Colorful ITO conductive film with heat insulation performance and preparation method thereof

Abstract

The invention relates to the technical field of thin films, and discloses a colorful ITO conductive film with heat insulation performance and a preparation method thereof, the conductive film is characterized in that a functional lamination layer is arranged between two transparent conductive layers, and the functional lamination layer comprises a first composite functional layer, an optical isolation layer and a second composite functional layer from bottom to top. The first composite functional layer and the second composite functional layer are both composed of silver nanoparticles dispersed in a high-refractive-index dielectric matrix, and the silver nanoparticles in the two layers have different size distributions. According to the structure, a precursor film is co-deposited through a magnetron sputtering method, and then silver is self-assembled into nanoparticles through in-situ rapid thermal annealing. By arranging the double composite functional layers and utilizing surface plasmon resonance of two groups of silver nanoparticles with different sizes formed after annealing, broadband high-efficiency blocking of near infrared spectrum is realized, and meanwhile, the film is endowed with stable and non-iridescent color by resonance scattering of the nanoparticles; the film has the advantages of high visible light transmittance, low square resistance and excellent environmental stability.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of thin films, in particular to a colorful ITO conductive film with heat insulation performance and a preparation method thereof. BACKGROUND

[0002] Transparent conductive film is a key component in modern optoelectronic devices, which plays an irreplaceable role in the fields of flat panel display, touch screen, solar cell and smart window. Among them, indium tin oxide film has become the most widely used and mature transparent conductive material due to its high transmittance and low resistivity in the visible light band.

[0003] With the increasing demand for building energy saving and electronic equipment heat management, single transparent conductive function cannot meet the higher level of application requirements. On the basis of ITO film, giving it high efficient heat regulation ability, i.e. effectively blocking the near-infrared thermal radiation in the solar spectrum, has become an important technical development direction. To achieve this purpose, the existing technology usually adopts the structure of inserting a continuous noble metal film (usually silver Ag) in the ITO dielectric layer.

[0004] However, this technical solution has inherent performance constraints. The effective reflection of continuous metal film to infrared depends on its thickness and network integrity, but this usually sacrifices the visible light transmittance, resulting in the overall transparency of the film decreasing. If the metal layer is thinned to ensure transparency, its continuity is easily damaged, not only leading to the weakening of infrared blocking ability, but also causing the sheet resistance of the film to increase significantly. In addition, the thin metal layer in this structure, especially the silver film, is not chemically stable and is easy to agglomerate or oxidize in a hot, humid or oxidizing atmosphere, resulting in the performance of the film deteriorating over time, limiting its application reliability in harsh environments.

[0005] At the same time, in some application scenarios, the film also needs to present a specific color to meet the decorative or identification requirements. The current method to realize the colorization of the film is either by adding organic dyes in the film layer, but such colorants often have poor weather resistance and are easy to decompose and fade under ultraviolet light; or by precisely controlling the thickness of the multi-layer film to produce color by using the interference effect of light, but such interference color usually has a significant iridescence effect, its color will change with the change of observation angle, and the precision requirement of film thickness control is extremely high, increasing the complexity of the process.

[0006] Therefore, the prior art still faces challenges in how to synergistically optimize the visible light transmittance, electrical conductivity, wide-spectrum infrared blocking property, and color diversity and stability of the thin film. Developing a new type of conductive thin film that can realize efficient, wide-spectrum infrared blocking while maintaining excellent photoelectric performance and presenting stable, non-iridescent colors, and a preparation method thereof, is a technical problem that needs to be solved in the field. SUMMARY

[0007] The purpose of the present application is to provide a multi-color ITO conductive film with heat insulation performance and a preparation method thereof, which solves the problem that the transparent conductive thin film in the prior art cannot simultaneously consider high visible light transmittance, low sheet resistance, high-efficiency wide-spectrum infrared blocking, and stable and durable multi-color appearance in a single structure.

[0008] To achieve the above purpose, the present application is implemented by the following technical solutions: A multi-color ITO conductive film with heat insulation performance, sequentially comprising, from the substrate to the top layer: a first transparent conductive layer, a wide-spectrum heat insulation and multi-color function stack, and a second transparent conductive layer.

[0009] The internal structure of the wide-spectrum heat insulation and multi-color function stack is, in order: a first composite function layer, an optical isolation layer, and a second composite function layer.

