Five-axis mechanical polishing equipment and electrochemical five-axis mechanical polishing equipment

Abstract

The utility model discloses five-axis mechanical polishing equipment which comprises a polishing device, the polishing device comprises a polishing wheel and a polishing wheel driving mechanism used for driving the polishing wheel to rotate, a grinding material layer is arranged on the circumferential wall of the outer side of the polishing wheel, the radius of the polishing wheel is R, the grinding material layer is arranged as follows: a point P1 is randomly selected on the outer surface of the grinding material layer, and the distance between the point P1 and the rotating axis of the polishing wheel is L1; a point P2 is optionally selected on the outer surface of the grinding material layer except the point P1, the distance between the point P2 and the rotating axis of the polishing wheel is L2, and L1, L2 and R meet the following setting that | L1-L2 | / R * 100% is smaller than or equal to 1%. The utility model further discloses electrochemical five-axis mechanical polishing equipment which comprises five-axis mechanical polishing equipment and an electrochemical polishing device. The polishing equipment has the advantages of being capable of improving the flatness and smoothness of the surface of a workpiece, good in polishing effect and the like.

Description

Technical Field

[0001] The utility model relates to the field of polishing equipment, in particular to a five-axis mechanical polishing equipment and an electrochemical five-axis mechanical polishing equipment. Background Art

[0002] With the development of science and technology, people have higher and higher requirements on product appearance and applicability. For example, electronic products such as mobile phones and tablets mostly use frames and panels made of aluminum alloy and other materials for finishing. This places high demands on the surface flatness and smoothness of raw material plates (such as aluminum alloy and other related plates used to prepare electronic product frames, panels and other products).

[0003] In order to obtain smoother and brighter plates, people mainly use polishing machines for production, such as five-axis polishing machines, which use the circumferential surface of the polishing wheel to polish the workpiece to be polished. Although it has a certain polishing effect and a high polishing efficiency (the area of ​​the circumferential surface of the polishing wheel is larger), due to different positions on the circumferential surface of the polishing wheel, the linear speeds of the grinding points corresponding to the corresponding positions are different due to the different distances from the rotation axis of the polishing wheel, which will cause certain defects in the polishing effect. Therefore, it is urgent to find a polishing equipment with better polishing effect. Utility Model Content

[0004] The purpose of the utility model is to overcome the deficiencies in the above-mentioned prior art and provide a five-axis mechanical polishing device that can improve the surface flatness and smoothness of the workpiece and has a good polishing effect; at the same time, the utility model also provides an electrochemical five-axis mechanical polishing device including the five-axis mechanical polishing device.

[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0006] A five-axis mechanical polishing device comprises a polishing device, wherein the polishing device comprises a polishing wheel and a polishing wheel driving mechanism for driving the polishing wheel to rotate, wherein an abrasive layer is arranged on the outer circumferential wall of the polishing wheel, the radius of the polishing wheel is R, and the abrasive layer is arranged as follows: any point P1 is selected on the outer surface of the abrasive layer, and the distance between point P1 and the rotation axis of the polishing wheel is L1; any other point P2 is selected on the outer surface of the abrasive layer except point P1, and the distance between point P2 and the rotation axis of the polishing wheel is L2, and L1, L2 and R satisfy the following arrangement: |L1-L2| / R*100%≤1%.

[0007] In the present utility model, a further preferred solution is that the five-axis mechanical polishing device further includes a driving device, and the driving device includes:

[0008] a workpiece fixing assembly for fixing a workpiece;

[0009] An X-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the X-axis direction;

[0010] A Y-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the Y-axis direction;

[0011] A Z-axis driving assembly for driving a workpiece fixing assembly or a polishing device to reciprocate along the Z-axis direction;

[0012] A C-axis drive assembly for driving the workpiece fixing assembly to rotate;

[0013] An A-axis drive assembly is used to drive the polishing device to rotate.

[0014] In the present utility model, a further preferred solution is that the workpiece fixing assembly is installed on the C-axis drive assembly; the C-axis drive assembly is installed on the X-axis drive assembly; the X-axis drive assembly is installed on the Y-axis drive assembly; the Y-axis drive assembly or the A-axis drive assembly is installed on the Z-axis drive assembly; and the polishing device is installed on the A-axis drive assembly.

[0015] In the present utility model, a further preferred solution is that the X-axis drive assembly, the Y-axis drive assembly, and the Z-axis drive assembly all include a drive motor and a screw transmission structure connected to the drive motor.

