Wide-spectrum high-transmission low-reflection glass surface modification process and application thereof

Abstract

The application provides a wide-spectrum high-transmittance low-reflectance glass surface modification process and application thereof, relates to the technical field of optical materials and glass surface treatment, and comprises the following steps: providing a glass substrate for wide-spectrum transmission application, and performing surface pretreatment on the glass substrate. The wide-spectrum high-transmittance low-reflectance glass surface modification process and application thereof are characterized in that: the surface of the glass substrate is pretreated, the glass substrate is immersed in a surface modification liquid containing silicon oxide particles and aluminum oxide particles, and a surface modification layer is formed on the surface of the glass substrate after immersion, pulling and drying, so that the optical performance of the glass surface is improved; the obtained glass has high transmittance and low reflectance in a wide-spectrum range of 380nm-1400nm, and can meet the application requirements of wide-spectrum transmission devices such as display cover plates, optical windows, sensor protection sheets, imaging module light transmission components and photoelectric detection components.

Description

Technical Field

[0001] This invention relates to the field of optical materials and glass surface treatment technology, specifically to a broad-spectrum, high-transmittance, low-reflection glass surface modification process and its application. Background Technology

[0002] Glass materials are widely used in display covers, optical windows, sensor protective sheets, lighting devices, imaging modules, and optoelectronic detection components. These products prioritize both light transmittance and surface reflectance. When light strikes a glass surface, reflection and energy loss occur, affecting image quality, detection accuracy, and light output performance. To address this need, the industry has developed several technologies for enhancing light transmittance and reducing reflection. One approach involves fabricating micro / nano structures on the glass surface, using surface morphology to adjust the incident and propagation states of light. Another approach involves applying single or multiple functional films to the glass surface, utilizing the refractive index relationships between different materials to reduce reflection. Other solutions employ processes such as wet coating, sol-gel, heat treatment, and vacuum deposition to modify the surface of substrates such as ordinary glass, borosilicate glass, and high borosilicate glass. Existing technologies already cover applications of enhancing light transmittance and reducing reflection in the visible light region and also address broader wavelength transmission requirements, with different processes corresponding to different substrate conditions, production conditions, and product applications.

[0003] The core problem with existing technologies is the complexity of the process and the high manufacturing cost. Anti-reflective coating of glass surfaces often involves multiple processes, requires strict control of process parameters, and demands high levels of equipment investment and production management. This limits existing solutions in terms of large-area processing, mass production, and cost control, making it difficult to simultaneously meet the application requirements of high transmittance, low reflectance, and low cost across a wide spectral range. Summary of the Invention

[0004] To address the shortcomings of existing technologies, this invention provides a broad-spectrum, high-transmittance, low-reflection glass surface modification process and its application. The technical problem this invention aims to solve is: how to address the issues of complexity, high cost, and difficulty in large-scale application of existing broad-spectrum anti-reflection and anti-reflection processes by using a glass surface modification process that combines silicon oxide and aluminum oxide to form a film.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a broad-spectrum, high-transmittance, low-reflection glass surface modification process, comprising: S1. Provide a glass substrate for broadband transmission applications, and perform surface pretreatment on the glass substrate; S2. Disperse silica particles and alumina particles in a liquid medium to prepare a surface-modified liquid, and heat the surface-modified liquid to the wetting treatment temperature; S3. Immerse the glass substrate in the surface modification liquid for surface wetting, so that the surface modification liquid adheres to the surface of the glass substrate; S4. The glass substrate that has been surface-wetted is lifted out of the surface modification liquid and dried. The liquid medium adhering to the surface of the glass substrate evaporates, and the silica particles and alumina particles dispersed in the liquid medium adhere to the surface of the glass substrate to form a surface modification layer. S5. Obtain a broadband high-transmittance low-reflection glass with the surface modification layer formed on its surface; the broadband wavelength range is 380nm-1400nm.

[0006] Preferably, the glass substrate is selected from soda-lime glass, medium borosilicate glass, or high borosilicate glass.

