Optical system, lithography machine having an optical system, and method for producing an optical system

Abstract

An optical system for a lithography machine comprising a plurality of optical elements has a number N1 of arrangements, where N1 ≥ 1, each of the N1 arrangements comprising a number of actuator / sensor devices, each actuator / sensor device being associated with one of the optical elements, and a number N2 of local control units for controlling the number N1 of arrangements, wherein each of the N1 arrangements comprises a ring network having N3 network devices arranged in a ring and connected by N3 primary connections, wherein the N3 network devices comprise a number N4 of the actuator / sensor devices and N5 bridges, where N5 ≥ 0 and N3 = N4 + N5, wherein the N4 actuator / sensor devices comprise a first subset N6 each having a connection to one of the local control units and a second subset N7 without a connection to one of the local control units, where N4 = N6 + N7, wherein each group member of the group consisting of the N5 bridges and the N7 actuator / sensor devices is connected to another group member of the group by a secondary connection, and wherein each secondary connection bypasses at least one adjacent group member in the group.

Description

[0001] Carl Zeiss SMT GmbH

[0002] 1

[0003] OPTICAL SYSTEM, LITHOGRAPHING PLANT WITH AN OPTICAL SYSTEM AND METHOD FOR MANUFACTURING AN OPTICAL SYSTEM

[0004] The present invention relates to an optical system and a lithography system comprising such an optical system. Furthermore, the present invention relates to a method for manufacturing an optical system for a lithography system.

[0005] The content of priority application DE 10 2024 209 175.8 is fully incorporated by reference.

[0006] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system, which includes an illumination system and a projection system. The image of a mask (reticule) illuminated by the illumination system is projected by the projection system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system. This transfers the mask structure onto the photosensitive coating of the substrate.

[0007] Driven by the pursuit of ever smaller structures in the production of integrated circuits, EUV lithography systems are currently being developed that use light with a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm. Since most materials absorb light of this wavelength, such EUV lithography systems must use reflective optics, i.e., mirrors, instead of the refracting optics, i.e., lenses, used previously. Carl Zeiss SMT GmbH

[0008] 2

[0009] Lithography systems incorporate a variety of actuator / sensor devices, such as sensors and actuators. Generally, an actuator / sensor device is capable of moving an associated optical element, such as a mirror, and / or acquiring a parameter of the associated optical element, such as its position or temperature. For control and evaluation, such an actuator / sensor device must be electrically connected to an electronic component, particularly an integrated circuit (IC).

[0010] The number of Actuator7Sensor devices in optical systems of lithography machines is steadily increasing. With conventional star-shaped wiring of the Actuator7Sensor devices, the length of the cable runs increases linearly. Cleanroom-compatible cables are expensive and also consume the limited installation space available in the lithography machine. Bus systems, on the other hand, require less wiring effort, but are susceptible to failures of individual connected devices and can therefore lead to the failure of an entire group of connected devices if the bus system itself malfunctions.

[0011] Document DE 10 2015 224 742 A proposes a lithography system comprising a radiation source for generating radiation, a plurality of optical components for guiding the radiation within the system, a number of arrangements, each arrangement comprising at least one actuator / sensor unit assigned to one of the optical components, a plurality of local control units for controlling the arrangements, and a number of central control units for controlling the local control units. The distributed control of the actuator / sensor units by means of the local and central control units makes it possible to control the parameters specified by Carl Zeiss SMT GmbH.

[0012] 3. to distribute the heat generated. This avoids heat spots, for example in the vacuum housing of the lithography system, and harmonizes and optimizes heat distribution. Each component of the arrangement is connected to one of the local control units for data exchange. However, it is possible that such a connection may fail or become faulty after some time.

[0013] Replacing electronic components, such as faulty connections between an actuator / sensor unit and a control unit, in the optical system of a lithography system, especially within the vacuum range, requires a significant amount of time before the system can be returned to operation. A modular design, such as that described in the document cited above, offers a solution.

[0014] As described in DE 10 2015 224 742 Al, while it enables a reduction in maintenance time and maintenance costs, with an increasing number of connections between the modules, i.e. in particular the actuator / sensor devices and the control units, the frequency of errors also increases, especially when there are several hundred electrical connections between the modules.

[0015] Document DE 10 2022 211 696 A describes an optical system for a lithography system comprising a plurality of optical elements, which includes: a number of arrangements, each of which comprises at least one actuator / sensor device assigned to one of the optical elements; a plurality of local control units for controlling the number of arrangements; and a number of central control units for controlling the local control units, wherein each of the arrangements is connected to at least one of the N2 local control units by means of a primary connection and a secondary connection redundant to the primary connection, one of which is Carl Zeiss SMT GmbH

[0016] 4 active connection usable for data transmission and the other of the connections is inactive, wherein each of the local control units has a plurality of interface devices for establishing the primary connection or the secondary connection to one of the arrangements, a fault detection unit for detecting a fault in one of the active connections of a particular arrangement, and a provisioning unit for providing switching information to switch the active connection exhibiting a detected fault to the inactive connection of the particular arrangement.

[0017] Against this background, one object of the present invention is to provide an improved optical system.

[0018] According to a first aspect, an optical system for a lithography system comprising a plurality of optical elements is proposed, which has: a number N1 of arrangements, with N1>1, wherein each of the N1 arrangements comprises a number of actuator / sensor devices, the respective actuator / sensor device being assigned to one of the optical elements, and a number N2 of local control units for controlling the number N1 arrangements, wherein each of the N1 arrangements comprises a ring network with N3 network devices arranged in a ring and connected by N3 primary connections, wherein the N3 network devices comprise a number N4 of actuator / sensor devices and N5 bridges, with N5>0 and N3=N4+N5, wherein the N4 actuator / sensor devices comprise a first subset N6 with a respective connection to one of the local control units and a second subset N7 without a connection to one of the local control units, with N4=N6+N7.Carl Zeiss SMT GmbH,

[0019] 5 wherein each group member of the group consisting of the N5 bridges and the N7 actuator7sensor devices is connected to another group member of the group by means of a secondary connection, wherein the respective secondary connection bridges at least one adjacent group member in the group.

[0020] An arrangement is specifically designed as a printed circuit board (PCB) that integrates, for example, a plurality of MMUs, each with a mirror array, as network devices. The ring network of network devices in the respective arrangement, comprising the primary and secondary connections, creates a wiring scheme that is redundantly designed to be robust against single faults within the ring network. The next element in the ring network is considered a neighboring group member. The physical placement on the PCB can be arbitrary.

[0021] The use of primary and secondary connections results in redundant connections between all network devices in the ring network of the arrangement. This advantageously allows the failure of a connection in the ring network to be tolerated. If a specific active connection used for data transmission between two network devices in the ring structure fails, the system can switch to the associated redundant secondary connection.

