Resist composition

Abstract

The present application relates to novel compositions, methods for producing a resist film, methods for producing a resist pattern, methods for producing a processed substrate, methods for producing a device, and uses of the composition thereof. The formulation may exhibit at least one of properties as an advanced material or as a high performance material. The formulation may be used in the nanotechnology process to make semiconductor device / display device application, for example semiconductor chip, or a liquid crystal, quantum dot, OLED display fabricated on a substrate controlled by semiconductors.

Description

[0001] Foreignfiling text P24-234 20251216

[0002] - 1 -

[0003] Resist Composition

[0004] FIELD OF THE INVENTION

[0005] The present application relates to novel compositions, methods for producing a resist film, methods for producing a resist pattern, methods for 5

[0006] producing a processed substrate, methods for producing a device, and uses of a novel composition for producing a resist film.

[0007] BACKGROUND OF THE INVENTION

[0008] In recent years, the need for high integration of LSIs has been increasing, and miniaturization of patterns is required of the system. This high integration enables miniaturization and high speed, which greatly contributes to improving the performance of electronic devices such as computers, smartphones, and network devices. Miniaturization technologies typically include KrF excimer laser, ArF excimer laser, 15

[0009] extreme ultraviolet (EUV), X-ray, lithography processes using electron beams, etc. are being performed.

[0010] PRIOR ART DOCUMENTS PATENT DOCUMENTS

[0011] 20

[0012] [Patent document 1] JP 2020-158623 A

[0013] [Patent document 2] US 2011-097668 A

[0014] Patent Document 1 studies hardening compositions that include boron nitride atoms and bisarylfluorene derivatives with epoxy groups as hardeners.

[0015] Patent Document 2 studies negative-tone resists comprising a core part, functional groups bonded to the core part, and a photosensitive molecular glass containing a photosensitive unit.Foreignfiling text P24-234 20251216

[0016] -2 -

[0017] SUMMARY OF THE INVENTION

[0018] The inventors newly have found that there are still one or more of considerable problems for which improvement is desired, as listed below: providing a resist pattern with sufficient local critical dimension uniformity (LCDU), providing a resist film with a sufficiently low dose to size (DtS), 5

[0019] providing a resist film with sufficient resolution, providing a resist pattern with sufficiently low line width roughness (LWR), providing a resist film with sufficiently low optimal exposure dose, providing a resist pattern with sufficient fineness, providing a resist pattern with sufficient etching resistance, providing a resist film with sufficient resolution when using an exposure machine with increased numerical apertures, providing a resist pattern with a reduced pattern width variation, providing a resist pattern with sufficiently high aspect ratio, providing a resist film with sufficient process window, and providing a resist film with sufficient yield in manufacturing. 15

[0020] The inventors aimed to solve one or more of the above-mentioned problems.

[0021] Then, the present inventors have surprisingly found that one or more of the above-described technical problems can be solved by the features as defined in the claims.

[0022] 20

[0023] Namely, it is found a new composition comprising compound (A) represented by formula (1a) and compound (B) represented by formula (1b), wherein the compound (A) is different from the compound (B):Foreignfiling text P24-234 20251216

[0024] (1a)

[0025] 5

[0026]

[0027] where ml and m2 are each independently 1 or 0, preferably 0;

[0028] n1 and n2 are each independently 0 or 1;

[0029] X1is CpH2p-n1-n2or C6+4(q-1)H4+2(q-1)-n1-n2, preferably CpH2p-n1-n2;

[0030] 15

[0031] p is 1 to 6, preferably 1 to 3, more preferably 1 or 2;

[0032] q is 1 to 3, preferably 1;

[0033] one or more H of X1may be each independently replaced with C1-5 alkyl; preferably replaced with linear C1-5 alkyl or branched C3-5 alkyl; more preferably replaced with methyl, ethyl, n-propyl or isopropyl; further

[0034] 20

[0035] preferably replaced with methyl;

[0036] R1to R20, Q1, Q2, Q3and Q4are each independently H, F, Cl, Br, I, C1-15 alkyl, C6-15aryl, Y1, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15alkyl, branched C3-15alkyl, cyclic C3-15alkyl, C6-15aryl, Y1, COOH or OH; more preferably H, I, linear C1-10alkyl, branched C3-10alkyl, cyclic C3-10alkyl, C6-15aryl or Y1; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y1;

[0037] one or more non-adjacent -CH2- of R1to R20, Q1, Q2, Q3and Q4may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -C≡C-;Foreignfiling text P24-234 20251216

[0038] -4 -

[0039] R21and R22are each independently H or C1-10 alkyl; preferably H, linear Ci- 10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl;

[0040] one or more H of R1to R20, Q1, Q2, Q3and Q4may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;

[0041] 5

[0042] R5and R10may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R5and R10form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -C≡C-;

[0043] R11and R16may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R11and R16form with each other may be replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - O-CO-, -O-CO-O-, -CR21=CR22- or -CEC-;

[0044] when n1 and n2 are 0, R5, R10and X1may form C1-6 saturated hydrocarbon group with each other;

[0045] 15

[0046] one or more non-adjacent -CH2- of the saturated hydrocarbon group R5, R10and X1form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22-, or -C≡C-; when m1=1 and m2=1, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; 20

[0047] preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1;

[0048] when m1=1 and m2=0, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6, R7, R8, R9and R10are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1; when m1=0 and m2=1, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each

[0049] 30

[0050] independently Y1; more preferably R3and R8are each independently Y1;Foreignfiling text P24-234 20251216

[0051] - 5 -

[0052] when m1=0 and m2=0, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9and R10are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1; and

[0053] when n1 =1, preferably at least one of R11, R12, R13, R14and R15is Y1; more 5

[0054] preferably at least one of R12to R14is Y1;

[0055] when n2=1, preferably at least one of R16, R17, R18, R19and R20is Y1; more preferably at least one of R17, R18and R19is Y1;

[0056] Y1is represented by formula (2);

[0057] (2)

[0058]

[0059] where na1=0 or 1;

[0060] L1is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-;

[0061] L3and L4are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene;

[0062] one or more non-adjacent -CH2- of L1may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L1is not methylene;

[0063] one or more H of L1may be each independently replaced with

[0064] C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;

[0065] L2is each independently C1-10 alkylene; preferably linear C1-10 alkylene, 30 branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene; andForeignfiling text P24-234 20251216

[0066] RA1is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH;

[0067] (1b)

[0068] 5

[0069]

[0070] where m3 and m4 are each independently 1 or 0, preferably 0;

[0071] 15 n3 and n4 are each independently 0 or 1;

[0072] X2is CrH2r-n3-n4or C6+4(s-1)H4+2(s-1)-n3-n4, preferably CrH2r-n3-n4;

[0073] r is 1 to 6, preferably 1 to 3, more preferably 1 or 2;

[0074] s is 1 to 3, preferably 1;

[0075] one or more H of X2may be each independently replaced with C1-5 alkyl; 20 preferably replaced with linear C1-5 alkyl or branched C3-5 alkyl; more preferably replaced with methyl, ethyl, n-propyl, or isopropyl; further preferably replaced with methyl;

[0076] R23to R42, Q5, Q6, Q7and Q8are each independently H, F, Cl, Br, I, C1-15 alkyl, C6-15aryl, Y2, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15alkyl, branched C3-15alkyl, cyclic C3-15alkyl, C6-15aryl, Y2, COOH or OH; more preferably H, I, linear C1-10alkyl, branched C3-10alkyl, cyclic C3-10alkyl, C6-15aryl or Y2; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y2;

[0077] one or more non-adjacent -CH2- of R23to R42, Q5, Q6, Q7and Q8may be 30 each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-;Foreignfiling text P24-234 20251216

[0078] - 7 -

[0079] R43and R44are each independently H or C1-10 alkyl; preferably H, linear Ci- 10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl;

[0080] one or more H of R23to R42and Q5, Q6, Q7and Q8may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH; 5

[0081] R27and R32may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R27and R32form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-;

[0082] R33and R38may form a single bond or C1-6 alkylene with each other;

[0083] 10

[0084] one or more non-adjacent -CH2- of the alkylene R33and R38form with each other may be replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - O-CO-, -O-CO-O-, -CR43=CR44- or -CEC-;

[0085] when n3 and n4 are 0, R27, R32and X2may form C1-6 saturated hydrocarbon group with each other;

[0086] one or more non-adjacent -CH2- of the saturated hydrocarbon group R27, R32and X2form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-; when m3=1 and m4=1, at least one of R23, R24, R25, R26, R27, Q5and Q6and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each

[0087] 20

[0088] independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2;

[0089] when m3=1 and m4=0, at least one of R23, R24, R25, R26, R27, Q5and Q6and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2;

[0090] when m3=0 and m4=1, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each independently Y2; 30

[0091] preferably at least one of R24and R25and / or at least one of R29and R30areForeignfiling text P24-234 20251216

[0092] each independently Y2; more preferably R25and R30are each independently Y2;

[0093] when m3=0 and m4=0, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are 5

[0094] each independently Y2; more preferably R25and R30are each independently Y2; and

[0095] when n3=1, preferably at least one of R33, R34, R35, R36and R37is Y2; more preferably at least one of R34, R35and R36is Y2;

[0096] when n4=1, preferably at least one of R38, R39, R40, R41and R42is Y2; more 10

[0097] preferably at least one of R39, R40and R41is Y2;

[0098] Y2is represented by formula (3);

[0099] (3)

[0100] L6

[0101] —L5na2

[0102]

[0103] L7

[0104] where na2=0 or 1;

[0105] L5is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single 20

[0106] bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-;

[0107] L7and L8are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene;

[0108] one or more non-adjacent -CH2- of L5may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L5is not methylene;

[0109] one or more H of L5may be each independently replaced with

[0110] 30

[0111] C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;Foreignfiling text P24-234 20251216

[0112] - 9 -

[0113] L6is each independently C1-10 alkylene; preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene; and RA2is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

[0114] 5

[0115] In another aspect, the present invention further relates to a method for producing a resist film comprising steps (1a) and (1b):

[0116] (la) applying the composition of the present invention above a substrate, preferably directly or via one or more of the underlayers on a substrate; preferably by spin-coating at the RPM (revolutions per minute) in the range from 500 to 3,000rpm for the time in the range from 5 to 100sec, more preferably at the RPM in the range from 600 to 2,500rpm for the time in the range from 10 to 70sec, further preferably at the RPM in the range from 700 to 1,900rpm for the time in the range from 10 to 50sec;

[0117] 15

[0118] (lb) heating the applied composition preferably at the temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 60 to 180°C, preferably for the time in the range from 1 to 400min, more preferably 3 to 200min, further preferably 5 to 120min.

[0119] 20

[0120] In another aspect, the present invention furthermore relates to a method for producing a resist pattern comprising steps (2a), (2b), (2c) and (2d):

[0121] (2a) producing a resist film by the method of the present invention;

[0122] (2b) exposing the resist film, preferably with light having the peak wavelength in the range from 10 to 300nm, more preferably 13.5 to 248nm;

[0123] (2c) heating the exposed resist film preferably at the temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 50 to 200°C, preferably for the time in the range from 1 to 400min, more preferably 3 to 200min, further preferably 5 to 120min;

[0124] (2d) developing the exposed resist film.

[0125] 30Foreignfiling text P24-234 20251216

[0126] - 10 -

[0127] In another aspect, the present invention furthermore relates to a method for producing a processed substrate comprising steps (3a) and (3b):

[0128] (3a) producing a resist pattern by the method of the present invention;

[0129] (3b) processing a substrate by using the resist pattern as a mask by etching.

[0130] 5

[0131] In another aspect, the present invention furthermore relates to a method for producing a processed substrate comprising steps (4a) and (4b) or (4c): (4a) producing a resist pattern by the method of the present invention;

[0132] (4b) performing ion implantation using the resist pattern as a mask;

[0133] (4c) processing an underlayer beneath the resist pattern using the resist pattern as a mask to form an underlayer pattern, and performing ion implantation using the underlayer pattern as a mask.

[0134] In another aspect, the present invention furthermore relates to a method for producing a device comprising the method of the present invention,

[0135] 15

[0136] wherein the method further comprises a step of forming wiring on the processed substrate;

[0137] wherein the device preferably is a semiconductor device.

[0138] In another aspect, the present invention furthermore relates to use of the 20

[0139] composition of the present invention for producing a resist film.

[0140] TECHNICAL EFFECTS OF THE INVENTION

[0141] The present invention may provide one or more of the following effects: LCDU of a resist pattern is sufficient, DtS of a resist film is sufficiently low, resolution of a resist film is sufficient, LWR of a resist pattern is sufficiently low, optimal exposure dose to form a resist pattern is sufficiently low, fineness of a resist pattern is sufficient, etching resistance of a resist pattern is sufficient, resolution of a resist film when using an exposure machine with increased numerical apertures is sufficient, a resist pattern with a reduced pattern width variation is obtainable, aspect ratio of a resist 30

[0142] pattern is sufficiently high, process window of a resist film is sufficient, and yield in manufacturing is improved.Foreignfiling text P24-234 20251216

[0143] - 11 -

[0144] [Definition of the terms]

[0145] Unless otherwise specified in the present specification, the definitions and examples described in this paragraph are followed.

[0146] 5

[0147] The singular form includes the plural form and “one” or “that” means “at least one”. An element of a concept can be expressed by a plurality of species, and when the amount (for example, mass% or mol%) is described, it means sum of the plurality of species. “And / or” includes a combination of all elements and also includes single use of the element.

[0148] When a numerical range is indicated using “to”

[0149]

[0150] or it includes both endpoints and units thereof are common. For example, 5 to 25 mol% means 5 mol% or more and 25 mol% or less.

[0151] The descriptions such as “Cx-y”, “Cx-Cy” and “Cx” mean the number of

[0152] 15

[0153] carbons in a molecule or substituent. For example, C1-6 alkyl means an alkyl chain having 1 or more and 6 or less carbons (methyl, ethyl, propyl, butyl, pentyl, hexyl etc.).

[0154] When a polymer has a plural type of repeating units, these repeating units 20

[0155] copolymerize. The copolymerization of these repeating units is any of alternating copolymerization, random copolymerization, block copolymerization, graft copolymerization, ora mixture thereof. When polymer or resin is represented by a structural formula, n, m or the like that is attached next to parentheses indicate the number of repetitions.

[0156] Celsius is used as the temperature unit. For example, 20 degrees means 20 degrees Celsius.

[0157] The additive refers to a compound itself having a function thereof (for example, in the case of a base generator, a compound itself that generates a 30

[0158] base). An embodiment in which the compound is dissolved or dispersed in a solvent and added to a composition is also possible.Foreignfiling text P24-234 20251216

[0159] - 12 -

[0160] DETAILED DESCRIPTION OF THE INVENTION

[0161] Hereinafter, embodiments of the present invention are described in detail.

[0162] [Composition]

[0163] 5

[0164] The present invention relates to a composition (hereinafter, referred to as “the composition”) comprising, essentially consisting of, or consisting of compound (A) and compound (B), wherein the compound (A) is different from the compound (B).

[0165] In a preferable embodiment of the present invention, the composition is to be used as a photoresist composition, more preferably as a negative photoresist composition, further preferably as a negative photoresist composition photosensitive to EUV or electron beam, furthermore preferably as a negative photoresist composition photosensitive to EUV.

[0166] 15

[0167] In the present invention, the EUV means a light with a peak wavelength in the range from 13 to 14nm, more preferably 13.5 nm. The electron beam means a light with a peak wavelength in the range from 0.10 to 0.20nm. 20

[0168] - Compounds (A) and (B)

[0169] The composition comprises the compound (A) represented by the formula (1a).

[0170] 30Foreignfiling text P24-234 20251216

[0171] (1a)

[0172] 5

[0173]

[0174] ml and m2 are each independently 1 or 0, preferably 0.

[0175] n1 and n2 are each independently 0 or 1, preferably 0.

[0176] X1is CpH2p-n1-n2or C6+4(q-1)H4+2(q-1)-n1-n2, preferably CpH2p-n1-n2. p is 1 to 6, preferably 1 to 3, more preferably 1 or 2.

[0177] 15 q is 1 to 3, preferably 1.

