Method, device and program for determining chamfer properties of a workpiece chamfer

Abstract

The invention relates to a device and a method for determining chamfer properties of a chamfer (1) of a workpiece, generating measuring points (MP) along at least a first measuring path (MB1), the first measuring path (MB1) extending over a first chamfer edge (3), determining at least one non-adaptive compensation element (9) for the measuring points (MP) of the first measuring path (MB1), determining the spatial position of the first chamfer edge (3) based on deviations between the measuring points (MP) of the first measuring path (MB1) and the at least one compensation element (9), and also to a program.

Description

Technical Field

[0001] The invention relates to a method and a device for determining chamfer properties of a chamfer of a workpiece, and also to a program. A device for data processing is also described. Background Art

[0002] When measuring workpieces, for example as part of quality control, it may be necessary to determine the properties of a chamfer of the workpiece. Thus, for example, a test criterion can be evaluated based on the chamfer properties. The chamfer properties can thus form test parameters. Properties that may be mentioned by way of example are, in particular, the spatial position of the chamfer in the coordinate system of the workpiece, the chamfer width and the chamfer angle.

[0003] Especially in the case of small chamfers, measurement (i.e. the generation of measuring points and their evaluation) is a challenge, since in such chamfers only a small number of measuring points can be generated along the chamfered surface. A further problem is that the position tolerance of the spatial position of the chamfered edge can be greater than the actual chamfer width, which also makes measurement more difficult.

[0004] WO 2017 / 121468 A1 discloses a method and apparatus for specifying specification data for measuring a workpiece to be measured by a coordinate measuring machine, the document discloses a chamfer with a specific chamfer angle as a property for determining a test feature. In addition, the document discloses the adaptability of an envelope curve or envelope surface to the measurement result. Summary of the invention

[0005] The technical problem addressed is to provide a method and an apparatus for determining chamfer properties of a chamfer of a workpiece as well as a procedure which allows an accurate and reliable determination of the chamfer properties.

[0006] The solution to the technical problem is provided by a subject matter having the characteristics described below. Other advantageous configurations of the invention are apparent from the following.

[0007] A method for determining chamfer properties of a chamfer of a workpiece is proposed. Chamfer properties that can be mentioned by way of example have been described above. It goes without saying, however, that other chamfer properties that differ from the mentioned properties can be determined by the proposed method.

[0008] In a first step (which may also be referred to as a measuring step), measuring points are generated along at least one measuring path or trajectory, which first measuring path extends over a first chamfered edge. The first measuring path may in particular have a predetermined length. A chamfered edge here refers to the intersection of two surfaces, one of which is a chamfered surface. The other surface may in particular be another surface of a workpiece, such as a cylindrical outer surface, a side surface or a bottom surface of the workpiece. In this case, the measuring points are generated along the surface of the workpiece. In particular, the coordinates of the measuring points therefore represent the coordinates of surface points of the workpiece.

[0009] In this case, the spatial course of the first measuring path can be determined based on previously known properties, in particular previously known spatial positions, of the workpiece and / or the chamfer. This can be done in a workpiece coordinate system. In this case, the previously known properties can be estimated, in particular calculated, and in addition in particular unmeasured properties of the workpiece. For example, the predetermined properties can be determined based on structural information of the workpiece, such as structural data. The predetermined spatial position can also be determined based on an already determined or previously known spatial position of the workpiece in the coordinate system of a measuring device, which generates these measuring points. For this purpose, it may be necessary to perform a coordinate transformation between the workpiece coordinate system and the measuring device coordinate system (machine coordinate system). In this case, this transformation can be determined in a registration step.

[0010] In particular, the starting point of the first measuring path and the end point of the first measuring path may be selected such that the first measuring path extends over the first chamfered edge.

[0011] The measuring device for generating these measuring points can in particular be a so-called coordinate measuring device, which can also be referred to as a coordinate measuring machine. The measuring device can include a tactile sensor for generating these measuring points or an optical sensor for generating these measuring points. In this case, corresponding measuring devices and sensors are known to the person skilled in the art from the prior art.

