Cavity gas inlet pipeline and gas flow uniformizing structure of PECVD (plasma enhanced chemical vapor deposition) equipment

Abstract

The invention belongs to the technical field of coating equipment, particularly relates to a chamber gas inlet pipeline and gas flow uniformizing structure of PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment, and aims to solve the problems that the dispersion concentration of dissociated chamber gas of the existing PECVD equipment is non-uniform, the gas concentration close to the inlet end of a gas pipeline exceeds that of other areas, and the gas flow uniformizing structure is not uniform. In order to solve the problems that the plasma concentration is too high in the part of film forming process, the phenomenon that particulate matter is gathered on half and exceeds the standard is caused, and meanwhile the uniformity of final film forming becomes poor due to the fact that the plasma concentration is inconsistent in the film forming process, the following scheme is provided that an air inlet cavity is included. The chamber gas inlet pipeline and the gas flow uniformizing structure of the PECVD equipment disclosed by the invention can assist the gas flow uniformizing plate I and the gas flow uniformizing plate II in diffusing gas introduced from the center above the chamber to the periphery; the risk that particulate matter exceeds the standard due to uneven concentration dispersion of single-pipeline gas inlet is avoided through secondary flow uniformizing of the first gas flow uniformizing plate and the second gas flow uniformizing plate, and the added secondary flow uniformizing can further improve the uniformity of the membrane.

Description

Technical Field

[0001] The present invention relates to the technical field of coating equipment, and in particular to a chamber air inlet pipeline and air flow uniformity structure of a PECVD equipment. Background Art

[0002] Plasma-enhanced chemical vapor deposition is a method of chemical vapor deposition in which gases are excited to generate low-temperature plasma, thereby enhancing the chemical activity of the reactants and performing epitaxy. This method can form solid films at lower temperatures.

[0003] The gas entering the chamber of the existing PECVD equipment is from a single pipe on the rear side of the chamber, resulting in uneven dispersion concentration after gas dissociation. The gas concentration near the inlet end of the gas pipeline exceeds that in other areas. Therefore, during the film formation process in this part, the plasma concentration is too high, resulting in the phenomenon that particles gather on one side and exceed the standard. At the same time, due to the inconsistent plasma concentration during the film formation process, the uniformity of the final film formation deteriorates. Summary of the Invention

[0004] The present invention discloses a chamber air intake pipeline and air flow uniformity structure of a PECVD device, aiming to solve the technical problem of poor film formation quality caused by uneven chamber air intake in the existing PECVD device in the background art.

[0005] The present invention proposes a chamber air inlet pipeline and air flow uniformity structure of a PECVD device, comprising an air inlet chamber, wherein a circular opening is provided on the upper side of the air inlet chamber, an expansion pipe is fixedly connected to the inner wall of the circular opening, a gas delivery pipe is fixedly connected to the upper side of the expansion pipe, and an inspection port is provided on the outside of the air inlet chamber, an inspection plate is fixedly connected to the inspection port, a gas uniformity plate 1 and a gas uniformity plate 2 are arranged in the air inlet chamber, the gas uniformity plate 1 is located above the gas uniformity plate 2, and the outside of the gas uniformity plate 2 is slidably connected to an installation plate. Placement frame one, the outside of placement frame one is fixedly connected to the inner wall of the air intake chamber, the upper side of placement frame one is fixedly connected with four symmetrical guide rails, the outside of the guide rails is slidingly connected with the same placement frame two, the inner wall of placement frame two is slidingly connected to the outside of gas flow plate one, a uniform diffusion component is provided in the air intake chamber, the uniform diffusion component is located below the flared tube and above the gas flow plate one, and both placement frame one and placement frame two are provided with fixing and adjustment components, and the fixing and adjustment components are located below the uniform diffusion component.

[0006] By providing an air intake chamber, an expansion pipe, a gas supply pipe, an inspection plate, a gas uniform flow plate 1, a gas uniform flow plate 2, a uniform diffusion component, a fixing and adjustment component, a placement frame 1, a guide rail and a placement frame 2, the device utilizes the uniform diffusion component to assist the gas uniform flow plate 1 and the gas uniform flow plate 2 to diffuse the gas entering from the center above the chamber to the surrounding areas. The secondary uniform flow of the gas uniform flow plate 1 and the gas uniform flow plate 2 avoids the risk of uneven concentration dispersion due to single-pipe air intake, resulting in excessive particulate matter, and the increased secondary uniform flow can further improve the uniformity of the film quality.

