Antireflection film and display device including the same

Abstract

An antireflection film includes a hard coat layer including a curable resin, and a low-refractive layer disposed on the hard coat layer and including a curable resin, wherein a pencil hardness measured on the low-refractive layer is equal to or greater than 3H, thereby achieving excellent durability and antireflection effects. Further, a display device using the antireflection film is provided.

Description

[0001] This application claims priority to and the benefit of Korean Patent Application Nos. 10-2020-0052771 and 10-2020-0167019, filed on April 29, 2020 and December 2, 2020, respectively, in the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference. TECHNICAL FIELD

[0002] Disclosed herein relates to a display device including an anti-reflection film disposed on a display panel or directly coated on a display panel. BACKGROUND

[0003] Various types of display devices are used to provide images. It is required that the exterior of such a display device has high surface hardness and impact resistance to protect the display device from external environments and have reliability even with repeated use.

[0004] If a display device is exposed to external light sources such as various illuminations and natural light, an image generated by the display device is not clearly delivered to a user or can cause eye fatigue or headache to the user. In this regard, there is a strong demand for anti-reflection properties in display devices.

[0005] It will be appreciated that this Background of the Technology section of the Specification is, in part, intended to provide useful background information to facilitate a better understanding of the Technology. However, this Background of the Technology section of the Specification can include ideas, concepts, or recognitions that were not known to be part of the state of the art of the relevant technology as of the corresponding effective filing date of the disclosure herein. SUMMARY

[0006] Disclosed provides an anti-reflection film having excellent surface hardness and anti-reflection properties.

[0007] Disclosed provides a display device including an anti-reflection film having high hardness, excellent anti-reflection properties, and excellent durability and visibility.

[0008] In an embodiment of the inventive concept, the anti-reflection film can include a hard coat layer including a curable resin, and a low-refraction layer disposed on the hard coat layer and including a curable resin, wherein a pencil hardness measured on the low-refraction layer can be equal to or greater than 3H.

[0009] In an embodiment, the low-refraction layer can include first nanoparticles having a size in a range of about 40 nm to about 100 nm.

[0010] In an embodiment, the hard coat layer can have a refractive index in a range of about 1.45 to about 1.6, the low-refraction layer can have a refractive index in a range of about 1.25 to about 1.45, and the refractive index of the hard coat layer can be greater than the refractive index of the low-refraction layer.

[0011] In an embodiment, the first nanoparticles can be at least one of hollow silica, hollow acrylate polymer, hollow vinyl polymer, and hollow epoxy polymer.

[0012] In an embodiment, the anti-reflective film can further include a high-refractive layer disposed between the hard coat layer and the low-refractive layer, wherein the high-refractive layer can include a curable resin and second nanoparticles having a size in a range of about 10 nm to about 30 nm.

[0013] In an embodiment, the high-refractive layer can have a refractive index in a range of about 1.6 to about 1.75, and the refractive index of the high-refractive layer can be greater than the refractive index of the hard coat layer and greater than the refractive index of the low-refractive layer.

[0014] In an embodiment, the second nanoparticles can include at least one of C 60 (fullerene), TiO2, ZnO, SiC, GaP, Ag, ZrO2, and Au.

[0015] In an embodiment, the low-refractive layer and the hard coat layer can have the same refractive index.

[0016] In an embodiment, the anti-reflective film can further include a functional layer disposed on the low-refractive layer, the functional layer including a fluorine-containing compound.

[0017] In an embodiment, the curable resin can include a polysilsesquioxane.

[0018] In an embodiment, the polysilsesquioxane can be represented by at least one of the following Formulae 1 to 4.

[0019] [Formula 1]

[0020]

[0021] [Formula 2]

[0022]

[0023] [Formula 3]

[0024]

[0025] [Formula 4]

[0026]

[0027] In the Formulae 1 to 4, Y1and Y2may each independently be O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2nO], at least one of Y1and Y2may be [(SiO 3 / 2 R 21 ) 4+2n O], X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O], at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O], R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' may each independently be an integer of 1 to 20, R a and R b may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n1and n2may each independently be an integer of 1 to 100,000, n3may be 1 or 2, n4may be an integer of 1 to 500, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, and R1and R 12 may be different from each other.

[0028] In an embodiment, the polysilsesquioxane can be represented by at least one of the following Formulas 5 to 7.

[0029] [Formula 5]

[0030]

[0031] [Formula 6]

[0032]

[0033] [Formula 7]

[0034]

[0035] In Formulas 5 to 7, Y1and Y2are each independently O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], at least one of Y1and Y2may be [(SiO 3 / 2R 21 ) 4+2n O], X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O], at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O], R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' can each independently be an integer of 1 to 20, R a and R b may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n1and n2may each independently be an integer of 1 to 100,000, n3may be 1 or 2, n4may be an integer of 1 to 500, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, and R1and R 12 may be different from each other.

[0036] In an embodiment, the polysilsesquioxane can be represented by at least one of the following Formula 8 and Formula 9.

[0037] [Formula 8]

[0038]

[0039] [Formula 9]

[0040]

[0041] In Formula 8 and Formula 9, Y1and Y2may each independently be O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], at least one of Y1and Y2may be [(SiO 3 / 2 R 21 ) 4+2n O], X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′O], at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O], R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' can each independently be an integer of 1 to 20, R b may be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n1and n2may each independently be an integer of 1 to 100,000, n3may be 1 or 2, n4may be an integer of 1 to 500, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, and R1and R 12 may be different from each other.

[0042] In another embodiment of the inventive concept, a display device can include a display panel and an anti-reflection film disposed on the display panel, wherein the anti-reflection film can include a hard coat layer including a curable resin, and a low-refraction layer disposed on the hard coat layer and including a curable resin, and a pencil hardness measured on the low-refraction layer is equal to or greater than 3H.

[0043] In an embodiment, the low-refraction layer can include first nanoparticles having a size in a range of about 40 nm to about 100 nm.

[0044] In an embodiment, the anti-reflection film can further include a high-refraction layer disposed between the hard coat layer and the low-refraction layer, and the high-refraction layer can include a curable resin and second nanoparticles having a size in a range of about 10 nm to about 30 nm.

[0045] In an embodiment, the display device can further include a light conversion layer disposed between the display panel and the anti-reflection film, and can include at least one light control portion including a quantum dot.

[0046] In an embodiment, the display panel can include a light emitting device generating a first light, and the light conversion layer can include a first light control portion transmitting the first light, a second light control portion converting the first light into a second light, and a third light control portion converting the first light into a third light.

[0047] In an embodiment, the display device can further include a color filter layer disposed on the light conversion layer, and the color filter layer can include: a first color filter that transmits the first light; a second color filter that transmits the second light; and a third color filter that transmits the third light.

[0048] In an embodiment, the display device can further include an organic layer disposed on the color filter layer and providing a flat top surface.

[0049] In an embodiment, the anti-reflection film can be directly applied and formed on the organic layer.

