A cathode structure, electrochemical polishing tank and electrochemical polishing equipment

Abstract

The present invention provides a cathode structure, an electrochemical polishing tank and an electrochemical polishing device, wherein the cathode structure includes at least one first cathode part and at least one second cathode part, wherein the first cathode part is connected to the second cathode part, and the first cathode part and the second cathode part are used to polish the surface of a workpiece. The electrochemical polishing tank includes the above-mentioned cathode structure, and the electrochemical polishing device includes the above-mentioned electrochemical polishing tank. The present invention can achieve a good polishing effect on both the inner and outer surfaces of the workpiece to improve the appearance quality of the inner and outer surfaces of the workpiece. In addition, the combined structural cathode structure provided by the present invention can finely adjust the distance between the workpiece and the cathode structure compared to the traditional single structural cathode structure, so that the workpiece with a complex structure can achieve a better polishing effect.

Description

Technical Field

[0001] The present invention relates to the technical field of electrochemical polishing, and in particular to a cathode structure, an electrochemical polishing tank and an electrochemical polishing device. Background Art

[0002] Medical metal stents can be made of metals such as stainless steel, titanium alloy, nickel-titanium alloy, cobalt-chromium alloy, etc., and are prepared by laser cutting or weaving. Medical metal stents are mainly used in tissue cavities or blood vessel cavities in the body to treat various diseases in tissue cavities or blood vessel cavities. After the preliminary processing of medical metal stents, there will generally be residual slag, burrs and oxide film on the surface. The metal stent must be pretreated first, and the pretreatment includes grinding or pickling. Electrochemical polishing can improve the biocompatibility and corrosion resistance of metal stents, so that the application performance of metal stents is improved.

[0003] Electrochemical polishing is a process in which the workpiece to be polished is used as the anode and the inactive metal is used as the cathode. Both electrodes are immersed in an electrolytic cell at the same time. At a certain temperature, voltage and current density, direct current is connected for a certain period of time to produce selective anodic dissolution. The tiny protrusions on the surface of the workpiece are dissolved first, and gradually become a smooth and bright surface, thereby achieving the effect of increasing the surface finish of the workpiece. Electrochemical polishing is an electrochemical dissolution process without the action of mechanical force, so it will not cause surface deformation of the metal, avoids the deformation layer produced on the surface of the sample during mechanical polishing, and truly displays the metallographic structure. Moreover, electrochemical polishing has low requirements on the degree of sample polishing, fast polishing speed and high efficiency.

[0004] The cathode of the existing electrochemical polishing device adopts a single rod-shaped, sheet-shaped or cylindrical structure. During the electrochemical polishing process, the polishing effect of the inner surface of the bracket is not good, and it is easy to cause uneven polishing of the complex workpiece located at the anode, affecting the appearance quality of the workpiece. At the same time, the distance between the complex workpiece located at the anode and the cathode is difficult to fine-tune, which easily leads to problems such as excessive polishing or low polishing efficiency. Summary of the invention

[0005] The object of the present invention is to provide a cathode structure, an electrochemical polishing tank and an electrochemical polishing device, which can achieve good polishing effects on both the inner and outer surfaces of a workpiece to improve the appearance quality of the inner and outer surfaces of the workpiece.

[0006] To achieve the above object, the present invention provides a cathode structure, including at least one first cathode part and at least one second cathode part, the first cathode part is connected to the second cathode part, and the first cathode part and the second cathode part are used to polish the surface of a workpiece.

[0007] Optionally, the second cathode portion is located inside the first cathode portion, and an accommodating space is formed between the first cathode portion and the second cathode portion.

[0008] Optionally, when the workpiece to be polished is placed in the accommodating space, the distance between the inner surface of the first cathode portion and the outer surface of the workpiece to be polished is equal everywhere.

[0009] Optionally, the first cathode portion is an annular structure, a constant diameter cylindrical structure or a variable diameter cylindrical structure.

[0010] Optionally, when the workpiece to be polished is placed in the accommodating space, the distance between the outer surface of the second cathode portion and the inner surface of the workpiece to be polished is equal everywhere.

[0011] Optionally, the second cathode portion is a ring-shaped structure, a rod-shaped structure with a constant diameter, or a rod-shaped structure with a variable diameter.

[0012] Optionally, the first cathode part and the second cathode part are detachably connected.

[0013] Optionally, the second cathode portion is movable relative to the first cathode portion.

[0014] Optionally, the first cathode portion and the second cathode portion are detachably connected via a first connecting member, one end of the first connecting member is connected to the second cathode portion, and the other end of the first connecting member is detachably connected to the first cathode portion.

[0015] Optionally, a second connecting member is connected to the first cathode portion, and the cathode structure is connected to the negative electrode of a power source through the second connecting member.

