Real-time monitoring system and method for inhibiting evolution of arsine in copper electrowinning arsenic removal process

Abstract

A real-time monitoring system and method for inhibiting the evolution of arsine in a copper electrowinning arsenic removal process. The system comprises a PLC control module (1), a primary mother solution real-time monitoring module (2), an arsenic removal circulating solution real-time monitoring module (3), a arsenic removal post-solution real-time monitoring module (4) and a precise regulation and control module (5). By means of using copper-arsenic electrodeposition and concentration competition difference and using a arsenic removal circulating solution copper-arsenic concentration difference and limit value as constraint indicators, the PLC control module (1) controls the monitoring modules to acquire in real time the copper-arsenic concentrations in a primary mother solution, in a arsenic removal circulating solution and in a arsenic removal post-solution, calculates and analyzes a requirement for the copper-arsenic ion concentration in the arsenic removal circulating solution, and precisely regulates and controls the amount of a high-concentration copper-arsenic solution added to the primary mother solution so as to ensure that, after the arsenic removal circulating solution is periodically returned, the copper-arsenic ion concentration in the arsenic removal circulating solution is always in the optimal electrowinning arsenic removal range, improving arsenic deposition and reducing copper deposition, inhibiting the evolution of highly toxic gas arsine, precisely regulating and controlling arsenic removal post-solution diversion, and meeting enterprise safety production requirements while achieving efficient arsenic removal.

Description

Real-time monitoring system and method for inhibiting arsine evolution during copper electrodeposition arsenic removal process Technical Field

[0001] This invention belongs to the field of clean production technology for electrolyte purification systems in the copper smelting industry, specifically relating to a real-time monitoring system and method for inhibiting arsine evolution during the copper electrowinning arsenic removal process. Background Technology

[0002] Electrolytic arsenic removal in copper electrolytic refining is a commonly used electrolyte purification method in the industry. Because copper and arsenic have similar electrode potentials, co-deposition is highly likely. If the copper ion concentration is too low, the highly toxic gas arsine is easily generated during arsenic discharge, making safe production impossible. If the copper ion concentration is too high, copper co-deposition is likely during arsenic discharge, leading to resource loss. To ensure a certain concentration of copper and arsenic ions in the system, enterprises need to monitor and analyze three stages: the primary mother liquor, the arsenic removal circulating liquid, and the post-arsenic removal liquid. By adjusting the dosage of the high-concentration primary mother liquor, the concentration of copper and arsenic ions during electrolytic arsenic removal is ensured to be within the optimal arsenic removal range (arsenic ion concentration must always be greater than copper ion concentration; copper ion concentration can fluctuate in the range of 2-5 g / L, and arsenic ion concentration can fluctuate in the range of 3-10 g / L). The copper ion concentration in the post-arsenic removal liquid is controlled at approximately ≤0.5 g / L, and the arsenic ion concentration is controlled at approximately ≤2.0 g / L. However, the current testing and analysis time for the primary mother liquor, arsenic removal circulating liquid, and post-arsenic removal liquid in the enterprise laboratory of the electrowinning arsenic removal unit is as long as 2-4 hours. Meanwhile, the concentration of copper and arsenic ions in the solution during the electrolysis process is constantly changing. The existing testing and analysis frequency cannot meet the requirements of dynamic control of the electrolysis process. As a result, when the copper concentration is too low during the electrowinning process, arsine is released, and when the copper concentration is too high, copper co-deposition occurs. Arsenic hazardous waste increases the loss of copper resources, which not only increases the production cost of enterprises, but also creates a series of safety and environmental hazards.

[0003] The copper smelting industry urgently needs to develop a real-time monitoring system and method for suppressing arsine evolution during the copper electrowinning arsenic removal process. This system would precisely control the dosage of high-concentration primary mother liquor by real-time monitoring of the target ion concentrations in the primary mother liquor, the arsenic removal circulating liquid, and the post-arsenic removal liquid. This ensures that the copper and arsenic ion concentrations remain within the optimal range during the electrowinning arsenic removal process. The goal is to suppress arsine evolution during deposition, improve the deposition efficiency of the arsenic removal slag, and reduce the residual copper concentration in the post-arsenic removal liquid, thus meeting the safety and production requirements of enterprises. Summary of the Invention

