Copper Ball Polishing Production Line

Abstract

The present invention discloses a copper ball polishing production line, which includes a polishing device and a cleaning tank. The polishing device includes a polishing unit, and the polishing unit includes a polishing cylinder and a slideway. The polishing cylinder has an inlet section, a transition section and an outlet section. The diameter of the inlet section is larger than that of the outlet section. The inlet section, the transition section and the outlet section are coaxial. The transition section is arranged between the inlet section and the outlet section. A plurality of liquid discharge ports are provided on the cylinder wall of the outlet section; the cleaning tank is arranged at the lower left of the outlet section, a feeding port is provided on the cleaning tank, and the slideway is arranged between the cleaning tank and the polishing cylinder, and the slideway is inclined downward. By setting the diameter of the inlet section to be larger than that of the outlet section, most of the polishing liquid will remain in the inlet section and will not flow into the cleaning tank; a small part of the polishing liquid moves to the outlet section along with the copper ball and then flows out from the liquid discharge port, and will not flow into the cleaning tank either; only the polishing liquid attached to the copper ball can enter the cleaning tank, so the burden of the cleaning process is lighter and the efficiency of the cleaning process is higher.

Description

Technical Field

[0001] The present invention relates to the technical field of polishing equipment, and particularly relates to a copper ball polishing production line. Background Art

[0002] In the production process of phosphor copper balls, generally, processes such as melting and up-drawing continuous casting, ball rolling, polishing, cleaning, air drying, and packaging are required. In the polishing process, a polishing liquid is needed for polishing, and then the polishing liquid is washed off in the cleaning process; currently, the polishing production line of phosphor copper balls mainly consists of a polishing cylinder and a cleaning tank. When it works, the polishing liquid in the polishing cylinder easily flows from the outlet of the polishing cylinder to the cleaning tank, increasing the burden of the cleaning process, resulting in a decrease in the efficiency of the cleaning process and an increase in cleaning water consumption. Summary of the Invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. For this purpose, the present invention provides a copper ball polishing production line.

[0004] The copper ball polishing production line according to an embodiment of the present invention includes a polishing device and a cleaning tank. The polishing device includes at least one polishing unit. The polishing unit includes a polishing cylinder and a slideway. The polishing cylinder has an inlet section, a transition section, and an outlet section. Both the inlet section and the outlet section are cylindrical. The diameter of the inlet section is larger than that of the outlet section. The transition section is in the shape of a frustum cylinder. The inlet section, the transition section, and the outlet section are coaxial. The transition section is provided between the inlet section and the outlet section. Taking the orientation of the outlet section relative to the inlet section as the left, the diameter of the left end of the transition section is equal to that of the outlet section, and the diameter of the right end of the transition section is equal to that of the inlet section. A plurality of liquid discharge ports are provided on the barrel wall of the outlet section. The cleaning tank is provided below the left of the outlet section. The cleaning tank is provided with a feeding port. The slideway is provided between the cleaning tank and the polishing cylinder. The slideway is inclined downward. The top end of the slideway is provided at the bottom of the left end of the outlet section, and the bottom end of the slideway is provided on the feeding port.

[0005] The copper ball polishing production line according to the embodiments of the present invention has at least the following technical effects: When in use, the copper balls to be polished and the polishing liquid are placed together in the inlet section. The polishing cylinder is rotated to make the polishing liquid wash the copper balls for polishing. After polishing, the copper balls can be conveyed from the inlet section to the outlet section through an externally provided spiral conveyor roller or other devices. The copper balls are sent out from the outlet section and then reach the cleaning tank through the slideway. The transition section is in the shape of a frustum cylinder, which can guide the copper balls to transition from the inlet section to the outlet section and gradually gather the copper balls at the same time. By setting the diameter of the inlet section to be larger than that of the outlet section, most of the polishing liquid will remain in the inlet section and will not flow into the cleaning tank. A small part of the polishing liquid moves to the outlet section along with the copper balls and then flows out from the liquid discharge port, and will not flow into the cleaning tank either. Only the polishing liquid attached to the copper balls can enter the cleaning tank, so the burden of the cleaning process is relatively light and the efficiency of the cleaning process is relatively high.