[0007] In a preferred embodiment, the uniform diffusion component includes an air intake hood, the upper side of the air intake hood is fixedly connected to the bottom of the expansion pipe, the air intake hood is located in the air intake chamber, and the inner wall of the expansion pipe is fixedly connected to an annular frame, the inner wall of the annular frame is fixedly connected to a stabilizing frame, the upper side of the stabilizing frame is fixedly connected to a synchronous motor 1, the output end of the synchronous motor 1 is connected to a fan 1 through a coupling, the bottom of the stabilizing frame is fixedly connected to a synchronous motor 2, the output end of the synchronous motor 2 is connected to a fan 2 through a coupling; a central fixed The fixed frame and the outer part of the middle fixed frame are fixedly connected with four circumferentially equidistant partition plates, the outer parts of the partition plates are fixedly connected with the inner wall of the air intake hood, and a plurality of guide vanes of different sizes and annular distribution are arranged in the air intake hood, and four guide vanes are distributed between two adjacent partition plates; the guide vanes are fixedly connected with two symmetrical rotating shafts, and the rotating shafts are movably connected to the side opposite to the partition plates, and the inner wall of the middle fixed frame is fixedly connected with a mounting plate, the upper side of the mounting plate is fixedly connected with a short shaft, and the outer part of the short shaft is fixedly connected with a winding shaft. The spring, one end of the coil spring away from the short shaft is fixedly connected to the winding roller, and the winding roller is located outside the short shaft; the bottom of the mounting plate is fixedly connected to the driving motor, and the output end of the driving motor is connected to the fixed disk through a coupling, and the outside of the fixed disk is fixedly connected to four thin wires with equal distances around the circumference, and the outside of the central fixed frame is provided with a plurality of grooves with equal distances around the circumference, and the plurality of grooves are divided into two layers, the upper layer's grooves and the winding roller are located in the same plane, and the lower layer's grooves and the fixed disk are located in the same plane, and the guide vanes are provided with two pairs of The end of the cutting groove away from the fixed disk passes through the cutting groove on the lower layer and the passing groove on the guide plate, and then passes through the passing groove and the cutting groove on the upper layer to enter the middle fixed frame and be fixedly connected to the outside of the winding roller, and the inner wall of the air intake cover is fixedly connected with a plurality of symmetrical mounting seats, and the mounting seats are movably connected with wire rollers, and the outsides of the two wire rollers on the same side are in contact with the outsides of the thin wire of the package, and the outsides of the thin wire are provided with a plurality of equidistantly distributed positioning beads, and the outsides of the positioning beads are in contact with the outsides of adjacent running grooves.

[0008] By providing a uniform diffusion component, the uniform diffusion component can effectively separate and diffuse the gas transported in the gas pipe quickly and efficiently. The gas can be guided to various positions in the air inlet chamber by using the guide plate with adjustable angle, thereby avoiding the concentration of gas in one part, effectively assisting the uniform flow effect of gas uniform flow plate 1 and gas uniform flow plate 2 on the gas, and improving the film forming quality of the device.

[0009] In a preferred embodiment, the fixing and adjusting assembly includes a screw, and two symmetrical hole grooves are provided on the placement frame. The inner walls of the hole grooves are rotatably connected to the outside of the screw by external threads, and the outside of the screw is provided with an external gear ring, and the bottom of the outer gear ring is movably connected to the upper side of the placement frame. The outside of the screw is provided with a knob, and the bottom of the knob is fixedly connected to the upper side of the outer gear ring on the same side; the outside of the outer gear ring is provided with a locking ring, and the bottom of the locking ring is slidably connected to the upper side of the placement frame, and the outside of the locking ring is provided with a fastener, the bottom of the fastener is fixedly connected to the upper side of the placement frame, and the inner wall of the locking ring is fixedly connected with a rack, and the rack is clamped with the outer gear ring on the same side, and the fastener is fixedly connected to a spring on the side away from the screw, and the end of the spring away from the fastener is fixedly connected to the inner wall of the locking ring on the same side. The top of the screw rod is fixedly connected with a top block, and the upper side of the top block is slidably connected to the bottom of the placement frame two, and the placement frame one and the placement frame two are provided with a plurality of symmetrical circular openings, and round rods are slidably connected in the circular openings; the outside of the round rod is provided with an inclined surface mosaic block one and an inclined surface mosaic block two, the bottom of the inclined surface mosaic block one is fixedly connected to the upper side of the placement frame one and the placement frame two, and the inner wall of the inclined surface mosaic block two is fixedly connected to the outside of the round rod, and the upper side of the inclined surface mosaic block one is fit with the bottom of the inclined surface mosaic block two, and the inclined surface mosaic block one and the inclined surface mosaic block two are located above the placement frame one and the placement frame two, and the bottom of the placement frame one, the gas uniform flow plate two and the placement frame two, the gas uniform flow plate one are provided with a mosaic groove, and the mosaic groove is slidably connected to the limiting piece, and the upper side of the limiting piece on the same side is fixedly connected to the bottom of the round rod.

