Touch panel, touch panel manufacturing method and display device

Abstract

The present disclosure provides a touch panel, a touch panel manufacturing method and a display device, comprising: a substrate; a first insulating layer disposed on the substrate, a first electrode layer disposed on the first insulating layer, a second insulating layer disposed on the first electrode layer, and a second electrode layer disposed on the second insulating layer; a third insulating layer is disposed between the first electrode layer and the first insulating layer, and the etching rate of the third insulating layer is lower than the etching rates of the first electrode layer and the first insulating layer. The present disclosure provides a third insulating layer with an etching rate lower than the first electrode layer between the first electrode layer and the first insulating layer. When the first electrode layer is partially etched due to the difference in etching rate, the etching gas is prevented from etching the first insulating layer due to the protection of the third insulating layer, thereby preventing the first insulating layer from having a large difference in roughness due to etching, thereby preventing the overall whitening of the macro touch screen.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a touch panel, a touch panel manufacturing method, and a display device. Background Art

[0002] During the production process of touch screens, after the first electrode layer is etched, you may find that the entire surface of the product is whitened when you check it macroscopically. After analysis, it is found that the serious whitening is caused by the large difference in surface roughness after the insulating film layer is etched, which causes the overall whitening of the touch screen. Summary of the invention

[0003] In view of this, an object of the present disclosure is to provide a touch panel, a touch panel manufacturing method and a display device.

[0004] Based on the above purpose, the present disclosure provides a touch panel, comprising: a substrate; a first insulating layer disposed on the substrate, a first electrode layer disposed on the first insulating layer, a second insulating layer disposed on the first electrode layer, and a second electrode layer disposed on the second insulating layer;

[0005] A third insulating layer is disposed between the first electrode layer and the first insulating layer, and an etching speed of the third insulating layer is lower than an etching speed of the first electrode layer and the first insulating layer.

[0006] In some embodiments, the third insulating layer is a silicon oxide film layer.

[0007] In some embodiments, the third insulating layer coincides with an orthographic projection of the first electrode layer on the substrate.

[0008] In some embodiments, the thickness of the third insulating layer is to

[0009] In some embodiments, the first insulating layer and the second insulating layer are silicon nitride film layers.

[0010] In some embodiments, the second electrode layer coincides with the orthographic projection of the first electrode layer on the substrate.

[0011] In some embodiments, an organic protective layer is disposed on the second electrode layer.

[0012] Based on the same concept, the present disclosure also provides a touch panel manufacturing method, comprising:

[0013] forming a first insulating layer, a third insulating layer and a first electrode layer in sequence on a substrate;

[0014] Etching the first electrode layer and the third insulating layer according to a preset pattern;

[0015] A second insulating layer and a second electrode layer are sequentially formed on the etched first electrode layer.

[0016] In some embodiments, it further comprises:

[0017] After forming the second electrode layer, etching the second electrode layer according to a preset pattern;

[0018] An organic protective layer is formed on the etched second electrode layer.

[0019] Based on the same concept, the present disclosure also provides a display device, including: the touch panel as described above.

[0020] From the above, it can be seen that the present disclosure provides a touch panel, a touch panel manufacturing method and a display device, comprising: a substrate; a first insulating layer arranged on the substrate, a first electrode layer arranged on the first insulating layer, a second insulating layer arranged on the first electrode layer, and a second electrode layer arranged on the second insulating layer; a third insulating layer is arranged between the first electrode layer and the first insulating layer, and the etching rate of the third insulating layer is lower than the etching rate of the first electrode layer and the first insulating layer. The present disclosure arranges a third insulating layer with an etching rate lower than the first electrode layer between the first electrode layer and the first insulating layer. When the first electrode layer is partially etched due to the difference in etching rate, the etching gas is prevented from etching the first insulating layer due to the protection of the third insulating layer, thereby preventing the large difference in roughness of the surface of the first insulating layer caused by etching, thereby preventing the overall whitening of the macro touch screen. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure or related technologies, the drawings required for use in the embodiments or related technical descriptions will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1 A schematic diagram of the structure of a defective touch panel proposed in an embodiment of the present disclosure;

[0023] Figure 2 A schematic diagram of the structure of a touch panel proposed in an embodiment of the present disclosure;

[0024] Figure 3 A schematic diagram of a process for manufacturing a touch panel according to an embodiment of the present disclosure;

[0025] Figure 4 A schematic diagram of the hierarchical structure of a touch panel before etching in a touch panel manufacturing method proposed in an embodiment of the present disclosure;

