Gas spray header, vapor deposition equipment and use method of vapor deposition equipment

Abstract

The invention discloses a gas spray head, vapor deposition equipment and a use method of the gas spray head. The gas spray head comprises a gas distribution plate with an upper surface and a lower surface; the multiple first gas conveying channels are arranged in the gas distribution plate at intervals and are parallel to the lower surface. A plurality of second gas delivery holes extend from the upper surface to the lower surface between adjacent channels of the plurality of first gas delivery channels to deliver a second gas through the gas distribution plate. And a plurality of first gas delivery holes, the plurality of first gas delivery holes extend from the plurality of first gas delivery channels to the lower surface, each first gas delivery channel is provided with a gas inlet and a gas outlet, the gas inlet is connected to a first gas source, and the gas outlet is connected to a sucking pump. According to the invention, uniformly distributed gas-phase precursors can be alternately introduced into the reaction cavity under the condition of rapidly removing slowly flowing residual gas-phase precursors.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and particularly relates to a gas showerhead, a chemical vapor deposition equipment and a using method thereof. Background Art

[0002] Under vacuum conditions, growing a thin film on the surface of a substrate by chemical vapor deposition technology is an important way to obtain thin film materials with excellent mechanical properties and special physical / chemical properties, and is a research hotspot in the fields of material science, physical science, etc.

[0003] ALD (Atomic Layer Deposition) technology is one of the most widely used thin film growth technologies at present. In essence, it also belongs to a kind of chemical vapor deposition (CVD). It mainly alternately introduces gaseous precursors into a reactor in pulses and adsorbs them on a deposition substrate, and uses chemical reactions between atoms to form a deposition film. Compared with thin film preparation methods such as physical vapor deposition (PVD) and chemical vapor deposition, ALD has significant advantages in the conformality and uniformity of growing thin films due to its unique reaction mechanism.

[0004] During atomic layer deposition processing, different types of gaseous precursors (referred to as type A gas and type B gas for short) are required to be alternately introduced into a processing chamber containing a substrate through a gas showerhead in a chemical vapor deposition equipment; and a uniform reaction gas needs to be provided to the substrate. That is, different types of gaseous precursors in the gas showerhead should not only not be mixed, but also be isolated from each other and there should be no gas leakage.

[0005] Generally, in some special processes, after the type B gas completes transportation and before switching to the type A gas, it must be quickly emptied and an inert gas is injected to achieve airway pressure balance. Otherwise, there is a risk of gas backflow and gas leakage during the switching moment, resulting in chemical deposition reactions in the pipeline. However, in the prior art, due to the complex structure of the gas channels in the gas showerhead, the residual gaseous precursors flow slowly in the gas showerhead, and it is difficult to quickly remove the residual gaseous precursors, resulting in the problem of forming deposits on the surface of the gas showerhead or in the spray holes. Summary of the Invention

[0006] The purpose of the present invention is to provide a gas showerhead, a chemical vapor deposition equipment and a using method thereof, so as to achieve the purpose of alternately introducing uniformly distributed gaseous precursors into a reaction chamber while quickly removing the residual gaseous precursors with slow flow.

[0007] In order to achieve the above purpose, the present invention is realized through the following technical solutions:

[0008] A gas spray head, comprising: a gas distribution plate having an upper surface and a lower surface; a plurality of first gas delivery channels spaced apart and disposed within the gas distribution plate and parallel to the lower surface. A plurality of second gas delivery holes extending from the upper surface to the lower surface between adjacent ones of the plurality of first gas delivery channels for delivering a second gas through the gas distribution plate, and a plurality of first gas delivery holes extending from the plurality of first gas delivery channels to the lower surface, the first gas delivery channels having an inlet and an outlet, the inlet being connected to a first gas source and the outlet being connected to a suction pump.

[0009] Optionally, each of the first gas delivery channels is a linear gas channel; the plurality of linear gas channels span across the gas distribution plate and are spaced apart.

[0010] Optionally, the first gas delivery channels are spiral gas channels extending along the gas distribution plate.

[0011] Optionally, each of the first gas delivery channels is an annular gas channel, and the plurality of annular gas channels are concentrically arranged.

[0012] Optionally, further comprising: a flange disposed on the gas distribution plate and extending upwardly away from the upper surface of the gas distribution plate; the flange having an annular shape. An intake top cover disposed on the flange and defining a receiving space with the flange. The receiving space is for buffering the second gas and is in communication with the second gas delivery holes.

[0013] Optionally, further comprising: a central intake port disposed at the center of the intake top cover for connection to a second gas source.