[0016] The utility model also claims protection for an electrochemical five-axis mechanical polishing device, comprising the above-mentioned five-axis mechanical polishing device, which also includes an electrochemical polishing device, and the electrochemical polishing device also includes:

[0017] A power supply assembly, wherein the negative electrode of the power supply assembly is electrically connected to the polishing wheel, and the positive electrode of the power supply assembly is connected to the workpiece fixing assembly and is electrically connected to the workpiece to be polished through the workpiece fixing assembly;

[0018] The polishing liquid spraying assembly is used for spraying the polishing liquid onto the workpiece to be polished which is fixed on the workpiece fixing assembly.

[0019] In the present utility model, a further preferred solution is that the electrochemical polishing device also includes a polishing liquid recovery pool, which is located below the workpiece fixing assembly and is used to receive the polishing liquid after polishing the workpiece, as well as particulate matter generated by polishing and grinding the workpiece.

[0020] In the utility model, a further preferred solution is that a first pipe connecting the inside and outside of the recovery pool is provided at the bottom of the recovery pool, and a first filter is provided at the position where the bottom of the recovery pool is connected to the pipe, for filtering particulate matter in the polishing liquid flowing into the pipe from the recovery pool.

[0021] In the utility model, a further preferred solution is that the polishing liquid spraying assembly also includes a polishing liquid storage box, a pump and a spray pipe, the inlet end of the pump is connected to the polishing liquid storage box, and the outlet end is connected to the spray pipe; the outlet end of the spray pipe is arranged facing the workpiece to be polished fixed on the workpiece fixing assembly.

[0022] In the present utility model, a further preferred solution is that one end of the first pipeline is connected to the recovery tank, and the other end is connected to the polishing liquid storage box.

[0023] In the present utility model, a further preferred solution is that the electrochemical polishing device also includes a lifting component for driving a polishing liquid recovery tank.

[0024] In the present utility model, a further preferred scheme is that the polishing liquid recovery pool includes a first recovery half pool body and a second recovery half pool body, and the first recovery half pool body and the second recovery half pool body are arranged face to face, and form a polishing liquid recovery pool through a detachable sealing cooperation manner.

[0025] In the present utility model, a further preferred solution is that the polishing liquid recovery tank also includes a first half-tank body driving assembly for driving the first recovery half-tank body to move toward and away from the second recovery half-tank body.

[0026] In the present utility model, a further preferred solution is that the polishing liquid recovery tank also includes a second half-tank body driving assembly for driving the second recovery half-tank body to move toward and away from the first recovery half-tank body.

[0027] In the utility model, a further preferred scheme is that a second pipe connecting the inside and outside of the recovery pool is provided at the bottom of the first recovery half pool body, and a second filter screen is provided at the position where the bottom of the first recovery half pool body is connected to the pipe, for filtering particulate matter in the polishing liquid flowing into the pipe from the recovery pool.

[0028] In the utility model, a further preferred solution is that a concave liquid outlet funnel is provided at the bottom of the second recovery half-tank body, the inlet end of the liquid outlet funnel is connected to the polishing liquid recovery tank, and the outlet end is connected to a pipeline or a valve.

[0029] Compared with the prior art, the beneficial effects of the utility model are: the linear speed difference at each position on the polishing surface of the polishing wheel is very small, and the overall uniformity is consistent, which can effectively improve the flatness and smoothness of the workpiece surface and has a good polishing effect; further combined with the polishing equipment of the electrochemical polishing device, it can effectively reduce the particle size of the particles generated during the polishing process and the number of particles returning to the polishing system, effectively reducing the scratches on the polishing surface by the particles, and further improving the polishing performance; and it can also increase the service life of the polishing wheel. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a structural schematic diagram of the five-axis mechanical polishing equipment of Example 1;

[0031] Figure 2 It is a schematic structural diagram of the polishing wheel in the five-axis mechanical polishing equipment of Example 1;

[0032] Figure 3 It is a structural schematic diagram of the chemical five-axis mechanical polishing equipment of Example 2;

[0033] Among them, 1. frame; 2. workpiece; 3. workpiece fixing assembly; 4. polishing wheel; 41. abrasive layer; 5. polishing wheel driving mechanism; 61. A-axis driving assembly; 62. C-axis driving assembly; 63. X-axis driving assembly; 64. Y-axis driving assembly; 65. Z-axis driving assembly; 71. power supply assembly; 72. polishing liquid injection assembly; 73. polishing liquid recovery tank; 8. polishing wheel rotation axis;

[0034] P1, P2 and P3 are three points randomly selected on the outer surface of the abrasive layer. DETAILED DESCRIPTION

[0035] The present invention is further described below in conjunction with the specific implementation methods and the drawings of the specification. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment. Unless otherwise specified, the materials and equipment used in this embodiment can be purchased from the market. The specific embodiments are exemplary and are only used to explain this application, and cannot be understood as limiting the scope of protection of this application.

