Implant abutment surface laser modification method

Abstract

The invention belongs to the technical field of implants, and particularly relates to an implant abutment surface laser modification method, which comprises the following steps: a laser device is adopted to form a micropore morphology on the implant abutment surface to promote soft tissue closure, the micropore morphology refers to that the implant abutment surface has a hole structure, and the micropore morphology refers to that the implant abutment surface has a hole structure. The micro-pores are arranged in a whole row, the pore diameter of the micro-pores is 45-60 microns, and the pore depth is 3-25 microns. The controllability of laser surface modification is high, laser residues are some metal oxide layers and have good compatibility in biology, the biological performance of a matrix is not affected, a smooth surface is still obtained through post-treatment, and the smooth surface is generally considered to be the morphology for promoting implant soft tissue sealing.

Description

Technical Field

[0001] The present invention belongs to the technical field of implants, and particularly relates to a method for laser modification of the surface of an implant abutment. Background Art

[0002] With the continuous development of oral implant technology, implants have become one of the important methods for repairing missing teeth.

[0003] Moreover, with the gradual aggravation of the aging population and the further attention of the population to dental health, the demand for implants has gradually increased. With the progress of technology, implant materials have developed from titanium metal to materials such as zirconia and yttria-stabilized zirconia, and the implant structure has also developed from a simple titanium screw to a high-precision and personalized customized adaptable implant structure. Although these changes have effectively extended the service life of implants, it is difficult to change the occurrence of peri-implantitis.

[0004] Peri-implantitis not only affects the oral health of patients, but may also lead to implant failure, which not only brings an economic burden to patients, but also affects the quality of life of patients. At present, there is no fundamental method to remove peri-implantitis.

[0005] Peri-implantitis is a complication after dental implantation, and its pathogenesis involves multiple factors, including microbial factors, host factors, implant design, surgical techniques, and oral hygiene maintenance, etc. Peri-implantitis is usually related to oral bacteria and the biofilms formed by them. These bacteria can come from the natural oral flora, especially Gram-negative anaerobic bacteria and motile bacteria. The most representative ones are Porphyromonas gingivalis and Prevotella intermedia. The toxins and enzymes produced by these bacteria can damage the hard and soft tissues around the implant, leading to inflammation and bone resorption.

[0006] Peri-implantitis not only affects the oral health of patients, but may also lead to implant failure, which not only brings an economic burden to patients, but also affects the quality of life of patients. At present, there is no fundamental method to remove peri-implantitis.

[0007] The surface properties, shape, connection method, roughness, etc. of implants may all affect the colonization of bacteria and the formation of biofilms. For example, an overly rough surface may promote the attachment of bacteria. Common surface treatment techniques such as sandblasting and acid etching may increase the surface roughness, which is helpful for bone bonding, but at the same time, the increase in roughness may also increase the risk of bacterial attachment. In addition, individual differences play an important role in the immune response to bacteria in the occurrence of peri-implantitis. An excessive inflammatory response may lead to tissue damage and absorption, causing the implant to lose its function.

[0008] The two most important types of cells in the dental implant microenvironment are human gingival fibroblasts and human gingival epithelial cells, and their interaction in the gingival tissue is an important area of oral biology research. When the gingival tissue is damaged, fibroblasts and epithelial cells will compete to adhere to the damaged area for repair. Fibroblasts are usually responsible for producing collagen and other matrix proteins, while epithelial cells are responsible for covering the wound surface. However, under normal circumstances, the covering ability of epithelial cells is stronger than that of fibroblasts, which results in a relatively poor biological width formed by fibroblasts. The balance of the interaction between the two types of cells may be disrupted, leading to increased adhesion competition, not only making it difficult for the wound to heal effectively, but also affecting the normal structure and function of the tissue. Only by regulating the two types of cells to a balanced state can a better sealing effect be achieved to reduce the periapical inflammation caused by bacterial invasion.

[0009] Therefore, in order to reduce the incidence of peri-implantitis and its subsequent hazards, scientists have conducted research from various aspects. Scientists in the field of materials science are trying to develop new implant materials or provide some means to modify the materials to obtain materials with better biocompatibility and the ability to reduce inflammatory reactions. For example, surface modification techniques are used to create a more hydrophilic implant surface to promote the attachment and growth of bone tissue; research in prevention and treatment has pointed out that appropriate antibiotic treatment, advanced surgical treatment, and updated oral hygiene maintenance means can effectively prevent and treat peri-implantitis. For example, biological agents are used to regulate the immune response of the microenvironment and clean the oral cavity to reduce the risk of bacterial infection.

