A wavefront sensor microlens array assembly monitoring method

Abstract

This invention provides a method for assembling and monitoring a wavefront sensor microlens array, comprising: aligning the wavefront sensor to be assembled with a collimator and receiving parallel light emitted from the collimator; establishing a coordinate system between the microlens array and a back-end camera, and defining the rotation angle of the microlens array around each axis of the coordinate system; acquiring the current wavefront aberration read by the wavefront sensor before and after adjustment, and determining the rotation angle of the microlens array to be adjusted; calculating the data change based on the current wavefront aberration, and determining the adjustment step size for adjusting the rotation angle according to a predefined adjustment step size range; repeating the above steps to adjust the rotation error of the microlens array until all adjustment items of the microlens array meet the assembly accuracy requirements. This invention directly uses wavefront aberration to guide the assembly of the microlens array, without limiting the sub-aperture arrangement type of the microlens array, and can adjust the rotation angle.

Description

Technical Field

[0001] This invention belongs to the field of wavefront detection technology, specifically relating to a method for assembling and monitoring a wavefront sensor microlens array. Background Technology

[0002] Wavefront sensors based on microlens arrays, such as Hartmann sensors and light field sensors, have been widely used in adaptive optics, atmospheric parameter measurement, aspherical surface processing, laser beam detection, and human eye aberration detection. The key components of this type of wavefront sensor are the microlens array and the imaging detector; the arrangement and adjustment of their positions directly determine its performance.

[0003] Traditional wavefront sensing methods can obtain the local slope by calculating the centroid and then reconstructing the wavefront. For this type of wavefront sensing method, assembly calibration based on the centroid or slope can usually be used; specifically, coarse adjustment is first used to ensure that the light spot enters each sub-region, and then the assembly error of the microlens array is calculated based on the centroid position deviation of the light spot, and precise adjustment is made based on the calculated assembly error.

[0004] With the development of wavefront sensing technology, new wavefront sensing methods are emerging that directly reconstruct the wavefront from light intensity information, eliminating the need for local slope calculations. Examples include the Hartmann phase restoration method based on light field information and complex wavefront detection methods based on deep learning. Using centroid- or slope-based calibration methods becomes increasingly complex. If assembly errors can be directly calculated from the reconstructed wavefront, the assembly monitoring process will be simplified. Summary of the Invention

[0005] The purpose of this invention is to address the shortcomings of existing technologies that cannot simply calculate assembly errors from wavefront data, and to provide a wavefront sensor microlens array assembly monitoring method that directly uses wavefront aberration to guide microlens array assembly, without limiting the sub-aperture arrangement type of the microlens array, and can adjust the rotation angle.

[0006] To achieve the above objectives, the technical solution provided by this invention is:

[0007] A method for assembling and monitoring a wavefront sensor microlens array includes the following steps:

[0008] Step 1: Align the wavefront sensor to be assembled with the collimator and receive the parallel light emitted by the collimator.

[0009] Step 2: Establish a coordinate system between the microlens array and the rear camera, and define the rotation angles of the assembled microlens array about each axis of the coordinate system;

[0010] Step 3: Obtain the current wavefront aberration read by the wavefront sensor before and after adjustment, determine the rotation angle of the microlens array to be adjusted; and calculate the data change based on the current wavefront aberration, and determine the adjustment step size when adjusting the rotation angle according to the predefined adjustment step size range.

[0011] Step 4: Repeat Step 3 to adjust the rotation error of the microlens array until all adjustment items of the microlens array meet the assembly accuracy requirements.

[0012] Further, step one includes:

[0013] The wavefront sensor to be assembled is aligned with the collimator. The light emitted from the collimator makes the incident light of each microlens array parallel. The parallel light is transmitted through the microlens array and focused onto the back camera in the wavefront sensor. The assembly error between the microlens array and the back camera causes the wavefront distortion measured by the wavefront sensor to increase, which is the distorted wavefront.

[0014] Furthermore, step two includes:

[0015] Using the rear camera as a reference, with the horizontal direction as the x-axis, the vertical direction as the y-axis, and the normal direction as the z-axis, a coordinate system is established between the microlens array of the wavefront sensor and the rear camera during assembly and adjustment.

[0016] The rotation angle of the assembled microlens array around the x-axis of the coordinate system is defined as α, the rotation angle around the y-axis of the coordinate system is defined as β, and the rotation angle around the z-axis of the coordinate system is defined as γ.

