Method for measuring temperature of object exposed to plasma

The ODMR method using inorganic fluorescent particles like NV center-containing diamonds allows precise temperature measurement under plasma conditions, addressing the limitations of existing techniques and facilitating processes like resist removal in semiconductor manufacturing.

JP2025006191APending Publication Date: 2025-01-17UNIV OKAYAMA
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Patent Information

Application Number
JP2023106835
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-06-29
Publication Date
2025-01-17

AI Technical Summary

Technical Problem

Existing temperature measurement techniques, such as optical fiber thermometers and fluorescent dye thermometers, are ineffective for measuring the temperature of objects under plasma irradiation due to plasma interference.

Method used

A method utilizing optical detection magnetic resonance (ODMR) of inorganic fluorescent particles, specifically NV center-containing diamonds, to measure temperature by irradiating with multiple types of microwaves, measuring fluorescence intensity with photon counters, and calculating temperature based on this intensity, while correcting for errors in pulse counting.

Benefits of technology

Enables accurate temperature measurement of objects under plasma irradiation, allowing for real-time monitoring of temperature changes and supporting processes like resist removal in semiconductor manufacturing.

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Abstract

To provide a technology capable of measuring a temperature of an object exposed to plasma.SOLUTION: A method for measuring a temperature of an object based on optically detected magnetic resonance of inorganic fluorescent particles comprises the steps of: (a) irradiating inorganic fluorescent particles arranged near an object exposed to plasma and / or inorganic fluorescent particles held by the object with a plurality of types of microwaves having mutually different frequencies; (b) measuring fluorescence intensities of the inorganic fluorescent particles when irradiated with each type of microwaves using separate photon counters; and (c) calculating the temperature of the object based on the obtained fluorescence intensities or a value based on the fluorescence intensities.SELECTED DRAWING: None
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Citation Information

Patent Citations

  • Plasma gas temperature measurement device

    JP2021039094A

  • Nanometer scale quantum thermometer

    WO2014165505A1

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