Display method and substrate processing device

By storing the substrate processing measured values ​​associated with the sampling time, and only the change points and the measured values ​​before and after are stored, the problem of excessive load on the graphical processing is solved, and more efficient graphical and memory usage optimization is achieved.

CN113947517BActive Publication Date: 2025-09-02TOKYO ELECTRON LTD
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Patent Information

Application Number
CN202110777046.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2020-07-17
Filing Date
2021-07-09
Publication Date
2025-09-02
Estimated Expiration
2041-07-09

AI Technical Summary

Technical Problem

The prior art has too heavy load when performing graphical processing, and the memory usage is large, which affects other processing and has too long processing time.

Method used

By acquiring and storing the measured values ​​associated with the sampling time, only the measured values ​​that have changed and the measured values ​​before and after are stored, the memory usage is reduced and the graphical processing is optimized.

Benefits of technology

It reduces the load on graphical processing, shortens processing time, reduces memory usage, and improves processing efficiency.

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Abstract

The present invention provides a display method and a substrate processing apparatus. The display method is used to display multiple parameters representing information related to substrate processing, and includes the following steps: obtaining measurement values ​​of multiple parameters sampled at a predetermined period and information related to the sampling time of the measurement values; based on the information related to the sampling time of the measurement values, extracting measurement values ​​that have changed over time from the measurement values ​​of the multiple parameters in the order in which they were sampled, or extracting the measurement values ​​that have changed over time and the measurement values ​​sampled immediately before the measurement values; storing the extracted measurement values ​​of the multiple parameters in a memory unit in association with the information related to the sampling time of the measurement values; plotting the measurement values ​​of the multiple parameters into a graph based on the information related to the sampling time of the measurement values ​​stored in the memory unit; and displaying the plotted graph.
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Description

Technical Field

[0001] The present disclosure relates to a display method and a substrate processing device. Background Art

[0002] For example, Patent Document 1 proposes temporarily storing data collected by a data collection unit in a data cache, retrieving the data from the data cache at a predetermined cycle to draw a graph, and setting the cycle according to CPU usage.

[0003] For example, Patent Document 2 proposes the following solution: when a logic analyzer is used with an external connection, in order to eliminate insufficient memory capacity when recording status values ​​inside an LSI, when the same status value is continuously output, the same status value is compressed, and a count value of the number of times the same data is repeated and a count value of the number of data with different values ​​are recorded in an overlapping manner.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent Application Laid-Open No. 2010-224974

[0007] Patent Document 2: Japanese Patent Application Laid-Open No. 2006-90727 Summary of the Invention

[0008] Problems to be solved by the invention

[0009] The present disclosure provides a technology capable of reducing the load of processing for graphing.

[0010] Solutions for solving problems

[0011] According to one embodiment of the present disclosure, a display method for displaying multiple parameters representing information related to substrate processing is provided, and the display method includes the following steps: obtaining measurement values ​​of multiple parameters obtained by sampling at a predetermined period, and information related to the sampling time of the measurement values; based on the information related to the sampling time of the measurement values, extracting the measurement values ​​that have changed with time from the measurement values ​​of the multiple parameters in the order of sampling, or extracting the measurement values ​​that have changed with time and the measurement values ​​sampled immediately before the measurement values ​​that have changed with time; storing the extracted measurement values ​​of the multiple parameters in a memory unit in association with the information related to the sampling time of the measurement values; plotting the measurement values ​​of the multiple parameters into a curve graph based on the information related to the sampling time of the measurement values ​​stored in the memory unit; and displaying the plotted curve graph.

[0012] Effects of the Invention

[0013] According to one aspect, the load of processing for graphing can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a schematic cross-sectional view showing an example of a substrate processing apparatus according to an embodiment.

[0015] Figure 2 This is a diagram showing an example of a functional configuration of a control unit according to one embodiment.

[0016] Figure 3 This is a diagram showing an example of a data file storage unit according to one embodiment.

[0017] Figure 4 This is a diagram showing an example of a hardware configuration of a control unit according to one embodiment.