[0036] A five-axis mechanical polishing device comprises a polishing device, wherein the polishing device comprises a polishing wheel and a polishing wheel driving mechanism for driving the polishing wheel to rotate, wherein an abrasive layer is arranged on the outer circumferential wall of the polishing wheel, the radius of the polishing wheel is R, and the abrasive layer is arranged as follows: a point P1 is randomly selected on the outer surface of the abrasive layer, and the distance between point P1 and the rotation axis of the polishing wheel is L1; another point P2 is randomly selected on the outer surface of the abrasive layer except point P1, and the distance between point P2 and the rotation axis of the polishing wheel is L2, and L1, L2 and R satisfy the following arrangement: |L1-L2| / R*100%≤1%, wherein |L1-L2| represents the absolute value of the difference between L1 and L2.

[0037] The utility model adopts the above-mentioned structural setting, and any two points on the outer surface of the abrasive layer satisfy |L1-L2| / R*100%≤1%. In this way, the linear speed difference of each point position on the outer surface of the entire abrasive layer (corresponding to the polishing surface) is very small. In this way, when the workpiece is polished, the polishing friction force on the workpiece surface is also very uniform, avoiding the uneven polishing caused by inconsistent linear speeds at unequal diameter positions on the circumferential surface of the traditional polishing wheel, thereby improving the uniformity of polishing, and greatly improving the flatness and smoothness of the workpiece surface after polishing. It can be seen that the polishing equipment of the utility model has a good polishing effect.

[0038] In other embodiments of the utility model, the following settings can be made: │L1-L2│ / R*100%≤0.5%, │L1-L2│ / R*100%≤0.1%, │L1-L2│ / R*100%≤0.05% or │L1-L2│ / R*100%≤0.01%. The smaller the value of │L1-L2│ / R*100%, the better the polishing effect.

[0039] A more ideal setting is, │L1-L2│ / R*100%=0, at which time, the distances between any two points on the outer surface of the abrasive layer and the axis of rotation of the polishing wheel are equal (i.e., the points on the outer surface of the abrasive layer are set with equal diameters, and the distances between any two points on the outer surface of the abrasive layer and the axis of rotation of the polishing wheel are equal at any position). The utility model adopts the above-mentioned structural setting, and the distances between any two points on the outer surface of the abrasive layer and the axis of rotation of the polishing wheel are equal, so that the linear speeds of the positions of the points on the outer surface of the entire abrasive layer (corresponding to the polishing surface) are consistent, so that when the workpiece is polished, the polishing friction force on the workpiece surface is also consistent, avoiding the uneven polishing caused by the inconsistent linear speeds at the unequal diameter positions on the circumferential surface of the traditional polishing wheel, thereby making the polishing uniformity better, and the flatness and finish of the workpiece surface after polishing are also greatly improved. It can be seen that the polishing equipment of the utility model has a good polishing effect.

[0040] For the abrasive layer of the polishing wheel, a detachable connection method with the polishing wheel can be selected, such as selecting a polishing belt (with an abrasive layer) to be combined with the polishing wheel, which is easy to replace; or the abrasive can be compounded on the outer circumferential wall of the polishing wheel to form an abrasive layer.

[0041] In order to expand the application scenarios of the polishing equipment, a second abrasive layer can also be provided on the outer circumferential surface of the polishing wheel, so that it can be used in scenarios with relatively lower requirements for flatness; in order to better realize the conversion of plane polishing (using the outer circumferential surface of the polishing wheel for grinding and polishing, that is, the front of the polishing wheel) and side polishing (the outer circumferential wall of the polishing wheel, that is, the side of the polishing wheel) modes, a hinge assembly can be further provided on the polishing device, and the polishing wheel driving mechanism is connected to the hinge assembly, so that the polishing wheel assembly can be rotated around the hinge assembly, thereby switching the angle for polishing mode conversion (conversion between side polishing and plane polishing); for the selection of the hinge assembly, a hinge structure such as a pin or a universal joint can be selected.

