Gas disturbance type viscous ultrafine particle fluidization reaction device system and method

Abstract

The invention provides a gas disturbance type viscous ultrafine particle fluidization reaction device system and method. The gas disturbance type viscous ultrafine particle fluidization reaction device system comprises a fluidization reaction unit, a gas supply unit, a multidirectional gas supply unit and a gas-solid separation unit, the fluidization reaction unit comprises a reaction cavity, and a gaseous zone and a dense-phase zone are sequentially arranged in the reaction cavity in the axial direction; the gas supply unit is connected with the bottom of the reaction cavity and is used for providing primary gas flow for the dense-phase region; the multidirectional air supply unit comprises an air supply module and a plurality of air supply assemblies, the air supply module is connected with the air supply assemblies, and the air supply assemblies are independently connected with the reaction cavity, communicate with the dense-phase region and are used for providing secondary airflow; and the gas-solid separation unit is connected with the gaseous region. Through reasonable configuration and structural arrangement of the multidirectional air supply units, uniform flowing and gas-solid efficient contact of materials in the fluidization reaction cavity are realized, and the problems of particle agglomeration and channeling are solved.

Description

Technical Field

[0001] The present invention belongs to the technical field of gas-solid reaction, and relates to a reaction device system and method for realizing stable fluidization of C-type viscous particles by utilizing gas disturbance. Background Art

[0002] Fluidized reactors are widely used in the chemical industry, energy production, and material processing due to their excellent heat transfer, mass transfer, and gas-solid contact efficiency. The working principle of a fluidized reactor is to suspend solid particles in the reactor through gas, so that the gas-solid two phases are in full contact, thereby achieving efficient heat and mass transfer effects. However, in the gas-solid fluidization process, according to Geldart's particle classification, class C particles exhibit different fluidization characteristics from class A and class B particles during the fluidization process due to their small particle size, low density, and strong surface viscosity. Class C particles are ultrafine and highly viscous particles, and the electrostatic force and van der Waals force between the particles are strong, so they exhibit high adhesion and agglomeration tendency. These characteristics make it difficult for class C particles to form a stable fluidization during the fluidization process, and they are prone to uneven airflow, particle agglomeration, channeling and slugging, and gas plugs. This poor fluidization affects the efficiency and uniformity of the gas-solid reaction, limiting the application of class C particles in fluidized beds.

[0003] Most traditional fluidized reactors use unidirectional gas inflow, which cannot achieve uniform disturbance of Class C particles, resulting in low gas-solid contact efficiency. In addition, the conventional fluidization method has unstable fluidization state, which is prone to problems such as bubble aggregation and particle agglomeration, ditch sulfur surge, etc., resulting in uneven gas distribution in the reactor and insufficient effective contact area between the gas phase and the solid phase, thereby reducing the reaction efficiency and product quality. Especially for industrial reaction processes that require stable operation, this fluctuation will affect the uniformity of the reaction and the quality of the product, making it difficult to accurately control the reaction conditions and reducing the stability and consistency of production. In addition, in order to overcome the agglomeration phenomenon of Class C particles, traditional fluidized beds usually increase the gas impact force by increasing the gas flow rate (i.e., the filling rate), and then try to break the particle agglomeration. However, this method significantly increases energy consumption, and in some cases still cannot achieve the ideal fluidization effect. At the same time, excessively high gas flow may cause particles to fly, resulting in material loss, increased production costs, and potential pollution to the surrounding environment. In addition, at high inflation rates and strong gas impact forces, the high-speed flow of air in traditional fluidized beds will lead to increased equipment wear, especially at the bottom gas distribution plate and the side walls of the fluidized bed. For Class C particles with high viscosity, agglomerated particles will further increase equipment wear during the fluidization process, increasing the frequency of equipment maintenance and replacement, and significantly increasing maintenance costs.

[0004] In recent years, some studies have proposed a variety of improvement methods, such as increasing the structural complexity of the gas distribution plate and introducing external force fields (such as stirring, vibration field, sound field, magnetic field, bubble breaking) to enhance the fluidization effect. When treating Class C particles, the traditional stirred fluidized bed still often has adhesion between particles, resulting in uneven fluidization and even loss of flow, which in turn causes uneven and unstable reaction process. This phenomenon not only reduces the reaction efficiency, but also causes a small amount of fine particles to be entrained by the airflow to the top or outlet of the reactor, so that they cannot fully react, resulting in "insufficient reaction" of these particles, and ultimately leading to a decrease in product qualification rate. Although adding a stirring device to the fluidized reactor can improve the fluidization quality to a certain extent, break the agglomeration of Class C particles, and enhance gas-solid contact, there are still many limitations in practical applications, especially in the field of fine chemicals such as chemical vapor deposition and carbon material activation. These processes have extremely high requirements for product quality and consistency, especially for precise control of process parameters such as reaction time, temperature and pressure. For example, CN118267939A discloses a fluidized reactor and reaction system designed specifically for Class C particles, which includes a fluidized stirring mechanism, a heating system, and a pressure regulating system to achieve a uniform fluidization effect and meet the reaction conditions of fine chemicals, but the design relies on a stirring device and multiple precision control systems, which increases the complexity and maintenance cost of the equipment, has high energy consumption, is difficult to operate, and its applicability may be limited to specific high-precision industrial applications. CN205110110U discloses a stirred air heavy medium fluidized bed sorting device, which introduces a frame-type stirring paddle device, which can effectively break up large bubbles in the fluidized bed and prevent uneven fluidization caused by the merger and enlargement of bubbles. This design reduces the complexity of vibration and magnetic field assisted fluidization, but the design mainly relies on mechanical stirring to break up bubbles, and its scope of application is relatively limited. The long-term operation of the stirring device may cause equipment wear and require regular maintenance, which increases the cost of use, and it may be difficult to achieve the best effect in high-precision sorting applications. CN109046187A discloses a gas-solid fluidized reactor with a high gas filling rate, which realizes efficient gas-solid contact by using "C+ class particles" in a fluidized bed, or increases the specific surface area and gas filling rate by surface roughening. However, the preparation and fluidization stability of C+ class particles depend on the uniform distribution of nanoparticles, and strict requirements are placed on the gas velocity and pressure of the fluidized bed during operation, which increases the complexity of the operation. At the same time, the wear of nanoparticles may cause particle loss and pollution, and the design of high gas filling rate has the risk of increased energy consumption during application. Mechanical vibration is applied to the fluidized reactor, so that the C class particles are easier to disperse under the action of vibration, which can reduce the agglomeration between particles, but the vibration system increases equipment wear, and may cause noise and energy consumption problems for large-scale industrial applications.A pulse airflow device is set at the bottom or side wall of the fluidized bed, and pulse airflow is applied regularly or randomly. Although it can break up the agglomeration of particles, it requires high control accuracy, and the pulse frequency and intensity must be accurately matched with the particle characteristics, otherwise it may lead to uneven particle distribution. Introducing sound waves into the fluidized bed to disturb the C-type particles can break up the agglomeration force between the particles, but for large-scale industrial applications, the effect of the sound wave disturbance weakens as the scale increases, and the power consumption of the sound wave device is high. The bubble breaking device can improve the fluidization quality to a certain extent, and the structure is relatively simple. However, the mechanical components increase the complexity and maintenance difficulty of the equipment, and at the same time, the effect on smaller C-type particles is limited. It is not difficult to see that the above method often increases the cost and complexity of the equipment, and the fluidization effect of C-type particles is limited.

