Resolution-adjustable super-resolution optical fiber digitization maskless photoetching device and method

Abstract

The invention discloses a resolution-adjustable super-resolution optical fiber digitization maskless photoetching device and method, and relates to the technical field of digitization maskless photoetching. Wherein the STED super-resolution light source and the optical fiber beam splitting assembly output M * N dual-wavelength light beams with equal-proportion light intensity; the digital pattern programmer controls the on-off and output light beam intensity of the M * N digital optical switches, and programs and pixelates the M * N STED super-resolution optical fibers to generate and switch a photoetching pattern; the pure polarization rotator converts radial or angular polarization vortex suppression light beams in the STED super-resolution double-beam array into generalized column vector vortex suppression light beams with different azimuth angles, and the generalized column vector vortex suppression light beams are focused by the objective lens to obtain annular light fields with different dark spot sizes. And when the size of the dark spot changes along with the azimuth angle, the effective area inhibited by the center of the annular light field changes, so that the photoetching resolution is adjustable. According to the invention, digital maskless super-resolution photoetching with high flexibility and adjustable resolution is realized.

Description

Technical Field

[0001] This application relates to the field of digital maskless lithography technology, and in particular to a resolution-adjustable super-resolution fiber digital maskless lithography apparatus and method. Background Technology

[0002] Currently, ultraviolet mask projection lithography relies on physical masks for pattern transfer. However, the development and manufacturing costs of physical masks are increasing, and their static properties cannot adapt to the rapid and frequent design modifications required during the R&D process. Any minor adjustment may mean discarding and remaking the mask, resulting in high R&D costs, long cycles, and poor flexibility, making it impossible to quickly respond to the development of prototype devices in research institutes and the small-batch, diversified production scenarios of small and medium-sized enterprises. Based on these needs, digital maskless lithography technology, which eliminates the need for physical masks, has emerged. The core of digital maskless lithography technology lies in using digital light processing technology to control spatial light modulators to generate exposure fields with different patterns, achieving a paradigm shift from "static physical templates" to "dynamic digital light fields." Digital maskless lithography technology based on digital micromirror devices (DMDs) modulates light by controlling the deflection state of pixelated micromirrors, forming a dynamic light field. Secondly, digital maskless lithography based on spatial light modulators (SLMs) changes the amplitude and phase of the light field by independently modulating the arrangement of a large number of liquid crystal molecules, thereby obtaining different exposure patterns.

[0003] In recent years, deep ultraviolet micro LED array technology has brought new breakthroughs to digital maskless lithography technology. Each deep ultraviolet micro LED acts as an independent pixel, and the generation and switching of patterns are achieved by independently controlling its on / off state and brightness.

[0004] However, existing digital maskless lithography solutions are inherently limited by the optical diffraction limit, restricting the processing spatial resolution and preventing the achievement of smaller feature sizes (for example, the smallest feature size achievable under visible light cannot be lower than 200 nm). Furthermore, the size of each pixel unit is typically a fixed value, making it difficult to appropriately optimize and adjust the lithography resolution based on the actual device fabrication requirements, thus limiting flexibility. If it were possible to achieve super-resolution digital maskless lithography while simultaneously enabling adjustable resolution, its flexibility would be greatly enhanced, further expanding the application scenarios of maskless lithography. Summary of the Invention

[0005] The purpose of this application is to provide a resolution-adjustable super-resolution fiber optic digital maskless lithography apparatus and method, which can realize highly flexible, resolution-adjustable digital maskless super-resolution lithography.

[0006] To achieve the above objectives, this application provides the following solution: In a first aspect, this application provides a resolution-adjustable super-resolution fiber optic digital maskless lithography apparatus, including a digital pattern programmer, an STED super-resolution light source and fiber optic splitter assembly, M×N digital optical switches, M×N STED super-resolution fibers, a fiber optic array combiner assembly, a pure polarization rotator, an objective lens, and a three-dimensional displacement stage. The STED super-resolution light source and fiber optic beam splitter are used to output M×N dual-wavelength beams with equal intensity, which are coupled into the M×N STED super-resolution optical fibers via the M×N digital optical switches; the dual-wavelength beams include a Gaussian excitation beam and a Gaussian suppression beam. The digital pattern programmer is communicatively connected to the M×N digital optical switches; the digital pattern programmer is used to: control the on / off state and output beam intensity of the M×N digital optical switches; program and pixelate the M×N STED super-resolution optical fibers to generate and switch photolithographic patterns; The M×N STED super-resolution optical fibers are used to convert the Gaussian suppressed beam array into a radial or angular polarization vortex suppressed beam array, and coaxially output the Gaussian excitation beam array and the radial or angular polarization vortex suppressed beam array to the fiber array combining component. After the fiber array combining component performs combining and collimation processing, the STED super-resolution dual beam array is output. The pure polarization rotator is used to convert the radial or angular polarization vortex suppression beam in the STED super-resolution dual-beam array into generalized cylindrical vector vortex suppression beams with different azimuth angles, and outputs M×N sets of STED super-resolution dual-beam arrays containing Gaussian excitation beams and generalized cylindrical vector vortex suppression beams with different azimuth angles. The objective lens is used to focus the STED super-resolution dual-beam array onto the wafer plane of the three-dimensional displacement stage, simultaneously obtaining M×N sets of Gaussian excitation beams and vortex suppression beams with different dark spot sizes, so as to achieve multi-focal super-resolution lithography with adjustable resolution; the resolution of multi-focal super-resolution lithography changes with the azimuth angle of the vortex suppression beam; the three-dimensional displacement stage is used to place the wafer containing STED super-resolution photoresist.

[0007] Secondly, this application provides a resolution-tunable super-resolution fiber optic digital maskless lithography method, applied to a resolution-tunable super-resolution fiber optic digital maskless lithography apparatus, the method comprising: The preset photolithography pattern is determined by programming with the digital pattern programmer; The digital pattern programmer controls the on / off state and output beam intensity of M×N digital optical switches so that M×N STED super-resolution optical fibers are bundled and collimated by the fiber array combining component to generate an STED super-resolution dual-beam array with the preset lithography pattern. The array is then focused onto the wafer surface placed on a three-dimensional displacement stage by a pure polarization rotator and an objective lens to perform a multi-focal super-resolution lithography writing process for the preset pattern, thereby obtaining a discrete STED super-resolution lithography structure corresponding to the preset lithography pattern. Based on the preset photolithography pattern, multiple scanning directions are determined; For any of the aforementioned scanning directions, a nested scanning lithography method is adopted. Based on the discrete STED super-resolution lithography structure, the digital pattern programmer controls the on / off state of the digital optical switches and the output beam intensity corresponding to the remaining part of the nested scanning lithography, and continues to perform multiple scans and writes, finally obtaining a continuous STED super-resolution lithography structure corresponding to the preset lithography pattern.

