Electroluminescent display device

Abstract

An electroluminescent display device includes: a substrate on which a display area and a non-display area are defined; a plurality of sub-pixels disposed in the display area on the substrate and arranged in a first direction and a second direction; a light-emitting diode disposed in each sub-pixel and including a first electrode, a light-emitting layer, and a second electrode; a first bank disposed between adjacent sub-pixels in the second direction and overlapping an edge of the first electrode; and a second bank disposed between adjacent sub-pixels in the first direction and having an opening corresponding to a sub-pixel column arranged in the second direction, wherein the opening includes a first portion corresponding to the display area and a second portion corresponding to the non-display area, and a bottom surface of the light-emitting layer in the second portion has uneven portions, and wherein an uneven pattern is provided below the light-emitting layer in the non-display area.

Description

[0001] Cross - reference to related applications

[0002] This application claims priority and the benefit of Korean Patent Application No. 10 - 2019 - 0162803, filed on December 9, 2019, which is incorporated herein by reference in its entirety. Technical field

[0003] The present invention relates to an electroluminescent display device, and more particularly, to an electroluminescent display device having a large size and high definition. Background art

[0004] As a flat panel display device, an electroluminescent display device has a wide viewing angle compared to a liquid crystal display device because it is self - emissive, and has the advantages of thin thickness, light weight, and low power consumption because it does not require a backlight unit.

[0005] In addition, the electroluminescent display device is driven by a low direct current (DC) voltage and has a fast response speed. In addition, the electroluminescent display device has strong resistance to external shocks because its components are solid and can be used in a wide temperature range. In particular, the electroluminescent display device can be manufactured at low cost.

[0006] The electroluminescent display device includes a plurality of pixels, each pixel having a red sub - pixel, a green sub - pixel, and a blue sub - pixel, and displays various color images by selectively emitting light from the red sub - pixel, the green sub - pixel, and the blue sub - pixel.

[0007] The red sub - pixel, the green sub - pixel, and the blue sub - pixel respectively have a red light - emitting layer, a green light - emitting layer, and a blue light - emitting layer, and each light - emitting layer is formed by a vacuum thermal evaporation process in which a fine metal mask (FMM) is used to selectively deposit a light - emitting material.

[0008] However, the evaporation process increases the manufacturing cost due to the preparation of the mask, and there are problems when applied to large - size and high - definition display devices due to mask manufacturing deviation, sagging, shadow effects, etc. Summary of the invention

[0009] Accordingly, the present invention aims to provide an electroluminescent display device that substantially overcomes one or more problems caused by the limitations and disadvantages of the related art.

[0010] An object of the present invention is to provide an electroluminescent display device having a large size and high definition.

[0011] Additional features and advantages of the present invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention may be realized and attained by the structure particularly pointed out in the specification, claims as well as the drawings.

[0012] To achieve these and other advantages and in accordance with the purpose of the present invention, as embodied and broadly described herein, there is provided an electroluminescent display device, comprising: a substrate on which a display area for displaying an image and a non-display area disposed outside the display area are defined; a plurality of sub-pixels disposed in the display area on the substrate and arranged in a first direction and a second direction; a light-emitting diode disposed in each of the plurality of sub-pixels and including a first electrode, a light-emitting layer, and a second electrode; a first bank disposed between sub-pixels adjacent in the second direction and overlapping an edge of the first electrode; and a second bank disposed between sub-pixels adjacent in the first direction and having an opening corresponding to a column of sub-pixels arranged in the second direction, wherein the opening includes a first portion corresponding to the display area and a second portion corresponding to the non-display area, and a bottom surface of the light-emitting layer in the second portion has uneven portions, and wherein an uneven pattern is provided below the light-emitting layer in the non-display area.

[0013] It should be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the claimed invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention.

[0015] In the drawings:

[0016] Figure 1 is a circuit diagram of a pixel area of an electroluminescent display device according to an embodiment of the present invention;

[0017] Figure 2 is a schematic cross-sectional view of an electroluminescent display device according to an embodiment of the present invention;

[0018] Figure 3 is a schematic plan view of an electroluminescent display device according to a first embodiment of the present invention;

[0019] Figure 4 is corresponding to Figure 3 a cross-sectional view taken along line I-I' of;

[0020] Figure 5 is a sectional view corresponding to line II-II' of Figure 3 ;

[0021] Figure 6 is a schematic enlarged plan view of an electroluminescent display device according to a first embodiment of the present invention;

[0022] Figures 7A to 7F is a schematic enlarged plan view of another example of an electroluminescent display device according to a first embodiment of the present invention;

[0023] Figure 8 is a schematic enlarged plan view of an electroluminescent display device according to a second embodiment of the present invention;

[0024] Figure 9 is a schematic sectional view of an electroluminescent display device according to a third embodiment of the present invention;

[0025] Figure 10 is a schematic sectional view of an electroluminescent display device according to a fourth embodiment of the present invention;

[0026] Figure 11A and Figure 11B are schematic sectional views of an electroluminescent display device according to a fifth embodiment of the present invention. Detailed Embodiments

[0027] Reference will now be made in detail to exemplary embodiments of the present invention, some examples of which are illustrated in the accompanying drawings.

[0028] An electroluminescent display device according to an embodiment of the present invention includes a plurality of pixels that display an image, and each of the plurality of pixels includes a red sub-pixel, a green sub-pixel, and a blue sub-pixel. A pixel region corresponding to each sub-pixel may have the configuration shown in Figure 1 .

[0029] Figure 1 is a circuit diagram of a pixel region of an electroluminescent display device according to an embodiment of the present invention.

[0030] In Figure 1 , an electroluminescent display device according to an embodiment of the present invention includes a plurality of gate lines and a plurality of data lines that cross each other to define a plurality of pixel regions. In particular, in the example of Figure 1 , a gate line GL and a data line DL cross each other to define a pixel region P. A switching thin-film transistor Ts, a driving thin-film transistor Td, a storage capacitor Cst, and a light-emitting diode De are formed in each pixel region P.

[0031] More specifically, the gate electrode of the switching thin film transistor Ts is connected to the gate line GL, and the source electrode of the switching thin film transistor Ts is connected to the data line DL. The gate electrode of the driving thin film transistor Td is connected to the drain electrode of the switching thin film transistor Ts, and the source electrode of the driving thin film transistor Td is connected to the high voltage power supply VDD. The anode of the light emitting diode De is connected to the drain electrode of the driving thin film transistor Td, and the cathode of the light emitting diode De is connected to the low voltage power supply VSS. The storage capacitor Cst is connected to the gate electrode and the drain electrode of the driving thin film transistor Td.

[0032] The electroluminescent display device is driven to display an image. For example, when the switching thin film transistor Ts is turned on by a gate signal applied through the gate line GL, the data signal from the data line DL is applied to the gate electrode of the driving thin film transistor Td and the electrode of the storage capacitor Cst through the switching thin film transistor Ts.

[0033] When the driving thin film transistor Td is turned on by the data signal, the current flowing through the light emitting diode De is controlled, thereby displaying an image. Due to the current provided from the high voltage power supply VDD through the driving thin film transistor Td, the light emitting diode De emits light.

[0034] That is to say, the amount of current flowing through the light emitting diode De is proportional to the magnitude of the data signal, and the intensity of the light emitted by the light emitting diode De is proportional to the amount of current flowing through the light emitting diode De. Therefore, the pixel region P displays different gray levels according to the magnitude of the data signal, and as a result, the electroluminescent display device displays an image.

[0035] In addition, when the switching thin film transistor Ts is turned off, the storage capacitor Cst holds the charge corresponding to the data signal for one frame. Therefore, even when the switching thin film transistor Ts is turned off, the storage capacitor Cst still keeps the amount of current flowing through the light emitting diode De constant and keeps the gray level displayed by the light emitting diode De until the next frame.

[0036] Meanwhile, in addition to the switching thin film transistor Ts, the driving thin film transistor Td, and the storage capacitor Cst, one or more thin film transistors and / or capacitors can be added in the pixel region P.

[0037] For example, in an electroluminescent display device, while a data signal is applied to the gate electrode of a driving thin film transistor Td, the driving thin film transistor Td is turned on for a relatively long time and a light emitting diode De emits light, thereby displaying a gray level. Due to the long-term application of the data signal, the driving thin film transistor Td may deteriorate. Therefore, the mobility and / or threshold voltage Vth of the driving thin film transistor Td change, and thus the pixel region P of the electroluminescent display device shows different gray levels for the same data signal. This results in uneven brightness, thereby reducing the image quality of the electroluminescent display device.

[0038] Therefore, in order to compensate for the change in the mobility and / or threshold voltage of the driving thin film transistor Td, at least one sensing thin film transistor and / or capacitor for sensing voltage change may be further added in the pixel region P. The sensing thin film transistor and / or capacitor may be connected to a reference line for applying a reference voltage and outputting a sensed voltage.

[0039] Figure 2 is a schematic cross-sectional view of an electroluminescent display device according to an embodiment of the present invention, which shows a pixel region.

[0040] In Figure 2 In the electroluminescent display device, a buffer layer 120 is formed on a substrate 110. The buffer layer 120 is provided on substantially the entire surface of the substrate 110. The substrate 110 may be a plastic substrate or a glass substrate. For example, polyimide may be used as the plastic substrate, but is not limited thereto. The buffer layer 120 may be formed of an inorganic material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ) and may be a single layer or a multi-layer.

[0041] A patterned semiconductor layer 122 is formed on the buffer layer 120. The semiconductor layer 122 may be formed of an oxide semiconductor layer, and a light-shielding pattern may be further formed under the semiconductor layer 122. The light-shielding pattern may block light incident on the semiconductor layer 122 and prevent the semiconductor layer 122 from deteriorating due to light. Alternatively, the semiconductor layer 122 may be formed of polysilicon, and both ends of the semiconductor layer 122 may be doped with impurities.