[0004] This invention addresses the problems of the current copper electrolytic refining process for arsenic removal, namely, the inability to dynamically control the electrolytic process, the precipitation of arsine when the copper concentration is too low, and the co-deposition of copper when the copper concentration is too high, resulting in increased arsenic waste and copper resource loss. It proposes a real-time monitoring system and method for suppressing arsine precipitation during the copper electrolytic arsenic removal process. This system enables rapid control of the optimal copper and arsenic concentrations, ensuring that the copper and arsenic ion concentrations are within the optimal arsenic removal range during the electrolytic arsenic removal process. It also suppresses the precipitation of arsine during deposition, improves the deposition efficiency of the arsenic removal slag, and reduces the residual copper concentration in the liquid after arsenic removal.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] In a first aspect, this invention proposes a real-time monitoring method for suppressing arsine evolution during the copper electrodeposition arsenic removal process:

[0007] This method is based on a copper electrowinning arsenic removal reaction process consisting of a primary mother liquor tank, an arsenic removal circulating liquid tank, an electrowinning arsenic removal reaction tank, and an arsenic removal post-removal liquid tank.

[0008] I. Real-time monitoring of copper ion concentration C in the primary mother liquor tank t1 and arsenic ion concentration C s1 The concentration of copper ions C in the arsenic removal circulating liquid pool t2 and arsenic ion concentration C s2 The concentration of copper ions and C in the arsenic removal pool t3 Arsenic ion concentration C s3 ;

[0009] II. Obtaining the copper and arsenic ion concentration C of the arsenic removal circulating solution t2 and C s2 Permissible variation range: 2g / L≤C t2 ≤5g / L, 3g / L≤C s2 ≤10g / L, and the constraint index of the effluent from the arsenic removal circulating liquid entering the electrowinning arsenic removal reaction tank: C s2 >C t2 ≥2g / L;

[0010] III. Based on the monitored copper and arsenic ion concentration data and the actual volume of the arsenic removal circulating liquid tank, establish a set of equations for copper concentration and a set of equations for arsenic concentration:

[0011] In the formula, V1 represents the initial mother liquor inlet volume, and V2 represents the actual volume of the arsenic removal circulating liquid tank.

[0012] 4. Solve the above system of simultaneous equations to obtain the initial mother liquor inlet volume V1 that simultaneously satisfies the concentration of copper and arsenic ions in the arsenic removal circulating liquid; ensure that after the initial mother liquor is added to the arsenic removal circulating liquid and the arsenic removal liquid is periodically returned to the arsenic removal circulating liquid, the concentration of copper and arsenic ions in the arsenic removal circulating liquid is always within the optimal range for electrodeposition arsenic removal.

[0013] V. Adjust the direction of liquid separation in the effluent after arsenic removal to meet process requirements C s3 ≤2g / L, C t3 ≤0.5g / L of this material enters the next stage of the electrolytic refining system, failing to meet the process requirements. s3 >2g / L, C t3 If the concentration is >0.5g / L, it should be returned to the mother liquor tank for reuse.

[0014] Secondly, this invention proposes a real-time monitoring system for suppressing arsine evolution during the copper electrowinning arsenic removal process:

[0015] The system consists of a primary mother liquor tank, an arsenic removal circulating liquid tank, an electrowinning arsenic removal reaction tank, an arsenic removal post-removal liquid tank, a PLC control module, a primary mother liquor real-time monitoring module, an arsenic removal circulating liquid real-time monitoring module, an arsenic removal post-removal liquid real-time monitoring module, and a precision control module.

[0016] The input pipe of the primary mother liquor tank is connected to the concentrated crystallized copper liquid; the output pipe of the primary mother liquor tank is connected to the arsenic removal circulating liquid tank, the output pipe of the arsenic removal circulating liquid tank is connected to the arsenic removal post-removal liquid tank via the electrowinning arsenic removal reaction tank, and the output pipe of the arsenic removal post-removal liquid tank is connected to the next process electrolytic refining system; a return pipe is connected between the arsenic removal post-removal liquid tank and the arsenic removal circulating liquid tank, and a return pipe is connected between the arsenic removal post-removal liquid tank and the primary mother liquor tank;