[0005] Therefore, it is necessary to provide a fluidized reactor that can ensure uniformity and stability of particle fluidization while also having a higher reaction effect. Summary of the invention

[0006] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a gas-disturbance type viscous ultrafine particle fluidized reaction device system and method, which has the advantages of high efficiency, flexibility and durability. By continuously supplying gas to the reaction chamber in multiple dimensions and directions, a uniform gas disturbance field is formed, which solves the problems of poor fluidization quality of Class C particles in the fluidized reactor and easy generation of particle agglomeration and channeling.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] In the first aspect, the present invention provides a gas-disturbance type viscous ultrafine particle fluidized reaction device system, which includes a fluidized reaction unit, a gas supply unit, a multi-directional air supply unit and a gas-solid separation unit; the fluidized reaction unit includes a reaction chamber, and a gaseous zone and a dense phase zone are sequentially arranged in the axial direction in the reaction chamber; the gas supply unit is connected to the bottom of the reaction chamber, and is used to provide a primary airflow to the dense phase zone; the multi-directional air supply unit includes an air supply module and a plurality of air supply components, the air supply modules are respectively connected to a plurality of the air supply components, and the plurality of the air supply components are independently connected to the reaction chamber and connected to the dense phase zone to provide a secondary airflow; the gas-solid separation unit is connected to the gaseous zone.

[0009] The present invention forms continuous multi-directional disturbances in the fluidized reaction chamber by arranging a multi-directional gas supply unit, so that the particles are in a suspended state, effectively breaking the agglomeration and channeling of the particles in the dense phase area, making the particle distribution more uniform, and significantly increasing the contact opportunities between gas and particles, thereby improving the gas-solid reaction efficiency and the uniformity and quality of the product; at the same time, the gas-solid separation unit is used to effectively remove particulate dust in the product, thereby ensuring the purity of the reaction product.

[0010] The gas disturbance type viscous ultrafine particle fluidized reaction device system provided by the present invention has a wide range of applications and can be applied to various gas-solid reactions requiring uniform fluidization, thereby improving reaction efficiency and product quality, and is particularly suitable for the processing of Class C particles.

[0011] As a preferred technical solution of the present invention, based on the central axis of the reaction chamber, the gas supply component adopts any one of a tangential setting, a radial setting, an upward inclined setting or a downward inclined setting, or a combination of at least two of them, and the setting directions of several gas supply components are the same or different.

[0012] It should be noted that the "tangential setting" in the present invention refers to setting at a certain angle with the inner wall of the reaction chamber along the circumferential direction, and the gas outlet of the gas replenishing component points away from the central axis of the reaction chamber; the "radial setting" refers to setting perpendicular to the inner wall of the reaction chamber along the circumferential direction, and the gas outlet of the gas replenishing component points to the central axis of the reaction chamber; the "inclined upward setting" refers to setting at a certain angle with the inner wall of the reaction chamber along the axial direction, and the gas outlet of the gas replenishing component is upward; the "inclined downward setting" refers to setting at a certain angle with the inner wall of the reaction chamber along the axial direction, and the gas outlet of the gas replenishing component is downward. The "circumferential direction" is perpendicular to the "axial direction" of the reaction chamber.

[0013] As a preferred technical solution of the present invention, a plurality of the gas supply components are arranged at equal intervals along the axial direction and / or circumferential direction of the reaction chamber.

[0014] Preferably, the gas supply component is sealingly connected to the outer peripheral wall of the dense phase zone of the reaction chamber.

[0015] Preferably, the distance between the gas outlet of the gas replenishing component and the inner cavity wall of the reaction chamber is 2% to 20% of the diameter of the reaction chamber, for example, it can be 2%, 3%, 5%, 8%, 10%, 12%, 15%, 16%, 18% or 20%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0016] Preferably, when the air supply component is arranged tangentially, the inclination angle of the air supply component is 15° to 45°, for example, it can be 15°, 20°, 25°, 30°, 35°, 40° or 45°, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0017] Preferably, when the air supply component is arranged to be inclined upward, the inclination angle of the air supply component is 15° to 60°, for example, it can be 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55° or 60°, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0018] Preferably, when the air supply component is arranged to be tilted downward, the inclination angle of the air supply component is 15° to 60°, for example, it can be 15°, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55° or 60°, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0019] It should be noted that the inclination angle of the gas-supplement component when it is set tangentially in the present invention refers to the angle between the gas-supplement component and the inner wall of the reaction chamber in the circumferential direction; the inclination angle of the gas-supplement component when it is set tilted downward refers to the angle between the gas-supplement component and the inner wall of the reaction chamber in the axial direction; the inclination angle of the gas-supplement component when it is set tilted downward refers to the angle between the gas-supplement component and the inner wall of the reaction chamber in the axial direction.

[0020] As a preferred technical solution of the present invention, the air supply module includes an air supply fan and a first air storage device connected in sequence, and the outlet end of the first air storage device is respectively connected to a plurality of the air supply components.

[0021] Preferably, the first gas storage device is connected to the gas supply component via a gas supply pipeline, and the gas supply pipeline is provided with a first flow detection component, a first pressure detection component and a first regulating valve.

[0022] As a preferred technical solution of the present invention, a gas distribution plate is provided at the bottom of the inner cavity of the reaction chamber, and the primary gas flow passes through the gas distribution plate and enters the dense phase zone.

[0023] Preferably, the gas distribution plate is a tongue-shaped distribution plate.

[0024] The present invention utilizes a gas distribution plate to allow the airflow to enter the dense phase region along a tortuous path, thereby reducing the intensity of direct impact on the bed layer, reducing the airflow short-circuiting phenomenon, avoiding excessive or weak local airflow, alleviating channeling and throttling phenomena, reducing dependence on high flow rate or high pressure airflow, and helping to improve gas-solid contact efficiency.

[0025] Preferably, the reaction chamber has a cylindrical structure.

[0026] Preferably, the volume of the dense phase zone is 40% to 70% of the total volume of the reaction chamber, for example, it can be 40%, 45%, 50%, 55%, 60%, 65% or 70%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0027] Preferably, the fluidized reaction unit further comprises a feeding device, and the feeding device is connected to the reaction chamber.

[0028] Preferably, a discharge port is also provided at the bottom of the reaction chamber.

[0029] As a preferred technical solution of the present invention, the air supply unit includes an air supply fan and a second air storage device connected in sequence, and the outlet end of the second air storage device is connected to the bottom of the reaction chamber.

[0030] Preferably, the second gas storage device is connected to the reaction chamber via a gas supply pipeline, and the gas supply pipeline is provided with a second flow detection component, a second pressure detection component and a second regulating valve.

[0031] As a preferred technical solution of the present invention, the gas-solid separation unit includes a cyclone separation device, the cyclone separation device is connected to the gaseous zone, and the top and bottom of the cyclone separation device are respectively provided with an exhaust port and a discharge port.

[0032] The present invention recovers the particles entrained by the gas during the fluidization startup stage and the use process through a cyclone separation device, thereby reducing the loss caused by the entrainment of particles and improving the product yield.