[0042] Above substantially the entire surface of the substrate 110, a gate insulating layer 130 of an insulating material is formed on the semiconductor layer 122. The gate insulating layer 130 may be formed of an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ) When the semiconductor layer 122 is made of an oxide semiconductor material, the gate insulating layer 130 may be formed of silicon oxide (SiO 2) is formed. Optionally, when the semiconductor layer 122 is made of polysilicon, the gate insulating layer 130 may be formed of silicon oxide (SiO 2 ) or silicon nitride (SiN x ).

[0043] A gate electrode 132 made of a conductive material such as metal is formed on the gate insulating layer 130 corresponding to the center of the semiconductor layer 122. In addition, a gate line and a first capacitor electrode may be formed on the gate insulating layer 130. The gate line extends in a first direction, and the first capacitor electrode is connected to the gate electrode 132.

[0044] In an embodiment of the present invention, the gate insulating layer 130 is formed above the entire surface of the substrate 110. However, the gate insulating layer 130 may be patterned to have the same shape as the gate electrode 132.

[0045] An interlayer insulating layer 140 made of an insulating material is formed on the gate electrode 132 above substantially the entire surface of the substrate 110. The interlayer insulating layer 140 may be formed of an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ). Optionally, the interlayer insulating layer 140 may be formed of an organic insulating material such as optical acrylic or benzocyclobutene.

[0046] The interlayer insulating layer 140 has a first contact hole 140a and a second contact hole 140b that expose the top surfaces of both ends of the semiconductor layer 122. The first contact hole 140a and the second contact hole 140b are provided on both sides of the gate electrode 132 and are separated from the gate electrode 132. The first contact hole 140a and the second contact hole 140b are also formed in the gate insulating layer 130. Optionally, when the gate insulating layer 130 is patterned to have the same shape as the gate electrode 132, the first contact hole 140a and the second contact hole 140b are only formed in the interlayer insulating layer 140.

[0047] A source electrode 142 and a drain electrode 144 made of a conductive material such as metal are formed on the interlayer insulating layer 140. In addition, a power supply line and a second capacitor electrode may be further formed on the interlayer insulating layer 140.

[0048] The source electrode 142 and the drain electrode 144 are separated from each other, and the gate electrode 132 is located therebetween. The source electrode 142 and the drain electrode 144 are respectively in contact with both ends of the semiconductor layer 122 through a first contact hole 140a and a second contact hole 140b. The data line extends in the second direction and intersects with the gate line, thereby defining a pixel region. The power supply line for providing a high voltage is separated from the data line. The second capacitor electrode is connected to the drain electrode 144. The second capacitor electrode overlaps with the first capacitor electrode with an interlayer insulating layer 140 as a dielectric therebetween, thereby constituting a storage capacitor. Optionally, the first capacitor electrode may be connected to the drain electrode 144, and the second capacitor electrode may be connected to the gate electrode 132.

[0049] The semiconductor layer 122, the gate electrode 132, the source electrode 142, and the drain electrode 144 form a thin film transistor Tr. The thin film transistor Tr has a coplanar structure in which, with respect to the semiconductor layer 122, the gate electrode 132 is on the same side as the source electrode 142 and the drain electrode 144.

[0050] Optionally, the thin film transistor Tr may have an inverted staggered structure in which, with respect to the semiconductor layer, the gate electrode is on a different side from the source electrode and the drain electrode. That is, the gate electrode may be disposed under the semiconductor layer, and the source electrode and the drain electrode may be disposed above the semiconductor layer. The semiconductor layer may be formed of an oxide semiconductor or amorphous silicon.

[0051] The thin film transistor Tr corresponds to Figure 1 the driving thin film transistor Td, and a switching thin film transistor Ts having the same structure as the driving thin film transistor Td may be further formed in the pixel region on the substrate 110. Figure 1 The gate electrode 132 of the driving thin film transistor Td may be connected to the drain electrode of the switching thin film transistor, and the source electrode 142 of the driving thin film transistor Td may be connected to the power supply line. In addition, the gate electrode and the source electrode of the switching thin film transistor may be respectively connected to the gate line and the data line.

[0052] A sensing thin film transistor having the same structure as the driving thin film transistor Td may be further formed in the pixel region on the substrate 110, but the present invention is not limited thereto.

[0053] On substantially the entire surface of the substrate 110, a passivation layer 150 of an insulating material is formed on the source electrode 142 and the drain electrode 144. The passivation layer 150 may be formed of an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ).

[0054] An overcoat layer 155 of an insulating material is formed on the passivation layer 150 over substantially the entire surface of the substrate 110. The overcoat layer 155 may be formed of an organic insulating material such as optical acrylic or benzocyclobutene. The overcoat layer 155 may have a flat top surface.

[0055] The overcoat layer 155 and the passivation layer 150 have a drain contact hole 155a that exposes the drain electrode 144. The drain contact hole 155a may be separated from the second contact hole 140b. Optionally, the drain contact hole 155a may be disposed directly above the second contact hole 140b.

[0056] A first electrode 162 formed of a conductive material having a relatively high work function is formed on the overcoat layer 155. The first electrode 162 is disposed in the pixel region and is in contact with the drain electrode 144 through the drain contact hole 155a. For example, the first electrode 162 may be formed of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO), but is not limited thereto.

[0057] The electroluminescent display device according to an embodiment of the present invention is a top-emitting type, in which light of the light-emitting diode De is output in a direction opposite to the substrate 110. Therefore, the first electrode 162 may further include a reflective electrode or a reflective layer formed of a metal material having a relatively high reflectivity under the transparent conductive material. For example, the reflective electrode or the reflective layer may be formed of an aluminum-palladium-copper (APC) alloy, silver (Ag), or aluminum (Al). The first electrode 162 may have a three-layer structure of ITO / APC / ITO, ITO / Ag / ITO, or ITO / Al / ITO, but is not limited thereto.

[0058] A bank of an insulating material is formed on the first electrode 162. The bank may include a first bank 172 having hydrophilic properties and a second bank 174 having hydrophobic properties.

[0059] More specifically, the first bank 172 overlaps with and covers the edge of the first electrode 162, and the first bank 172 exposes the central portion of the first electrode 162. The first bank 172 may be formed of a material having hydrophilic properties, for example, an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ). Optionally, the first bank 172 may be formed of polyimide.

[0060] The second bank 174 is formed on the first bank 172. At this time, at least the upper surface of the second bank 174 is hydrophobic, and the side surface of the second bank 174 may be hydrophobic or hydrophilic.

[0061] The second bank portion 174 has a width narrower than that of the first bank portion 172, is disposed on the first bank portion 172 and exposes the edge of the first bank portion 172. The thickness of the second bank portion 174 may be greater than the thickness of the first bank portion 172. The second bank portion 174 may overlap with the edge of the first electrode 162. Optionally, the second bank portion 174 may be separated from the first electrode 162 without overlapping.

[0062] The second bank portion 174 may be formed of an organic insulating material having hydrophobic properties. Optionally, the second bank portion 174 may be formed of an organic insulating material having hydrophilic properties and may be subjected to a hydrophobic treatment.

[0063] Meanwhile, only the first bank portion 172 may be provided on other edges of the first electrode 162 not shown in the figure. In addition, although the first bank portion 172 and the second bank portion 174 are formed on the edge of the first electrode 162 in Figure 2 , the first bank portion 172 may be omitted, and only the second bank portion 174 may overlap with and cover the edge of the first electrode 162.

[0064] In Figure 2 , the first bank portion 172 and the second bank portion 174 are formed of different materials respectively. However, the hydrophilic first bank portion 172 and the hydrophobic second bank portion 174 may be formed of the same material and integrally formed. For example, after an organic material layer having a hydrophobic upper surface is formed above substantially the entire surface of the substrate 110, the organic material layer may be exposed and patterned using a halftone mask including a light-transmitting portion, a light-shielding portion, and a semi-transmitting portion, thereby forming the first bank portion 172 and the second bank portion 174 having different widths and thicknesses.

[0065] In addition, the drain contact hole 155a is separated from the first bank portion 172 and the second bank portion 174, but is not limited thereto. Optionally, the drain contact hole 155a may be provided directly below the first bank portion 172 and the second bank portion 174.

[0066] Next, a light-emitting layer 180 is formed on the first electrode 162 exposed by the first bank portion 172 and the second bank portion 174.

[0067] The light-emitting layer 180 may include a first charge assisting layer, a light-emitting material layer, and a second charge assisting layer sequentially located above the first electrode 160. The light-emitting material layer may be formed of any one of a red light-emitting material, a green light-emitting material, and a blue light-emitting material, but is not limited thereto. The light-emitting material may be an organic light-emitting material such as a phosphorescent compound or a fluorescent compound, or may be an inorganic light-emitting material such as a quantum dot.

[0068] The first charge assisting layer may be a hole assisting layer, and the hole assisting layer may include at least one of a hole injection layer (HIL) and a hole transport layer (HTL). In addition, the second charge assisting layer may be an electron assisting layer, and the electron assisting layer may include at least one of an electron injection layer (EIL) and an electron transport layer (ETL). However, the present invention is not limited thereto.

[0069] The light emitting layer 180 is formed by a solution process. Accordingly, the process can be simplified and a display device having a large size and high definition can be provided. A spin coating method, an inkjet printing method, or a screen printing method may be used as the solution process, but the present invention is not limited thereto.