[0018] Figure 5 This is a diagram showing an example of a flow of a measurement value collection process according to one embodiment.

[0019] Figure 6 This is a diagram showing an example of the flow of conventional measurement value graphing processing.

[0020] Figure 7 This is a diagram for explaining graphing processing and graph display of conventional measurement values.

[0021] Figure 8 This is a diagram showing an example of a flow of a process for graphing measurement values ​​according to one embodiment.

[0022] Figure 9 This is a diagram for explaining graphing processing and graph display of measurement values ​​according to one embodiment.

[0023] Description of Reference Numerals

[0024] 1: Chamber; 2: Plasma; 3: Upper electrode; 4: Lower electrode; 5: Electrostatic chuck; 6: RF power supply; 7: RF power supply; 8: Gas supply unit; 9: Exhaust device; 10: Substrate processing device; 20: Control unit; 21: Acquisition unit; 22: Storage unit; 23: Process execution unit; 24: Data processing unit; 25: Drawing unit; 26: Drawing request unit; 27: Display unit; ST: Loading table; G: Substrate. DETAILED DESCRIPTION

[0025] Hereinafter, the embodiment of the present disclosure will be described with reference to the accompanying drawings. In the drawings, the same components are sometimes denoted by the same reference numerals, and repeated descriptions are omitted.

[0026] [Substrate processing equipment]

[0027] First, use Figure 1 A substrate processing apparatus 10 according to one embodiment will be described. Figure 1 It is a schematic cross-sectional view showing an example of a substrate processing apparatus 10 according to one embodiment. Figure 1 A processing apparatus for processing a substrate using a capacitively coupled plasma is shown.

[0028] The substrate processing apparatus 10 includes a chamber 1, which provides a processing space for performing etching and film formation processes. In the substrate processing apparatus 10, a plasma is formed in the processing space between the upper electrode 3 and the stage ST in the chamber 1, and the substrate G is processed by the action of the plasma. The stage ST includes a lower electrode 4 and an electrostatic chuck 5. The stage ST may also include a heater. The substrate G is held on the lower electrode 4. An RF power supply 6 and an RF power supply 7 are coupled to the lower electrode 4, and the RF power supplies 6 and 7 can use different RF frequencies. The upper electrode 3 is connected to a ground potential. In other examples, the RF power supply 6 and the RF power supply 7 may also be coupled to different electrodes. A gas supply unit 8 is connected to the chamber 1 via a gas supply line 11, and the gas supply unit 8 supplies a processing gas to the processing space. A flow controller MFC is connected to the gas supply line 11. The flow rate of the processing gas is controlled by the flow controller MFC, so that the processing gas is supplied to the chamber 1 at a predetermined flow rate. An exhaust device 9 is connected to the bottom of the chamber 1 , and the exhaust device 9 exhausts the interior of the chamber 1 .

[0029] The substrate processing apparatus 10 includes a control unit 20 including a processor and various storage areas. The control unit 20 controls various components of the substrate processing apparatus 10 to perform plasma processing, such as etching, on the substrate G.

[0030] A pressure gauge CM is installed in the chamber 1 . The pressure gauge CM measures the pressure in the chamber 1 while processing the substrate G. The pressure value measured by the pressure gauge CM is transmitted to the control unit 20 .

[0031] The flow controller MFC controls and measures the flow rate of each gas included in the processing gas while processing the substrate G. The gas flow rate measurement values ​​measured by the flow controller MFC are sent to the control unit 20 .

[0032] A thermometer T is attached to the mounting table ST. The thermometer T measures the temperature of the mounting table ST while the substrate G is being processed. The temperature value measured by the thermometer T is transmitted to the control unit 20.

[0033] The pressure gauge CM, the temperature gauge T, and the flow controller MFC are examples of equipment that measures information related to substrate processing, such as the state of the substrate G, the state of the process, or the state of the chamber 1 during processing of the substrate G. Furthermore, the pressure measurement value, the temperature measurement value, and the gas flow measurement value are examples of multiple parameters indicating the state of the substrate G, the state of the process, or the state of the chamber 1, and the measurement values ​​of the multiple parameters indicating information related to substrate processing are not limited thereto.