[0022] The network devices in the ring network are interconnected with local redundancy, thus meeting the highest requirements for reliability, real-time capability, and latency in communication within the configuration. Carl Zeiss SMT GmbH

[0023] 6

[0024] The present ring network with primary and secondary connections ensures robust communication against individual faults in a network topology with point-to-point connections between participating network devices. This results in high system availability while simultaneously saving costs and installation space due to the reduced wiring effort in the arrangement. Overall, this also advantageously saves on the length of expensive cleanroom-compatible cables and the associated installation space.

[0025] Due to the presupposing condition that the respective secondary connection bridges at least one neighboring group member in the group, the following rules are observed:

[0026] 1. When bridging in the ring network through the respective secondary connection, at least one adjacent location in the ring network is always skipped.

[0027] 2. When skipping, actuator / sensor devices that have a connection to one of the local control units are not counted. Consequently, only actuator / sensor devices that have no connection to one of the local control units, and bridges, are counted when skipping.

[0028] 3. The positions in the ring network that have a connection to one of the local control units are always occupied by an actuator / sensor device, and not by a bridge.

[0029] This means that each network device in the group has at least one alternative connection to a non-adjacent network device of Carl Zeiss SMT GmbH.

[0030] 7

[0031] The group is designed to tolerate the failure of individual network devices in the ring network. The N2 local control units, with N2>1, are configured to control the network devices in the ring network of the array from a higher hierarchy level. The N6 actuator / sensor units, each connected to one of the local control units, handle the data exchange between the array and the higher hierarchy level of the local control units. A further number of central control units may be provided at a hierarchy level above the local control units.

[0032] Each bridge can also be called an adapter bridge, bridge device, or device bridge and is suitable for forwarding data in any direction within the ring network. Specifically, each N5 bridge includes an electrical through-connection in each direction of the ring network. The ring network can also be referred to as a network or a network with a ring topology.

[0033] In particular, if a slot in the ring network is not occupied by an actuator / sensor device, for example, when the arrangement is configured as a circuit board with N3 slots, the free slots are bridged by adapter bridges, primarily electrically without packet routing, in order to keep the ring of the ring network closed. Specifically, adapter bridges are not used in consecutive slots.

[0034] The optical system is preferably a projection optic of the lithography system or a projection exposure system. However, the optical system can also be an illumination system. The projection exposure system can be an EUV lithography system. EUV stands for "Extreme Ultraviolet" and refers to a wavelength of the working light between 0.1 nm and 30 nm. The projection exposure system can also be a DUV lithography system. DUV stands for Carl Zeiss SMT GmbH.

[0035] 8

[0036] "Deep Ultraviolet" refers to a wavelength of the working light between 30 nm and 465 nm.

[0037] The respective actuator / sensor device is, for example, an actuator (or actuator) for actuating an optical element, a sensor for sensing an optical element or an environment in the optical system, or an actuator / sensor device for actuating and sensing in the optical system. The sensor is, for example, a temperature sensor. The actuator is, for example, an electrostrictive actuator or a piezoelectric actuator, such as a PMN actuator (PMN; lead magnesium niobate) or a PZT actuator (PZT; lead zirconate titanate). The actuator can also be a MEMS actuator (MEMS; microelectromechanical system). The actuator is specifically configured to actuate an optical element of the optical system. Examples of such an optical element include lenses, mirrors, and adaptive mirrors.

[0038] The following parameters are used in the description of the present optical system:

[0039] N 1 Number of arrangements

[0040] N2 Number of local control units

[0041] N3 Number of network devices in the ring network N3 Number of primary connections in the ring network N4 Number of actuator / sensor devices in the ring network N5 Number of bridges in the ring network

[0042] N6 Number of actuator / sensor devices in the ring network connected to one of the local control units

[0043] N7 Number of actuator / sensor devices in the ring network without a connection to one of the local control units

[0044] N8 Number of central control units Carl Zeiss SMT GmbH

[0045] 9

[0046] According to one embodiment, the respective primary connection is a point-to-point connection between two of the network devices arranged in the ring network.

[0047] According to a further embodiment, the group members form a ring structure by means of the N3 primary connections and the N6 actuator7 sensor devices. In the ring structure, each group member is connected to two adjacent group members either via one of the primary connections or via two of the primary connections and one of the N6 actuator7 sensor devices.

[0048] According to another embodiment, the respective secondary connection is a point-to-point connection between two of the non-adjacent group members arranged in the ring structure.

[0049] According to another embodiment, the N4 actuator / sensor units of the ring network are identical. In particular, the N4 actuator / sensor units are identical according to the common parts principle. By using identical actuator / sensor units, manufacturing costs for the optical system can be reduced.

[0050] According to another embodiment, each of the N3 network devices has at least two inputs and at least two outputs. Preferably, each of the N3 network devices has exactly two inputs and exactly two outputs. In alternative embodiments, each of the N3 network devices has exactly four inputs and exactly four outputs.

[0051] According to another embodiment, the N6 actuator / sensor devices are connected to N6 different local control units, with Carl Zeiss SMT GmbH

[0052] 10

[0053] 2 <N6<N2. Damit wird vorteilhafterweise Redundanz bei der datentechnischen Ankopplung der Anordnung und dabei insbesondere ihrer Aktor7Sensor-Einrich- tungen mit der höheren Hierarchieebene, vorliegend den lokalen Ansteuereinheiten, bewerkstelligt.

[0054] According to another embodiment, each of the N6 actuator7sensor devices is connected to a specific of the N6 different local control units via a downlink connection for transmitting commands from the specific local control unit to the connected actuator7sensor device and via an uplink connection for transmitting data from the actuator / sensor device to the connected local control unit.

[0055] According to another embodiment, the respective primary connection is designed as a unidirectional connection. According to a further, alternative embodiment, the respective primary connection is designed as a bidirectional connection.

[0056] According to another embodiment, the respective secondary connection is designed as a unidirectional connection. According to a further, alternative embodiment, the respective secondary connection is designed as a bidirectional connection.

[0057] According to another embodiment, each of the N5 bridges has a respective electrical through-connection in each direction of the ring network.

[0058] According to a further embodiment, each of the N1 arrangements is configured as a circuit board. The respective circuit board includes, in particular, N3 slots, which are interconnected via the N3 primary connections to form the ring network. Carl Zeiss SMT GmbH

[0059] 11

[0060] According to another embodiment, each slot of a subset N6 of the N3 slots is connected to one of the N2 local control units, with N6 <N3, insbesondere über eine dedizierte Downlink-Verbindung und eine dedizierte Uplink-Verbindung. Dabei ist jeder der N6 Steckplätze mit einer der N6 Aktor7Sensor-Einrichtungen bestückt. Damit sind diejenigen Steckplätze mit einer Verbindung zu einer der lokalen Ansteuereinheiten mit solchen Aktor7Sen- sor-Einrichtungen bestückt, welche zur Kommunikation mit einer der hierarchisch höheren lokalen Ansteuereinheiten eingerichtet sind.

