Glass assembly arranged in vehicle

Abstract

This antenna assembly arranged on a glass panel includes a plurality of conductive patterns. A loop-shaped third conductive pattern includes a plurality of segment patterns and slit regions formed between the segment patterns. The slit regions include: a first portion crossing an outer circumference of the third conductive pattern; a first connection portion connected to the first portion and formed in an arc direction; a second portion connected to the first connection portion and crossing a circumference of the third conductive pattern; a second connection portion connected to the second portion and formed in the arc direction; and a third portion connected to the second connection portion and crossing the circumference of the third conductive pattern.

Description

Glass assembly placed in a vehicle

[0001] The present disclosure relates to a glass assembly for placement on a vehicle. A particular embodiment relates to a glass assembly having an antenna assembly for placement on a vehicle glass.

[0002] Vehicles can perform wireless communication services with other vehicles, surrounding objects, infrastructure, or base stations. In this regard, various wireless communication services can be provided through wireless communication systems utilizing LTE or 5G communication technologies. To provide wireless communication services through a vehicle, the vehicle must be equipped with an antenna assembly.

[0003] Automotive antenna assemblies need to be designed for specific frequency bands to support vehicle-to-everything (V2X) communications. Antennas for V2X communications need to be designed to receive wireless signals in any direction for vehicle-to-vehicle communications in any direction. In this regard, it is challenging to design an antenna with an omnidirectional radiation pattern that satisfies the wireless performance required for V2X communications on vehicle windows with a constant inclination angle.

[0004] Meanwhile, an antenna assembly supporting V2X communication may be placed on a vehicle's glass panel. For example, the antenna assembly may be implemented as a loop-shaped loop antenna placed on the glass panel. Meanwhile, loop antennas may suffer from uneven surface current distribution across the pattern area. This uneven current distribution can degrade antenna performance and, in particular, cause distortion of the signal radiation pattern.

[0005] The present disclosure aims to resolve the non-uniformity of surface current distribution occurring in the pattern area of ​​a loop antenna.

[0006] The present disclosure aims to improve the performance of an antenna by resolving the non-uniformity of surface current distribution and to implement a more uniform signal radiation pattern.

[0007] To address this issue, this specification defines a loop pattern as a plurality of segment patterns, with slit structures introduced between them. Specifically, the third conductive pattern is divided into a plurality of segment patterns, and slit regions corresponding to dielectric regions are formed between adjacent segment patterns. The slit regions have the following structure.

[0008] An antenna assembly disposed on a glass panel includes a plurality of conductive patterns. A third conductive pattern having a loop shape includes a plurality of segment patterns and slit regions formed between the segment patterns. The slit regions include a first portion crossing an outer circumference of the third conductive pattern; a first connecting portion connected to the first portion and formed in an arcuate direction; a second portion connected to the first connecting portion and formed in an arcuate direction and crossing a circumference of the third conductive pattern; a second connecting portion connected to the second portion and formed in an arcuate direction; and a third portion connected to the second connecting portion and formed in an arcuate direction and crossing a circumference of the third conductive pattern.

[0009] A glass assembly according to the present disclosure comprises a glass panel having a first dielectric constant including a transparent region and an opaque region; an antenna assembly disposed on the glass panel and configured to radiate a wireless signal; and a cable having a feed line for feeding a signal to the antenna assembly and a ground line surrounding a dielectric. The antenna assembly comprises a substrate formed on one side of the opaque region of the glass panel and having a second dielectric constant; and the substrate has a first side facing the glass panel and a second side formed on an opposite side of the first side, and includes a plurality of conductive patterns formed on the second side. The antenna assembly comprises a substrate formed on one side of the opaque region of the glass panel and having a second dielectric constant; and the substrate has a first side facing the glass panel and a second side formed on an opposite side of the first side, and includes a plurality of conductive patterns formed on the second side.

[0010] The third conductive pattern includes a plurality of segment patterns. A plurality of slit regions corresponding to a dielectric region are formed between adjacent segment patterns among the plurality of segment patterns of the third conductive pattern. A first segment pattern among the plurality of segment patterns is connected to the second conductive pattern. A second segment pattern among the plurality of segment patterns is connected to the fourth conductive pattern. A first slit region is formed between the first segment pattern and the second segment pattern, spaced apart from the first gap among the plurality of slit regions. A third segment pattern among the plurality of segment patterns is arranged in an area opposite to the first slit region with respect to a first center line of the loop. At least one fourth segment pattern is arranged between the first segment pattern and the third segment pattern. A second slit region is formed spaced apart from the second gap between the third segment pattern and the fourth segment pattern. At least one fifth segment pattern is arranged between the second segment pattern and the third segment pattern. A third slit region is formed between the third partial pattern and the fifth partial pattern, spaced apart by the second gap. The third partial pattern has a first surface forming the inner side of the loop and a second surface forming the outer side of the loop, and the length of the second surface is formed to be longer than the length of the first surface. The interval of the first gap is formed to be wider than the interval of the second gap.

[0011] According to an embodiment, the second slit region and the third slit region are formed starting from the inner circumference of the loop to the outer circumference of the loop, and may be formed in a step shape.

[0012] According to an embodiment, the second slit region may include a first portion formed near the second surface of the third partial pattern and extending inwardly of the loop; a first connecting portion connected to the first portion and formed at a position parallel to the second surface; a second portion connected to the first connecting portion and extending inwardly of the loop; a second connecting portion connected to the second portion and formed at a position parallel to the first surface; and a third portion connected to the second connecting portion and formed to extend to a position near the first surface of the third partial pattern.

[0013] According to an embodiment, the second slit region and the third slit region may be formed symmetrically with respect to the second center line of the loop.

[0014] According to an embodiment, the antenna assembly may further include a fourth slit region formed between a plurality of fourth partial patterns and a fifth slit region formed between a plurality of fifth partial patterns. The shape of the fourth slit region and the shape of the fifth slit region may be formed symmetrically with respect to the second center line of the loop.

[0015] According to an embodiment, the fourth slit region may include a first portion formed near the second surface of the fourth partial pattern and extending inwardly of the loop; a first connecting portion connected to the first portion and formed at a position parallel to the second surface; a second portion connected to the first connecting portion and extending inwardly of the loop; a second connecting portion connected to the second portion and formed at a position parallel to the first surface; and a third portion connected to the second connecting portion and formed to extend to a position near the first surface of the fourth partial pattern.

[0016] According to an embodiment, the length of the first connecting portion of the fourth slit region may be formed longer than the length of the second connecting portion of the fourth slit region.

[0017] According to an embodiment, a portion of the length of the first connecting portion of the fourth slit region may be formed parallel to the length of the second connecting portion of the fourth slit region.

[0018] According to an embodiment, the length of the first connecting portion of the fourth slit region may be formed shorter than the length of the second connecting portion of the fourth slit region.

[0019] According to an embodiment, the length of the first connecting portion of the fourth slit region may be formed parallel to a portion of the length of the second connecting portion of the fourth slit region.

[0020] According to an embodiment, a sixth slit region may be provided between the first partial pattern and the at least one fourth partial pattern. The sixth slit region may include: a first portion formed near the second surface of the fourth partial pattern and extending inwardly of the loop; a first connecting portion connected to the first portion and formed at a position parallel to the second surface; a second portion connected to the first connecting portion and extending inwardly of the loop; a second connecting portion connected to the second portion and formed at a position parallel to the first surface; and a third portion connected to the second connecting portion and formed to extend to a position near the first surface of the fourth partial pattern. A portion of a length of the first connecting portion of the sixth slit region may be formed in parallel with a length of the second connecting portion of the sixth slit region.

[0021] According to an embodiment, a seventh slit region may be provided between the first partial pattern and the at least one fourth partial pattern. The seventh slit region may include: a first portion formed near the second surface of the fifth partial pattern and extending inwardly of the loop; a first connecting portion connected to the first portion and formed at a position parallel to the second surface; a second portion connected to the first connecting portion and extending inwardly of the loop; a second connecting portion connected to the second portion and formed at a position parallel to the first surface; and a third portion connected to the second connecting portion and formed to extend to a position near the first surface of the fifth partial pattern. The first connecting portion of the seventh slit region may be formed near the fourth conductive pattern.

[0022] The technical effects of a glass assembly having an antenna assembly disposed on a vehicle glass according to the present disclosure are described below. In this regard, by introducing a slit structure into the loop antenna, the following effects can be achieved:

[0023] The surface current distribution within the loop pattern can be uniformly achieved through multiple segment patterns and slit structures. This uniform surface current distribution can play a significant role in improving antenna performance.

[0024] Uniform current distribution reduces distortion of the signal radiation pattern and enables more stable and consistent signal radiation.

[0025] In high-performance communication systems such as V2X communication, improving antenna performance contributes to increasing the efficiency of the entire system, enabling efficient wireless communication.

[0026] Therefore, the present disclosure can effectively solve the problem of surface current distribution of a loop antenna, thereby optimizing the performance of the antenna and increasing its usability in various communication applications.

[0027] Further scope of the applicability of this specification will become apparent from the detailed description below. However, since various changes and modifications within the spirit and scope of this specification will become apparent to those skilled in the art, it should be understood that the detailed description and specific examples, such as preferred embodiments, are given by way of example only.

[0028] FIG. 1 illustrates glass of a vehicle on which an antenna structure according to an embodiment of the present disclosure may be placed.

[0029] Figure 2 shows the types of V2X applications.

[0030] Figure 3 shows a configuration in which a vehicle antenna is placed on the vehicle window.

[0031] Figure 4 shows a cross-sectional view of a glass assembly in which a glass panel of a vehicle is joined to a metal frame.

[0032] Figure 5 shows the connection structure of a V2X antenna and a cable placed on a glass panel of a vehicle that is combined with a metal frame.

[0033] Fig. 6 is an enlarged view of the slit area of ​​the V2X antenna of Fig. 5.

[0034] Fig. 7 shows the structure of a circular ring-shaped challenge pattern according to the present specification.

[0035] Fig. 8 shows the current distribution of the circular ring-shaped conductive pattern of Fig. 7 and the equivalent circuit of each partial pattern.

[0036] Figures 9a and 9b illustrate the structure and current distribution of a conductive pattern having a circular ring shape according to the number of partial patterns.

[0037] Figure 10 shows a structure in which each sub-pattern is divided in the width direction into adjacent sub-patterns.

[0038] Figures 11 and 12 show slit regions formed between adjacent sub-patterns having a number of sub-patterns of 4 and 6, respectively.

[0039] Fig. 13 shows a connection structure of a V2X antenna and a cable having slit areas of first to fourth parts arranged on a glass panel of a vehicle combined with a metal frame.

[0040] Fig. 14 is an enlarged view of the slit area of ​​the V2X antenna of Fig. 13.

[0041] Fig. 15 is a drawing that divides the third partial pattern of Fig. 5 and the third partial pattern of Fig. 13 into sub-patterns and indicates the location of each sub-pattern.

[0042] Fig. 16 shows the reflection coefficient characteristics and gain characteristics of the antenna assembly of Fig. 5.

[0043] Fig. 17 shows the reflection coefficient characteristics and gain characteristics of the antenna assembly of Fig. 13.

[0044] Figure 18 shows the current distribution formed in the antenna assembly positioned adjacent to the metal frame of Figure 13.