[0178] One or more H of X1may be each independently replaced with C1-5 alkyl; preferably one or more H of X1is replaced with linear C1-5 alkyl or branched C3-5 alkyl; more preferably one H of X1is replaced with methyl, ethyl, n-propyl or isopropyl; further preferably one H of X1is replaced with methyl.

[0179] 20 R1to R20, Q1, Q2, Q3and Q4are each independently H, F, Cl, Br, I, C1-15alkyl, C6-15aryl, Y1, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15 or C3-15 cyclic alkyl, Ce-15 aryl, Y1, COOH or OH; more preferably H, I, linear C1-10 alkyl, branched C3-10 alkyl, cyclic C3-10 alkyl, Ce-15 aryl or Y1; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y1; furthermore preferably H, I, methyl, ethyl, or Y1.

[0180] One or more non-adjacent -CH2- of R1to R20, Q1, Q2, Q3and Q4may be each independently replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, - CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -C=C-; preferably none of -CH2- of R1to R20, Q1, Q2, Q3and Q4is replaced with any other group.

[0181] 30Foreignfiling text P24-234 20251216

[0182] - 14 -

[0183] R21and R22are each independently H or C1-10 alkyl; preferably H, linear C1-10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl; further preferably H, methyl or ethyl.

[0184] One or more H of R1, R3, R4, R5, R6, R8to R20, Q1, Q2, Q3and Q4may be each independently replaced with C6-15 aryl, -OC6H5, F, Cl, Br, I, COOH or 5

[0185] OH; preferably none of H of R1, R3, R4, R5, R6, R8to R20, Q1, Q2, Q3and Q4is replaced with any other group.

[0186] One or more H of R2and R7may be each independently replaced with C6-15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably one or more H of R2and R7are each independently replaced with OH; more preferably one H of R2and R7are each independently replaced with OH.

[0187] R5and R10may form a single bond or C1-6 alkylene with each other; preferably R5and R10form a single bond with each other.

[0188] One or more non-adjacent -CH2- of the alkylene R5and R10form with each other may be replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - 15

[0189] O-CO-, -O-CO-O-, -CR21=CR22- or -C=C-; preferably none of -CH2- of the alkylene R5and R10form with each other is replaced with any other group. R11and R16may form a single bond or C1-6 alkylene with each other; preferably R11and R16may form a single bond with each other.

[0190] One or more non-adjacent -CH2- of the alkylene R11and R16form with each 20

[0191] other may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - O-CO-, -O-CO-O-, -CR21=CR22- or -C=C-; preferably none of -CH2- of the alkylene R11and R16form with each other is replaced with any other group. When n1 and n2 are 0, R5, R10and X1may form C1-6 saturated hydrocarbon group with each other; preferably R5, R10and X1form C3 saturated hydrocarbon group with each other.

[0192] One or more non-adjacent -CH2- of the saturated hydrocarbon group R5, R10and X1form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22-, or -C≡C-; preferably one -CH2- of the saturated hydrocarbon group R5, R10and X1form 30

[0193] with each other is replaced with phenylene.Foreignfiling text P24-234 20251216

[0194] - 15 -

[0195] When m1=1 and m2=1, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1.

[0196] 5

[0197] When m1=1 and m2=0, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6, R7, R8, R9and R10are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1. When m1=0 and m2=1, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1. When m1=0 and m2=0, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9and R10are each independently Y1; preferably at least 15

[0198] one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1.

[0199] When n1 =1, preferably at least one of R11, R12, R13, R14and R15is Y1; more preferably at least one of R12, R13and R14is Y1.

[0200] When n2=1, preferably at least one of R16, R17, R18, R19and R20is Y1; more 20

[0201] preferably at least one of R17, R18and R19is Y1.

[0202] Y1is represented by formula (2):

[0203] (2)

[0204]

[0205] where na1=0 or 1, preferably 0.

[0206] 30 L1is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, -Foreignfiling text P24-234 20251216

[0207] - 16 -

[0208] CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-.

[0209] L3and L4are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene.

[0210] 5

[0211] One or more non-adjacent -CH2- of L1may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L1is not methylene; preferably none of -CH2- of L1is replaced with any other group.

[0212] One or more H of L1may be each independently replaced with C6-15 aryl, - OC6H5, F, Cl, Br, I, COOH or OH; preferably none of H of L1is replaced with any other group.

[0213] L2is C1-10 alkylene; preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or linear propylene.

[0214] RA1is H, C1-5 alkyl or -CH2OH; preferably H, C1-5 linear alkyl, C3-5 branched alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

[0215] In another preferable embodiment of the present invention, at least one of R1to R20, Q1, Q2, Q3and Q4may be a group represented by formula (1aa): (1aa)

[0216] paa1

[0217]

[0218] Raa1, Raa2and Raa3are each independently C1-5 alkyl or C6-20 aryl; preferably linear C1-5 alkyl, branched C3-5 alkyl, cyclic C3-5 alkyl, phenyl or naphthyl; more preferably methyl, ethyl or phenyl.

[0219] One or more H of Raa1, Raa2and Raa3may be each independently replaced 30

[0220] with F, Cl, Br, I, OH or Y1. Preferably two H atoms of at least one of Raa1and Raa2is respectively replaced with I and Y1.Foreignfiling text P24-234 20251216

[0221] - 17 -

[0222] In another preferable embodiment of the present invention, Y1may be replaced with a group represented by (1bb):

[0223] (1bb) -Lbb1-Lbb2-(O)nbu-CH=CH2

[0224] nb11 is 0 or 1, preferably 1;

[0225] 5

[0226] Lbb1is -0- or -CO-O-;

[0227] Lbb2is C1-5 alkylene, preferably methylene or ethylene.

[0228] In a preferable embodiment of the present invention, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9and R10and / or at least one of R11, R12, R13, R14R15and / or at least one of R16, R17, R18, R19and R20of the compound (A) are each independently selected from one member of the group consisting of F, Cl, Br, I, and OH; preferably at least one of R1, R2, R4and R5and / or at least one of R6, R7, R9and R10and / or at least one of R11, 15

[0229] R12, R14and R15and / or at least one of R16, R17, R19and R20of the compound (A) are each independently selected from one member of the group consisting of F, Cl, Br, I, and OH.

[0230] The composition further comprises the compound (B) represented by the 20

[0231] formula (1b):

[0232] (1b)

[0233] 30

[0234]

[0235] Foreignfiling text P24-234 20251216

[0236] - 18 -

[0237] where m3 and m4 are each independently 1 or 0, preferably 0.

[0238] n3 and n4 are each independently 0 or 1, preferably 1.

[0239] X2is CrH2r-n3-n4or C6+4(s-1)H4+2(s-1)-n3-n4, preferably CrH2r-n3-n4. r is 1 to 6, preferably 1 to 3, more preferably 0 or 1.

[0240] s is 1 to 3, preferably 1.

[0241] 5

[0242] One or more H of X2may be each independently replaced with C1-5 alkyl; preferably one or more H of X2is replaced with linear C1-5 alkyl or branched C3-5 alkyl; more preferably one or more H of X1is replaced with methyl, ethyl, n-propyl, isopropyl; further preferably one H of X1is replaced with methyl. R23to R42, Q5, Q6, Q7and Q8are each independently H, F, Cl, Br, I, C1-15 alkyl, C6-15aryl, Y2, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15alkyl, branched C3-15alkyl, cyclic C3-15alkyl, C6-15aryl, Y2, COOH or OH; more preferably H, I, linear C1-10alkyl, branched C3-10alkyl, cyclic C3-10alkyl, C6-15aryl or Y2; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y2; furthermore preferably H, I, methyl, ethyl, or Y2.

[0243] 15

[0244] One or more non-adjacent -CH2- of R23to R42, Q5, Q6, Q7and Q8may be each independently replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, - CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C=C-; preferably none of -CH2- of R23to R42, Q5, Q6, Q7and Q8is replaced with any other group.

[0245] R43and R44are each independently H or C1-10 alkyl; preferably H, linear C1-10 20

[0246] alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl; further preferably H, methyl or ethyl.

[0247] One or more H of R23, R25, R26, R27, R28, R30to R42, Q5, Q6, Q7and Q8may be each independently replaced with C6-15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of H of preferably none of H of R23, R25, R26, R27, R28, R30to R42, Q5, Q6, Q7and Q8is replaced with any other group.

[0248] One or more H of R24and R29may be each independently replaced with C6- 15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably one or more H of R24and R29are each independently replaced with OH; more preferably one H of R24and R29are each independently replaced with OH.

[0249] 30

[0250] R27and R32may form a single bond or C1-6 alkylene with each other; preferably R27and R32form a single bond with each other.Foreignfiling text P24-234 20251216

[0251] - 19 -

[0252] One or more non-adjacent -CH2- of the alkylene R27and R32form with each other may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - O-CO-, -O-CO-O-, -CR43=CR44- or -C=C-; preferably none of -CH2- of the alkylene R27and R32form with each other is replaced with any other group. R33and R38may form a single bond or C1-6 alkylene with each other;

[0253] 5

[0254] preferably R33and R38form a single bond with each other.

[0255] One or more non-adjacent -CH2- of the alkylene R33and R38form with each other may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, - O-CO-, -O-CO-O-, -CR43=CR44- or -C=C-; preferably none of -CH2- of the alkylene R33and R38form with each other is replaced with any other group. When n3 and n4 are 0, R27, R32and X2may form C1-6 saturated hydrocarbon group with each other; preferably R27, R32and X2form C3 saturated hydrocarbon group with each other.

[0256] One or more non-adjacent -CH2- of the saturated hydrocarbon group R27, R32and X2form with each other may be replaced with Ce-15 arylene, -O-, - 15

[0257] C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-; preferably one -CH2- of the saturated hydrocarbon group R27, R32and X2form with each other is replaced with phenylene.

[0258] When m3=1 and m4=1, at least one of R23, R24, R25, R26R27, Q5and Q6and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each

[0259] 20

[0260] independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2.

[0261] When m3=1 and m4=0, at least one of R23, R24, R25, R26R27, Q5and Q6and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2.

[0262] When m3=0 and m4=1, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each independently Y2; 30

[0263] preferably at least one of R24and R25and / or at least one of R29and R30areForeignfiling text P24-234 20251216

[0264] each independently Y2; more preferably R25and R30are each independently Y2.

[0265] When m3=0 and m4=0, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each 5

[0266] independently Y2; more preferably R25and R30are each independently Y2. When n3=1, preferably at least one of R33, R34, R35, R36and R37is Y2; more preferably at least one of R34, R35and R36is Y2.

[0267] When n4=1, preferably at least one of R38, R39, R40, R41and R42is Y2more preferably at least one of R39, R40and R41is Y2.

[0268] Y2is represented by formula (3):

[0269] (3)

[0270] |_6

[0271] —L5na2

[0272]

[0273] where na2=0 or 1, preferably 0.

[0274] L5is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-.

[0275] L7and L8are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene.

[0276] One or more non-adjacent -CH2- of L5may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L5is not methylene; preferably none of -CH2- of L5is replaced with any other group.

[0277] One or more H of L5may be each independently replaced with

[0278] 30Foreignfiling text P24-234 20251216

[0279] - 21 -

[0280] Ce-15 aryl, -OCeHs, F, Cl, Br, I, COOH or OH; preferably none of H of L5is replaced with any other group.

[0281] L6is C1-10 alkylene; preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or linear propylene.

[0282] 5

[0283] RA2is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 linear alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or - CH2OH.

[0284] The compound (A) is different from the compound (B).

[0285] 10

[0286] In another preferable embodiment of the present invention, at least one of R23to R42, Q5, Q6, Q7and Q8may be a group represented by formula (2aa): (2aa)

[0287] paa21

[0288] p aa22

[0289]

[0290] paa23

[0291] Raa21, Raa22and Raa23are respectively as defined by Raa1, Raa2and Raa3.

[0292] 20 In another preferable embodiment of the present invention, Y2may be replaced with a group represented by (2bb):

[0293] (2bb) -Lbb21-Lbb22-(O)nb2i-CH=CH2

[0294] nb21, Lbb21and Lbb22are respectively as defined by nb11, Lbb1and Lbb2.

[0295] In a preferable embodiment of the present invention, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31and R32and / or at least one of R33, R34, R35, R36and R37and / or at least one of R38, R39, R40, R41and R42of the compound (B) are each independently selected from one member of the group consisting of F, Cl, Br, I, and OH; preferably at least 30 one of R23, R24, R26and R27and / or at least one of R28, R29, R31and R32and / or at least one of R33, R34, R36and R37and / or at least one of R38, R39,Foreignfiling text P24-234 20251216

[0296] R41and R42of the compound (B) are each independently selected from one member of the group consisting of F, Cl, Br, I, and OH.

[0297] It is believed that DtS of a resist film is lower when the composition comprises both the compounds (A) and (B).

[0298] 5

[0299] It is also believed that when the composition comprises both the compounds (A) and (B), the number of points where the compounds crosslink increases when they are polymerized compared to a composition containing only one of the compounds (A) and (B). Thanks for the increase of the cross-linking points, the photosensitivity of a resist film formed by the composition increases.

[0300] The following explains how to read the compound represented by the formula (Ex1 ) with the formula (1a);

[0301] (Ex1)

[0302]

[0303] ml and m2 are 0.

[0304] n1 is 1 and n2 is 0.

[0305] X1is CpH2p-ni-n2 where p is 2, n1 is 1 and n2 is 0 (C-CH3).

[0306] R1, R4, R5, R6, R7, R10, R11, R14and R15are H. R2, R9and R12are I. R3, R8and R13are Y1.

[0307] In the formula (2), na1 is 0, L1is -O-, L3and L4are a single bond, and RA1is H.

[0308] The following explains how to read the compound represented by the 30

[0309] formula (Ex2) with the formula (1b);

[0310] (Ex2)Foreignfiling text P24-234 20251216

[0311] 5

[0312] m3 and m4 are 0.

[0313] n3 is 1 and n4 is 1.

[0314] X2is CrH2r-n3-n4 where r is 1, n3 is 1 and n4 is 1 (C).

[0315]

[0316] R23, R27, R28, R32, R34, R35, R37, R39, R40and R42are H. R24and R29are Ci alkyl (methyl) where one H is replaced with OH. R25and R30are Y2. R26and R31are Ci alkyl (methyl). R36and R41are I. R33and R38form a single bond with each other.

[0317] In the formula (3), na2 is 0, L5is -O-, L7and L8are a single bond, and RA2is 15 H.

[0318] The following explains how to read the compound represented by the formula (Ex3) with the formula (1b);

[0319] (Ex3)

[0320] 20

[0321]

[0322] m3 and m4 are 0.

[0323] n3 and n4 are 1.

[0324] X2is CrH2r-n3-n4 where r, n3 and n4 are 1 (C).

[0325] R23, R25, R26, R28, R30, R31, R34, R35, R37, R39, R40and R42are H.

[0326] R24, R29, R36and R41are Y2.

[0327] 30 R27and R32form C1alkylene (-CH2-) with each other where the -CH2- is replaced with -O-.Foreignfiling text P24-234 20251216

[0328] - 24 -

[0329] R33and R38form a single bond with each other.

[0330] In the formula (3), na2 is 0, L5is -O-, L7and L8are a single bond, and RA2is H.

[0331] In a preferable embodiment of the present invention, at least one of the 5

[0332] compounds (A) and (B), preferably the compound (A) is represented by formula (4).

[0333] (4)

[0334]

[0335] R45is H or C1-10 alkyl; preferably H, linear C1-10 alkyl, branched C1-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl; further preferably H, methyl, ethyl, n-propyl, isopropyl; furthermore preferably H or methyl.

[0336] R46TOR54are each independently H, F, Cl, Br, I, C1-15 alkyl, Ce-15 aryl, Y3, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15 alkyl, cyclic C3-15 alkyl, Ce-15 aryl, Y3, COOH or OH; more preferably H, I, linear C1-10 alkyl, branched C3-10 alkyl, cyclic C3-10 alkyl, Ce-15 aryl or Y3; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y3; furthermore preferably H, I, methyl, ethyl, or Y3.

[0337] One or more non-adjacent -CH2- of R46to R54may be each independently replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO- O-, -CR55=CR56- or -C=C-; preferably none of -CH2- of R46to R54is replaced with any other group.

