Method for detecting content of trace elements in quartz sand

Abstract

The invention relates to the technical field of spectrum detection, in particular to a method for detecting the content of trace elements in quartz sand. The method comprises the following steps: acquiring spectral data of a quartz sand solution with gradient change of concentration; in each concentration spectrum, calculating an overlapping index according to the position and peak height difference of a spectrum peak and a previous spectrum peak, and screening abnormal spectrum peaks; analyzing the cross interference of the abnormal spectrum peak and the previous spectrum peak to obtain a distortion representation degree; obtaining the deviation influence degree according to the deviation of the abnormal spectrum peaks influenced by the silicon peaks among different concentrations, obtaining the concentration change interference degree according to the deviation amplitude variation trend of the distortion representation degree in the continuous concentration spectrum data in the ordered concentration, and correcting the spectrum data of the abnormal spectrum peaks to detect the content of the trace elements. According to the method, the spectrum data deviation of the quartz sand under the gradient concentration change is dynamically analyzed and quantified, so that the interference of the silicon element on the trace elements is eliminated, and the accuracy and reliability of the detection result of the content detection of the trace elements in the quartz sand are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of spectrum detection, and in particular to a method for detecting the content of trace elements in quartz sand. Background Art

[0002] Quartz sand, a key industrial raw material, is widely used in glass, ceramics, casting, electronics, photovoltaics, and other fields. Its purity and trace element content directly impact product performance and quality. For example, elements such as iron (Fe), titanium (Ti), and aluminum (Al) can reduce the light transmittance of glass, while elements such as lithium (Li) and boron (B) can affect melting properties. Therefore, accurate measurement of trace element content in quartz sand is crucial for production process optimization and product grading.

[0003] Traditional detection methods include wet chemical methods (such as spectrophotometry and titration) and atomic absorption spectrometry (AAS), but these methods often have limitations such as complex sample pretreatment, long detection cycles, and insufficient capabilities for simultaneous multi-element analysis. In recent years, inductively coupled plasma optical emission spectrometry (ICP-OES) has gradually become the mainstream technology for trace element analysis due to its high sensitivity, wide linear range, and simultaneous multi-element detection.

[0004] However, the high content of silicon-based matrix in quartz sand will interfere with the test. The strong emission spectrum of silicon will mask the spectrum lines of adjacent trace elements. Even if the main peak of silicon does not completely overlap with the target line, the wide wingspan of its strong peak (especially at high Si concentrations) may raise the background signal in the adjacent area, resulting in the inability to accurately identify the type and content of the element. Summary of the Invention

[0005] In order to solve the technical problems in the above-mentioned prior art, the purpose of the present invention is to provide a method for detecting the content of trace elements in quartz sand. The technical solution adopted is as follows: The present invention provides a method for detecting the content of trace elements in quartz sand, the method comprising: Spectral data were collected for the quartz sand powder solution at each concentration in a stepwise ordered concentration sequence; In the spectral data of each concentration, the peak overlap index of each peak is determined based on the difference in position and peak height between each peak and the previous peak. Abnormal peaks are screened out using the peak overlap index. The cross-interference between each abnormal peak and the previous peak is analyzed, and the distortion performance of each abnormal peak is obtained by combining the peak overlap index. The offset influence is obtained based on the deviation of the degree to which each abnormal spectral peak is affected by the silicon element spectral peak between different concentrations. In the step-ordered concentration sequence, the concentration change interference is obtained by the change trend of the distortion performance deviation amplitude of each abnormal spectral peak between consecutive concentration spectral data. The spectrum data of each abnormal spectrum peak is corrected according to the offset image degree and the concentration change interference degree to obtain the corrected spectrum data; and the trace element content is detected based on the corrected spectrum data.

[0006] Furthermore, the method for obtaining the spectral peak overlap index includes: For any spectral peak, the distance between the peak point of the spectral peak and the previous spectral peak is negatively correlated and mapped as the position overlap possibility of the spectral peak; the peak height difference between the previous spectral peak and the spectral peak is normalized to obtain the masking overlap possibility of the spectral peak; The peak overlap index of the spectrum peak is obtained by combining the position overlap possibility and the mask overlap possibility of the spectrum peak.

