Scanning device of laser radar and structural optimization method of scanning device

Abstract

The present application relates to a scanning device of a laser radar and a method for optimizing the structure of the scanning device. The scanning device includes a substrate, a scanning mirror, a driving ring, a fast axis and a slow axis; at least one of the fast axis and the slow axis is a stress equalization structure, and the stress equalization structure includes a single-axis structure or a dual-axis structure. A driving hole is provided on the substrate, the scanning mirror is connected to the driving ring through the fast axis, the driving ring is connected to the substrate through the slow axis, and the scanning mirror is arranged at the center of the driving ring, which is arranged at the center of the driving hole. The above-mentioned device optimizes the structure of the traditional fast axis or slow axis into a stress equalization structure, so that the deformation mode of the fast axis or slow axis is transformed from a torsional mode to a bending mode, thereby reducing the stress magnitude in the stress concentration area during the cyclic motion process, and keeping the stress away from the fatigue failure stress threshold, thereby greatly improving the durability of the non-silicon scanning mirror and thereby improving the working life of the device.

Description

Technical Field

[0001] The present application relates to the field of laser technology, and in particular to a scanning device of a laser radar and a structural optimization method of the scanning device. Background Art

[0002] In recent years, intelligent driving technology has gradually come into the public eye. LiDAR, the eyes of intelligent driving technology, possesses strong technological capabilities due to its active detection capabilities. However, the integration of LiDAR into vehicles has not been smooth sailing. High costs have hampered its mass production and adoption, leading major LiDAR companies to focus on cost reduction and efficiency improvement across various modules. The scanning mirror system, as the core module of LiDAR, controls the scanning pattern. Reducing the cost of scanning mirrors is one of the technical means by which LiDAR companies can achieve this. Non-silicon scanning mirror technology, with its many advantages, including low process costs, has become a key method for reducing LiDAR costs.

[0003] Non-silicon scanning mirror technology usually uses alloy as the substrate. Compared with silicon-based substrates, the fatigue failure stress threshold of alloy substrates is lower, which can easily cause the problem of optical scanning angle shrinkage, thereby seriously affecting the field of view of the lidar. In extreme cases, it may cause the lidar system to be paralyzed.

[0004] Therefore, how to improve the durability of non-silicon scanning mirrors has become an urgent problem to be solved in current lidar technology. Summary of the Invention

[0005] Based on this, it is necessary to provide a scanning device of a laser radar and a structural optimization method of the scanning device that can improve the durability of the non-silicon scanning mirror in order to address the above technical problems.

[0006] In a first aspect, the present application provides a laser radar scanning device, comprising: a substrate, a scanning mirror, a drive ring, a fast axis, and a slow axis; at least one of the fast axis and the slow axis is a stress equalization structure, and the stress equalization structure includes a single-axis structure or a dual-axis structure;

[0007] A driving hole is set on the substrate, the scanning mirror is connected to the driving ring through a fast axis, the driving ring is connected to the substrate through a slow axis, and the scanning mirror is set at the center of the driving ring, which is set at the center of the driving hole.

[0008] In one embodiment, the stress equalization structure includes any one of a concave structure, a convex structure, a trapezoidal structure, an hourglass structure, and an arched structure.

[0009] In one embodiment, the dual-axis structure includes a first axis and a second axis, the first slow axis and the second slow axis are arranged in parallel between the driving ring and the substrate, and the first fast axis and the second fast axis are arranged in parallel between the scanning mirror and the driving ring.

[0010] In one embodiment, the first shaft and the second shaft are both rectangular structures, and the width of the first shaft is the same as the width of the second shaft, and the length of the first shaft is the same as the length of the second shaft.

[0011] In one embodiment, the single-axis structure includes a third axis, the slow-axis third axis is disposed between the driving ring and the substrate, and the fast-axis third axis is disposed between the scanning mirror and the driving ring.

[0012] In a second aspect, the present application further provides a method for optimizing the structure of a scanning device, which is applied to the scanning device according to any one of the first aspects above, and comprises:

[0013] For the slow axis in the scanning device, by simulating the process of the original slow axis differentiating into one axis or two axes, the width at the position of each point on the third axis or the width at the position of each point on the first axis and the second axis is determined; the length of the first axis and the length of the second axis are the first preset length threshold, and the length of the third axis is the second preset length threshold.

[0014] In one embodiment, the slow axis has a dual-axis structure. For the slow axis in the scanning device, by simulating a process in which the original slow axis is divided into one axis or two axes, the width at each point on the third axis or the width at each point on the first axis and the second axis is determined, including:

[0015] For the slow axis in the scanning device, the width of each point on the first axis and the second axis is determined by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis; the length of the first axis and the length of the second axis are preset length thresholds.

[0016] In one embodiment, the first axis and the second axis are both rectangular structures, and the width of each point on the first axis and the second axis is determined by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis, including:

[0017] Get the resonant frequency and width of the original axis;

[0018] Based on the principle that the resonant frequency of the original axis, the resonant frequency of the first axis, and the resonant frequency of the second axis are consistent, simulation is performed according to the resonant frequency, the width of the original axis, and the preset axis spacing between the fourth axis and the fifth axis, and the width of each point on the first axis and the second axis is calculated.

[0019] In one embodiment, the method further comprises:

[0020] Setting the spacing between the first axis and the second axis of the slow axis in the scanning device to a plurality of preset spacings;

[0021] Start the scanning device to scan at each preset distance to obtain the corresponding scanning frequency at each preset distance;

[0022] The preset spacing corresponding to the minimum scanning frequency is determined as the preset axis spacing between the fourth axis and the fifth axis; the fourth axis corresponds to the first axis, and the fifth axis corresponds to the second axis.

[0023] In one embodiment, the first axis and the second axis are both stress-averaged structures, and the width at each point on the first axis and the second axis is determined by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis, including:

[0024] A plurality of first width groups are obtained by simulating a process of applying a first preset pressure on the fourth axis and the fifth axis; the first width groups include the widths at the positions of the points to be optimized on the fourth axis and the fifth axis;

[0025] According to the plurality of first width groups, pressure tests are performed on the corresponding plurality of simulation axes through simulation to determine a first target width group; each width in the first target width group corresponds to the width at the location of each to-be-optimized point on the first axis and the second axis;

[0026] The widths at the positions of other points on the first axis and the second axis are determined according to the widths at the positions of the points to be optimized on the first axis and the second axis.

[0027] In one embodiment, a plurality of first width groups are obtained through a simulation process of applying a first preset pressure on the fourth axis and the fifth axis, including:

[0028] Applying a first preset pressure to the fourth axis and the fifth axis to obtain first stress curves corresponding to the fourth axis and the fifth axis;

[0029] According to the first stress curves corresponding to the fourth axis and the fifth axis, a plurality of first width groups are determined; the first width groups include the widths at the positions of the points to be optimized on the corresponding simulation axes.

[0030] In one embodiment, determining a plurality of first width groups according to the first stress curves corresponding to the fourth axis and the fifth axis includes:

[0031] The points corresponding to the maximum stress value and the minimum stress value on the first stress curve corresponding to the fourth axis and the fifth axis are used as points to be optimized, and a first initial width group is generated; the first initial width group includes the widths corresponding to the optimization points on the fourth axis or the fifth axis;

[0032] At least one width in the first initial width group is adjusted multiple times to generate multiple first width groups.

[0033] In one embodiment, according to the plurality of first width groups, simulating the corresponding plurality of simulated axes to perform pressure tests to determine the first target width group includes:

[0034] Simulating a plurality of corresponding simulation axes according to the plurality of first width groups;

[0035] Applying a second preset pressure to each simulation axis to obtain a stress value of each point to be optimized on each simulation axis;

[0036] A first target width group is determined according to the stress value of each point to be optimized on each simulation axis; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis.

[0037] In one embodiment, determining the first target width group according to the stress value of each point to be optimized on each simulation axis includes:

[0038] Determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points;

[0039] A stress point with a minimum value is screened out from the multiple stress points, and the width group where the stress point with the minimum value belongs is determined as the first target width group.

[0040] In one embodiment, the slow axis is a single-axis structure. For the slow axis in the scanning device, by simulating a process in which the original slow axis is divided into one axis or two axes, determining the width of each point on the third axis or determining the width of each point on the first axis and the second axis includes:

[0041] For the slow axis in the scanning device, the width of each point on the third axis is determined by simulating the process of the original slow axis differentiating into the sixth axis.

[0042] In one embodiment, determining the width of each point on the third axis by simulating the process of the original slow axis differentiating into the sixth axis includes:

[0043] A plurality of second width groups are obtained by simulating a process of applying a third preset pressure on the sixth axis; the second width groups include the widths at the positions of the points to be optimized on the sixth axis;

[0044] According to the plurality of second width groups, pressure tests are performed on the corresponding plurality of simulation axes by simulation to determine a second target width group; each width in the second target width group corresponds to the width at the location of each point to be optimized on the third axis;

[0045] The widths of the other points on the third axis are determined based on the widths of the points to be optimized on the third axis.