[0070] When drying the solution, the drying rate of the solvent in the region adjacent to the second bank 174 is different from that in other regions. That is, the drying rate of the solvent in the region adjacent to the second bank 174 is faster than that in other regions. Accordingly, the height of the light emitting layer 180 in the region adjacent to the second bank 174 increases as it gets closer to the second bank 174.

[0071] Meanwhile, among the layers of the light emitting layer 180, the electron assisting layer may be formed by a thermal evaporation process. At this time, the electron assisting layer may be formed over substantially the entire surface of the substrate 110.

[0072] Over substantially the entire surface of the substrate 110, a second electrode 190 made of a conductive material having a relatively low work function is formed on the light emitting layer 180. The second electrode 190 may be formed of aluminum (Al), magnesium (Mg), silver (Ag), or an alloy thereof. The second electrode 190 has a relatively thin thickness such that light from the light emitting layer 180 can pass therethrough. Alternatively, the second electrode 190 may be formed of a transparent conductive material such as indium gallium oxide (IGO), but is not limited thereto.

[0073] The first electrode 162, the light emitting layer 180, and the second electrode 190 constitute a light emitting diode De. The first electrode 162 may be used as an anode, and the second electrode 190 may be used as a cathode, but is not limited thereto.

[0074] As described above, the electroluminescent display device according to an embodiment of the present invention may be a top emission type, in which light from the light emitting layer 180 of the light emitting diode De is output in a direction opposite to the substrate 110, that is, output to the outside through the second electrode 190. The top emission type display device may have a wider light emitting area than a bottom emission type display device of the same size, thereby increasing the brightness and reducing the power consumption.

[0075] The light emitting diode De in each pixel region may have an element thickness corresponding to the wavelength of the emitted light for a microcavity effect, thereby increasing the light efficiency. Herein, the element thickness may be defined as the distance between the first electrode 162 and the second electrode 190, but is not limited thereto.

[0076] In addition, a protective layer and / or an encapsulation layer may be formed on the second electrode 190 above substantially the entire surface of the substrate 110 to block moisture or oxygen introduced from the outside, thereby protecting the light-emitting diode De.

[0077] As described above, in the electroluminescent display device according to an embodiment of the present invention, by forming some of the layers in the light-emitting layer 180 via a solution process, a fine metal mask is omitted, thereby reducing the manufacturing cost and enabling a display device having a large size and high definition to be realized.

[0078] Incidentally, when the light-emitting layer 180 is formed by a solution process, the solution is dropped once in each of a plurality of sub-pixels, and for this purpose, different nozzles are used for the respective sub-pixels. However, due to the deviation in the dropping amount of the nozzles, the thickness of the thin film formed in each sub-pixel varies. Therefore, in the present invention, the light-emitting layers 180 of the same color sub-pixels are connected to each other and formed as one body. Thus, the deviation in the dropping amount of the nozzles is minimized, and the thickness of the light-emitting layer 180 formed in each sub-pixel can be uniform.

[0079] will be referred to Figure 3 to describe the structure of the electroluminescent display device according to the first embodiment of the present invention.

[0080] Figure 3 is a schematic plan view of the electroluminescent display device according to the first embodiment of the present invention, mainly showing the bank structure.

[0081] In Figure 3 the electroluminescent display device 1000 according to the first embodiment of the present invention includes a display area DA for displaying an image and a non-display area NDA provided outside the display area DA. Here, the non-display area NDA is shown as being provided on the upper side and the lower side of the display area DA, but is not limited thereto. Optionally, the non-display area NDA may be provided on the left side and the right side of the display area DA.

[0082] In a display area DA, a red sub-pixel R, a green sub-pixel G, and a blue sub-pixel B are provided. The red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B are arranged in sequence along a first direction, and sub-pixels R, G, and B of the same color are arranged along a second direction. For example, the R sub-pixel, the G sub-pixel, and the B sub-pixel are repeatedly arranged in sequence along the first direction (e.g., the horizontal direction), and columns of the R sub-pixel, columns of the G sub-pixel, and columns of the B sub-pixel are repeatedly arranged in sequence along the second direction (e.g., the vertical direction). Herein, each of the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B is shown to have a rectangular shape, but is not limited thereto. Each of the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B may have various shapes, such as a rectangular shape with rounded corners, an oval shape, etc.

[0083] A first bank 172 having a hydrophilic property is provided between adjacent sub-pixels R, G, B of the same color and between adjacent sub-pixels R, G, B of different colors. Optionally, the first bank 172 may be omitted between adjacent sub-pixels R, G, B of different colors. That is to say, the first bank 172 may be formed between sub-pixels R, G, B adjacent along the second direction and may extend along the first direction.

[0084] In addition, the first bank 172 is also provided in a non-display area NDA and may be formed to surround all sub-pixels R, G, and B.

[0085] A second bank 174 having a hydrophobic property is provided on the first bank 172. In the display area DA, the second bank 174 has an opening 176 corresponding to a column of sub-pixels of the same color and is provided between adjacent sub-pixels R, G, B of different colors. Therefore, the opening 176 extends along the second direction, and the opening 176 has a length in the second direction that is greater than the length in the first direction, i.e., the width. In other words, the opening 176 has a short side parallel to the first direction and a long side parallel to the second direction. At this time, the second bank 174 may have a width narrower than that of the first bank 172 between adjacent sub-pixels R, G, B of different colors.

[0086] In addition, the second bank 174 is also provided in the non-display area NDA, and the opening 176 of the second bank 174 extends into the non-display area NDA. Herein, at least one uneven pattern (not shown) may be provided corresponding to the second opening 176 in the non-display area NDA, which will be described in detail below.

[0087] Meanwhile, although not shown in the figures, a plurality of virtual sub-pixels may be provided in the non-display area NDA, and the opening 176 of the second bank 174 may be formed to correspond to the virtual sub-pixels. At this time, one or more virtual sub-pixels may be provided on each side of the upper and lower sides of each sub-pixel column. Except for the connection structure, the virtual sub-pixels may have the same structure as the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B. Alternatively, the virtual sub-pixels may have a structure different from that of the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B.

[0088] Reference will be made to Figure 4 and Figure 5 describe the cross-sectional structure of the electroluminescent display device 1000 according to the first embodiment of the present invention.

[0089] Figure 4 is a cross-sectional view corresponding to the line I-I' of Figure 3 and Figure 5 is a cross-sectional view corresponding to the line II-II' of Figure 3 .

[0090] As Figure 4 and Figure 5 shown, in the electroluminescent display device 1000 according to the first embodiment of the present invention, a display area DA and a non-display area NDA are defined on the substrate 110, and a plurality of pixel areas P corresponding to the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B are defined in the display area DA. The buffer layer 120 is formed on substantially the entire surface of the substrate 110, and the buffer layer 120 is provided in both the display area DA and the non-display area NDA.

[0091] Next, a thin film transistor Tr is formed on the buffer layer 120 in each pixel area P. Above substantially the entire surface of the substrate 110, a passivation layer 150 and a coating layer 155 are sequentially formed on the thin film transistor Tr, and the passivation layer 150 and the coating layer 155 are provided in both the display area DA and the non-display area NDA. Next, a first electrode 162 is formed on the coating layer 155 in each pixel area P.

[0092] Here, the thin film transistor Tr may have the structure shown in Figure 2 , but is not limited thereto. In addition, although not shown in the figures, a gate insulating layer and an interlayer insulating layer may be further formed between the buffer layer 120 and the passivation layer 150.

[0093] In each pixel area P, the coating layer 155 and the passivation layer 150 together have a drain contact hole 155a that exposes a part of the thin film transistor Tr, that is, the drain electrode. The first electrode 162 contacts the drain electrode of the thin film transistor Tr through the drain contact hole 155a.

[0094] In addition, at least one uneven pattern 200 is formed on the coating layer 155 in the non-display area NDA. The uneven pattern 200 can be formed of an inorganic insulating material such as silicon oxide (SiO 2 ), or silicon nitride (SiN x ). However, the present invention is not limited thereto, and the uneven pattern 200 can be formed of a metal material.

[0095] Preferably, the thickness of the uneven pattern 200 is equal to or greater than 30 nm. In addition, the thickness of the uneven pattern 200 can be equal to or less than 500 nm, but is not limited thereto.

[0096] On the other hand, when virtual sub-pixels are provided in the non-display area NDA, virtual thin film transistors having the same structure as the thin film transistor Tr in the pixel area P can be formed between the buffer layer 120 and the passivation layer 150 in each virtual sub-pixel, and virtual electrodes can be formed on the coating layer 155 in each virtual sub-pixel. At this time, the uneven pattern 200 can be formed on the virtual electrode. Here, the passivation layer 150 and the coating layer 155 do not have drain contact holes exposing the virtual thin film transistors in the virtual sub-pixels, so in the virtual sub-pixels, the virtual electrodes are not connected to the virtual thin film transistors.

[0097] However, the structure of the virtual sub-pixels is not limited thereto. For example, at least one of the virtual thin film transistors and the virtual electrodes can be omitted.

[0098] A first bank 172 having hydrophilic properties is formed on the first electrode 162. The first bank 172 overlaps the edge of the first electrode 162 and covers the edge of the first electrode 162. The first bank 172 is formed between adjacent same-color sub-pixels R, G, B and between adjacent different-color sub-pixels R, G, B. Optionally, the first bank 172 can be omitted between adjacent different-color sub-pixels R, G, B, and the first bank 172 can be provided only between adjacent same-color sub-pixels R, G, B.

[0099] In addition, the first bank 172 can be formed on substantially the entire non-display area NDA and can cover the uneven pattern 200. At this time, the top surface of the first bank 172 in the non-display area NDA has unevenness due to the uneven pattern 200. Optionally, the first bank 172 can be removed in the non-display area NDA, and the uneven pattern 200 can be exposed.