[0010] By providing a fixing and adjusting component, the fixing and adjusting component can use a screw to quickly and conveniently change the distance between the gas uniform flow plate 1 and the gas uniform flow plate 2, so that more gas can flow down from the gas uniform flow plate 1 and remain between the gas uniform flow plate 1 and the gas uniform flow plate 2, thereby improving the gas concentration retained on the gas uniform flow plate 2, ensuring that the concentration of gas flowing out of each part of the gas uniform flow plate 2 is the same when the gas flows downward from the gas uniform flow plate 2, thereby improving the uniform flow effect of the gas uniform flow plate 2; using the inclined surface interlocking block 2 and the inclined surface interlocking block 1 can improve the effect of the limiter connected to the round rod to fix the gas uniform flow plate 1 and the mounting frame 1 on the mounting frame 2 and the mounting frame 1, and at the same time, it can be more convenient to disassemble and replace the gas uniform flow plate 1 and the gas uniform flow plate 2.

[0011] From the above, it can be seen that the chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment provided by the present invention can assist gas uniformity plate 1 and gas uniformity plate 2 to diffuse the gas introduced from the top center of the chamber to the surrounding areas. The secondary uniform flow of gas uniformity plate 1 and gas uniformity plate 2 can avoid the risk of uneven concentration dispersion of single-pipeline air intake leading to excessive particulate matter, and the increased secondary uniform flow can further improve the uniformity of the film quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 This is a schematic diagram of the overall structure of the chamber air inlet pipeline and air flow uniformity structure of a PECVD device proposed in the present invention;

[0013] Figure 2 This is a schematic cross-sectional view of the chamber air inlet pipeline and air flow uniformity structure of a PECVD device proposed in the present invention;

[0014] Figure 3 This is a schematic diagram of the uniform diffusion component structure of the chamber air inlet pipeline and air flow uniformity structure of a PECVD device proposed in the present invention;

[0015] Figure 4 This is a schematic diagram of the structure of a stabilizing frame for the chamber air inlet pipe and the air flow uniformity structure of a PECVD device proposed in the present invention;

[0016] Figure 5 This is a schematic diagram of the structure of the chamber air inlet pipeline and the guide vane of the air flow uniformity structure of the PECVD equipment proposed by the present invention;

[0017] Figure 6 This is a schematic diagram of the structure of the fixing and regulating components of the chamber air inlet pipeline and the air flow uniformity structure of the PECVD equipment proposed by the present invention;

[0018] Figure 7 This is a schematic diagram of the round rod structure of the chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment proposed in the present invention.

[0019] In the figure: 1, air intake chamber; 2, flaring pipe; 3, air delivery pipe; 4, inspection panel; 5, gas flow plate 1; 6, gas flow plate 2; 7, uniform diffusion assembly; 701, air intake cover; 702, ring frame; 703, center fixed frame; 704, stabilizing frame; 705, synchronous motor 1; 706, fan 1; 707, synchronous motor 2; 708, fan 2; 709, partition plate; 710, rotating shaft; 711, guide vane; 712, mounting plate; 713, drive motor; 714, fixing plate; 715, slot; 716, travel slot ;717. Thin wire;718. Mounting seat;719. Positioning bead;720. Wire roller;721. Short shaft;722. Coil spring;723. Winding roller;8. Fixing and adjusting components;801. Screw;802. Outer gear ring;803. Locking ring;804. Fastener;805. Spring;806. Rack;807. Knob;808. Top block;809. Round rod;810. Engaging groove;811. Limiting piece;812. Inclined engaging block one;813. Inclined engaging block two;9. Mounting frame one;10. Guide rail;11. Mounting frame two. DETAILED DESCRIPTION

[0020] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0021] The chamber air intake pipeline and air flow uniformity structure of a PECVD device disclosed in the present invention are mainly used in scenarios where uneven chamber air intake in existing PECVD devices leads to poor film formation quality.