[0007] Preferably, the surface pretreatment includes cleaning and drying, wherein the cleaning time is 3-15 minutes and the drying time is 5-20 minutes.

[0008] Preferably, the dispersion is a stirring dispersion; the stirring dispersion time is 10 min-60 min; and the wetting treatment temperature of the surface modification liquid is 60℃-80℃.

[0009] Preferably, the liquid medium is a diluent, and the surface-modifying liquid is prepared by mixing the slurry with the diluent; the slurry includes the silica particles and the alumina particles; the mass ratio of the silica particles to the alumina particles is 1:2-2:1; the average particle size of the silica particles is 20nm-80nm, and the average particle size of the alumina particles is 30nm-120nm; the ratio of the slurry to the liquid medium is 1:8-1:12.

[0010] Preferably, the surface wetting time is 4-6 minutes.

[0011] Preferably, the lifting is a uniform lifting at a speed of 1.5 mm / s to 3 mm / s; the drying process is room temperature air drying for 5 min to 30 min.

[0012] Preferably, the surface modification layer is a granular layer covering the surface of the glass substrate, and the granular layer is formed by the silicon oxide particles and the aluminum oxide particles attached to the surface of the glass substrate.

[0013] An application of a broadband high-transmittance low-reflection glass, used as a light-transmitting component of a broadband transmission device in the 380nm-1400nm band, wherein the broadband transmission device includes a display cover plate, an optical window, a sensor protective sheet, a light-transmitting component of an imaging module, and a photoelectric detection component.

[0014] This invention provides a broad-spectrum, high-transmittance, low-reflection glass surface modification process and its application. It offers the following advantages: This broadband high-transmittance low-reflectance glass surface modification process and its application involve pretreating the glass substrate and immersing it in a surface modification solution containing silica and alumina particles. After wetting, pulling, and drying, a surface modification layer is formed on the glass substrate surface, thereby improving the optical properties of the glass surface. The resulting glass exhibits both high transmittance and low reflectance in a broadband spectral range of 380nm-1400nm, meeting the application requirements of broadband transmission devices such as display cover plates, optical windows, sensor protective sheets, imaging module light-transmitting components, and photoelectric detection components.

[0015] A surface modification liquid is formed by combining silica particles and alumina particles. Combined with processes such as heated impregnation, uniform pulling, and room temperature air drying, the particles can be evenly attached to the surface of the glass substrate to form a stable granular surface modification layer. This is beneficial for improving the light transmission and anti-reflection effect of the glass surface. Moreover, the process is simple and easy to control, and it has good applicability to soda-lime glass, medium borosilicate glass, and high borosilicate glass, which has good practical value and promotion significance. Attached Figure Description

[0016] Figure 1 This is the main process flow diagram of the present invention; Figure 2 This is a schematic diagram illustrating the formation of the surface modification layer of the present invention; Figure 3 This is a schematic diagram illustrating an application scenario of the present invention. Detailed Implementation

[0017] The technical solutions in the embodiments of the present invention have been clearly and completely described. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0018] Example 1 like Figure 1-3 As shown, this embodiment of the invention provides a broad-spectrum, high-transmittance, low-reflection glass surface modification process, including: S1. Provides a glass substrate for broadband transmission applications, and performs surface pretreatment on the glass substrate. The glass substrate is borosilicate glass. The surface pretreatment includes cleaning and drying, with a cleaning time of 3 minutes and a drying time of 5 minutes.

[0019] S2. Silica particles and alumina particles are dispersed in a liquid medium to prepare a surface-modified liquid, which is then heated to the wetting treatment temperature. Dispersion is performed by stirring for 10 minutes. The wetting treatment temperature of the surface-modified liquid is 60°C. The liquid medium is a diluent, and the surface-modified liquid is prepared by mixing a slurry with the diluent. The slurry includes silica particles and alumina particles. The mass ratio of silica particles to alumina particles is 1:2. The average particle size of the silica particles is 20 nm, and the average particle size of the alumina particles is 30 nm. The ratio of the slurry to the liquid medium is 1:8.

