Electroencephalogram measurement device, and support tool

Abstract

An electroencephalogram measurement device (10) has a support body (1110) that is mounted to a head (20), and an electrode unit (1101) that the support body (1110) retains. The support body (1110) has a through-hole (elastic member recess (1131), elastic material through-hole (1135)) in which at least a section of the electrode unit (1101) is positioned. The electrode unit (1101) has an electrode body (electroencephalogram electrode member (1120)) that comes into contact with a scalp (22), an electrode support member (retention section (1180)) that supports the electrode body (electroencephalogram electrode member (1120)) and is attached to the through-hole (elastic member recess (1131), elastic material through-hole (1135)), and a first member (adjustment member (1200)) for electrode position adjustment that is attached to the electrode support member (retention section (1180)) and in which at least an end section thereof can pass through the through-hole (elastic member recess (1131), elastic material through-hole (1135)) and be positioned further to the outside than an exterior material (covering member (1112)) of the support body (1100), and can be deformed.

Description

Electroencephalogram (EEG) measuring device and support device

[0001] This invention relates to an electroencephalogram (EEG) measuring device and a support device.

[0002] In electroencephalography (EEG), electrodes are placed in contact with the head to perform electrical measurements.

[0003] Patent Document 1 describes measuring electroencephalograms by bringing the tip of an electrode pin supported by an elastic member into contact with the scalp.

[0004] Japanese Patent Publication No. 2020-000268

[0005] However, the structure described in Patent Document 1 had room for improvement in the efficiency of electroencephalogram measurement.

[0006] The present invention aims to improve the efficiency of electroencephalogram (EEG) measurement.

[0007] The present invention provides the following technologies: [1] An electroencephalogram (EEG) measuring device comprising: a support body worn on the head; and an electrode unit held by the support body, wherein the support body has a through hole in which at least a portion of the electrode unit is disposed; the electrode unit comprises: an electrode body that contacts the scalp; an electrode support member that supports the electrode body and is attached to the through hole; and a first member for adjusting the electrode position, attached to the electrode support member or the electrode body, at least its end being able to pass through the through hole and be located outside the outer covering material of the support body. [2] The EEG measuring device according to [1], further comprising a plurality of the first members attached to different locations on the electrode support member. [3] The EEG measuring device according to [1] or [2], further comprising an elastically deformable second member provided on the head-side surface of the support body and pressing down on the edge of the upper surface of the electrode support member. [4] The EEG measuring device according to any one of [1] to [3], wherein the first member is deformable. [5] The EEG measuring device according to [4], wherein the first member is a string. [6] An electroencephalogram measuring device comprising: a support divided into a plurality of pieces, which is attached to the head; and an electrode unit held by the support, wherein the plurality of pieces include an anterior piece on the frontal side and a posterior piece on the occipital side, and the dividing line (A) separating the anterior piece from the posterior piece passes between Cz and Pz, T3 and T5, C3 and P3, T4 and T6, and C4 and P4 respectively in the International 10-20 electrode placement method. [7] The electroencephalogram measuring device according to [6], wherein the posterior piece comprises at least a first posterior piece and a second posterior piece, and the dividing line (B) separating the first posterior piece from the second posterior piece passes between O1 and O2 in the International 10-20 electrode placement method. [8] The electroencephalogram measuring device according to [7], wherein the posterior piece has a third posterior piece in addition to the first posterior piece and the second posterior piece, the first posterior piece has O1, T3 and P3 in the International 10-20 electrode arrangement, the second posterior piece has O2, T6 and P4 in the International 10-20 electrode arrangement, and the third posterior piece has Pz in the International 10-20 electrode arrangement.[9] The electroencephalogram measuring device according to [6], wherein the front piece is divided into at least three pieces, the three pieces comprising: a first front piece comprising Cz in the International 10-20 electrode placement method; a second front piece comprising T3 in the International 10-20 electrode placement method; and a third front piece comprising T4 in the International 10-20 electrode placement method.

[10] The electroencephalogram measuring device according to [9], wherein the front piece is divided into at least five pieces, the five pieces comprising the first front piece, the second front piece, and the third front piece, in addition to a fourth front piece and a fifth front piece, the fourth front piece being provided between the first front piece and the second front piece and comprising C3 and F3 in the International 10-20 electrode placement method; and the fifth front piece being provided between the first front piece and the third front piece and comprising C4 and F4 in the International 10-20 electrode placement method.

[11] An electroencephalogram measuring device having a mounting part that is attached to the head, wherein the mounting part has an outer casing and a cushion layer attached to the inner surface of the outer casing, wherein the cushion layer has a first part and a second part located on the outer casing side of the first part in the thickness direction, wherein the amount of sinking of the first part, measured by the following procedure 1, is 1 mm or more and 9.5 mm or less, and the amount of sinking of the second part is 0.5 mm or more and 5 mm or less, an electroencephalogram measuring device. (Procedure 1) 1) Prepare a sample of 50 x 50 x 10 mm (length x width x thickness) from the part to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Pressurize the prepared sample and displace it by 0.2 mm at a time, and read the load value after the displacement. 4) The total amount of displacement when the load value first exceeds 10 N is taken as the amount of sinking (mm).

[12] The electroencephalogram measuring device according to

[11] , wherein the thickness of the first portion is 1 mm or more and 20 mm or less.

[13] The electroencephalogram measuring device according to

[11] or

[12] , wherein the thickness of the second portion is 5 mm or more and 25 mm or less.

[14] The electroencephalogram measuring device according to any one of

[11] to

[11] , wherein the first portion is located on the innermost side of the cushion layer.

[15] The electroencephalogram measuring device according to any one of

[11] to

[14] , wherein the first part is a first layer, the second part is a second layer, and the second layer and the first layer are stacked in that order on the inner surface of the outer casing.

[16] The electroencephalogram measuring device according to any one of

[11] to

[15] , wherein the thickness of the cushion layer is 1 mm or more and 45 mm or less.

[17] The electroencephalogram measuring device according to any one of

[11] to

[16] , wherein the amount of sinking of the first part, measured by the following procedure 2, is 0 mm or more and 6.5 mm or less. (Procedure 2) 1) Prepare a 50 x 50 x 10 mm (length x width x thickness) sample from the part to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Pressurize the prepared sample and displace it by 0.2 mm at a time, and read the load value after the displacement. 4) The total displacement when the load value first exceeds 1 N is taken as the sinking amount (mm).

[18] A support device for supporting the head and cervical spine of a person wearing a headset in a sleeping position.

[19] The support device according to

[18] , wherein a first region for supporting at least a portion of the person's cervical spine, a second region for supporting at least a portion of the back of the head of the headset, and a third region for supporting at least a portion of the top of the head of the headset are arranged in this order.

[20] The support device according to

[19] , wherein, in a state in which the head and cervical spine of the person in a sleeping position are supported, the first height of the highest part of the first region supporting the cervical spine is higher than the second height of the lowest part of the second region supporting the headset, and the second height is lower than the third height of the highest part of the third region supporting the headset.

[21] The support device according to

[20] , wherein the difference between the first height and the second height is 0 cm or more and 10 cm or less, and the difference between the second height and the third height is 0 cm or more and 12 cm or less.

[22] The support according to

[20] , wherein each of the first, second, and third regions has at least one elastic member, and in at least one of the first, second, and third regions, the elastic member can be adjusted by at least one of replacement, addition, and deletion, and by such adjustment, the difference between the first height and the second height is 0 cm or more and 10 cm or less, and the difference between the second height and the third height is 0 cm or more and 12 cm or less.

[23] The support according to

[19] , wherein each of the first, second, and third regions has at least one elastic member, and the amount of deformation of the elastic member in at least one of the first, second, and third regions, as measured by the following procedure 1, is 0.5 mm or more and 9.5 mm or less. (Procedure 1) Obtain a test piece with dimensions of 50 mm in length x 50 mm in width x 10 mm in height, attach a disc-shaped pressure piece with a diameter of 20 mm to the test piece, attach a push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) to the pressure piece, set the test piece on a measuring stand having a displacement meter, set the pressure piece on the elastic member, lower the pressure piece by 0.2 mm and measure the load and deformation after 20 seconds using the push-pull gauge and the displacement meter, repeat the process and plot the SS curve to measure the deformation when the load is 10 N.

[24] The support according to

[19] , wherein the first region has at least one elastic member, and the deformation of the elastic member measured by the procedure in step 1 is 4.0 mm or more and 9.5 mm or less. (Procedure 1) Obtain a test piece with dimensions of 50 mm (length) x 50 mm (width) x 10 mm (height). Attach a disc-shaped pressure piece with a diameter of 20 mm to the test piece. Attach a push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) to the pressure piece. Set the test piece on a measuring stand equipped with a displacement meter. Set the pressure piece on the elastic member. Lower the pressure piece by 0.2 mm and repeat the process of measuring the load and deformation after 20 seconds using the push-pull gauge and the displacement meter to plot the SS curve and measure the deformation when the load is 10 N.

[25] The support according to

[19] , wherein the first region, the second region, and the third region each have at least one elastic member, and the elastic member having at least one of the first region, the second region, and the third region includes a structure in which a filler is filled into a hollow member, and the deformation rate measured by the following procedure 2 is 0.05 or more and 0.95 or less. (Procedure 2) A disc-shaped pressure piece with a diameter of 20 mm is attached to the elastic member, a push-pull gauge (digital force gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece, the elastic member is set on a measuring stand having a displacement meter, the pressure piece is set on the elastic member, the pressure piece is lowered by 0.2 mm and the load and deformation amount after 20 seconds are measured using the push-pull gauge and the displacement meter, and the SS curve is plotted and the deformation amount ε when a load of 10 N is applied is measured. Then, the deformation rate is set to ε / T, which is calculated from the height T of the elastic member before pressurization and the deformation amount ε.

[26] The support according to

[19] , wherein the first region has at least one elastic member, the elastic member having a structure in which a filler is filled into a hollow member, and the deformation rate measured by the following procedure 2 is 0.45 or more and 0.95 or less. (Procedure 2) A disc-shaped pressure piece with a diameter of 20 mm is attached to the elastic member, a push-pull gauge (digital force gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece, the elastic member is set on a measuring stand having a displacement meter, the pressure piece is set on the elastic member, the pressure piece is lowered by 0.2 mm and the load and deformation amount after 20 seconds are measured using the push-pull gauge and the displacement meter, and the SS curve is plotted and the deformation amount ε when a load of 10 N is applied is measured. Then, the deformation rate is set to ε / T, which is calculated from the height T of the elastic member before pressurization and the deformation amount ε.

[27] The support according to

[19] , having a fourth region on both sides of the first region, the second region, and the third region in a direction perpendicular to the direction in which the first region, the second region, and the third region are aligned and in the thickness direction.

[28] The support according to

[27] , wherein the difference between the height of the lowest point in the second region when a load of 40 N is applied to the second region and the height of the lowest point in the fourth region when a load of 40 N is applied to the fourth region is 0 mm or more and 50 mm or less.

[29] The support according to

[27] or

[28] , having an elastic layer covering the first region, the second region, the third region, and the fourth region.

[30] The support according to

[27] , further comprising a height adjustment member for adjusting the height of the entire first region, the second region, the third region, and the fourth region.

[31] The support according to any one of

[18] to

[30] , which is integrated with the headset.

[32] The support according to any one of

[18] to

[31] , further comprising a body support part for supporting a person in a sleeping position.

[33] The support according to any one of

[18] to

[32] , wherein the headset is used for electroencephalogram measurement.

[0008] According to the present invention, the orientation of the electroencephalogram electrodes can be adjusted.

[0009] This is a diagram illustrating a partial cross-section of the electroencephalogram (EEG) measuring device according to the embodiment. This is a perspective view illustrating the EEG measuring device according to the embodiment. This is a diagram illustrating the state in which the support according to the embodiment is attached to a person's head. This is a diagram illustrating the internal state of the support according to the embodiment. This is a diagram illustrating the cross-sectional structure of the holding part according to the embodiment. This is a diagram illustrating the cross-sectional structure of the holding member according to the embodiment. This is a diagram illustrating the structure of the side of the EEG electrode member that faces the head according to the embodiment. This is a side view of the EEG electrode member according to the embodiment. This is a cross-sectional view taken along line A-A in Figure 7 according to the embodiment. This is a block diagram illustrating the schematic configuration of the signal processing unit according to the embodiment. This is a block diagram illustrating a computer that implements the signal processing unit according to the embodiment. This is a diagram showing the state in which the mounting posture of the electrode unit according to the embodiment is at an angle. This is a diagram showing the state in which the electrode unit is pulled up with the adjustment member according to the embodiment. This is a diagram showing the state in which the electrode unit is being adjusted with a finger according to the embodiment. This is a diagram showing the state in which the liquid according to the embodiment is being supplied to the scalp. This is a diagram illustrating a partial cross-section of the EEG measuring device according to the embodiment. This is a diagram illustrating a partial cross-section of the EEG measuring device according to the embodiment when it is attached to the head. This is a diagram illustrating a cross-section of the electrode unit according to the embodiment. This is a side view illustrating the state in which the support according to the embodiment is attached to a person's head. This is a perspective view illustrating the state in which the support according to the embodiment is attached to a person's head. This is a diagram illustrating the positions of the eight divided pieces of the support according to the embodiment and the electrode units according to the International 10-20 electrode arrangement method. This is a diagram showing the compression SS curve of the cushioning material provided between the pieces of the support according to the embodiment. This is a diagram illustrating the positions of the two divided pieces of the support according to the International 10-20 electrode arrangement method in Modification 1. This is a diagram illustrating the positions of the four divided pieces of the support according to the International 10-20 electrode arrangement method in Modification 2. This is a diagram illustrating the positions of the six divided pieces of the support according to the International 10-20 electrode arrangement method in Modification 3. This is a perspective view of the electroencephalogram (EEG) measuring device according to this embodiment. This is a perspective view of the EEG measuring device with the holding member inserted. This is a view of the EEG measuring device from the inside. This is an enlarged view of the dashed line portion in Figure 28. This is Figure 1 showing how to use the EEG measuring device. This is Figure 2 showing how to use the EEG measuring device.Figure 3 shows how to use the electroencephalogram (EEG) measuring device. Figure 4 shows how to use the EEG measuring device. This is a perspective view of the support according to this embodiment. This is a diagram showing the support in use. This is Figure 1 to illustrate an example of the configuration of the support according to this embodiment. This is Figure 2 to illustrate an example of the configuration of the support according to this embodiment. This is Figure 3 to illustrate an example of the configuration of the support according to this embodiment. This is Figure 4 to illustrate an example of the configuration of the support according to this embodiment. This is Figure 5 to illustrate an example of the configuration of the support according to this embodiment. This is Figure 6 to illustrate an example of the configuration of the support according to this embodiment. This is a diagram showing a first modified example of the support according to this embodiment. This is a diagram showing a second modified example of the support according to this embodiment.

[0010] Embodiments of the present invention will be described below with reference to the drawings. In all drawings, similar components are denoted by the same reference numerals, and their descriptions are omitted as appropriate.

[0011] [First Embodiment] First, the first embodiment will be described. One example of a problem that this embodiment aims to solve is to provide an electroencephalogram (EEG) measuring device that can adjust the orientation of the EEG electrodes.

[0012] <Overview> Figure 1 is a diagram illustrating a partial cross-section of the electroencephalogram (EEG) measuring device 10 according to an embodiment. Figures 2 to 4 are diagrams showing the overall view of the EEG measuring device 10. Figure 2 is a perspective view of the EEG measuring device 10 from above. Figure 3 is a front view of the EEG measuring device 10 when it is attached to the head. Figure 4 is a diagram illustrating the state of the inside of the support 1110 (the side into which the head 20 is inserted) of the EEG measuring device 10.