[0100] Meanwhile, when virtual sub-pixels are provided in the non-display area NDA, the first bank 172 can overlap the edge of the virtual electrode and cover the edge of the virtual electrode, and expose the central portion of the virtual electrode.

[0101] The first bank 172 can be made of a material with hydrophilic properties, such as an inorganic insulating material such as silicon oxide (SiO 2 ) or silicon nitride (SiN x ). Optionally, the first bank 172 can be formed of polyimide.

[0102] A second bank 174 with hydrophobic properties is formed on the first bank 172. The second bank 174 has a greater thickness than the first bank 172. The second bank 174 is formed only between adjacent sub-pixels R, G, B of different colors and not between adjacent sub-pixels R, G, B of the same color. The width of the second bank 174 is narrower than the width of the first bank 172 between adjacent sub-pixels R, G, B of different colors.

[0103] The second bank 174 has openings 176 corresponding to the columns of sub-pixels of the same color and exposes the first electrodes 162 of the columns of sub-pixels of the same color and the first bank 172 between adjacent first electrodes 162 through the openings 176. In addition, the openings 176 extend into the non-display area NDA and expose the first bank 172 on the uneven pattern 200.

[0104] Here, when the first bank 172 is omitted between adjacent sub-pixels R, G, B of different colors, the second bank 174 contacts and overlaps the edge of each first electrode 162 of Figure 4 and covers the edge of each first electrode 162 of Figure 4 .

[0105] The second bank 174 can be formed of an organic insulating material with hydrophobic properties. Optionally, the second bank 174 can be formed of an organic insulating material with hydrophilic properties and can be subjected to a hydrophobic treatment.

[0106] The first bank 172 and the second bank 174 can be formed of the same material and formed integrally. At this time, the first bank 172 and the second bank 174 can be formed by a halftone mask process.

[0107] An emission layer 180 is formed on the first electrode 162 exposed through the openings 176 of the second bank 174 in each pixel region P. Here, a red emission layer is formed in the red sub-pixel R, a green emission layer is formed in the green sub-pixel G, and a blue emission layer is formed in the blue sub-pixel B.

[0108] In addition, the emission layer 180 is also formed on the first bank 172 exposed through the openings 176 of the second bank 174 between adjacent sub-pixels R, G, B of the same color. That is, in Figure 5In this case, the green light-emitting layer 180 is also formed on the first bank 172 exposed through the opening 176 of the second bank 174 between adjacent green sub-pixels G. At this time, the light-emitting layer 180 on the first bank 172 is connected to the light-emitting layer 180 on the first electrode 162 in each pixel region P adjacent thereto, and thus is formed as a single body.

[0109] Meanwhile, as described above, the opening 176 of the second bank 174 extends into the non-display area NDA, and thus the light-emitting layer 180 is also formed in the non-display area NDA. The light-emitting layer 180 in the non-display area NDA is connected to the light-emitting layer 180 in the pixel region P of the display area DA, and thus is formed as a single body. At this time, the opening 176 of the second bank 174 exposes the first bank 172 on the uneven pattern 200 in the non-display area NDA, and the light-emitting layer 180 is formed on the first bank 172 in the non-display area NDA.

[0110] Here, since the top surface of the first bank 172 has uneven portions, the bottom surface of the light-emitting layer 180 in contact with the top surface of the first bank 172 also has uneven portions. At this time, the concave portions on the bottom surface of the light-emitting layer 180 correspond to the convex portions on the top surface of the first bank 172, and the convex portions on the bottom surface of the light-emitting layer 180 correspond to the concave portions on the top surface of the first bank 172.

[0111] Optionally, the first bank 172 may be removed in the non-display area NDA. In this case, the opening 176 of the second bank 174 may expose the uneven pattern 200 and the coating layer 155 in the non-display area NDA, and the light-emitting layer 180 may be in contact with the uneven pattern 200 and the coating layer 155 in the non-display area NDA.

[0112] At this time, due to the uneven pattern 200, the bottom surface of the light-emitting layer 180 may have uneven portions, the concave portions on the bottom surface of the light-emitting layer 180 may correspond to the uneven pattern 200, and the convex portions on the bottom surface of the light-emitting layer 180 may correspond to the regions between adjacent uneven patterns 200.

[0113] The light-emitting layer 180 is formed through a solution process. Here, the solutions dropped into the respective pixel regions P corresponding to the same-color sub-pixels, for example, the green sub-pixel columns, through different nozzles are connected to each other, and the light-emitting layer 180 is formed by drying the solutions. Therefore, the deviation in the dropping amount between the nozzles is minimized, and the thickness of the light-emitting layer 180 formed in each pixel region P can be uniform.

[0114] At this time, due to the structure below the light-emitting layer 180 corresponding to the non-display area NDA, that is, the top surface of the first bank 172 is configured to have uneven portions due to the uneven pattern 200, the contact area between the light-emitting layer 180 and the first bank 172 in the non-display area NDA increases, and the adhesion and friction force between the light-emitting layer 180 and the first bank 172 increase. Accordingly, the solution dropped into the opening 176 is prevented from concentrating in the center of the display area DA.

[0115] Next, a second electrode 190 is formed on the light-emitting layer 180 and the second bank 174. Here, the second electrode 190 is also formed on the top surface and the side surface of the second bank 174 and is in contact with the top surface and the side surface of the second bank 174.

[0116] The first electrode 162, the light-emitting layer 180, and the second electrode 190 constitute a light-emitting diode De.

[0117] As described above, in the electroluminescent display device 1000 according to the first embodiment of the present invention, the light-emitting layers 180 of the same color sub-pixels R, G, and B are connected to each other and formed as a single body, thereby minimizing the deviation in the dropping amount between the nozzles and uniformly forming the thickness of the light-emitting layers 180 of the sub-pixels R, G, and B. Accordingly, moiré can be prevented, thereby preventing a reduction in the image quality of the display device.

[0118] In addition, the top surface of the first bank 172 below the light-emitting layer 180 corresponding to the non-display area NDA has uneven portions due to the uneven pattern 200, and the adhesion and friction force between the light-emitting layer 180 and the first bank 172 in the non-display area NDA increase. Accordingly, the solution dropped into the opening 176 is prevented from concentrating in the center of the display area DA, thereby preventing a problem in that the light-emitting layer 180 is not formed in the pixel areas P provided at both ends of the same color sub-pixel column.

[0119] Reference will be made to Figure 6 describe in detail the uneven pattern according to the first embodiment of the present invention.

[0120] Figure 6 is a schematic enlarged plan view of an electroluminescent display device according to the first embodiment of the present invention, which shows Figure 3 area A1 of.

[0121] In Figure 6 therein, a display area DA and a non-display area NDA are defined, and a first bank 172 having a hydrophilic property is formed to surround each sub-pixel B of the display area DA. Alternatively, the first bank 172 may be provided only on the upper side and the lower side of each sub-pixel B.

[0122] In addition, the first dam portion 172 is formed over substantially the entire non-display area NDA. Optionally, the first dam portion 172 may be removed in the non-display area NDA.

[0123] A second dam portion 174 having a hydrophobic property is formed on the first dam portion 172. The second dam portion 174 has openings 176 corresponding to columns of sub-pixels of the same color.

[0124] The openings 176 include a first portion 176a provided in the display area DA and a second portion 176b provided in the non-display area NDA. The openings 176 have a width in a first direction and a length in a second direction perpendicular to the first direction.

[0125] At this time, the length of the first portion 176a of the opening 176 corresponds to the length of the columns of sub-pixels of the same color arranged in the second direction, and the length of the second portion 176b is greater than the length of each sub-pixel B in the second direction. The length of the second portion 176b may be 10 times or less the length of the sub-pixel B, and advantageously, may be greater than or equal to 5 times the length of the sub-pixel B and less than or equal to 10 times the length of the sub-pixel B. For example, the length of the second portion 176b may be 1 mm or greater, but is not limited thereto.

[0126] In addition, the first portion 176a and the second portion 176b of the opening 176 may have the same width.

[0127] Meanwhile, a plurality of uneven patterns 200 are formed in the non-display area NDA. The uneven patterns 200 may be provided below the first dam portion 172. Optionally, the first dam portion 172 may be removed in the non-display area NDA, and the uneven patterns 200 may be exposed.

[0128] The uneven patterns 200 extend in the first direction and are spaced apart from each other in the second direction. Accordingly, each uneven pattern 200 has a length in the first direction and a width in the second direction.

[0129] The uneven patterns 200 may have the same length. Optionally, the uneven patterns 200 may have different lengths, and the length of the uneven patterns 200 may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction.

[0130] The length of the uneven patterns 200 may be greater than 0 and equal to or less than the pixel pitch p1. Here, the pixel pitch p1 is the pitch of each column of sub-pixels, and may be the distance between the centers of two adjacent sub-pixels in the first direction. When the length of the uneven patterns 200 is the same as the pixel pitch p1, the uneven patterns 200 may be respectively connected to other uneven patterns adjacent to them in the first direction.

[0131] In addition, the uneven pattern 200 may have the same width. Optionally, the uneven pattern 200 may have different widths, and the width of the uneven pattern 200 may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction. For example, the width of the uneven pattern 200 may be 10 μm or greater. In addition, the width of the uneven pattern 200 may be 40 μm or less, but is not limited thereto.

[0132] The distance between adjacent uneven patterns 200 in the second direction may be the same. Optionally, the distance between adjacent uneven patterns 200 may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction. For example, the distance between adjacent uneven patterns 200 may be 10 μm or greater. In addition, the distance between adjacent uneven patterns 200 may be 40 μm or less, but is not limited thereto.