[0007] Furthermore, the method for obtaining the distortion representation includes: For any abnormal spectrum peak, obtain the connection point between the abnormal spectrum peak and the previous spectrum peak; use the peak width of the previous spectrum peak at the connection point as the interference influence of the abnormal spectrum peak; combine the ordinate of the connection point and the interference influence of the abnormal spectrum peak to obtain the deformation interference index of the abnormal spectrum peak; The product of the deformation interference index and the spectrum peak overlap index of the abnormal spectrum peak is used as the distortion expression degree of the abnormal spectrum peak.

[0008] Furthermore, the method for obtaining the offset influence includes: For the spectrum data of any concentration, the peak difference between the peak point of each abnormal spectrum peak in the spectrum data and the maximum peak point of all spectrum peaks is calculated as the deviation degree of each abnormal spectrum peak; The spectral data of each other concentration is sequentially used as the analysis spectrum; the peak corresponding to the wavelength of each abnormal peak in the spectral data in the analysis spectrum is used as the matching peak of each abnormal peak; The difference in the degree of deviation between each abnormal spectral peak and the matching spectral peak is used as the spectral peak shift index of each abnormal spectral peak to the analysis spectrum; the sum of the spectral peak shift indexes of all abnormal spectral peaks in the spectral data is used as the spectral shift index of the spectral data to the analysis spectrum; The spectral shift indices between all spectral data of two concentrations are combined to obtain the shift impact.

[0009] Furthermore, the method for obtaining the concentration change interference degree includes: For any wavelength of an abnormal spectral peak, the distortion performance degree of the spectral peak corresponding to the wavelength is arranged according to the concentration order in the step-ordered concentration sequence to obtain the distortion performance sequence of the wavelength; Obtain a differential sequence of the distortion performance sequence; use the absolute value of the slope of the differential value in the differential sequence as the interference trend of the wavelength; and use the average of the interference trend of the wavelengths of all abnormal spectral peaks as the concentration change interference.

[0010] Furthermore, the method for obtaining the corrected spectral data includes: The offset influence and concentration change interference are combined and normalized to obtain the corrected offset coefficient; The product of the peak width of each abnormal peak in the spectral data of each concentration and the correction offset coefficient is used as the corrected peak width of the abnormal peak; the peak corresponding to the corrected peak width and the non-abnormal peak constitute the corrected spectral data.

[0011] Furthermore, the method for obtaining the abnormal spectrum peak includes: When the peak overlap index of a spectrum peak is greater than a preset abnormal threshold, the corresponding spectrum peak is regarded as an abnormal spectrum peak.

[0012] Furthermore, the step of combining the position overlap possibility and the mask overlap possibility of the spectrum peak to obtain the spectrum peak overlap index of the spectrum peak includes: The product of the position overlap possibility and the mask overlap possibility of the spectrum peak is normalized and used as the spectrum peak overlap index of the spectrum peak.

[0013] Furthermore, combining the spectral shift index between all the spectral data of two concentrations to obtain the shift influence degree includes: Normalizing the sum of the spectrum shift indices of the spectrum data of all other concentrations to obtain the shift degree of the spectrum data; The average of the deviations of the spectral data of all concentrations is taken as the deviation influence.

[0014] Furthermore, the method for obtaining the correction offset coefficient includes: The product of the offset influence and the concentration change interference is negatively correlated and normalized to obtain the corrected offset coefficient.