[0013] The electroencephalogram (EEG) measuring device 10 includes a support body 1110, an elastic member 1130, and an electrode unit 1101. The electrode unit 1101 includes an EEG electrode member 1120, which is the electrode body, and a holding part 1180 for attaching the EEG electrode member 1120 to the elastic member 1130. The EEG electrode member 1120 is attached to the elastic member 1130 via the holding part 1180 and held by the support body 1110. Electroencephalograms are measured by bringing the EEG electrode member 1120 of the EEG measuring device 10 into contact with the head 20 (scalp 22).

[0014] As will be described in more detail later, the support body 1110 is, for example, a helmet-type body worn on the head 20, and has a support body through-hole 1114 that penetrates from the inside to the outside, and an elastic member 1130 embedded in the support body through-hole 1114. The electroencephalogram electrode member 1120 is held on the bottom surface 1132 of the elastic member 1130 via a holding portion 1180.

[0015] The elastic member 1130 is provided with an elastic member recess 1131 that is recessed from the surface to the bottom. The elastic member recess 1131 communicates with the support through hole 1114. By inserting a finger or the like into the elastic member recess 1131 through the support through hole 1114, the elastic member 1130 can be operated, or the holding part 1180 (holding part recess 1188) attached to the elastic member 1130 can be operated to adjust the orientation of the electrode unit 1101 (i.e., the electroencephalogram electrode member 1120), etc.

[0016] The electroencephalogram electrode member 1120 is provided with an electrode through-hole 1121 that penetrates from the support 1110 toward the head 20. The support through-hole 1114, the elastic member recess 1131, and the electrode through-hole 1121 are in communication with each other. A tube 151 is inserted into the electrode through-hole 1121, and a liquid 30 (see Figure 15) is supplied to improve the electrical contact between the scalp 22 and the electroencephalogram electrode member 1120.

[0017] In the examples shown in Figures 2 to 4, the support 1110 is helmet-shaped. When the support 1110 is helmet-shaped, it has a recess into which the head 20 is inserted. The electroencephalogram (EEG) measuring device 10 is configured such that, with the helmet-shaped support 1110 attached to the head 20, one or more EEG electrode members 1120 are in contact with the head 20 (scalp 22). The EEG measuring device 10 may also include a belt 1170 for fixing the support 1110 to the head 20, as shown in Figure 4.

[0018] Hereinafter, the side of the support 1110 that faces the head 20 (scalp 22) will be referred to as the inside of the support 1110, and the side opposite the inside will be referred to as the outside of the support 1110. In Figure 1, the direction from the inside to the outside of the support 1110 is defined as the z direction. The x, y, and z directions are orthogonal to each other. The z direction is approximately the normal direction to the scalp 22. Note that the x, y, and z directions may be defined as different directions for each electrode unit 1101 (EEG electrode member 1120) in the electroencephalogram measurement device 10.

[0019] In the examples shown in Figures 2 to 4, the support 1110 holds a plurality of electroencephalogram (EEG) electrode members 1120. With the support 1110 attached to the head 20, each EEG electrode member 1120 can be brought into contact with a predetermined position on the head 20. Then, electroencephalograms are measured by the plurality of EEG electrode members 1120. For example, the support 1110 can hold seven EEG electrode members 1120. The positions of the seven EEG electrode members 1120 may correspond to the positions F3, F4, C3, C4, P3, Pz, and P4 in the International 10-20 electrode placement scheme. The number and position of the EEG electrode members 1120 provided on the support 1110 are not particularly limited and can be set according to the application, etc. The electroencephalograms measured by each EEG electrode member 1120 are transmitted to the signal processing unit 1160.

[0020] In the example shown in Figure 1, the electroencephalogram (EEG) electrode member 1120 is provided with an electrode through-hole 1121. The electrode through-hole 1121 is a hole for supplying liquid 30 to the head 20. The electrode through-hole 1121 communicates with the holding portion through-hole 1189 of the holding portion 1180 and the elastic member recess 1131 of the elastic member 1130. The presence of the electrode through-hole 1121 in the EEG electrode member 1120 allows for easy injection of liquid 30 into the scalp 22 from outside the support 1110. For example, supplying an electrolyte-containing auxiliary solution (liquid 30) to the head 20 prior to EEG measurement can improve electrical contact between the scalp and the EEG electrode member 1120. The EEG electrode member 1120 and the EEG measurement method will be described in detail later.

[0021] In the example shown in Figure 1, the electroencephalogram measuring device 10 further comprises an elastic member 1130. The elastic member 1130 is elastically deformable. The elastic member 1130 has an elastic member recess 1131 that is recessed from the outside inward. In this embodiment, at least a portion of the bottom surface of the elastic member recess 1131 has an elastic material through-hole 1135 that penetrates the elastic member 1130. In this embodiment, a configuration in which substantially the entire bottom surface of the elastic member recess 1131 is an elastic material through-hole 1135 is illustrated. Hereafter, unless otherwise specified, the elastic member recess 1131 and the elastic material through-hole 1135 will be described as the same thing.

[0022] Furthermore, the bottom surface of the elastic member 1130 has an electrode placement section 1137 for attaching the electrode unit 1101. The electroencephalogram electrode member 1120 is attached to the elastic member 1130 via a holding section 1180.

[0023] The shape of the support 1110 is determined, for example, based on the average head shape. However, head shapes vary greatly from person to person, and an element is needed to absorb these differences. In the electroencephalogram (EEG) measuring device 10, in which the electrode unit 1101 (i.e., the EEG electrode member 1120) is held to the support 1110 via an elastic member 1130, the elastic member 1130 elastically deforms when the support 1110 is attached to the head 20. In this way, even if there are individual differences in head shape (unevenness and surface angles), the EEG electrode member 1120 can be stably brought into contact with the scalp, and EEG measurements can be performed.

[0024] Furthermore, as described above, a finger 99 or the like is inserted into the support 1110 through a support through-hole 1114 provided in the covering member 1112 of the support 1110 to operate the elastic member 1130 (elastic member recess 1131) and the holding part 1180 (holding part recess 1188). Since there is no need for a structure protruding from the inside to the outside of the support 1110 to adjust the orientation of the electroencephalogram electrode member 1120, the center of gravity can be stabilized when it is attached to the head 20. In addition, the person being measured can lie down while wearing the support 1110, and noise caused by body movement can be reduced. Furthermore, electroencephalogram measurements may be performed while the person being measured is moving around.

[0025] The holding portion 1180 is provided with a first member for adjusting the electrode position (hereinafter referred to as "adjustment member 1200") which is deformable and can be positioned outside the outer covering material (covering member 1112) of the support 1110, passing through the elastic material through hole 1135 (elastic member recess 1131) at least at its end. Details of the adjustment member 1200 will be described later, but a string can be used as the adjustment member 1200. This is because, when attaching the electrode unit 1101 to the elastic member 1130, the orientation of the electrode unit 1101 may become inappropriate, or the support 1110 may move while the electroencephalogram measuring device 10 is attached, causing the elastic member 1130 to deform unevenly, and the electrode unit 1101 may become stuck in a diagonally fitted position. In this case, adjustment may not be possible by manipulating the holding portion recess 1188. The adjustment member 1200 allows the orientation of the electrode unit 1101 (electroencephalogram electrode member 1120) to be adjusted. This adjustment can be made even after the electroencephalogram (EEG) measuring device 10 has been attached. In other words, while the EEG measuring device 10 is attached, a major adjustment can be made with the adjustment member 1200, and a fine adjustment can be made by operating the retaining recess 1188 (a mortar-shaped second recess).

[0026] Furthermore, the electroencephalogram (EEG) electrode members 1120 are detachable from the support 1110. This allows for the replacement of the EEG electrode members 1120 as needed, or the use of different types of EEG electrode members 1120 for each measurement. Each component of the EEG measurement device 10 will be described in detail below.

[0027] <Details of each component of the electroencephalogram measuring device> <Support> Figure 5 is a diagram showing the cross-sectional structure of the support 1110, and shows the state in which the electrode unit 1101 (electroencephalogram electrode member 1120, holding part 1180) has been removed from Figure 1. The support 1110 has a shape that can cover at least a part of the head 20. The support 1110 only needs to be attachable to the head 20 and may be made of cloth or rubber, for example. The support 1110 may be helmet-shaped, hat-shaped, or band-shaped, for example. In this embodiment, as shown in Figure 1, the support 1110 comprises a base 1111 and a covering member 1112. The base 1111 is located on the head 20 side when the support 1110 is attached to the head 20. The covering member 1112 is located on the opposite side from the head 20 when the support 1110 is attached to the head 20.

[0028] The base body 1111 is constructed using, for example, expanded polystyrene. The base body 1111 is provided with a plurality (seven in this case) of holes 1115 that penetrate vertically at positions corresponding to F3, F4, C3, C4, P3, Pz, and P4 in the International 10-20 electrode arrangement described above. The elastic member 1130 is housed in the holes 1115. The covering member 1112 is constructed using, for example, resin. The covering member 1112 is harder than the base body 1111 and can protect the head 20. However, the support body 1110 does not necessarily have to include the covering member 1112.

[0029] <Elastic Member> The elastic member 1130 is a second elastically deformable member provided on the head 20 side surface of the support 1110 and pressing against the edge of the upper surface of the holding portion 1180. The elastic member 1130 is housed in a hole 1115 provided in the base 1111 of the support 1110. The external shape and size of the elastic member 1130 are substantially the same as the internal shape and size of the hole 1115 provided in the support 1110, and the elastic member 1130 is fitted into the hole 1115 of the support 1110.

[0030] With the support 1110 not attached to the head 20, the elastic member 1130 may fill the entire portion of the hole 1115 provided in the support 1110, excluding the first through hole 1131. The covering member 1112 is provided with a support through hole 1114. The elastic member recess 1131 provided in the elastic member 1130 and the support through hole 1114 provided in the covering member 1112 are in communication.

[0031] It is preferable that the diameter d2 of the support through-hole 1114 is larger than the diameter d1 of the elastic member recess 1131. By making the diameter d2 of the support through-hole 1114 larger in this way, it becomes easier to manipulate the elastic member recess 1131 and the holding part recess 1188 (mortar-shaped recess). As a result, it becomes easier to adjust the orientation of the electroencephalogram electrode member 1120, etc. Also, when the end of the adjustment member 1200 is taken out of the support 1110, the covering member 1112 does not get in the way.

[0032] An electrode placement portion 1137 is provided on the inner (-z side) surface of the elastic member 1130. The electrode placement portion 1137 is recessed from the inside to the outside, and the center of the recessed bottom surface communicates with the elastic material through hole 1135. The inner shape and size of the electrode placement portion 1137 are approximately the same as the outer shape and size of the retaining portion 1180. For example, when the retaining portion 1180 is fitted into the electrode placement portion 1137, the inner surfaces of the electrode placement portion 1137 and the retaining portion 1180 are flush. The size relationship between the electrode placement portion 1137 and the retaining portion 1180 is sufficient as long as the retaining portion 1180 is stably fixed when attached to the electrode placement portion 1137.

[0033] The elastic member 1130 is made of an elastic material. The elastic material consists of one or more selected from, for example, urethane sponge, polyethylene sponge, polypropylene sponge, and silicone rubber sponge. The elastic material may be a foam, and examples of foams include low-rebound sponge and low-rebound elastic foam. This makes it easy to correct the orientation of the electrode unit 1101 by pulling up the electrode unit 1101 with the adjustment member 1200, which will be described later.

[0034] The elastic member 1130 can be configured without a spring. When a spring is used, the spring's repulsive force increases in proportion to the amount of spring deformation. Therefore, when the amount of deformation is large, excessive repulsive force is generated, making it easy for the person being measured to feel pain. On the other hand, when using an elastic foam material, there is a displacement range in which the repulsive force does not increase much (is not proportional) with increasing deformation. By configuring the elastic member 1130 to be usable within such a displacement range, an appropriate repulsive force can be obtained even if the amount of deformation varies depending on the position of the electrode unit 1101 (EEG electrode member 1120).

[0035] The hardness H of the elastic material, as measured by JIS K 6400-2-A method, is, for example, between 10 N and 200 N. From the viewpoint of further reducing the burden on the person being measured, the hardness H is preferably 150 N or less, and more preferably 100 N or less. Furthermore, from the viewpoint of more stably pressing the electroencephalogram electrode member 1120 against the scalp 22, the hardness H is preferably 30 N or more, and more preferably 50 N or more.

[0036] The thickness t of the elastic member 1130 is, for example, 10 mm to 100 mm when the support 1110 is not attached to the head 20. Here, the thickness t is the thickness of the elastic member 1130 in the direction perpendicular to the bottom surface 1132 that faces the head 20. The elastic member 1130 is fixed to the support 1110 at one end, and the thickness t of the elastic member 1130 is variable according to the force it receives in the direction of its thickness. Specifically, the elastic member 1130 is fixed to the support 1110 on the surface opposite to the bottom surface 1132 (top surface 133). The thickness t of the elastic member 1130 is preferably 20 mm to 60 mm when the support 1110 is not attached to the head 20. The lower limit of the thickness t is preferably 25 mm or more, more preferably 30 mm or more. The upper limit of the thickness t is preferably 55 mm or less, more preferably 50 mm or less. By making the thickness t such that it can be appropriately compressed according to the shape of the head 20, the electroencephalogram electrode member 1120 can be properly pressed against the scalp 22 while minimizing discomfort to the person being measured.

[0037] The thickness t of the elastic member 1130 may be greater than or less than the thickness of the base body 1111. When the thickness t of the elastic member 1130 is made greater than the thickness of the base body 1111, the compression rate of the elastic member 1130 can be increased, and the force pressing the electroencephalogram electrode member 1120 against the scalp 22 can be strengthened. When the thickness t of the elastic member 1130 is made less than the thickness of the base body 1111, the elastic member 1130 is completely accommodated in the hole 1115, and the movement when compressed in the thickness direction becomes stable.

[0038] The area of the bottom surface 1132 of the elastic member 1130 facing the head 20 is, for example, 3 cm ２ or more and 25 cm ２ or less. The lower limit is preferably 5 cm ２ or more, and more preferably 7 cm ２ or more. Thereby, an appropriate size as the electroencephalogram electrode member 1120 can be ensured, and a stable posture (orientation) can be realized. The upper limit is preferably 20 cm ２ or less, and more preferably 15 cm ２ or less. Thereby, it is possible to prevent the orientation of the electroencephalogram electrode member 1120 from moving too much and becoming difficult to adjust. The shape of the bottom surface is not particularly limited. Examples of the shape of the bottom surface include a circle, a square, an oval, an ellipse, etc. In terms of facilitating the rotation of the electroencephalogram electrode member 1120, a circular shape is preferable. On the other hand, when it is not desired to rotate the electroencephalogram electrode member 1120, a non-circular shape is preferable.

[0039] <Holding portion> FIG. 6 shows a cross-sectional view of the holding portion 1180. The holding portion 1180 is attached to the bottom surface 1132 of the elastic member 1130. Further, the holding portion 1180 holds the electroencephalogram electrode member 1120 on the surface (bottom surface 1183) opposite to the elastic member 1130. In other words, the electroencephalogram electrode member 1120 is attached to the elastic member 1130 via the holding portion 1180. The holding portion 1180 may be detachable from the elastic member 1130.

[0040] The holding portion 1180 includes a base portion 1181, a convex portion 1182, and an adjustment member 1200. The base portion 1181, the convex portion 1182, and the adjustment member 1200 are integrally formed. The holding portion 1180 is made of, for example, a hard plastic.

[0041] The base 1181 is in the shape of a substantially disc (flange) with a predetermined thickness. The base 1181 has a conductive portion 1164, a circuit 1162, and an adjustment member mounting portion 1190. Specifically, on the bottom surface 1183 of the base 1181, there are a first accommodating portion 1185 recessed for accommodating the conductive portion 1164 and a second accommodating portion 1186 recessed for accommodating the circuit 1162. On the upper surface 1184 of the base 1181, there is a convex adjustment member mounting portion 1190. The first accommodating portion 1185 is provided at the center of the disc shape. The position of the second accommodating portion 1186 is not particularly limited, but it is provided at a position where the accommodated circuit 1162 functions properly. The function of the circuit 1162 will be described later.