[0010] Although there are currently some relatively mature materials science means and external treatment means that can control peri-implantitis to a large extent, most of the cases are only treating the symptoms rather than the root cause. The fundamental reason is that as an external implant, the implant cannot form a good soft tissue seal like natural teeth, allowing bacteria to enter the tissue and cause infection. Therefore, the best way to completely eradicate peri-implantitis is to simulate the soft tissue seal of natural teeth to achieve the effect of preventing bacteria from invading. Summary of the Invention

[0011] To improve the deficiencies in the existing technology, the present invention provides a method for laser modification of the surface of an implant abutment, which solves the problem that the implant abutment in the existing technology cannot form a good biological sealing effect.

[0012] In the first aspect of the present invention, a method for laser modification of the surface of an implant abutment is provided, and the method includes the following steps:

[0013] Use a laser device to form a microporous morphology on the surface of the implant abutment to promote soft tissue sealing.

[0014] According to an embodiment of the present invention, the laser device is used to emit laser to ablate the surface coating of the implant abutment and form a microporous morphology, which exerts the ability of morphology induction function on the premise of ensuring the biocompatibility of the material.

[0015] According to an embodiment of the present invention, the microporous morphology refers to a hole structure on the surface of the implant abutment.

[0016] According to an embodiment of the present invention, the micropores are arranged in an array.

[0017] According to an embodiment of the present invention, the aperture of the micropores is 45 - 60 μm, and the depth of the pores is 3 - 25 μm. Preferably, the aperture of the micropores is 45 - 50 μm, and the depth of the pores is 3 - 15 μm.

[0018] According to an embodiment of the present invention, the pore spacing of the micropores is 50 - 150 μm, for example, 100 μm.

[0019] As an example, the aperture of the micropores is 50 μm, the depth of the pores is 3 μm, and the pore spacing is 100 μm.

[0020] As an example, the aperture of the micropores is 50 μm, the depth of the pores is 9 μm, and the pore spacing is 100 μm.

[0021] As an example, the aperture of the micropores is 50 μm, the depth of the pores is 15 μm, and the pore spacing is 100 μm.

[0022] According to an embodiment of the present invention, the micropores have a SEM image substantially as Figure 1 shown.

[0023] According to an embodiment of the present invention, the micropores are circular or butterfly wing-shaped structures.

[0024] According to an embodiment of the present invention, the longitudinal section of the micropores is arc-shaped, and the angle of the arc is 30 - 60°, for example, 40°.

[0025] According to an embodiment of the present invention, the implant abutment material is selected from titanium alloy, pure titanium, for example, Ti6Al4V material.

[0026] According to an embodiment of the present invention, the micropores have a dense surface morphology.

[0027] According to an embodiment of the present invention, the surface of the micropores has no volcanic pile morphology.

[0028] According to an embodiment of the present invention, the micropores have one or more of the following functions:

[0029] 1) Promote the adhesion and proliferation of human gingival fibroblasts;

[0030] 2) Promote the vertical anchorage of human gingival fibroblasts to implants;

[0031] 3) Inhibit the proliferation and adhesion of human gingival epithelial cells;

[0032] 4) Control the competitive adhesion between human gingival epithelial cells and human gingival fibroblasts;

[0033] 5) Improve the soft tissue sealing effect during the implant healing period.

[0034] According to an embodiment of the present invention, the laser device is selected from laser blind hole devices.

[0035] According to an embodiment of the present invention, the method includes the following steps:

[0036] S1. Obtain an implant abutment material with a smooth surface;

[0037] S2. Use a laser blind hole device to form an array of microporous topography on the surface of the implant abutment material with a smooth surface.

[0038] According to an embodiment of the present invention, step S1 includes the following steps: successively polish and buff the implant abutment material to obtain an implant abutment material with a smooth surface.

[0039] According to an embodiment of the present invention, the polishing includes the following steps: use sandpaper with a mesh size of 50 - 3000 to polish the surface of the implant abutment material until it is flat. For example, successively use sandpaper with mesh sizes of 80, 200, 600, 1000, and 2000 to polish the surface of the implant abutment material until it is flat.

[0040] According to an embodiment of the present invention, the buffing includes the following steps: use a polishing solution on the surface of the implant abutment material with a flat surface on a polishing machine until the surface of the sample is smooth and free of scratches.