[0017] Furthermore, step three includes:

[0018] Based on the wavefront distortion received in step one, generated by comparing the parallel light before and after passing through the microlens array, the current wave phase difference of the wavefront distortion transmitted to the back camera after the assembly is completed and before the rotation adjustment has started is obtained. This difference is compared with the current wave phase difference before and after adjustment obtained by adjusting the microlens array transmitted to the back camera. The rotation angle of the microlens array when it is to be adjusted and the adjustment step size when it is to be adjusted based on the previous adjustment are then determined.

[0019] Based on the microlens array that has met the assembly and adjustment accuracy requirements after assembly and adjustment, the adjustment step size range of the current microlens array is defined, and the adjustment step size for the next adjustment of the rotation angle is updated by the adjustment step size range and the current adjustment step size.

[0020] Furthermore, the calculation of the rotation angle to be adjusted in step three is specifically as follows:

[0021] Describe the Zernike polynomial of the current wave phase difference during adjustment, read the current wavefront data corresponding to the current wave phase difference, and determine the Zernike coefficients of each term in the Zernike polynomial corresponding to the current wavefront data.

[0022] By comparing the absolute values ​​of the Zernike coefficients C3 (3rd term), C5 (5th term), and C14 (14th term) in the Zernike polynomial, the rotation angles α, β, and γ of the x, y, and z axes in the coordinate system are determined. Specifically, if the absolute value of C3 is the largest, the rotation angle α is adjusted; if the absolute value of C5 is the largest, the rotation angle β is adjusted; and if the absolute value of C14 is the largest, the rotation angle γ is adjusted.

[0023] The adjustment is performed according to the adjustment step size corresponding to each adjustment item. This adjustment step size is determined based on the pre-defined ranges of adjustment step sizes dα, dβ, and dγ corresponding to the rotation angles α, β, and γ, respectively. The initial values ​​of these ranges are α0, β0, and γ0, respectively, and the maximum absolute values ​​of these ranges are α0, β0, and γ0, respectively. m β m γ m .

[0024] Furthermore, the calculation of the adjustment step size for the next rotation angle adjustment in step three is as follows:

[0025] Based on the pre-defined ranges of adjustment step sizes dα, dβ, and dγ corresponding to rotation angles α, β, and γ, and according to the changes in the parallel light transmitted by the microlens array before and after adjustment and the corresponding changes in Zernike coefficients of the Zernike polynomial, the adjustment step size for the next rotation angle adjustment is updated using the range of the adjustment step size and the current adjustment step size; wherein:

[0026] If α is adjusted, the adjustment step size is dα. After adjustment, the Zernike coefficient C3 changes from C3 to C 3p Adjust the step size to update dα = C 3p / (C3-C 3p ) dα, if |dα|>α m Then dα=α m ·dα / |dα|;

[0027] If β is adjusted, the adjustment step size is dβ. After adjustment, the Zernike coefficient C5 changes from C5 to C 5p Adjust the step size to update dβ = C 5p / (C5-C 5p ) dβ, if |dβ|>β m Then dβ=β m ·dβ / |dβ|;

[0028] If γ is adjusted, the adjustment step size is dγ. After adjustment, the Zernike coefficient C... 14 By C 14 Change to C 14p Adjust the step size to update dγ = C 14p / (C 14 -C 14p ) dγ, if |dγ|>γ m Then dγ=γ m ·dγ / |dγ|.

[0029] Furthermore, step four includes:

[0030] Repeatedly adjust the rotation error of the microlens array in the wavefront sensor to be assembled until all adjustment terms of the wavefront aberration expressed by the Zernike polynomial for the parallel light projected by the microlens array meet the following corresponding assembly accuracy requirements:

[0031] The third criterion is the absolute value of the Zernike coefficient C3, |C3| < C3 coefficient. 3m ;

[0032] The fifth criterion is the absolute value of the Zernike coefficient C5, |C5| < C5 coefficient. 5m ;

[0033] Item 14: Zernike coefficient C14 absolute value |C14| < C14 coefficient determination criterion C 14m .

[0034] The advantages of this invention are:

[0035] This invention directly uses wavelet aberration to guide the assembly of microlens arrays, without limiting the sub-aperture arrangement type of the microlens array, and can adjust the rotation angle.

