Resist composition, resist pattern formation method, compound, acid generator, acid diffusion control agent, and high molecular compound

Abstract

The present invention adopts a resist composition which generates acid when exposed to light and the solubility of which in a developing solution is changed by the action of the acid. The resist composition contains a compound containing a cation represented by general formula (c0). In the formula, R01 and R02 each independently represent an aryl group that may have a substituent, an alkyl group that may have a substituent, or an alkenyl group that may have a substituent. R01 and R02 may be bonded to each other to form a ring together with a sulfur atom in the formula. R03 represents a substituent. k is an integer from 0 to 3. According to this resist composition, higher sensitivity can be achieved, lithography characteristics such as roughness reduction can be enhanced, and the occurrence of defects can be suppressed.

Claims

A resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, A resist composition containing a compound comprising a cation represented by the following general formula (c0). [In the formula, R ０１ and R ０２ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０１ and R ０２ These may bond with each other to form a ring together with the sulfur atom in the formula. ０３ represents a substituent. k is an integer between 0 and 3. A base component (A) whose solubility in the developer changes due to the action of acid, An acid-generating agent component (B) that generates acid upon exposure, It contains, The resist composition according to claim 1, wherein the acid generating agent component (B) comprises a compound represented by the following general formula (b0). [In the formula, Mc ＋ Xb is a cation represented by the general formula (c0) above. － This is at least one anion selected from the group consisting of anions represented by any of the following general formulas: (b-an-1), (b-an-2), and (b-an-3). [In the formula, R １０１ and R １０４ ~R １０８ are each independently a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent. R １０４ and R １０５ may be bonded to each other to form a ring structure. R １０２ is a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. Y １０１ is a divalent linking group containing an oxygen atom or a single bond. V １０１ ~V １０３ are each independently an alkylene group, a fluorinated alkylene group or a single bond. However, Y １０１ and V １０１ do not simultaneously become a single bond. L １０１ and L １０２ are each independently an oxygen atom or a single bond. L １０３ ~L １０５ are each independently -CO-, -SO ２ - or a single bond.] 　 A base component (A) whose solubility in the developer changes due to the action of acid, An acid diffusion control agent component (D) that controls the diffusion of acid generated by exposure, It contains, The resist composition according to claim 1, wherein the acid diffusion control agent component (D) comprises a compound represented by the following general formula (d0). [In the formula, Mc ＋ Xd is a cation represented by the general formula (c0) above. － This is at least one anion selected from the group consisting of anions represented by any of the following general formulas: (d1-an-1), (d1-an-2), and (d1-an-3). [In the formula, Rd １ ~Rd ４ Each of these is independently an optionally substituted cyclic group, an optionally substituted linear alkyl group, or an optionally substituted linear alkenyl group. However, Rd in formula (d1-an-2) ２ In this example, assume that no fluorine atom is bonded to the carbon atom adjacent to the sulfur atom. １ This is a divalent linking group or a single bond. It contains a resin component (A1) whose solubility in the developer changes due to the action of acid, The resist composition according to claim 1, wherein the resin component (A1) has a constituent unit derived from a compound represented by the following general formula (a0-m). [In the formula, W ０ This represents a polymerizable group-containing group. ０ Rx represents a divalent linking group. － Mc is an anionic group. ＋ This is a cation represented by the general formula (c0) mentioned above. A method for forming a resist pattern, comprising the steps of: forming a resist film on a support using a resist composition according to any one of claims 1 to 4; exposing the resist film; and developing the exposed resist film to form a resist pattern. 　 A compound containing a cation represented by the following general formula (c0). [In the formula, R ０１ and R ０２ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０１ and R ０２ These may bond with each other to form a ring together with the sulfur atom in the formula. ０３ represents a substituent. k is an integer between 0 and 3. An acid generator containing a compound represented by the following general formula (b0). [In the formula, Mc ＋ Xb is a cation represented by the following general formula (c0): － This is at least one anion selected from the group consisting of anions represented by any of the following general formulas: (b-an-1), (b-an-2), and (b-an-3). [In the formula, R ０１ and R ０２ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０１ and R ０２ These may bond with each other to form a ring together with the sulfur atom in the formula. ０３ represents a substituent. k is an integer between 0 and 3. R １０１ and R １０４ ~R １０８ Each of these is independently a cyclic group which may have substituents, a linear alkyl group which may have substituents, or a linear alkenyl group which may have substituents. １０４ and R １０５ These may bond to each other to form a ring structure. １０２ This is a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom. １０１ This is a divalent linking group or single bond containing an oxygen atom. １０１ ~V １０３ Each of these is independently an alkylene group, a fluorinated alkylene group, or a single bond. However, Y １０１ and V １０１ It is impossible for them to be single bonds at the same time. １０１ and L １０２ Each of these is independently either an oxygen atom or a single bond. １０３ ~L １０５ These are, independently, -CO- and -SO-. ２ - Or it is a single bond. 　 An acid diffusion control agent comprising a compound represented by the following general formula (d0). [In the formula, Mc ＋ Xd is a cation represented by the following general formula (c0): － This is at least one anion selected from the group consisting of anions represented by any of the following general formulas: (d1-an-1), (d1-an-2), and (d1-an-3). [In the formula, R ０１ and R ０２ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０１ and R ０２ These may bond with each other to form a ring together with the sulfur atom in the formula. ０３ represents a substituent. k is an integer between 0 and 3. Rd １ ~Rd ４ Each of these is independently an optionally substituted cyclic group, an optionally substituted linear alkyl group, or an optionally substituted linear alkenyl group. However, Rd in formula (d1-an-2) ２ In this example, assume that no fluorine atom is bonded to the carbon atom adjacent to the sulfur atom. １ This is a divalent linking group or a single bond. 　 A polymer compound having a constituent unit derived from a compound represented by the following general formula (a0-m). [In the formula, W ０ This represents a polymerizable group-containing group. ０ Rx represents a divalent linking group. － Mc is an anionic group. ＋ This is a cation represented by the following general formula (c0). [In the formula, R ０１ and R ０２ Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. ０１ and R ０２ These may bond with each other to form a ring together with the sulfur atom in the formula. ０３ represents a substituent. k is an integer between 0 and 3.

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