[0133] At this time, as it moves away from the first portion 176a of the opening 176, the length of the uneven pattern 200 may decrease, the width of the uneven pattern 200 may decrease, or the distance between adjacent uneven patterns 200 may decrease, thereby further increasing the contact area between the solution dropped into the opening 176 and the underlying layer at both ends of the opening 176. Therefore, the concentration of the solution in the center of the display area DA can be further prevented.

[0134] As described above, in the electroluminescent display device 1000 according to the first embodiment, since the uneven pattern 200 is provided in the opening 176 corresponding to the non-display area NDA and the adhesion and friction between the solution dropped into the opening 176 and the underlying layer in the non-display area NDA are increased, the solution dropped into the opening 176 can be prevented from concentrating in the center of the display area DA.

[0135] will be referred to Figures 7A to 7F Other examples of the electroluminescent display device including the uneven pattern will be described in detail.

[0136] Figures 7A to 7F is a schematic enlarged plan view of another example of the electroluminescent display device according to the first embodiment of the present invention. The same parts as Figure 6 are denoted by the same reference numerals, and the description of the same parts will be shortened or omitted.

[0137] In Figure 7A the uneven pattern 200a may extend in a third direction intersecting the first and second directions. That is, the uneven pattern 200a may be formed at a predetermined angle with respect to the first direction or the second direction.

[0138] Compared with Figure 6 the uneven pattern 200 of Figure 7AThe uneven pattern 200a increases the contact area between the solution dropped into the dropping opening 176 and the underlying layer in the non-display area NDA, thereby further preventing the solution dropped into the dropping opening 176 from concentrating in the center of the display area DA.

[0139] The uneven patterns 200a may have the same length. Optionally, the uneven patterns 200a may have different lengths, and the length of the uneven pattern 200a may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction.

[0140] In addition, the uneven patterns 200a may have the same width. Optionally, the uneven patterns 200a may have different widths, and the width of the uneven pattern 200a may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction.

[0141] In addition, the distance between adjacent uneven patterns 200a may be the same. Optionally, the distance between adjacent uneven patterns 200a may increase or decrease as it moves away from the first portion 176a of the opening 176 in the second direction.

[0142] At this time, as it moves away from the first portion 176a of the opening 176, the length of the uneven pattern 200a may decrease, the width of the uneven pattern 200a may decrease, or the distance between adjacent uneven patterns 200a may decrease, thereby further increasing the contact area between the solution dropped into the dropping opening 176 and the underlying layer at both ends of the opening 176. Therefore, the concentration of the solution in the center of the display area DA can be further prevented.

[0143] Meanwhile, the uneven patterns 200a may be respectively connected to other uneven patterns corresponding to the sub-pixel columns adjacent to them in the first direction.

[0144] Next, in Figure 7B and Figure 7C each of the uneven patterns 200b and 200c may have at least one bent portion. The uneven patterns 200b and 200c extend substantially in the first direction and are separated from each other in the second direction.

[0145] As Figure 7B shown, the bent portion of the uneven pattern 200b may be arranged to protrude toward the center of the opening 176 in the second direction. Optionally, as Figure 7C shown, the bent portion of the uneven pattern 200c may be arranged to protrude toward the edge of the opening 176 in the second direction.

[0146] Compared with the uneven pattern 200 of Figure 6 Figure 7B and Figure 7CThe uneven patterns 200b and 200c increase the contact area between the solution dropped into the dropping opening 176 and the underlying layer in the non-display area NDA, thereby further preventing the solution dropped into the dropping opening 176 from concentrating in the center of the display area DA.

[0147] The uneven patterns 200b and 200c may have the same length. Optionally, the uneven patterns 200b and 200c may have different lengths, and the lengths of the uneven patterns 200b and 200c may increase or decrease as they are farther from the first portion 176a of the opening 176 along the second direction.

[0148] In addition, the uneven patterns 200b and 200c may have the same width. Optionally, the uneven patterns 200b and 200c may have different widths, and the widths of the uneven patterns 200b and 200c may increase or decrease as they are farther from the first portion 176a of the opening 176 along the second direction.

[0149] In addition, the distance between adjacent uneven patterns 200b and 200c may be the same. Optionally, the distance between adjacent uneven patterns 200b and 200c may increase or decrease as they are farther from the first portion 176a of the opening 176 along the second direction.

[0150] At this time, as they are farther from the first portion 176a of the opening 176, the lengths of the uneven patterns 200b and 200c may decrease, the widths of the uneven patterns 200b and 200c may decrease, or the distance between adjacent uneven patterns 200b and 200c may decrease, thereby further increasing the contact area between the solution dropped into the dropping opening 176 and the underlying layer at both ends of the opening 176. Therefore, the concentration of the solution in the center of the display area DA can be further prevented.

[0151] Meanwhile, the uneven patterns 200b and 200c may be respectively connected to other uneven patterns corresponding to the sub-pixel columns adjacent to them along the first direction.

[0152] As Figure 7D shown, each uneven pattern 200d may have two bending portions. The uneven patterns 200d extend generally along the first direction and are separated from each other along the second direction. Therefore, one bending portion protrudes toward the center of the opening 176 along the second direction, and the other bending portion protrudes toward the edge of the opening 176 along the second direction.

[0153] Compared with Figure 6 the uneven pattern 200 Figure 7D the uneven pattern 200d increases the contact area between the solution dropped into the dropping opening 176 and the underlying layer in the non-display area NDA, thereby further preventing the solution dropped into the dropping opening 176 from concentrating in the center of the display area DA.

[0154] The uneven patterns 200d may have the same length. Optionally, the uneven patterns 200d may have different lengths, and the length of the uneven patterns 200d may increase or decrease as it moves away from the first part 176a of the opening 176 along the second direction.

[0155] In addition, the uneven patterns 200d may have the same width. Alternatively, the uneven patterns 200d may have different widths, and the width of the uneven patterns 200d may increase or decrease as it moves away from the first part 176a of the opening 176 along the second direction.

[0156] Moreover, the distance between adjacent uneven patterns 200d may be the same. Optionally, the distance between adjacent uneven patterns 200d may increase or decrease as it moves away from the first part 176a of the opening 176 along the second direction.

[0157] At this time, as it moves away from the first part 176a of the opening 176, the length of the uneven pattern 200d may decrease, the width of the uneven pattern 200d may decrease, or the distance between adjacent uneven patterns 200d may decrease, thereby further increasing the contact area between the solution dropped into the opening 176 and the lower layer at both ends of the opening 176. Therefore, the concentration of the solution in the center of the display area DA can be further prevented.

[0158] Meanwhile, the uneven patterns 200d may be respectively connected to other uneven patterns corresponding to the sub-pixel columns adjacent to them in the first direction.

[0159] As Figure 7E shown, each uneven pattern 200e may generally have a rhombus shape and may be separated from each other in the second direction. At this time, the diagonal of each uneven pattern 200e may have a length smaller than the width of the opening 176.

[0160] In Figure 7E it is described that one uneven pattern 200e is arranged in the first direction in the second part 176b of the opening 176, but it is not limited thereto. Optionally, two or more uneven patterns 200e may be arranged in the first direction in the second part 176b of the opening 176.

[0161] The uneven patterns 200e may have the same size. Optionally, the uneven patterns 200e may have different sizes, and the size of the uneven patterns 200e may increase or decrease as it moves away from the first part 176a of the opening 176 along the second direction.

[0162] Moreover, the distance between adjacent uneven patterns 200e may be the same. Optionally, the distance between adjacent uneven patterns 200e may increase or decrease as it moves away from the first part 176a of the opening 176 along the second direction.

[0163] At this time, as the first part 176a is away from the opening 176, the size of the uneven pattern 200e may decrease, or the distance between adjacent uneven patterns 200e may decrease, thereby further increasing the contact area between the solution dropped into the opening 176 and the lower layer at both ends of the opening 176. Therefore, the concentration of the solution in the center of the display area DA can be further prevented.

[0164] As Figure 7F shown, the uneven pattern 200 may extend in a first direction and may be separated from each other in a second direction, and the opening 176 may have different widths in the display area DA and the non-display area NDA.

[0165] That is to say, the opening 176 includes a first part 176a provided in the display area DA and a second part 176c provided in the non-display area NDA, and the width of the second part 176c may be smaller than the width of the first part 176a.

[0166] Compared with Figure 6 the uneven pattern 200 of Figure 7F since the opening 176 of

[0167] In the first embodiment of the present invention, it is described that the uneven pattern 200 is formed on the coating layer, but it is not limited thereto. The position of the uneven pattern 200 may vary.

[0168] That is to say, as long as the lower layer under the light-emitting layer has uneven portions, the uneven pattern may be formed under the coating layer. At this time, the uneven pattern may include one or more patterns having a relatively large step difference, and the one or more patterns may overlap each other. The one or more patterns may be formed of an additional insulating material or may be formed of the same metal material as the line or electrode on the same layer as the line or electrode.

[0169] Meanwhile, red light-emitting diodes, green light-emitting diodes, and blue light-emitting diodes are formed using light-emitting materials with different characteristics and are respectively provided in the red sub-pixels, green sub-pixels, and blue sub-pixels. Therefore, the red light-emitting diodes, green light-emitting diodes, and blue light-emitting diodes have different lifetimes and efficiencies, and due to the difference in the lifetimes of the light-emitting diodes, the lifetime of the electroluminescent display device is reduced.

[0170] Therefore, in the present invention, by making the sizes of the red sub-pixels, green sub-pixels, and blue sub-pixels different, the lifetimes and efficiencies of the light-emitting diodes provided in the respective sub-pixels can be optimized, thereby solving the problem of reduced lifetime of the electroluminescent display device and increasing the lifetime of the electroluminescent display device. To this end, reference will be made to Figure 8 Describe an electroluminescent display device according to a second embodiment of the present invention.