[0015] The present invention has the following beneficial effects: The present invention can be used to analyze the dynamic characteristics of silicon element interference as the content decreases through the spectral data of quartz sand solution with concentration gradient changes, providing data support for subsequent interference analysis. In each concentration spectrum, the overlap index is calculated based on the position and peak height difference between the spectral peak and the previous spectral peak, and the abnormal spectral peak is screened. The target spectral peak interfered by the silicon peak can be targeted, the interference of irrelevant spectral peaks can be reduced, and the accuracy of interference identification can be improved. The cross-interference between the abnormal spectral peak and the previous spectral peak is analyzed to obtain the distortion performance, quantify the degree of peak distortion caused by the interference, and further provide a data basis for interference assessment. The offset influence degree is obtained according to the deviation of the abnormal spectral peak affected by the silicon peak between different concentrations, and the concentration change interference degree is obtained by the trend of the distortion performance deviation amplitude in the continuous concentration spectral data in the ordered concentration. The more serious the interference of silicon element to other elements, and the change law of deformation interference as the concentration decreases, the dynamics of interference analysis can be improved. The spectral data of the abnormal spectral peak is corrected according to the offset influence degree and the concentration change interference degree, the silicon matrix interference offset can be eliminated in a targeted manner, and the trace element content can be detected more accurately. The present invention dynamically analyzes and quantifies the spectral data offset of quartz sand under step concentration changes, eliminates the interference of silicon on trace elements, and improves the accuracy and reliability of the detection results of trace element content in quartz sand. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions and advantages of the embodiments of the present invention or the prior art, the following briefly introduces the drawings required for use in the embodiments or the prior art descriptions. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0017] Figure 1 A flow chart of a method for detecting trace element content in quartz sand provided by one embodiment of the present invention; Figure 2 A schematic diagram of abnormal spectral peak overlap provided by one embodiment of the present invention. DETAILED DESCRIPTION

[0018] To further illustrate the technical means and effectiveness of the present invention in achieving its intended objectives, the following, in conjunction with the accompanying drawings and preferred embodiments, describes in detail a method for detecting trace element content in quartz sand according to the present invention, including its specific implementation, structure, features, and effectiveness. In the following description, references to "one embodiment" or "another embodiment" do not necessarily refer to the same embodiment. Furthermore, specific features, structures, or characteristics of one or more embodiments may be combined in any suitable manner.

[0019] Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.

[0020] The following describes in detail a method for detecting trace element content in quartz sand provided by the present invention in conjunction with the accompanying drawings.

[0021] Inductively coupled plasma optical emission spectrometry (ICP-OES) is an advanced spectroscopic analysis technique that uses a high-frequency induction coil to generate an argon plasma (temperatures of up to 7,000-10,000 K) to atomize and excite sample elements. The characteristic emission spectrum is then detected for quantitative analysis. In the determination of trace element content in quartz sand, ICP-OES utilizes high-temperature plasma to achieve efficient element excitation, enabling the simultaneous determination of over 20 elements, including Na, K, Fe, and Al. This method is over 10 times more efficient than traditional chemical analysis methods and effectively overcomes interference from the quartz sand matrix. It combines high precision, high efficiency, and broad applicability in trace element analysis of quartz sand.

[0022] Therefore, the content of trace elements is detected based on inductively coupled plasma optical emission spectrometry. Figure 1 , which shows a flow chart of a method for detecting trace element content in quartz sand provided by one embodiment of the present invention, the method comprising the following steps: S1: Collect spectral data for a quartz sand powder solution at each concentration in a stepwise ordered concentration sequence.

[0023] To accurately detect trace element content, the present invention utilizes a comparative observation correction method to measure element content. Quartz sand powder solutions of varying concentrations are prepared, and spectral data is collected using inductively coupled plasma emission spectroscopy for dynamic analysis and comparison. In this embodiment, three quartz sand powder solutions of varying concentrations are prepared, with step concentrations set to 1000 mg / L (i.e., 1 g of quartz sand powder dissolved in 1 L of solvent), 600 mg / L, and 200 mg / L. The concentrations are arranged in order of magnitude to form a stepped, ordered concentration sequence, facilitating subsequent dynamic analysis of continuously changing concentrations. It should be noted that the specific preparation and step concentration selection can be adjusted by the implementer based on different implementation scenarios.

[0024] S2: In the spectral data of each concentration, determine the peak overlap index of each peak based on the position and peak height difference between each peak and the previous peak; filter out abnormal peaks through the peak overlap index; analyze the cross-interference between each abnormal peak and the previous peak, and combine the peak overlap index to obtain the distortion performance of each abnormal peak.

