Devices and methods for handling a storage container

Abstract

Device (200) for handling a storage container (100) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114,116,118) defining a main body (110) and a lid, the device (200) being configured for engagement with a first one of the plurality of plates, the device (200) being further configured for engagement with at least a further one of the plurality of plates.

Description

[0001] Brooks Automation (Germany) GmbH DG1.DD174885 / 02 IDF3267 13 November 2025

[0002] 1

[0003] Devices and methods for handling a storage container

[0004] The present invention relates to devices and methods for handling a storage container, in particular a storage container for storing semiconductor wafers, from which semiconductor chips are made, and / or lithography masks, which are used for chip manufacture. The invention also relates to a system comprising such a device and storage container.

[0005] Background

[0006] Front opening unified pods (FOUPs) are specialized storage containers designed to hold wafers, in particular semiconductor wafers, in a controlled environment of semiconductor fabrication plants, so called fabs. FOUPs are typically used to transport wafers between method steps to prevent the wafers being contaminated. For this purpose, FOUPs provide a controlled environment in which pressure, airflow and particle-content is controlled. Similar reguirements exist for transportation or storage containers for lithography masks (often referred to as reticles), e.g. EUV lithography masks, which are stored and / or transported in dedicated containers, so called reticle pods.

[0007] The controlled environment during transportation of wafers and / or lithography masks is essential for the fabrication of highly integrated electric circuits on the wafers with the lithography mask, as even minor contamination can lead to errors in the electronic circuits on the chips, which can result in a whole batch of chips being unusable, thus reducing the yield, which can for example be defined as the percentage of usable chips per reticle.

[0008] However, over time, FOUPs can be contaminated by gases from manufacturing processes or by chemical compounds emitted from the wafers and / or lithography masks stored therein. To flush out (“purge”) most of the contamination molecules and / or ions, FOUPs are provided with purge openings, through which an inert gas can flushed into the FOUP. Further, in order to prevent contamination molecules being transferred from one batch of wafers to another, FOUPs are cleaned regularly, in particular from the inside and the outside.

[0009] Furthermore, FOUPs are subjected to various forces, especially torque forces during their transportation and handling in the fab environment, which leads to wear and tear, such that a FOUP only has a limited lifetime, during which it can be used in a reliable way.

[0010] Summary of the Invention

[0011] The present invention addresses these issues by providing a device comprising the features of claim 1 and 2 , a system comprising the features of claim 10 and a method comprising the features of claim 11 or 13.

[0012] Further embodiments and additional features are provided in the dependent claims and further discussed in the following description.

[0013] The invention provides devices and methods for handling a storage container for storing semiconductor wafers or lithography masks, the storage container comprising a plurality of plates defining a main body or housing and a lid, the device being configured for engagement with a first one of the plurality of plates, the device being further configured for engagement with at least a further one of the plurality of plates. By configuring the handling device in this way, strain, for example due to torque effects and / or asymmetrical weight distributions, which the FOUP is subjected to during handling, can be minimised or avoided.

[0014] The invention especially provides a device for handling a storage container for storing semiconductor wafers or lithography masks, the storage container comprising a plurality of plates or walls defining a main body or housing and a lid, at least one of the plurality of plates being provided with an adaptor, also referred to as handling flange (such an adaptor or handling flange, by which a FOUP can be gripped or clamped, especially for or by robotic or automated handling systems, is sometimes also referred to as “mushroom” in the jargon of the technical field) , the device comprising a transportation arm configured for engagement with the adaptor, the device being provided for further engagement with at least a further one of the plurality of plates, especially a plate adjacent to the plate provided with the adaptor. By providing multiple engagements or engagement points in this way, torque forces acting on the handling device as well as on the storage container in various orientations can be minimised, thereby reducing stress effects on the storage container and thus increasing its life span. Especially, torque forces during a rotational movement of a storage container being handled by a robotic handlings system, for example a rotational movement from a first orientation to a second orientation, can be minimised.