[0050] In another embodiment of the inventive concept, a tiled display device can include display modules disposed along a first direction and a second direction intersecting the first direction, wherein each of the display modules can include a display panel and an anti-reflection film disposed on the display panel, the anti-reflection film can include: a hard coat layer including a curable resin; and a low-refraction layer disposed on the hard coat layer and including a curable resin, and a pencil hardness measured on the low-refraction layer can be equal to or greater than 3H. BRIEF DESCRIPTION OF DRAWINGS

[0051] The accompanying drawings, which are included to provide a further understanding of the inventive concept and are incorporated in and constitute a part of this specification, illustrate embodiments of the inventive concept and together with the description serve to explain the inventive concept. The disclosed embodiments will become more fully understood from the detailed description, and embodiments thereof, taken in conjunction with the accompanying drawings, in which:

[0052] Figure 1 is a perspective view of a display device according to an embodiment;

[0053] Figure 2 is a schematic cross-sectional view of a display device according to an embodiment;

[0054] Figure 3A is a schematic cross-sectional view illustrating an anti-reflection film according to an embodiment;

[0055] Figure 3B is Figure 3A is a magnified view of a portion AA1 in FIG. 10;

[0056] Figure 4A is a schematic cross-sectional view illustrating an anti-reflection film according to an embodiment;

[0057] Figure 4B is Figure 4A is a magnified view of a portion AA2 in FIG. 11;

[0058] Figure 5A is a schematic cross-sectional view illustrating an anti-reflection film according to an embodiment;

[0059] Figure 5B isFigure 5A is an enlarged view of a portion AA3 in FIG. 8;

[0060] Figure 6 is a schematic cross-sectional view illustrating an anti-reflection film according to an embodiment;

[0061] Figure 7 is an enlarged plan view of a portion of a display device according to an embodiment;

[0062] Figure 8 is a schematic cross-sectional view of a display device according to an embodiment; and

[0063] Figure 9A and Figure 9B are diagrams partially illustrating steps of manufacturing an anti-reflection film according to an embodiment. DETAILED DESCRIPTION

[0064] The inventive concept can have various modifications and can be implemented in different forms and should not be construed as limited to the embodiments set forth herein. Rather, all modifications, equivalents, and alternatives falling within the spirit and technical scope of the inventive concept should be included in the inventive concept.

[0065] In the specification, it will be understood that when an element (or area, layer, part, etc.) is referred to as being "on" another element, "connected to" or "coupled to" another element, it can be directly on, directly connected to, or directly coupled to the other element, or one or more intervening elements can be present therebetween.

[0066] In the specification, when an element is "directly on" another element, "directly connected to" or "directly coupled to" another element, there is no intervening element. For example, "directly on" can mean that two layers or two elements are disposed without an additional element such as an adhesive element therebetween.

[0067] The same reference numerals refer to the same elements throughout the specification. In the drawings, the thickness, proportions, and dimensions of elements can be exaggerated for the sake of efficiency and clarity in explaining the technical content.

[0068] As used herein, unless the context clearly indicates otherwise, expressions using singular forms "a," "an," and "the" are intended to include the plural forms as well.

[0069] As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. For example, “A and / or B” can be understood to mean “A, B, or A and B.” The terms “and” and “or” can be used in an inclusive and exclusive sense, and can be understood to be equivalent to “and / or.”

[0070] For purposes of this disclosure, the term “at least one of’ will be understood to include one or more of the items in the list that follows the term. For example, “at least one of A and B” can be understood to mean “A, B, or A and B.” The term “at least one of’ will be understood to include one or more of the items in the list that follows the term, when applied to a list of elements (elements). The term “at least one of’ will be understood to include one or more of the items in the list that follows the term, when applied to a list of elements (elements).

[0071] It will be understood that, although the terms “first,” “second,” etc. can be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. Thus, a first element could be termed a second element without departing from the teachings of the present disclosure. Similarly, where a second element is described as being “at” or “on” a first element, the second element can be directly on the first element or intervening elements can be present between the two elements.

[0072] For ease of description, spatially relative terms, such as “below”, “under”, “lower”, “above”, “upper” and the like, can be used herein for describing the relationship between one element or component and another element or component as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientations depicted in the figures. For example, where a device is illustrated in the figures as being turned over, the device can be inverted, and the term “below” or “under” can, therefore, encompass both a lower position with respect to the other element and an upper position with respect to the other element. The illustrative terms “below” or “under” therefore can include both the lower and upper positions. The device can also be oriented in other directions, and the spatially relative terms can be interpreted differently depending on the orientation of the device. The terms “first”, “second”, “third”, etc. can be used to describe various elements, but do not imply a limitation on the number or order of the elements. Terms such as “first” and “second” are used to identify elements of similar type or description. The terms “first”, “second”, “third”, etc. are not necessarily used to denote a chronological order or a sequence of operations.

[0073] The terms “about” or “approximately” as used herein include the recited value and contemplate within an acceptable range of deviation from the recited value as determined by one of ordinary skill in the art, and in connection with the measurement of the quantity at issue (i.e., the limitations of the measurement system). For example, “about” can mean within one or more standard deviations, or within ±20%, ±10%, or ±5% of the recited value.

[0074] It is to be understood that the terms "including", "comprising", "having" and variations thereof herein are intended to be broad and encompass the passage of elements, components, steps, operations, members, etc. into the compositions, products, methods, steps, etc. described herein, without precluding the presence or addition of one or more other elements, components, steps, operations, members, etc.

[0075] Unless otherwise defined or implied herein, all terms used are intended to have the same meaning as commonly understood by one of ordinary skill in the art in the field of the disclosure. It will also be appreciated that terms, such as those defined in a glossary, are intended to be interpreted in accordance with their meaning in the context of the relevant art and are not to be interpreted in an idealized or overly formal sense unless expressly so defined in the specification.

[0076] Hereinafter, an anti-reflection film and a display device including the same according to embodiments of the inventive concept will be explained with reference to the accompanying drawings.

[0077] Hereinafter, embodiments of the inventive concept will be explained with reference to the accompanying drawings.

[0078] Figure 1 FIG. 1 is a perspective view illustrating a display device DD. Figure 2 FIG. 2 is a schematic cross-sectional view of the display device DD according to an embodiment. Figure 2 FIG. 3 is a schematic cross-sectional view of a portion corresponding to line I-I' in Figure 1 FIG. 4 is a schematic cross-sectional view of a portion corresponding to line I-I' in

[0079] The display device DD can be a device that can be activated by an electric signal. The display device DD can include various embodiments. For example, the display device DD can be a large electronic device such as a television, a monitor, and an outdoor billboard. The display device DD of the embodiments can be a tiled display including a plurality of display modules DM1 and DM2. However, embodiments of the inventive concept are not limited thereto, and the display device DD can include only one display module DM1. The description of the display module DM1, which will be explained later, can be applied to each of the plurality of modules DM1 and DM2.

[0080] In the display device DD of the embodiments, the plurality of display modules DM1 and DM2 can be disposed in parallel to each other in a plane. Edges at one side of the display modules DM1 and DM2 can contact each other.

[0081] The display device DD can include a display area DA on which an image IM is displayed. The display area DA on which the image IM is displayed can be parallel to a plane defined by a first direction axis DR1 and a second direction axis DR2 intersecting the first direction axis DR1. The display device DD of the embodiments can include the display area DA, but can not include a non-display area.

[0082] The display device DD can have a three-dimensional shape having a thickness in a third direction axis DR3 perpendicular to a plane defined by a first direction axis DR1 and a second direction axis DR2 intersecting the first direction axis DR1. In the specification, a top surface (or a front surface) and a bottom surface (or a rear surface) of each member are defined based on a direction in which the image IM is displayed in the display area DA. The top surface and the bottom surface are opposite to each other based on the third direction axis DR3, and normal lines of the top surface and the bottom surface can be parallel to the third direction axis DR3. Directions indicated by the first direction axis DR1, the second direction axis DR2, and the third direction axis DR3 have a relative concept, and can be changed to other directions. Hereinafter, the first direction to the third direction are directions indicated by the first direction axis DR1, the second direction axis DR2, and the third direction axis DR3, respectively, and refer to the same reference numerals.

[0083] The display device DD according to an embodiment includes an anti-reflection film ARF and a display panel DP. The anti-reflection film ARF can be disposed on the display panel DP. Although not shown, an adhesive layer can be further included between the anti-reflection film ARF and the display panel DP.