[0338] R55and R56are each independently H or C1-10 alkyl; preferably H, linear C1-10 30

[0339] alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl; further preferably H, methyl or ethyl.Foreignfiling text P24-234 20251216

[0340] - 25 -

[0341] One or more H of R46to R54may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of -CH2- of R46to R54is replaced with any other group.

[0342] At least one of R46, R47and R48and / or at least one of R49, R50and R51and / or 5

[0343] at least one of R52, R53and R54are each independently Y3; preferably R47, R50and R53are each independently Y3.

[0344] Y3is represented by formula (5):

[0345] (5)

[0346]

[0347] 15 where na3=0 or 1, preferably 0.

[0348] L9is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-.

[0349] 20 L11and L12are each independently a single bond or C1-5 alkylene;

[0350] preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene. One or more non-adjacent -CH2- of L9may be replaced with Ce-15 arylene, - O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C C- when L9is not methylene; preferably none of -CH2- of L9is replaced with any other group.

[0351] One or more H of L9may be each independently replaced with

[0352] Ce-15 aryl, -OCeHs, F, Cl, Br, I, COOH or OH; preferably none of H of L9is replaced with any other group.

[0353] 30Foreignfiling text P24-234 20251216

[0354] - 26 -

[0355] L10is C1-10 alkylene; preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or linear propylene.

[0356] RA3is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

[0357] 5

[0358] In another preferable embodiment of the present invention, at least one of R46to R54may be a group represented by formula (3aa):

[0359] (3aa)

[0360] K

[0361] Raa31, Raa32and Raa33are respectively as defined by Raa1, Raa2and Raa3.

[0362]

[0363] In another preferable embodiment of the present invention, Y3may be replaced with a group represented by (3bb):

[0364] (3bb) -Lbb31-Lbb32-(O)nb3i-CH=CH2

[0365] nb31, Lbb31and Lbb32are respectively as defined by nb11, Lbb1and Lbb2.

[0366] In another preferable embodiment of the present invention, at least one of the compounds (A) and (B) is represented by formula (6), preferably the compound (B) is represented by formula (6).

[0367] 30Foreignfiling text P24-234 20251216

[0368] (6)

[0369] 5

[0370]

[0371] n41 =0 or 1, preferably 0.

[0372] R57to R68are each independently H, F, Cl, Br, I, C1-15 alkyl, Ce-15 aryl, Y4, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15, cyclic C3-15 alkyl, Ce-15 aryl, Y4, COOH or OH; more preferably H, I, linear Ci- 15 10 alkyl, branched C3-10 alkyl cyclic C3-10 alkyl, Ce-15 aryl or Y4; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y4; furthermore preferably H, I, methyl, ethyl, or Y4

[0373] One or more non-adjacent -CH2- of R57to R68may be each independently replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO- 20 O-, -CR69=CR70- or -C=C-; preferably none of H of R57to R68is replaced with any other group.

[0374] L41is a single bond, C1-6 alkylene or -O-; preferably a single bond.

[0375] One or more non-adjacent -CH2- of L41may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR69=CR70- or -C≡C- when L41is not methylene; preferably none of -CH2- of L41is replaced with any other group.

[0376] R69and R70are each independently H or C1-10 alkyl; preferably H, linear C1-10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H, linear C1-5 alkyl, further preferably H, methyl or ethyl.

[0377] 30Foreignfiling text P24-234 20251216

[0378] - 28 -

[0379] One or more H of R58, R59and R61to R68may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of H of R58, R59and R61to R68is replaced with any other group.

[0380] One or more H of R57and R60may be each independently replaced with Ce- 15 aryl, -OCeHs, F, Cl, Br, I, COOH or OH; preferably one or more H of R575

[0381] and R60are each independently replaced with OH; more preferably one H of R57and R60are each independently replaced with OH.

[0382] Preferably at least one of R57, R58and R59and / or at least one of R60, R61and R62and / or at least one of R63, R64and R65and / or R66, R67and R68are each independently Y4; more preferably at least one of R57, R58and R59and / or at 10

[0383] least one of R60, R61and R62are each independently Y4; furthermore preferably R58and R61are each independently Y4.

[0384] Y4is represented by formula (7):

[0385] (7)

[0386] L14

[0387]

[0388] 20

[0389] where na4=0 or 1, preferably 0.

[0390] L13is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, -CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-.

[0391] L15and L16are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene. One or more non-adjacent -CH2- of L13may be replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C C- 30

[0392] when L13is not methylene; preferably none of -CH2- of L13is replaced with any other group.Foreignfiling text P24-234 20251216

[0393] - 29 -

[0394] One or more H of L13may be each independently replaced with

[0395] Ce-15 aryl, -OCeHs, F, Cl, Br, I, COOH or OH; preferably none of H of L13is replaced with any other group.

[0396] L14is C1-10 alkylene; preferably linear C1-10 alkylene, branched C1-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further

[0397] 5

[0398] preferably methylene, ethylene or n-propylene.

[0399] RA4is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

[0400] In another preferable embodiment of the present invention, at least one of R57to R68may be a group represented by formula (4aa):

[0401] (4aa)

[0402] paa41

[0403]

[0404] re

[0405] Raa41, Raa42and Raa43are respectively as defined by Raa1, Raa2and Raa3.

[0406] In another preferable embodiment of the present invention, Y4may be replaced with a group represented by (4bb):

[0407] (4bb) -Lbb41-Lbb42-(O)nb4i-CH=CH2

[0408] nb41, Lbb41and Lbb42are respectively as defined by nb11, Lbb1and Lbb2.

[0409] It is believed that DtS of a resist film is further lower when the compound (A) is represented by the formula (4) and / or the compound (B) is represented by the formula (6).

[0410] It is also believed that when the compound (A) is represented by the formula (4) and / or the compound (B) is represented by the formula (6), the number of 30 points where the compounds crosslink further increases when they are polymerized compared to a composition containing only one of theForeignfiling text P24-234 20251216

[0411] - 30 -

[0412] compounds (A) and (B). Thanks for the increase of the cross-linking points, the photosensitivity of a resist film formed by the composition further increases.

[0413] The following explains how to read the compound represented by the

[0414] 5

[0415] formula (Ex4) with the formula (4):

[0416] (Ex4)

[0417]

[0418] 0

[0419] R45is H, R46, R48, R52and R54are Ci alkyl (methyl). R47, R50and R53are Y3. R49and R51are I.

[0420] In the formula (5), na3 is 1, L9is -O-, L10and L11are Ci alkylene (methylene), L12is a single bond, and RA3is H.

[0421] The following explains how to read the compound represented by the formula (Ex5) with the formula (6):

[0422] (Ex5)

[0423]

[0424] 30

[0425] n41=0.Foreignfiling text P24-234 20251216

[0426] - 31 -

[0427] R57and R62are C6aryl (phenyl). R58, R61, R65and R68are Y4. R59, R60, R63, R64, R66and R67are H

[0428] In the formula (7), na4=0, L13is -O-, L15is a single bond, L16is C1alkylene (methylene), and RA3is -CH2OH.

[0429] 5

[0430] In another preferable embodiment of the present invention, the mole ratio of the compound (A) to the total of the compounds (A) and (B) is in the range from 0.1 to 0.95, preferably 0.2 to 0.9, more preferably 0.3 to 0.9, further preferably 0.4 to 0.9.

[0431] It is believed that DtS of a resist film is further lower when the mole ratio of the compound (A) to the total of the compound (A) and the compound (B) is in the range from 0.1 to 0.95.

[0432] It is also believed that when the mole ratio of the compound (A) to the total of the compound (A) and the compound (B) is in the range from 0.1 to 0.95, the 15

[0433] compounds (A) and (B) more efficiently cross-link. Thanks for the increase of the cross-linking efficiency, the photosensitivity of a resist film formed by the composition further increases.

[0434] In another preferable embodiment of the present invention, the mole ratio of 20

[0435] the compound (A) to the solid content of the composition is in the range from 0.1 to 0.8, preferable 0.2 to 0.75, more preferably 0.25 to 0.70, further preferably 0.30 to 0.65.

[0436] In the present invention, the solid content is the content of all the components contained in the composition other than the solvent.

[0437] In another preferable embodiment of the present invention, the mole ratio of the compound (B) to the solid content of the composition is in the range from 0.01 to 0.70, preferable 0.03 to 0.60, more preferably 0.05 to 0.50, further 30

[0438] preferably 0.05 to 0.40.Foreignfiling text P24-234 20251216

[0439] - 32 -

[0440] In another preferable embodiment of the present invention, the molecular weight of the compound (A) is in the range from 400 to 2,000, preferably 450 to 1,800, more preferably 500 to 1,500, further preferably 600 to 1,200, furthermore preferably 700 to 1,000.

[0441] 5

[0442] In another preferable embodiment of the present invention, the molecular weight of the compound (B) is in the range from 300 to 1,900, preferably 350 to 1,700, more preferably 400 to 1,400, further preferably 500 to 1, 100, furthermore preferably 600 to 900.

[0443] In the present invention, the molecular weight of the compounds (A) and (B) may be measured by gel permeation chromatography (GPC). In the measurement, it is a preferable example that a GPC column at 40 degrees Celsius, an elution solvent of tetrahydrofuran at 0.6 mL / min and monodisperse polystyrene as a standard are used.

[0444] 15

[0445] The molecular weight of the compounds (A) and (B) may also be measured by methods known in the art other than GPC such as cryoscopy.

[0446] The composition may comprise one or more compounds containing two aryls or arylenes other than the compounds (A) and (B) (hereafter, referred to as 20

[0447] “the other compounds”).

[0448] When the total mass of the compounds (A) and (B) is represented by MAB and the total mass of the other compounds is represented by Mo, MAB / (MAB+M0) is preferably in the range from 80 to 100mass%, more preferably 90 to 100mass%, and further preferably 95 to 100mass%. It is also a preferable embodiment of the composition not to include the other compound (MAB / (MAB+M0)=100mass%).

[0449] Examples of the compounds (A) and (B) include the followings:Foreignfiling text_P24-234_20251216

[0450] - 33 -

[0451]

[0452] 30Foreignfiling text_P24-234_20251216

[0453] - 34 -

[0454] 5

[0455]

[0456] 30Foreignfiling text P24-234 20251216

[0457] 5

[0458]

[0459] 30Foreignfiling text P24-234 20251216

[0460] 5

[0461] 30

[0462]

[0463] Foreignfiling text_P24-234_20251216

[0464] - 37 -

[0465]

[0466] - Acid generator

[0467] The composition may further comprise an acid generator, preferably a photoacid generator.

[0468] 30Foreignfiling text P24-234 20251216

[0469] - 38 -

[0470] In a preferable embodiment of the present invention, the acid generator is selected from one or more members of the following group consisting of iodonium salts, tetrahydrothiophenium salts, sulfonium salts, diazonium salts, and pyridinium salts; preferably selected from one or more members of the following group consisting of iodonium salts and sulfonium salts.

[0471] 5

[0472] In another preferable embodiment of the present invention, the acid generator is represented by the formula (8):

[0473] Bn+cation and Bn-anion - (8)

[0474] Bn+cation is a cation represented by one of the formulae (AC1 ) and (AC2); preferably a cation represented by the formula (AC1).

[0475] Bn+cation is n valent as a whole, n is 1 to 3; preferably 1 or 2; more preferably 1.

[0476] 15

[0477] Bn-anion is preferably an anion represented by one of the formulae (AA1 ), (AA2), (AA3), (AA4) and (AA5); preferably an anion represented by one of the formulae (AA1), (AA2) and (AA4).

[0478] Bn-anion is n valent as a whole, n is 1 to 3; preferably 1 or 2; more preferably 1.

[0479] 20

[0480] (AC1)

[0481]

[0482] wherenc1, nc2 and nc3 are each independently 0 or 1; preferably 0;

[0483] 30

[0484] Rc1, Rc2and Rc3are each independently C1-10alkyl, C6-15aryl, benzyl, F, Cl, Br, I, COOH or OH; preferably linear C1-10alkyl, branched C3-10alkyl, cyclicForeignfiling text P24-234 20251216

[0485] - 39 -

[0486] C3-10alkyl, C6-15aryl, benzyl, F, Cl, Br, I, COOH or OH; more preferably H or linear C1-5alkyl, benzyl or I; further preferably H, methyl, ethyl, n-propyl, isopropyl, benzyl or I; furthermore preferably methyl, ethyl, benzyl or I.

[0487] One or more non-adjacent -CH2- of Rc1, Rc2and Rc3may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C-; preferably none of -CH2- of Rc1, Rc2and Rc3is replaced with any other group.

[0488] One or more H of Rc1, Rc2and Rc3may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of -H of Rc1, Rc2and Rc3is replaced with any other group.

[0489] (AC2) Rc4- l+- Rc5

[0490] whereRc4and Rc5are each independently C1-20alkyl, C6-20aryl or C7-20aralkyl; preferably linear C1-20alkyl, branched C3-20alkyl, cyclic C3-20alkyl, C6-20aryl or C7-20aralkyl; more preferably C6-15aryl or C7-15aralkyl; further preferably C6-10aryl.

[0491] One or more non-adjacent -CH2- of Rc4and Rc5may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C-; preferably none of -CH2- of Rc4and Rc5is replaced with any other group.

[0492] 20

[0493] One or more H of Rc4and Rc5may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of H of Rc4and Rc5is replaced with any other group.

[0494] (AA1)

[0495]

[0496] whereRa11is P’ or Sb preferably Sb’.

[0497] (AA2)

[0498] 30Foreignfiling text P24-234 20251216

[0499] 5

[0500]

[0501] wherena21, na22, na23 and na24 are each independently 0 to 5; preferably 5.

[0502] Ra21, Ra22, Ra23and Ra24are each independently fluorine-substituted or unsubstituted C1-6 alkyl, F, Cl, Br, I, COOH or OH; preferably fluorinesubstituted or unsubstituted linear C1-6 alkyl, fluorine-substituted or unsubstituted branched C3-6 alkyl, fluorine-substituted or unsubstituted cyclic C3-6 alkyl, F, Cl, Br, I, COOH or OH; more preferably F.

[0503] (AA3)

[0504] Ra31

[0505] Ov. C- O

[0506] / X / /

[0507] , S on

[0508] Ra33 ^ / / ^Ra32

[0509]

[0510] K0 0

[0511] whereRa31, Ra32and Ra33are each independently fluorine-substituted or unsubstituted C1-6 alkyl, F, Cl, Br, I, COOH or OH; preferably fluorine- substituted or unsubstituted linear C1-6 alkyl, fluorine-substituted or unsubstituted branched C3-6 alkyl, fluorine-substituted or unsubstituted cyclic C3-6 alkyl, F, Cl, Br, I, COOH or OH; more preferably fluorine-substituted linear C1-6 alkyl; further preferably -CF3.

[0512] (AA4)

[0513] 30Foreignfiling text P24-234 20251216

[0514] - 41 -

[0515]

[0516] 5 where Ra41is C1-15 alkyl or C6-15 aryl; preferably linear C1-15 alkyl, branched C3-15 alkyl, cyclic C3-15 alkyl, or C6-15 aryl; more preferably cyclic C6-15 alkyl or C6-15 aryl.

[0517] One or more non-adjacent -CH2- of Ra41may be replaced with

[0518] C6-15 arylene, -O-, -C6H4O-, -S-, -O-SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, - CH=CH-, or -C=C-; preferably none of -CH2- of Ra41is replaced with any other group.

[0519] One or more H of Ra41may be replaced with C6-15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH; preferably none of -CH2- of Ra41is replaced with any other group.

[0520] 30Foreignfiling text P24-234 20251216

[0521] (AA5)

[0522] O

[0523] 5

[0524]

[0525] where Ra51is C1-6 alkylene or C6-12 arylene, -CO-, -CO-O-, -O-CO-, or -0- CO-O-; preferably linear C1-6 alkylene, branched C3-6 alkylene, cyclic C3-6 alkylene, C6-12 arylene, -CO-, -CO-O-, -O-CO-, or -O-CO-O-; more preferably methylene, ethylene, propylene, butylene or -CO-; further preferably methylene, ethylene or -CO-.

[0526] na51 is 0 or 1, preferably 1.