[0042] The adjustment member mounting portion 1190 is formed in a convex shape and has a structure for attaching the adjustment member 1200. As an example of the structure for attaching the adjustment member 1200, it may be a hole penetrating in the lateral direction (x direction), or it may be a hook shape for locking the adjustment member 1200. Further, the adjustment member mounting portion 1190 is not integrally formed with the base 1181 and may be provided separately and attached to the upper surface 1184 of the base 1181 by screws or the like.

[0043] The adjustment member mounting portion 1190 is provided corresponding to the number and mounting position of the adjustment members 1200. Note that it may be provided in a number more than that of the adjustment members 1200 and be selected when attaching the adjustment members 1200.

[0044] The convex portion 1182 is cylindrical and protrudes upward (z direction) from the center of the upper surface 1184 of the base 1181 (that is, the center of the disc shape). The convex portion 1182 is fitted into the elastic member recess 1131 (elastic material through hole 1135) of the elastic member 1130 from the bottom surface side of the elastic member recess 1131.

[0045] On the upper surface of the convex portion 1182, there is a holding portion recess 1188 recessed in the vertical direction. The bottom of the holding portion recess 1188 has a holding portion through hole 1189 communicating with the electrode through hole 1121.

[0046] The retaining recess 1188 overlaps with the elastic member recess 1131 (elastic member through hole 1135). As a result, the retaining recess 1188 can be operated from outside the support 1110 by a finger 99 or the like through the support through hole 1114 and the elastic member recess 1131.

[0047] The retaining recess 1188 has a shape (a so-called mortar shape) in which the cross-section becomes smaller as it approaches the electroencephalogram electrode member 1120 from the elastic member 1130, that is, towards the downward side (-z side). This shape makes it easy to operate the retaining recess 1188 with a finger 99. Also, when inserting the tube 150 into the retaining through hole 1189, the inclined surface of the retaining recess 1188 guides the tube 150 into the retaining through hole 1189, making insertion easier. Note that the shape of the retaining recess 1188 is not limited to a mortar shape; various shapes can be adopted as long as they are suitable for finger operation and guide the tube 151 (see Figure 15) into the retaining through hole 1189.

[0048] <Adjustment Member 1200> The adjustment member 1200 is attached to the holding part 1180 (more specifically, the adjustment member mounting part 1190), and at least its end can be positioned outside the outer material (covering member 1112) of the support 1110 by passing through the elastic material through hole 1135 (elastic material recess 1131). The extent to which it should be positioned outside is sufficient as long as it is possible to operate the adjustment member 1200. For example, if the adjustment member 1200 is to be pinched with fingers, it should be about 1 cm to 3 cm. If it is too long, it may interfere with electroencephalogram measurement, so if it is made long, it is preferable to provide a structure to fix the adjustment member 1200 to the covering member 1112 when it is not in use so that it does not get in the way.

[0049] The adjustment member 1200 may be a single unit or multiple units attached to different locations on the holding unit 1180. By providing two adjustment members 1200 in point-symmetrical positions with respect to the convex portion 1182 when viewed from above (viewed from the +y direction), the orientation of the electrode unit 1101 (EEG electrode member 1120) can be easily adjusted. If three or more adjustment members 1200 are provided, the orientation of the electrode unit 1101 can be finely adjusted. In this embodiment, since the recess 1188 of the holding unit can be adjusted with a finger 99, providing the adjustment member 1200 in two locations as described above allows it to fully perform its function as an adjustment member 1200. The adjustment member 1200 may be attached to the EEG electrode member 1120 instead of the holding unit 1180. In that case, it is preferable that the holding portion 1180 or the elastic member 1130 has a structure such as an opening that allows the adjustment member 1200 attached to the electroencephalogram electrode member 1120 to be removed upward.

[0050] The adjustment member 1200 is deformable. More specifically, the adjustment member 1200 can be a string, a wire, or a foldable or telescopic rod (stick). By using such an adjustment member 1200, it can be deformed so as not to interfere with electroencephalogram (EEG) measurements. For example, it can be fixed along the covering member 1112 or housed inside the elastic member recess 1131.

[0051] As the adjustment member 1200, a string is preferred from the viewpoint of ease of deformation, ensuring the desired strength, and ease of handling. The string is a member made by bundling fibers such as cloth, hemp, synthetic fibers, or leather to a medium thickness and making it long and thin. Various materials and thicknesses can be used for the adjustment member 1200, as long as they can exhibit sufficient strength to prevent breakage when the electrode unit 1101 is pulled up and adjusted, and can be deformed so as not to interfere with electroencephalogram (EEG) measurement. Furthermore, from the viewpoint of minimizing the impact on EEG measurement, it is preferable that at least the outer covering of the adjustment member 1200 is made of an insulating material.

[0052] <Circuit> Circuit 1162 includes, for example, a preamplifier that amplifies the electrical signal from the electroencephalogram electrode member 1120, and is also called an active electrode. Circuit 1162 is electrically connected to a conductive part 1164 by wiring 1163, and acquires electroencephalogram signals from the electroencephalogram electrode member 1120 via the conductive part 1164. Circuit 1162 performs amplification processing according to predetermined settings and transmits the signal to the signal processing unit 1160 (data processing unit 210) via wiring 1165. The specific configuration of the signal processing unit 1160 will be described later.

[0053] <Electroencephalogram Electrode Member> The electroencephalogram electrode member 1120 will be described with reference to Figures 7 to 9. Figure 7 is a diagram (bottom view) illustrating the structure of the side of the electroencephalogram electrode member 1120 that faces the head 20. Figure 8 is a side view of the electroencephalogram electrode member 1120. Figure 9 is a cross-sectional view taken along line A-A in Figure 7. In this embodiment, the electroencephalogram electrode member 1120 further comprises an electrode body 1125, a conductive member 1124, wiring 1127, and a cover 1129. The electrode body 1125 comprises a base portion 1122 and one or more protrusions 1123 provided on the base portion 1122. An electrode through-hole 1121 is provided in the base portion 1122.

[0054] The conductive member 1124 is, for example, a conductive metal and has a first portion 1124a and a second portion 1124b. The first portion 1124a and the second portion 1124b are integrally formed. As such a metal, for example, copper, aluminum, silver, and alloys thereof can be used.

[0055] The first portion 1124a is tubular. The through hole 121a provided in the conductive member 1124 and the through hole 1122a provided in the base portion 1122 are in communication with each other, and these through holes 121a and 122a constitute the electrode through hole 1121. Screw grooves are provided on the outside of the first portion 1124a.

[0056] The second portion 1124b is, for example, disc-shaped. The cover 1129 covers a part of the conductive member 1124 and a part of the base 1122. The cover 1129 is made of, for example, resin and is insulating. The base 1122 is fixed to the main surface 1124c of the second portion 1124b.

[0057] The protrusion 1123 has a first portion 1123a, a conductive portion 1123b, and a second portion 1123c. Multiple protrusions 1123 are provided on the side of the base 1122 opposite to the conductive member 1124. The base 1122 and the first portion 1123a are integrally formed by a rubber-like elastic material. There may be 10 or more protrusions 1123. The shape of the first portion 1123a is, for example, a cone or a pyramidal pyramid. The conductive portion 1123b is provided so as to cover the first portion 1123a. The tip of the first portion 1123a is covered by the second portion 1123c. The second portion 1123c is a spherical member made of a gel-like material (also called hydrogel) containing water inside, and is attached so as to pierce the tip of the first portion 1123a.

[0058] When the electroencephalogram electrode member 1120 is pressed against the head 20 for electroencephalogram measurement, the second portion 1123c comes into contact with the head 20. At this time, the electrolytic substances (generally salts) from the scalp 22 are absorbed into the second portion 1123c. As a result, the electroencephalogram electrode member 1120 and the scalp 22 become electrically conductive. The shape of the second portion 1123c is not limited to a sphere. Furthermore, the gel-like material constituting the second portion 1123c is not particularly limited as long as it can contain sufficient water and achieve sufficient strength and flexibility when pressed against the head 20, but for example, acrylic hydrogels or silicone hydrogels can be used.

[0059] The materials of the base portion 1122 and the first portion 1123a will now be described. The base portion 1122 and the first portion 1123a are composed of a rubber-like elastic body. Specifically, the rubber-like elastic body is rubber or thermoplastic elastomer (also simply called "elastomer (TPE)"). An example of rubber is silicone rubber. Examples of thermoplastic elastomers include styrene-based TPE (TPS), olefin-based TPE (TPO), vinyl chloride-based TPE (TPVC), urethane-based TPE (TPU), ester-based TPE (TPEE), and amide-based TPE (TPAE).

[0060] The conductive portion 1123b is formed, for example, using a paste containing a highly conductive metal. The conductive portion 1123b includes, for example, one or more selected from the group consisting of copper, silver, gold, nickel, tin, lead, zinc, bismuth, antimony, or alloys thereof.

[0061] Inside the first portion 1123a, a wiring 1127 is provided that connects to the conductive portion 1123b. The wiring 1127 electrically connects the conductive portion 1123b and the conductive member 1124. The wiring 1127 may be made of, for example, conductive fibers. As conductive fibers, one or more selected from the group consisting of metal fibers, metal-coated fibers, carbon fibers, conductive polymer fibers, conductive polymer-coated fibers, and conductive paste-coated fibers can be used. These may be used individually or in combination of two or more types.

[0062] By screwing the first portion 1124a of the conductive member 1124 into the conductive portion 1164 of the holding portion 1180, the electroencephalogram electrode member 1120 is attached to the conductive portion 1164. As a result, the electroencephalogram electrode member 1120 is attached to the elastic member 1130.

[0063] <Tube and Injection Member> Referring to Figure 15, the tube 151 and injection member 152 for supplying liquid 30 to the scalp 22 will be described. The injection member 152 is, for example, a syringe and has a liquid storage portion. The tube 151 is, for example, made of metal. With the tube 151 attached to the injection member 152, the tube 151 is inserted into the holding portion through hole 1189 and the electrode through hole 1121. The lower end of the injection member 152 or the outer circumference of the tube 151 is provided with a structure that limits the insertion amount of the tube 151. When fully inserted, the tube 151 penetrates the base portion 1122, but the tip of the tube 151 is positioned above (+Z direction) the lower end of the protrusion 1123. This prevents the tube 151 from coming into contact with the scalp 22. The liquid 30 pushed out from the injection member 152 is supplied to the scalp 22 through the tube 151.

[0064] <Electrical Connection Relationship in the Electroencephalogram Measurement Device> The electrical connection relationship in the electroencephalogram measurement device 10 is described below. The electroencephalogram measurement device 10 further includes wiring 1163, 1165, 1166, circuit 1162, signal processing unit 1160, and reference potential measurement wiring 1161 (see Figure 4). Of these, the conductive part 1164, wiring 11165, 1166, and circuit 1162 are provided for each electroencephalogram electrode member 1120. Wiring 1163 and circuit 1162 are fixed to the holding unit 1180 together with the conductive part 1164.

[0065] When the scalp 22 comes into contact with the second portion 1123c, electrical signals from the scalp 22 are transmitted to the conductive member 1124 via the second portion 1123c, the conductive part 1123b, and the wiring 1127. In this way, the electrical signals obtained by each electroencephalogram electrode member 1120 are sent from the conductive member 1124 of the electroencephalogram electrode member 1120 to the signal processing unit 1160 via the conductive part 1164, the wiring 1163, the circuit 1162, and the wiring 1165.

[0066] <Signal Processing Unit> Figure 10 is a block diagram focusing on the functions of the signal processing unit 1160. The signal processing unit 1160 includes a main control unit 201, an operation processing unit 202, a communication unit 203, and a data processing unit 210. The main control unit 201 comprehensively controls each component of the signal processing unit 1160. The operation processing unit 202 is an interface that accepts user operations, such as a switch or a touch panel. The communication unit 203 connects to external devices via communication lines, wireless, etc. The connection to external devices may be direct or via a network such as the Internet.

[0067] The data processing unit 210 is connected to the circuit 1162 of the electroencephalogram electrode member 1120 (holding unit 1180) and acquires data measured by the electroencephalogram electrode member 1120 via the circuit 1162. The data processing unit 210 performs processing such as amplification of the electroencephalogram electrical signal, analog-to-digital conversion, and frequency filtering. The data processing unit 210 can also record the electroencephalogram signal data obtained through these processes into a recording unit provided in the signal processing unit 1160. Furthermore, the data processing unit 210 can transmit the electroencephalogram signal data to an external device via wired or wireless communication through the communication unit 203.

[0068] It is preferable that the signal processing unit 1160 has a built-in battery. This eliminates the need to connect a power line to the signal processing unit 1160 for power supply. Consequently, the person being measured can move and act with a certain degree of freedom during the measurement. It also prevents noise that depends on the frequency of the power supply. The reference potential measurement wiring 1161 connects the signal processing unit 1160 and a reference electrode (not shown) to each other. The reference electrode is an electrode used to acquire a reference potential that serves as a standard in the measurement of electroencephalogram signals. The reference electrode is attached, for example, to the earlobe or the upper part of the outer ear with a clip, or attached to the bone on the back of the outer ear to acquire the reference potential.

[0069] Figure 11 illustrates the hardware configuration of a computer 1000 for implementing the signal processing unit 1160. The computer 1000 can be any type of computer. For example, the computer 1000 may be a personal computer (PC), a server machine, a tablet terminal, a smartphone, or a terminal device. The computer 1000 may be a dedicated computer designed to implement the signal processing unit 1160, or it may be a general-purpose computer.

[0070] Computer 1000 includes a bus 1010, a processor 1020, a memory 1030, a storage device 1040, an input / output interface 1050, and a network interface 1060. The bus 1010 is a data transmission path for the processor 1020, memory 1030, storage device 1040, input / output interface 1050, and network interface 1060 to send and receive data to and from each other. The processor 1020 is an arithmetic processing unit such as a CPU (Central Processing Unit) or a GPU (Graphics Processing Unit). The memory 1030 is a main memory device composed of RAM (Random Access Memory), etc. The storage device 1040 is an auxiliary storage device composed of a hard disk, SSD (Solid State Drive), memory card, or ROM (Read Only Memory), etc. However, the storage device 1040 may be configured using RAM, etc. The input / output interface 1050 is an interface for connecting computer 1000 and the input / output device. For example, input devices such as keyboards and mice, and output devices such as display devices are connected to the input / output interface 1050. The network interface 1060 is an interface for connecting to communication networks such as WANs (Wide Area Networks) and LANs (Local Area Networks). The storage device 1040 stores program modules that realize each function of the signal processing unit 1160. The processor 1020 reads each of these program modules into the memory 1030 and executes them to realize the functions corresponding to those program modules.

[0071] <How to Use the EEG Measurement Device> The method of using the EEG measurement device 10 will be explained with reference to Figures 12 to 15, focusing mainly on adjusting the orientation of the electrode unit 1101. Figure 12 shows the electrode unit 1101 mounted at an angle. Figure 13 shows the electrode unit 1101 being pulled up by the adjustment member 1200. Figure 14 shows the electrode unit 1101 being adjusted with a finger. Figure 15 shows the liquid 30 being supplied to the scalp 22.

[0072] First, as shown in Figure 3, the support body 1110 with the electroencephalogram electrode member 1120 attached is mounted on the head 20. The electroencephalogram electrode member 1120 is provided on the bottom surface 1132 side of the elastic member 1130 via a holding portion 1180.

[0073] In this case, as shown in Figure 12, if the mounting position of the electrode unit 1101 is at an angle, the electroencephalogram electrode member 1120 cannot properly contact the scalp 22, and electroencephalogram measurement cannot be performed properly. Therefore, it is necessary to correct the mounting position of the electroencephalogram electrode member 1120.