[0022] Reference Figure 1-7 A chamber air inlet pipeline and air flow uniformity structure of a PECVD device includes an air inlet chamber 1, a circular opening is opened on the upper side of the air inlet chamber 1, an expansion pipe 2 is connected to the inner wall of the circular opening by bolts, a gas delivery pipe 3 is connected to the upper side of the expansion pipe 2 by bolts, and an inspection port is opened on the outside of the air inlet chamber 1, an inspection plate 4 is connected to the inspection port by bolts, a gas uniformity plate 1 5 and a gas uniformity plate 2 6 are provided in the air inlet chamber 1, the gas uniformity plate 1 5 is located above the gas uniformity plate 2 6, and the outside of the gas uniformity plate 2 6 is slidably connected to a placement frame 1 9, and the placement frame The outside of the mounting frame 19 is connected to the inner wall of the air intake chamber 1 by bolts, and the upper side of the mounting frame 19 is connected to four symmetrical guide rails 10 by bolts. The outside of the guide rail 10 is slidably connected to the same mounting frame 2 11, and the inner wall of the mounting frame 2 11 is slidably connected to the outside of the gas flow plate 15. A uniform diffusion component 7 is provided in the air intake chamber 1, and the uniform diffusion component 7 is located below the flared tube 2 and above the gas flow plate 5, and a fixing and adjustment component 8 is provided on both the mounting frame 19 and the mounting frame 2 11, and the fixing and adjustment component 8 is located below the uniform diffusion component 7.

[0023] Specifically, before inputting gas into the air inlet chamber 1 through the air delivery pipe 3, the inspection panel 4 is opened, the gas flow plate 1 5 and the gas flow plate 2 6 are inserted into the placement frame 2 11 and the placement frame 1 9, and the spacing between the gas flow plate 1 5 and the gas flow plate 2 6 is adjusted using the fixing and adjusting component 8. After the gas flow plate 1 5 and the gas flow plate 2 6 are fixed in the placement frame 2 11 and the placement frame 1 9, the inspection panel 4 is closed again, and the gas is delivered to the air inlet chamber 1 through the air delivery pipe 3. When the gas flows through the flared pipe 2, the uniform diffusion component 7 is used to fill the gas. The diffused gas is further evenly distributed when passing through the gas even flow plate 1 5 and the gas even flow plate 2 6, thereby entering the lower half of the air inlet chamber 1 and participating in the film forming operation; the device utilizes the uniform diffusion component 7 to assist the gas even flow plate 1 5 and the gas even flow plate 2 6 to diffuse the gas introduced from the center of the upper part of the chamber to the surrounding areas, and the secondary even flow of the gas even flow plate 1 5 and the gas even flow plate 2 6 avoids the risk of uneven concentration dispersion of the single-pipe air intake leading to excessive particulate matter, and the increased secondary even flow can further improve the uniformity of the film quality.

[0024] Reference Figure 3 、 Figure 4 and Figure 5In a preferred embodiment, the uniform diffusion component 7 includes an air intake hood 701, the upper side of which is connected to the bottom of the flared tube 2 by bolts. The air intake hood 701 is located in the air intake chamber 1, and the inner wall of the flared tube 2 is connected to an annular frame 702 by bolts. The inner wall of the annular frame 702 is connected to a stabilizing frame 704 by bolts. The upper side of the stabilizing frame 704 is connected to a synchronous motor 1 705 by bolts. The output end of the synchronous motor 1 705 is connected to a fan 1 706 via a coupling. The bottom of the stabilizing frame 704 is connected to a synchronous motor 2 707 by bolts. The output end of the synchronous motor 2 707 is connected to a fan 2 708 via a coupling. A central fixing frame 703 is provided in the air intake hood 701. The outside of the central fixed frame 703 is connected to four circumferentially equidistant partition plates 709 by bolts. The outside of the partition plates 709 is connected to the inner wall of the air intake cover 701 by bolts, and a plurality of guide vanes 711 of different sizes and annular distribution are provided in the air intake cover 701. There are four guide vanes 711 distributed between two adjacent partition plates 709; the guide vanes 711 are connected to two symmetrical rotating shafts 710 by bolts, and the sides of the rotating shafts 710 opposite to the partition plates 709 are rotatably connected by bearings, and the inner wall of the central fixed frame 703 is connected to a mounting plate 712 by bolts, and the upper side of the mounting plate 712 is connected to a short shaft 721 by bolts, and the outside of the short shaft 721 is connected to a coil spring 711 by bolts. 22. One end of the coil spring 722 away from the short shaft 721 is connected to the winding roller 723 by bolts, and the winding roller 723 is located outside the short shaft 721; the bottom of the mounting plate 712 is connected to the driving motor 713 by bolts, and the output end of the driving motor 713 is connected to the fixed disk 714 through a coupling, and the outside of the fixed disk 714 is connected to four circumferentially equidistant thin wires 717 by bolts, and the outside of the central fixed frame 703 is provided with a plurality of circumferentially equidistant grooves 715, and the plurality of grooves 715 are divided into two layers, the upper layer's grooves 715 and the winding roller 723 are located in the same plane, and the lower layer's grooves 715 and the fixed disk 714 are located in the same plane, and the guide plate 711 is provided with two symmetrical The through groove 716; the end of the cutting groove 715 away from the fixed plate 714 passes through the cutting groove 715 located in the lower layer and the through groove 716 on the guide plate 711, and then passes through the through groove 716 and the cutting groove 715 located in the upper layer to enter the middle fixed frame 703 and is connected to the outside of the winding roller 723 by bolts, and the inner wall of the air intake cover 701 is connected with multiple symmetrical mounting seats 718 by bolts, and the mounting seats 718 are rotatably connected to the wire rollers 720 through bearings, and the outsides of the two wire rollers 720 located on the same side are in contact with the outside of the package wire 717, and the outside of the thin wire 717 is provided with multiple equidistantly distributed positioning beads 719, and the outsides of the positioning beads 719 are in contact with the outsides of adjacent through grooves 716.