[0036] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0037] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0038] Figure 1 The present invention provides a flowchart of a wavefront sensor microlens array assembly and monitoring method;

[0039] Figure 2 The present invention provides a flowchart of an assembly and monitoring method for an example of assembling and adjusting a wavefront sensor microlens array;

[0040] Figure 3 : A schematic diagram showing the positions of the wavefront sensor microlens array and the back camera provided by this invention;

[0041] Figure 4 This invention provides a schematic diagram of establishing a coordinate system in a wavefront sensor microlens array assembly and monitoring method.

[0042] Figure 5 The Zernike coefficients corresponding to different rotation errors in the microlens array assembly and adjustment example provided by this invention are: α=5°, β=5°, γ=5°.

[0043] Figure 6 The Zernike coefficients corresponding to different rotation errors in the microlens array assembly and adjustment example provided by this invention are: α=5°, β=5°, γ=6°.

[0044] Figure 7 The Zernike coefficients corresponding to different rotation errors in the microlens array assembly and adjustment example provided by this invention are: α=5°, β=5°, γ=4°.

[0045] Figure 8 The present invention provides a curve showing the change of the Zernike coefficient during the adjustment of the microlens array.

[0046] Figure 9 The present invention provides a curve showing the change in rotation angle error during the adjustment of the microlens array. Detailed Implementation

[0047] The embodiments of the present invention are described in detail below. These embodiments are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0048] Taking the wavefront sensor to be assembled as an example, the microlens array in this embodiment is selected as a square arrangement. Since this embodiment can be directly guided by wavefront aberration for assembly, other embodiments of this embodiment are not limited to a square arrangement, but can also be hexagonal or radial arrangements. Furthermore, the following steps of this embodiment are applicable to both traditional and novel wavefront sensing methods, and can reduce the error of the rotation angle value when adjusting the rotation angle during the assembly of the microlens array in the wavefront sensor assembly process, thereby improving the performance of the assembled microlens array. It should be noted that the wavefront sensor assembly error in this embodiment includes not only rotation angle error but also translation error. This embodiment can reduce the rotation angle error, and the translation error can be easily adjusted through the tilt term in wavefront aberration. Therefore, the following embodiments of this invention only address the adjustment of rotation angle error.

[0049] See Figure 1This invention provides a method for assembling and monitoring a wavefront sensor microlens array.

[0050] Includes the following steps:

[0051] Step 1: Align the wavefront sensor to be assembled with the collimator and receive the parallel light emitted by the collimator.

[0052] Step one of this embodiment specifically includes: aligning the wavefront sensor to be assembled with a collimator, the light emitted from the collimator making the incident light of each microlens array parallel, the parallel light being transmitted and focused by the microlens array onto the back camera in the wavefront sensor, the assembly error between the microlens array and the back camera (in this embodiment, the back camera is the imaging detector used for imaging in the wavefront sensor) causes the wavefront distortion measured by the wavefront sensor after assembly to increase, which is the distorted wavefront, thereby enabling the current wavefront aberration to be obtained.

[0053] In this embodiment, the parameters of the wavefront sensor to be assembled are as follows: a square arrangement of microlens arrays, with 10 microlenses along the side length, and each microlens unit has a circular aperture, preferably with a diameter of 1 mm. In this embodiment, the microlens diameter is 100 μm and the focal length is 4 mm. In this embodiment, the wavefront is reconstructed using a standard normalized Zernike polynomial expansion via a back-facing camera, and the Zernike coefficients in the Zernike polynomial correspond to the RMS values ​​of the Zernike terms.

[0054] See Figure 2 This embodiment is based on the above assembly and adjustment example. In the assembly and adjustment method of the microlens array in the assembly monitoring of this example, the wavefront sensor to be assembled is first aligned with the collimator, and then the parallel light emitted by the collimator is received after the coordinate system is established and the approximate range of the rotation angle is defined.

[0055] Step 2: Establish a coordinate system between the microlens array and the back camera, and define the rotation angles of the assembled microlens array around each axis of the coordinate system.

[0056] Step two of this embodiment specifically includes: establishing a coordinate system between the wavefront sensor and the microlens array during assembly, using the back camera as a reference, the horizontal direction as the x-axis, the vertical direction as the y-axis, and the normal direction as the z-axis. The established coordinate system is as follows: Figure 4 As shown. In addition, step two of this embodiment defines the rotation angle around the x-axis of the coordinate system as α, the rotation angle around the y-axis as β, and the rotation angle around the z-axis as γ when assembling the microlens array for rotational adjustment. In this embodiment, the initial rotation angle error of the microlens array can be expressed as: α = 5°, β = 5°, γ = 5°.