[0041] According to an embodiment of the present invention, before step S2, the following steps are further included: clean and dry the polished implant abutment material to obtain an implant abutment material with a smooth surface.

[0042] According to an embodiment of the present invention, the cleaning includes immersing the polished implant abutment material in a cleaning solvent and performing ultrasonic cleaning for 5 - 20 minutes.

[0043] According to an embodiment of the present invention, the cleaning solvent is selected from at least one of alcohol and acetone.

[0044] According to an embodiment of the present invention, the drying temperature is 40 - 100 °C, for example, 60 °C.

[0045] According to an embodiment of the present invention, step S2 includes the following steps: using a laser blind hole device to punch holes in the implant abutment material on a smooth surface to form a microporous array.

[0046] According to an embodiment of the present invention, the laser blind hole device includes a laser, and the punching parameters of the laser are set as follows: pulse width 1 microsecond, pulse frequency 40KHz, peak power 15 kilowatts, and pulse energy 300 microjoules.

[0047] According to an embodiment of the present invention, the process parameters for setting the microporous array are: laser current 5 amperes, number of pulses 3 - 15 times, and hole spacing set at 100 micrometers.

[0048] According to an embodiment of the present invention, after step S2, the following steps are further included: polishing the punched implant abutment material.

[0049] According to an embodiment of the present invention, the polishing includes using a polishing liquid on the surface of the implant abutment material with a flat surface on a polishing machine for the punched implant abutment material until the volcanic pile morphology at the micropore edges is polished to be flat, leaving only a dense microporous surface with a burr - free edge.

[0050] According to an embodiment of the present invention, after the polishing, the following steps are further included: cleaning and drying the polished implant abutment material with holes.

[0051] According to an embodiment of the present invention, the cleaning includes immersing the polished implant abutment material in a cleaning solvent and performing ultrasonic cleaning, and the time for the ultrasonic cleaning is 5 - 20 min.

[0052] According to an embodiment of the present invention, the cleaning solvent is selected from at least one of alcohol and acetone.

[0053] According to an embodiment of the present invention, the drying temperature is 40 - 100 °C, for example, 60 °C.

[0054] In a second aspect, the present invention provides an implant abutment material with a microporous morphology prepared by the above - mentioned method, and the surface of the implant abutment material has a microporous morphology arranged in an array.

[0055] According to an embodiment of the present invention, the microporous morphology has the structure as described above.

[0056] In a third aspect, the present invention provides a use of the implant abutment material with a microporous morphology as described above, which is used for preparing an implant.

[0057] In a fourth aspect, the present invention provides an implant, and the implant includes an implant abutment, and the surface of the implant abutment has the microporous morphology as described above.

[0058] Beneficial effects

[0059] 1) This technology avoids some potential hazards in current common implant abutment surface modification technologies. For example, acid etching may leave residues that cause local tissue reactions, and the rough surface caused by sandblasting may lead to excessive inflammation. Laser surface modification has strong controllability, and the laser residues are some metal oxide layers, which have good biocompatibility biologically, do not affect the biological properties of the substrate, and a smooth surface is obtained through post-treatment. A smooth surface is generally also considered a morphology that promotes soft tissue sealing of implants.

[0060] 2) The laser ablation oxide layer obtained by laser drilling treatment and the microholes with specific shapes formed through process exploration can induce gingival fibroblasts to extend into the holes and anchor inside the holes to enhance cell adhesion performance, thereby improving the sealing effect of soft tissue at the implant abutment. The strong adhesion of tissues can inhibit the invasion of bacteria, achieving the purpose of reducing the occurrence probability of peri-implantitis.

[0061] 3) By designing a microhole morphology that is suitable for the proliferation and adhesion of gingival fibroblasts but affects the proliferation and adhesion of gingival epithelial cells, the situation where epithelial cells grow downward excessively and occupy the normal sealing of fibroblasts is adjusted, promoting better healing and sealing of the two types of cells during the implant healing stage, and enhancing the ability of soft tissue to resist external bacterial invasion to achieve the purpose of reducing the occurrence probability of peri-implantitis. Description of the drawings

[0062] Figure 1 SEM image of the surface morphology of titanium alloy after laser surface microhole array treatment obtained in Example 1;

[0063] Figure 2 White light interference cross-sectional view of the surface of titanium alloy after laser surface microhole array treatment obtained in Example 1;