[0527] Examples of the Bn+cation represented by the formula (AC1 ) include the followings:

[0528] 30

[0529]

[0530] Foreignfiling text P24-234 20251216

[0531] Examples of the Bn+cation represented by the formula (AC2) include the followings:

[0532] (CH2)11CH3

[0533] 5

[0534]

[0535] Examples of the Bn-anion represented by the formula (AA1 ) include the followings:

[0536] \! zF

[0537] Sb— F

[0538] / \

[0539] F F

[0540]

[0541] Examples of the Bn-anion represented by the formula (AA2) include the following:

[0542]

[0543] Examples of the Bn-anion represented by the formula (AA3) include the following:

[0544] 30Foreignfiling text P24-234 20251216

[0545]

[0546] 5

[0547] Examples of the Bn-anion represented by the formula (AA4) include the followings:

[0548] CF3SO3-, C3F7SO3-, C4F9SO3-,

[0549]

[0550] Examples of the Bn-anion represented by the formula (AA5) include the followings:

[0551] 30Foreignfiling text P24-234 20251216

[0552] 5

[0553]

[0554] In another preferable embodiment of the present invention, the mole ratio of the acid generator to the total of the compound (A) and the compound (B) is in the range from 0.10 to 0.99, preferably 0.15 to 0.90, more preferably 0.25 to 0.85, further preferably 0.40 to 0.85.

[0555] In another preferable embodiment of the present invention, the acid generator is a mixture of a first acid generator and a second acid generator, wherein the first acid generator is different from the second acid generator in 15

[0556] structure.

[0557] Preferably at least one of the first and second acid generators is represented by the formula (8) where the Bn+cation is represented by the formula (AC1 ), more preferably the first and second acid generators are represented by the 20

[0558] formula (8) where the Bn+cation is represented by the formula (AC1).

[0559] It is believed that DtS of a resist film is further lower when at least one of the first and second acid generators is represented as described above.

[0560] Preferably at least one of the first and second acid generators is represented by the formula (8) where the Bn-anion is represented by the formula (AA4), more preferably the first and second acid generators are represented by the formula (8) where the Bn-anion is represented by the formula (AA4).

[0561] 30Foreignfiling text P24-234 20251216

[0562] -46 -

[0563] It is believed that DtS of a resist film is further lower when at least one of the first and second acid generators is represented as described above.

[0564] The mole ratio of the first acid generator to the second acid generator is preferably in the range from 0.05 to 7, more preferably 0.1 to 6, further 5

[0565] preferably 0.15 to 5.5.

[0566] It is believed that DtS of a resist film is further lower when the mole ratio of the first acid generator to the second acid generator is preferably in the range from 0.05 to 7.

[0567] In another preferable embodiment of the present invention, the molecular weight of the acid generator is in the range from 200 to 1,600, preferably 300 to 1,400, more preferably 400 to 1,200, further preferably 500 to 1,000.

[0568] 15

[0569] The molecular weight of the acid generator may be measured by methods known in the art such as cryoscopy.

[0570] - Solvent

[0571] The composition may further include a solvent. The solvent (S) may be a 20

[0572] mixture of two or more solvents having different structures each other.

[0573] In a preferable embodiment of the present invention, the solid content of the composition is in the range from 0.1 to 10mass%, more preferably 0.5 to 5mass%, further preferably 1 to 3mass%.

[0574] In another preferable embodiment of the present invention, the molecular weight of the solvent (S) is in the range from 40 to 160, preferably 50 to 140, more preferably 60 to 120.

[0575] 30

[0576] The molecular weight of the solvent (S) may be measured by methods known in the art such as cryoscopy.Foreignfiling text P24-234 20251216

[0577] - 47 -

[0578] In a preferable embodiment of the present invention, the boiling point of the solvent (S) is in the range from 60 to 200°C, preferably 70 to 180°C, more preferably 80 to 160°C, further preferably 80 to 145°C.

[0579] The boiling point of the solvent (S) is the boiling point at 1 atm.

[0580] 5

[0581] The solvent may be selected from one or more members of the following group consisting of methanol, ethanol, n-propanol, i-propanol (isopropyl alcohol, IPA), n-butanol, i-butanol, sec-butanol, t-butanol, n-pentanol, i- pentanol, 2-methylbutanol, sec-pentanol, t-pentanol, 3-methoxybutanol, n- 10

[0582] hexanol, 2-methylpentanol, sec-hexanol, 2-ethylbutanol, sec-heptanol, heptanol-3, n-octanol, 2-ethylhexanol, sec-octanol, n-nonyl alcohol, 2,6- dimethylheptanol-4, n-decanol, sec-undecyl alcohol, trimethylnonyl alcohol, sec-tetradecyl alcohol, sec-heptadecyl alcohol, phenol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, phenylmethylcarbinol, diacetone alcohol, cresol, ethylene glycol, propylene glycol, 1,3-butylene glycol, pentanediol-2,4, 2-methylpentanediol-2,4, hexanediol-2,5, heptanediol-2,4, 2-ethyl-1,3-hexanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol 20

[0583] mono-n-butyl ether, ethylene glycol mono-n-hexyl ether, ethylene glycol monophenyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-hexyl ether, ethoxytriglycol, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono propyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, 4-methyl-2-pentanol, 3-methyl-2-pentanol, 2-methyl-2-pentanol, 3-methyl-2-butanol, 2-methyl-2- 30

[0584] butanol, 4-methyl-2-hexanol, 5-methyl-2-hexanol, 3-methyl-2-hexanol, 2- methyl-2-hexanol, ethyl lactate (EL), propyl lactate, n-butyl lactate, n-amylForeignfiling text P24-234 20251216

[0585] - 48 -

[0586] lactate, butyric acid, methyl 2-hydroxyisobutyrate, methyl 2-hydroxybutyrate, methyl 3-hydroxybutyrate, methyl 4-hydroxybutyrate, ethyl 2- hydroxyisobutyrate, ethyl 2-hydroxybutyrate, ethyl 3-hydroxybutyric acid and ethyl 4-hydroxybutyrate; preferably selected from one or more members of the following group consisting of i-propanol, PGME, PGMEA, EL, propylene 5

[0587] glycol dimethyl ether and N-methylpyrrolidone; more preferably selected from one or more members of the following group consisting of PGME, PGMEA and EL.

[0588] - Additives

[0589] The composition may further include one or more additives. Examples of additives include surfactants, adhesion promoters, corrosion resistance additives, crosslinking agents, dispersants, fillers, functional pigments (such as those providing functional effects like conductivity, thermal conductivity, magnetic properties), nanoparticles, optical pigments (such as those

[0590] 15

[0591] providing optical effects like color tone, refractive index, pearlescent effect), particles that reduce thermal expansion, photobase generators, photoradical generators, polymerization inhibitors, primers, rheology modifiers (such as thickeners), and adhesion enhancers.

[0592] The additives are different from the compounds (A) and (B), the acid 20

[0593] generator and the solvent.

[0594] The content of additives is preferably in the range from 0 to 10 parts by mass, more preferably 0 to 5 parts by mass, even more preferably 0 to 1 part by mass, and further more preferably 0 to 0.5 parts by mass based on 100 parts by mass of the composition. It is also a preferable embodiment that the composition doesn’t contain the additives.

[0595] Examples of photobase generators include multi-substituted amide compounds having an amide group, lactams, imide compounds; and ionic photobase generators containing anions such as amide anions, methide 30

[0596] anions, borate anions, phosphate anions, sulfonate anions, or carboxylate anions.Foreignfiling text P24-234 20251216

[0597] - 49 -

[0598] Examples of thermal base generators include compounds that generate bases such as imidazoles and tertiary amines.

[0599] Examples of surfactants include fluorine-containing surfactants, nonionic 5

[0600] surfactants, anionic surfactants, and amphoteric surfactants.

[0601] Examples of fluorine-containing surfactants include surfactants having fluorinated hydrocarbon groups and hydrophilic groups, such as Megaface (trade name, DIC), Florad (trade name, 3M), and Surfion (trade name, AGC Seimi Chemical).

[0602] Nanoparticles may be selected from particles of nitrides, titanates, diamonds, oxides, sulfides, sulfites, sulfates, silicates, and carbides.

[0603] Nanoparticles can be optionally surface-modified using capping agents. 15

[0604] The particle size of nanoparticles is preferably in the range from 1 to 100 nm, more preferably 1 to 50 nm, and further preferably 1 to 25 nm. The particle size can be measured by any standard method known to those skilled in the art.

[0605] 20

[0606] Examples of photoradical generators include those based on azo compounds, peroxides, acylphosphine oxides, alkylphenones, oxime esters, and titanocenes. Among these, generators based on alkylphenones, acylphosphine oxides, and oxime esters are preferred, and examples include 2,2-dimethoxy-1,2-diphenylethan-1 -one, 1 -hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-[4-(2- hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1 -propan-1 -one, 2-hydroxy-1 -{4- [4-(2-hydroxy-2-methylpropanoyl)benzyl]phenyl}-2-methylpropan-1-one, 2- methyl-1 -(4-methylthiophenyl)-2-morpholinopropan-1 -one, 2-benzyl-2- dimethylamino-1-(4-morpholinophenyl)-1-butanone, 2-(dimethylamino)-2- 30

[0607] [(4-methylphenyl)methyl]-1 -[4-(4-morpholinyl)phenyl]-1 -butanone, 2,4,6- trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-Foreignfiling text P24-234 20251216

[0608] - 50 -

[0609] trimethylbenzoyl)phenylphosphine oxide, 1,2-octanedione, 1-[4- (phenylthio)phenyl]-, 2-(O-benzoyloxyimino)ethanone, 1 -[9-ethyl-6-(2- methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetoxyimino), etc.

[0610] Examples of polymerization inhibitors include ultraviolet absorbers, as well as nitrones, nitrogen oxide radicals, hydroquinones, catechols,

[0611] 5

[0612] phenothiazines, phenoxazines, hindered amines, and their derivatives. Specifically, methylhydroquinone, catechol, 4-t-butylcatechol, 3- methoxycatechol, phenothiazine, chlorpromazine, phenoxazine, hindered amines such as TINUVIN 144, 292, and 5100 (BASF), and ultraviolet absorbers such as TINUVIN 326, 328, 384-2, 400, and 477 (BASF) can be 10

[0613] used.

[0614] Adhesion enhancers are effective in preventing the coating film from peeling off the substrate due to stress applied during curing by heating when a composition according to one embodiment is applied to a substrate to form a coating film. Preferred adhesion enhancers include imidazole compounds and silane coupling agents. Examples of imidazole compounds include 2-hydroxybenzimidazole, 2-hydroxyethylbenzimidazole, benzimidazole, 2-hydroxyimidazole, imidazole, 2-mercaptoimidazole, and 2-aminoimidazole.

[0615] 20

[0616] Examples of silane coupling agents include epoxy silane coupling agents, amino silane coupling agents, and mercapto silane coupling agents.

[0617] Specific examples include 3-glycidoxypropyltrimethoxysilane, 3- glycidoxypropyltriethoxysilane, N-2-(2-aminoethyl)-3- aminopropyltrimethoxysilane, N-2-(2-aminoethyl)-3- aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3- aminopropyltriethoxysilane, 3-ureidopropyltriethoxysilane, 3- chloropropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3- isocyanatopropyltriethoxysilane, etc.

[0618] 30Foreignfiling text P24-234 20251216

[0619] - 51 -

[0620] Furthermore, silane compounds having acid groups can be used as silane coupling agents. Examples of acid groups include carboxyl groups, acid anhydride groups, and phenolic hydroxyl groups.

[0621] [Method for producing a resist film]

[0622] 5

[0623] In another aspect, the present invention further relates to a method for producing a resist film comprising, or consisting of steps (1a) and (1 b).

[0624] (1a) applying the composition according to the present invention above a substrate.

[0625] (lb) heating the applied composition.

[0626] - Step (1a)

[0627] The method for producing a resist film according to the present invention comprises the following step (1a):

[0628] (1a) applying the composition according to the present invention above a 15

[0629] substrate.

[0630] The composition is preferably applied above a substrate by spin-coating.

[0631] The spin-coating is preferably performed at the revolutions per minute (RPM) 20

[0632] in the range from 500 to 3,000rpm, more preferably 600 to 2,500rpm, further preferably 700 to 1,900rpm.

[0633] The spin-coating is preferably performed for the time in the range from 5 to 100sec, more preferably 10 to 70sec, further preferably 10 to 50sec.

[0634] When the step (1a) is performed by the spin-coating, the spin-coating may be performed two or more times with the same or different RPMs and durations.

[0635] 30

[0636] “Above a substrate” means that the composition according to the present invention may be applied either directly or via one or more other layersForeignfiling text P24-234 20251216

[0637] - 52 -

[0638] (hereinafter, referred to as “the underlayer”) on the substrate. Examples of the underlayer include a SOC (Spin on Carbon), an adhesion enhancing film.

[0639] The composition is preferably applied directly or via one or more of the underlayers on a substrate, more preferably via one or more adhesion 5

[0640] enhancing films on a substrate.

[0641] Examples of the substrate include a silicone substrate, a glass substrate and a resin film. Preferably the substrate is a silicone film. The substrate may be patterned on its surface.

[0642] The adhesion of the surface of the substrate to the composition may be improved by treatments such as a silane coupling treatment, a silazane treatment, and applying an adhesion enhancing film.

[0643] The detail of the composition in the step (1a) is described in the chapter of 15

[0644] [Composition],

[0645] - Step (1b)

[0646] The method for producing a resist film according to the present invention comprises the following step (1b):

[0647] 20

[0648] (1b) heating the applied composition.

[0649] The heating is preferably performed at the temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 60 to 180°C.

[0650] The heating is preferably performed for the time in the range from 1 to 400sec, more preferably 3 to 200sec, further preferably 5 to 120sec.

[0651] The heating of the step (1 b) may be performed two or more times with the same or different temperatures and durations.

[0652] 30

[0653] [Method for producing a resist patten]Foreignfiling text P24-234 20251216

[0654] - 53 -

[0655] In another aspect, the present invention furthermore relates to a method for producing a resist pattern comprising, or consisting of steps (2a), (2b), (2c) and (2d):

[0656] (2a) producing a resist film by the method according to the present invention described above;

[0657] 5

[0658] (2b) exposing the resist film, preferably with light having the peak wavelength in the range from 10 to 300nm, more preferably 13 to 248nm;

[0659] (2c) heating the exposed resist film preferably at temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 50 to 200°C, preferably for the time in the range from 1 to 400sec, more preferably 3 to 200sec, further preferably 5 to 120sec;

[0660] (2d) developing the exposed resist film.

[0661] - Step (2a)

[0662] In a preferable embodiment of the present invention, the intensity of the light 15

[0663] of the step (2b) is in the range from 200 to 450 mW / cm2, preferably 250 to 420 mW / cm2, more preferably 280 to 400 mW / cm2

[0664] In a preferable embodiment of the present invention, the duration of the exposure of the step (2b) is in the range from 10 to 200sec, preferably 30 to 20

[0665] 150sec, more preferably 50 to 100sec.

[0666] Examples of a light source that emits the light of the step (2b) include a LED lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a low-pressure mercury lamp, a Deep-UV lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, a KrF excimer laser, an ArF excimer laser, an F2 laser, an electron beam lamp and an EUV. The light source is preferably an electron beam lamp or an EUV lamp.

[0667] 30Foreignfiling text P24-234 20251216

[0668] - 54 -

[0669] - Step (2b)

[0670] In one embodiment of the present invention, the light is intermittently emitted to the entire region of the composition on the substrate a plurality of times in the step (2b).

[0671] 5

[0672] In another embodiment of the present invention, the light is continuously emitted to the entire region of the composition on the substrate in the step (2b).

[0673] - Step (2c)

[0674] The heating of the step (2c) may be performed two or more times with different temperatures and durations.

[0675] - Step (2d)

[0676] In the step (2d), the development of the exposed resist film may be

[0677] 15

[0678] performed by using a developer.

[0679] Examples of the developer to be used in the step (2d) include an alkaline developer and an organic developer, preferably an organic developer.

[0680] 20

[0681] In a preferable embodiment of the present invention, the developer is the organic developer; preferably a ketone, an ester, an alcohol, an amide, an ether, a hydrocarbon or any combination thereof; more preferably methyl acetate, n-butyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, ethoxypropionate, 3-methoxybutyl acetate, 3- methyl-3-methoxybutyl acetate, methyl formate, ethyl formate, butyl formate, propyl formate, ethyl lactate, butyl lactate, propyl lactate or any combination thereof; further preferably n-butyl acetate.