[0171] Figure 8 FIG. is a schematic enlarged plan view of an electroluminescent display device according to a second embodiment of the present invention. The electroluminescent display device of the second embodiment has substantially the same configuration as the electroluminescent display device of the first embodiment, except for the sizes of the sub-pixels, the sizes of the openings, and the uneven patterns. Parts identical to those of the first embodiment are denoted by the same reference numerals, and the description of the same parts will be abbreviated or omitted.

[0172] As Figure 8 shown in, in an electroluminescent display device 2000 according to a second embodiment of the present invention, red sub-pixels R, green sub-pixels G, and blue sub-pixels B are sequentially arranged in a display area DA in a first direction. In addition, although not shown in the figure, sub-pixels R, G, and B of the same color are arranged in a second direction perpendicular to the first direction.

[0173] Here, the red sub-pixels R, green sub-pixels G, and blue sub-pixels B have different sizes. The sizes of the red sub-pixels R, green sub-pixels G, and blue sub-pixels B are determined by considering the lifetimes of the light-emitting diodes provided in the respective sub-pixels. For example, the size of the green sub-pixel G may be larger than the size of the red sub-pixel R and smaller than the size of the blue sub-pixel B. At this time, the red sub-pixels R, green sub-pixels G, and blue sub-pixels B may have the same length in the second direction and may have different widths in the first direction. The width of the green sub-pixel G may be larger than the width of the red sub-pixel R and smaller than the width of the blue sub-pixel B. However, the present invention is not limited thereto.

[0174] The red sub-pixels R, green sub-pixels G, and blue sub-pixels B can be defined by a first bank 172 and a second bank 174.

[0175] More specifically, the first bank 172 is provided between adjacent sub-pixels R, G, B of the same color and between adjacent sub-pixels R, G, B of different colors. The first bank 172 can surround each sub-pixel R, G, and B.

[0176] Optionally, the first bank 172 can be omitted between adjacent sub-pixels R, G, B of different colors. That is, the first bank 172 can be formed only between sub-pixels R, G, B adjacent in the second direction and can extend in the first direction.

[0177] In addition, the first dam portion 172 is formed in the non-display area NDA. Optionally, the first dam portion 172 may be removed in the non-display area NDA.

[0178] Next, a second dam portion 174 is formed on the first dam portion 172. The second dam portion 174 has openings 176 corresponding to the same-color sub-pixel columns and is disposed between different-color sub-pixels R, G, B adjacent to each other in the first direction.

[0179] Here, the openings 176 include a first opening 1761, a second opening 1762, and a third opening 1763 corresponding to the red sub-pixel R column, the green sub-pixel G column, and the blue sub-pixel B column, respectively. The first opening 1761, the second opening 1762, and the third opening 1763 have different widths. For example, the width of the second opening 1762 may be greater than the width of the first opening 1761 and less than the width of the third opening 1763, but is not limited thereto.

[0180] The first opening 1761, the second opening 1762, and the third opening 1763 extend into the non-display area NDA. Accordingly, each of the first opening 1761, the second opening 1762, and the third opening 1763 includes a first portion 176a corresponding to the display area DA and a second portion 176b corresponding to the non-display area NDA.

[0181] The second portions 176b of the first opening 1761, the second opening 1762, and the third opening 1763 may have the same width as the first portions 176a of the first opening 1761, the second opening 1762, and the third opening 1763. Optionally, the second portions 176b of the first opening 1761, the second opening 1762, and the third opening 1763 may have a width narrower than the width of the first portions 176a of the first opening 1761, the second opening 1762, and the third opening 1763.

[0182] Meanwhile, an uneven pattern 200 is formed in the non-display area NDA. The uneven pattern 200 may be disposed under the first dam portion 172. Optionally, the first dam portion 172 may be removed in the non-display area NDA, thereby exposing the uneven pattern 200.

[0183] Here, the uneven pattern 200 includes a first pattern 210, a second pattern 220, and a third pattern 230 corresponding to the first opening 1761, the second opening 1762, and the third opening 1763, respectively. At this time, the first pattern 210, the second pattern 220, and the third pattern 230 have different numbers. For example, the number of the second pattern 220 is greater than the number of the first pattern 210 and less than the number of the third pattern 230, but is not limited thereto.

[0184] The number of the uneven patterns 200 may be proportional to the width of the opening 176. That is, as the width of the opening 176 increases, the number of the uneven patterns 200 may increase. Here, as the width of the opening 176 increases, the solution further concentrates on the center of the display area DA. Therefore, by increasing the number of the uneven patterns 200, the contact area between the solution dropped into the opening 176 and the lower layer increases in the non-display area NDA.

[0185] In addition, at least one of the first pattern 210, the second pattern 220, and the third pattern 230 may be connected to each other. For example, the first pattern 210, the second pattern 220, and the third pattern 230 disposed at the outermost sides at both ends along the second direction may be connected to each other, but it is not limited thereto.

[0186] As described above, in the electroluminescent display device 2000 according to the second embodiment of the present invention, the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B are configured to have different sizes, so that the lifetimes and efficiencies of the light-emitting diodes provided in the respective sub-pixels can be optimized.

[0187] In addition, the uneven patterns 200 are provided corresponding to the openings 176 in the non-display area NDA, and the uneven patterns 200 have different numbers corresponding to the red sub-pixel columns, the green sub-pixel columns, and the blue sub-pixel columns, respectively. Therefore, it is possible to prevent the solution dropped into the openings 176 corresponding to each of the red sub-pixel columns, the green sub-pixel columns, and the blue sub-pixel columns from concentrating on the center of the display area DA.

[0188] Meanwhile, in the above embodiment, the uneven pattern is described as an additional pattern, but the uneven pattern can be configured in various ways.

[0189] Figure 9 FIG. is a schematic cross-sectional view of an electroluminescent display device according to the third embodiment of the present invention. The electroluminescent display device of the third embodiment has substantially the same structure as the electroluminescent display device of the first embodiment, except for the uneven pattern. The same parts as those in the first embodiment are denoted by the same reference numerals, and the description of the same parts will be shortened or omitted.

[0190] As Figure 9 shown, in the electroluminescent display device 3000 according to the third embodiment of the present invention, the uneven pattern may be a recessed portion 300 provided on the top surface of the first bank 172.

[0191] More specifically, a display area DA and a non-display area NDA are defined on a substrate 110, and a plurality of pixel areas P corresponding to red sub-pixels R, green sub-pixels G, and blue sub-pixels B are defined in the display area DA. A buffer layer 120 is formed on substantially the entire surface of the substrate 110, and thin film transistors Tr are formed on the buffer layer 120 in each pixel area P. A passivation layer 150 and a coating layer 155 are sequentially formed on the thin film transistors Tr above substantially the entire surface of the substrate 110, and a first electrode 162 is formed on the coating layer 155 in each pixel area P. The first electrode 162 contacts the drain electrode of the thin film transistor Tr through a drain contact hole 155a formed in the coating layer 155 and the passivation layer 150.

[0192] Next, a first bank 172 having hydrophilic characteristics is formed on the first electrode 162. The first bank 172 overlaps with and covers the edge of the first electrode 162. In addition, the first bank 172 is formed on substantially the entire non-display area NDA.

[0193] In the non-display area NDA, the first bank 172 has at least one recess 300 on its top surface. Therefore, the top surface of the first bank 172 has unevenness in the non-display area NDA.

[0194] Here, the depth of the recess 300 is less than the thickness of the first bank 172. The recess 300 may have Figure 6 and Figures 7A to 7E the planar structure shown in, but is not limited thereto.

[0195] The recess 300 can be formed by the process of forming the first bank 172, and no additional process is required to form the recess 300. That is, the first bank 172 having the recess 300 can be formed by a photolithography process using a halftone mask including a light-shielding portion, a light-transmitting portion, and a semi-transmitting portion. At this time, the semi-transmitting portion of the halftone color corresponds to the recess 300.

[0196] A second bank 174 having hydrophobic characteristics is formed on the first bank 172. The second bank 174 has an opening 176 corresponding to the same color sub-pixel column, and the opening 176 extends into the non-display area NDA.

[0197] The opening 176 includes a first portion 176a provided in the display area DA and a second portion 176b provided in the non-display area NDA. The first portion 176a of the opening 176 exposes the first electrode 162 of the same color sub-pixel column and the first bank 172 between adjacent first electrodes 162, and the second portion 176b exposes the first bank 172 having the recess 300.

[0198] The light-emitting layer 180 is formed on the first electrode 162 exposed through the opening 176 of the second bank 174 in each pixel region P. At this time, the light-emitting layer 180 is also formed on the first bank 172 exposed through the first part 176a of the opening 176 between adjacent same-color sub-pixels R, G, B, and the light-emitting layer 180 on the first bank 172 is connected to the light-emitting layer 180 on the first electrode 162 in the adjacent pixel region P, thereby being formed as a single body.

[0199] In addition, the light-emitting layer 180 is also formed on the first bank 172 exposed through the second part 176b of the opening 176 in the non-display area NDA. The light-emitting layer 180 in the non-display area NDA is connected to the light-emitting layer 180 in the pixel region P of the display area DA, thereby being formed as a single body.

[0200] Here, since the top surface of the first bank 172 has uneven portions due to the recessed portions 300, the bottom surface of the light-emitting layer 180 in contact with the top surface of the first bank 172 also has uneven portions. At this time, the concave portions on the bottom surface of the light-emitting layer 180 correspond to the convex portions on the top surface of the first bank 172, and the convex portions on the bottom surface of the light-emitting layer 180 correspond to the concave portions on the top surface of the first bank 172.