[0033] In a second aspect, the present invention provides a gas disturbance fluidized reaction method, wherein the gas disturbance fluidized reaction method adopts the gas disturbance viscous ultrafine particle fluidized reaction device system described in the first aspect, and the gas disturbance fluidized reaction method comprises:

[0034] (1) Filling the solid raw material into the dense phase region and introducing a primary air flow to perform a gas-solid reaction, so that the solid raw material is in a fluidized state;

[0035] (2) A secondary airflow is then introduced into the dense phase region to form a multi-directional gas disturbance field to enhance the fluidization effect and generate a gaseous mixture;

[0036] (3) Separate the gaseous mixture produced by the fluidized bed reaction into gas and solid.

[0037] The present invention first utilizes a primary airflow to make the solid raw material initially fluidized, and then supplements a secondary airflow to form a multi-directional disturbance field with mutually staggered airflow directions, further breaking up particle agglomerations, enhancing the fluidization effect, improving the gas-solid contact efficiency, improving the fluidization uniformity, reducing the problems of particle agglomeration, channeling and bubble aggregation, and greatly reducing energy consumption while greatly improving the fluidization effect.

[0038] As a preferred technical solution of the present invention, the gas disturbance fluidized reaction method further includes: adjusting the charging angle, pressure and gas velocity of the secondary gas flow to enhance the fluidization state of the solid raw material in the dense phase region.

[0039] The present invention realizes multi-dimensional and all-round disturbance of solid raw materials, improves gas-solid contact efficiency, makes the reaction process more stable, and significantly improves fluidization quality.

[0040] As a preferred technical solution of the present invention, the charging direction of the secondary airflow in the multi-directional gas disturbance field includes any one of tangential, radial, inclined upward or inclined downward, or a combination of at least two of them.

[0041] Preferably, the air velocity of the secondary air flow is lower than the air velocity of the primary air flow.

[0042] Preferably, the pressure of the secondary air flow is lower than the pressure of the primary air flow.

[0043] Preferably, the velocity of the primary airflow is 0.003 to 50 m / s, for example, it can be 0.003 m / s, 0.1 m / s, 0.5 m / s, 1 m / s, 5 m / s, 10 m / s, 15 m / s, 20 m / s, 25 m / s, 30 m / s, 45 m / s, 50 m / s, 55 m / s or 50 m / s, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0044] Preferably, the pressure of the primary airflow is 0.1-0.5 MPa, for example, it can be 0.1 MPa, 0.15 MPa, 0.2 MPa, 0.25 MPa, 0.3 MPa, 0.35 MPa, 0.4 MPa, 0.45 MPa or 0.5 MPa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0045] The system refers to an equipment system, a device system or a production device.

[0046] Compared with the prior art, the present invention has the following beneficial effects:

[0047] (1) The gas-disturbance-type viscous ultrafine particle fluidized reaction device system and method provided by the present invention effectively breaks up the agglomeration and channeling of particles by forming multi-directional disturbances in the fluidized bed, making the particle distribution more uniform, avoiding the channeling and throttling problems in traditional fluidized beds, improving the gas-solid contact efficiency and fluidization uniformity, and solving the problem of poor fluidization effect of traditional fluidized beds on Class C viscous particles.

[0048] (2) The present invention significantly increases the contact opportunities between gas and particles by adding multi-directional gas supply disturbance, so that the active sites on the surface of the particles are fully utilized, thereby improving the gas-solid reaction efficiency and improving the uniformity and quality of the product.

[0049] (3) The present invention adjusts the gas supply direction and airflow intensity according to the specific reaction requirements to adapt to different particle characteristics and fluidization requirements, provides continuous and stable airflow disturbance, enhances the versatility and operability of the system, and is suitable for a variety of industrial application scenarios; at the same time, the multi-directional gas supply method can ensure the continuous suspension of particles in the fluidized bed. Compared with traditional unidirectional fluidization, it can greatly improve the gas-solid contact efficiency, so as to achieve a higher reaction rate in a shorter time, which is suitable for efficient industrial production needs.

[0050] (4) The present invention provides multi-directional air supply disturbance, which helps prevent the deposition and blockage of particles inside the equipment, reduces the risk of equipment wear and failure, reduces equipment blockage and maintenance frequency, extends the service life of the equipment, and reduces maintenance costs and downtime.

[0051] (5) The present invention optimizes the distribution of gas through efficient gas supply disturbance, making the fluidization operation more energy-efficient and reducing the energy consumption of the system operation. Compared with the traditional fluidized reactor with high filling rate or high power vibration device, it saves energy, is environmentally friendly and efficient, and has higher economic benefits.

[0052] (6) The present invention utilizes an integrated design of a fluidized reaction unit and a gas-solid separation unit to effectively remove particulate dust, thereby ensuring the purity of the reaction products and improving the cleanliness of the reaction device. In combination with multi-directional gas replenishment, the gas-solid separation effect is further optimized, thereby ensuring the environmental friendliness and safety of the reaction process.

[0053] (7) The present invention has a wide range of applications and great industrial application potential. It can be widely used in the fluidization reaction of other sticky particles or ultrafine particles, and has an efficient and stable fluidization effect, which makes it have significant advantages and market potential in a variety of industrial applications. BRIEF DESCRIPTION OF THE DRAWINGS

[0054] Figure 1 This is a schematic diagram of the structure of the gas disturbance type viscous ultrafine particle fluidized reaction device system provided in Example 1 of the present invention.

[0055] Figure 2This is a schematic structural diagram of the tongue-shaped distribution plate provided in Example 1 of the present invention.

[0056] Figure 3 This is a schematic diagram of the structure of the gas replenishing component provided in Example 1 of the present invention.

[0057] Figure 4 This is a schematic diagram of the structure of the gas replenishing component provided in Example 2 of the present invention.

[0058] Figure 5 This is a schematic diagram of the structure of the gas replenishing component provided in Example 3 of the present invention.

[0059] Figure 6 This is a schematic diagram of the structure of the gas replenishing component provided in Example 4 of the present invention.

[0060] Figure 7 This is a schematic diagram of the structure of the gas replenishing component provided in Example 5 of the present invention.

[0061] Figure 8 This is a schematic diagram of the structure of the gas replenishing component provided in Example 6 of the present invention.

[0062] Fig. 9 This is a schematic diagram of the structure of the gas replenishing component provided in Example 7 of the present invention.

[0063] Fig.10 This is a schematic diagram of the structure of the gas replenishing component provided in Example 8 of the present invention.

[0064] Among them, 1-reaction chamber; 101-gaseous zone; 102-dense phase zone; 103-discharge port; 2-feeding device; 3-tongue-shaped distribution plate; 4-air supply fan; 5-second gas storage device; 401-second flow detection component; 402-second pressure detection component; 403-second regulating valve; 6-cyclone separation device; 601-exhaust port; 602-discharge port; 7-air supply fan; 701-first flow detection component; 702-first pressure detection component; 703-first regulating valve; 8-first gas storage device; 9-air supply component; 901-first gas outlet; 902-second gas outlet; 903-third gas outlet. DETAILED DESCRIPTION

[0065] It should be understood that, in the description of the present invention, the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0066] It should be noted that in the description of the present invention, unless otherwise clearly specified and limited, the terms "disposed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

[0067] The technical solution of the present invention is further described below with reference to the accompanying drawings and through specific implementation methods.