[0008] According to the specific embodiments provided in this application, the following technical effects are disclosed: This application uses a digital optical switch to specifically control the on / off state and intensity of M×N STED super-resolution optical fibers, and combines a digital pattern programmer to control and program the STED super-resolution optical fiber array to perform high-speed pattern generation and switching, so as to achieve highly flexible digital maskless super-resolution lithography.

[0009] The STED super-resolution light source and fiber optic beam splitter are used to output M×N proportionally proportional dual-wavelength beams, including a Gaussian excitation beam and a Gaussian suppression beam. Correspondingly, the Gaussian suppression beam is converted into a vortex suppression beam and simultaneously output as a Gaussian excitation beam via the STED super-resolution fiber. This not only possesses inherent absolute coaxiality but also significantly reduces alignment difficulty and structural complexity compared to free-space optical paths, thereby improving stability. Furthermore, during photolithography on the wafer surface, the Gaussian excitation beam-induced photoresist polymerization reaction is suppressed by the vortex suppression beam, preserving only the central effective photolithography polymerization region. This overcomes the diffraction limit resolution, achieving super-resolution photolithography.

[0010] More importantly, this application combines STED super-resolution fiber and a pure polarization rotator to obtain generalized cylindrical vector vortex suppression beams at different azimuth angles. Based on the focusing characteristics of these beams under high numerical aperture objectives, annular light field distributions with different dark spot sizes are obtained, thereby achieving effective lithographic aggregation regions of different sizes and enabling adjustable lithographic resolution. Compared with adjusting the suppression beam power, this significantly reduces the thermal effects of STED super-resolution lithography, lowers the risk of photoresist damage, and makes resolution adjustment simpler, safer, and more reliable. It also greatly increases the flexibility of digital maskless lithography.

[0011] Secondly, and importantly, in terms of lithography methods, this application combines digital maskless lithography and nested scanning lithography to overcome the problem of uneven pattern structure and large discrete gaps in single multi-focus lithography. By continuously nested scanning lithography, a pattern structure containing complete and continuous lines can be achieved, ensuring the uniformity, continuity and integrity of multi-focus lithography. Attached Figure Description

[0012] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0013] Figure 1 This is a schematic diagram of the structure of a resolution-adjustable super-resolution fiber optic digital maskless lithography apparatus in one embodiment of this application.

[0014] Figure 2 This is a schematic diagram of the STED super-resolution light source structure provided in an embodiment of this application.

[0015] Figure 3 The following is a schematic diagram of the structure of a digital optical switch provided in the embodiments of this application; wherein, (a) is a schematic diagram of the structure when the optical switch is any one of acousto-optic, electro-optic, magneto-optic or thermo-optic modulator; and (b) is a schematic diagram of the structure when the optical switch is a microelectromechanical optical switch.

[0016] Figure 4 This is a schematic diagram of the STED super-resolution fiber structure and function provided in the embodiments of this application.

[0017] Figure 5 A schematic diagram of the vector vortex suppression beam focusing characteristics provided in the embodiments of this application; wherein, (a) is a schematic diagram of the radial polarization light focusing characteristics; and (b) is a schematic diagram of the angular polarization light focusing characteristics.

[0018] Figure 6 The diagram below shows the structure and function of the pure polarization rotator provided in the embodiments of this application; wherein, (a) is a schematic diagram of the working principle of the pure polarization rotator; and (b) is a schematic diagram of the function of the pure polarization rotator.

[0019] Figure 7 This is a schematic diagram illustrating the adjustable resolution function provided in an embodiment of this application.

[0020] Figure 8 This is a schematic diagram of digital lithography and nested scanning lithography provided for embodiments of this application.

[0021] Figure label: STED super-resolution light source: 1; Excitation laser: 1-1; First half-wave plate: 1-2; Mirror: 1-3; Suppression laser: 1-4; Second half-wave plate: 1-5; Quarter-wave plate: 1-6; Dichroic mirror: 1-7; Multi-axis fiber coupler: 2; Polarization-maintaining single-mode fiber: 3; 1×M fiber beam splitter: 4; M polarization-maintaining single-mode sub-fibers: 5; M 1×N fiber beam splitters: 6; M×N polarization-maintaining single-mode fibers: 7; M×N digital optical switches: 8; Sub-fibers Collimator: 8-1; Optical switch: 8-2; Sub-fiber coupler: 8-3; Digital pattern programmer: 9; M×N STED super-resolution fiber: 10; Single-mode fiber: 10-1; Fiber polarization controller: 10-2; Vortex fiber etched with long-period grating: 10-3; Two-dimensional fiber array fixed combiner: 11; Microlens array: 12; Pure polarization rotator: 13; Third half-wave plate: 13-1; Fourth half-wave plate: 13-2; Objective lens: 14; Three-dimensional displacement stage: 15. Detailed Implementation

[0022] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0023] To overcome the diffraction limit, STED super-resolution lithography is used to overlap a Gaussian excitation beam and a ring suppression beam on the wafer surface. The ring suppression beam can suppress the photoresist polymerization reaction in the overlapping part of the focal point caused by the excitation beam, thereby compressing the size of the photopolymerization reaction region and realizing super-resolution lithography.

[0024] Typically, the ring suppression beam is generated separately using free-element optical components (such as spiral phase plates or vortex waveplates), and then precisely coaxially combined with a Gaussian excitation beam through a free-space optical path to achieve super-resolution lithography, which requires high system stability and precise alignment. However, by simultaneously transmitting the Gaussian excitation beam and the ring suppression beam in the same specially designed vortex fiber (STED super-resolution fiber), natural absolute coaxiality can be achieved, resulting in extremely high alignment accuracy while reducing system complexity. Furthermore, unlike traditional STED super-resolution lithography where the processing size is changed by adjusting the power of the ring suppression beam, the ring suppression beam generated by the STED super-resolution fiber is a vector-polarized vortex beam with a non-uniform polarization state. The optical field distribution can be altered through polarization control, achieving an adjustable dark spot size without thermal effects. Therefore, it is possible to achieve resolution-adjustable STED super-resolution lithography polymerization reactions.

[0025] Building upon this foundation, this application utilizes a digital optical switch to specifically control the on / off state and intensity of pixelated STED super-resolution optical fibers. By controlling and programming the STED super-resolution fiber array via computer, pattern generation and switching can be achieved, enabling maskless lithography. Furthermore, by overcoming the diffraction limit and incorporating a three-dimensional displacement stage, multi-focal scanning lithography can also be realized. By combining the polarization characteristics of vector-polarized vortex beams and altering the dark spot size of the annular light field, the effective area of ​​the STED super-resolution lithography polymerization reaction can be adjusted, achieving adjustable lithography resolution and greater flexibility. Therefore, the high-flexibility, high-throughput, and super-resolution fiber-based digital maskless lithography technology provided in this application is becoming a common market demand.

