Phototransistor and display panel

By designing a photosensitive transistor including an active layer, a gate insulating layer and a first transparent electrode layer, using light to irradiate light to form a photosensitive current in the channel region, and excite electron-hole pairs under the gate bias voltage, the existing photosensitive TFT problem is solved, and efficient light intensity recognition and TFT-LCD photosensitive function are achieved.

CN119947192APending Publication Date: 2025-05-06BOE TECHNOLOGY GROUP CO LTD +1
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Patent Information

Application Number
CN202311433955.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-10-31
Publication Date
2025-05-06

AI Technical Summary

Technical Problem

The photocurrent generated by the existing photosensitive TFT photosensitive recognition is small, and the accuracy of identifying light intensity is poor, making it difficult to realize the photosensitive function of the TFT-LCD.

Method used

A photosensitive transistor is designed, including an active layer, a gate insulating layer and a first transparent electrode layer, and a photosensitive current is formed in the channel region by irradiating the light to be measured, and an electron-hole pair is excited under the gate bias voltage, reducing the potential well or barrier, and increasing the photosensitive current.

Benefits of technology

The photosensitive efficiency of the photosensitive transistor is improved, and the photosensitive TFT is accurate enough to recognize light intensity, realizing the photosensitive function of the TFT-LCD.

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Abstract

The invention discloses a photosensitive transistor and a display panel. The photo-transistor includes an active layer, a gate insulating layer, and a first transparent electrode layer. The active layer is arranged on the substrate, and a channel region is formed in the active layer. The gate insulating layer is arranged on the active layer and covers the channel region. The first transparent electrode layer is at least partially arranged on the gate insulating layer to form a gate of the photo-transistor, and the orthographic projection part of the channel region on the substrate falls into the orthographic projection of the gate on the substrate. Light to be detected irradiates the channel region through the first transparent electrode layer to form light sensing current. A channel region part located outside the orthographic projection of the grid electrode on the substrate can generate a potential well or a potential barrier under the bias voltage of the grid electrode, electron-hole pairs are excited after illumination so as to reduce the potential well or the potential barrier, and the light-sensitive current is further improved. The photosensitive transistor is manufactured by adopting a process compatible with the TFT-LCD, so that the photosensitive function of the TFT-LCD can be realized while the process efficiency is improved.
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