[0068] In some embodiments, the present invention provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, including a fluidized reaction unit, a gas supply unit, a multi-directional gas supply unit and a gas-solid separation unit. The fluidized reaction unit includes a reaction chamber, which serves as a gas-solid reaction site. A gaseous zone and a dense phase zone are sequentially arranged in the axial direction in the reaction chamber. The dense phase zone is filled with solid materials, and the gaseous products generated by the gas-solid reaction enter the gaseous zone. The gas supply unit is connected to the bottom of the reaction chamber, and is used to provide the primary airflow required for basic fluidization to the dense phase zone as a reaction gas, and to perform a gas-solid reaction with the solid materials in the dense phase zone, so that the solid materials are suspended in a state to achieve preliminary fluidization. The multi-directional gas supply unit includes a gas supply module and a plurality of gas supply components, and the gas supply modules are respectively connected to a plurality of the gas supply components, and the plurality of the gas supply components are independently connected to the reaction chamber and connected to the dense phase zone, and are used to provide a secondary airflow to form a multi-dimensional and multi-directional airflow disturbance in the reaction chamber, thereby enhancing the stability of the fluidization effect. The gas-solid separation unit is connected to the gaseous zone and is used to effectively intercept and recover the particulate dust entrained and rising in the gaseous product.

[0069] The gas disturbance type viscous ultrafine particle fluidized reaction device system provided by the present invention can be applied to various gas-solid reactions that require uniform fluidization, and can be widely used in fluidized reactions of viscous particles or ultrafine particles, including but not limited to chemical vapor deposition, catalytic reactions, material synthesis, adsorption separation, powder mixing and surface modification, etc., and is particularly suitable for fluidized processing of Class C particles. The particle size of the Class C particles is ≤20μm, and the viscosity is 10-500mPa·s. Due to the small particle size and strong viscosity, stagnation, uneven bubbles and insufficient gas-solid contact often occur during the fluidization process, thereby affecting the efficiency and uniformity of the reaction. It is difficult for traditional fluidized bed systems to ensure fluidization uniformity and stability when processing Class C particles, which easily leads to low equipment operation efficiency and poor reaction effect. The present invention can enhance the fluidization effect of Class C particles by adding multi-directional gas disturbance, avoid particle agglomeration, channeling and other phenomena, and effectively improve the fluidization quality.

[0070] Taking the central axis of the reaction chamber as a reference, the gas supplement component adopts any one or a combination of at least two of the tangential setting, radial setting, tilted upward setting or tilted downward setting, and the setting directions of several gas supplement components are the same or different. And the gas supplement component is set in the dense phase area in the middle and lower part of the reaction chamber, and the distance from the gas outlet of the gas supplement component to the inner cavity wall of the reaction chamber is 2% to 20% of the diameter of the reaction chamber. Those skilled in the art can adjust the insertion depth of the gas supplement component according to the actual process conditions. Specifically, when the gas supplement component is set tangentially, the inclination angle of the gas supplement component is 15° to 45°. When the gas supplement component is set tilted upward, the inclination angle of the gas supplement component is 15° to 60°, preferably 30° to 60°. When the gas supplement component is set tilted downward, the inclination angle of the gas supplement component is 15° to 60°, preferably 30° to 60°. The present invention arranges gas supply components in tangential, radial, upward slanting, downward slanting or multi-directional mixing on the reaction chamber, and can flexibly adjust the gas supply direction, angle, flow rate or axial arrangement quantity according to process requirements to adapt to the fluidization characteristics of different particles. The particles are arranged in an orderly manner inside the fluidization cavity to form a multi-dimensional gas disturbance with mutually staggered gas flow directions, thereby improving fluidization uniformity.

[0071] The number of air supply components in the present invention is multiple, and the setting direction, angle, flow rate and number of each air supply component can be adjusted according to the process requirements. Exemplarily, the setting directions of all air supply components can be the same, and any one or a combination of at least two of the tangential setting, radial setting, tilted upward setting or tilted downward setting is adopted, wherein the typical but non-limiting combination is: a combination of tangential and tilted downward, a combination of tangential and tilted downward, a combination of tangential and radial, a combination of radial and tilted downward, a combination of radial and tilted downward, a combination of tangential, tilted upward and tilted downward, a combination of radial, tilted upward and tilted downward, a combination of tangential, radial and tilted upward, a combination of tangential, radial and tilted downward, a combination of tangential, radial, tilted downward and tilted upward, and the like. Alternatively, the setting directions of at least some of the air supply components are different from each other, for example, a part of the air supply components is tangentially set, and the other part of the air supply components is any one or a combination of at least two of the radial, tilted upward or tilted downward settings. At the same time, the angle and flow rate of each air supply component can be the same or different, and the relevant parameters can be adjusted independently according to the actual process requirements.

[0072] Furthermore, a plurality of the gas replenishing components are arranged equidistantly along the axial direction and / or circumferential direction of the reaction chamber. That is, the gas replenishing components in the present invention can be arranged along the circumferential direction of the reaction chamber, can be arranged along the axial direction of the reaction chamber, or can be arranged along the circumferential direction and the axial direction at the same time.

[0073] The gas supply component is sealed to the outer peripheral wall of the dense phase zone of the reaction chamber. The sealed connection includes but is not limited to flange connection, welding, threaded connection, socket connection, ferrule connection or bonding, etc., which are well known to those skilled in the art. The gas supply component can adopt a nozzle or nozzle which is well known to those skilled in the art.

[0074] In some embodiments, the air supply module includes an air supply fan and a first air storage device connected in sequence, and the outlet end of the first air storage device is respectively connected to a plurality of the air supply components. Further, the first air storage device is connected to the air supply component through an air supply pipeline, and the air supply pipeline is provided with a first flow detection component, a first pressure detection component and a first regulating valve. During the application of the present invention, the air supply fan is started, and the secondary airflow in the first air storage device is sent to the air supply component on the reaction chamber, so that the secondary airflow enters the dense phase area to form a multi-directional airflow disturbance field, and the gas velocity and pressure of the secondary airflow are detected in real time, and the first regulating valve is used to regulate the fluidization state in the reaction chamber to meet the needs of different reaction conditions and ensure the stability and safety of the reaction operation. The air supply module must also include necessary pipelines, conventional valves and general pump equipment for realizing the complete process. Those skilled in the art can add layouts on their own based on the process flow and equipment structure selection, and the present invention does not make special requirements and specific limitations on this.

[0075] In some embodiments, a gas distribution plate is provided at the bottom of the inner cavity of the reaction chamber, and the primary airflow passes through the gas distribution plate into the dense phase region. Specifically, the gas distribution plate is a tongue-shaped distribution plate, and the plate surface is provided with air inlet holes that are evenly distributed in the circumferential direction. A tongue-shaped guide hood is provided at the air inlet hole to form a specific flow channel design, so that the gas enters the bed layer along a tortuous path, reducing the intensity of direct impact on the bed layer and reducing equipment wear. Compared with the traditional flat distribution plate, the tongue-shaped distribution plate used in the present invention enables the airflow to be evenly distributed in the entire bed layer area, reduces the short-circuiting phenomenon of the airflow, avoids excessive or weak local airflow, alleviates the channel flow and throttling phenomenon, and reduces the dependence on high flow rate or high pressure airflow, reduces energy consumption, and improves the gas-solid contact efficiency. In addition, it can also prevent too many fine particles from being quickly entrained to the gaseous zone or the outlet end of the reaction chamber, reduces the difficulty of operation, and facilitates control and management. The gas distribution plate provides a basic fluidizing gas flow at the bottom of the reaction chamber, and the multi-directional gas supply unit further enhances the fluidizing state of the particles, showing a synergistic effect, and together constitutes an efficient fluidizing gas distribution system, so that the gas-solid contact in the entire reaction chamber is more sufficient.