[0025] The high content of silicon-based matrix in quartz sand can cause significant interference to inductively coupled plasma emission spectroscopy testing. The main reason is that silicon excites a large number of strong emission lines in high-temperature plasma. These lines are mainly concentrated in the ultraviolet-visible light region (180–450nm) and have high signal intensity and wide half-peak width.

[0026] The biggest obstacle to quartz sand testing is the strong interference from the emission lines of high silicon content. Silicon's peak intensity is extremely high and its peak width is very wide. Even if it doesn't completely overlap with the spectrum of target trace elements (such as Fe, Al, and Ti), it can elevate the background signal in the adjacent area, even squeezing and obscuring the boundaries of the target peak, ultimately distorting the morphology of the target peak. This can cause the peak width of the trace element to be widened, resulting in the incorporation of interfering signals from Si, or the peak boundaries to be blurred, making it impossible to distinguish the target peak from the silicon peak. Consequently, peak height and area measurements contain a large amount of interfering signals, leading to concentration errors.

[0027] Therefore, we analyze the overlap and interference of spectral peaks, perform spectral shift analysis for peaks most affected by overlap, and correct for shifted peaks to improve detection accuracy. Because the high-concentration element (Si) is excited first, its interference is highly propagated backward. The strong Si peak typically extends to the longer wavelength side, which is a spectral line broadening and attenuation to the right. Therefore, we analyze the possible overlap between each spectral peak and the preceding peak.

[0028] Preferably, in an embodiment of the present invention, the method for obtaining the spectrum peak overlap index includes: First, for any spectral peak, the distance between the peak points of the peak and the previous peak is negatively correlated to determine the likelihood of peak overlap. The inter-peak distance is the horizontal distance between the peak points, or the difference between the horizontal coordinates. The closer the horizontal distance between the peaks, the closer the two components are. During detection, the closer the wavelengths of light absorbed, and therefore the greater the degree of impact.

[0029] Furthermore, the peak height difference between the previous spectral peak and this spectral peak is normalized to obtain the masking overlap possibility of the spectral peak. The height difference indicates the difference in element content, because the closer the distance, the closer the light absorption ability should be. However, if the content is less, it will cause the light absorption ability to be masked. The greater the difference in the spectral data, it means that it is very likely that the previous peak is a strong peak, then the impact will be greater, and therefore the possibility of overlap is greater.

[0030] It should be noted that normalization is a technical means well known to those skilled in the art. The normalization function can be a hyperbolic tangent function, linear normalization or standard normalization, etc. The specific normalization method is not limited here.

[0031] Finally, the peak overlap index of the peak is obtained by combining the position overlap possibility and the mask overlap possibility of the peak. In an embodiment of the present invention, the product of the position overlap possibility and the mask overlap possibility of the peak is normalized to serve as the peak overlap index of the peak. The larger the peak overlap index, the higher the possibility of peak overlap.

[0032] Based on the peak overlap index, adjacent peaks that produce abnormal interference are screened out. In an embodiment of the present invention, when the peak overlap index of a peak is greater than a preset abnormal threshold, the corresponding peak is regarded as an abnormal peak. The preset abnormal threshold can be set to 0.7, and the specific value can be adjusted by the implementer.

[0033] We then analyze the degree of abnormal changes caused by overlapping peaks. Peak overlap occurs because of similar material composition. Silicon's strong emission lines can mask the spectral lines of nearby trace elements, causing interference anomalies. The greater the overlap, the greater the anomaly. Therefore, we quantify the loss by analyzing the shape of the abnormal peaks. The more severe the overlap, the greater the degree of anomaly.