[0042] Furthermore, the polishing device of the utility model also includes a driving device, and the driving device includes:

[0043] A workpiece fixing assembly for fixing the workpiece (the workpiece fixing assembly includes but is not limited to a clamp, a vacuum suction cup, a manipulator, etc.);

[0044] An X-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the X-axis direction;

[0045] A Y-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the Y-axis direction;

[0046] A Z-axis driving assembly for driving a workpiece fixing assembly or a polishing device to reciprocate along the Z-axis direction;

[0047] A C-axis drive assembly for driving the workpiece fixing assembly to rotate;

[0048] An A-axis drive assembly is used to drive the polishing device to rotate.

[0049] As for the connection method between the driving device and the polishing device, the following arrangement can be made: the workpiece fixing assembly is installed on the C-axis driving assembly; the C-axis driving assembly is installed on the X-axis driving assembly; the X-axis driving assembly is installed on the Y-axis driving assembly; the Y-axis driving assembly or the A-axis driving assembly is installed on the Z-axis driving assembly; and the polishing device is installed on the A-axis driving assembly.

[0050] For the A-axis drive assembly, the rotation axis that drives the polishing wheel device to rotate can be a single rotation axis, which can coincide with the rotation axis of the polishing wheel; it can also not coincide with the rotation axis of the polishing wheel, and is preferably perpendicular to the rotation axis of the polishing wheel. In this way, polishing can be coordinated with other axis drive mechanisms to achieve more flexible and multi-angle polishing.

[0051] When the rotation axis of the A-axis drive assembly is perpendicular to the rotation axis of the polishing wheel, the polishing wheel drive mechanism can be set to one, and the polishing wheel drive mechanism can be installed on the rotating shaft of the A-axis drive assembly; the polishing wheel drive mechanism can also be set to at least two, and a turntable can be installed on the rotating shaft of the A-axis drive assembly, and more than two polishing wheel drive mechanisms can be installed on the turntable. When there are at least three polishing wheel drive mechanisms, they can be arranged on the turntable in a centrally symmetrical manner.

[0052] For the drive components of each axis, the X-axis drive component, the Y-axis drive component, and the Z-axis drive component all include a drive motor and a screw transmission structure connected to the drive motor; the corresponding screw transmission mechanism can also be replaced by a piston rod transmission structure, a crank slider transmission structure, or other transmission structures that can achieve a reciprocating transmission relationship; and for the A-axis drive component and the C-axis drive component, a motor can be selected, and the rotating shaft on the corresponding motor can be directly connected to the workpiece fixing component and the polishing device corresponding to them respectively, or the linkage between the two can be indirectly achieved through a transmission component, such as transmitting rotational motion through a gear set.

[0053] In order to further improve the polishing effect and reduce the scratching effect of particles generated by mechanical polishing on the polishing surface, an electrochemical polishing device can be combined with the five-axis mechanical polishing device of the utility model to obtain an electrochemical five-axis mechanical polishing device, which includes the above-mentioned five-axis mechanical polishing device, and also includes an electrochemical polishing device, and the electrochemical polishing device also includes:

[0054] A power supply assembly, wherein the negative electrode of the power supply assembly is electrically connected to the polishing wheel, and the positive electrode of the power supply assembly is connected to the workpiece fixing assembly and is electrically connected to the workpiece to be polished through the workpiece fixing assembly;

[0055] The polishing liquid spraying assembly is used for spraying the polishing liquid onto the workpiece to be polished which is fixed on the workpiece fixing assembly.

[0056] Polishing equipment combined with an electrochemical polishing device is used. On the basis of mechanical polishing, the "peak clipping" effect of electrochemistry on the microstructure is utilized to further improve the flatness of the polished surface, thereby obtaining a higher brightness. In addition, the size of the solid particles produced by polishing will be smaller due to the effect of electrochemical corrosion, reducing the risk of large particles returning to the polishing system and scratching the polished surface, and some of the related particles will also be carried away by the polishing liquid, further reducing the number of particles returning to the polishing system, further improving the polishing efficiency and quality. In addition, since the number and size of particles produced by polishing are greatly reduced, the life of the polishing belt on the polishing wheel is further improved.

[0057] In order to recycle the polishing liquid, the electrochemical polishing device may also include a polishing liquid recovery pool, which is located below the workpiece fixing assembly and is used to receive the polishing liquid after polishing the workpiece, as well as particulate matter generated by polishing the workpiece.

[0058] In order to facilitate the recovery and recycling of the polishing liquid, such an arrangement can be made: a first pipe connecting the inside and outside of the recovery pool is provided at the bottom of the recovery pool, and a first filter is provided at the position where the bottom of the recovery pool is connected to the pipe, which is used to filter the particles in the polishing liquid flowing from the recovery pool into the pipe. In this way, the polishing liquid collected in the recovery pool is filtered through the first filter, and the corresponding particles will remain on the first filter, which is convenient for subsequent recycling; in addition, the polishing liquid after filtering can also be recycled through the first pipe.

