Display device and method of manufacturing the same

Abstract

A display device includes: a substrate, the substrate including a display area having a plurality of first-color sub-pixels and a transparent area inside the display area; an array layer, the array layer is arranged in the display area on the substrate; a first electrode, the first electrode is arranged in the first-color sub-pixel on the array layer; a first light-emitting auxiliary layer, the first light-emitting auxiliary layer is arranged on the first electrode; a light-emitting material layer, the light-emitting material layer is arranged in the first-color sub-pixel on the first light-emitting auxiliary layer; a second light-emitting auxiliary layer, the second light-emitting auxiliary layer is arranged on the light-emitting material layer; a deposition prevention layer, the deposition prevention layer is arranged in the transparent area on the second light-emitting auxiliary layer; a second electrode, the second electrode is arranged on the second light-emitting auxiliary layer, and the second electrode is selectively arranged in an area where the deposition prevention layer is not formed; an encapsulation layer, the encapsulation layer is arranged on the deposition prevention layer and the second electrode; a polarization layer, the polarization layer is arranged in the display area on the encapsulation layer; and an auxiliary device, the auxiliary device is arranged in the transparent area below the substrate.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims the benefit of priority from Korean Patent Application No. 10-2019-0160708, filed in Korea on December 5, 2019, which is hereby incorporated by reference herein in its entirety. Technical Field

[0003] The present disclosure relates to a display device, and more particularly, to a display device including a transparent area for an auxiliary device such as a camera or a fingerprint sensor, and a method of manufacturing the display device. Background Art

[0004] A mobile terminal is a portable terminal capable of transmitting and receiving voice, character, and image data through wireless communication. A flat panel display (FPD) such as an organic light emitting diode (OLED) display device may be used for the mobile terminal.

[0005] Recently, a mobile terminal including auxiliary devices such as a camera for photographing and a fingerprint sensor for authentication has been proposed.

[0006] In the mobile terminal, the auxiliary device is provided on a rear surface of a display panel, and the display panel includes a transparent area corresponding to the auxiliary device, so that the auxiliary device can recognize an object above a front surface of the display panel.

[0007] To reduce the bezel of the non-display area and expand the display area, a transparent area for auxiliary devices is placed within the display area. After the display panel is completed, the substrate, array layer, LEDs, encapsulation layer, and polarizing layer in the transparent area are removed through a cutting process such as laser trimming. This increases the transmittance of the transparent area.

[0008] However, since the cutting process is added, the manufacturing cost increases and the productivity decreases.

[0009] In addition, since the light-emitting diodes and the encapsulation layer on the substrate are removed by the cutting process, the sides of the light-emitting diodes and the encapsulation layer are exposed to the outside, so external oxygen or moisture is introduced through the sides of the light-emitting diodes and the encapsulation layer, causing degradation such as particles in the display panel.

[0010] In order to prevent degradation, the light emitting diodes are separated by forming grooves in the array layer below the light emitting diodes. However, since the groove forming process is added, the manufacturing cost is further increased and the productivity is further reduced. Summary of the Invention

[0011] Accordingly, the present disclosure is directed to a display device and a method of manufacturing the same that substantially obviate one or more problems due to limitations and disadvantages of the related art.

[0012] An object of the present disclosure is to provide a display device including a transparent area and a method of manufacturing the display device, in which a second electrode is selectively formed in a display area other than the transparent area using a deposition preventing layer.

[0013] Another object of the present disclosure is to provide a display device including a transparent area and a method for manufacturing the display device, wherein a second electrode is selectively formed in the display area and a partially transparent area.

[0014] Other features and advantages of the present disclosure will be described in the following description, and in part will become apparent from the description, or may be learned through practice of the present disclosure. These and other advantages of the present disclosure will be realized and obtained through the structures particularly pointed out in the written description and claims and the accompanying drawings.

[0015] In order to achieve these and other advantages, and in accordance with the purposes of the present disclosure, as embodied and broadly described herein, a display device includes: a substrate, the substrate including a display area having a plurality of first color sub-pixels and a transparent area within the display area; an array layer, the array layer is arranged in the display area on the substrate; a first electrode, the first electrode is arranged in each of the plurality of first color sub-pixels on the array layer; a first light-emitting auxiliary layer, the first light-emitting auxiliary layer is arranged on the first electrode; a light-emitting material layer, the light-emitting material layer is arranged in each of the plurality of first color sub-pixels on the first light-emitting auxiliary layer; a second light-emitting auxiliary layer, the second light-emitting auxiliary layer is arranged on the light-emitting material layer; a deposition prevention layer, the deposition prevention layer is arranged in the transparent area on the second light-emitting auxiliary layer; a second electrode, the second electrode is arranged on the second light-emitting auxiliary layer, and the second electrode is selectively arranged in an area where the deposition prevention layer is not formed; an encapsulation layer, the encapsulation layer is arranged on the deposition prevention layer and the second electrode; a polarization layer, the polarization layer is arranged in the display area on the encapsulation layer; and an auxiliary device, the auxiliary device is arranged in the transparent area below the substrate.

[0016] On the other hand, a method for manufacturing a display device includes: forming an array layer on a substrate, the substrate including a display area having a plurality of first color sub-pixels and a transparent area inside the display area, the array layer being arranged in the display area; forming a first electrode in each of the plurality of first color sub-pixels on the array layer; forming a first light-emitting auxiliary layer on the first electrode; forming a light-emitting material layer in each of the plurality of first color sub-pixels on the first light-emitting auxiliary layer; forming a second light-emitting auxiliary layer on the light-emitting material layer; forming a deposition prevention layer in the transparent area on the second light-emitting auxiliary layer; forming a second electrode on the second light-emitting auxiliary layer, the second electrode being selectively arranged in an area where the deposition prevention layer is not formed; forming an encapsulation layer on the deposition prevention layer and the second electrode; forming a polarization layer in the display area on the encapsulation layer; and forming an auxiliary device in the transparent area below the substrate.