[0025] Specifically, when the gas flows through the flared tube 2, the synchronous motor 1 705 and the synchronous motor 2 707 are started, and the synchronous motor 1 705 and the synchronous motor 2 707 drive the fan 1 706 and the fan 2 708 to rotate, thereby accelerating the speed of the gas flowing into the air inlet chamber 1, and the driving motor 713 is started, and the driving motor 713 drives the fixed disk 714 to rotate slightly, thereby pulling the thin wire 717, and the end of the pulled thin wire 717 away from the fixed disk 714 overcomes the coil spring 722. The torsional force rotates, thereby releasing a part of the thin wire 717 wound on the winding roller 723. Under the guidance of the wire roller 720 on the mounting seat 718, the lower part pulls the locking beads 719 on the thin wire 717 released from the upper part, pushing the guide plate 711 to rotate around the rotating shaft 710, so that the gas blown down by the expansion pipe 2 is evenly diffused in the air intake chamber 1, and the gas sinks and enters the lower part of the air intake chamber 1 through the uniform flow of gas uniform flow plate 1 5 and gas uniform flow plate 2 6.

[0026] In a specific application scenario, the uniform diffusion component 7 is mainly suitable for the uniform diffusion link in the uniform diffusion process, that is, the uniform diffusion component 7 can effectively separate and diffuse the gas transported in the gas pipe 3 quickly and efficiently, and the gas can be guided to various positions in the air inlet chamber 1 by using the guide plate 711 with an adjustable angle, thereby avoiding the concentration of gas in one part, effectively assisting the gas uniform flow plate 1 5 and the gas uniform flow plate 2 6 in the uniform flow effect of the gas, and improving the film forming quality of the device.

[0027] Reference Figure 6 and Figure 7In a preferred embodiment, the fixing and adjusting component 8 includes a screw 801, and two symmetrical holes are provided on the placement frame 9. The inner wall of the hole is rotatably connected to the outer side of the screw 801 through an external thread. The outer side of the screw 801 is provided with an outer gear ring 802. The bottom of the outer gear ring 802 is rotatably connected to the upper side of the placement frame 9 through a bearing. The outer side of the screw 801 is provided with a knob 807, and the bottom of the knob 807 is connected to the upper side of the outer gear ring 802 on the same side by a bolt; the outer side of the outer gear ring 802 is provided with a A locking ring 803 is provided, the bottom of the locking ring 803 is slidably connected to the upper side of the placement frame 9, and a fastener 804 is provided on the outside of the locking ring 803. The bottom of the fastener 804 is connected to the upper side of the placement frame 9 by bolts, and the inner wall of the locking ring 803 is connected to a rack 806 by bolts, and the rack 806 is clamped with the outer gear ring 802 on the same side. The side of the fastener 804 away from the screw 801 is connected to a spring 805 by bolts, and the end of the spring 805 away from the fastener 804 is connected to the locking ring 803 on the same side. The inner wall is connected by bolts; the upper side of the screw 801 is connected with a top block 808 by bolts, and the upper side of the top block 808 is slidably connected to the bottom of the placement frame 11, and the placement frame 9 and the placement frame 11 are provided with a plurality of symmetrical circular openings, and the circular openings are slidably connected with round rods 809; the outside of the round rod 809 is provided with an inclined surface mosaic block 812 and an inclined surface mosaic block 813, the bottom of the inclined surface mosaic block 812 is connected to the upper side of the placement frame 9 and the placement frame 11 by bolts, and the inner wall of the inclined surface mosaic block 813 is They are all connected to the outside of the round rod 809 by bolts, and the upper side of the inclined interlocking block 1 812 is fitted with the bottom of the inclined interlocking block 2 813. The inclined interlocking block 1 812 and the inclined interlocking block 2 813 are both located above the placement frame 1 9 and the placement frame 2 11, and the bottoms of the placement frame 1 9, the gas flow plate 2 6 and the placement frame 2 11, the gas flow plate 1 5 are all provided with interlocking grooves 810, and the limiting members 811 are all slidably connected in the interlocking grooves 810. The upper side of the limiting member 811 on the same side is connected to the bottom of the round rod 809 by bolts.