[0084] The display panel DP can be activated by an electrical signal. In this embodiment, the display panel DP can be activated and display an image IM in the display area DA of the display device DD, through which a user can receive information. However, these are merely illustrative, the display panel DP can be activated and sense an external input applied to the top surface. The external input can include a user's touch, contact or proximity of a non-substance, pressure, light, or heat, and embodiments of the inventive concept are not limited to any one of them.

[0085] The display panel DP can be a light-emitting type display panel. For example, the display panel DP can be a light-emitting diode (LED) display panel, an organic electroluminescent display panel, or a quantum dot light-emitting display panel. However, embodiments of the inventive concept are not limited thereto. The display panel DP can provide first light. For example, the display panel DP can emit blue light.

[0086] The light-emitting diode (LED) display panel can include a light-emitting diode, an emission layer of the organic electroluminescent display panel can include an organic electroluminescent material, and an emission layer of the quantum dot light-emitting display panel can include a quantum dot or a quantum rod. Hereinafter, the display panel DP included in the display device DD of the embodiments described in the specification will be explained as an organic electroluminescent display panel. However, embodiments of the inventive concept are not limited thereto.

[0087] The display panel DP according to an embodiment can include a base substrate BS, a circuit layer DP-CL disposed on the base substrate BS, and a display device layer DP-ED disposed on the circuit layer DP-CL.

[0088] The base substrate BS can have an alternatingly stacked structure of an organic insulating layer including an organic material and an inorganic insulating layer including an inorganic material. Accordingly, the base substrate BS can be flexible. However, embodiments of the inventive concept are not limited thereto, and the base substrate BS can be rigid or provided as a single layer, but is not limited to any one thereof.

[0089] The circuit layer DP-CL can be disposed on the base substrate BS and can include a plurality of transistors. The circuit layer DP-CL can include driving transistors and switching transistors for driving light emitting devices ED of the display device layer DP-ED. Figure 8 The circuit layer DP-CL can include a plurality of insulating layers.

[0090] The display device layer DP-ED can be disposed on the circuit layer DP-CL and electrically connected with the circuit layer DP-CL to receive a signal. The display device layer DP-ED can include a plurality of light emitting devices ED. Figure 8 The type of the light emitting device is not limited, but can include, for example, an organic light emitting device, a quantum dot light emitting device, a liquid crystal capacitor, an electrophoretic device, or an electrowetting device.

[0091] The display apparatus DD according to embodiments can further include a light conversion layer CCL and / or an optical layer PP disposed on the display panel DP. The light conversion layer CCL can selectively convert a wavelength of light generated in the display device layer DP-ED. The light conversion layer CCL can include a light control portion including a quantum dot that controls the wavelength of light. The optical layer PP can be disposed on the display panel DP and control reflected light at the display panel DP by external light. For example, the optical layer PP can include a polarizing layer and / or a color filter layer. The light conversion layer CCL and / or the optical layer PP can be omitted from the display apparatus DD according to embodiments, unlike the drawings.

[0092] Figure 3A is a schematic cross-sectional view illustrating an anti-reflection film ARF1 of an embodiment, Figure 3B is Figure 3A a magnified view of a portion AA1 in Figure 4A is a schematic cross-sectional view illustrating an anti-reflection film ARF2 of another embodiment, Figure 4B is Figure 4A a magnified view of a portion AA2 in Figure 5A is a schematic cross-sectional view illustrating an anti-reflection film ARF3 of another embodiment, Figure 5B is Figure 5A a magnified view of a portion AA3 in Figure 6 is a schematic cross-sectional view illustrating an anti-reflection film ARF4 of an embodiment.

[0093] In Figure 3A , Figure 4A、 Figure 5A and Figure 6 In the schematic cross-sectional view of the antireflection film ARF cut along a first direction DR1 in Figure 2 but the schematic cross-sectional view cut along a second direction DR2 of the antireflection film ARF can have substantially the same shape.

[0094] Referring to Figure 3A The antireflection film ARF1 of the embodiment includes a hard coat layer HCL and a low-refractive layer LRL1 stacked in order. The antireflection film ARF1 according to the embodiment can have a pencil hardness equal to or greater than 3H measured on a surface of the low-refractive layer LRL1. If the pencil hardness is less than 3H, the hardness is low, durability capable of withstanding external force is not achieved, and it can be difficult to protect the display device DD. The pencil hardness of the antireflection film ARF1 can be equal to or less than 8H. If the pencil hardness is greater than 8H, the hardness is too high, the antireflection film ARF1 does not have sufficient flexibility, so that a crack can easily occur if an external force is applied.

[0095] The low-refractive layer LRL1 includes the same resin as the curable resin included in the hard coat layer HCL to increase surface hardness and increase interfacial adhesion between layers. Accordingly, the antireflection film ARF1 can not include a separate adhesive layer between the hard coat layer HCL and the low-refractive layer LRL1, and can have excellent abrasion resistance.

[0096] Although not shown, the antireflection film ARF1 can further include a base film under the hard coat layer HCL. The base film can support the antireflection film ARF1, or the base film can serve as a protective layer for protecting the antireflection film ARF1. The base film can be made of any material having transmittance without limitation, for example, a polyethylene terephthalate (PET) film can be used.

[0097] In the specification, the term "substituted or unsubstituted" corresponds to unsubstituted or substituted with one or more substituents selected from the group consisting of a deuterium atom, a halogen atom, a cyano, a nitro, an amine, a silyl, a boron, a phosphine oxide, a phosphine sulfide, an alkyl, an alkenyl, an aryl, and a heterocyclic group. Each of the substituents can be substituted or unsubstituted. For example, a biphenyl group can be interpreted as an aryl group or a phenyl group substituted with a phenyl group.

[0098] In the specification, the halogen atom can be, for example, a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.

[0099] In the specification, an alkyl group can be linear, branched, or cyclic. The number of carbons of the alkyl group can be 1 to 50, 1 to 30, 1 to 20, 1 to 10, or 1 to 6. Examples of the alkyl group can include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, t-butyl, isobutyl, 2-ethylbutyl, 3,3-dimethylbutyl, n-pentyl, isopentyl, neopentyl, t-pentyl, cyclopentyl, 1-methylpentyl, 3-methylpentyl, 2-ethylpentyl, 4-methyl-2-pentyl, n-hexyl, 1-methylhexyl, 2-ethylhexyl, 2-butylhexyl, cyclohexyl, 4-methylcyclohexyl, 4-t-butylcyclohexyl, n-heptyl, 1-methylheptyl, 2,2-dimethylheptyl, 2-ethylheptyl, 2-butylheptyl, n-octyl, t-octyl, 2-ethyloctyl, 2-butyloctyl, 2-hexyloctyl, 3,7-dimethyloctyl, cyclooctyl, n-nonyl, n-decyl, adamantyl, 2-ethyldodecyl, 2-butyldodecyl, 2-hexyldodecyl, 2-octyldodecyl, n-undecyl, n-dodecyl, 2-ethyldodecyl, 2-butyldodecyl, 2-hexyldodecyl, 2-octyldodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, 2-ethylhexadecyl, 2-butyihexadecyl, 2-hexylhexadecyl, 2-octylhexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, n-eicosyl, 2-ethyleicosyl, 2-butyileicosyl, 2-hexyleicosyl, 2-octyleicosyl, n- heneicosyl, n-docosyl, n-tricosyl, n-tetracosyl, n-pentacosyl, n-hexacosyl, n-heptacosyl, n-octacosyl, n-nonacosyl, n-triacontyl, and the like, without limitation.

[0100] In the specification, an alkenyl group can be linear or branched. The number of carbons is not particularly limited, but is 2 to 30, 2 to 20, or 2 to 10. Examples of the alkenyl group include ethenyl, 1-butenyl, 1-pentenyl, 1,3-butenyl, phenylethenyl, phenylethenyl, and the like, without limitation.