[0010] The first composite function layer is composed of hafnium dioxide dielectric matrix and first silver nanoparticles dispersedly distributed therein, wherein the atomic percentage of silver is 15 at. % to 35 at. %. The second composite function layer is also composed of hafnium dioxide dielectric matrix and second silver nanoparticles dispersedly distributed therein, wherein the atomic percentage of silver is 5 at. % to 14 at. %.

[0011] In this structure, the different silver atomic concentrations in the two composite function layers cause the formation of first and second silver nanoparticles with different statistical sizes after heat treatment. According to the principle of surface plasmon resonance, the larger first silver nanoparticles produce a resonance absorption peak mainly in the mid-far infrared band in the hafnium dioxide matrix, while the smaller second silver nanoparticles produce a resonance absorption peak mainly in the short-wave near-infrared band. The two physically separated but optically related absorption peaks work together to produce strong absorption and scattering of wide-spectrum near-infrared light from 780 nm to 2500 nm, thereby blocking the transfer of heat energy. At the same time, the tail effect of this plasmonic resonance absorption in the visible light region gives the film a specific color as a whole.

[0012] Further, the conductive film further comprises an interface energy pinning layer with a thickness of 0.5 nm to 2.0 nm between the first transparent conductive layer and the wide-spectrum heat insulation and multi-color functional stack. The material of the pinning layer is aluminum oxide or zirconium oxide. The interface energy pinning layer is used to provide preferential nucleation sites for silver atoms during subsequent heat treatment, thereby affecting the final spatial distribution uniformity and growth morphology of silver nanoparticles.

[0013] Further, the optical isolation layer is used to physically separate the first and second composite functional layers, and the material thereof is hafnium dioxide or silicon dioxide, and the thickness thereof is 10 nm to 30 nm. The isolation layer prevents the cross-layer agglomeration of silver nanoparticles in the two layers, and the specific thickness thereof can cause near-field coupling effects of electromagnetic fields between the two silver nanoparticle arrays.

[0014] Further, the thickness of the first composite functional layer is 15 nm to 30 nm, and the thickness of the second composite functional layer is 10 nm to 25 nm.

[0015] A preparation method of a multi-color ITO conductive film with heat insulation performance, which is continuously completed in a vacuum cycle, comprises the following steps: a. depositing a first transparent conductive layer on a substrate; b. preparing a wide-spectrum heat insulation and multi-color functional stack on the first transparent conductive layer; c. depositing a second transparent conductive layer on the wide-spectrum heat insulation and multi-color functional stack.

[0016] In the step b, the following sub-steps are included: b1. depositing a hafnium dioxide-silver composite film containing 15 at.% to 35 at.% silver atoms as a precursor of the first composite functional layer by a co-sputtering process; b2. depositing an optical isolation layer; b3. depositing a hafnium dioxide-silver composite film containing 5 at.% to 14 at.% silver atoms as a precursor of the second composite functional layer by a co-sputtering process; b4. performing an in-situ rapid thermal annealing treatment on the stack structure formed in steps b1 to b3, and under the driving of heat energy, the supersaturated silver atoms in the two precursor films diffuse and phase separate, respectively nucleate and grow in the respective hafnium dioxide matrix, and self-assemble to form first and second silver nanoparticle arrays with different size distributions.

[0017] Further, in the steps b1 and b3, the setting of the silver atom concentration in the precursor film is realized by controlling the sputtering power ratio of the metal silver target to the sputtering power ratio of the metal hafnium target and the target providing oxygen source in the co-sputtering process.

[0018] Preferably, the in-situ rapid thermal annealing process parameters are: annealing temperature of 350-500℃, and holding time of 60-300s.

[0019] Further, the method can further comprise a step between step a and step b: depositing an interface energy pinning layer to provide nucleation induction for the subsequent self-assembly of silver nanoparticles.

[0020] In summary, the present application has at least one of the following beneficial technical effects: 1. By setting the first and second composite functional layers with two different silver atom concentrations, two groups of silver nanoparticle arrays with different sizes can be formed after heat treatment. The surface plasmon resonance absorption peaks of the two groups of nanoparticle arrays cover different wave bands of the near-infrared spectrum, respectively, and their synergistic effect makes the film strongly absorb and scatter the solar thermal radiation of 780-2500nm, thereby effectively blocking the heat energy transmission and significantly improving the heat insulation efficiency of the product.

