A special gas coupling and conveying device for the reaction chamber of a flat-plate PECVD equipment

Abstract

The present invention discloses a special gas coupling and conveying device for a reaction chamber of a flat-plate PECVD equipment, comprising an upper gas supply seat located on the upper cover of the reaction chamber, a lower gas supply seat located in the reaction chamber, and a transition seat located between the upper gas supply seat and the lower gas supply seat, wherein the upper gas supply seat is provided with a plurality of upper gas supply joints, the transition seat is provided with a plurality of transition channels, the lower gas supply seat is provided with a plurality of lower gas supply joints, the lower end of each upper gas supply joint is arranged one-to-one with the upper end of each transition channel, the upper end of each lower gas supply joint extends one-to-one into the lower end of each transition channel, the upper end of the transition seat is provided with a first sealing ring at the outer periphery of each transition channel, and the upper edge of the transition seat is provided with a second sealing ring including all the first sealing rings. The present invention can safely introduce gas from a fixed lower reaction chamber to the gas injection port of a movable upper cover of a hinged flip cover structure, and the present invention has the advantages of simple structure, good reliability, and low gas leakage.

Description

Technical Field

[0001] The invention relates to a flat-plate PECVD device, in particular to a special gas coupling and conveying device for a reaction chamber of a flat-plate PECVD device. Background Art

[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) refers to plasma enhanced chemical vapor deposition, which uses microwaves or radio frequencies to ionize special gases (such as silane and ammonia) containing thin film component atoms to form plasma locally. The plasma chemical activity is very strong, which allows chemical reactions to be carried out at a lower temperature and deposit the desired film on the substrate. During the film growth process, the inner wall of the cavity will also be attached with thin film materials, which need to be cleaned regularly. Therefore, this equipment adopts the method of opening the upper cover hinge, and the upper cover is opened during maintenance. The reacting process gases are introduced from the cavity into the jet port of the movable upper cover. The advantages of flat-plate PECVD equipment are obvious, such as low basic temperature, fast deposition rate, good film quality, fewer pinholes, and not easy to crack.

[0003] There are two main existing special gas delivery methods. One is to use a bellows for direct connection. This method will cause fatigue fracture as the upper cover is frequently opened. At the same time, the bellows may be squeezed when the upper cover of the reaction chamber is closed. As the number of times the cover is closed increases, the bellows will be damaged, causing gas leakage and making it impossible to carry out the thin film growth process. The other is to use a single-channel gas docking. Although this method avoids the problem of bellows damage, it is prone to sealing failure due to relative movement, resulting in gas leakage. The leaked gas enters the reaction chamber, causing poor process repeatability and poor product quality. Summary of the invention

[0004] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a flat-plate PECVD equipment reaction chamber special gas coupling and delivery device with simple structure and good reliability.

[0005] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0006] A special gas coupling and delivery device for a reaction chamber of a flat-plate PECVD equipment comprises an upper gas supply seat located on an upper cover of the reaction chamber, a lower gas supply seat located in the reaction chamber, and a transition seat located between the upper gas supply seat and the lower gas supply seat, wherein the upper gas supply seat is provided with a plurality of upper gas supply joints, the transition seat is provided with a plurality of transition channels, and the lower gas supply seat is provided with a plurality of lower gas supply joints, the lower end of each of the upper gas supply joints is arranged in a one-to-one correspondence with the upper end of each of the transition channels, the upper end of each of the lower gas supply joints extends into the lower end of each of the transition channels in a one-to-one correspondence, the upper end of the transition seat is provided with a first sealing ring at the periphery of each of the transition channels, and the upper end edge of the transition seat is provided with a second sealing ring including all the first sealing rings.

[0007] As a further improvement of the above technical solution: a vacuum channel is provided in the transition seat, an air inlet of the vacuum channel is located between the first sealing ring and the second sealing ring, and an air outlet is connected to a vacuum pump.

[0008] As a further improvement of the above technical solution: at least one third sealing ring is provided at the upper end of the lower air supply joint.

[0009] As a further improvement of the above technical solution: an elastic member is sleeved on the outer periphery of the lower air supply joint, the upper end of the elastic member abuts against the transition seat, and the lower end of the elastic member abuts against the lower air supply seat.

[0010] Compared with the prior art, the advantages of the present invention are: the flat-plate PECVD equipment reaction chamber special gas coupling and delivery device disclosed in the present invention, the reaction chamber upper cover and the lower chamber gas are separated, the upper gas supply joint is concentrated on the upper gas supply seat, and the transition channel is concentrated on the transition seat. The transition seat can provide space for arranging the first sealing ring, the second sealing ring and the vacuum channel. In addition to relying on the corresponding first sealing rings, the sealing between each upper gas supply joint and the transition channel can also rely on the outer second sealing ring for total sealing. Even if a single first sealing ring fails and leaks, the leaked gas will be sealed by the second sealing ring and will not leak into the chamber, which will not affect the process quality of the reaction chamber. At the same time, the gas is safely introduced from the fixed lower reaction chamber to the air outlet of the movable upper cover of the hinged flip structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1 It is a structural schematic diagram of the special gas coupling and conveying device of the reaction chamber of the flat-plate PECVD equipment of the present invention.