[0074] Therefore, as shown in Figure 13, the end of the adjustment member 1200, which is located outside the covering member 1112, is pulled upward (in the +z direction). This causes the electrode unit 1101 to move upward. As the electrode unit 1101 moves upward, the elastic member 1130 deforms and is compressed. This action corrects the mounting position of the electrode unit 1101 on the elastic member 1130.

[0075] Next, as shown in Figure 14, the scalp 22 is inserted into the elastic member recess 1131 and the holding part recess 1188 is operated to fine-tune the orientation of the electroencephalogram electrode member 1120, avoid hair, etc., and improve the contact condition with the scalp 22.

[0076] Subsequently, as shown in Figure 15, the liquid 30 is supplied to the scalp 22 using the tube 151 and the injection member 152. Then, the operator removes the tube 150 and starts electroencephalogram measurement.

[0077] As described above, according to this embodiment, even when the orientation of the electrode unit 1101 is at an angle to the head 20 (scalp 22), the orientation can be adjusted using the adjustment member 1200. Furthermore, by operating the holding recess 1188 with a finger 22, the orientation of the electrode unit 1101 can be finely adjusted and the hair can be parted to improve the contact condition.

[0078] [Second Embodiment] Next, a second embodiment will be described. One example of a problem that this embodiment aims to solve is to provide a technology that allows electroencephalogram (EEG) measurement to be performed even when the subject is lying down or in a state where force is acting on the EEG measuring device.

[0079] <Basic Configuration of Electroencephalogram Measurement Device> <Overview> Figure 16 is a diagram illustrating a partial cross-section of the electroencephalogram measurement device 10 according to the embodiment. Figure 17 is a diagram illustrating a partial cross-section of the electroencephalogram measurement device 10 according to the embodiment, illustrating the state in which the electroencephalogram measurement device 10 of Figure 16 is attached to the head 20 (the electrode unit 2120 is pressed against the scalp 22). Figure 18 is a diagram illustrating a cross-section of the electrode unit 2120. In this embodiment, the electrode unit 2120 is placed at the electrode positions defined by the International 10-20 Electrode Placement Method.

[0080] Referring to Figures 16-18, a basic form of electroencephalogram (EEG) measurement device, in which EEG electrodes are attached to a helmet-shaped support, will be described.

[0081] The electroencephalogram (EEG) measuring device 10 comprises a support body 2110, a support body elastic member 2130, a holding part 2180, and an electrode unit 2120. Electroencephalograms are measured by bringing the electrode unit 2120 of the EEG measuring device 10 into contact with the head 20 (scalp 22). The electrode unit 2120 is attached to the support body elastic member 2130 via the holding part 2180 and held by the support body 2110.

[0082] As will be described in detail later, the support 2110 is, for example, a helmet-type support worn on the head 20, and has a support through-hole 2114 that penetrates the inside and outside, and a support elastic member 2130 embedded in the support through-hole 2114. The electrode unit 2120 is held on the bottom surface 2132 of the support elastic member 2130 via a holding part 2180. The support 2110 is divided into multiple pieces. In this embodiment, a support 2110 divided into eight pieces is shown as an example, but the specific configuration will be described later.

[0083] The support elastic member 2130 is provided with an elastic member recess 2131 that is recessed from the surface to the bottom surface. The elastic member recess 2131 communicates with the support through hole 2114. By inserting a finger or the like into the elastic member recess 2131 through the support through hole 2114, the support elastic member 2130 can be manipulated, or the holding part 2180 attached to the support elastic member 2130 can be manipulated to adjust the orientation of the electrode unit 2120, etc.

[0084] The support 2110 is helmet-shaped. When the support 2110 is helmet-shaped, it has a recess into which the head 20 is inserted. The electroencephalogram (EEG) measuring device 10 is configured such that, with the helmet-shaped support 2110 attached to the head 20, one or more electrode units 2120 are in contact with the head 20 (scalp 22).

[0085] Hereinafter, the side of the support 2110 that faces the head 20 (scalp 22) will be referred to as the inside of the support 2110, and the side opposite the inside will be referred to as the outside of the support 2110. In Figures 16 and 17, the direction from the inside to the outside of the support 2110 is defined as the z direction. The x, y, and z directions are orthogonal to each other. The z direction is approximately the normal direction of the scalp 22. Note that the x, y, and z directions may be defined as different directions for each electrode unit 2120 in the electroencephalogram measurement device 10.

[0086] The support 2110 holds a plurality of electrode units 2120. With the support 2110 attached to the head 20, each electrode unit 2120 can be brought into contact with a predetermined position on the head 20. Then, electroencephalograms are measured by the plurality of electrode units 2120. For example, the support 2110 can hold 17 electrode units 2120. The positions of the 17 electrode units 2120 may correspond to the positions of Fz, F3, F4, F7, F8, Cz, C3, C4, T3, T4, Pz, P3, P4, T5, T6, O1, and O2 in the International 10-20 electrode placement scheme.

[0087] Hereinafter, the electrode positions in the International 10-20 electrode placement method will be referred to as "electrode positions" for convenience, for example, F3 in the International 10-20 electrode placement method will be referred to as "electrode position F3". The number and positions of the electrode units 2120 provided on the support 2110 are not particularly limited and can be set according to the application, etc.

[0088] The support elastic member 2130 is elastically deformable. The support elastic member 2130 has a recess (elastic member recess 2131) that is indented from the outside to the inside. In this embodiment, at least a portion of the bottom surface of the elastic member recess 2131 has a second through hole (hereinafter also referred to as "elastic material through hole 2135") that penetrates the support elastic member 2130. In this embodiment, a configuration in which substantially the entire bottom surface of the elastic member recess 2131 is the elastic material through hole 2135 is illustrated. Hereafter, unless otherwise specified, the elastic member recess 2131 and the elastic material through hole 2135 will be described as the same thing.

[0089] The shape of the support 2110 is determined, for example, based on the average head shape. However, head shapes vary greatly from person to person, and an element is needed to absorb these differences. In the electroencephalogram (EEG) measuring device 10, in which the electrode unit 2120 is held on the support 2110 via the support elastic member 2130, the support elastic member 2130 elastically deforms when the support 2110 is attached to the head 20. In this way, even if there are individual differences in head shape (unevenness and surface angles), the electrode unit 2120 can be stably brought into contact with the scalp 22, and electroencephalograms can be measured.

[0090] The helmet-shaped support 2110 is divided into multiple pieces, which allows it to better accommodate individual differences in head shape (such as unevenness and surface angles). The structure divided into multiple pieces will be described later.

[0091] As described above, fingers or the like are inserted into the support 2110 through the support through-hole 2114 provided in the covering member 2112 of the support 2110 to operate the support elastic member 2130 (elastic member recess 2131) and the holding part 2180. Since there is no need for a structure that protrudes from the inside to the outside of the support 2110 to adjust the orientation of the electrode unit 2120, the center of gravity can be stabilized when it is attached to the head 20. In addition, the person being measured can lie down with the support 2110 attached, and noise caused by body movement can be reduced. Furthermore, electroencephalogram measurements may be performed while the person being measured is moving around.

[0092] Furthermore, the electrode unit 2120 is detachable from the support 2110. This allows the electrode unit 2120 to be replaced as needed, or different types of electrode units 2120 to be used for each measurement. Each component of the electroencephalogram (EEG) measuring device 10 will be described in detail below.

[0093] <Details of each component of the electroencephalogram measuring device> <Support> The support 2110 has a shape that can cover at least a part of the head 20. The support 2110 only needs to be attachable to the head 20 and may be made of cloth or rubber, for example. The support 2110 may be helmet-shaped, hat-shaped, or band-shaped. In this embodiment, the support 2110 comprises a base 2111 and a covering member 2112. The base 2111 is located on the head 20 side when the support 2110 is attached to the head 20. The covering member 2112 is located on the opposite side from the head 20 when the support 2110 is attached to the head 20.

[0094] The base body 2111 is made of, for example, expanded polystyrene, rigid expanded polyurethane, expanded polyethylene, expanded polypropylene, EPDM, or other rubber. The base body 2111 is provided with a plurality (seven in this case) of holes 2115 that penetrate vertically at positions corresponding to the 17 electrode positions mentioned above. The support elastic member 2130 is housed in the holes 2115. The covering member 2112 is made of, for example, resin. The covering member 2112 is harder than the base body 2111 and can protect the head 20. However, the support body 2110 does not necessarily have to be equipped with the covering member 2112.

[0095] <Support Elastic Member> The support elastic member 2130 is housed in a hole 2115 provided in the base 2111 of the support 2110. The external shape and size of the support elastic member 2130 are substantially the same as the internal shape and size of the hole 2115 provided in the support 2110, and the support elastic member 2130 is fitted into the hole 2115 of the support 2110.

[0096] With the support body 2110 not attached to the head 20, the support body elastic member 2130 may fill the entire portion of the hole 2115 provided in the support body 2110, excluding the elastic member recess 2131. The covering member 2112 is provided with a support body through hole 2114. The elastic member recess 2131 provided in the support body elastic member 2130 and the support body through hole 2114 provided in the covering member 2112 are in communication.

[0097] As shown in Figure 16, it is preferable that the hole diameter d2 of the support through hole 2114 is larger than the hole diameter d1 of the elastic member recess 2131. By making the hole diameter d2 of the support through hole 2114 larger in this way, it becomes easier to operate the holding part 2180. As a result, it becomes easier to adjust the orientation of the electrode unit 2120, etc.

[0098] The support elastic member 2130 is made of an elastic material. The elastic material is made of one or more selected from, for example, urethane sponge, polyethylene sponge, polypropylene sponge, and silicone rubber sponge.

[0099] The support elastic member 2130 can be configured without a spring. When a spring is used, the spring's repulsive force increases in proportion to the amount of spring deformation. Therefore, when the amount of deformation is large, excessive repulsive force is generated, making it easy for the person being measured to feel pain. On the other hand, when using a foam elastic material, there is a displacement range in which the repulsive force does not increase much (is not proportional) with increasing deformation. By configuring the support elastic member 2130 to be usable within such a displacement range, an appropriate repulsive force can be obtained even if the amount of deformation varies depending on the position of the electrode unit 2120.

[0100] The hardness H of the elastic material, as measured by JIS K 6400-2-A method, is, for example, between 10 N and 200 N. From the viewpoint of further reducing the burden on the person being measured, the hardness H is preferably 150 N or less, and more preferably 100 N or less. Furthermore, from the viewpoint of more stably pressing the electrode unit 2120 against the scalp 22, the hardness H is preferably 30 N or more, and more preferably 50 N or more.

[0101] The thickness t1 of the support elastic member 2130 is, for example, 10 mm to 100 mm when the support 2110 is not attached to the head 20. Here, the thickness t1 is the thickness of the support elastic member 2130 in the direction perpendicular to the bottom surface 2132 that faces the head 20. The support elastic member 2130 is fixed to the support 2110 at one end, and the thickness t1 of the support elastic member 2130 is variable according to the force it receives in the thickness direction. Specifically, the support elastic member 2130 is fixed to the support 2110 on the surface opposite to the bottom surface 2132 (top surface 133). The thickness t of the support elastic member 2130 is preferably 20 mm to 60 mm when the support 2110 is not attached to the head 20. The lower limit of the thickness t1 is preferably 25 mm or more, more preferably 30 mm or more. The upper limit of the thickness t1 is preferably 55 mm or less, more preferably 50 mm or less. By setting the thickness t1 in this way, the electrode unit 2120 can be appropriately compressed according to the shape of the head 20, thereby suppressing discomfort to the person being measured and allowing the electrode unit 2120 to be properly pressed against the scalp 22.

[0102] Among the support elastic members 2130, the area of the bottom surface 2132 facing the head is, for example, 3 cm ２ or more and 25 cm ２ or less. The lower limit is preferably 5 cm ２ or more, and more preferably 7 cm ２ or more. By this, an appropriate size as the electrode unit 2120 can be ensured, and a stable posture (orientation) can be realized. The upper limit is preferably 20 cm ２ or less, and more preferably 15 cm ２ or less. Thereby, it is possible to prevent the orientation of the electrode unit 2120 from moving too much and becoming difficult to adjust. The shape of the bottom surface is not particularly limited. Examples of the shape of the bottom surface include a circle, a square, an oval, an ellipse, etc. In view of making the electrode unit 2120 easy to rotate, a circular shape is preferable. On the other hand, when it is not desired to rotate the electrode unit 2120, a non-circular shape is preferable.

[0103] <Holding portion> The holding portion 2180 is provided on the bottom surface 2132 of the support elastic member 2130. Also, the holding portion 2180 holds the electrode unit 2120 on the surface (bottom surface 2183) opposite to the support elastic member 2130. In other words, the electrode unit 2120 is attached to the support elastic member 2130 via the holding portion 2180. The holding portion 2180 may be detachable from the support elastic member 2130.

[0104] The holding portion 2180 integrally has a base portion 2181 and a convex portion 2182. The holding portion is made of, for example, a hard plastic, and the base portion 2181 and the convex portion 2182 are molded simultaneously.

[0105] The base portion 2181 is a substantially disc-shaped (flange-shaped) structure of a predetermined thickness. The base portion 2181 has a conductive portion 2164 and a circuit 2162. Specifically, the bottom surface 2183 of the base portion 2181 has a first housing portion 2185 recessed to accommodate the conductive portion 2164 and a second housing portion 2186 recessed to accommodate the circuit 2162. The first housing portion 2185 is located at the center of the disc shape. The position of the second housing portion 2186 is not particularly limited, but it is positioned so that the housed circuit 2162 functions properly.

[0106] The protrusion 2182 is cylindrical and protrudes upward (in the z direction) from the center of the upper surface 2184 of the base 2181 (i.e., the center of the disc shape). The protrusion 2182 is fitted into the elastic member recess 2131 (elastic material through hole 2135) of the support elastic member 2130 from the bottom side of the elastic member recess 2131.

[0107] <Circuit> Circuit 2162 includes, for example, a preamplifier that amplifies the electrical signal from the electrode unit 2120. Circuit 2162 is electrically connected to a conductive part 2164 by wiring 2163 and acquires electroencephalogram (EEG) signals from the electrode unit 2120 via the conductive part 2164. Circuit 2162 performs amplification processing according to predetermined settings and transmits the signal to an external signal processing unit via wiring 2165.

[0108] <Electrode Unit (Electroencephalogram Electrode Member)> For example, as shown in Figure 18, the electrode unit 2120 comprises an electrode body 2125, a conductive member 2124, and wiring 2127. The electrode body 2125 has a cylindrical base 2122 and an electrode protrusion 2123 that protrudes from the lower surface of the base 2122 (hereinafter also referred to as the "protrusion-forming surface 2126"). The conductive member 2124 is attached to the upper surface 2128 of the base 2122.

[0109] <Conductive Member> The conductive member 2124 is, for example, a conductive metal and has a first portion 2124a and a second portion 2124b. The first portion 2124a and the second portion 2124b are integrally formed.

[0110] The first part 2124a is columnar (cylindrical). Screw grooves are provided on the outside of the first part 2124a. The second part 2124b is, for example, disc-shaped. The first part 2124a is screw-fitted to the conductive part 2164 of the holding part 2180.

[0111] <Electrode Body> The electrode body 2125 comprises a cylindrical base 2122 and one or more electrode protrusions 2123 provided on the base 2122.

[0112] The electrode projection 2123 has a first portion 2123a, a conductive portion 2123b, and a second portion 2123c. Multiple electrode projections 2123 are provided on the side of the base portion 2122 opposite to the conductive member 2124 side.

[0113] The base portion 2122 and the first portion 2123a are integrally formed by a rubber-like elastic body. Ten or more electrode protrusions 2123 may be provided. The shape of the first portion 2123a is, for example, a cone or a pyramidal shape. The conductive portion 2123b is provided so as to cover the first portion 2123a. The tip of the first portion 2123a is covered by the second portion 2123c. The second portion 2123c is a spherical member made of a gel-like material (also called hydrogel) containing water inside, and is attached so as to pierce the tip of the first portion 2123a.

