Synthesis of aluminum precursors without use of pyrophoric compounds and related compositions and related methods
A method combining aluminum halides, alkoxy aluminum compounds, and Grignard reagents safely synthesizes aluminum precursors, addressing the dangers of pyrophoric compounds and producing high-purity vapor deposition precursors.
WO2026112016A1 Publication Date: 2026-05-28ENTEGRIS INC
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Patent Information
- Application Number
- PCT/US2025/055807
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-19
- Filing Date
- 2025-11-17
- Publication Date
- 2026-05-28
AI Technical Summary
Technical Problem
Conventional methods for synthesizing aluminum precursors involve the use of pyrophoric compounds, posing dangerous conditions due to their reactivity.
Method used
A method involving the reaction of an aluminum halide compound with an alkoxy aluminum compound, followed by a Grignard reagent, to form a vapor deposition precursor without using pyrophoric compounds.
Benefits of technology
This approach allows for the synthesis of aluminum precursors safely, eliminating the hazards associated with pyrophoric compounds and enabling the production of high-purity vapor deposition precursors.
✦ Generated by Eureka AI based on patent content.
Abstract
Methods for forming a vapor deposition precursor are provided. The method comprises contacting an aluminum halide compound, an alkoxy aluminum compound, and a Grignard reagent to form the vapor deposition precursor. The vapor deposition precursor comprises an dialkyl aluminum alkoxide compound. The vapor deposition precursor is formed without use of a pyrophoric compound. Related compositions, related precursors, and related methods are also provided, among other things.
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