[0045] Hereinafter, embodiments disclosed in this specification will be described in detail with reference to the attached drawings. Regardless of the drawing numbers, identical or similar components will be given the same reference numbers and redundant descriptions thereof will be omitted. The suffixes "module" and "part" used for components in the following description are assigned or used interchangeably only for the convenience of writing the specification, and do not in themselves have distinct meanings or roles. In addition, when describing the embodiments disclosed in this specification, if it is determined that a specific description of a related known technology may obscure the gist of the embodiments disclosed in this specification, a detailed description thereof will be omitted. In addition, the attached drawings are only intended to facilitate easy understanding of the embodiments disclosed in this specification, and the technical ideas disclosed in this specification are not limited by the attached drawings, and should be understood to include all modifications, equivalents, and substitutes included in the spirit and technical scope of the present invention.

[0046] Terms that include ordinal numbers, such as first, second, etc., may be used to describe various components, but the components are not limited by these terms. These terms are used solely to distinguish one component from another.

[0047] When a component is referred to as being "connected" or "connected" to another component, it should be understood that it may be directly connected or connected to that other component, but that there may be other components intervening. Conversely, when a component is referred to as being "directly connected" or "connected" to another component, it should be understood that there are no other components intervening.

[0048] Singular expressions include plural expressions unless the context clearly indicates otherwise.

[0049] In this application, terms such as “include” or “have” are intended to specify the presence of a feature, number, step, operation, component, part or combination thereof described in the specification, but should be understood not to exclude in advance the possibility of the presence or addition of one or more other features, numbers, steps, operations, components, parts or combinations thereof.

[0050] The vehicle antenna described herein can be mounted on a vehicle. The configuration and operation according to the embodiments described herein can also be applied to a vehicle-mounted communication system, i.e., a vehicle antenna. In this regard, a vehicle-mounted antenna may include multiple antennas and a transceiver circuit and processor that control the antennas.

[0051] Hereinafter, an antenna assembly (antenna module) that can be placed on a vehicle window according to the present specification and a vehicle antenna including the antenna assembly are described. In this regard, the antenna assembly refers to a structure in which conductive patterns are combined on a dielectric substrate, and may also be referred to as an antenna module.

[0052] In this regard, FIG. 1 illustrates glass of a vehicle on which an antenna structure according to an embodiment of the present disclosure may be placed. Referring to FIG. 1, the vehicle (1) may be configured to include a front window glass (310), a side window glass (320), a rear window glass (330), and a quarter window glass (340). Meanwhile, the vehicle (1) may further be configured to include an upper glass (350) formed on a roof of an upper region.

[0053] Accordingly, the glass constituting the window of the vehicle (1) may include a front window glass (310) disposed in the front area of ​​the vehicle (1), a side window glass (320) disposed in the door area of ​​the vehicle (1), and a rear window glass (330) disposed in the rear area of ​​the vehicle (1). Meanwhile, the glass constituting the window of the vehicle (1) may further include a quarter window glass (340) disposed in a part of the door area of ​​the vehicle (1). In addition, the glass constituting the window of the vehicle (1) may further include an upper glass (350) disposed in the upper area of ​​the vehicle (1) and spaced apart from the rear window glass (330). Accordingly, each glass constituting the window of the vehicle (1) may also be referred to as a window.

[0054] The front window glass (310) may be referred to as a front windshield because it prevents wind from entering the interior of the vehicle (1) from the front. The front window glass (310) may be formed as a two-layer laminated structure having a thickness of about 5.0 to 5.5 mm. The front window glass (310) may be formed as a laminated structure of glass / anti-shatter film / glass.

[0055] The side window glass (320) may be formed of a two-layer laminated structure or a single-layer pressed glass. The rear window glass (330) may be formed of a two-layer laminated structure or a single-layer pressed glass with a thickness of about 3.5 to 5.5 mm. A separation distance is required between the heating element and the AM / FM antenna and the transparent antenna in the rear window glass (330). The quarter window glass (340) may be formed of a single-layer pressed glass with a thickness of about 3.5 to 4.0 mm, but is not limited thereto.

[0056] The size of the quarter window glass (340) varies depending on the type of vehicle (1), and the size of the quarter window glass (340) may be configured to be smaller than the sizes of the front window glass (310) and the rear window glass (330).

[0057] A vehicle (1) may be configured to communicate with pedestrians, surrounding infrastructure, and / or servers in addition to surrounding vehicles (1). In this regard, FIG. 2 illustrates types of V2X applications. Referring to FIG. 2, V2X (Vehicle-to-Everything) communication includes communication between the vehicle (1) and all entities, such as V2V (Vehicle-to-Vehicle) referring to communication between vehicles (1), V2I (Vehicle to Infrastructure) referring to communication between the vehicle (1) and an eNB or RSU (Road Side Unit), V2P (Vehicle-to-Pedestrian) referring to communication between terminals possessed by the vehicle (1) and an individual (pedestrian, cyclist, driver or passenger of the vehicle (1), and V2N (vehicle-to-network).

[0058] Meanwhile, a vehicle antenna (1000) having a wideband transparent antenna structure that can be placed on the vehicle's glass according to the present specification can be implemented as a single dielectric substrate on the same plane as the CPW feeder. In addition, the wideband transparent antenna structure that can be placed on the vehicle's glass according to the present specification can be implemented as a structure in which grounds are formed on both sides of the radiator, thereby forming a wideband structure.

[0059] Hereinafter, an antenna assembly related to a wideband transparent antenna structure according to the present specification will be described. In this regard, FIG. 3 illustrates a configuration in which a vehicle antenna is placed on a vehicle window. Referring to FIG. 3, a vehicle antenna (1000) may include a first dielectric substrate (1010a) and a second dielectric substrate (1010b). The first dielectric substrate (1010a) may be implemented as a transparent dielectric substrate. The second dielectric substrate (1010b) may be implemented as a flexible substrate. The first dielectric substrate (1010a) may be referred to as a transparent dielectric substrate, and the second dielectric substrate (1010b) may be referred to as a flexible substrate.

[0060] The glass panel (10) may be configured to include a transparent region (11) and an opaque region (12). The glass panel (10) may be at least one of the front window glass (310), the side window glass (320), the rear window glass (330), and the quarter window glass (340) of FIG. 1. The opaque region (12) of the glass panel (10) may be a frit layer formed of a frit layer. The opaque region (12) may be formed to surround the transparent region (11). The opaque region (12) may be formed in an outer region of the transparent region (11). The opaque region (12) may form a boundary region of the glass panel (10).

[0061] A transparent dielectric substrate (1010a) may be placed on a transparent area (11) of a glass substrate (10). A plurality of conductive patterns (1100) of a transparent material may be formed on one side of the transparent dielectric substrate (1010a). A flexible substrate (1010b) may be placed on an opaque area (12) of the glass substrate (10). The flexible substrate (1010b) may be formed to be electrically connected to the transparent dielectric substrate (1010a).

[0062] Meanwhile, the antennas disposed on the first dielectric substrate (1010a) corresponding to the transparent dielectric substrate may be implemented as transparent antennas formed of metal mesh grids. Feed patterns and ground patterns for applying signals to the antennas may be formed on the second dielectric substrate (1010b). The second dielectric substrate (1010b) may be implemented as a flexible printed circuit board (FPCB). A slot antenna may be formed on the second dielectric substrate (1010b) in which a portion of the ground pattern is removed.

[0063] When a vehicle antenna (1000) is attached to the inside or surface of a glass panel (10), a first dielectric substrate (1010a) having a transparent electrode portion including an antenna pattern and a dummy pattern formed thereon may be placed in a transparent area (11). Meanwhile, a second dielectric substrate (1010b), such as an FPCB, may be placed in an opaque area (312).

[0064] The antennas disposed on the first dielectric substrate (1010a) may include MIMO antennas and / or other antenna elements for wireless communication. The other antenna elements may include at least one of a GNSS / radio / broadcast / WiFi / satellite communication / UWB, and Remote Keyless Entry (RKE) antenna for vehicle applications.

[0065] A power supply pattern formed on a second dielectric substrate (1010b) may be connected to a telematics control unit (TCU) (300) via a cable (100c), such as a coaxial cable. The TCU (300) may be placed inside a vehicle, but is not limited thereto. The TCU (300) may be placed on a dashboard inside a vehicle or in a ceiling area of ​​the vehicle, but is not limited thereto.

[0066] Meanwhile, the vehicle's glass, in which the transparent antenna is positioned, may be joined to the vehicle's frame. In this regard, Fig. 4 illustrates a cross-sectional view of a glass assembly in which the vehicle's glass panel is joined to a metal frame.

[0067] Referring to FIG. 4, the glass assembly (200) may be configured to include a glass panel (10), an antenna assembly (1000), and a metal frame (9). The glass panel (10) may be bonded or attached to the metal frame (9) of the vehicle. Referring to FIGS. 1 and 4, the glass panel (10) may be glass of the vehicle (1), such as front window glass (310), side window glass (320), rear window glass (330), quarter window glass (340), or top glass (350).

[0068] The glass panel (10) may be configured to include a transparent region (11) and an opaque region (12). The opaque region (12) may include a first opaque region (12a) corresponding to a first frit region and a second opaque region (12b) corresponding to a second frit region.

[0069] In the opaque region (12), a frit region in which frit patterns are arranged on a glass panel (10) may be formed. An antenna assembly (100) may be arranged at a position overlapping the frit region. The antenna assembly (1000) may be configured to include a substrate (10) and a cable (100C).

[0070] The metal frame (9) may be formed with a support portion (9a) and an extension portion (9b) that support the glass panel (10). The support portion (9a) may be formed at a lower portion of the first opaque region (12a) of the glass panel (10) so as to support the first opaque region (12a) of the glass panel (10). The extension portion (9b) may be formed to extend in one axial direction from the support portion (9a). The extension portion (9b) may be coupled to a side surface of the glass panel (10). The support portion (9a) may be formed with a first thickness on the Z-axis, and the extension portion (9b) may be formed with a second thickness that is thicker than the first thickness on the Z-axis.

[0071] As described above, the glass panel (10) may be configured to include a first opaque region (12a), a second opaque region (12b), and a transparent region (11). A metal frame (9) of a vehicle configured to support the glass panel (10) may be additionally configured in the first opaque region (12a). The second opaque region (12b) may be arranged such that the antenna assembly (1000) and the frit region overlap with the glass panel (10). The transparent region (11) may be configured as an area of ​​the glass panel (10) excluding the frit region formed by the first and second opaque regions (12a, 12b).

[0072] The glass assembly (200) may further include a cover (8) in addition to the glass panel (10), the antenna assembly (1000), and the metal frame (9). The cover (8) may have an area covering the antenna assembly (1000). The cover (8) may have a structure that is fixed to the metal frame (9). The cover (8) may be configured to include a first area (8a) covering the antenna assembly (1000) and a second area (8b) extending from the first area (8a).

[0073] Hereinafter, a vehicle antenna supporting V2X communication according to the present specification will be described. An object of the present specification is to provide an antenna structure having an omni-directional radiation pattern that can be placed on a vehicle glass. Another object of the present specification is to provide an antenna structure that satisfies wireless performance for V2X communication on a vehicle glass having a constant inclination angle. Another object of the present specification is to implement a V2X antenna structure having reliability and robustness in terms of mass production on a vehicle glass panel. Another object of the present specification is to provide an antenna structure that can be implemented in a minimized size in an opaque area and a transparent area of ​​a glass panel.

