Recess profiling after controlled wet etching reveals MOS transistor failure more accurately by protecting the substrate from profile distortion.
Resonant nanoantennas add anisotropy to a 2D photodetector, enabling on-chip LWIR spectral and polarization sensing without bulky spectrometers.
An added contact layer enables E-beam inspection of metal via filling, exposing open circuits early and reducing semiconductor process losses.
Grouped antennas and shielding via arrays cut interference in dense IC test fixtures, preserving signal integrity during sequential testing.
Frontside SEM e-beam probing with ATE bypasses blocked backside access in SPR chips, enabling dynamic fault isolation and process revision.
Real-time stage position feedback steers the electron beam during non-contact wafer testing, improving alignment accuracy and throughput.
Continuous stage motion can disrupt wafer targeting; position feedback adjusts electron-beam deflection for accurate NCEM.