[0014] Optionally, further comprising: a peripheral intake port disposed at the edge of the intake top cover for connection to the second gas source.

[0015] Optionally, the gas distribution plate further comprises: a gas partition plate, a groove recessed towards the lower surface is provided within the gas distribution plate, and the gas partition plate is disposed on the plurality of grooves to form the plurality of first gas delivery channels.

[0016] Optionally, further comprising: a first gas flow equalizing plate disposed within the receiving space and parallel to the gas partition plate for adjusting the gas flow distribution of the second gas within the receiving space.

[0017] Optionally, a first gas buffer chamber and a second gas buffer chamber are respectively formed in the flange. The first gas buffer chamber is communicated with the air inlet of each first gas delivery channel and the first gas source. The second gas buffer chamber is communicated with the air outlet of each first gas delivery channel and the air extraction pump.

[0018] Optionally, it further includes: a second air distribution plate and a third air distribution plate. The second air distribution plate is disposed in the first gas buffer chamber for adjusting the air flow distribution of the first gas in the first gas buffer chamber. The third air distribution plate is disposed in the second gas buffer chamber for adjusting the air flow distribution of the first gas in the second gas buffer chamber.

[0019] Optionally, single-row spaced-apart first gas delivery holes are provided on the same first gas delivery channel, and each first gas delivery hole is a vertical straight hole; single-row spaced-apart second gas delivery holes are provided on the groove wall of the same groove, and each second gas delivery hole is a vertical straight hole.

[0020] Optionally, single-row spaced-apart second gas delivery holes are provided on the groove wall of the same groove, and each second gas delivery hole is a vertical straight hole. Two rows of first gas delivery holes are provided on the same first gas delivery channel, and the two rows of first gas delivery holes extend toward both sides of the first gas delivery channel respectively. The air outlet of each first gas delivery hole is located between two adjacent second gas delivery holes on the groove wall of the same groove.

[0021] Optionally, the included angle between the air outlet direction of each first gas delivery hole and the vertical direction is 10° to 30°.

[0022] Optionally, it further includes: a plurality of second gas delivery channels, which are respectively formed on the groove walls of the grooves and extend along the extending direction of the groove walls. An interval area is provided between two adjacent first gas delivery channels and second gas delivery channels. Two rows of second gas delivery holes are provided on the same second gas delivery channel. The outlets of the two rows of second gas delivery holes are respectively disposed on the lower surfaces on both sides of the second gas delivery channel. Two rows of first gas delivery holes are provided on the same first gas delivery channel. The outlets of the two rows of first gas delivery holes are respectively disposed on the lower surfaces of the interval areas on both sides of the first gas delivery channel. The outlet of each second gas delivery hole is located between the outlets of two adjacent first gas delivery holes in the same row.

[0023] Optionally, each of the second gas delivery holes includes an upper through-hole portion and two lower through-hole portions, and the diameter of the upper through-hole portion is greater than that of each of the lower through-hole portions. There is a spacer region between the adjacent upper through-hole portion and the first gas delivery channel. The outlets of the two lower through-hole portions are respectively arranged on the lower surfaces of the spacer regions on both sides of the upper through-hole portion. There are two rows of the first gas delivery holes on the same first gas delivery channel; the outlets of the two rows of the first gas delivery holes are respectively arranged on the lower surfaces on both sides of the first gas delivery channel. The outlet of each lower through-hole portion is located between the outlets of two adjacent first gas delivery holes in the same row.

[0024] Optionally, the included angle between the gas outlet direction of each second gas delivery hole and the vertical direction is 10° to 30°.

[0025] Optionally, the included angle between the gas outlet direction of each lower through-hole portion and the vertical direction is 10° to 30°.

[0026] Optionally, the aperture of each second gas delivery hole is 0.5 to 1 mm; the aperture of each first gas delivery hole is 0.2 to 0.6 mm.

[0027] In another aspect, the present invention further provides a chemical vapor deposition apparatus, including: a reaction chamber; a susceptor disposed at the inner bottom of the reaction chamber for supporting a substrate; a gas shower head as described above, the gas shower head is disposed at the top of the reaction chamber and is disposed opposite to the susceptor for providing reaction gas to the surface of the substrate. An air extraction ring is disposed on the reaction chamber and is located below the gas shower head; for evacuating the inside of the reaction chamber.