[0021] 2. The color of the film of the present application is derived from the tailing effect of the silver nanoparticle plasmon resonance absorption peak in the visible light region. By accurately controlling the doping concentration of silver in the co-sputtering process and the subsequent heat treatment process parameters, the final size and morphology of the silver nanoparticles can be regulated, and the absorption spectrum can be changed, so that the film presents stable, non-interference, and pre-designed multiple colors.

[0022] 3. The present application integrates the wide-spectrum heat insulation and multi-color function of the heat insulation functional unit into two layers of ITO conductive layers, ensuring the overall conductive path; at the same time, the heat insulation mechanism relies on discontinuous nanoparticles rather than continuous metal films, which minimizes the blocking and absorption of visible light. This structural design effectively solves the technical problem that the heat insulation performance, conductivity and transparency are difficult to balance in traditional technology. DETAILED DESCRIPTION

[0023] The present application provides a multi-color ITO conductive film with heat insulation performance and a preparation method thereof, The main raw materials and reagents used in the following examples and comparative examples are as follows, and the reagents not specifically described are commercially available analytical pure or higher grade products.

[0024] Substrate material: Soda-lime float glass, CAS No: 65997-17-3.

[0025] Sputtering target: High purity Indium Tin Oxide target (ITO), purity 99.99%, with a weight ratio of Indium Oxide (In2O3, CAS No: 1312-43-2) to Tin Oxide (SnO2, CAS No: 18282-10-5) of 90:10.

[0026] High purity metal Hafnium target (Hf), purity 99.99%, CAS No: 7440-58-6.

[0027] High purity metal Silver target (Ag), purity 99.99%, CAS No: 7440-22-4.

[0028] High purity Aluminum Oxide target (Al2O3), purity 99.99%, CAS No: 1344-28-1.

[0029] High purity Silicon Dioxide target (SiO2), purity 99.99%, CAS No: 7631-86-9.

[0030] Process gas Argon gas (Ar), purity 99.999%, CAS No: 7440-37-1.

[0031] Oxygen gas (O2), purity 99.999%, CAS No: 7782-44-7.

[0032] Cleaning reagents Acetone, analytical reagent (AR), CAS No: 67-64-1.

[0033] Ethanol, anhydrous, analytical reagent (AR), CAS No: 64-17-5.

[0034] Deionized water, resistivity ≥ 18.2 MΩ·cm.

[0035] Example 1: The embodiment provides a preparation method of a colorful ITO conductive film with heat insulation performance, and specific steps are as follows: (1) take a piece of 100mmx100mmx1.1mm sodium calcium float glass substrate, and sequentially place it in acetone, anhydrous ethanol and deionized water for ultrasonic cleaning for 15 minutes, then blow dry with high-purity nitrogen, and place it on a sample table of a multifunctional high-vacuum magnetron sputtering device. The vacuum chamber is pumped to 8.0x10 -5 Pa.

[0036] (2) Depositing a first transparent conductive layer on the substrate: argon gas with a flow rate of 30 sccm and oxygen gas with a flow rate of 1.2 sccm are introduced, and the working pressure is maintained at 0.5 Pa. A direct current power supply is turned on to sputter an indium tin oxide target at a power of 150 W to deposit an ITO film with a thickness of 100 nm.

[0037] (3) Depositing a precursor film of a first composite functional layer: argon gas with a flow rate of 60 sccm and oxygen gas with a flow rate of 2.5 sccm are introduced, and the working pressure is maintained at 0.6 Pa. A direct current power supply is turned on to sputter a hafnium target and a silver target at powers of 80 W and 15 W, respectively; meanwhile, a radio frequency power supply is turned on to sputter an indium tin oxide target at a power of 100 W. A HfO2(Ag) composite film with a thickness of 20 nm is co-sputtered and deposited.

[0038] (4) Depositing an optical isolation layer: the hafnium target and the silver target are turned off, and argon gas with a flow rate of 40 sccm is introduced, and the working pressure is maintained at 0.4 Pa. A radio frequency power supply is turned on to sputter a silicon dioxide target at a power of 200 W to deposit a SiO2 film with a thickness of 20 nm.

[0039] (5) Depositing a precursor film of a second composite functional layer: the process parameters are basically the same as those in step (3), except that the sputtering power of the silver target is reduced to 5 W. A HfO2(Ag) composite film with a thickness of 15 nm is co-sputtered and deposited.