[0059] For the polishing liquid spraying assembly, a combination of a polishing liquid storage box, a pump, and a spraying pipe can be selected. One of the schemes is exemplified as follows: the polishing liquid spraying assembly also includes a polishing liquid storage box, a pump, and a spraying pipe. The inlet end of the pump is connected to the polishing liquid storage box, and the outlet end is connected to the spraying pipe; the outlet end of the spraying pipe is arranged facing the workpiece to be polished fixed on the workpiece fixing assembly, and the polishing liquid in the polishing liquid storage box can be sprayed out from the spraying pipe through the pump and sprayed onto the workpiece, and polishing is achieved under the action of electric current.

[0060] To further improve the polishing liquid recovery efficiency, one end of the first pipeline is connected to the recovery tank, and the other end is connected to the polishing liquid storage tank; in this way, the filtered polishing liquid can be returned to the polishing liquid storage tank through the pipeline and recycled.

[0061] In order to better recover the polishing liquid and avoid splashing of the polishing liquid, the following setting can be made: the electrochemical polishing device also includes a lifting component for driving a polishing liquid recovery pool; with this setting, when starting the electrochemical polishing, the lifting component can be used to drive the polishing liquid recovery pool to the position where the fixed workpiece is located, so that the polishing liquid recovery pool can receive more polishing liquid, avoiding splashing while also improving the recovery efficiency.

[0062] In order to reduce the interference between the polishing liquid recovery pool and other components, the following arrangement may be made: the first recovery half pool body and the second recovery half pool body are arranged face to face, and a polishing liquid recovery pool is formed by a detachable sealing cooperation; before starting the chemical polishing, the first recovery half pool body and the second recovery half pool body can be arranged face to face to form a polishing liquid recovery pool by a sealing cooperation, so as to avoid interference caused by the excessive area of ​​the entire pool body; the first recovery half pool body and the second recovery half pool body can be regarded as two parts formed by cutting a pool body, and the contact surface between the two parts is detachably connected by a sealing cooperation. For example, a sealing groove can be provided on the contact surface of the first recovery half pool body, and a sealing strip matching the sealing groove can be provided on the contact surface of the corresponding second recovery half pool body, so that a sealing cooperation can be achieved by snapping and can be disassembled.

[0063] In order to facilitate the automation of production and further reduce interference, such an arrangement can be made. The polishing liquid recovery tank also includes a first half-tank driving assembly for driving the first recovery half-tank body to approach and move away from the second recovery half-tank body; in this way, when chemical mechanical polishing is not required, the first half-tank driving assembly can drive the first recovery half-tank body away from the second recovery half-tank body, which makes the occupied space of the recovery tank smaller and further reduces interference; further, a corresponding second half-tank driving assembly can also be set on the second recovery half-tank body at the same time to drive the second recovery half-tank body to approach and move away from the first recovery half-tank body, so that both half-tanks are movable, which can further reduce the interference of the polishing liquid recovery tank with other components and improve the efficiency of installation and disassembly of the recovery tank.

[0064] Another example of the utility model for facilitating the recovery of the polishing liquid is that a second pipe is provided at the bottom of the first recovery half-tank body to connect the inside and outside of the recovery tank, and a second filter is provided at the position where the bottom of the first recovery half-tank body is connected to the pipe to filter particles in the polishing liquid flowing from the recovery tank into the pipe. In this way, the polishing liquid collected in the recovery tank is filtered through the second filter, and the corresponding particles will remain on the second filter, which is convenient for subsequent recovery; in addition, the polishing liquid after filtering can also be recycled through the second pipe.

[0065] Another example of the utility model for facilitating the recovery of polishing liquid is that a concave liquid outlet funnel is provided at the bottom of the second recovery half-tank, the inlet end of the liquid outlet funnel is connected to the polishing liquid recovery tank, and the outlet end is connected to a pipe or a valve; such a setting can make the recovery of polishing liquid more concentrated; accordingly, a filter can be provided in the liquid outlet funnel to collect particulate matter generated during polishing, which is also convenient for the recovery of polishing liquid, and the collected particulate matter can also be recycled.