[0020] S3. Immerse the glass substrate in the surface modification solution for surface wetting, allowing the surface modification solution to adhere to the surface of the glass substrate. The surface wetting time is 4 minutes.

[0021] S4. The glass substrate, after surface impregnation, is lifted out of the surface modification liquid and dried. The liquid medium adhering to the surface of the glass substrate evaporates, and the silica and alumina particles dispersed in the liquid medium adhere to the surface of the glass substrate, forming a surface modification layer. The lifting is performed at a uniform speed of 1.5 mm / s. The drying process is air drying at room temperature for 5 minutes. The surface modification layer is a granular layer covering the surface of the glass substrate, formed by the silica and alumina particles adhering to the surface of the glass substrate.

[0022] S5. Obtain a broadband high-transmittance, low-reflection glass with a surface modification layer formed on its surface. The broadband wavelength range is 380 nm.

[0023] An application of a broadband high-transmittance low-reflection glass, used as a light-transmitting component of a 380nm broadband transmission device, the broadband transmission device including a display cover plate, an optical window, a sensor protective sheet, a light-transmitting component of an imaging module, and a photoelectric detection component.

[0024] This invention, even with the lowest possible process parameters, can still modify the glass surface and form a surface-modified layer composed of silica and alumina particles. This demonstrates that the technical solution has clear feasibility and layering capability under relatively low process conditions. Therefore, this invention does not rely on high or strong process conditions to achieve the desired processing objective; rather, the technical solution can be constructed under relatively basic implementation conditions. It is suitable for surface treatment scenarios of light-transmitting components where process conditions are relatively mild and process feasibility and ease of implementation are emphasized.

[0025] Example 2 This invention provides a process for modifying the surface of a wide-spectrum, high-transmittance, low-reflection glass, comprising: S1. Provides a glass substrate for broadband transmission applications, and performs surface pretreatment on the glass substrate. The glass substrate is borosilicate glass. The surface pretreatment includes cleaning and drying, with a cleaning time of 9 min and a drying time of 12.5 min.

[0026] S2. Silica particles and alumina particles are dispersed in a liquid medium to prepare a surface-modified liquid, which is then heated to the wetting treatment temperature. Dispersion is performed by stirring for 35 minutes. The wetting treatment temperature of the surface-modified liquid is 70°C. The liquid medium is a diluent, and the surface-modified liquid is prepared by mixing a slurry with the diluent. The slurry includes silica particles and alumina particles. The mass ratio of silica particles to alumina particles is 1:1. The average particle size of the silica particles is 50 nm, and the average particle size of the alumina particles is 75 nm. The ratio of the slurry to the liquid medium is 1:10.

[0027] S3. Immerse the glass substrate in the surface modification solution for surface wetting, allowing the surface modification solution to adhere to the surface of the glass substrate. The surface wetting time is 5 minutes.

[0028] S4. The glass substrate, after surface impregnation, is lifted out of the surface modification liquid and dried. The liquid medium adhering to the surface of the glass substrate evaporates, and the silica and alumina particles dispersed in the liquid medium adhere to the surface of the glass substrate, forming a surface modification layer. The lifting is performed at a uniform speed of 2.25 mm / s. The drying process is performed at room temperature for 17.5 minutes. The surface modification layer is a granular layer covering the surface of the glass substrate, formed by the silica and alumina particles adhering to the surface of the glass substrate.

[0029] S5. Obtain a broadband high-transmittance, low-reflection glass with a surface modification layer formed on its surface. The broadband wavelength range is 890 nm.

[0030] An application of a broadband high-transmittance low-reflection glass, used as a light-transmitting component of an 890nm broadband transmission device, the broadband transmission device including a display cover, an optical window, a sensor protective sheet, a light-transmitting component of an imaging module, and a photoelectric detection component.