[0012] The first measuring path extending over the chamfered edge may in particular mean that the first measuring path is not parallel to the chamfered edge. Preferably, the angle between the first measuring path and the first chamfered edge is 90°. However, it is conceivable that the angle between the chamfered edge and the measuring path is in the range of 0 (exclusive) to 180° (exclusive), preferably in the range of 45° (exclusive) to 135° (exclusive). In this case, the properties, in particular the length and / or the position and / or the course of the first measuring path, may be selected such that the first measuring path extends over the first chamfered edge without extending over the further chamfered edge.

[0013] According to the invention, in the compensation determination step, at least one non-adaptive compensation element is determined for the measurement points of the first measurement path. As will be described in detail below, this compensation element can in particular be a compensation straight line. However, other geometric configurations of the compensation element are also conceivable, such as a circle or an ellipse.

[0014] A non-adaptive compensating element may be understood in particular as an element whose geometry is selected such that there is a non-zero minimum deviation between the error-free measuring points and the non-adaptive compensating element when its properties or parameters have been optimized to minimize the deviation between the compensating element and the error-free measuring points. The geometry is understood in particular as a rectilinear shape, a circular shape, an elliptical shape or another geometric shape.

[0015] Thus, a non-adaptive compensation element may be a compensation element whose deviation from the expected course of the first measuring path is non-zero when its parameters have been selected such that this deviation has been minimized. The expected course of the first measuring path may be determined, for example, by structural data of the workpiece, in particular CAD data.

[0016] In particular, the non-adaptive compensating element must not follow an acute angle course and therefore may not comprise or consist of two straight sub-sections which are angled with respect to each other.

[0017] The properties of a non-adaptive compensating element, in particular a non-adaptive compensating element, such as its spatial position and / or its spatial route, can be determined in such a way that it is as close to the measuring points of the first measuring path as possible. In other words, the compensating element can be determined in such a way that one or more distances between the measuring point and the compensating element are minimized. Various suitable cost functions can be used to determine the corresponding distance quantities. The cost function can be, for example, the sum of the distances or squared distances of the measuring points from the compensating element. The distance can be measured along a connecting line oriented perpendicular to the compensating element between the measuring point and the compensating element, or along a connecting line oriented perpendicular to the tangent direction of the compensating element at the intersection with the connecting line. In other words, the best-fitting non-adaptive compensating element can therefore be determined.

[0018] In this case, the non-adaptive compensating element may have a predetermined length.

[0019] Furthermore, at least one property may be determined in such a way that the distance quantity(s) is / are minimized, in particular by a suitable optimization method, for example by a least squares method (method of least squares). It goes without saying, however, that other cost functions and optimization methods may be used to determine the compensation element.

[0020] These measuring points and compensation elements can be determined in the machine coordinate system or in the workpiece coordinate system.

[0021] Furthermore, the spatial position of the first chamfered edge is determined as a function of the deviation between the measuring points of the first measuring path and the compensation element determined in this way. In particular, this may mean quantitatively evaluating the value of this deviation in order to determine the spatial position. Furthermore, the course of this deviation may be determined along the measuring path or along the compensation element, i.e., for example for each measuring point, and the spatial position of the first chamfered edge is then determined as a function of this course.

[0022] Therefore, the spatial position of the first chamfered edge can therefore be determined as a chamfer property.

[0023] It is possible that, in addition to this deviation, the position of these measuring points relative to the compensation element is also taken into account when determining the spatial position of the first chamfered edge, in particular whether the measuring points are located in a first half-space delimited by the compensation element and where the chamfered edge is expected to be located or in the half-space opposite to this first half-space.

[0024] Thus, it is advantageously achieved that a reliable and accurate determination of the spatial position of the first chamfered edge is easily achievable. In particular, no complex determination and movement along the first measuring path is required in order to determine the spatial position of the first chamfered edge.

