Photovoltaic glass surface self-cleaning coating and preparation method thereof

Abstract

The invention provides a photovoltaic glass surface self-cleaning coating and a preparation method thereof.The photovoltaic glass surface self-cleaning coating is prepared from a dehydrated organic solvent, 1-7 parts by mass of tetramethyl orthosilicate, 2-15 parts by mass of fluorosilane hydrophobic coupling agent, 10-20 parts by mass of silicon tetrachloride, 1-10 parts by mass of hydrophobic silane coupling agent, 5-15 parts by mass of dichloro (methyl) (3, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5- and 1-10 parts of 2, 3, 3-trifluoropropyl) silane and 1-10 parts of dimethyl dichlorosilane. According to the preparation method, tetramethyl silicate with relatively low reaction activity is used as a raw material to react with silicon tetrachloride to form an intermediate species with moderate activity, and then a linear chain polymer modification layer is pre-formed on the surface by utilizing the difference of reaction rates; a fluorosilane substance added in the coating also can participate in the reaction to form an organic silicon linear polymer with a fluorosilane side chain; in the recombination process of polysiloxane, perfluoro side chains with lower surface energy migrate to the surface of the coating; meanwhile, by adding the dichlorosilane coupling agent and the trichlorosilane coupling agent, the flexibility and hydrophobicity of the coating are improved.

Description

Technical Field

[0001] This invention relates to the field of coating technology, specifically to a self-cleaning coating for photovoltaic glass surfaces and its preparation method. Background Technology

[0002] With the rapid development of photovoltaic (PV) power generation technology, the large-scale application of PV modules has placed higher demands on power generation efficiency and long-term reliability. As a crucial component of PV modules, the surface cleanliness of PV glass directly affects light transmittance and energy conversion efficiency. However, PV glass is exposed to the outdoor environment for extended periods, making its surface susceptible to contaminants such as dust, oil, bird droppings, and rain stains. This leads to increased light reflectivity and decreased light transmittance, significantly reducing module power generation efficiency (literature indicates that dust accumulation can cause PV module efficiency losses as high as 20%-30%). Furthermore, manual or mechanical cleaning methods are costly and risk damaging the glass surface, especially in desertified areas or areas with severe industrial pollution, where cleaning and maintenance issues are even more prominent.

[0003] To address the aforementioned issues, self-cleaning coating technology has gradually become a research hotspot. In existing technologies, self-cleaning coatings are mainly divided into two categories: superhydrophobic coatings and photocatalytic hydrophilic coatings. Superhydrophobic coatings achieve a "lotus effect" by constructing micro-nano rough structures, making it difficult for pollutants to adhere and allowing them to be washed away by rainwater; photocatalytic coatings (such as TiO2-based materials) generate active oxygen species through photoexcitation to decompose organic pollutants, and utilize their hydrophilicity to allow the pollutants to detach with the water flow.

[0004] However, existing technologies still have the following drawbacks:

[0005] 1. Insufficient durability: The micro-nano structure of superhydrophobic coatings is easily damaged by ultraviolet rays, acid rain or mechanical friction, resulting in rapid decay of hydrophobic properties; while the activity of photocatalytic coatings decreases significantly under weak light or no light conditions, and the photocatalytic material may fail due to crystal phase transformation or shedding after long-term use.

[0006] 2. The balance between light transmittance and self-cleaning performance: Improper coating thickness or material selection can reduce the light transmittance of photovoltaic glass. For example, although some metal oxide nanoparticles (such as ZnO) have photocatalytic properties, their light scattering characteristics can lead to a decrease in light transmittance.

[0007] 3. Complexity and cost of preparation process: Existing coatings mostly adopt sol-gel method, chemical vapor deposition (CVD) or magnetron sputtering technology, which have the problems of complicated process, high equipment investment or difficulty in large-scale production. For example, SiO2 / TiO2 composite coating requires multiple high-temperature sintering steps, which consumes a lot of energy and is prone to thermal stress damage to glass substrate.