[0074] In this regard, Fig. 5 illustrates a connection structure of a V2X antenna and a cable arranged on a glass panel of a vehicle coupled with a metal frame. Fig. 6 is an enlarged view of a slit area of ​​the V2X antenna of Fig. 5. Referring to Figs. 1 to 6, a glass assembly and a vehicle equipped with a vehicle antenna supporting V2X communication according to the present specification will be described.

[0075] A glass assembly (200) is configured to include a glass panel (10, 310, 330), an antenna assembly (1000), and a cable (100c). A vehicle (1) having a glass assembly (200) is configured to include a glass panel (10, 310, 330), a metal frame (9), an antenna assembly (1000), and a cable (100c). The glass panel (10, 310, 330) may be configured as a glass substrate on which conductive patterns of the antenna assembly (1000) are arranged.

[0076] The antenna assembly (1000) may be configured to perform V2X communication. For V2X communication, the n14 band, the n38 band, the n47 band, and the n79 band may be allocated. The frequency band of 788-798 MHz may be set as the n14 band. The frequency band of 2570-2620 MHz may be set as the n38 band. The frequency band of 5855-5925 MHz may be set as the n47 band. The frequency band of 4440-500 MHz may be set as the n79 band. The antenna assembly (1000) performing V2X communication according to the present specification may be configured to radiate a wireless signal in the frequency band of 5855-5925 MHz, which is the n47 band.

[0077] Meanwhile, the glass panel (10, 310, 330) is not limited to the front window glass (310) or the rear window glass (330) of the vehicle (1). The glass panel may be at least one of the front window glass (310), the side window glass (320), the rear window glass (330), the quarter window glass (340), and the upper glass (350) formed on the roof of the upper area of ​​the vehicle.

[0078] The glass panel (10, 310, 330) may include a transparent region (11, 311, 331) and an opaque region (12, 312, 332). The glass substrate (10, 310, 330) may be provided in a vehicle and may form an opaque region (12, 312, 332) and a transparent region (11, 311, 331) formed in an inner region of the opaque region (12, 312, 332). The transparency of the transparent region (11, 311, 331) is formed higher than that of the opaque region (12, 312, 332).

[0079] Hereinafter, a glass assembly (200) according to the present specification will be described. The glass assembly (200) is configured to include a glass panel (10, 310, 330), an antenna assembly (1000), and a cable (100c). The glass panel (10, 310, 330) may include a transparent region (11, 311, 331) and an opaque region (12, 312, 332). The glass panel (10, 310, 330) may be formed to have a first dielectric constant.

[0080] An antenna assembly (1000) may be placed on a glass panel (10, 310, 330). The antenna assembly (1000) may be configured to radiate a wireless signal. The antenna assembly (1000) may be configured to radiate a wireless signal for V2X communication. The cable (100c) may include a feed line (110), which is a signal line that feeds a signal to the antenna assembly (1000), and a ground line (120) that surrounds a dielectric.

[0081] An antenna assembly (1000) may be configured to include a substrate (1010) and a plurality of conductive patterns (1100). The substrate (1010) may be formed on one side of an opaque region (12, 312, 332) of a glass panel (10, 310, 330). The substrate (1010) may be formed to have a second dielectric constant. The substrate (1010) may be configured with a first side facing the glass panel (10, 310, 330) and a second side formed on an opposite side of the first side. A plurality of conductive patterns (1100) may be formed on the second side of the substrate (1010).

[0082] The plurality of challenge patterns (1100) may be configured to include a first challenge pattern (1110), a second challenge pattern (1120), a third challenge pattern (1130), a fourth challenge pattern (1140), and a fifth challenge pattern (1150).

[0083] The first conductive pattern (1110) may be connected to the power supply line (110) of the cable (100c). The first conductive pattern (1110) may be formed on an opaque area (12, 312, 332) of a glass panel (10, 310, 330). The second conductive pattern (1120) may be electrically connected to the first conductive pattern (1110). The first conductive pattern (1110) may be arranged in a first axis direction, which is the X-axis direction. The second conductive pattern (1120) may be arranged in a second axis direction, which is the Y-axis direction.

[0084] The third conductive pattern (1130) may be formed to be connected to the second conductive pattern (1120). The third conductive pattern (1130) may be formed in a loop shape on the transparent area (11, 311, 331) of the glass panel (10, 310, 330). The third conductive pattern (1130) may be formed in a loop shape having a circular ring shape. The third conductive pattern (1130) may be formed to be connected to the fourth conductive pattern (1140) arranged parallel to the second conductive pattern (1120).

[0085] The fourth conductive pattern (1140) may be formed to be connected to the third conductive pattern (1130). The fourth conductive pattern (1140) may be arranged parallel to the second conductive pattern (1120). The fifth conductive pattern (1150) may be electrically connected to the fourth conductive pattern (1140). The fifth conductive pattern (1150) may be connected to the ground line (120) of the cable (100c). The fifth conductive pattern (1150) may be arranged in the first axis direction, which is the X-axis direction. The fourth conductive pattern (1140) may be arranged in the second axis direction, which is the Y-axis direction.

[0086] The third conductive pattern (1130) may include a plurality of segment patterns. A plurality of slit regions corresponding to dielectric regions may be formed between adjacent segment patterns among the plurality of segment patterns of the third conductive pattern (1130). The slit regions correspond to regions where the segment patterns of the conductive patterns are separated.

[0087] Among the plurality of partial patterns, a first partial pattern (SP1) may be connected to a second conductive pattern (1120). Among the plurality of partial patterns, a second partial pattern (SP2) may be connected to a fourth conductive pattern (1140). A first slit region (SR1) may be formed between the first partial pattern (SP1) and the second partial pattern (SP2) and spaced apart from each other by a first gap (G1) among the plurality of slit regions. A third partial pattern (SP3) among the plurality of partial patterns may be arranged in an area opposite to the first slit region (SR1) with respect to a first center line (CL1) of the loop.

[0088] At least one fourth partial pattern (SP4) may be arranged between the first partial pattern (SP1) and the third partial pattern (SP3). A second slit region (SR2) may be formed between the third partial pattern (SP3) and one fourth partial pattern (SP4) and spaced apart by a second gap (G2). At least one fifth partial pattern (SP5) may be arranged between the second partial pattern (SP2) and the third partial pattern (SP3). A third slit region (SR3) may be formed between the third partial pattern (SP3) and the fifth partial pattern (SP5) and spaced apart by a second gap (G2).

[0089] The third partial pattern (SP3) may have a first surface (LS1) forming the inner side of the loop and a second surface (LS2) forming the outer side of the loop. The first surface (LS1) and the second surface (LS2) may correspond to the inner and outer peripheries of the third partial pattern (SP3). The length of the second surface (LS2) may be formed to be longer than the length of the first surface (LS1). The interval of the first gap (G1) of the first slit region (SR1) may be formed to be wider than the interval of the second gap (G2) of the second slit region (SR2) and the third slit region (SR3).

[0090] The second slit region (SR2) and the third slit region (SR3) may be formed starting from the inner circumference of the loop and extending to the outer circumference of the loop. The second slit region (SR2) and the third slit region (SR3) may be formed in a step shape.

[0091] Slit regions corresponding to the dielectric region between adjacent partial patterns can be configured to include a first portion (P1), a second portion (P2), a third portion (P3), a first connection portion (CP1), and a second connection portion (CP2). An omni-directional radiation pattern, which is an omnidirectional radiation pattern, can be formed by the conductive pattern segmented by the slit regions. In this regard, the third conductive pattern (1130) in which the slit regions are formed can be configured to include a first region, a second region, and a third region in which the first portion (P1), the second portion (P2), and the third portion (P3) are formed.

[0092] Slit regions corresponding to the dielectric region between adjacent partial patterns can be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). An omni-directional radiation pattern can be formed by the conductive pattern segmented by the slit regions.

[0093] The second slit region (SR2) and the third slit region (SR3) may be configured to include a first portion (P1), a first connecting portion (CP1), a second portion (P2), a second connecting portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the third partial pattern (SP3) and may extend inwardly of the loop. The first connecting portion (CP1) may be connected to the first portion (P1) and may be formed at a position parallel to the second side (LS2) of the third partial pattern (SP3). The first connecting portion (CP1) and the second side (LS2) of the third partial pattern (SP3) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second side (LS2) of the third partial pattern (SP3) may form an inner side and an outer side of a fan shape.

[0094] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the third partial pattern (SP3) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the third partial pattern (SP3) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the third partial pattern (SP3).

[0095] The second slit region (SR2) and the third slit region (SR3) can form one side boundary and the other side boundary of the third partial pattern (SP3). The second slit region (SR2) and the third slit region (SR3) can be formed symmetrically with respect to the second center line (CL2) of the loop corresponding to the third conductive pattern (1130).

[0096] The third conductive pattern (1130) may further include a fourth slit region (SR4) and a fifth slit region (SR5). The fourth slit region (SR4) may be formed between a plurality of fourth partial patterns (SP4). The fifth slit region (SR5) may be formed between a plurality of fifth partial patterns (SP5). The shape of the fourth slit region (SR4) and the shape of the fifth slit region (SR5) may be formed symmetrically with respect to the second center line (CL2) of the loop corresponding to the third conductive pattern (1130).

[0097] The fourth slit region (SR4) and the fifth slit region (SR5) may be configured to include a first portion (P1), a first connecting portion (CP1), a second portion (P2), a second connecting portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fourth partial pattern (SP4) and may extend inwardly of the loop. The first connecting portion (CP1) may be connected to the first portion (P1) and may be formed at a position parallel to the second side (LS2) of the fourth partial pattern (SP4). The first connecting portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may form an inner side and an outer side of a fan shape.

[0098] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fourth partial pattern (SP4).

[0099] The length of the first connection portion (CP1) of the fourth slit region (SR4) may be formed longer than the length of the second connection portion (CP2) of the fourth slit region (SR4). A portion of the length of the first connection portion (CP1) of the fourth slit region (SR4) may be formed parallel to the length of the second connection portion (CP2) of the fourth slit region (SR4). A portion of the first connection portion (CP1) of the fourth slit region (SR4) and the second connection portion (CP2) of the fourth slit region (SR4) may be formed as an arc of the same curvature. A portion of the first connection portion (CP1) of the fourth slit region (SR4) and the second connection portion (CP2) of the fourth slit region (SR4) may form an inner side and an outer side of a fan shape.

[0100] The third challenge pattern (1130) may have a sixth slit region (SR6) between the first partial pattern (SP1) and at least one fourth partial pattern (SP4). The sixth slit region (SR6) may be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fourth partial pattern (SP4) and may extend inwardly of the loop. The first connection portion (CP1) may be formed at a position connected to the first portion (P1) and parallel to the second side (LS2) of the fourth partial pattern (SP4). The first connection portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second surface (LS2) of the fourth partial pattern (SP4) can form the inner and outer sides of a fan shape.

[0101] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the fourth partial pattern (SP4) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fourth partial pattern (SP4).

[0102] A portion of the length of the first connection portion (CP1) of the sixth slit region (SR6) may be formed parallel to the length of the second connection portion (CP2) of the sixth slit region (SR6). The first connection portion (CP1) of the sixth slit region (SR6) and the second connection portion (CP2) of the sixth slit region (SR6) may be formed as an arc of the same curvature. The first connection portion (CP1) of the sixth slit region (SR6) and the second connection portion (CP2) of the sixth slit region (SR6) may form the inner and outer sides of a fan shape.