[0057] Step 3: Obtain the current wavefront aberration read by the wavefront sensor before and after adjustment, determine the rotation angle of the microlens array to be adjusted; and calculate the data change based on the current wavefront aberration, and determine the adjustment step size when adjusting the rotation angle according to the predefined adjustment step size range.

[0058] See Figure 2 In the assembly monitoring method of the wavefront sensor microlens array assembly and adjustment example in this embodiment, step three of the above embodiment of the present invention specifically includes: specifically including: based on Figure 3 The back camera in the middle receives the wavefront distortion generated by the comparison of parallel light passing through the microlens array before and after the light passes through it. It obtains the current wave phase difference of the wavefront distortion transmitted to the back camera after the assembly is completed but before the rotation adjustment has started. It also adjusts the current wave phase difference of the microlens array transmitted to the back camera before and after the adjustment, and determines the rotation angle of the microlens array when it is to be adjusted and the adjustment step size when it is to be adjusted based on the previous adjustment.

[0059] In step three of this embodiment, the calculation of the rotation angle to be adjusted specifically involves: describing the Zernike polynomial of the current wave phase difference during adjustment; reading the current wavefront data corresponding to the current wave phase difference; determining the Zernike coefficients of each term in the Zernike polynomial corresponding to the current wavefront data; comparing the absolute values ​​of the 3rd Zernike coefficient C3, the 5th Zernike coefficient C5, and the 14th Zernike coefficient C14 in the Zernike polynomial to determine the rotation angles α, β, and γ of the x, y, and z axes in the coordinate system; wherein, if the absolute value of C3 is the largest, the rotation angle α is adjusted; if the absolute value of C5 is the largest, the rotation angle β is adjusted; and if the absolute value of C14 is the largest, the rotation angle γ is adjusted; adjusting the adjustment term according to the adjustment step size corresponding to each adjustment term, wherein the adjustment step size is determined based on the predefined range of the adjustment step sizes dα, dβ, and dγ corresponding to the rotation angles α, β, and γ, respectively, with initial values ​​of α0, β0, and γ0, and maximum values ​​of absolute values ​​of α0, β0, and γ0, respectively. m β m γ m .

[0060] See Figure 2 In this embodiment, the specific process of defining the adjustment step size is as follows: Based on the microlens array that has met the assembly and adjustment accuracy requirements after assembly and adjustment, the adjustment step size range of the current microlens array is defined, and the adjustment step size for the next adjustment of the rotation angle is updated by adjusting the adjustment step size range and the current adjustment step size.

[0061] According to the above process of the embodiments of the present invention, an initial value, a maximum value, and a minimum value of the adjustment step size can be defined. In this embodiment, the initial values ​​of the adjustment step size of the rotation angle are dα0=1°, dβ0=1°, and dγ0=1°, respectively. The maximum absolute values ​​of the adjustment step size of the rotation angle in this embodiment are dα0=1°, dβ0=1°, and dγ0=1°, respectively. m =2°, dβ m =2°、dγ m =2°; and according to the adjustment step size determined in step three above for the next rotation angle adjustment, specifically: based on the range of adjustment step sizes dα, dβ, and dγ corresponding to the pre-defined rotation angles α, β, and γ, respectively, and according to the change in the parallel light transmitted by the microlens array before and after adjustment and the change in Zernike coefficients corresponding to the Zernike polynomial, the adjustment step size for the next rotation angle adjustment is updated by the range of adjustment step size and the current adjustment step size; where: if α is adjusted, the adjustment step size is dα, and after adjustment, the Zernike coefficient C3 changes from C3 to C 3p Adjust the step size to update dα = C 3p / (C3-C 3p ) dα, if |dα|>α m Then dα=α m ·dα / |dα|; If β is adjusted, the adjustment step size is dβ. After adjustment, the Zernike coefficient C5 changes from C5 to C 5p Adjust the step size to update dβ = C 5p / (C5-C 5p ) dβ, if |dβ|>β m Then dβ=β m ·dβ / |dβ|; If γ is adjusted, the adjustment step size is dγ. After adjustment, the Zernike coefficient C 14 By C 14 Change to C 14p Adjust the step size to update dγ = C 14p / (C 14 -C 14p ) dγ, if |dγ|>γ m Then dγ=γ m ·dγ / |dγ|.

[0062] Step 4: Repeat step 3 to adjust the rotation error of the microlens array until all adjustment items of the microlens array meet the assembly accuracy requirements.

