Nitrogen removal agent for low-nitrogen metal manganese ingot production and preparation method thereof
By using a reducing agent to react with nitrogen in the air during the processing of manganese ingot and adsorbing a nitrogen remover for silicon nitride to form a protective film during the processing of manganese ingot, the problem of increased nitrogen content in the processing of manganese ingot is solved, and its performance and stability of the production process are improved.
Patent Information
- Application Number
- CN202411600929.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-11
- Publication Date
- 2025-03-18
AI Technical Summary
During the processing process, manganese metal easily reacts with nitrogen in the environment, resulting in an increase in nitrogen content in the ingot, affecting its performance and use effect.
A nitrogen removal agent including a reducing agent and a slag removal agent is used. The reducing agent reacts between liquid manganese water and air to form a new nitride. The slag removal agent forms a protective film by adsorbing silicon nitride to prevent the manganese water from contacting with the air to increase nitrogen.
It significantly reduces the nitrogen content in the manganese ingot, improves its performance, especially toughness, reduces brittleness problems, extends the service life of the product, and improves the stability and controllability of the production process.