[0034] The distortion expression degree analyzed reflects the degree of abnormality. Preferably, in an embodiment of the present invention, the method for obtaining the distortion expression degree includes: For any abnormal peak, get the connection point between the abnormal peak and the previous peak. Figure 2 , which shows a schematic diagram of abnormal spectrum peak overlap provided by an embodiment of the present invention, the horizontal axis represents wavelength, the vertical axis represents spectral intensity, wherein C is the abnormal spectrum peak, A represents the spectrum peak before the abnormal spectrum peak, B is the connection point, D is the horizontal coordinate corresponding to the connection point, and the BE segment is the peak width of the spectrum peak A at the connection point.

[0035] The peak width of the previous peak at the connection point is used as the interference influence of the abnormal peak, that is, the length of the BE segment is used as the interference influence. The wider the peak width at the connection point, the greater the coverage of the previous peak and the more susceptible the abnormal peak is to interference. Then, combining the ordinate of the connection point and the interference influence of the abnormal peak, the deformation interference index of the abnormal peak is obtained. The size of the ordinate reflects the signal strength, that is, the length of the BD segment. The larger the ordinate, the higher the position of the connection point, reflecting the greater the degree of intersection between the two peaks, and therefore the greater the interference between the peaks.

[0036] In an embodiment of the present invention, the size of the vertical coordinate of the connection point is multiplied by the interference influence of the abnormal spectrum peak to obtain a deformation interference index. The larger the deformation interference index, the higher the degree of cross interference and the greater the possibility of abnormality.

[0037] Finally, the product of the deformation interference index and the peak overlap index of the abnormal spectrum peak is used as the distortion performance index of the abnormal spectrum peak. The distortion performance index is obtained by comprehensively combining the cross interference and overlap degree, which reflects the degree of abnormal interference of the abnormal spectrum peak.

[0038] S3: The offset influence degree is obtained based on the deviation of the degree to which each abnormal spectral peak is affected by the silicon element spectral peak between different concentrations; in the stepped ordered concentration sequence, the concentration change interference degree is obtained through the changing trend of the distortion performance deviation amplitude of each abnormal spectral peak between consecutive concentration spectral data.

[0039] After analyzing the anomalies at a single concentration, we further analyzed the differences in spectral data for different sample concentrations. Because different sample concentrations contain different substances, the degree of influence between spectral peaks varies during spectral measurement. Furthermore, due to the varying silicon content in quartz sand, its impact on the overall spectrum may exhibit different characteristics. Therefore, by comparing the differences in spectral data corresponding to samples of different concentrations, we analyzed the overall deviation patterns.

[0040] The silicon content in quartz sand varies with concentration, and the degree of interference of silicon's strong emission spectrum lines on trace element spectrum peaks is directly correlated with silicon concentration, which means that the higher the concentration, the stronger the interference.

[0041] Therefore, the overall difference in the effect of silicon on the spectral data at different concentrations is first quantified. The offset influence degree is obtained by measuring the effect of the silicon peak on each abnormal spectral peak at different concentrations, reflecting the magnitude of the overall difference in the interference. Preferably, in an embodiment of the present invention, the method for obtaining the offset influence degree includes: First, for the spectral data of any concentration, the peak difference between the peak point of each abnormal spectral peak in the spectral data and the maximum peak point among all spectral peaks is calculated as the deviation degree of each abnormal spectral peak. The maximum peak point among all spectral peaks is usually the intensity corresponding to the silicon strong peak. The deviation degree is used to characterize the relative intensity difference of each abnormal spectral peak.

[0042] The spectral data for each additional concentration is then used as the analytical spectrum, and the spectral data for each concentration is then compared and analyzed. It is understood that because the constituent substances are identical, the spectral data will have corresponding wavelengths, so the peaks in the spectral data at different concentrations must correspond. Therefore, the wavelength of each anomalous peak in the spectral data is used as the corresponding peak in the analytical spectrum as the matching peak for each anomalous peak, and a comparative change analysis is performed.

[0043] The difference in deviation between each abnormal spectral peak and the matching spectral peak is further used as the spectral peak shift index of each abnormal spectral peak to the analytical spectrum. The spectral peak shift index represents the spectral peak difference of quartz sand with different concentrations at the same wavelength. The greater the spectral peak difference, the different concentrations of silicon elements have different degrees of influence on the spectral data when obtaining quartz sand spectral data, thus causing a greater degree of spectral peak shift.