[0006] According to some embodiments of the present invention, the polishing unit further includes a driving mechanism. The driving mechanism includes a bracket, a power assembly, and a supporting assembly. The power assembly includes an annular rack and a motor. The annular rack is sleeved outside the inlet section and fixedly connected to the inlet section. The motor is arranged on the bracket, and a gear is arranged on the rotating shaft of the motor. The gear meshes with the annular rack. The supporting assembly includes two supporting structures. The two supporting structures are arranged at intervals left and right. The supporting structure includes an annular track and two rollers. The annular track is sleeved outside the inlet section and fixedly connected to the inlet section. The two rollers are both arranged on the bracket, and the two rollers are both in contact with the outer peripheral surface of the annular track. The two rollers are respectively arranged at the front lower side and the rear lower side of the annular track. The structure is simple, and the polishing cylinder can be lifted as a whole, which is convenient for the maintenance of the polishing unit.

[0007] According to some embodiments of the present invention, the supporting structure further includes a second retaining ring. The second retaining ring is coaxial with the annular track. The outer diameter of the second retaining ring is larger than that of the annular track. The second retaining ring is fixedly arranged beside the annular track. The two second retaining rings are both arranged between the two annular tracks, or the two annular tracks are both arranged between the two second retaining rings. This can prevent the polishing cylinder from derailing.

[0008] According to some embodiments of the present invention, the polishing device includes two such polishing units. The two polishing units are arranged at intervals front and rear. In the production process of phosphor copper balls, for the same number of phosphor copper balls, the time required for the cleaning process is shorter than that for the polishing process. Therefore, in order to make full use of the production capacity of the cleaning tank, two polishing units are set to share one cleaning tank. In actual use, the two polishing units can be controlled to alternately convey the phosphor copper balls to the cleaning tank.

[0009] According to some embodiments of the present invention, at least one second spiral blade is provided in the transition section. The second spiral blade is fixed to the inner wall of the transition section and extends from the left end to the right end of the transition section. When the polishing cylinder rotates, the second spiral blade can convey the copper balls from the inlet section to the outlet section without the need to provide an additional conveying device for conveying the copper balls, and the structure is simple.

[0010] According to some embodiments of the present invention, a plurality of first spiral blades connected to the inner wall of the outlet section are provided in the outlet section. All the first spiral blades are evenly spaced along the circumferential direction of the outlet section, and the spiral direction of the first spiral blade is the same as that of the second spiral blade; the copper ball polishing production line further includes a plurality of copper ball output units, and each copper ball output unit includes a copper ball channel and a liquid discharge port. The copper ball channel is defined by two adjacent first spiral blades; the liquid discharge port is in the shape of a waist-shaped groove, is opened on the wall of the outlet section, and is located at the copper ball channel. The extending direction of the liquid discharge port is the same as the extending direction of the copper ball channel. When the polishing cylinder rotates, after the second spiral blade conveys the copper balls to the outlet section, the copper balls can move from right to left along the copper ball channel to prevent the copper balls from falling back into the inlet section; the liquid discharge port is in the shape of a waist-shaped groove, so the flow area of the liquid discharge port is relatively large, and the polishing liquid can be fully discharged when the copper balls pass through the copper ball channel.

[0011] According to some embodiments of the present invention, two second spiral blades are provided in the transition section, and the two second spiral blades are centrosymmetric. In this way, the efficiency of conveying copper balls is higher, and the overall structure of the polishing cylinder is centrosymmetric, so the polishing cylinder rotates more smoothly.