[0017] The PLC control module is communicatively and electrically connected to the primary mother liquor real-time monitoring module, the arsenic removal circulating liquid real-time monitoring module, the arsenic removal post-liquid real-time monitoring module, and the precision control module. The PLC control module is used to send operating instructions to the primary mother liquor real-time monitoring module, the arsenic removal circulating liquid real-time monitoring module, and the arsenic removal post-liquid real-time monitoring module, and to receive feedback real-time monitoring data. Based on the feedback real-time monitoring data, the PLC control module sends instructions to the precision control module to adjust the valve opening, obtain a suitable inflow rate from the primary mother liquor tank to the arsenic removal circulating liquid tank, and adjust the separation direction of the effluent from the arsenic removal post-liquid tank.

[0018] The primary mother liquor real-time monitoring module is installed in the primary mother liquor tank and is communicatively and electrically connected to the PLC control module. It is used to monitor the copper ion concentration and arsenic ion concentration in the primary mother liquor tank in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and arsenic ion concentration in the primary mother liquor tank to the PLC control module in real time through feedback.

[0019] The real-time monitoring module for the arsenic removal circulating liquid is installed in the arsenic removal circulating liquid tank and is communicatively and electrically connected to the PLC control module. It is used to monitor the copper ion concentration and arsenic ion concentration in the arsenic removal circulating liquid tank in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and arsenic ion concentration in the arsenic removal circulating liquid tank to the PLC control module in real time through feedback.

[0020] The real-time monitoring module for the arsenic-removed liquid is installed in the arsenic-removed liquid pool and is communicatively and electrically connected to the PLC control module. It is used to monitor the copper ion concentration and arsenic ion concentration in the arsenic-removed liquid pool in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and arsenic ion concentration in the arsenic-removed liquid pool to the PLC control module in real time through feedback.

[0021] The precision control module includes a first precision control module and a second precision control module. The first precision control module is installed on the pipeline between the primary mother liquor tank and the arsenic removal circulating liquid tank, and is communicatively and electrically connected to the PLC control module. It includes an electromagnetic regulating valve and a volumetric flow meter, used to measure parameters and adjust the opening of the electromagnetic regulating valve according to the instructions of the PLC control module. The second precision control module is installed at the output end of the arsenic removal liquid tank, and is communicatively and electrically connected to the PLC control module. It includes multiple electromagnetic regulating valve groups and a diversion pipeline, used to open or close the electromagnetic regulating valve groups and transport the arsenic removal liquid effluent to the next process electrolytic refining system or return it to the primary mother liquor tank through the diversion pipeline according to the instructions of the PLC control module.

[0022] The significant advantages of this invention are:

[0023] This invention provides a real-time monitoring system and method for suppressing arsine evolution during copper electrowinning arsenic removal. The system includes a PLC control module, a real-time monitoring module for the primary mother liquor, a real-time monitoring module for the arsenic removal circulating liquid, a real-time monitoring module for the post-arsenic removal liquid, and a precision control module. This invention utilizes the difference in copper-arsenic electrodeposition and concentration competition, using the copper-arsenic concentration difference and limit value in the arsenic removal circulating liquid as constraint indicators. The PLC control module controls the monitoring module to acquire the copper-arsenic concentrations in the primary mother liquor, the arsenic removal circulating liquid, and the post-arsenic removal liquid in real time. It calculates and analyzes the required copper-arsenic ion concentration in the arsenic removal circulating liquid, precisely controlling the amount of high-concentration copper-arsenic liquid added from the primary mother liquor. This ensures that the copper-arsenic ion concentration in the arsenic removal circulating liquid remains within the optimal range for electrowinning arsenic removal after the cycle returns, improving arsenic deposition, reducing copper deposition, suppressing the evolution of highly toxic arsine gas, and precisely controlling the diversion of the post-arsenic removal liquid. This achieves efficient arsenic removal while meeting the enterprise's safety production requirements. Attached Figure Description

[0024] Figure 1 is a system block diagram and control circuit diagram of the present invention.

[0025] Figure 2 shows the changes in copper and arsenic ion concentrations in the primary mother liquor of a sample under actual working conditions.

[0026] Figure 3 shows the changes in copper and arsenic ion concentrations in the arsenic removal circulating solution of the actual working sample.