[0026] To make the above-mentioned objectives, features and advantages of this application more apparent and understandable, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0027] In one exemplary embodiment, such as Figure 1 As shown, a resolution-adjustable super-resolution fiber optic digital maskless lithography apparatus is provided, including a digital pattern programmer 9, an STED super-resolution light source and fiber optic splitter assembly, M×N digital optical switches 8, M×N STED super-resolution fibers 10, a fiber array combiner assembly, a pure polarization rotator 13, an objective lens 14, and a three-dimensional displacement stage 15.

[0028] In a specific application example, the STED super-resolution light source and fiber beam splitter are used to output M×N dual-wavelength beams with equal light intensities, which are coupled into M×N STED super-resolution optical fibers 10 via M×N digital optical switches 8; the dual-wavelength beams include a Gaussian excitation beam and a Gaussian suppression beam.

[0029] Specifically, the STED super-resolution light source and fiber optic beam splitter assembly includes an STED super-resolution light source 1, a multi-axis fiber coupler 2, a polarization-maintaining single-mode fiber 3, a 1×M fiber beam splitter 4, M polarization-maintaining single-mode sub-fibers 5, M 1×N fiber beam splitters 6, and M×N polarization-maintaining single-mode fibers 7 arranged sequentially along the beam propagation direction.

[0030] STED super-resolution light source is used to simultaneously output Gaussian excitation beams and Gaussian suppression beams; such as Figure 2 As shown, the STED super-resolution light source 1 includes an excitation laser 1-1, a first half-wave plate 1-2, a reflector 1-3, a suppressor laser 1-4, a second half-wave plate 1-5, a quarter-wave plate 1-6, and a dichroic mirror 1-7. The first half-wave plate 1-2 and the reflector 1-3 are arranged in the output light path of the excitation laser 1-1; the second half-wave plate 1-5, the quarter-wave plate 1-6, and the dichroic mirror 1-7 are arranged in the output light path of the suppressor laser.

[0031] Both the excitation laser 1-1 and the suppression laser 1-4 are pulsed or continuous-wave lasers with adjustable power. The excitation laser 1-1 has a wavelength range of 400 nm to 800 nm and is used to output a Gaussian excitation beam to excite the STED super-resolution photolithography polymerization reaction. In one application, the excitation laser 1-1 is a 405 nm single-mode laser, and its output 405 nm Gaussian excitation beam is used to excite the STED super-resolution photolithography polymerization reaction of negative photoresist (containing monomers PETA or PETTA and photoinitiator DETC).

[0032] The wavelength range of the suppressor lasers 1-4 is 500nm to 900nm. The suppressor lasers 1-4 are used to output a Gaussian suppressor beam that excites the STED super-resolution photolithography polymerization reaction. In one application, the suppressor lasers 1-4 are 532nm single-mode lasers, and their output 532nm Gaussian suppressor beam is used to suppress the STED super-resolution photolithography polymerization reaction of negative photoresist (containing monomers PETA or PETTA and photoinitiator DETC).

[0033] The first half-wave plate 1-2 is mounted on a manual or electric coaxial rotating base; the first half-wave plate 1-2 is used to provide the Gaussian excitation beam with initial uniform linear polarization, thereby correcting the polarization state change of the Gaussian excitation beam caused by the polarization device and controlling the linear polarization direction of the Gaussian excitation beam with optimal lithographic resolution.

[0034] The second half-wave plate 1-5 and the quarter-wave plate 1-6 are both mounted on a manual or electric coaxial rotating base; the second half-wave plate 1-5 is used to provide the Gaussian suppressed beam with a uniform linear polarization of ±45° with the fast axis of the quarter-wave plate 1-6; the quarter-wave plate 1-6 is used to convert the ±45° uniformly linearly polarized Gaussian suppressed beam into a uniformly right-handed or left-handed circularly polarized Gaussian suppressed beam.

[0035] Dichroic mirrors 1-7 are short-pass dichroic mirrors with a cutoff wavelength of 505nm; dichroic mirrors 1-7 are used to diffract wavelengths of... A Gaussian excitation beam of (405 nm) and a wavelength of (532nm) Gaussian suppression beam combining and ensuring that the beam centers are completely coincident.

[0036] In the STED super-resolution light source 1, the 405nm Gaussian excitation beam output from the excitation laser 1-1 is adjusted to the required uniform linear polarization by the first half-wave plate 1-2 and then reflected by the mirror onto the dichroic mirror 1-7. At the same time, the 532nm Gaussian suppression beam output from the excitation laser 1-4 is adjusted to a uniform right-handed or left-handed circularly polarized Gaussian beam by the second half-wave plate 1-5 and the quarter-wave plate 1-6, and then combined with the Gaussian excitation beam by the dichroic mirror 1-7 to ensure that the beam centers are completely coincident.

[0037] A multi-axis fiber coupler 2 is positioned in the output optical path of the STED super-resolution light source 1. The adjustment mode of the multi-axis fiber coupler 2 is three-axis (Z-axis translation, pitch, and yaw) or five-axis (X / Y / Z-axis translation, pitch, and yaw). The multi-axis fiber coupler 2 is used to simultaneously couple the Gaussian excitation beam and the Gaussian suppression beam into the polarization-maintaining single-mode fiber 3.

[0038] Specifically, the coupling lens assembled inside the multi-axis fiber coupler 2 is an aspherical lens or an achromatic aspherical lens, and the multi-axis fiber coupler 2 will couple a wavelength of... A Gaussian excitation beam of (405 nm) and a wavelength of A 532nm Gaussian suppressed beam is simultaneously coupled into polarization-maintaining single-mode fiber 3, achieving optimal and balanced fiber coupling efficiency for both wavelength beams.

[0039] A polarization-maintaining single-mode fiber 3 is positioned near the focal plane of the multi-axis fiber coupler 2. The polarization-maintaining single-mode fiber 3 is of the PANDA type and is used to ensure that the incident dual-wavelength combined light maintains polarization stability during transmission within the fiber. The polarization-maintaining single-mode fiber 3 is used to coaxially transmit the Gaussian excitation beam and the Gaussian suppression beam to the 1×M fiber beam splitter 4.