[0046] In one embodiment, a plurality of second width groups are obtained through a simulation process of applying a third preset pressure on the sixth axis, including:

[0047] Applying a third preset pressure to the sixth axis to obtain a stress curve corresponding to the sixth axis;

[0048] According to the stress curve corresponding to the sixth axis, a plurality of second width groups are determined; the second width groups include the widths at the positions of the points to be optimized on the corresponding simulation axes.

[0049] In one embodiment, determining a plurality of second width groups according to a stress curve corresponding to the sixth axis includes:

[0050] The points corresponding to the maximum stress value and the minimum stress value on the stress curve corresponding to the sixth axis are used as points to be optimized, and a second initial width group is generated; the second initial width group includes the widths corresponding to the optimization points on the sixth axis;

[0051] At least one width in the second initial width group is adjusted multiple times to generate multiple second width groups.

[0052] In one embodiment, according to the plurality of second width groups, simulating the corresponding plurality of simulated axes to perform pressure tests to determine the second target width group includes:

[0053] Simulating a plurality of corresponding simulation axes according to the plurality of second width groups;

[0054] Applying a fourth preset pressure to each simulation axis to obtain a stress value of each point to be optimized on each simulation axis;

[0055] The second target width group is determined according to the stress value of each point to be optimized on each simulation axis; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis.

[0056] In one embodiment, determining the second target width group according to the stress value of each point to be optimized on each simulation axis includes:

[0057] Determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points;

[0058] A stress point with a minimum value is screened out from the multiple stress points, and the width group where the stress point with the minimum value belongs is determined as the second target width group.

[0059] In a third aspect, the present application further provides a structural optimization device for a scanning device, the device comprising:

[0060] A determination module is used to determine the width of each point on the third axis or the width of each point on the first axis and the second axis by simulating the process of the original slow axis dividing into one axis or two axes in the slow axis of the scanning device; the length of the first axis and the length of the second axis are the first preset length threshold, and the length of the third axis is the second preset length threshold.

[0061] In a fourth aspect, the present application further provides a computer device comprising a memory and a processor, wherein the memory stores a computer program, and when the processor executes the computer program, the steps of the structural optimization method of the scanning device of any one of the above-mentioned second aspects are implemented.

[0062] In a sixth aspect, the present application further provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the structural optimization method for a scanning device according to any one of the above-mentioned second aspects.

[0063] In a seventh aspect, the present application further provides a computer program product, which includes a computer program, and when the computer program is executed by a processor, it implements the steps of the structural optimization method of the scanning device of any one of the above-mentioned second aspects.

[0064] The scanning device of the above-mentioned laser radar and the structural optimization method of the scanning device, the scanning device includes a substrate, a scanning mirror, a driving ring, a fast axis and a slow axis; at least one of the fast axis and the slow axis is a stress equalization structure, and the stress equalization structure includes a single-axis structure or a dual-axis structure. A driving hole is provided on the substrate, the scanning mirror is connected to the driving ring through the fast axis, the driving ring is connected to the substrate through the slow axis, and the scanning mirror is arranged at the center of the driving ring, and the driving ring is arranged at the center of the driving hole. The above-mentioned device optimizes the structure of the traditional fast axis or slow axis into a stress equalization structure, so that the deformation mode of the fast axis or slow axis is transformed from a torsional mode to a bending mode, thereby reducing the stress magnitude in the stress concentration area during the cyclic motion process, and keeping the stress away from the fatigue failure stress threshold, thereby greatly improving the durability of the non-silicon scanning mirror and thereby improving the working life of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0065] Figure 1 1 is a schematic structural diagram of a scanning device of a laser radar in one embodiment;

[0066] Figure 2 A schematic diagram of a biaxial structure of a rectangular structure in one embodiment;

[0067] Figure 3 is a schematic structural diagram of a laser radar scanning device in another embodiment;

[0068] Figure 4 Schematic diagram of the uniaxial structure of the original slow axis in one embodiment;

[0069] Figure 5 1 is a flow chart of a method for optimizing the structure of a scanning device according to an embodiment;

[0070] Figure 6 A schematic diagram of the process from an original axis to a dual-axis structure in one embodiment;

[0071] Figure 7 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0072] Figure 8 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0073] Figure 9 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0074] Figure 10 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0075] Figure 11 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0076] Figure 12 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0077] Figure 13 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0078] Figure 14 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0079] Figure 15 is a schematic flow chart of a method for optimizing the structure of a scanning device according to another embodiment;

[0080] Figure 16 Schematic diagram of stress curves of various points to be optimized in one embodiment;

[0081] Figure 17 is a schematic diagram of minimum stress values ​​under different optimization conditions in one embodiment;

[0082] Figure 18 is a schematic diagram of maximum stress values ​​of different structures in one embodiment;

[0083] Figure 19 is a diagram of the internal structure of a computer device in one embodiment;

[0084] Description of reference numerals:

[0085] Substrate 10; Driving hole 60; Scanning mirror 20;

[0086] Drive ring 30; Fast axis 40; Slow axis 50;

[0087] First axis 01; Second axis 02; Third axis 03. DETAILED DESCRIPTION

[0088] In order to make the purpose, technical solutions and advantages of this application more clear, the following further describes this application in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain this application and are not intended to limit this application.

[0089] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which this application belongs; the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" and any variations thereof in the specification and claims of this application and the above-mentioned figure descriptions are intended to cover non-exclusive inclusions.

[0090] In the description of the embodiments of this application, the technical terms "first" and "second" are used only to distinguish different objects and should not be understood to indicate or imply relative importance or implicitly specify the quantity, specific order, or primary and secondary relationship of the indicated technical features. In the description of the embodiments of this application, the meaning of "plurality" is more than two, unless otherwise clearly and specifically defined.

[0091] References herein to "embodiments" mean that a particular feature, structure, or characteristic described in connection with the embodiments may be included in at least one embodiment of the present application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it constitute an independent or alternative embodiment that is mutually exclusive of other embodiments. It is understood, both explicitly and implicitly, by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0092] In recent years, intelligent driving technology has gradually gained traction. LiDAR, the eyes of intelligent driving technology, possesses strong technological capabilities due to its active detection capabilities. However, the integration of LiDAR into vehicles has been challenging. High costs have hampered its mass production and adoption, leading major LiDAR companies to focus on cost reduction and efficiency improvement across all modules. The scanning mirror system, as the core module of LiDAR, controls the scanning pattern. Reducing the cost of scanning mirrors is one of the technical means by which LiDAR companies can achieve this. Non-silicon scanning mirror technology, with its low process costs and other advantages, has become a key method for reducing LiDAR costs. Non-silicon scanning mirror technology typically uses an alloy substrate. Compared to silicon-based substrates, alloy substrates have a lower fatigue failure stress threshold, which can easily lead to a reduction in the optical scanning angle, severely impacting the LiDAR's field of view. In extreme cases, it can even cause the LiDAR system to fail. Therefore, improving the durability of non-silicon scanning mirrors is a pressing issue in LiDAR technology.

[0093] In one embodiment, Figure 1 As shown, a laser radar scanning device is provided, which includes: a substrate 10, a scanning mirror 20, a driving ring 30, a fast axis 40, a slow axis 50 and a driving hole 60; at least one of the fast axis 40 and the slow axis 50 is a stress equalization structure, and the stress equalization structure includes a uniaxial structure or a biaxial structure;

[0094] The substrate 10 is provided with a drive hole 60, the scanning mirror 20 is connected to the drive ring 30 via a fast axis 40, and the drive ring 30 is connected to the substrate 10 via a slow axis 50. The scanning mirror 20 is disposed at the center of the drive ring 30, and the drive ring 30 is disposed at the center of the drive hole 60. The stress distribution of the biaxial stress equalization structure is more uniform than that of the traditional uniaxial stress distribution, avoiding fatigue fracture caused by excessive stress in a certain location. The stress equalization structure can include any of a concave structure, a convex structure, a trapezoidal structure, an hourglass structure, and an arched structure.

[0095] The substrate 10 is used to carry the other components and provide structural support. The material of the substrate 10 can be an alloy material or a silicon material, and the shape can be rectangular, annular, or other shapes. The scanning mirror can be a micro scanning mirror 20 (Micro-Electro-Mechanical Systems Scanning Mirror, abbreviated as MEMS scanning mirror), or other types of scanning mirrors. The drive ring 60 can be a circular ring or an elliptical ring, and the material of the drive ring 60 can be an alloy material or a silicon material. The materials of the fast axis 40 and the slow axis 50 can be the same or different, and their structures can be the same or different. The fast axis 40 can be a dual-axis structure, and the slow axis 50 can be a uniaxial structure; optionally, the fast axis 40 can be a uniaxial structure, and the slow axis 50 can be a dual-axis structure; optionally, the fast axis 40 and the slow axis 50 can both be dual-axis structures; optionally, the fast axis 40 and the slow axis 50 can both be uniaxial structures.