[0031] When the process parameters are in the middle range, this invention can stably achieve glass surface modification and form the expected surface modification layer, reflecting the good overall performance of this technical solution in terms of parameter matching, process coordination, and implementation stability. This embodiment can fully demonstrate the overall technical concept and conventional implementation state of this invention, and is suitable for application scenarios with comprehensive requirements for light transmittance, anti-reflection performance, and process stability. It can serve as a representative example of a typical implementation of this invention.

[0032] Example 3 This invention provides a process for modifying the surface of a wide-spectrum, high-transmittance, low-reflection glass, comprising: S1. Provides a glass substrate for broadband transmission applications, and performs surface pretreatment on the glass substrate. The glass substrate is borosilicate glass. The surface pretreatment includes cleaning and drying, with a cleaning time of 15 min and a drying time of 20 min.

[0033] S2. Silica particles and alumina particles are dispersed in a liquid medium to prepare a surface-modified liquid, which is then heated to the wetting treatment temperature. Dispersion is performed by stirring for 60 minutes. The wetting treatment temperature of the surface-modified liquid is 80°C. The liquid medium is a diluent, and the surface-modified liquid is prepared by mixing a slurry with the diluent. The slurry includes silica particles and alumina particles. The mass ratio of silica particles to alumina particles is 2:1. The average particle size of the silica particles is 80 nm, and the average particle size of the alumina particles is 120 nm. The ratio of the slurry to the liquid medium is 1:12.

[0034] S3. Immerse the glass substrate in the surface modification solution for surface wetting, allowing the surface modification solution to adhere to the surface of the glass substrate. The surface wetting time is 6 minutes.

[0035] S4. The surface-wetting glass substrate is lifted out of the surface modification liquid and dried. The liquid medium adhering to the surface of the glass substrate evaporates, and the silica and alumina particles dispersed in the liquid medium adhere to the surface of the glass substrate, forming a surface modification layer. The lifting is performed at a uniform speed of 3 mm / s. The drying process is air drying at room temperature for 30 minutes. The surface modification layer is a granular layer covering the surface of the glass substrate, formed by the silica and alumina particles adhering to the surface of the glass substrate.

[0036] S5. Obtain a broadband high-transmittance, low-reflection glass with a surface modification layer formed on its surface. The broadband wavelength range is 1400 nm.

[0037] An application of a broadband high-transmittance low-reflection glass, used as a light-transmitting component of a 1400nm broadband transmission device, the broadband transmission device including a display cover plate, an optical window, a sensor protective sheet, a light-transmitting component of an imaging module, and a photoelectric detection component.

[0038] Even under the extreme conditions of various process parameters, this invention can still complete glass surface modification and form the target surface modification layer, demonstrating that this technical solution remains continuously and completely feasible under high process intensity conditions. Therefore, the parameter range defined by this invention has strong inclusiveness and coverage; it is not only valid under local conditions but also maintains the effective realization of the technical solution even under high-limit implementation conditions. It is suitable for light-transmitting device applications with high requirements for sufficient surface modification, degree of functional layer construction, and overall optical performance.

[0039] Example 4 To investigate the effects of different process parameters on the surface modification of broadband high-transmittance low-reflection glass, high borosilicate glass from the same batch was selected as the sample, and experimental groups 1, 2 and 3 were set up.

[0040] All three groups of samples were processed into glass slides of 50mm × 50mm × 1.1mm, with 5 slides taken from each group. Experimental group 1 used the lower limit parameter combination, experimental group 2 used the intermediate parameter combination, and experimental group 3 used the upper limit parameter combination. The process parameters for all three groups were determined according to the aforementioned implementation method.

[0041] 1. Substrate pretreatment In experimental group 1, the borosilicate glass was first immersed in the cleaning solution for 3 minutes, followed by drying for 5 minutes. Due to the short pretreatment time, the glass surface could achieve a basically clean state, but the degree of activation was relatively limited.

[0042] In Experiment 2, the pretreatment process for the same batch of glass substrates was appropriately extended, with the cleaning time controlled at 9 minutes, followed by drying for 12.5 minutes. After treatment, the substrate surface was more uniform, with no obvious watermarks remaining, providing more stable surface conditions for subsequent particle adhesion.