[0044] That is, the greater the difference in relative intensity of the same spectral peak under two concentrations, the more significant the interference of the spectral peak by the change in silicon concentration is. The offset of all abnormal spectral peaks under a single concentration is compared, and the sum of the spectral peak offset indices of all abnormal spectral peaks in the spectral data is used as the spectral offset index of the spectral data for the analytical spectrum, reflecting the significance of the overall interference deviation between the two concentrations.

[0045] Finally, the spectral shift indexes between all the spectral data of two concentrations are combined to obtain the shift influence degree. In an embodiment of the present invention, the sum of the spectral shift indexes of the spectral data for all other concentrations is normalized as the shift degree of the spectral data, as the degree of shift between the single-concentration spectral data and all different concentrations.

[0046] The average of the offsets for all concentrations of spectral data is used as the offset influence. Combining all spectral offset indicators reflects the concentration dependence of silicon matrix interference, quantifying the overall trend of interference intensity as it changes with quartz sand concentration. A larger offset influence indicates a more significant difference in silicon interference in spectral data at different concentrations, providing a fundamental data basis for subsequent offset coefficient adjustments.

[0047] Since silicon's interference with trace element peaks is not random but rather exhibits a linear pattern of gradient attenuation as concentration decreases, meaning that the lower the concentration and the less silicon there is, the more gradual the change in distortion. Therefore, we further quantify the linear trend of distortion as concentration levels change. By analyzing the trend of distortion at successive concentrations in an ordered concentration sequence, we obtain the concentration-varying interference degree, which reflects the rate at which interference changes with concentration.

[0048] Preferably, in an embodiment of the present invention, the method for obtaining the concentration change interference degree includes: For any wavelength of an abnormal spectral peak, the distortion performance indexes of the spectral peak corresponding to that wavelength are arranged according to the concentration order in the step-ordered concentration sequence to obtain the distortion performance sequence for that wavelength. As an example, when the concentration order in the step-ordered concentration sequence is descending, the distortion performance indexes in the distortion performance sequence are also distributed in descending order based on the linear variation characteristics.

[0049] A differential sequence of the distortion performance sequence is then obtained, reflecting the degree of change in the distortion performance. The absolute value of the slope of the differential values ​​in the differential sequence is used as the interference trend for that wavelength, and the slope reflects the rate of change. In a descending distribution, the faster the interference decays with decreasing concentration, the steeper the linear trend. The mean of the interference trend of the wavelengths of all abnormal spectral peaks is used as the concentration change interference. By converting the abstract trend of interference intensity with concentration into a quantifiable relationship, the linear correlation between the offset degree and silicon concentration is clarified, providing a dynamic correction logic for concentration and interference for subsequent offset adjustments.

[0050] S4: Correcting the spectral data of each abnormal spectral peak according to the offset image degree and the concentration change interference degree to obtain corrected spectral data; and detecting the trace element content based on the corrected spectral data.

[0051] The strong emission lines of high-concentration silicon in quartz sand produce wide wingspans, which can cause neighboring trace element peaks to overlap or squeeze out. This often results in a distortion of the target peak's width, such as broadening and asymmetry. This distortion can cause the instrument to misjudge peak boundaries, affecting accurate readings of peak height and area. For example, if the wingspan of Si elevates the background baseline of the Fe peak, the uncorrected peak width will contain significant interference. Directly measuring the peak height will incorporate background noise, resulting in an inaccurate result.

[0052] Therefore, the peak width is corrected by dynamically adjusting the offset image degree and the concentration change interference degree. After the peak width is corrected, the interference part can be eliminated, making the peak boundary clearer and obtaining more accurate corrected spectral data for detection.