[0096] In an embodiment of the present application, the drive ring 30 is connected to the substrate 10 through the slow axis 50, so that the center position of the entire scanning device is determined and stabilized. The scanning mirror 20 is connected to the drive ring 30 through the fast axis 40. The structural design of the fast axis 40 and the slow axis 50 can enable the scanning mirror 20 to achieve a balance between fast scanning and fine adjustment. The scanning device controls the movement of the drive ring 30 so that the scanning mirror 20 can scan according to a predetermined trajectory, thereby realizing precise positioning and scanning of the laser beam.

[0097] The scanning device of the laser radar provided in the embodiment of the present application optimizes the traditional fast axis or slow axis structure into a stress equalization structure, so that the deformation mode of the fast axis or slow axis is transformed from a torsional mode to a bending mode, thereby reducing the stress magnitude in the stress concentration area during cyclic motion, and keeping the stress away from the fatigue failure stress threshold, thereby greatly improving the durability of the non-silicon scanning mirror and thereby increasing the service life of the device.

[0098] In one embodiment, Figure 2 As shown, the dual-axis structure includes a first axis 01 and a second axis 02, the first axis of the slow axis 50 and the second axis of the slow axis 50 are arranged in parallel between the drive ring 30 and the substrate 10, and the first axis of the fast axis 40 and the second axis of the fast axis 40 are arranged in parallel between the scanning mirror 20 and the drive ring 30.

[0099] The structure of the first axis 01 in the dual-axis structure may be the same as or different from the structure of the second axis 02 , and the widths of various points on the first axis 01 or the second axis 02 may be the same or different.

[0100] In the embodiment of the present application, by setting the slow axis 50 in parallel between the drive ring 30 and the substrate 10, the first axis and the second axis of the slow axis 50 can achieve fine vertical adjustment and positioning of the scanning mirror. By setting the fast axis 40 in parallel between the scanning mirror 20 and the drive ring 30, the first axis and the second axis of the fast axis 40 can achieve fast horizontal scanning and adjustment of the scanning mirror 20.

[0101] The scanning device of the laser radar provided in the embodiment of the present application, through the parallel arrangement of the first axis 01 and the second axis 02 of the slow axis 50 and the fast axis 40 in the dual-axis structure, the scanning mirror can achieve independent and efficient control and adjustment in the vertical and horizontal directions, thereby ensuring that the system can meet the requirements for optical scanning and positioning accuracy.

[0102] In one embodiment, the first axis 01 and the second axis 02 are both rectangular structures. Figure 3 As shown, the width of the first axis 01 is the same as the width of the second axis 02, and the length of the first axis 01 is the same as the length of the second axis 02.

[0103] In the embodiment of the present application, there are three situations: the first situation is that the first axis and the second axis of the slow axis 50 are both rectangular structures, and the first axis and the second axis of the fast axis 40 are non-rectangular structures; the second situation is that the first axis and the second axis of the slow axis 50 are both rectangular structures, and the first axis and the second axis of the fast axis 40 are both rectangular structures; the third situation is that the first axis and the second axis of the fast axis 40 are both rectangular structures, and the first axis and the second axis of the slow axis 50 are non-rectangular structures.

[0104] In one embodiment, the single-axis structure includes a third axis 03 , the third axis 03 of the slow axis 50 is disposed between the drive ring 30 and the substrate 10 , and the third axis of the fast axis 40 is disposed between the scanning mirror 20 and the drive ring 30 .

[0105] The widths of the points on the third axis 03 of the single-axis structure may be the same or different.

[0106] In summary of the laser radar scanning devices described in all the above embodiments, the present application further provides a laser radar scanning device, which includes: a substrate 10, a scanning mirror 20, a drive ring 30, a fast axis 40, and a slow axis 50; at least one of the fast axis 40 and the slow axis 50 is a stress equalization structure, and the stress equalization structure includes a uniaxial structure or a biaxial structure;

[0107] The single-axis structure includes a third axis 03, wherein the third axis 03 of the slow axis 50 is disposed between the drive ring 30 and the substrate 10, and the third axis of the fast axis 40 is disposed between the scanning mirror 20 and the drive ring 30. The dual-axis structure includes a first axis 01 and a second axis 02, wherein the first axis of the slow axis 50 and the second axis of the slow axis 50 are disposed in parallel between the drive ring 30 and the substrate 10, and the first axis of the fast axis 40 and the second axis of the fast axis 40 are disposed in parallel between the scanning mirror 20 and the drive ring 30. The stress equalization structure includes any one of a concave structure, a convex structure, a trapezoidal structure, an hourglass structure, and an arched structure. A drive hole 60 is provided on the substrate 10, and the scanning mirror 20 is connected to the drive ring 30 via the fast axis 40. The drive ring 30 is connected to the substrate 10 via the slow axis 50. The scanning mirror 20 is disposed at the center of the drive ring 30, and the drive ring 30 is disposed at the center of the drive hole 60.

[0108] Based on the above-mentioned laser radar scanning device, the present application further provides a method for optimizing the structure of the scanning device, which is described by taking the method applied to the scanning device of any one of the above-mentioned embodiments as an example, and includes the following steps:

[0109] For the slow axis in the scanning device, by simulating the process of the original slow axis being differentiated into one axis or two axes, the width of each point on the third axis or the width of each point on the first axis and the second axis is determined.

[0110] The length of the first axis and the length of the second axis are a first preset length threshold, and the length of the third axis is a second preset length threshold.

[0111] In an embodiment of the present application, in the process of differentiating the original slow axis into one axis or two axes, the computer device can first convert the structure corresponding to the original slow axis into an initial stress equalization structure, and then determine the stress value of each point on the initial stress equalization structure based on the converted initial stress equalization structure. By cyclically adjusting the width at the location of each point in the initial stress equalization structure, a target third axis, or a target first axis and a target second axis that meet preset requirements are obtained. For example, the preset requirement may be that the stress of each point on the target third axis, or the target first axis and the target second axis is uniform. Finally, the width at the location of each point on the target third axis, or the target first axis and the target second axis is used as the width at the location of each point on the third axis, or the first axis and the second axis, and the target stress equalization structure is designed based on the width at the location of each point on the third axis, or the first axis and the second axis.

[0112] The scanning device structural optimization method provided in the embodiments of the present application determines the width of each point on the third axis or the width of each point on the first and second axes by simulating the process of the original slow axis splitting into one or two axes. In this method, by optimizing the structure of the traditional fast or slow axis into a stress-averaging structure, the deformation mode of the fast or slow axis is transformed from a torsional mode to a bending mode, reducing the stress in the stress concentration area during cyclic motion and keeping the stress away from the fatigue failure stress threshold. This greatly improves the durability of the non-silicon scanning mirror and thereby increases the service life of the device.

[0113] In one embodiment, when the slow axis is a dual-axis structure, a specific implementation method for determining the width of each point on the first axis and the second axis or the width of each point on the third axis is further provided. The above step of "determining the width of each point on the third axis or the width of each point on the first axis and the second axis by simulating the process of the original slow axis splitting into one axis or two axes for the slow axis in the scanning device" includes:

[0114] For the slow axis in the scanning device, the width of each point on the first axis and the second axis is determined by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis.

[0115] The length of the first axis and the length of the second axis are preset length thresholds. The original slow axis is a single-axis structure, which can be seen in Figure 4 The fourth and fifth axes represent intermediate structures in the process of optimizing the dual-axis structure of the scanning device.

[0116] In an embodiment of the present application, in the process of optimizing the original slow axis into a biaxial structure, the computer device can first convert the single axis corresponding to the original slow axis into an initial biaxial structure, and then determine the stress value of each point on the initial biaxial structure based on the converted initial biaxial structure, and obtain the target fourth axis and target fifth axis that meet the preset requirements by cyclically adjusting the width of the fourth axis and the fifth axis or the distance between the fourth axis and the fifth axis in the initial biaxial structure. For example, the preset requirement may be that the stress of each point on the target fourth axis and the target fifth axis is uniform, and finally the width at the position of each point on the target fourth axis and the target fifth axis is used as the width at the position of each point on the first axis and the second axis, and the target biaxial structure is designed based on the width at the position of each point on the first axis and the second axis.

[0117] In one embodiment, a method for optimizing the structure of a fast axis in a scanning device is provided, the method comprising:

[0118] For the fast axis in the scanning device, the width of each point on the first axis and the second axis is determined by simulating the process of the original fast axis dividing into the fourth axis and the fifth axis; the length of the first axis and the length of the second axis are the preset length thresholds.

[0119] The method described in this embodiment is similar to the aforementioned slow axis optimization method. Please refer to the aforementioned description for details, which will not be repeated here.

[0120] In one embodiment, when both the first axis and the second axis are rectangular structures, a specific implementation method for determining the width of each point on the first axis and the second axis is also provided, such as Figure 5 As shown, the above step of "determining the width of each point on the first axis and the second axis by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis" includes:

[0121] S101 , obtaining the resonant frequency and width of the original axis.