[0114] When the electrode unit 2120 is pressed against the head 20 for electroencephalogram (EEG) measurement, the second portion 2123c comes into contact with the head 20. At this time, the electrolytic substance (generally salt) from the scalp 22 is absorbed into the second portion 2123c. As a result, the electrode unit 2120 and the scalp 22 become electrically conductive. The shape of the second portion 2123c is not limited to a sphere. Furthermore, the gel-like material constituting the second portion 2123c is not particularly limited as long as it can contain sufficient water and achieve sufficient strength and flexibility when pressed against the head 20, but for example, acrylic hydrogels or silicone hydrogels can be used.

[0115] The materials of the base portion 2122 and the first portion 2123a will now be described. The base portion 2122 and the first portion 2123a are composed of a rubber-like elastic body. Specifically, the rubber-like elastic body is rubber or thermoplastic elastomer (also simply called "elastomer (TPE)"). An example of rubber is silicone rubber. Examples of thermoplastic elastomers include styrene-based TPE (TPS), olefin-based TPE (TPO), vinyl chloride-based TPE (TPVC), urethane-based TPE (TPU), ester-based TPE (TPEE), and amide-based TPE (TPAE).

[0116] The conductive portion 2123b is formed, for example, using a paste containing a highly conductive metal. The conductive portion 2123b includes, for example, one or more selected from the group consisting of copper, silver, gold, nickel, tin, lead, zinc, bismuth, antimony, or alloys thereof.

[0117] Inside the first portion 2123a, a wiring 2127 is provided that connects to the conductive portion 2123b. The wiring 2127 electrically connects the conductive portion 2123b and the conductive member 2124. The wiring 2127 may be made of, for example, conductive fibers. As conductive fibers, one or more selected from the group consisting of metal fibers, metal-coated fibers, carbon fibers, conductive polymer fibers, conductive polymer-coated fibers, and conductive paste-coated fibers can be used. These may be used individually or in combination of two or more types.

[0118] The electrode unit 2120 is attached to the conductive portion 2164 of the holding portion 2180 by screwing the first portion 2124a of the conductive member 2124 into the conductive portion 2164 of the holding portion 2180. This attaches the electrode unit 2120 to the support elastic member 2130.

[0119] <Electrical Connection Relationship in the Electroencephalogram Measurement Device> When the scalp 22 comes into contact with the second part 2123c, electrical signals from the scalp 22 are transmitted to the conductive member 2124 via the second part 2123c, the conductive part 2123b, and the wiring 2127. In this way, the electrical signals obtained by each electrode unit 2120 are sent from the conductive member 2124 of the electrode unit 2120 to an external signal processing unit via the conductive part 2164, the wiring 2163, the circuit 2162, and the wiring 2165. The signal processing unit may be attached to the support 2110.

[0120] The signal processing unit is connected to the circuit 2162 of the electrode unit 2120 (holding unit 2180), and acquires data measured by the electrode unit 2120 via the circuit 2162. The signal processing unit performs processing such as amplification of the electroencephalogram (EEG) electrical signal, analog-to-digital conversion, and frequency filtering. The signal processing unit can also record the EEG signal data obtained through these processes into a recording unit provided within the signal processing unit. Furthermore, the signal processing unit can transmit the EEG signal data to an external device via wired or wireless communication.

[0121] <How to use the electroencephalogram (EEG) measuring device> The method of using the EEG measuring device 10 with the above configuration will be explained below. First, the support body 2110 with the electrode unit 2120 attached is placed on the head 20. The electrode unit 2120 is provided on the bottom surface 2132 side of the support elastic member 2130 via the holding part 2180.

[0122] At this time, the support elastic member 2130 shrinks in the thickness direction according to the state of the head 20, and the electrode unit 2120 is pressed against the scalp 22. In other words, the support elastic member 2130 deforms according to the position and angle of the scalp 22 relative to the support 2110. Also, the electrode unit 2120 is pressed against the scalp 22 with a force corresponding to the elasticity of the support elastic member 2130. That is, as the support elastic member 2130 contracts, the position and angle of the tip of the electrode unit 2120 relative to the support 2110 changes to conform to the shape of the head 20.

[0123] If there is any discomfort in the contact between the electrode unit 2120 and the scalp 22, insert a finger or the like through the support through hole 2114 and manipulate the elastic material through hole 2135 or the holding part 2180 of the support elastic member 2130 to adjust the orientation of the electrode unit 2120. By doing so, the hair on the scalp 22 can be parted, improving the contact between the electrode unit 2120 and the scalp 22.

[0124] <Divided Support Type> Referring to Figures 19 to 21, an example of an electroencephalogram (EEG) measuring device 10 in which the support 2110 is divided into multiple pieces is shown. Figures 19 and 20 are diagrams showing an overall view of the EEG measuring device 10. Figure 19 is a side view of the EEG measuring device 10 when attached to the head 20. Figure 20 is a top perspective view of the EEG measuring device 10 when attached to the head 20. In Figure 20, the connecting part 60 and the cushioning material 70 are omitted. Figure 21 is a schematic diagram showing the relationship between each piece of the divided support 2110, the dividing line and the electrode position, with the support 2110 of the EEG measuring device 10 divided into eight parts.

[0125] The following describes an example of dividing the material into eight pieces (division method), but the number of divisions and the method of division are not limited to these examples, and various methods can be applied. Other division examples will be described later in the section on variations.

[0126] The support 2110 is divided into multiple pieces. Each piece has a base 2111 and a covering member 2112 as described in the basic form. Each piece is also provided with multiple through holes corresponding to the holes 2115 in the basic form, and the electrode unit 2120 is attached via the support elastic member 2130 and the holding part 2180. Furthermore, as shown in Figure 19, the support 2110 has a buffer material 70 (for example, an elastic member) provided in the gap between adjacent pieces, and a connecting part 60 (for example, a hook-and-loop fastener, etc.) that determines the relative position of adjacent pieces.

[0127] The electroencephalogram (EEG) measuring device 10 will now be described, focusing on the support body 2110, which is divided into multiple pieces. The configuration of the electrode unit 2120 and the structure for attaching the electrode unit 2120 to the support body 2110 are the same as in the basic form, and explanations of similar configurations will be omitted.

[0128] The support 2110 is broadly divided into an anterior piece 200 on the frontal side and a posterior piece 300 on the occipital side. A dividing line (A) 401 that separates the anterior piece 200 and the posterior piece 300 passes between the electrode positions Cz and Pz, T3 and T5, C3 and P3, T4 and T6, and C4 and P4 in the International 10-20 Electrode Placement Method. The posterior piece 300 is the part that mainly contacts the bed when the patient is lying on their back on a bed or the like. In other words, it is the part where force acts on the support 2110 due to the weight (pressure) of the head 20. On the other hand, the anterior piece 200 does not come into contact with the bed or the like very often, even when the patient is lying on their back on a bed or the like, and is a part where the weight of the head 20 hardly acts. More specifically, the electrode unit 2120 is pressed against the anterior piece 200 mainly by its own weight (the weight of the anterior piece 200 and the electrode unit 2120). On the other hand, the rear piece 300 is pressed against the electrode unit 2120 not only by its own weight but also by the weight of the head 20. By dividing the device into parts where the weight of the head 20 acts and parts where it does not, the weight of the head 20 can be distributed, preventing some of the electrode units 2120 from floating up and making proper electroencephalogram (EEG) measurement impossible. In other words, the EEG measurement device 10 can be worn as is, and EEG measurement can be continued even when lying down. Furthermore, because the device is divided into an anterior piece 200 and a rear piece 300, it is easier to attach the EEG measurement device 10 to the head 20.

[0129] <Rear Piece> The rear piece 300 has at least a first rear piece 310 and a second rear piece 320. A dividing line (B) 421 separating the first rear piece 310 and the second rear piece 320 passes between electrode positions O1 and O2 in the International 10-20 Electrode Arrangement Method. In addition to the first rear piece 310 and the second rear piece 320, the rear piece 300 has a third rear piece 330. A dividing line (B1) 422 separating the first rear piece 310 and the third rear piece 330 passes between electrode positions Pz and P3 in the International 10-20 Electrode Arrangement Method. A dividing line (B2) 423 separating the second rear piece 320 and the third rear piece 330 passes between electrode positions Pz and P4 in the International 10-20 Electrode Arrangement Method.

[0130] With this division, electrode units 2120 are attached to the first rear piece 310, the second rear piece 320, and the third rear piece 330 at positions corresponding to the electrode positions shown below.

[0131] The first posterior piece 310 has electrode positions O1, T3, and P3 according to the International 10-20 electrode placement method. In other words, the first posterior piece 310 faces the left occipital region. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the first posterior piece 310 covers the left occipital region. Holes 311, 312, and 313 are provided at positions corresponding to electrode positions O1, T3, and P3, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding portion 2180.

[0132] The second posterior piece 320 has electrode positions O2, T6, and P4 in the International 10-20 electrode placement method. In other words, the second posterior piece 320 faces the right occipital region. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the second posterior piece 320 covers the right occipital region. Holes 321, 322, and 323 are provided at positions corresponding to electrode positions O2, T6, and P4, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180.

[0133] The third posterior piece 330 has an electrode position Pz in the International 10-20 electrode placement method. In other words, the third posterior piece 330 can be said to correspond to the occipital region near the top of the head. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the third posterior piece 330 covers the occipital region near the top of the head. A hole 331 is provided at the position corresponding to the electrode position Pz, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180.

[0134] By dividing the posterior piece 300 into a first posterior piece 310, a second posterior piece 320, and a third posterior piece 330 as described above, the load acting on each piece can be appropriately distributed even when the subject lies on a bed or the like with the electroencephalogram (EEG) measuring device 10 attached to their head 20, resulting in good EEG measurement. Since the movement of each piece is independent, changes in the contact state between the electrode unit 2120 and the scalp 22 can suppress the influence of one piece on the other. In addition, it can be fitted to the shape of the subject's head. As a result, it is possible to prevent the subject from experiencing pain or other discomfort during EEG measurement.

[0135] <Front Piece> The front piece 200 is divided into at least three pieces, the three pieces being a first front piece 210 including electrode position Cz in the International 10-20 Electrode Arrangement Method, a second front piece 220 including electrode position T3 in the International 10-20 Electrode Arrangement Method, and a third front piece 230 including electrode position T4 in the International 10-20 Electrode Arrangement Method. Furthermore, the front piece 200 is divided into at least five pieces by the following division: the five pieces being the first front piece 210, the second front piece 220, and the third front piece 230, plus a fourth front piece 240 and a fifth front piece 250. The fourth front piece 240 is located between the first front piece 210 and the second front piece 220 and includes C3 and F3 in the International 10-20 Electrode Arrangement Method. The fifth front piece 250 is located between the first front piece 210 and the third front piece 230 and includes electrode positions C4 and F4 in the International 10-20 electrode arrangement method.

[0136] The dividing line (C1) 411 separating the first front piece 210 and the fourth front piece 240 passes between electrode positions Cz and C3, and Fz and F3 in the International 10-20 electrode placement method. The dividing line (C2) 412 separating the fourth front piece 240 and the second front piece 220 passes between electrode positions C3 and T3, and F3 and F7 in the International 10-20 electrode placement method. The dividing line (C3) 413 separating the first front piece 210 and the fifth front piece 250 passes between electrode positions Cz and C4, and Fz and F4 in the International 10-20 electrode placement method. The dividing line (C4) 414 separating the fifth front piece 250 and the third front piece 230 passes between electrode positions C4 and T4, and F4 and F8 in the International 10-20 electrode placement method. The dividing line (C5) 415, which separates the second front piece 220 and the third front piece 230, and also separates the fourth front piece 240 and the fifth front piece 250, passes between electrode positions Fp1 and Fp2.

[0137] With this division, the electrode unit 2120 is attached to the first front piece 210, second front piece 220, third front piece 230, fourth front piece 240, and fifth front piece 250 at positions corresponding to the electrode positions shown below.

[0138] The first anterior piece 210 has electrode positions Cz and Fz according to the International 10-20 electrode placement method. In other words, the first anterior piece 210 faces the top of the head. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the first anterior piece 210 covers the top of the head. Holes 211 and 212 are provided at positions corresponding to electrode positions Cz and Fz, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180.

[0139] The second anterior piece 220 has electrode positions T3 and F7 in the International 10-20 electrode placement method. In other words, the second anterior piece 220 faces the lower region of the left temporal lobe. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the second anterior piece 220 covers the lower region of the left temporal lobe. Holes 221 and 222 are provided at positions corresponding to electrode positions T3z and F7, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180. In this embodiment, the second anterior piece 220 has an electrode position Fp1, but no hole is made at electrode position Fp1 and the electrode unit 2120 is not attached there. However, a hole may be made at electrode position Fp1 and the electrode unit 2120 may be attached there.

[0140] The third anterior piece 230 has electrode positions T4 and F8 in the International 10-20 electrode placement method. In other words, the third anterior piece 230 faces the lower right temporal region. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the third anterior piece 230 covers the lower right temporal region. Holes 231 and 232 are provided at positions corresponding to electrode positions T4z and F8, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180. In this embodiment, the third anterior piece 230 has an electrode position Fp2, but no hole is made at electrode position Fp2 and the electrode unit 2120 is not attached there. However, a hole may be made at electrode position Fp2 and the electrode unit 2120 may be attached there.

[0141] The fourth anterior piece 240 has electrode positions C3 and F3 in the International 10-20 electrode placement method. In other words, the fourth anterior piece 240 faces the upper region of the left temporal lobe. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the fourth anterior piece 240 covers the upper region of the left temporal lobe. Holes 241 and 242 are provided at positions corresponding to electrode positions C3 and F3, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding part 2180.

[0142] The fifth anterior piece 250 has electrode positions C4 and F4 in the International 10-20 electrode placement method. In other words, the fifth anterior piece 250 faces the upper region of the right temporal lobe. That is, when the electroencephalogram measuring device 10 is attached to the head 20, the fourth anterior piece 240 covers the upper region of the right temporal lobe. Holes 251 and 252 are provided at positions corresponding to electrode positions C4 and F4, respectively, and the support elastic member 2130 described in the basic embodiment is housed there, and the electrode unit 2120 is attached via the holding portion 2180.

[0143] By dividing the front piece 200 into the first front piece 210, the second front piece 220, the third front piece 230, the fourth front piece 240, and the fifth front piece 250 as described above, the load acting on each piece can be appropriately distributed even when the subject lies on a bed or the like with the electroencephalogram (EEG) measuring device 10 attached to the head 20, resulting in good EEG measurement. Furthermore, it can be fitted to the shape of the subject's head. As a result, it is possible to prevent the subject from experiencing pain or other discomfort during EEG measurement. When the subject lies on a bed or the like with the head 20 attached to the front piece 200, depending on the orientation, the second front piece 220 or the third front piece 230 will come into contact with the bed or the like and a load will act on it when the subject turns from lying on their back to turning on their side. On the other hand, the load of the head 20 rarely acts on the first front piece 210, the fourth front piece 240, and the fifth front piece 250. In this way, by providing separate pieces for areas where the load on the head 20 acts and areas where it does not, the load acting on each piece can be distributed more effectively. As a result, the movement of each piece becomes independent, and changes in the contact state between the electrode unit 2120 and the scalp 22 can suppress the influence of one piece on the other. Furthermore, it can be fitted to the shape of the subject's head. As a result, it is possible to prevent the subject from experiencing pain or other discomfort during electroencephalogram (EEG) measurement.

[0144] <Connecting Section> Each piece of the divided support 2110 (first front piece 210, second front piece 220, third front piece 230, fourth front piece 240, fifth front piece 250, first rear piece 310, second rear piece 320, third rear piece 330) is connected by a connecting section 60. Here, "connecting" refers to a state in which the relative positions can be adjusted within a predetermined range, but the pieces are connected to each other. The connecting section 60 preferably has a structure that connects the pieces and allows for easy changes to the connection position and clearance between pieces. For example, hook-and-loop fasteners, belts, rubber bands, buckles, etc., can be suitably used. Furthermore, from the viewpoint of improving the fit with the head 20, it is preferable to adopt a connecting section 60 with a structure that does not suppress the direction in which the cushioning material 70 placed between the pieces shrinks, but suppresses the direction in which it stretches (loosens). All connecting sections 60 used may be of the same type, or different types may be used. In this embodiment, a configuration is shown in which a hook-and-loop fastener is provided on the outer surface of the support 2110 as the connecting portion 60.