[0016] In order to achieve the above-mentioned purpose, the present invention also provides an electrochemical polishing tank, comprising a tank body and a cathode structure as described in any one of the above items, wherein the cathode structure is located inside the tank body.

[0017] Optionally, the electrochemical polishing tank further includes an anode structure for fixing the workpiece to be polished, and the anode structure is located inside the tank body.

[0018] Optionally, the anode structure includes a first anode portion and a second anode portion connected to each other, and a clamping space capable of clamping at least a portion of the workpiece to be polished is formed between the first anode portion and the second anode portion.

[0019] Optionally, a pair of oppositely arranged sleeves are sleeved on the anode structure, and the sleeves are movable relative to the anode structure.

[0020] To achieve the above objectives, the present invention also provides an electrochemical polishing device, comprising a power supply and an electrochemical polishing tank as described above, wherein the negative pole of the power supply is used to be connected to the cathode structure, and the positive pole of the power supply is used to be connected to the workpiece to be polished.

[0021] Compared with the prior art, the cathode structure, electrochemical polishing tank and electrochemical polishing equipment provided by the present invention have the following advantages:

[0022] (1) The cathode structure provided by the present invention is changed from a traditional single structure to a combined structure including at least one first cathode part and at least one second cathode part, and the first cathode part and the second cathode part are used to polish the surface of the workpiece, so that during the electrochemical polishing process, both the inner and outer surfaces of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece. In addition, compared with the traditional single-structure cathode structure, the combined structure cathode structure provided by the present invention can finely adjust the distance between the workpiece and the cathode structure, so that the workpiece with a complex structure can achieve a better polishing effect.

[0023] (2) The electrochemical polishing tank provided by the present invention has a combined structural cathode structure consisting of at least one first cathode part and at least one second cathode part, and the first cathode part and the second cathode part are used to polish the surface of the workpiece. Therefore, during the electrochemical polishing process of the workpiece, both the inner surface and the outer surface of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece.

[0024] (3) The electrochemical polishing equipment provided by the present invention has a cathode structure of a combined structure consisting of at least one first cathode part and at least one second cathode part, and the first cathode part and the second cathode part are used to polish the surface of the workpiece. Therefore, during the electrochemical polishing process of the workpiece, both the inner surface and the outer surface of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 is a schematic diagram of a cathode structure in one embodiment of the present invention;

[0026] Figure 2 A front view of a cathode structure and a workpiece to be polished in cooperation with each other in one embodiment of the present invention;

[0027] Figure 3 A top view of a cathode structure and a workpiece to be polished in cooperation with each other in one embodiment of the present invention;

[0028] Figure 4 Schematic diagram of the structure of an electrochemical polishing tank in one embodiment of the present invention;

[0029] Figure 5 is a schematic structural diagram of an anode structure in one embodiment of the present invention;

[0030] Figure 6A schematic structural diagram of the connection relationship between the anode structure and the workpiece to be polished in one embodiment of the present invention;

[0031] Figure 7 It is a schematic structural diagram of an electrochemical polishing device according to one embodiment of the present invention.

[0032] The reference numerals are as follows:

[0033] Cathode structure-100; first cathode part-110; second cathode part-120; workpiece to be polished-200; first connecting piece-130; second connecting piece-140; first metal ring-111; third connecting piece-112; second metal ring-121; fourth connecting piece-122; electrochemical polishing tank-300; tank body-310; anode structure-320; first anode part-321; second anode part-322; sleeve-330; power supply-400; cathode wire-410; anode wire-420; temperature control device-500; first liquid inlet-510; first liquid outlet-520; second liquid inlet-311; second liquid outlet-312; stirring device-600. DETAILED DESCRIPTION

[0034] The following is combined with Figures 1 to 7 The specific implementation methods of a cathode structure, an electrochemical polishing tank and an electrochemical polishing device proposed in the present invention are further described in detail. According to the following description and claims, the advantages and features of the present invention will become clearer. In order to make the purposes, features and advantages of the present invention more obvious and easy to understand, please refer to the accompanying drawings. It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings attached to this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present invention, so they have no technical substantive significance. Any modification of the structure, change in the proportional relationship or adjustment of the size should still fall within the scope of the technical content disclosed in the present invention without affecting the effects that the present invention can produce and the purposes that can be achieved.

[0035] The core idea of ​​the present invention is to provide a cathode structure, an electrochemical polishing tank and an electrochemical polishing device, which can achieve good polishing effects on both the inner and outer surfaces of the workpiece to improve the appearance quality of the inner and outer surfaces of the workpiece.