[0682] 30

[0683] The step (2d) may be followed by a step of drying the developed resist film.Foreignfiling text P24-234 20251216

[0684] - 55 -

[0685] The drying may be performed by methods such as spin drying.

[0686] The detail of the method for producing a resist film in the step (2a) is described in the chapter of [Method for producing a resist film],

[0687] 5

[0688] [Method for producing a processed substrate]

[0689] In another aspect, the present invention furthermore relates to a method for producing a processed substrate comprising, or consisting of steps (3a) and (3b):

[0690] (3a) producing a resist pattern by the method according to the present invention;

[0691] (3b) processing the substrate by etching, using the resist pattern as a mask.

[0692] - Step (3b)

[0693] The etching of the step (3b) may be dry etching or wet etching, preferably dry 15

[0694] etching.

[0695] When the resist film is applied on the underlayer on the substrate in the step (1a), the underlayer may be etched to form an underlayer pattern by using the resist pattern as a mask, and the substrate may be etched by using the 20

[0696] underlayer pattern as a mask.

[0697] In another aspect of the present invention, the method for producing a processed substrate comprises or consists of steps (4a) and (4b) or (4c): (4a) producing a resist pattern by the method according to the present invention;

[0698] (4b) performing ion implantation using the resist pattern as a mask;

[0699] (4c) processing an underlayer beneath the resist pattern using the resist pattern as a mask to form an underlayer pattern, and performing ion implantation using the underlayer pattern as a mask.

[0700] 30Foreignfiling text P24-234 20251216

[0701] - 56 -

[0702] - Step (4b)

[0703] In a preferable embodiment of the present invention, conductive impurity ions are implanted into the substrate.

[0704] In another preferable embodiment of the present invention, the ions are implanted to the depth in the range from 0.1 to 60 nm, preferably 0.3 to 5

[0705] 40nm, more preferably 0.5 to 20nm from the surface of the substrate.

[0706] The detail of the method for producing a resist pattern in the steps (3a) and (4a) is described in the chapter of [Method for producing a resist pattern],

[0707] [Method for producing a device]

[0708] In another aspect, the present invention furthermore relates to a method for producing a device comprising the method according to the present invention;

[0709] wherein the method further comprises a step of forming wiring on the

[0710] 15

[0711] processed substrate.

[0712] The device is preferably a semiconductor device.

[0713] In one embodiment of the present invention, the substrate is cut into chips, 20

[0714] connected to lead frames, and packaged with resin after the step of forming wiring on the processed substrate. In the present invention, this packaged product is called a device.

[0715] The detail of the method contained in the method for producing the device is described in the chapters [Method for producing a resist film] and [Method for producing a resist pattern],

[0716] [Use of the composition]

[0717] In another aspect, the present invention furthermore relates to use of the 30

[0718] composition according to the present invention for producing a resist film.Foreignfiling text P24-234 20251216

[0719] - 57 -

[0720] The detail of the composition is described in the chapter of [Composition],

[0721] [Woking examples]

[0722] The present invention is described below with reference to several examples. The embodiment of the present invention is not limited only to 5

[0723] these examples.

[0724] Synthesis of compound A1: 2,2',2"-(((ethane-1,1,1-triyltris(2- iodobenzene-4,1-diyl)) tris(oxy)) tris (methylene)) tris(oxirane)

[0725]

[0726] To an OptiMax 1001 Reactor (Mettler Toledo), 55.50 g of 4,4',4"-(ethane- 1,1,1-triyl)tris(2-iodophenol) is dissolved into 400 mL of anhydrous N, N- dimethylformamide (DMF). 158.6 g of Cesium carbonate and 67.28 g of potassium carbonate are added in three portions under stirring. 134.7 g of epibromohydrin is added dropwise at 0 °C. The mixture is stirred for 48 hours at 10°C under nitrogen atmosphere. Insoluble by-product is removed by filtration. The solution is concentrated to 100 mL under vacuum. The solution is dropwise added into 4,000 mL of deionized water (DI water) under continuous stirring to precipitate the product. Water is removed by filtration with 0.2p Omnipore PTFE Membrane Filters (Sigma Aldrich). The crude product is purified by dissolving into 200 mL of acetone and precipitating into 20-folder excess of DI water. The dissolving / precipitating cycle is repeated twice to fully remove residual solvent and trace metals. The white precipitate is dried under vacuum to afford 62.66 g of final 30

[0727] product as amorphous powder. yield=91%. Tg = 62°C (DSC).Foreignfiling text P24-234 20251216

[0728] - 58 -

[0729] 1H NMR (400 MHz, CDCl3) δ 7.49, 7.48, 6.89, 6.87, 6.72, 6.70, 4.29, 4.26, 4.05, 4.02, 3.39, 2.92, 2.90, 2.03. 13C NMR (101 MHz, CDCl3) δ 155.48, 143.17, 139.12, 129.83, 111.73, 86.65, 69.48, 50.12, 49.94, 44.79, 30.78.

[0730] Synthesis of compound A2: ((2,7-diiodo-9H-fluorene-9,9-diyl)bis(5- 5 methyl-6-(oxiran-2-ylmethoxy)-3,1-phenylene))dimethanol

[0731]

[0732] 95.6 g of 4,4'-(2,7-diiodo-9H-fluorene-9,9-diyl)bis(2-(hydroxymethyl)-6- 15 methylphenol) is dissolved in 400 g of DMF. 133 g of cesium carbonate is added, followed by stirring for 1 hr in nitrogen. 47.3 g of epibromohydrin is added dropwise. The mixture is agitated for 3 days. The inorganic salts are filtered out. The filtrate is slowly poured into 3 L water with stirring. The suspension is acidified to PH 3.5 by aqueous oxalic acid solution. The solid 20 formed is recovered by filtering and water rinse, followed by drying in a vacuum oven. The dried solid is dissolved in acetone. The solution is stirred overnight with added activated carbon. After filtering out the activated carbon, the filtrate is poured into water. The solution is filtered and dried to obtain 98 g of the compound A2.

[0733] 1H NMR (400 MHz, DMSO-d6): 2.2 ppm (6H), 2.6-2.8 ppm (4H), 3.3 ppm (2H), 3.5 ppm-4.1 ppm (4H), 4.5 ppm (4H), 5.0 ppm (2H), 6.8-7.1 ppm (4H), and 7.7-7.8 ppm (6H).

[0734] 30Foreignfiling text P24-234 20251216

[0735] - 59 -

[0736] Synthesis of compound A3: 2,2',2"-(((ethane-1,1,1-triyltris(2- iodobenzene-4,1-diyl)) tris(oxy)) tris(ethane-2,1-diyl)) tris(oxirane)

[0737] 5

[0738] To an OptiMax 1001 Reactor, 55.55g of 4,4',4"-(ethane-1, 1, 1 -triyl)tris(2-

[0739]

[0740] iodophenol) is dissolved into 400 mL of anhydrous DMF. 158.8g of Cesium carbonate and 67.34g of potassium carbonate are added in three portions under stirring. 148.63g of 2-(2-bromoethyl)oxirane is added dropwise at 0 °C. The mixture is stirred for 24 hours at 10°C under nitrogen atmosphere. Insoluble by-product is removed by filtration. The DMF 15

[0741] solution is concentrated down to 100 mL under vacuum. The solution is dropwise added into 4,000 mL of DI water under continuous stirring to precipitate the product. Water is removed by filtration with 0.2m Omnipore PTFE Membrane Filters (Sigma Aldrich). The crude product is purified by dissolving into 200 mL of acetone and precipitating into 20-folder excess of 20

[0742] DI water. The dissolving / precipitating cycle is repeated twice to fully remove residual solvent and trace metals. The white precipitate is dried under vacuum to obtain 67.15 g of the compound A3 as amorphous powder. yield=92%. Tg = 47°C (DSC).

[0743] 1H NMR (400 MHz, CDCl3) δ 7.50, 6.91, 6.89, 6.70, 6.68, 4.14, 3.25, 2.87, 2.66, 2.17, 2.12, 2.04, 1.64.13C NMR (101 MHz, CDCl3) δ 155.62, 142.87, 139.02, 129.84, 111.05, 86.53, 65.85, 49.89, 47.63, 32.50, 30.84.

[0744] 30Foreignfiling text P24-234 20251216

[0745] - 60 -

[0746] Synthesis of compound A4

[0747] 5

[0748]

[0749] In a 100 ml 3-neck flask, equipped with a stir bar, reflux condenser, thermometer, 2.69 g of compound B3-OH, 7.87g of cesium carbonate and 186g of tetrabutylammonium iodide are dissolved into 24 mL of anhydrous DMF. 5.47 g of [3-(Bromomethyl)-3-oxetanyl]methanol is added. The obtained suspension is stirred at 50 °C for 20 h under argon atmosphere. Water is added and the aqueous phase is extracted three times with ethyl 15 acetate. The combined organic phases are extracted with brine. The extract is dried over Na2SO4 and filtered. The solvent is evaporated. The resulting solid is purified by column chromatography (silica gel, heptane / ethyl acetate / ethanol) to obtain 3.82 g (81 %) of the compound A4.

[0750] The identity of the substance is confirmed by 1 H NMR (500 MHz, DMSO- 20 d6) 57.74 (d, J = 8.4 Hz, 2H), 7.37 - 7.30 (m, 8H), 7.29 - 7.23 (m, 2H), 7.17 (dd, J = 8.8, 2.5 Hz, 2H), 7.12 - 7.07 (m, 4H), 7.03 (d, J = 2.3 Hz, 2H), 6.99 (dd, J = 8.4, 2.3 Hz, 2H), 4.97 (t, J = 5.4 Hz, 2H), 4.89 (t, J = 5.4 Hz, 2H), 4.41 (d, J = 5.9 Hz, 4H), 4.37 (d, J = 5.9 Hz, 4H), 4.29 (d, J = 5.9 Hz, 4H), 4.26 (d, J = 5.9 Hz, 4H), 4.14 (s, 4H), 4.12 (s, 4H), 3.69 (d, J = 5.3 Hz, 4H), 3.55 (d, J = 5.3 Hz, 4H). Tg = 117.7 °C. The compound is soluble in EL, nBA, PGMEA.

[0751] Preparing compositions

[0752] The components described in Table 1 are dissolved into EL to prepare 30 solutions with a solid content of 1.25 mass% respectively. In Table 1, the unit of the numbers is mole ratio of each component to the total of theForeignfiling text P24-234 20251216

[0753] - 61 -

[0754] compounds A1 to A19. The solid content is the content of the components other than the solvent. The obtained solutions are respectively filtered through a filter with a pore size of 0.2 μm. The compositions of Examples P1 to P75 and L1 to L139, and Comparative Examples P1 to P6, and L1 to L4 are prepared respectively.

[0755] 5

[0756] 30NJ NJ cn

[0757] cn O cn

[0758] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex Pl 50 50 31 9

[0759] Ex P2 70 30 32 12

[0760] Ex P3 70 30 19 7

[0761] Ex P4 70 30 32 12

[0762] Ex P5 70 30 54 13

[0763] Ex P6 70 30 57 10

[0764] Ex P7 70 30 66 16

[0765] Ex P8 90 10 7 36

[0766] Ex P9 40 60 15 39

[0767] Ex PIO 20 80 15 39

[0768] Ex Pll 40 60 15 39

[0769] Ex P12 20 80 15 39 Ex P13 50 50 31 12

[0770]

[0771] Ex P14 50 50 38 15

[0772] Ex P15 50 50 31 12

[0773] Ex P16 50 50 38 15

[0774] Ex P17 50 50 8 35

[0775] Ex P18 50 50 39 15

[0776] Ex P19 50 50 32 22

[0777] Ex P20 70 30 7 36

[0778] Ex P21 70 30 7 36

[0779] Ex P22 60 40 15 39

[0780] Ex P23 80 20 39

[0781] Ex P24 30 70 26 17

[0782]

[0783] Ex P25 50 50 38 15Foreignfiling text P24-234 20251216

[0784] [Table 1] – continued

[0785] Cl B29 B27 B26 B25 B24 B23 B22 B21 B20 B19 B17 B16 B15 B14 B13 B12 Bll BIO B9 B7 B6

[0786] | | E Plx

[0787] co | | E P2x

[0788] fXI

[0789] cfl | | E P3x

[0790] | | E P4x

[0791] 5 | | E P5x

[0792] | | E P6x

[0793] | | E P7x

[0794] | | E P8x

[0795] | | E P9x

[0796] | | E PIOx

[0797] | | E Pllx

[0798] | | E P12x

[0799] | | E P13x

[0800] | | E P14x

[0801] | | E P16x

[0802] | | E P17x

[0803] | | E P19x

[0804] co | | E P20x

[0805] cfl

[0806] | | E P21x

[0807] | | E P22x |^ | |15 E P23x | | E P24x | | E P25x

[0808] co

[0809] cfl

[0810] 30

[0811]

[0812] NJ NJ cn

[0813] cn O cn

[0814] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex P26 50 50 58 23

[0815] Ex P27 50 50 32 22

[0816] Ex P28 50 50 32 22

[0817] Ex P29 50 50 26 17

[0818] Ex P30 30 70 31 12

[0819] Ex P31 50 50 58 23

[0820] Ex P32 50 50 15

[0821] Ex P33 50 50 15 39 Ex P34 80 20 9 45 Ex P35 90 10 9 45 Ex P36 90 10 3 45 Ex P37 90 10 3 45 Ex P38 80 20 15 38 Ex P39 80 20 5 38 Ex P40 80 20 15 38 Ex P41 90 10 3 45 Ex P42 90 10 3 45 Ex P43 90 10 9 45 Ex P44 80 20 9 45 Ex P45 50 50 22 32 Ex P46 80 20 15 39 Ex P47 80 20 15 39 Ex P48 80 20 15

[0822] Ex P49 80 20

[0823]

[0824] Ex P50 80 20Foreignfiling text_P24-234_20251216

[0825] - 65 - [Table 1] – continued

[0826] Cl B29 B27 B26 B25 B24 B23 B22 B21 B20 B19 B17 B16 B15 B14 B13 B12 Bll BIO B9 B7 B6

[0827] | | E P26x

[0828] co | | E P27x

[0829] fXI

[0830] cfl | | E P28x

[0831] | | E P29x

[0832] | | E P30x

[0833] | | E P31x

[0834] | | E P32x

[0835] | | E P33x

[0836] | | E P34x

[0837] | | E P35x

[0838] | | E P36x

[0839] | | E P37x

[0840] | | E P38x

[0841] | | E P39x

[0842] | | E P40x

[0843] | | E P41x

[0844] CO

[0845] co | | E P42x

[0846] | | E P43x

[0847] | | E P44x

[0848] co | | E P45x

[0849] cfl

[0850] | | E P46x

[0851] | | E P47x ll | |39 E P48x 1^ ll | |1539 E P49x 15 E P50x <0 <0

[0852] co

[0853] cfl

[0854]

[0855] Foreignfiling text P24-234 20251216

[0856] [Table 1] – continued

[0857] B5 B4 B3 B2 Bl A19 A18 A17 A16 A15 A14 A13 A12 All A10 A9 A8 A7 A6 A5 A4 A3 A2 Al

[0858] | 0 E P51^ 0^ 0^

[0859] CxO CO CO cO CO 0^ CO O'! LO LO m s s s m m m | E P52x

[0860] LT) LT) | L E P53xT) r-. l\ rxi l\ i_n rxi i_n rxi rxi i_n in in i_n i_n i_n rxi rxi rxi rxi in i\ r-. r-. | E P54x

[0861] | E P55x CO CO 5 | E P56x cO rxi CO co rxi co rxi rxi o

[0862] rxi m rxi m m m m m co CXI | E P57x

[0863] | E P58x

[0864] | E P59x

[0865] | E P60x

[0866] | E P61x

[0867] | E P62x

[0868] | E P63x o

[0869] Ln

[0870] | E P64x

[0871] | E P65x

[0872] | E P66x

[0873] | E P68x

[0874] | E P69x

[0875] | E P71x

[0876] s | E P72 sx

[0877] o o o | E P73x

[0878] | E P75x

[0879] | C Plom

[0880] O O o o O o O o o

[0881] Ln Ln i_n Ln i_n Ln Ln i_n | C P2om

[0882] O O O o o o o o o o o O o rxi rxi CO rxi rxi rxi rxi rxi rxi rxi xt rxi o C P4omp rxi rxi C P5omp xt cO xt cO