[0034] The control unit 20 executes a display method in which a plurality of parameters representing the substrate processing performed by the substrate processing apparatus 10 are graphed and displayed on a display 36 (see FIG. Figure 4 ) or other computers that can communicate with the control unit 20.

[0035] [Functional structure of the control unit]

[0036] Next, refer to Figure 2 An example of the functional configuration of the control unit 20 will be described. Figure 2 1 is a diagram showing an example of a functional configuration of a control unit 20 according to an embodiment. The control unit 20 includes an acquisition unit 21 , a storage unit 22 , a process execution unit 23 , a data processing unit 24 , a rendering unit 25 , a rendering request unit 26 , and a display unit 27 .

[0037] The acquisition unit 21 acquires the measured values ​​of multiple parameters sampled at a predetermined period, as well as information related to the sampling times of the measured values. The information related to the sampling times of the measured values ​​can be either the sampling numbers of the measured values ​​or the sampling times themselves. In this embodiment, the acquisition of the sampling numbers is used as an example for explanation.

[0038] The sampling number is assigned in ascending order for each cycle. Thus, by storing the measured values ​​measured in each cycle in association with the sampling number in the storage unit 22, the sampling time of the measured values ​​can be calculated. For example, if the cycle is T and the sampling number is n (n is an integer greater than or equal to 1), the sampling time t of each measured value can be calculated using formula (1), starting from the time when sampling starts.

[0039] t=T×(n-1)…(1)

[0040] For example, if the cycle T is 100 msec and all data for all parameters are sampled in each cycle, the sampling time for each measured value is t = 100 (msec) × (n-1). The sampling time t can be calculated based on the sampling number n. For example, if n = 11, the data obtained is the data obtained by sampling 1 second (100 msec × 10) after the start of sampling.

[0041] When n is an integer equal to or greater than 0 and the sampling start time is n=0, the sampling time t can be calculated by equation (1′).

[0042] t=T×n…(1')

[0043] The data processing unit 24 calculates the sampling time of each measurement value from the product of the integer obtained based on the sampling number n and the period T based on the formula (1) or the formula (1′).

[0044] Furthermore, when only the relative time during the sampling period is of interest, the above formula (1') can be applied even when n is set to an integer greater than 1 and the sampling start time is set to n=1. However, in this case, the numerical value of the sampling time corresponding to each n is meaningless when viewed alone.

[0045] For each of the plurality of parameters, the acquired measurement value is associated with information on the sampling time of the measurement value and stored in the data storage unit 28 of the storage unit 22. The data storage unit 28 stores a plurality of monitoring data files 128a, 128b, ...

[0046] Figure 3 This diagram shows an example of measured values ​​stored in the data storage unit 28 according to one embodiment. For example, monitoring data file 128a stored in the data storage unit 28 stores all parameters (pressure measurement values, gas flow measurement values, temperature measurement values, etc.) for sampling number 1 (n=1). Monitoring data file 128b stores all parameters for sampling number 2 (n=2). Monitoring data file 128c stores all parameters for sampling number 3 (n=3).

[0047] In this way, the monitoring data files 128a, 128b, ... are set up for each sampling number, and the measured values ​​of each parameter are stored in association with the sampling number for a plurality of parameters. Figure 3 Only three parameters are shown in FIG. 1 , but the number of parameters is not limited to three, and may be two or more. Furthermore, the monitoring data files 128 a , 128 b . . . are also collectively referred to as monitoring data files 128 .

[0048] The process execution unit 23 performs the desired processing on the substrate G. The data processing unit 24 performs data processing (a part of the graphing processing) for graphing the measurement values ​​of multiple parameters based on the sampling number associated with each measurement value. Specifically, the data processing unit 24 searches for the measurement value of each parameter of the multiple parameters in the order of the sampling number, and extracts the measurement value that has changed over time. However, the data processing unit 24 may also search for the measurement value of each parameter of the multiple parameters in the order of the sampling number, and extract the measurement value that has changed over time and the measurement value obtained immediately before the measurement value that has changed over time. The measurement values ​​extracted according to the prescribed rules determined as described above are stored in the memory unit 29 which is a temporary storage area of ​​the storage unit 22. In the memory unit 29, information related to the sampling time of the extracted measurement value is stored in association with the measurement value.