[0036] To realize the above idea, the present invention provides a cathode structure, please refer to Figure 1 and Figure 2 ,in Figure 1 The cathode structure of one embodiment of the present invention is schematically shown. Figure 2The schematic diagram of the structure of the cathode structure of one embodiment of the present invention and the workpiece to be polished when they cooperate with each other is shown schematically. The cathode structure 100 includes at least one first cathode part 110 and at least one second cathode part 120. The first cathode part 110 is connected to the second cathode part 120. Figure 1 and Figure 2 As shown, in this embodiment, the cathode structure 100 includes a first cathode portion 110 and a second cathode portion 120. In actual application, the number of the first cathode portions 110 and the number of the second cathode portions 120 can be set according to the specific shape of the workpiece to be polished. When the cathode structure 100 includes at least two first cathode portions 110 and at least two second cathode portions 120, each of the first cathode portions 110 can be connected in sequence, and each of the second cathode portions 120 can be connected in sequence, and one first cathode portion 110 is connected to one second cathode portion 120.

[0037] Optionally, a plurality of cathode portions are respectively arranged to approach the to-be-polished portion of the workpiece to be polished, such as the surface of the workpiece to be polished, so as to polish the surface of the workpiece, and preferably, the distance between each cathode portion and the surface of the workpiece to be polished is set to be equidistant, or optionally, the distance between some cathode portions and the outer surface of the workpiece to be polished is set to be equidistant, and the distance between other cathode portions and the inner surface of the workpiece to be polished is set to be equidistant, so that the polishing speed of the surface of the workpiece to be polished is substantially consistent, thereby achieving uniform polishing of the workpiece surface. For example, in this embodiment, the distance between the first cathode portion 110 and the outer surface of the workpiece to be polished is set to be equidistant, and the distance between the second cathode portion 120 and the inner surface of the workpiece to be polished is set to be equidistant.

[0038] Optionally, the second cathode portion 120 is located inside the first cathode portion 110, and a receiving space for placing the workpiece 200 to be polished can be formed between the first cathode portion 110 and the second cathode portion 120. The workpiece 200 to be polished can be a metal bracket made of nickel-titanium alloy, cobalt-chromium alloy, stainless steel alloy or titanium alloy. When the workpiece is placed in the receiving space between the first cathode portion 110 and the second cathode portion 120 for polishing, the first cathode portion 110 is located outside the workpiece 200 to be polished, and the second cathode portion 120 is located inside the workpiece 200 to be polished. As a result, during the electrochemical polishing process, both the inner and outer surfaces of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece. For example, when the workpiece 200 to be polished is a metal bracket, the metal bracket can obtain a smooth and bright metal surface, effectively improving the biocompatibility and corrosion resistance of the metal bracket.

[0039] Optionally, the material of the first cathode part 110 is the same as the material of the second cathode part 120. The material of the first cathode part 110 and the material of the second cathode part 120 need to be resistant to corrosion by the electrochemical polishing liquid and not react with the electrochemical polishing liquid. In addition, they need to have good electrical conductivity. The material can be brass, copper, stainless steel, titanium alloy or lead and other metal materials. The specific material can be selected according to the actual situation of the electrochemical polishing liquid and the workpiece 200 to be polished. The present invention does not limit the material of the first cathode part 110 and the second cathode part 120. Since titanium has good electrical conductivity, small pole distance change, strong corrosion resistance, good mechanical strength and processing performance, long life, low cost, and good electrocatalytic performance for electrode reaction, the material of the first cathode part 110 and the second cathode part 120 is preferably titanium alloy.

[0040] Please refer to Figure 2 and Figure 3 , Figure 3 A top view of the cathode structure 100 and the workpiece 200 to be polished in the present invention when they cooperate with each other is shown schematically. Figure 2 and Figure 3 As shown, when the workpiece 200 to be polished is placed in the accommodation space formed between the first cathode portion 110 and the second cathode portion 120, the distance between the inner surface of the first cathode portion 110 and the outer surface of the workpiece 200 to be polished is preferably equal everywhere. Since the distance between the outer surface of the workpiece and the inner surface of the first cathode portion 110 will affect the polishing speed of the outer surface of the workpiece, the closer the distance between the two is, the faster the polishing speed of the outer surface is, and the farther the distance between the two is, the slower the polishing speed of the outer surface is, thus, by setting the distance between the inner surface of the first cathode portion 110 and the outer surface of the workpiece 200 to be polished to be equidistant, it is possible to ensure that the polishing speed of the outer surface of the workpiece is substantially consistent, so as to achieve uniform polishing of the outer surface of the workpiece.

[0041] The first cathode portion 110 may be a ring-shaped structure, a constant diameter cylindrical structure, or a variable diameter cylindrical structure.