[0028] In other aspects, the present invention further provides a method for using a chemical vapor deposition apparatus, including: Step a, introducing a second gas into the second gas delivery holes. Step b, stopping the introduction of the second gas, and introducing a purge gas into the second gas delivery holes to remove the second gas in the second gas delivery holes and the reaction chamber. Step c, introducing a first gas into the first gas delivery channel; the air extraction pump is in a closed state. Step d, stopping the introduction of the first gas, introducing a purge gas into the first gas delivery channel, and the air extraction pump is in an open state. Repeat steps a to d.

[0029] The present invention has at least one of the following technical effects:

[0030] The gas showerhead provided by the present invention has the first gas delivery channels spaced within the gas distribution plate. A plurality of the second gas delivery holes are provided between adjacent channels of the plurality of the first gas delivery channels and extend from the upper surface to the lower surface to deliver the second gas through the gas distribution plate. The above is equivalent to that there are two layers of staggered gas delivery channels in the gas showerhead provided by the present invention. Among them, one layer of the first gas delivery channels is connected to a low-pressure source (a suction pump), and can perform rapid air extraction to achieve rapid removal and switching of the first gas. This layer of the first gas delivery channels can be used to introduce reaction gases with rapid removal and switching requirements into the reaction chamber, solving the problem of deposition of such reaction gases in the first gas delivery channels. The other layer of the second gas delivery channels (which can be regarded as the second gas delivery holes) is not connected to the low-pressure source and directly supplies the second gas to the base or the reaction chamber. It does not have an air outlet end, only an air inlet end connected to the second gas source and the second gas delivery holes. This layer of the second gas delivery channels can be used to introduce reaction gases that do not require rapid removal and switching into the reaction chamber.

[0031] When it is necessary to remove the second gas in the second gas delivery channels, the second gas is extracted through the suction ring provided on the reaction chamber to achieve the removal of the second gas in the second gas delivery channels.

[0032] Since a plurality of gas delivery channels in the prior art are arranged in the same layer, and seals are provided between adjacent gas delivery channels to achieve sealed isolation between the plurality of gas delivery channels. This setting has extremely high requirements for the setting of the seals or their own performance, and even if the gas delivery channels are sealed well, there may still be leaks, resulting in the problem of gas leakage. However, in the present invention, the gas delivery channels are arranged in layers according to the type or characteristics of the reaction gases introduced, thereby reducing the difficulty of the sealing process, lowering the requirements for the performance of the seals themselves, and greatly reducing the problems of leakage and gas leakage.

[0033] The present invention realizes the provision of a variety of reaction gases with uniform distribution in the reaction chamber by arranging the first gas delivery holes and the second gas delivery holes obliquely and at intervals and staggered with each other. Description of the Drawings

[0034] Figure 1 It is a schematic cross-sectional structure diagram of a gas showerhead provided by an embodiment of the present invention;

[0035] Figure 2 It is a schematic top view structure diagram of a gas showerhead provided by an embodiment of the present invention;

[0036] Figure 3 It is a schematic cross-sectional structure diagram of a gas showerhead provided by another embodiment of the present invention;

[0037] Figure 4 Cross-section of the gas shower head provided by another embodiment of the present invention;

[0038] Figure 5 Schematic structural diagram of a chemical vapor deposition apparatus provided by an embodiment of the present invention. Detailed implementation manners

[0039] The following further describes in detail a gas shower head, a chemical vapor deposition apparatus, and a method for using the same proposed by the present invention in conjunction with the accompanying drawings and specific implementation manners. According to the following description, the advantages and features of the present invention will be clearer. It should be noted that the accompanying drawings are in a very simplified form and are all drawn with non-precise scales, only for the purpose of facilitating and clearly assisting in explaining the implementation manners of the present invention. In order to make the objectives, features, and advantages of the present invention more obvious and understandable, please refer to the accompanying drawings. It should be noted that the structures, scales, sizes, etc. shown in the drawings of this specification are only used to cooperate with the content disclosed in the specification for those skilled in the art to understand and read, and are not used to limit the limiting conditions for the implementation of the present invention. Therefore, they do not have a substantial technical meaning. Any modification of the structure, change of the proportional relationship, or adjustment of the size, without affecting the effects that the present invention can produce and the objectives that can be achieved, should still fall within the scope covered by the technical content disclosed in the present invention.