[0103] The third challenge pattern (1130) may have a seventh slit region (SR7) between the first partial pattern (SP1) and at least one fifth partial pattern (SP5). The seventh slit region (SR7) may be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fifth partial pattern (SP5) and may extend inwardly of the loop. The first connection portion (CP1) may be formed at a position connected to the first portion (P1) and parallel to the second side (LS2) of the fifth partial pattern (SP5). The first connection portion (CP1) and the second side (LS2) of the fifth partial pattern (SP5) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second surface (LS2) of the fifth partial pattern (SP5) can form the inner and outer sides of a fan shape.

[0104] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fifth partial pattern (SP5) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the fifth partial pattern (SP5) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fifth partial pattern (SP5). The first connecting portion (CP1) of the seventh slit region (SR7) may be formed near the fourth conductive pattern (1140).

[0105] Meanwhile, the operating principle of the third conductive pattern (1130) in a circular ring shape in the antenna assembly (1000) supporting V2X communication according to the present specification will be described. In this regard, FIG. 7 shows the structure of the conductive pattern in a circular ring shape according to the present specification. Referring to FIG. 7, the antenna assembly may include a third conductive pattern (1130) including a plurality of slit regions, and a second conductive pattern (1120) and a fourth conductive pattern (1140) connected to one end and the other end of the third conductive pattern (1130).

[0106] The second conductive pattern (1120) and the fourth conductive pattern (1140) constitute an impedance transformer. The second conductive pattern (1120) and the fourth conductive pattern (1140) may be formed with a predetermined length and width, respectively. The second conductive pattern (1120) and the fourth conductive pattern (1140) may be formed to be spaced apart from each other by a first gap (G1). An input signal (RF in) of a specific frequency band may be applied between an end of the second conductive pattern (1120) and an end of the fourth conductive pattern (1140).

[0107] The third conductive pattern (1130) may be formed in a circular ring shape having a first inner radius (R1) and a second outer radius (R2). Eight slit regions may be formed between adjacent partial patterns of the third conductive pattern (1130). First to eighth slit regions (SR1 to SR8) may be formed between adjacent partial patterns of the third conductive pattern (1130). Unlike the slit regions of FIG. 5, all eight slit regions of FIG. 7 may be formed in a symmetrical structure. The first angle (a1) between adjacent slit regions may be formed to be the same.

[0108] The slit region (SR) may be configured to include a first portion (P1), a second portion (P2), a third portion (P3), a first connection portion (CP1), and a second connection portion (CP2), as shown in FIG. 6. Since all eight slit regions are formed in a symmetrical structure, the length (Ws) and the width (gs) of the portions of the slit region (SR) may be formed identically. Accordingly, the second angle (a2) between the first point and the second point of the first portion (P1) may be formed identically for the eight slit regions. The third angle (a3) ​​between the first point (P1) and the second portion (P2) may be formed identically for the eight slit regions. The fourth angle (a4) between the first point and the second point of the second portion (P2) may be formed identically for the eight slit regions. The second angle (a2) of the first part (P1) of the slit region (SR) and the fourth angle (a4) of the second part (P2) can be formed identically.

[0109] The length (d) of each of the plurality of partial patterns can be implemented in a range between 0.1 and 0.3λg. Each of the plurality of partial patterns can be implemented as an arc-shaped microstrip line. The length (d) of each of the plurality of partial patterns can be determined as an average length of the inner and outer lengths of the arc. Each of the plurality of partial patterns can be formed in a symmetrical structure with respect to the origin of the circular loop. Meanwhile, in the structures of FIGS. 5 and 6, each of the plurality of partial patterns can be formed in an asymmetrical structure with respect to the origin of the circular loop.

[0110] Meanwhile, Fig. 8 shows the current distribution of the circular ring-shaped conductive pattern of Fig. 7 and the equivalent circuit of each partial pattern. Referring to Fig. 7 and Fig. 8(a), each of the plurality of partial patterns of the third conductive pattern (1130) can be formed to have an in-phase current distribution. In this regard, the current distribution in the slit region between adjacent partial patterns has a higher value than the current distribution in other regions. In addition, the current distribution is expressed to be periodically repeated for each of the plurality of partial patterns. Therefore, each of the plurality of partial patterns of the third conductive pattern (1130) can be formed to have a current distribution of an MZR (Mu-Zero Resonance) antenna.

[0111] Referring to FIGS. 7 to 8(b), each of the plurality of partial patterns of the third conductive pattern (1130) can be approximated and expressed as a transmission line equivalent circuit having a predetermined length (d). The transmission line equivalent circuit of each partial pattern constituting the third conductive pattern (1130) can be configured to include an inductance (LRk), a first capacitance (CLk), and a second capacitance (CRk). Here, k corresponds to each of the partial patterns, and has a value of k=1 to N in a structure composed of N partial patterns. In order for the antenna assembly including the third conductive pattern (1130) to be configured as an MZR, each of the plurality of partial patterns needs to be configured as an MNG (mu-negative) line.

[0112] In this regard, the value of the inductance (LR) and the value of the first capacitance (CL) for the operation of the MZR antenna at the operating frequency can be derived based on mathematical expression 1 according to the dielectric constant of the glass panel (10).

[0113]

[0114] Here, and ω M represents the MZR frequency. Therefore, the shapes of a plurality of partial patterns of the third conductive pattern (1130) can be designed based on the value of the inductance (LR) and the value of the first capacitance (CL). Meanwhile, the length (d) of each of the partial patterns is a parameter that is not related to the MZR frequency. For N partial patterns, mathematical expression 1 must satisfy the boundary condition of mathematical expression 2. Meanwhile, according to the open-ended boundary condition, the condition of the input impedance (Zina) of mathematical expression 3 must be satisfied. In addition, according to the short-ended boundary condition, the condition of the input impedance (Zinb) of mathematical expression 3 must be satisfied.

[0115]

[0116]

[0117] MZR frequency (ω) for N sub-patterns MZR ) can be expressed as in the mathematical expression 4 below, and the number of partial patterns (N) is related to the operating mode of the antenna.

[0118]

[0119] Here, L short represents the inductance value according to the short-ended boundary condition.

[0120] Meanwhile, in the antenna assembly (1000) supporting V2X communication according to the present specification, the electrical characteristics may be changed depending on the number of partial patterns of the third conductive pattern (1130) having a circular ring shape. In this regard, FIGS. 9A and 9B illustrate the structure and current distribution of a conductive pattern having a circular ring shape depending on the number of partial patterns. FIG. 9A illustrates the structure of a conductive pattern having a circular ring shape depending on the number of partial patterns. FIG. 9B illustrates the current distribution of a conductive pattern having a circular ring shape depending on the number of partial patterns of FIG. 5.

[0121] Referring to Fig. 9a(a), the third conductive pattern (1130) includes first to fourth partial patterns (SP1 to SP4). A first slit region (SR1) is formed between the first and second partial patterns (SP1, SP2). A second slit region (SR2) is formed between the second and third partial patterns (SP2, SP3). A third slit region (SR3) is formed between the third and fourth partial patterns (SP3, SP4). Referring to Figs. 9a(a) and 9b(a), when the number of slit regions (S) = 3, current is transmitted between adjacent segment lines through the first to third slit regions (SR1 to SR3).

[0122] Referring to FIG. 9a(b), the third conductive pattern (1130) includes first to fifth partial patterns (SP1 to SP5). A fourth slit region (SR4) may be further formed between the fourth and fifth partial patterns (SP4, SP5). Referring to FIG. 9a(b) and FIG. 9b(b), when the number of slit regions (S) = 4, current is transmitted between adjacent partial patterns through the first to fourth slit regions (SR1 to SR4).

[0123] Referring to Fig. 9a(c), the third conductive pattern (1130) includes first to sixth partial patterns (SP1 to SP6). A fifth slit region (SR5) may be further formed between the fifth and sixth partial patterns (SP5, SP6). Referring to Figs. 9a(c) and 9b(c), when the number of slit regions (S) = 5, current is transmitted between adjacent segment lines through the first to fifth slit regions (SR1 to SR5) at a rate below a critical ratio. In this regard, the current of the second partial pattern (SP2) separated by the first slit region (SR1) has a value below the critical current value. Accordingly, the currents of the third to sixth partial patterns (SP3 to SP6) also have values ​​below the critical current value.

[0124] Referring to Fig. 9a(d), the third conductive pattern (1130) includes first to seventh partial patterns (SP1 to SP7). A sixth slit region (SR6) may be further formed between the sixth and seventh partial patterns (SP6, SP7). Referring to Figs. 9a(d) and 9b(d), when the number of slit regions (S) = 6, current is transmitted between adjacent partial patterns through the first to sixth slit regions (SR1 to SR6) at a ratio lower than a critical ratio. In this regard, the current of the second partial pattern (SP2) separated by the first slit region (SR1) has a value lower than the critical current value. Accordingly, the currents of the third to seventh partial patterns (SP3 to SP7) also have values ​​lower than the critical current value.

[0125] The length of the third conductive pattern (1130) in the shape of a circular ring can be formed in a range between 1 and 2 wavelengths (λg). For example, the length of the third conductive pattern (1130) can be formed in a predetermined range based on 1.8 λg. Accordingly, when the number of partial patterns (S) is 5 or more, the current between adjacent partial patterns is transferred below a critical ratio. Accordingly, the current between adjacent partial patterns is transferred below a critical ratio, so that an antenna having a current distribution of an MZR (Mu-Zero Resonance) antenna can be implemented in a specific frequency band.

[0126] Meanwhile, slit regions need to be defined between any adjacent partial patterns of the third ring-shaped conductive pattern (1130) according to the present specification. In this regard, Fig. 10 illustrates a structure in which each partial pattern is divided in the width direction among adjacent partial patterns.

[0127] Referring to FIG. 10, the kth partial pattern (SPk) and the k+1th partial pattern (SPk+1) may each be composed of W sub-patterns. In this regard, each of the plurality of partial patterns may be composed of an inter-digitized line including W sub-patterns. The number of each sub-pattern (W) is can be expressed as . Here, W Loop represents the width of each of the multiple sub-patterns and corresponds to the width of the antenna having a loop structure in the shape of a circular ring. α represents the width of each sub-pattern. Here, represents an integer associated with the ratio between a partial pattern and a sub-pattern.

[0128] Slit areas can be formed depending on the number (W) of each sub-pattern implemented as an inter-digital line. In this regard, FIGS. 11 and 12 illustrate slit areas formed between adjacent partial patterns having 4 and 6 sub-patterns. FIG. 11 illustrates slit areas formed between adjacent partial patterns having 4 sub-patterns.

[0129] Referring to Fig. 11(a), the kth partial pattern (SPk) and the k+1th partial pattern (SPk+1) may each be composed of four sub-patterns. The slit region may be configured to include a first portion (P1), a second portion (P2), a third portion (P3), and a fourth portion (P4). The slit region may further be configured to include a first connecting portion (CP1), a second connecting portion (CP2), and a third connecting portion (CP3) that connect adjacent portions.

[0130] Referring to FIG. 11(a) and FIG. 10(b), the first part (P1) formed on the first sub-pattern corresponding to W=1 is formed at -x / 2, and thus the position can be represented as [1, 0, 0]. The second part (P2) formed on the second sub-pattern corresponding to W=2 is formed at 0, and thus the position can be represented as [0, 1, 0]. The third part (P3) formed on the third sub-pattern corresponding to W=3 is formed at x / 2, and thus the position can be represented as [0, 0, 1]. The fourth part (P4) formed on the fourth sub-pattern corresponding to W=4 is formed at -x / 2, and thus the position can be represented as [1, 0, 0].