[0042] Among them, Figure 1As shown, when the first cathode portion 110 is an annular structure, the first cathode portion 110 may be composed of a plurality of first metal rings 111 that are coaxial and parallel to each other, and the plurality of first metal rings 111 may be sequentially connected through the same third connecting member 112, or each of two adjacent first metal rings 111 may be connected through a third connecting member 112. The plurality of first metal rings 111 may be formed by bending the same metal wire, in which case the third connecting member 112 and the plurality of first metal rings 111 are integrally formed; the plurality of first metal rings 111 may also be formed by bending each first metal ring 111 with a metal wire, in which case the third connecting member 112 and the plurality of first metal rings 111 may be connected by welding, and preferably, the material of the third connecting member 112 is the same as that of the first cathode portion 110.

[0043] In actual use, the number and inner diameter of the first metal rings 111 and the distance between any two adjacent first metal rings 111 can be specifically set according to the shape of the workpiece 200 to be polished.

[0044] Preferably, the shape of the first metal ring 111 is similar to the cross-sectional shape of the corresponding portion of the workpiece 200 to be polished. The shape of the first metal ring 111 may be a circular ring, or may be other annular structures other than a circular ring. For example, when the cross-sectional shape of a certain portion of the workpiece 200 to be polished is a circular ring, the shape of the first metal ring 111 corresponding to that portion on the first cathode portion 110 is also a circular ring; when the shape of the outer contour of the cross-section of a certain portion of the workpiece 200 to be polished is non-circular, the shape of the first metal ring 111 corresponding to that portion on the first cathode portion 110 is also non-circular. When the workpiece 200 to be polished is of the same diameter at the top and bottom, that is, the radial dimension of the workpiece 200 to be polished is constant along its axial direction, for example, when the workpiece 200 to be polished is cylindrical, the inner diameters of the plurality of first metal rings 111 are the same, that is, at this time, the annular structure is set to be equal in diameter; when the workpiece 200 to be polished is a variable diameter structure with non-equal diameters at the top and bottom, that is, the radial dimension of the workpiece 200 to be polished varies along the axial direction, at least two of the plurality of first metal rings 111 have different inner diameters, that is, the annular structure is set to be variable in diameter. Preferably, the distances between the inner surfaces of the first metal rings 111 and the outer surface of the workpiece 200 to be polished are equal.

[0045] When the workpiece 200 to be polished has the same diameter at the top and bottom, the first cathode part 110 may be a cylindrical structure with equal diameter, for example, a cylindrical structure. When the workpiece 200 to be polished has a variable diameter structure with non-equal diameters at the top and bottom, for example, when the radial dimension of the workpiece 200 to be polished gradually increases or decreases along its axial direction, that is, the radial dimension of the workpiece 200 to be polished changes regularly along its axial direction, then at this time, a first cathode part 110 with a variable diameter cylindrical structure whose radial dimension gradually increases or decreases along its axial direction can be selected, for example, the shape of the workpiece 200 to be polished can be roughly regarded as a cone, then at this time, the shape of the first cathode part 110 is also a cone. When the radial dimension of the workpiece 200 to be polished changes irregularly along its axial direction, then at this time, a first cathode part 110 with a variable diameter cylindrical structure whose radial dimension also changes irregularly along its axial direction can be selected. The shape of the first cathode part 110 is preferably similar to the shape of the workpiece 200 to be polished.

[0046] like Figure 3 As shown, the distance between the outer surface of the second cathode portion 120 and the inner surface of the workpiece to be polished 200 is preferably equal everywhere. Since the distance between the inner surface of the workpiece and the outer surface of the second cathode portion 120 affects the polishing speed of the outer surface of the workpiece, the closer the distance between the two is, the faster the polishing speed of the inner surface is, and the farther the distance between the two is, the slower the polishing speed of the inner surface is. Therefore, by setting the distance between the outer surface of the second cathode portion 120 and the inner surface of the workpiece to be polished 200 to be equidistant, it is possible to ensure that the polishing speed of the inner surface of the workpiece is substantially consistent, so as to achieve uniform polishing of the inner surface of the workpiece.

[0047] The second cathode portion 120 may be a ring-shaped structure, a rod-shaped structure with a constant diameter, or a rod-shaped structure with a variable diameter.

[0048] Among them, Figure 1 As shown, when the second cathode portion 120 is an annular structure, the second cathode portion 120 may be composed of a plurality of coaxial and mutually parallel second metal rings 121, and the plurality of second metal rings 121 may be sequentially connected through the same fourth connecting member 122, or each of two adjacent second metal rings 121 may be connected through a fourth connecting member 122. The plurality of second metal rings 121 may be formed by bending the same metal wire, in which case the fourth connecting member 122 and the plurality of second metal rings 121 are integrally formed; the plurality of second metal rings 121 may also be formed by bending each second metal ring 121 with a metal wire, in which case the fourth connecting member 122 and the plurality of second metal rings 121 may be connected by welding. Preferably, the material of the fourth connecting member 122 is the same as that of the second cathode portion 120.