[0017] It is to be understood that both the foregoing general description and the following detailed description are explanatory and are intended to provide further explanation of the disclosure as claimed. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present disclosure includes accompanying drawings to provide a further understanding of the present disclosure, and the accompanying drawings are incorporated into and constitute a part of this specification. The accompanying drawings illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure. In the accompanying drawings:

[0019] Figure 1 is a diagram showing a display device according to a first embodiment of the present disclosure;

[0020] Figure 2 is a diagram illustrating sub-pixels of a display device according to a first embodiment of the present disclosure;

[0021] Figure 3 is a plan view showing a display device according to a first embodiment of the present disclosure;

[0022] Figure 4 It shows Figure 3 An enlarged plan view of a boundary area between a display area and a transparent area;

[0023] Figure 5 It is along Figure 4 a sectional view taken along line VV;

[0024] Figures 6A to 6E is a cross-sectional view illustrating a method for manufacturing a display device according to a first embodiment of the present disclosure;

[0025] Figure 7 is a graph showing adsorption and desorption of various materials with respect to the surface energy of a display device according to the first embodiment of the present disclosure;

[0026] Figure 8is the behavior of various materials of the display device according to the first embodiment of the present disclosure;

[0027] Figure 9 is a graph showing transmittance of a display device according to a first embodiment of the present disclosure;

[0028] Figure 10 is an enlarged plan view showing a boundary area between a display area and a transparent area of ​​a display device according to a second embodiment of the present disclosure;

[0029] Figure 11 It is along Figure 10 A sectional view taken along line XI-XI. DETAILED DESCRIPTION

[0030] The advantages and features of the present disclosure and its implementation methods will be illustrated by the following example embodiments described with reference to the accompanying drawings. However, the present disclosure can be embodied in different forms and should not be construed as limited to the example embodiments set forth herein. On the contrary, these example embodiments are provided so that the present disclosure can be sufficiently thorough and complete to help those skilled in the art fully understand the scope of the present disclosure. Furthermore, the present disclosure is limited only by the scope of the claims.

[0031] The shapes, sizes, ratios, angles and quantities disclosed in the drawings for describing the embodiments of the present disclosure are merely examples. Therefore, the present disclosure is not limited to the details shown. The same reference numerals always represent the same elements. In the following description, when it is determined that the detailed description of related known functions or configurations unnecessarily obscures the main points of the present disclosure, the detailed description of such known functions or configurations may be omitted. Where the terms "including", "having" and "comprising" described in this specification are used, another part may be added unless a more restrictive term such as "only" is used. Unless otherwise indicated, terms in the singular may include plural forms.

[0032] When interpreting an element, even if the error or tolerance range is not explicitly described, the element is interpreted as including the error or tolerance range.

[0033] When describing a positional relationship, for example, when the positional relationship between two parts is described as "on," "over," "below," or "near," one or more other parts may be disposed between the two parts, unless more restrictive terms such as "just" or "directly" are used.

[0034] It will be understood that although the terms "first," "second," etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element, without departing from the scope of this disclosure.

[0035] As will be fully understood by those skilled in the art, the features of the various embodiments of the present disclosure may be coupled or combined with each other in part or in whole, and may interoperate and technically drive each other in different ways. The embodiments of the present disclosure may be implemented independently of each other, or may be implemented together in a mutually dependent relationship.

[0036] Hereinafter, a display device according to an embodiment of the present disclosure and a method for manufacturing the display device will be described in detail with reference to the accompanying drawings. In the following description, the same reference numerals always represent the same elements. When it is determined that the detailed description of the well-known functions or configurations related to this document unnecessarily obscures the main idea of ​​the present invention, the detailed description will be omitted or simplified.

[0037] Figure 1 is a diagram showing a display device according to a first embodiment of the present disclosure, Figure 2 is a diagram showing sub-pixels of a display device according to a first embodiment of the present disclosure. Figure 1 and Figure 2 , an organic light emitting diode (OLED) display device is exemplarily shown as a display device.

[0038] exist Figure 1 In the embodiment, the display device 110 includes a timing control unit 180 , a data driving unit 182 , a gate driving unit 184 and a display panel 186 .

[0039] The timing control section 180 generates gate control signals, data control signals, and image data using image signals and multiple timing signals transmitted from an external system such as a graphics card or television system. The timing control section 180 provides the data control signals and image data to the data driving section 182 and the gate control signals to the gate driving section 184.

[0040] The data driving part 182 generates a data signal (data voltage) using the data control signal and image data transmitted from the timing control part 180 , and supplies the data voltage to the data line DL of the display panel 186 .

[0041] The gate driving section 184 generates a gate signal (gate voltage) using the gate control signal transmitted from the timing control section 180 , and supplies the gate voltage to the gate line GL of the display panel 186 .

[0042] The display panel 186 displays an image using gate signals and data signals. The display panel 186 includes gate lines GL, data lines DL, and a plurality of sub-pixels SP connected to the gate lines GL and the data lines DL. Figure 2 ).

[0043] For example, each of the plurality of subpixels SP may be defined by a gate line GL and a data line DL crossing each other, and the plurality of subpixels SP may include a red subpixel SPr, a green subpixel SPg, and a blue subpixel SPb corresponding to red, green, and blue, respectively.

[0044] Each of the plurality of sub-pixels SP includes a plurality of thin film transistors (TFTs). For example, each of the plurality of sub-pixels SP may include a switching TFT, a driving TFT, a storage capacitor, and a light emitting diode.

[0045] exist Figure 2 In the embodiment, each of the plurality of sub-pixels SP of the OLED display device 110 according to the first embodiment of the present disclosure includes a switching TFT Ts, a driving TFT Td, a storage capacitor Cs, and a light emitting diode De.

[0046] The switching TFT Ts supplies the data signal of the data line DL to the driving TFT Td according to the gate signal of the gate line GL, and the driving TFT Td supplies the high level voltage ELVDD to the light emitting diode De according to the data signal applied to the gate through the switching TFT Ts.

[0047] The light emitting diode De displays various gray levels using various currents according to a voltage difference between a voltage corresponding to the data signal and the low-level voltage ELVSS.

[0048] Figure 3 is a plan view showing a display device according to a first embodiment of the present disclosure, Figure 4 It shows Figure 3 An enlarged plan view of the boundary area between the display area and the transparent area, Figure 5 It is along Figure 4 A cross-sectional view taken along line VV of FIG. An organic light emitting diode (OLED) display device of a touch-on-cell type and a top emission type is exemplarily shown as a display device.

[0049] exist Figure 3 、 Figure 4 and Figure 5 In the embodiment, the display device 110 according to the first embodiment of the present disclosure includes a display area DA for displaying an image and sensing a touch, a transparent area TA inside the display area DA, and a non-display area NDA surrounding the display area DA.

[0050] The display device 110 includes a display panel 186, a system unit 170, and an auxiliary device 172. The display panel 186 can transmit information to the user through image display and receive information from the user through touch sensing. The system unit 170 can transmit and receive signals and power with the display panel and the auxiliary device 172. The auxiliary device 172 can receive information such as the shape of an object through the display panel 186.

[0051] The back plate 162 supports and protects the substrate 120. The back plate 162 may include plastic such as polyethylene terephthalate (PET), and may have a refractive index of about 1.6.

[0052] The substrate 120 is disposed on the entire back plate 162 , and the gate insulating layer 122 , the interlayer insulating layer 124 , and the passivation layer 126 are sequentially disposed in the display area DA on the substrate 120 .