[0131] Referring to Fig. 12(a), the kth partial pattern (SPk) and the k+1th partial pattern (SPk+1) may each be composed of six sub-patterns. The slit region may be configured to include a first portion (P1), a second portion (P2), a third portion (P3), a fourth portion (P4), a fifth portion (P4), and a sixth portion (P6). The slit region may further be configured to include a first connecting portion (CP1), a second connecting portion (CP2), a third connecting portion (CP3), a fourth connecting portion (CP4), and a fifth connecting portion (CP5) that connect adjacent portions.

[0132] Referring to FIG. 12(a) and FIG. 12(b), the first part (P1) formed on the first sub-pattern corresponding to w=1 is formed at -x / 2, and thus the position can be expressed as [1, 0, 0, 0, 0]. The second part (P2) formed on the second sub-pattern corresponding to W=2 is formed at x / 4, and thus the position can be expressed as [0, 0, 0, 1, 0]. The second part (P2) formed on the third sub-pattern corresponding to W=3 is formed at 0, and thus the position can be expressed as [0, 0, 1, 0, 0]. The fourth part (P4) formed on the fourth sub-pattern corresponding to W=4 is formed at -x / 2, and thus the position can be expressed as [1, 0, 0, 0, 0]. The fifth part (P5) formed in the fifth sub-pattern corresponding to W=5 is formed at 0, so the position can be expressed as [0, 0, 1, 0, 0]. The sixth part (P6) formed in the sixth sub-pattern corresponding to W=6 is formed at x / 2, so the position can be expressed as [0, 0, 0, 0, 0, 1].

[0133] Referring to FIGS. 5 to 12, the width (α) of the slit region can be formed to be less than or equal to a predetermined ratio with respect to the guided wavelength (λg). In this regard, a third conductive pattern composed of partial patterns including the slit region can be arranged on a glass panel. When the dielectric constant of the glass panel is 6 to 7.5 and the third conductive pattern operates as a radiator at 5.9 GHz, the width of the slit region can be less than or equal to 0.1 mm. The slit region can be optimally designed for the N partial patterns forming the third conductive pattern. In this regard, the slit region can be independently designed according to the circumferential length (x) of the slit region, the number of sub-patterns (W), and the position of each portion of the slit region.

[0134] The circumferential length (x) of the slit region formed between consecutive adjacent partial patterns can be set to λg / Lx or less based on the wavelength (λg) in the tube. Here, Lx can be defined as a number greater than 4, and must be smaller than the length of each partial pattern (SPk, SPk+1). Accordingly, the circumferential length (x) of the slit region can be formed as x=min(λg / Lx, length of SPk). The circumferential length (x) of the slit region can be set to λg / 4 or less.

[0135] Meanwhile, the V2X vehicle antenna according to the present specification is formed with the first and fifth conductive patterns in an asymmetrical structure as it is connected to a power supply structure such as a coaxial cable. Meanwhile, in order to compensate for the asymmetrical current distribution caused by the conductive patterns of the asymmetrical structure, the slit regions of the third conductive pattern need to be designed with an optimal structure.

[0136] Accordingly, a detailed structure of a third conductive pattern in a circular ring formation in a V2X vehicle antenna according to the present specification will be described. In this regard, a first portion (P1) may be formed across an outer circumference of the third conductive pattern (1130). A first connecting portion (CP1) may be connected to the first portion (P1). The first connecting portion (CP1) may be formed substantially perpendicular to the first portion (P1). The first connecting portion (CP1) may be formed in an arc direction in which the outer circumference of the third conductive pattern (1130) is formed. A second portion (P2) may be connected to the first connecting portion (CP1). The second portion (P2) may be formed substantially perpendicular to the first connecting portion (CP1). The second portion (P2) may be formed across a circumference of a region between the outer circumference and the inner circumference of the third conductive pattern (1130).

[0137] The second connecting portion (CP2) may be connected to the second portion (P2). The second connecting portion (CP2) may be formed substantially perpendicular to the second portion (P2). The second connecting portion (CP2) may be formed in an arcuate direction in which the first connecting portion (CP1) is formed. The second connecting portion (CP2) may be formed spaced apart from the first connecting portion (CP1) by a constant interval. The third portion (P3) may be connected to the second connecting portion (CP2). The third portion (P3) may be formed substantially perpendicular to the second connecting portion (CP2). The third portion (P3) may be formed across the circumference of the third conductive pattern (1130). The third portion (P3) may be formed to extend to the inner circumference of the third conductive pattern (1130).

[0138] The first portion (P1) may be formed with a first length from a first point on the outer circumference of the third conductive pattern (1130) to a second point inwardly perpendicular to the outer circumference. The first connecting portion (CP1) may be formed with a second length from a second point on the first portion (P1) to a third point in the direction in which the outer circumference of the third conductive pattern (1130) is formed. The second portion (P2) may be formed with a third length from a third point on the first connecting portion (CP1) to a fourth point inwardly perpendicular to the outer circumference of the third conductive pattern (1130).

[0139] The second connecting portion (CP2) can be formed with a fourth length from the fourth point of the second portion (P2) to the fifth point in the direction in which the outer periphery of the third conductive pattern (1130) is formed. The third portion (P3) can be formed with a fifth length from the fifth point of the second connecting portion (CP2) to the sixth point inwardly perpendicular to the outer periphery of the third conductive pattern (1130).

[0140] Meanwhile, the third conductive pattern (1130) formed in a circular ring shape may be configured to include a plurality of slit regions and a plurality of partial patterns. The number of the plurality of slit regions may be six and the number of the plurality of partial patterns may be seven, but is not limited thereto and may be changed according to the application. Meanwhile, in order to form an omni-directional radiation pattern, the number of slit regions needs to be formed to be five or more.

[0141] Referring to FIGS. 1 to 12, the third conductive pattern (1130) may be configured to include a first partial pattern SP1, a second partial pattern SP2, a third partial pattern SP3, a plurality of fourth partial patterns SP4, and a plurality of fifth partial patterns SP5. The plurality of fourth partial patterns SP4 may include a first sub-partial pattern SP4a and a second sub-partial pattern SP4b. A fourth slot region SR4 may be formed between the first sub-partial pattern SP4a and the second sub-partial pattern SP4b. The plurality of fifth partial patterns SP5 may include a first sub-partial pattern SP5a and a second sub-partial pattern SP5b. A fifth slot region SR5 may be formed between the first sub-partial pattern SP5a and the second sub-partial pattern SP5b.

[0142] The third challenge pattern (1130) may include a first slit region (SR1) formed by a first gap (G1) and a plurality of slit regions formed by a second gap (G2). The plurality of slit regions may include a second slit region (SR2), a third slit region (SR3), a fourth slit region (SR4), a fifth slit region (SR5), a sixth slit region (SR6), and a seventh slit region (SR7).

[0143] Meanwhile, each of the plurality of slit regions may include a first portion (P1), a second portion (P2), and a third portion (P3), a first connecting portion (CP1) connecting the first portion (P1) and the second portion (P2), and a second connecting portion (CP2) connecting the second portion (P2) and the third portion (P3).

[0144] Meanwhile, each portion of some of the plurality of slit regions may be formed with the same shape. Each portion of the remaining slit regions may be formed with different shapes. In this regard, the plurality of slit regions may be arranged on different lines extending radially from the center of the circular ring of the third conductive pattern (1130).

[0145] The second part (P2) of the sixth slit region (SR6) may be arranged on a first line (L1) extending from the center of the circular ring. The first part (P1) and the third part (P3) of the sixth slit region (SR6) may be arranged on a second line (L2) extending from the center of the circular ring. The second part (P2), the third part (P3) and the first part (P1) of the fourth slit region (SR4) may be arranged on a third line (L3), a fourth line (L4) and a fifth line (L5) extending from the center of the circular ring, respectively.

[0146] The first part (P1), the second part (P2), and the third part (P3) of the second slit region (SR2) may be arranged on the sixth line (L6), the seventh line (L7), and the eighth line (L8) extending from the center of the circular ring, respectively. The third part (P3), the second part (P2), and the first part (P1) of the third slit region (SR3) may be arranged on the ninth line (L9), the tenth line (L10), and the eleventh line (L11) extending from the center of the circular ring, respectively. The second line (L2) to the eleventh line (L11) may be formed in a direction sequentially rotated counterclockwise or clockwise with respect to the first line (L1).

[0147] The third partial pattern (SP3) between the second slit region (SR2) and the third slit region (SR3) may be formed in a symmetrical structure with respect to an axis (Y-axis) parallel to the second and fourth conductive patterns (1120, 1140). A first distance on the circumference may be formed between a first point of the first part (P1) of the second slit region (SR2) and a second point of the first part (P1) of the third slit region (SR3). A second distance shorter than the first distance on the circumference may be formed between a third point of the second part (P2) of the second slit region (SR2) and a third point of the second part (P2) of the third slit region (SR3). The distance between the fifth point of the third part (P3) of the second slit region (SR2) and the sixth point of the third part (P3) of the third slit region (SR3) can be formed as a third distance shorter than the second distance on the circumference.

[0148] The first part (P1), the third part (P3), and the second part (P2) of the fifth slit region (SR5) may be arranged on the 12th line (L12), the 13th line (L13), and the 14th line (L14) extending from the center of the circular ring, respectively. The third part (P3), the second part (P2), and the first part (P1) of the seventh slit region (SR7) may be arranged on the 15th line (L15), the 16th line (L16), and the 17th line (L17) extending from the center of the circular ring, respectively. The 12th line (L12) to the 17th line (L17) may be formed in a direction sequentially rotated counterclockwise or clockwise with respect to the 11th line (L11).

[0149] Meanwhile, in the vehicle antenna supporting V2X communication according to the present specification, the slit regions of the antenna assembly (1000) may be formed with a more detailed structure. In this regard, FIG. 13 illustrates a connection structure of a V2X antenna and a cable having slit regions of first to fourth portions arranged on a glass panel of a vehicle coupled with a metal frame. FIG. 14 is an enlarged view of the slit region of the V2X antenna of FIG. 13. Referring to FIGS. 1, 4, 13, and 14, a glass assembly of a vehicle antenna supporting V2X communication according to the present specification and a vehicle will be described.

[0150] A glass assembly (200) is configured to include a glass panel (10, 310, 330), an antenna assembly (1000), and a cable (100c). A vehicle (1) having a glass assembly (200) is configured to include a glass panel (10, 310, 330), a metal frame (9), an antenna assembly (1000), and a cable (100c). The glass panel (10, 310, 330) may be configured as a glass substrate on which conductive patterns of the antenna assembly (1000) are arranged.

[0151] As described above, the plurality of conductive patterns (1100) of the antenna assembly (1000) may be configured to include a first conductive pattern (1110), a second conductive pattern (1120), a third conductive pattern (1130), a fourth conductive pattern (1140), and a fifth conductive pattern (1150). The overlapping portions of the structure of the antenna assembly (1000) of FIGS. 13 and 14 are replaced with the description of the structure of the antenna assembly (1000) of FIGS. 5 and 6.

[0152] The first conductive pattern (1110) may be connected to the power supply line (110) of the cable (100c). The first conductive pattern (1110) may be formed on an opaque area (12, 312, 332) of a glass panel (10, 310, 330). The second conductive pattern (1120) may be electrically connected to the first conductive pattern (1110). The first conductive pattern (1110) may be arranged in a first axis direction, which is the X-axis direction. The second conductive pattern (1120) may be arranged in a second axis direction, which is the Y-axis direction.