[0076] Furthermore, the reaction chamber has a cylindrical structure, and the volume of the dense phase zone is 40% to 70% of the total volume of the reaction chamber. The present invention does not specifically limit the overall volume of the reaction chamber, and those skilled in the art can adjust the volume of the reaction chamber according to actual process conditions and output. The reaction chamber must include necessary pipelines, conventional valves, general pump equipment, pressure detection sensors and safety valves, etc. for achieving complete process. Those skilled in the art can add layouts on their own based on process flow and equipment structure selection, and the present invention does not make special requirements and specific limitations on this.

[0077] In some embodiments, the fluidized reaction unit further includes a feeding device, which is connected to the reaction chamber and is used to provide solid materials to the reaction chamber. Specifically, the feeding device is docked above the dense phase zone so that the solid materials are evenly distributed at the bottom of the inner cavity of the reaction chamber. Exemplarily, the feeding device may include a silo, a feeding mechanism, a conveyor belt, etc. for realizing a complete process. Those skilled in the art may also reasonably add a weighing mechanism according to actual production needs, and the present invention does not specifically limit this. A discharge port is also provided at the bottom of the reaction chamber for unloading.

[0078] In some embodiments, the air supply unit includes an air supply fan and a second air storage device connected in sequence, and the outlet end of the second air storage device is connected to the bottom of the reaction chamber. Further, the second air storage device is connected to the reaction chamber through an air supply pipeline, and the air supply pipeline is provided with a second flow detection component, a second pressure detection component and a second regulating valve. During the application of the present invention, the air supply fan is started, and the primary air flow in the second air storage device is sent to the bottom of the reaction chamber, so that it passes through the gas distribution plate and enters the dense phase area to form an ascending air flow, and the gas velocity and pressure of the primary air flow are detected in real time, and the gas velocity and pressure of the primary air flow are adjusted by the second regulating valve to ensure that the solid material is in a suspended state, so that the gas is fully in contact with the solid material. The air supply unit must also include necessary pipelines, conventional valves and general pump equipment for realizing the complete process. Those skilled in the art can add layouts by themselves based on the process flow and equipment structure selection, and the present invention does not make special requirements and specific limitations on this.

[0079] In some embodiments, the gas-solid separation unit includes a cyclone separation device, which is connected to the gaseous area at the top of the reaction chamber and is used to separate the particulate dust generated during the reaction from the gas, ensuring the purity of the reaction product and the cleanliness of the reaction environment, and cooperates with the multi-directional air supply unit to further improve the overall performance of the reactor to ensure the high efficiency and continuity of gas-solid separation. The top and bottom of the cyclone separation device are respectively provided with an exhaust port and a discharge port, which intercept fine particles in the gas product and separate them in the finished product bin and discharge them from the discharge port, and the separated gas is discharged from the exhaust port to the waste gas treatment system, thereby improving the product recovery rate.

[0080] In another specific embodiment, the present invention provides a gas disturbance fluidized reaction method, wherein the gas disturbance fluidized reaction method adopts a gas disturbance viscous ultrafine particle fluidized reaction device system according to a specific embodiment, and the gas disturbance fluidized reaction method comprises:

[0081] Step (1) Fill the solid raw material into the dense phase region and introduce a primary air flow to carry out a gas-solid reaction, so that the solid raw material is in a fluidized state.

[0082] The solid raw material includes any one of Class A particles, Class B particles or Class C particles, or a combination of at least two of them. The present invention uses a feeding device to feed the solid raw material into the reaction chamber and distributes it in the bottom area of ​​the reaction chamber, starts the air supply fan, and allows the primary gas to enter the dense phase area from the gas distribution plate at the bottom, gradually increasing the flow rate to promote the solid raw material to begin fluidization. Specifically, the gas velocity of the primary gas flow is 0.003-50 m / s, and the pressure is 0.1-0.5 MPa.

[0083] Step (2) injects a secondary airflow into the dense phase region to form a multi-directional gas disturbance field to enhance the fluidization effect and generate a gaseous mixture.

[0084] After the solid raw materials are initially fluidized, the present invention starts the air supply fan to provide a multi-dimensional and multi-directional secondary airflow to the dense phase area of ​​the reaction chamber at a preset angle and flow rate, forming a uniform multi-directional airflow disturbance inside the reaction chamber to break up the particle agglomeration, and during the reaction process, by adjusting the filling angle, pressure and gas velocity of the secondary airflow, the fluidization state of the solid raw materials in the dense phase area is regulated to meet the needs of different reaction conditions. Furthermore, the filling direction of the secondary airflow in the multi-directional gas disturbance field includes any one of tangential, radial, inclined upward or inclined downward, or a combination of at least two of them. Wherein, the gas velocity of the secondary airflow is less than the gas velocity of the primary airflow, and the pressure of the secondary airflow is less than the pressure of the primary airflow.

[0085] Step (3) performs gas-solid separation on the gaseous mixture produced by the fluidized reaction.

[0086] The gaseous mixture produced by the reaction of the present invention enters the gaseous zone and is discharged from the top of the reaction chamber to the cyclone separation device. During the startup stage or the gas volume adjustment process, the fine particles entrained by the airflow are collected by the cyclone separation device, the particles are effectively intercepted, and separated in the finished product bin. The separated gas is discharged to the exhaust gas treatment system.

[0087] Example 1

[0088] This embodiment provides a gas-turbulent viscous ultrafine particle fluidized reaction device system, including a fluidized reaction unit, a gas supply unit, a multi-directional gas supply unit and a gas-solid separation unit. Figure 1 As shown, the fluidized reaction unit includes a reaction chamber 1 and a feeding device 2. The reaction chamber 1 is a cylindrical structure, and a gaseous zone 101 and a dense phase zone 102 are sequentially arranged in the reaction chamber 1 along the axial direction. The volume of the dense phase zone 102 is 50% of the total volume of the reaction chamber 1, and a discharge port 103 is arranged at the bottom of the reaction chamber 1. The feeding device 2 is connected to the top of the dense phase zone 102 to provide solid raw materials. The bottom of the inner cavity of the reaction chamber 1 is also provided with a Figure 2 The tongue-shaped distribution plate 3 shown. The air supply unit includes an air supply fan 4 and a second air storage device 5 which are connected in sequence, and the outlet end of the second air storage device 5 is connected to the tongue-shaped distribution plate 3 via an air supply pipeline to provide a primary air flow. A second flow detection component 401, a second pressure detection component 402 and a second regulating valve 403 are arranged on the air supply pipeline. The gas-solid separation unit includes a cyclone separation device 6, which is connected to the top of the reaction chamber 1 and connected to the gaseous zone 101, and the top and bottom of the cyclone separation device 6 are also respectively provided with an exhaust port 601 and a discharge port 602. The multi-directional air supply unit includes an air supply module and a plurality of air supply components 9. As Figure 3 As shown, a plurality of air supply components 9 are arranged at equal intervals along the circumference of the reaction chamber 1, and each air supply component 9 is arranged radially and connected to the dense phase area 102 to provide secondary airflow. The air supply module includes an air supply fan 7 and a first air storage device 8 connected in sequence, the outlet end of the first air storage device 8 is connected to the air supply component 9 through an air supply pipeline, the air supply component 9 is welded to the outer wall of the reaction chamber 1, and the distance from the air outlet of the air supply component to the inner wall of the reaction chamber is 2% to 20% of the diameter of the reaction chamber. A first flow detection component 701, a first pressure detection component 702 and a first regulating valve 703 are arranged on the air supply pipeline.