[0201] The light-emitting layer 180 is formed by a solution process. Here, the solutions dropped into the respective pixel regions P corresponding to the same-color sub-pixels through different nozzles are connected to each other, and the light-emitting layer 180 is formed by drying the solutions. Therefore, the deviation in the dropping amount between the nozzles is minimized, and the thickness of the light-emitting layer 180 formed in each pixel region P can be uniform.

[0202] At this time, due to the structure below the light-emitting layer 180 corresponding to the non-display area NDA, that is, the top surface of the first bank 172 is configured to have uneven portions due to the recessed portions 300, the contact area between the light-emitting layer 180 and the first bank 172 in the non-display area NDA increases, and the adhesion force and frictional force between the light-emitting layer 180 and the first bank 172 increase. Therefore, the solution dropped into the opening 176 is prevented from concentrating in the center of the display area DA.

[0203] Next, a second electrode 190 is formed on the light-emitting layer 180 and the second bank 174. The first electrode 162, the light-emitting layer 180, and the second electrode 190 constitute a light-emitting diode De.

[0204] In the electroluminescent display device 3000 according to the third embodiment of the present invention, since the top surface of the first bank 172 in the non-display area NDA and the bottom surface of the light-emitting layer 180 have uneven portions due to the recess 300 and the recess 300 is formed by the process of forming the first bank 172, compared with the first embodiment in which the uneven pattern is formed by an additional process, the manufacturing process and cost can be reduced.

[0205] Figure 10 FIG. is a schematic cross-sectional view of an electroluminescent display device according to a fourth embodiment of the present invention. The electroluminescent display device of the fourth embodiment has substantially the same configuration as the electroluminescent display device of the first embodiment, except for the uneven pattern. The same parts as those in the first embodiment are denoted by the same reference numerals, and the description of the same parts will be abbreviated or omitted.

[0206] As Figure 10 shown in, in the electroluminescent display device 4000 according to the fourth embodiment of the present invention, the uneven pattern may be a hole 400 provided in the first bank 172.

[0207] More specifically, a display area DA and a non-display area NDA are defined on a substrate 110, and a plurality of pixel areas P corresponding to a red sub-pixel R, a green sub-pixel G, and a blue sub-pixel B are defined in the display area DA. A buffer layer 120 is formed on substantially the entire surface of the substrate 110, and a thin-film transistor Tr is formed on the buffer layer 120 in each pixel area P. Above substantially the entire surface of the substrate 110, a passivation layer 150 and a coating layer 155 are sequentially formed on the thin-film transistor Tr, and a first electrode 162 is formed on the coating layer 155 in each pixel area P. The first electrode 162 contacts the drain electrode of the thin-film transistor Tr through a drain contact hole 155a formed in the coating layer 155 and the passivation layer 150.

[0208] Next, a first bank 172 having hydrophilic properties is formed on the first electrode 162. The first bank 172 overlaps the edge of the first electrode 162 and covers the edge of the first electrode 162. In addition, the first bank 172 is formed on substantially the entire non-display area NDA.

[0209] In the non-display area NDA, the first bank 172 has at least one hole 400. Therefore, the first bank 172 has uneven portions in the non-display area NDA, and the top surface of the coating layer 155 is exposed through the hole 400.

[0210] Here, the depth of the hole 400 is the same as the thickness of the first bank 172. The hole 400 may have Figure 6 and Figures 7A to 7F the planar structure shown in, but is not limited thereto.

[0211] The hole 400 can be formed by the process of forming the first bank 172, and no additional process is required to form the hole 400.

[0212] A second bank 174 having a hydrophobic property is formed on the first bank 172. The second bank 174 has openings 176 corresponding to sub-pixel columns of the same color, and the openings 176 extend into the non-display area NDA.

[0213] The opening 176 includes a first portion 176a provided in the display area DA and a second portion 176b provided in the non-display area NDA. The first portion 176a of the opening 176 exposes the first electrodes 162 of the sub-pixel columns of the same color and the first bank 172 between the adjacent first electrodes 162, and the second portion 176b exposes the first bank 172 having the hole 400.

[0214] An emission layer 180 is formed on the first electrodes 162 exposed through the openings 176 of the second bank 174 in each pixel region P. At this time, the emission layer 180 is also formed on the first bank 172 exposed through the first portion 176a of the opening 176 between the adjacent sub-pixels R, G, B of the same color, and the emission layer 180 on the first bank 172 is connected to the emission layer 180 on the first electrode 162 in the adjacent pixel region P, thereby being formed integrally.

[0215] In addition, the emission layer 180 is also formed on the first bank 172 exposed through the second portion 176b of the opening 176 in the non-display area NDA. The emission layer 180 in the non-display area NDA is connected to the emission layer 180 in the pixel region P of the display area DA, thereby being formed integrally.

[0216] Here, since the first bank 172 has concavo-convex portions due to the hole 400, the bottom surface of the emission layer 180 in contact with the first bank 172 also has concavo-convex portions. At this time, the concave portions of the bottom surface of the emission layer 180 correspond to the convex portions of the first bank 172, and the convex portions of the bottom surface of the emission layer 180 correspond to the concave portions of the first bank 172, that is, the hole 400. The emission layer 180 contacts the top surface of the coating layer 155 through the hole 400.

[0217] The emission layer 180 is formed by a solution process. Here, the solutions dropped into the respective pixel regions P corresponding to the sub-pixels of the same color through different nozzles are connected to each other, and the emission layer 180 is formed by drying the solutions. Therefore, the deviation in the dropping amount between the nozzles is minimized, and the thickness of the emission layer 180 formed in each pixel region P can be uniform.

[0218] At this time, due to the structure below the light-emitting layer 180 corresponding to the non-display area NDA, that is, the first bank 172 is configured to have uneven portions due to the holes 400, the contact area between the light-emitting layer 180 and the first bank 172 in the non-display area NDA increases, and the adhesion and friction between the light-emitting layer 180 and the first bank 172 increase. Therefore, the solution dropped into the opening 176 is prevented from concentrating in the center of the display area DA.

[0219] Next, a second electrode 190 is formed on the light-emitting layer 180 and the second bank 174. The first electrode 162, the light-emitting layer 180, and the second electrode 190 constitute a light-emitting diode De.

[0220] In the electroluminescent display device 4000 according to the fourth embodiment of the present invention, since the bottom surface of the light-emitting layer 180 and the first bank 172 in the non-display area NDA have uneven portions due to the holes 400 and the holes 400 are formed by the process of forming the first bank 172, compared with the first embodiment in which an uneven pattern is formed by an additional process, the manufacturing process and cost can be reduced.

[0221] Figure 11A and Figure 11B is a schematic cross-sectional view of an electroluminescent display device according to the fifth embodiment of the present invention. The electroluminescent display device of the fifth embodiment has substantially the same structure as the electroluminescent display device of the first embodiment, except for the uneven pattern. The same parts as those in the first embodiment are denoted by the same reference numerals, and the description of the same parts will be shortened or omitted.

[0222] As Figure 11A and Figure 11B shown in, in the electroluminescent display device 5000 according to the fifth embodiment of the present invention, the uneven pattern may be a recess 500 provided on the top surface of the coating layer 155.

[0223] More specifically, a display area DA and a non-display area NDA are defined on the substrate 110, and a plurality of pixel areas P corresponding to a red sub-pixel R, a green sub-pixel G, and a blue sub-pixel B are defined in the display area DA. The buffer layer 120 is formed on substantially the entire surface of the substrate 110, and a thin film transistor Tr is formed on the buffer layer 120 in each pixel area P. Above substantially the entire surface of the substrate 110, a passivation layer 150 and a coating layer 155 are sequentially formed on the thin film transistor Tr, and a first electrode 162 is formed on the coating layer 155 in each pixel area P. The first electrode 162 contacts the drain electrode of the thin film transistor Tr through a drain contact hole 155a formed in the coating layer 155 and the passivation layer 150.

[0224] At this time, the coating layer 155 in the non-display area NDA has at least one recess 500 on its top surface. Therefore, the top surface of the coating layer 155 has uneven portions in the non-display area NDA.

[0225] Here, the depth of the recess 500 is less than the thickness of the coating layer 155. The recess 500 may have Figure 6 and Figures 7A to 7F the planar structure shown in, but is not limited thereto.

[0226] The recess 500 can be formed by the process of forming the coating layer 155, and no additional process is required to form the recess 500. That is, the recess 500 can be formed by a photolithography process using a halftone mask including a light-shielding portion, a light-transmitting portion, and a semi-transmitting portion. At this time, the semi-transmitting portion of the halftone mask corresponds to the recess 500.

[0227] A first bank 172 having hydrophilic characteristics is formed on the first electrode 162. The first bank 172 overlaps with the edge of the first electrode 162 and covers the edge of the first electrode 162. In addition, the first bank 172 is formed on substantially the entire non-display area NDA.

[0228] As Figure 11A shown in, the first bank 172 can be formed on substantially the entire non-display area NDA. At this time, since the top surface of the coating layer 155 in the non-display area NDA has uneven portions, the top surface of the first bank 172 formed on the coating layer 155 also has uneven portions.

[0229] Optionally, as Figure 11B shown in, the first bank 172 can be removed in the non-display area NDA. Therefore, the top surface of the coating layer 155 having uneven portions can be exposed in the non-display area NDA.

[0230] A second bank 174 having hydrophobic characteristics is formed on the first bank 172. The second bank 174 has an opening 176 corresponding to the same-color sub-pixel columns, and the opening 176 extends into the non-display area NDA.