[0053] The substrate 120 includes a display area DA and a transparent area TA. The display area DA includes a plurality of first color sub-pixels, for example, red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb, and the transparent area TA is disposed inside the display area DA.

[0054] The substrate 120 may include glass or plastic such as polyethylene terephthalate (PET), and may have a refractive index of about 1.6.

[0055] Such as switch TFT Ts( Figure 2 ) and driving TFT Td( Figure 2 ) of multiple thin film transistors (TFT) and storage capacitors Cs ( Figure 2 ) may be disposed between the gate insulating layer 122 , the interlayer insulating layer 124 , and the passivation layer 126 of each of the red sub-pixel SPr, the green sub-pixel SPg, and the blue sub-pixel SPb.

[0056] For example, a gate insulating layer 122 may be provided between the gate electrodes of the switching TFT Ts and the driving TFT Td and the semiconductor layer, an interlayer insulating layer 124 may be provided between the gate electrodes and the source electrodes and between the gate electrodes and the drain electrodes of the switching TFT Ts and the driving TFT Td, and a passivation layer 126 may be provided on the source electrodes and the drain electrodes of the switching TFT Ts and the driving TFT Td.

[0057] The first electrode 128 is disposed in each of the red, green, and blue subpixels SPr, SPg, and SPb on the passivation layer 126 , and the first light emitting auxiliary layer 130 is disposed on the entire substrate 120 having the first electrode 128 .

[0058] The first electrode 128 may include a first layer of a metallic material having a relatively high reflectivity and a second layer of a transparent conductive material having a relatively high work function.

[0059] For example, the first electrode 128 may be an anode supplying holes to the light emitting material layer 132 and may be connected to the driving TFT Td.

[0060] The first light emitting auxiliary layer 130 may include a hole injection layer for injecting holes into the light emitting material layer 132 and a hole transport layer for transporting holes to the light emitting material layer 132. The hole injection layer and the hole transport layer may be sequentially disposed on the first electrode 128.

[0061] The light emitting material layer 132 is disposed in each of the red, green, and blue subpixels SPr, SPg, and SPb on the first light emitting auxiliary layer 130 , and the second light emitting auxiliary layer 134 is disposed on the entire substrate 120 having the light emitting material layer 132 .

[0062] The light emitting material layer 132 combines holes supplied from the first electrode 128 and electrons supplied from the second electrode 140 to emit light.

[0063] Although in the first embodiment the light-emitting material layers 132 of the red sub-pixel SPr, the green sub-pixel SPg, and the blue sub-pixel SPb exemplarily include different materials so as to emit red light, green light, and blue light, respectively, in another embodiment, the light-emitting material layers 132 of the red sub-pixel SPr, the green sub-pixel SPg, and the blue sub-pixel SPb may have the same structure of the same material so as to emit white light, and a color filter layer may be provided on the second electrode 140.

[0064] The second light emitting auxiliary layer 134 may include an electron transport layer that transports electrons to the light emitting material layer 132 and an electron injection layer that injects electrons. The electron transport layer and the electron injection layer may be sequentially disposed on the light emitting material layer 132.

[0065] For example, the electron injection layer may have a to about thickness.

[0066] Each of the first light emitting auxiliary layer 130 and the second light emitting auxiliary layer 134 may have a refractive index of about 1.8.

[0067] Although the first light-emitting auxiliary layer 130 and the second light-emitting auxiliary layer 134 of the same material are exemplarily provided on the entire substrate 120 in the first embodiment, the first light-emitting auxiliary layer 130 and the second light-emitting auxiliary layer 134 can be selectively provided with different materials in the red sub-pixel SPr, the green sub-pixel SPg and the blue sub-pixel SPb.

[0068] The second electrode 140 and the deposition preventing layer 142 are respectively disposed in the display area DA and the transparent area TA on the second light emitting auxiliary layer 134 .

[0069] The second electrode 140 is selectively provided in a region where the deposition preventing layer 142 is not formed. Therefore, the second electrode 140 and the deposition preventing layer 142 may be provided exclusively to each other.

[0070] The second electrode 140 may include a metal material having semi-transmittance and a relatively low work function.

[0071] For example, the second electrode 140 may be a cathode that provides electrons to the light emitting material layer 132. The second electrode 140 may have a thickness of approximately to about thickness and may include magnesium silver (MgAg).

[0072] The first electrode 128 , the first light-emitting auxiliary layer 130 , the light-emitting material layer 132 , the second light-emitting auxiliary layer 134 and the second electrode 140 constitute a light-emitting diode.

[0073] The deposition preventing layer 142 may include an organic material having relatively low surface energy so that the metal material is not adsorbed on the deposition preventing layer 142 and is separated from the deposition preventing layer 142 when the second electrode 140 is formed.

[0074] For example, the deposition preventing layer 142 may have a thickness of about to about thickness.

[0075] The deposition preventing layer 142 will be described later.

[0076] The encapsulation layer 150 is disposed on the entire substrate 120 having the second electrode 140 and the deposition preventing layer 142 , and the touch layer 152 is disposed on the entire substrate 120 having the encapsulation layer 150 .

[0077] The encapsulation layer 150 prevents penetration of external oxygen or moisture. The encapsulation layer 150 may include a plurality of organic material layers and a plurality of inorganic material layers, and may have a refractive index of about 1.8.

[0078] The touch layer 152 senses touch. The touch layer 152 may include a plurality of touch electrodes and an insulating layer, and the insulating layer may have a refractive index of about 1.5.

[0079] Although the touch layer 152 is exemplarily disposed on the encapsulation layer 150 in the first embodiment, in another embodiment the touch layer 152 may be disposed inside the array layer including the gate insulating layer 122 , the interlayer insulating layer 124 , and the passivation layer 126 , or may be omitted.

[0080] The polarizing layer 154 is disposed in the display area DA on the touch layer 152 , and the adhesive layer 156 is disposed in the display area DA on the polarizing layer 154 .

[0081] The polarization layer 154 minimizes re-emission of external light by reflection on the array layer and the light emitting diodes. The polarization layer 154 may include a quarter wave plate and a linear polarization layer sequentially on the touch layer 152.

[0082] A cover glass 160 is disposed on the entire substrate 120 having the adhesive layer 156. The cover glass 160 protects the touch layer 152, the light emitting diodes, and the plurality of TFTs.

[0083] The backplane 162 , the substrate 120 , a plurality of TFTs, light emitting diodes, and the cover glass 160 constitute a display panel.

[0084] The system part 170 and the auxiliary device 172 are respectively disposed in the display area DA and the transparent area TA below the back plate 162 .