[0883] C P6omp

[0884] o

[0885] o o

[0886] i_n Ln

[0887] o o o o o o co co xt co co xt o o o o o o o o o o o in Ln o o co co s m i_n Ln i_n S co CO co

[0888] o xt m

[0889] !o CL CL CL CL E X X X LU LU LU o

[0890] o

[0891]

[0892] 30Foreignfiling text P24-234 20251216

[0893] [[Table 1] – continued

[0894] Cl B29 B28 B27 B26 B25 B24 B23 B22 B21 B20 B19 B17 B16 B15 B14 B13 B12 Bll BIO B7 B6

[0895] | E P51x

[0896] I E P52x

[0897] | E P53x

[0898] | E P54x

[0899] 5 | E P55x

[0900] | E P56x

[0901] | E P57x

[0902] | E P58x

[0903] | E P59x

[0904] | E P60x

[0905] | E P61x

[0906] | E P62x

[0907] | E P63x

[0908] | E P64x

[0909] I E P65x

[0910] | E P66x

[0911] | E P68x

[0912] | E P69x

[0913] | E P71x

[0914] | E P72x

[0915] | E P73x

[0916] | E P74x

[0917] | E P75x

[0918] 69 C Plomp

[0919] C P2omp

[0920] C P3omp C P4omp C P5omp C P6omp

[0921] 30

[0922]

[0923] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex LI 20 80 30

[0924] Ex L2 50 50 30

[0925] Ex L3 80 20 30

[0926] Ex L4 80 20 30

[0927] Ex L5 50 50 30

[0928] Ex L6 80 20 30

[0929] Ex L7 80 20 30 Ex L8 80 20

[0930] Ex L9 80 20 30

[0931] Ex LIO 80 20 30

[0932] Ex Lil 80 20 30

[0933] Ex L12 80 20 30

[0934] Ex L13 80 20 30

[0935] Ex L14 80 20 15

[0936] Ex L15 80 20 30 Ex L16 80 20 24 Ex L17 80 20 15 Ex L18 80 20 6 Ex L19 80 20 24 Ex L20 80 20 15 Ex L21 80 20

[0937] Ex L22 80 20

[0938] Ex L23 80 20

[0939] Ex L24 80 20

[0940]

[0941] Ex L25 80 20Foreignfiling text P24-234 20251216

[0942] [Table 1] – continued

[0943] l |j LJ IJ B24 B14 B29 B23 B22 B20B27B2]Blz 'Tr T— 1

[0944] ll I21 E LIx

[0945] || I21 E L2x

[0946] co 21 E L3x

[0947] fXI

[0948] cfl IJ |21 E L4x

[0949] ll |21 E L5x

[0950] 5 IJ |21 E L6x

[0951] ll 121 E L7x

[0952] IJ21

[0953] | E L9x

[0954] | E LIOx

[0955] 1 E Lilx

[0956] bl |i E L12x

[0957] IJ |21 E L13x

[0958] ll |21 E L14x

[0959] IJ21

[0960] IJ |21 E L16x

[0961] ll |21 E L17x

[0962] IJ21

[0963] IJ |21 E L19x

[0964] IJ |21 E L20x

[0965] ll |21 E L21x

[0966] co

[0967] cfl IJ |21 E L22x

[0968] IJ |21 E L23x bj ll |421 E L24x IJ |21 E L25x in

[0969] co

[0970] TH 'Tr

[0971] co

[0972] cfl

[0973] i_n co

[0974] 30 co

[0975] _l _ 1 — 1

[0976] X LU X X LU LU

[0977]

[0978] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex L26 80 20

[0979] Ex L27 98 2 30 21

[0980] Ex L28 96 4 30 21

[0981] Ex L29 94 6 30 21

[0982] Ex L32 20 80 26

[0983] Ex L33 20 80 21

[0984] Ex L34 20 80 26

[0985] Ex L35 20 80 21

[0986] Ex L36 20 80 26

[0987] Ex L37 20 80 21

[0988] Ex L38 20 80 26

[0989] Ex L39 20 80 21

[0990] Ex L41 20 80 30 Ex L42 80 20 30 Ex L43 80 20 30 Ex L44 20 40 40 30 Ex L45 50 50 30 21

[0991] Ex L46 50 50 30 21

[0992] Ex L47 50 50 30 21

[0993] Ex L48 20 80 51 15 Ex L49 20 80 15

[0994]

[0995] Ex L50 20 80Foreignfiling text_P24-234_20251216

[0996] - 71 - [Table 1] – continued

[0997] B29 B23 B22

[0998] o | I E L26x

[0999] | | E L27x

[1000] | | E L28x

[1001] fXI

[1002] co | | E L29x

[1003] | | E L32x

[1004] 5 | | E L33x

[1005] CM | | E L34x

[1006] co | | E L35x

[1007] | | E L36x

[1008] | | E L37x

[1009] CXJ | | E L38x

[1010] co

[1011] | | E L39x

[1012] | | E L41x

[1013] 10 | | E L42x

[1014] | | E L43x

[1015] | | E L44x

[1016] | | E L45x

[1017] o CM | | E L46x co | | E L47x co

[1018] 15 | | E L49x co E L50x co

[1019] 20 'Tr

[1020] co

[1021] co

[1022] co

[1023] 25

[1024] co

[1025] co

[1026] 30

[1027]

[1028] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex L51 80 20 51 15 Ex L52 80 20 15 Ex L53 80 20

[1029] Ex L54 50 50 15 Ex L55 50 50

[1030] Ex L56 80 20 15

[1031] Ex L57 80 20 15

[1032] Ex L58 80 20 15

[1033] Ex L59 80 20 15

[1034] Ex L60 80 20 15

[1035] Ex L61 80 20

[1036] Ex L62 80 20

[1037] Ex L63 24 76 26 Ex L64 24 76

[1038] Ex L65 24 76

[1039] Ex L66 24 76

[1040] Ex L67 90 10 36 Ex L68 90 10

[1041] Ex L69 90 10

[1042] Ex L70 50 50 30 Ex L71 50 50

[1043] Ex L72 20 80

[1044] Ex L73 20 80

[1045] Ex L74 20 80

[1046]

[1047] Ex L75 20 80Foreignfiling text P24-234 20251216

[1048] [Table 1] – continued

[1049] ^d |J B2924 B23 B22 B20B2J B14

[1050] | 1 E L51x

[1051] 11 | | E L5251x

[1052] co Il 11 | |15 E L5351x

[1053] fXI

[1054] cfl 11 | | E L5451x

[1055] Il 11 | |15 E L5551x

[1056] 5 11 | | E L5651x

[1057] 11 | | E L5751x

[1058] 11 | | E L5851x

[1059] 11 | | E L5951x

[1060] 1151

[1061] ll ll | |2626 E L61x 1-1 ll ll | |2626 E L62x

[1062] || | |22 E L63x

[1063] || II | |2622 E L64x

[1064] || II | |2622 E L65x

[1065] || II | |2622 E L66x

[1066] |j | |24 E L67x

[1067] || |j3624

[1068] || |j | |3624 E L69x

[1069] |J | |21 E L70x

[1070] lj |J | |3021 E L71x

[1071] co

[1072] cfl 1^ | |15 E L72x

[1073] |j |^ | |7575 E L73x |j |^ | |2525 E L74x || U|269 in

[1074] co

[1075] co

[1076] cfl

[1077] o co i_n 30 —i —1 —i X X X LU LU LU

[1078]

[1079] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex L76 50 50

[1080] Ex L77 50 50

[1081] Ex L78 50 50

[1082] Ex L79 50 50

[1083] Ex L80 50 50

[1084] Ex L81 80 20 30 Ex L82 80 20 30 Ex L83 80 20 30 Ex L84 80 20 30 Ex L85 80 20 30 Ex L86 80 20 30 Ex L87 80 20 30 Ex L88 25 75 36

[1085] Ex L89 20 80 36

[1086] Ex L90 80 20 36

[1087] Ex L91 50 50 36

[1088] Ex L92 50 50 36

[1089] Ex L93 25 75

[1090] Ex L94 20 80

[1091] Ex L95 80 20

[1092] Ex L96 50 50

[1093] Ex L97 50 50

[1094] Ex L98 80 20 15

[1095] Ex L99 80 20 15

[1096]

[1097] Ex L100 80 20 15Foreignfiling text_P24-234_20251216

[1098] - 75 -

[1099] [Table 1] – continued

[1100] | | E L76x

[1101] fXI

[1102] co | | E L77x

[1103] co

[1104] CM

[1105] co | | E L79x

[1106] 5

[1107] CM | | E L82x

[1108] co

[1109] i_n

[1110] CXI

[1111] | | E L85x

[1112] CXI

[1113] co

[1114] CX] 'xT

[1115] 'xT

[1116] 10 co

[1117] CX]

[1118] CX]

[1119] co | | E L90x

[1120] CN | | E L91x

[1121] co | | E L92x

[1122] o

[1123] CM | | E L93x

[1124] co | | E L94x

[1125] | | E L95x

[1126] co

[1127] 15 | | E L96x

[1128] co

[1129] co | | E L97x co | | E L99x E L100x co

[1130] co

[1131] 20 'xT CX]

[1132] co CX]

[1133] co

[1134] CXl

[1135] co

[1136] CXI CX]

[1137] co cxi CX]

[1138] 25 o

[1139] co

[1140] co

[1141] co

[1142] 30

[1143]

[1144] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex L101 50 50

[1145] Ex L102 50 50 44 Ex L103 20 80

[1146] Ex L104 80 20

[1147] Ex L105 20 80

[1148] Ex L106 80 20

[1149] Ex L107 50 50

[1150] Ex L108 80 20 30 Ex L109 80 20 30 Ex L110 50 50 44 Ex L111 50 50 44

[1151] Ex L112 50 50

[1152] Ex L113 50 50

[1153] Ex L114 50 50

[1154] Ex L115 50 50

[1155] Ex L116 50 50 44 Ex L117 50 50 44 Ex L118 20 80 36 Ex L119 20 80 36 Ex L120 50 50 44 Ex L121 50 50 44

[1156] Ex L122 50 50 44 Ex L123 50 50 22 44 Ex L124 50 50 22 44

[1157]

[1158] Ex L125 50 50 44Foreignfiling text P24-234 20251216

[1159] [Table 1] – continued

[1160] LJ B24 B29 B23 B22 B20B2] B14 BH

[1161] IJ IJ |4422 E L101x

[1162] ll |22 E L102x

[1163] co ll ll |3646 E L103x

[1164] fXI

[1165] cfl || || |3646 E L104x

[1166] |j |^ |2755 E L105x

[1167] 5 lj l^2755

[1168] |^ |55 E L107x_

[1169] |J21

[1170] ll |21 E L109x

[1171] II |22 E L110x

[1172] II |22 E L111x

[1173] ll IJ |4422 E L112x

[1174] || IJ |4422 E L113x

[1175] II |22 E L114x

[1176] r\j ll IJ |4422 E L115x

[1177] II |22 E L116x

[1178] II |22 E L117x

[1179] ll |46 E L118x

[1180] || |46 E L119x

[1181] II |22 E L120x

[1182] ll |22 E L121x

[1183] co

[1184] cfl IJ |22 E L122x | E L123x | E L124x IJ |22 E L125x in

[1185] co

[1186] co

[1187] cfl

[1188] co

[1189] 30 0 0

[1190] —i —i

[1191] X X LU LU

[1192]

[1193] Al A2 A3 A4 A5 A6 A7 A8 A9 A10 All A12 A13 A14 A15 A16 A17 A18 A19 Bl B2 B3 B4 B5 Ex L126 50 50 44 Ex L127 50 50 44 Ex L128 50 50 44 Ex L129 50 50 44 Ex L130 50 50 44 Ex L131 50 50 44 Ex L132 20 80 36 Ex L133 80 20 36 Ex L134 50 50 36 Ex L135 50 50 22 Ex L136 50 50

[1194] Ex L137 50 50

[1195] Ex L138 50 50 33 Ex L139 50 50

[1196] Comp L1 100 30

[1197] Comp L2 100 15 21

[1198] Comp L3 100 21

[1199]

[1200] Comp L4 100 30 21Foreignfiling text_P24-234_20251216

[1201] - 79 -

[1202] [Table 1] – continued

[1203] B29 B28 B23 B22

[1204] o

[1205] | | E L126x

[1206] | | E L127x

[1207] | | E L128x

[1208] cxi

[1209] cxi | | E L129x

[1210] | | E L130x

[1211] cxi cxi cxi

[1212] 5 CQ cxi | | E L131x cxi

[1213] fN | | E L132x

[1214] co | | E L133x

[1215] i_n

[1216] r\j LO LO | | L E L134xO

[1217] CO 'st 'st 'st

[1218] | | E L135x

[1219] 'xt

[1220] r\J 'st

[1221] ' | | '

[1222] st E L136st 'st

[1223] co 'sxt 'st

[1224] | | E L137x

[1225] | | E L138x

[1226] 10 | | E L139x

[1227] CO CO

[1228] co co | Comp L1

[1229] | Comp L2

[1230] r\!

[1231] co | Comp L3

[1232] fN o | Comp L4

[1233] 15 00

[1234] co

[1235] cxi

[1236] co cxi

[1237] cxi r\J co

[1238] co cxi r\J co

[1239] Ln cxi

[1240] co cxi

[1241] 20 'st

[1242] co

[1243] co cxi

[1244] co cxi

[1245] CXI

[1246] co

[1247] co

[1248] o

[1249] 25 co CXJ

[1250] co

[1251] 00

[1252] co

[1253] co

[1254] co

[1255] 30

[1256]

[1257] Foreignfiling text P24-234 20251216

[1258] In Table 1, the structures of the compounds A1 to A19, B1 to B29, and C1 are respectively as follows:

[1259] A1

[1260] A4

[1261] A6

[1262]

[1263] 30Foreignfiling text_P24-234_20251216

[1264]

[1265] 25

[1266] 30Foreignfiling text_P24-234_20251216

[1267] - 82 -

[1268] 20

[1269]

[1270] A17

[1271] 25

[1272]

[1273] 30Foreignfiling text P24-234 20251216

[1274] 5

[1275] B2

[1276] B3

[1277] B4

[1278] B5

[1279] B6

[1280]

[1281] 30Foreignfiling text P24-234 20251216

[1282] B7

[1283] 5

[1284]

[1285] 30Foreignfiling text P24-234 20251216

[1286] 5

[1287]

[1288] 30Foreignfiling text P24-234 20251216

[1289] 5

[1290]

[1291] 30Foreignfiling text P24-234 20251216

[1292] - 87 - 5

[1293] B29 C1

[1294]

[1295] 30Foreignfiling text P24-234 20251216

[1296] - 88 -

[1297] Evaluation of optimal exposure dose (DtS)

[1298] An adhesion promoter E2Stack AL412 (Brewer Science) is spin-coated at 1,500RPM for 30sec on a 12-inch silicon wafer and heated at 205°C for 60 seconds to obtain a 20 nm-thick underlayer film.

[1299] The composition of Example P1 is spin-coated at 1,500RPM for 30sec on 5

[1300] the underlayer film. The film is heated at 80°C for 60 seconds on a hot plate (pre-baking) to obtain a resist film with a thickness of 26 nm. The thickness of the resist film is measured by Lambda Ace “VM-1210” (SCREEN).

[1301] The pre-baked film is exposed by EUV with a peak wavelength of 13.5nm irradiated from NEX3400 (ASML) to print a pillar pattern. The pillar patten has a pitch of 50nm, a critical dimension of 20nm and a height of 30nm. The exposed film is heated at 70°C for 60 seconds on a hot plate (postexposure baking). The heated film is developed with n-butyl acetate for 30 seconds. By varying the exposure dose, the exposure doses that produce pillars with width of 50 nm, height of 100 nm and pitch of 100 nm are 15

[1302] respectively determined.