[0008] Furthermore, the specific requirements of photovoltaic glass surfaces (such as high weather resistance and resistance to UV aging) further limit the applicability of traditional coatings. Therefore, there is an urgent need to develop a photovoltaic glass surface coating technology that combines high light transmittance, long-lasting self-cleaning performance, strong environmental adaptability, and efficient industrial-scale preparation. Summary of the Invention

[0009] This invention addresses the self-cleaning problem of photovoltaic glass by providing a self-cleaning coating for photovoltaic glass surfaces and its preparation method. It utilizes tetramethyl silicate, a material with low reactivity, to react with silicon tetrachloride to form a moderately reactive intermediate species. Then, taking advantage of the difference in reaction rates, a linear chain polymer modification layer is pre-formed on the surface. Fluorosilanes added to the coating can also participate in this type of reaction, forming an organosilicon linear polymer with fluorosilane side chains. During the recombination process of polysiloxanes, the surface energy difference between the perfluorinated side chains and the polysiloxanes is significant, leading to microphase separation during molecular chain movement. This promotes the migration of the lower surface energy perfluorinated side chains to the coating surface. Simultaneously, the addition of dichlorosilane and trichlorosilane coupling agents improves the flexibility and hydrophobicity of the coating.

[0010] This invention provides a self-cleaning coating for photovoltaic glass surfaces. The raw materials include a dehydrated organic solvent, 1-7 parts by weight of methyl orthosilicate, 2-15 parts by weight of fluorosilane hydrophobic coupling agent, 10-20 parts by weight of silicon tetrachloride, 1-10 parts by weight of hydrophobic silane coupling agent, 5-15 parts by weight of dichloro(methyl)(3,3,3-trifluoropropyl)silane, and 1-10 parts by weight of dimethyldichlorosilane.

[0011] The dehydrated organic solvent is obtained by adding 5-8 parts of anhydrous calcium chloride to 20-80 parts of organic solvent to remove water and then filtering out the calcium chloride residue.

[0012] The fluorosilane hydrophobic coupling agent is 1H,1H,2H,2H-perfluorodecyltrichlorosilane, and the hydrophobic silane coupling agent is dodecyltrichlorosilane.

[0013] In a preferred embodiment of the self-cleaning coating for photovoltaic glass surface described in this invention, the organic solvent is n-hexane, n-pentane, or diethyl ether, and the mass ratio of anhydrous calcium chloride to the organic solvent is 1:7 to 1:11.

[0014] Dichloro(methyl)(3,3,3-trifluoropropyl)silane and dimethyldichlorosilane are both lubricants and flexibility agents;

[0015] The self-cleaning coating on the photovoltaic glass surface includes a polysiloxane with a linear chain polymer modification layer and an organosilicon linear polymer with fluorosilane side chains.

[0016] This invention provides a method for preparing a self-cleaning coating on a photovoltaic glass surface, comprising the following steps:

[0017] S1. Add 5-8 parts by weight of anhydrous calcium chloride to 20-80 parts by weight of organic solvent, stir, let stand for 2-4 hours, filter to remove residual calcium chloride, and obtain dehydrated organic solvent; the organic solvent is n-hexane, n-pentane, or diethyl ether.

[0018] S2. Add 1-7 parts by weight of methyl orthosilicate, 2-15 parts by weight of 1H,1H,2H,2H-perfluorodecyltrichlorosilane, and 10-20 parts by weight of silicon tetrachloride to the dehydrated organic solvent in sequence.

[0019] Methyl orthosilicate reacts with silicon tetrachloride to form an intermediate species, and then the difference in reaction rate is used to form a polysiloxane with a linear chain polymer modification layer.

[0020] Methyl orthosilicate, 1H,1H,2H,2H-perfluorodecyltrichlorosilane and silicon tetrachloride form an organosilicon linear polymer with fluorosilane side chains;

[0021] Polysiloxanes with linear chain polymer modification layers and organosilicon linear polymers with fluorosilane side chains exhibit microphase separation behavior due to differences in surface energy.

[0022] S3. Add 1-10 parts by weight of dodecyltrichlorosilane and 5-15 parts by weight of dichloro(methyl)(3,3,3-trifluoropropyl)silane sequentially to adjust flexibility and hydrophobicity.

[0023] S4. Add 1-10 parts by mass of dimethyldichlorosilane and stir evenly to disperse, thereby obtaining a self-cleaning hydrophobic coating with dust-proof effect;

[0024] S5. A method for preparing a self-cleaning coating on a photovoltaic glass surface is completed by repeatedly immersing and removing the photovoltaic glass in a self-cleaning hydrophobic coating with dust-proof effect 1-20 times, or by spraying, vapor deposition, or spin coating.

[0025] In the method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, as a preferred embodiment, in step S1, the filtration method is vacuum filtration or syringe filtration; in step S1, magnesium sulfate, molecular sieves, or silica gel can also be used instead of anhydrous calcium chloride for organic solvent dehydration.