[0089] In this embodiment, a plurality of gas supply components 9 are arranged on the periphery of the dense phase zone 102 of the reaction chamber 1, and additional secondary airflow is provided to the dense phase zone 102 in the radial direction, thereby forming a uniform radial disturbance. The gas velocity and pressure of the gas supply can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0090] Example 2

[0091] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that the gas supply component 9 adopts a radial and tangential multi-directional mixing setting mode, such as Figure 4 As shown, each gas supplement component 9 is composed of a first gas outlet portion 901, a second gas outlet portion 902 and a third gas outlet portion 903, wherein the first gas outlet portion 901, the second gas outlet portion 902 and the third gas outlet portion 903 are all located on the same horizontal plane perpendicular to the axial direction of the reaction chamber 1, the second gas outlet portion 902 and the third gas outlet portion 903 are symmetrically arranged with the first gas outlet portion 901 as the center, the first gas outlet portion 901 is perpendicular to the inner wall of the reaction chamber 1, the angle between the second gas outlet portion 902 and the inner wall of the reaction chamber 1 is 30°, the angle between the third gas outlet portion 903 and the inner wall of the reaction chamber 1 is 30°, and the rest of the structure is exactly the same as that of Example 1.

[0092] In this embodiment, a plurality of gas supply components 9 are arranged on the periphery of the dense phase zone 102 of the reaction chamber 1, and additional secondary airflow is provided to the dense phase zone 102 in radial and tangential directions, thereby forming uniform radial disturbance and rotational disturbance at the same time. The gas velocity and pressure of the gas supply can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0093] Example 3

[0094] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that each gas supply component 9 is arranged tangentially, such as Figure 5As shown, the multiple gas supply components 9 are all located on the same horizontal plane perpendicular to the axial direction of the reaction chamber 1, and the angle between each gas supply component 9 and the inner wall of the reaction chamber 1 is 45°. The rest of the structure is exactly the same as that of Example 1.

[0095] In this embodiment, a plurality of gas supply components 9 are arranged on the periphery of the dense phase zone 102 of the reaction chamber 1, and an additional secondary airflow is provided to the dense phase zone 102 in the tangential direction to form a rotational disturbance in the reaction chamber 1, thereby effectively preventing particle aggregation and fully mixing the gas and solid phases. The gas supply velocity and pressure can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0096] Example 4

[0097] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that: Figure 6 As shown, a plurality of gas supply components 9 are arranged along the circumference of the reaction chamber 1 and are also arranged along the axial direction of the reaction chamber 1 , and the rest of the structure is exactly the same as that of the first embodiment.

[0098] In this embodiment, multiple gas replenishment components 9 are arranged along the circumference and axial direction of the reaction chamber 1 to form uniform radial disturbance, enhance the intensity of air flow disturbance, and increase the contact rate between gas and solid materials. The gas velocity and pressure of the gas replenishment can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0099] Example 5

[0100] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that: Figure 7 As shown, each gas supplement component 9 is arranged to be tilted downward, and the angle between the gas supplement component 9 and the inner wall of the reaction chamber 1 is 45°. The rest of the structure is exactly the same as that of Example 1.

[0101] In this embodiment, the gas outlet of the gas supply component 9 is tilted downward at the same time, so that the airflow forms a dual effect of downward disturbance and horizontal dispersion in the dense phase area 102, thereby forming a uniform disturbance and avoiding the formation of a dead zone at the bottom of the reaction chamber 1.

[0102] Example 6

[0103] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that: Figure 8 As shown, each gas supplement component 9 is arranged to be inclined upward, and the angle between the gas supplement component 9 and the inner wall of the reaction chamber 1 is 45°. The rest of the structure is exactly the same as that of Example 1.

[0104] In this embodiment, the gas outlet of the gas supply component 9 is tilted upward at the same time, providing an oblique airflow into the reaction chamber 1, so that the airflow forms a dual effect of downward disturbance and horizontal dispersion in the dense phase area 102, thereby forming a uniform disturbance, which can break up the material agglomeration and promote the solid material to move in an orderly manner along the direction of the airflow, avoiding the formation of channel flow or accumulation.

[0105] Example 7

[0106] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that: Fig. 9 As shown, multiple gas supply components 9 are arranged along the circumference of the reaction chamber 1 and also arranged along the axial direction of the reaction chamber 1, and each gas supply component 9 is arranged downwardly inclined, and the angle between the gas supply component 9 and the inner wall of the reaction chamber 1 is 45°. The rest of the structure is exactly the same as that of Example 1.

[0107] In this embodiment, multiple gas supply components 9 are arranged along the circumference and axial direction of the reaction chamber 1 to provide additional oblique airflow to the reaction chamber 1, so that the airflow forms a dual effect of downward disturbance and horizontal dispersion in the dense phase area 102, thereby forming a uniform disturbance, avoiding the formation of a dead zone at the bottom of the reaction chamber 1, enhancing the intensity of the airflow disturbance, and increasing the contact rate between the gas and the solid material. The gas supply velocity and pressure can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0108] Example 8

[0109] This embodiment provides a gas disturbance type viscous ultrafine particle fluidized reaction device system, which is different from the embodiment 1 in that: Fig.10 As shown, multiple gas supplement components 9 are arranged along the circumferential direction of the reaction chamber 1, and are also arranged along the axial direction of the reaction chamber 1, and the gas supplement components 9 adopt a radial, inclined upward and inclined downward multi-directional mixed setting method, each gas supplement component 9 is composed of a first gas outlet 901, a second gas outlet 902 and a third gas outlet 903, wherein the second gas outlet 902 and the third gas outlet 903 are symmetrically arranged with the first gas outlet 901 as the center, the first gas outlet 901 is perpendicular to the inner wall of the reaction chamber 1, the second gas outlet 902 is inclined upward, and the angle between it and the inner wall of the reaction chamber 1 is 30°, the third gas outlet 903 is inclined downward, and the angle between it and the inner wall of the reaction chamber 1 is 30°, and the rest of the structure is exactly the same as that of Example 1.

[0110] In this embodiment, a plurality of gas supply components 9 are arranged along the circumference and axial directions of the reaction chamber 1 to provide multi-directional airflows entering radially, entering obliquely upward, and entering obliquely upward and downward in the reaction chamber 1, so as to achieve a better gas distribution inside and fully disturb the dense phase area 102 in the flow field. The gas velocity and pressure of the gas supply can be adjusted according to the reaction requirements to ensure the uniformity inside the reaction chamber 1.