[0145] A hook-and-loop fastener, for example, connects or separates by the hook-and-loop fastener (A) having a hook-shaped (J-hook) surface A and a hook-and-loop fastener (B) having a surface B with densely packed loops, which hook onto or detach from each other. In this embodiment, the hook-and-loop fastener (A) is fixed to the support 2110 side, and the hook-and-loop fastener (B) of the adjacent piece is attached from above to the hook-and-loop fastener (A) of the adjacent piece to connect them.

[0146] In the example described, a hook-and-loop fastener is provided on the outer surface of the support 2110 as the connecting portion 60. However, it may also be provided on the inner surface of the support 2110, or in the gap between the pieces (at the position of the dividing line).

[0147] <Cushioning Material> Cushioning material 70 is provided between each piece of the divided support 2110. By providing cushioning material 70, it is possible to prevent the pieces from coming into contact with each other. If the pieces come into contact, the vibrations caused by the contact may introduce noise into the detected brain waves, and by providing cushioning material 70, such noise can be prevented. Here, cushioning material 70 is provided in part of the gaps (dividing lines) between the pieces. Depending on where the cushioning material 70 is used and the shape of the head 20 of the person wearing the brain wave measuring device 10, appropriate materials of different sizes and hardnesses may be used. Also, it is not necessary to provide cushioning material 70 between all pieces. Furthermore, the cushioning material 70 may also function as a connecting part 60.

[0148] The shape of the cushioning material 70 is not particularly limited, but for example, it can be a rectangular parallelepiped. The size can be, for example, 10 mm to 40 mm in length, 10 mm to 40 mm in width, and 1 mm to 25 mm in thickness. The lower limits of length and width are preferably 10 mm or more, more preferably 20 mm or more. The upper limits are preferably 35 mm or less, more preferably 30 mm or less. The lower limit of thickness is preferably 2 mm or more, more preferably 5 mm or more. The upper limit is preferably 20 mm or less, more preferably 15 mm or less. By setting the size of the cushioning material 70 within this range, the transmission of movement of one piece to other pieces can be suppressed. The cushioning material 70 may be provided throughout the entire space between each piece, but from the viewpoint of suppressing the transmission of movement of the temporal region to the pieces, it is preferable to provide it in three locations: the forehead, the top of the head, and the back of the head.

[0149] As the material for the cushioning material 70, for example, an elastic material as exemplified in the support elastic member 2130 can be used. The elastic material consists of one or more selected from, for example, urethane sponge, polyethylene sponge (foamed polyethylene), polypropylene sponge, and rubber sponge (foamed rubber).

[0150] The physical properties of the cushioning material 70 can be suitably defined, for example, by a compression SS curve. Specifically, a push-pull gauge (Nidec-Shimpo Corporation Digital Force Gauge FGJN-2) with a 20 mm diameter disc-shaped pressure piece attached to a test piece of the cushioning material 70 with dimensions of 50 mm length x 50 mm width x 10 mm height is set on a measuring stand with a displacement meter, and when the gauge is lowered by 0.2 mm and the load is read after 20 seconds, and the SS curve is plotted, the deformation amount when a compressive load of 10 N is applied is 0.5 mm or more and 9.5 mm or less. The lower limit of the deformation amount is 1 mm or more, and more preferably 2 mm or more. The upper limit is preferably 8 mm or less, and more preferably 6 mm or less. By setting the characteristic range of the compression SS curve of the cushioning material 70 to the above values, the cushioning material 70 can appropriately absorb the force when a force is applied in the direction that brings each piece closer together.

[0151] Figure 22 shows examples of compression SS curves for four types of cushioning materials used as cushioning material 70. The following four types of materials, A to D, are shown as materials used for cushioning material 70. A: Foamed polyethylene (1) Manufactured by TRUSCO, product name "TPES" B: Foamed polyethylene (2) Manufactured by Sakai Chemical Industry Co., Ltd., product name "Minafoam" C: Low-rebound urethane Manufactured by ITEC Co., Ltd., product name "KTHU" D: Foamed rubber Hikari Co., Ltd., product name "KSEP" Materials A to D (and materials with similar physical properties) can be used as appropriate. Among the materials in the above range, assuming a head load of approximately 40 N, it is preferable to use a material in which the change is relatively suppressed rather than a material in which the change is too large. In the example in Figure 22, material A (foamed polyethylene (1)) is the most preferred. Material C (low-rebound urethane) has a large change, so it can be used when the head load is small, but it is preferable to avoid using it when the head load is large.

[0152] <Modifications> The embodiments of the present invention have been described above, but these are merely examples of the present invention, and various other configurations can be adopted. Figures 23 to 25 show modifications 1 to 3.

[0153] Figure 23 shows an example of the support 2110 in modification 1, which is divided into two parts. In this modification, the support 2110 is configured to be divided into a front piece 200 and a rear piece 300. That is, it is divided into two pieces, front and rear, by a dividing line (A) 401 that separates the front piece 200 and the rear piece 300 of the above embodiment, and the front piece 200 and the rear piece 300 are not divided any further.

[0154] Figure 24 shows an example of a modified example 2 in which the support 2110 is divided into four parts. In this modified example, only the third rear piece 330 is divided into three parts (first rear piece 310, second rear piece 320, and third rear piece 330) in the same way as the embodiment described above, while the front piece 200 is configured as a single, undivided piece.

[0155] Figure 25 shows an example of the support 2110 in six divisions in Modification 3. In this modification, only the front piece 200 is divided into five parts (first front piece 210, second front piece 220, third front piece 230, fourth front piece 240, fifth front piece 250) in the same way as the embodiment described above, while the rear piece 300 is a single, undivided piece.

[0156] [Third Embodiment] Next, a third embodiment will be described. One example of a problem that this embodiment aims to solve is to provide an electroencephalogram (EEG) measuring device that can reduce stress on the subject.

[0157] Figure 26 is a perspective view of the electroencephalogram (EEG) measuring device 10 according to this embodiment, worn on a subject. Figure 27 is a perspective view of the EEG measuring device 10 with the holding member 3140 inserted. The holding member 3140 will be described later. Figure 28 is a view of the EEG measuring device 10 according to this embodiment, seen from the inside. Figure 29 is an enlarged view of the dashed line area in Figure 28.

[0158] As shown in Figures 28 and 29, the electroencephalogram (EEG) measuring device 10 has a mounting portion 311 that is attached to the head, and the mounting portion 311 includes an outer casing 3100 and a cushion layer 3200. The cushion layer 3200 is provided inside the outer casing 3100. In other words, the cushion layer 3200 is held in place by the outer casing 3100.

[0159] The cushion layer 3200 includes a first portion 3210 and a second portion 3220 located on the outer edge 3100 side of the first portion 3210 in the thickness direction. The physical properties of the first portion 3210 and the second portion 3220 will be described later.

[0160] Furthermore, the electroencephalogram (EEG) measuring device 10 includes a plurality of second through-holes 3114. Electrodes 3120 are supported on the cushion layer 3200 side of the second through-holes 3114. The second through-holes 3114 are used to inject a measurement support fluid to reduce the resistance between the scalp and the electrodes 3120. The specific uses of the second through-holes 3114 will be described later.

[0161] Furthermore, as shown in Figures 26 and 27, the outer casing 3100 may include a plurality of separate parts that are joined together to form the outer casing. In this case, the shape of the outer casing 3100 can be matched to the shape of the subject's head, thereby improving the close contact of the electroencephalogram measuring device 10 with the subject's head.

[0162] The following describes the details of each component of the electroencephalogram (EEG) measurement device 10.

[0163] [Outer casing 3100] The outer casing 3100 is formed on the outside of the electroencephalogram measuring device 10. The outer casing 3100 forms the outer casing of the electroencephalogram measuring device 10 and has a cushion layer 3200 on its inner surface, i.e., the surface that comes into contact with the head.

[0164] Furthermore, the outer casing 3100 may include multiple separate parts that are joined together. For example, the outer casing 3100 may be divided into four parts, six parts, or eight parts. Even when the outer casing 3100 is divided into multiple parts, it does not deform except for the change in the distance between each part. However, the outer casing 3100 may be a single, integrated structure.

[0165] Furthermore, the material constituting the outer casing 3100 is not particularly limited as long as it has hardness sufficient to hold the cushion layer 3200, but as an example, it is constructed using resin.

[0166] Furthermore, the width W1 of the outer casing 3100, when viewed from the inside, from one temporal side to the other temporal side, and the width W2 from the frontal side to the occipital side, are set appropriately according to the subject.

[0167] Furthermore, the thickness T1 of the outer casing 3100 is not particularly limited, but is preferably, for example, 1 mm or more and 50 mm or less, and more preferably 1 mm or more and 10 mm or less. By having a thickness T1 of the outer casing 3100 that is greater than or equal to the lower limit, the outer casing 3100 can obtain sufficient strength. Also, by having a thickness T1 of the outer casing 3100 that is less than or equal to the upper limit, the stress on the subject wearing the electroencephalogram measuring device 10 can be reduced.

[0168] [Cushioning layer 3200] The cushioning layer 3200 is an elastic body formed on the inside of the outer casing 3100. The cushioning layer 3200 includes, in the thickness direction, a first portion 3210 and a second portion 3220 located on the outer casing 3100 side of the first portion 3210. The cushioning layer 3200 is the part that comes into contact with the subject's head when the subject wears the electroencephalogram measuring device 10.

[0169] Furthermore, the overall thickness T2 of the cushion layer 3200 is not particularly limited, but is preferably, for example, 1 mm or more and 45 mm or less, and more preferably 5 mm or more and 25 mm or less. By having the overall thickness T2 of the cushion layer 3200 within the above range, the stress on the subject wearing the electroencephalogram measuring device 10 can be reduced.

[0170] Next, the first part 3210 and the second part 3220 will be described. First, for the first part 3210, the amount of sinking measured by the following procedure 1 is preferably 1 mm or more and 9.5 mm or less, and more preferably 3 mm or more and 7 mm or less. Also, for the second part 3220, the amount of sinking measured by the following procedure 1 is preferably 0.5 mm or more and 5 mm or less, and more preferably 1 mm or more and 4 mm or less. (Procedure 1) 1) Prepare a sample of 50 x 50 x 10 mm (length x width x thickness) from the part to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Apply pressure to the prepared sample and displace it by 0.2 mm at a time, and read the load value after the displacement. 4) The total displacement when the load value first exceeds 10 N is taken as the amount of sinking (mm).

[0171] Furthermore, the amount of sinking of the first part 3210 measured by the procedure 2 below is preferably 0 mm or more and 6.5 mm or less, and more preferably 1 mm or more and 4.0 mm or less. Also, for example, if the amount of sinking of the first part 3210 measured by the procedure 1 above is 1 mm or more and 9.5 mm or less, it is preferable that the amount of sinking of the first part 3210 measured by the procedure 2 below be 0.5 mm or more and 6.5 mm or less. Also, for example, if the amount of sinking of the first part 3210 measured by the procedure 1 above is 3 mm or more and 7 mm or less, it is preferable that the amount of sinking of the first part 3210 measured by the procedure 2 below be 1.5 mm or more and 4.5 mm or less. (Procedure 2) 1) Prepare a 50 x 50 x 10 mm (length x width x thickness) sample from the part to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Apply pressure to the prepared sample, displacing it by 0.2 mm at a time, and read the load value after each displacement. 4) The total displacement when the load value first exceeds 1 N is defined as the sinking amount (mm).

[0172] Furthermore, the thickness T3 of the first portion 3210 is not particularly limited, but is preferably, for example, 1 mm or more and 20 mm or less, and more preferably 5 mm or more and 15 mm or less. Furthermore, the thickness T4 of the second portion 3220 is not particularly limited, but is preferably, for example, 5 mm or more and 25 mm or less, and more preferably 10 mm or more and 20 mm or less.

[0173] By having the amount of sinking and thickness T3 of the first portion 3210 within the above range, the adhesion of the cushion layer 3200 to the subject's head is improved, thereby reducing the subject's stress. Furthermore, by having the amount of sinking and thickness T4 of the second portion 3220 within the above range, the pressure applied from the outer casing 3100 to the subject's head is distributed, thereby reducing the subject's stress.

[0174] Furthermore, the cushion layer 3200 is made of an elastic material. The elastic material consists of one or more selected from, for example, urethane sponge, polyethylene sponge, polypropylene sponge, and silicone rubber sponge. The elastic material may be a foam, and examples of foams include low-rebound sponge and low-rebound elastic foam. In particular, the first portion 3210 preferably contains urethane sponge, and the second portion 3220 preferably contains silicone rubber sponge.

[0175] The elastic material may also consist of a sheet-like hollow member and a filler material that fills the hollow member. Examples of fillers include polyethylene pipes, polystyrene-containing foam beads, feathers, polyester cotton, microfibers, gel, etc.

[0176] The first portion 3210 and the second portion 3220 may be different parts of a single layer, i.e., a sheet. For example, the first portion 3210 and the second portion 3220 may be formed by adjusting the amount of sinking in each part in the thickness direction of the elastic material, for example, by varying the foaming ratio in the thickness direction of a single layer that will become the cushion layer 3200.

[0177] Alternatively, the first portion 3210 and the second portion 3220 may be different layers, i.e., sheets. For example, the cushion layer 3200 may have a two-layer structure, with the first layer being the first portion and the second layer being the second portion. In this case, the second layer (second portion) and the first layer (first portion) are stacked on the inner surface of the outer casing 3100 in that order. In this case, the cushion layer 3200 may also have a structure of three or more layers. For example, another elastic material layer may be placed between the first portion (first layer) and the second portion (second layer), or another elastic material layer may be placed between the outer casing 3100 and the second portion (second layer).

[0178] In all examples, it is preferable that the other elastic material layer is positioned on the outer casing 3100 side of the first portion (first layer). That is, it is preferable that the first portion 3210 is located on the innermost side of the cushion layer 3200. In this way, the first portion 3210 improves the holding ability of the cushion layer 3200 with respect to the shape of the head.

[0179] [How to use the electroencephalogram (EEG) measuring device 10] Next, how to use the EEG measuring device 10 will be explained using Figures 30 to 33. Figures 30 to 33 show an example of how to use the EEG measuring device 10, and are cross-sectional views of the second through-hole 3114 and the surrounding structure described above in each step. In the example of how to use the EEG measuring device 10 described below, an electrode support portion 3130 is formed inside the second through-hole 3114. The electrode support portion 3130 also has a first through-hole 3131, and an electrode 3120 is supported at the bottom of the first through-hole 3131.

[0180] First, the electroencephalogram (EEG) measuring device 10 is attached to the head. This brings the electrodes 3120 into contact with the scalp 22. Then, as shown in Figure 30, a holding member 3140 for injecting the measurement support fluid is inserted into the second through-hole 3114 and the first through-hole 3131 and attached to the electrodes 3120. As shown in the figure, the holding member 3140 has a fourth through-hole 3143 for injecting the measurement support fluid.

[0181] The retaining member 3140 is attached as follows, as an example. First, a screw groove is formed on the tip 141 side of the fourth through hole 3143 in the retaining member 3140. Then, the retaining member 3140 is fixed in place when the screw threads formed on the protrusion 3122 of the electrode 3120 engage with the screw groove in the fourth through hole 3143.