[0053] In an embodiment of the present invention, a method for obtaining corrected spectral data includes: The offset influence and concentration change interference are combined and normalized to obtain a corrected offset coefficient. In an embodiment of the present invention, the product of the offset influence and the concentration change interference is negatively correlated and normalized to obtain a corrected offset coefficient. The intensity and dynamic change law of Si interference are comprehensively considered to reflect the degree of interference of silicon in quartz sand on the trace element spectral peak and the severity of the spectral peak offset. The larger the corrected offset coefficient, the smaller the offset degree of the spectral data, the smaller the interference, and the smaller the adjustment degree.

[0054] The corrected peak width of each anomalous peak in the spectral data for each concentration is then calculated by multiplying the peak width of each anomalous peak by the correction offset factor. A larger correction offset factor results in a higher degree of peak width preservation. Peak width adjustment is performed to restore the true shape of the peak, ensuring that the peak height reflects the net signal of the target element, rather than a mixed signal of interference and target. Therefore, the corrected spectral data, consisting of the peak corresponding to the corrected peak width and the non-abnormal peak, can be used to more accurately determine the trace element content in quartz sand.

[0055] In summary, the present invention can be used to analyze the dynamic characteristics of silicon element interference as the content decreases through the quartz sand solution spectral data of concentration gradient changes, providing data support for subsequent interference analysis. In each concentration spectrum, the overlap index is calculated based on the position and peak height difference between the spectral peak and the previous spectral peak and the abnormal spectral peak is screened. The target spectral peak interfered by the silicon peak can be targeted, the interference of irrelevant spectral peaks can be reduced, and the accuracy of interference identification can be improved. The cross-interference between the abnormal spectral peak and the previous spectral peak is analyzed to obtain the distortion performance, quantify the peak distortion degree caused by the interference, and further provide a data basis for interference assessment. The offset influence degree is obtained according to the deviation of the abnormal spectral peak affected by the silicon peak between different concentrations, and the concentration change interference degree is obtained by the distortion performance deviation amplitude change trend in the continuous concentration spectral data in the ordered concentration. The more serious the interference of silicon element to other elements, and the change law of deformation interference as the concentration decreases, the dynamics of interference analysis can be improved. The spectral data of the abnormal spectral peak is corrected according to the offset influence degree and the concentration change interference degree, the silicon matrix interference offset can be eliminated in a targeted manner, and the trace element content can be more accurately detected. The present invention dynamically analyzes and quantifies the spectral data offset of quartz sand under step concentration changes, eliminates the interference of silicon on trace elements, and improves the accuracy and reliability of the detection results of trace element content in quartz sand.

[0056] It should be noted that the order in which the embodiments of the present invention are described above is for illustrative purposes only and does not necessarily represent the superiority or inferiority of the embodiments. The processes depicted in the accompanying drawings do not necessarily require the specific order or sequential order shown to achieve the desired results. In certain embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0057] The various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referred to each other. Each embodiment focuses on the differences from other embodiments.

Claims

1. A method for detecting trace element content in quartz sand, characterized in that: The method comprises: Spectral data were collected for the quartz sand powder solution at each concentration in a stepwise ordered concentration sequence; In the spectral data of each concentration, the peak overlap index of each peak is determined based on the difference in position and peak height between each peak and the previous peak. Abnormal peaks are screened out using the peak overlap index. The cross-interference between each abnormal peak and the previous peak is analyzed, and the distortion performance of each abnormal peak is obtained by combining the peak overlap index. The offset influence is obtained based on the deviation of the degree to which each abnormal spectral peak is affected by the silicon element spectral peak between different concentrations. In the step-ordered concentration sequence, the concentration change interference is obtained by the change trend of the distortion performance deviation amplitude of each abnormal spectral peak between consecutive concentration spectral data. The spectrum data of each abnormal spectrum peak is corrected according to the offset image degree and the concentration change interference degree to obtain the corrected spectrum data; and the trace element content is detected based on the corrected spectrum data.

2. The method for detecting trace element content in quartz sand according to claim 1, wherein: The method for obtaining the spectral peak overlap index includes: For any spectral peak, the distance between the peak point of the spectral peak and the previous spectral peak is negatively correlated and mapped as the position overlap possibility of the spectral peak; the peak height difference between the previous spectral peak and the spectral peak is normalized to obtain the masking overlap possibility of the spectral peak; The peak overlap index of the spectrum peak is obtained by combining the position overlap possibility and the mask overlap possibility of the spectrum peak.