[0040] As Figure 1 shown, this embodiment provides a gas shower head, including: a gas distribution plate 101, the gas distribution plate 101 having an upper surface 1010 and a lower surface 1011; a plurality of first gas delivery channels 103, the plurality of first gas delivery channels 103 being spaced apart and disposed within the gas distribution plate 101 and parallel to the lower surface. A plurality of second gas delivery holes 201, the plurality of second gas delivery holes 201 extending from the upper surface 101 to the lower surface 1011 between adjacent channels of the plurality of first gas delivery channels 103 to deliver a second gas through the gas distribution plate 101. And a plurality of first gas delivery holes 104, the plurality of first gas delivery holes 104 extending from the plurality of first gas delivery channels 103 to the lower surface, the first gas delivery channels 103 having an inlet (which can be referred to the reference numeral 142 shown in Figure 2 ) and an outlet (which can be referred to the reference numeral 143 shown in Figure 2 ), the inlet being connected to a first gas source (not shown in Figure 1 ), and the outlet being connected to a suction pump (not shown in Figure 1 ).

[0041] Since multiple gas delivery channels in the prior art are arranged on the same layer, a seal is achieved between the multiple gas delivery channels by providing a seal between adjacent gas delivery channels. This arrangement has extremely high requirements for the setting of the seal or its own performance. Moreover, even if the gas delivery channels are sealed perfectly, there may still be leaks, resulting in the problem of gas leakage. In this embodiment, the gas delivery channels are arranged in layers according to the type or characteristics of the reaction gas introduced. That is, the structure of the gas shower head provided in this embodiment is substantially equivalent to having two layers of staggered gas delivery channels therein. This reduces the difficulty of the sealing process, lowers the requirements for the performance of the seal itself, and greatly reduces the problems of leakage and gas leakage.

[0042] Specifically, for one layer of the two layers of staggered gas delivery channels, the first gas delivery channel is connected to a low-pressure source (a suction pump), and rapid evacuation can be carried out to achieve rapid removal and switching of the first type of gas. This type of gas requires a short residence time and is extremely likely to be adsorbed by the pipeline and needs to be quickly emptied. This layer of the first gas delivery channel can be used to introduce reaction gases with rapid removal and switching requirements into the reaction chamber, solving the problem of deposition of such reaction gases in the first gas delivery channel. The other layer of the second gas delivery channel (which can be considered as the second gas delivery hole) is not connected to the low-pressure source and directly supplies the second gas (gas that is not easily adsorbed by the pipeline) to the base or the reaction chamber. It does not have an air outlet end, only an air inlet end connected to the second gas source and the second gas delivery hole. This layer of the second gas delivery channel can be used to introduce reaction gases that do not require rapid removal and switching into the reaction chamber.

[0043] This embodiment can rapidly remove residual gas-phase precursors with slow flow and alternately introduce uniformly distributed gas-phase precursors into the reaction chamber.

[0044] As Figure 2 shown, each of the first gas delivery channels 103 is a linear gas channel; a plurality of the linear gas channels are arranged at intervals across the gas distribution plate 101.

[0045] In some other embodiments, the first gas delivery channel 103 is a spiral gas channel extending along the gas distribution plate 101. In some other embodiments, each of the first gas delivery channels 103 is an annular gas channel, and a plurality of the annular gas channels are concentrically arranged and adjacent annular gas channels are connected by a cross-bridge. It can be understood that in addition to the above shapes, the first gas delivery channel 103 can also be arranged in a circuitous and spaced manner within the gas distribution plate, as long as it can meet the requirements for rapid gas removal and switching of the first gas delivery channel. The present invention is not limited thereto.

[0046] Please continue to refer to Figure 1As shown, this embodiment further includes: a flange 102, which is disposed on the gas distribution plate 101 and extends upward from the upper surface 1010 of the gas distribution plate 101 away from the gas distribution plate 101; the flange 102 has an annular shape. An intake top cover 200, which is disposed on the flange 102 and defines a receiving space 220 with the flange 102. The receiving space 220 is used for buffering the second gas and is in communication with the second gas delivery hole 201. In this embodiment, the receiving space 220 and the second gas delivery hole 201 constitute the second gas delivery channel described above for introducing the second gas into the reaction chamber. It can be seen that the receiving space 220 is located above the first gas delivery channel 103, and the two are substantially arranged in layers.

[0047] Please continue to refer to Figure 1 As shown, this embodiment further includes: a central intake port 212, which is disposed at the center of the intake top cover 200 and is used for connecting to a second gas source.

[0048] Please continue to refer to Figure 1 As shown, in this embodiment or some other embodiments, it further includes: an edge intake port 213, which is disposed at the edge of the intake top cover 200 and is used for connecting to the second gas source.