[0085] In the display device 110 according to the first embodiment of the present disclosure, a cutting process for removing the light-emitting diodes and the encapsulation layer 150 in the transparent area TA is not performed. Instead, since the second electrode 140 of the light-emitting diode is selectively formed in the display area DA using the deposition prevention layer 142, the sides of the light-emitting diodes and the encapsulation layer 150 are not exposed to the outside. Therefore, the penetration of external oxygen or external moisture is minimized, and degradation such as particles is minimized.

[0086] In addition, since a cutting process such as laser trimming and a process of forming a groove are omitted, the manufacturing process is simplified, the manufacturing cost is reduced, and the productivity is improved.

[0087] A method of manufacturing the display device 110 is shown below.

[0088] Figures 6A to 6E is a cross-sectional view illustrating a method for manufacturing a display device according to a first embodiment of the present disclosure, Figure 7 is a graph showing adsorption and desorption of various materials with respect to the surface energy of a display device according to the first embodiment of the present disclosure, Figure 8 are behaviors of various materials of the display device according to the first embodiment of the present disclosure.

[0089] exist Figure 6A In the example, the switch TFT Ts( Figure 2 ) and driving TFT Td( Figure 2 ) of multiple thin film transistors (TFT) and storage capacitors Cs ( Figure 2 ) may be disposed between the gate insulating layer 122 , the interlayer insulating layer 124 and the passivation layer 126 .

[0090] The plurality of TFTs and the first electrode 124 may be formed through a photolithography process.

[0091] Next, a first light-emitting auxiliary layer 130 is formed on the entire substrate 120 having the first electrode 124, a light-emitting material layer 132 is formed in each of the red sub-pixel SPr, green sub-pixel SPg and blue sub-pixel SPb on the first light-emitting auxiliary layer 130, and a second light-emitting auxiliary layer 134 is formed on the entire substrate 120 having the light-emitting material layer 132.

[0092] The first light emitting auxiliary layer 130 , the light emitting material layer 132 , and the second light emitting auxiliary layer 134 may be formed through a thermal evaporation process using a shadow mask such as a fine metal mask.

[0093] The electron injection layer of the second light emitting auxiliary layer 134 may be formed as a top surface of the substrate 120 .

[0094] The metal material used for the electron injection layer may have a relatively high surface energy. For example, the metal material used for the electron injection layer may have a surface energy equal to or greater than about 0.5 J / m 2 surface energy.

[0095] The metal material for the electron injection layer may have a relatively low melting point so as to be deposited at a relatively low temperature. For example, the metal material for the electron injection layer may have a melting point equal to or lower than about 1000°C.

[0096] The metal material used for the electron injection layer may have a relatively large electrical conductivity. For example, the metal material used for the electron injection layer may have a conductivity equal to or greater than about 4.0×10 6 Ω -1 m -1 conductivity.

[0097] The metal material used for the electron injection layer may have a relatively low work function. For example, the metal material used for the electron injection layer may have a work function of about 2.4 eV to about 2.8 eV.

[0098] The electron injection layer may have a to about thickness, and may be equal to or greater than about The deposition rate is formed.

[0099] exist Figure 6B In the embodiment, a shadow mask 144 having a shielding area SA and an opening area OA is disposed above the second light emitting auxiliary layer 134 , and an organic material is deposited on the second light emitting auxiliary layer 134 through the opening area OA.

[0100] Therefore, the deposition preventing layer 142 is formed in the transparent area TA on the second light emitting auxiliary layer 134 , and the second light emitting auxiliary layer 134 of the display area DA is exposed.

[0101] The shadow mask 144 may be aligned such that the shielding area SA and the opening area OA correspond to the display area DA and the transparent area TA, respectively.

[0102] The organic material used for the deposition preventing layer 142 may have a relatively small surface energy and a relatively low glass transition temperature Tg. For example, the organic material used for the deposition preventing layer 142 may have a heat release rate equal to or less than about 0.2 J / m 2 and a glass transition temperature equal to or lower than about 40°C.

[0103] The organic material used for the deposition preventing layer 142 may have a relatively large refractive index and a relatively small light absorption rate. For example, the organic material used for the deposition preventing layer 142 may have a refractive index equal to or greater than about 1.7 for light having a wavelength of about 550 nm and may have a light absorption rate equal to or less than about 0.02.

[0104] The organic material for the deposition preventing layer 142 may be patterned using the shadow mask 144. For example, the organic material for the deposition preventing layer 142 may be patterned using the shadow mask 144 to form a pattern corresponding to pixels having a resolution of approximately 300 ppi.

[0105] The organic material used for the deposition preventing layer 142 may have relatively high high temperature storage reliability. For example, the organic material used for the deposition preventing layer 142 may be determined so that even if the thickness is about The deposition preventing layer 142 is not degraded even when placed at a temperature of about 100° C. for about 500 hours.

[0106] The deposition preventing layer 142 may have a thickness of about to about thickness.

[0107] The organic material used for the deposition preventing layer 142 may be different from organic insulating materials such as photo acryl and polyimide and inorganic insulating materials such as silicon nitride (SiNx), silicon dioxide (SiO2) and silicon oxynitride (SiON) used for the gate insulating layer 122, the interlayer insulating layer 124 and the passivation layer 126.

[0108] Although the organic insulating material and the inorganic insulating material used for the gate insulating layer 122, the interlayer insulating layer 124 and the passivation layer 126 can be patterned by a photolithography process, the organic material used for the deposition preventing layer 142 can be patterned without a photolithography process and can be patterned by a thermal deposition process using a shadow mask.

[0109] For example, the organic material for the deposition preventing layer 142 may include diarylethene (DAE), a ring-opened isomer represented by the following Chemical Formula 1.

[0110] [Chemical Formula 1]

[0111]

[0112] exist Figure 6C In the embodiment, the metal material is deposited on the second light emitting auxiliary layer 134 of the display area DA and the deposition preventing layer 142 of the transparent area TA.

[0113] The atoms 146 of the metal material are not adsorbed onto the deposition preventing layer 142 of the transparent area TA and are desorbed from the deposition preventing layer 142 of the transparent area TA. The atoms 146 of the metal material are selectively adsorbed onto the second light emitting auxiliary layer 134 of the display area DA, so that the second electrode 140 is selectively formed in the display area DA.

[0114] The metal material used for the second electrode 140 may have a relatively large surface energy. For example, the metal material used for the second electrode 140 may have a surface energy equal to or greater than about 0.5 J / m 2 surface energy.

[0115] Specifically, the surface energy of the metal material used for the second electrode 140 may be greater than the surface energy of the metal material used for the electron injection layer of the second light emitting auxiliary layer 130 .

[0116] The metal material for the second electrode 140 may have a relatively low melting point to be deposited at a relatively low temperature. For example, the metal material for the second electrode 140 may have a melting point equal to or lower than about 1000°C.