[0101] In the specification, an aryl group means an optional functional group or substituent derived from an aromatic hydrocarbon ring. The aryl group can be a monocyclic aryl group or a polycyclic aryl group. The number of carbons for forming a ring in the aryl group can be 6 to 30, 6 to 20, or 6 to 15. Examples of the aryl group can include phenyl, naphthyl, fluorenyl, anthryl, phenanthryl, biphenyl, terphenyl, quaterphenyl, quinquephenyl, sexiphenyl, benzo[9,10]phenanthryl, pyrenyl, benzofluoranthene,

[0102] ​In the specification, a heteroaryl group can include one or more of O, N, P, Si, and S as a heteroatom. The number of carbons used to form a ring of a heteroaryl group can be 2 to 30 or 2 to 20. The heteroaryl group can be a monocyclic heteroaryl group or a polycyclic heteroaryl group. The polycyclic heteroaryl group can have, for example, a bicyclic or tricyclic structure. Examples of the heteroaryl group can include a thiophenyl group, a furanyl group, a pyrrolyl group, an imidazolyl group, a thiazolyl group, an oxazolyl group, an oxadiazolyl group, a triazolyl group, a pyridyl group, a bipyridyl group, a pyrimidinyl group, a triazinyl group, an acridinyl group, a pyridazinyl group, a pyrazinyl group, a quinolinyl group, a quinazolinyl group, a quinoxalinyl group, a phenoxazinyl group, a phthalazinyl group, a pyridopyrimidinyl group, a pyridopyrazinyl group, a pyrazinopyrazinyl group, an isoquinolinyl group, an indolyl group, a carbazolyl group, an N-arylcarbazolyl group, an N-heteroarylcarbazolyl group, an N-alkylcarbazolyl group, a benzoxazolyl group, a benzimidazolyl group, a benzothiazolyl group, a benzocarbazolyl group, a benzothiophenyl group, a dibenzothiophenyl group, a thienothiophenyl group, a benzofuranyl group, a phenanthrolinyl group, an isoxazolyl group, a thiadiazolyl group, a benzothiazolyl group, a phenothiazinyl group, a dibenzothiopholyl group, a dibenzofuranyl group, and the like, without limitation.

[0103] The hard coat layer HCL can include a curable resin. The curable resin can include a polysilsesquioxane. In an embodiment, the polysilsesquioxane can include two or more repeating units among the following first to fourth repeating units.

[0104] [First repeating unit]

[0105]

[0106] [Second repeating unit]

[0107]

[0108] [Third repeating unit]

[0109]

[0110] [Fourth repeating unit]

[0111]

[0112] In the third repeating unit, at least one of Y1and Y2may be [(SiO 3 / 2 R 21 ) 4+2n O], and the rest can be O or NR 22 In the second repeating unit, X1may be [(SiO 3 / 2 R 23 ) 4+2m O] or R 24 .

[0113] In the first to fourth repeating units, R21 to R 24 may each independently be substituted or unsubstituted alkyl of 1 to 12 carbon atoms, n and m can each independently be an integer of 1 to 20, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a cyano group (or nitrile group), a nitro group, a substituted or unsubstituted amine group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted oxyl group, a substituted or unsubstituted thiol group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted heterocycloalkyl group of 3 to 12 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, R1and R 12 may be different from each other.

[0114] In an embodiment, the polysilsesquioxane can be represented by at least one (or any one) of the following Formulas 1 to 4.

[0115] [Formula 1]

[0116]

[0117] [Formula 2]

[0118]

[0119] [Formula 3]

[0120]

[0121] [Formula 4]

[0122]

[0123] In Formulas 1 to 4, Y1and Y2may each independently be O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], at least one of Y1and Y2may be [(SiO 3 / 2 R 21 ) 4+2n O].

[0124] In Formulas 1 to 4, X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O], at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O].

[0125] In Formulae 1 to 4, R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' can each independently be an integer of 1 to 20.

[0126] In Formulae 1 to 4, R a and R b may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms.

[0127] In Formulae 1 to 4, n1 and n2 can each independently be an integer of 1 to 100,000, n3 can be 1 or 2, and n4 can be an integer of 1 to 500.

[0128] In Formulae 1 to 4, R1 to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, R1 and R 12 may be different from each other.

[0129] In an embodiment, the polysilsesquioxane can be represented by at least one (or any one) of the following Formulae 5 to 7.

[0130] [Formula 5]

[0131]

[0132] [Formula 6]

[0133]

[0134] [Formula 7]

[0135]

[0136] In Formulae 5 to 7, Y1 and Y2 can each independently be O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], at least one of Y1 and Y2 can be [(SiO 3 / 2 R 21 ) 4+2n O].

[0137] In Formulae 5 to 7, X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O], at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O].

[0138] In Formulae 5 to 7, R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' may each independently be an integer of 1 to 20.

[0139] In Formulae 5 to 7, R a and R b may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms.

[0140] In Formulae 5 to 7, n1and n2may each independently be an integer of 1 to 100,000, n3may be 1 or 2, and n4may be an integer of 1 to 500.

[0141] In Formulae 5 to 7, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, R1and R 12 may be different from each other.

[0142] In an embodiment, the polysilsesquioxane can be represented by at least one of the following Formulae 8 and 9 (or Formula 8 or Formula 9).

[0143] [Formula 8]

[0144]

[0145] [Formula 9]

[0146]

[0147] In Formulae 8 and 9, Y1and Y2may each independently be O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2nat least one of Y1and Y2may be [(SiO 3 / 2 R 21 ) 4+2n O] at least one of X1and X2may be [(SiO

[0148] In Formula 8 and Formula 9, X1and X2may each independently be R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O] at least one of X1and X2may be [(SiO 3 / 2 R 23 ) 4+2n′ O] at least one of X1and X2may be [(SiO

[0149] In Formula 8 and Formula 9, R 20 to R 23 may each independently be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, n and n' may each independently be an integer of 1 to 20.

[0150] In Formula 8 and Formula 9, R b may be a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms.

[0151] In Formula 8 and Formula 9, n1and n2may each independently be an integer of 1 to 100,000, n3may be 1 or 2, and n4may be an integer of 1 to 500.

[0152] In Formula 8 and Formula 9, R1to R 13 may each independently be a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, R1and R 12 may be different from each other.

[0153] In an embodiment, the curable resin can further include a polymer resin represented by any one of the following Formulae 10 to 14.

[0154] [Formula 10]

[0155]

[0156] [Formula 11]

[0157]

[0158] [Formula 12]

[0159]

[0160] [Formula 13]

[0161]

[0162] [Formula 14]

[0163]

[0164] In Formulae 10 to 14, n5 can be an integer of 1 to 20, n6 to n8 can each independently be an integer of 1 to 5, n9 to n14 can each independently be an integer of 1 to 12, R 31 to R 38 may each independently be represented by the following R x or R y .

[0165]

[0166] In R x and R y , n15 and n16 can each independently be an integer of 1 to 12, R 39 may be a hydrogen atom or a methyl group.

[0167] In an embodiment, the hard coat layer HCL can have a thickness in a range of about 600 nm to about 1,000 nm. If the above range is satisfied, the anti-reflection film ARF1 can have sufficient durability.

[0168] In an embodiment, the hard coat layer HCL can have a larger refractive index than the low-refraction layer LRL1. For example, the hard coat layer HCL can have a refractive index in a range of about 1.45 to about 1.6.

[0169] The low-refraction layer LRL1 can include the same material as the hard coat layer HCL and can have increased adhesion to the hard coat layer HCL. The low-refraction layer LRL1 includes the same curable resin as the curable resin included in the hard coat layer HCL and can have excellent hardness. The same content explained above for the curable resin can be applied to the curable resin.