[0064] Figure 3 Graph showing the results of the proliferation effect after co-culturing various surface modification samples with human gingival fibroblasts in Example 2;

[0065] Figure 4 Graph showing the results of the effects on cell toxicity, migration and adhesion after co-culturing various surface modification samples with human gingival fibroblasts in Example 2;

[0066] Figure 5 Graph showing the expression results of various adhesion- and proliferation-related genes in Example 2;

[0067] Figure 6 Graph showing the results of the proliferation effect after co-culturing various surface modification samples with human gingival epithelial cells in Example 3;

[0068] Figure 7It is a graph showing the results of the proliferation effect after co-culturing various surface-modified samples in Example 3 with human gingival epithelial cells;

[0069] Figure 8 It is an immunofluorescence analysis graph of FN and COL1 proteins after culturing HGFs on the surface of various laser-modified samples in Comparative Example 1;

[0070] Figure 9 It is an immunofluorescence analysis graph of FN and COL1 proteins after culturing HGFs on the surface of laser-modified samples with other surface topography designs. Detailed implementation manners

[0071] The method of the present invention will be further described in detail below in conjunction with specific embodiments. It should be understood that the following embodiments are only illustrative explanations of the present invention and should not be construed as limiting the protection scope of the present invention. All technologies implemented based on the above content of the present invention are covered within the scope of protection intended by the present invention.

[0072] Unless otherwise specified, the raw materials and reagents used in the following embodiments are all commercially available products or can be prepared by known methods.

[0073] Example 1 Surface modification of titanium alloy implant abutment

[0074] Design the topography of the titanium alloy abutment with the function of promoting soft tissue sealing. The materials used are all commercially available F136 standard Ti6Al4V materials (hereinafter referred to as TC4). The composition of this material is as follows: Ti 90wt%, Al 6wt%, V 4wt%.

[0075] Cut the TC4 material into thin slices with a size of 10×10×1 mm by wire cutting. The TC4 thin slices are polished with 80, 200, 600, 1000, and 2000-mesh silicon carbide sandpapers in sequence until smooth. Subsequently, polish with a nano-silica polishing liquid on a polishing machine (the polishing liquid is a commercially available 50-nanometer particle size nano-silica polishing liquid. In the polishing liquid, the solvent is water and contains a dispersant. The polishing liquid used in the following embodiments is also the same). Polish until the surface of the polished thin slice sample is smooth and free of scratches. Subsequently, soak the sample in alcohol and acetone respectively, ultrasonically clean in an ultrasonic cleaner for 10 min, and put it into an oven at 60°C to dry after cleaning. Finally, obtain a smooth TC4 material for subsequent laser treatment.

[0076] Use the smooth TC4 material as the control group, and the experimental group uses a special laser blind hole device to punch holes on the polished surface of TC4. The equipment used is a special blind hole laser device manufactured by Nanguang High-Tech Laser Technology Co., Ltd. The main core component of the equipment is GAMMA: an ultraviolet solid-state laser, and the rest of the components are common components of the processing equipment.

[0077] The laser drilling parameters are set as follows: pulse width of 1 microsecond, pulse frequency of 40 KHz, peak power of 15 kW, and pulse energy of 300 microjoules.

[0078] The drilling process parameters of experimental group 1 are set as follows: laser current of 5 A, number of pulses of 3 times, hole spacing of 100 microns. The micropore array parameters on the titanium alloy sample 1 produced are: pore diameter of approximately 50 μm, hole depth of approximately 3 μm, and hole spacing of 100 μm (hereinafter referred to as "TC4-3p group"), that is, titanium alloy sample 1.

[0079] The drilling process parameters of experimental group 2 are set as follows: laser current of 5 A, number of pulses of 9 times, hole spacing of 100 microns. The micropore array parameters on the titanium alloy sample 2 produced are: pore diameter of 50 μm, hole depth of 9 μm, and hole spacing of 100 μm (hereinafter referred to as "TC4-9p group"), that is, titanium alloy sample 2.

[0080] The drilling process parameters of experimental group 3 are set as follows: laser current of 5 A, number of pulses of 9 times, hole spacing of 100 microns. The micropore array parameters on the titanium alloy sample 3 produced are: pore diameter of 50 μm, hole depth of 15 μm, and hole spacing of 100 μm (hereinafter referred to as "TC4-15p group"), that is, titanium alloy sample 3.