[0012] According to some embodiments of the present invention, a ridge is provided in the inlet section. The ridge is fixed to the inner wall of the inlet section and extends from the right end to the left end of the inlet section. The extending direction of the ridge is the same as the spiral direction of the second spiral blade. When the polishing cylinder rotates, the copper balls will move along the ridge to the left end of the inlet section, that is, the right end of the second spiral blade, and then move to the outlet section through the second spiral blade, preventing the copper balls from rolling in the inlet section all the time and being unable to move to the outlet section.

[0013] According to some embodiments of the present invention, the ridge is in the shape of a triangular prism, and one side of the ridge is in close contact with the inner wall of the inlet section. The copper balls can stay in the inlet section for enough time for polishing without staying in the inlet section forever.

[0014] According to some embodiments of the present invention, a first retaining ring is provided at the right end of the inlet section. The first retaining ring is coaxial with the inlet section, and the inner diameter of the first retaining ring is smaller than the diameter of the inlet section. When the copper balls are polished in the inlet section, they will not fall out from the right end of the inlet section.

[0015] Additional aspects and advantages of the present invention will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The above and / or additional aspects and advantages of the present invention will become apparent and be readily understood from the following description of embodiments in conjunction with the accompanying drawings, in which:

[0017] Figure 1 is a front view of the structure of the copper ball polishing production line according to an embodiment of the present invention;

[0018] Figure 2 is a top view of the structure of the copper ball polishing production line according to an embodiment of the present invention;

[0019] Figure 3 is Figure 1 a front view of the structure of the polishing cylinder in

[0020] Figure 4 is Figure 1 a right view of the structure of the polishing cylinder in

[0021] Reference numerals:

[0022] Polishing cylinder 100, outlet section 110, drain port 111, first spiral blade 112, transition section 120, second spiral blade 121, inlet section 130, ridge 131, first retaining ring 140, slideway 190, cleaning tank 200, roller 311, annular track 312, second retaining ring 313, gear 321, annular rack 322, motor 323. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0023] Embodiments of the present invention will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, where the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0024] In the description of the present invention, it should be understood that for the orientation description, such as the orientation or positional relationship indicated by up, down, front, back, left, right, etc., it is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present invention. In addition, the meaning of several is one or more, the meaning of multiple is more than two, greater than, less than, exceeding, etc. are understood as not including the original number, and above, below, within, etc. are understood as including the original number. If the first and second are described only for the purpose of distinguishing technical features, they should not be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features or implicitly indicating the sequence relationship of the indicated technical features.

[0025] In the description of the present invention, unless otherwise clearly defined, words such as setting, installing, connecting, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in the present invention in combination with the specific content of the technical solution.

[0026] Next, refer to Figures 1 to 4 to describe the copper ball polishing production line according to an embodiment of the present invention.

[0027] The copper ball polishing production line according to an embodiment of the present invention includes a polishing device and a cleaning tank 200. The polishing device includes at least one polishing unit. The polishing unit includes a polishing cylinder 100 and a slideway 190. The polishing cylinder 100 has an inlet section 130, a transition section 120, and an outlet section 110. Both the inlet section 130 and the outlet section 110 are cylindrical. The diameter of the inlet section 130 is larger than the diameter of the outlet section 110. The transition section 120 is in the shape of a frustum cylinder. The inlet section 130, the transition section 120, and the outlet section 110 are coaxial. The transition section 120 is provided between the inlet section 130 and the outlet section 110. Taking the orientation of the outlet section 110 relative to the inlet section 130 as the left, the diameter of the left end of the transition section 120 is equal to the diameter of the outlet section 110, and the diameter of the right end of the transition section 120 is equal to the diameter of the inlet section 130. A plurality of liquid discharge ports 111 are provided on the cylinder wall of the outlet section 110. The cleaning tank 200 is provided below the left of the outlet section 110. The cleaning tank 200 is provided with a feeding port. The slideway 190 is provided between the cleaning tank 200 and the polishing cylinder 100. The slideway 190 is inclined downward. The top end of the slideway 190 is provided at the bottom of the left end of the outlet section 110, and the bottom end of the slideway 190 is provided on the feeding port.