[0040] The 1×M fiber beam splitter 4 is connected to the output end of the polarization-maintaining single-mode fiber 3 and to the input end of the M polarization-maintaining single-mode sub-fibers 5. The 1×M fiber beam splitter 4 is used to: split the polarization-maintaining single-mode fiber 3 into M polarization-maintaining single-mode fibers 5; and split coaxially transmitted dual-wavelength combined beams into M dual-wavelength combined sub-beams of equal intensity. In a specific application, the 1×M fiber beam splitter 4 is a fused biconical taper (FBT) or planar waveguide (PLC) fiber beam splitter.

[0041] M polarization-maintaining single-mode fibers 5 are connected to the output end of 1×M fiber splitter 4 and to the input end of M 1×N fiber splitters 6. The M 1×N fiber splitters 6 are connected to the output end of M polarization-maintaining single-mode fibers 5 and to the input end of M×N polarization-maintaining single-mode fibers 7.

[0042] The M polarization-maintaining single-mode fibers 5 are used to transmit M equal-intensity dual-wavelength bundled beams to the M 1×N fiber splitters 6. The M 1×N fiber splitters 6 are used to: split the M polarization-maintaining single-mode fibers 5 into M×N polarization-maintaining single-mode fibers 7; and split the M equal-intensity dual-wavelength bundled beams into M×N equal-intensity dual-wavelength beams. Here, M and N are both integers greater than or equal to 3. In a specific application, the M 1×N fiber splitters 6 are all fused biconical taper (FBT) or planar waveguide (PLC) fiber splitters.

[0043] The M×N polarization-maintaining single-mode optical fibers are used to transmit M×N proportionally proportional dual-wavelength beams to the M×N digital optical switches.

[0044] The digital pattern programmer 9 is communicatively connected to M×N digital optical switches 8; the digital pattern programmer 9 is used to: control the on / off state and output beam intensity of the M×N digital optical switches 8; program and pixelate M×N STED super-resolution optical fibers 10 to generate and switch lithographic patterns.

[0045] M×N digital optical switches 8 are arranged on the output optical path of M×N polarization-maintaining single-mode optical fibers 7 and on the incident optical path of M×N STED super-resolution optical fibers 10. For example... Figure 3 As shown, the M×N digital optical switches 8 include M×N sets of sub-fiber collimators 8-1, optical switches 8-2, and sub-fiber couplers 8-3 arranged sequentially along the beam propagation direction. The sub-fiber collimators 8-1 are used to collimate the dual-wavelength beams output from their respective polarization-maintaining single-mode sub-fibers; the optical switches 8-2 are used to independently control the on / off state of their respective polarization-maintaining single-mode sub-fibers according to control commands issued by the digital pattern programmer 9, and to regulate the output beam intensity; the sub-fiber couplers 8-3 are used to couple the dual-wavelength beams into their respective STED super-resolution fibers.

[0046] Optical switch 8-2 ​​can be any one of an acousto-optic modulator, electro-optic modulator, magneto-optic modulator, thermo-optic modulator, or microelectromechanical optical switch. For example... Figure 3 As shown in (a), when the optical switch 8-2 ​​is any one of an acousto-optic, electro-optic, magneto-optic, or thermo-optic modulator, it is modulated by a modulation signal source; such as Figure 3 As shown in (b), when the optical switch 8-2 ​​is a microelectromechanical optical switch, its periphery is coated with light-absorbing material to absorb reflected light, and it is driven by a driving power supply.

[0047] During operation, each digital optical switch collimates the received dual-wavelength beam through its corresponding sub-fiber collimator 8-1. The collimated dual-wavelength beam is then controlled by optical switch 8-2 ​​to switch on and off and output beam intensity, and then coupled into its corresponding STED super-resolution fiber via sub-fiber coupler 8-3.

[0048] In one specific application, the digital pattern programmer 9 communicates serially with M×N digital optical switches 8 via LabVIEW software. The digital pattern programmer 9 is used to program and pixelate M×N polarization-maintaining single-mode optical fibers 7, and to quickly generate and switch photolithographic patterns, while outputting a dual-beam array with a specific pattern.

[0049] M×N STED super-resolution optical fibers 10 are positioned near the focal plane of the M×N digital optical switches 8 and neutron fiber couplers 8-3. The M×N STED super-resolution optical fibers 10 are used to convert the Gaussian suppressed beam array into a radially or angularly polarized vortex suppressed beam array, and coaxially output the Gaussian excitation beam and the radially or angularly polarized vortex suppressed beam array to the fiber array combiner. After the fiber array combiner performs combining and collimation processing, the STED super-resolution dual-beam array is output.

[0050] like Figure 4 As shown, the STED super-resolution fiber is an optical fiber composed of a single-mode fiber 10-1, a fiber polarization controller 10-2, and a vortex fiber 10-3 with a long-period grating. The single-mode fiber 10-1 is connected to the vortex fiber 10-3 with a long-period grating by fused taper. The fiber polarization controller 10-2 is located between the single-mode fiber 10-1 and the vortex fiber 10-3 with a long-period grating.

[0051] Single-mode fiber 10-1 is used to couple a uniformly linearly polarized Gaussian excitation beam and a uniformly circularly polarized Gaussian suppression beam into a vortex fiber 10-3 etched with a long-period grating.

[0052] The fiber polarization controller 10-2 is used to rapidly adjust the polarization state of the fundamental mode Gaussian suppressed beam incident from the single-mode fiber 10-1 onto the vortex fiber 10-3 etched with a long-period grating, and selectively excite radial (TM) beams from the vortex fiber 10-3 etched with a long-period grating. 01 (Mode) or angular (TE) 01 (Mode) Polarization vortex suppression beam. Specifically, the fiber polarization controller 10-2 is a three-ring fiber structure or a squeezed fiber structure with equivalent waveplate properties.

[0053] The vortex fiber 10-3 etched with a long-period grating is used to control the resonance condition by adjusting the grating period length and number during fabrication. When the resonance condition is met, the resonance wavelength (i.e., wavelength) is achieved. ) will fundamental mode (LP) 01 Gaussian suppressed beam conversion to higher-order mode (LP) 11 ) Vortex beam (including TM) 01 Pattern and TE 01 Mode vortex beams), also known as non-uniformly polarized radially or angularly polarized vortex suppression beams, and for non-resonant wavelengths (i.e., wavelengths... The fundamental mode Gaussian excitation beam does not undergo mode conversion; specifically, the surface of the vortex fiber 10-3 with a long periodic grating has a unidirectional non-uniformly etched periodic grating structure or a structure with a periodic distribution of refractive index, and has polarization-dependent characteristics.