[0081] The titanium alloy samples 1-3 obtained through the above steps are subjected to surface post-treatment: the titanium alloy samples 1-3 are placed on a polishing machine and polished using nano-silica polishing liquid until the volcanic pile morphology at the micropore edges is polished to be flat, leaving only a dense micropore surface with a burr-free edge; subsequently, the polished samples are successively ultrasonically cleaned in acetone and alcohol for 10 min and then dried at 60 °C. Finally, a sample with a laser-modified morphology of the implant abutment surface with a dense micropore array is obtained. The obtained samples are subjected to SEM and white light interference detection, and at the same time, they are compared with the commercially available implant material F136 titanium alloy without treatment (hereinafter referred to as "control group"), and the results are as Figure 1 and Figure 2 .

[0082] See Figure 1 As shown, compared with the control group, the modification methods in experimental groups 1-3 successfully prepared a micropore array surface with regular pores and uniform pore diameters and depths on the surface. See Figure 2 As shown, according to the test data, the actual size is close to the designed size, and the micropore edges obtained by post-treatment polishing are smooth. There is a possibility of inducing cell extension and anchoring in the micropores in the structure, and this structure can be batch-formed by a laser device, with high designability and controllability, proving the feasibility of the laser micropore array process design.

[0083] Experiment on gingival fibroblasts of the surface modification of titanium alloy implant abutment in Example 2

[0084] Design the topography of a titanium alloy abutment with the function of promoting soft tissue sealing. The materials used are all commercially available F136 standard Ti6Al4V materials (hereinafter referred to as TC4). The composition of this material is as follows: Ti 90wt%, Al 6wt%, V 4wt%. Cut the TC4 material into slices with a size of 10×10×1 mm by wire cutting. Polish the TC4 slices successively with 80, 200, 600, 1000, and 2000-mesh silicon carbide sandpaper until they are flat. Then polish them on a polishing machine with nano-silica polishing liquid until the surface of the polished slice sample is smooth and free of scratches. Subsequently, soak the samples in alcohol and acetone respectively, and ultrasonically clean them in an ultrasonic cleaner for 10 minutes. After cleaning, put them in an oven at 60°C to dry. Finally, obtain smooth TC4 materials for subsequent laser treatment.

[0085] Use the smooth TC4 material as the control group, and use a special laser blind hole device in the experimental group to punch holes on the polished surface of TC4. The device used is a special blind hole laser device manufactured by Nanguang High-Tech Laser Technology Co., Ltd. The main core component of the device is GAMMA: an ultraviolet solid-state laser, and the rest of the components are general components of the processing equipment. The punching parameters of this laser are set as follows: pulse width 1 microsecond, pulse frequency 40KHz, peak power 15 kilowatts, and pulse energy 300 microjoules.

[0086] The punching process parameters of experimental group 1 are set as laser current 5 A, number of pulses 3 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture about 50μm, hole depth about 3μm, and hole spacing 100μm (hereinafter referred to as the "TC4-3p group"), that is, titanium alloy sample 1.

[0087] The punching parameters of experimental group 2 are set as laser current 5 A, number of pulses 9 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture 50μm, hole depth 9μm, and hole spacing 100μm (hereinafter referred to as the "TC4-9p group"), that is, titanium alloy sample 2.

[0088] The punching parameters of experimental group 3 are set as laser current 5 A, number of pulses 9 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture 50μm, hole depth 15μm, and hole spacing 100μm (hereinafter referred to as the "TC4-15p group"), that is, titanium alloy sample 3.

[0089] The titanium alloy samples 1-3 obtained through the above steps were subjected to surface post-treatment: The titanium alloy samples 1-3 were placed on a polishing machine and polished using nano-silica polishing liquid until the volcanic pile morphology at the edges of the micropores was polished to be flat, leaving only a dense micropore surface with a burr-free edge. Subsequently, the obtained samples were successively ultrasonically cleaned in acetone and alcohol for 10 minutes and then dried at 60 °C, finally obtaining a laser-modified morphology sample of the implant abutment surface with a dense micropore array, namely the modified samples TC4 thin slices 1-3.

