Rotary shaft fluid supply device
The rotary shaft fluid supply device addresses contamination and leakage issues by using lip seals and purge channels to enhance sealing, ensuring reliable operation and preventing particle ingress in semiconductor processing systems.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- SEALINK
- Filing Date
- 2025-10-22
- Publication Date
- 2026-06-04
AI Technical Summary
Mechanical seal units in rotary shaft systems used in semiconductor substrate processing devices cause contamination and potential explosion due to lubricating oil leakage, and are prone to damage from particle penetration, leading to reduced lifespan and gas leakage risks.
A rotary shaft fluid supply device utilizing lip seals with curved lips and purge channels to seal the interface between rotating components, preventing fluid leakage and particle ingress under pressure and vacuum conditions, while replacing mechanical seals.
The device effectively seals the rotary shaft system, preventing fluid and particle leakage, enhancing sealing force, and ensuring reliable operation under varying conditions.
Smart Images

Figure KR2025016851_04062026_PF_FP_ABST
Abstract
Description
Rotating shaft fluid supply device
[0001] The present invention relates to a rotary shaft fluid supply device, and more specifically, to a rotary shaft fluid supply device capable of supplying fluid through a hollow rotary shaft that is housed within an inner housing, fixed to an outer housing, and rotates together with said outer housing.
[0002] A semiconductor substrate processing device is equipped with a chamber where a substrate processing process is performed and a susceptor on which a substrate is placed inside the chamber. Additionally, a shaft and a drive unit are provided for linear and / or rotational movement of the susceptor. Here, the drive unit is provided outside the chamber, and the shaft is provided penetrating the chamber.
[0003] Here, the shaft is equipped with a seal to seal the part that is coupled to the chamber. As the shaft moves in a linear motion and / or rotational motion, friction occurs between the shaft and the seal.
[0004] Conventionally, mechanical seal units have been used as such seal devices, but these mechanical seal units use lubricating oil, which causes oil to penetrate into the chamber, posing a risk of contamination and explosion. In particular, if powder is formed inside the reaction chamber, the powder can penetrate between the mechanical seals, which can cause a rapid reduction in lifespan. Mechanical seal units use surface contact materials such as carbon, silicon carbide, and cemented carbide, which have a problem in that damage to the contact surface can easily occur if small solid particles penetrate between the surface contacts.
[0005] If the seal is damaged by repeated friction, risks such as gas leakage may occur. In addition, because sudden changes in temperature and pressure inside the chamber can lead to emergency gas leakage, it is necessary to develop a device that can seal the shaft and the chamber even in emergency situations.
[0006] The objective of the embodiment of the present invention is to provide a rotary shaft fluid supply device capable of improving the problem of particle penetration through a linear contact method.
[0007] In addition, we aim to provide a rotary shaft fluid supply device that replaces mechanical seals while improving the sealing force between the housing and the shaft to prevent fluid leakage under pressure and vacuum conditions.
[0008] In addition, the invention aims to provide a rotary shaft fluid supply device capable of supplying fluid through a hollow rotary shaft that is housed within an inner housing, fixed to an outer housing, and rotates together with the outer housing.
[0009] The problems to be solved in the embodiments are not limited to those mentioned above, and other unmentioned problems will be clearly understood by those skilled in the art from the description below.
[0010] A rotary shaft fluid supply device according to one embodiment of the present invention comprises: a rotating hollow outer housing; an inner housing accommodated within the outer housing; a hollow rotary shaft accommodated within the inner housing and fixed to the outer housing to rotate together with the outer housing; a fluid supply port housing that accommodates one end of the rotary shaft and in which the rotary shaft rotates inside; a first sealing part that seals between the inner housing and the rotary shaft; and a second sealing part that seals between the fluid supply port housing and the rotary shaft; wherein the fluid supplied from the fluid supply port housing can be supplied to a fluid supply path inside the rotating hollow shaft.
[0011] In addition, each of the first sealing part and the second sealing part may include a plurality of lip seals having a curved lip formed on the inner circumference of the annular seal.
[0012] In addition, each of the above lip seals may be provided with a plurality of curved lip portions in a single body portion.