[0061] According to another embodiment, the N3 network devices are configured to send and receive data packets of a specific communication protocol over the ring network. The respective data packet comprises, in particular, a first frame with packet routing information, a second frame with header information, and a third frame with payload data.

[0062] According to another embodiment, the packet routing information of the first frame determines a path in the ring network. In particular, the path is a complete path in the ring network. The packet routing information for each forwarding step of the data packet in the ring network comprises a bit group of a predetermined bit length. Each bit group is assigned to one of the network devices that determine the path in the ring network.

[0063] According to another embodiment, the respective network device has a first output connected to the respective primary connection and a second output connected to the respective secondary connection. The respective bit group of packet routing information is used to forward the data packet via the first output of the respective Carl Zeiss SMT GmbH

[0064] 12. The network device of the path has a first encoding. For forwarding the data packet via the second output of the respective network device of the path, the respective bit group of the packet routing information has a second encoding.

[0065] The last bit group of the packet routing information has a third encoding to indicate the termination of the data packet at the network device associated with the last bit group.

[0066] If the respective network device has more than two outputs, the codings of the packet routing information are adjusted accordingly, so that the respective assignment of one of the outputs to a respective coding is unique.

[0067] For example, the packet routing information is formatted as: 01 101 101 1 10100

[0068] In this example, the packet routing information consists of five bit groups, each with a length of 2 bits. The first encoding for forwarding over the primary connection is 01, the second encoding for forwarding over the secondary connection is 10, and the third encoding for terminating the data packet at the assigned network device is 00. Thus, in this example, there is one sending network device and three forwarding network devices, with the data packet ultimately terminating at the network device designated 00. Using this packet routing information in the first frame of the data packet, the sender of the data packet determines the path through the network to the other network participants by means of packet forwarding instructions, specifically through the different encodings of the bit groups.Because the packet routing information is provided in the first frame of the data packet, every network participant can see the data packet header, in this case comprising the first and second frames, even before Carl Zeiss SMT GmbH.

[0069] 13

[0070] The entire data packet is analyzed upon receipt. The packet routing information contained within is followed accordingly by the receiving network participant, and the data packet header can be adjusted so that the next network participant receives the routing instructions intended for it.

[0071] According to another embodiment, data transmission in the ring network is time-slot based. Time-slot-based data transmission within the ring network also ensures that data packets always arrive at the respective receiver with the same delay, enabling, for example, real-time transmission of sensor data. As described above, the data packet header contains the transmission path through the ring network. Consequently, a constant, predictable latency can be achieved during data packet transmission. This allows the use of a simplified transmission protocol where the network devices of the ring network do not require any information about the ring network itself.

[0072] According to another embodiment, the respective network device is configured to analyze and subsequently consume only the leading bit group, so that the respective network device only ever needs to analyze the first bit group. The respective bit group can also be referred to as a symbol. In other words, the leading symbol can be consumed and deleted from the packet routing information during forwarding, so that each Actuator7Sensor device only ever needs to evaluate the leading symbol. This eliminates the need for the Actuator7Sensor devices to have any knowledge of the network itself, and they can all use an identical evaluation unit. To keep the length of the routing information constant, any symbol can be appended to the end, or even the leading deleted bit. The latter allows the receiver to reconstruct the routing path to the sender. Carl Zeiss SMT GmbH

[0073] 14

[0074] According to another embodiment, the local control unit is configured to analyze the ring network by sending data packets of the specified communication protocol designed for network analysis via the network devices of the ring network and, based on this, to define a number of ring paths, in particular logical ring paths, in the ring network.

[0075] According to another embodiment, the local control unit is configured to define the ring paths in the ring network such that each point-to-point connection between two of the network devices is used a maximum of once per ring path.

[0076] At least one local control unit analyzes the ring network of the system for existing devices and connections by systematically sending data packets according to the source-driven routing principle and defines one or more ring paths through the ring network, in which each direct connection between two network participants is used at most once per ring path. This advantageously results in redundant communication connections in the analyzed ring network of the system. After defining the ring paths, data can be exchanged between the local control unit and the network participants of the ring network, particularly using time-division multiplexing. The local control unit can, in particular, send data packets according to the source-driven routing principle, with each sent data packet having the local control unit itself as its destination, so that the data packets can traverse the defined ring path.For example, in each circulating data packet, a fixed data block is allocated to each network participant, in which data can be received and sent by overwriting the received data. Carl Zeiss SMT GmbH.

[0077] 15

[0078] According to another embodiment, the optical system further comprises a number N8 of central control units for controlling the N2 local control units, with N8 1.

[0079] According to another embodiment, the optical system is arranged in a vacuum housing of the lithography system.

[0080] According to another embodiment, the optical system is designed as an illumination optic or as a projection optic of a lithography system.

[0081] In embodiments, the optical system described above is suitable for transmitting data about its arrangements and local control units, in particular by means of a specific network protocol. The transmitted data can, in particular, include a reference clock, for example an external reference clock, or be configured as a reference clock. The reference clock can, in particular, include timestamp information.

[0082] This makes the optical system particularly suitable for implementing a method for clock synchronization of network devices connected in a network. Such a method for clock synchronization of network devices of an optical system of a lithography system, wherein a specific network device is connected to a local control unit via a link, comprises, for example, the following steps: a) starting the network devices with a respective local clock, b) receiving a data signal sent by the local control unit via the link at the specific network device. Carl Zeiss SMT GmbH

[0083] 16

[0084] a) Clock recovery of an external reference clock from the received data signal by the specified network device, c) switching the specified network device from its local clock to the recovered external reference clock, and d) passing the recovered external reference clock to other network devices via a 1-to-N connection.

[0085] A method for clock synchronization is described in particular in German patent application DE 10 2025 129 800.9, the contents of which are hereby fully incorporated by reference. Consequently, the present optical system is particularly suitable for carrying out the clock synchronization method described in German patent application DE 10 2025 129 800.9.

[0086] According to a second aspect, a lithography system is proposed which has an optical system according to the first aspect or according to one of the embodiments of the first aspect.

[0087] According to a third aspect, a method for manufacturing an optical system for a lithography system is proposed, comprising a plurality of optical elements. The method includes:

[0088] Providing a number N 1 of arrangements, with N 1>1, wherein each of the N 1 arrangements comprises a number of actuator7sensor devices, the respective actuator7sensor device being assigned to one of the optical elements,

[0089] Providing a number N2 of local control units for controlling the number N1 arrangements, wherein in each of the N1 arrangements N3 network devices are arranged in a ring and connected to form a ring network by N3 primary connections, wherein the N3 network devices are Carl Zeiss SMT GmbH

[0090] 17 comprising a number N4 of actuator / sensor devices and N5 bridges, with N5>0 and N3=N4+N5, wherein a first subset N6 of the N4 actuator / sensor devices is connected to one of the local control units by means of a respective connection and a second subset N7 of the N4 actuator / sensor devices is provided without connection to one of the local control units, with N4=N6+N7, wherein each group member of the group consisting of the N5 bridges and the N7 actuator / sensor devices is connected to another group member of the group by means of a secondary connection, wherein the respective secondary connection bridges at least one adjacent group member in the group.