[0027] Figure 4 shows the change in arsenic ion concentration in liquid copper after arsenic removal in samples from actual working conditions of the enterprise. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below with reference to the accompanying drawings. The following embodiments are used to illustrate the present invention.

[0029] Referring to Figure 1, the system of the present invention comprises: a primary mother liquor tank, an arsenic removal circulating liquid tank, an electrowinning arsenic removal reaction tank, an arsenic removal post-removal liquid tank, a PLC control module 1, a primary mother liquor real-time monitoring module 2, an arsenic removal circulating liquid real-time monitoring module 3, an arsenic removal post-removal liquid real-time monitoring module 4, and a precision control module 5.

[0030] Referring to Figure 1, the connection method of the primary mother liquor tank, the arsenic removal circulating liquid tank, the electrowinning arsenic removal reaction tank, and the arsenic removal post-removal liquid tank is as follows: the input pipe of the primary mother liquor tank is connected to the concentrated crystallized copper liquid; the output pipe of the primary mother liquor tank is connected to the arsenic removal circulating liquid tank, the output pipe of the arsenic removal circulating liquid tank is connected to the arsenic removal post-removal liquid tank via the electrowinning arsenic removal reaction tank, and the output pipe of the arsenic removal post-removal liquid tank is connected to the next process electrolytic refining system; a return pipe is connected between the arsenic removal post-removal liquid tank and the arsenic removal circulating liquid tank, and a return pipe is connected between the arsenic removal post-removal liquid tank and the primary mother liquor tank.

[0031] Referring to Figure 1, the PLC control module 1 is communicatively and electrically connected to the primary mother liquor real-time monitoring module 2, the arsenic removal circulating liquid real-time monitoring module 3, the arsenic removal post-liquid real-time monitoring module 4, and the precision control module 5, respectively, and can realize the following functions:

[0032] Control and Monitoring: PLC control module 1 can simultaneously send operation commands A-1, A-2, and A-3 to the primary mother liquor real-time monitoring module 2, the arsenic removal circulating liquid real-time monitoring module 3, and the arsenic removal post-liquid real-time monitoring module 4. It is also responsible for receiving feedback information from A-1, A-2, and A-3. The copper ion concentration C in the primary mother liquor is obtained from the A-1 feedback. t1 and arsenic ion concentration C s1 The concentration of copper ions C in the arsenic removal circulating solution is obtained from feedback A-2. t2 and arsenic ion concentration C s2 The concentration of copper ions and C in the arsenic-removed solution were obtained from the feedback of A-3. t3 Arsenic ion concentration C s3 .

[0033] Referring to Figures 2, 3, and 4, the concentrations of copper ions and arsenic ions in the primary mother liquor, arsenic removal circulating liquid, and arsenic removal post-removal liquid in the actual working samples of the enterprise are shown respectively.

[0034] Analysis of data: Effect of arsenic removal cycle process on copper arsenic ion concentration C t2 and C s2 The permissible range of variation is: 2g / L≤C t2 ≤5g / L, 3g / L≤C s2 The constraint index for the effluent from the arsenic removal circulating solution entering the electrowinning arsenic removal process is ≤10g / L, which is C. s2 >C t2 ≥2g / L, meaning that the concentrations of arsenic and copper ions can be both high or low, but the concentration of arsenic ions must be greater than that of copper ions (to inhibit copper discharge and deposition), and the concentration of copper ions must be ≥2g / L (to inhibit arsine deposition). First, list the copper concentration equation set (1) and the arsenic concentration equation set (2).

[0035] In the formula, V1 represents the amount of mother liquor fed in at one time, and V2 represents the volume of the arsenic removal circulating liquid tank.

[0036] Based on the real-time feedback of copper and arsenic concentration data from the monitoring module and the actual volume of the arsenic removal circulating liquid pool, solve the simultaneous equations (1) and (2) to obtain the high-concentration primary mother liquor inlet volume V1 that simultaneously satisfies the copper and arsenic ion concentrations in the arsenic removal circulating liquid.

