, 72.00%, 73.00%, or 74.00%, or a value within a range formed by any two of the above specific values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0146] In the present application, Al2O3 is a glass network intermediate, which enters the glass network structure in the form of [AlO4] tetrahedron. Increasing Al2O3 can increase the T g temperature of the glass, enhance the thermal stability, and is conducive to inhibiting phase separation during heat treatment of the glass, but excessive Al2O3 can increase the melting temperature of the glass. In some embodiments of the present application, the content of Al2O3 in the strengthened layer or the central tensile stress layer of the strengthened photosensitive glass is 5.00% to 10.00%, preferably 5.10% to 9.70%, and more preferably 5.20% to 9.40%, in mass percentage of oxides.

[0147] In some embodiments of the application, the content of Al2O3 in the strengthened layer or the compressive stress layer or the center of the strengthened photosensitive glass can be 5.00%, 5.50%, 6.00%, 6.50%, 7.00%, 7.50%, 8.00%, 8.50%, 9.00%, 9.50%, 10.00%, 7.25%, 5.83%, 8.76%, 7.62%, 7.89%, 6.47%, or 8.96% in terms of mass percentage of oxide, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0148] In some embodiments of the application, the content of Li2O in the strengthened layer of the strengthened photosensitive glass is 7.90% to 12.00% in terms of mass percentage of oxide.

[0149] In some embodiments of the application, the content of Li2O in the compressive stress layer or the center of the strengthened photosensitive glass can be 7.90%, 8.00%, 8.50%, 9.00%, 9.50%, 10.00%, 10.50%, 11.00%, 11.50%, or 12.00% in terms of mass percentage of oxide, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0150] In some embodiments of the application, the content of Li2O in the strengthened layer is lower than the content of Li2O in the compressive stress layer and / or the center of the strengthened photosensitive glass.

[0151] In some embodiments of the application, the content of Na2O in the compressive stress layer or the center of the strengthened photosensitive glass is 1.00% to 3.00%, preferably 1.00% to 2.80% in terms of mass percentage of oxide. In some embodiments of the application, the content of Na2O in the compressive stress layer or the center of the strengthened photosensitive glass can be 1.00%, 1.10%, 1.20%, 1.30%, 1.40%, 1.50%, 1.60%, 1.70%, 1.80%, 1.90%, 2.00%, 2.10%, 2.20%, 2.30%, 2.40%, 2.50%, 2.60%, 2.70%, 2.80%, 2.90%, or 3.00% in terms of mass percentage of oxide, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0152] In some embodiments of the application, the content of Na20 in the strengthened layer of the strengthened photosensitive glass is 4.00% to 16.00%, preferably 4.00% to 15.00%, in terms of mass percentage of oxides. In some embodiments of the application, the content of Na20 in the strengthened layer of the strengthened photosensitive glass can be 4.00%, 4.50%, 4.80%, 5.00%, 5.40%, 5.80%, 6.60%, 6.90%, 7.00%, 7.20%, 7.80%, 8.00%, 8.50%, 8.90%, 9.00%, 9.50%, 10.0%, 10.30%, 10.80%, 11.00%, 11.50%, 12.00%, 12.50%, 12.90%, 13.00%, 13.50%, 14.00%, 14.50%, 15.00%, 15.60%, 15.90%, or 16.00%, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0153] In some embodiments of the application, the content of K20 in the tension stress layer or center of the strengthened photosensitive glass is 1.50% to 3.80%, preferably 1.80% to 3.50%, in terms of mass percentage of oxides. In some embodiments of the application, the content of K20 in the tension stress layer or center of the strengthened photosensitive glass can be 1.50%, 1.80%, 2.00%, 2.30%, 2.40%, 2.80%, 3.00%, 3.30%, 3.40%, 3.50%, 3.60%, 3.70%, or 3.80%, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0154] In some embodiments of the application, the content of K20 in the strengthened layer of the strengthened photosensitive glass is 2.00% to 5.00%, preferably 2.20% to 4.90%, in terms of mass percentage of oxides. In some embodiments of the application, the content of K20 in the strengthened layer of the strengthened photosensitive glass can be 2.00%, 2.50%, 2.80%, 3.00%, 3.40%, 3.80%, 4.00%, 4.30%, 4.80%, or 5.00%, or a value within a range formed by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0155] In some embodiments of the application, the content of Zr02in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass is 3.50% to 6.50% by mass percent of oxide, preferably 3.80% to 6.40% by mass percent of oxide. In some embodiments of the application, the content of Zr02in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass can be 3.50%, 3.80%, 4.00%, 4.30%, 4.80%, 5.00%, 5.30%, 5.70%, 5.80%, 5.90%, 6.00%, 6.20%, or 6.50% by mass percent of oxide, or a value within a range defined by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0156] In some embodiments of the application, the content of Ag20 in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass is 0.20% to 0.50% by mass percent of oxide, preferably 0.20% to 0.49% by mass percent of oxide. In some embodiments of the application, the content of Ag20 in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass can be 0.20%, 0.22%, 0.24%, 0.26%, 0.28%, 0.30%, 0.32%, 0.34%, 0.36%, 0.38%, 0.40%, 0.42%, 0.44%, 0.46%, 0.48%, or 0.50% by mass percent of oxide, or a value within a range defined by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0157] In some embodiments of the application, the content of Ce02in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass is 0.07% to 0.13% by mass percent of oxide, preferably 0.08% to 0.12% by mass percent of oxide.