[0043] In Experiment 3, to enhance the cleanliness and consistency of the substrate surface, the cleaning time was further extended to 15 minutes, combined with a 20-minute drying process. Under these conditions, the glass surface cleanliness was the highest, but the corresponding pretreatment time was also the longest.

[0044] 2. Preparation of surface modification liquid When preparing the modified liquid in Experimental Group 1, silica particles with an average particle size of 20 nm and alumina particles with an average particle size of 30 nm were selected, with a mass ratio of silica particles to alumina particles of 1:2, and the slurry and liquid phase medium were mixed at a ratio of 1:8.

[0045] After continuous stirring for 10 minutes, a modified liquid was obtained and heated to 60°C for later use. Experimental group 1 had smaller particle size and a higher alumina content, resulting in a system with stronger adhesion.

[0046] In the modified liquid used in Experimental Group 2, the average particle size of silica particles was 50 nm and the average particle size of alumina particles was 75 nm. The mass ratio of the two was adjusted to 1:1, and the ratio of slurry to liquid medium was 1:10. After mixing, the mixture was stirred and dispersed for 35 min, and then heated to 70℃.

[0047] Compared with experimental group 1, experimental group 2 has a more balanced particle size distribution and liquid phase concentration, and the dispersion state of the system is more stable.

[0048] In Experiment 3, the proportion of silica was increased during liquid preparation, resulting in a silica-to-alumina particle mass ratio of 2:1. Two types of particles with average diameters of 80 nm and 120 nm were used respectively. The slurry and liquid medium were prepared at a ratio of 1:12, and the temperature was raised to 80°C after stirring for 60 minutes. Experiment 3 had the largest particle size and the highest degree of liquid dilution, making it more suitable for forming a rougher surface structure.

[0049] 3. Immersion treatment In Experiment 1, the pretreated glass substrate was slowly immersed in a 60°C modified solution and held for 4 minutes, allowing the liquid to form a thin film on the glass surface. Due to the short immersion time, the amount of liquid adhering to the surface of Experiment 1 was relatively small.

[0050] Experimental group 2 underwent immersion treatment at 70℃, with the substrate remaining in the modified solution for 5 minutes. At this point, the modified solution adequately wetted the glass surface, and the liquid layer distribution was relatively uniform, which could balance the continuity of subsequent film formation and thickness control.

[0051] In experimental group 3, the substrate was immersed in a modified solution at 80°C for 6 minutes. The higher temperature and longer immersion time further increased the amount of liquid adhering to the glass surface, resulting in a thicker wet film, which provided conditions for constructing a more obvious particle coating layer.

[0052] 4. Lifting out and drying / fixing After immersion, the glass in Experiment 1 was lifted from the liquid surface at a speed of 1.5 mm / s and air-dried at room temperature for 5 minutes. The resulting surface-modified layer was thinner, and the particle coverage was more finely dispersed.

[0053] In Experiment 2, after the immersion process, a lifting speed of 2.25 mm / s was used, and the air-drying time was extended to 17.5 min. Under these conditions, the liquid medium adhering to the surface could evaporate more fully, and silica and alumina particles formed a continuous particle layer on the glass surface.

[0054] In experimental group 3, the lifting speed was increased to 3 mm / s, and the air-drying time was extended to 30 min. Due to the larger initial liquid content and particle size in experimental group 3, the final modified layer thickness was relatively higher, and the surface roughness also increased.

[0055] 5. Sample acquisition and preliminary observation of surface condition The sample prepared in experimental group 1 had a uniform, shallowly hazy surface, a fine particle layer, and its light-transmitting appearance basically maintained the original glass characteristics.

[0056] The sample obtained from experimental group 2 had a more continuous surface particle coverage, with no obvious flow marks, and the overall appearance uniformity was better than that of experimental group 1 and experimental group 3.

[0057] The surface modification layer of the sample in experimental group 3 is more obvious, and strong diffuse scattering characteristics can be observed under oblique light conditions, indicating that its particle structure is more inclined to the surface morphology required for long-wavelength anti-reflection.