[0028] For example, as Figure 1As shown, the inlet section 130 and the transition section 120 can be fixedly connected by welding, and the transition section 120 and the outlet section 110 can be fixedly connected by welding. Of course, the inlet section 130, the transition section 120, and the outlet section 110 can also be integrally formed members and can be formed by casting; the liquid discharge port 111 on the outlet section 110 can be a round hole penetrating the cylinder wall, or can be a square hole, a waist-shaped groove, or other shapes; in addition, an external spiral conveying roller can be provided to convey the copper balls from the inlet section 130 to the outlet section 110, or spiral blades can be provided on the cylinder wall of the transition section 120; the cleaning tank 200 can be a tank body with an open top, and its open top is the feeding port, or the cleaning tank 200 can be a closed tank body with only a feeding port opened on its tank wall; similarly, the slideway 190 can be a chute with an open top or a pipeline, and the slideway 190 can be fixedly connected to the cleaning tank 200 or can be installed on an external support frame, as long as it can convey the copper balls into the cleaning tank 200.

[0029] During use, the copper balls to be polished and the polishing liquid are placed together in the inlet section 130, and the polishing cylinder 100 is rotated to wash the copper balls with the polishing liquid for polishing. After polishing, the copper balls can be conveyed from the inlet section 130 to the outlet section 110 through an external spiral conveying roller or other devices, and the copper balls are sent out from the outlet section 110 and then reach the cleaning tank 200 through the slideway 190; the transition section 120 is in the shape of a frustum cylinder, which can guide the copper balls to transition from the inlet section 130 to the outlet section 110 and gradually gather the copper balls at the same time; by setting the diameter of the inlet section 130 to be larger than the diameter of the outlet section 110, most of the polishing liquid will remain in the inlet section 130 and will not flow into the cleaning tank 200; a small part of the polishing liquid moves to the outlet section 110 along with the copper balls and then flows out from the liquid discharge port 111, and will not flow into the cleaning tank 200 either; only the polishing liquid attached to the copper balls can enter the cleaning tank 200, so the burden of the cleaning process is lighter and the efficiency of the cleaning process is higher; in actual use, a collection tank can be provided below the outlet section 110 to collect the polishing liquid discharged from the liquid discharge port 111.

[0030] According to some embodiments of the present invention, the polishing unit further includes a driving mechanism, which includes a bracket, a power assembly and a support assembly. The power assembly includes an annular rack 322 and a motor 323. The annular rack 322 is sleeved outside the inlet section 130 and fixedly connected to the inlet section 130. The motor 323 is arranged on the bracket. A gear 321 is arranged on the rotating shaft of the motor 323, and the gear 321 meshes with the annular rack 322. The support assembly includes two support structures, which are arranged at intervals left and right. Each support structure includes an annular track 312 and two rollers 311. The annular track 312 is sleeved outside the inlet section 130 and fixedly connected to the inlet section 130. The two rollers 311 are both arranged on the bracket, and the two rollers 311 are both in contact with the outer peripheral surface of the annular track 312. The two rollers 311 are respectively arranged at the front lower side and the rear lower side of the annular track 312. By providing the annular track 312 and the rollers 311, the polishing cylinder 100 can rotate on the bracket. By providing the annular rack 322 and the gear 321, when the motor 323 rotates, the gear 321 rotates, driving the annular rack 322 to rotate, and then the polishing cylinder 100 rotates. The structure is simple, and the polishing cylinder 100 can be lifted as a whole, which is convenient for the maintenance of the polishing unit. The tooth surface of the annular rack 322 can be arranged on the outer periphery of the annular rack 322. The annular track 312 can be an integrally formed member with the inlet section 130, or can be an independent member welded to the inlet section 130. The two annular tracks 312 are respectively arranged at the left end and the right end of the inlet section 130. The distance between the two annular tracks 312 is relatively large, and the operation of the polishing cylinder 100 is more stable and not easy to flip left and right. The two rollers 311 are respectively arranged at the front lower side and the rear lower side of the annular track 312. The center of gravity of the polishing cylinder 100 is above the area between the two rollers 311, and the polishing cylinder 100 can be stably placed on the rollers 311. The rollers 311 can be bearings, so the structure is simple. The rollers 311 can also be rubber wheels, so that the vibration is smaller when the polishing cylinder 100 rotates and the operation of the polishing cylinder 100 is more stable.