[0117] The metal material used for the second electrode 140 may have a relatively large electrical conductivity. For example, the metal material used for the second electrode 140 may have an electrical conductivity equal to or greater than about 1.0×10 7 Ω -1 m -1 conductivity.

[0118] The metal material used for the second electrode 140 may have a relatively small refractive index and a relatively small light absorption rate. For example, the metal material used for the second electrode 140 may have a refractive index of about 1.0 for light of about 550 nm wavelength and a light absorption rate equal to or less than about 5.5.

[0119] The metal material used for the second electrode 140 may have a to about thickness, and can be approximately to about The deposition rate is formed.

[0120] exist Figure 7 and Figure 8 In the embodiment, the metal material used for the second light emitting auxiliary layer 134, the organic material used for the deposition preventing layer 142, and the metal material used for the second electrode 140 have a first surface energy SE1, a second surface energy SE2, and a third surface energy SE3, respectively. The first surface energy SE1 is greater than the second surface energy SE2 and less than the third surface energy SE3 (SE2 <SE1<SE3)。

[0121] Since the deposition preventing layer 142 is formed of an organic material having a relatively small value of the second surface energy SE2 and a relatively low glass transition temperature, the deposition preventing layer 142 has efficient surface atomic movement.

[0122] Therefore, the atoms 146 of the metal material for the second electrode 140 having the third surface energy SE3 are not adsorbed on the surface of the deposition preventing layer 142 having the relatively small second surface energy SE2 and the relatively low glass transition temperature in the transparent area TA, and are separated from the surface and then move to the display area DA.

[0123] Atoms 146 of the metal material used for the second electrode 140, having a third surface energy SE3, are selectively adsorbed on the surface of the electron injection layer of the second light-emitting auxiliary layer 134, which has a relatively large first surface energy SE1, in the display area DA. In the display area DA, nucleation of the metal material atoms 146 is performed, and the metal material atoms 146 gradually accumulate using the atomic nuclei as seeds. As a result, the second electrode 140 is selectively formed in the display area DA.

[0124] Although in the first embodiment, the second electrode 140 can be selectively formed in the display area DA by adjusting the surface energy of the metal material of the electron injection layer for the second light-emitting auxiliary layer 134, the organic material for the deposition preventing layer 142, and the metal material for the second electrode 140, in another embodiment, the second electrode 140 can be selectively formed in the display area DA by adjusting the deposition temperature and deposition rate of the metal material of the electron injection layer for the second light-emitting auxiliary layer 134, the organic material for the deposition preventing layer 142, and the metal material for the second electrode 140.

[0125] exist Figure 6D In the embodiment, the encapsulation layer 150 is formed on the entire substrate 120 having the second electrode 140 and the deposition preventing layer 142 , and the touch layer 152 is formed on the entire substrate 120 having the encapsulation layer 150 .

[0126] Next, the polarizing layer 154 is formed in the display area DA on the encapsulation layer 150. For example, the polarizing layer 154 of a film type having a size corresponding to the display area DA may be attached to the encapsulation layer 150 of the display area DA.

[0127] Next, an adhesive layer 156 is formed in the display area DA on the polarizing layer 154 , and a cover glass 160 is formed on the entire substrate having the adhesive layer 156 .

[0128] For example, cover glass 160 may be attached to polarizing layer 154 using adhesive layer 156 .

[0129] Next, the back plate 162 is formed on the entire rear surface of the substrate 120 .

[0130] For example, the substrate 120 with the cover glass 160 may be attached to the backplane 162 using an adhesive layer.

[0131] exist Figure 6E In the embodiment, the system part 170 and the auxiliary device 172 are respectively disposed in the display area DA and the transparent area TA on the rear surface of the substrate 120.

[0132] In the method for manufacturing the display device 110 according to the first embodiment of the present disclosure, a cutting process is not performed to remove the light-emitting diodes and encapsulation layer 150 in the transparent area TA. Instead, because the metal material for the second electrode 140 is not adsorbed on the deposition prevention layer 142 in the transparent area TA but on the second light-emitting auxiliary layer 134 in the display area DA, the second electrode 140 for the light-emitting diode is selectively formed in the display area DA, so that the sides of the light-emitting diodes and encapsulation layer 150 are not exposed to the outside. Therefore, the penetration of external oxygen or external moisture is minimized, and degradation such as particles is minimized.

[0133] In addition, since a cutting process such as laser trimming and a process of forming a groove are omitted, the manufacturing process is simplified, the manufacturing cost is reduced, and the productivity is improved.

[0134] Figure 9 is a graph showing transmittance of the display device according to the first embodiment of the present disclosure. Figure 9 The transmittance of the display device from which the cover glass 160 is omitted is shown.

[0135] exist Figure 9 In the display device 110 according to the first embodiment of the present disclosure, the second electrode 140 is formed in the display area DA and is not formed in the transparent area TA due to the deposition preventing layer 142 .

[0136] In the display device according to the comparative example, the second electrode 140 having a semi-transmissive property is formed in the display area DA and the transparent area TA and overlaps the deposition preventing layer 142 .

[0137] The second electrode 140 includes magnesium silver (MgAg) and has a thickness of approximately thickness.

[0138] For light with a wavelength of about 400 nm to about 800 nm, the transmittance of the transparent area TA of the display device 110 of the first embodiment is greater than the transmittance of the transparent area TA of the display device of the comparative example.

[0139] The transparent area TA of the display device 110 of the first embodiment has intensities of approximately 107.6%, approximately 107.2%, and approximately 108.0% for light with wavelengths of approximately 430 nm, approximately 550 nm, and approximately 620 nm, respectively. The transparent area TA of the display device of the comparative example has intensities of approximately 75.7%, approximately 75.8%, and approximately 63.2% for light with wavelengths of approximately 430 nm, approximately 550 nm, and approximately 620 nm, respectively.

[0140] Therefore, the transparent area TA of the display device 110 of the first embodiment has a transmittance higher by about 30% or more than that of the display device of the comparative example, and the brightness of the display device 110 is improved.

[0141] In addition, since the transparent area TA of the display device 110 of the first embodiment has a relatively high value of uniform transmittance, degradation such as color shift is minimized.

[0142] The transparent area TA of the display device 110 of the first embodiment having the cover glass 160 may have intensities of approximately 97.6%, approximately 97.2%, and approximately 98.0% for light having wavelengths of approximately 430 nm, approximately 550 nm, and approximately 620 nm, respectively. The transparent area TA of the display device of the comparative example having the cover glass 160 may have intensities of approximately 76.7%, approximately 65.8%, and approximately 53.2% for light having wavelengths of approximately 430 nm, approximately 550 nm, and approximately 620 nm, respectively.