[0026] Figure 5 A schematic diagram of the hierarchical structure of a touch panel after etching is completed in a touch panel manufacturing method proposed in an embodiment of the present disclosure;

[0027] Figure 6 A schematic diagram of the hierarchical structure of a touch panel after etching according to a touch panel manufacturing method proposed in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solutions and advantages of this specification more clear, this specification is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0029] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the embodiments of the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements, objects or method steps appearing before the word cover the elements, objects or method steps listed after the word and their equivalents, without excluding other elements, objects or method steps. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0030] As described in the background technology section, in the current process, Figure 1As shown, when the first electrode layer 120 (Metal1) is etched, due to the difference in etching rate, part of the first electrode layer 120 has been etched within the set etching time, while other areas have not been etched. That is, there will be a moment when the first electrode layer 120 is being etched slowly while the first insulating layer 110 is being etched quickly. The final result is that, first, due to the different degrees of etching of the first insulating layer 110, the surface roughness of the first insulating layer 110 product varies greatly, causing macroscopic whitening; second, severe whitening can be found as black granular foreign matter under the microscopic view, and FIB (Focused Ion beam) analysis shows metal residue, that is, due to the difference in etching rate, the etching of the local slow etching area of ​​the first electrode layer 120 is not completely completed, resulting in metal residue.

[0031] In view of the above-mentioned actual situation, the embodiment of the present disclosure proposes a touch panel, in which a third insulating layer with an etching rate lower than that of the first electrode layer and the first insulating layer is arranged between the first electrode layer and the first insulating layer. When the first electrode layer is partially etched due to the difference in etching rate, the etching gas is prevented from etching the first insulating layer due to the protection of the third insulating layer, thereby preventing the large difference in roughness of the surface of the first insulating layer caused by etching, thereby preventing the overall whitening of the macro touch screen and the problem of metal residue.

[0032] like Figure 2 , which is a schematic structural diagram of a touch panel provided by the present disclosure, comprising: a substrate 100; a first insulating layer 110 disposed on the substrate 100, a first electrode layer 120 disposed on the first insulating layer 110, a second insulating layer 130 disposed on the first electrode layer 120, and a second electrode layer 140 disposed on the second insulating layer 130;

[0033] A third insulating layer 150 is disposed between the first electrode layer 120 and the first insulating layer 110 . An etching rate of the third insulating layer 150 is lower than an etching rate of the first electrode layer 120 and the first insulating layer 110 .

[0034] Among them, the substrate 100 is a product from the touch control process, that is, other components such as display components mainly used for display in the touch panel. In order to accurately receive the touch signal in the existing touch panel process, the touch layer is generally placed above the display layer, so that the substrate 100 is the display layer components and other related components or film layers. Afterwards, the first insulating layer 110 and the second insulating layer 130 mainly play the functions of insulation and transition. For the insulating layer, it can be an organic insulating layer or an inorganic insulating layer. The material of the organic insulating layer can be polyimide, polyethylene terephthalate, etc., and the material of the inorganic insulating layer can be silicon oxide or silicon nitride, etc. Afterwards, the first electrode layer 120 and the second electrode layer 140 are mainly used to achieve the purpose of touch through the interaction and change between the two. The user changes the specific parameters between the first electrode layer and the second electrode layer by pressing, touching, etc. on the touch panel, so as to determine the user's touch operation. The touch panel can generally be divided into a resistive touch panel, a capacitive touch panel, etc.

[0035] Afterwards, a third insulating layer 150 is arranged between the first electrode layer 120 and the first insulating layer 110, and the etching speed of the third insulating layer is lower than the etching speed of the first electrode layer and the first insulating layer, so that when etching, when the first electrode layer is partially etched first due to the different etching rates, the etching gas will be concentrated on the unetched part of the first electrode layer because the etching speed of the third insulating layer is slower, thereby accelerating the etching speed of the unetched part of the first electrode layer and completing the etching of the first electrode layer as a whole as soon as possible. At the same time, due to the presence of the third insulating layer, the first insulating layer is protected from being etched, ensuring that there will be no large roughness difference on the surface of the first insulating layer product. The third insulating layer accelerates the etching speed of the unetched part of the first electrode layer due to the slow etching speed, and at the same time, the etching gas gathers in these parts of the third insulating layer, so that the etching speed of these parts can catch up with the first etched third insulating layer, thereby achieving smooth etching of the entire third insulating layer. In addition, even if there is residue after etching, it will not cause the harm of excessive roughness.