[0122] In an embodiment of the present application, the computer device can obtain the resonant frequency of the original axis through Raman spectroscopy, infrared spectroscopy and other technologies, and the computer device can perform spectral measurement on the original axis to obtain the width of the original axis, for example, observing the width of the original axis absorption peak to determine the width of the original axis.

[0123] S102 , based on the principle that the resonant frequency of the original axis, the resonant frequency of the first axis, and the resonant frequency of the second axis are consistent, a simulation is performed according to the resonant frequency, the width of the original axis, and the preset axis spacing between the fourth axis and the fifth axis to calculate the width of each point on the first axis and the second axis.

[0124] The scanning frequency of the preset axis spacing is relatively low, and the preset axis spacing can be obtained in advance from finite element simulation software or a database.

[0125] In the embodiment of the present application, after the computer device obtains the resonant frequency and width of the original axis based on the above steps, the resonant frequency of the original axis and the resonant frequency of the dual-axis structure composed of the first axis and the second axis are consistent, and simulation is performed according to the resonant frequency, the width of the original axis and the preset axis spacing between the fourth axis and the fifth axis to calculate the width of each point on the first axis and the second axis. Specifically, the resonant frequency of the original axis and the width of the original axis can be input into a preset algorithm or preset simulation software for analysis, for example, input into a non-gradient heuristic search algorithm for analysis, and output the width of each point on the first axis and the second axis in the dual-axis structure. The process from the original axis to the dual-axis structure can be seen in Figure 6 As shown, for example, the resonant frequency of the original axis is 184.8 Hz and the width of the original axis is 70 um. After calculation by the above-mentioned preset algorithm or preset simulation software, it can be obtained that the widths of each point (a1, a2...a6...a10) on the first axis and the second axis are 55 um, and the preset axis spacing between the fourth axis and the fifth axis is d. At this time, the resonant frequency of the two axes is 184.8 Hz.

[0126] In one embodiment, a method for optimizing the structure of a scanning device is also provided. Figure 7 As shown, Figure 5 The method described in the embodiment further includes:

[0127] S103, setting the distance between the first axis and the second axis of the slow axis in the scanning device to a plurality of preset distances.

[0128] In an embodiment of the present application, the computer device can set the spacing between the first and second axes of the slow axis of the scanning device to multiple preset spacings based on a preset range and a step value. For example, if the preset range of the preset spacing d is [0, 8 mm] and the step value is 0.25 mm, multiple preset spacings can be obtained.

[0129] S104: Start the scanning device to scan at each preset distance to obtain a corresponding scanning frequency at each preset distance.

[0130] In an embodiment of the present application, after the computer device obtains multiple preset spacings based on the above steps, it can calculate the scanning frequency corresponding to each preset spacing one by one. Specifically, when the preset spacing is set to spacing 1, the scanning device can be started to scan at spacing 1 to obtain the scanning frequency corresponding to spacing 1, and when the preset spacing is set to spacing 2, the scanning device can be started to scan at spacing 2 to obtain the scanning frequency corresponding to spacing 2. This cycle can be repeated to obtain the scanning frequency corresponding to each preset spacing.

[0131] S105 , determining the preset spacing corresponding to the minimum scanning frequency as the preset axis spacing between the fourth axis and the fifth axis.

[0132] The fourth axis corresponds to the first axis, and the fifth axis corresponds to the second axis.

[0133] In the embodiment of the present application, after the computer device obtains the corresponding scanning frequency under each preset spacing based on the above steps, it can store the mapping relationship between the preset spacing and the scanning frequency in a database, or construct finite element simulation software based on each preset spacing and the corresponding scanning frequency. When the original axis is optimized into a dual-axis structure, the minimum scanning frequency among the scanning frequencies can be determined from the database or finite element simulation software, and then the preset spacing corresponding to the minimum scanning frequency can be determined. Finally, the preset spacing corresponding to the minimum scanning frequency is determined as the preset axis spacing between the fourth axis and the fifth axis. For example, the preset axis spacing between the fourth axis and the fifth axis is determined to be 250um, as shown in FIG. Figure 8 As shown, Figure 8 (a) indicates that the preset axis spacing between the slow axis fourth axis and the fifth axis is 250um, Figure 8 (b) indicates that the preset axis spacing between the fourth and fifth axes of the fast axis is 250 μm. Figure 8 (c) shows a mapping curve between the preset spacing and the scanning frequency, where the horizontal axis represents the preset spacing d (mm) and the vertical axis represents the scanning frequency (Hz).

[0134] In one embodiment, when both the first axis and the second axis are stress equalization structures, a specific implementation method for determining the width at each point on the first axis and the second axis is also provided, such as Figure 9 As shown, the above step of "determining the width of each point on the first axis and the second axis by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis" includes:

[0135] S201 , obtaining a plurality of first width groups through a simulation process of applying a first preset pressure on the fourth axis and the fifth axis.

[0136] The first width group includes the widths at the positions of the points to be optimized on the fourth axis and the fifth axis. The first preset pressure is the pressure that starts the fourth axis and the fifth axis of the scanning device to work.

[0137] In the embodiment of the present application, the computer device can determine the initial width of each point on the fourth axis and the fifth axis based on the above step S102. For example, the initial width of each point is 55 μm. For the third axis or the fourth axis, the initial first width group can be determined as A1∈(a1,…,a n ), where a1=a2=...=a n=55um, n represents the width to be optimized, a n Represents the initial width corresponding to the nth optimization point. The computer device can then determine the stress value of each point on the fourth and fifth axes by simulating the process of loading the first preset pressure on the fourth and fifth axes, and then determine the position of each point to be optimized on the fourth and fifth axes based on the stress value of each point. Then, by adjusting the width of each point to be optimized in the initial width parameter, multiple first width groups can be obtained. For example, the initial width corresponding to optimization point 1 is a1, the initial width corresponding to optimization point 2 is a2... The initial width corresponding to optimization point n is a n , by changing the width of a certain optimization point, repeating the process multiple times, multiple first width groups can be obtained. Alternatively, the widths of multiple optimization points can be adjusted, repeating the process multiple times, multiple first width groups can be obtained. Alternatively, the widths of all optimization points can be adjusted, repeating the process multiple times, multiple first width groups can be obtained.

[0138] S202 : According to the plurality of first width groups, simulate the corresponding plurality of simulation axes to perform pressure tests to determine a first target width group.

[0139] The simulated axis is a dual-axis structure generated based on the simulation of each first width group. Each width in the first target width group corresponds to the width of each point to be optimized on the first axis and the second axis.

[0140] In an embodiment of the present application, after the computer device obtains the corresponding multiple first width groups at the positions of each point to be optimized on the fourth axis and the fifth axis based on the above steps, it can generate multiple simulation axes based on each first width group, and then simulate each simulation axis to perform a pressure test to obtain a stress curve corresponding to each simulation axis. Through analysis of each stress curve, the stress curve that meets the preset requirements is used as the target stress curve, and the first width group corresponding to the target stress curve is used as the first target width group. For example, a stress curve in which the stress values ​​corresponding to all points to be optimized on the stress curve meet the preset threshold range can be determined as the target stress curve.

[0141] S203 , determining the widths of other points on the first axis and the second axis based on the widths of the points to be optimized on the first axis and the second axis.

[0142] In the embodiment of the present application, after the computer device obtains the width of each point to be optimized on the first and second axes based on the above steps, it smoothly connects each point to be optimized to determine the width of other points on the first and second axes. For example, there are multiple points on the first axis in the order of A, a, B, b, C, c, D, d, where A, B, C, and D are points to be optimized. Then, after determining the width of points A, B, C, and D, the width of point a can be determined by smoothly connecting A and B, and the width of point b can be determined by smoothly connecting B and C.

[0143] In one embodiment, a specific implementation method for obtaining multiple width groups is also provided, such as Figure 10 As shown, the above step S201 of "obtaining a plurality of first width groups by simulating a process of applying a first preset pressure on the fourth axis and the fifth axis" includes:

[0144] S301 , applying a first preset pressure to the fourth axis and the fifth axis to obtain first stress curves corresponding to the fourth axis and the fifth axis.

[0145] In the embodiment of the present application, after determining the initial width parameters of the fourth and fifth axes, the computer device can apply a first preset pressure to the fourth and fifth axes corresponding to the initial width parameters to obtain a first stress curve corresponding to each point on the fourth and fifth axes. Specifically, Figure 11 As shown, a non-gradient heuristic search algorithm can be used to load a first preset pressure on the biaxial structure in the rectangular structure, and the structures of the fourth and fifth axes in the biaxial structure are imported into the finite element simulation software. Through steady-state stress simulation, a 3D stress cloud diagram of the entire structure of the scanning mirror corresponding to the motion state when the stress of the biaxial structure of the scanning device is maximized is calculated, as shown in FIG. Figure 11 As shown in (a), the stress distribution reference line S to be discussed is set on one axis of the biaxial structure. The stress distribution reference line S passes through the position of the maximum stress value, as shown in Figure 11 As shown in (b), finally, the stress value at the stress distribution reference line is extracted from the 3D stress cloud map to form the first stress curve, as shown in Figure 11 As shown in (c), the horizontal axis represents the length of the biaxial structure (mm), and the vertical axis represents the stress value (MPa). It can be seen that the maximum stress value P1 of the biaxial structure of the rectangular structure is 347.2 MPa.