[0153] The third conductive pattern (1130) may be formed to be connected to the second conductive pattern (1120). The third conductive pattern (1130) may be formed in a loop shape on the transparent area (11, 311, 331) of the glass panel (10, 310, 330). The third conductive pattern (1130) may be formed in a loop shape having a circular ring shape. The third conductive pattern (1130) may be formed to be connected to the fourth conductive pattern (1140) arranged parallel to the second conductive pattern (1120).

[0154] The fourth conductive pattern (1140) may be formed to be connected to the third conductive pattern (1130). The fourth conductive pattern (1140) may be arranged parallel to the second conductive pattern (1120). The fifth conductive pattern (1150) may be electrically connected to the fourth conductive pattern (1140). The fifth conductive pattern (1150) may be connected to the ground line (120) of the cable (100c). The fifth conductive pattern (1150) may be arranged in the first axis direction, which is the X-axis direction. The fourth conductive pattern (1140) may be arranged in the second axis direction, which is the Y-axis direction.

[0155] The third conductive pattern (1130) may include a plurality of segment patterns separated by a dielectric region of the substrate (1010). Slit regions corresponding to the dielectric region may be formed between adjacent segment patterns among the plurality of segment patterns of the third conductive pattern (1130). The slit regions correspond to regions where the segment patterns of the conductive patterns are separated.

[0156] Among the plurality of partial patterns, a first partial pattern (SP1) may be connected to a second conductive pattern (1120). Among the plurality of partial patterns, a second partial pattern (SP2) may be connected to a fourth conductive pattern (1140). A first slit region (SR1) may be formed between the first partial pattern (SP1) and the second partial pattern (SP2) and spaced apart from each other by a first gap (G1) among the plurality of slit regions. A third partial pattern (SP3) among the plurality of partial patterns may be arranged in an area opposite to the first slit region (SR1) with respect to a first center line (CL1) of the loop.

[0157] At least one fourth partial pattern (SP4) may be arranged between the first partial pattern (SP1) and the third partial pattern (SP3). A second slit region (SR2) may be formed between the third partial pattern (SP3) and one fourth partial pattern (SP4) and spaced apart by a second gap (G2). At least one fifth partial pattern (SP5) may be arranged between the second partial pattern (SP2) and the third partial pattern (SP3). A third slit region (SR3) may be formed between the third partial pattern (SP3) and the fifth partial pattern (SP5) and spaced apart by a second gap (G2).

[0158] The third partial pattern (SP3) may have a first surface (LS1) forming the inner side of the loop and a second surface (LS2) forming the outer side of the loop. The first surface (LS1) and the second surface (LS2) may correspond to the inner and outer peripheries of the third partial pattern (SP3). The length of the second surface (LS2) may be formed to be longer than the length of the first surface (LS1). The interval of the first gap (G1) of the first slit region (SR1) may be formed to be wider than the interval of the second gap (G2) of the second slit region (SR2) and the third slit region (SR3).

[0159] The second slit region (SR2) and the third slit region (SR3) may be formed starting from the inner circumference of the loop and extending to the outer circumference of the loop. The second slit region (SR2) and the third slit region (SR3) may be formed in a step shape.

[0160] Slit regions corresponding to the dielectric region between adjacent partial patterns can be configured to include a first portion (P1), a second portion (P2), a third portion (P3), a first connection portion (CP1), and a second connection portion (CP2). An omni-directional radiation pattern, which is an omnidirectional radiation pattern, can be formed by the conductive pattern segmented by the slit regions. In this regard, the third conductive pattern (1130) in which the slit regions are formed can be configured to include a first region, a second region, and a third region in which the first portion (P1), the second portion (P2), and the third portion (P3) are formed.

[0161] Slit regions corresponding to the dielectric region between adjacent partial patterns can be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). An omni-directional radiation pattern can be formed by the conductive pattern segmented by the slit regions.

[0162] The second slit region (SR2) and the third slit region (SR3) may be configured to include a first portion (P1), a first connecting portion (CP1), a second portion (P2), a second connecting portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the third partial pattern (SP3) and may extend inwardly of the loop. The first connecting portion (CP1) may be connected to the first portion (P1) and may be formed at a position parallel to the second side (LS2) of the third partial pattern (SP3). The first connecting portion (CP1) and the second side (LS2) of the third partial pattern (SP3) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second side (LS2) of the third partial pattern (SP3) may form an inner side and an outer side of a fan shape.

[0163] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the third partial pattern (SP3) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the third partial pattern (SP3) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the third partial pattern (SP3).

[0164] The second slit region (SR2) and the third slit region (SR3) can form one side boundary and the other side boundary of the third partial pattern (SP3). The second slit region (SR2) and the third slit region (SR3) can be formed symmetrically with respect to the second center line (CL2) of the loop corresponding to the third conductive pattern (1130).

[0165] The third conductive pattern (1130) may further include a fourth slit region (SR4) and a fifth slit region (SR5). The fourth slit region may be formed between a plurality of fourth partial patterns (SP4). The fifth slit region (SR5) may be formed between a plurality of fifth partial patterns (SP5). The shape of the fourth slit region (SR4) and the shape of the fifth slit region (SR5) may be formed symmetrically with respect to the second center line (CL2) of the loop corresponding to the third conductive pattern (1130).

[0166] The fourth slit region (SR4) and the fifth slit region (SR5) may be configured to include a first portion (P1), a first connecting portion (CP1), a second portion (P2), a second connecting portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fourth partial pattern (SP4) and may extend inwardly of the loop. The first connecting portion (CP1) may be connected to the first portion (P1) and may be formed at a position parallel to the second side (LS2) of the fourth partial pattern (SP4). The first connecting portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may form an inner side and an outer side of a fan shape.

[0167] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fourth partial pattern (SP4).

[0168] The length of the first connection portion (CP1) of the fourth slit region (SR4) may be formed shorter than the length of the second connection portion (CP2) of the fourth slit region (SR4). The length of the first connection portion (CP1) of the fourth slit region (SR4) may be formed parallel to a portion of the length of the second connection portion (CP2) of the fourth slit region (SR4). A portion of the length of the first connection portion (CP1) of the fourth slit region (SR4) and the second connection portion (CP2) of the fourth slit region (SR4) may be formed as an arc of the same curvature. A portion of the length of the first connection portion (CP1) of the fourth slit region (SR4) and the second connection portion (CP2) of the fourth slit region (SR4) may form an inner side and an outer side of a fan shape.

[0169] The third challenge pattern (1130) may have a sixth slit region (SR6) between the first partial pattern (SP1) and at least one fourth partial pattern (SP4). The sixth slit region (SR6) may be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fourth partial pattern (SP4) and may extend inwardly of the loop. The first connection portion (CP1) may be formed at a position connected to the first portion (P1) and parallel to the second side (LS2) of the fourth partial pattern (SP4). The first connection portion (CP1) and the second side (LS2) of the fourth partial pattern (SP4) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second surface (LS2) of the fourth partial pattern (SP4) can form the inner and outer sides of a fan shape.

[0170] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fourth partial pattern (SP4) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the fourth partial pattern (SP4) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fourth partial pattern (SP4).

[0171] A portion of the length of the first connection portion (CP1) of the sixth slit region (SR6) may be formed parallel to the length of the second connection portion (CP2) of the sixth slit region (SR6). The first connection portion (CP1) of the sixth slit region (SR6) and the second connection portion (CP2) of the sixth slit region (SR6) may be formed as an arc of the same curvature. The first connection portion (CP1) of the sixth slit region (SR6) and the second connection portion (CP2) of the sixth slit region (SR6) may form the inner and outer sides of a fan shape.

[0172] The third challenge pattern (1130) may have a seventh slit region (SR7) between the first partial pattern (SP1) and at least one fifth partial pattern (SP5). The seventh slit region (SR7) may be configured to include a first portion (P1), a first connection portion (CP1), a second portion (P2), a second connection portion (CP2), and a third portion (P3). The first portion (P1) may be formed near the second side (LS2) of the fifth partial pattern (SP5) and may extend inwardly of the loop. The first connection portion (CP1) may be formed at a position connected to the first portion (P1) and parallel to the second side (LS2) of the fifth partial pattern (SP5). The first connection portion (CP1) and the second side (LS2) of the fifth partial pattern (SP5) may be formed as an arc of the same curvature. The first connecting portion (CP1) and the second surface (LS2) of the fifth partial pattern (SP5) can form the inner and outer sides of a fan shape.

[0173] The second portion (P2) may be connected to the first connecting portion (CP1) and may extend inwardly of the loop. The second connecting portion (CP2) may be connected to the second portion (P2) and may be formed at a position parallel to the first surface (LS1) of the third partial pattern (SP3). The second connecting portion (CP2) and the first surface (LS1) of the fifth partial pattern (SP5) may be formed as an arc having the same curvature. The second connecting portion (CP2) and the second surface (LS2) of the fifth partial pattern (SP5) may form the inner and outer sides of a fan shape. The third portion (P3) may be connected to the second connecting portion (CP2) and may be formed to extend to the vicinity of the first surface (LS1) of the fifth partial pattern (SP5). The first connecting portion (CP1) of the seventh slit region (SR7) may be formed near the fourth conductive pattern (1140).

[0174] As described above, the third conductive pattern (1130) having a plurality of slit regions formed therein may be configured to include a first region, a second region, a third region, and a fourth region, in which a first portion (P1), a second portion (P2), a third portion (P3), and a fourth portion (P4) are formed. The first portion (P1) may be formed across the outer periphery of the third conductive pattern (1130). The first connecting portion (CP1) may be connected to the first portion (P1). The first connecting portion (CP1) may be formed substantially perpendicular to the first portion (P1). The first connecting portion (CP1) may be formed in an arc direction along which the outer periphery of the third conductive pattern (1130) is formed. The second portion (P2) may be connected to the first connecting portion (CP1). The second portion (P2) may be formed substantially perpendicular to the first connecting portion (CP1). The second portion (P2) can be formed across the circumference of the area between the outer and inner peripheries of the third challenge pattern (1130).

[0175] The second connecting portion (CP2) may be connected to the second portion (P2). The second connecting portion (CP2) may be formed substantially perpendicular to the second portion (P2). The second connecting portion (CP2) may be formed in an arcuate direction in which the first connecting portion (CP1) is formed. The second connecting portion (CP2) may be formed spaced apart from the first connecting portion (CP1) by a constant interval. The third portion (P3) may be connected to the second connecting portion (CP2). The third portion (P3) may be formed substantially perpendicular to the second connecting portion (CP2). The third portion (P3) may be formed across the circumference of the third conductive pattern (1130).

[0176] The third connecting portion (CP3) may be connected to the third portion (P3). The third connecting portion (CP3) may be formed substantially perpendicular to the third portion (P3). The third connecting portion (CP3) may be formed in an arcuate direction in which the second connecting portion (CP2) is formed. The third connecting portion (CP3) may be formed spaced apart from the second connecting portion (CP2) by a constant interval. The fourth portion (P4) may be connected to the third connecting portion (CP3). The fourth portion (P4) may be formed substantially perpendicular to the third connecting portion (CP3). The fourth portion (P4) may be formed across the circumference of the third conductive pattern (1130). The fourth portion (P4) may be formed to extend to the inner circumference of the third conductive pattern (1130).