[0058] 6. Performance Testing The samples obtained from Experimental Group 1, Experimental Group 2, and Experimental Group 3 were numbered and then subjected to performance testing. To ensure the comparability of the test results, glass slides from the same batch were selected for all three groups of samples, with 5 slides tested in each group. Before testing, the surface of the samples was wiped with a lint-free cloth to remove floating dust and attached impurities, and then allowed to stand at room temperature for 30 minutes before testing.

[0059] Transmittance and reflectance detection: Each group of samples was tested using a UV-Vis-NIR spectrophotometer. The test wavelength range was set to 380nm-1400nm, and the transmittance and reflectance data at three wavelength points of 380nm, 890nm and 1400nm were read in particular.

[0060] During testing, unmodified borosilicate glass of the same specifications was used as a blank reference to calibrate the instrument baseline. The sample was then placed vertically in the test optical path, and the transmittance and reflectance at the corresponding wavelength were recorded. Each sample was tested three times, and the average value was taken as the test result for the sample. The average value of each group of five samples was then taken as the final result.

[0061] Haze detection: The haze of the sample is tested using a haze meter.

[0062] Before testing, the instrument was calibrated at zero and with the standard plate. The sample was then placed flat in the test window, and the haze value was measured. Each sample was tested three times consecutively, and the average value was taken as the haze result. Finally, the average haze of each group of five samples was calculated.

[0063] Adhesion test: The adhesion of the modified layer on the glass surface was evaluated using the cross-cut test.

[0064] During testing, a test area was selected on the sample surface, and a grid was formed by crisscrossing with a crisscross cutter. Adhesive tape was then applied tightly to the grid area and quickly peeled off. The extent of surface modification layer detachment was observed, and adhesion levels were assigned based on the adhesion state. Three samples from each group were selected for adhesion testing, and the highest-frequency level was taken as the adhesion result.

[0065] Surface condition observation: To help determine the uniformity of the modified layer, the surface appearance of the three groups of samples was observed under natural light and oblique light conditions. The presence of flow marks, local accumulation, obvious scattering spots or surface unevenness was recorded. The modification effect was comprehensively evaluated by combining transmittance, reflectance and haze data.

[0066] Performance test results: According to the above methods, the transmittance of experimental group 1 was 93.8% and the reflectance was 4.6% at 380nm, 92.4% and the reflectance was 5.5% at 890nm, 91.2% and the reflectance was 6.4% at 1400nm, the haze was 0.42%, and the adhesion rating was 4B.

[0067] Experimental group 2 had a transmittance of 93.5% and a reflectance of 4.7% at 380nm, a transmittance of 95.0% and a reflectance of 3.8% at 890nm, a transmittance of 93.8% and a reflectance of 4.4% at 1400nm, a haze of 0.35%, and an adhesion rating of 5B.

[0068] Experimental group 3 had a transmittance of 92.1% and a reflectance of 5.9% at 380nm, a transmittance of 93.8% and a reflectance of 4.6% at 890nm, a transmittance of 95.3% and a reflectance of 3.6% at 1400nm, a haze of 0.51%, and an adhesion rating of 4B.

[0069] 7. Comparative Analysis of Results In terms of short-wavelength performance, experimental group 1, after being treated with smaller particles and lower temperature, achieved better anti-reflection effect at 380nm, with reflectivity reduced to 4.6%, indicating that fine particle structure is more beneficial for suppressing short-wavelength light reflection.

[0070] The parameters of experimental group 2 are in the middle of the three groups. It does not show any obvious performance shortcomings in the range of 380nm to 1400nm. In particular, the transmittance reaches 95.0% and the reflectance is only 3.8% at 890nm. At the same time, the haze is controlled at 0.35%, indicating that the modified layer of experimental group 2 has more advantages in terms of uniformity and optical matching.