[1303] The determined doses are referred to as the optimal exposure dose (DtS) in mJ / cm2The focal point when the pillar width is 50nm is referred to as “the optimal focal point” hereinafter. The obtained results are described in Table 2. The same evaluation is conducted for the compositions of

[1304] 20

[1305] Examples P2 to P19 and Comparative Examples P1 to P3 by the same manner.

[1306] 30Foreignfiling text P24-234 20251216

[1307] - 89 -

[1308] [Table 2]

[1309] DtS (mJ / cm2)

[1310] Ex Pl 42.0

[1311] Ex P2 52.0

[1312] 5 Ex P3 46.0

[1313] Ex P4 50.0

[1314] Ex P5 50.0

[1315] Ex P6 39.0

[1316] Ex P7 53.0

[1317] Ex P8 35.0

[1318] Ex P9 46.5

[1319] Ex PIO 45.6

[1320] Ex Pll 46.5

[1321] Ex P12 45.6

[1322] Ex P13 34.2

[1323] Ex P14 33.1

[1324] Ex P15 50.3

[1325] Ex P16 40.3

[1326] Ex P17 33.4

[1327] Ex P18 33.5

[1328] Ex P19 42.9

[1329] Comp Pl 58.0

[1330] Comp P2 69.0

[1331]

[1332] Comp P3 65.0

[1333] Evaluation of depth of focus (DOF)

[1334] The resist pattern Example P20 is prepared and its DtS is determined as described by “Evaluation of optimal exposure dose.” The focal points when the pillar widths of the resist pattern of Example P20 are 45 and 55 nm are respectively measured. Said focal points are determined by shifting a focal 30

[1335] point from the optimal focal point while performing exposure with the DtS.Foreignfiling text P24-234 20251216

[1336] - 90 -

[1337] The absolute value of the distance between the measured two focal points is determined as DOF. The same evaluation is performed for the resist patterns of Examples P21 to P33 and comparative examples P4, P5 and P6. The results are described by Table 3.

[1338] 5

[1339] [Table 3]

[1340] DOF (nm)

[1341] Ex P20 113.0

[1342] Ex P21 113.0

[1343] Ex P22 121

[1344] Ex P23 144

[1345] Ex P24 160

[1346] Ex P25 150

[1347] Ex P26 141

[1348] Ex P27 145

[1349] Ex P28 160

[1350] Ex P29 144

[1351] Ex P30 140

[1352] Ex P31 138

[1353] Ex P32 160

[1354] Ex P33 103

[1355] Comp P4 92

[1356] Comp P5 92

[1357]

[1358] Comp P6 92

[1359] 30Foreignfiling text P24-234 20251216

[1360] - 91 -

[1361] Evaluation of exposure latitude (EL)

[1362] The resist pattern of Example P34 is prepared and its DtS is determined as described by “Evaluation of optimal exposure dose.” The exposure dose when the pillar widths of the resist pattern of Example P34 are 45 and 55 nm are respectively measured. The absolute value of the gap between the 5

[1363] measured two exposure doses is calculated. The ratio of the absolute value to the DtS is determined as EL. The same evaluation is performed for the resist patterns of Examples P35 to P69 and comparative example P5 and P6. The results are described by Table 4.

[1364] [Table 4]

[1365] EL (%)

[1366] Ex P34 17.5

[1367] Ex P35 13.1

[1368] Ex P36 13.1

[1369] Ex P37 15.5

[1370] Ex P38 17.6

[1371] Ex P39 18.1

[1372] Ex P40 17.6

[1373] Ex P41 15.5

[1374] Ex P42 13.1

[1375] Ex P43 13.1

[1376] Ex P44 17.5

[1377] Ex P45 16.6

[1378] Ex P46 15.7

[1379] Ex P47 15.7

[1380] Ex P48 18.2

[1381] Ex P49 17.8

[1382] Ex P50 18.0

[1383] Ex P51 15.7

[1384] Ex P52 15.7

[1385] 30

[1386]

[1387] Ex P53 17.3Foreignfiling text P24-234 20251216

[1388] [[Table 4] – continued

[1389] EL (%)

[1390] Ex P54 18.0

[1391] Ex P55 17.7

[1392] 5 Ex P56 16.9

[1393] Ex P57 18.0

[1394] Ex P58 17.7

[1395] Ex P59 16.9

[1396] Ex P60 16.3

[1397] Ex P61 15.3

[1398] Ex P62 10.0

[1399] Ex P63 7.5

[1400] Ex P64 13.6

[1401] Ex P65 12.8

[1402] Ex P66 16.3

[1403] Ex P67 14.2

[1404] Ex P68 8.5

[1405] Ex P69 15.1

[1406] Comp P5 18.3

[1407]

[1408] Comp P6 18.3

[1409] Evaluation of Local Critical Dimension Uniformity (LCDU)

[1410] The resist pattern of Example P70 is prepared as described by “Evaluation of optimal exposure dose.” The widths of the pattern are measured. Standard deviation is calculated based on the measured widths. The standard deviation is determined as Local Critical Dimension Uniformity (LCDU). The same evaluation is performed for the resist patterns of Examples P71 to P75 and comparative example P4. The results are described by Table 5.

[1411] 30Foreignfiling text P24-234 20251216

[1412] [Table 5]

[1413] LCDU

[1414] Ex P70 3.21

[1415] Ex P71 2.86

[1416] Ex P72 3.21

[1417] 5

[1418] Ex P73 2.82

[1419] Ex P74 2.98

[1420] Ex P75 2.63

[1421]

[1422] Comp P4 3.45

[1423] Evaluation of line edge roughness (LER) and line width roughness (LWR)

[1424] An adhesion promoter E2Stack AL412 (Brewer Science) is spin-coated at 1,500RPM for 30sec on a 12-inch silicon wafer and heated at 205°C for 60 seconds to obtain a 20 nm-thick underlayer film.

[1425] 15

[1426] The composition of Example L1 is spin-coated at 1,500RPM for 30sec on the underlayer film. The film is heated at 80°C for 60 seconds on a hot plate (pre-baking) to obtain a resist film with a thickness of 26 nm. The thickness of the resist film is measured by Lambda Ace “VM-1210” (SCREEN).

[1427] The pre-baked film is exposed by EUV with a peak wavelength of 13.5nm 20

[1428] irradiated from NEX3400 (ASML) through a mask with a width of 150 nm (line: space = 1:1). The exposed film is heated at 70°C for 60 seconds on a hot plate (post-exposure baking). The heated film is developed with n-butyl acetate for 30 seconds.

[1429] The widths of the pattern are measured. LER and LWR are determined based on the measured widths. The same evaluation is performed for the resist patterns of Examples L2 to L139 and Comparative examples L1 to L4. The results are described by Table 6.

[1430] 30Foreignfiling text P24-234 20251216

[1431] - 94 -

[1432] [Table 6] [Table 6] - continued LER(nm) LWR(nm) LER(nm) LWR(nm) Ex L1 2.85 3.61 Ex L51 2.64 3.05 Ex L2 2.51 3.60 Ex L52 2.67 3.09 Ex L3 2.63 3.46 Ex L53 2.52 2.73 Ex L4 2.38 3.36 Ex L54 2.70 3.23

[1433] Ex L55 2.34 2.62 5 Ex L5 2.67 3.44

[1434] Ex L56 2.25 3.21 Ex L6 2.75 3.51

[1435] Ex L57 2.17 3.22 Ex L7 2.74 3.40

[1436] Ex L58 2.23 3.12 Ex L8 3.03 3.66 Ex L59 2.17 3.26 Ex L9 2.83 3.64 Ex L60 2.24 3.21 Ex L10 2.80 3.54 Ex L61 2.77 3.68 Ex L11 2.75 3.58 Ex L62 2.66 3.62 Ex L12 2.78 3.55 Ex L63 2.47 3.41 Ex L13 2.38 3.36 Ex L64 2.48 3.55 Ex L14 2.85 3.67 Ex L65 2.30 3.32 Ex L15 2.74 3.40 Ex L66 2.60 3.45 Ex L16 2.80 3.45 Ex L67 2.57 3.47 Ex L17 2.79 3.48 Ex L68 2.49 3.43 Ex L18 2.80 3.59 Ex L69 2.63 3.54 Ex L19 2.78 3.53 Ex L70 2.51 3.58 Ex L20 2.80 3.52 Ex L71 2.55 3.57 Ex L21 2.79 3.46 Ex L72 2.48 3.69

[1437] Ex L73 2.26 3.11 Ex L22 2.87 3.69

[1438] Ex L74 2.26 3.31 Ex L23 2.82 3.66

[1439] Ex L75 2.27 3.11 Ex L24 2.77 3.52 Ex L76 2.55 3.47 Ex L25 2.81 3.61 Ex L77 2.62 3.67 Ex L26 2.82 3.58 Ex L78 2.68 3.58 Ex L27 2.64 3.38 Ex L79 2.35 3.34 Ex L28 2.31 3.26 Ex L80 2.49 3.55 Ex L29 2.34 3.24 Ex L81 2.58 3.54 Ex L32 3.00 3.66 Ex L82 2.31 3.30 Ex L33 2.96 3.68 Ex L83 2.19 3.04 Ex L34 2.96 3.68 Ex L84 2.12 2.99 Ex L35 2.95 3.68 Ex L85 2.01 2.81 Ex L36 3.00 3.66 Ex L86 1.89 2.64 Ex L37 2.96 3.68 Ex L87 1.88 2.62 Ex L38 2.96 3.68 Ex L88 2.40 3.49 Ex L39 2.95 3.68 Ex L89 2.28 3.38

[1440] Ex L90 2.20 3.38 Ex L41 2.86 3.63

[1441] Ex L91 2.29 3.43 Ex L42 2.97 3.67

[1442] Ex L92 2.43 3.56 Ex L43 2.93 3.69 Ex L93 2.35 3.41 Ex L44 2.93 3.63 Ex L94 2.22 3.29 Ex L45 2.48 3.55 Ex L95 2.15 3.25 Ex L46 2.41 3.41 Ex L96 2.34 3.43 Ex L47 2.44 3.41 Ex L97 2.62 3.65 30 Ex L48 2.47 3.26 Ex L98 2.45 3.62

[1443] Ex L49 2.95 3.33 Ex L99 2.38 3.50

[1444]

[1445] Ex L50 2.03 2.62

[1446]

[1447] Ex L100 2.30 3.10Foreignfiling text P24-234 20251216

[1448] [Table 6] – continued LER(nm) LWR(nm) Ex L101 2.55 3.47 Ex L102 2.34 3.19 Ex L103 2.22 3.29 Ex L104 2.15 3.25 5 Ex L105 2.09 3.08

[1449] Ex L106 2.11 3.03 Ex L107 2.12 3.12 Ex L108 2.27 3.34 Ex L109 2.51 3.44 Ex L110 2.40 3.26 Ex L111 2.44 3.43 Ex L112 2.55 3.47 Ex L113 2.35 3.34 Ex L114 2.49 3.55 Ex L115 2.55 3.47 Ex L116 2.34 3.19 Ex L117 2.46 3.41 Ex L118 2.67 3.63 Ex L119 2.29 3.20 Ex L120 2.40 3.26 Ex L121 2.44 3.43 Ex L122 2.46 3.41 Ex L123 2.41 3.43 Ex L124 2.44 3.27 Ex L125 2.59 3.59 Ex L126 2.24 3.15 Ex L127 2.42 3.36 Ex L128 2.44 3.38 Ex L129 2.52 3.52 Ex L130 2.60 3.62 Ex L131 2.53 3.56 Ex L132 2.67 3.67 Ex L133 2.45 3.43 Ex L134 2.60 3.62 Ex L135 2.81 3.68 Ex L136 2.87 3.60 Ex L137 2.91 3.69 Ex L138 2.78 3.47 Ex L139 2.96 3.69 Comp L1 4.71 4.91 30 Comp L2 3.67 4.51 Comp L3 4.77 5.65

[1450]

[1451] Comp L4 4.38 5.32

Claims

1. Foreignfiling text P24-234 20251216- 96 -Claims1. A composition comprising compound (A) represented by formula (1a) and compound (B) represented by formula (1b), wherein the compound (A) is different from the compound (B):5(1a)15where ml and m2 are each independently 1 or 0, preferably 0;n1 and n2 are each independently 0 or 1;X1is CpH2p-n1-n2or C6+4(q-1)H4+2(q-1)-n1-n2, preferably CpH2p-n1-n2;p is 1 to 6, preferably 1 to 3, more preferably 1 or 2;20q is 1 to 3, preferably 1;one or more H of X1may be each independently replaced with C1-5 alkyl; preferably replaced with linear C1-5 linear alkyl or branched C3-5 alkyl; more preferably replaced with methyl, ethyl, n-propyl or isopropyl; further preferably replaced with methyl;R1to R20, Q1, Q2, Q3and Q4are each independently H, F, Cl, Br, I, C1-15alkyl, C6-15aryl, Y1, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15 alkyl, cyclic C3-15 alkyl, Ce-15 aryl, Y1, COOH or OH; more preferably H, I, linear C1-10 linear alkyl, branched C3-10 alkyl, cyclic C3-10 alkyl, Ce-15 aryl or Y1; further preferably H, I, linear C1-6 alkyl, branched C3-6 30branched alkyl, cyclic C3-6 alkyl, or Y1;Foreignfiling text P24-234 20251216- 97 -one or more non-adjacent -CH2- of R1to R20, Q1, Q2, Q3and Q4may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -C≡C-;R21and R22are each independently H or C1-10 alkyl; preferably H, linear Ci- 10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear 5C1-5 alkyl;wherein one or more H of R1to R20, Q1, Q2, Q3and Q4may be each independently replaced with Ce-15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH;R5and R10may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R5and R10form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -C≡C-;R11and R16may form a single bond or C1-6 alkylene with each other; wherein one or more non-adjacent -CH2- of the alkylene R11and R16form with each other may be replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, 15-CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22- or -CEC-;when n1 and n2 are 0, R5, R10and X1may form C1-6 saturated hydrocarbon group with each other;wherein one or more non-adjacent -CH2- of the saturated hydrocarbon group R5, R10and X1form with each other may be replaced with Ce-15 20arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR21=CR22, or -C=C-,when m1=1 and m2=1, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1;when m1=1 and m2=0, at least one of R1, R2, R3, R4, R5, Q1and Q2and / or at least one of R6to R10are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; 30more preferably R3and R8are each independently Y1;Foreignfiling text P24-234 20251216- 98 -when m1=0 and m2=1, at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9, R10, Q3and Q4are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1; when ml =0 and m2=0, at least one of R1to R5and / or at least one of R6to 5R10are each independently Y1; preferably at least one of R2and R3and / or at least one of R7and R8are each independently Y1; more preferably R3and R8are each independently Y1;when n1 =1, preferably at least one of R11to R15is Y1; more preferably at least one of R12to R14is Y1;10when n2=1, preferably at least one of R16to R20is Y1; more preferably at least one of R17to R19is Y1;Y1is represented by formula (2):(2)20 na1=0 or 1;L1is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-;L3and L4are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene;one or more non-adjacent -CH2- of L1may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L1is not methylene;one or more H of L1may be each independently replaced withForeignfiling text P24-234 20251216C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;L2is C1-10 alkylene; preferably linear C1-10 alkylene, or branched or cyclic C3- 10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene;RA1is H, C1-5 alkyl or -CH2OH; preferably H, C1-5 linear alkyl, C3-5 branched 5alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH;(1b)15where m3 and m4 are each independently 1 or 0, preferably 0;n3 and n4 are each independently 0 or 1;X2is CrH2r-n3-n4or C6+4(s-1)H4+2(s-1)-n3-n4, preferably CrH2r-n3-n4;20 r is 1 to 6, preferably 1 to 3, more preferably 1 or 2;s is 1 to 3, preferably 1;one or more H of X2may be each independently replaced with C1-5 alkyl; preferably replaced with C1-5 linear alkyl or C3-5 branched alkyl; more preferably replaced with methyl, ethyl, n-propyl, isopropyl; further preferably replaced with methyl;R23to R42, Q5, Q6, Q7and Q8are each independently H, F, Cl, Br, I, C1-15alkyl, C6-15aryl, Y2, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15alkyl, branched C3-15alkyl, cyclic C3-15alkyl, C6-15aryl, Y2, COOH or OH; more preferably H, I, linear C1-10alkyl, branched C3-10alkyl, cyclic C3-10alkyl, C6-15aryl or Y2; further preferably H, I, C1-6linear alkyl, C3-6branched or cyclic alkyl, or Y2;Foreignfiling text P24-234 20251216- 100 -one or more non-adjacent -CH2- of R23to R42, Q5, Q6, Q7and Q8may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-;R43and R44are each independently H or C1-10 alkyl; preferably H, linear Ci- 10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably H or linear 5C1-5 alkyl;one or more H of R23to R42, Q5, Q6, Q7and Q8may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;R27and R32may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R27and R32form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-;R33and R38may form a single bond or C1-6 alkylene with each other; one or more non-adjacent -CH2- of the alkylene R33and R38form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-;when n3 and n4 are 0, R27, R32and X2may form C1-6 saturated hydrocarbon group with each other;one or more non-adjacent -CH2- of the saturated hydrocarbon group R27, R32and X2form with each other may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR43=CR44- or -C≡C-; when m3=1 and m4=1, at least one of R23, R24, R25, R26, R27, Q5and Q6and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2;when m3=1 and m4=0, at least one of R23, R24, R25, R26, R27, Q5and Q6and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each30independently Y2;Foreignfiling text P24-234 20251216when m3=0 and m4=1, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31, R32, Q7and Q8are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2;5when m3=0 and m4=0, at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31and R32are each independently Y2; preferably at least one of R24and R25and / or at least one of R29and R30are each independently Y2; more preferably R25and R30are each independently Y2;when n3=1, preferably at least one of R33, R34, R35, R36and R37is Y2; more preferably at least one of R34, R35and R36is Y2;when n4=1, preferably at least one of R38, R39, R40, R41and R42is Y2; more preferably at least one of R39, R40and R41is Y2;Y2is represented by formula (3):(3)LLz na2■*— — Lwhere na2=0 or 1;L5is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-;L7and L8are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C1-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene;30Foreignfiling text P24-234 20251216- 102 -one or more non-adjacent -CH2- of L5may be replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L5is not methylene;one or more H of L5may be each independently replaced withC6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;5L6is each independently C1-10 alkylene, preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene;RA2is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