[0143] In the display device 110 according to the first embodiment of the present disclosure, the cutting process for removing the light-emitting diodes and the encapsulation layer 150 in the transparent area TA is not performed. In contrast, since the metal material for the second electrode 140 is not adsorbed on the deposition preventing layer 142 in the transparent area TA but adsorbed on the second light-emitting auxiliary layer 134 in the display area DA, the second electrode 140 of the light-emitting diode is selectively formed in the display area DA, so that the side surfaces of the light-emitting diodes and the encapsulation layer 150 are not exposed to the outside.

[0144] Therefore, penetration of external oxygen or external moisture is minimized, and deterioration such as particles is minimized.

[0145] For example, in the display device of the comparative example in which the light-emitting diode and the encapsulation layer 150 of the transparent area TA were removed by a cutting process such as laser trimming, degradation due to moisture permeation was observed in a storage reliability test conducted at a temperature of approximately 85° C. and a humidity of approximately 85% for 200 hours. In the display device 110 of the first embodiment in which the second electrode 140 was selectively formed in the display area DA using the deposition prevention layer 142, no degradation due to moisture permeation was observed in a storage reliability test conducted at a temperature of approximately 85° C. and a humidity of approximately 85% for 408 hours.

[0146] In addition, since a cutting process such as laser trimming and a process of forming a groove are omitted, the manufacturing process is simplified, the manufacturing cost is reduced, and the productivity is improved.

[0147] Furthermore, since the transparent area TA has a relatively high value of uniform transmittance, brightness is improved and degradation such as color shift is minimized.

[0148] In another embodiment, by disposing color sub-pixels such as the red sub-pixel SPr, the green sub-pixel SPg, and the blue sub-pixel SPb in a portion of the transparent area TA, the display quality of an image is improved.

[0149] Figure 10 is an enlarged plan view showing a boundary area between a display area and a transparent area of ​​a display device according to a second embodiment of the present disclosure, Figure 11 It is along Figure 10 1 is a cross-sectional view taken along line XI-XI of FIG. An organic light emitting diode (OLED) display device of a touch-on-cell type and a top emission type is exemplarily shown as a display device.

[0150] exist Figure 10 and Figure 11 In the embodiment, the display device 210 according to the second embodiment of the present disclosure includes a display area DA for displaying images and sensing touch, a transparent area TA inside the display area DA, and a non-display area (not shown) surrounding the display area DA.

[0151] The display device 210 includes a display panel, a system unit 270, and an auxiliary device 272. The display panel can transmit information to the user through image display and receive information from the user through touch sensing. The system unit 270 can transmit and receive signals and power with the display panel and the auxiliary device 272. The auxiliary device 272 can receive information such as the shape of an object through the display panel 186.

[0152] The back plate 262 supports and protects the substrate 220. The back plate 262 may include plastic such as polyethylene terephthalate (PET), and may have a refractive index of about 1.6.

[0153] The substrate 220 is disposed on the entire backplane 262 , and the gate insulating layer 222 , the interlayer insulating layer 224 and the passivation layer 226 are sequentially disposed in the plurality of first color sub-pixels of the display area DA and the plurality of second color sub-pixels of the transparent area TA on the substrate 220 .

[0154] The substrate 220 includes a display area DA and a transparent area TA. The display area DA includes a plurality of first color sub-pixels such as red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb, and the transparent area TA includes a plurality of second color sub-pixels such as red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb, and a plurality of transparent sub-pixels SPt alternating with the plurality of second color sub-pixels.

[0155] Although in the second embodiment, the red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb of the plurality of second color sub-pixels of the transparent area TA and the plurality of transparent sub-pixels SPt are exemplarily alternated with one another in a 1:1 correspondence along the horizontal direction, in another embodiment, the red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb of the plurality of second color sub-pixels of the transparent area TA and the plurality of transparent sub-pixels SPt may be alternated with one another in a one-to-many correspondence along the horizontal direction.

[0156] For example, the second color subpixels of red, green, and blue subpixels SPr, SPg, and SPb and the transparent subpixels SPt of the transparent area TA may alternate with each other in a 1:3 correspondence, so that the transparent area TA has an aperture ratio of about 75%.

[0157] The substrate 220 may include glass or plastic such as polyethylene terephthalate (PET), and may have a refractive index of about 1.6.

[0158] Such as switch TFT Ts( Figure 2 ) and driving TFT Td( Figure 2 ) of multiple thin film transistors (TFT) and storage capacitors Cs ( Figure 2 ) may be disposed between the gate insulating layer 222 , the interlayer insulating layer 224 , and the passivation layer 226 of each of the red sub-pixel SPr, the green sub-pixel SPg, and the blue sub-pixel SPb.

[0159] For example, a gate insulating layer 222 may be provided between the gate electrodes of the switching TFT Ts and the driving TFT Td and the semiconductor layer, an interlayer insulating layer 224 may be provided between the gate electrodes and the source electrodes and between the gate electrodes and the drain electrodes of the switching TFT Ts and the driving TFT Td, and a passivation layer 226 may be provided on the source electrodes and the drain electrodes of the switching TFT Ts and the driving TFT Td.

[0160] The first electrode 228 is disposed in each of the red, green, and blue subpixels SPr, SPg, and SPb of the display area DA and the transparent area TA on the passivation layer 226 , and the first light emitting auxiliary layer 230 is disposed on the entire substrate 220 having the first electrode 228 .

[0161] The first electrode 228 may include a first layer of a metallic material having a relatively high reflectivity and a second layer of a transparent conductive material having a relatively high work function.

[0162] For example, the first electrode 228 may be an anode supplying holes to the light emitting material layer 232 and may be connected to the driving TFT Td.

[0163] The first light emitting auxiliary layer 230 may include a hole injection layer for injecting holes into the light emitting material layer 232 and a hole transport layer for transporting holes to the light emitting material layer 232. The hole injection layer and the hole transport layer may be sequentially disposed on the first electrode 228.

[0164] The light emitting material layer 232 is disposed in each of the red, green, and blue subpixels SPr, SPg, and SPb on the first light emitting auxiliary layer 230 , and the second light emitting auxiliary layer 234 is disposed on the entire substrate 220 having the light emitting material layer 232 .

[0165] The light emitting material layer 232 combines holes supplied from the first electrode 228 and electrons supplied from the second electrode 240 to emit light.

[0166] Although in the second embodiment, the light-emitting material layers 232 of the red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb of the display area DA and the transparent area TA exemplarily include different materials so as to emit red light, green light, and blue light, respectively, in another embodiment, the light-emitting material layers 232 of the red sub-pixels SPr, green sub-pixels SPg, and blue sub-pixels SPb of the display area DA and the transparent area TA may have the same structure of the same material so as to emit white light, and the color filter layer may be provided on the second electrode 240.