[0049] The edge intake port 213 can be a plurality of small intake holes with diameters smaller than the central intake hole 212. The plurality of small intake holes are arranged at intervals along the circumference of the intake top cover 200 at its edge. Thus, when introducing the second gas into the receiving space 220, the second gas can be directly introduced into the edge of the receiving space 220 through the edge intake port 213, and the second gas can also be introduced into the central region of the receiving space 220 through the central intake hole 212, thereby improving the uniformity of the concentration distribution of the second gas at the edge and the central region of the receiving space 220.

[0050] Combined with Figure 1 and Figure 2 As shown, in this embodiment, the gas distribution plate 102 further includes a gas separation plate 110. The gas distribution plate 102 is provided with grooves recessed towards the lower surface direction; the gas separation plate 110 is disposed on a plurality of the grooves to form a plurality of the first gas delivery channels 103. A sealing device is provided between the gas separation plate 110 and the grooves to prevent gas from leaking between the gas channels.

[0051] Please continue to refer to Figure 1As shown, this embodiment further includes: a first gas distribution plate 210, on which a plurality of through holes are provided. The first gas distribution plate 210 is disposed in the accommodation space 220 and is parallel to the gas separation plate 110, and is used to adjust the gas flow distribution of the second gas in the accommodation space 220. The arrangement of the first gas distribution plate 210 can improve the uniformity of the concentration distribution of the second gas in the accommodation space.

[0052] Please continue to refer to Figure 2 As shown, a first gas buffer chamber 120, a second gas buffer chamber 121, a first gas inlet 140, and a first gas outlet 141 are respectively formed in the flange 102;

[0053] The first gas buffer chamber 120 is communicated with the inlet 142 of each first gas delivery channel 103, and the first gas inlet 140 is respectively communicated with the first gas source and the first gas buffer chamber 120 to introduce the first gas into the first gas buffer chamber 120.

[0054] The second gas buffer chamber 121 is communicated with the outlet 143 of each first gas delivery channel 103, and the first gas outlet 141 is respectively communicated with the air extraction pump (which can be referred to the label 150 shown in Figure 5 ) and the second gas buffer chamber 121 to converge the first gas into the second gas buffer chamber 121 and extract it.

[0055] The first gas buffer chamber 120 and the second gas buffer chamber 121 can be used to buffer and converge the first gas, so that the first gas flows into each first gas delivery channel 103 more uniformly.

[0056] Please continue to refer to Figure 2 As shown, in this embodiment, it further includes: a second gas distribution plate 130 and a third gas distribution plate 131. The second gas distribution plate 130 is disposed in the first gas buffer chamber 120 and is used to adjust the gas flow distribution of the first gas in the first gas buffer chamber 120. The third gas distribution plate 131 is disposed in the second gas buffer chamber 121 and is used to adjust the gas flow distribution of the first gas in the second gas buffer chamber 121.

[0057] Please continue to refer to Figure 1 As shown, in this embodiment, single-row and spaced-apart first gas delivery holes 104 are provided in the same first gas delivery channel 103, and each first gas delivery hole 104 is a vertical straight hole; single-row and spaced-apart second gas delivery holes 201 are provided on the groove wall 105 of the same groove, and each second gas delivery hole 201 can be a vertical straight hole.

[0058] In some other embodiments, such as Figure 3 shown, on the groove wall 105 of the same groove, single-row and spaced-apart second gas delivery holes 201 are provided, and each second gas delivery hole 201 is a vertical straight hole. In the same first gas delivery channel 103, two rows of first gas delivery holes 104 are provided, and the two rows of first gas delivery holes 104 extend toward both sides of the first gas delivery channel 103 respectively.

[0059] Please continue to refer to Figure 2 and 3 shown, the outlet of each first gas delivery hole 104 is located between two adjacent second gas delivery holes 201 on the groove wall 105 of the same groove.

[0060] Specifically, the included angle β1 between the outlet direction of each first gas delivery hole 104 and the vertical direction is 10° to 30°. The range of the included angle α1 formed by the outlet directions between two first gas delivery holes 104 located at the same position can be 20° to 60°.