[0063] Step four of the present invention specifically includes: repeatedly adjusting the rotation error of the microlens array in the wavefront sensor to be assembled until all adjustment terms of the wavefront aberration expressed by the Zernike polynomial for the parallel light projected by the microlens array meet the following corresponding assembly accuracy requirements:

[0064] The third criterion is the absolute value of the Zernike coefficient C3, |C3| < C3 coefficient. 3m ; Item 5: Zernike coefficient C5 absolute value |C5| < C5 coefficient determination criterion C 5m ; Item 14: Zernike coefficient C14 absolute value |C14| < C14 coefficient determination criterion C 14m .

[0065] For more details, please refer to [link / reference]. Figure 3 In this embodiment, the current wavefront data (Zernike coefficients) output by the wavefront sensor is read, and the Zernike coefficients C3, C5, and C6 are compared at the 3rd, 5th, and 14th terms. 14 The absolute value determines the adjustment term. If the absolute value of |C3| is the largest, then adjust α; if the absolute value of |C5| is the largest, then adjust β; if |C 14 If the absolute value is the largest, then adjust γ. It can be seen that C... 14 The absolute value is the largest, therefore the adjustment term is γ. The adjustment term is adjusted according to its corresponding adjustment step size, which is the initial adjustment step size, dγ = dγ0 = 1°. After adjustment, the current wavefront data (Zernike coefficients) output by the wavefront sensor is read. Based on the change in Zernike coefficients before and after adjustment, the adjustment step size is updated; since γ was adjusted previously, its adjustment step size dγ is updated, after which dγ = -2°. The Zernike coefficient determination criterion is set as: C. 3m =0.001λ、C 5m =0.001λ、C 14m =0.001λ.

[0066] Clearly, the Zernike coefficient at this point does not meet the requirements; refer to Figure 5 , Figure 6 and Figure 7 Repeat the above process, with the adjustment term remaining γ; the adjustment step size is dγ = -2°, and after adjustment, as follows: Figure 7 As shown. The Zernike coefficients in the Zernike polynomial corresponding to the current wavefront data output by the wavefront sensor are read. This dynamic process is repeated until at least three of the 35 terms of the Zernike polynomial meet the requirements.

[0067] See Figure 8 and Figure 9 , Figure 8 The curves showing the change of the Zernike coefficient during the adjustment process are given. Figure 9 The curve showing the change in rotation angle error during the adjustment process is presented. From... Figure 8 and Figure 9As can be seen, with the increase of the number of adjustment steps, the Zernike coefficients and rotation angle error in the Zernike polynomial tend to 0, satisfying the convergence condition, proving that the method of this embodiment can effectively realize the monitoring of the wavefront sensor microlens array and can adjust the rotation angle of the microlens array.

[0068] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the scope of the technology disclosed in the present invention, and such modifications or substitutions should all be covered within the scope of protection of the present invention.

Claims

1. A method for assembling and monitoring a wavefront sensor microlens array, characterized in that, Includes the following steps: Step 1: Align the wavefront sensor to be assembled with the collimator and receive the parallel light emitted by the collimator. Step 2: Establish a coordinate system between the microlens array and the back camera, and define the rotation angle of the microlens array about each axis of the coordinate system. Step 3: Obtain the current wavefront aberration read by the wavefront sensor before and after adjustment, and determine the rotation angle of the microlens array to be adjusted; Furthermore, the data change is calculated based on the current wave aberration, and the adjustment step size for rotation angle adjustment is determined according to the predefined adjustment step size range; Step 4: Repeat Step 3 to adjust the rotation error of the microlens array until all adjustment items of the microlens array meet the assembly accuracy requirements.

2. The wavefront sensor microlens array assembly and monitoring method according to claim 1, characterized in that, Step one includes: The wavefront sensor to be assembled is aligned with the collimator. The light emitted from the collimator makes the incident light of each microlens array parallel. The parallel light is transmitted through the microlens array and focused onto the back camera in the wavefront sensor. The assembly error between the microlens array and the back camera causes the wavefront distortion measured by the wavefront sensor to increase, which is the distorted wavefront.