[0167] The second light emitting auxiliary layer 234 may include an electron transport layer that transports electrons to the light emitting material layer 232 and an electron injection layer that injects electrons. The electron transport layer and the electron injection layer may be sequentially disposed on the light emitting material layer 232.

[0168] For example, the electron injection layer may have a to about thickness.

[0169] Each of the first light emitting auxiliary layer 230 and the second light emitting auxiliary layer 234 may have a refractive index of about 1.8.

[0170] Although the first light-emitting auxiliary layer 230 and the second light-emitting auxiliary layer 234 of the same material are exemplarily provided on the entire substrate 220 in the second embodiment, the first light-emitting auxiliary layer 230 and the second light-emitting auxiliary layer 234 can be selectively provided with different materials in the red sub-pixel SPr, green sub-pixel SPg and blue sub-pixel SPb in the display area DA and the transparent area TA.

[0171] The second electrode 240 is disposed in the red, green, and blue subpixels SPr, SPg, and SPb of the display area DA and the transparent area TA on the second light emitting auxiliary layer 234 , and the deposition preventing layer 242 is disposed in the plurality of transparent subpixels SPt of the transparent area TA on the second light emitting auxiliary layer 234 .

[0172] The second electrode 240 is selectively provided in a region where the deposition preventing layer 242 is not formed. Therefore, the second electrode 240 and the deposition preventing layer 242 may be provided exclusively to each other.

[0173] The second electrode 240 may include a metal material having semi-transmittance and a relatively low work function.

[0174] For example, the second electrode 240 may be a cathode that provides electrons to the light emitting material layer 232. The second electrode 240 may have a thickness of approximately to about thickness and may include magnesium silver (MgAg).

[0175] The first electrode 228 , the first light-emitting auxiliary layer 230 , the light-emitting material layer 232 , the second light-emitting auxiliary layer 234 and the second electrode 240 constitute a light-emitting diode.

[0176] The deposition preventing layer 242 may include an organic material having relatively low surface energy so that the metal material is not adsorbed on the deposition preventing layer 242 and is separated from the deposition preventing layer 242 when the second electrode 240 is formed.

[0177] For example, the deposition preventing layer 242 may have a thickness of about to about thickness.

[0178] The deposition preventing layer 242 may be formed of the same material through the same process as that of the first embodiment.

[0179] Since the second electrode 240 is not formed but the deposition preventing layer 242 is formed in the plurality of transparent sub-pixels SPt of the transparent area TA, transmittance of the transparent area TA is improved.

[0180] For example, the plurality of transparent sub-pixels SPt of the transparent area TA may have a transmittance of about 94%, and the transparent area TA may have an aperture ratio of about 75%. Therefore, the transparent area TA without the anti-reflection layer 258 may have a transmittance of about 71%, and the transparent area TA with the anti-reflection layer 258 may have a transmittance of about 75%.

[0181] The encapsulation layer 250 is disposed on the entire substrate 220 having the second electrode 240 and the deposition preventing layer 242 , and the touch layer 252 is disposed on the entire substrate 220 having the encapsulation layer 250 .

[0182] The encapsulation layer 250 prevents penetration of external oxygen or moisture. The encapsulation layer 250 may include a plurality of organic material layers and a plurality of inorganic material layers, and may have a refractive index of about 1.8.

[0183] The touch layer 252 senses touch. The touch layer 252 may include a plurality of touch electrodes and an insulating layer, and the insulating layer may have a refractive index of about 1.5.

[0184] Although the touch layer 252 is exemplarily disposed on the encapsulation layer 250 in the second embodiment, in another embodiment the touch layer 252 may be disposed inside the array layer including the gate insulating layer 222 , the interlayer insulating layer 224 , and the passivation layer 226 , or may be omitted.

[0185] The polarizing layer 254 is disposed in the display area DA on the touch layer 252 , and the adhesive layer 256 is disposed in the display area DA on the polarizing layer 254 .

[0186] The polarization layer 254 minimizes re-emission of external light by reflection on the array layer and the light emitting diodes. The polarization layer 254 may include a quarter wave plate and a linear polarization layer sequentially on the touch layer 252.

[0187] The anti-reflection layer 258 is disposed in the transparent area TA on the touch layer 252 .

[0188] The anti-reflection layer 258 improves the transmittance of the transparent area TA by adjusting interference according to reflection at the interface between the touch layer 252 and the anti-reflection layer 258 .

[0189] In another embodiment, the anti-reflective layer 258 may be omitted.

[0190] A cover glass 260 is disposed on the entire substrate 220 having the adhesive layer 256. The cover glass 260 protects the touch layer 252, the light emitting diodes, and the array layer.

[0191] The backplane 262 , the substrate 220 , the plurality of TFTs, the light emitting diodes, and the cover glass 260 constitute a display panel.

[0192] The system part 270 and the auxiliary device 272 are respectively disposed in the display area DA and the transparent area TA below the back plate 262 .

[0193] In the display device 210 according to the second embodiment of the present disclosure, a cutting process is not performed to remove the light-emitting diodes and the encapsulation layer 250 in the transparent area TA. Instead, the second electrodes 240 of the light-emitting diodes are selectively formed in the plurality of first color sub-pixels in the display area DA and the plurality of second color sub-pixels in the transparent area TA using the deposition prevention layer 242. Therefore, the sides of the light-emitting diodes and the encapsulation layer 250 are not exposed to the outside. Therefore, the penetration of external oxygen or external moisture is minimized, and degradation such as particles is minimized.

[0194] In addition, since a cutting process such as laser trimming and a process of forming a groove are omitted, the manufacturing process is simplified, the manufacturing cost is reduced, and the productivity is improved.

[0195] Furthermore, since the plurality of second color sub-pixels are disposed in the transparent area TA, the display area of ​​the display device 210 is expanded, and the display quality of an image is improved.

[0196] In addition, since the light emitting diode including the second electrode 240 having a semi-transmissive property is disposed in the plurality of second color sub-pixels of the transparent area TA, color reproducibility is improved due to the microcavity effect, and lifespan is increased.

[0197] In addition, since the deposition preventing layer 242 is formed in the plurality of transparent sub-pixels SPt of the transparent area TA instead of the second electrode 240 , the transmittance of the transparent area TA is improved.

[0198] Therefore, in the display device and the manufacturing method of the display device according to the first and second embodiments of the present disclosure, since the second electrode of the light-emitting diode is selectively set in the display area outside the transparent area using the deposition prevention layer, deterioration such as particles is minimized, manufacturing costs are reduced, and productivity is improved.