[0040] (6) In-situ rapid thermal annealing: all sputtering sources are turned off, and the heating module in the chamber is started to heat the substrate to 400℃ at a heating rate of 5℃ / s, and the temperature is maintained at 400℃ for 180 seconds. Then, it is naturally cooled to room temperature.

[0041] (7) Depositing a second transparent conductive layer: the process parameters are completely the same as those in step (2), and an ITO film with a thickness of 100 nm is deposited.

[0042] After all the steps are completed, the sample is taken out, and the conductive film sample of Example 1 is obtained.

[0043] Example 2 This example provides a method for preparing a multi-color ITO conductive film with heat insulation performance comprising an interface energy pinning layer. The preparation steps are basically the same as those in Example 1, except that the following step (2a) is added between step (2) and step (3) of Example 1: (2a) Depositing an interface energy pinning layer: argon gas with a flow rate of 50 sccm is introduced, and the working pressure is maintained at 0.7 Pa. A radio frequency power supply is turned on to sputter an aluminum oxide target at a power of 50 W to deposit an Al2O3 film with a thickness of 1.0 nm.

[0044] After all the steps are completed, the sample is taken out, and the conductive film sample of Example 2 is obtained.

[0045] Example 3 This example provides a preparation method of a multi-color ITO conductive film with thermal insulation performance and different optical properties. The preparation steps are basically the same as those of Example 1, and the only difference is that the power of the metal silver target in the co-sputtering process is adjusted. Specifically, the power of the metal silver target in the co-sputtering process is adjusted. In step (3), the sputtering power of the metal silver target is adjusted to 20 W. In step (5), the sputtering power of the metal silver target is adjusted to 8 W.

[0046] The remaining steps and process parameters are consistent with those of Example 1. After completing all the steps, the sample is taken out, and the conductive film sample of Example 3 is obtained.

[0047] Comparative Example 1 Compared with Example 1, the difference is that after the deposition of the precursor film of the first composite functional layer in step (3) is completed, steps (4) and (5) are omitted, and step (6) is directly performed. The remaining steps and process parameters are the same.

[0048] Comparative Example 2 Compared with Example 1, the difference is that after the deposition of the first transparent conductive layer in step (2) is completed, steps (3) and (4) are omitted, and step (5) is directly performed. The remaining steps and process parameters are the same.

[0049] Comparative Example 3 This comparative example prepares a traditional thermal insulation conductive film with an ITO / Ag / ITO three-layer structure. The preparation method is as follows: After completing steps (1) and (2) of Example 1, steps (3) to (6) are replaced by the following steps: argon gas with a flow rate of 30 sccm is introduced, the working pressure is maintained at 0.5 Pa, the direct current power supply is turned on, the metal silver target is sputtered at a power of 80 W, and a continuous metal silver film with a thickness of 15 nm is deposited. Subsequently, the same process as step (7) of Example 1 is performed to deposit the second transparent conductive layer.

[0050] Test Example 1 Experimental steps: Optical performance test Test equipment: UV-Vis-NIR spectrophotometer (PerkinElmer, Lambda 950 type, USA).

[0051] Test procedure: Put each sample (Examples 1-3, Comparative Examples 1-3) into the sample chamber of the spectrophotometer in turn, with air as the reference. Set the scanning parameters, and scan the sample in the wavelength range of 300 nm to 2500 nm to obtain the continuous transmission spectrum data of each sample.

[0052] Data processing: According to the obtained transmission spectrum data, the following calculations were made: Visible light average transmittance (T vis ): According to the national standard GB / T 2680-2021, the spectral data in the wavelength range of 380 nm to 780 nm were calculated to obtain the average transmittance in the visible light region.

[0053] Near-infrared barrier rate (IRR): First, calculate the arithmetic average transmittance (T nir ) of all data points of the sample in the wavelength range of 780 nm to 2500 nm, and then calculate the near-infrared barrier rate according to the formula IRR (%) = (1-T nir ) x 100%.

[0054] Electrical performance test Test equipment: Four-probe tester (Suzhou Jili Electronics Co., Ltd., RTS-8 type).

[0055] Test procedure: Place the sample on an insulating platform, and use the four-probe probe to press vertically on the surface of the sample. Select five mutually distant positions on the surface of each sample without obvious defects for measurement.

[0056] Data processing: Record the sheet resistance readings of the five positions, and calculate the arithmetic mean value as the final sheet resistance (Rs) of the sample.