[0066] In some embodiments of the utility model, the polishing wheel drive mechanism can be configured to include: a polishing wheel shaft connected to the polishing wheel, and a motor for driving the polishing wheel shaft to rotate; in addition, in order to facilitate the connection between the polishing wheel and the power supply assembly, a mercury slip ring (a conductive rotating joint) can be mounted on the polishing wheel shaft, so that the polishing wheel can remain connected to the power supply assembly when rotating, making the overall operation of the polishing equipment more stable.

[0067] In some embodiments of the utility model, in order to better regulate the polishing voltage and current during the electrochemical polishing process, a transformer and / or a sliding resistor (such as adding a sliding resistor between the positive pole of the power supply and the metal workpiece) can be set in the electrochemical polishing device to better achieve the regulation of the voltage and current; and corresponding ammeters and voltmeters can also be set to observe the voltage and current values ​​in a timely manner.

[0068] The polishing equipment of the present invention also includes a frame, and the corresponding driving device, polishing device and / or electrochemical polishing device are arranged on the frame; further, when the Y-axis driving assembly is installed on the Z-axis driving assembly, the Z-axis driving assembly is installed on the frame, and the A-axis driving assembly is installed on the frame; when the A-axis driving assembly is installed on the Z-axis driving assembly, the Z-axis driving assembly is installed on the frame, and the Y-axis driving assembly is installed on the frame.

[0069] Example 1

[0070] A five-axis mechanical polishing device, comprising a frame 1 and a driving device and a polishing device arranged on the frame, wherein the polishing device comprises a polishing wheel 4 and a polishing wheel driving mechanism 5 for driving the polishing wheel to rotate, wherein an abrasive layer 41 is arranged on the outer circumferential wall of the polishing wheel, and the distances between any two points on the outer surface of the abrasive layer and the polishing wheel rotation axis 8 are equal (for example, any three points on the outer surface of the abrasive layer are selected, namely P1, P2 and P3, and the distances from the polishing wheel rotation axis 8 are L1, L2 and L3, respectively, L1=L2=L3; the corresponding linear velocities at the three points are ω1, ω2 and ω3, ω1=ω2=ω3);

[0071] The driving device comprises:

[0072] A workpiece fixing assembly 3 for fixing the workpiece 2;

[0073] An X-axis driving assembly 63 for driving the workpiece fixing assembly to reciprocate along the X-axis direction;

[0074] A Y-axis driving assembly 64 for driving the workpiece fixing assembly to reciprocate along the Y-axis direction;

[0075] A Z-axis driving assembly 65 for driving the workpiece fixing assembly to reciprocate along the Z-axis direction;

[0076] A C-axis driving assembly 62 for driving the workpiece fixing assembly to rotate;

[0077] An A-axis driving assembly 61 for driving the polishing device to rotate;

[0078] The workpiece fixing assembly is mounted on the C-axis driving assembly; the C-axis driving assembly is mounted on the X-axis driving assembly; the X-axis driving assembly is mounted on the Y-axis driving assembly; the Y-axis driving assembly is mounted on the Z-axis driving assembly; the polishing device is mounted on the A-axis driving assembly; the Z-axis driving assembly 65 is mounted on the frame, and the A-axis driving assembly 61 is mounted on the frame; the rotation axis of the polishing wheel is perpendicular to the rotation axis of the A-axis driving assembly;

[0079] The X-axis driving assembly, the Y-axis driving assembly, and the Z-axis driving assembly all include a driving motor and a screw transmission structure connected to the driving motor.

[0080] Example 2

[0081] An electrochemical five-axis mechanical polishing device, based on the five-axis mechanical polishing device described in Example 1, further includes an electrochemical polishing device, and the electrochemical polishing device further includes:

[0082] A power supply assembly 71, wherein the negative electrode of the power supply assembly is electrically connected to the polishing wheel, and the positive electrode of the power supply assembly is connected to the workpiece fixing assembly and is electrically connected to the workpiece to be polished through the workpiece fixing assembly;

[0083] A polishing liquid spraying assembly 72, used for spraying the polishing liquid onto the workpiece to be polished fixed on the workpiece fixing assembly;

[0084] The electrochemical polishing device further comprises a polishing liquid recovery pool 73, which is located below the workpiece fixing assembly and is used to receive the polishing liquid after the workpiece is polished, and the particles generated by the workpiece polishing.