[0025] In summary, a compensating element is thus selected which is not adapted in its geometry to the expected course of the first measuring path, although then its properties, in particular its spatial position, are selected such that it comes as close as possible to the course of the measuring points along the first measuring path (best fit). The distances of the measuring points determined in this way from the compensating element are then evaluated and used to determine the position of the chamfered edge. In this case, the geometry of the compensating element is not fixed, but the compensating element or its geometry should be selected such that the distances between the compensating element and the measuring points can be determined.

[0026] It is also possible that in a first step, measuring points are generated along a measuring path or trajectory, which extends both over the first chamfered edge and over the other chamfered edge. In addition, a non-adaptive compensation element can then be determined for these measuring points of this measuring path, and the spatial position of the first chamfered edge and the spatial position of the other chamfered edge can be determined based on the deviations between these measuring points of this measuring path and the compensation element. In other words, the spatial position of the first chamfered edge and the other chamfered edge can therefore be determined based on these measuring points generated along the measuring path and their deviations from the non-adaptive compensation element. This determination can be carried out by suitable calculation methods, in particular taking into account tolerances. For example, the positions of the two measuring points with the largest deviations from the compensation element can be determined as the spatial positions of the first chamfered edge and the other chamfered edge.

[0027] The measurement path can also be divided into at least two path areas. In this case, the properties of the path area, such as position and / or length and / or route, can be predetermined. The properties can also be set, for example, manually by a user or automatically, for example, by a corresponding evaluation method.

[0028] In addition, the spatial position of the first chamfered edge can be determined based on the deviation between the measuring point of the first path area and the compensation element. Similarly, the spatial position of the other chamfered edge can be determined based on the deviation between the measuring point of the other path area and the compensation element. In this case, one or more properties of the path areas are determined in particular in such a way that in the first path area, the measuring path extends over the first chamfered edge and in the other path area, the measuring path extends over the other chamfered edge. Preferably, one or more properties of the path areas are determined in such a way that in the first path area, the measuring path does not extend over the other chamfered edge and in the other path area, the measuring path does not extend over the first chamfered edge.

[0029] It is also possible to determine a first non-adaptive compensation element for the measurement points of a first path region, and to determine the spatial position of the first chamfered edge based on the deviation between the measurement points of this first path region and the first compensation element. Similarly, another non-adaptive compensation element can be determined for the measurement points of another path region, and the spatial position of another chamfered edge can be determined based on the deviation between the measurement points of this another path region and the another compensation element.

[0030] In another embodiment, the compensating element is a straight line. This has been explained above. The properties of such a compensating element may be in particular the interpolation point, the slope and the orientation of the straight line.

[0031] If the first measuring path extends over the first chamfered edge, the measuring path will have an acute or curved course. Therefore, selecting the compensation element as a straight line means selecting a geometry of the compensation element that is not adapted to the actual course of the measuring path. Therefore, in this case, the compensation element is selected such that the compensation element is not adapted to the expected course of the measuring path, i.e. the course of the measuring points when they are recorded without error, i.e. under ideal measurement.

[0032] Thus, in the case of a straight line, at least some of the measuring points of the first measuring path are arranged at a certain distance from the compensation element. In this case, it can be assumed that measuring points generated in the region of the edge (i.e. at or on the edge) are at a greater distance from the compensation element formed as a straight line than measuring points generated further away from the edge. The spatial position of the chamfered edge can therefore be determined from the spatial position of these measuring points at the maximum distance from the compensation element. However, this is not necessarily the case, as will be explained in more detail below, the measuring points at the maximum distance from the compensation element necessarily fix the spatial position of the edge.

[0033] For example, it is conceivable to determine the spatial position of the chamfered edge as the midpoint of all these measuring points or their coordinates (the distance from the compensation element is greater than 80%, 90% or 95% of the maximum distance). Moreover, the spatial position of the chamfered edge can be determined based on the coordinates of these measuring points weighted by a certain distance amount, the more the coordinates of the measuring points used to determine the spatial position are weighted, the greater the distance of the corresponding measuring point from the compensation element.

[0034] In this case, however, these measuring points can only be taken into account if they are located in the first half-space described above.