[0071] After being treated with high temperature, long-term immersion and larger particle size, experimental group 3 showed the best performance in the 1400nm band, with transmittance increasing to 95.3% and reflectance decreasing to 3.6%. However, its haze increased to 0.51%, indicating that although enhanced surface roughness is beneficial for long-wave near-infrared anti-reflection, it will affect the transparent appearance of the visible area to some extent.

[0072] In summary, experimental group 1 showed good short-wave anti-reflection effect in the 380nm band, experimental group 3 showed more obvious anti-reflection and anti-reflection effect in the 1400nm band, and experimental group 2 showed relatively balanced performance at various test points in the 380nm-1400nm range, while also exhibiting low haze and high adhesion. This indicates that the combination of intermediate parameters is more conducive to forming a modified layer that balances broad-spectrum transmittance and surface stability.

[0073] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A process for modifying the surface of a broad-spectrum, high-transmittance, low-reflection glass, characterized in that, include: S1. Provide a glass substrate for broadband transmission applications, and perform surface pretreatment on the glass substrate; S2. Disperse silica particles and alumina particles in a liquid medium to prepare a surface-modified liquid, and heat the surface-modified liquid to the wetting treatment temperature; S3. Immerse the glass substrate in the surface modification liquid for surface wetting, so that the surface modification liquid adheres to the surface of the glass substrate; S4. The glass substrate that has been surface-wetted is lifted out of the surface modification liquid and dried. The liquid medium adhering to the surface of the glass substrate evaporates, and the silica particles and alumina particles dispersed in the liquid medium adhere to the surface of the glass substrate to form a surface modification layer. S5. Obtain a broadband high-transmittance low-reflection glass with the surface modification layer formed on its surface; the broadband wavelength range is 380nm-1400nm.

2. The broad-spectrum, high-transmittance, low-reflection glass surface modification process according to claim 1, characterized in that: The glass substrate is selected from soda-lime glass, medium borosilicate glass, or high borosilicate glass.

3. The broad-spectrum, high-transmittance, low-reflection glass surface modification process according to claim 1, characterized in that: The surface pretreatment includes cleaning and drying, with the cleaning time being 3-15 minutes and the drying time being 5-20 minutes.

4. The broad-spectrum, high-transmittance, low-reflection glass surface modification process according to claim 1, characterized in that: The dispersion is carried out by stirring; the stirring and dispersion time is 10 min to 60 min; the wetting treatment temperature of the surface modification liquid is 60℃ to 80℃.

5. The broad-spectrum, high-transmittance, low-reflection glass surface modification process according to claim 1, characterized in that: The liquid medium is a diluent, and the surface-modifying liquid is prepared by mixing the slurry with the diluent; the slurry includes the silica particles and the alumina particles; the mass ratio of the silica particles to the alumina particles is 1:2-2:1; the average particle size of the silica particles is 20nm-80nm, and the average particle size of the alumina particles is 30nm-120nm; the ratio of the slurry to the liquid medium is 1:8-1:

12.

6. The broadband high-transmittance low-reflection glass surface modification process according to claim 1, characterized in that: The surface wetting time is 4-6 minutes.

7. The broadband high-transmittance low-reflection glass surface modification process according to claim 1, characterized in that: The lifting process is a uniform lifting process with a speed of 1.5 mm / s to 3 mm / s; the drying process is a room temperature air drying process with a drying time of 5 min to 30 min.

8. The broad-spectrum, high-transmittance, low-reflection glass surface modification process according to claim 1, characterized in that: The surface modification layer is a granular layer covering the surface of the glass substrate, and the granular layer is formed by the silicon oxide particles and the aluminum oxide particles attached to the surface of the glass substrate.

9. An application of a broadband high-transmittance, low-reflection glass, characterized in that, A wide-spectrum high-transmittance low-reflection glass obtained by the surface modification process of a wide-spectrum high-transmittance low-reflection glass according to any one of claims 1-7 is used as a light-transmitting component of a wide-spectrum transmission device in the 380nm-1400nm band. The wide-spectrum transmission device includes a display cover plate, an optical window, a sensor protection sheet, a light-transmitting component of an imaging module, and a photoelectric detection component.

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