[0170] In an embodiment, the low-refraction layer LRL1 can have a smaller refractive index than the hard coat layer HCL. For example, the low-refraction layer LRL1 can have a refractive index in a range of about 1.25 to about 1.45. For example, the low-refraction layer LRL1 can have a refractive index in a range of about 1.3 to about 1.45. The anti-reflection film ARF1 according to the inventive concept can include a bilayer structure of a layer having a relatively low refractive index and a layer having a relatively high refractive index on the outer side (i.e., in a direction opposite to the direction indicated by the third direction axis DR3). Accordingly, an improved anti-reflection effect can be achieved.

[0171] In an embodiment, the thickness of the low-refraction layer LRL1 can be in a range of about 70 nm to about 200 nm. For example, the thickness of the low-refraction layer LRL1 can be in a range of about 100 nm to about 200 nm. If the thickness of the low-refraction layer LRL1 satisfies the above range, the anti-reflection film AFR1 can have an excellent anti-reflection effect.

[0172] Referring to Figure 3B , the low-refraction layer LRL1 can include first nanoparticles NP1 having a relatively small refractive index. In Figure 3B , the first nanoparticles NP1 are illustrated in a spherical shape, but embodiments of the inventive concept are not limited thereto. The first nanoparticles NP1 can have various shapes such as a hexahedron and an ellipse, without limitation.

[0173] In an embodiment, the size of the first nanoparticles NP1 can be in a range of about 40 nm to about 100 nm. In the inventive concept, the size of the particle can mean the farthest distance between optional end points in the particle, for example, a diameter. If the range is satisfied, the type is not particularly limited, for example, the first nanoparticles NP1 can be at least one of hollow silica, hollow acrylate polymer, hollow vinyl polymer, and hollow epoxy polymer. For example, the first nanoparticles NP1 can be hollow silica. If the first nanoparticles NP1 are hollow silica, dispersion in the curable resin including polysiloxane can be more effectively performed, and the anti-reflection effect can be excellent. The hard coat layer HCL can not include separate particles.

[0174] In an embodiment, the amount of the first nanoparticles NP1 can be in a range of about 10% to about 60% by weight, with respect to the curable resin included in the low-refraction layer LRL1.

[0175] Referring to Figure 4A and Figure 5A , the anti-reflection films ARF2 and ARF3 of the embodiments respectively include a hard coat layer HCL, a high-refraction layer HRL, and low-refraction layers LRL1 and LRL2, which are sequentially disposed. Hereinafter, with reference to Figure 3A and Figure 3BLike elements will be denoted by like reference numerals, and detailed descriptions thereof will be omitted. Although not shown, the anti-reflection films ARF2 and ARF3 can further include a base film under the hard coat layer HCL.

[0176] In an embodiment, the anti-reflection films ARF2 and ARF3 can further include a high refractive layer HRL disposed between the hard coat layer HCL and the low refractive layers LRL1 and LRL2. The high refractive layer HRL can have a higher refractive index than the hard coat layer HCL and a higher refractive index than the low refractive layer LRL1. For example, the high refractive layer HRL can have a refractive index in a range of about 1.6 to about 1.75.

[0177] The high refractive layer HRL can include the same material as the hard coat layer HCL and can have improved adhesion with the hard coat layer HCL. The high refractive layer HRL can include the same curable resin as the curable resin included in the hard coat layer HCL and can have excellent hardness. The same explanation for the curable resin described above can apply to the curable resin.

[0178] In an embodiment, the thickness of the high refractive layer HRL can be in a range of about 70 nm to about 200 nm. For example, the thickness of the high refractive layer HRL can be in a range of about 100 nm to about 200 nm. If the thickness of the high refractive layer HRL satisfies the above range, the anti-reflection film AFR2 can have an excellent anti-reflection effect.

[0179] Referring to Figure 4B , the high refractive layer HRL can include second nanoparticles NP2 distinguished from the first nanoparticles NP1. In Figure 4B , the second nanoparticles NP2 are shown to have a spherical shape, but are not limited thereto. The second nanoparticles NP2 can have various shapes such as hexahedron and ellipsoid, without specific limitation.

[0180] The second nanoparticles NP2 can have a smaller size than the first nanoparticles NP1. For example, the size of the second nanoparticles NP2 can be in a range of about 10 nm to about 30 nm. If the above range is satisfied, the type is not particularly limited. For example, the second nanoparticles NP2 can include at least one of C 60 (fullerene), TiO2, ZnO, SiC, GaP, Ag, ZrO2, and Au.

[0181] In an embodiment, based on the curable resin included in the high refractive layer HRL, the amount of the second nanoparticles NP2 can be in a range of about 10% to about 60% by weight.

[0182] Referring to Figure 5AThe anti-reflection film ARF3 according to the embodiment can include a second low-refractive layer LRL2 disposed on the high-refractive layer HRL. The second low-refractive layer LRL2 according to the embodiment can have a refractive index smaller than that of the high-refractive layer HRL, and can have the same refractive index as the hard coat layer HCL. For example, the second low-refractive layer LRL2 and the hard coat layer HCL can be formed using the same material.

[0183] Referring to Figure 5B , the second low-refractive layer LRL2 disposed on the high-refractive layer HRL according to the embodiment can include the curable resin according to the embodiment, but can not include the first nanoparticles. Thus, the second low-refractive layer LRL2 not including the first nanoparticles can have the same refractive index as the hard coat layer HCL.

[0184] Since the anti-reflection film ARF3 includes the high-refractive layer HRL having a refractive index higher than that of the hard coat layer HCL, although the second low-refractive layer LRL2 has the same refractive index as the hard coat layer HCL, it can include a bilayer structure having a layer with a relatively low refractive index and a layer with a relatively high refractive index from the outside, and an improved anti-reflection effect can be achieved.

[0185] Referring to Figure 6 , the anti-reflection film ARF4 according to the embodiment can further include a functional layer FL disposed on the low-refractive layer LRL1. The functional layer FL can be disposed at the outer side of the anti-reflection film ARF4. In Figure 6 , the structure of the anti-reflection film ARF4 except for the functional layer FL is shown as the embodiment, and can have the structure of Figure 4A and Figure 5A .

[0186] The functional layer FL can consist of a single layer or multiple layers. The functional layer FL can include at least one among a hard coat layer, a fingerprint-proof layer, and a shatter-proof layer. In the embodiment, the functional layer FL can include a fluorine-containing compound. In the embodiment, the functional layer FL including the fluorine-containing compound can be a fingerprint-proof layer.

[0187] Table 1 below shows measurement results of physical properties of anti-reflection films according to examples and comparative examples. As shown in Figure 9A , the anti-reflection films of the examples were manufactured by being applied on display panels. The anti-reflection films of the examples included a low-refractive layer LRL1, a high-refractive layer HRL, and a second low-refractive layer LRL2 disposed on the high-refractive layer HRL. Figure 4AA hard coat layer HCL including a curable resin including a polysilsesquioxane represented by Formula 1, a high refractive layer HRL including the same curable resin, TiO2, and ZrO2, and a low refractive layer LRL1 including hollow silica and the same curable resin are sequentially stacked. In the high refractive layer HRL, TiO2 and ZrO2 are included so that the total amount is in the range of about 10% to about 60% by weight, and the hollow silica in the low refractive layer LRL1 is included in an amount in the range of about 10% to about 60% by weight. The anti-reflection film of the comparative example is manufactured in a film shape and attached to a display panel. In the anti-reflection film of the comparative example, the high refractive layer and the low refractive layer do not include the same curable resin as the hard coat layer, but include an acryl resin. The anti-reflection film has the same configuration as the example except that the total amount of TiO2 and ZrO2 in the high refractive layer is less than about 10% by weight and the amount of hollow silica in the low refractive layer is less than about 10% by weight.