[0035] This advantageously facilitates a reliable and exact determination of the spatial position of the first chamfered edge (as explained above), in particular since the compensating element formed as a straight line or its properties can be easily and reliably determined.

[0036] In another embodiment, the distance between the measuring point and the compensation element is determined for each measuring point, and the spatial position of the measuring point at the maximum distance from the compensation element is determined as the spatial position of the chamfered edge. This advantageously results in a determination of the spatial position of the chamfered edge that can be realized in a short time and with a small amount of calculation.

[0037] In another embodiment, the length of the first measuring path is determined according to a position tolerance of an expected spatial position of the first chamfered edge.Alternatively or additionally, the length of the first measuring path is determined according to an expected width of the chamfer.

[0038] For example, the length of the first measuring path can be determined in such a way that it corresponds to a position tolerance of the expected spatial position or is longer by a predetermined percentage, for example 10% or 20%.

[0039] Furthermore, the length of the first measuring path may be determined in such a way that it corresponds to the expected width or is longer than this expected width by a predetermined percentage, for example 10% or 20%.

[0040] Furthermore, the length of the first measuring path may be determined in such a way that it corresponds to the sum of the position tolerance and the expected width or is longer by a predetermined percentage, for example 10% or 20%.

[0041] Furthermore, the length of the first measuring path may be determined in such a way that it is not longer than a predetermined multiple of the position tolerance or the expected width or the sum of the position tolerance and the expected width, for example not longer than 1.5 times this amount.

[0042] Advantageously, this results in an improved reliability of the determination of the spatial position, since, by selecting this length, it can be ensured with a greater probability that the measuring path extends over the first chamfered edge.

[0043] In another embodiment, measurement points are generated along a further measurement path, which extends over a further chamfered edge, for which a further non-adaptive compensation element is determined for the measurement points of the further measurement path. In addition, the spatial position of the further chamfered edge is determined as a function of the deviation between the measurement points of the further measurement path and the further compensation element. The aforementioned aspect of determining the spatial position of the first chamfered edge as a function of the deviation between the measurement points of the first measurement path and the compensation element also applies in a corresponding manner to determining the spatial position of the further chamfer.

[0044] Preferably, the first measuring path and the further measuring path are located in a common measuring plane, the normal vector of which can be oriented perpendicularly to the normal vector of the chamfered surface. Moreover, the measuring plane can be oriented perpendicularly to the first and / or further chamfered edge, in particular perpendicularly to the expected course of the chamfered edge(s).

[0045] In this case, the further measuring path can continue the course of the first measuring path, in particular with the same orientation.However, it is also possible that the first measuring path and the further measuring path intersect at an angle different from 0° or 180° and therefore have different orientations.

[0046] In this case, the properties, in particular the length and / or the position and / or the course of the first measuring path, can be selected such that the further measuring path extends over the further chamfered edge without extending over the first chamfered edge.

[0047] In another embodiment, the method is a computer-implemented method. This will still be explained in more detail below.

[0048] A program is also proposed, which, when executed on or by a computer, causes the computer or the computing device or the apparatus for data processing to execute one, several or all steps of the method described in the present disclosure for determining the chamfering properties of a workpiece chamfer.

[0049] In this case, a computer may be any kind of data processing device, but in particular one of the aforementioned computing devices or apparatus for data processing, in particular a programmable computing device or apparatus for data processing.

[0050] Alternatively or additionally, a program storage medium or a computer program product is described, in particular on or in which the program is stored in a non-temporary (i.e. permanent) form. Alternatively or additionally, a computer comprising this program storage medium is described. Furthermore, alternatively or additionally, a signal, such as a digital signal, encoding information representing the program and comprising encoding means, which are suitable for performing one, several or all steps of the method set forth in the present disclosure for determining chamfer properties of a chamfer of a workpiece is described. The signal can be a physical signal, such as an electrical signal, which is in particular generated technically or by a machine.