[0158] In some embodiments of the application, the content of Ce02in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass can be 0.07%, 0.08%, 0.09%, 0.10%, 0.11%, 0.12%, or 0.13% by mass percent of oxide, or a value within a range defined by any two of the above specific numerical values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0159] In the present application, Sb203is a weak reducing agent, and at the same time, it also plays the role of a fining agent. Sb 3+ In the glass melting process, Ce 4+3+ In some embodiments of the present application, the mass percentage of Sb2O3 in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass is 0.20% to 0.50%, preferably 0.22% to 0.49%, in terms of mass percentage of oxide.

[0160] In some embodiments of the present application, the mass percentage of Sb2O3 in the strengthened layer or the tensile stress layer or the center of the strengthened photosensitive glass can be 0.20%, 0.22%, 0.25%, 0.28%, 0.30%, 0.34%, 0.37%, 0.39%, 0.40%, 0.42%, 0.45%, 0.47%, 0.49% or 0.50%, or a value within a value range formed by any two of the above specific values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0161] In the present application, chemical strengthening can be carried out by known methods; for example, chemical strengthening includes single-step chemical strengthening or multi-step chemical strengthening.

[0162] In some embodiments of the present application, the single-step chemical strengthening uses a salt bath containing NaNO3; preferably, the content of NaNO3 in the salt bath is 30wt% to 100wt%; preferably, the single-step chemical strengthening uses a mixed salt bath containing NaNO3 and KNO3, preferably the content of KNO3 in the mixed salt bath is greater than or equal to 80wt% and less than 100wt%, and the content of NaNO3 is greater than 0 and less than or equal to 20wt%.

[0163] In some embodiments of the present application, the temperature of the single-step chemical strengthening is 380°C to 480°C; preferably, the ion exchange time of the single-step chemical strengthening is 5h to 20h.

[0164] In some embodiments of the present application, the multi-step chemical strengthening includes two-step chemical strengthening, wherein the first step chemical strengthening uses a salt bath containing NaNO3, preferably the content of NaNO3 is 30wt% to 100wt%; the second step chemical strengthening uses a salt bath containing KNO3, preferably the content of KNO3 is 60wt% to 100wt%.

[0165] In some embodiments of the present application, the temperature of the first step chemical strengthening is 380°C to 480°C, preferably the time of the first step chemical strengthening is 3h to 20h; and / or, the temperature of the second step chemical strengthening is 380°C to 480°C, preferably the time of the second step chemical strengthening is 5min to 30min.

[0166] ​In some embodiments of the present application, the photosensitive glass can be subjected to other conventional processing before being chemically strengthened, to obtain a photosensitive glass sample that meets the required specifications or requirements, wherein the processing includes one or more of CNC machining, grinding and polishing, cleaning, 3D hot bending, and edge polishing. It should be noted that the size of the strengthened photosensitive glass sample is not limited in the present application, for example, it can be 50mm x 50mm x 1.0mm, 300mm x 120mm x 0.7mm, etc.