[0199] In addition, since the second electrode of the light emitting diode is selectively disposed in the display area and the partially transparent area using the deposition preventing layer, degradation such as particles is minimized, manufacturing costs are reduced, productivity is improved, and images are displayed even in the transparent area.

[0200] It will be apparent to those skilled in the art that various modifications and variations can be made to the present disclosure without departing from the spirit or scope of the present disclosure. Therefore, the present disclosure is intended to cover the modifications and variations of the present disclosure as long as they fall within the scope of the appended claims and their equivalents.

Claims

1. A display device comprising: a substrate comprising a display area having a plurality of first color sub-pixels and a transparent area within the display area, wherein the transparent area comprises a plurality of second color sub-pixels and a plurality of transparent sub-pixels alternating with the plurality of second color sub-pixels; an array layer, the array layer being provided in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the substrate; a first electrode disposed in each of the plurality of first color sub-pixels and the plurality of second color sub-pixels on the array layer; a first light-emitting auxiliary layer, the first light-emitting auxiliary layer being provided in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the first electrode and in the plurality of transparent sub-pixels above the substrate; a light-emitting material layer, the light-emitting material layer being provided in each of the plurality of first color sub-pixels and the plurality of second color sub-pixels on the first light-emitting auxiliary layer; a second light-emitting auxiliary layer, the second light-emitting auxiliary layer being provided in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the light-emitting material layer and in the plurality of transparent sub-pixels on the first light-emitting auxiliary layer; a deposition preventing layer, the deposition preventing layer being provided in the plurality of transparent sub-pixels on the second light-emitting auxiliary layer; a second electrode, the second electrode being disposed in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the second light-emitting auxiliary layer, the second electrode being selectively disposed in a region where the deposition preventing layer is not formed; an encapsulation layer, the encapsulation layer being provided on the deposition prevention layer and the second electrode; a polarizing layer, the polarizing layer being provided in the display area on the encapsulation layer; and an auxiliary device, the auxiliary device being provided in the transparent area below the substrate, The first light-emitting auxiliary layer includes a hole injection layer and a hole transport layer sequentially arranged on the first electrode. Wherein, the second light-emitting auxiliary layer includes an electron transport layer and an electron injection layer sequentially arranged on the light-emitting material layer, and wherein the surface energy of the electron injection layer is greater than the surface energy of the deposition prevention layer and less than the surface energy of the second electrode, wherein the auxiliary device is a camera or a fingerprint sensor, and The light absorptivity of the deposition preventing layer is equal to or less than 0.02 for light with a wavelength of 550 nm.

2. The device according to claim 1, wherein The electron injection layer has a capacity of equal to or greater than 0.5 J / m 2 The surface energy, Wherein, the deposition prevention layer has a strength of equal to or less than 0.2 J / m 2 The surface energy, and Wherein, the second electrode has a strength equal to or greater than 0.5 J / m 2 surface energy.

3. The device according to claim 1, wherein The deposition preventing layer has a glass transition temperature equal to or lower than 40° C., a refractive index equal to or greater than 1.7 for light of 550 nm wavelength, and to thickness.

4. The device according to claim 1, wherein The deposition prevention layer includes a ring-opening isomer diarylethene represented by the following Chemical Formula 1: [Chemical Formula 1] 。 5 . The device according to claim 1 , further comprising an anti-reflection layer provided in the transparent region on the encapsulation layer.

6. The apparatus according to claim 1, further comprising: a touch layer, the touch layer being disposed between the encapsulation layer and the polarizing layer; a cover glass, the cover glass being disposed on the polarizing layer; a back plate, the back plate being arranged between the base plate and the auxiliary equipment; as well as The system unit is arranged in the display area below the back panel.

7. The device according to claim 1, wherein The deposition preventing layer is provided only in the transparent region, and the second electrode is provided only in the display region.

8. A method for manufacturing a display device, comprising: Providing a substrate, the substrate comprising a display area having a plurality of first color sub-pixels and a transparent area within the display area, wherein the transparent area comprises a plurality of second color sub-pixels and a plurality of transparent sub-pixels alternating with the plurality of second color sub-pixels; forming an array layer in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the substrate; forming a first electrode in each of the plurality of first color sub-pixels and the plurality of second color sub-pixels on the array layer; forming a first light emitting auxiliary layer in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the first electrode and in the plurality of transparent sub-pixels above the substrate; forming a light-emitting material layer in each of the plurality of first color sub-pixels and the plurality of second color sub-pixels on the first light-emitting auxiliary layer; forming a second light-emitting auxiliary layer in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the light-emitting material layer and in the plurality of transparent sub-pixels on the first light-emitting auxiliary layer; forming a deposition preventing layer in the plurality of transparent sub-pixels on the second light emitting auxiliary layer; forming a second electrode in the plurality of first color sub-pixels and the plurality of second color sub-pixels on the second light emitting auxiliary layer, wherein the second electrode is selectively provided in a region where the deposition preventing layer is not formed; forming an encapsulation layer on the deposition preventing layer and the second electrode; forming a polarizing layer in the display area on the encapsulation layer; and forming auxiliary equipment in the transparent area below the substrate, The first light-emitting auxiliary layer includes a hole injection layer and a hole transport layer sequentially arranged on the first electrode. Wherein, the second light-emitting auxiliary layer includes an electron transport layer and an electron injection layer sequentially arranged on the light-emitting material layer, and wherein the surface energy of the electron injection layer is greater than the surface energy of the deposition prevention layer and less than the surface energy of the second electrode, wherein the auxiliary device is a camera or a fingerprint sensor, and The light absorptivity of the deposition preventing layer is equal to or less than 0.02 for light with a wavelength of 550 nm.

9. The method according to claim 8, wherein The step of forming the deposition prevention layer includes: Disposing a shadow mask having a shielding area and an opening area above the second light-emitting auxiliary layer; and depositing an organic material on the second light-emitting auxiliary layer through the opening area of ​​the shadow mask, The shielding area and the opening area correspond to the display area and the transparent area respectively.

10. The method according to claim 8, wherein The step of forming the second electrode includes depositing a metal material on the second light emitting auxiliary layer and the deposition preventing layer, and The metal material is desorbed from the deposition preventing layer and adsorbed on the second light-emitting auxiliary layer. The method according to claim 8 , further comprising forming an anti-reflection layer in the transparent region on the encapsulation layer.

12. The method according to claim 8, further comprising: forming a touch layer between the encapsulation layer and the polarizing layer; forming a cover glass on the polarizing layer; attaching a back plate to the rear surface of the substrate; as well as A system portion is provided in the display area below the back panel.

13. The method according to claim 8, wherein The deposition preventing layer is formed only in the transparent region, and the second electrode is formed only in the display region.

Images