[0051] Furthermore, the method for determining the chamfer properties of a chamfer of a workpiece may be a computer-implemented method. For example, one, several or all steps of the method may be performed by a computer. An embodiment of the computer-implemented method is to use a computer to perform a data processing method. The computer may, for example, comprise at least one computing device, in particular a processor, and, for example, at least one storage device, in order to process the data, in particular technically, for example electronically and / or optically. The processor may be a semiconductor-based processor.

[0052] A computer program or a computer program product is also described, which includes commands which, when the program is run by a computer, cause the computer to perform one, several or all steps of the method set forth in the present disclosure for determining the chamfering properties of a chamfered workpiece. A computer-readable (storage) medium is also described, which includes such commands. A computer-readable data carrier is also described, on which the computer program (product) is stored.

[0053] A device for determining chamfer properties of a chamfer of a workpiece is also proposed, the device comprising an input interface for receiving measurement points, in particular measurement points generated along the at least first measurement path, and at least one evaluation device. The evaluation device can be formed as a computing device and a device for data processing. In particular, the evaluation device can be formed as a microcontroller or an integrated circuit (for example as an FPGA) or can include such a microcontroller or integrated circuit.

[0054] According to the invention, the evaluation device can be used to determine a non-adaptive compensation element for the spatial position of the measuring point of the first measuring path and the first chamfered edge as a function of the deviation between the measuring point of the first measuring path and the compensation element. The evaluation device can be designed or configured in particular in such a way that the described determination can be performed by the evaluation device.

[0055] The proposed device is used in an advantageous manner to carry out the method described in the present disclosure. In particular, the device can thus be configured or formed in such a way that the method according to one of the embodiments described in the present disclosure can be carried out by the device.

[0056] Also described is a device for data processing, which includes a device for performing the steps of the method for determining chamfer properties of a chamfer of a workpiece according to the embodiments described in the present disclosure.

[0057] A coordinate measuring machine is also described, which comprises a device for determining chamfer properties of a chamfer of a workpiece and / or a device for data processing according to one of the embodiments described in the present disclosure. In particular, by means of the coordinate measuring machine, measuring points can be generated along the described measuring path. BRIEF DESCRIPTION OF THE DRAWINGS

[0058] The present invention will be described in more detail based on exemplary embodiments. In the accompanying drawings:

[0059] Figure 1 A schematic side view showing a chamfer of a workpiece,

[0060] Figure 2 shows a schematic diagram of a first measurement path and a first non-adaptive compensation element,

[0061] Figure 3 A schematic diagram showing another measurement path and another non-adaptive compensation element,

[0062] Figure 4 A schematic diagram showing the deviation between the measuring point and the compensation element;

[0063] Figure 5 shows a schematic flow chart of a method according to the present invention in a first embodiment,

[0064] Figure 6 A schematic flow chart of a method according to the present invention in another embodiment is shown, and

[0065] Figure 7 A schematic block diagram of a device according to the present invention is shown. DETAILED DESCRIPTION

[0066] Identical reference numerals are used hereinafter to designate elements having identical or similar technical features.

[0067] Figure 1 A schematic side view of a chamfer 1 of a workpiece 2 is shown. The chamfer 1 has a first chamfer edge 3 and a further chamfer edge 4. The first chamfer edge 3 is formed as an intersection of a first surface 5 and a chamfer surface 6 of the workpiece 2. The second chamfer edge 4 is formed as an intersection between the chamfer surface 6 and a further surface 7 of the workpiece, which is different from the first surface 5, in particular has a normal vector different from the normal vector of the first surface 5.

[0068] The surfaces 5 , 6 , 7 may in particular be non-curved surfaces, ie planar surfaces.

[0069] Figure 2 A schematic diagram of a workpiece 2 with a chamfer 1, a first surface 5, a chamfered surface 6 and a first chamfered edge 3 is shown. Also shown are measuring points MP produced along a first measuring path MB1. In this case, the first measuring path MB1 extends along the first surface 5 over the first chamfered edge 3 and along the chamfered surface 6 up to the second chamfered edge 4. The direction of the first measuring path MB1 is symbolically indicated by an arrow 8. For the sake of overall clarity, only one of these measuring points MP is provided with a reference number.