[0026] The method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, as a preferred embodiment, involves the following process in step S2: obtaining the polysiloxane with a linear chain polymer modification layer:

[0027]

[0028] The method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, as a preferred embodiment, involves the following process in step S2: obtaining the organosilicon linear polymer with fluorosilane side chains.

[0029]

[0030] In a preferred embodiment of the method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, in step S3, dodecyltrichlorosilane is used to reduce the surface energy of the self-cleaning coating.

[0031] The dichloro(methyl)(3,3,3-trifluoropropyl)silane in step S3 and the dimethyldichlorosilane in step S4 are both used to promote the sliding of water droplets off the self-cleaning coating surface and increase the coating's flexibility.

[0032] In the preferred embodiment of the method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, the ambient humidity in steps S2 to S4 is 15 to 25%.

[0033] In the preferred embodiment of the method for preparing a self-cleaning coating on a photovoltaic glass surface according to the present invention, the dispersion method in step S4 is ultrasonic dispersion and the process container is in a closed state.

[0034] The self-cleaning coating for photovoltaic glass surfaces of the present invention is composed of the following raw materials: methyl orthosilicate, silicon tetrachloride, hexane / pentane / ethyl ether, dimethyl dichlorosilane, dodecyl trichlorosilane, and dichloro(methyl)(3,3,3-trifluoropropyl)silane. Specifically, methyl orthosilicate comprises 1-7 parts, 1H,1H,2H,2H-perfluorodecyl trichlorosilane 2-15 parts, hexane / pentane / ethyl ether 20-80 parts, silicon tetrachloride 10-20 parts, dimethyl dichlorosilane 1-10 parts, dodecyl trichlorosilane 1-10 parts, dichloro(methyl)(3,3,3-trifluoropropyl)silane 5-15 parts, and anhydrous calcium chloride 5-8 parts. The specific preparation steps are as follows:

[0035] (1) Add 5-8 parts of anhydrous calcium chloride to 20-80 parts of n-hexane / n-pentane / diethyl ether according to the mass fraction, stir and let stand for 2-4 hours to remove water from the solvent;

[0036] Dehydrating agents include, but are not limited to, calcium chloride, such as magnesium sulfate, molecular sieves, and silica gel.

[0037] (2) Filter the n-hexane containing anhydrous calcium chloride to remove calcium chloride residue in the n-hexane; the filtration method includes, but is not limited to, vacuum filtration, syringe filtration and other methods.

[0038] (3) Add 1-7 parts of methyl orthosilicate to the dehydrated hexane / pentane / diethyl ether according to the mass fraction;

[0039] (4) Add 2-15 parts by mass of 1H,1H,2H,2H-perfluorodecyltrichlorosilane to the above system;

[0040] (5) Add 10-20 parts of silicon tetrachloride to the above system according to the mass fraction;

[0041] (6) Add 1-10 parts of dodecyltrichlorosilane to the above system according to the mass fraction;

[0042] (7) Add 5-15 parts of dichloro(methyl)(3,3,3-trifluoropropyl)silane to the above system according to the mass fraction;

[0043] (8) Add 1-10 parts of dimethyldichlorosilane to the above system according to the mass fraction and stir evenly to obtain a self-cleaning coating with dustproof effect.

[0044] (9) The photovoltaic glass is repeatedly immersed and retrieved from the hydrophobic coating 1-20 times, or a self-cleaning coating is obtained on the surface by spraying, vapor deposition or other methods.

[0045] In steps (3)(4)(5)(6)(7)(8), the ambient humidity should be maintained between 15-25%.

[0046] In step (3), the specific number of parts of methyl orthosilicate 1-7 is 1, 1.1, 1.2, 2, 2.5, etc., and the specific number of parts is not listed in detail.

[0047] In steps (4), (5), and (6), the number of parts includes, but is not limited to, integers; the specific number of parts is not listed in detail.

[0048] In step (7), the method of forming a film on the surface is not limited to repeated immersion and retrieval, but also includes vapor deposition, spin coating, spray coating and other methods.

[0049] In step (8), the dispersion method is ultrasonic dispersion and the process container is in a closed state.

[0050] Although some studies have utilized silicon tetrachloride to directly form silica nanostructures, the molecular weight of silica decreases sharply (from 169.9 to 60.08) during the reaction, while the density increases (silicon tetrachloride becomes 1.48 g / cm³). 3 2.65 g / cm³ of silicon dioxide 3 This causes the formed silica coating to shrink drastically and break into nanoparticles, making it impossible to obtain a continuous and firmly adhered coating.