[0090] The modified samples TC4 thin slices 1-3 were co-cultured with human gingival fibroblasts for 1, 3, and 5 days respectively, and then the proliferation of human gingival fibroblasts was detected by the CCK8 method. The results were as Figure 3 shown. At the same time, the cytotoxicity and adhesion induction of gingival fibroblasts were observed by live / dead staining and actin staining. The results were as Figure 4 , Figure 5 shown. Finally, the expression levels of typical adhesion and proliferation-related genes such as FN, VCL, COL-1, VEGF, EGFR, LAMB1, and TGF-β1 were detected by PCR. All experiments were compared with the control group, and the results were as Figure 6 shown.

[0091] The results showed that compared with the control group, there were no statistical differences in the proliferation rate of human gingival fibroblasts in the TC4-3p, TC4-9p, and TC4-15p groups, indicating that this morphological structure did not significantly inhibit the proliferation of human gingival fibroblasts. And the live / dead staining results also proved that the micropore array design did not produce toxicity to cells. Actin staining observed that the pore depth of the micropores would greatly affect the cell adhesion behavior. For example, when the pore depth in the TC4-3p group was about 3 μm, there was no obvious morphological induction effect on cells, and the cells grew covering the pores; the cells in the TC4-9p group anchored on the 9-μm deep pores and tentatively extended their pseudopods into the pores, showing the characteristics of extending and adhering into the pores; the cells in the TC4-15p group anchored on the 15-μm deep pores as the key points, extended a large number of cell skeletons and pseudopods into the pores to grow, and showed more pseudopods. The migration ability and adhesion ability of the cells were enhanced. It can be seen that a suitable pore morphology can promote better adhesion and migration of gingival fibroblasts.

[0092] According to Figure 5The PCR results showed that the morphologies with deeper pore depths (TC4-9p group and TC4-15p group) could induce the cells to produce more adhesion-related genes such as VCL, FN, LAMB1, and COL-1. At the same time, they also promoted the expression of the TGF-β1 proliferation gene. However, there was no significant difference in the expression of the VEGF gene. Thus, it can be seen that when the pore depth reaches a certain level, the gingival fibroblasts can be induced by the morphology to adhere better. The increased expression of adhesion-related genes can promote the synthesis of more related proteins, such as laminin and fibronectin. These proteins can further promote the soft tissue sealing effect and enhance the bonding effect of the implant.

[0093] Example 3 Gingival epithelial cell experiment on the surface modification of titanium alloy implant abutments

[0094] Design the morphology of a titanium alloy abutment with the function of promoting soft tissue sealing. The materials used are all commercially available F136 standard Ti6Al4V materials (hereinafter referred to as TC4), and the material composition is as follows: Ti 90wt%, Al 6wt%, V 4wt%. Cut the material into thin slices with a size of 10×10×1 mm by wire cutting, and polish it flat with silicon carbide sandpaper successively through 80, 200, 600, 1000, and 2000 mesh sandpapers. Subsequently, polish it on a polishing machine with nano-silica polishing liquid until the surface of the sample is smooth and scratch-free. Then, soak the sample in alcohol and acetone respectively, and ultrasonically clean it in an ultrasonic cleaner for 10 min. After cleaning, put it in an oven at 60 °C to dry. Finally, obtain a smooth TC4 material for subsequent laser treatment. The untreated group serves as the control group, and the experimental group uses a special laser blind hole device to punch holes on the polished surface of TC4. The device used is a special blind hole laser device manufactured by Nanguang High-Tech Laser Technology Co., Ltd. The main core component of the device is GAMMA: an ultraviolet solid-state laser, and the rest of the components are general components of the processing equipment. The punching parameters of this laser are set as follows: pulse width 1 microsecond, pulse frequency 40KHz, peak power 15 kilowatts, and pulse energy 300 microjoules. The punching process parameters of the control group 1 are set as laser current 5 A, pulse number 3 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture about 50μm, hole depth about 3μm, and hole spacing 100μm (hereinafter referred to as "TC4-3p group"). The punching parameters of the control group 2 are set as laser current 5 A, pulse number 9 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture 50μm, hole depth 9μm, and hole spacing 100μm (hereinafter referred to as "TC4-9p group"). The punching parameters of the control group 3 are set as laser current 5 A, pulse number 9 times, and hole spacing 100 microns. The parameters of the manufactured microhole array are: aperture 50μm, hole depth 15μm, and hole spacing 100μm (hereinafter referred to as "TC4-15p group"). Perform surface post-treatment on all titanium alloy samples with a dense microhole array obtained through the above steps: Place the sample on a polishing machine and polish it with nano-silica polishing liquid until the volcanic pile morphology at the edge of the microhole is polished to be flat, leaving only a dense microhole surface with a burr-free edge. Then, ultrasonically clean the obtained sample in acetone and alcohol for 10 min each and dry it at 60 °C. Finally, obtain a sample with a laser-modified morphology of the implant abutment surface with a dense microhole array.