[0015] In the following, as a typical example of a storage container to which the invention is applicable, a Front Opening Unified Pod (FOUP) will be considered. FOUPs are typically handled in a first orientation, in which the transportation arm engages the adaptor from above (i.e. such that the plate of the FOUP, on which the adaptor is provided is the top plate), so that the FOUP essentially hangs from the adaptor. This exposes the FOUP essentially only to relatively small tensile strain or torque forces, for which FOUPs are typically well adapted. However, in case the FOUP is engaged by the transportation arm in a second orientation such that the plate, on which the adaptor is provided, is on a side of the FOUP, for example, significant torque forces act on the adaptor and on the FOUP as a whole, which lead to an acceleration of degradation of the FOUP. Such an engagement of the FOUP is especially advantageous during change of the orientation of the FOUP, for example by a rotational movement from the first orientation to the second orientation as mentioned above, or vice versa. If the FOUP is only carried or engaged at one plate, for example the plate provided with the adaptor, changing orientation can lead to significant additional stress effects, which contribute to premature degradation of the FOUP. Engaging the FOUP at two plates significantly reduces such stress effects caused by change of orientation, as especially torques acting between the adaptor (sometimes referred to a “mushroom” in the art, as mentioned above) and other parts or sections of the FOUP can be avoided. Such an engagement of the FOUR is especially useful for handling situations, in which a load opening of the FOUR faces downwardly (i.e. downwards in the direction of gravity), such that it can be placed on a base with its load opening, the base constituting part of a cleaning system such that the inside of the FOIIP can be cleaned using the FOIIP itself as its own cleaning chamber. This handling can especially be provided by gripping the adaptor laterally, i.e. from the side. In this case, the plate of the FOIIP constituting its lid is removed, and the load opening of the FOIIP thus provided, after rotation of the FOIIP, is placed face down on the base, via which at least in part upwardly directed cleaning fluid can be directed into the inside of the FOIIP by means of appropriately positioned cleaning fluid nozzles. In this orientation, with the load opening facing downwardly, the plate of the FOIIP provided with the adaptor is positioned at the side of the FOIIP, i.e. in a vertical orientation, and constitutes a side wall. Be it noted in order to handle a FOIIP while its load opening is facing downwardly in the way described above, the FOIIP can also be handled or gripped by a handling device from above at a plate opposite the loading opening of the FOIIP. In this orientation also, the plate comprising the adaptor is in a lateral position, such that an asymmetrical force can act on the handling device, especially a transportation arm, for example due to the weight of the adaptor. This can also lead to undue strain or torque within the FOIIP, leading to an acceleration of degradation.

[0016] The device may comprise a clamping structure adapted to provide the further engagement with the at least further one of the plurality of plates, the clamping structure especially being connected to the transportation arm. A clamping structure constitutes a simple and robust arrangement for providing engagement between FOIIP and handling device at multiple locations.

[0017] The clamping structure may be connected to the transportation arm in such a way that it can engage with the at least further one of the plurality of plates when the transportation arm is in engagement with the adaptor. The clamping structure can be articulately and / or telescopically connected to the transportation arm, especially to the end of the transportation arm in engagement with the adaptor. Hereby, various engagement positions, which may differ with different types or dimensions of FOUPs, can be effectively selected. Especially, the clamping structure can be provided to contact or engage specific locations on the outside of the FOUR, which constitute acceptable locations for engagement for example according to specific industry standards.

[0018] As mentioned, the invention is especially applicable in case the storage container is a FOIIP, but is also advantageously useable with other types of storage containers in the semiconductor fab environment

[0019] In an embodiment, the device is configured and adapted to handle the storage container in at least one of a first configuration and a second configuration. The device is especially adapted to rotate the storage container from the first orientation into the second orientation.

[0020] In an embodiment, wherein a first plate of the plurality of plates forms a lid of the storage container, and the other ones of the plurality of plates form a main body of the storage container, the first plate being detachable from the main body, such that a loading opening of the storage container is provided when the first plate is detached from the main body, the first configuration is an orientation of the storage container, in which the first plate or the loading opening faces downwards in the direction of gravity, and the second configuration is an orientation, in which the first plate or the loading opening faces sidewards or upwards in the direction of gravity.

[0021] The invention also especially provides a method for handling a storage container for storing semiconductor wafers or lithography masks, the storage container comprising a plurality of plates defining a main body or housing and a lid, at least one of the plurality of plates being provided with an adaptor, comprising engagement of the adaptor with a transportation arm of a handling device, the transportation arm being configured for engagement with the adaptor, and further engagement with at least a further one of the plurality of plates, especially a plate adjacent to the plate provided with the adaptor, especially with a clamping structure connected to the transportation arm.