3. The wavefront sensor microlens array assembly and monitoring method according to claim 1, characterized in that, Step two includes: Using the back camera in the wavefront sensor as the reference, with the horizontal direction as the x-axis, the vertical direction as the y-axis, and the normal direction as the z-axis, a coordinate system is established between the microlens array and the back camera of the wavefront sensor during assembly and adjustment. The rotation angle of the assembled microlens array around the x-axis of the coordinate system is defined as α, the rotation angle around the y-axis of the coordinate system is defined as β, and the rotation angle around the z-axis of the coordinate system is defined as γ.

4. The wavefront sensor microlens array assembly and monitoring method according to claim 1, characterized in that, Step three includes: Based on the wavefront distortion received in step one, generated by comparing the parallel light before and after passing through the microlens array, the current wave phase difference of the wavefront distortion transmitted to the back camera after the assembly is completed and before the rotation adjustment has started is obtained. This difference is compared with the current wave phase difference before and after adjustment obtained by adjusting the microlens array transmitted to the back camera. The rotation angle of the microlens array when it is to be adjusted and the adjustment step size when it is to be adjusted based on the previous adjustment are then determined. Based on the microlens array that has met the assembly and adjustment accuracy requirements after assembly and adjustment, the adjustment step size range of the current microlens array is defined, and the adjustment step size for the next adjustment of the rotation angle is updated by the adjustment step size range and the current adjustment step size.

5. The wavefront sensor microlens array assembly and monitoring method according to claim 4, characterized in that, The calculation of the rotation angle to be adjusted in step three includes the following steps: Describe the Zernike polynomial of the current wave phase difference during adjustment, read the current wavefront data corresponding to the current wave phase difference, and determine the Zernike coefficients of each term in the Zernike polynomial corresponding to the current wavefront data. By comparing the absolute values ​​of the Zernike coefficients C3 (3rd term), C5 (5th term), and C14 (14th term) in the Zernike polynomial, the rotation angles α, β, and γ of the x, y, and z axes in the coordinate system are determined. Specifically, if the absolute value of C3 is the largest, the rotation angle α is adjusted; if the absolute value of C5 is the largest, the rotation angle β is adjusted; and if the absolute value of C14 is the largest, the rotation angle γ is adjusted. The adjustment is performed according to the adjustment step size corresponding to each adjustment item. This adjustment step size is determined based on the pre-defined ranges of adjustment step sizes dα, dβ, and dγ corresponding to the rotation angles α, β, and γ, respectively. The initial values ​​of these ranges are α0, β0, and γ0, respectively, and the maximum absolute values ​​of these ranges are α0, β0, and γ0, respectively. m β m γ m .

6. The wavefront sensor microlens array assembly and monitoring method according to claim 4, characterized in that, The calculation of the adjustment step size for the next rotation angle adjustment in step three is as follows: Based on the pre-defined ranges of adjustment step sizes dα, dβ, and dγ corresponding to rotation angles α, β, and γ, and according to the changes in the parallel light transmitted by the microlens array before and after adjustment and the corresponding changes in Zernike coefficients of the Zernike polynomial, the adjustment step size for the next rotation angle adjustment is updated using the range of the adjustment step size and the current adjustment step size; wherein: If α is adjusted, the adjustment step size is dα. After adjustment, the Zernike coefficient C3 changes from C3 to C 3p Adjust the step size to update dα = C 3p / (C3-C 3p ) dα, if |dα|>α m Then dα=α m ·dα / |dα|; If β is adjusted, the adjustment step size is dβ. After adjustment, the Zernike coefficient C5 changes from C5 to C 5p Adjust the step size to update dβ = C 5p / (C5-C 5p ) dβ, if |dβ|>β m Then dβ=β m ·dβ / |dβ|; If γ is adjusted, the adjustment step size is dγ. After adjustment, the Zernike coefficient C... 14 By C 14 Change to C 14p Adjust the step size to update dγ = C 14p / (C 14 -C 14p ) dγ, if |dγ|>γ m Then dγ=γ m ·dγ / |dγ|.

7. The wavefront sensor microlens array assembly and monitoring method according to claim 1, characterized in that, Step four includes: Repeatedly adjust the rotation error of the microlens array in the wavefront sensor to be assembled until all adjustment terms of the wavefront aberration expressed by the Zernike polynomial for the parallel light projected by the microlens array meet the following corresponding assembly accuracy requirements: The third criterion is the absolute value of the Zernike coefficient C3, |C3| < C3 coefficient. 3m ; The fifth criterion is the absolute value of the Zernike coefficient C5, |C5| < C5 coefficient. 5m ; Item 14: Zernike coefficient C14 absolute value |C14| < C14 coefficient determination criterion C 14m .

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