[0031] According to some embodiments of the present invention, the support structure further includes a second retaining ring 313. The second retaining ring 313 is coaxial with the annular track 312. The outer diameter of the second retaining ring 313 is greater than the outer diameter of the annular track 312. The second retaining ring 313 is fixedly provided beside the annular track 312. Two of the second retaining rings 313 may be both disposed between the two annular tracks 312, or the two annular tracks 312 may be both disposed between the two second retaining rings 313. During the rotation of the polishing cylinder 100, it may move left and right, resulting in derailment. By providing two second retaining rings 313, when the polishing cylinder 100 moves left or right, one of the second retaining rings 313 will touch the corresponding roller 311, achieving the purpose of preventing the polishing cylinder 100 from derailing. The second retaining ring 313 may be in close contact with the corresponding annular track 312, or there may be a certain gap between the second retaining ring 313 and the corresponding annular track 312, and the width of the gap is less than the width of the roller 311.

[0032] According to some embodiments of the present invention, referring to Figure 2 , the polishing device includes two of the polishing units, and the two polishing units are arranged at intervals in the front and rear directions. In the production process of phosphor copper balls, for the same number of phosphor copper balls, the time required for the cleaning process is shorter than that of the polishing process. Therefore, in order to make full use of the production capacity of the cleaning tank 200, two polishing units are provided to share one cleaning tank 200. During actual use, the two polishing units can be controlled to alternately convey the phosphor copper balls to the cleaning tank 200.

[0033] In some embodiments of the present invention, at least one second spiral blade 121 is provided in the transition section 120. The second spiral blade 121 is fixedly provided on the inner wall of the transition section 120, and the second spiral blade 121 extends from the left end of the transition section 120 to the right end of the transition section 120. The second spiral blade 121 may be made of stainless steel and welded and fixed to the inner wall of the transition section 120. The second spiral blade 121 spirally extends from the right end of the transition section 120 along the inner wall of the transition section 120 to the left end of the transition section 120. When the polishing cylinder 100 rotates, the second spiral blade can convey the copper balls from the inlet section 130 to the outlet section 110 without the need to provide an additional conveying device to convey the copper balls, and the structure is simple. When the polishing cylinder 100 rotates in the reverse direction, the copper balls can be continuously polished in the inlet section 130 without moving to the outlet section 110.

[0034] In some embodiments of the present invention, the outlet section 110 is provided with a plurality of first spiral blades 112 connected to the inner wall of the outlet section 110, all of the first spiral blades 112 are evenly spaced along the circumference of the outlet section 110, and the rotation direction of the first spiral blades 112 is the same as the rotation direction of the second spiral blades 121; the copper ball polishing production line also includes a plurality of copper ball output units, each of which includes a copper ball channel and a drain port 111, and the copper ball channel is defined by two adjacent first spiral blades 112; the drain port 111 is in the shape of a waist-shaped groove, opened from the wall of the outlet section 110, and located at the copper ball channel, and the extension direction of the drain port 111 is the same as the extension direction of the copper ball channel. The first spiral blade 112 can be welded and fixed on the inner wall of the outlet section 110, and the drain port 111 is arranged between two adjacent first spiral blades 112. By setting the drain port 111 to be a waist-shaped groove, the flow area of ​​the drain port 111 is larger, and the polishing liquid can be fully discharged when the copper ball passes through the copper ball channel; by setting the rotation direction of the first spiral blade 112 to be the same as the rotation direction of the second spiral blade 121, when the polishing cylinder 100 rotates, after the second spiral blade 121 transports the copper ball to the outlet section 110, the copper ball can move from right to left along the copper ball channel to prevent the copper ball from falling back to the inlet section 130.