[0037] Precise Control: Based on the analysis data, PLC control module 1 can send a B command to the first precise control module 5-1 to adjust the valve opening and obtain the appropriate initial mother liquor inlet volume V1; based on real-time monitoring data, PLC control module 1 can send a C command to the second precise control module 5-2 to adjust the liquid-liquid separation direction after arsenic removal to meet the process index requirements (C). s3 ≤2g / L, C t3 ≤0.5g / L) of pollutants enters the next stage of the electrolytic refining system, which does not meet the requirements (C). s3 >2g / L, C t3 If the concentration is >0.5g / L, the mother liquor should be returned to the mother liquor tank for reuse.

[0038] Referring to Figure 1, the primary mother liquor real-time monitoring module 2 is installed in the primary mother liquor tank and is communicatively and electrically connected to the PLC control module 1. Based on the A-1 instruction from the PLC control module 1, it monitors the copper ion concentration C in the primary mother liquor tank in real time. t1 and arsenic ion concentration C s1 And through A-1 feedback, the copper ion concentration C t1 and arsenic ion concentration C s1 The data is transmitted in real time to PLC control module 1.

[0039] Referring to Figure 1, the real-time monitoring module 3 for the arsenic removal circulating liquid is installed in the arsenic removal circulating liquid tank and is communicatively and electrically connected to the PLC control module 1. Based on the A-2 instruction from the PLC control module 1, it monitors the copper ion concentration C in the arsenic removal circulating liquid tank in real time. t2 and arsenic ion concentration C s2 And through A-2 feedback, the copper ion concentration C t2 and arsenic ion concentration C s2 The data is transmitted in real time to PLC control module 1.

[0040] Referring to Figure 1, the real-time monitoring module 4 for the arsenic-removed liquid is installed in the arsenic-removed liquid tank and is communicatively and electrically connected to the PLC control module 1. Based on the A-3 instruction from the PLC control module 1, it monitors the copper ion concentration C in the arsenic-removed liquid tank in real time. t3 and arsenic ion concentration C s3 And through A-3 feedback, the copper ion concentration C t3 and arsenic ion concentration C s3 The data is transmitted in real time to PLC control module 1.

[0041] Referring to Figure 1, the precision control module 5 includes a first precision control module 5-1 installed on the pipeline between the primary mother liquor tank and the arsenic removal circulating liquid tank, and a second precision control module 5-2 installed at the output end of the arsenic removal liquid tank. Both are communicatively and electrically connected to the PLC control module 1. The first precision control module 5-1 contains an electromagnetic regulating valve and a volumetric flow meter. According to the B command of the PLC control module 1, it can dynamically adjust the opening of the electromagnetic regulating valve by measuring parameters using the volumetric flow meter, precisely controlling the primary mother liquor inflow V1, and ensuring that the total copper T entering the arsenic removal circulating liquid tank is... 总铜 =C t1 *V1 meets the data analysis requirements of PLC control module 1; the second precision control module 5-2 contains multiple electromagnetic regulating valve groups and diversion pipes, which can open or close the electromagnetic regulating valve groups according to the C command of PLC control module 1. Qualified liquid proceeds to the next process, and unqualified liquid is returned to the primary mother liquor tank.

[0042] Referring to Figure 1, the "periodic circulation" arrow in the post-arsenic removal liquid pool points to the arsenic removal circulating liquid pool, meaning that the low-concentration solution in the post-arsenic removal liquid pool circulates periodically into the arsenic removal circulating liquid pool. This is because the liquid in the arsenic removal circulating liquid pool needs to be replenished in real time as it is consumed; the large amount of replenishment is post-arsenic removal liquid, and the small amount is the primary mother liquor.

[0043] Note: The concentration of copper and arsenic ions in the arsenic removal circulating solution must be adjusted to a certain range before entering the electrowinning arsenic removal process. The arsenic removal solution with low copper and low arsenic is preferentially returned to the arsenic removal circulating solution pool for mixing to ensure a certain water balance. When the water volume of the arsenic removal circulating solution becomes too large due to the continuous addition of the primary mother liquor, the excess arsenic removal solution will enter the subsequent electrolytic refining system. The continuous return of the arsenic removal solution to the arsenic removal circulating solution for mixing causes the concentration of copper and arsenic ions to continuously decrease. Therefore, it is necessary to precisely control the amount of high-concentration copper and arsenic liquid added from the primary mother liquor according to the required concentration of copper and arsenic ions in the arsenic removal circulating solution to ensure that the concentration of copper and arsenic ions in the arsenic removal circulating solution is always within the optimal range for electrowinning arsenic removal after the arsenic removal solution returns for the next cycle.