[0028] Specifically, after the gas flow plate 1 5 and the gas flow plate 2 6 are inserted into the placement frame 2 11 and the placement frame 1 9, the round rod 809 is rotated, and the inclined surface of the inclined surface engaging block 2 813 on the round rod 809 moves upward along the inclined surface of the inclined surface engaging block 1 812 during the rotation of the round rod 809, so that the inclined surface engaging block 2 813 drives the round rod 809 to rise, so that the limiting piece 811 at the bottom of the round rod 809 enters the engaging groove 810 and engages with the gas flow plate 1 5 and the gas flow plate 2 6, so that the gas flow plate 1 5 and the gas flow plate 2 6 are fixed on the placement frame 2 11 and the placement frame 1 9, and the gas flow is adjusted when it is necessary to adjust the gas flow. When the distance between plate 1 5 and gas flow equalizing plate 2 6 is adjusted, the elastic force of spring 805 is overcome to push locking ring 803, so that the rack 806 on locking ring 803 releases the lock on outer gear ring 802, and knob 807 is turned. Knob 807 drives outer gear ring 802 to rotate, thereby moving screw 801 upward, so that the top block 808 on screw 801 pushes placement frame 2 11 to drive gas flow equalizing plate 1 5 upward, thereby changing the distance between gas flow equalizing plate 1 5 and gas flow equalizing plate 2 6, and loosening locking ring 803. Under the pulling force of spring 805, rack 806 locks outer gear ring 802 again, and screw 801 stops rotating.

[0029] In specific application scenarios, the fixing and adjusting component 8 is mainly suitable for the fixing and adjusting links in the fixing and adjusting process, that is, the fixing and adjusting component 8 can use the screw 801 to quickly and conveniently change the distance between the gas flow plate 1 5 and the gas flow plate 2 6, so that more gas can flow down from the gas flow plate 1 5 and remain between the gas flow plate 1 5 and the gas flow plate 2 6, thereby increasing the gas concentration retained on the gas flow plate 2 6, and ensuring that the concentration of gas flowing out of each part of the gas flow plate 2 6 is the same when the gas flows downward from the gas flow plate 2 6, thereby improving the uniform flow effect of the gas flow plate 2 6; the bevel interlocking block 2 813 and the bevel interlocking block 1 812 can be used to improve the effect of the limiter 811 connected to the round rod 809 to fix the gas flow plate 1 5 and the mounting frame 1 9 on the mounting frame 2 11 and the mounting frame 1 9, and at the same time, it can be more convenient to disassemble and replace the gas flow plate 1 5 and the gas flow plate 2 6.