[0061] In some other embodiments, such as Figure 4 shown, it further includes: a plurality of second gas delivery channels (reference numeral 2010 can be referred to), which are respectively opened on the groove wall 105 of the groove and extend along the extending direction of the groove wall 105. There is a spacing area between two adjacent first gas delivery channels and the second gas delivery channel 103. In the same second gas delivery channel, two rows of second gas delivery holes (reference numeral 2011 can be referred to) are provided. The outlets of the two rows of second gas delivery holes are respectively arranged on the lower surfaces of the spacing areas on both sides of the second gas delivery channel. In the same first gas delivery channel 103, two rows of first gas delivery holes 104 are provided. The outlets of the two rows of first gas delivery holes 104 are respectively arranged on the lower surfaces of the spacing areas on both sides of the first gas delivery channel 103. The outlet of each second gas delivery hole is located between the outlets of two adjacent first gas delivery holes 104 in the same row. In this embodiment, the included angle β2 between the outlet direction of each second gas delivery hole and the vertical direction is 10° to 30°, and the range of the included angle α2 formed by the outlet directions between two second gas delivery holes 2011 located at the same position can be 20° to 60°.

[0062] In some other embodiments, please continue to refer to Figure 4As shown, each of the second gas delivery holes 201 includes an upper through-hole portion 2010 and two lower through-hole portions 2011, and the diameter of the upper through-hole portion 2010 is greater than that of each of the lower through-hole portions 2011. There is a spacer region between the adjacent upper through-hole portion 2010 and the first gas delivery channel 103. The outlets of the two lower through-hole portions 2011 are respectively disposed on the lower surface of the spacer region on both sides of the upper through-hole portion 2010. Two rows of the first gas delivery holes 104 are provided in the same first gas delivery channel 103; the outlets of the two rows of the first gas delivery holes 104 are respectively disposed on the lower surface of the spacer region on both sides of the first gas delivery channel 103. The outlet of each lower through-hole portion 2011 is located between the outlets of two adjacent first gas delivery holes 104 in the same row. In this embodiment, the included angle between the gas outlet direction of each lower through-hole portion 2011 and the vertical direction is 10° to 30°.

[0063] In this embodiment, by arranging the first gas delivery holes and the second gas delivery holes in an inclined and mutually spaced and staggered manner, a variety of reaction gases with uniform distribution are provided to the reaction chamber.

[0064] In this embodiment, please continue to refer to Figure 1 As shown, the aperture of each second gas delivery hole 201 is 0.5 to 1 mm; the aperture of each first gas delivery hole 104 is 0.2 to 0.6 mm.

[0065] The second gas may be a type A gas, which is a gas that can stay in the gas spray head for a relatively long time or has a relatively long purge time. For this type A gas, gas holes with a larger aperture can be used for ventilation to increase the flux of this type A gas. Since its flux is large, the second gas can enter the reaction chamber and then flow out of the reaction chamber through an exhaust channel (such as an air extraction ring) provided on the chamber. Thus, when clearing the second gas through the air extraction ring, the gas holes with a large flux can accelerate the introduction of the remaining second gas in the accommodation cavity into the reaction chamber and be evacuated through the air extraction ring, thereby accelerating the clearing efficiency of the second gas.

[0066] The first gas may be a type B gas, which is a reaction gas that is extremely likely to adsorb or deposit in the gas delivery channel and needs to be quickly cleared. The effects of introducing such a gas into the reaction chamber through gas holes with a smaller aperture are as follows: First, the gas distribution in the reaction chamber is uniform. Second, when it is necessary to quickly clear the first gas, during the process of clearing the first gas in the first gas delivery channel, the amount of the remaining first gas entering the reaction chamber through the small-aperture gas holes is relatively small, further accelerating the clearing rate of the second gas. In addition, through an air extraction pump, the type B gas in the gas delivery channel can be quickly evacuated.

[0067] On the other hand, as Figure 5 shown, the present invention further provides a chemical vapor deposition apparatus, comprising: a reaction chamber 300; a susceptor 310 disposed at the inner bottom of the reaction chamber 300 for supporting a substrate 400; a gas shower head as described above, the gas shower head being disposed at the top of the reaction chamber 300 and opposite to the susceptor 310 for supplying a reaction gas to the surface of the substrate 400. A pumping ring 230 is disposed on the reaction chamber 300 and below the gas shower head for evacuating the interior of the reaction chamber 300.

[0068] A vacuum pump 150 is disposed on the top of the flange 102 of the gas shower head and is in communication with the outlet of the first gas delivery channel for providing a low pressure at the outlet when it is necessary to quickly purge the first gas in the first gas delivery channel, thereby increasing the discharge rate of the first gas.

[0069] When it is necessary to remove the second gas in the second gas delivery channel, the second gas is evacuated through the pumping ring 230 provided on the reaction chamber to purge the second gas in the second gas delivery pipe (which can be understood as a receiving cavity).