[0022] Brief description of the drawings

[0023] Advantages and further aspects of the invention will now be discussed further with reference to the appended drawings. Herein,

[0024] Figure 1 shows a perspective view of a prior art FOUR as a storage container, with which the present invention can be implemented,

[0025] Figure 2 shows a schematic side view of a FOUR being handled using a device according to an embodiment of the present invention in an orientation, in which the plate provided with the adaptor extends in a vertical direction, i.e. in parallel to the force of gravity,

[0026] Figure 3 shows a schematic side view of a FOIIP being handled using a device according to a further embodiment of the present invention similar to that of Figure 2, and

[0027] Figure 4 shows a schematic side view of a cleaning system, with which the invention can advantageously be utilised.

[0028] In Figure 1 , a perspective view of prior art FOIIP is shown as a typical storage container 100, with which the present invention can be implemented. The FOIIP 100 comprises a plurality of plates 112, 114 116, 118 forming a box-shaped housing or main body 110 of the FOIIP 100. Plate 118 is detachable from the remaining plates 112,114,116 and constitutes a lid of the FOIIP, the remaining plates forming the main body of the FOIIP and defining a loading opening 124, via which wafers to be stored can be brought into the FOIIP. The FOUR is provided with handling members 140 for manual handling by human operators to hold or transport the FOUR 100. The inside of FOIIP 100 is provided with a plurality of ridges 122 adapted to support the peripheral portions of opposite sides of wafers.

[0029] Further, a handling flange or adaptor 130 is provided on a top plate 112 of the FOIIP 100. The adaptor 130 is used in case of handling by handling devices (handling robots) for handling and transporting the FOIIP 100, for example within a fab environment.

[0030] The plate 118 and / or the plates engaging plate 118 can be provided with a sealing ring that seals the FOIIP 100, when plate 118 is placed in the loading opening 124.

[0031] In Figure 2, a FOIIP 100 is shown in engagement with an embodiment of the handling device 200 according to the invention. Herein, a transportation arm 210 of the handling device provided with an end for engaging the adaptor is provided. As can be seen in Figure 2, the plate provided with the adaptor 130 is orientated such that it extends in a vertical direction, i.e. parallel to the direction of the force of gravity. In the orientation shown, plate 118 constituting the lid of the FOIIP 100 thus extends horizontally, i.e. perpendicularly to the force of gravity. Handling a FOIIP 100 in this orientation can be expedient in connection with placing FOUPs in specific kinds of cleaning or handling stations within a fab.

[0032] In this orientation, the weight of the FOIIP exerts a significant torque force on the adaptor 130, which causes excessive strain within the various plates of the FOIIP. Such strain can lead to premature degradation of the FOIIP, for example as gas tightness of the loading opening 124 when closed by plate 118 constituting the FOIIP lid can deteriorate. Also, material fatigue can occur.

[0033] In order to minimise these torque forces and strains, handling device 200 is also provided with a clamping structure 220. An engagement arm 222 of the clamping structure 220 is articulately connected to the end of the transportation arm 210 engaging the adaptor 130 with its first end. At its second end it is provided with an engagement feature 224 adapted to engage with specific positions on the outside of FOUR 100. In the example shown, it engages plate 118 in such a way that at least part of the weight of the FOUR 100 is carried by the engagement arm 222 and / or the engagement feature 224, hereby significantly reducing torque or torque forces acting on the transportation arm 210 and / or the adaptor 130 of the FOIIP. Hereby, strain within the FOIIP structure can be minimised. The exact positioning of the engagement feature 224 can be varied. For example, the engagement feature 224 could also engage the FOIIP 100 at least one of the, in this orientation, vertically extending plates, for example plate 114.

[0034] While in Figure 2 the FOIIP 100 is shown resting on the engagement feature, i.e. the engagement feature is located below the FOIIP, it is also possible to provide the engagement arm and the engagement feature above the FOIIP in such a way that the FOIIP, or at least a part of the weight of the FOIIP, is suspended from the Engagement feature 224, whereby torque and torque induced strain on the FOIIP can also be significantly reduced.