[0030] Working principle: Before inputting gas into the air inlet chamber 1 through the gas pipe 3, open the inspection panel 4, insert the gas flow plate 1 5 and the gas flow plate 2 6 into the placement frame 2 11 and the placement frame 1 9, rotate the round rod 809, and the inclined surface of the inclined surface engaging block 2 813 on the round rod 809 moves upward along the inclined surface of the inclined surface engaging block 1 812 during the rotation of the round rod 809, so that the inclined surface engaging block 2 813 drives the round rod 809 to rise, so that the limiting piece 811 at the bottom of the round rod 809 enters the engaging groove 810 and engages with the gas flow plate 1 5 and the gas flow plate 2 6, so that The gas flow plate 1 5 and the gas flow plate 2 6 are fixed on the placement frame 2 11 and the placement frame 1 9. When the distance between the gas flow plate 1 5 and the gas flow plate 2 6 needs to be adjusted, the elastic force of the spring 805 is overcome to push the locking ring 803, so that the rack 806 on the locking ring 803 releases the lock on the outer gear ring 802, and the knob 807 is turned. The knob 807 drives the outer gear ring 802 to rotate, thereby moving the screw 801 upward, so that the top block 808 on the screw 801 pushes the placement frame 2 11 to drive the gas flow plate 1 5 upward, thereby changing the gas flow plate 1 5 and the gas flow plate 2 The spacing between the plates 2 and 6 is adjusted, the locking ring 803 is released, and under the tension of the spring 805, the rack 806 re-locks the outer gear ring 802, and the screw 801 stops rotating. When the gas flows through the flared pipe 2, the synchronous motor 1 705 and the synchronous motor 2 707 are started, and the synchronous motor 1 705 and the synchronous motor 2 707 drive the fan 1 706 and the fan 2 708 to rotate, thereby accelerating the speed of the gas flowing into the air inlet chamber 1, and the driving motor 713 is started, and the driving motor 713 drives the fixed disk 714 to rotate slightly, thereby pulling the thin wire 717, and the pulled thin wire 717 is pulled. The end of 17 away from the fixed disk 714 overcomes the torsion of the coil spring 722 and rotates, thereby releasing a part of the thin wire 717 wound on the winding roller 723. Under the guidance of the wire roller 720 on the mounting seat 718, the lower part pulls the locking beads 719 on the thin wire 717 released from the upper part to push the guide plate 711 to rotate around the rotating shaft 710, so that the gas blown down by the expansion tube 2 is evenly diffused in the air inlet chamber 1, the gas sinks, and enters the lower part of the air inlet chamber 1 through the uniform flow of the gas uniform flow plate 1 5 and the gas uniform flow plate 2 6 to participate in the film forming operation.

[0031] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A chamber air inlet pipeline and air flow uniformity structure of a PECVD device, comprising an air inlet chamber (1), characterized in that: The air inlet chamber (1) has a circular opening on its upper side, a flaring tube (2) is fixedly connected to the inner wall of the circular opening, a gas delivery tube (3) is fixedly connected to the upper side of the flaring tube (2), and an inspection opening is provided on the outside of the air inlet chamber (1), an inspection plate (4) is fixedly connected to the inspection opening, a gas flow plate (5) and a gas flow plate (6) are arranged in the air inlet chamber (1), the gas flow plate (5) is located above the gas flow plate (6), and a placement frame (9) is slidably connected to the outside of the gas flow plate (6), and the outside of the placement frame (9) is fixedly connected to the inner wall of the air inlet chamber (1). The upper side of the placement frame 1 (9) is fixedly connected with four symmetrical guide rails (10), the outer side of the guide rails (10) is slidably connected with the same placement frame 2 (11), the inner wall of the placement frame 2 (11) is slidably connected with the outer side of the gas flow plate 1 (5), a uniform diffusion component (7) is arranged in the air inlet chamber (1), the uniform diffusion component (7) is located below the expansion pipe (2) and above the gas flow plate 1 (5), and the placement frame 1 (9) and the placement frame 2 (11) are both provided with a fixing and adjusting component (8), and the fixing and adjusting component (8) is located below the uniform diffusion component (7).

2. The chamber air inlet pipeline and air flow uniformity structure of a PECVD device according to claim 1, characterized in that: The uniform diffusion component (7) comprises an air intake hood (701), the upper side of the air intake hood (701) is fixedly connected to the bottom of the expansion tube (2), the air intake hood (701) is located in the air intake chamber (1), and the inner wall of the expansion tube (2) is fixedly connected to an annular frame (702), the inner wall of the annular frame (702) is fixedly connected to a stabilizing frame (704), the upper side of the stabilizing frame (704) is fixedly connected to a synchronous motor 1 (705), the output end of the synchronous motor 1 (705) is connected to a fan 1 (706) via a coupling, the bottom of the stabilizing frame (704) is fixedly connected to a synchronous motor 2 (707), and the output end of the synchronous motor 2 (707) is connected to a fan 2 (708) via a coupling.

3. The chamber air inlet pipeline and air flow uniformity structure of a PECVD device according to claim 2, characterized in that: The air intake hood (701) is provided with a central fixed frame (703), the exterior of the central fixed frame (703) is fixedly connected to four circumferentially equidistantly distributed partition plates (709), the exteriors of the partition plates (709) are fixedly connected to the inner wall of the air intake hood (701), and a plurality of guide plates (711) of different sizes distributed in an annular pattern are provided in the air intake hood (701), and four guide plates (711) are distributed between two adjacent partition plates (709).

4. The chamber air inlet pipeline and air flow uniformity structure of a PECVD device according to claim 3, characterized in that: The guide plate (711) is fixedly connected to two symmetrical rotating shafts (710), the rotating shafts (710) are movably connected to the sides opposite to the partition plate (709), and the inner wall of the central fixed frame (703) is fixedly connected to a mounting plate (712), the upper side of the mounting plate (712) is fixedly connected to a short shaft (721), the outside of the short shaft (721) is fixedly connected to a coil spring (722), and one end of the coil spring (722) away from the short shaft (721) is fixedly connected to a winding roller (723), and the winding roller (723) is located outside the short shaft (721).

