Methods, systems, and media for generating metrology measurements

Abstract

Disclosed herein are techniques for configuring metrology tasks. In some embodiments, a method comprises obtaining an initial semiconductor image; performing segmentation on the initial semiconductor image; determining one or more labels based on the segmentation; determining one or more reference lines based on the one or more labels and the segmentation; and configuring one or more metrology measurement tasks based on the one or more labels and the one or more reference lines, wherein the one or more metrology tasks are configured to be utilized to process a batch of semiconductor images automatically based on segmentation of images of the batch of semiconductor images.

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