[0177] The first portion (P1) may be formed with a first length from a first point on the outer circumference of the third conductive pattern (1130) to a second point inwardly perpendicular to the outer circumference. The first connecting portion (CP1) may be formed with a second length from a second point on the first portion (P1) to a third point in the direction in which the outer circumference of the third conductive pattern (1130) is formed. The second portion (P2) may be formed with a third length from a third point on the first connecting portion (CP1) to a fourth point inwardly perpendicular to the outer circumference of the third conductive pattern (1130).

[0178] The second connecting portion (CP2) can be formed with a fourth length from the fourth point of the second portion (P2) to the fifth point in the direction in which the outer periphery of the third conductive pattern (1130) is formed. The third portion (P3) can be formed with a fifth length from the fifth point of the second connecting portion (CP2) to the sixth point inwardly perpendicular to the outer periphery of the third conductive pattern (1130).

[0179] The third connecting portion (CP3) can be formed with a sixth length from the sixth point of the third portion (P3) to the seventh point in the direction in which the outer circumference of the third conductive pattern (1130) is formed. The fourth portion (P4) can be formed with a seventh length from the seventh point of the third connecting portion (CP3) to the eighth point inwardly perpendicular to the inner circumference of the third conductive pattern (1130).

[0180] The third challenge pattern (1130) may be configured to include a first partial pattern (SP1), a second partial pattern (SP2), a third partial pattern (SP3), a plurality of fourth partial patterns (SP4), and a plurality of fifth partial patterns (SP5). The plurality of fourth partial patterns (SP4) may include a first sub-partial pattern (SP4a), a second sub-partial pattern (SP4b), and a third sub-partial pattern (SP4c). A first sub-slot (SR4a) of a fourth slot region (SR4) may be formed between the first sub-partial pattern (SP4a) and the second sub-partial pattern (SP4b). A second sub-slot (SR4b) of the fourth slot region (SR4) may be formed between the second sub-partial pattern (SP4b) and the third sub-partial pattern (SP4c). The plurality of fifth partial patterns (SP5) may include a first sub-partial pattern (SP5a), a second sub-partial pattern (SP5b), and a third sub-partial pattern (SP4c). A first sub-slot (SR5a) of a fifth slot region (SR5) may be formed between the first sub-partial pattern (SP5a) and the second sub-partial pattern (SP5b). A second sub-slot (SR5b) of a fourth slot region (SR5) may be formed between the second sub-partial pattern (SP5b) and the third sub-partial pattern (SP5c).

[0181] The third challenge pattern (1130) may include a first slit region (SR1) formed by a first gap (G1) and a plurality of slit regions formed by a second gap (G2). The plurality of slit regions may be configured to include a second slit region (SR2), a third slit region (SR3), a plurality of fourth slit regions (SR4), a plurality of fifth slit regions (SR5), a sixth slit region (SR6), and a seventh slit region (SR7). The overlapping portions in the structure of the antenna assembly (1000) of FIGS. 16 and 18 are replaced with the description of the structure of the antenna assembly (1000) of FIGS. 5 to 10.

[0182] Meanwhile, each of the plurality of slit regions may include a first portion (P1), a second portion (P2), and a third portion (P3), a first connecting portion (CP1) connecting the first portion (P1) and the second portion (P2), and a second connecting portion (CP2) connecting the second portion (P2) and the third portion (P3).

[0183] Meanwhile, each portion of some of the plurality of slit regions may be formed with the same shape. Each portion of the remaining slit regions may be formed with different shapes. In this regard, the plurality of slit regions may be arranged on different lines extending radially from the center of the circular ring of the third conductive pattern (1130).

[0184] The second part (P2) of the sixth slit region (SR6) may be arranged on a first line (L1) extending from the center of the circular ring. The first part (P1) and the third part (P3) of the sixth slit region (SR6) may be arranged on a second line (L2) extending from the center of the circular ring. The second part (P2), the first part (P1) and the third part (P3) of the fourth slit region (SR4) may be arranged on a third line (L3), a fourth line (L4) and a fifth line (L5) extending from the center of the circular ring, respectively.

[0185] The second part (P2), the first part (P1) and the third part (P3) of the fourth slit region (SR4) may be arranged on the sixth line (L6), the seventh line (L7) and the eighth line (L8) extending from the center of the circular ring, respectively. The first part (P1), the second part (P2) and the third part (P3) of the second slit region (SR2) may be arranged on the ninth line (L9), the tenth line (L10) and the eleventh line (L11) extending from the center of the circular ring, respectively. The third part (P3), the second part (P2) and the first part (P1) of the third slit region (SR3) may be arranged on the twelfth line (L12), the thirteenth line (L13) and the fourteenth line (L14) extending from the center of the circular ring, respectively. The second line (L2) to the fourteenth line (L14) can be formed in a direction that is sequentially rotated counterclockwise or clockwise with respect to the first line (L1).

[0186] The third partial pattern (SP3) between the second slit region (SR2) and the third slit region (SR3) may be formed in a symmetrical structure with respect to an axis (Y-axis) parallel to the second and fourth conductive patterns (1120, 1140). A first distance on the circumference may be formed between a first point of the first part (P1) of the second slit region (SR2) and a second point of the first part (P1) of the third slit region (SR3). A second distance shorter than the first distance on the circumference may be formed between a third point of the second part (P2) of the second slit region (SR2) and a third point of the second part (P2) of the third slit region (SR3). The distance between the fifth point of the third part (P3) of the second slit region (SR2) and the sixth point of the third part (P3) of the third slit region (SR3) can be formed as a third distance shorter than the second distance on the circumference.

[0187] The third part (P3), the first part (P1) and the second part (P2) of the fifth slit region (SR5) may be arranged on the fifteenth line (L15), the sixteenth line (L16) and the seventeenth line (L17) extending from the center of the circular ring, respectively. The third part (P3), the first part (P1) and the second part (P2) of the fifth slit region (SR5) may be arranged on the eighteenth line (L18), the nineteenth line (L18) and the twentieth line (L20) extending from the center of the circular ring, respectively. The third part (P3), the second part (P2) and the first part (P1) of the seventh slit region (SR7) may be arranged on the twenty-first line (L21), the twenty-second line (L22) and the twenty-third line (L23) extending from the center of the circular ring, respectively. The 15th line (L15) to the 23rd line (L23) can be formed in a direction that is sequentially rotated counterclockwise or clockwise with respect to the 14th line (L14).

[0188] Meanwhile, the antenna assembly (1000) formed of conductive patterns (1100) connected to the cable (100c) may be formed in an asymmetric structure for impedance matching with the cable (100c). In this regard, the first conductive pattern (1110) connected to the feed line (110) of the cable (100c) may be formed with a first length (L1b) on the X-axis and a first width (W1b) on the Y-axis. The fifth conductive pattern (1150) connected to the ground line (120) of the cable (100c) may be formed with a second length (L2b) on the X-axis and a second width (W1b) on the Y-axis. The second length (L2b) of the fifth conductive pattern (1150) on the X-axis may be formed longer than the first length (L1b) of the first conductive pattern (1110) on the X-axis. The second width (W1b) on the Y-axis of the fifth challenge pattern (1150) may be formed wider than the first width (W1b) on the Y-axis of the first challenge pattern (1110).

[0189] Meanwhile, in the antenna assembly according to the present specification, the partial pattern of the lower region in the Y-axis direction of the third conductive pattern (1130) in a circular ring shape can be formed with a symmetrical structure. In this regard, the imbalance in current distribution due to the asymmetrical structure of the second and fourth conductive patterns (1120, 1140) can be resolved by the compensation structure of the asymmetrical structure of the first and second partial patterns (SP1, SP2). Therefore, the third partial pattern (SP3) of the lower region in the Y-axis direction of the third conductive pattern (1130) which is spaced the furthest from the second and fourth conductive patterns (1120, 1140) can be formed with a symmetrical structure with respect to the Y-axis. In this regard, the third partial pattern (SP3) of the lower region in the Y-axis direction of the third conductive pattern (1130) of FIGS. 5 and 13 can also be formed with a symmetrical structure with respect to the Y-axis.

[0190] Meanwhile, FIG. 15 is a drawing that divides the third partial pattern of FIG. 5 and the third partial pattern of FIG. 13 into sub-patterns and indicates the location of each sub-pattern. Referring to FIG. 9 and FIG. 15(a), a second slit region (SR2) may be formed on one side (left) of the third partial pattern (SP3). The boundary of one side (left) of the third partial pattern (SP3) may be arranged in the section from -x / 2 to x / 2. A third slit region (SR3) may be formed on the other side (right) of the third partial pattern (SP3). The boundary of the other side (right) of the third partial pattern (SP3) may be arranged in the section from -x / 2 to x / 2.

[0191] Referring to FIG. 5, FIG. 15(a) and FIG. 15(b), the position of the third portion (P3) corresponding to W=1 of the second slit region (SR2) can be represented as [0, 0, 1]. The position of the second portion (P2) corresponding to W=2 of the second slit region (SR2) can be represented as [0, 1, 0]. The position of the first portion (P1) corresponding to W=3 of the second slit region (SR2) can be represented as [1, 0, 0].

[0192] Referring to FIG. 9, FIG. 15(a), and FIG. 15(c), the position of the third part (P3) corresponding to W=1 of the third slit region (SR3) can be represented as [1, 0, 0]. The position of the second part (P2) corresponding to W=2 of the third slit region (SR3) can be represented as [0, 1, 0]. The position of the first part (P1) corresponding to W=3 of the third slit region (SR3) can be represented as [0, 0, 1].

[0193] Referring to FIG. 13 and FIG. 15(a), a third slit region (SR3) may be formed on one side (left) of the third partial pattern (SP3). The boundary of one side (left) of the third partial pattern (SP3) may be arranged in the section from -x / 2 to x / 2. A second slit region (SR2) may be formed on the other side (right) of the third partial pattern (SP3). The boundary of the other side (right) of the third partial pattern (SP3) may be arranged in the section from -x / 2 to x / 2.

[0194] Referring to FIG. 13, FIG. 15(a) and FIG. 15(b), the position of the third part (P3) corresponding to W=1 of the third slit region (SR3) can be represented as [0, 0, 1]. The position of the second part (P2) corresponding to W=2 of the third slit region (SR3) can be represented as [0, 1, 0]. The position of the first part (P1) corresponding to W=3 of the third slit region (SR3) can be represented as [1, 0, 0].

[0195] Referring to FIG. 13, FIG. 15(a), and FIG. 15(c), the position of the third portion (P3) corresponding to W=1 of the second slit region (SR2) can be represented as [1, 0, 0]. The position of the second portion (P2) corresponding to W=2 of the second slit region (SR2) can be represented as [0, 1, 0]. The position of the first portion (P1) corresponding to W=3 of the second slit region (SR2) can be represented as [0, 0, 1].

[0196] Meanwhile, the antenna assembly (1000) according to the present specification can be arranged in a circular ring shape on the transparent area (11, 311, 331) of the glass panel (10, 310, 330) to minimize the overall antenna size. In this regard, when the antenna assembly (1000) including the first conductive pattern (1110) to the fifth conductive pattern (1150) is implemented in a structure in which it is not arranged on the glass panel, it can be arranged within an area of ​​20 mm X 26 mm on the X-axis and the Y-axis. Meanwhile, the antenna assembly (1000) including the first conductive pattern (1110) to the fifth conductive pattern (1150) arranged on the transparent area (11, 311, 331) of the glass panel (10, 310, 330) can be arranged within an area of ​​14 mm X 20 mm on the X-axis and the Y-axis.