[0188] 1. Measurement of reflectance and transmittance

[0189] The reflectance and transmittance for light having a wavelength of about 400 nm to about 750 nm were measured using a CM-3600D. The reflectance was measured at an angle of about 5 degrees.

[0190] 2. Measurement of surface hardness

[0191] The pencil hardness was measured at a load of about 1 kg, a contact angle of a pencil of about 45 degrees, and a moving rate of a pencil of about 1 mm / sec.

[0192] 3. Measurement of scratch resistance

[0193] A load was applied to steel wool (#0000) to rub the surface of the anti-reflection film obtained in the example and the comparative example at a rate of about 27 rpm for 10 times back and forth at the same time. The maximum load having one or less scratches of about 1 cm or less was observed with the naked eye.

[0194] [Table 1]

[0195] Comparative Example Example Reflectance (%) 0.3 0.3 Transmittance (%) 95.9 96.0 Pencil hardness B 4H Scratch resistance (g) 150 1000 Tolerance 500 pm or more 30 pm or less

[0196] Referring to Table 1, it can be confirmed that the anti-reflection film according to the example exhibits excellent reflectance and transmittance, and at the same time, a high pencil hardness and scratch resistance higher than the comparative example are achieved.

[0197] Figure 7 FIG. 1 is an enlarged plan view showing a portion of a display device according to an example. Figure 8 FIG. 1 is an enlarged plan view showing a portion of a display device according to an example. Figure 7In the middle, a display area DA according to an embodiment of the inventive concept is partially illustrated. Figure 8 Illustrated is a portion corresponding to line II-II' in Figure 7

[0198] Referring to Figure 7 and Figure 8 , the display device DD1 according to an embodiment can include a non-emitting area NPXA and emitting areas PXA-B, PXA-G, and PXA-R. The emitting areas PXA-B, PXA-G, and PXA-R can be areas that emit light generated from the light emitting devices ED, respectively. The emitting areas PXA-B, PXA-G, and PXA-R can be separated from each other in a planar view. Areas of the emitting areas PXA-B, PXA-G, and PXA-R are illustrated as being the same, but can be different from each other without limitation. For example, the area can mean an area in a planar view.

[0199] The emitting areas PXA-B, PXA-G, and PXA-R can be divided into a plurality of groups according to colors of the emitted light. In the display device DD1 of an embodiment, three emitting areas PXA-B, PXA-G, and PXA-R that respectively emit blue light, green light, and red light are illustrated as an embodiment as shown in Figure 7 and Figure 8 For example, the display device DD1 of an embodiment can include a red emitting area PXA-R, a blue emitting area PXA-B, and a green emitting area PXA-G that are distinguished from each other.

[0200] In an embodiment, the emitting areas PXA-B, PXA-G, and PXA-R can have a stripe structure in which the blue emitting area PXA-B, the green emitting area PXA-G, and the red emitting area PXA-R are alternately arranged. An area of the green emitting area PXA-G can be greater than areas of the blue emitting area PXA-B and the red emitting area PXA-R. The areas of the blue emitting area PXA-B and the red emitting area PXA-R can be the same. For example, the area can mean an area in a planar view. However, embodiments of the inventive concept are not limited thereto, and the areas of the emitting areas PXA-B, PXA-G, and PXA-R can be the same or different, and the emitting areas PXA-B, PXA-G, and PXA-R can have various polygonal shapes or a circular shape. The arrangement structure of the emitting areas is not limited to the stripe structure, and can be, for example a dot structure.

[0201] Referring to Figure 8 , the display device DD1 of an embodiment can include a light conversion layer CCL disposed on the display panel DP. The display device DD1 according to an embodiment can further include a color filter layer CFL. The color filter layer CFL can be disposed between the cover layer OC and the light conversion layer CCL. ​

[0202] The display panel DP can be a light emitting type display panel. For example, the display panel DP can be an organic electroluminescence display panel or a quantum dot light emitting display panel.

[0203] The display panel DP can include a base substrate BS, a circuit layer DP-CL disposed on the base substrate BS, and a display device layer DP-ED. The display device layer DP-ED can include a pixel definition layer PDL, a light emitting device ED disposed in the pixel definition layer PDL, and a encapsulation layer TFE disposed on the light emitting device ED.

[0204] The pixel definition layer PDL can be formed using a polymer resin. For example, the pixel definition layer PDL can be formed by including a polyacrylate-based resin or a polyimide-based resin. The pixel definition layer PDL can be formed by including a light absorbing material or including a black pigment or a black dye. The pixel definition layer PDL can be formed using an inorganic material. For example, the pixel definition layer PDL can be formed by including silicon nitride (SiN x ), silicon oxide (SiO x ), silicon oxynitride (SiO x N y ), or the like. The pixel definition layer PDL can define light emitting areas PXA-B, PXA-G, and PXA-R. The light emitting areas PXA-B, PXA-G, and PXA-R and the non-light emitting area NPXA can be divided by the pixel definition layer PDL.

[0205] The display device layer DP-ED includes a light emitting device ED, which can include a first electrode EL1 and a second electrode EL2 disposed opposite each other, and a multi-layer OL disposed between the first electrode EL1 and the second electrode EL2. The multi-layer OL can include a hole transport region, an emission layer, and an electron transport region. The hole transport region can include a hole injection layer adjacent to the first electrode EL1 and a hole transport layer disposed between the hole injection layer and the emission layer, and the electron transport region can include an electron injection layer adjacent to the second electrode EL2 and an electron transport layer disposed between the emission layer and the electron injection layer. In an embodiment, the light emitting device ED can provide first light. For example, the light emitting device ED can emit blue light.

[0206] In another embodiment, the light emitting device ED can include a plurality of light emitting structures disposed in sequence between the first electrode EL1 and the second electrode EL2. Each of the plurality of light emitting structures can include an emission layer and a hole transport region and an electron transport region, and the emission layer is between the hole transport region and the electron transport region. For example, three light emitting structures including an emission layer emitting blue light and one light emitting structure including an emission layer emitting green light can be included. However, embodiments of the inventive concept are not limited thereto. The arrangement order among the light emitting structures or the number of light emitting structures can be variously changed.

[0207] On the light emitting device ED, an encapsulation layer TFE can be provided, and the encapsulation layer TFE can be provided on the second electrode EL2. The encapsulation layer TFE can be directly provided on the second electrode EL2. The encapsulation layer TFE can be a stack of one or more layers.

[0208] The light conversion layer CCL can be provided on the display panel DP, and a cover layer CPL is located between the light conversion layer CCL and the display panel DP. The light conversion layer CCL can include a plurality of separation portions BK provided separately and light control portions CCP-B, CCP-G, and CCP-R provided between the separation portions BK. The separation portion BK can be formed by including a polymer resin and a liquid repellent additive. The separation portion BK can be formed by including a light absorbing material or by including a pigment or a dye. For example, the separation portion BK can be formed by including a black pigment or a black dye to implement a black separation portion. As the black pigment or the black dye for forming the black separation portion, a material such as carbon black can be used, but embodiments of the inventive concept are not limited thereto.

[0209] The light conversion layer CCL can include a first light control portion CCP-B that transmits first light, a second light control portion CCP-G that includes first quantum dots QD1 that convert the first light into second light, and a third light control portion CCP-R that includes second quantum dots QD2 that convert the first light into third light. The second light can be light in a wavelength region longer than the first light, and the third light can be light in a wavelength region longer than the first light and the second light. For example, the first light can be blue light, the second light can be green light, and the third light can be red light.

[0210] Although not shown, the light conversion layer CCL can further include a scatterer. For example, the first light control portion CCP-B can not include quantum dots but include a scatterer, the second light control portion CCP-G can include the first quantum dots QD1 and a scatterer, and the third light control portion CCP-R can include the second quantum dots QD2 and a scatterer.