[0070] exist Figure 2 In FIG. 5 , it is shown that these measurement points MP are measurement points recorded without error, whose coordinates correspond to the actual coordinates of the point on the first surface 5 or on the chamfered surface. In practice, due to measurement errors, not every measurement point MP can encode the exact spatial position of the point on the first surface 5 or on the chamfered surface 6, but can encode coordinates that slightly deviate therefrom.

[0071] It is also evident that the course of the first measuring path B1 with the measurement point MP recorded without error is an acute-angle course, which is arranged at the location of the first chamfered edge 3 .

[0072] Also shown is a first non-adaptive compensating element 9 which is indicated by a dashed line. The first compensating element 9 is formed as a straight line and is therefore not suitable for the acute angle course of the first measuring path MB1 formed by the error-free recorded measuring points MP.

[0073] In this case, the properties or parameters, in particular the spatial position and the course or the encoding parameters, of this first non-adaptive compensating element 9 are selected such that the deviation between the measuring points MP of the first measuring path MB1 and the compensating element 9 is minimized. This deviation can be represented by a cost function, and the properties / parameters of the first compensating element 9 are determined in such a way that this cost function is minimized, for example by a suitable optimization method.

[0074] In this case, the spatial position can refer to a position and / or orientation in a coordinate system, in particular a reference coordinate system. The reference coordinate system can in particular be a coordinate system of the measuring device or a workpiece coordinate system.

[0075] For each measuring point MP, the distance between the respective measuring point MP and the first compensating element 9 can then be determined. For the sake of overall clarity, only the maximum distance Dmax between the maximum distance-specific measuring point MPmax and the first non-adaptive compensating element 9 is indicated here.

[0076] The spatial position of this maximum distance-specific measuring point MPmax, i.e. the measuring point MP at the maximum distance Dmax from the first compensating element 9, can then be determined as the spatial position of the first chamfered edge 3. Distance variables known to those skilled in the art can be selected here for determining the distance between a point and a straight line, in particular the length of a connecting line between the straight line and the measuring point MP, which is oriented perpendicular to the straight line.

[0077] Figure 2 A schematic diagram of a workpiece 2 with a chamfer 1, a further surface 7, a chamfered surface 6 and a further chamfered edge 4 is shown. Also shown are measuring points MP produced along a further measuring path MB2. In this case, the further measuring path MB2 extends along the further surface 7 over the further chamfered edge 4 and along the chamfered surface 6 up to the first chamfered edge 3. The direction of the further measuring path MB2 is symbolically indicated by an arrow 8. For the sake of overall clarity, only one of these measuring points MP is provided with a reference number.

[0078] In this case, the further measuring path MB2 is selected such that it extends over the further chamfered edge 4 without extending over the first chamfered edge 3 .

[0079] exist Figure 3 In FIG. 1 , it is shown that these measurement points MP are measurement points recorded without error, and the coordinates of these measurement points correspond to the actual coordinates of the points on the other surface 7 or the chamfered surface 6. In practice, due to measurement errors, not every measurement point MP can encode the exact spatial position of the point on the other surface 7 or on the chamfered surface 6, but can encode coordinates that slightly deviate therefrom.

[0080] It is also evident that the course of the further measuring path MB2 with the measuring points MP recorded without error is also an acute angle course, which is arranged at the location of the further chamfered edge 4 .

[0081] Also shown is a further non-adaptive compensating element 10 which is indicated by a dashed line. The further compensating element 10 is likewise formed as a straight line and is therefore not suitable for the acutely angled course of the further measuring path MB2 formed by the error-free recorded measuring points MP.

[0082] Similar to the case of the first non-adaptive compensating element 9, the properties or parameters of this further non-adaptive compensating element 10 are selected so that the deviation between the measuring point MP of the further measuring path MB2 and the compensating element 10 is minimized. Regarding the determination of this property, reference can be made to the description regarding the determination of the properties / parameters of the first non-adaptive compensating element 9.