[0035] In some embodiments of the present invention, two second spiral blades 121 are provided in the transition section 120, and the two second spiral blades 121 are symmetrical to each other. This makes the copper ball conveying more efficient, and makes the overall structure of the polishing cylinder 100 symmetrical to each other, so that the polishing cylinder 100 rotates more smoothly.

[0036] In some embodiments of the present invention, a ridge 131 is provided in the inlet section 130, and the ridge 131 is fixed to the inner wall of the inlet section 130. The ridge 131 extends from the right end of the inlet section 130 to the left end of the inlet section 130, and the extension direction of the ridge 131 is consistent with the rotation direction of the second spiral blade 121. In this way, when the polishing cylinder 100 rotates, the copper ball will move along the ridge 131 to the left end of the inlet section 130, that is, the right end of the second spiral blade 121, and then move to the outlet section 110 through the second spiral blade 121, so as to prevent the copper ball from rolling in the inlet section 130 and unable to move to the outlet section 110; Figure 3 and Figure 4 As shown, when the second spiral blade 121 is right-handed and the ridge 131 is disposed on the rear side of the inlet section 130, the ridge 131 can be disposed to be inclined upward from right to left; in addition, when the second spiral blade 121 is left-handed and the ridge 131 is disposed on the rear side of the inlet section 130, the ridge 131 can be disposed to be inclined downward from right to left; the cross-sectional shape of the ridge 131 can be circular, triangular, rectangular or other shapes, as long as the ridge 131 can guide the copper ball to the right end of the second spiral blade 121.

[0037] In some embodiments of the present invention, the ridge 131 is in the shape of a triangular prism, and one side surface of the ridge 131 is in close contact with the inner wall of the inlet section 130. When the polishing cylinder 100 rotates, the copper balls collide with the side surface of the ridge 131. Some of the copper balls will move along the ridge 131 to the left end of the inlet section 130, and some of the copper balls will cross the ridge 131 along the circumferential direction of the inlet section 130 and continue to be polished within the inlet section 130, rather than all the copper balls moving to the left end of the inlet section 130; enabling the copper balls to stay in the inlet section 130 for a sufficient time for polishing without staying in the inlet section 130 forever. The slower the polishing cylinder 100 rotates, the more copper balls will move to the left end of the inlet section 130. The polishing time of the copper balls can be controlled by adjusting the rotation speed of the polishing cylinder 100; the ridge 131 can be formed by bending a stainless steel angle bar and welding it to the inner wall of the inlet section 130.

[0038] In some embodiments of the present invention, a first retaining ring 140 is provided at the right end of the inlet section 130. The first retaining ring 140 is coaxial with the inlet section 130, and the inner diameter of the first retaining ring 140 is smaller than the diameter of the inlet section 130. The outer diameter of the first retaining ring 140 can be the same as the diameter of the inlet section 130, and the first retaining ring 140 can be welded to the right end of the inlet section 130; in this way, when the copper balls are polished within the inlet section 130, they will not fall out from the right end of the inlet section 130.

[0039] The above has specifically described the preferred embodiments of the present invention, but the present invention is not limited to the embodiments. Those skilled in the art can also make various equivalent variations or substitutions without departing from the spirit of the present invention, and these equivalent variations or substitutions are all included within the scope defined by the claims of this application.