[0057] Experimental data: The sample performance test results of Examples 1-3 and Comparative Examples 1-3 are summarized in Table 1.

[0058] Table 1. Optical and electrical performance test results of each sample The data in Table 1 show that the film layer structure described in the technical solution has a specific effect on optical and electrical properties. The near-infrared barrier rates of the samples of Examples 1, 2, and 3 are significantly higher than those of Comparative Examples 1 and 2. This result is directly related to the film layer structure: Comparative Example 1 only contains a high-concentration silver composite functional layer, and Comparative Example 2 only contains a low-concentration silver composite functional layer. Both of them can only form silver nanoparticles with a relatively single size distribution, and the coverage waveband of the surface plasmon resonance absorption peak is limited. The double composite functional layer structure in the examples forms two groups of silver nanoparticles with different size distributions through thermal annealing self-assembly, producing two physically separated but optically coupled absorption peaks, thereby achieving effective blocking of a wide spectral range of near-infrared light.

[0059] By comparing the data of Example 1 with Comparative Example 3, the performance differences of different technical solutions can be observed. Comparative Example 3 adopts a continuous silver metal film structure, which has a high near-infrared barrier rate, but a low visible light transmittance value. Example 1 adopts a structure in which non-continuous silver nanoparticles are dispersed in a hafnium dioxide dielectric matrix, which has a high near-infrared barrier rate while having a higher visible light transmittance value than Comparative Example 3. This shows that the structure design of the technical solution can reduce the negative impact on visible light transmittance performance while achieving the function of infrared heat blocking.

[0060] The internal data of Examples 1, 2, and 3 further reveals the regulating effect of structure parameters on performance. Example 2, compared to Example 1, has an interface energy pinning layer added between the first transparent conductive layer and the functional stack, and the test results show that the visible light transmittance and the near-infrared barrier rate are both slightly improved, while the sheet resistance is slightly reduced. The data of Example 3 shows that by changing the atomic concentration of silver in the co-sputtering process, the photoelectric properties of the final film can be systematically adjusted. All examples have a sheet resistance of less than 10 Ω / sq, proving that an effective electrical path is formed between the multi-layer functional structure and the ITO conductive layer.

[0061] Test Example 2: To objectively evaluate the performance stability of the above examples and comparative sample under long-term thermal load, the following method is used for accelerated aging test.

[0062] Experimental steps: Initial performance measurement For all newly prepared samples (Examples 1-3, Comparative Examples 1-3), according to the experimental steps described in Test Example 1, the initial average visible light transmittance (T vis initial ), the initial near-infrared barrier rate (IR initial ), and the initial sheet resistance (Rs initial ) of the samples are measured.

[0063] Accelerated heat aging treatment Test equipment: programmable constant temperature and humidity test chamber.

[0064] Test procedure: all samples that have completed initial performance measurement were placed in the test chamber. The chamber environment was set to constant dry heat condition, temperature at 150℃, relative humidity less than 5%. All samples were continuously placed under this condition for 100 hours.

[0065] Post-aging performance measurement After the aging treatment was completed, all samples were taken out and placed in a room temperature environment for natural cooling for at least 2 hours.

[0066] Using the exact same equipment and steps as the initial performance measurement, the post-aging samples were measured to obtain their post-aging visible light average transmittance (T vis aged ), post-aging near-infrared barrier rate (IR aged R) and post-aging sheet resistance (Rs aged ).

[0067] Data processing To quantify the changes in performance, the change rates of each performance parameter were calculated. The calculation formula is as follows: Sheet resistance change rate (%) = [(Rs aged -Rs initial ) / Rs initial ] x 100% Visible light transmittance change amount (ΔT vis , %) = T vis aged -T vis initial Near-infrared barrier rate change amount (ΔIR, %) = IRR aged - IRR initial ; Experimental data: The performance parameter change of the samples of Examples 1-3 and Comparative Examples 1-3 after heat stability test is summarized in Table 2.

[0068] Table 2. Performance parameter changes of each sample after heat stability test The data in Table 2 directly reflects the performance retention ability of different film layer structures after long-term heat treatment. The samples of Examples 1, 2, and 3 maintain the change range of the three core performance indicators of sheet resistance, visible light transmittance, and near-infrared barrier rate within a small range. In contrast, the samples of Comparative Examples 1, 2, and 3, especially Comparative Example 3, have significantly deteriorated performance indicators.