[0167] In some embodiments of the present application, the strengthened photosensitive glass can be planar or curved.

[0168] In some embodiments of the present application, the thickness t of the strengthened photosensitive glass of the present application is not particularly limited, for example, it can be 0.4-2.0mm. In some embodiments of the present application, the thickness t of the strengthened photosensitive glass can be 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.2mm, 1.4mm, 1.6mm, 1.8mm, or 2.0mm, or a value within a range defined by any two of the above specific values as endpoints. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0169] In some embodiments of the present application, the surface CS of the non-exposed area of the strengthened photosensitive glass is above 300MPa, preferably above 350MPa, and further preferably 350MPa-600MPa. In some embodiments of the present application, the surface CS of the non-exposed area of the strengthened photosensitive glass can be 350MPa, 351MPa, 395MPa, 438MPa, 385MPa, 391MPa, 398MPa, 402MPa, 422MPa, 450MPa, 480MPa, 500MPa, 530MPa, 550MPa, 580MPa, or 600MPa, or a value within a range defined by any two of the above specific values as endpoints; as long as the photosensitive glass with the required properties of the present application can be obtained. It should be understood that in embodiments, any of the above ranges can be combined with any other range.

[0170] In some embodiments of the present application, the single-edged static compression strength of the strengthened photosensitive glass is above 200 N, preferably 200 N to 500 N, more preferably 200 N to 490 N. In some embodiments of the present application, the single-edged static compression strength of the strengthened curved photosensitive glass can be 200 N, 250 N, 294 N, 361 N, 392 N, 301 N, 314 N, 375 N, 376 N, 390 N, 400 N, 450 N, 480 N or 500 N, or a value within a range defined by any two of the above values as endpoints; as long as the photosensitive glass with the desired properties of the present application can be obtained. It should be understood that in specific embodiments, any of the above ranges can be combined with any other range.

[0171] The photosensitive glass and / or strengthened photosensitive glass provided by the present application can be used in electronic devices, including but not limited to mobile phones, tablet computers, portable digital devices (such as digital cameras), smart home, smart wear (such as smart bracelet, smart watch, smart glasses), and can also be used in vehicles, aircraft or spacecraft, and can also be used in any desired photosensitive glass glassware. For example, it can be used for the back cover glass of a mobile phone, the shell glass of a smart watch, etc.; for example, it can be used for the windshield of a vehicle, aircraft or spacecraft, such as the front windshield or side windshield.

[0172] For example, the photosensitive glass and / or strengthened photosensitive glass provided by the present application can be configured to manufacture cover glass, which can be the back cover of a mobile phone or the camera protection cover of an electronic device. For example, the photosensitive glass and / or strengthened photosensitive glass provided by the present application with excellent performance can be used in electronic devices. In some embodiments of the present application, an electronic device is provided, which can be a mobile phone (as shown in FIG. 3, the photosensitive glass and / or strengthened photosensitive glass can be used as the back cover of the mobile phone), a tablet computer, a smart wearable device (as shown in FIG. 4, the photosensitive glass and / or strengthened photosensitive glass can be used as the shell of the bottom of the smart watch), and the like.

[0173] In some embodiments of the present application, the electronic device includes a smart wearable device worn on the body, which includes a shell having a top and a bottom, and the bottom shell includes the photosensitive glass and / or strengthened photosensitive glass described above in the present application. The bottom is designed to be in contact with the user's skin when worn.

[0174] In some embodiments of the present application, as shown in FIG. 3, the electronic device further comprises a camera assembly 32 located inside the shell, and the shell can comprise a camera protective cover plate 31 configured to cover the camera assembly 32 to protect the camera assembly 32, and the camera protective cover plate 31 is made of the aforementioned photosensitive glass and / or reinforced photosensitive glass. In some embodiments of the present application, the camera protective cover plate 31 can be partially made of the aforementioned photosensitive glass, or can be entirely made of the aforementioned photosensitive glass. In some embodiments of the present application, the camera protective cover plate 31 can be located on the front side of the electronic device, or can be located on the rear side of the electronic device, depending on the location of the camera assembly 32. In some embodiments of the present application, the camera protective cover plate 31 can be in a separate structure from the rear cover 33. In some other embodiments of the present application, the camera protective cover plate 31 can be in an integrated structure with the rear cover 33.