Claims

1. A copper ball polishing production line, characterized in that, Comprising: A polishing device, including at least one polishing unit. The polishing unit includes a polishing cylinder and a slideway. The polishing cylinder has an inlet section, a transition section, and an outlet section. The inlet section and the outlet section are both cylindrical. The diameter of the inlet section is larger than that of the outlet section. The transition section is in the shape of a frustum cylinder. The inlet section, the transition section, and the outlet section are coaxial. The transition section is provided between the inlet section and the outlet section. Taking the orientation of the outlet section relative to the inlet section as the left, the diameter of the left end of the transition section is equal to the diameter of the outlet section, and the diameter of the right end of the transition section is equal to the diameter of the inlet section. A plurality of liquid discharge ports are provided on the barrel wall of the outlet section; A cleaning tank, which is provided below the left of the outlet section. The cleaning tank is provided with a feeding port. The slideway is provided between the cleaning tank and the polishing cylinder. The slideway is inclined downward. The top end of the slideway is provided at the bottom of the left end of the outlet section, and the bottom end of the slideway is provided on the feeding port; At least one second spiral blade is provided in the transition section. The second spiral blade is fixedly arranged on the inner wall of the transition section. The second spiral blade extends from the left end of the transition section to the right end of the transition section. The second spiral blade spirally extends from the right end of the transition section along the inner wall of the transition section to the left end of the transition section, so that when the polishing cylinder rotates, the second spiral blade can convey the copper balls from the inlet section to the outlet section; A plurality of first spiral blades connected to the inner wall of the outlet section are provided in the outlet section. All the first spiral blades are evenly spaced along the circumferential direction of the outlet section. The spiral direction of the first spiral blade is the same as that of the second spiral blade; The copper ball polishing production line further includes a plurality of copper ball output units. Each copper ball output unit includes: A copper ball channel, which is defined by two adjacent first spiral blades; A liquid discharge port, which is in the shape of a waist-shaped groove, is opened on the wall of the outlet section and is located at the copper ball channel. The extending direction of the liquid discharge port is the same as the extending direction of the copper ball channel; A ridge is provided in the inlet section. The ridge is fixedly arranged on the inner wall of the inlet section. The ridge extends from the right end of the inlet section to the left end of the inlet section. The extending direction of the ridge is consistent with the spiral direction of the second spiral blade.

2. The copper ball polishing production line according to claim 1, characterized in that: The polishing unit further includes a driving mechanism. The driving mechanism includes: A bracket; A power assembly, including an annular rack and a motor. The annular rack is sleeved outside the inlet section and is fixedly connected to the inlet section. The motor is arranged on the bracket. A gear is provided on the rotating shaft of the motor. The gear meshes with the annular rack; A supporting assembly, including two supporting structures. The two supporting structures are arranged at intervals left and right. The supporting structure includes an annular track and two rollers. The annular track is sleeved outside the inlet section and is fixedly connected to the inlet section. The two rollers are both arranged on the bracket. The two rollers are both in contact with the outer peripheral surface of the annular track. The two rollers are respectively arranged on the front lower side and the rear lower side of the annular track.

3. The copper ball polishing production line according to claim 2, wherein: The support structure further includes a second retaining ring. The second retaining ring is coaxial with the annular track. The outer diameter of the second retaining ring is greater than the outer diameter of the annular track. The second retaining ring is fixedly arranged beside the annular track. Both of the two second retaining rings are arranged between the two annular tracks, or both of the two annular tracks are arranged between the two second retaining rings.

4. The copper ball polishing production line according to any one of claims 1 to 3, characterized in that: The polishing device includes two of the polishing units, and the two polishing units are arranged at intervals in the front and rear directions.

5. The copper ball polishing production line according to claim 1, characterized in that: Two second spiral blades are arranged in the transition section, and the two second spiral blades are centrosymmetric.

6. The copper ball polishing production line according to claim 1, wherein: The ridge is in the shape of a triangular prism, and one side surface of the ridge is in close contact with the inner wall of the inlet section.

7. The copper ball polishing production line according to claim 1, characterized in that: A first retaining ring is arranged at the right end of the inlet section. The first retaining ring is coaxial with the inlet section, and the inner diameter of the first retaining ring is smaller than the diameter of the inlet section.

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