[0035] Such an engagement by handling the adaptor 130 from the side is for example employed in connection with cleaning methods, in which the FOIIP 100 itself is used as a cleaning chamber when cleaning the inside of the FOIIP. In this case, the plate 118 of the FOIIP 100 constituting its lid is removed, and the loading opening 124 of the FOIIP thus provided is placed face down on a base (not shown), via which cleaning fluid can be brought into the inside of the FOIIP 100 by means of appropriately positioned cleaning fluid nozzles (also not shown). In this orientation, with the loading opening 124 facing downwards, the plate 112 of the FOIIP 100 provided with the adaptor 130 is typically positioned at the side of the FOIIP, i.e. in a vertical orientation, and constitutes a side wall of the FOUP. Handling of a FOUR 100 with its load opening 124 facing downwardly can also be achieved by gripping the FOUR at a plate opposite the handling opening 124, i.e. the plate opposite the plate constituting lid 118, as shown in Figure 3. Here, the FOIIP is gripped by a handling device 200 comprising a handling arm 210 from above. In this orientation also, the plate comprising the adaptor 130 is in a lateral position, such that an asymmetrical force can act on the handling device 200, especially the transportation arm 210, for example due to the weight of the adaptor 130. This can also lead to undue strain or torque within the FOIIP 100, leading to an acceleration of degradation. In order to minimise or avoid this strain or torque, the handling device according to Figure 3 is also provided with a clamping structure. In order to illustrate various different engagement positions, a first clamping structure designated 220a provided with an engagement arm 222a engaging a (vertically extending) side plate with clamping feature 224a, and a second clamping structure designated 220 b provided with an engagement arm 222b engaging a (horizontally extending) downwardly facing plate with clamping feature 224 b are shown. Clamping structures 220a and 220b may be provided or used individually or simultaneously.

[0036] Be it noted that in many fab applications, the plate of the FOIIP 100 provided with the adaptor will constitute the top plate of the FOIIP, so that the transportation arm will engage the FOIIP from above. In this orientation, essentially only downward forces parallel to the force of gravity will act on the transportation arm and / or the adaptor of the FOIIP, with essentially no torque being generated, which could act on the adaptor. While in this orientation minimising torque using a clamping structure as described above will not have the same torque reducing effects, it may nevertheless be used to more uniformly distribute the weight of the FOIIP that the handling device has to carry.

[0037] An embodiment of the method, in which the storage container, for example a FOIIP, is handled with its load opening facing downwards, and the FOIIP can be placed on a surface of a cleaning device such that the FOIIP can serve as its own cleaning chamber will now be further illustrated with reference to Figure 4.

[0038] A cleaning device 300 comprises an enclosure 310 at least comprising a contact surface 311 on which the main body 110 of the FOUR 100 can be placed such that the loading opening 124 faces and is covered by the contact surface 311. In Figure 4 it can be seen that the loading opening faces in a downward direction, i.e. the loading opening forms a horizontally extending opening, which is oriented downward in the direction of gravity. In the shown embodiment, the device 300 comprises a housing or chamber into which the FOUR 100, especially the main body 110 of the FOIIP, is placed for cleaning.

[0039] The device 300 further comprises a first cleaning apparatus 320 arranged such that, when the main body 110 of the FOIIP 100 is placed on the contact surface 311 , the cleaning apparatus extends into the inside of the main body 110 of the FOIIP (entering the inside of the main body 110 of the FOIIP via the loading opening 124) such that a first cleaning fluid can be distributed within the inside of the main body 110 of FOIIP 100. For distribution, the first cleaning apparatus 320 is provided with a plurality of first cleaning fluid nozzles 321 , 322, 323 on a cleaning apparatus head. The cleaning apparatus head can be moved transversally, i.e. in an up-and-down direction, and can be rotated to ensure that the whole interior of the main body 110 of the FOIIP 110 is cleaned. Thus, regarding the inside of the FOIIP, the FOIIP, i.e. the main body 110 of the FOIIP, acts as its own cleaning chamber.

[0040] Further, the device 300 is provided with a second cleaning apparatus 330 arranged such that, when the main body 110 of FOIIP 100 is placed on the contact surface 311 , a second cleaning fluid can be distributed to the outside of the main body 110 of FOIIP 100. For distribution of the second cleaning fluid, the second cleaning apparatus 330 is provided with a plurality of second cleaning fluid nozzles 331, 332, 333, 334, 335, 336, 337. The second cleaning fluid nozzles 331-337 are arranged such that the second cleaning fluid can be distributed to every side of the main body 110 of the FOIIP. For this purpose, the direction in which each second cleaning fluid nozzles 331-337 distribute and apply the second cleaning fluid can be changed during cleaning. Alternatively, the second cleaning fluid nozzles 331-337 can be arranged in a movable manner, and for example be provided to perform translational and / or rotational movement.