[0013] In addition, at least two of the plurality of curved ribs may be curved in different directions.
[0014] In addition, a power transmission unit capable of transmitting rotational power by connecting a gear or pulley may be provided on the outer circumference of the above-mentioned outer housing.
[0015] In addition, one or more of the first sealing part and the second sealing part may include a purge channel for discharging foreign substances around the seal to the outside.
[0016] Additionally, it may further include a first bearing portion for supporting the rotation of the hollow rotating shaft between the hollow rotating shaft and the inner housing; and a second bearing portion for supporting the rotation of the rotating shaft between the fluid supply port housing and the rotating shaft.
[0017] In addition, one end of the hollow rotating shaft is connected to a semiconductor loading unit of a semiconductor substrate processing device, and the fluid supplied to the fluid supply path of the rotating shaft can be supplied to the semiconductor substrate through the loading unit.
[0018] The rotary shaft fluid supply device according to an embodiment of the present invention can improve the problem of particle penetration through a linear contact method.
[0019] In addition, while replacing mechanical seals, it can improve the sealing force between the housing and the shaft, thereby preventing fluid leakage under pressure and vacuum conditions.
[0020] In addition, fluid can be supplied through a hollow rotating shaft that is accommodated within an inner housing, fixed to an outer housing, and rotates together with the outer housing.
[0021] FIG. 1 is a drawing showing a rotary shaft fluid supply device and a semiconductor substrate processing device according to one embodiment of the present invention.
[0022] FIG. 2 is a perspective view of a rotary shaft fluid supply device according to one embodiment of the present invention.
[0023] Figure 3 is a front view of the rotating shaft sealing device of Figure 2.
[0024] Figure 4 is a cross-sectional view of Figure 3.
[0025] FIG. 5 illustrates various lip seals that can be used for a rotating shaft fluid supply according to one embodiment of the present invention.
[0026] Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement the invention. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in order to clearly explain the embodiments of the present invention in the drawings, parts unrelated to the explanation have been omitted.
[0027] The terms used herein are used merely to describe specific embodiments and are not intended to limit the invention. Singular expressions may include plural expressions unless the context clearly indicates otherwise.
[0028] In this specification, terms such as “comprising,” “having,” or “having” are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not excluding in advance the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.
[0029] In addition, the following embodiments are provided to explain more clearly to those with average knowledge in the industry, and the shapes and sizes of the elements in the drawings may be exaggerated for clearer explanation.
[0030]
[0031] Hereinafter, a preferred embodiment according to the present invention will be described with reference to the attached drawings.
[0032] FIG. 1 is a drawing showing a rotary shaft fluid supply device and a semiconductor substrate processing device according to one embodiment of the present invention, and FIG. 2 is a perspective view of a rotary shaft fluid supply device according to one embodiment of the present invention. FIG. 3 is a front view of the rotary shaft sealing device of FIG. 2, and FIG. 4 is a cross-sectional view of FIG. 3.
[0033] First, referring to FIG. 1, a semiconductor substrate processing device (10) according to one embodiment of the present invention may include, for example, a rotary axis fluid supply device (100) and a chamber (20). Examples of the semiconductor substrate processing device (10) may include chemical vapor deposition equipment, furnace equipment, sputtering equipment, etching equipment, etc. In FIG. 1, sputtering equipment is illustrated. The semiconductor substrate processing device (10) may include a loading unit (susceptor; 22) capable of loading a semiconductor wafer inside the chamber (20) and a rotary axis fluid supply device (100) capable of supplying working fluid while rotating the loading unit (22). The rotary axis fluid supply device (100) can rotate the loading unit (22) at an appropriate speed while simultaneously preventing process gas inside the chamber (20) from leaking out of the chamber (20) or foreign substances from outside the chamber (20) from entering the chamber (20). In addition, working fluid can be supplied from the outside and supplied through the hollow shaft (130) and through the fluid supply hole provided in the loading unit (22).
[0034] Referring to FIGS. 2 to 4, a rotary shaft fluid supply device (100) according to one embodiment of the present invention is provided to rotate a semiconductor loading unit (22) and simultaneously supply working fluid into a chamber (20). The rotary shaft fluid supply device (100) may include an outer housing (110), an inner housing (120), a rotary shaft (130), a fluid supply port housing (140), a first sealing part (150), and a second sealing part (160).