[0091] The embodiments described for the proposed optical system apply accordingly to the proposed method. Furthermore, the definitions and explanations relating to the optical system also apply accordingly to the proposed method.

[0092] The term "one" here should not necessarily be understood as restricting the number to exactly one element. Rather, it can also refer to multiple elements, such as two, three, or more. Similarly, every other counter used here should not be interpreted as restricting the number to the exact number stated. Instead, numerical deviations, both higher and lower, are possible unless otherwise specified.

[0093] Other possible implementations of the invention also include combinations of features or embodiments described previously or subsequently with regard to the exemplary embodiments, even if not explicitly mentioned. In such cases, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention. Carl Zeiss SMT GmbH

[0094] 18

[0095] Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will be explained in more detail below with reference to preferred embodiments and the accompanying figures.

[0096] Fig. 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography;

[0097] Fig. 2 shows a schematic representation of a first embodiment of an optical system with a central control unit, local control units and an arrangement with actuator / sensor devices.

[0098] Fig. 3 shows a schematic representation of a second embodiment of an optical system;

[0099] Fig. 4 shows a schematic representation of a third embodiment of an optical system;

[0100] Fig. 5 shows a schematic representation of a data packet that can be transmitted via the ring network of the arrangement;

[0101] Fig. 6 shows a schematic representation of a fourth embodiment of an optical system;

[0102] Fig. 7 shows a schematic representation of ring paths in the ring network of an optical system arrangement; and

[0103] Fig. 8 shows a schematic flowchart of a process for manufacturing an optical system for a lithography system. Carl Zeiss SMT GmbH

[0104] 19

[0105] In the figures, identical or functionally equivalent elements have been labelled with the same reference symbols, unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

[0106] Fig. 1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of the illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, an illumination optic 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the illumination system 2. In this case, the illumination system 2 does not include the light source 3.

[0107] A reticule 7 arranged in the object field 5 is exposed. The reticule 7 is held by a reticule holder 8. The reticule holder 8 can be moved, particularly in a scanning direction, via a reticule displacement drive 9.

[0108] Figure 1 illustrates a Cartesian coordinate system with an x-direction x, a y-direction y, and a z-direction z. The x-direction x runs perpendicular to the plane of the drawing. The y-direction y runs horizontally, and the z-direction z runs vertically. In Figure 1, the scan direction runs along the y-direction y. The z-direction z runs perpendicular to the object plane 6.

[0109] The projection exposure system 1 comprises a projection optic 10. The projection optic 10 serves to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, Carl Zeiss SMT GmbH

[0110] 20. An angle other than 0° between the object plane 6 and the image plane 12 is also possible.

[0111] A structure on the reticulum 7 is imaged onto a photosensitive layer of a wafer 13 located in the image plane 12 within the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved, particularly along the y-direction y, via a wafer transfer drive 15. The movement of the reticulum 7 via the reticulum transfer drive 9 and of the wafer 13 via the wafer transfer drive 15 can be synchronized.

[0112] Light source 3 is an EUV radiation source. Light source 3 emits, in particular, EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation 16 has a wavelength in the range between 5 nm and 30 nm. Light source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma, plasma generated using a laser) or a DPP source (Gas Discharged Produced Plasma, plasma generated by gas discharge). It can also be a synchrotron-based radiation source. Light source 3 can be a free-electron laser (FEL).

[0113] The illumination radiation 16 emanating from the light source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and / or hyperboloid reflective surfaces. The at least one reflective surface of the collector 17 can be illuminated by the illumination radiation 16 at grazing incidence (Gl), i.e., with angles of incidence greater than 45°, or at normal incidence (NI), i.e., with angles of incidence less than 45°. Carl Zeiss SMT GmbH

[0114] 21. The collector 17 can be structured and / or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress stray light.

[0115] After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4.

[0116] The illumination optics 4 comprise a deflecting mirror 19 and, downstream in the beam path, a first faceted mirror 20. The deflecting mirror 19 can be a planar deflecting mirror or, alternatively, a mirror with an effect that influences the beam shape beyond the mere deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first faceted mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field faceted mirror. The first faceted mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Only a few of these first facets 21 are shown in Fig. 1 as examples.

[0117] The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or semicircular border contour. The first facets 21 can be designed as planar facets or alternatively as convexly or concavely curved facets.

[0118] As is known, for example, from DE 10 2008 009 600 Al, the first facets 21 themselves can each also consist of a large number of individual mirrors, Carl Zeiss SMT GmbH

[0119] 22, in particular, a plurality of micromirrors. The first faceted mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1.

[0120] Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction y.

[0121] In the beam path of the illumination optics 4, a second faceted mirror 22 is arranged downstream of the first faceted mirror 20. If the second faceted mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil faceted mirror. The second faceted mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first faceted mirror 20 and the second faceted mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1 614 008 B1, and US 6,573,978.

[0122] The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

[0123] The second facets 23 can also be macroscopic facets, which may, for example, have round, rectangular, or hexagonal edges, or alternatively, facets composed of micromirrors. Reference is also made to DE 10 2008 009 600 Al in this regard.

[0124] The second facets 23 can have flat or, alternatively, convex or concave curved reflective surfaces. Carl Zeiss SMT GmbH

[0125] 23

[0126] The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a honeycomb condenser (EnglJ Fly's Eye Integrator).

[0127] It can be advantageous not to arrange the second faceted mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second faceted mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as described, for example, in DE 10 2017 220 586 A1.

[0128] With the aid of the second faceted mirror 22, the individual first facets 21 are imaged into the object field 5. The second faceted mirror 22 is the last beam-shaping, or indeed the last, mirror for the illumination radiation 16 in the beam path before the object field 5.

[0129] In another embodiment of the illumination optics 4, not shown, a transmission optic can be arranged in the beam path between the second facet mirror 22 and the object field 5, which contributes in particular to imaging the first facets 21 into the object field 5. The transmission optic can have exactly one mirror, or alternatively two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optic can in particular comprise one or two mirrors for normal incidence (Ni mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (GF mirrors, grazing incidence mirrors).

[0130] In the embodiment shown in Fig. 1, the illumination optics 4 has exactly three mirrors after the collector 17: the deflecting mirror 19, the first faceted mirror 20, and the second faceted mirror 22. Carl Zeiss SMT GmbH

[0131] 24

[0132] In a further embodiment of the lighting optics 4, the deflecting mirror 19 can also be omitted, so that the lighting optics 4 after the collector 17 can then have exactly two mirrors, namely the first faceted mirror 20 and the second faceted mirror 22.

[0133] The mapping of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optic into the object plane 6 is regularly only an approximate mapping.