[0095] After co-culturing the modified TC4 thin slices with human gingival epithelial cells for 1, 3, and 5 days, the proliferation of human gingival epithelial cells was detected by the CCK8 method, and the results are as Figure 6 shown. At the same time, the toxicity and adhesion induction of gingival epithelial cells were observed by live-dead staining and actin staining, and the results are as Figure 7 shown. All experiments were compared with commercially available titanium alloy implant abutment materials (hereinafter referred to as the "control group").

[0096] The results showed that there was no significant difference in the proliferation rate of human gingival epithelial cells between the TC4-3p and TC4-9p groups compared with the control group. However, the TC4-15p group was significantly lower than the other groups on the fifth day of culture, indicating that deeper pore structures would affect the normal proliferation of epithelial cells. The live / dead staining results showed that, compared with the control group, there were relatively more dead cells in the other groups with microhole arrays, indicating that this structure would have a certain inhibitory effect on the growth and proliferation of epithelial cells. Actin staining was used to observe the effect of the microholes on the activities of epithelial cells. All groups showed that epithelial cells had almost no tendency to extend into the pores. This was attributed to the different morphological sizes of epithelial cells and fibroblasts. The cell size of epithelial cells was often larger than that of fibroblasts, and the cell morphology of epithelial cells was not conducive to anchoring into the pores in the form of long fibroblast pseudopodia. Instead, they grew in a covering manner on the pores. The part of the microholes passed by the cells would also reduce some adhesion protein attachment sites due to the hollowing out. This would have a certain inhibitory effect on the migration and adhesion of epithelial cells. Thus, it can be seen that the deep pore designs of the TC4-9p and TC4-15p groups would enhance the adhesion and proliferation of gingival fibroblasts while inhibiting the adhesion and proliferation of epithelial cells to a certain extent. This result has a certain effect on solving the competitive adhesion of the two types of cells during implant placement.

[0097] Comparative Example 1

[0098] Design the topography of a titanium alloy abutment with the function of promoting soft tissue sealing. The materials used are all commercially available F136 standard Ti6Al4V materials (hereinafter referred to as TC4), and the material composition is as follows: Ti 90wt%, Al 6wt%, V 4wt%. Cut the material into slices with a size of 10×10×1 mm by wire cutting, and polish it flat successively with 80, 200, 600, 1000, and 2000 mesh silicon carbide sandpapers. Then polish it on a polishing machine with nano-silica polishing liquid until the surface of the sample is smooth and scratch-free. Subsequently, soak the sample in alcohol and acetone respectively, and ultrasonically clean it in an ultrasonic cleaner for 10 minutes. After cleaning, put it in an oven at 60°C to dry, and finally obtain a smooth TC4 material for subsequent laser treatment. The untreated group serves as the control group, and the experimental group uses a special laser blind hole device to punch holes on the polished surface of TC4. The equipment used is a special blind hole laser device manufactured by Nanguang High-Tech Laser Technology Co., Ltd. The main core component of the equipment is GAMMA: an ultraviolet solid-state laser, and the rest of the components are general components of the processing equipment. The punching parameters of this laser are set as follows: pulse width 1 microsecond, pulse frequency 40KHz, peak power 15 kilowatts, and pulse energy 300 microjoules. The punching process parameters of the control group 1 are set as laser current 5 A, pulse number 3 times, and hole spacing 100 microns. The parameters of the manufactured microporous array are: aperture about 50μm, hole depth about 3μm, and hole spacing 100μm (hereinafter referred to as "TC4-3p group"). The punching parameters of the control group 2 are set as laser current 5 A, pulse number 9 times, and hole spacing 100 microns. The parameters of the manufactured microporous array are: aperture 50μm, hole depth 9μm, and hole spacing 100μm (hereinafter referred to as "TC4-9p group"). The punching parameters of the control group 3 are set as laser current 5 A, pulse number 9 times, and hole spacing 100 microns. The parameters of the manufactured microporous array are: aperture 50μm, hole depth 15μm, and hole spacing 100μm (hereinafter referred to as "TC4-15p group"). Perform surface post-treatment on all titanium alloy samples with a dense microporous array obtained through the above steps: Place the sample on a polishing machine and polish it with nano-silica polishing liquid until the volcanic pile topography at the edge of the micropores is polished to be flat, leaving only a dense microporous surface with a burr-free edge. Subsequently, ultrasonically clean the obtained sample in acetone and alcohol for 10 minutes each and then dry it at 60°C. Finally, obtain a sample with a laser-modified topography of the implant abutment surface with a dense microporous array.