[0049] In actual use, the number and outer diameter of the second metal rings 121 and the distance between any two adjacent second metal rings 121 can be specifically set according to the shape of the workpiece 200 to be polished.

[0050] Preferably, the shape of the second metal ring 121 is similar to the cross-sectional shape of the corresponding portion of the workpiece 200 to be polished. The shape of the second metal ring 121 may be a circular ring, or may be other annular structures other than a circular ring. For example, when the cross-sectional shape of a certain portion of the workpiece 200 to be polished is a circular ring, the shape of the second metal ring 121 corresponding to that portion on the second cathode portion 120 is also a circular ring; when the cross-sectional outer contour shape of a certain portion of the workpiece 200 to be polished is non-circular, the shape of the second metal ring 121 corresponding to that portion on the second cathode portion 120 is also non-circular. When the workpiece 200 to be polished is of the same diameter at the top and bottom, that is, the radial dimension of the workpiece 200 to be polished is constant along its axial direction, for example, when the workpiece 200 to be polished is cylindrical, the outer diameters of the plurality of second metal rings 121 are the same, that is, at this time, the annular structure is set to be equal in diameter; when the workpiece 200 to be polished is a variable diameter structure with non-equal diameters at the top and bottom, that is, the radial dimension of the workpiece 200 to be polished varies along the axial direction, at least two of the plurality of second metal rings 121 have different outer diameters, that is, the annular structure is set to be variable in diameter. Preferably, the distances between the outer surfaces of the respective second metal rings 121 and the inner surface of the workpiece 200 to be polished are equal.

[0051] When the workpiece 200 to be polished has the same diameter at the top and bottom, the second cathode portion 120 may be a rod-shaped structure with equal diameter, for example, a round rod-shaped structure. When the workpiece 200 to be polished has a variable diameter structure with unequal diameters at the top and bottom, for example, when the radial dimension of the workpiece 200 to be polished gradually increases or decreases along its axial direction, that is, the radial dimension of the workpiece 200 to be polished changes regularly along its axial direction, then at this time, a second cathode portion 120 with a variable diameter rod-shaped structure whose radial dimension gradually increases or decreases along its axial direction may be selected, for example, the shape of the workpiece 200 to be polished can be roughly regarded as a tapered rod, then at this time, the shape of the second cathode portion 120 is also a tapered rod. When the radial dimension of the workpiece 200 to be polished changes irregularly along its axial direction, then at this time, a second cathode portion 120 with a variable diameter rod-shaped structure whose radial dimension also changes irregularly along its axial direction may be selected. The shape of the second cathode portion 120 is preferably similar to the shape of the workpiece 200 to be polished.

[0052] Preferably, in order to save costs, the first cathode portion 110 and the second cathode portion 120 may be detachably connected. For example, the first cathode portion 110 and the second cathode portion 120 may be detachably connected by a buckle or an alligator clip. Specifically, the first cathode portion 110 and the second cathode portion 120 may be detachably connected by a first connector 130, one end of the first connector 130 is connected to the second cathode portion 120, and the other end is detachably connected to the first cathode portion 110. A buckle or an alligator clip may be provided at one end of the first connector 130 close to the first cathode portion 110, and the buckle or alligator clip may be fastened to the first cathode portion 110 or the alligator clip may be clipped to the first cathode portion 110 to achieve a buckle connection between the second cathode portion 120 and the first cathode portion 110. In addition, the detachable connection between the second cathode portion 120 and the first cathode portion 110 may also be achieved by wrapping one end of the first connector 130 close to the first cathode portion 110 around the first cathode portion 110.

[0053] Optionally, when the second cathode portion 120 is a ring-shaped structure formed by bending a same metal wire, the first connecting member 130 and the second cathode portion 120 may be integrally formed.

[0054] Preferably, the second cathode portion 120 can move relative to the first cathode portion 110, specifically, the second cathode portion 120 can reciprocate along its axial direction. Therefore, when the workpiece 200 to be polished is a complex structure whose radial dimension changes irregularly along its axial direction, the second cathode portion 120 can be set to a ring structure with multiple second metal rings 121, and the outer diameters of the second metal rings 121 are different. After polishing a certain position of the workpiece for a period of time, the second cathode portion 120 can be moved upward or downward so that the inner surface of the workpiece corresponds to the second metal rings 121 with different outer diameters for multiple polishing. Since the second cathode portion 120 is detachably connected to the first cathode portion 110, the second cathode portion 120 can be reciprocated along its axial direction.

[0055] Optionally, the first cathode portion 110 is connected to a second connector 140, and the cathode structure 100 can be connected to the negative electrode of the power source 400 through the second connector 140. Therefore, by providing the second connector 140 on the first cathode portion 110, it is easier to connect the cathode structure 100 to the negative electrode of the power source 400.