[0085] Example 3

[0086] An electrochemical five-axis mechanical polishing device, based on the electrochemical five-axis mechanical polishing device of embodiment 2, further has the following structural arrangement:

[0087] The electrochemical polishing device also includes a lifting assembly for driving a polishing liquid recovery tank;

[0088] The polishing liquid recovery pool comprises a first recovery half pool body and a second recovery half pool body, wherein the first recovery half pool body and the second recovery half pool body are arranged facing each other and form a polishing liquid recovery pool through a detachable sealing cooperation mode;

[0089] The polishing liquid recovery tank also includes a half-tank driving assembly for driving the first recovery half-tank body to move toward and away from the second recovery half-tank body;

[0090] A concave liquid outlet funnel is provided at the bottom of the second recovery half-tank body, the inlet end of the liquid outlet funnel is connected to the polishing liquid recovery tank, and the outlet end is connected to a pipeline or a valve.

[0091] Example 4

[0092] An electrochemical five-axis mechanical polishing device, based on the electrochemical five-axis mechanical polishing device of embodiment 2, further has the following structural arrangement:

[0093] A first pipe connecting the inside and outside of the recovery pool is provided at the bottom of the recovery pool, and a first filter is provided at the position where the bottom of the recovery pool is connected to the pipe, which is used to filter particles in the polishing liquid flowing from the recovery pool into the pipe;

[0094] The polishing liquid spraying assembly further comprises a polishing liquid storage box, a pump and a spraying pipe, wherein the inlet end of the pump is connected to the polishing liquid storage box, and the outlet end is connected to the spraying pipe; the outlet end of the spraying pipe is arranged facing the workpiece to be polished fixed to the workpiece fixing assembly;

[0095] One end of the first pipeline is connected to the recovery tank, and the other end is connected to the polishing liquid storage box.

[0096] Example 5

[0097] A five-axis mechanical polishing device comprises a frame, a driving device and a polishing device arranged on the frame, wherein the polishing device comprises a polishing wheel and a polishing wheel driving mechanism for driving the polishing wheel to rotate, an abrasive layer is arranged on the outer circumferential wall of the polishing wheel, the radius of the polishing wheel of the abrasive layer is R, and the abrasive layer is arranged as follows: a point P1 is selected at random on the outer surface of the abrasive layer, and the distance between the point P1 and the rotation axis of the polishing wheel is L1; another point P2 is selected at random on the outer surface of the abrasive layer except the point P1, and the distance between the point P2 and the rotation axis of the polishing wheel is L2, and L1, L2 and R satisfy the following settings: |L1-L2| / R*100%≤0.05%,

[0098] The driving device comprises:

[0099] a workpiece fixing assembly for fixing a workpiece;

[0100] An X-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the X-axis direction;

[0101] A Y-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the Y-axis direction;

[0102] A Z-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the Z-axis direction;

[0103] A C-axis drive assembly for driving the workpiece fixing assembly to rotate;

[0104] An A-axis driving assembly for driving the polishing device to rotate;

[0105] The workpiece fixing assembly is mounted on the C-axis driving assembly; the C-axis driving assembly is mounted on the X-axis driving assembly; the X-axis driving assembly is mounted on the Y-axis driving assembly; the Y-axis driving assembly is mounted on the Z-axis driving assembly; the polishing device is mounted on the A-axis driving assembly; the Z-axis driving assembly is mounted on the frame, and the A-axis driving assembly is mounted on the frame; the rotation axis of the polishing wheel is perpendicular to the rotation axis of the A-axis driving assembly;

[0106] The X-axis driving assembly, the Y-axis driving assembly, and the Z-axis driving assembly all include a driving motor and a screw transmission structure connected to the driving motor.

[0107] Example 6

[0108] An electrochemical five-axis mechanical polishing device, based on the five-axis mechanical polishing device described in Example 5, also includes an electrochemical polishing device, and the electrochemical polishing device can be selected from any one of Examples 2-4.

[0109] Finally, it should be noted that the above-mentioned implementation mode is only a preferred embodiment of the present utility model, and cannot be used to limit the scope of protection of the present utility model. Any non-substantial changes and substitutions made by technicians in this field on the basis of the present utility model shall fall within the scope of protection required by the present utility model.

Claims

1. A five-axis mechanical polishing device, comprising a polishing device, wherein the polishing device comprises a polishing wheel and a polishing wheel driving mechanism for driving the polishing wheel to rotate, characterized in that: An abrasive layer is provided on the outer circumferential wall of the polishing wheel, the radius of the polishing wheel is R, and the abrasive layer is configured as follows: any point P1 is selected on the outer surface of the abrasive layer, and the distance between point P1 and the axis of rotation of the polishing wheel is L1; any other point P2 is selected on the outer surface of the abrasive layer except point P1, and the distance between point P2 and the axis of rotation of the polishing wheel is L2, and L1, L2 and R satisfy the following configuration: |L1-L2| / R*100%≤1%.