[0044]

Example

[0045] Table 1 Basic Information

[0046] 1) Monitoring module data: The copper and arsenic content in the primary mother liquor, arsenic removal circulating liquid, and arsenic removal post-treatment liquid are constantly changing. Let the measured value before adjustment be C of the primary mother liquor. t1 =25g / L, C s1 =22g / L; Arsenic removal circulating solution C t2 =3g / L, C s2 =8g / L; arsenic removal solution C t1 =0.3g / L, C s1 =3g / L;

[0047] 2) Given the enterprise's structural data: volume of the arsenic removal circulating liquid tank, assume: V2 = 200m³ 3 ;

[0048] 3) Because the arsenic removal circulating liquid pool is always kept at a copper C level t2 ≥2g / L, arsenic C s2 ≥3g / L (the arsenic removal solution is periodically returned to the arsenic removal circulating solution tank), so only the copper C requirement needs to be satisfied. t2 ≤5g / L, Arsenic C s2 The amount of mother liquor added at one time, V1, is determined under the condition of ≤10g / L; solve the system of simultaneous equations (1). and (2)

[0049] That is: (1) and (2)

[0050] Substituting the measured data from 1), we get: (1)

[0051] (2)

[0052] Therefore, when both requirements (1) and (2) need to be met, the value V1 ≤ 20m should be taken.3 / h

[0053] Let the value be V1 = 18m 3 / h, substituting the data into the formula, we obtain the copper and arsenic concentrations of the arsenic removal circulating liquid after one adjustment with the mother liquor:

[0054] Copper concentration: (1) Satisfying 2g / L≤C t2 The requirement is ≤5g / L;

[0055] Arsenic concentration: (2) Satisfying 3g / L≤C s2 The requirement is ≤10g / L.

[0056] The above description of the embodiments is provided to enable those skilled in the art to understand and apply the present invention. It will be apparent to those skilled in the art that various modifications can be easily made to these embodiments, and the general principles described herein can be applied to other embodiments without inventive effort. Therefore, the present invention is not limited to the embodiments described herein, and any improvements and modifications made by those skilled in the art based on the disclosure of the present invention without departing from the scope of the invention should be within the protection scope of the present invention.

Claims

1. A real-time monitoring method for suppressing arsine evolution during copper electrodeposition arsenic removal, characterized in that: Based on the copper electrowinning arsenic removal reaction process consisting of a primary mother liquor tank, an arsenic removal circulating liquid tank, an electrowinning arsenic removal reaction tank, and an arsenic removal post-removal liquid tank; I. Real-time monitoring of copper ion concentration C in the primary mother liquor tank t1 and arsenic ion concentration C s1 The concentration of copper ions C in the arsenic removal circulating liquid pool t2 and arsenic ion concentration C s2 The concentration of copper ions and C in the arsenic removal pool t3 Arsenic ion concentration C s3 ; II. Obtaining the copper and arsenic ion concentration C of the arsenic removal circulating solution t2 and C s2 Permissible variation range: 2g / L≤C t2 ≤5g / L, 3g / L≤C s2 ≤10g / L, and the constraint index of the effluent from the arsenic removal circulating liquid entering the electrowinning arsenic removal reaction tank: C s2 >C t2 ≥2g / L; III. Based on the monitored copper and arsenic ion concentration data and the actual volume of the arsenic removal circulating liquid tank, establish a set of equations for copper concentration and a set of equations for arsenic concentration: In the formula, V1 represents the initial mother liquor inlet volume, and V2 represents the actual volume of the arsenic removal circulating liquid tank.

4. Solve the above system of simultaneous equations to obtain the initial mother liquor inlet volume V1 that simultaneously satisfies the concentration of copper and arsenic ions in the arsenic removal circulating liquid; ensure that after the initial mother liquor is added to the arsenic removal circulating liquid and the arsenic removal liquid is periodically returned to the arsenic removal circulating liquid, the concentration of copper and arsenic ions in the arsenic removal circulating liquid is always within the optimal range for electrodeposition arsenic removal. V. Adjust the direction of liquid separation in the effluent after arsenic removal to meet process requirements C s3 ≤2g / L, C t3 ≤0.5g / L of this material enters the next stage of the electrolytic refining system, failing to meet the process requirements. s3 >2g / L, C t3 If the concentration is >0.5g / L, it should be returned to the mother liquor tank for reuse.