[0070] Please continue to refer to Figure 5 shown, the chemical vapor deposition apparatus further includes a mounting base 320 which is annular and disposed above the pumping ring 230, and the flange 102 can be disposed on the mounting base 320 and is hermetically connected thereto.

[0071] In other aspects, the present embodiment further provides a method for using a chemical vapor deposition apparatus, comprising: Step a, introducing a second gas into the second gas delivery hole (or receiving space).

[0072] Step b, stopping the introduction of the second gas and introducing a purge gas into the second gas delivery hole (or receiving space) to purge the second gas in the second gas delivery hole (or receiving space and the second gas delivery hole) and the reaction chamber.

[0073] Step c, introducing a first gas into the first gas delivery channel; the vacuum pump is in a closed state.

[0074] Step d, stopping the introduction of the first gas and introducing a purge gas into the first gas delivery channel, and the vacuum pump is in an open state.

[0075] Repeat steps a to d.

[0076] It should be noted that in this text, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent in such process, method, article or device. Without further limitation, an element defined by the phrase "comprising a..." does not exclude the presence of additional identical elements in the process, method, article or device comprising said element.

[0077] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by terms such as "center", "height", "thickness", "upper", "lower", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention. In the description of the present invention, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0078] In the description of the present invention, unless otherwise clearly specified and limited, the terms "mounted", "connected", "connected to", "fixed" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and can be the communication inside two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0079] In the present invention, unless otherwise clearly specified and limited, the first feature being "above" or "below" the second feature may include direct contact between the first and second features, or may include the situation where the first and second features are not in direct contact but in contact through other features therebetween. Moreover, the first feature being "above", "over" and "on top of" the second feature includes the first feature being directly above and obliquely above the second feature, or merely indicating that the horizontal height of the first feature is higher than that of the second feature. The first feature being "below", "beneath" and "under" the second feature includes the first feature being directly below and obliquely below the second feature, or merely indicating that the horizontal height of the first feature is lower than that of the second feature.

[0080] Although the content of the present invention has been described in detail through the above preferred embodiments, it should be recognized that the above description should not be construed as a limitation of the present invention. After those skilled in the art have read the above content, various modifications and alternatives to the present invention will be obvious. Therefore, the protection scope of the present invention should be defined by the appended claims.

Claims

1. A gas spray head, comprising: a gas distribution plate having an upper surface and a lower surface; a plurality of first gas delivery channels spaced apart within the gas distribution plate and parallel to the lower surface; a plurality of second gas delivery holes extending from the upper surface to the lower surface between adjacent ones of the plurality of first gas delivery channels to deliver a second gas through the gas distribution plate; and a plurality of first gas delivery holes extending from the plurality of first gas delivery channels to the lower surface, the first gas delivery channels having an air inlet and an air outlet, the air inlet being connected to a first gas source and the air outlet being connected to a suction pump.

2. The gas spray head according to claim 1, wherein Each of the first gas delivery channels is a linear gas channel; a plurality of the linear gas channels span across the gas distribution plate and are spaced apart.

3. The gas spray head according to claim 1, wherein The first gas delivery channel is a spiral gas channel extending along the gas distribution plate.

4. The gas spray head according to claim 1, wherein Each of the first gas delivery channels is an annular gas channel, and a plurality of the annular gas channels are concentrically arranged.

5. The gas spray head according to claim 1, wherein Further included are: A flange, which is provided on the gas distribution plate and extends upward from the upper surface of the gas distribution plate away from the gas distribution plate; the flange has an annular shape; An intake top cover, which is provided on the flange and defines a receiving space with the flange, The receiving space is used for buffering the second gas and is communicated with the second gas delivery holes.

6. The gas spray head according to claim 5, wherein Further included are: A central intake port, which is provided at the center of the intake top cover and is used for connecting to a second gas source.

7. The gas spray head according to claim 6, wherein Further included is an edge intake port, which is provided at the edge of the intake top cover and is used for connecting to the second gas source.

8. The gas spray head according to claim 7, wherein The gas distribution plate further includes a gas partition plate. Grooves are provided in the gas distribution plate and recess downward toward the lower surface. The gas partition plate is provided on a plurality of the grooves to form a plurality of the first gas delivery channels.

9. The gas spray head according to claim 8, wherein Further included are: A first gas flow equalizing plate, which is provided in the receiving space and is arranged parallel to the gas partition plate, for adjusting the gas flow distribution of the second gas in the receiving space.