5. The chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment according to claim 4, characterized in that: The bottom of the mounting plate (712) is fixedly connected to a driving motor (713), the output end of the driving motor (713) is connected to a fixed disk (714) via a coupling, the outside of the fixed disk (714) is fixedly connected to four thin wires (717) that are equidistantly distributed around the circumference, and the outside of the central fixed frame (703) is provided with a plurality of equidistantly distributed circumferential grooves (715), the plurality of grooves (715) are divided into upper and lower layers, the grooves (715) of the upper layer and the winding roller (723) are located in the same plane, the grooves (715) of the lower layer and the fixed disk (714) are located in the same plane, and the guide plate (711) is provided with two symmetrical running grooves (716).

6. The chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment according to claim 5, characterized in that: One end of the cutting groove (715) away from the fixed disk (714) passes through the cutting groove (715) located at the lower layer and the running groove (716) on the guide plate (711), and then passes through the running groove (716) and the cutting groove (715) located at the upper layer to enter the middle fixed frame (703) and be fixedly connected to the outside of the winding roller (723), and the inner wall of the air intake cover (701) is fixedly connected with a plurality of symmetrical mounting seats (718), and the mounting seats (718) are movably connected with a wire roller (720), and the outside of the two wire rollers (720) located on the same side contacts the outside of the thin wire (717) of the set meal, and the outside of the thin wire (717) is provided with a plurality of equally spaced positioning beads (719), and the outside of the positioning beads (719) contacts the outside of the adjacent running groove (716).

7. The chamber air inlet pipeline and air flow uniformity structure of a PECVD device according to claim 1, characterized in that: The fixing and adjusting assembly (8) comprises a screw rod (801), and two symmetrical holes are provided on the placement frame (9). The inner wall of the hole groove is rotatably connected to the outside of the screw rod (801) through an external thread. The outside of the screw rod (801) is provided with an external toothed ring (802), and the bottom of the external toothed ring (802) is movably connected to the upper side of the placement frame (9). The outside of the screw rod (801) is provided with a knob (807), and the bottom of the knob (807) is fixedly connected to the upper side of the external toothed ring (802) on the same side.

8. The chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment according to claim 7, characterized in that: The outer side of the outer toothed ring (802) is provided with a locking ring (803), the bottom of the locking ring (803) is slidably connected to the upper side of the placement frame (9), the outer side of the locking ring (803) is provided with a fastener (804), the bottom of the fastener (804) is fixedly connected to the upper side of the placement frame (9), and the inner wall of the locking ring (803) is fixedly connected with a rack (806), the rack (806) is clamped with the outer toothed ring (802) on the same side, and the side of the fastener (804) away from the screw rod (801) is fixedly connected with a spring (805), and the end of the spring (805) away from the fastener (804) is fixedly connected to the inner wall of the locking ring (803) on the same side.

9. The chamber air inlet pipeline and air flow uniformity structure of a PECVD device according to claim 1, characterized in that: The upper side of the screw rod (801) is fixedly connected to a top block (808), and the upper side of the top block (808) is slidably connected to the bottom of the second placement frame (11). The first placement frame (9) and the second placement frame (11) are both provided with a plurality of symmetrical circular openings, and round rods (809) are slidably connected in the circular openings.

10. The chamber air inlet pipeline and air flow uniformity structure of the PECVD equipment according to claim 9, characterized in that: The outside of the round rod (809) is provided with an inclined surface embedding block 1 (812) and an inclined surface embedding block 2 (813); the bottom of the inclined surface embedding block 1 (812) is fixedly connected to the upper side of the placement frame 1 (9) and the placement frame 2 (11); the inner wall of the inclined surface embedding block 2 (813) is fixedly connected to the outside of the round rod (809); the upper side of the inclined surface embedding block 1 (812) is in contact with the bottom of the inclined surface embedding block 2 (813); The first (812) and the second inclined surface engaging block (813) are both located above the first placement frame (9) and the second placement frame (11), and the bottoms of the first placement frame (9), the second gas flow plate (6) and the second placement frame (11), the first gas flow plate (5) are all provided with engaging grooves (810), and the engaging grooves (810) are all slidably connected with limiting members (811), and the upper sides of the limiting members (811) on the same side are fixedly connected to the bottom of the round rod (809).

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