[0083] For each measuring point MP, the distance between the respective measuring point MP and the other compensating element 10 can then be determined. For the sake of overall clarity, only the maximum distance Dmax between the maximum distance-specific measuring point MPmax and the other non-adaptive compensating element 10 is shown here.

[0084] The spatial position of this maximum-distance-specific measuring point MPmax, ie the measuring point MP at the maximum distance Dmax from the further compensating element 10 , can then be determined as the spatial position of the further chamfered edge 3 .

[0085] Furthermore, the chamfer width can then be determined, for example, as the distance between these measuring points MPmax, based on the spatial position of specific measuring points MPmax of the maximum distance produced along the first measuring path MB1 and the further measuring path MB2, in particular when the first and further measuring paths MB1, MB2 are located in a plane oriented perpendicular to the chamfer edges 3, 4 or when their normal vectors are located in a plane defined by the chamfer surface 6.

[0086] Figure 4 By way of example, the non-adaptive compensation elements 9, 10 (see FIG. 1 ) are shown for the corresponding determination of the measuring point distances along the measuring paths MB1, MB2. Figure 2 and Figure 3 ) of a distance D. The distance D is shown here as positive or negative.

[0087] It is obvious that the course of the line representing the distance has a curved shape which depends in particular on the diameter of the probe ball used.

[0088] Then, from the spatial position of the chamfered edges 3, 4, as explained, the width of the chamfer 1 can also be determined. From the spatial position of the two chamfered edges 3, 4, the chamfering angle, i.e. the angle between the first surface 5 and the chamfered surface 6 or the angle between the chamfered surface 6 and another surface 7 of the workpiece 2 can also be determined.

[0089] Tests have shown that the measurement accuracy achieved using the method according to the invention is very high. It has also been possible to show that the chamfer properties, in particular the width of the chamfer 1, can be determined with the desired reproducibility. For example, it has been possible to establish that the measurement results obtained when measuring the chamfer vary only between 3 micrometers and 8 micrometers.

[0090] The method can advantageously be applied to a wide variety of workpieces and chamfer widths and can therefore be used flexibly.

[0091] exist Figure 5 In FIG. 4 , a schematic flow chart of a method according to the invention according to a first embodiment is shown. In a first step S1, a measuring point MP is generated along a first measuring path MB1, which extends over a first chamfered edge 3 (see FIG. 4 ). Figure 2 ).

[0092] In a second step S2, a first non-adaptive compensation element 9 is determined for the measurement point MP of the first measurement path MB1. This has already been explained above. In a third step S3, the spatial position of the first chamfered edge 3 is then determined from the deviation between the measurement point MP of the first measurement path MB1 and the compensation element 9.

[0093] Figure 6 A schematic flow chart of a method according to the invention in another embodiment is shown. Here, the first, second and third steps S1, S2, S3 correspond to Figure 5 Steps S1, S2, S3 are shown. In a fourth step S4, measurement points MP are generated along a further measurement path MB2, which extends over the further chamfered edge 4. Furthermore, in a fifth step S5, a further compensation element 10 is determined for the measurement points MP of the further measurement path MB2. Furthermore, in a sixth step S6, the spatial position of the further chamfered edge 4 is determined based on the deviation between the measurement points MP of the further measurement path MB2 and the further compensation element 10. In a seventh step S7, the chamfer width and / or the chamfer angle can then be determined as chamfer properties based on the spatial position of the first chamfered edge 3 and the spatial position of the further chamfered edge 4.

[0094] Figure 7 A schematic block diagram of a device 11 according to the invention for determining chamfer properties of a workpiece chamfer 1 is shown. The device 11 comprises an input interface 12 for receiving measurement points MP. The device 11 also comprises an evaluation device 13 which can be formed as a device for data processing, in particular as a computing device.

[0095] The device 11 further comprises an output interface 14 for outputting the chamfer properties or information encoded based on the chamfer properties.

[0096] In particular, the evaluation device 13 can be used to perform Figure 5 and Figure 6 The second step S2, the third step S3, the fifth step S5, the sixth step S6, and the seventh step S7 (see Figure 6 ).