3. The method for detecting trace element content in quartz sand according to claim 1, wherein: The method for obtaining the distortion expression includes: For any abnormal spectrum peak, obtain the connection point between the abnormal spectrum peak and the previous spectrum peak; use the peak width of the previous spectrum peak at the connection point as the interference influence of the abnormal spectrum peak; combine the ordinate of the connection point and the interference influence of the abnormal spectrum peak to obtain the deformation interference index of the abnormal spectrum peak; The product of the deformation interference index and the spectrum peak overlap index of the abnormal spectrum peak is used as the distortion expression degree of the abnormal spectrum peak.

4. The method for detecting trace element content in quartz sand according to claim 1, wherein: The method for obtaining the offset influence includes: For the spectrum data of any concentration, the peak difference between the peak point of each abnormal spectrum peak in the spectrum data and the maximum peak point of all spectrum peaks is calculated as the deviation degree of each abnormal spectrum peak; The spectral data of each other concentration is sequentially used as the analysis spectrum; the peak corresponding to the wavelength of each abnormal peak in the spectral data in the analysis spectrum is used as the matching peak of each abnormal peak; The difference in the degree of deviation between each abnormal spectral peak and the matching spectral peak is used as the spectral peak shift index of each abnormal spectral peak to the analysis spectrum; the sum of the spectral peak shift indexes of all abnormal spectral peaks in the spectral data is used as the spectral shift index of the spectral data to the analysis spectrum; The spectral shift indices between all spectral data of two concentrations are combined to obtain the shift impact.

5. The method for detecting trace element content in quartz sand according to claim 4, wherein: The method for obtaining the concentration change interference degree includes: For any wavelength of an abnormal spectral peak, the distortion performance degree of the spectral peak corresponding to the wavelength is arranged according to the concentration order in the step-ordered concentration sequence to obtain the distortion performance sequence of the wavelength; Obtain a differential sequence of the distortion performance sequence; use the absolute value of the slope of the differential value in the differential sequence as the interference trend of the wavelength; and use the average of the interference trend of the wavelengths of all abnormal spectral peaks as the concentration change interference.

6. The method for detecting trace element content in quartz sand according to claim 1, wherein: The method for obtaining the corrected spectral data includes: The offset influence and concentration change interference are combined and normalized to obtain the corrected offset coefficient; The product of the peak width of each abnormal peak in the spectral data of each concentration and the correction offset coefficient is used as the corrected peak width of the abnormal peak; the peak corresponding to the corrected peak width and the non-abnormal peak constitute the corrected spectral data.

7. The method for detecting trace element content in quartz sand according to claim 1, wherein: The method for obtaining the abnormal spectrum peak includes: When the peak overlap index of a spectrum peak is greater than a preset abnormal threshold, the corresponding spectrum peak is regarded as an abnormal spectrum peak.

8. The method for detecting trace element content in quartz sand according to claim 2, wherein: The step of combining the position overlap possibility and the mask overlap possibility of the spectrum peak to obtain the spectrum peak overlap index of the spectrum peak includes: The product of the position overlap possibility and the mask overlap possibility of the spectrum peak is normalized and used as the spectrum peak overlap index of the spectrum peak.

9. The method for detecting trace element content in quartz sand according to claim 4, wherein: Combining the spectral shift index between all the spectral data of two concentrations to obtain the shift impact includes: Normalizing the sum of the spectrum shift indices of the spectrum data of all other concentrations to obtain the shift degree of the spectrum data; The average of the deviations of the spectral data of all concentrations is taken as the deviation influence.

10. The method for detecting trace element content in quartz sand according to claim 6, characterized in that: The method for obtaining the correction offset coefficient includes: The product of the offset influence and the concentration change interference is negatively correlated and normalized to obtain the corrected offset coefficient.

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