[0134] The projection optics 10 comprise a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

[0135] In the example shown in Fig. 1, the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The projection optics 10 is a double-obscured optic. The penultimate mirror M5 and the last mirror M6 each have a passage aperture for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75.

[0136] The reflective surfaces of the mirrors Mi can be designed as freeform surfaces without an axis of rotational symmetry. Alternatively, the reflective surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflective surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon. Carl Zeiss SMT GmbH

[0137] 25

[0138] The projection optics 10 has a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

[0139] The projection optics 10 can be anamorphic. In particular, they have different image scales βx, βy in the x and y directions. The two image scales βx, βy of the projection optics 10 are preferably (βx, βy) = (+ / - 0.25, ± 0.125). A positive image scale β indicates an image without image inversion. A negative value for the image scale β indicates an image with image inversion.

[0140] The projection optics 10 thus lead to a reduction in the x-direction x, that is, in the direction perpendicular to the scan direction, in a ratio of 4'1.

[0141] The projection optics 10 lead to a reduction of 8H in the y-direction y, that is, in the scan direction.

[0142] Other magnification ratios are also possible. Magnification ratios with the same sign and absolute value in the x and y directions (x, y), for example with absolute values ​​of 0.125 or 0.25, are also possible.

[0143] The number of intermediate image planes in the x and y directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, different. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from US Patent 2018 / 0074303 A. Carl Zeiss SMT GmbH

[0144] 26 Each of the second facets 23 is assigned to exactly one of the first facets 21 to form an illumination channel for illuminating the object field 5. This can result, in particular, in illumination according to Köhler's principle. The far field is divided into a multitude of object fields 5 with the help of the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to each of them.

[0145] The first facets 21 are each superimposed on a corresponding second facet 23 to illuminate the object field 5 on the reticle 7. The illumination of the object field 5 is particularly homogeneous. It preferably exhibits a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

[0146] The illumination of the entrance pupil of the projection optics 10 can be geometrically defined by arranging the second facets 23. By selecting the illumination channels, in particular the subset of the second facets 23 that carry light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil filling.

[0147] Another preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by a redistribution of the illumination channels.

[0148] Further aspects and details of the illumination of the object field 5, and in particular the entrance pupil of the projection optics 10, are described below. Carl Zeiss SMT GmbH

[0149] 27

[0150] The projection optics 10 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

[0151] The entrance pupil of the projection optics 10 cannot always be illuminated exactly by the second faceted mirror 22. When the projection optics 10 image the center of the second faceted mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found where the pairwise determined separation of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in real space. In particular, this surface exhibits a finite curvature.

[0152] The projection optics 10 may have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second faceted mirror 22 and the reticle 7. This optical element can accommodate the different positions of the tangential and sagittal entrance pupils.

[0153] In the arrangement of the components of the illumination optics 4 shown in Fig. 1, the second faceted mirror 22 is arranged in a plane conjugate to the entrance pupil of the projection optics 10. The first faceted mirror 20 is arranged tilted relative to the object plane 6. The first faceted mirror 20 is arranged tilted relative to an arrangement plane defined by the deflecting mirror 19. The first faceted mirror 20 is arranged tilted relative to an arrangement plane defined by the second faceted mirror 22.

[0154] Fig. 2 shows a schematic representation of an embodiment of an optical system 100 for a lithography system or Carl Zeiss SMT GmbH

[0155] 28

[0156] Projection exposure system 1, as shown, for example, in Fig. 1. Furthermore, the optical system 100 of Fig. 2 can also be used, for example, in a

[0157] DUV lithography system will be used.

[0158] The optical system 100 comprises a number of NI arrangements 200, with NI

[0159] > 1, wherein each of the NI arrangements 200 comprises a number of actuator / sensor devices 201, 202 (see, for example, Fig. 3). The number of actuator / sensor devices 201, 202 of the respective arrangement 200 are part of a respective ring network 210. The respective arrangement 200 is preferably configured as a printed circuit board.

[0160] The Actuator7Sensor device 201, 202 is, for example, an actuator device for relocating the optical element, a sensor device for determining a position of the optical element, or an actuator and sensor device for relocating the optical element and for determining a position of the optical element.

[0161] Furthermore, the optical system 100 comprises a plurality N2 of local control units 300 for controlling the number N1 of arrangements 200, with N2 > 2.

[0162] Furthermore, the optical system 100 has a number N8 of central control units 400 for controlling the local control units 300, with N8 > 1. Here, N1, N2, and N8 are, in particular, natural numbers. Without loss of generality, N8 = 1 in Fig. 2.

[0163] Details of the ring network 210 of the arrangement 200 are shown in Fig. 3. Without loss of generality, the optical system 100 of Fig. 3 comprises an arrangement 200 (with N=1) and two local control units 300 (N2=2). In general, each of the N1 arrangements 200 has a number of actuator / sensor devices 201, 202, wherein the respective actuator / sensor is Carl Zeiss SMT GmbH

[0164] 29

[0165] Device 201, 202 is assigned to one of the optical elements of the optical system 100. The N2 local control units 300 are configured to control the number NI of arrangements 200, as discussed above with reference to Fig. 2.

[0166] As already explained with regard to Fig. 2, each of the N1 arrangements 200 has a ring network 210. This ring network 210 is shown in detail in Fig. 3. The ring network 210 of Fig. 3 comprises N3 network devices 201, 202, 203 arranged in a ring. In the example of Fig. 3, N3 = 12, and thus the ring network 210 of Fig. 3 comprises twelve network devices 201, 202, 203.

[0167] The network devices 201, 202, 203 arranged in a ring (N3) are connected by primary connections V3 (N3). Since N3 = 12, the ring network 210 has twelve primary connections VI. Each primary connection VI is, in particular, a point-to-point connection between any two of the network devices 201, 202, 203 arranged in the ring network 210. For example, each primary connection VI is configured as a unidirectional connection. Alternatively, each primary connection VI can also be configured as a bidirectional connection.

[0168] The N3 network devices 201, 202, 203 comprise a number N4 of actuator / sensor devices 201, 202 (with N4=10 in Fig. 3) and N5 bridges 203 (with N5=2 in Fig. 3). The N4 actuator / sensor devices of Fig. 3 comprise two actuator / sensor devices with reference 201 and eight actuator / sensor devices with reference 202. The actuator / sensor devices with reference 210 are those actuator / sensor devices that have a connection to one of the local control units 300. In contrast, the actuator / sensor devices with reference 202 are those actuator / sensor devices that do not have a connection to one of the local control units 300. In general, the N4 Actuator7Sensor - Carl Zeiss SMT GmbH

[0169] 30

[0170] Devices 201, 202 (with N4=10 in Fig. 3) a first subset N6 (with N6=2 in Fig. 3) of actuator / sensor devices 201 with respective connection V3, V4 to one of the local control units 300 and a second subset N7 (with N7=8 in Fig. 3) without a connection to one of the local control units 300.