[0035] The outer housing (110) is in the shape of a hollow structure, with one end open and the other end having a through hole into which a rotating shaft (130) can be inserted, and can accommodate an inner housing (120) and a rotating shaft (130) inside. The outer housing (110) can be rotated by receiving rotational power from a separate power transmission device. In one embodiment, a power transmission part (112) capable of transmitting rotational power by connecting a gear or a pulley may be provided on the outer circumference of the outer housing (110). In this embodiment, the power transmission part (112) may have a shape in which a protrusion is formed so that a pulley can be coupled, but is not limited thereto, and a gear part may be formed so that power can be transmitted through a power transmission device and a gear.
[0036] The inner housing (120) can be accommodated within the outer housing (110) and can rotate relative to the outer housing (110). More specifically, the inner housing (120) may not rotate, and only the outer housing (110) may rotate. The inner housing (120) may accommodate a rotating shaft (130) inside, and may be provided with a flange portion (122) that can be mounted to be fixed to the chamber (20) of the semiconductor substrate processing device (10). That is, the inner housing (120) is fixed to the chamber (20) and does not rotate, but the outer housing (110) can rotate by receiving rotational power from a power transmission device.
[0037] The rotating shaft (130) is housed within the inner housing (120) and coupled with the outer housing (110) so that it can rotate together with the outer housing (110). Although the method of coupling is not illustrated, they can be coupled in various ways to prevent mutual rotation, such as by separate bolt fastening, welding, or a coupling method by a structure in which rotation is prevented by the shape of the cross-section. One end of the rotating shaft (130) is connected to the semiconductor loading unit (22) of the semiconductor substrate processing device (10) to rotate the semiconductor loading unit (22). That is, the rotating shaft (130) can transmit rotational force to the semiconductor loading unit (22). In addition, the rotating shaft (130) has a hollow shape and can supply working fluid to the semiconductor loading unit (22) through a fluid supply channel (132) inside.
[0038] The fluid supply port housing (140) may be installed to accommodate one end of the rotating shaft (130) opposite to the chamber (20) while allowing the rotating shaft (130) to rotate inside. The fluid supply port housing (140) may also be a non-rotating structure, and the working fluid supplied from the outside through the fluid supply port (142) may pass through the fluid supply chamber (143) and then be supplied to the fluid supply path (132) of the rotating shaft (130) that communicates with it.
[0039] The first sealing portion (150) is provided to seal the space between the inner housing (120) and the rotating shaft (130). The first sealing portion (150) may include a plurality of seals disposed between the inner housing (120) and the rotating shaft (130) to seal the gap between the inner housing (120) and the rotating shaft (130). In this embodiment, the plurality of seals (150) may be composed of three, and each may be a lip seal having a curved lip formed on the inner circumference of an annular seal. Additionally, each lip seal (150) may have one or more curved lip portions provided on a single body portion. Thanks to the plurality of lip seals of the first sealing portion (150), gas or foreign matter within the chamber (20) can be prevented from being discharged to the outside through the rotating shaft fluid supply device (100). Likewise, thanks to the multiple lip seals of the first sealing part (150), external particles or foreign substances can be prevented from entering the chamber (20).
[0040] The second sealing portion (160) is provided to seal the space between the fluid supply port housing (140) and the rotating shaft (130). The second sealing portion (160) may include a plurality of seals disposed between the fluid supply port housing (140) and the rotating shaft (130) to seal the gap between the fluid supply port housing (140) and the rotating shaft (130). In this embodiment, the plurality of seals (160) may be composed of three, and each may be a lip seal having a curved lip formed on the inner circumference of an annular seal. Additionally, each lip seal (160) may have one or more curved lip portions provided on a single body portion. Thanks to the multiple lip seals of the second sealing part (160), the fluid in the fluid supply chamber (143) within the fluid supply port housing (140) is prevented from being discharged between the rotating shaft (130) and the fluid supply port housing (140), and can only flow through the fluid supply path (132) of the rotating shaft (130).