[0051] This technology utilizes tetramethyl silicate, which has relatively low reactivity, as a raw material to react with silicon tetrachloride to form an intermediate species with moderate reactivity. Then, taking advantage of the difference in reaction rates, a linear chain polymer modification layer is pre-formed on the surface. These polysiloxanes are liquid at room temperature, allowing for free chain extension and recombination, thus avoiding coating damage and decreased adhesion caused by severe shrinkage. The specific reaction process is shown in the figure below:

[0052]

[0053] Fluorosilanes added to the coating can also participate in this type of reaction, forming linear organosilicon polymers with fluorosilane side chains. During the recombination process of polysiloxanes, the surface energy difference (8-15 mN / m) between the perfluorinated side chains and the polysiloxane is significant, leading to microphase separation during molecular chain movement. This promotes the migration of the lower surface energy perfluorinated side chains to the coating surface. This allows this technology to achieve superior overall performance with the same amount of perfluorinated compound added, as shown in the reaction diagram below:

[0054]

[0055] 1H,1H,2H,2H-perfluorodecyltrichlorosilane and dodecyltrichlorosilane are hydrophobic silane coupling agent molecules with similar structures and uses. They can reduce the surface energy of the coating, that is, reduce the adhesion of dust to the coating; at the same time, they can increase the rigidity of the coating. However, if the content is too high, it will easily cause whitening.

[0056] Dichloro(methyl)(3,3,3-trifluoropropyl)silane and dimethyldichlorosilane are silane coupling agent molecules with similar properties. They can increase the lubricity of the coating surface, that is, promote the sliding of water droplets off the coating surface; at the same time, they can increase the flexibility of the coating, reduce cracking and whitening.

[0057] In this invention, tetrachlorosilane mainly plays a structural role, while trichlorosilane contains functional groups. Adjusting the proportions of each component can improve the overall dustproof, waterproof, and light transmittance performance of the coating. This invention adjusts the content of the components to suit the characteristics of photovoltaic glass. Dichlorosilane increases flexibility and improves water resistance but slightly reduces dustproof performance (the decrease in surface hardness increases the adhesion of dust, while liquids easily roll and slide off its surface). Since photovoltaic glass is primarily dustproof, the proportions of dichlorosilane and trichlorosilane are adjusted.

[0058] The present invention has the following advantages:

[0059] (1) This invention utilizes tetramethyl silicate, which has low reactivity, as a raw material to react with silicon tetrachloride to form an intermediate species with moderate reactivity. Then, taking advantage of the difference in reaction rates, a linear chain polymer modification layer is pre-formed on the surface. Fluorosilanes added to the coating can also participate in this type of reaction, forming organosilicon linear polymers with fluorosilane side chains. During the recombination process of polysiloxanes, the surface energy difference between the perfluorinated side chains and the polysiloxanes (8-15 mN / m) is significant, thus causing microphase separation behavior during molecular chain movement, promoting the migration of the lower surface energy perfluorinated side chains to the coating surface. This allows this technology to achieve superior overall performance under the same perfluorinated compound addition conditions.

[0060] (2) In this invention, dichlorosilane is used to increase flexibility and trichlorosilane is used to increase hydrophobicity. The ratio of dichlorosilane and trichlorosilane is adjusted to take into account the usage environment of photovoltaic glass. Attached Figure Description

[0061] Figure 1 A flowchart of a self-cleaning coating for photovoltaic glass surface and its preparation method;

[0062] Figure 2 Example 1: Comparison of light transmittance before and after sand and dust test for a self-cleaning coating on photovoltaic glass surface and its preparation method;

[0063] Figure 3 Example 1 shows a comparison of the dustproofing effect of a photovoltaic glass surface before (top) and after (bottom) treatment of a self-cleaning coating on the surface and its preparation method.

[0064] Figure 4 Example 2: Comparison of light transmittance before and after sand and dust test for a self-cleaning coating on photovoltaic glass surface and its preparation method;

[0065] Figure 5 Example 2 shows a comparison of the dustproofing effect of a photovoltaic glass surface before (top) and after (bottom) treatment of a self-cleaning coating for the surface of photovoltaic glass and its preparation method.