[0171] The respective bridge 203 can also be referred to as an adapter bridge, bridge device, bridge, or device bridge and is suitable for forwarding data in predetermined directions of the ring network 210. Each of the N5 bridges 203 includes, in particular, an electrical through-connection in each direction of the ring network 210. The respective bridge 203 is configured to connect the primary input and output as well as the secondary input and output, or to connect the primary input to the secondary output as well as the secondary input to the primary output.

[0172] Furthermore, each group member of the group 202, 203 consisting of the N bridges 203 (with N5=2 in Fig. 3) and the N7 actuator7sensor devices 202 is connected to another group member of the group 202, 203 without a connection to one of the local control units 300 by means of a secondary connection V2, wherein the respective secondary connection V2 bridges at least one adjacent group member in the group 202, 202.

[0173] The following example illustrates this: The actuator7sensor device 202 at the bottom left in Fig. 3 has, in the ring network 210, following the primary connections VI clockwise, the actuator7sensor device 201 at the top left as its neighboring network device in the ring, which is not a member of the group 202, 203. Carl Zeiss SMT GmbH

[0174] 31

[0175] Clockwise, following this actuator / sensor device 201, is a bridge 203 (the left bridge 203 of the two bridges 203 in Fig. 3), which is a member of the group 202, 203. Following the left bridge 203 are two actuator / sensor devices 202.

[0176] As shown in Fig. 3, a secondary connection V2 is provided between the actuator7sensor device 202 at the bottom left and the rightmost of the two actuator7sensor devices 202 in the top row of the network devices. Thus, this secondary connection V2 bridges two members of the group 202, 203, namely the left bridge 203 and the actuator7sensor device 202 following the left bridge 203 clockwise.

[0177] In particular, the group members 202, 203 form a ring structure by means of the N3 primary connections VI (with N3=12 in Fig. 3) and by means of the N6 actuator 7 sensor device 201 with connection to a local control unit 300 (with N6=2 in Fig. 3). In the ring structure, each group member 202, 203 is connected to two neighboring group members 202, 203 either via one of the primary connections VI or via two of the primary connections VI and one of the N6 actuator 7 sensor devices 201.

[0178] Analogous to the primary connection VI, the respective secondary connection V2 is in particular a point-to-point connection between two of the non-adjacent group members 202, 203 arranged in the ring structure. Also analogous to the primary connection VI, the respective secondary connection is designed as a unidirectional connection or alternatively as a bidirectional connection.

[0179] The following rules are met by the condition that the respective secondary connection V2 bridges at least one adjacent group member in group 202, 203. Carl Zeiss SMT GmbH

[0180] 32

[0181] 1. When bridging in the ring network 210 by the respective secondary connection V2, at least one adjacent location in the ring network 210 is always skipped.

[0182] 2. When skipping, such actuator7sensor devices (in this case the actuator7sensor device with reference numeral 201) are not counted which have a connection to one of the local control units 300.

[0183] 3. The positions in the ring network 210, which have a connection to one of the local control units 300, are always occupied by an actuator7sensor device 201 (and not by a bridge 203).

[0184] Fig. 4 shows a schematic representation of a third embodiment of an optical system 100. The third embodiment of the optical system 100 according to Fig. 4 is based on the second embodiment according to Fig. 3 and includes all the features of Fig. 3. For the sake of clarity, some reference numerals are therefore omitted in Fig. 4. In the third embodiment according to Fig. 4, the arrangement 200 is designed as a circuit board with N3 slots 221, 222 (with N3=12). These N3 slots 221, 222 are interconnected via N3 primary connections VI to form the ring network 210. Those slots that have a connection to one of the local control units 300 are designated with the reference numeral 221. In contrast, those slots that do not have a connection to one of the local control units 300 are designated with the reference numeral 222.Consequently, slots with reference numeral 221 are equipped with an actuator / sensor unit 201, whereas slots 222 are equipped either with an actuator / sensor unit 202 or with a bridge 303. Carl Zeiss SMT GmbH.

[0185] 33

[0186] In general, each slot 221 of a subset N6 (N6=2 in Fig. 4) of the N3 slots 221, 222 (N3=12 in Fig. 4) is connected to one of the N2 local control units 300 (N2=2 in Fig. 4). As illustrated in Fig. 4, such a connection can consist of a dedicated downlink connection and a dedicated uplink connection. In general, each of the N6 slots 221 is equipped with one of the N6 actuator7sensor units 201.

[0187] Furthermore, the N3 network devices 201, 202, and 203 are specifically configured to send and receive DP data packets of a specific communication protocol over the ring network 210. An example of such a DP data packet is shown in Fig. 5. The DP data packet has a first frame RI containing packet routing information, a second frame R2 containing header information, and a third frame R3 containing payload data. The packet routing information of the first frame RI, in particular, defines a complete path for the DP data packet in the ring network 210. Each network device 201, 202, and 203 has, in particular, a first output connected to the respective primary connection VI and a second output connected to the respective secondary connection V2.

[0188] In general, the packet routing information for at least each forwarding step of the data packet DP in the ring network 210 comprises a bit group of a predetermined bit length. In the example in Fig. 5, the packet routing information is formatted as: 01 101 101 1 10 | 00.

[0189] In this example, the packet routing information consists of five bit groups, each with a bit length of two bits. Each bit group is assigned to one of the network devices 201, 202, 203 that define the path in the ring network 210. A first encoding, in this example 01, indicates that the data packet should be routed via the first output of the respective network device 201, 202, 203 of the path, and thus via the primary connection VI Carl Zeiss SMT GmbH.

[0190] 34 is to be forwarded. A second encoding 10 indicates that the data packet DP is to be forwarded via the second output of the respective network device 201, 202, 203 of the path, and thus via the secondary connection V2. The last bit group of the packet routing information has a third encoding 00 to indicate the termination of the data packet DP at the network device 201, 202 assigned to the last bit group. The first encoding 01, the second encoding 10, and the third encoding 00 are examples here, but generally differ from each other.

[0191] Preferably, each network device 201, 202, 203 is configured to analyze and subsequently consume only the respective leading bit group, so that each network device 201, 202, 203 only ever needs to analyze the first bit group 201, 202, 203. The respective bit group can also be referred to as a symbol. In other words, the leading symbol can be consumed and removed from the packet routing information during forwarding, so that each actuator / sensor device 201, 202 always only needs to evaluate the leading symbol. Therefore, the actuator / sensor devices 201, 202 do not require any knowledge of the network itself and can have an identical evaluation unit.

[0192] To keep the length of the packet routing information constant, an arbitrary symbol can be appended to the end, or the first deleted bit can be used. The receiver can then use the latter to reconstruct the routing path back to the sender.