[0069] The difference in stability is due to the intrinsic difference in microstructure of the film layers. In the structure described in the examples, the silver nanoparticles as the functional core are completely coated and fixed in the hafnium dioxide dielectric matrix which is stable in physical and chemical properties. The matrix structure effectively inhibits the surface diffusion and migration of silver atoms under high temperature conditions, thereby maintaining the stability of the size, morphology and spatial distribution of the silver nanoparticles, which is the fundamental reason for the stability of the surface plasmon resonance effect and the overall photoelectric performance of the film.

[0070] In contrast, the continuous silver metal film in Comparative Example 3 is extremely prone to solid-state phase transition under the drive of thermal energy, and appears to be holey and agglomerated, resulting in the destruction of its conductive network, a sharp rise in its square resistance, and irreversible changes in its optical response, which causes the simultaneous decline of its heat insulation and light transmission performance. The single-layer nanoparticle structure of Comparative Examples 1 and 2, although better than the continuous film, still has limited thermal stability due to the lack of the constraints of the double-layer structure and the matching of specific materials. Therefore, the double-composite functional layer structure described in the technical solution can effectively improve the service life and performance reliability of the conductive film under harsh application environments.

[0071] Although embodiments of the present application have been shown and described, it is to be understood that various modifications, substitutions, replacements and changes can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A multicolored ITO conductive film with heat insulation properties, characterized in that, From base to top layer, the following are included: First transparent conductive layer; a broadband thermal insulation and multi-color functional stack; Second transparent conductive layer; The broadband thermal insulation and multi-color functional laminate includes: The first composite functional layer is composed of a hafnium dioxide dielectric matrix and first silver nanoparticles with an atomic concentration of 15 at.% to 35 at.% dispersed therein; Optical isolation layer; The second composite functional layer is composed of a hafnium dioxide dielectric matrix and second silver nanoparticles dispersed therein with an atomic concentration of 5 at.% to 14 at.%.

2. The multicolored ITO conductive film with heat insulation properties according to claim 1, characterized in that, Between the first transparent conductive layer and the broadband thermal insulation and multi-color functional stack, there is also an interfacial energy pinning layer with a thickness of 0.5 nm to 2.0 nm.

3. A multi-colored ITO conductive film with heat insulation properties according to claim 2, characterized in that, The material of the interfacial anchoring layer is alumina or zirconium oxide.

4. A multi-colored ITO conductive film with heat insulation properties according to claim 1, characterized in that, The optical isolation layer is made of hafnium dioxide or silicon dioxide.

5. A multi-colored ITO conductive film with heat insulation properties according to claim 1, characterized in that, The thickness of the optical isolation layer is 10 nm to 30 nm.

6. A multi-colored ITO conductive film with heat insulation properties according to claim 1, characterized in that, The thickness of the first composite functional layer is 15 nm to 30 nm, and the thickness of the second composite functional layer is 10 nm to 25 nm.

7. A method for preparing a multi-colored ITO conductive film with heat insulation properties, applied to the multi-colored ITO conductive film with heat insulation properties as described in any one of claims 1-6, characterized in that, Includes the following steps: a. Deposit a first transparent conductive layer on the substrate; b. A broadband thermal insulation and multi-color functional stack is prepared on the first transparent conductive layer by co-sputtering and in-situ thermal annealing self-assembly process; b1. Precursor film for co-sputtering deposition of the first composite functional layer; b2. Deposit an optical isolation layer; b3. Precursor film for co-sputtering deposition of the second composite functional layer; b4. Perform in-situ rapid thermal annealing on the stack formed in steps b1 to b3, so that the silver atoms in the precursor film self-assemble into nanoparticles. c. Deposit a second transparent conductive layer on the broadband thermal insulation and multicolor functional stack.

8. The method for preparing a multi-colored ITO conductive film with heat insulation properties according to claim 7, characterized in that, Between step a and step b, there is also step a1: depositing an interfacial pinning layer.

9. The method for preparing a multicolored ITO conductive film with heat insulation properties according to claim 7, characterized in that, The in-situ rapid thermal annealing temperature in step b4 is 350°C to 500°C, and the holding time is 60s to 300s.

10. A method for preparing a multicolored ITO conductive film with heat insulation properties according to claim 7, characterized in that, The co-sputtering deposition process in steps b1 and b3 controls the concentration of silver atoms in the precursor film by controlling the sputtering power ratio between the silver target and other targets.

Images