[0231] The opening 176 includes a first portion 176a provided in the display area DA and a second portion 176b provided in the non-display area NDA. The first portion 176a of the opening 176 exposes the first electrode 162 of the same-color sub-pixel columns and the first bank 172 between adjacent first electrodes 162, and the second portion 176b exposes Figure 11A the top surface of the first bank 172 having uneven portions in Figure 11B or the top surface of the coating layer 155 having uneven portions in.

[0232] A light-emitting layer 180 is formed on a first electrode 162 exposed through an opening 176 of a second bank 174 in each pixel region P. At this time, the light-emitting layer 180 is also formed on a first bank 172 exposed through a first portion 176a of the opening 176 between adjacent same-color sub-pixels R, G, B, and the light-emitting layer 180 on the first bank 172 is connected to the light-emitting layer 180 on the first electrode 162 in an adjacent pixel region P, thereby being formed as one body.

[0233] In addition, the light-emitting layer 180 is also formed on a first bank 172 exposed through a second portion 176b of the opening 176 in a non-display area NDA Figure 11A or on a coating layer 155 Figure 11B . The light-emitting layer 180 in the non-display area NDA is connected to the light-emitting layer 180 in a pixel region P of a display area DA, thereby being formed as one body. In Figure 11A , the light-emitting layer 180 in the non-display area NDA contacts the first bank 172; in Figure 11B , the light-emitting layer 180 in the non-display area NDA contacts the coating layer 155 and the first bank 172.

[0234] Here, since Figure 11A the top surface of the first bank 172 or Figure 11B the top surface of the coating layer 155 has uneven portions, the bottom surface of the light-emitting layer 180 contacting Figure 11A the top surface of the first bank 172 or Figure 11B the top surface of the coating layer 155 also has uneven portions. At this time, the concave portions on the bottom surface of the light-emitting layer 180 correspond to Figure 11A the convex portions of the first bank 172 or Figure 11B the convex portions of the coating layer 155, and the convex portions on the bottom surface of the light-emitting layer 180 correspond to Figure 11A the concave portions of the first bank 172 or Figure 11B the concave portions of the coating layer 155.

[0235] The light-emitting layer 180 is formed through a solution process. Here, the solutions dropped into respective pixel regions P corresponding to same-color sub-pixels are connected to each other through different nozzles, and the light-emitting layer 180 is formed by drying the solutions. Therefore, the deviation in the dropping amount between the nozzles is minimized, and the thickness of the light-emitting layer 180 formed in each pixel region P can be uniform.

[0236] At this time, due to the structure below the light-emitting layer 180 corresponding to the non-display area NDA, that is, Figure 11A the top surface of the coating layer 155 and the first bank 172 or Figure 11BThe top surface of the coating layer 155 is configured to have uneven portions due to the recessed portions 500 of the coating layer 155. Thus, the contact area between the light-emitting layer 180 and the first bank 172 or between the light-emitting layer 180 and the coating layer 155 in the non-display area NDA increases, and the adhesion and frictional force between the light-emitting layer 180 and the first bank 172 or between the light-emitting layer 180 and the coating layer 155 increase. Therefore, the solution dropped into the opening 176 is prevented from concentrating in the center of the display area DA.

[0237] Next, a second electrode 190 is formed on the light-emitting layer 180 and the second bank 174. The first electrode 162, the light-emitting layer 180, and the second electrode 190 constitute a light-emitting diode De.

[0238] In the electroluminescent display device 5000 according to the fifth embodiment of the present invention, since the top surface of the first bank 172 and / or the coating layer 155 and the bottom surface of the light-emitting layer 180 in the non-display area NDA have uneven portions due to the recessed portions 500 of the coating layer 155 and the recessed portions 500 are formed by the process of forming the coating layer 155, compared with the first embodiment in which an uneven pattern is formed by an additional process, the manufacturing process and cost can be reduced.

[0239] Meanwhile, in an electroluminescent display device according to another embodiment of the present invention, the uneven pattern in the non-display area NDA may be a hole provided in the coating layer 155, but is not limited thereto.

[0240] In the present invention, by forming the light-emitting layer of each sub-pixel via a solution process, a fine metal mask is omitted, thereby reducing the manufacturing cost, and a display device having a large size and high definition can be realized.

[0241] In addition, the light-emitting layers of the same-color sub-pixels are connected to each other to form an integral body, thereby minimizing the deviation in the dropping amount between the nozzles and uniformly forming the thickness of the light-emitting layer of the sub-pixels. Therefore, moiré can be prevented, thereby preventing the image quality of the display device from deteriorating.

[0242] In addition, an uneven pattern is provided in the non-display area such that the bottom surface of the light-emitting layer in the non-display area has uneven portions, and the contact area between the light-emitting layer and the underlying layer in the non-display area increases. Therefore, the solution dropped into the opening is prevented from concentrating in the center of the display area, thereby preventing the problem that the light-emitting layer is not formed at the edge of the display area.

[0243] In addition, the uneven pattern in the non-display area is configured as a recessed portion or a hole of the first bank or the coating layer, and the uneven pattern can be formed without increasing the manufacturing process and cost.

[0244] In addition, since the red sub-pixels, green sub-pixels, and blue sub-pixels are configured to have different sizes, the lifetimes of the red sub-pixels, green sub-pixels, and blue sub-pixels can be consistent. The uneven patterns corresponding to the red sub-pixels, green sub-pixels, and blue sub-pixels are configured to have different numbers, which can prevent the solutions corresponding to the red sub-pixel columns, green sub-pixel columns, and blue sub-pixel columns from being concentrated differently in the center of the display area due to different sizes.

[0245] It will be apparent to those skilled in the art that various modifications and variations can be made in the device of the present invention without departing from the spirit or scope of the embodiments. Accordingly, the present invention is intended to cover modifications and variations of the present invention that fall within the scope of the appended claims and their equivalents.

Claims

1. An electroluminescent display device, comprising: a substrate on which a display area for displaying an image and a non-display area disposed outside the display area are defined; a plurality of sub-pixels disposed in the display area on the substrate and arranged in a first direction and a second direction; a light-emitting diode disposed in each of the plurality of sub-pixels and including a first electrode, a light-emitting layer, and a second electrode; a first bank disposed between adjacent sub-pixels along the second direction and overlapping an edge of the first electrode; and a second bank disposed between adjacent sub-pixels along the first direction and having an opening corresponding to a column of sub-pixels arranged along the second direction, wherein the opening includes a first part corresponding to the display area and a second part corresponding to the non-display area, and a bottom surface of the light-emitting layer in the second part has uneven portions, wherein an uneven pattern is provided below the light-emitting layer in the non-display area, and wherein the uneven pattern includes a plurality of patterns extending along the first direction and spaced apart from each other along the second direction.

2. The electroluminescent display device according to claim 1, wherein the uneven pattern is a recess provided at a top surface of the first bank.

3. The electroluminescent display device according to claim 1, wherein the uneven pattern is a hole provided in the first bank.

4. The electroluminescent display device according to claim 3, further comprising a coating layer between the substrate and the first electrode, wherein in the non-display area, the light-emitting layer is in contact with the coating layer.

5. The electroluminescent display device according to claim 1, further comprising a coating layer between the substrate and the first electrode, wherein the uneven pattern is a recess provided at a top surface of the coating layer.

6. The electroluminescent display device according to claim 1, further comprising a coating layer between the substrate and the first electrode, wherein the uneven pattern is formed between the first bank and the coating layer.

7. The electroluminescent display device according to claim 1, wherein the uneven pattern has at least one bent portion.

8. The electroluminescent display device according to claim 1, wherein the first bank has a hydrophilic property and the second bank has a hydrophobic property.

9. The electroluminescent display device according to claim 1, wherein the first bank and the second bank are formed integrally.

10. The electroluminescent display device according to claim 1, wherein the light-emitting layer is formed on the first electrode of the sub-pixels arranged along the second direction and on the first bank between adjacent sub-pixels arranged along the second direction, and thus is formed integrally.

11. The electroluminescent display device according to claim 1, further comprising at least one thin-film transistor between the substrate and the first electrode, and the first electrode is connected to the at least one thin-film transistor.

12. An electroluminescent display device, comprising: A substrate, on which a display area for displaying an image and a non-display area disposed outside the display area are defined; A plurality of sub-pixels, the plurality of sub-pixels being disposed in the display area on the substrate and arranged in a first direction and a second direction; A light-emitting diode, the light-emitting diode being disposed in each of the plurality of sub-pixels and including a first electrode, a light-emitting layer, and a second electrode; A first bank, the first bank being disposed between adjacent sub-pixels along the second direction and overlapping an edge of the first electrode; And A second bank, the second bank being disposed between adjacent sub-pixels along the first direction and having an opening corresponding to a column of sub-pixels arranged along the second direction, Wherein the opening includes a first portion corresponding to the display area and a second portion corresponding to the non-display area, and a bottom surface of the light-emitting layer in the second portion has uneven portions, Wherein an uneven pattern is provided below the light-emitting layer in the non-display area, and Wherein the opening includes a first opening, a second opening, and a third opening respectively corresponding to a first sub-pixel column, a second sub-pixel column, and a third sub-pixel column, and each of the first sub-pixel column, the second sub-pixel column, and the third sub-pixel column includes a plurality of sub-pixels arranged along the second direction, Wherein along the first direction, a width of the second sub-pixel column is greater than a width of the first sub-pixel column and less than a width of the third sub-pixel column, Wherein the uneven patterns respectively corresponding to the first opening, the second opening, and the third opening have different numbers of patterns.

13. The electroluminescent display device according to claim 12, wherein a number of patterns corresponding to the second opening is greater than a number of patterns corresponding to the first opening and less than a number of patterns corresponding to the third opening.

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