[0146] S302 , determining a plurality of first width groups according to the first stress curves corresponding to the fourth axis and the fifth axis; the first width groups include widths at positions of points to be optimized on the corresponding simulation axes.

[0147] In an embodiment of the present application, after the computer device obtains the first stress curve corresponding to each point on the fourth axis and the fifth axis based on the above steps, the stress value of each point on the first stress curve can be analyzed to determine multiple width groups. For example, the point on the first stress curve corresponding to the stress value greater than the preset numerical range is used as the point to be optimized, and then the width at the position of the point to be optimized is adjusted to obtain multiple width groups.

[0148] In one embodiment, a specific implementation method for determining multiple first width groups is also provided, such as Figure 12 As shown, the above step S302 of “determining a plurality of first width groups according to the first stress curves corresponding to the fourth axis and the fifth axis” includes:

[0149] S401 , taking points corresponding to maximum stress values ​​and minimum stress values ​​on the first stress curve corresponding to the fourth axis and the fifth axis as points to be optimized, and generating a first initial width group.

[0150] The first initial width group includes the width corresponding to the optimization point on the fourth axis or the fifth axis.

[0151] In an embodiment of the present application, after the computer device determines the stress curves corresponding to each point on the fourth axis and the fifth axis based on the above step S301, the points corresponding to the maximum stress values ​​and the minimum stress values ​​on the stress curve can be used as points to be optimized, and a first initial width group can be generated based on the widths corresponding to the positions of the points to be optimized. For example, the first initial width group is A1 (55, 55, 55, 55, 55, 55...).

[0152] S402: Adjust at least one width in the first initial width group multiple times to generate multiple first width groups.

[0153] In an embodiment of the present application, after the computer device obtains the first initial width group based on the above steps, it can adjust at least one width in the first initial width group multiple times to generate multiple width groups. Specifically, n width groups can be taken along the n basis vector directions in the n-dimensional space where A1 is located, including A1, for a total of n+1 width groups. For example, the first point to be optimized in the first initial width group can be adjusted by a preset value to obtain a group of width groups, for example, A2 (56, 55, 55, 55, 55, 55...); the second point to be optimized in the first initial width group can be adjusted by a preset value to obtain another group of width groups, for example, A3 (55, 56, 55, 55, 55, 55...); and this cycle can be repeated to obtain multiple width groups. Optionally, multiple points to be optimized in the first initial width group can also be adjusted by a preset value to obtain a group of width groups, for example, A4 (56, 56, 56, 55, 55, 55...).

[0154] In one embodiment, a specific implementation method for determining the first target width group is also provided, such as Figure 13 As shown, the above step S202 of "simulating the corresponding multiple simulation axes according to the multiple first width groups to perform pressure tests and determine the first target width group" includes:

[0155] S501 , simulating corresponding multiple simulation axes according to multiple first width groups.

[0156] The simulated axis is a dual-axis structure generated based on simulation of each first width group.

[0157] In the embodiment of the present application, after obtaining multiple first width groups, the computer device can input each first width group into a preset simulation software to generate a dual-axis structure and obtain a simulation axis corresponding to each first width group.

[0158] S502 : Apply a second preset pressure to each simulation axis to obtain a stress value of each point to be optimized on each simulation axis.

[0159] In the embodiment of the present application, the computer device obtains multiple simulated axes based on the above steps, and can load a second preset pressure on each simulated axis to obtain a stress curve corresponding to each simulated axis. Specifically, Figure 14 As shown in FIG, a non-gradient heuristic search algorithm can be used to load a second preset pressure on the biaxial structure in the stress equalization structure, and the structures of the fourth and fifth axes in the biaxial structure are imported into the finite element simulation software. Through steady-state stress simulation, the 3D stress cloud diagram of the entire structure of the scanning mirror corresponding to the motion state when the stress of the biaxial structure of the scanning device is maximized is calculated, as shown in FIG. Figure 14 Then, a stress distribution reference line S to be discussed is set on one axis of the biaxial structure. The stress distribution reference line S passes through the position of the maximum stress value, as shown in Figure 14 As shown in (b), finally, the stress value at the stress distribution reference line is extracted from the 3D stress cloud map to form a stress curve, as shown in Figure 14 As shown in (c), the horizontal axis represents the length of the biaxial structure (mm), and the vertical axis represents the stress value (MPa). It can be seen that the maximum stress value of the biaxial structure with stress equalization is 160.8 MPa.

[0160] S503 , determining a first target width group according to the stress value of each point to be optimized on each simulation axis; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis.

[0161] In an embodiment of the present application, after the computer device obtains the stress value of each point to be optimized on each simulation axis based on the above steps, a group of widths corresponding to the stress curve that meets the preset conditions can be used as the first target width group.

[0162] In one embodiment, a specific implementation method for determining the first target width group is also provided, such as Figure 15 As shown, the above step S703 of "determining the first target width group according to the stress value of each point to be optimized on each simulation axis" includes:

[0163] S601, determining the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points.

[0164] The stress point is the point corresponding to the maximum stress value in the simulated shaft.

[0165] In the embodiment of the present application, after obtaining the stress values ​​of each point to be optimized on each simulation axis, the computer device can determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points. For example, the point corresponding to the maximum stress value in simulation axis A is point A2 to be optimized, the point corresponding to the maximum stress value in simulation axis B is point B1 to be optimized, and the point corresponding to the maximum stress value in simulation axis C is point C5 to be optimized. Then the multiple stress points are (A2, B1, C5...). Figure 16 As shown in the figure, the optimization results of 10 points to be optimized on the simulation axis are shown. The detailed optimization process is as follows Figure 16 As shown, the 10 points to be optimized were iterated 154 times in total, and the maximum stress value corresponding to each iteration is as follows: Figure 16 As shown in (a), the horizontal axis represents the number of iterations, and the vertical axis represents the maximum stress value Max stress (Mpa). The width results corresponding to the positions of the 10 points to be optimized are as follows: Figure 16 As shown in (b), the horizontal axis represents the number of iterations, the vertical axis represents the width, and the curves in the figure are a3, a2, a4, a5, a6, a7, a8, a9, and a10 from top to bottom.

[0166] S602 , screening out a stress point with a minimum value from a plurality of stress points, and determining the width group where the stress point with the minimum value belongs as a first target width group.

[0167] In an embodiment of the present application, after the computer device obtains multiple stress points based on the above steps, it can screen out the stress point with the smallest value from the multiple stress points, and determine the width group where the stress point with the smallest value is located as the first target width group. For example, the stress point with the smallest value is selected from A2, B1, C5..., and the width group where the stress point with the smallest value is located is determined as the first target width group. Finally, the target biaxial structure can be designed based on the first target width group.

[0168] In the process of determining the first target width group based on the number of points to be optimized, the design method of the number of points to be optimized is as follows: Figure 17As shown in the figure, 10 different optimization cases are designed, ranging from 1 to 10 points to be optimized. The positions of the points to be optimized corresponding to different optimization cases are as follows: Figure 17 (a) is shown. The minimum stress values ​​of different optimization cases are shown as Figure 17 As shown in (b), the horizontal axis represents different optimization cases Types, and the vertical axis represents the minimum stress value Min stress (MPa). When the number of optimization points is 10, the maximum stress value is the smallest, so it can be considered that the optimal optimization case is 10 optimization points. The number of optimization iterations and optimization time corresponding to different optimization cases are shown in Figure 2. Figure 17 As shown in (c), the horizontal axis represents different optimization types, and the vertical axis represents the number of optimization iterations. The width group parameters corresponding to different optimization situations are as follows: Figure 17 As shown in (d), the horizontal axis represents different optimization situations, and the vertical axis represents the width of each point to be optimized. Between 0 and 1, it is a1; between 1 and 2, it is a1 and a2; between 2 and 3, it is a1, a2 and a3, ...; between 9 and 10, it is a1, a2, a3, a4, a5, a6, a7, a8, a9 and a10.

[0169] In one embodiment, when the slow axis is a single-axis structure, a specific implementation method for determining the width of each point on the third axis or determining the width of each point on the first and second axes is also provided. The above step of "determining the width of each point on the third axis or determining the width of each point on the first and second axes by simulating the process of the original slow axis splitting into one axis or two axes for the slow axis in the scanning device" includes:

[0170] For the slow axis in the scanning device, the width of each point on the third axis is determined by simulating the process of the original slow axis differentiating into the sixth axis.