[0056] Optionally, when the first cathode portion 110 is a ring-shaped structure formed by bending a same metal wire, the second connecting member 140 and the first cathode portion 110 may be integrally formed.

[0057] In summary, the cathode structure 100 provided by the present invention is changed from a traditional single structure to a combined structure including at least one first cathode portion 110 and at least one second cathode portion 120, and the first cathode portion 110 and the second cathode portion 120 are used to polish the surface of the workpiece 200, so that during the electrochemical polishing process, both the inner and outer surfaces of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece. In addition, compared with the traditional single-structure cathode structure, the combined structure cathode structure provided by the present invention can finely adjust the distance between the workpiece and the cathode structure, so that the workpiece with a complex structure can achieve a better polishing effect.

[0058] Furthermore, the present invention also provides an electrochemical polishing tank 300, please refer to Figure 4 , schematically shows a schematic structural diagram of an electrochemical polishing tank 300 according to an embodiment of the present invention, as shown in FIG. Figure 4 As shown, the electrochemical polishing tank 300 includes a tank body 310 and the cathode structure 100 described above, and the cathode structure 100 is located inside the tank body 310 .

[0059] The tank body 310 can be used to store electrochemical polishing liquid. The tank body 310 can be a metal, ceramic or plastic container, for example, stainless steel, copper, brass, lead, fiberglass and polytetrafluoroethylene. The material of the tank body 310 must meet the following requirements: it cannot react with the stored electrochemical polishing liquid and can withstand the corresponding temperature during the electrochemical polishing process.

[0060] The electrochemical polishing liquid can be a highly versatile, low-toxic and low-pollution electrochemical polishing liquid. For example, the electrochemical polishing liquid can be made of perchloric acid and acetic acid in a certain concentration ratio. The concentration ratio of the mixed liquid in the electrochemical polishing liquid can be specifically set according to the material of the workpiece 200 to be polished.

[0061] Preferably, the electrochemical polishing tank 300 further includes an anode structure 320 for fixing the workpiece 200 to be polished, and the anode structure 320 is located inside the tank body 310. Therefore, by arranging the anode structure 320 in the electrochemical polishing tank 300, not only can the workpiece 200 to be polished be further fixed, but also the workpiece 200 to be polished can be connected to the positive electrode of the power supply 400 through the anode structure 320, and the anode structure 320 and the workpiece 200 to be polished together constitute the anode of the electrochemical polishing, so that the operation is more convenient.

[0062] Please refer to Figure 5 and Figure 6 ,in Figure 5The structural diagram of the anode structure in one embodiment of the present invention is schematically shown. Figure 6 A schematic diagram of the structure of the anode structure and the workpiece to be polished in cooperation with each other according to an embodiment of the present invention is shown schematically. Figure 5 and Figure 6 As shown, the anode structure 320 may include a first anode portion 321 and a second anode portion 322 connected to each other, and a clamping space capable of clamping at least a portion of the workpiece 200 to be polished is formed between the first anode portion 321 and the second anode portion 322. Thus, at least a portion of the workpiece 200 to be polished can be fixed in the clamping space by the first anode portion 321 and the second anode portion 322 that cooperate with each other, so that the anode structure 320 is connected to the workpiece 200 to be polished to form an anode. In addition, this arrangement can also effectively simplify the overall structure of the anode structure 320.

[0063] Preferably, the anode structure 320 can be formed by folding a metal wire in half, one section of the metal wire constitutes the first anode portion 321, and the other section of the metal wire constitutes the second anode portion 322. Therefore, by using a metal wire to make the anode structure 320, the processing steps of the anode structure 320 can be further simplified, effectively reducing the production cost. The material of the anode structure 320 can be brass, copper, stainless steel, titanium alloy or lead and other metals. The material of the anode structure 320 must be resistant to corrosion by the electrochemical polishing liquid and must not react with the electrochemical polishing liquid. In addition, it must have good electrical conductivity. For example, the anode structure 320 can be formed by folding a nickel-titanium wire in half.

[0064] In order to enable the anode structure 320 to firmly clamp the workpiece 200 to be polished, Figure 5 and Figure 6 As shown, a pair of sleeves 330 arranged opposite to each other may be sleeved on the anode structure 320, and the sleeves 330 can move relative to the anode structure 320, specifically, can reciprocate along the axial direction of the anode structure 320. Thus, after at least a portion of the workpiece 200 to be polished is clamped by the anode structure 320, the sleeves 330 are sleeved and moved along the axial direction of the anode structure 320, so that at least a portion of the workpiece 200 to be polished is firmly clamped between the two sleeves 330.