[0054] In one specific application, STED super-resolution fiber is used to transmit uniformly circularly polarized fundamental mode Gaussian suppressed beams (wavelength λ). The beam is converted into a non-uniformly polarized radially or angularly polarized vortex suppression beam, while maintaining the Gaussian excitation beam (wavelength is...). The mode remains unchanged, and it coaxially outputs a Gaussian excitation beam and a radial or angular polarization vortex suppression beam, which has absolute coaxiality and reduces the alignment difficulty of the system.

[0055] like Figure 5 As shown, the radial or angular polarization vortex suppression beam output by STED super-resolution fiber is a special vector vortex beam, which has different light field distributions after being focused by a high numerical aperture objective lens.

[0056] like Figure 5 As shown in (a), on the transverse section (k) x k y When a radially polarized vortex beam with a ring-shaped light field distribution is focused by a high numerical aperture objective lens, the polarized light in different radial directions is vector-combined on the focal plane, producing a longitudinal component along the optical axis. Compared with the corresponding transverse component, the intensity of the longitudinal component is much greater, resulting in a solid Gaussian-like light field distribution at the focal plane.

[0057] like Figure 5 As shown in (b), on the transverse section (k) x k y When an angularly polarized vortex beam with a ring-shaped light field distribution is focused by a high numerical aperture objective lens, the angularly polarized light produces only a transverse component and zero longitudinal component when vector synthesis is performed on the focal plane, resulting in a ring-shaped light field distribution with the largest dark spot size at the focal plane.

[0058] Therefore, in practical applications, the fiber polarization controller 10-2 should be used to excite only one type of radially or angularly polarized vortex suppression beam from the vortex fiber 10-3 etched with a long-period grating. This facilitates subsequent diversion of any of the aforementioned vector vortex beams to different azimuth angles. The generalized cylindrical vector polarization conversion enables the obtaining of annular light field distributions with different dark spot sizes after focusing by a high numerical aperture objective lens.

[0059] The fiber array combining assembly includes a two-dimensional fiber array fixed combiner 11 and a microlens array 12 arranged sequentially.

[0060] The two-dimensional fiber array fixed combiner 11 is directly connected to the M×N STED super-resolution fibers 10. The two-dimensional fiber array fixed combiner 11 is used to fix and arrange the M×N STED super-resolution fibers into a two-dimensional array before combining them. Specifically, the two-dimensional fiber array fixed combiner 11 is a fiber positioning module with tightly arranged V-grooves. All STED super-resolution fibers are fixed in the V-grooves, and the output fiber end faces are leveled and placed on the same plane. The two-dimensional fiber array fixed combiner 11 is a rectangular array of M×N V-grooves with equal spacing between them, the spacing matching the size of the polarization-maintaining single-mode fiber. The two-dimensional fiber array fixed combiner 11 is used to arrange the M×N STED super-resolution fibers 10 into a preset rectangular array on the M×N V-grooves array.

[0061] The microlens array 12 is disposed in the output optical path of the two-dimensional fiber array fixed combiner 11 and fixed on the XYZ axis linear displacement stage; the microlens array 12 is used to align and collimate the STED super-resolution dual-wavelength beam array output from the two-dimensional fiber array fixed combiner; each STED super-resolution dual-wavelength beam in the STED super-resolution dual-wavelength beam array includes a Gaussian excitation beam and a radial or angular polarization vortex suppression beam. Specifically, the microlens array 12 consists of M×N sub-lenses with identical optical parameters uniformly arranged on the substrate.

[0062] The pure polarization rotator 13 is used to convert the radial or angular polarization vortex suppression beam in the STED super-resolution dual-wavelength beam array into generalized cylindrical vector vortex suppression beams with different azimuth angles, and outputs an M×N set of STED super-resolution dual-beam arrays containing Gaussian excitation beams and generalized cylindrical vector vortex suppression beams with different azimuth angles.

[0063] In a specific application, a pure polarization rotator 13 is disposed in the output optical path of the microlens array 12. The pure polarization rotator 13 includes a third half-wave plate 13-1 and a fourth half-wave plate 13-2. The fourth half-wave plate 13-2 is fixed on a rotation adjustment frame. The pure polarization rotator 13 is used to rotate the polarization direction of the radial or angular polarization vortex suppression beam by changing the fast axis angle between the third half-wave plate 13-1 and the fourth half-wave plate 13-2, thereby obtaining generalized cylindrical vector vortex suppression beams at different azimuth angles. The M×N groups of Gaussian excitation beams and the generalized cylindrical vector vortex suppression beams at different azimuth angles constitute an STED super-resolution dual-beam array.

[0064] The working principle of the pure polarization rotator 13 is as follows: Figure 6 As shown in (a). Assume a radially polarized vortex beam enters the pure polarization rotator 13, and its initial local polarization P1 in a certain radial direction, along the fast axis 1 (the angle between the beam and the P1 direction is...). After being deflected by the third half-wave plate 13-1, it becomes locally polarized P2. At this time, the local polarization deflection angles in different radial directions are not consistent. In order to ensure that the local polarization in different radial directions is rotated by the same angle, a fourth half-wave plate 13-2 is added. At this time, the fourth half-wave plate 13-2 in the fast axis 2 direction (the angle between it and the P1 direction is...) After deflection, it becomes locally polarized P3. The final deflection angle from locally polarized P1 to locally polarized P3 is... ,at this time 、 and The relationship between the three angles is as follows: .

[0065] From the above formula, we can see that the polarization deflection angle... Only with the two fast shaft clamps of the third half-wave plate 13-1 and the fourth half-wave plate 13-2 The polarization is related to the initial polarization state, but not to the initial polarization state. Therefore, the local polarization in different radial directions of a radially polarized vortex beam can be deflected by the same angle.

[0066] like Figure 6 As shown in (b), the pure polarization rotator 13 changes the fast axis angle between the third half-wave plate 13-1 and the fourth half-wave plate 13-2. This allows for the conversion of radial (azimuth 0°) or angular (azimuth 90°) polarized vortex suppression beams into beams with an azimuth angle of... (0° < The generalized cylindrical vector vortex suppression beam (90°) was ultimately used to obtain M×N azimuth angles. (0° < 90°) Generalized cylindrical vector vortex suppression beam array. That is, azimuth angle. The value range is 0° to 90°.

[0067] Objective lens 14 is positioned in the output light path of pure polarizer 13. Objective lens 14 is used to: polarize a beam containing Gaussian excitation light and beams with different azimuth angles. The STED super-resolution dual-beam array, which suppresses generalized column vector vortex beams, is simultaneously focused onto the wafer plane; different azimuth angles The generalized cylindrical vector vortex suppression beam is focused to obtain annular light fields with different dark spot sizes, thereby achieving adjustable lithographic resolution. Specifically, objective lens 14 is an air, water, or oil immersion objective lens with a preset numerical aperture, and the numerical aperture is >0.1.