[0111] Application Example 1

[0112] This application example uses the gas disturbance type viscous ultrafine particle fluidized reaction device system provided in Example 1 to carry out the gas-solid reaction of Class C particles, which specifically includes the following steps:

[0113] (1) Class C particles are fed into the reaction chamber 1 by the feeding device 2 and distributed in the bottom area of ​​the reaction chamber 1. The air supply fan 4 is started to allow the primary gas to enter the dense phase area 102 from the gas distribution plate at the bottom, and the flow rate is gradually increased to promote the fluidization of the solid raw material. The gas velocity of the primary gas flow is 25 m / s and the pressure is 0.3 MPa;

[0114] (2) After the solid raw material is initially fluidized, the air supply blower 7 is started to inject a secondary airflow into the dense phase region 102 to form a multi-directional gas disturbance field, so as to enhance the fluidization effect and generate a gaseous mixture, and ensure that the gas velocity of the secondary airflow is lower than the gas velocity of the primary airflow, and the pressure of the secondary airflow is lower than the pressure of the primary airflow;

[0115] (3) The gaseous mixture produced by the reaction enters the gaseous zone 101 and is discharged from the top of the reaction chamber 1 to the cyclone separation device 6. The fine particles carried up by the airflow are collected by the cyclone separation device 6, and the particles are effectively intercepted and separated in the finished product bin. The separated gas is discharged to the exhaust gas treatment system for post-treatment.

[0116] Application Example 2

[0117] This application example uses the gas disturbance type viscous ultrafine particle fluidized reaction device system provided in Example 2 to carry out the gas-solid reaction of Class C particles. The difference from Application Example 1 is that the gas velocity of the primary air flow is 10m / s and the pressure is 0.15MPa. The remaining steps are the same as Application Example 1.

[0118] Application Example 3

[0119] This application example uses the gas-turbulent viscous ultrafine particle fluidized reaction device system provided in Example 3 to carry out a gas-solid reaction of a mixture of Class A particles and Class C particles. The difference from Application Example 1 is that the gas velocity of the primary airflow is 40 m / s and the pressure is 0.45 MPa, and the remaining steps are the same as those in Application Example 1.

[0120] Application Example 4

[0121] This application example uses the gas disturbance type viscous ultrafine particle fluidized reaction device system provided in Example 4 to carry out the gas-solid reaction of Class C particles. The difference from Application Example 1 is that the gas velocity of the primary air flow is 5m / s and the pressure is 0.2MPa. The remaining steps are the same as Application Example 1.

[0122] Application Example 5

[0123] This application example uses the gas-turbulent viscous ultrafine particle fluidized reaction device system provided in Example 5 to carry out a gas-solid reaction of a mixture of Class B particles and Class C particles. The difference from Application Example 1 is that the gas velocity of the primary airflow is 30 m / s and the pressure is 0.25 MPa, and the remaining steps are the same as Application Example 1.

[0124] Application Example 6

[0125] This application example uses the gas-turbulent viscous ultrafine particle fluidized reaction device system provided in Example 6 to carry out the gas-solid reaction of Class C particles. The difference from Application Example 1 is that the gas velocity of the primary airflow is 45m / s and the pressure is 0.4MPa. The remaining steps are the same as Application Example 1.

[0126] Application Example 7

[0127] This application example uses the gas-turbation viscous ultrafine particle fluidized reaction device system provided in Example 7 to carry out the gas-solid reaction of Class C particles. The difference from Application Example 1 is that the gas velocity of the primary airflow is 50m / s and the pressure is 0.5MPa. The remaining steps are the same as Application Example 1.

[0128] Application Example 8

[0129] This application example uses the gas-turbation viscous ultrafine particle fluidized reaction device system provided in Example 8 to carry out the gas-solid reaction of Class C particles. The difference from Application Example 1 is that the gas velocity of the primary airflow is 20m / s and the pressure is 0.3MPa. The remaining steps are the same as Application Example 1.

[0130] Comparative Example 1

[0131] This comparative example provides a fluidized bed reactor system, which differs from Example 1 in that a multi-directional air supply unit is not provided, and the rest of the structure is the same as that of Example 1.

[0132] Comparative Example 2

[0133] This comparative example provides a fluidized bed reactor system, which differs from Example 1 in that a stirring device is provided in the reaction chamber 1, but a multi-directional air supply unit is not provided, and the rest of the structure is the same as that of Example 1.

[0134] Comparative Example 3

[0135] This comparative example provides a fluidized bed reaction device system, which differs from Example 1 in that a circulating airflow device is added, and the top and bottom of the reaction chamber 1 are respectively connected, so that part of the gas flows back to the dense phase zone 102 after passing through the reaction chamber 1 to achieve circulating disturbance. A multi-directional air supply unit is not set, and the rest of the structure is the same as Example 1.

[0136] Comparative application example 1

[0137] This comparative application example adopts the fluidized reaction device system provided in comparative example 1 to carry out the gas-solid reaction of Class C particles. The specific process includes: using the feeding device 2 to deliver the Class C particles into the reaction chamber 1, and distribute them in the bottom area of ​​the reaction chamber 1, starting the air supply fan 4, so that the primary gas enters the dense phase zone 102 from the gas distribution plate at the bottom, and gradually increases the flow rate to cause the solid raw material to begin to fluidize. The gas velocity of the primary airflow is 25m / s and the pressure is 0.3MPa; the gaseous mixture produced by the reaction enters the gaseous zone 101, and is discharged from the top of the reaction chamber 1 to the cyclone separation device 6, and the fine particles entrained by the airflow are collected by the cyclone separation device 6, the particles are effectively intercepted, and separated in the finished product bin, and the separated gas is discharged to the exhaust gas treatment system for post-treatment.

[0138] Compared with Application Example 1, Comparative Application Example 1 adopts unidirectional gas inflow, which cannot achieve uniform disturbance of Class C particles, resulting in low gas-solid contact efficiency and insufficient effective contact area between the gas phase and the solid phase, thereby reducing the reaction efficiency and product quality.

[0139] Comparative Application Example 2

[0140] This comparative application example adopts the fluidized reaction device system provided in comparative example 2 to carry out the gas-solid reaction of Class C particles. The specific process includes: using the feeding device 2 to deliver the Class C particles into the reaction chamber 1, and distribute them in the bottom area of ​​the reaction chamber 1, starting the air supply fan 4, so that the primary gas enters the dense phase area 102 from the gas distribution plate at the bottom, and gradually increases the flow rate to promote the fluidization of the solid raw material. The gas velocity of the primary airflow is 25m / s and the pressure is 0.3MPa; at the same time, the stirring device is turned on to stir the material in the reaction chamber 1, and the gaseous mixture produced by the reaction enters the gaseous area 101 and is discharged from the top of the reaction chamber 1 to the cyclone separation device 6. The fine particles entrained by the airflow are collected through the cyclone separation device 6, and the particles are effectively intercepted and separated in the finished product bin. The separated gas is discharged to the exhaust gas treatment system for post-treatment.

[0141] Compared with Application Example 1, the adhesion problem between particles in Comparative Application Example 2 during the reaction process is more obvious, resulting in uneven fluidization and even fluid loss, causing uneven reaction and affecting product quality.