[0193] An exemplary transmission of a data packet DP with the packet routing information 01 101 101 1 10100 shown in Fig. 5 is shown in Fig. 6. Under the exemplary assumption that the actuator7sensor device 202 at the top left in Fig. 6 is the source and thus sender of the data packet DP in the ring network 210, the first bit group, namely 01, of the packet routing information Carl Zeiss SMT GmbH

[0194] 35

[0195] 01 101 101 1 10100 is assigned to this actuator / sensor unit 201. In Fig. 6, this actuator / sensor unit 201 is marked with the letter A.

[0196] The bit group with the first encoding 01 therefore means that the data packet from actuator7sensor unit 201, labeled A, is transmitted via primary connection VI to bridge 203, labeled B. Since the second bit group is also 01, the data packet DP is forwarded from bridge 203, labeled B, via primary connection VI to actuator7sensor unit 202, labeled C.

[0197] Since the third bit group is also 01, the data packet DP is forwarded from the actuator7sensor unit 202 with the letter C via the primary connection VI to the actuator7sensor unit 202, which is marked with the letter D.

[0198] Since the fourth bit group is 10, the data packet DP is forwarded from the actuator7sensor device 202 with the letter D via the secondary connection V2 to the actuator7sensor device 202, which is marked with the letter E.

[0199] Since the fifth and last bit group is 00, the data packet DP terminates at the actuator7sensor device 202 with the letter E.

[0200] Fig. 7 shows a schematic representation of ring paths Pl, P2 in the ring network 210 of the arrangement 200 of an optical system 100. The respective local control unit 300 is preferably configured to analyze the ring network 210 by sending data packets DP of the specified communication protocol, designed for network analysis, via the network devices 201, 202, 203 of the ring network 210, in order to... (Carl Zeiss SMT GmbH)

[0201] 36. A number of ring paths Pl, P2 in the ring network 210 are defined. The ring paths Pl, P2 in the ring network 210 are defined in particular such that each point-to-point connection, which is either a primary connection V1 or a secondary connection V2, is used a maximum of once per ring path Pl, P2 between any two of the network devices 201, 202, 203. For clarity, the network devices of the arrangement 200 are numbered in Fig. 7 and thus bear the numbers 1 to 12.

[0202] In the example shown in Fig. 7, two ring paths, PI and P2, are defined. Ring path P1 is formed by the right local control unit 300 and the network devices 4, 5, 6, 7, 8, 9, and 12. The separate ring path P2 is formed by the left local control unit 300 and the network devices 1, 2, 3, 6, 10, 11, and 12. As illustrated in Fig. 7, each point-to-point connection (primary connection V1 or secondary connection V2) is used at most once and never more than once.

[0203] Figure 8 shows a schematic flowchart of a method for manufacturing an optical system 100 for a lithography system 1, comprising a plurality of optical elements. Examples of such optical systems 100 are shown in Figures 2 to 7. An example of a lithography system 1 is shown in Figure 1.

[0204] The procedure according to Fig. 8 comprises steps 801-805:

[0205] In step 801, a number of NI of arrangements 200, with N1>1, are provided, wherein each of the N1 arrangements 200 comprises a number of actuator7sensor devices 201, 202, the respective actuator7sensor device 201, 202 being assigned to one of the optical elements. Carl Zeiss SMT GmbH

[0206] 37

[0207] In step 802, a number N2 of local control units 300 are provided to control the number N1 of arrays 200.

[0208] In step 803, in each of the NI arrangements, 200 N3 network devices 201, 202, 203 are arranged in a ring and connected by N3 primary connections VI to form a ring network 210. Here, the N3 network devices 201, 202, 203 comprise a number N4 of the actuator7sensor devices 201, 202 and N5 bridges, with N5>0 and N3=N4+N5.

[0209] In step 804, a first subset N6 of the N4 actuator7sensor devices 201, 202 is connected to one of the local control units 300 via a respective connection V3, V4, and a second subset N7 of the N4 actuator7sensor devices is provided without connection to one of the local control units 300, with N4=N6+N7.

[0210] In step 805, each group member of group 202, 203 from the N5 bridges 203 and the N7 actuator7sensor devices 202 is connected to another group member of group 202, 203 by means of a secondary connection V2, wherein the respective secondary connection V2 bridges at least one neighboring group member in group 202, 203.

[0211] Although the present invention has been described using exemplary embodiments, it can be modified in many ways.

[0212] Carl Zeiss SMT GmbH

[0213] 38

[0214] REFERENCE MARK LIST

[0215] 1 Projection exposure system

[0216] 2 lighting systems

[0217] 3 light source

[0218] 4 Lighting optics

[0219] 5 object field

[0220] 6 Object level

[0221] 7 reticles

[0222] 8 label holders

[0223] 9 Reticle displacement drive

[0224] 10 Projection optics

[0225] 11 Image field

[0226] 12 Image plane

[0227] 13 wafers

[0228] 14 wafer holders

[0229] 15 wafer transfer drive

[0230] 16 Lighting radiation

[0231] 17 Collector

[0232] 18 Intermediate focus plane

[0233] 19 deflecting mirrors

[0234] 20 first faceted mirror

[0235] 21 first facet

[0236] 22 second faceted mirror

[0237] 23 second facet

[0238] 100 optical system

[0239] 200 arrangement

[0240] 201 Actuator7Sensor device with connection to local control unit Carl Zeiss SMT GmbH

[0241] 39

[0242] 202 Actuator / sensor device without connection to local control unit

[0243] 203 Bridge

[0244] 210 ring network

[0245] 221 Slot with connection to local control unit

[0246] 222 slot without connection to local control unit

[0247] 300 local control unit

[0248] 400 central control unit

[0249] ml mirror

[0250] M2 mirrors

[0251] M3 mirror

[0252] M4 mirrors

[0253] M5 mirror

[0254] M6 mirrors

[0255] PI ring path

[0256] P2 Ring Path

[0257] RI first frame with packet routing information

[0258] R2 second frame with header information

[0259] R3 third frame with user data

[0260] V 1 primary connection

[0261] V2 secondary connection

[0262] V3 Downlink connection to local control unit

[0263] V4 Uplink connection to local control unit

[0264] 801-805 Procedure step

[0265] 01 first coding

[0266] 10 second coding

[0267] 00 third coding

Claims

Carl Zeiss SMT GmbH 40 PATENT CLAIMS 1. Optical system (100) for a lithography system (1) comprising a A plurality of optical elements, comprising a number N 1 of arrangements (200), with N 1>1, wherein each of the N 1 arrangements (200) comprises a number of actuator7sensor devices (201, 202), the respective actuator7sensor device (201, 202) being assigned to one of the optical elements, and a number N2 of local control units (300) for controlling the number N 1 arrangements (200), wherein each of the N 1 arrangements (200) comprises a ring network (210) with N3 network devices (201, 202, 203) arranged in a ring and connected by N3 primary connections (V1), wherein the N3 network devices (201, 202, 203) comprise a number N4 of actuator7sensor devices (201, 202) and N5 bridges (203), with N5>0 and N3=N4+N5, where the N4 actuator7sensor devices (201, 202) form a first subset N6 (201) with respective connection (V3,V4) to one of the local control units (300) and a second subset N7 (202) without connection to one of the local control units (300), with N4=N6+N7, wherein each group member of the group (202, 203) from the N5 bridges (203) and the N7 actuator7sensor devices (202) is connected to another group member of the group (202, 203) by means of a secondary connection (V2), wherein the respective secondary connection (V2) bridges at least one adjacent group member in the group (202, 203).