[0041] Thereby, the main body 110 of the FOUR 100 can be cleaned both from the inside and form the outside. It is pointed out that a lid 120 of the FOUR 100 (not shown in Figure 4) may be cleaned at a different location (also not shown).

[0042] The device 300 further comprises a first drain 350 with a first drain opening 351 arranged such that the first cleaning fluid distributed to the inside of the main body 110 of FOIIP 100 can flow out of the device 300 and a second drain 360 with a second drain opening 361 arranged such that the second cleaning fluid distributed to the outside of the FOIIP 100 can flow out of the device 300.

[0043] Thereby, the used and thus potentially contaminated first and second cleaning fluids can directly flow off.

[0044] Further, the device 300 is provided with a pressurized gas control device 340 configured to, when the FOIIP 100 is placed inside the enclosure 310 on the contact surface 311, provide pressurized gas, in particular pressurized air, on first openings 114a, 114b, 114c provided in the main body 110 of the FOIIP. Such first openings are provided, for example, as openings for purge gas inflow or outflow during typical operation of the FOIIP. For this purpose, the pressure control device 340 comprises pressurized air nozzles 341 , 342. In Figure 4, only two pressurized air nozzles 341 , 342 are shown. However, due to the arrangement of the first openings 114a, 114b, 114c a third pressurized air nozzle is provided behind one of the two shown pressurized air nozzle 341 , 342, i.e. is out of view.

[0045] The pressurized gas control device 340 is configured to provide pressurized air to each first opening 114a, 114b, 114c from an outer side of the FOIIP 100, when the main body 110 of FOIIP 100 is arranged on the contact surface 311 and an outer side or an inner side of the storage container 100 is being cleaned. Thereby, the first openings 114a, 114b, 114c are sealed by an air curtain or air knife and first and / or second cleaning fluid cannot be transferred to the other side of the FOUP 100.

[0046] The device 300 further comprises a locking mechanism 371 , 372 configured to detachably connect the main body 110 of the FOUP 100 to the contact surface 311. Thereby, movement of the main body 110 during the cleaning is prevented. The locking mechanism 371 , 372 can for example be provided as a latch mechanism. Furthermore, the locking mechanism 371,372 is adapted to provide a sealing connection between the main body 110 of the FOUP and the contact surface, such that cross-contamination between cleaning fluid applied to the inside of the FOUP and cleaning fluid applied to the outside of the FOUP can be effectively avoided.

Claims

Claims1. Device (200) for handling a storage container (100) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114,116,118) defining a main body (110) and a lid (118), the device (200) being configured for engagement with a first one of the plurality of plates, the device (200) being further configured for engagement with at least a further one of the plurality of plates, at least one (112) of the plurality of plates being provided with an adaptor (130), the device comprising a transportation arm (210) being configured for engagement with the adaptor (130), and the device being provided for further engagement with at least the further one of the plurality of plates, especially a plate (114, 118) adjacent to the plate (112) provided with the adaptor.

2. Device (200) for handling a storage container (100) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114,116,118) defining a main body (110) and a lid (118), the device (200) being configured for engagement with a first one of the plurality of plates, the device (200) being further configured for engagement with at least a further one of the plurality of plates.

3. Device (200) for handling a storage container (100) for storing semiconductor wafers or lithography masks according to claim 2, at least one (112) of the plurality of plates being provided with an adaptor (130), the device comprising a transportation arm (210) being configured for engagement with the adaptor (130), the device being provided for further engagement with at least the further one of the plurality of plates, especially a plate (114, 118) adjacent to the plate (112) provided with the adaptor.

4. Device (100) according to any one of the preceding claims, further comprising a clamping structure (220) adapted to provide the further engagement with the at least further one of the plurality of plates, the clamping structure (220) especially being connected to the transportation arm (210).

5. Device according to claim 4, wherein the clamping structure (220) is connected to the transportation arm (210) in such a way that it can engage with the at least further one of the plurality of plates (112, 114,116,118) when the transportation arm (210) is in engagement with the adaptor (130).

6. Device according to any one of the preceding claims 4 or 5, wherein the clamping structure (220) is articulatedly and / or telescopically connected to the transportation arm (210), especially to an end of the transportation arm (210) configured for engagement with the adaptor (130).