[0182] Next, as shown in Figure 31, the holding member 3140 is moved to part the hair and bring the electrode 3120 into contact with the scalp 22. When the holding member 3140 is holding the electrode 3120, the angle of the holding member 3140 with respect to the outer casing 3100 is variable. In addition, the electrode support portion 3130 is elastic, and the length of the portion of the holding member 3140 that is exposed to the outside of the outer casing 3100 is variable depending on the degree of contraction of the electrode support portion 3130. After the electroencephalogram (EEG) measuring device 10 is attached to the head, for example, the operator of the EEG measuring device 10 moves the holding member 3140 with respect to the outer casing 3100. Specifically, the operator can move the holding member 3140 so as to change the angle of the holding member 3140 with respect to the outer casing 3100, that is, the angle with respect to the scalp 22. In particular, it is effective to move the holding member 3140 so as to pivot the other end 142 of the holding member 3140 around the electrode 3120. The operator can also push and pull the holding member 3140 against the outer casing 3100, that is, against the scalp 22.

[0183] Next, as shown in Figure 32, the tube 151 is inserted into the fourth through-hole 3143 and the third through-hole 121. By flowing the measurement aid liquid through the tube 151, the contact area between the electrode 3120 and the scalp 22 can be wetted with the measurement aid liquid, thereby reducing the resistance value of the contact area.

[0184] Furthermore, as shown in Figure 32, the tube 151 may be used together with an injection member 152 for facilitating the injection of a measurement aid into the tube 151, and a connecting member 153 for stably fixing the tube 151.

[0185] Subsequently, as shown in Figure 33, the holding member 3140 is removed and electroencephalogram (EEG) measurement is performed.

[0186] As described above, the electroencephalogram (EEG) measuring device 10 according to this embodiment improves the adhesion of the cushion layer 3200 to the subject's head and disperses the pressure applied to the subject's head from the outer casing 3100, thereby reducing stress on the subject when wearing the EEG measuring device 10. Therefore, it is possible to suppress the subject from feeling stressed during EEG measurement.

[0187] Next, we will explain the electrical connections during electroencephalogram (EEG) measurement.

[0188] As shown in the figure, the electroencephalogram measuring device 10 further comprises a conductive part 3164, wiring 3163, circuit 3162, and wiring 3165. The wiring 3163 and circuit 3162 are fixed to an elastic member together with the conductive part 3164.

[0189] When the scalp comes into contact with the electrode 3120, electrical signals from the scalp are sent to an external signal processing unit via the conductive part 3164, wiring 3163, circuit 3162, and wiring 3165. Circuit 3162 includes, for example, a preamplifier that amplifies the electrical signals from the electrode 3120. The signal processing unit acquires electrical signals from multiple electrodes 3120 (from circuit 162). The signal processing unit performs processing such as amplification of the electroencephalogram (EEG) electrical signals, analog-to-digital conversion, and frequency filtering. The signal processing unit can also record the EEG signal data obtained through these processes in a recording unit provided within the signal processing unit. Furthermore, the signal processing unit can transmit the EEG signal data to an external device via wired or wireless communication. The signal processing unit is implemented, for example, using an integrated circuit.

[0190] Thus, the electroencephalogram (EEG) measuring device 10 according to this embodiment can reduce stress on the subject during EEG measurement.

[0191] [Fourth Embodiment] Next, a fourth embodiment will be described. One example of a problem that this embodiment aims to solve is to suppress the burden on the subject's body when the subject is in a sleeping position during electroencephalogram measurement using a helmet-type electroencephalogram measurement device.

[0192] Figure 34 is a perspective view showing an overview of the support device 410 according to this embodiment. The support device 410 supports the head and cervical spine of a person wearing a headset 420 in a sleeping position. Figure 35 shows the support device 410 when supporting a subject in a sleeping position. The headset 420 is used, for example, in an electroencephalogram (EEG) measuring device.

[0193] First, as shown in Figures 34 and 35, the support member 410 has a first region 4110, a second region 4120, and a third region 4130 arranged in that order.

[0194] As shown in Figure 35, the first region 4110 is a region for supporting at least a portion of the subject's cervical spine, the second region 4120 is a region for supporting at least a portion of the occipital region of the headset 420 worn by the subject, and the third region 4130 is a region for supporting at least a portion of the occipital region of the headset 420 worn by the subject. However, each of the above regions may also include regions that support parts other than those described above, and regions that do not support (do not touch) the subject or the headset 420. Furthermore, the occipital region of the headset 420 is, for example, the portion of the headset 420 that is located on the inside of the headset 420 and includes a point on the outside of the headset 420 that is positioned vertically toward the outside of the headset 420 from the point that contacts the subject's occipital protuberance. For example, it is the region within 50 mm from the above point. Furthermore, the occipital region of the headset 420 is, for example, the portion that includes the highest point when the headset 420 is placed in a horizontal position with the side of the headset 420 that contacts the subject facing downwards. For example, the area within 20 mm from the above point is the top of the head of the headset 420.

[0195] In a top view, the lateral width W1 of the support 410 is not particularly limited, but is, for example, 400 mm or more and 750 mm or less. The vertical width W2 of the support 410 is not particularly limited, but is, for example, 200 mm or more and 450 mm or less. However, these widths are not limited to these values.

[0196] Furthermore, the lateral width W3 of the first region 4110, the second region 4120, and the third region 4130 is not particularly limited, but for example, it is between 100 mm and 300 mm. Also, the lateral width W4 of the fourth region, which will be described later, is not particularly limited, but for example, it is between 100 mm and 300 mm each. Furthermore, the vertical width W5 of the first region 4110 and the third region 4130 is not particularly limited, but for example, it is between 20 mm and 150 mm. Furthermore, the vertical width W6 of the second region 4120 is not particularly limited, but for example, it is between 20 mm and 200 mm. Furthermore, the vertical width of the fourth region 140 is not particularly limited, but for example, it is almost equal to the width W2.

[0197] Furthermore, the thicknesses of the first region 4110, the second region 4120, and the third region 4130 are, for example, 10 mm or more and 200 mm or less. However, the thicknesses of the first region 4110, the second region 4120, and the third region 4130 may be different.

[0198] When the headset and the subject's cervical spine are not being supported, the upper surfaces of the first region 4110, the second region 4120, and the third region 4130, in other words, the surfaces that come into contact with the subject, may be horizontal or inclined.

[0199] Furthermore, when the headset 420 is attached to the support device 410 and the subject is in a sleeping position, it is preferable that the first height T1 of the highest part of the first region 4110 that supports the cervical spine is higher than the second height T2 of the lowest part of the second region 4120 that supports the headset, and the second height T2 is lower than the third height T3 of the highest part of the third region 4130 that supports the headset. In this way, the subject's cervical spine is in contact with and supported by the first region 4110, while the back of the subject's head is sufficiently lowered. Also, since the top of the subject's head is at a relatively high position, the angle of the subject's face becomes an angle that is less burdensome for the subject. As a result, the subject can sleep in a less burdensome position.

[0200] More specifically, the difference between the first height T1 and the second height T2 is preferably 0 cm or more and 10 cm or less. Furthermore, the difference between the second height T2 and the third height T3 is preferably 0 cm or more and 12 cm or less, and more preferably 2 cm or more and 8 cm or less.

[0201] Alternatively, the support 410 has a first region 4110, a second region 4120, and a third region 4130, each having at least one elastic member, such as a sheet-like member, and in at least one of the first region 4110, the second region 4120, and the third region 4130, the elastic member can be adjusted by replacing, adding, or removing at least one of these.

[0202] The elastic member may have a shape that spans multiple regions, or it may have a shape that is positioned only in a specific region. Specific examples of these will be described later.

[0203] Furthermore, with the adjustments described above, the difference between the first height T1 and the second height T2 may be between 0 cm and 10 cm, and the difference between the second height T2 and the third height T3 may be between 0 cm and 12 cm.

[0204] By ensuring that the difference between the first height T1 and the second height T2, and the difference between the second height T2 and the third height T3 are within the above range, it is possible to suppress the formation of a gap between the subject's cervical spine and the first region 4110, thereby reducing the load applied to the subject's cervical spine.

[0205] The elastic member described above includes, for example, one or more combinations selected from urethane, polyethylene, polypropylene, ethylene-propylene copolymer, silicone rubber, etc. The elastic member is, for example, a sheet-like member made of the above materials. More specifically, the elastic member may be a sheet-like material made from a low-rebound urethane sponge such as water-stopping low-rebound polyurethane, polyethylene foam, ethylene-propylene rubber, or other foam.

[0206] Alternatively, the elastic member may consist of a hollow member and a filler material that fills the hollow member. The filler material may consist of, for example, the materials mentioned above. More specifically, the filler material may be polyethylene pipe or polystyrene-containing foamed beads. The filler material may also be feathers, polyester cotton, microfiber, gel, etc.

[0207] Furthermore, the first region 4110, the second region 4120, and the third region 4130 each have at least one elastic member, and it is preferable that the deformation amount of the elastic member in at least one of the first region 4110, the second region 4120, and the third region 4130, as measured by the following procedure 1, is 0.5 mm or more and 9.5 mm or less. It is more preferable that the above deformation amount is 1.0 mm or more and 9.5 mm or less. Furthermore, the first region 4110 has at least one elastic member, and it is preferable that the deformation amount of this elastic member, as measured by the following procedure 1, is 4.0 mm or more and 9.5 mm or less. In procedure 1, the load measurement is repeated while increasing the deformation amount, and it is preferable that the pressure piece is lowered until the load exceeds 10 N. (Procedure 1) Obtain a test specimen with dimensions of 50 mm (length) x 50 mm (width) x 10 mm (height). Attach a disc-shaped pressure piece with a diameter of 20 mm to the test specimen. Attach a push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) to the pressure piece. Set the test specimen on a measuring stand equipped with a displacement meter. Set the pressure piece on an elastic member. Lower the pressure piece by 0.2 mm and repeat the process of measuring the load and deformation after 20 seconds using the push-pull gauge and displacement meter, plotting the SS curve and measuring the deformation when the load is 10 N.

[0208] Furthermore, the first region 4110, the second region 4120, and the third region 4130 each have at least one elastic member, and the elastic member in at least one of the first region 4110, the second region 4120, and the third region 4130 includes a structure in which a filler material is filled into a hollow member, and it is preferable that the deformation rate measured by the following procedure 2 is 0.05 or more and 0.95 or less. Also, the first region 4110 has at least one elastic member, and this elastic member includes a structure in which a filler material is filled into a hollow member, and it is preferable that the deformation rate measured by the following procedure 2 is 0.45 or more and 0.95 or less. Note that the height of the elastic member in procedure 2 is measured, for example, from the distance between the pressure piece and the measuring stand after setting the pressure piece on the elastic member and before applying pressure. Also, in procedure 2, the load measurement is repeated while increasing the amount of deformation, and it is preferable that the pressure piece is lowered until the load exceeds 10 N. (Procedure 2) A disc-shaped pressure piece with a diameter of 20 mm is attached to the elastic member, a push-pull gauge (Nidec-Shimpo Corporation Digital Force Gauge FGJN-2) is attached to the pressure piece, the elastic member is set on a measuring stand equipped with a displacement meter, the pressure piece is set on the elastic member, the pressure piece is lowered by 0.2 mm, and the load and deformation after 20 seconds are measured using the push-pull gauge and displacement meter. This process is repeated, and the SS curve is plotted to measure the deformation ε when a load of 10 N is applied. Then, the deformation ratio is calculated as ε / T from the height T of the elastic member before pressurization and the deformation ε.

[0209] By ensuring that the amount and rate of deformation measured in step 1 or step 2 above are within the above range, it is possible to prevent a gap from forming between the subject, who is wearing the headset 420 and in a sleeping position, and the support device 410.

[0210] Furthermore, as shown in Figure 34, it is preferable that the support 410 has a fourth region 140 on both sides of the first region 4110, the second region 4120, and the third region 4130 in a direction perpendicular to the direction in which the first region 4110, the second region 4120, and the third region 4130 are aligned and in the thickness direction. The presence of the fourth region 140 in the support 410 makes it easier for the subject to turn over in their sleep from a state in which their head and cervical spine are supported by the first region 4110, the second region 4120, and the third region 4130.

[0211] Furthermore, the upper surface of the fourth region 140 may be horizontal or inclined. The fourth region 140 may become thinner, for example, as it moves outward, that is, as it moves away from the first region 4110, the second region 4120, and the third region 4130.

[0212] Furthermore, it is preferable that the difference between the lowest point height of the second region 4120 when a load of 40N is applied to the second region 4120 and the lowest point height of the fourth region 140 when a load of 40N is applied to the fourth region 140 is between 0 mm and 50 mm. This reduces the difference between the lowest point height of the second region 4120 and the lowest point height of the fourth region 140 when the subject is lying supine in the second region 4120. As a result, the barrier to turning over from the second region 4120 to the fourth region 140 is reduced, making it easier for the subject to turn over. The above height measurement can be performed, for example, by adjusting the weight of a hemispherical bowl with a diameter of φ120 mm to 40N and measuring the height after 20 seconds of placing it on the second region 4120 and the fourth region 140. For example, a hemispherical bowl with a diameter of φ120 mm made of SUS304 can be used as the hemispherical bowl.

[0213] [Example of the configuration of the support 410] Next, a specific example of the configuration of the support 410 according to this embodiment will be shown. The support 410 may be a multilayer structure formed by stacking multiple sheet-like elastic members. Figures 36 to 41 illustrate an example of the shape of each sheet-like member. In the following description, the support 410 has a horizontal width W1 of 500 mm and a vertical width W2 of 250 mm. The horizontal width W3 of the first region 4110, the second region 4120, and the third region 4130 is 200 mm. The horizontal width W4 of the fourth region is 150 mm. The vertical width W5 of the first region 4110 and the third region 4130 is 50 mm. The vertical width W6 of the second region 4120 is 150 mm. The vertical width of the fourth region 140 is equal to the width W2, which is 250 mm. The support member 410 is formed by overlapping the members shown in Figures 36 to 41.

[0214] Figure 36 shows the first sheet member 10A, which forms the bottommost layer, or first layer, of the support 410. The first sheet member 10A is entirely made of a sound-absorbing sheet 11A. The thickness of the first sheet member 10A is 10 mm.

[0215] Figure 37 shows the second sheet member 10B that forms the second layer of the support 410. The second sheet member 10B has sub-members 11B and 12B. Sub-member 11B corresponds to the first region 4110, the third region 4130, and the fourth region 140, and is made of foamed polyethylene. Sub-member 12B corresponds to the region inside region 11B, i.e., the second region 4120, and is made of watertight, low-rebound polyurethane. The thickness of the second sheet member 10B is 10 mm.

[0216] Figure 38 shows the third sheet member 10C that forms the third layer of the support 410. The third sheet member 10C has sub-members 11C and 12C. Sub-member 11C is a U-shaped region corresponding to the first region 4110 and the fourth region 140, and is made of foamed polyethylene. Sub-member 12C corresponds to the second region 4120 and the third region 4130, and is made of water-sealing low-rebound polyurethane. The thickness of the third sheet member 10C is 10 mm.

[0217] Figure 39 shows the fourth sheet member 10D that forms the fourth layer of the support 410. The fourth sheet member 10D is a layer formed only in the regions corresponding to the first region 4110 and the third region 4130, and has separate sub-members 11D and 12D. Sub-member 11D corresponds to the first region 4110, and sub-member 12D corresponds to the third region 4130. Both sub-members 11D and 12D are made of watertight, low-rebound polyurethane. The thickness of the fourth sheet member 10D is 10 mm.

[0218] Figure 40 shows the fifth sheet member 10E that forms the fifth layer of the support 410. The fifth sheet member 10E is a layer formed only in the region corresponding to the third region 4130 and is made of watertight, low-rebound polyurethane. The thickness of the fifth layer is 10 mm.

[0219] Figure 41 shows the sixth sheet member 10F that forms the sixth layer of the support 410. The sixth sheet member 10F is entirely composed of a sound-absorbing sheet 11F. The thickness of the sixth layer is 10 mm.

[0220] The support 410 according to this embodiment can be manufactured by stacking the first to sixth layers described above in this order from bottom to top.