2. Optical system according to claim 1, wherein the respective primary connection (Vl) is a point-to-point connection between two of the network devices (201, 202, 203) arranged in the ring network (210). Carl Zeiss SMT GmbH 41 3. Optical system according to claim 1 or 2, wherein the group members (202, 203) form a ring structure by means of the N3 primary connections (V1) and the N6 actuator VSensor devices (201), in which each group member (202, 203) is connected to two adjacent group members (202, 203) via one of the primary connections (V1) or via two of the primary connections (V1) and one of the N6 actuator7 sensor devices (201).

4. Optical system according to claim 3, wherein the respective secondary connection (V2) is a point-to-point connection between two of the non-adjacent group members (202, 203) arranged in the ring structure.

5. Optical system according to one of claims 1 to 4, wherein the N4 actuator / sensor devices (201, 202) of the ring network (210) are identical.

6. Optical system according to any one of claims 1 to 5, wherein each of the N3 network devices (201, 202, 203) has at least two inputs and at least two outputs, wherein preferably each of the N3 network devices (201, 202, 203) has exactly two inputs and exactly two outputs or wherein each of the N3 network devices (201, 202, 203) has exactly four inputs and exactly four outputs.

7. Optical system according to any one of claims 1 to 6, wherein the N6 actuator7 sensor devices (201) are connected to N6 different local control units (300), with 2 <N6<N2.

8. Optical system according to claim 7, Carl Zeiss SMT GmbH 42 wherein each of the N6 actuator / sensor devices (201) is connected to a specific of the N6 different local control units (300) via a downlink connection (V3) for transmitting commands from the specific local control unit (300) to the connected actuator / sensor device (201) and via an uplink connection (V4) for transmitting data from the actuator / sensor device (201) to the connected local control unit (300).

9. Optical system according to any one of claims 1 to 8, wherein the respective primary connection (V1) is configured as a unidirectional connection or as a bidirectional connection and / or wherein the respective secondary connection (V2) is configured as a unidirectional connection or as a bidirectional connection.

10. Optical system according to one of claims 1 to 9, wherein each of the N5 bridges (203) comprises a respective electrical through-hole in each direction of the ring network (210).

11. Optical system according to any one of claims 1 to 10, wherein each of the NI arrangements (200) is configured as a circuit board with N3 slots (221, 222) which are interconnected via the N3 primary connections (V1) to form the ring network (210).

12. Optical system according to claim 11, wherein each slot (221) of a subset N6 of the N3 slots is connected to one of the N2 local control units (300), with N6 <N3, insbesondere über eine dedizierte Downlink-Verbindung (V3) und eine dedizierte Uplink-Verbindung (V4), wobei jeder der N6 Steckplätze (221) mit einer der N6 Aktor7Sensor-Einrich- tungen (201) bestückt ist.

13. Optical system according to any one of claims 1 to 12, Carl Zeiss SMT GmbH 43 wherein the N3 network devices (201, 202, 203) are configured to send and receive data packets of a specific communication protocol over the ring network (210), wherein the respective data packet (DP) has a first frame (Rl) containing packet routing information, a second frame (R2) containing header information and a third frame (R3) containing payload data.

14. Optical system according to claim 13, wherein the packet routing information of the first frame (Rl) determines a path, in particular a complete path, in the ring network (210), wherein the packet routing information comprises, at least for each forwarding step of the data packet (DP) in the ring network (210), a bit group of a predetermined bit length, wherein each bit group is assigned to one of the network devices (201, 202, 203) determining the path in the ring network (210).

15. Optical system according to claim 14, wherein the respective network device (201, 202, 203) has a first output connected to the respective primary connection (V1) and a second output connected to the respective secondary connection (V2), wherein the respective bit group of packet routing information for forwarding the data packet (DP) via the first output of the respective network device (201, 202, 203) of the path has a first encoding (01), wherein the respective bit group of packet routing information for forwarding the data packet (DP) via the second output of the respective network device (201, 202, 203) of the path has a second encoding (10), and wherein the last bit group of packet routing information for indicating the termination of the data packet (DP) at the network device (201, 202) associated with the last bit group has a third encoding (00).

16. Optical system according to claim 15, Carl Zeiss SMT GmbH 44 wherein the respective network device (201, 202, 203) is configured to analyze and then consume only the respective leading bit group.

17. Optical system according to one of claims 13 to 16, wherein the local control unit (300) is configured to analyze the ring network (210) by sending network analysis data packets (DP) of the specified communication protocol via the network devices (201, 202, 203) of the ring network (210) and, based on this, to determine a number of ring paths (Pl, P2) in the ring network (210).

18. Optical system according to claim 17, wherein the local control unit (300) is configured to define the ring paths (PI, P2) in the ring network (210) such that each point-to-point connection between two of the network devices (201, 202, 203) is used a maximum of once per ring path (Pl, P2).

19. Optical system according to one of claims 1 to 18, further comprising a number N8 of central control units (400) for controlling the N2 local control units (300), with N8 > 1.

20. Lithography system (1) with an optical system (100) according to one of claims 1 to 19.

21. Method for manufacturing an optical system (100) for a lithography system (1) comprising a plurality of optical elements, with Providing (801) a number of NI arrangements (200), with N1>1, wherein each of the NI arrangements (200) comprises a number of actuator7sensor devices (201, 202), wherein the respective actuator7sensor device (201, 202) is associated with one of the optical elements, Carl Zeiss SMT GmbH 45 Providing (802) a number N2 of local control units (300) for controlling the number N1 arrangements (200), wherein in each of the N1 arrangements (200) N3 network devices (201, 202, 203) are arranged in a ring and connected to form a ring network (210) by N3 primary connections (V1) (803), wherein the N3 network devices (201, 202, 203) comprise a number N4 of actuator7sensor devices (201, 202) and N5 bridges (203), with N5>0 and N3=N4+N5, wherein a first subset N6 (201) of the N4 actuator7sensor devices (201, 202) is connected to one of the local control units (300) by means of a respective connection (V3, V4). (804) and a second subset N7 (202) of the N4 actuator7sensor devices (201, 202) without connection to any of the local control units (300) is provided (804), with N4=N6+N7, wherein each group member of the group (202,203) from the N5 bridges (203) and the N7 actuator7sensor devices (202) is connected to another group member of the group (202, 203) by means of a secondary connection (V2) (805), wherein the respective secondary connection (V2) bridges at least one adjacent group member in the group (202, 203).

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