[0065] In summary, the electrochemical polishing tank 300 provided by the present invention has a cathode structure 100 of a combined structure composed of at least one first cathode part 110 and at least one second cathode part 120, and the first cathode part 110 and the second cathode part 120 are used to polish the surface of the workpiece 200. Therefore, during the electrochemical polishing process, both the inner and outer surfaces of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece.

[0066] Accordingly, the present invention also provides an electrochemical polishing device, please refer to Figure 7 , schematically shows an electrochemical polishing device according to an embodiment of the present invention, such as Figure 7 As shown, the electrochemical polishing equipment includes a power supply 400 and an electrochemical polishing tank 300 as described above, the negative pole of the power supply 400 is used to be connected to the cathode structure 100, and the positive pole of the power supply 400 is used to be connected to the workpiece 200 to be polished, and the power supply 400 can be a DC power supply 400.

[0067] The negative electrode of the power source 400 can be connected to the cathode structure 100 through the cathode wire 410. Optionally, the negative electrode of the power source 400 can be connected to the first cathode part 110 of the cathode structure 100 through the cathode wire 410. Optionally, the negative electrode of the power source 400 can be connected to the second connector 140 on the first cathode part 110 through the cathode wire 410. The positive electrode of the power source 400 can be connected to the workpiece 200 to be polished through the anode wire 420. Optionally, the positive electrode of the power source 400 can be connected to the anode structure 320 through the anode wire 420. Thus, a current loop can be formed between the cathode structure 100 and the workpiece 200 to be polished in this embodiment through the cathode wire 410 and the anode wire 420. Under the action of the current, the tiny protrusions on the inner and outer surfaces of the workpiece are continuously dissolved into the electrochemical polishing liquid, so that the inner and outer surfaces of the workpiece achieve a smooth and bright electrochemical polishing effect.

[0068] Since metals have a suitable polishing temperature range in different electrochemical polishing solutions, generally, the lower the temperature of the electrochemical polishing solution and the greater the viscosity, the slower the ion diffusion rate and the slower the metal dissolution rate. Within the allowable temperature range, it is advisable to select a higher temperature, because at this time the viscosity of the electrochemical polishing solution is relatively small, the ion diffusion rate is fast, the limiting current density increases, the metal dissolves quickly, and the polishing effect is better. However, if the temperature is too high, on the one hand, it will cause the viscosity of the electrochemical polishing solution to decrease, and on the other hand, it will increase the activity of the acid radical ions, which can easily cause excessive corrosion of the metal surface. In addition, if the temperature is too high, especially if the local temperature in the yin and yang reaction zone rises too fast, it is also easy to cause certain components in the electrochemical polishing solution to decompose, thereby affecting the polishing effect.

[0069] Preferably, the electrochemical polishing device further comprises a temperature control device 500, wherein the temperature control device 500 is provided with a first liquid inlet 510 and a first liquid outlet 520, and the tank body 310 is provided with a second liquid inlet 311 and a second liquid outlet 312, wherein the first liquid inlet 510 is connected to the second liquid outlet 312, and the first liquid outlet 520 is connected to the second liquid inlet 311. Thus, by providing the temperature control device 500, the electrochemical polishing liquid can be heated or cooled according to the electrochemical polishing requirements of different workpieces, so that the electrochemical polishing liquid reaches a suitable electrochemical polishing temperature. Through the connected first liquid inlet 510 and the second liquid outlet 312 and the connected first liquid outlet 520 and the second liquid inlet 311, it can be ensured that a constant temperature liquid enters and exits the tank body 310 of the electrochemical polishing tank 300, so that a constant temperature electrochemical polishing liquid flows in the tank body 310, so as to improve the polishing effect of the electrochemical polishing device on the workpiece.

[0070] Preferably, the electrochemical polishing equipment further comprises a stirring device 600, and the stirring device 600 is used to stir the electrochemical polishing liquid stored in the tank body 310. Thus, by providing the stirring device 600, it can be used to accelerate the flow of the electrochemical polishing liquid, make the temperature of the electrochemical polishing liquid more uniform, and accelerate the diffusion of the anode dissolution product. In addition, by providing the stirring device 600, it is also possible to solve the problem that the electrochemical polishing liquid is easily boiled and evaporated due to excessive local heat generation and overheating of the polishing area during the electrochemical polishing process, thereby ensuring the normal progress of the electrochemical polishing.

[0071] The stirring device 600 can be a turbine stirrer or a propeller stirrer commonly used in the prior art. In this case, the stirring device 600 can be placed in the tank body 310 of the electrochemical polishing device to accelerate the flow of the electrochemical polishing liquid by continuously stirring the electrochemical polishing liquid. The stirring device 600 can also be a magnetic stirrer commonly used in the prior art. In this case, the stirring device 600 can be placed below the tank body 310, so that the magnetic stirring bar placed in the tank body 310 can be driven to rotate by the magnetic field, thereby achieving the effect of stirring the electrochemical polishing liquid.