2. The composition according to claim 1,wherein at least one of R1, R2, R3, R4and R5and / or at least one of R6, R7, R8, R9and R10and / or at least one of R11, R12, R13, R14and R15and / or at least one of R16, R17, R18, R19and R20of the compound (A) are each 15independently selected from one member of the group consisting of F, Cl, Br, I, and OH; preferably at least one of R1, R2, R4and R5and / or at least one of R6, R7, R9and R10and / or at least one of R11, R12, R14and R15and / or at least one of R16, R17, R19and R20of the compound (A) are each independently selected from one member of the group consisting of F, Cl, 20Br, I, and OH.

3. The composition according to claim 1 or 2,wherein at least one of R23, R24, R25, R26and R27and / or at least one of R28, R29, R30, R31and R32and / or at least one of R33, R34, R35, R36and R37and / or at least one of R38, R39, R40, R41and R42are each independently selected from one member of the group consisting of F, Cl, Br, I, and OH; preferably at least one of R23, R24, R26and R27and / or at least one of R28, R29, R31and R32and / or at least one of R33, R34, R36and R37and / or at least one of R38, R39, R41and R42of the compound (B) are each independently selected from 30one member of the group consisting of F, Cl, Br, I, and OH.Foreignfiling text P24-234 20251216- 103 -4. The composition according to any one of claims 1 to 3, wherein at least one of the compounds (A) and (B), preferably the compound (A) is represented by formula (4):(4)5where R45is H or C1-10 alkyl; preferably H or linear C1-10 alkyl, branched Ci- 10 alkyl or cyclic C3-10 alkyl; more preferably H or linear C1-5 alkyl; further 15preferably H, methyl, ethyl, n-propyl, isopropyl, further more preferably H or methyl;R46to R54are each independently H, F, Cl, Br, I, C1-15 alkyl, Ce-15 aryl, Y3, COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15 alkyl, cyclic C3-15 alkyl, Ce-15 aryl, Y3, COOH or OH; more preferably H, I, 20linear C1-10 alkyl, branched C3-10 alkyl, cyclic C3-10 alkyl, Ce-15 aryl or Y3; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, or Y3;one or more non-adjacent -CH2- of R46to R54may be each independently replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR55=CR56- or -C≡C-;R55and R56are each independently H or C1-10 alkyl; preferably linear C1-10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably linear C1-5 alkyl;one or more H of R46to R54may be each independently replaced with Ce-15 30aryl, -OC6H5, F, Cl, Br, I, COOH or OH;Foreignfiling text P24-234 20251216- 104 -at least one of R46, R47and R48and / or at least one of R49, R50and R51and / or at least one of R52, R53and R54are each independently Y3; preferably R47, R50and R53are each independently Y3;wherein Y3is represented by formula (5);(5)5where na3=0 or 1;L9is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, - CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, 15-CO-O- or -O-CO-;L11and L12are each independently a single bond or C1-5 alkylene; preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene; one or more non-adjacent -CH2- of L9may be replaced with Ce-15 arylene, - 20O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C C- when L9is not methylene;one or more H of L9may be each independently replaced withC6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;L10is C1-10 alkylene, preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene;RA3is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.

305. The composition according to any one of claims 1 to 3,Foreignfiling text P24-234 20251216- 105 -wherein at least one of the compounds (A) and (B), preferably the compound (B) is represented by formula (6):(6)5n41=0 or 1;R57to R68are each independently H, F, Cl, Br, I, C1-15 alkyl, Ce-15 aryl, Y4, 15COOH or OH; preferably H, F, Cl, Br, I, linear C1-15 alkyl, branched C3-15 branched, cyclic C3-15 alkyl, Ce-15 aryl, Y4, COOH or OH; more preferably H, I, C1-10 linear alkyl, branched C3-10 alkyl, cyclic C3-10 alkyl, Ce-15 aryl or Y4; further preferably H, I, linear C1-6 alkyl, branched C3-6 alkyl, cyclic C3-6 alkyl, orY4;20one or more non-adjacent -CH2- of R57to R68may be each independently replaced with Ce-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -0- CO-O-, -CR69=CR70- or -CEC-;L41is a single bond, C1-6 alkylene or -O-;one or more non-adjacent -CH2- of L41may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CR69=CR70- or -C≡C- when L41is not methylene;R69and R70are each independently H or C1-10 alkyl; preferably linear C1-10 alkyl, branched C3-10 alkyl or cyclic C3-10 alkyl; more preferably linear C1-5 alkyl;30one or more H of R57to R68may be each independently replaced with Ce-15 aryl, -OC6H5, F, Cl, Br, I, COOH or OH;Foreignfiling text P24-234 20251216- 106 -at least one of R57, R58and R59and / or at least one of R60, R61and R62and / or at least one of R63, R64and R65and / or R66, R67and R68are each independently Y4; preferably at least one of R57, R58and R59and / or at least one of R60, R61and R62are each independently Y4; more preferably R58, R59and R61are each independently Y4;5wherein Y4is represented by formula (7);(7)where na4=0 or 1;L13is a single bond, C1-5 alkylene, -O-, -CO-O- or -O-CO-, preferably a 15single bond, linear C1-5 alkylene, branched C3-5 alkylene, cyclic C3-5 alkylene, -O-, -CO-O- or -O-CO-; more preferably a single bond, methylene, ethylene, -O-, -CO-O- or -O-CO-;L15and L16are each independently a single bond or C1-5 alkylene, preferably a single bond, linear C1-5 alkylene, branched C3-5 alkylene or 20cyclic C3-5 alkylene; more preferably a single bond, methylene or ethylene; one or more non-adjacent -CH2- of L13may be replaced with C6-15 arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C- when L13is not methylene;one or more H of L13may be each independently replaced withC6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;L14is C1-10 alkylene, preferably linear C1-10 alkylene, branched C3-10 alkylene or cyclic C3-10 alkylene; more preferably linear C1-5 alkylene; further preferably methylene, ethylene or n-propylene;RA4is H, C1-5 alkyl or -CH2OH; preferably H, linear C1-5 alkyl, branched C3-5 30alkyl or -CH2OH; more preferably H, methyl, ethyl or -CH2OH.Foreignfiling text P24-234 20251216- 107 -6. The composition according to any one of claims 1 to 5, wherein the mole ratio of the compound (A) to the total of the compounds (A) and (B) is in the range from 0.1 to 0.95, preferably 0.2 to 0.9, more preferably 0.3 to 0.9, further preferably 0.4 to 0.9.

57. The composition according to any one of claims 1 to 6, wherein the composition further comprises an acid generator, preferably a photoacid generator.

8. The composition according to claim 7,wherein the acid generator is selected from one or more members of the following group consisting of iodonium salts, tetrahydrothiophenium salts, sulfonium salts, diazonium salts, and pyridinium salts; preferably selected from one or more members of the following group consisting of iodonium salts and sulfonium salts.

159. The composition according to any one of claims 7 and 8, wherein the acid generator is represented by the formula (8):(8) Bn+cation and Bn+anionwhere Bn+cation is a cation represented by one of the formulae (AC1 ) and 20(AC2);Bn+cation is n valent as a whole, n is 1 to 3; preferably 1 or 2; more preferably 1;Bn-anion is preferably an anion represented by one of the formulae (AA1 ), (AA2), (AA3), (AA4) and (AA5);Bn-anion is n valent as a whole, n is 1 to 3; preferably 1 or 2; more preferably 1;(AC1)30Foreignfiling text P24-234 20251216- 108 -5where nc1, nc2 and nc3 are each independently 0 or 1; preferably 0;Rc1, Rc2and Rc3are each independently C1-10alkyl, C6-15aryl, benzyl, F, Cl, Br, I, COOH or OH; preferably linear C1-10alkyl, branched C3-10alkyl, cyclic C3-10 alkyl, Ce-isaryl, benzyl, F, Cl, Br, I, COOH or OH; more preferably H or linear C1-5 alkyl, benzyl or I; further preferably H, methyl, ethyl, n-propyl, isopropyl, benzyl or I; further more preferably methyl, ethyl, benzyl or I; one or more non-adjacent -CH2- of Rc1, Rc2and Rc3may be each15independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C-;one or more H of Rc1, Rc2and Rc3may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;20(AC2) Rc4- l+- Rc5where Rc4and Rc5are each independently C1-20 alkyl, C1-20 aryl or C1-20 aralkyl; preferably linear C1-20 alkyl, branched C3-20 alkyl, cyclic C3-20 alkyl, C1-20 aryl or C1-20 aralkyl; more preferably C1-15 aryl or C1-15 aralkyl; further preferably C1-10 aryl;one or more non-adjacent -CH2- of Rc4and Rc5may be each independently replaced with C6-15arylene, -O-, -C6H4O-, -S-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C≡C-;one or more H of Rc4and Rc5may be each independently replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;(AA1)Foreignfiling text P24-234 20251216- 109 -where Ra11is P⁻ or Sb⁻;5 (AA2)where na21, na22, na23 and na24 are each independently 0 to 5; 15 preferably 5;Ra21, Ra22, Ra23and Ra24are each independently fluorine-substituted or unsubstituted C1-6 alkyl, F, Cl, Br, I, COOH or OH; preferably fluorinesubstituted or unsubstituted linear C1-6 alkyl, fluorine-substituted or unsubstituted branched C3-6 alkyl, fluorine-substituted or unsubstituted 20 cyclic C3-6 alkyl, F, Cl, Br, I, COOH or OH; more preferably F;30Foreignfiling text P24-234 20251216- 110 -(AA3)Ra31o=s=oO w, C’ / / O5 D a33 % / / SRa32KO owhere Ra31, Ra32and Ra33are each independently fluorine-substituted or unsubstituted C1-6alkyl, F, Cl, Br, I, COOH or OH, preferably fluorine-substituted or unsubstituted linear C1-6alkyl, fluorine-substituted or unsubstituted branched C3-6alkyl, fluorine-substituted or unsubstituted cyclic C3-6alkyl, F, Cl, Br, I, COOH or OH; more preferably fluorine-substituted linear C1-6alkyl; further preferably -CF3;(AA4)OO" — S — Ra4115Owhere Ra41is C1-15 alkyl or C1-15 aryl, preferably linear C1-15 alkyl, branched Ce-is alkyl, cyclic Ce-is alkyl, or C1-15 aryl; more preferably cyclic Ce-is alkyl or C1-15 aryl;20 one or more non-adjacent -CH2- of Ra41may be replaced withC6-15 arylene, -O-, -C6H4O-, -S-, -O-SO2-, -CO-, -CO-O-, -O-CO-, -O-CO-O-, -CH=CH- or -C=C-;one or more H of Ra41may be replaced with C6-15aryl, -OC6H5, F, Cl, Br, I, COOH or OH;(AA5)30Foreignfiling text P24-234 20251216- 111 -Ra51is C1-6 alkylene or C6-12 arylene, -CO-, -CO-O-, -O-CO-, or -O-CO-O-; preferably linear C1-6 alkylene, branched C3-6 alkylene, cyclic C3-6 alkylene, C6-12 arylene, -CO-, -CO-O-, -O-CO-, or -O-CO-O-; more preferably methylene, ethylene, propylene, butylene or -CO-; further preferably methylene, ethylene or -CO-;5na51 is 0 or 1.

10. The composition according to any one of claims 7 to 9, wherein the mole ratio of the acid generator to the total of the compound (A) and the compound (B) is 0.10 to 0.99, preferably 0.15 to 0.90, more preferably 0.25 to 0.85, further preferably 0.40 to 0.85.

11. The composition according to any one of claims 7 to 10, wherein the acid generator comprises a first acid generator and a second acid generator,15wherein the first acid generator is different from the second acid generator in structure.

12. The composition according to any one of claims 1 to 11, wherein the composition further comprises a solvent,20preferably the solid content of the composition is in the range from 0.1 to 10mass%, more preferably 0.5 to 5mass%, further preferably 1 to 3mass%.

13. The composition according to any one of claims 1 to 12, wherein the composition is a resist composition, preferably a negative tone resist composition.

14. A method for producing a resist film comprising step (1 a) and (1 b): (1a) applying the composition according to any one of claims 1 to 13 above a substrate, preferably directly or via one or more of the underlayers on a 30substrate, more preferably via one or more adhesion enhancing layers on a substrate;Foreignfiling text P24-234 20251216- 112 -preferably by spin-coating at the RPM in the range from 500 to 3,000rpm for the time in the range from 5 to 100sec, more preferably at the RPM in the range from 600 to 2,500rpm for the time in the range from 10 to 70sec, further preferably at the RPM in the range from 700 to 1,900rpm for the time in the range from 10 to 50sec;5(1b) heating the applied composition preferably at the temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 60 to 180°C; preferably for the time in the range from 1 to 400min, more preferably 3 to 200min, further preferably 5 to 120min.

15. A method for producing a resist pattern comprising steps (2a), (2b), (2c) and (2d):(2a) producing a resist film by the method according to claim 14;(2b) exposing the resist film, preferably with light having the peak wavelength in the range from 10 to 300nm, more preferably 13 to 248nm; 15(2c) heating the exposed resist film preferably at the temperature in the range from 30 to 300°C, more preferably 40 to 250°C, further preferably 50 to 200°C, preferably for the time in the range from 1 to 400sec, more preferably 3 to 200sec, further preferably 5 to 120sec;(2d) developing the exposed resist film.2016. A method for producing a processed substrate comprising steps (3a) and (3b):(3a) producing a resist pattern by the method according to claim 15;(3b) processing a substrate by using the resist pattern as a mask by etching.

17. A method for producing a processed substrate comprising steps (4a) and (4b) or (4c):(4a) producing a resist pattern by the method according to claim 15;30(4b) performing ion implantation using the resist pattern as a mask;Foreignfiling text P24-234 20251216- 113 -(4c) processing the underlayer beneath the resist pattern using the resist pattern as a mask to form an underlayer pattern, and performing ion implantation using the underlayer pattern as a mask.

18. A method for producing a device, preferably a semiconductor 5device comprising the method according to any one of claims 14 to 17, wherein the method further comprises a step of forming wiring on the processed substrate.

19. Use of the composition according to any one of claims 1 to 13 for producing a resist film.30

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