[0041] Meanwhile, a rotary shaft fluid supply device (100) according to one embodiment of the present invention may include a purge path (172, 170) for discharging foreign substances around the seal to the outside in one or more of the first sealing part (150) and the second sealing part (160). The first purge path (172) may include a purge path (172) provided within the inner housing (120) to prevent foreign substances from the chamber (20) of the semiconductor substrate processing device (10) from leaking out to the outside of the inner housing (120) of the rotary shaft fluid supply device (100). More specifically, when a pneumatic device is connected to the first purge path (172) to form negative pressure, particles (foreign substances) generated from the bearing (180), etc., placed between the inner housing (120) and the rotary shaft (130), or particles from the lip seal (150), etc., can be sucked in and removed. In addition, since the first purge channel (172) is in fluid communication with the gap between the rotating shaft (130) and the inner housing (120), the purge gas supplied through the first purge channel (172) can flow toward the first sealing part (150) and the chamber (20) through the gap, thereby preventing process gas from the chamber (20) from flowing into the gap. In addition, by forming negative pressure in the first purge channel (172) through an external pneumatic device, foreign substances formed in the gap can be sucked out to the outside.
[0042] The second purge passage (170) can prevent particles (foreign matter) generated from the bearing (190), etc., placed between the fluid supply port housing (140) and the rotating shaft (130), or particles from the lip seal (160), from accumulating. More specifically, when a pneumatic device is connected to the second purge passage (170) to form negative pressure, particles (foreign matter) generated from the bearing (190), etc., placed between the fluid supply port housing (140) and the rotating shaft (130), or particles from the lip seal (160), can be sucked in and removed.
[0043] Meanwhile, a rotary shaft fluid supply device (100) according to one embodiment of the present invention may include a first bearing part (180) and a second bearing part (190). The first bearing part (180) is provided between a hollow rotary shaft (130) and an inner housing (120) to support the rotation of the rotary shaft (130) within the inner housing (120), and the second bearing part (190) is provided between a fluid supply port housing (140) and a rotary shaft (130) to support the rotation of the rotary shaft (130) within the fluid supply port housing (140). Additionally, the first bearing part (180) may be provided in pairs of two at the top and bottom of the inner housing (120), and an annular spacer (182) may be provided between them. The annular spacer (182) may be composed of two concentric annular spacers, one of which may be mounted on the outer surface of the rotating shaft (132) and the other one may be mounted on the inner surface of the inner housing (120). Additionally, a locking nut (184) may be provided to fix the position of the lower bearing portion (180). Furthermore, the second bearing portion (190) may be provided at one end of the fluid supply port housing (140) on the outside of the second sealing portion (160) to prevent the fluid in the fluid supply chamber (143) of the fluid supply port housing (140) from coming into contact with the second bearing portion (190) and causing damage to the bearing.
[0044]
[0045] FIG. 5 illustrates various lip seals that can be used for a rotating shaft fluid supply according to one embodiment of the present invention.
[0046] Referring to FIG. 5, an example of the first lip seal portion (150) is shown, but since the same can be applied to the second lip seal portion (160), only the first lip seal portion (150) will be described below. Each lip seal (150) used in the rotating shaft fluid supply device (100) according to an embodiment of the present invention may be in the form in which a plurality of curved lip portions (154) are provided on a single body portion (152).
[0047] As illustrated in FIG. 5(a), when three lip seals (150) are used, the curving direction of the lip portions (154) is the same. As illustrated in FIG. 5(b), the curving directions of the lip portions (154A, 145B) among the plurality of lip seals (150) may be different from each other. As illustrated in FIG. 5(c), each lip seal (150) may include a plurality of lip portions (154), but at least two of the plurality of curved lip portions (154) may be curved in different directions. In the case of FIG. 5(a), when a vacuum is formed on the upper side, the lip portion (154) has a shape that is curved to the right to prevent foreign matter from flowing from the rotating shaft fluid supply device (100) side of the lip seal (150) into the chamber (20) side, and in the case of FIG. 5(b), it can be configured to respond even if a vacuum is formed in either the upper or lower direction, or so that if one lip portion (154A) is consumed or damaged, the other lip portion (154B) can respond.