[0175] The technical solutions of the present application are further described in detail below in combination with embodiments. The embodiments of the present application described in detail below are exemplary and are configured to explain the present application, and cannot be understood as a limitation of the present application.

[0176] Embodiment 1

[0177] (1) The raw materials were prepared according to the proportions of each component in Table 1, and the total mass of the prepared raw materials was 2000g. Then, 10g of clarifying agent sodium chloride (NaCl) was added to the prepared raw materials, and then mixed for 30 minutes by a V-type mixer to obtain a raw material mixture with uniform mixing.

[0178] The raw material mixture was transferred to a platinum-gold crucible at 1500°C for melting, and the molten material was stirred with a platinum-gold stirring rod. The melting time was 10h, and then the glass was drawn into the required size of the glass brick. The glass brick was quickly placed in an annealing furnace at 500°C for 10h, and then naturally cooled to room temperature to obtain the substrate glass brick.

[0179] After the above substrate glass brick was subjected to cutting, CNC processing (the CNC instrument used in the present application was model RCG500S), and polishing, a substrate glass with a size of 50mm x 50mm x 1.0mm was obtained.

[0180] (2) The substrate glass obtained above was ultrasonically cleaned for 10min, and then dried in a drying oven;

[0181] The substrate glass after cleaning was coated with a shielding ink in a local area, as shown in FIG. 1, and the black area was the shielding area. Then, the substrate glass was subjected to irradiation treatment under parallel ultraviolet light with a wavelength of 310nm (UVHX800*850 drawer type) for a total of 25min, and the intensity of the ultraviolet irradiation treatment was 120mw / cm2.2 ;

[0182] The glass after UV irradiation was heat treated according to the heat treatment process of Table 1 to obtain a photosensitive glass; the heat treatment included nucleation treatment and crystallization treatment; the heating rate of the nucleation treatment and the crystallization treatment was 10℃ / min; the photosensitive glass was subjected to cold processing of laser cutting, cleaving, polishing, chamfering and the like in sequence to obtain a photosensitive glass with a size of φ30*1.0mm, as shown in Figure 2.

[0183] Examples 2-8

[0184] They were respectively carried out according to Example 1, except that the raw material composition ratio, heat treatment process parameters and the like of Examples 1-8 were different.

[0185] The relevant performance tests were carried out on Examples 1-8, and the results are shown in Table 1.

[0186] Table 1

[0187] The photosensitive glasses of Examples 1, 3 and 6 were subjected to chemical strengthening treatment, and the chemical strengthening treatment was chemical strengthening in a 460℃ 100wt% NaNO3 salt bath for 18h and a 440℃ 100wt% KNO3 salt bath for 20min in sequence to obtain strengthened photosensitive glasses.

[0188] The mass percentages of each component of the raw materials of the photosensitive glasses of Examples 1, 3 and 6 were converted into oxides and are shown in Table 2 below; the surface CS and single bar static pressure strength of the non-exposed area of the strengthened photosensitive glasses were tested, and the results are shown in Table 3.

[0189] Table 2

[0190] Table 3

[0191] Examples 9-10 and Comparative Examples 1-3 were carried out according to Example 1, except that the raw material compositions of Examples 9-10 and Comparative Examples 1-3 were different as shown in Table 4.

[0192] The same oxide is provided by different raw materials. For example, in the column of Sb2O3, the content of Sb2O3 is 0.37 in terms of the molar percentage of the oxide in the examples 9-10 and the comparative examples 1-3, and the difference is that the example 9 uses sodium antimonate as the raw material to provide Sb2O3, the example 10 uses antimony triamide as the raw material to provide Sb2O3, and the comparative examples 1-3 use antimony trioxide (Sb2O3) as the raw material to provide Sb2O3. In addition, the mass ratio of the raw material components in the examples 9-10 is converted from the molar percentage of the oxide into: 57.96wt% of silica sand, 18.34wt% of lithium carbonate, 8.89wt% of aluminum hydroxide, 5.30wt% of potassium nitrate, 5.05wt% of sodium nitrate, 3.62wt% of zirconium oxide, 0.43wt% of silver nitrate, 0.07wt% of cerium oxide, and pentavalent antimony salt; wherein the content of the pentavalent antimony salt is 0.34wt% in terms of sodium antimonate; and the mass ratio is within the range of the present application.