[0049] The plotting unit 25 plots the corresponding measurement value for each parameter on a graph based on the sampling time calculated from the sampling number stored in the memory unit 29. The display unit 27 displays a graph plotting the temporal changes in the measurement values ​​of a plurality of parameters.

[0050] In this embodiment, the control unit 20 first stores all the measurement values ​​obtained through sampling in the monitoring data file 128. Then, when drawing a graph, the measurement values ​​of the multiple parameters extracted from the measurement values ​​of the multiple parameters stored in the monitoring data file 128 based on the above-mentioned predetermined rules are stored in the memory unit 29 in association with information related to the sampling time of the extracted measurement values.

[0051] However, the method of storing the measured values ​​is not limited to this. For example, the measured values ​​extracted by the data processing unit 24 from the sampled measured values ​​may be directly stored in the memory unit 29. In this case, the process of first storing all the sampled measured values ​​in the monitoring data file 128 can be omitted. This can reduce the processing load and the amount of memory used to store the sampled measured values.

[0052] Alternatively, in response to a graph drawing request, the data processing unit 24 may extract the measured values ​​of multiple parameters from the sampled measured values ​​based on the aforementioned predetermined rules, and the plotting unit 25 may plot the temporal changes in the measured values ​​of the multiple parameters extracted in response to the graph drawing request. Alternatively, in response to the display of a screen capable of requesting graph drawing (a graph drawing request screen), the plotting request unit 26 may output an instruction signal instructing the start of the measurement value extraction process. Alternatively, in response to an operation requesting graph drawing on the graph drawing request screen, the plotting request unit 26 may output an instruction signal instructing the start of the drawing process (part of the graphing process).

[0053] [Hardware structure of the control unit]

[0054] Next, refer to Figure 4 An example of the hardware configuration of the control unit 20 will be described. Figure 4 1 is a diagram showing an example of a hardware configuration of the control unit 20 according to one embodiment. The control unit 20 includes an interface 31 , an auxiliary storage device 32 , a main memory 33 , a CPU 34 , a keyboard 35 , and a display 36 .

[0055] The interface 31 is an interface with a measuring unit such as the pressure gauge CM. Thus, the control unit 20 can acquire, via the interface 31, measurement values ​​of a plurality of parameters sampled at a preset period.

[0056] The auxiliary storage device 32 is a nonvolatile storage device that stores the measured values ​​of the multiple sampled parameters in association with the sampling numbers associated with the measured values. The main memory 33 is a volatile semiconductor memory that temporarily stores the measured values ​​extracted from the sampled multiple parameter values ​​based on the predetermined rule, in association with the sampling numbers of the measured values.

[0057] The CPU 34 executes graphing processing (data processing, drawing processing, etc.) based on the measurement values ​​and the sampling numbers of the measurement values ​​stored in the auxiliary storage device 32 and the main memory 33 .

[0058] The keyboard 35 is an example of an input device and is used to input predetermined operations. The display 36 is an example of a display device and is used to display the temporal changes in the measured values ​​of multiple parameters in a graph. A touch panel may be used as the input device in place of the keyboard 35.

[0059] exist Figure 2 , a block diagram focusing on the functions of the control unit 20 is depicted. For example, the functions of the process execution unit 23, the data processing unit 24, and the rendering unit 25 can be realized by causing the CPU 34 to execute substrate processing, data processing, and rendering processing.

[0060] The function of the storage unit 22 can be realized by the auxiliary storage device 32 and the main memory 33. The function of the display unit 27 can be realized by the display 36. The function of the acquisition unit 21 can be realized by the interface 31. The function of the rendering request unit 26 can be realized by the keyboard 35.

[0061] [Measurement value collection and processing]

[0062] Next, refer to Figure 5 The measurement value collection process executed by the control unit 20 will be described. Figure 5 This is a diagram showing an example of a flow of a measurement value collection process according to one embodiment.