[0012] The numbers in the figure indicate: 1. upper air supply seat; 11. upper air supply joint; 2. lower air supply seat; 21. lower air supply joint; 22. third sealing ring; 23. elastic member; 3. transition seat; 31. transition channel; 32. second sealing ring; 33. first sealing ring; 34. vacuum channel. DETAILED DESCRIPTION

[0013] The present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0014] Figure 1 An embodiment of a special gas coupling and delivery device for a reaction chamber of a flat-plate PECVD device of the present invention is shown. The special gas coupling and delivery device for a reaction chamber of a flat-plate PECVD device of the present embodiment comprises an upper gas delivery seat 1 located on an upper cover of the reaction chamber, a lower gas delivery seat 2 located in the reaction chamber, and a transition seat 3 located between the upper gas delivery seat 1 and the lower gas delivery seat 2. The upper gas delivery seat 1 is provided with a plurality of upper gas delivery joints 11, the transition seat 3 is provided with a plurality of transition channels 31, and the lower gas delivery seat 2 is provided with a plurality of lower gas delivery joints 21. The lower end of each upper gas delivery joint 11 is arranged one-to-one with the upper end of each transition channel 31, and the upper end of each lower gas delivery joint 21 extends one-to-one into the lower end of each transition channel 31. The upper end of the transition seat 3 is provided with a first sealing ring 33 on the outer periphery of each transition channel 31, and the upper end edge of the transition seat 3 is provided with a second sealing ring 32 including all the first sealing rings 33.

[0015] The flat-plate PECVD equipment reaction chamber special gas coupling conveying device has a reaction chamber upper cover and a lower chamber body gas separation, an upper gas supply connector 11 is concentrated on an upper gas supply seat 1, and a transition channel 31 is concentrated on a transition seat 3. The transition seat 3 can provide space for arranging a first sealing ring 33, a second sealing ring 32 and a vacuum channel 34. In addition to relying on the corresponding first sealing rings 33, the sealing between each upper gas supply connector 11 and the transition channel 31 can also rely on the outer second sealing ring 32 for overall sealing. Even if a single first sealing ring 33 fails to leak, the leaked gas will be sealed by the second sealing ring 32 and will not leak into the chamber, thereby not affecting the process quality of the reaction chamber.

[0016] Furthermore, in this embodiment, a vacuum channel 34 is provided in the transition seat 3, the air inlet of the vacuum channel 34 is located between the first sealing ring 33 and the second sealing ring 32, and the air outlet is connected to a vacuum pump (not shown in the figure). When the first sealing ring 33 fails and leaks, the leaked gas is blocked by the second sealing ring 32 on the one hand, and can be promptly extracted with the help of the vacuum pump and the vacuum channel 34 on the other hand.

[0017] Further, at least one third sealing ring 22 is provided at the upper end of the lower air supply joint 21. In this embodiment, there are two third sealing rings 22. Providing more than one third sealing ring 22 is conducive to ensuring the sealing between the transition seat 3 and the lower air supply joint 21.

[0018] Furthermore, in this embodiment, an elastic member 23 is sleeved on the outer periphery of the lower gas supply connector 21, the upper end of the elastic member 23 abuts against the transition seat 3, and the lower end of the elastic member 23 abuts against the lower gas supply seat 2. When the upper cover is opened or closed, the transition seat 3 can move up and down under the action of the elastic member 23, so as to achieve flexible contact between the transition seat 3 and the upper gas supply seat 1, and at the same time ensure that when the upper cover of the reaction chamber is closed, the transition seat 3 and the upper gas supply seat 1 are tightly fitted at all places.

[0019] Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any technician familiar with the art can make many possible changes and modifications to the technical solution of the present invention by using the technical content disclosed above without departing from the scope of the technical solution of the present invention, or modify it into an equivalent embodiment of equivalent changes. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention should fall within the scope of protection of the technical solution of the present invention.

Claims

1. A flat-plate PECVD equipment reaction chamber special gas coupling delivery device, used to introduce gas from a fixed lower reaction chamber to a movable reaction chamber upper cover, characterized in that: The invention comprises an upper gas supply seat (1) located on an upper cover of a reaction chamber, a lower gas supply seat (2) located in the reaction chamber, and a transition seat (3) located between the upper gas supply seat (1) and the lower gas supply seat (2), wherein the upper gas supply seat (1) is provided with a plurality of upper gas supply joints (11), the transition seat (3) is provided with a plurality of transition channels (31), and the lower gas supply seat (2) is provided with a plurality of lower gas supply joints (21), the lower ends of the upper gas supply joints (11) are arranged in a one-to-one correspondence with the upper ends of the transition channels (31), the upper ends of the lower gas supply joints (21) extend into the lower ends of the transition channels (31) in a one-to-one correspondence, and the upper ends of the transition seats (3) are respectively provided with A first sealing ring (33), a second sealing ring (32) including all the first sealing rings (33) is provided on the upper edge of the transition seat (3), an elastic member (23) is sleeved on the outer periphery of the lower air supply joint (21), the upper end of the elastic member (23) abuts against the transition seat (3), and the lower end of the elastic member (23) abuts against the lower air supply seat (2) so that the transition seat (3) can move up and down; a vacuum channel (34) is provided in the transition seat (3), the air inlet of the vacuum channel (34) is located between the first sealing ring (33) and the second sealing ring (32), and the air outlet is connected to a vacuum pump; at least one third sealing ring (22) is provided at the upper end of the lower air supply joint (21).

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