[0193] The Ag / Ag2O concentration of the main surface of the photosensitive glass prepared in the examples 9-10 and the comparative examples 1-3 (convert the results into the mass ratio of Ag2O) and the transmittance T3 (850nm) of the exposed area thereof are tested; in addition, the shielding diagram of the exposed area of the photosensitive glass prepared in the examples 9-10 and the comparative examples 1-3 in the visible light range is shown in FIG. 6, and the results are shown in Table 5.

[0194] Table 4

[0195] Table 5

[0196] The photos of the bottom of the crucible after melting of the examples 9-10 and the comparative examples 1-2 are shown in FIG. 5, wherein a. the photo of the bottom of the crucible of the comparative example 1, b. the photo of the bottom of the crucible of the comparative example 2, c. the photo of the bottom of the crucible of the example 9, and d. the photo of the bottom of the crucible of the example 10.

[0197] FIG. 6 is a shielding physical diagram of the exposed area of the examples 9-10 and the comparative examples 1-3 in the visible light range, and the bright color light spot in the comparative examples 1-3 is red light.

[0198] According to the above Table 1 and FIGS. 5 and 6, the photosensitive glass prepared in the present application can ensure the stability of the glass components during the melting process of the Ag-containing photosensitive glass, and there is no Ag precipitation to corrode the precious metal container; and the exposed area of the prepared photosensitive glass can shield the optical signal in the visible light and near-infrared wavelength range.

[0199] According to the above Table 4 and Figure 5, in the case of the same molar ratio of oxides, the raw materials without nitrate cause serious corrosion of the platinum-gold crucible; the addition of part of the nitrate raw materials can reduce the corrosion, but as long as silver oxide is directly used in the raw materials, a certain corrosion of the platinum-gold crucible will occur. In addition, the raw materials of the present application simultaneously use sodium nitrate, potassium nitrate, silver nitrate and sodium antimonate, which can ensure that the platinum-gold crucible is not corroded.

[0200] According to the above Table 5, the examples 9-10 do not have Ag + loss during the melting and forming of the raw materials, and the comparative examples 1-3 have Ag + loss, because the examples 9-10 use sodium nitrate, potassium nitrate, silver nitrate and antimonate (sodium antimonate or ammonium antimonate) as the raw material components of the photosensitive glass, and during melting, Ag + is not converted into Ag precipitation, so that the content of Ag2O in the final product is almost the same as the content of Ag2O in the starting composition; while in the comparative examples 1-3, part of Ag + is converted into Ag precipitation during the initial melting, so that the content of Ag2O in the final product is much lower than the content of Ag2O in the starting composition. At the same time, the photosensitive glass prepared by the examples 9-10 has good shielding performance in the visible light region of the exposed region, while the photosensitive glass prepared by the comparative examples 1-3 has red light transmission in the visible light region of the exposed region, in addition, the photosensitive glass prepared by the examples 9-10 has a low transmittance at 850 nm, which has good shielding performance.

[0201] The above only describes specific embodiments of the present application and is not intended to limit the present application. For those skilled in the art, the present application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application. Industrial applicability

[0202] In summary, the present application provides a photosensitive glass which not only ensures the stability of the glass components during the melting process of the Ag2O-containing photosensitive glass, and solves the problem of the loss and damage of noble metal containers caused by the decomposition of Ag2O to produce silver atoms Ag 0 , but also ensures that the optical transmittance of the exposed region of the photosensitive glass in the visible light and near-infrared wavelength range is extremely low after the radiation treatment and the heat treatment, which can achieve the shielding of the optical signal.

Claims

1. A photosensitive glass, characterized by, According to the mass percentage of each component in the photosensitive glass, the photosensitive glass comprises the following components: 50wt%-60wt% of silica sand, 15wt%-22wt% of lithium carbonate, 6wt%-10wt% of aluminum hydroxide, 3wt%-6wt% of potassium nitrate, 3wt%-6wt% of sodium nitrate, 3wt%-5wt% of zirconium oxide, 0.3wt%-0.6wt% of silver nitrate, 0.05wt%-0.10wt% of cerium oxide, and a pentavalent antimony salt; wherein the mass percentage of the pentavalent antimony salt in the composition of the photosensitive glass is 0.3wt%-0.8wt% in terms of sodium antimonate.