[0036] At the same time, the thickness of the third insulating layer can be controlled so that it can solve the problems of large differences in product surface roughness and metal residue, while making the third insulating layer as free of residue as possible in the etched part, thereby preventing it from affecting other functions of the touch panel. to etc.

[0037] From the above description, it can be seen that the touch panel provided by the present disclosure includes: a substrate; a first insulating layer arranged on the substrate, a first electrode layer arranged on the first insulating layer, a second insulating layer arranged on the first electrode layer, and a second electrode layer arranged on the second insulating layer; a third insulating layer is arranged between the first electrode layer and the first insulating layer, and the etching rate of the third insulating layer is lower than the etching rates of the first electrode layer and the first insulating layer. The present disclosure arranges a third insulating layer with an etching rate lower than the first electrode layer between the first electrode layer and the first insulating layer. When the first electrode layer is partially etched due to the difference in etching rate, the etching gas is prevented from etching the first insulating layer due to the protection of the third insulating layer, thereby preventing the large difference in roughness of the surface of the first insulating layer caused by etching, thereby preventing the overall whitening of the macro touch screen.

[0038] In a specific application scenario, in order to ensure that the etching speed of the third insulating layer is lower than the etching speed of the first electrode layer and to minimize the impact on the overall touch panel performance, the third insulating layer is a silicon oxide film layer (SiO2 film layer). And the thickness of the third insulating layer is to Since the etching rate of SiO2 is relatively slow, after testing, a very thin SiO2 film layer is added on the first insulating layer. The etching of the first insulating layer can be blocked to a certain extent.

[0039] After the first electrode layer is etched faster, the SiO2 film (with a lower etching rate) will block the etching gas from etching the first insulating layer, which is equivalent to increasing the etching gas in the first electrode layer that is etched slower. Therefore, the problem of large differences in product surface roughness can be solved, and the problem of metal residue can also be solved.

[0040] In specific application scenarios, in order to prevent the third insulating layer from affecting the overall function of the touch panel. Figure 2 As shown, the third insulating layer 150 and the first electrode layer 120 overlap in orthographic projection on the substrate 100 .

[0041] Among them, the orthographic projections of the third insulating layer 150 and the first electrode layer 120 on the substrate 100 coincide, and it can be considered that the third insulating layer 150 and the first electrode layer 120 are etched with the same pattern, so that after etching is completed, the first electrode layer can completely cover the third insulating layer, thereby preventing other touch panel defects caused by excessive exposure of the third insulating layer.

[0042] In a specific application scenario, in order to realize the required functions of the touch panel, the functional requirements of other components such as the display panel in the substrate are also met. The first insulating layer and the second insulating layer are silicon nitride film layers (SiN X film layer).

[0043] The first insulating layer and the second insulating layer are SiN X 1 Film layer and SiN X 2. Film layer. In order to meet the optical effect of the touch panel and ensure that the image displayed by the display panel under the touch panel can be accurately and clearly transmitted, the first insulating layer and the second insulating layer are both made of silicon nitride film layers. If the silicon nitride film layer is replaced with other types of insulating film layers such as silicon oxide film layers, it will generally affect optical transmission, so the silicon nitride film layer is selected.

[0044] In specific application scenarios, in order to realize the touch function of the touch panel. Figure 2 As shown, the orthographic projections of the second electrode layer 140 and the first electrode layer 120 on the substrate 100 overlap.

[0045] Among them, the orthographic projections of the second electrode layer 140 and the first electrode layer 120 on the substrate 100 overlap, and it can be considered that the second electrode layer 140 and the first electrode layer 120 are etched with similar patterns, so that the second electrode layer and the first electrode layer can correspond to each other, thereby realizing the touch function of the touch panel.

[0046] In specific application scenarios, in order to protect the structure of each layer of the touch template and reduce the impact of external factors on the touch template layers. Figure 2 As shown, an organic protection layer 160 is disposed on the second electrode layer 140 .

[0047] The organic protective layer 160 may be a glass material protective layer, polymethyl methacrylate (PMMA), polycarbonate (PC) or other organic material protective layer, etc. It mainly isolates external pollutants or corrosive substances such as water vapor and stains, and prevents the user's skin from directly contacting the internal structure of the touch template when the user touches the touch template, thereby preventing damage to the functional layers of the touch template.