[0063] This collection process is a process of acquiring all measured values ​​of a plurality of parameters at a cycle of, for example, 100 msec while the process execution unit 23 is executing the substrate process, and storing the values ​​in the monitoring data file 128 .

[0064] When substrate processing begins, the acquisition unit 21 samples the measured values ​​of multiple parameters at a preset period and acquires the sampling numbers and measured values ​​of the multiple parameters (step S1). The acquisition unit 21 then stores the acquired sampling numbers and measured values ​​of each parameter in the monitoring data file 128 of the data storage unit 28 (step S2).

[0065] Next, the acquisition unit 21 determines whether the process (substrate processing) has ended (step S3). Until the process ends, steps S1 to S3 are repeated, and the sampling number and measured value of each parameter obtained through sampling are stored in the monitoring data file 128. When the process ends, it determines whether the next process has begun (step S4), and a waiting period is set before the next process begins. After the next process begins, the acquisition unit 21 again acquires the sampling numbers and measured values ​​of the multiple parameters obtained through sampling and stores them in the monitoring data file 128 while the next process is being executed.

[0066] [Graphing of previous curves]

[0067] Next, refer to Figure 6 and Figure 7 The following describes conventional processing for graphing measured values. Figure 6 This is a diagram showing an example of the flow of conventional measurement value graphing processing. Figure 7 This figure is used to explain the conventional graphing and display of measured values. Furthermore, in conventional graphing, when the measured values ​​are stored in the monitoring data file 128 in the order in which they were sampled and the sampling times of the measured values ​​are obtained without using sampling numbers, the sampling numbers may not be associated with the measured values.

[0068] exist Figure 6 In the conventional graphing process, first, it is determined whether the drawing request screen has been switched to (step S11). If the drawing request screen is displayed, it is determined that the drawing request screen has been switched to, and the measured values ​​of the plurality of parameters stored in the monitoring data file 128 are stored directly in the memory unit 29 (step S12).

[0069] For example, Figure 7 As shown, when the drawing request screen 136 is displayed on the display 36, Figure 7 The parameters (A: pressure measurement value, B: gas flow measurement value, C: temperature measurement value) stored in the monitoring data file 128 shown in (a) are stored directly in the memory unit 29. In other words, the data stored in the memory unit 29 are the same as the measurement values ​​of the parameters stored in the monitoring data file 128.

[0070] Next, it is determined whether there is a drawing request (step S13). For example, if the operator does not press Figure 7 If "Yes" button 136a is pressed on the drawing request screen 136 (step S13: No), and a predetermined time period has elapsed (step S14), the process ends. If "Yes" button 136a is pressed on the drawing request screen 136 before the predetermined time period has elapsed, it is determined that a drawing request has been made. Alternatively, step S14 may be omitted, and if "No" is determined in step S13, the process may remain in a waiting state until button 136a is pressed before returning to step S13.

[0071] In this case, in response to the drawing request, the measured values ​​of the plurality of parameters stored in the memory unit 29 are plotted in the order in which they were stored to form a graph (step S15), and the graph of the plurality of parameters is displayed (step S16), and the processing is terminated. Figure 7 As shown in (b), the temporal changes of the measured values ​​of the plurality of parameters stored in the memory unit 29 can be displayed as a graph, thereby confirming the substrate processing status.

[0072] In conventional graphing, the measured values ​​stored in memory unit 29 are identical to the measured values ​​of each parameter stored in monitoring data file 128, and all sampled measured values ​​are plotted on the graph. Consequently, the values ​​are plotted in the order in which they were sampled, increasing the processing load for graphing and making the graph more time-consuming. In particular, the increasing number of parameters in recent years has further increased the processing load for graphing.

[0073] Furthermore, in conventional graphing processing, the measured values ​​of multiple parameters stored in monitoring data file 128 are stored directly in memory unit 29, resulting in a large amount of memory usage. In recent years, the number of parameters has increased significantly, further increasing memory usage. Memory is used not only for graphing but also for other processing. Therefore, if memory usage increases due to graphing, this can also affect other processing.