2. The photosensitive glass according to claim 1, characterized in that, According to the mass percentage of each component in the photosensitive glass, the photosensitive glass comprises the following components: The content of the silica sand is 53wt%-59wt%, preferably the content of the silica sand is 54.00wt%-58.96wt%, and / or, The content of the lithium carbonate is 17wt%-20wt%, preferably the content of the lithium carbonate is 17.43wt%-19.94wt%, and / or, The content of the aluminum hydroxide is 8wt%-10wt%, preferably the content of the aluminum hydroxide is 8.22wt%-9.97wt%, and / or, The content of the potassium nitrate is 4wt%-6wt%, preferably the content of the potassium nitrate is 4.07wt%-5.97wt%, and / or, The content of the sodium nitrate is 3.5wt%-5.5wt%, preferably the content of the sodium nitrate is 3.77wt%-5.45wt%, and / or, The content of the zirconium oxide is 3wt%-5wt%, preferably the content of the zirconium oxide is 3.33wt%-4.96wt%, and / or, The content of the silver nitrate is 0.3wt%-0.5wt%, preferably the content of the silver nitrate is 0.32wt%-0.49wt%, and / or, The content of the cerium oxide is 0.05wt%-0.10wt%, preferably the content of the cerium oxide is 0.06wt%-0.09wt%, and / or, The content of the pentavalent antimony salt is 0.3wt%-0.7wt%, preferably the content of the pentavalent antimony salt is 0.3wt%-0.5wt%.

3. Photosensitive glass according to claim 1 or 2, characterized in that The pentavalent antimony salt comprises at least one of NaSbO3, KSbO3, NH4SbO3, and a hydrate thereof.

4. The photosensitive glass according to any one of claims 1 to 3, characterized in that The thickness of the photosensitive glass is 0.4-1.0mm.

5. The photosensitive glass according to any one of claims 1 to 4, characterized in that, The photosensitive glass comprises an exposed region and a non-exposed region; When the thickness of the photosensitive glass is 0.40mm-1.00mm, the transmittance T1 of the exposed region of the photosensitive glass at a wavelength of 850nm is 0.00%-5.00%, preferably the transmittance T1 is 0.00%-3%, and / or; When the thickness of the photosensitive glass is 0.40mm-1.00mm, the transmittance T2 of the exposed region of the photosensitive glass at a wavelength of 550nm is 0.00%-5.00%, preferably the transmittance T2 is 0.00%-2%, and / or, When the thickness of the photosensitive glass is 0.40mm-1.00mm, the transmittance T2 of the exposed region of the photosensitive glass at a wavelength of 550nm is 0.00%-5.00%, preferably the transmittance T2 is 0.00%-2%, and / or, When the thickness of the photosensitive glass is 0.40mm-1.00mm, the transmittance T3 of the non-exposed area of the photosensitive glass at 850nm wavelength is above 90%; and / or, When the thickness of the photosensitive glass is 0.40mm-1.00mm, the transmittance T4 of the non-exposed area of the photosensitive glass at 550nm wavelength is above 90%.

6. A method for the production of a photosensitive glass according to any one of claims 1 to 5, characterized in that Comprise: The raw material components are configured, then mixed and melted in a noble metal container, then formed, then annealed to obtain a base glass; The base glass comprises a first area and a second area, the first area is subjected to a masking treatment, and the second area is not subjected to the masking treatment to obtain a masked base glass; After the radiation treatment and the heat treatment of the masked base glass, a photosensitive glass with a non-exposed area and an exposed area is obtained; wherein the non-exposed area corresponds to the first area, and the exposed area corresponds to the second area.

7. The production method according to claim 6, wherein The noble metal container is a container prepared by using at least one metal selected from gold, platinum and rhodium.

8. The production method according to claim 6 or 7, characterized by, The melting temperature is 1400℃-1650℃, and the melting time is 6h-48h; and / or, the annealing temperature is 400℃-500℃, and the annealing time is 8h-24h.

9. The production method according to any one of claims 6 to 8, characterized by, The radiation treatment mode comprises ultraviolet irradiation treatment.