[0171] The original slow axis is a single-axis structure, and the sixth axis represents an intermediate structure in the process of optimizing the single-axis structure of the scanning device.

[0172] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0173] In one embodiment, a specific implementation method for determining the width of each point on the third axis is further provided. The step of "determining the width of each point on the third axis by simulating the process of differentiation of the original slow axis into the sixth axis" includes:

[0174] A plurality of second width groups are obtained by simulating a process of applying a third preset pressure on the sixth axis; the second width groups include the widths at the positions of the points to be optimized on the sixth axis;

[0175] According to the plurality of second width groups, pressure tests are performed on the corresponding plurality of simulation axes by simulation to determine a second target width group; each width in the second target width group corresponds to the width at the location of each point to be optimized on the third axis;

[0176] The widths of the other points on the third axis are determined based on the widths of the points to be optimized on the third axis.

[0177] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0178] In one embodiment, a specific implementation method for obtaining multiple second width groups is further provided. The step of "obtaining multiple second width groups by simulating a process of applying a third preset pressure on the sixth axis" includes:

[0179] Applying a third preset pressure to the sixth axis to obtain a stress curve corresponding to the sixth axis;

[0180] According to the stress curve corresponding to the sixth axis, a plurality of second width groups are determined; the second width groups include the widths at the positions of the points to be optimized on the corresponding simulation axes.

[0181] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0182] In one embodiment, a specific implementation method for obtaining multiple second width groups is further provided. The step of "determining multiple second width groups according to the stress curve corresponding to the sixth axis" includes:

[0183] The points corresponding to the maximum stress value and the minimum stress value on the stress curve corresponding to the sixth axis are used as points to be optimized, and a second initial width group is generated; the second initial width group includes the widths corresponding to the optimization points on the sixth axis;

[0184] At least one width in the second initial width group is adjusted multiple times to generate multiple second width groups.

[0185] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0186] In one embodiment, a specific implementation method for determining the second target width group is further provided. The above step of "simulating the corresponding multiple simulation axes to perform pressure tests based on the multiple second width groups to determine the second target width group" includes:

[0187] Simulating a plurality of corresponding simulation axes according to the plurality of second width groups;

[0188] Applying a fourth preset pressure to each simulation axis to obtain a stress value of each point to be optimized on each simulation axis;

[0189] The second target width group is determined according to the stress value of each point to be optimized on each simulation axis; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis.

[0190] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0191] In one embodiment, a specific implementation method for determining the second target width group is further provided. The step of "determining the second target width group according to the stress value of each point to be optimized on each simulation axis" includes:

[0192] Determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points;

[0193] A stress point with a minimum value is screened out from the multiple stress points, and the width group where the stress point with the minimum value belongs is determined as the second target width group.

[0194] The method described in this embodiment is similar to the aforementioned optimization method for the dual-axis structure. Please refer to the aforementioned description for details, which will not be repeated here.

[0195] In summary of all the above embodiments, a method for optimizing the structure of a scanning device is further provided, the method comprising:

[0196] The method described in this embodiment takes the slow axis as an example, and the method is also applicable to the fast axis.

[0197] For the slow axis in the scanning device, the slow axis is a dual-axis structure, and the dual-axis structure includes a first axis and a second axis. When the first axis and the second axis are both rectangular structures, the spacing between the first axis and the second axis of the slow axis in the scanning device is set to multiple preset spacings; the scanning device is started to scan at each preset spacing to obtain the corresponding scanning frequency at each preset spacing; the preset spacing corresponding to the minimum scanning frequency is determined as the preset axis spacing between the fourth axis and the fifth axis; the fourth axis corresponds to the first axis, and the fifth axis corresponds to the second axis; the resonant frequency of the original axis and the width of the original axis are obtained; based on the principle that the resonant frequency of the original axis and the resonant frequency of the first axis and the second axis are consistent, simulation is performed according to the resonant frequency, the width of the original axis and the preset axis spacing between the fourth axis and the fifth axis, and the width of each point on the first axis and the second axis is calculated.

[0198] For the slow axis in the scanning device, the slow axis is a dual-axis structure, and the dual-axis structure includes a first axis and a second axis. When the first axis and the second axis are both stress equalization structures, a first preset pressure is loaded on the fourth axis and the fifth axis to obtain a first stress curve corresponding to the fourth axis and the fifth axis; the points corresponding to the maximum stress value and the minimum stress value on the first stress curve corresponding to the fourth axis and the fifth axis are used as points to be optimized to generate a first initial width group; the initial width group includes the width corresponding to the optimization point on the fourth axis or the fifth axis; at least one width in the first initial width group is adjusted multiple times to generate multiple first width groups; the first width group includes the width at the position of each point to be optimized on the corresponding simulation axis; the first width group includes the width at the position of each point to be optimized on the fourth axis and the fifth axis ; According to multiple first width groups, simulate the corresponding multiple simulation axes; load the second preset pressure on each simulation axis to obtain the stress value of each point to be optimized on each simulation axis; determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points; screen out the stress point with the smallest value from the multiple stress points, and determine the width group where the stress point with the smallest value is located as the first target width group; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis respectively; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis respectively; based on the width at the position of each point to be optimized on the first axis and the second axis, determine the width at the position of other points on the first axis and the second axis.

[0199] For the slow axis in the scanning device, when the slow axis is a single-axis structure, the single-axis structure includes a third axis, and a third preset pressure is loaded on the sixth axis to obtain a stress curve corresponding to the sixth axis; the points corresponding to the maximum stress value and the minimum stress value on the stress curve corresponding to the sixth axis are used as points to be optimized to generate a second initial width group; the second initial width group includes the width corresponding to the optimization point on the sixth axis; at least one width in the second initial width group is adjusted multiple times to generate multiple second width groups; the second width group includes the width at the position of each point to be optimized on the corresponding simulation axis; the second width group includes the width at the position of each point to be optimized on the sixth axis; according to the multiple second width groups, the simulation Simulate multiple corresponding simulation axes; load a fourth preset pressure on each simulation axis to obtain the stress value of each point to be optimized on each simulation axis; determine the point corresponding to the maximum stress value in each simulation axis to obtain multiple stress points; screen out the stress point with the smallest value from the multiple stress points, and determine the width group where the stress point with the smallest value is located as the second target width group; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis; according to the width at the position of each point to be optimized on the third axis, determine the width at the position of other points on the third axis.

[0200] In this embodiment, the maximum stress values ​​corresponding to the three structures of the original axis structure axis, the rectangular structure biaxial structure axis-1, and the stress equalization structure biaxial structure axis-2 are compared as follows: Figure 18 As shown, Figure 18 (a) is the 3D stress cloud corresponding to the original shaft structure. Figure 18 (b) The stress curve corresponding to the original shaft structure shows that the maximum stress value is P = 404.1 MPa. Figure 18 (c) shows the maximum stress values ​​corresponding to the three structures, which are 404.1 MPa, 347.2 MPa, and 160.8 MPa, respectively.

[0201] Since fatigue failure typically occurs in stress concentration areas, the method described in this embodiment can reduce the stress level in stress concentration areas during cyclic motion through the structural optimization method of the scanning device described above, keeping the stress away from the fatigue failure stress threshold, thereby greatly improving the durability of the non-silicon scanning mirror. To address the fatigue failure problem caused by concentrated stress in current non-silicon scanning mirrors, the method described above optimizes the width of the fast or slow axis to achieve uniform stress distribution, minimize the stress in the stress concentration area, and address the problem of insufficient durability from the perspective of the scanning device structure. The method described above can address the problems of optical scanning angle shrinkage and fatigue fracture caused by traditional slow-axis fatigue failure, and can reduce the maximum cyclic stress by 60.2%, thereby slowing down fatigue failure and increasing the service life of the scanning mirror module.

[0202] The methods described in the above steps are all described in the above embodiments. Please refer to the above description for details and will not be repeated here.

[0203] It should be understood that, although the various steps in the flowcharts involved in the various embodiments described above are displayed in sequence according to the instructions of the arrows, these steps are not necessarily executed in sequence in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order restriction on the execution of these steps, and these steps can be executed in other orders. Moreover, at least a portion of the steps in the flowcharts involved in the various embodiments described above can include multiple steps or multiple stages, and these steps or stages are not necessarily executed and completed at the same time, but can be executed at different times, and the execution order of these steps or stages is not necessarily to be carried out in sequence, but can be executed in turn or alternately with other steps or at least a portion of steps or stages in other steps.

[0204] Based on the same inventive concept, embodiments of the present application also provide a scanning device structural optimization device for implementing the aforementioned scanning device structural optimization method. The solution provided by this device is similar to the solution described in the aforementioned method. Therefore, the specific limitations of one or more scanning device structural optimization device embodiments provided below can be found in the aforementioned limitations of the scanning device structural optimization method and will not be further elaborated here.