[0068] The three-dimensional displacement stage 15 is positioned near the focal plane of the objective lens 14, and is used to place the wafer containing the STED super-resolution photoresist. Specifically, the three-dimensional displacement stage 15 is a high-precision three-dimensional displacement stage.

[0069] like Figure 7 As shown, objective lens 14 encloses an M×N array containing Gaussian excitation beams and beams at different azimuth angles. A generalized cylindrical vector vortex-suppressed beam array (STED) is focused onto the wafer plane of a three-dimensional displacement stage. Due to different azimuth angles... The generalized cylindrical vector vortex-suppressed beam can essentially be decomposed into a radially polarized beam and an angularly polarized beam. Therefore, after being focused by a high numerical aperture objective lens, it simultaneously contains lateral and longitudinal components at the focal plane. When When the angle is 0°, the longitudinal component is at its maximum, resulting in a solid Gaussian-like light field distribution. When the angle is 90°, the longitudinal component is zero, which means that the ring-shaped light field distribution with the largest dark spot size is obtained.

[0070] Therefore, when 0° < When the angle is less than 90°, both the lateral and longitudinal components exist. By rotating the azimuth angle appropriately... (like and By vector synthesis, annular light field distributions with different dark spot sizes can be achieved. Furthermore, by conducting an effective STED super-resolution lithography polymerization reaction on the focal plane, the lithographic resolution can be adjusted. Ultimately, the lithographic resolution of the multi-focal system will vary with different azimuth angles. This allows for adjustable multi-focal lithography resolution. Compared to adjusting the suppression beam power, this significantly reduces the thermal effects of STED super-resolution lithography, while also providing a simpler and more reliable resolution adjustment method.

[0071] In summary, this application outputs excitation and suppression beams from an STED super-resolution light source 1; M×N polarization-maintaining single-mode fibers 7 are generated sequentially using a multi-axis fiber coupler 2, a polarization-maintaining single-mode fiber 3, a 1×M fiber beam splitter 4, and M 1×N fiber beam splitters 5, and connected to the M×N STED super-resolution fibers 10 via M×N digital optical switches 8; the STED super-resolution fiber array is encoded by a digital pattern programmer 9 to generate and switch patterns, thereby achieving digital maskless lithography; the M×N STED super-resolution fibers 10 output an STED super-resolution dual-beam array through a two-dimensional fiber array combiner 11 and a microlens array 12, thereby achieving super-resolution multifocal lithography; the radial (or angular) polarization suppression beam output from the STED super-resolution fiber is converted into a generalized cylindrical vector suppression beam with different azimuth angles by a pure polarization rotator 13, and after being focused by an objective lens 14, annular light fields with different dark spot sizes are obtained, thereby achieving adjustable lithography resolution.

[0072] This application addresses the limitations of existing digital maskless lithography technology in terms of resolution due to diffraction and insufficient flexibility in resolution adjustment. It also addresses the problems of poor spatial optical path stability, high alignment difficulty, and complex structure in existing STED super-resolution lithography technology. The application provides a resolution-adjustable super-resolution fiber digital maskless lithography device, which can realize highly flexible pattern generation and switching, highly flexible resolution adjustment, high-throughput multi-focus scanning lithography and super-resolution lithography. It is suitable for rapid prototyping device development in research institutes and small and medium-sized enterprises for small-batch, multi-batch, and diversified production scenarios.

[0073] Based on the same inventive concept, this application also provides a method. The solution provided by this method is similar to the solution described in the above-described apparatus. Therefore, the specific limitations of one or more method embodiments provided below can be found in the limitations of the apparatus described above, and will not be repeated here.

[0074] In one exemplary embodiment, a resolution-tunable super-resolution fiber optic digital maskless lithography method is provided, applied to the aforementioned resolution-tunable super-resolution fiber optic digital maskless lithography apparatus, the method comprising: Step 100: Determine the preset photolithography pattern by programming with a digital pattern programmer.

[0075] In a specific application, such as Figure 8 As shown, the preset photolithography pattern is a "Z" shape.

[0076] Step 200: The on / off state and output beam intensity of M×N digital optical switches are controlled by a digital pattern programmer so that the M×N STED super-resolution optical fibers are bundled and collimated by the fiber array combining component to generate an STED super-resolution dual-beam array with a preset lithographic pattern. The array is then focused onto the wafer surface placed on a three-dimensional displacement stage by a pure polarization rotator and an objective lens to perform a multi-focal super-resolution lithography writing process of the preset pattern, thereby obtaining a discrete STED super-resolution lithography structure corresponding to the preset lithography pattern.

[0077] In a specific application, it is necessary to first build the resolution-adjustable super-resolution fiber optic digital maskless lithography device mentioned above, and then program the STED super-resolution fiber array into a "Z" shaped pattern using a digital pattern programmer. Figure 8 The STED super-resolution fiber array marked with a "Z" as shown in step ① will be activated. Therefore, a "Z"-shaped STED super-resolution dual-beam array (gray and black represent the excitation beam and suppression beam, respectively) will be obtained on the focal plane (the wafer plane of the three-dimensional displacement stage) as shown in step ②. After the STED super-resolution lithography polymerization reaction, the first-step lithography structure with gaps as shown in step ③ will be obtained, which is the discrete STED super-resolution lithography structure corresponding to the preset lithography pattern.

[0078] Step 300: Based on the preset photolithography pattern, determine multiple scanning directions.

[0079] Since the effective region where the polymerization reaction has already occurred is not suppressed by the suppression beam, a nested scanning lithography method can be used to activate the STED super-resolution fiber in the upper and lower parts of the "Z" shape in step ④. As mentioned earlier, a "Z" shaped structure is used, indicating that it has two scanning directions, corresponding to... Figure 8 Steps ④ and ⑥ in the process.

[0080] Step 400: For any scanning direction, a nested scanning lithography method is adopted. Based on the discrete STED super-resolution lithography structure, the digital pattern programmer controls the on / off state of the digital optical switch and the output beam intensity corresponding to the remaining part of the nested scanning lithography, and continues to perform multiple scans and writes, finally obtaining a continuous STED super-resolution lithography structure corresponding to the preset lithography pattern.

[0081] In a specific application, scanning lithography along the direction of the arrow can obtain the complete etched lines of the upper and lower parts of the "Z" shape in step ⑤. Further performing steps ⑥ and ⑦ in the same nested manner can finally obtain a complete and continuous "Z" shaped pattern structure, ensuring the uniformity and integrity of multi-focal lithography.

[0082] Based on the above processing steps, this application can obtain an arbitrary pattern writing structure by using digital maskless lithography and nested scanning lithography.