[0074] As described above, the consumption of CPU 34 and main memory 33 for graphing increases. In addition, the high load on CPU 34 continues during the graphing process, so the time required to display the graph on the screen also increases, resulting in a decrease in service quality.

[0075] Therefore, in the graphing process of this embodiment, the consumption of the CPU 34 and the main memory 33 used for displaying the graphs of multiple parameters is reduced, and the time until the graphs are displayed on the screen is shortened. Figure 5 The collection, processing and Figure 8 The graphing process (data processing, drawing process, etc.) shown.

[0076] [Graphing of this embodiment]

[0077] Next, refer to Figure 8 and Figure 9 The processing of graphing the measured values ​​according to this embodiment will be described. Figure 8 This is a diagram showing an example of a flow of a process for graphing measurement values ​​according to one embodiment. Figure 9 This is a diagram for explaining graphing processing and graph display of measurement values ​​according to one embodiment.

[0078] In this process, the drawing request unit 26 first determines whether to transition to the drawing request screen (step S21). If the drawing request unit 26 determines that the transition has been made to the drawing request screen, the data processing unit 24 extracts the change points of the measured values ​​for each of the multiple parameters stored in the monitoring data file 128 based on the aforementioned rules. The data processing unit 24 stores the measured values ​​at the extracted change points in the memory unit 29, in association with the sampling numbers (step S22). However, the data processing unit 24 may also store the measured values ​​at the extracted change points and the measured values ​​obtained by sampling immediately before the measured values ​​at the extracted change points in the memory unit 29, in association with the sampling numbers.

[0079] For example, Figure 9As shown, when the drawing request screen 136 is displayed on the display 36, the drawing request unit 26 outputs an instruction signal for instructing the start of the process of extracting the measured value. When the data processing unit 24 receives the instruction signal for instructing the start of the process of extracting the measured value, Figure 9 The data processing unit 24 extracts the change points of the measured values ​​for each parameter (A: pressure measurement value, B: gas flow measurement value, C: temperature measurement value, etc.) stored in the monitoring data file 128 shown in (a). The data processing unit 24 then stores the measured values ​​at the extracted change points in association with the sampling numbers in the memory unit 29. Furthermore, the first and last measured values ​​of a sampling period consisting of multiple cycles are unconditionally stored in the memory unit 29. Thus, for example, from the pressure measurement value of A, the change points with sampling numbers 1, 3, and 6 are extracted. The measured values ​​"7," "10," and "11" of the extracted change points are then stored in the memory unit 29 in association with the sampling numbers "1," "3," and "6." Furthermore, in this embodiment, the measured values ​​"7," "10," and "11" of the sampling numbers "2" and "5" immediately preceding the extracted change points are also stored in the memory unit 29 in association with the sampling numbers "2" and "5." The measurement value extraction is performed similarly for the gas flow measurement value of B and the temperature measurement value of C.

[0080] The results, such as Figure 9 As shown in (b), the pressure and temperature measurement values ​​of sampling number "4" are substantially discarded and not stored in the memory unit 29. Therefore, the data stored in the memory unit 29 is less than the measurement values ​​of each parameter stored in the monitoring data file 128, which can reduce the usage of the memory unit 29.

[0081] Next, the drawing request unit 26 determines whether there is a drawing request (step S23). For example, if the operator does not press Figure 9 If "Yes" button 136a is pressed on the drawing request screen 136 (step S23: No), and a predetermined time period has elapsed (step S24), this process ends. If "Yes" button 136a is pressed on the drawing request screen 136 before the predetermined time period has elapsed, the drawing request unit 26 determines that a drawing request has been made and outputs an instruction signal instructing the start of drawing processing for the extracted measurement values. Alternatively, step S24 may be omitted, and if step S23 is "No," the process may remain in a waiting state until button 136a is pressed before returning to step S23.