[0205] In one embodiment, a structure optimization device for a scanning device is provided, comprising:

[0206] A determination module is used to determine the width of each point on the third axis or the width of each point on the first axis and the second axis by simulating the process of the original slow axis dividing into one axis or two axes in the slow axis of the scanning device; the length of the first axis and the length of the second axis are the first preset length threshold, and the length of the third axis is the second preset length threshold.

[0207] In one embodiment, when the slow axis is a dual-axis structure, the above-mentioned determination module is specifically used to determine the width of each point on the first axis and the second axis by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis in the slow axis of the scanning device; the length of the first axis and the length of the second axis are preset length thresholds.

[0208] In one embodiment, when the first axis and the second axis of the dual axis are both rectangular structures, the above-mentioned determination module is also used to obtain the resonant frequency and the width of the original axis; based on the principle that the resonant frequency of the original axis and the resonant frequencies of the first axis and the second axis are consistent, simulation is performed according to the resonant frequency, the width of the original axis and the preset axis spacing between the fourth axis and the fifth axis, and the width of each point on the first axis and the second axis is calculated.

[0209] In one embodiment, the above-mentioned determination module is also used to set the spacing between the first axis and the second axis of the slow axis in the scanning device to multiple preset spacings; start the scanning device to scan at each preset spacing to obtain the corresponding scanning frequency at each preset spacing; determine the preset spacing corresponding to the minimum scanning frequency as the preset axis spacing between the fourth axis and the fifth axis; the fourth axis corresponds to the first axis, and the fifth axis corresponds to the second axis.

[0210] In one embodiment, when the first axis and the second axis of the dual axis are both stress equalization structures, the above-mentioned determination module is also used to obtain multiple first width groups through a simulation process of loading a first preset pressure on the fourth axis and the fifth axis; the first width group includes the width at the position of each point to be optimized on the fourth axis and the fifth axis; based on the multiple first width groups, the corresponding multiple simulation axes are simulated to perform pressure tests to determine the first target width group; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis; based on the width at the position of each point to be optimized on the first axis and the second axis, the width at the position of other points on the first axis and the second axis is determined.

[0211] In one embodiment, the above-mentioned determination module is also used to load a first preset pressure on the fourth axis and the fifth axis to obtain a first stress curve corresponding to the fourth axis and the fifth axis; based on the first stress curve corresponding to the fourth axis and the fifth axis, multiple first width groups are determined; the first width group includes the width at each point to be optimized on the corresponding simulation axis.

[0212] In one embodiment, the above-mentioned determination module is also used to use the points corresponding to the maximum stress value and the minimum stress value on the first stress curve corresponding to the fourth axis and the fifth axis as points to be optimized to generate a first initial width group; the first initial width group includes the width corresponding to the optimization point on the fourth axis or the fifth axis; and multiple adjustments are made to at least one width in the first initial width group to generate multiple first width groups.

[0213] In one embodiment, the above-mentioned determination module is also used to simulate the corresponding multiple simulation axes based on multiple first width groups; load a second preset pressure on each simulation axis to obtain the stress value of each point to be optimized on each simulation axis; determine the first target width group based on the stress value of each point to be optimized on each simulation axis; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis, respectively.

[0214] In one embodiment, the above-mentioned determination module is also used to determine the point corresponding to the maximum stress value in each simulated axis to obtain multiple stress points; filter out the stress point with the smallest value from the multiple stress points, and determine the width group where the stress point with the smallest value is located as the first target width group.

[0215] In one embodiment, when the slow axis is a single-axis structure, the determination module is specifically configured to determine the width of each point on the third axis by simulating the process of the original slow axis being differentiated into the sixth axis.

[0216] In one embodiment, the above-mentioned determination module is also used to obtain multiple second width groups through a simulation process of loading a third preset pressure on the sixth axis; the second width group includes the width at the position of each point to be optimized on the sixth axis; according to the multiple second width groups, the corresponding multiple simulation axes are simulated to perform pressure tests to determine the second target width group; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis; according to the width at the position of each point to be optimized on the third axis, the width at the position of other points on the third axis is determined.

[0217] In one embodiment, the above-mentioned determination module is also used to load a third preset pressure on the sixth axis to obtain a stress curve corresponding to the sixth axis; based on the stress curve corresponding to the sixth axis, multiple second width groups are determined; the second width groups include the widths at the positions of each point to be optimized on the corresponding simulation axis.

[0218] In one embodiment, the above-mentioned determination module is also used to use the points corresponding to the maximum stress value and the minimum stress value on the stress curve corresponding to the sixth axis as points to be optimized to generate a second initial width group; the second initial width group includes the widths corresponding to the optimization points on the sixth axis; and multiple adjustments are made to at least one width in the second initial width group to generate multiple second width groups.

[0219] In one embodiment, the above-mentioned determination module is also used to simulate the corresponding multiple simulation axes based on multiple second width groups; load a fourth preset pressure on each simulation axis to obtain the stress value of each point to be optimized on each simulation axis; determine the second target width group based on the stress value of each point to be optimized on each simulation axis; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis.

[0220] In one embodiment, the above-mentioned determination module is also used to determine the point corresponding to the maximum stress value in each simulated axis to obtain multiple stress points; filter out the stress point with the smallest value from the multiple stress points, and determine the width group where the stress point with the smallest value is located as the second target width group.

[0221] Each module in the aforementioned scanning device structural optimization device may be implemented in whole or in part through software, hardware, or a combination thereof. Each module may be embedded in or independent of a processor in a computer device in the form of hardware, or may be stored in a computer device memory in the form of software, so that the processor can call and execute the corresponding operations of each module.

[0222] In one embodiment, a computer device is provided. The computer device may be a terminal, and its internal structure diagram may be as follows: Figure 19As shown. The computer device includes a processor, a memory, an input / output interface, a communication interface, a display unit and an input device. The processor, the memory and the input / output interface are connected via a system bus, and the communication interface, the display unit and the input device are connected to the system bus via the input / output interface. The processor of the computer device is used to provide computing and control capabilities. The memory of the computer device includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system and a computer program. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The input / output interface of the computer device is used to exchange information between the processor and an external device. The communication interface of the computer device is used to communicate with an external terminal in a wired or wireless manner, and the wireless manner can be achieved through WIFI, a mobile cellular network, NFC (near field communication) or other technologies. When the computer program is executed by the processor, a structural optimization method of a scanning device is implemented. The display unit of the computer device is used to form a visually visible picture, which can be a display screen, a projection device or a virtual reality imaging device. The display screen can be a liquid crystal display screen or an electronic ink display screen, and the input device of the computer device can be a touch layer covering the display screen, or a button, trackball or touchpad set on the computer device casing, or an external keyboard, touchpad or mouse.

[0223] Those skilled in the art will understand that Figure 19 The structure shown in the figure is only a block diagram of a part of the structure related to the solution of the present application, and does not constitute a limitation on the computer device to which the solution of the present application is applied. The specific computer device may include more or fewer components than shown in the figure, or combine certain components, or have a different component arrangement.

[0224] In one embodiment, a computer device is further provided, including a memory and a processor. The memory stores a computer program, and the processor implements the steps in the above method embodiments when executing the computer program.

[0225] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored. When the computer program is executed by a processor, the steps in the above-mentioned method embodiments are implemented.

[0226] In one embodiment, a computer program product is provided, including a computer program, which implements the steps in the above method embodiments when executed by a processor.

[0227] Those skilled in the art will appreciate that all or part of the processes in the above-mentioned embodiment methods can be implemented by instructing the relevant hardware through a computer program, and the computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the embodiments of the above-mentioned methods. Among them, any reference to memory, database or other media used in the embodiments provided in this application may include at least one of non-volatile and volatile memory. Non-volatile memory may include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory may include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM). The database involved in the various embodiments provided herein may include at least one of a relational database and a non-relational database. Non-relational databases may include, but are not limited to, distributed databases based on blockchains. The processor involved in the various embodiments provided herein may be, but are not limited to, a general-purpose processor, a central processing unit, a graphics processing unit, a digital signal processor, a programmable logic unit, a data processing logic unit based on quantum computing, and the like.

[0228] The technical features of the above embodiments can be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0229] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present application. It should be noted that a person of ordinary skill in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present application shall be determined by the appended claims.