[0048] In one embodiment, an annular anti-rotation member (156) may be provided on the outer surface facing the inner housing (120) of the lip seal (150) to prevent relative rotation with respect to the shaft (130) within the inner housing (120) of the lip seal (150). The anti-rotation member (156) serves to further press the lip seal (150) toward the inner housing (120). Additionally, compared to when the anti-rotation member (156) is absent, that is, when the lip seal (150) is in direct contact with the inner surface of the inner housing (120), the frictional force between the anti-rotation member (156) and the lip seal (150) is greater. Accordingly, relative rotation of the lip seal (150) with respect to the shaft (130) within the inner housing (120) can be suppressed.
[0049] In addition, when attempting to disassemble and reassemble the rotating shaft fluid supply device (100) for reasons such as damage or inspection, even if the surface roughness of the inner housing (120) is relatively rough, the anti-rotation member (156) is in friction with the inner surface of the inner housing (120) during the disassembly and reassembly process, so the sealing part (150) can minimize damage caused by the low surface roughness of the inner housing (120). In addition, since there is an advantage that the anti-rotation member (156) can be reused even if it is damaged to some extent, the rotating shaft fluid supply device (100) can be disassembled and reassembled more easily.
[0050] The rotary shaft fluid supply device according to the above-described embodiment can improve the problem of particle penetration through a linear contact method. In addition, while replacing a mechanical seal, it can prevent fluid leakage under pressure and vacuum conditions by improving the sealing force between the housing and the shaft, and can supply fluid through a hollow rotary shaft that is housed within an inner housing, fixed to an outer housing, and rotates together with the outer housing.
[0051] Although the present invention has been described above with specific details such as specific components, limited embodiments, and drawings, this is provided only to aid in a more comprehensive understanding of the invention, and the invention is not limited to the above embodiments, and a person skilled in the art to which the invention belongs can make various modifications and variations from this description.
[0052] Accordingly, the scope of the present invention should not be limited to the embodiments described above, and all modifications equivalent to or equivalent to the claims set forth below, as well as the claims described below, shall be considered to fall within the scope of the concept of the present invention.
Claims
1. As a rotary shaft fluid supply device, Rotating hollow outer housing; An inner housing accommodated within the above outer housing; A hollow rotating shaft accommodated within the inner housing and fixed to the outer housing, rotating together with the outer housing; A fluid supply port housing that accommodates one end of the aforementioned rotating shaft, wherein the rotating shaft rotates inside; A first sealing part that seals between the inner housing and the rotating shaft; and It includes a second sealing part that seals between the fluid supply port housing and the rotating shaft; and A rotating shaft fluid supply device in which the fluid supplied from the above fluid supply port housing is supplied to the fluid supply path inside the rotating hollow shaft.
2. In Paragraph 1, A rotary shaft fluid supply device wherein each of the first sealing part and the second sealing part comprises a plurality of lip seals having a curved lip formed on the inner circumference of an annular seal.
3. In Paragraph 2, A rotary shaft fluid supply device in which each of the above lip seals is provided with a plurality of curved lip portions in a single body portion.
4. In Paragraph 3, A rotary axis fluid supply device in which at least two of the plurality of curved lip portions are curved in different directions.
5. In Paragraph 1, A rotary shaft fluid supply device having a power transmission part connected to a gear or pulley on the outer circumference of the above-mentioned outer housing to transmit rotational power.
6. In Paragraph 1, A rotary shaft fluid supply device comprising, in one or more of the first sealing part and the second sealing part, a purge channel for discharging foreign matter around the seal to the outside.
7. In Paragraph 1, Between the hollow rotating shaft and the inner housing, a first bearing portion for supporting the rotation of the hollow rotating shaft; and A rotating shaft fluid supply device further comprising a second bearing portion for supporting the rotation of the rotating shaft between the fluid supply port housing and the rotating shaft.
8. In Paragraph 1, One end of the above hollow rotating shaft is connected to a semiconductor loading unit of a semiconductor substrate processing device, and A rotary shaft fluid supply device in which the fluid supplied to the fluid supply path of the rotary shaft is supplied to the semiconductor substrate through the loading unit.