2. The five-axis mechanical polishing equipment according to claim 1, characterized in that: The five-axis mechanical polishing device also includes a driving device, which includes: a workpiece fixing assembly for fixing a workpiece; An X-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the X-axis direction; A Y-axis driving assembly for driving the workpiece fixing assembly to reciprocate along the Y-axis direction; A Z-axis driving assembly for driving a workpiece fixing assembly or a polishing device to reciprocate along the Z-axis direction; A C-axis drive assembly for driving the workpiece fixing assembly to rotate; An A-axis drive assembly is used to drive the polishing device to rotate.

3. The five-axis mechanical polishing equipment according to claim 2, characterized in that: The workpiece fixing assembly is installed on the C-axis driving assembly; the C-axis driving assembly is installed on the X-axis driving assembly; The X-axis driving assembly is installed on the Y-axis driving assembly; the Y-axis driving assembly or the A-axis driving assembly is installed on the Z-axis driving assembly; and the polishing device is installed on the A-axis driving assembly.

4. The five-axis mechanical polishing device according to claim 3, characterized in that: The X-axis driving assembly, the Y-axis driving assembly, and the Z-axis driving assembly all include a driving motor and a screw transmission structure connected to the driving motor.

5. An electrochemical five-axis mechanical polishing device, comprising a five-axis mechanical polishing device according to any one of claims 1 to 4, characterized in that: It also includes an electrochemical polishing device, and the electrochemical polishing device also includes: A power supply assembly, wherein the negative electrode of the power supply assembly is electrically connected to the polishing wheel, and the positive electrode of the power supply assembly is connected to the workpiece fixing assembly and is electrically connected to the workpiece to be polished through the workpiece fixing assembly; The polishing liquid spraying assembly is used for spraying the polishing liquid onto the workpiece to be polished which is fixed on the workpiece fixing assembly.

6. The electrochemical five-axis mechanical polishing equipment according to claim 5, characterized in that: The electrochemical polishing device also includes a polishing liquid recovery pool, which is located below the workpiece fixing assembly and is used to receive the polishing liquid after the workpiece is polished, and the particles generated by the polishing of the workpiece.

7. The electrochemical five-axis mechanical polishing equipment according to claim 6, characterized in that: A first pipe connecting the inside and outside of the recovery pool is provided at the bottom of the recovery pool, and a first filter screen for filtering particles in the polishing liquid flowing from the recovery pool into the pipe is provided at the position where the bottom of the recovery pool connects with the pipe.

8. The electrochemical five-axis mechanical polishing equipment according to claim 7, characterized in that: The polishing liquid spraying assembly also includes a polishing liquid storage box, a pump and a spraying pipe. The inlet end of the pump is connected to the polishing liquid storage box, and the outlet end is connected to the spraying pipe. The outlet end of the spraying pipe is arranged facing the workpiece to be polished fixed on the workpiece fixing assembly.

9. The electrochemical five-axis mechanical polishing equipment according to claim 8, characterized in that: One end of the first pipeline is connected to the recovery tank, and the other end is connected to the polishing liquid storage box.

10. The electrochemical five-axis mechanical polishing equipment according to claim 6, characterized in that: The electrochemical polishing device also includes a lifting component for driving a polishing liquid recovery tank.

11. The electrochemical five-axis mechanical polishing equipment according to claim 6, characterized in that: The polishing liquid recovery pool includes a first recovery half pool body and a second recovery half pool body. The first recovery half pool body and the second recovery half pool body are arranged face to face and form a polishing liquid recovery pool through a detachable sealing cooperation manner.

12. The electrochemical five-axis mechanical polishing equipment according to claim 11, characterized in that: The polishing liquid recovery tank also includes a first half tank body driving assembly for driving the first recovery half tank body to move toward and away from the second recovery half tank body.

13. The electrochemical five-axis mechanical polishing equipment according to claim 12, characterized in that: The polishing liquid recovery tank also includes a second half-tank body driving assembly for driving the second recovery half-tank body to move toward and away from the first recovery half-tank body.

14. The electrochemical five-axis mechanical polishing device according to any one of claims 11 to 13, characterized in that: A second pipe connecting the inside and outside of the recovery tank is provided at the bottom of the first recovery half tank body, and a second filter is provided at the position where the bottom of the first recovery half tank body is connected to the pipe, which is used to filter particulate matter in the polishing liquid flowing into the pipe from the recovery tank.

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