[0082] When receiving the instruction signal for instructing the start of the drawing process, the drawing unit 25 marks the measured values ​​extracted by the data processing unit 24 according to the sampling time, which is the sampling time calculated based on the sampling number based on the formula (1) or the formula (1') and graphs the process (step S25). The display unit 27 displays the graphs of the multiple parameters (step S26), and the process ends. For each parameter, according to the method based on, for example, Figure 9 The measured values ​​are labeled with the sampling times calculated based on the sampling numbers associated with the measured values ​​in the memory unit 29 of (b), and the changes in the measured values ​​of each parameter over time are graphed and displayed. Figure 9 As shown in (c), the measured values ​​of a plurality of parameters stored in the memory unit 29 can be displayed as a graph, thereby confirming the status of substrate processing and the like. Figure 9 The curve shown in (c) is the same as Figure 7 The graph of the conventional example shown in (c) shows the same display.

[0083] As described above, in the measurement value graphing process according to this embodiment, the change point of the measurement value of each parameter stored in the monitoring data file 128 is extracted, and the measurement value at the change point is stored in the memory unit 29. Alternatively, the change point of the measurement value of each parameter stored in the monitoring data file 128 is extracted, and the measurement value at the change point and the measurement value obtained by sampling immediately before the change point are stored in the memory unit 29.

[0084] Thus, during periods when measured values ​​do not change, the measured values ​​during these periods can be deemed as data not required for graphing and discarded, not stored in memory unit 29. Specifically, during periods when the measured values ​​obtained through sampling remain constant, a horizontal line is displayed on the graph. Therefore, measured values ​​other than the measured value at the change point, or other than the measured value at the change point and the measured value obtained immediately before the change point, are data not required for graphing. Therefore, in this embodiment, measured values ​​determined to be unnecessary data are not stored in memory unit 29, thereby reducing the number of measured values ​​required for graphing. This can reduce memory usage for graphing.

[0085] Furthermore, since the number of measured values ​​stored in memory unit 29 is reduced compared to conventional systems, the number of measured value points required for graphing is reduced, reducing the load on CPU 34 performing the graphing process and shortening the time required to draw and display the graph. Furthermore, in order to calculate the time at which the measured value was sampled, a sampling number is associated with the measured value and stored in memory unit 29. This allows, for example, the sampling time of the measured value stored in memory unit 29 to be calculated, the measured value to be labeled according to the sampling time, and the temporal changes in the measured value to be graphed.

[0086] Furthermore, the measurement value obtained immediately before the measurement value at the change point may or may not be stored. Alternatively, when the measurement value at the change point is stored in the memory unit 29 together with the measurement value obtained immediately before the measurement value at the change point, the measurement value may be graphed according to a graphing rule that connects adjacent measured values ​​with straight lines.

[0087] Alternatively, when only the measured values ​​of the change points are stored in the memory unit 29, the following graphing rule may be used: instead of connecting adjacent measured values ​​with a straight line, a horizontal straight line is drawn from the measured value of the preceding change point to the measured value of the succeeding change point, and the measured values ​​increase and decrease in stages relative to the measured value of the succeeding change point. However, the graphing rule is not limited to this, and other rules may also be used.

[0088] The display method according to the present embodiment described above can compress the measured values ​​stored in the memory unit 29. This reduces the number of points plotted in the graphing of the measured values, reduces the processing load for graphing, and shortens the time required for graphing.

[0089] Furthermore, since the measured values ​​of the plurality of parameters stored in the monitoring data file 128 are compressed and stored in the memory unit 29 , the amount of memory used can be reduced.

[0090] Furthermore, in this embodiment, all sampled measurement values ​​for all parameters are stored in monitoring data file 128, and the measured values ​​of each parameter after the change point is extracted are stored in memory unit 29. However, it is also possible to store the measured values ​​of each parameter after the change point is extracted in monitoring data file 128, and upon receiving an instruction signal instructing the start of the measurement value extraction process, the measured values ​​of each parameter after the change point is extracted stored in monitoring data file 128 are graphed and displayed. Alternatively, the data in monitoring data file 128 may be updated using the measured values ​​stored in memory unit 29. This allows compressed storage of the sampled measurement values, thereby reducing the amount of data storage unit 28 used to store monitoring data file 128.