[0072] Before the electrochemical polishing starts, the electrochemical polishing liquid is poured into the tank 310 until the liquid level reaches a suitable position, and then the cathode structure 100 is immersed in the electrochemical polishing liquid, and the cathode structure 100 is connected to the negative electrode of the power supply 400 through the cathode wire 410. The workpiece 200 to be polished is connected to the positive electrode of the DC power supply 400 through the anode wire 420. Before the polishing starts, the workpiece 200 to be polished is located above the liquid level of the electrochemical polishing liquid.

[0073] During electrochemical polishing, the workpiece 200 to be polished should be located in the electrochemical polishing liquid and in the accommodation space formed between the first cathode portion 110 and the second cathode portion 120. The temperature control device 500 is used to make the electrochemical polishing liquid reach a suitable temperature, the stirring device 600 and the power supply 400 are turned on, the voltage of the power supply 400 is adjusted, the voltage / current of the electrochemical polishing circuit is changed, and electrochemical polishing is performed. The magnitude of the voltage / current of the electrochemical polishing circuit is determined according to the size and material of the workpiece 200 to be polished and the distance between the anode and the cathode.

[0074] In summary, the electrochemical polishing equipment provided by the present invention has a cathode structure 100 that is changed from a traditional single structure to a combined structure including at least one first cathode part 110 and at least one second cathode part 120, and the first cathode part 110 and the second cathode part 120 are used to polish the surface of the workpiece 200. Therefore, during the electrochemical polishing process, both the inner and outer surfaces of the workpiece can achieve a good polishing effect, thereby effectively improving the appearance quality of the inner and outer surfaces of the workpiece.

[0075] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0076] The above description is only a description of the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any changes and modifications made by a person skilled in the art in the field of the present invention based on the above disclosure shall fall within the scope of protection of the claims. Obviously, a person skilled in the art may make various changes and modifications to the invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A cathode structure, characterized in that: The invention comprises at least one first cathode portion and at least one second cathode portion, wherein the first cathode portion is connected to the second cathode portion, and the first cathode portion and the second cathode portion are used for polishing the surface of a workpiece; the second cathode portion is located on the inner side of the first cathode portion, and an accommodating space is formed between the first cathode portion and the second cathode portion; the first cathode portion and the second cathode portion are detachably connected, and the second cathode portion can reciprocate along its axial direction relative to the first cathode portion.

2. The cathode structure according to claim 1, characterized in that: When the workpiece to be polished is placed in the accommodating space, the distance between the inner surface of the first cathode portion and the outer surface of the workpiece to be polished is equal everywhere.

3. The cathode structure according to claim 1, characterized in that: The first cathode portion is an annular structure, a constant diameter cylindrical structure or a variable diameter cylindrical structure.

4. The cathode structure according to claim 1, characterized in that: When the workpiece to be polished is placed in the accommodating space, the distance between the outer surface of the second cathode portion and the inner surface of the workpiece to be polished is equal everywhere.

5. The cathode structure according to claim 1, characterized in that: The second cathode portion is a ring-shaped structure, a rod-shaped structure with a constant diameter, or a rod-shaped structure with a variable diameter.

6. The cathode structure according to claim 1, characterized in that: The first cathode part and the second cathode part are detachably connected via a first connecting member, one end of the first connecting member is connected to the second cathode part, and the other end of the first connecting member is detachably connected to the first cathode part.

7. The cathode structure according to claim 1, characterized in that: The first cathode portion is connected to a second connector, and the cathode structure is connected to a negative electrode of a power source via the second connector.

8. An electrochemical polishing tank, comprising a tank body, characterized in that: The electrochemical polishing tank comprises the cathode structure according to any one of claims 1 to 7, and the cathode structure is located inside the tank body.

9. The electrochemical polishing tank according to claim 8, characterized in that: The electrochemical polishing tank comprises an anode structure for fixing a workpiece to be polished, and the anode structure is located inside the tank body.

10. The electrochemical polishing tank according to claim 9, characterized in that: The anode structure comprises a first anode portion and a second anode portion connected to each other, wherein a clamping space capable of clamping at least a portion of a workpiece to be polished is formed between the first anode portion and the second anode portion.

11. The electrochemical polishing tank according to claim 10, characterized in that: The anode structure is sleeved with a pair of sleeves arranged opposite to each other, and the sleeves can move relative to the anode structure.

12. An electrochemical polishing device, comprising a power supply, characterized in that: The electrochemical polishing equipment comprises the electrochemical polishing tank according to any one of claims 8 to 11, the negative electrode of the power supply is used to be connected to the cathode structure, and the positive electrode of the power supply is used to be connected to the workpiece to be polished.

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