[0083] Compared with the prior art, this application has the following advantages: (1) By using a digital optical switch to specifically control the on / off state and intensity of the STED super-resolution fiber, and by using a digital pattern programmer to control and program the STED super-resolution fiber array to generate and switch high-speed patterns, a highly flexible digital maskless lithography is achieved.

[0084] (2) The excitation beam and the suppression beam are transmitted simultaneously through STED super-resolution fiber. It not only has natural absolute coaxiality, but also greatly reduces the alignment difficulty and structural complexity compared with free space optical path, and improves the stability of the device. It also breaks through the diffraction limit resolution through STED super-resolution fiber, realizes super-resolution lithography. After arranging the STED super-resolution fiber array into a rectangle, a dual beam array is generated on the wafer surface to realize high-throughput multi-focus parallel lithography.

[0085] (3) Combine STED super-resolution fiber and pure polarization rotator to obtain different azimuth angles The generalized cylindrical vector vortex suppression beam, based on its focusing characteristics, obtains annular light field distributions of different dark spot sizes, thereby obtaining effective lithography areas of different sizes, thus achieving adjustable lithography resolution. Compared with adjusting the suppression beam power, this method significantly reduces the thermal effects of STED super-resolution lithography, and the adjustment method is simpler and more reliable, further increasing the flexibility of digital maskless lithography.

[0086] (4) Combining digital maskless lithography and nested scanning lithography overcomes the problem of uneven pattern structure and large gaps during single multi-focus writing. Through continuous nested scanning lithography, a pattern structure containing complete continuous lines can be realized, ensuring the uniformity and integrity of multi-focus lithography.

[0087] This application achieves highly flexible digital maskless lithography by specifically controlling the on / off state and intensity of STED super-resolution optical fibers through a digital optical switch, and by controlling and programming the STED super-resolution optical fiber array with a digital pattern programmer for high-speed pattern generation and switching. It also achieves high-throughput multi-focus parallel lithography by generating a rectangular focal array on the wafer surface using the STED super-resolution optical fiber array, and by breaking through the diffraction limit resolution with STED super-resolution optical fibers to achieve super-resolution lithography. Furthermore, it utilizes the polarization characteristics of the suppressed beam generated by the generalized column vector vortex of the STED super-resolution optical fiber to control the dark spot size, achieving adjustable lithography resolution without increasing the suppression beam power, further increasing lithography flexibility. This invention is applicable to rapid prototyping device development in research institutes and small-scale, multi-batch, diversified production scenarios for small and medium-sized enterprises.

[0088] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0089] This document uses specific examples to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the methods and core ideas of this application. Furthermore, those skilled in the art will recognize that, based on the ideas of this application, there will be changes in the specific implementation methods and application scope. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A resolution-tunable super-resolved fiber-digital maskless lithography apparatus, characterized by, The device comprises a digital pattern programmer, an STED super-resolution light source and a fiber beam splitting assembly, M×N digital light switches, M×N STED super-resolution optical fibers, a fiber array beam combining assembly, a pure polarization rotator, an objective lens and a three-dimensional displacement stage; The STED super-resolution light source and the fiber beam splitting assembly are used to output M×N portions of dual-wavelength light beams with equal light intensity, which are coupled into the M×N STED super-resolution optical fibers through the M×N digital light switches; the dual-wavelength light beams comprise Gaussian excitation light beams and Gaussian suppression light beams; The digital pattern programmer is in communication connection with the M×N digital light switches; the digital pattern programmer is used to control the on-off and output light beam intensity of the M×N digital light switches, program and pixelize the M×N STED super-resolution optical fibers to generate and switch light etching patterns; The M×N STED super-resolution optical fibers are used to convert the Gaussian suppression light beam array into a radial or angular polarization vortex suppression light beam array, coaxially output the Gaussian excitation light beam array and the radial or angular polarization vortex suppression light beam array to the fiber array beam combining assembly, and then output an STED super-resolution dual-beam array after the beam combining and collimation processing of the fiber array beam combining assembly; The pure polarization rotator is used to convert the radial or angular polarization vortex suppression light beams in the STED super-resolution dual-beam array into generalized cylindrical vector vortex suppression light beams with different azimuth angles, and output M×N groups of STED super-resolution dual-beam arrays comprising Gaussian excitation light beams and generalized cylindrical vector vortex suppression light beams with different azimuth angles; The objective lens is used to focus the STED super-resolution dual-beam array onto the wafer plane of the three-dimensional displacement stage, so as to obtain M×N groups of Gaussian excitation light beams and vortex suppression light beams with different dark spot sizes, and realize multi-focus super-resolution lithography with adjustable resolution; the resolution of the multi-focus super-resolution lithography changes with the azimuth angle of the vortex suppression light beam; and the three-dimensional displacement stage is used to place a wafer comprising an STED super-resolution photoresist.

2. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 1, wherein, The STED super-resolution light source and the fiber beam splitting assembly comprise, in sequence along the light beam propagation direction, an STED super-resolution light source, a multi-axis fiber coupler, a polarization maintaining single-mode optical fiber, a 1×M fiber beam splitter, M polarization maintaining single-mode sub-optical fibers, M 1×N fiber beam splitters and M×N polarization maintaining single-mode sub-optical fibers; The STED super-resolution light source is used to simultaneously output Gaussian excitation light beams and Gaussian suppression light beams; The multi-axis fiber coupler is used to simultaneously couple the Gaussian excitation light beams and the Gaussian suppression light beams into the polarization maintaining single-mode optical fiber; The polarization maintaining single-mode optical fiber is used to coaxially transmit the Gaussian excitation light beams and the Gaussian suppression light beams to the 1×M fiber beam splitter; The 1×M fiber beam splitter is used to: divide the polarization maintaining single-mode optical fiber into the M polarization maintaining single-mode sub-optical fibers; and divide the coaxially transmitted dual-wavelength combined light into M portions of dual-wavelength combined sub-beams with equal light intensity; The M polarization maintaining single-mode sub-optical fibers are used to transmit the M portions of dual-wavelength combined sub-beams with equal light intensity to the M 1×N fiber beam splitters; The M 1*N fiber splitters are used for splitting the M polarization maintaining single mode sub-fibers into the M*N polarization maintaining single mode sub-fibers and splitting the M portions of the double-wavelength beam with equal light intensity into M*N portions of the double-wavelength beam with equal light intensity. The M*N polarization maintaining single mode sub-fibers are used for transmitting the M*N portions of the double-wavelength beam with equal light intensity to the M*N digital optical switches, wherein M and N are both integers greater than or equal to 3.

3. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 2, wherein, The STED super-resolution light source comprises an excitation light laser, a first half-wave plate, a mirror, a suppression light laser, a second half-wave plate, a quarter-wave plate and a dichroic mirror. The excitation light laser is used for generating a Gaussian excitation light beam for STED super-resolution photolithography polymerization reaction. The suppression light laser is used for generating a Gaussian suppression light beam for STED super-resolution photolithography polymerization reaction. The first half-wave plate, the second half-wave plate and the quarter-wave plate are all mounted on a coaxial rotating seat; the first half-wave plate is used for providing an initial uniform linear polarization for the Gaussian excitation light beam and reflecting the uniformly linearly polarized Gaussian excitation light beam to the dichroic mirror through the mirror; The second half-wave plate is used for providing a uniform linear polarization with an angle of ±45° with the fast axis of the quarter-wave plate for the Gaussian suppression light beam; the quarter-wave plate is used for converting the Gaussian suppression light beam with the uniform linear polarization of ±45° into a Gaussian suppression light beam with uniform right-handed or left-handed circular polarization, and then combining the Gaussian suppression light beam with the uniformly linearly polarized Gaussian excitation light beam through the dichroic mirror and ensuring that the centers of the light beams completely coincide.

4. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 3, wherein, The wavelength range of the excitation light laser is 400-800 nm, and the wavelength range of the suppression light laser is 500-900 nm.

5. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 1, wherein, The M*N digital optical switches comprise M*N groups of sub-fiber collimators, optical switches and sub-fiber couplers arranged in sequence along the light beam propagation direction. The sub-fiber collimators are used for collimating the double-wavelength light beams output by the corresponding polarization maintaining single mode sub-fibers. The optical switches are used for independently controlling the on-off of the corresponding polarization maintaining single mode sub-fibers and regulating the output light beam intensity according to the control instructions issued by the digital pattern programmer. The sub-fiber couplers are used for coupling the double-wavelength light beams into the corresponding STED super-resolution fibers.

6. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 1, wherein, The STED super-resolution fiber is a fiber connected by a single mode fiber, a fiber polarization controller and a vortex fiber with a long period grating; the surface of the vortex fiber with the long period grating has a one-way non-uniformly engraved periodic grating structure or a structure with a periodically distributed refractive index. The single mode fiber is connected to the vortex fiber with the long period grating by means of fusion tapering, and the fiber polarization controller is arranged between the single mode fiber and the vortex fiber with the long period grating. The single mode fiber is used for coupling the Gaussian excitation light beam and the Gaussian suppression light beam into the vortex fiber with the long period grating. The fiber polarization controller is used to adjust the polarization state of the Gaussian suppression light beam incident from the single-mode fiber to the long-period grating engraved vortex fiber, and selectively excite a radial or angular polarization vortex suppression light beam from the long-period grating engraved vortex fiber; The long-period grating engraved vortex fiber is used to control the resonance condition by adjusting the grating period length and the number of periods during preparation, and when the resonance condition is met, the Gaussian suppression light beam is converted into a radial or angular polarization vortex suppression light beam at the resonance wavelength, and the non-resonance wavelength Gaussian excitation light beam is not mode-converted; wherein the resonance wavelength is the wavelength of the Gaussian suppression light beam.

7. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 1, wherein, The fiber array beam combining assembly comprises a two-dimensional fiber array fixed beam combiner and a microlens array arranged in sequence; The two-dimensional fiber array fixed beam combiner is directly connected with the M×N STED super-resolution optical fibers; the two-dimensional fiber array fixed beam combiner is used to fix and arrange the M×N STED super-resolution optical fibers into a two-dimensional array and then combine the beams; The microlens array is arranged on the exit light path of the two-dimensional fiber array fixed beam combiner and is fixed on an XYZ axis linear displacement stage; the microlens array is used to align and collimate the STED super-resolution dual-wavelength light beam array output by the two-dimensional fiber array fixed beam combiner; each STED super-resolution dual-wavelength light beam in the STED super-resolution dual-wavelength light beam array comprises the Gaussian excitation light beam and the radial or angular polarization vortex suppression light beam.

8. The resolution adjustable super-resolved fiber-digitalized maskless lithography device of claim 1, wherein, The pure polarization rotator comprises a third half-wave plate and a fourth half-wave plate; The fourth half-wave plate is fixed on a rotating adjustment frame; The pure polarization rotator is used to rotate the polarization direction of the radial or angular polarization vortex suppression light beam by changing the included angle between the fast axis of the third half-wave plate and the fourth half-wave plate, so as to obtain a generalized cylindrical vector vortex suppression light beam with different azimuth angles; M×N groups of Gaussian excitation light beams and generalized cylindrical vector vortex suppression light beams with different azimuth angles constitute a STED super-resolution dual-beam array; The azimuth angle is in the range of 0°-90°.

9. The resolution adjustable super-resolved fiber-nic digitalization maskless lithography apparatus of claim 1, wherein, The objective lens is an air, water immersion or oil immersion objective lens with a predetermined numerical aperture, and the numerical aperture is greater than 0.1; The objective lens is used to simultaneously focus the STED super-resolution dual-beam array comprising the Gaussian excitation light beam and the generalized cylindrical vector vortex suppression light beam with different azimuth angles onto the wafer plane; and focus the generalized cylindrical vector vortex suppression light beam with different azimuth angles to obtain a ring-shaped light field with different dark spot sizes, so as to realize adjustable lithography resolution.

10. A resolution-adjustable super-resolution fiber-digital maskless lithography method applied to the resolution-adjustable super-resolution fiber-digital maskless lithography device of any one of claims 1-9, characterized in that, The method comprises: programming a predetermined lithography pattern through the digital pattern programmer; controlling the on-off and output light beam intensity of the M×N digital light switches through the digital pattern programmer, so that the M×N STED super-resolution optical fibers are combined and collimated through the fiber array beam combining assembly to generate a STED super-resolution dual-beam array of the predetermined lithography pattern, and focused on the wafer surface placed on the three-dimensional displacement stage through the pure polarization rotator and the objective lens, to perform a multi-focal super-resolution lithography writing process of the predetermined pattern, and obtain discrete STED super-resolution lithography structures corresponding to part of the predetermined lithography pattern; determining a plurality of scanning directions based on the preset lithography pattern; for any of the scanning directions, using a nested scanning lithography mode, on the basis of the discrete STED super-resolution lithography structure, controlling the on-off and output beam intensity of the digital light switch corresponding to the remaining part of the nested scanning lithography by the digital pattern programmer, continuing to perform multiple scanning and writing, and finally obtaining a continuous STED super-resolution lithography structure corresponding to the preset lithography pattern.

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