10. The method of claim 9, wherein, The wavelength of the ultraviolet irradiation treatment is 300 nm to 320 nm, the intensity of the ultraviolet irradiation treatment is 20 mw / cm 2 to 360 mw / cm 2 , and the time of the ultraviolet irradiation treatment is 5 min to 60 min.

11. The production method according to any one of claims 6 to 10, characterized by, The heat treatment comprises nucleation treatment and crystallization treatment.

12. The method of claim 11, wherein, The nucleation treatment has a temperature increasing rate of 1℃ / min-10℃ / min; and / or, The nucleation treatment has a temperature of 430℃-540℃; and / or, The nucleation treatment has a time of 30min-360min, and / or, The crystallization treatment has a temperature increasing rate of 1℃ / min-10℃ / min; and / or, The crystallization treatment has a temperature of 540℃-800℃; and / or, The crystallization treatment has a time of 30min-240min.

13. A strengthened photosensitive glass, characterized by, The thickness is t, and it comprises a strengthening layer and a tensile stress layer, the strengthening layer extends from the surface of the strengthened photosensitive glass to the interior direction, and the thickness of the strengthening layer is 0-0.22t; The tensile stress layer and / or the center of the strengthened photosensitive glass comprises the following components in mass percentage of oxides: SiO2: 65%-74.00%, Al2O3: 5.00%-10.00%, Li2O: 7.90%-12.00%, Na2O: 1.00%-3.00%, K2O: 1.50%-3.80%, ZrO2: 3.5%-6.50%, Ag2O: 0.20%-0.50%, CeO2: 0.07%-0.13%, and Sb2O3: 0.2%-0.50%; The strengthening layer comprises the following components in mass percentage of oxides: SiO2: 65% to 74.00%, Al2O3: 5.00% to 10.00%, Na2O: 4.00% to 16.00%, K2O: 2.0% to 5.0%, ZrO2: 3.5% to 6.50%, Ag2O: 0.20% to 0.50%, CeO2: 0.07% to 0.13%, and Sb2O3: 0.2% to 0.50%; the content of Li2O in the strengthening layer is lower than the content of Li2O at the center of the tensile stress layer and / or the strengthened photosensitive glass; wherein Na2O is obtained by sodium nitrate, K2O is obtained by potassium nitrate, Ag2O is obtained by silver nitrate, and Sb2O3 is obtained by pentavalent antimony salt; The strengthened photosensitive glass comprises a non-exposed region and an exposed region.

14. The strengthened photosensitive glass of claim 13, wherein, The single bar static strength of the strengthened photosensitive glass is above 200 N, preferably 200 N to 500 N, and more preferably 200 N to 490 N.

15. A cover glass, characterized by The cover glass is made of the photosensitive glass according to any one of claims 1 to 5, the photosensitive glass prepared by the preparation method according to any one of claims 6 to 12, or the strengthened photosensitive glass according to any one of claims 13 to 14.

16. An electronic device, comprising: The electronic device comprises the photosensitive glass according to any one of claims 1 to 5, the photosensitive glass prepared by the preparation method according to any one of claims 6 to 12, or the strengthened photosensitive glass according to any one of claims 13 to 14.

17. The electronic device of claim 16, wherein, The electronic device comprises a housing having a top and a bottom, and the bottom of the housing comprises the photosensitive glass according to any one of claims 1 to 5, or the photosensitive glass prepared by the preparation method according to any one of claims 6 to 12, or the strengthened photosensitive glass according to any one of claims 13 to 14.

18. The electronic device of claim 16 or 17, wherein, The electronic device further comprises a camera assembly, and the shell of the electronic device comprises a camera protective cover plate covering the camera assembly, and the camera protective cover plate comprises the photosensitive glass according to any one of claims 1 to 5, or the photosensitive glass prepared by the preparation method according to any one of claims 6 to 12, or the strengthened photosensitive glass according to any one of claims 13 to 14.

19. Use of the photosensitive glass according to any one of claims 1 to 5, the photosensitive glass prepared by the preparation method according to any one of claims 6 to 12, or the strengthened photosensitive glass according to any one of claims 13 to 14 in the preparation of a mobile phone, a smart watch, a wearable device, a camera module, or a component in a vehicle.

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