10. The gas spray head according to claim 5, wherein A first gas buffer cavity and a second gas buffer cavity are respectively formed in the flange. The first gas buffer cavity is respectively communicated with the intake port of each of the first gas delivery channels and the first gas source; The second gas buffer cavity is respectively communicated with the outlet port of each of the first gas delivery channels and the air extraction pump.

11. The gas spray head according to claim 10, wherein Further included are: A second gas flow equalizing plate and a third gas flow equalizing plate. The second gas flow equalizing plate is provided in the first gas buffer cavity for adjusting the gas flow distribution of the first gas in the first gas buffer cavity; The third gas flow equalizing plate is provided in the second gas buffer cavity for adjusting the gas flow distribution of the first gas in the second gas buffer cavity.

12. The gas spray head according to claim 8, wherein On the same first gas delivery channel, there are single-row spaced-apart first gas delivery holes, and each first gas delivery hole is a vertical straight hole; on the wall of the same groove, there are single-row spaced-apart second gas delivery holes, and each second gas delivery hole is a vertical straight hole.

13. The gas showerhead according to claim 8, wherein, On the wall of the same groove, there are single-row spaced-apart second gas delivery holes, and each second gas delivery hole is a vertical straight hole; On the same first gas delivery channel, there are two rows of first gas delivery holes. The two rows of first gas delivery holes respectively extend toward both sides of the first gas delivery channel, and the outlet port of each first gas delivery hole is located between two adjacent second gas delivery holes on the wall of the same groove.

14. The gas showerhead according to claim 13, wherein, The included angle between the outlet direction of each first gas delivery hole and the vertical direction is 10° to 30°.

15. The gas showerhead according to claim 8, wherein, Further included are: A plurality of second gas delivery channels, which are respectively formed in the groove walls of the grooves and extend along the extending direction of the groove walls; an interval area is provided between two adjacent ones of the first gas delivery channels and the second gas delivery channels; Two rows of second gas delivery holes are provided on the same second gas delivery channel; the outlets of the two rows of second gas delivery holes are respectively arranged on the lower surfaces on both sides of the second gas delivery channel; Two rows of first gas delivery holes are provided on the same first gas delivery channel; the outlets of the two rows of first gas delivery holes are respectively arranged on the lower surfaces of the interval areas on both sides of the first gas delivery channel; The outlet of each second gas delivery hole is located between the outlets of two adjacent first gas delivery holes in the same row.

16. The gas showerhead according to claim 8 or 15, wherein, Each second gas delivery hole includes an upper through-hole part and two lower through-hole parts, and the diameter of the upper through-hole part is larger than the diameter of each lower through-hole part; An interval area is provided between the adjacent upper through-hole part and the first gas delivery channel; The outlets of the two lower through-hole parts are respectively arranged on the lower surfaces of the interval areas on both sides of the upper through-hole part; Two rows of first gas delivery holes are provided on the same first gas delivery channel; the outlets of the two rows of first gas delivery holes are respectively arranged on the lower surfaces on both sides of the first gas delivery channel; The outlet of each lower through-hole part is located between the outlets of two adjacent first gas delivery holes in the same row.

17. The gas showerhead according to claim 15, wherein, The included angle between the gas outlet direction of each second gas delivery hole and the vertical direction is 10° to 30°; 18. The gas showerhead according to claim 16, wherein, The included angle between the gas outlet direction of each lower through-hole part and the vertical direction is 10° to 30°.

19. The gas showerhead according to claim 1, wherein, The aperture of each second gas delivery hole is 0.5 to 1 mm; the aperture of each first gas delivery hole is 0.2 to 0.6 mm.

20. A vapor deposition apparatus, wherein, Comprising: A reaction chamber; A base, which is arranged at the inner bottom of the reaction chamber and is used for supporting a substrate; The gas shower head according to any one of claims 1 to 19, wherein the gas shower head is arranged at the top of the reaction chamber and is oppositely arranged with the base, and is used for providing reaction gas to the surface of the substrate; An air extraction ring, which is arranged on the reaction chamber and is located below the gas shower head; and is used for extracting air inside the reaction chamber.

21. A method for using the vapor deposition apparatus according to claim 20, wherein, Comprising: Step a, introducing a second gas into the second gas delivery holes; Step b, stopping introducing the second gas, and introducing a purge gas into the second gas delivery holes to remove the second gas in the second gas delivery holes and the reaction chamber; Step c, introducing a first gas into the first gas delivery channels; the air extraction pump is in a closed state; Step d, stopping introducing the first gas, introducing a purge gas into the first gas delivery channels, and the air extraction pump is in an open state; Repeat steps a to d.

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