[0099] After co-culturing the obtained samples with human gingival fibroblasts for 3 days, perform FN and COL1 protein immunofluorescence staining. At the same time, compare with other laser surface modification topographies (lotus leaf, butterfly wing, shark skin, gecko foot) in the paper Ceramics International 49(2023)21602–21612 (hereinafter referred to as the paper comparison group), and the results are as Figure 8 、Figure 9 as shown

[0100] The results show that the FN detection amount of all microporous groups is more than that of the smooth surface, and the COL1 detection amounts of the TC4-9p and TC4-15p groups are significantly more than that of the smooth surface. At the same time, among the comparison groups in the paper, only the butterfly wing morphology can promote the secretion of both cell FN and COL1, and there is no other morphology that can significantly improve the secretion of both proteins at the same time. This result indicates that compared with the comparison groups in the paper, both the TC4-9p and TC4-15p groups have a more obvious effect on promoting cell adhesion. In particular, the TC4-15p group has a more obvious significant difference, and the detection results of this group are better than various morphologies mentioned in the comparison groups in the paper.

[0101] The specific implementation modes of the present invention have been exemplarily described above through embodiments. However, the protection scope of the present invention is not limited to the above exemplary implementation modes. Any modifications, equivalent replacements, improvements, etc. made by those skilled in the art within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A method for laser modification of the surface of an implant abutment, characterized in that, The method includes the following steps: A laser device is used to form a microporous morphology on the surface of the implant abutment to promote soft tissue sealing. The microporous morphology refers to a hole structure on the surface of the implant abutment. The microporous morphology is arranged in an array. The aperture of the micropores is 45 - 60 μm, and the pore depth is 3 - 25 μm.

2. The laser modification method for the surface of the implant abutment according to claim 1, characterized in that The pore spacing of the micropores is 50 - 150 μm. Preferably, the micropores have the SEM image shown in Figure 1. Preferably, the micropores are circular or butterfly wing-shaped structures.

3. The laser modification method for the surface of an implant abutment according to claim 1, characterized in that The longitudinal section of the micropores is arc-shaped, and the angle of the arc is 30 - 60°.

4. The laser modification method for the surface of an implant abutment according to any one of claims 1-3, characterized in that, The method includes the following steps: S1. Obtain an implant abutment material with a smooth surface; S2. Use a laser blind hole device to form an array of microporous morphologies on the surface of the implant abutment material with a smooth surface.

5. The method for laser modification of the surface of an implant abutment according to claim 4, characterized in that, Step S1 includes the following steps: The implant abutment material is polished and buffed in sequence to obtain an implant abutment material with a smooth surface.

6. The method for laser modification of the surface of an implant abutment according to claim 4, wherein Step S2 includes the following steps: Use a laser blind hole device to drill holes in the implant abutment material with a smooth surface to form a micropore array.

7. The method for laser modification of the surface of an implant abutment according to claim 4, wherein The laser blind hole device includes a laser. The drilling parameters of the laser are set as follows: pulse width 1 microsecond, pulse frequency 40 KHz, peak power 15 kilowatts, and pulse energy 300 microjoules. Preferably, the process parameters for setting the micropore array are: laser current 5 amperes, number of pulses 3 - 15 times, and pore spacing set at 100 microns.

8. The method for laser modification of the surface of an implant abutment according to claim 4, wherein After step S2, the following steps are further included: The drilled implant abutment material is polished. Preferably, the polishing includes using a polishing liquid on the surface of the drilled implant abutment material on a polishing machine to polish the surface of the implant abutment material until the volcanic pile morphology at the micropore edges is polished to be flat, leaving only a dense micropore surface with a burr-free edge.

9. An implant abutment material with a microporous morphology prepared by the method according to any one of claims 1 - 8, wherein the surface of the implant abutment material has an array of microporous morphologies.

10. An implant, wherein the implant includes an implant abutment prepared by the method according to any one of claims 1 - 8.

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