[0211] The scatterer can be an inorganic particle. For example, the scatterer can include at least one of TiO2, ZnO, Al2O3, SiO2, and hollow silica. The scatterer can include at least one of TiO2, ZnO, Al2O3, SiO2, and hollow silica, or can be a mixture of two or more materials selected from TiO2, ZnO, Al2O3, SiO2, and hollow silica.

[0212] The cores of the quantum dots QD1 and QD2 of the embodiments can be selected from a group consisting of II-VI compounds, III-VI compounds, III-V compounds, IV-VI compounds, IV elements, IV compounds, and combinations thereof.

[0213] The II-VI compound can be selected from the group consisting of binary compounds, ternary compounds, and quaternary compounds, the binary compounds being selected from the group consisting of CdSe, CdTe, CdS, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS, and mixtures thereof, the ternary compounds being selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, MgZnSe, MgZnS, and mixtures thereof, the quaternary compounds being selected from the group consisting of HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof.

[0214] The III-VI compound can include binary compounds such as In2S3and In2Se3, ternary compounds such as InGaS3and InGaSe3, or optional combinations thereof.

[0215] The I-III-VI compound can be selected from ternary or quaternary compounds such as AgInGaS2and CuInGaS2, the ternary compounds being selected from the group consisting of AgInS, AgInS2, CuInS, CuInS2, AgGaS2, CuGaS2, CuGaO2, AgGaO2, AgAlO2, and mixtures thereof.

[0216] The III-V compound can be selected from the group consisting of binary compounds, ternary compounds, and quaternary compounds, the binary compounds being selected from the group consisting of GaN, GaP, GaAs, GaSb, AIN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof, the ternary compounds being selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InGaP, InAlP, InNP, InNAs, InNSb, InPAs, InPSb, and mixtures thereof, the quaternary compounds being selected from the group consisting of GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof. The III-V compound can also include a Group II metal. For example, InZnP, InGaZnP, InAlZnP, and the like can be selected as III-V compounds that also include a Group II metal.

[0217] The IV-VI compound can be selected from the group consisting of binary compounds, ternary compounds, and quaternary compounds, the binary compounds being selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof, the ternary compounds being selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof, the quaternary compounds being selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof. The Group IV element can be selected from the group consisting of Si, Ge, and mixtures thereof. The Group IV compound can be a binary compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

[0218] The binary, ternary, or quaternary compound can be present in the particle at a uniform concentration, or can be present in the same particle in a partially different concentration profile. Core / shell structures can be included in which one quantum dot is wrapped by another. In a core / shell structure, the shell can have a concentration gradient in which the concentration of the element present in the shell decreases toward the center.

[0219] In some embodiments, the quantum dots QD1 and QD2 can have the above-described core-shell structure including a core including a nanocrystal and a shell wrapping the core. The shell of the quantum dots QD1 and QD2 can serve as a protective layer for preventing chemical deformation of the core to maintain a semiconductor property, and / or as a charging layer for imparting an electrophoretic property to the quantum dots QD1 and QD2. The shell can have a single layer or multiple layers. Examples of the shell of the quantum dots QD1 and QD2 can include a metal oxide or a non-metal oxide, a semiconductor compound, or a combination thereof.

[0220] For example, the metal oxide or the non-metal oxide can include a binary compound such as SiO2, Al2O3, TiO2, ZnO, MnO, Mn2O3, Mn3O4, CuO, FeO, Fe2O3, Fe3O4, CoO, Co3O4, and NiO, or a ternary compound such as MgAl2O4, CoFe2O4, NiFe2O4, and CoMn2O4, but embodiments of the inventive concept are not limited thereto.

[0221] Further, the semiconductor compound can include CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnSeS, ZnTeS, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InGaP, InSb, AlAs, AlP, AlSb, etc., but embodiments of the inventive concept are not limited thereto.

[0222] The quantum dots QD1 and QD2 can have a full width at half maximum (FWHM) of an emission wavelength spectrum equal to or less than about 45 nm. For example, the quantum dots QD1 and QD2 can have a FWHM of an emission wavelength spectrum equal to or less than about 40 nm. For example, the quantum dots QD1 and QD2 can have a FWHM of an emission wavelength spectrum equal to or less than about 30 nm. Within these ranges, color purity or color reproducibility can be improved. Light emitted via such quantum dots QD1 and QD2 can be emitted in all directions, and light viewing angle properties can be improved.

[0223] The shape of the quantum dots QD1 and QD2 can be a shape commonly used in the art without specific limitation. For example, the quantum dots QD1 and QD2 can be spherical, conical, multi-armed, or cubic nanoparticles, nanotubes, nanowires, nanofibers, nanoplatelets, etc.

[0224] The quantum dots QD1 and QD2 can control the color of emitted light according to the particle diameter, and thus, the quantum dots QD1 and QD2 can have various emission colors such as blue, red, green.

[0225] The light conversion layer CCL can further include a cover layer CPL. The cover layer CPL can be disposed on the light control portions CCP-B, CCP-G, and CCP-R and the separation portion BK. The cover layer CPL can prevent permeation of moisture and / or oxygen (hereinafter, will be referred to as "moisture / oxygen"). The cover layer CPL can be disposed on the light control portions CCP-B, CCP-G, and CCP-R and prevent the light control portions CCP-B, CCP-G, and CCP-R from being exposed to the moisture / oxygen. The cover layer CPL can include at least one inorganic layer.

[0226] In the display device DD1 of the embodiment, the optical layer PP can include a cover layer OC and a color filter layer CFL.

[0227] The color filter layer CFL can include a light blocking portion BM and a color filter portion CF. The color filter portion CF can include a plurality of color filters CF-B, CF-G, and CF-R. For example, the color filter layer CFL can include a first color filter CF-B that transmits first light, a second color filter CF-G that transmits second light, and a third color filter CF-R that transmits third light. For example, the first color filter CF-B can be a blue color filter, the second color filter CF-G can be a green color filter, and the third color filter CF-R can be a red color filter.

[0228] Each of the color filters CF-B, CF-G, and CF-R can include a polymer photosensitive resin and a pigment or a dye. The first color filter CF-B can include a blue pigment or a blue dye, the second color filter CF-G can include a green pigment or a green dye, and the third color filter CF-R can include a red pigment or a red dye.

[0229] Embodiments of the inventive concept are not limited thereto, but the first color filter CF-B can not include a pigment or a dye. The first color filter CF-B can include a polymer photosensitive resin, but not include a pigment or a dye. The first color filter CF-B can be transparent. The first color filter CF-B can be formed using a transparent photosensitive resin.

[0230] The light blocking portion BM can be a black matrix. The light blocking portion BM can be formed by including an organic light blocking material or an inorganic light blocking material including a black pigment or a black dye. The light blocking portion BM can prevent light leakage and can define a boundary between adjacent color filters CF-B, CF-G, and CF-R.

[0231] The color filter layer CFL can further include a buffer layer BFL. For example, the buffer layer BFL can be a protective layer that protects the color filters CF-B, CF-G, and CF-R. The buffer layer BFL can be an inorganic layer including at least one inorganic material among silicon nitride, silicon oxide, and silicon oxynitride. The buffer layer BFL can consist of a single layer or multiple layers.

[0232] exist Figure 8 In the illustrated embodiment, the first filter CF-B of the color filter layer CFL is shown stacked with the second filter CF-G and the third filter CF-R, but the embodiments of the inventive concept are not limited thereto. For example, the first filter CF-B, the second filter CF-G, and the third filter CF-R can be divided by the light-blocking portion BM and may not be stacked on top of each other. In the embodiment, the first filter CF-B, the second filter CF-G, and the third filter CF-R can be respectively disposed in the blue emitting region PXA-B, the green emitting region PXA-G, and the red emitting region PXA-R.

