Gas cluster ion beam apparatus

The gas cluster ion beam apparatus efficiently neutralizes ions using a neutralization gas introduction and reflective electrode, addressing the challenges of polyvalent ions and expensive vacuum systems, achieving smooth surface processing with reduced costs and length.

JP2026096169APending Publication Date: 2026-06-12IIPT INC
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Patent Information

Application Number
JP2025188529
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-02
Filing Date
2025-11-07
Publication Date
2026-06-12

AI Technical Summary

Technical Problem

Conventional gas cluster ion beam apparatuses face challenges in achieving smooth surface processing due to the generation of polyvalent ions, which cause crater-like irradiation marks, and require expensive vacuum systems to maintain high gas pressures for neutralization, leading to apparatus lengthening and increased costs.

Method used

A gas cluster ion beam apparatus with a neutralization gas introduction device and a reflective electrode to neutralize cluster ions efficiently, using the same or different gases for neutralization, and a reflective electrode to remove unneutralized ions, without the need for high-pressure regions or expensive vacuum systems.

Benefits of technology

Enables stable, efficient, and cost-effective neutralization of gas cluster ions, achieving surface roughness of Ra < 1 nm with reduced apparatus length and cost, by using a neutral beam to perform etching and trimming.

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Abstract

The present invention provides a gas cluster ion beam apparatus that enables flat processing of a material substrate by irradiation with a neutral beam during irradiation with a gas cluster ion beam. [Solution] A neutralization gas introduction device 26 is provided for the first vacuum vessel 2. By introducing neutralization gas from the neutralization gas introduction device, the gas cluster ion beam 11 along the beamline in the beam transport system BT collides with the neutralization gas, causing dissociation and neutralization to form a high-energy neutral beam 25. Furthermore, a reflective electrode 28 is provided between the electrostatic lens 9b and the material substrate 15 to which a high voltage equivalent to the acceleration voltage is applied.
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Citation Information

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