[0066] Figure 6 Example 3: Comparison of light transmittance before and after sand and dust test for a self-cleaning coating on photovoltaic glass surface and its preparation method;

[0067] Figure 7 Example 3 shows a comparison of the dustproofing effect of a photovoltaic glass surface before (top) and after (bottom) treatment of a self-cleaning coating for the surface of photovoltaic glass and its preparation method. Detailed Implementation

[0068] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0069] Example 1

[0070] like Figure 1 As shown, a self-cleaning coating for photovoltaic glass surface and its preparation method are described, comprising the following raw materials: methyl orthosilicate, silicon tetrachloride, n-hexane, dimethyl dichlorosilane, dodecyl trichlorosilane, and dichloro(methyl)(3,3,3-trifluoropropyl)silane. Specifically, methyl orthosilicate comprises 3 parts, 1H,1H,2H,2H-perfluorodecyl trichlorosilane 5 parts, n-hexane 40 parts, silicon tetrachloride 10 parts, dimethyl dichlorosilane 2 parts, dodecyl trichlorosilane 5 parts, dichloro(methyl)(3,3,3-trifluoropropyl)silane 7 parts, and anhydrous calcium chloride 5 parts. The specific preparation steps are as follows:

[0071] (1) Add 5 parts of anhydrous calcium chloride to 40 parts of n-hexane according to the mass fraction, stir and let stand for 2-4 hours to remove water from the solvent;

[0072] (2) Filter the n-hexane containing anhydrous calcium chloride to remove calcium chloride residue from the n-hexane;

[0073] (3) Add 3 parts of methyl orthosilicate to the dehydrated hexane / pentane / diethyl ether according to the mass fraction;

[0074] (4) Add 5 parts by mass of H,1H,2H,2H-perfluorodecyltrichlorosilane to the above system;

[0075] (5) Add 10 parts of silicon tetrachloride to the above system according to the mass fraction;

[0076] (6) Add 5 parts of dodecyltrichlorosilane to the above system according to the mass fraction;

[0077] (7) Add 7 parts of dichloro(methyl)(3,3,3-trifluoropropyl)silane to the above system according to the mass fraction;

[0078] (8) Add 2 parts of dimethyldichlorosilane to the above system according to the mass fraction and stir evenly to obtain a self-cleaning coating with dustproof effect.

[0079] (9) The photovoltaic glass is repeatedly immersed and retrieved from the hydrophobic coating 10 times, or a self-cleaning coating is obtained on the surface by spraying, vapor deposition or other methods.

[0080] Example 2

[0081] like Figure 1As shown, a self-cleaning coating for photovoltaic glass surface and its preparation method are described, comprising the following raw materials: methyl orthosilicate, silicon tetrachloride, n-pentane, dimethyldichlorosilane, dodecyltrichlorosilane, and dichloro(methyl)(3,3,3-trifluoropropyl)silane. Specifically, methyl orthosilicate comprises 2 parts, 1H,1H,2H,2H-perfluorodecyltrichlorosilane 9 parts, n-pentane 80 parts, silicon tetrachloride 15 parts, dimethyldichlorosilane 5 parts, dodecyltrichlorosilane 8 parts, dichloro(methyl)(3,3,3-trifluoropropyl)silane 5 parts, and anhydrous calcium chloride 8 parts.

[0082] The preparation method of the self-cleaning coating on the photovoltaic glass surface in this embodiment is the same as in Embodiment 1.

[0083] Example 3

[0084] like Figure 1 As shown, a self-cleaning coating for photovoltaic glass surface and its preparation method are described, comprising the following raw materials: methyl orthosilicate, silicon tetrachloride, diethyl ether, dimethyl dichlorosilane, dodecyl trichlorosilane, and dichloro(methyl)(3,3,3-trifluoropropyl)silane. Specifically, methyl orthosilicate comprises 7 parts, 1H,1H,2H,2H-perfluorodecyl trichlorosilane comprises 7 parts, diethyl ether comprises 60 parts, silicon tetrachloride comprises 11 parts, dimethyl dichlorosilane comprises 3 parts, dodecyl trichlorosilane comprises 2 parts, dichloro(methyl)(3,3,3-trifluoropropyl)silane comprises 10 parts, and anhydrous calcium chloride comprises 6 parts.

[0085] The preparation method of the self-cleaning coating on the photovoltaic glass surface in this embodiment is the same as in Embodiment 1.

[0086] like Figures 2-7 The figures show the implementation effects of Examples 1-3. It can be seen that the light transmittance of the photovoltaic glass treated with the self-cleaning coating in Examples 1-3, after sand and dust testing according to national standards, is significantly higher than that of the untreated photovoltaic glass. Figure 3 , 5 In section 7, the upper part shows the sample after the dustproof test before the self-cleaning coating treatment, and the lower part shows the sample after the dustproof test following the self-cleaning coating treatment. Figures 2-7 It can be seen that after dustproof testing according to national standards, it is significantly more transparent than untreated photovoltaic glass, and the dustproof effect is very good.