[0197] Meanwhile, the antenna assembly according to the present specification is formed to operate in a V2X frequency band. In this regard, FIG. 16 shows reflection coefficient characteristics and gain characteristics of the antenna assembly of FIG. 5. FIG. 16(a) shows reflection coefficient characteristics (S11) of the antenna assembly of FIG. 5. Referring to FIGS. 5, 6, and 16(a), an antenna assembly (1000) without a frame made of metal around it has a reflection coefficient characteristic of -13.7 dB or less in a frequency band of 5.855 to 5.925 GHz.

[0198] Fig. 16(b) shows the radiated power characteristics of the antenna assembly of Fig. 13. Referring to Figs. 5, 6, and 16(b), the antenna assembly (1000) without a metal frame around it has a radiated power characteristic of -1.17 dB at 5.855 GHz.

[0199] Fig. 17 shows the reflection coefficient characteristics and gain characteristics of the antenna assembly of Fig. 13. Fig. 17(a) shows the reflection coefficient characteristics (S11) of the antenna assembly of Fig. 13. Referring to Figs. 13, 14, and 17(a), the antenna assembly (1000) positioned adjacent to the frame (9) made of a metal material has a reflection coefficient characteristic of -12.6 dB or less in the frequency band of 5.855 to 5.925 GHz. Therefore, the reduction in the reflection coefficient characteristics due to the frame (9) made of a metal material can be ignored, and the antenna assembly (1000) positioned adjacent to the frame (9) operates as a radiator.

[0200] Fig. 17(b) shows the radiated power characteristics of the antenna assembly of Fig. 13. Referring to Figs. 13, 14, and 17(b), the antenna assembly (1000) positioned adjacent to the metal frame (9) has a radiated power characteristic of -2.37 dB at 5.855 GHz. Therefore, the reduction in radiated power (antenna gain) due to the metal frame (9) has a value within the range of 1.2 dB.

[0201] Meanwhile, the antenna assembly according to the present specification forms a nearly uniform current distribution in a plurality of partial patterns separated by slit regions. In this regard, FIG. 18 illustrates a current distribution formed in an antenna assembly positioned adjacent to the metal frame of FIG. 13.

[0202] Referring to FIGS. 13 and 18, a substantially uniform current distribution is formed in the first partial pattern (SP1), the second partial pattern (SP2), the third partial pattern (SP3), the plurality of fourth partial patterns (SP4), and the plurality of fifth partial patterns (SP5) to have a current value within a predetermined range. In addition, the current value transmitted between adjacent partial patterns by the first slit region (SR1) to the seventh slit region (SR7) is formed to be less than a threshold current value. Since a substantially uniform current distribution is formed in the plurality of partial patterns and the current coupled between adjacent partial patterns is minimized, the antenna efficiency is improved, and an omnidirectional radiation pattern can be implemented.

[0203] Accordingly, an omni-directional radiation pattern can be implemented by a conductive pattern having a plurality of partial patterns separated by slit areas that can be placed on a vehicle glass. In addition, an antenna structure satisfying wireless performance for V2X communication on a vehicle glass having a constant inclination angle can be provided by a conductive pattern having a plurality of partial patterns separated by slit areas.

[0204] Meanwhile, a V2X antenna structure having reliability and robustness in terms of mass production can be implemented on a vehicle glass panel through an antenna assembly arranged in an opaque area and a transparent area of ​​a glass panel and connected to a cable. In addition, an antenna structure that can be implemented in a minimized size in an opaque area and a transparent area of ​​a glass panel can be provided through a cable connection structure and a circular ring-shaped conductive pattern having a plurality of partial patterns separated by a slit area.

[0205] The technical effects of a glass assembly having an antenna assembly disposed on a vehicle glass according to the present disclosure are described below. In this regard, by introducing a slit structure into the loop antenna, the following effects can be achieved:

[0206] The surface current distribution within the loop pattern can be uniformly achieved through multiple segment patterns and slit structures. This uniform surface current distribution can play a significant role in improving antenna performance.

[0207] Uniform current distribution reduces distortion of the signal radiation pattern and enables more stable and consistent signal radiation.

[0208] In high-performance communication systems such as V2X communication, improving antenna performance contributes to increasing the efficiency of the entire system, enabling efficient wireless communication.

[0209] Therefore, the present disclosure can effectively solve the problem of surface current distribution of a loop antenna, thereby optimizing the performance of the antenna and increasing its usability in various communication applications.

[0210] Further scope of the applicability of this disclosure will become apparent from the detailed description below. However, since various changes and modifications within the spirit and scope of this disclosure will be readily apparent to those skilled in the art, further scope of the applicability of this disclosure, such as the detailed description and preferred embodiments of this disclosure, will become apparent from the detailed description below. Accordingly, the detailed description above should not be construed as limiting in any respect, but rather as illustrative. The scope of this disclosure should be determined by a reasonable interpretation of the appended claims, and all changes coming within the equivalent scope of this disclosure are intended to be embraced therein.

Claims

In glass assembly, A glass panel having a first dielectric constant including a transparent region and an opaque region; An antenna assembly disposed on the glass panel and configured to radiate a wireless signal; and A cable comprising a feed line for feeding a signal to the antenna assembly and a ground line surrounding the dielectric, The above antenna assembly, a substrate formed on one side of the opaque area of ​​the glass panel and having a second dielectric constant; and The substrate comprises a first surface facing the glass panel and a second surface formed on an opposite side of the first surface, and includes a plurality of conductive patterns formed on the second surface. The above multiple challenge patterns are: A first conductive pattern connected to the power supply line of the above cable; A second conductive pattern electrically connected to the first conductive pattern; A third conductive pattern connected to the second conductive pattern and formed in a loop shape; A fourth challenge pattern connected to the third challenge pattern and arranged parallel to the second challenge pattern; and A fifth conductive pattern electrically connected to the fourth conductive pattern and connected to the ground line of the cable, The third challenge pattern includes a plurality of segment patterns, A plurality of slit regions corresponding to the dielectric region are formed between adjacent partial patterns among the plurality of partial patterns of the third challenge pattern, Among the plurality of partial patterns, the first partial pattern is connected to the second challenge pattern, The second partial pattern among the plurality of partial patterns is connected to the fourth challenge pattern, A first slit region is formed between the first partial pattern and the second partial pattern, spaced apart by a first gap among the plurality of slit regions, A third partial pattern among the plurality of partial patterns is arranged in an area opposite to the first slit area based on the first center line of the loop, At least one fourth partial pattern is arranged between the first partial pattern and the third partial pattern, A second slit region is formed spaced apart by a second gap between the third partial pattern and the fourth partial pattern, At least one fifth partial pattern is arranged between the second partial pattern and the third partial pattern, A third slit region is formed spaced apart by the second gap between the third partial pattern and the fifth partial pattern, The third partial pattern has a first side forming the inner side of the loop and a second side forming the outer side of the loop, and the length of the second side is longer than the length of the first side. A glass assembly wherein the spacing of the first gap is wider than the spacing of the second gap. In the first paragraph, A glass assembly wherein the second slit region and the third slit region are formed starting from the inner surface of the loop and extending to the outer surface of the loop, and are formed in a step shape. In the second paragraph, The above second slit region is, A first portion formed near the second surface of the third partial pattern and extending inwardly of the loop; A first connecting portion connected to the first portion and formed at a position parallel to the second surface; A second portion connected to the first connecting portion and extending inwardly of the loop; A second connecting portion connected to the second portion and formed at a position parallel to the first surface; and A glass assembly comprising a third portion connected to the second connecting portion and formed to extend to the vicinity of the first surface of the third partial pattern. In the third paragraph, A glass assembly wherein the second slit region and the third slit region are formed symmetrically with respect to the second center line of the loop. In the first paragraph, The antenna assembly further comprises a fourth slit region formed between a plurality of fourth partial patterns and a fifth slit region formed between a plurality of fifth partial patterns. The shape of the fourth slit area and the shape of the fifth slit area are formed symmetrically based on the second center line of the loop, the glass assembly In paragraph 5, The above fourth slit region is, A first portion formed near the second surface of the fourth partial pattern and extending inwardly of the loop; A first connecting portion connected to the first portion and formed at a position parallel to the second surface; A second portion connected to the first connecting portion and extending inwardly of the loop; A second connecting portion connected to the second portion and formed at a position parallel to the first surface; and A glass assembly comprising a third portion connected to the second connecting portion and formed to extend to the vicinity of the first surface of the fourth partial pattern. In paragraph 6, A glass assembly, characterized in that the length of the first connecting portion of the fourth slit area is longer than the length of the second connecting portion of the fourth slit area. In paragraph 7, A glass assembly, wherein a portion of the length of the first connecting portion of the fourth slit area is formed parallel to the length of the second connecting portion of the fourth slit area. In paragraph 8, A glass assembly, characterized in that the length of the first connecting portion of the fourth slit area is shorter than the length of the second connecting portion of the fourth slit area. In paragraph 9, A glass assembly, wherein the length of the first connecting portion of the fourth slit area is formed parallel to a portion of the length of the second connecting portion of the fourth slit area. In the first paragraph, The antenna assembly has a sixth slit area between the first partial pattern and the at least one fourth partial pattern, The above 6th slit region is, A first portion formed near the second surface of the fourth partial pattern and extending inwardly of the loop; A first connecting portion connected to the first portion and formed at a position parallel to the second surface; A second portion connected to the first connecting portion and extending inwardly of the loop; A second connecting portion connected to the second portion and formed at a position parallel to the first surface; and A third portion is formed by being connected to the second connecting portion and extending to the vicinity of the first surface of the fourth partial pattern, A glass assembly, wherein a portion of the length of the first connecting portion of the sixth slit area is formed parallel to the length of the second connecting portion of the sixth slit area. In the first paragraph, The antenna assembly has a seventh slit area between the first partial pattern and the at least one fifth partial pattern, The above 7th slit region is, A first portion formed near the second surface of the fifth partial pattern and extending inwardly of the loop; A first connecting portion connected to the first portion and formed at a position parallel to the second surface; A second portion connected to the first connecting portion and extending inwardly of the loop; A second connecting portion connected to the second portion and formed at a position parallel to the first surface; and A third portion is formed by being connected to the second connecting portion and extending to the vicinity of the first surface of the fifth partial pattern, A glass assembly, wherein the first connecting portion of the seventh slit region is formed near the fourth conductive pattern. In the first paragraph, The first conductive pattern connected to the power supply line of the cable is formed with a first length on the X-axis and a first width on the Y-axis, The fifth conductive pattern connected to the ground line of the cable is formed with a second length on the X-axis and a second width on the Y-axis, A glass assembly wherein the second length is longer than the first length, and the second width is wider than the first width. In the first paragraph, A glass assembly, wherein the antenna assembly including the first conductive pattern to the fifth conductive pattern disposed on the transparent area of ​​the glass panel is disposed within an area of ​​14 mm X 20 mm on the X-axis and the Y-axis. In the first paragraph, In the above opaque area, a frit area is formed in which frit patterns are arranged on the glass panel, A glass assembly having an antenna assembly positioned overlapping the above frit area. In the first paragraph, In the above opaque area, a frit area is formed in which frit patterns are arranged on the glass panel, A glass assembly comprising a first opaque region in which a metal frame of a vehicle configured to support the glass panel is additionally configured, a second opaque region in which the antenna assembly and the frit region overlap the glass panel, and the transparent region excluding the frit region. In Article 16, Further comprising a cover having an area covering the antenna assembly, The above cover is a glass assembly having a structure that is fixed to the above metal frame.

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