[0233] and Figure 8 In a different embodiment, the display device DD1 may include a polarizing layer (not shown) instead of a color filter layer CFL as an optical layer PP. The polarizing layer (not shown) can block external light supplied to the display panel DP from the outside. The polarizing layer (not shown) can partially block external light.

[0234] A polarizing layer (not shown) reduces reflected light generated at the display panel DP by external light. For example, the polarizing layer (not shown) can block reflected light from light incident on the display panel DP and then emitted from outside the display device DD1. The polarizing layer (not shown) can be a circular polarizer with anti-reflection function, or the polarizing layer (not shown) can include a linear polarizer and a λ / 4 phase delayer. The polarizing layer (not shown) can be disposed on and exposed on the cover layer OC, or the polarizing layer (not shown) can be disposed below the cover layer OC.

[0235] A capping layer (OC) can be disposed on the color filter layer (CFL). The capping layer (OC) may include an organic layer. The capping layer (OC) can provide a flat top surface. The capping layer (OC) may also include an inorganic layer, such as a hard coating, disposed on the flat top surface.

[0236] Figure 9A and Figure 9B The diagram schematically illustrates the step of forming a hard coating HCL in the process of manufacturing an antireflective film ARF according to an embodiment.

[0237] Figure 9A The steps for supplying a hard coating composition HCR onto a capping layer OC are illustrated. The hard coating composition HCR comprises a curable resin composition and can be supplied onto the capping layer OC by inkjet printing or dispersion. Figure 9B The steps for forming a hard coating HCL by curing a layer formed from a hard coating composition HCR through irradiation with ultraviolet light are shown. However, the curing method is not limited to this; a hard coating HCL can also be formed by supplying heat.

[0238] The hard coat layer HCL according to the embodiment can be formed by directly supplying the hard coat composition HCR on the cover layer OC via a nozzle NZ or the like. The other layers constituting the anti-reflection film ARF can be formed by the same method. Thus, the coating tolerance of the anti-reflection film ARF can be controlled to be equal to or less than about 30 μm, and can also be applied to a tiled display apparatus DD Figure 1 ) which has a display panel attached type anti-reflection film can have a coating tolerance greater than about 30 μm, and can not be applied to a tiled display in which a plurality of display modules contact each other.

[0239] The anti-reflection film of the embodiment can have a stacked structure of two or more layers, each layer can include the same curable resin having high hardness, and have high surface hardness and excellent anti-reflection effect.

[0240] The display apparatus of the embodiment includes an anti-reflection film having excellent surface hardness on the outside, and has high reliability and visibility.

[0241] Embodiments have been disclosed herein, although the use of the terms first, second, etc. do not connote any hierarchy, priority, or importance, but are simply labels used for the convenience of the reader. In some instances, features, structures, or elements can be shown or discussed only once, identification being made with reference to the drawing figures, in which like reference characters are common to like elements throughout the figures and disclosure. Additionally, it is to be understood that other embodiments can be utilized and structural or logical changes can be made without departing from the scope of the present disclosure. Therefore, the foregoing description is not intended to be limiting. The disclosure made herein is simply an elucidation of examples that are within the spirit and scope of the application as set forth in the following claims.

Claims

1. An anti-reflection film comprising: a hard coat layer including a curable resin; and a low-refraction layer disposed on the hard coat layer and including the curable resin, wherein a pencil hardness measured on the low-refraction layer is equal to or greater than 3H, wherein the curable resin includes a polysilsesquioxane, and wherein the polysilsesquioxane is represented by at least one of Formulae 1 to 9: [Formula 1] [Formula 2] [Formula 3] [Formula 4] [Formula 5] [Formula 6] [Formula 7] [Formula 8] [Formula 9] ， wherein, in formulae 1 to 3, Y1and Y2are each independently NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], one of Y1and Y2is [(SiO 3 / 2 R 21 ) 4+2n O], and the other of Y1and Y2is NR 20 , in formulae 4 to 9, Y1and Y2are each independently O, NR 20 or [(SiO 3 / 2 R 21 ) 4+2n O], at least one of Y1and Y2is [(SiO 3 / 2 R 21 ) 4+2n O], In Formulae 1 to 9, X1and X2are each independently R 22 or [(SiO 3 / 2 R 23 ) 4+2n′ O] at least one of X1and X2is [(SiO 3 / 2 R 23 ) 4+2n′ O], R 20 to R 23 each independently is substituted or unsubstituted alkyl of 1 to 12 carbon atoms, n and n' are each independently an integer of 1 to 20, R a and R b each independently is substituted or unsubstituted alkyl of 1 to 12 carbon atoms, n1 and n2 are each independently an integer of 1 to 100,000, n3 is 1 or 2, n4 is an integer of 1 to 500, R1to R 13 each independently is a hydrogen atom, a deuterium atom, a halogen atom, an isocyanate group, a nitrile group, a nitro group, a substituted or unsubstituted epoxy group, a substituted or unsubstituted acryloyl group, a substituted or unsubstituted thio group, a substituted or unsubstituted alkyl group of 1 to 12 carbon atoms, a substituted or unsubstituted alkoxy group of 1 to 40 carbon atoms, a substituted or unsubstituted alkenyl group of 2 to 12 carbon atoms, a substituted or unsubstituted aryl group of 6 to 12 carbon atoms, or a substituted or unsubstituted heteroaryl group of 2 to 12 carbon atoms, and R1and R 12 are different from each other.

2. The antireflection film according to claim 1, wherein the low-refraction layer includes first nanoparticles having a size in a range of 40 nm to 100 nm. 3.The anti-reflection film according to claim 2, wherein, the hard coat layer has a refractive index in a range of 1.45 to 1.6, the low-refraction layer has a refractive index in a range of 1.25 to 1.45, and the refractive index of the hard coat layer is greater than the refractive index of the low-refraction layer.

4. The antireflection film according to claim 2, wherein the first nanoparticles include at least one of hollow silica, hollow acrylate polymer, hollow vinyl polymer, and hollow epoxy polymer. 5.The anti-reflection film according to claim 1, further comprising a high-refraction layer disposed between the hard coat layer and the low-refraction layer, wherein, the high-refraction layer includes the curable resin and second nanoparticles having a size in a range of 10 nm to 30 nm. 6.The anti-reflection film according to claim 5, wherein, the high-refraction layer has a refractive index in a range of 1.6 to 1.75, and the refractive index of the high-refraction layer is greater than the refractive index of the hard coat layer and greater than the refractive index of the low-refraction layer.

7. The antireflection film according to claim 5, wherein The second nanoparticle includes at least one of C 60 , TiO2, ZnO, SiC, GaP, Ag, ZrO2, and Au.

8. The antireflection film according to claim 6, wherein the low-refraction layer and the hard coat layer have the same refractive index. 9.The anti-reflection film according to claim 1, further comprising a functional layer including a fluorine-containing compound disposed on the low-refraction layer. 10.A display device comprising: a display panel; and the anti-reflection film according to any one of claims 1 to 9 disposed on the display panel. 11.The display device according to claim 10, further comprising a light conversion layer including at least one light control portion including quantum dots disposed between the display panel and the anti-reflection film. 12.The display device according to claim 11, wherein, the display panel includes a light emitting device generating first light, and the light conversion layer includes: a first light control portion transmitting the first light; a second light control portion converting the first light into second light; and a third light control portion converting the first light into third light. 13.The display device according to claim 12, further comprising a color filter layer disposed on the light conversion layer, wherein, The color filter layer includes a first optical filter that transmits the first light, a second optical filter that transmits the second light, and a third optical filter that transmits the third light.

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