[0087] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A self-cleaning coating for photovoltaic glass surfaces, characterized in that: The raw materials include a dehydrated organic solvent, 1-7 parts by weight of methyl orthosilicate, 2-15 parts by weight of fluorosilane hydrophobic coupling agent, 10-20 parts by weight of silicon tetrachloride, 1-10 parts by weight of hydrophobic silane coupling agent, 5-15 parts by weight of dichloro(methyl)(3,3,3-trifluoropropyl)silane and 1-10 parts by weight of dimethyldichlorosilane; The dehydrated organic solvent is obtained by adding 5-8 parts of anhydrous calcium chloride to 20-80 parts by weight of an organic solvent to remove water and then filtering out calcium chloride residue. The fluorosilane hydrophobic coupling agent is 1H,1H,2H,2H-perfluorodecyltrichlorosilane, and the hydrophobic silane coupling agent is dodecyltrichlorosilane.

2. The self-cleaning coating for photovoltaic glass surface according to claim 1, characterized in that: The organic solvent is n-hexane, n-pentane, or diethyl ether, and the mass ratio of anhydrous calcium chloride to the organic solvent is 1:7 to 1:

11. Dichloro(methyl)(3,3,3-trifluoropropyl)silane and dimethyldichlorosilane are both lubricants and flexibility agents; The self-cleaning coating on the photovoltaic glass surface includes a polysiloxane with a linear chain polymer modification layer and an organosilicon linear polymer with fluorosilane side chains.

3. A method for preparing a self-cleaning coating on a photovoltaic glass surface, characterized in that: Includes the following steps: S1. Add 5-8 parts by weight of anhydrous calcium chloride to 20-80 parts by weight of organic solvent, stir, let stand for 2-4 hours, filter to remove residual calcium chloride, and obtain dehydrated organic solvent; the organic solvent is n-hexane, n-pentane, or diethyl ether. S2. 1-7 parts by weight of methyl orthosilicate, 2-15 parts by weight of 1H,1H,2H,2H-perfluorodecyltrichlorosilane, and 10-20 parts by weight of silicon tetrachloride are sequentially added to the dehydrated organic solvent. Methyl orthosilicate reacts with silicon tetrachloride to form an intermediate species, and then the difference in reaction rate is used to form a polysiloxane with a linear chain polymer modification layer. Methyl orthosilicate, 1H,1H,2H,2H-perfluorodecyltrichlorosilane and silicon tetrachloride form an organosilicon linear polymer with fluorosilane side chains; Polysiloxanes with linear chain polymer modification layers and organosilicon linear polymers with fluorosilane side chains exhibit microphase separation behavior due to differences in surface energy. S3. Add 1-10 parts by weight of dodecyltrichlorosilane and 5-15 parts by weight of dichloro(methyl)(3,3,3-trifluoropropyl)silane sequentially to adjust flexibility and hydrophobicity. S4. Add 1-10 parts by mass of dimethyldichlorosilane and stir evenly to disperse, thereby obtaining a self-cleaning hydrophobic coating with dust-proof effect; S5. A method for preparing a self-cleaning coating on a photovoltaic glass surface is completed by repeatedly immersing and removing the photovoltaic glass in a self-cleaning hydrophobic coating with dust-proof effect 1-20 times, or by spraying, vapor deposition, or spin coating.

4. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: In step S1, the filtration method is vacuum filtration or syringe filtration; magnesium sulfate, molecular sieves, or silica gel can also be used in step S1 to replace anhydrous calcium chloride for organic solvent dehydration.

5. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: In step S2, the process of obtaining the polysiloxane with the linear chain polymer modification layer is as follows:

6. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: In step S2, the process of obtaining the organosilicon linear polymer with fluorosilane side chains is as follows:

7. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: In step S3, dodecyltrichlorosilane is used to reduce the surface energy of the self-cleaning coating; The dichloro(methyl)(3,3,3-trifluoropropyl)silane in step S3 and the dimethyldichlorosilane in step S4 are both used to promote the sliding of water droplets off the surface of the self-cleaning coating and increase the flexibility of the coating.

8. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: The ambient humidity in steps S2 to S4 is 15% to 25%.

9. The method for preparing a self-cleaning coating on a photovoltaic glass surface according to claim 3, characterized in that: In step S4, the dispersion method is ultrasonic dispersion and the process container is in a closed state.

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