[0142] Comparative Application Example 3

[0143] This comparative application example adopts the fluidized reaction device system provided in comparative example 3 to carry out the gas-solid reaction of Class C particles. The specific process includes: using the feeding device 2 to deliver the Class C particles into the reaction chamber 1, and distribute them in the bottom area of ​​the reaction chamber 1, starting the air supply fan 4, so that the primary gas enters the dense phase zone 102 from the gas distribution plate at the bottom, and gradually increases the flow rate to promote the fluidization of the solid raw material. The gas velocity of the primary airflow is 25m / s and the pressure is 0.3MPa; at the same time, part of the gas flows back to the dense phase zone 102 after passing through the reaction chamber 1 to achieve circulation disturbance, and the gaseous mixture produced by the reaction enters the gaseous zone 101 and is discharged from the top of the reaction chamber 1 to the cyclone separation device 6. The fine particles entrained by the airflow are collected through the cyclone separation device 6, and the particles are effectively intercepted and separated in the finished product bin. The separated gas is discharged to the exhaust gas treatment system for post-treatment.

[0144] Compared with Application Example 1, in Comparative Application Example 3, Class C particles agglomerate and channel flow phenomena occur, and the airflow is uneven, which easily leads to gas embolism. The contact uniformity between the gas and Class C particles is poor, causing too many fine particles to be entrained by the gas to the cyclone separation device 6.

[0145] The present invention designs a multi-directional air supply unit so that the gas can enter the reaction chamber 1 from multiple directions and form a uniform fluidization effect inside the reaction chamber 1, thereby achieving efficient fluidization of solid materials in the fluidized reaction chamber 1, thereby avoiding particle agglomeration and channeling, ensuring sufficient gas-solid contact, and improving reaction efficiency. At the same time, the tongue-shaped distribution plate 3 at the bottom of the present invention is designed with a specific flow channel so that the gas enters along a tortuous path and is evenly distributed in the entire reaction area, reducing the short-circuiting phenomenon of the airflow, and can also avoid too many fine particles being quickly entrained out of the reaction chamber 1. At the same time, the present invention sets a cyclone separation at the top bypass, which can recover fine particles entrained by the airflow during the startup phase or use, reduce the loss caused by particle entrainment, and improve the product yield. The design of the present invention effectively improves the fluidization effect of Class C particles. Through the reasonable configuration and structural layout of the multi-directional air supply system, uniform flow of particles and efficient gas-solid contact in the fluidized bed are achieved, overcoming the problems of particle agglomeration and channeling in traditional fluidized beds, greatly improving the performance and application range of the reactor, having higher operational flexibility, being able to adjust the airflow direction and flow rate in real time according to the reaction conditions, and having stronger adaptability.

[0146] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A gas disturbance type viscous ultrafine particle fluidized reaction device system, characterized in that: The gas disturbance type viscous ultrafine particle fluidized reaction device system comprises a fluidized reaction unit, a gas supply unit, a multi-directional gas supply unit and a gas-solid separation unit; The fluidized reaction unit includes a reaction chamber, in which a gaseous zone and a dense phase zone are arranged in sequence along the axial direction; the gas supply unit is connected to the bottom of the reaction chamber, and is used to provide a primary airflow to the dense phase zone; the multi-directional air supply unit includes an air supply module and a plurality of air supply components, the air supply modules are respectively connected to a plurality of the air supply components, and the plurality of the air supply components are independently connected to the reaction chamber and connected to the dense phase zone, and are used to provide a secondary airflow; the gas-solid separation unit is connected to the gaseous zone.

2. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 1 is characterized in that: Based on the central axis of the reaction chamber, the gas supplement component is arranged in any one direction, radial direction, upward tilted direction or downward tilted direction, or a combination of at least two of them, and the arrangement directions of several gas supplement components are the same or different.

3. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 2 is characterized in that: A plurality of the gas supply components are arranged at equal intervals along the axial direction and / or circumferential direction of the reaction chamber; Preferably, the gas supply component is sealingly connected to the peripheral wall of the dense phase zone of the reaction chamber; Preferably, the distance between the gas outlet of the gas supply component and the inner cavity wall of the reaction cavity is 2% to 20% of the diameter of the reaction cavity; Preferably, when the air supply component is arranged tangentially, the inclination angle of the air supply component is 15° to 45°; Preferably, when the air supply component is arranged to be tilted upward, the tilt angle of the air supply component is 15° to 60°; Preferably, when the air supply component is arranged to be tilted downward, the tilt angle of the air supply component is 15° to 60°.

4. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 1, characterized in that: The air supply module comprises an air supply fan and a first air storage device connected in sequence, and the outlet end of the first air storage device is respectively connected to a plurality of the air supply components; Preferably, the first gas storage device is connected to the gas supply component via a gas supply pipeline, and the gas supply pipeline is provided with a first flow detection component, a first pressure detection component and a first regulating valve.

5. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 1, characterized in that: A gas distribution plate is provided at the bottom of the inner cavity of the reaction chamber, and the primary gas flow passes through the gas distribution plate and enters the dense phase zone; Preferably, the gas distribution plate is a tongue-shaped distribution plate; Preferably, the reaction chamber is a cylindrical structure; Preferably, the volume of the dense phase zone is 40% to 70% of the total volume of the reaction chamber; Preferably, the fluidized reaction unit further comprises a feeding device, and the feeding device is connected to the reaction chamber; Preferably, a discharge port is also provided at the bottom of the reaction chamber.

6. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 1, characterized in that: The air supply unit comprises an air supply fan and a second air storage device connected in sequence, and the outlet end of the second air storage device is connected to the bottom of the reaction chamber; Preferably, the second gas storage device is connected to the reaction chamber via a gas supply pipeline, and the gas supply pipeline is provided with a second flow detection component, a second pressure detection component and a second regulating valve.

7. The gas disturbance type viscous ultrafine particle fluidized reaction device system according to claim 1, characterized in that: The gas-solid separation unit comprises a cyclone separation device, the cyclone separation device is connected to the gaseous zone, and the top and bottom of the cyclone separation device are respectively provided with an exhaust port and a discharge port.

8. A gas disturbance fluidized reaction method, characterized in that: The gas disturbance fluidized reaction method adopts the gas disturbance viscous ultrafine particle fluidized reaction device system according to any one of claims 1 to 7, and the gas disturbance fluidized reaction method comprises: (1) Filling the solid raw material into the dense phase region and introducing a primary air flow to perform a gas-solid reaction, so that the solid raw material is in a fluidized state; (2) A secondary airflow is then introduced into the dense phase region to form a multi-directional gas disturbance field to enhance the fluidization effect and generate a gaseous mixture; (3) Separate the gaseous mixture produced by the fluidized bed reaction into gas and solid.

9. The gas disturbance fluidized reaction method according to claim 8, characterized in that: The gas disturbance fluidized reaction method further includes: adjusting the charging angle, pressure and gas velocity of the secondary gas flow to strengthen the fluidized state of the solid raw material in the dense phase region.

10. The gas disturbance fluidized reaction method according to claim 8 or 9, characterized in that: The charging direction of the secondary airflow in the multi-directional gas disturbance field includes any one of tangential, radial, oblique upward or oblique downward, or a combination of at least two of them; Preferably, the air velocity of the secondary air flow is less than the air velocity of the primary air flow; Preferably, the pressure of the secondary airflow is less than the pressure of the primary airflow; Preferably, the velocity of the primary airflow is 0.003 to 50 m / s; Preferably, the pressure of the primary airflow is 0.1-0.5 MPa.

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