[0221] In electroencephalogram (EEG) measurements using a helmet-type EEG device, when a subject goes to sleep, they rest their cervical spine and head on the support 410. As a result, the second region 4120 sinks down, causing the back of the subject's head to drop. The first region 4110 then contacts and supports the subject's cervical spine. Furthermore, the third region 4130 supports the top of the subject's head, adjusting the angle of the subject's face to an angle that is less strenuous for the subject. Thus, the subject achieves a less strenuous sleeping posture.

[0222] Thus, according to the support device 410 of this embodiment, when measuring electroencephalograms using a helmet-type electroencephalogram measuring device, both the head and cervical spine of the subject in a sleeping position can be supported, thereby reducing stress on the subject when they are in a sleeping position.

[0223] The embodiments of the present invention have been described above with reference to the drawings, but these are merely examples of the present invention, and various other configurations can also be adopted.

[0224] The support 410 may have, for example, an elastic layer on its uppermost layer that covers the first region 4110, the second region 4120, the third region 4130, and the fourth region 140. The elastic layer is, for example, a sheet-like member containing the material that constitutes the elastic member described above. In this case, the height difference in each region can be made into a gentle slope. This makes it easier for the subject to turn over in bed.

[0225] Furthermore, the support 410 may further have, for example, a height adjustment member in the bottom or top layer, shaped to correspond to the entirety of the first region 4110, the second region 4120, the third region 4130, and the fourth region 140. The height adjustment member may include, for example, the material that constitutes the elastic member described above. The thickness of the height adjustment member is, for example, 10 mm to 30 mm. In this case, for example, the height of the entirety of the first region 4110, the second region 4120, the third region 4130, and the fourth region 140 can be adjusted to an appropriate value for each subject. There may also be multiple height adjustment members. For example, the support 410 may have a relatively hard height adjustment member in the bottom layer and a soft height adjustment member in the top layer. This allows for adjustment of the height of the support 410 for each subject and improves the feel against the skin for each subject.

[0226] Furthermore, the support 410 according to this embodiment may be integrated with the headset 420. For example, the portion of the headset 420 corresponding to the back of the head and at least a part of the second region 4120 of the support 410 may be detachable or joined together.

[0227] Figure 42 shows an example of a support 410 integrated with a headset 420. In the example shown in Figure 42, the support 410 is wrapped around the headset 420 by a belt 430. From the viewpoint of making it easier for the subject to turn over in bed, it is preferable that the support 410 covers up to the side of the head of the headset 420. For this reason, in this configuration, the lateral width W1 of the support 410 is preferably 400 mm or more. Also, from the viewpoint of not obstructing the subject's field of vision, in this configuration, the lateral width W1 of the support 410 is preferably 600 mm or less. Also, in this configuration, the vertical width W2 of the support 410 is preferably 150 mm or more and 350 mm or less.

[0228] Furthermore, the means by which the support 410 is integrated with the headset 420 is not limited to the belt 430. For example, the support 410 and the headset 420 may be integrated by being fixed together, for example, by Velcro®, or by being fixed together by magnets.

[0229] In a configuration where the support device 410 is integrated with the headset 420, the support device 410 can support the subject's cervical spine and head even when the subject is in a position other than a sleeping position.

[0230] Furthermore, the support 410 according to this embodiment may be integrated with the body support section 440. The body support section 440 supports the body of the subject in a sleeping position and is, for example, a typical bed or reclining seat.

[0231] Figure 43 shows an example of a support device 410 integrated with a body support unit 440. In Figure 43, the body support unit 440 is a bed. The support device 410 is integrated with the body support unit 440 by being covered together with the body support unit 440 by a cover unit 450. The cover unit 450 is a general-purpose cloth such as a sheet. However, the method of integrating the support device 410 with the body support unit 440 is not limited to the cover unit 450. For example, the contact surface between the support device 410 and the body support unit 440 may be fixed. As a method of fixing the contact surface, a contact layer may be formed on the contact surface and fixed, or magnets or Velcro (registered trademark) may be provided on the contact surface and fixed therein.

[0232] In a configuration where the support device 410 is integrated with the body support unit 440, the support device 410 can be fixed in the most appropriate position when the subject is in a sleeping position.

[0233] This application claims priority based on Japanese Patent Applications No. 2024-186102, No. 2024-186113, No. 2024-186163, and No. 2024-186167, filed on 22 October 2024, and incorporates all of their disclosures herein.

[0234] 151 Tube 152 Injection member 153 Connecting member 440 Body support part 450 Cover part 1101, 2120 Electrode unit 1110, 2110 Support body 1111, 2111 Base body 1112, 2112 Covering member 1114, 2114 Support body through hole 1120 EEG electrode member, electrode body 1121 Electrode through hole 1122, 1181, 2122, 2181 Base part 1122a Through hole 1123, 1182, 2182, 3122 Protrusion 1123a, 1124a, 2123a, 2124a, 3210 First part 1123b, 1164, 2123b, 2164, 3164 Conductive part 1123c, 1124b, 2123c, 2124b, 3220 Second part 1124, 2124 Conductive member 1124c Main surface 1125, 2125 Electrode body 1129 Cover 1130 Elastic member, second member 1131, 2131 Elastic member recess 1132, 1183, 2132, 2183 Bottom surface 1135, 2135 Elastic material through hole 1137 Electrode placement section 1160 Signal processing section 1161 Wiring for reference potential measurement 1162, 2162, 3162 Circuit 1170, 430 Belt 1180, 2180 Holding section, electrode support member 1184, 2128, 2133, 2184 Top surface 1185, 2185 First housing section 1186, 2186 Second housing section 1188 Retaining recess 1189 Retaining through hole 1190 Adjustment member mounting section 1200 Adjustment member, first member 2123 Electrode protrusion 2126 Protrusion forming surface 2130 Support elastic member 3100 Outer casing 3114 Second through hole 3120 Electrode 3121 Third through hole 3130 Electrode support section 3131 First through hole 3140 Retaining member 3141 Tip 3142 Other end 3143 Fourth through hole 3200 Cushion layer 4110 First region 4120 Second region 4130 Third region 4140 Fourth region

Claims

A support that is attached to the head, An electrode unit held in the support, It has, The support has a through hole in which at least a portion of the electrode unit is disposed, The electrode unit is The electrode body that comes into contact with the scalp, An electrode support member that supports the electrode body and is attached to the through hole, A first electrode positioning member is attached to the electrode support member or the electrode body, and at least one end of the member is capable of passing through the through hole and being located outside the outer material of the support; An electroencephalogram (EEG) measuring device. 　 The electroencephalogram measuring device according to claim 1, further comprising a plurality of the first members attached to different locations on the electrode support member. 　 The electroencephalogram measuring device according to claim 1 or 2, further comprising an elastically deformable second member provided on the head-side surface of the support and pressing against the edge of the upper surface of the electrode support member. 　 The electroencephalogram measuring device according to claim 1 or 2, wherein the first member is deformable. 　 The electroencephalogram measuring device according to claim 4, wherein the first member is a string. 　 A support structure, divided into multiple pieces, that is attached to the head, An electrode unit held in the support, It has, The plurality of aforementioned pieces include a front piece on the forehead side and a rear piece on the back of the head side. An electroencephalogram (EEG) measuring device in which the dividing line (A) separating the front piece and the rear piece passes between Cz and Pz, T3 and T5, C3 and P3, T4 and T6, and C4 and P4 respectively in the international 10-20 electrode placement method. 　 The aforementioned rear piece comprises at least a first rear piece and a second rear piece. The electroencephalogram measuring device according to claim 6, wherein the dividing line (B) separating the first posterior piece and the second posterior piece passes between O1 and O2 in the international 10-20 electrode arrangement. 　 The aforementioned rear piece has a third rear piece in addition to the first rear piece and the second rear piece. The first rear piece has O1, T3 and P3 in the international 10-20 electrode arrangement method, The second rear piece has O2, T6 and P4 in the international 10-20 electrode arrangement method, The third rear piece has Pz in the international 10-20 electrode arrangement method. The electroencephalogram measuring device according to claim 7. 　 The aforementioned front piece is divided into at least three pieces, The three pieces mentioned above are, A first forward piece containing Cz in the international 10-20 electrode arrangement method, The second forward piece including T3 in the international 10-20 electrode arrangement method, The third forward piece including T4 in the international 10-20 electrode arrangement method, The electroencephalogram measuring device according to claim 6, having the following features. 　 The aforementioned front piece is divided into at least five pieces, The five pieces include the first front piece, the second front piece, and the third front piece, as well as a fourth front piece and a fifth front piece. The fourth front piece is provided between the first front piece and the second front piece and includes C3 and F3 in the international 10-20 electrode arrangement method. The fifth front piece is provided between the first front piece and the third front piece and includes C4 and F4 in the international 10-20 electrode arrangement method. The electroencephalogram measuring device according to claim 9. 　 An electroencephalogram measuring device having a part that is attached to the head, The mounting portion comprises an outer casing and a cushion layer attached to the inner surface of the outer casing. The cushion layer has, in the thickness direction, a first portion and a second portion located closer to the outer casing than the first portion. The measurement is performed according to the following procedure 1: The amount of sinking of the first part is 1 mm or more and 9.5 mm or less. An electroencephalogram (EEG) measuring device in which the amount of sinking of the second part is 0.5 mm or more and 5 mm or less. (Step 1) 1) Prepare a sample measuring 50 x 50 x 10 mm (length x width x thickness) from the area to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Apply pressure to the prepared sample, displace it in 0.2 mm increments, and read the load value after the displacement. 4) The total displacement when the load value first exceeds 10 N shall be defined as the sinking amount (mm). 　 The thickness of the first portion is 1 mm or more and 20 mm or less. The electroencephalogram measuring device according to claim 11. 　 The thickness of the second portion is 5 mm or more and 25 mm or less. The electroencephalogram measuring device according to claim 11 or 12. 　 The first part is located on the innermost side of the cushion layer, The electroencephalogram measuring device according to claim 11 or 12. 　 The first part is the first layer, and the second part is the second layer. The inner surface of the outer casing is made of the second layer and the first layer stacked in that order. The electroencephalogram measuring device according to claim 11 or 12. 　 The thickness of the cushion layer is 1 mm or more and 45 mm or less. The electroencephalogram measuring device according to claim 11 or 12. 　 The amount of sinking of the first part, as measured by the following procedure 2, is 0 mm or more and 6.5 mm or less. The electroencephalogram measuring device according to claim 11 or 12. (Step 2) 1) Prepare a sample measuring 50 x 50 x 10 mm (length x width x thickness) from the area to be measured. 2) Prepare a push-pull gauge with a Φ20 mm disc-shaped pressure piece attached. 3) Apply pressure to the prepared sample, displace it in 0.2 mm increments, and read the load value after the displacement. 4) The total displacement when the load value first exceeds 1 N is defined as the sinking amount (mm). 　 A support device that holds the head and cervical spine of a person wearing a headset while they are sleeping. 　 A first region for supporting at least a portion of the cervical vertebrae of the person, A second region for supporting at least a portion of the back of the head of the headset, A third region for supporting at least a portion of the top of the head of the headset, The support device according to claim 18, wherein the elements are arranged in this order. 　 In a sleeping position, with the head and cervical spine of the person being supported, The first height of the highest part of the first region that supports the cervical vertebrae is higher than the second height of the lowest part of the second region that supports the headset. The support according to claim 19, wherein the second height is lower than the third height of the highest part of the third region that supports the headset. 　 The difference between the first height and the second height is 0 cm or more and 10 cm or less. The support according to claim 20, wherein the difference between the second height and the third height is 0 cm or more and 12 cm or less. 　 The first region, the second region, and the third region each have at least one elastic member. In at least one of the first region, the second region, and the third region, the elastic member can be adjusted by at least one of replacement, addition, and deletion. The support according to claim 20, wherein, as a result of the adjustment, the difference between the first height and the second height becomes 0 cm or more and 10 cm or less, and the difference between the second height and the third height becomes 0 cm or more and 12 cm or less. 　 The support according to claim 19, wherein the first region, the second region, and the third region each have at least one elastic member, and the amount of deformation of the elastic member in at least one of the first region, the second region, and the third region, as measured by the following procedure 1, is 0.5 mm or more and 9.5 mm or less. (Step 1) A test specimen with dimensions of 50 mm (length) x 50 mm (width) x 10 mm (height) is obtained. A disc-shaped pressure piece with a diameter of 20 mm is attached to the test specimen. A push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece. The test specimen is placed on a measuring stand equipped with a displacement meter, the pressure piece is placed on the elastic member, and the load and deformation amount after 20 seconds are measured using the push-pull gauge and the displacement meter. This process is repeated, and an SS curve is plotted to determine the deformation amount at a load of 10 N. 　 The support according to claim 19, wherein the first region has at least one elastic member, and the amount of deformation of the elastic member, as measured by the following procedure 1, is 4.0 mm or more and 9.5 mm or less. (Step 1) A test specimen with dimensions of 50 mm (length) x 50 mm (width) x 10 mm (height) is obtained. A disc-shaped pressure piece with a diameter of 20 mm is attached to the test specimen. A push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece. The test specimen is placed on a measuring stand equipped with a displacement meter, the pressure piece is placed on the elastic member, and the load and deformation amount after 20 seconds are measured using the push-pull gauge and the displacement meter. This process is repeated, and an SS curve is plotted to determine the deformation amount at a load of 10 N. 　 The support according to claim 19, wherein the first region, the second region, and the third region each have at least one elastic member, and the elastic member having at least one of the first region, the second region, and the third region includes a structure in which a filler material is filled into a hollow member, and the deformation rate measured by the following procedure 2 is 0.05 or more and 0.95 or less. (Step 2) A disc-shaped pressure piece with a diameter of 20 mm is attached to the elastic member, a push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece, the elastic member is set on a measuring stand equipped with a displacement meter, the pressure piece is set on the elastic member, the pressure piece is lowered by 0.2 mm, and the load and deformation after 20 seconds are measured using the push-pull gauge and the displacement meter. This process is repeated, and an SS curve is plotted to measure the deformation ε when a load of 10 N is applied. The deformation ratio is then calculated as ε / T, which is derived from the height T of the elastic member before pressurization and the deformation ε. 　 The support according to claim 19, wherein the first region has at least one elastic member, the elastic member having a structure in which a filler material is filled into a hollow member, and the deformation rate measured by the following procedure 2 is 0.45 or more and 0.95 or less. (Step 2) A disc-shaped pressure piece with a diameter of 20 mm is attached to the elastic member, a push-pull gauge (Digital Force Gauge FGJN-2 manufactured by Nidec-Shimpo Corporation) is attached to the pressure piece, the elastic member is set on a measuring stand equipped with a displacement meter, the pressure piece is set on the elastic member, the pressure piece is lowered by 0.2 mm, and the load and deformation after 20 seconds are measured using the push-pull gauge and the displacement meter. This process is repeated, and an SS curve is plotted to measure the deformation ε when a load of 10 N is applied. The deformation ratio is then calculated as ε / T, which is derived from the height T of the elastic member before pressurization and the deformation ε. 　 A fourth region is located on both sides of the first, second, and third regions in a direction perpendicular to the direction in which the first, second, and third regions are aligned and to the thickness direction. The support device according to claim 19. 　 The difference between the height of the lowest point in the second region when a load of 40 N is applied to the second region and the height of the lowest point in the fourth region when a load of 40 N is applied to the fourth region is 0 mm or more and 50 mm or less. The support device according to claim 27. 　 Having an elastic layer covering the first region, the second region, the third region, and the fourth region, The support device according to claim 27 or 28. 　 The system further includes a height adjustment member for adjusting the height of the entire first, second, third, and fourth region, The support device according to claim 27. 　 Integrated with the aforementioned headset, The support device according to claim 18 or 19. 　 A body support part that supports a person in the aforementioned sleeping position, further including The support device according to claim 18 or 19. 　 The aforementioned headset is used for electroencephalogram (EEG) measurement. The support device according to claim 18 or 19.

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