7. Device according to any one of the preceding claims, configured and adapted to handle the storage container in at least one of a first configuration and a second configuration.

8. Device according to claim 7, wherein a first plate (118) of the plurality of plates forms the lid of the storage container, and the other ones of the plurality of plates form the main body (110) of the storage container, the lid being detachable from the main body, such that a loading opening (124) of the storage container is provided when the lid is detached from the main body, the first configuration being an orientation of the storage container, in which the lid or the loading opening (124) faces downwards in the direction of gravity, and the second configuration being an orientation, in which the lid or the loading opening (124) faces sidewards or upwards in the direction of gravity.

9. Device according to any one of the preceding claims, wherein the storage container (100) is a FOUR.

10. System comprising a device according to any one of the preceding claims and a storage container (110) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114,116,118) defining a main body (110) and a lid.

11. Method for handling a storage container (100) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114, 116, 118) defining a main body (110) and a lid, comprising engagement of a first one of the plurality of plates with a handling device (200), and further engagement with at least a further one of the plurality of plates with the handling device, the handling device comprising a clamping structure (220) provided with a transportation arm (210) adapted for engagement with the first and the further one of the plurality of plates, at least one (112) of the plurality of plates being provided with an adaptor (130), comprising engagement of the adaptor (130) with the transportation arm (210) of the handling device (200), and further engagement with at least the further one of the plurality of plates, especially a plate (114, 118) adjacent or opposite to the plate (112) provided with the adaptor (130), with the clamping structure (220).

12. Method according to claim 11 , wherein a first plate (118) of the plurality of plates forms the lid of the storage container, and the other ones of the plurality of plates form the main body of the storage container, the lid being detachable from the main body, such that a loading opening of the storage container is provided when the lid is detached from the main body, wherein the storage container is handled in at least one of a first configuration and a second configuration, the first configuration being an orientation of the storage container, in which the lid or the loading opening faces downwards in the direction of gravity, and the second configuration being an orientation, in which the lid or the loading openingfaces sidewards or upwards in the direction of gravity, and after detaching the lid from the main body of the storage container, the storage container is placed on a cleaning device in a sealing manner, such that an inside of the main body of the storage container can be cleaned without any cleaning fluid used for cleaning the inside of the storage container contacting an outside of the storage container, and / or the outside of the main body can be cleaned without any cleaning fluid used for cleaning the outside of the storage container contacting the inside of the storage container.

13. Method for handling a storage container (100) for storing semiconductor wafers or lithography masks, the storage container (100) comprising a plurality of plates (112, 114, 116, 118) defining a main body (110) and a lid, comprising engagement of a first one of the plurality of plates with a handling device (200), and further engagement with at least a further one of the plurality of plates with the handling device, the handling device especially comprising a clamping structure (220) provided with a transportation arm (210) adapted for engagement with the first and the further one of the plurality of plates.

14. Method for handling a storage container (100) for storing semiconductor wafers or lithography masks according to claim 13, at least one (112) of the plurality of plates being provided with an adaptor (130), comprising engagement of the adaptor (130) with the transportation arm (210) of the handling device (200), and further engagement with at least a further one of the plurality of plates, especially a plate (114, 118) adjacent or opposite to the plate (112) provided with the adaptor (130), with the clamping structure.

15. Method according to claim 13 or 14, wherein a first plate (118) of the plurality of plates forms the lid of the storage container, and the other ones of the plurality of plates form the main body of the storage container, the lid being detachable from the main body, such that aloading opening of the storage container is provided when the lid is detached from the main body, wherein the storage container is handled in at least one of a first configuration and a second configuration.

16. Method according to claim 15, the first configuration being an orientation of the storage container, in which the lid or the loading opening faces downwards in the direction of gravity, and the second configuration being an orientation, in which the lid or the loading opening faces sidewards or upwards in the direction of gravity.

17. Method according to claim 16, wherein the lid and / or the loading opening face downwards in the direction of gravity, and after detaching the lid from the main body of the storage container, the storage container is placed on a cleaning device in a sealing manner, such that an inside of the main body of the storage container can be cleaned without any cleaning fluid used for cleaning the inside of the storage container contacting an outside of the storage container, and / or the outside of the main body can be cleaned without any cleaning fluid used for cleaning the outside of the storage container contacting the inside of the storage container18. Method according to claim 7 or 8, wherein the storage container (100) is a FOUP.

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