[0048] Based on the same concept, the present disclosure also provides a touch panel manufacturing method, such as Figure 3 As shown, including:

[0049] Step 301, forming a first insulating layer, a third insulating layer and a first electrode layer in sequence on a substrate;

[0050] Step 302, etching the first electrode layer and the third insulating layer according to a preset pattern;

[0051] Step 303: forming a second insulating layer and a second electrode layer in sequence on the etched first electrode layer.

[0052] The manufacturing method of the above embodiment is applied to the corresponding touch panel in the above embodiment. The description of the specific contents and corresponding beneficial effects of the above steps have been involved in the above touch panel embodiment, so they will not be repeated in this embodiment.

[0053] In a specific application scenario, in order to protect the structure of each layer of the touch template and reduce the impact of external factors on each layer of the touch template, the manufacturing method further includes:

[0054] After forming the second electrode layer, etching the second electrode layer according to a preset pattern;

[0055] An organic protective layer is formed on the etched second electrode layer.

[0056] In specific application scenarios, such as Figure 4 As shown in FIG. 1 , a first insulating layer, a third insulating layer 150 and a first electrode layer 120 are first formed on a substrate 100. Then, as shown in FIG. Figure 5 As shown, the entire third insulating layer 150 and the entire first electrode layer 120 are etched according to a preset pattern, and the required first electrode layer 120 and the third insulating layer 150 thereunder are retained. Figure 6 As shown, the second insulating layer 130 is formed on the first electrode layer 120 according to a normal procedure, and then other processes of the touch panel are completed according to a normal procedure.

[0057] Based on the same concept, the present disclosure also provides a display device, comprising a touch panel as described in any of the aforementioned embodiments.

[0058] The display device of the above embodiment is used to apply the corresponding touch panel in the above embodiment, and has the beneficial effects of the corresponding touch panel embodiment, which will not be described in detail here.

[0059] A person skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of the present disclosure (including the claims) is limited to these examples; under the concept of the present disclosure, the technical features in the above embodiments or different embodiments may also be combined, and there are many other variations of different aspects of the embodiments of the present disclosure as described above, which are not provided in detail for the sake of simplicity. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present disclosure shall be included in the scope of protection of the present disclosure.

Claims

1. A touch panel, comprising: substrate; A first insulating layer disposed on the substrate, a first electrode layer disposed on the first insulating layer, a second insulating layer disposed on the first electrode layer, and a second electrode layer disposed on the second insulating layer; A third insulating layer is provided between the first electrode layer and the first insulating layer, and an etching rate of the third insulating layer is lower than an etching rate of the first electrode layer and the first insulating layer, wherein the third insulating layer is a silicon oxide film layer, and the third insulating layer is configured to protect the first insulating layer when etching the first electrode layer; The third insulating layer and the first electrode layer have overlapping orthographic projections on the substrate; wherein, during the etching process, the entire third insulating layer and the entire first electrode layer are etched according to a preset pattern, and after etching, the first electrode layer and the portion where the third insulating layer and the first electrode layer have overlapping orthographic projections on the substrate are retained.

2. The touch panel according to claim 1, wherein: The thickness of the third insulating layer is to 3. The touch panel according to claim 1, wherein: The first insulating layer and the second insulating layer are silicon nitride film layers.

4. The touch panel according to claim 1, wherein: The second electrode layer overlaps with the orthographic projection of the first electrode layer on the substrate.

5. The touch panel according to claim 1, wherein: An organic protective layer is disposed on the second electrode layer.

6. A touch panel manufacturing method, comprising: forming a first insulating layer, a third insulating layer and a first electrode layer in sequence on a substrate; Etching the first electrode layer and the third insulating layer according to a preset pattern, wherein the third insulating layer is a silicon oxide film layer, the third insulating layer is configured to protect the first insulating layer when etching the first electrode layer, and the third insulating layer and the first electrode layer overlap with the orthographic projection on the substrate; A second insulating layer and a second electrode layer are sequentially formed on the first electrode layer after etching; wherein, during the etching process, the entire third insulating layer and the entire first electrode layer are etched according to a preset pattern, and the first electrode layer and the part where the third insulating layer and the first electrode layer have overlapping orthographic projections on the substrate are retained after etching.

7. The manufacturing method according to claim 6, further comprising: After forming the second electrode layer, etching the second electrode layer according to a preset pattern; An organic protective layer is formed on the etched second electrode layer.

8. A display device, comprising: A touch panel as claimed in any one of claims 1 to 5.

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