[0097] List of Reference Numerals

[0098] 1 Chamfer

[0099] 2 Workpiece

[0100] 3 First chamfer edge

[0101] 4 Another chamfered edge

[0102] 5. First surface of the workpiece

[0103] 6 Chamfered surfaces

[0104] 7 The other surface of the workpiece

[0105] 8 Arrow

[0106] 9 The first non-adaptive compensation element

[0107] 10 Another non-adaptive compensation element

[0108] 11 Equipment

[0109] 12 Input Interface

[0110] 13 Evaluation Device

[0111] 14 Output Interface

[0112] MB1 First measurement path

[0113] MB2 Another measurement path

[0114] MP measuring point

[0115] MPmax Maximum distance to a specific measuring point

[0116] D Distance

[0117] Dmax Maximum distance

Claims

1. A method for determining chamfer properties of a chamfer (1) of a workpiece, comprising generating measuring points (MP) by means of a coordinate measuring machine along at least a first measuring path (MB1), the first measuring path (MB1) having a first geometry and extending over a first chamfer edge (3), It is characterized in that determining, by means of an evaluation device, at least one non-adaptive compensating element (9) for the measuring points (MP) of the first measuring path (MB1), wherein the non-adaptive compensating element has a second geometry and wherein the first geometry deviates from the second geometry; as well as The spatial position of the first chamfered edge (3) is determined based on the deviation between the measurement points (MP) of the first measurement path (MB1) and at least one corresponding point of the at least one non-adaptive compensation element (9), wherein the measurement points of the first measurement path are generated by measurements performed by the coordinate measuring machine.

2. The method according to claim 1, characterized in that The non-adaptive compensation element (9) is a straight line.

3. The method according to any one of the preceding claims, characterized in that The distance (D) between the measuring point (MP) and the non-adaptive compensation element (9) is determined for each of the measuring points (MP), and the spatial position of the measuring point (MPmax) at the maximum distance (Dmax) from the non-adaptive compensation element (9) is determined as the spatial position of the first chamfered edge (3).

4. The method according to claim 1 or 2, characterized in that: The length of the first measuring path (MB1) is determined according to a position tolerance of an expected spatial position of the first chamfered edge (3) and / or according to an expected width of the chamfer (1).

5. The method according to claim 1 or 2, characterized in that: Measuring points (MP) are generated along a further measuring path (MB2), the further measuring path (MB2) extending over a further chamfered edge (4), a further non-adaptive compensation element (10) is determined for these measuring points (MP) of the further measuring path (MB2), and the spatial position of the further chamfered edge (4) is determined based on deviations between these measuring points (MP) of the further measuring path (MB2) and the further non-adaptive compensation element (10).

6. The method according to claim 5, characterized in that The chamfer width and / or the chamfer angle are determined according to the spatial position of the first chamfered edge (3) and the spatial position of the other chamfered edge (4).

7. The method according to claim 1 or 2, characterized in that: The method is a computer-implemented method.

8. A computer-readable storage medium having a computer program stored thereon, which, when the computer program is executed by a computer, The computer is caused to execute the method for determining chamfer properties of a workpiece chamfer (1) as claimed in claim 1.

9. A device for determining chamfer properties of a chamfer of a workpiece (1), the device (11) comprising an input interface (12) for receiving measuring points (MP) generated by a coordinate measuring machine and at least one evaluation device (13), It is characterized in that By means of the evaluation device (13), the at least one non-adaptive compensating element (9) can be determined for the spatial position of the measuring points (MP) of the first measuring path (MB1) and the first chamfered edge (3) based on deviations between the measuring points (MP) of the first measuring path (MB1) and corresponding points of the at least one non-adaptive compensating element (9), wherein the first measuring path has a first geometry, wherein the non-adaptive compensating element has a second geometric shape, wherein the first geometric shape deviates from the second geometric shape, and The measuring points of the first measuring path result from a measurement performed by the coordinate measuring machine.

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