Claims

1. A method for optimizing the structure of a scanning device, characterized in that: The method is applied to a scanning device, which includes a substrate, a scanning mirror, a drive ring, a fast axis, and a slow axis; at least one of the fast axis and the slow axis is a stress equalization structure, and the stress equalization structure includes a uniaxial structure or a biaxial structure, the biaxial structure includes a first axis and a second axis, and the uniaxial structure includes a third axis; the stress equalization structure includes any one of a concave structure, a convex structure, a trapezoidal structure, an hourglass structure, and an arched structure; the structural optimization method includes: For the slow axis in the scanning device, by simulating a process in which the original slow axis splits into one axis or two axes, the width of each point on the third axis or the width of each point on the first axis and the second axis are determined; the length of the first axis and the length of the second axis are a first preset length threshold, and the length of the third axis is a second preset length threshold; The process of simulating the differentiation of the original slow axis into one axis or two axes includes: Converting the structure corresponding to the original slow axis into an initial stress homogenization structure, and determining the stress value of each point on the initial stress homogenization structure based on the converted initial stress homogenization structure, and cyclically adjusting the width of each point on the initial stress homogenization structure to obtain a target third axis, or a target first axis, and a target second axis that meet preset requirements; wherein the preset requirements include uniform stress at each point on the target third axis, or the target first axis, and the target second axis; The width of the target third axis, or the width of each point on the target first axis and the target second axis, is used as the width of the third axis, or the width of each point on the first axis and the second axis, and the stress equalization structure is designed based on the width of the third axis, or the width of each point on the first axis and the second axis.

2. The method according to claim 1, characterized in that The slow axis has a dual-axis structure. The method for determining the width of each point on the third axis or the width of each point on the first axis and the second axis by simulating the process of the original slow axis being divided into one axis or two axes includes: For the slow axis in the scanning device, the width of each point on the first axis and the second axis is determined by simulating the process of the original slow axis being differentiated into the fourth axis and the fifth axis.

3. The method according to claim 2, characterized in that The first axis and the second axis are both rectangular structures, and determining the width of each point on the first axis and the second axis by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis includes: Get the resonant frequency and width of the original axis; Based on the principle that the resonant frequency of the original axis and the resonant frequencies of the first axis and the second axis are consistent, simulation is performed according to the resonant frequency, the width of the original axis and the preset axis spacing between the fourth axis and the fifth axis to calculate the width of each point on the first axis and the second axis.

4. The method according to claim 3, characterized in that The method further comprises: Setting the spacing between the first axis and the second axis of the slow axis in the scanning device to a plurality of preset spacings; Starting the scanning device to scan at each of the preset intervals to obtain a corresponding scanning frequency at each of the preset intervals; The preset spacing corresponding to the minimum scanning frequency is determined as the preset axis spacing between the fourth axis and the fifth axis; the fourth axis corresponds to the first axis, and the fifth axis corresponds to the second axis.

5. The method according to claim 1, wherein The first axis and the second axis are both stress equalization structures, and determining the width of each point on the first axis and the second axis by simulating the process of the original slow axis differentiating into the fourth axis and the fifth axis includes: A plurality of first width groups are obtained by simulating a process of applying a first preset pressure on the fourth axis and the fifth axis; the first width groups include widths at positions of points to be optimized on the fourth axis and the fifth axis; According to the plurality of first width groups, pressure tests are performed on the corresponding plurality of simulated axes through simulation to determine a first target width group; each width in the first target width group corresponds to a width at a position of each to-be-optimized point on the first axis and the second axis; The widths at the locations of other points on the first axis and the second axis are determined according to the widths at the locations of the points to be optimized on the first axis and the second axis.

6. The method according to claim 5, characterized in that The simulation process of applying the first preset pressure on the fourth axis and the fifth axis obtains a plurality of first width groups, including: Applying a first preset pressure to the fourth axis and the fifth axis to obtain first stress curves corresponding to the fourth axis and the fifth axis; A plurality of first width groups are determined according to the first stress curves corresponding to the fourth axis and the fifth axis; the first width groups include the widths at the positions of the points to be optimized on the corresponding simulation axes.

7. The method according to claim 6, characterized in that The determining of a plurality of first width groups according to the stress curves corresponding to the fourth axis and the fifth axis includes: The points corresponding to the maximum stress value and the minimum stress value on the first stress curve corresponding to the fourth axis and the fifth axis are used as the points to be optimized, and a first initial width group is generated; the initial width group includes the width corresponding to the optimization point on the fourth axis or the fifth axis; At least one width in the first initial width group is adjusted multiple times to generate multiple first width groups.

8. The method according to claim 5, characterized in that The step of simulating and performing pressure tests on corresponding multiple simulation axes according to the multiple first width groups to determine a first target width group includes: Simulating a corresponding plurality of simulation axes according to the plurality of first width groups; Applying a second preset pressure to each of the simulation axes to obtain a stress value of each point to be optimized on each of the simulation axes; A first target width group is determined according to the stress value of each point to be optimized on each of the simulation axes; each width in the first target width group corresponds to the width at the position of each point to be optimized on the first axis and the second axis.

9. The method according to claim 8, characterized in that Determining the first target width group according to the stress value of each point to be optimized on each simulation axis includes: Determine the point corresponding to the maximum stress value in each of the simulated axes to obtain a plurality of stress points; A stress point with a minimum value is screened out from the multiple stress points, and the width group where the stress point with the minimum value belongs is determined as the first target width group.

10. The method according to claim 1, characterized in that The slow axis is a single-axis structure. The method for determining the width of each point on the third axis or the width of each point on the first axis and the second axis by simulating the process of the original slow axis being divided into one axis or two axes includes: For the slow axis in the scanning device, the width of each point on the third axis is determined by simulating the process of the original slow axis being differentiated into the sixth axis.

11. The method according to claim 10, characterized in that Determining the width of each point on the third axis by simulating the process of the original slow axis differentiating into the sixth axis includes: A plurality of second width groups are obtained by a simulation process of applying a third preset pressure on the sixth axis; the second width groups include the widths at the positions of the points to be optimized on the sixth axis; According to the plurality of second width groups, a pressure test is performed on the corresponding plurality of simulation axes by simulation to determine a second target width group; each width in the second target width group corresponds to the width at the position of each to-be-optimized point on the third axis; The widths of the other points on the third axis are determined based on the widths of the points to be optimized on the third axis.

12. The method according to claim 11, characterized in that The simulation process of applying the third preset pressure on the sixth axis obtains a plurality of second width groups, including: Applying a third preset pressure to the sixth axis to obtain a stress curve corresponding to the sixth axis; According to the stress curve corresponding to the sixth axis, a plurality of second width groups are determined; the second width groups include the widths at the positions of the points to be optimized on the corresponding simulation axes.

13. The method according to claim 12, characterized in that The determining of a plurality of second width groups according to the stress curve corresponding to the sixth axis includes: The points corresponding to the maximum stress value and the minimum stress value on the stress curve corresponding to the sixth axis are used as the points to be optimized, and a second initial width group is generated; the second initial width group includes the widths corresponding to the optimization points on the sixth axis; At least one width in the second initial width group is adjusted multiple times to generate multiple second width groups.

14. The method according to claim 11, characterized in that The step of simulating and performing pressure tests on corresponding multiple simulation axes according to the multiple second width groups to determine the second target width group includes: Simulating a corresponding plurality of simulation axes according to the plurality of second width groups; Applying a fourth preset pressure to each of the simulation axes to obtain a stress value of each point to be optimized on each of the simulation axes; A second target width group is determined according to the stress value of each point to be optimized on each simulation axis; each width in the second target width group corresponds to the width at the position of each point to be optimized on the third axis.

15. The method according to claim 14, characterized in that Determining the second target width group according to the stress value of each point to be optimized on each simulation axis includes: Determine the point corresponding to the maximum stress value in each of the simulated axes to obtain a plurality of stress points; A stress point with a minimum value is screened out from the multiple stress points, and the width group where the stress point with the minimum value belongs is determined as the second target width group.

16. A structure optimization device for a scanning device, characterized in that: The device comprises: A determination module is configured to determine, for a slow axis in a scanning device, the width of each point on the third axis or the width of each point on the first and second axes by simulating a process in which the original slow axis splits into one axis or two axes; the length of the first axis and the length of the second axis are a first preset length threshold, and the length of the third axis is a second preset length threshold; the scanning device comprises a substrate, a scanning mirror, a drive ring, a fast axis, and a slow axis; at least one of the fast axis and the slow axis is a stress equalization structure, the stress equalization structure comprising a uniaxial structure or a biaxial structure, the biaxial structure comprising a first axis and a second axis, and the uniaxial structure comprising a third axis; the stress equalization structure comprising any one of a concave structure, a convex structure, a trapezoidal structure, an hourglass structure, and an arched structure; The determination module is further configured to convert the structure corresponding to the original slow axis into an initial stress equalization structure, and determine the stress value of each point on the initial stress equalization structure based on the converted initial stress equalization structure, and obtain a target third axis, or a target first axis, and a target second axis that meet preset requirements by cyclically adjusting the width of each point on the initial stress equalization structure; wherein the preset requirements include uniform stress at each point on the target third axis, or the target first axis, and the target second axis; The width of the target third axis, or the width of each point on the target first axis and the target second axis, is used as the width of the third axis, or the width of each point on the first axis and the second axis, and the stress equalization structure is designed based on the width of the third axis, or the width of each point on the first axis and the second axis.

17. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 15 are implemented.

18. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 15 are implemented.

19. A computer program product comprising a computer program, characterized in that When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 15 are implemented.

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