[0091] The display method and substrate processing apparatus disclosed in the embodiments herein should be considered in all respects to be illustrative and non-restrictive. The embodiments may be modified and improved in various ways without departing from the scope of the appended claims and their gist. The matters described in the various embodiments described above may also adopt other configurations within the scope of non-inconsistency and may be combined within the scope of non-inconsistency.

[0092] The substrate processing device disclosed in the present invention can also be applied to any type of device such as Atomic Layer Deposition (ALD: atomic layer deposition) device, Capacitively Coupled Plasma (CCP: capacitively coupled plasma), Inductively Coupled Plasma (ICP: inductively coupled plasma), Radial Line Slot Antenna (RLSA: radial line slot antenna), Electron Cyclotron Resonance Plasma (ECR: electron cyclotron resonance plasma), Helicon Wave Plasma (HWP: helicon wave plasma), etc.

[0093] Furthermore, a plasma processing apparatus has been described as an example of a substrate processing apparatus. However, the substrate processing apparatus is not limited to a plasma processing apparatus as long as it performs a predetermined process (eg, film formation process, etching process, etc.) on a substrate.

Claims

1. A display method for displaying a plurality of parameters representing information related to substrate processing, the display method comprising the following steps: Acquiring measurement values ​​of a plurality of parameters obtained by sampling at a preset period and information related to the sampling time of the measurement values; Before storing the plurality of parameter measurement values ​​in the memory unit, based on information regarding sampling times of the measurement values, extracting a measurement value that has changed with time from the plurality of parameter measurement values ​​in the order in which they were sampled, or extracting the measurement value that has changed with time and a measurement value sampled immediately before the measurement value that has changed with time; storing the extracted plurality of parameter measurement values ​​in association with information related to sampling times of the measurement values ​​in the memory unit; plotting the measurement values ​​of the plurality of parameters in a graph based on information regarding sampling times of the measurement values ​​stored in the memory unit; as well as The drawn curve graph is displayed.

2. The display method according to claim 1, wherein: The acquired information related to the sampling time of the measurement value is the acquired sampling number of the measurement value, In the graphing step, the sampling time of the measurement value is calculated based on the product of the integer obtained from the sampling number and the period, and the measurement values ​​of the plurality of parameters are graphed in correspondence with the sampling time of the measurement value.

3. The display method according to claim 1 or 2, characterized in that: The method further includes the following steps: storing the acquired measurement values ​​of the plurality of parameters in a data file in association with information related to sampling times of the measurement values; In the step of storing the data in the memory unit, the plurality of parameter measurement values ​​extracted from the plurality of parameter measurement values ​​stored in the data file are stored in the memory unit in association with information on sampling times of the measurement values.

4. The display method according to claim 3, wherein: In the step of acquiring the measurement values, the measurement values ​​of the plurality of parameters are sampled at the cycle during the substrate processing and stored in the data file in association with sampling numbers indicating the order of the sampling.

5. The display method according to claim 1 or 2, characterized in that: It also includes the following steps: Displaying a screen capable of requesting drawing of the curve graph; In response to display of a screen capable of requesting drawing of the graph, an instruction signal is outputted for instructing a start of a process of extracting the measurement value.

6. A substrate processing apparatus for performing substrate processing, the substrate processing apparatus comprising: an acquisition unit configured to acquire measurement values ​​of a plurality of parameters obtained by sampling at a preset period and information related to sampling times of the measurement values; a data processing unit that, before storing the plurality of parameter measurement values ​​in the memory unit, extracts a measurement value that has changed with time from the plurality of parameter measurement values ​​in the order in which they were sampled, or extracts the measurement value that has changed with time and a measurement value sampled immediately before the measurement value that has changed with time, based on information regarding sampling times of the measurement values; a storage unit that stores the extracted plurality of parameter measurement values ​​in association with information on sampling times of the measurement values ​​in the memory unit; a plotting unit that plots the measurement values ​​of the plurality of parameters in a graph based on information on sampling times of the measurement values ​​stored in the memory unit; and A display unit displays the drawn graph.

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