2. A real-time monitoring system for suppressing arsine evolution during copper electrowinning arsenic removal, characterized in that: The system consists of a primary mother liquor tank, an arsenic removal circulating liquid tank, an electrowinning arsenic removal reaction tank, an arsenic removal post-removal liquid tank, a PLC control module (1), a primary mother liquor real-time monitoring module (2), an arsenic removal circulating liquid real-time monitoring module (3), an arsenic removal post-removal liquid real-time monitoring module (4), and a precision control module (5). The input pipe of the primary mother liquor tank is connected to the concentrated crystallized copper liquid; the output pipe of the primary mother liquor tank is connected to the arsenic removal circulating liquid tank, the output pipe of the arsenic removal circulating liquid tank is connected to the arsenic removal post-removal liquid tank via the electrowinning arsenic removal reaction tank, and the output pipe of the arsenic removal post-removal liquid tank is connected to the next process electrolytic refining system; a return pipe is connected between the arsenic removal post-removal liquid tank and the arsenic removal circulating liquid tank, and a return pipe is connected between the arsenic removal post-removal liquid tank and the primary mother liquor tank; The PLC control module (1) is connected to the primary mother liquor real-time monitoring module (2), the arsenic removal circulating liquid real-time monitoring module (3), the arsenic removal post-liquid real-time monitoring module (4), and the precision control module (5) for communication and electrical connection. The PLC control module (1) is used to send operation instructions to the primary mother liquor real-time monitoring module (2), the arsenic removal circulating liquid real-time monitoring module (3), and the arsenic removal post-liquid real-time monitoring module (4) and to receive feedback real-time monitoring data. The PLC control module (1) sends instructions to the precision control module (5) based on the feedback real-time monitoring data to adjust the valve opening, obtain the appropriate inflow rate of the primary mother liquor tank into the arsenic removal circulating liquid tank, and adjust the separation direction of the effluent from the arsenic removal post-liquid tank. The primary mother liquor real-time monitoring module (2) is installed in the primary mother liquor tank and is connected to the PLC control module (1) for communication and electrical connection. It is used to monitor the copper ion concentration and arsenic ion concentration in the primary mother liquor tank in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and arsenic ion concentration in the primary mother liquor tank to the PLC control module (1) in real time through feedback. The real-time monitoring module (3) for the arsenic removal circulating liquid is installed in the arsenic removal circulating liquid pool and is connected to the PLC control module (1) for communication and electrical connection. It is used to monitor the copper ion concentration and arsenic ion concentration in the arsenic removal circulating liquid pool in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and arsenic ion concentration in the arsenic removal circulating liquid pool to the PLC control module (1) in real time through feedback. The real-time monitoring module (4) of the arsenic removal liquid is installed in the arsenic removal liquid pool and is connected to the PLC control module (1) for communication and electrical connection. It is used to monitor the copper ion concentration and arsenic ion concentration in the arsenic removal liquid pool in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and arsenic ion concentration in the arsenic removal liquid pool to the PLC control module (1) in real time through feedback. The precision control module (5) includes a first precision control module (5-1) and a second precision control module (5-2); The first precision control module (5-1) is installed on the pipeline between the primary mother liquor tank and the arsenic removal circulating liquid tank, and is in communication and electrical connection with the PLC control module (1). It includes an electromagnetic regulating valve and a volumetric flow meter, and is used to measure parameters and adjust the opening of the electromagnetic regulating valve according to the instructions of the PLC control module (1). The second precision control module (5-2) is installed at the output end of the arsenic removal liquid tank, and is in communication and electrical connection with the PLC control module (1). It includes multiple electromagnetic regulating valve groups and a diversion pipeline, and is used to open or close the electromagnetic regulating valve groups and transport the arsenic removal liquid effluent to the next process electrolytic refining system or return it to the primary mother liquor tank through the diversion pipeline according to the instructions of the PLC control module (1).

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